JP2019177311A - Millimeter wave-permeable decorative article, silver mirror film and its formation method - Google Patents

Millimeter wave-permeable decorative article, silver mirror film and its formation method Download PDF

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JP2019177311A
JP2019177311A JP2018066713A JP2018066713A JP2019177311A JP 2019177311 A JP2019177311 A JP 2019177311A JP 2018066713 A JP2018066713 A JP 2018066713A JP 2018066713 A JP2018066713 A JP 2018066713A JP 2019177311 A JP2019177311 A JP 2019177311A
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silver mirror
mirror film
silver
solution
substrate
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JP7106935B2 (en
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宏明 安藤
Hiroaki Ando
宏明 安藤
美貴 北元
Miki KITAMOTO
美貴 北元
新太朗 大川
Shintaro Okawa
新太朗 大川
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Toyoda Gosei Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/36Successively applying liquids or other fluent materials, e.g. without intermediate treatment
    • B05D1/38Successively applying liquids or other fluent materials, e.g. without intermediate treatment with intermediate treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/10Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/06Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/42Coating with noble metals
    • C23C18/44Coating with noble metals using reducing agents

Abstract

To provide a silver mirror film having both brilliance and millimeter wave permeability; and to provide a decorative article including the same.SOLUTION: A formation method of a millimeter wave-permeable silver mirror film includes a step B for coating tin chloride on a substrate, followed by water washing, a step D1 for coating silver mirror film formation liquid on the substrate to form a part of the silver mirror film, followed by water washing, a step β for coating acid solution on the substrate, followed by water washing, and a step D2 for coating the silver mirror film formation liquid on the substrate to form again a part of the silver mirror film, followed by water washing. The silver mirror film is completed by repeating once or more a process from the step β to the step D2.SELECTED DRAWING: Figure 1

Description

本発明は、ミリ波透過性銀鏡膜とそれを備えた加飾品に関するものである。   The present invention relates to a millimeter-wave transparent silver mirror film and a decorative article including the same.

自動車のラジエータグリル、バックパネル、サイドモール等の外装樹脂部品には、意匠性のために光輝(金属光沢)膜が形成されることがあり、光輝膜としては金属めっき膜、真空蒸着膜又は金属スパッタリング膜が一般的である。   A bright (metallic luster) film may be formed on exterior resin parts such as radiator grills, back panels, and side moldings for automobiles due to its design. As the bright film, a metal plating film, a vacuum deposited film, or a metal Sputtering films are common.

また、近年の外装樹脂部品には、その内側にミリ波レーダーが配置されるものがあり、ミリ波を透過させる性質(ミリ波透過性)が求められる。ミリ波透過性が高いとは、ミリ波透過減衰量が小さいということである。これまでの金属スパッタリング膜における知見により、表面抵抗値が高いほどミリ波透過減衰量が小さいという相関があることが分かっており、光輝性であり且つ不連続構造によって表面抵抗値が高い金属スパッタリング膜が得られている(特許文献1)。   In addition, some recent exterior resin parts have a millimeter wave radar disposed on the inside thereof, and a property of transmitting millimeter waves (millimeter wave permeability) is required. High millimeter wave transmission means that the millimeter wave transmission attenuation is small. Based on the knowledge of metal sputtering films so far, it has been found that there is a correlation that the higher the surface resistance value, the smaller the millimeter-wave transmission attenuation, and the metal sputtering film has a high surface resistance value due to the discontinuous structure. Is obtained (Patent Document 1).

しかし、近年増えてきた深い凹部がある三次元形状のラジエータグリル等に、均一に金属めっき膜、真空蒸着膜又は金属スパッタリング膜を形成することは難しい。   However, it is difficult to uniformly form a metal plating film, a vacuum vapor deposition film, or a metal sputtering film on a three-dimensional radiator grill or the like having a deep recess that has been increasing in recent years.

一方、深い三次元形状品にも均一に形成できる光輝膜として、銀鏡膜が知られている。銀鏡膜は無数の微細な銀粒子が密に存在してなるものであり、その形成方法は銀鏡液と還元液とからなる銀鏡膜形成液を両液の混合直後に塗布し、銀鏡反応(還元)により銀粒子を析出させるというものである(特許文献2)。また、特許文献3には、銀鏡反応処理剤(硝酸銀を含む金属塩溶液と還元剤溶液)と活性化処理剤(塩化スズと塩化パラジウムとの混合溶液)とをほぼ同時に吹き付けることを複数回繰り返すことにより、別々に吹き付ける手間を省き、製造時間を短縮する方法が開示されている。   On the other hand, a silver mirror film is known as a bright film that can be uniformly formed on a deep three-dimensional product. The silver mirror film consists of innumerable fine silver particles, and the formation method is to apply a silver mirror film-forming solution consisting of a silver mirror solution and a reducing solution immediately after mixing the two solutions, and then the silver mirror reaction (reduction ) To precipitate silver particles (Patent Document 2). Patent Document 3 repeats spraying a silver mirror reaction treatment agent (a metal salt solution containing silver nitrate and a reducing agent solution) and an activation treatment agent (mixed solution of tin chloride and palladium chloride) almost simultaneously several times. Thus, there is disclosed a method for reducing the manufacturing time by eliminating the trouble of spraying separately.

特許第4732147号公報Japanese Patent No. 4732147 特許第4140368号公報Japanese Patent No. 4140368 特許第4405143号公報Japanese Patent No. 4405143

しかし、これまでの銀鏡膜で、ミリ波透過性について検討されたものはない。本発明者の検討によれば、通常の方法で形成される銀鏡膜も、特許文献1,2の方法で形成される銀鏡膜も、ミリ波透過性を有していない。   However, no silver mirror film has been studied for millimeter wave transmission. According to the study of the present inventor, neither the silver mirror film formed by the ordinary method nor the silver mirror film formed by the methods of Patent Documents 1 and 2 has millimeter wave permeability.

よって、深い三次元形状の自動車用外装樹脂部品に均一な銀鏡膜を形成しても、光輝性は得られるが、ミリ波透過性は得られなかった。   Therefore, even if a uniform silver mirror film is formed on a deep three-dimensional automotive exterior resin part, the glittering property is obtained, but the millimeter wave permeability is not obtained.

そこで、本発明の課題は、光輝性とミリ波透過性とを両立して有する銀鏡膜及びそれを備えた加飾品を提供することにある。   Then, the subject of this invention is providing the silver mirror film which has both luster and millimeter wave transmissivity, and a decoration provided with the same.

本発明者は、当初、通常の銀鏡反応を短時間だけ行ったり、銀鏡膜形成液を銀鏡反応の弱いものにしたりして、いわゆるハーフグロス(半光沢)の銀鏡膜を形成する方法を検討した。しかし、それらの方法では、光輝性が十分あるものはミリ波透過性が全く得られず、ミリ波透過性が十分あるものは光輝性が全く不足する、という結果に終わり、課題の解決は困難であった。そこで、それらの方法とは全く異なる新規な方法を模索し、本発明に至った。   The present inventor initially studied a method for forming a so-called half-gloss silver mirror film by performing a normal silver mirror reaction only for a short time or by making a silver mirror film-forming solution weak in silver mirror reaction. . However, in those methods, those with sufficient glitter cannot achieve millimeter wave transmission at all, and those with sufficient millimeter wave transmission do not have sufficient glitter, resulting in difficulty in solving the problem. Met. Therefore, a new method completely different from those methods was sought and the present invention was reached.

(1)ミリ波透過性銀鏡膜の形成方法
基材に塩化スズ溶液を塗布してから水洗する工程Bと、
前記基材に銀鏡膜形成液を塗布し銀鏡膜の一部を形成してから水洗する工程D1と、
前記基材に酸溶液を塗布してから水洗する工程βと、
前記基材に銀鏡膜形成液を塗布し銀鏡膜のさらに一部を形成してから水洗する工程D2とを含み、
工程βから工程D2までを1回以上繰り返し行って銀鏡膜を完成させることを特徴とするミリ波透過性銀鏡膜の形成方法。
(1) Method of forming millimeter wave transmissive silver mirror film Step B of applying a tin chloride solution to a substrate and then washing with water;
A step D1 of applying a silver mirror film-forming liquid to the substrate to form part of the silver mirror film and then washing with water;
A step β of applying an acid solution to the substrate and then washing with water;
A step D2 of applying a silver mirror film-forming liquid to the substrate to form a part of the silver mirror film and then washing with water;
A method for forming a millimeter-wave permeable silver mirror film, wherein the process is repeated at least once from step β to complete a silver mirror film.

<作用>
後述する実施例1〜4のイメージ図である図1に示すように、
工程Bにより、基材の表面にスズ微粒子が付着する。
工程D1により、主に、スズ微粒子を起点として基材の表面に銀粒子が付着し、銀鏡膜の一部が形成される。銀鏡膜の一部であるから、銀粒子は小さく、互いに離間しているものが多い。また、スズ微粒子が無いところにも銀粒子が付着することがある。
工程βにより、工程D1(又はD2)で付着した銀粒子のうち付着力が弱い銀粒子(特にスズの微粒子が無いところに付着した銀粒子)が除去され、銀粒子の密度が低くなる。
工程D2により、工程D1で付着した銀粒子に被さるように銀が付着して、銀粒子が大きくなる。銀粒子どうしは、互いにくっつくものもあるが、依然として離間しているものが多い。また、スズ微粒子が無いところにも銀粒子が付着することがある。
工程βから工程D2までを1回以上繰り返し行うことで、光輝性とミリ波透過性とを有する銀鏡膜を完成させることができる。
<Action>
As shown in FIG. 1 which is an image diagram of Examples 1 to 4 described later,
By the process B, tin fine particles adhere to the surface of the substrate.
By the process D1, silver particles adhere mainly to the surface of the base material starting from tin fine particles, and a part of the silver mirror film is formed. Since it is a part of the silver mirror film, the silver particles are small and often separated from each other. In addition, silver particles may adhere even where there are no tin fine particles.
By the step β, silver particles having a weak adhesion (particularly, silver particles adhering to a place where there is no tin fine particle) among the silver particles adhering in the step D1 (or D2) are removed, and the density of the silver particles is lowered.
By the process D2, silver adheres so as to cover the silver particles adhered in the process D1, and the silver particles become large. Some silver particles stick to each other, but many are still separated. In addition, silver particles may adhere even where there are no tin fine particles.
By repeating step β to step D2 one or more times, a silver mirror film having glitter and millimeter wave transparency can be completed.

(2)ミリ波透過性銀鏡膜
L*a*b*表色系のL*値が65以上であり、表面抵抗値が1×1011Ω/□以上(好ましくは3×1011Ω/□以上)であり、ミリ波透過減衰量が2dB以下である銀鏡膜。
(2) Millimeter-wave permeable silver mirror membrane L * a * b * color system L * value is 65 or more, and surface resistance is 1 × 10 11 Ω / □ or more (preferably 3 × 10 11 Ω / □) A silver mirror film having a millimeter-wave transmission attenuation of 2 dB or less.

(3)ミリ波透過性加飾品
基材と、基材の表面に形成された、L*a*b*表色系のL*値が65以上であり、表面抵抗値が1×1011Ω/□以上(好ましくは3×1011Ω/□以上)であり、ミリ波透過減衰量が2dB以下である銀鏡膜とを含むミリ波透過性加飾品。
(3) Millimeter-wave transparent decorative product The L * value of the L * a * b * color system formed on the base material and the surface of the base material is 65 or more, and the surface resistance value is 1 × 10 11 Ω / □ or more (preferably 3 × 10 11 Ω / □ or higher), and the millimeter wave transmitting decorative article millimeter wave transmission attenuation includes silver mirror and film is 2dB less.

本発明によれば、光輝性とミリ波透過性とを両立して有する銀鏡膜及びそれを備えた加飾品を提供することができる。   ADVANTAGE OF THE INVENTION According to this invention, the silver mirror film which has both luster and millimeter wave transmissivity, and a decoration provided with the same can be provided.

図1は実施例1〜4のイメージ図である。FIG. 1 is an image diagram of the first to fourth embodiments. 図2は比較例1のイメージ図である。FIG. 2 is an image diagram of Comparative Example 1. 図3は実施例2の(a)は表面のSEM写真、(b)は断面のSEM写真である。3A is a SEM photograph of the surface of Example 2, and FIG. 3B is a SEM photograph of a cross section. 図4は実施例3の(a)は表面のSEM写真、(b)は断面のSEM写真である。4A is a SEM photograph of the surface of Example 3, and FIG. 4B is a SEM photograph of a cross section. 図5は比較例1の(a)は表面のSEM写真、(b)は断面のSEM写真である。5A is a SEM photograph of the surface of Comparative Example 1, and FIG. 5B is a SEM photograph of the cross section. 図6は比較例2の表面のSEM写真である。FIG. 6 is an SEM photograph of the surface of Comparative Example 2. 図7は比較例5の(a)は表面のSEM写真、(b)は断面のSEM写真である。7A is a SEM photograph of the surface of Comparative Example 5, and FIG. 7B is a SEM photograph of the cross section. 図8は比較例6の表面のSEM写真である。FIG. 8 is an SEM photograph of the surface of Comparative Example 6. 図9は比較例9の表面のSEM写真である。FIG. 9 is an SEM photograph of the surface of Comparative Example 9.

1.工程Bよりも前の工程
工程Bよりも前に、クッション性、平滑性、基材との密着性等を向上させるためのアンダーコート層を形成する工程(Aa)を行ってもよい。
また、工程Bよりも前に、濡れ性、基材との密着性等を向上させるためのプラズマ処理工程(Ab)を行ってもよい。
1. Step Before Step B Before Step B, a step (Aa) of forming an undercoat layer for improving cushioning properties, smoothness, adhesion to the substrate, and the like may be performed.
Moreover, you may perform the plasma treatment process (Ab) for improving wettability, adhesiveness with a base material, etc. before the process B. FIG.

2.工程Bと工程D1との間の工程C
工程Bと工程D1との間で、表面調整剤として変性シロキサンを塗布し浸透させる工程Cを行ってもよい。
2. Process C between Process B and Process D1
Between the process B and the process D1, you may perform the process C which apply | coats and osmose | permeates a modified siloxane as a surface conditioner.

3.工程β
工程Bの塩化スズ溶液が酸溶液である場合には、工程βに工程Bの塩化スズ溶液を用いてもよいし、工程βとして工程Bをそのまま行ってもよい。また、工程βは、塩化スズ酸溶液以外の酸溶液で行ってもよい。
3. Process β
When the tin chloride solution in step B is an acid solution, the tin chloride solution in step B may be used for step β, or step B may be performed as step β. In addition, step β may be performed with an acid solution other than the stannic chloride solution.

4.工程D1と工程D2
工程D1と工程D2は、銀鏡膜の一部を形成する点において共通するが、各工程の内容は、同一でもよいし、銀鏡膜形成液や塗布量等において相違してもよい。
4). Process D1 and Process D2
The process D1 and the process D2 are common in that a part of the silver mirror film is formed, but the content of each process may be the same or may be different in the silver mirror film forming liquid, the coating amount, and the like.

5.最後に行う工程D2の後の工程
最後に行う工程D2の後に、銀鏡膜の未反応物除去及び銀の安定化(変色防止)を目的として、銀鏡膜の腐食防止処理(工程E)を行ってもよい。
さらに、工程Eの後に、銀鏡膜の保護等を目的として、トップコート層を形成する工程Fを行ってもよい。
5. Step after the last step D2 After the last step D2, the silver mirror film is subjected to corrosion prevention treatment (step E) for the purpose of removing unreacted silver mirror film and stabilizing silver (preventing discoloration). Also good.
Furthermore, after the step E, a step F for forming a topcoat layer may be performed for the purpose of protecting the silver mirror film or the like.

6.基材
基材の材料としては、特に限定されないが、樹脂、ガラス、セラミックス、木材等を例示できる。
6). Base material The material of the base material is not particularly limited, and examples thereof include resin, glass, ceramics, and wood.

7.加飾品
加飾品(用途)としては、特に限定されないが、内側にミリ波レーダー装置が配置される自動車用外装樹脂部品が好適であり、ラジエータグリル、グリルカバー、サイドモール、バックパネル、バンパー、エンブレム等を例示できる。
7). Decorative products Decorative products (uses) are not particularly limited, but automotive exterior resin parts with millimeter-wave radar devices inside are suitable. Radiator grille, grill cover, side molding, back panel, bumper, emblem Etc. can be illustrated.

次の表1及び工程説明で述べる工程で行う方法により、基材とアンダーコート層と銀鏡膜とトップコート層とからなる加飾品の実施例1〜4及び比較例1〜9を作製した。基材には、ABS樹脂からなる100mm×100mm×厚さ3.0mmの板状の基材を使用した。   Examples 1 to 4 and Comparative Examples 1 to 9 of decorative articles made of a base material, an undercoat layer, a silver mirror film, and a top coat layer were produced by the method described in the following Table 1 and the process described in the process description. As the substrate, a plate-shaped substrate made of ABS resin and having a size of 100 mm × 100 mm × thickness 3.0 mm was used.

工程は、表1の欄に回数(多くは1)を記入した各工程を左から右へ(空欄を除いて)順に行い、但し、実施例1〜4では、銀鏡膜の一部を形成する工程D1の後に、工程βと工程Cと銀鏡膜の一部を形成する工程D2を、β→C→D2→β→C→D2→…のように複数回繰り返し行って銀鏡膜を完成させた。図1に実施例1〜4のイメージ図を示す。   The steps are performed in order from the left to the right (except for the blank) in which the number of times (mostly 1) is entered in the column of Table 1, but in Examples 1 to 4, a part of the silver mirror film is formed. After Step D1, Step D, Step C, and Step D2 for forming a part of the silver mirror film are repeated a plurality of times as β → C → D2 → β → C → D2 → ... to complete the silver mirror film. . FIG. 1 shows an image diagram of the first to fourth embodiments.

これに対し、比較例1は、1回の工程Daで金属光沢(フルグロス)の銀鏡膜を形成したものである。比較例2〜5は、1回の工程Dbで半光沢(ハーフグロス)の銀鏡膜を形成したものである。比較例6〜9は、1回の工程Dcで半光沢(ハーフグロス)の銀鏡膜を形成したものである。図2に比較例のイメージ図を示す。   On the other hand, in Comparative Example 1, a metallic gloss (full gloss) silver mirror film is formed in one step Da. In Comparative Examples 2 to 5, a semi-glossy (half gloss) silver mirror film is formed in one step Db. In Comparative Examples 6 to 9, a semi-glossy (half gloss) silver mirror film is formed in one step Dc. FIG. 2 shows an image diagram of the comparative example.

以下、各工程の詳細を説明する。なお、各工程における、材料、配合量、条件等は例示であり、適宜変更することができる。   Hereinafter, details of each process will be described. In addition, materials, blending amounts, conditions, and the like in each step are examples and can be changed as appropriate.

(工程Aa)アンダーコート(実施例4以外の全例)
基材に、アンダーコート液を塗布して、アンダーコート層を形成した。
アンダーコート液の材料として、次の主剤、硬化剤、希釈剤及びレベリング剤を使用した。
・主剤:表面化工研究所社の製品名「MFSアンダーコート主剤」製品番号「MFS−51」(アクリル樹脂40%、トルエン21.5%、キシレン(混合)16.5%、酢酸イソブチル22%の混合物)
・硬化剤:表面化工研究所社の製品名「MFSアンダーコート硬化剤21」製品番号「MFS−52AK21」(イソシアネートプレポリマー60%、酢酸エチル40%の混合物)
・希釈剤:表面化工研究所社の製品名「MFSアンダーコート希釈剤」製品番号「MFS−53」(トルエン3.0%、キシレン23.4%、エチルベンゼン12.6%、酢酸ブチル25〜30%、酢酸エチル5〜10%、メチルイソブチルケトン1〜5%、ジアセトンアルコール10〜15%、エチレングリコールモノエチルエーテルアセテート14.0%の混合物)
・レベリング剤:表面化工研究所社の製品名「MFSアンダーコートレベリング剤」製品番号「MFS−58」(ポリシロキサンとワキ防止剤2%、1,3,5−トリメチルベンゼン12%、1,2,4−トリメチルベンゼン28%、1,2,3−トリメチルベンゼン5%、エチルベンゼン24%、キシレン4%、ジイソブチルケトン15%、ブチルグリコレート3%の混合物)である。
(Process Aa) Undercoat (all examples other than Example 4)
An undercoat solution was applied to the substrate to form an undercoat layer.
The following main ingredients, curing agents, diluents and leveling agents were used as materials for the undercoat liquid.
・ Main agent: Product name “MFS undercoat main agent”, product number “MFS-51” of Surface Chemical Research Laboratory (acrylic resin 40%, toluene 21.5%, xylene (mixed) 16.5%, isobutyl acetate 22% blend)
・ Curing agent: Product name “MFS undercoat curing agent 21”, product number “MFS-52AK21” (mixture of 60% isocyanate prepolymer and 40% ethyl acetate)
・ Diluent: Product name “MFS undercoat diluent”, product number “MFS-53” (3.0% toluene, 23.4% xylene, 12.6% ethylbenzene, 25-30 butyl acetate) %, Ethyl acetate 5-10%, methyl isobutyl ketone 1-5%, diacetone alcohol 10-15%, ethylene glycol monoethyl ether acetate 14.0%)
Leveling agent: Product name “MFS undercoat leveling agent”, product number “MFS-58” (2% polysiloxane and anti-waxing agent, 12% 1,3,5-trimethylbenzene, 1, 2) , 4-trimethylbenzene 28%, 1,2,3-trimethylbenzene 5%, ethylbenzene 24%, xylene 4%, diisobutyl ketone 15%, butyl glycolate 3%).

これらの主剤:硬化剤:希釈剤:レベリング剤を100:20:60〜100:3〜5の質量比で混合し、スプレーガンにより基材の表面にスプレー塗布した。
塗布後、恒温槽にて65℃×30分保持して、硬化させるとともに乾燥させて、膜厚15〜25μmのアンダーコート層を形成した。
その後、イオン交換水で水洗した。
These main agents: curing agent: diluent: leveling agent were mixed at a mass ratio of 100: 20: 60 to 100: 3 to 5, and spray-coated on the surface of the substrate with a spray gun.
After application, the film was held at 65 ° C. for 30 minutes in a thermostatic bath, cured and dried to form an undercoat layer having a film thickness of 15 to 25 μm.
Then, it washed with ion-exchange water.

(工程Ab)プラズマ処理(実施例4のみ)
基材に、芝浦メカトロニクス社製スパッタリング装置i−millerIIにより、RF100W・O2プロセスガス50sccm・60秒の条件で、プラズマ処理した。
(Process Ab) Plasma treatment (only Example 4)
The substrate was subjected to plasma treatment under the conditions of RF 100 W · O 2 process gas 50 sccm · 60 seconds using a sputtering apparatus i-miller II manufactured by Shibaura Mechatronics.

(工程B)表面調整その1(全例)
銀析出促進及び付着性向上を目的として、表面調整液その1を吹き付けて、基材ないしアンダーコート層の表面調整をした。
表面調整液の材料として、次の表面調整剤a,bを使用した。
・表面調整剤a:表面化工研究所社の製品名「MFS表面調整剤A」製品番号「MFS−40A」(第一塩化錫〜10%、塩酸〜5%の水溶液)を、イオン交換水で15倍希釈した(例;表面調整剤A10mL、イオン交換水140mL)。
・表面調整剤b:表面化工研究所社の製品名「MFS表面調整剤B」製品番号「MFS−40B」(ナトリウム塩〜1%の水溶液)を、イオン交換水で15倍希釈した(例;表面調整剤B10mL、イオン交換水140mL)
(Process B) Surface adjustment 1 (all examples)
For the purpose of promoting silver precipitation and improving adhesion, the surface conditioning liquid 1 was sprayed to adjust the surface of the substrate or the undercoat layer.
As materials for the surface conditioning liquid, the following surface conditioning agents a and b were used.
-Surface modifier a: Product name "MFS surface modifier A" product number "MFS-40A" (aqueous solution of stannous chloride to 10%, hydrochloric acid to 5%) of surface chemical research institute with ion-exchanged water It was diluted 15 times (example: surface conditioning agent A 10 mL, ion exchange water 140 mL).
-Surface modifier b: Product name "MFS surface modifier B" product number "MFS-40B" (sodium salt to 1% aqueous solution) of Surface Chemical Laboratory Ltd. was diluted 15 times with ion-exchanged water (example; (Surface conditioner B10mL, ion-exchanged water 140mL)

これらの表面調整剤a:表面調整剤bを1:1の質量比で混合して表面調整液その1を作製し、スプレーガンによりアンダーコート層の表面に5秒間吹き付けた。
その後、10秒間静置して浸透させ、イオン交換水で水洗し、エアー乾燥させ、再びイオン交換水で水洗した。
These surface conditioner a: surface conditioner b were mixed at a mass ratio of 1: 1 to prepare surface conditioner No. 1 and sprayed on the surface of the undercoat layer with a spray gun for 5 seconds.
Thereafter, the mixture was allowed to stand for 10 seconds for permeation, washed with ion exchange water, air dried, and washed again with ion exchange water.

(工程C)表面調整その2(全例)
さらに付着性向上を目的として、表面調整液その2を吹き付けて、基材ないしアンダーコート層の表面調整をした。
表面調整液の材料として、次の表面調整剤cを使用した。
・表面調整剤c:表面化工研究所社の製品名「MFS表面調整剤C」製品番号「MFS−40C」(変性シロキサン)を、イオン交換水で50倍希釈した(例;表面調整剤C5mL、イオン交換水245mL)。
(Process C) Surface adjustment 2 (all examples)
Furthermore, for the purpose of improving adhesion, the surface adjustment liquid 2 was sprayed to adjust the surface of the substrate or the undercoat layer.
The following surface conditioning agent c was used as the material for the surface conditioning liquid.
-Surface modifier c: The product name "MFS surface modifier C" product number "MFS-40C" (modified siloxane) of Surface Chemical Laboratory Ltd. was diluted 50 times with ion-exchanged water (example: surface modifier C5mL, Ion-exchanged water (245 mL).

こうして作製した表面調整液その2を、スプレーガンによりアンダーコート層の表面に2秒間吹き付けた。
その後、10秒間静置して浸透させた。
The surface conditioning solution 2 prepared in this way was sprayed on the surface of the undercoat layer for 2 seconds with a spray gun.
Thereafter, it was allowed to stand for 10 seconds to allow penetration.

(工程D1)銀鏡膜(実施例1〜4のみ)
基材(アンダーコート又はプラズマ処理後)に、銀鏡膜形成液を塗布(銀鏡塗装)して、銀鏡膜の一部を形成した。
銀鏡膜形成液の材料として、次の銀主液、銀副液、及び還元液を使用した。
・銀主液:表面化工研究所社の製品名「MFS銀主液」、製品番号「MFS−10」(硝酸銀8.4%、水酸化アンモニウム〜5%の水溶液)
・銀副液:表面化工研究所社の製品名「MFS銀副液」、製品番号「MFS−20」(苛性ソーダ〜10%、水酸化アンモニウム〜5%の水溶液)
・還元液:表面化工研究所社の製品名「MFS還元剤」、製品番号「MFS−30」(多糖類5〜15%、塩酸〜5%の水溶液)
(Process D1) Silver mirror film (Examples 1 to 4 only)
A silver mirror film-forming solution was applied to the base material (after undercoating or plasma treatment) (silver mirror coating) to form a part of the silver mirror film.
The following silver main liquid, silver secondary liquid, and reducing liquid were used as materials for the silver mirror film forming liquid.
・ Silver main liquid: Product name “MFS silver main liquid”, product number “MFS-10” (Aqueous solution of silver nitrate 8.4%, ammonium hydroxide -5%)
・ Silver secondary liquid: Product name “MFS silver secondary liquid” of Surface Chemical Laboratory, product number “MFS-20” (aqueous solution of caustic soda to 10%, ammonium hydroxide to 5%)
・ Reducing liquid: Product name “MFS reducing agent” of Surface Chemical Laboratory, product number “MFS-30” (polysaccharide 5-15%, hydrochloric acid-5% aqueous solution)

銀主液をイオン交換水で15倍希釈し(例;銀主液5mL、水70mL)、銀副液をイオン交換水で15倍希釈し(例;銀副液5mL、水70mL)、これらの希釈液を混合して、銀鏡液を作製した。
還元液をイオン交換水で30倍希釈(例;還元液5mL、水145mL)し、もってアルデヒドを0.085〜0.258モル/L含むものとなった還元液(希釈液)を作製した。
The silver main solution is diluted 15 times with ion-exchanged water (eg; silver main solution 5 mL, water 70 mL), and the silver sub-solution is diluted 15 times with ion-exchanged water (eg; silver auxiliary solution 5 mL, water 70 mL). The diluted solution was mixed to prepare a silver mirror solution.
The reducing solution was diluted 30 times with ion-exchanged water (eg, reducing solution 5 mL, water 145 mL) to prepare a reducing solution (diluted solution) containing 0.085 to 0.258 mol / L of aldehyde.

これらの銀鏡液と還元液とを二頭スプレーガンにより同時にスプレーし、空中で混合させて、アンダーコートの表面に塗布した。スプレー塗布時間は、実施例1,4では3秒、実施例2では4秒、実施例3では5秒とした。
アンダーコート上で、次の銀鏡反応式により銀粒子が析出し、銀鏡膜が形成された。
R−CHO+2[Ag(NH32++2OH-
→ R−COOH+2Ag↓+4NH3+H2
ここで、R−CHOは、還元液(多糖類が塩酸で加水分解して単糖類となっている。)に含まれるアルデヒドである。
[Ag(NH32+は、銀鏡液に含まれるアンモニア性硝酸銀である。
その後、イオン交換水で水洗した。
These silver mirror solution and reducing solution were sprayed simultaneously with a two-head spray gun, mixed in the air, and applied to the surface of the undercoat. The spray application time was 3 seconds in Examples 1 and 4, 4 seconds in Example 2, and 5 seconds in Example 3.
On the undercoat, silver particles were precipitated by the following silver mirror reaction formula to form a silver mirror film.
R—CHO + 2 [Ag (NH 3 ) 2 ] + + 2OH
→ R-COOH + 2Ag ↓ + 4NH 3 + H 2 O
Here, R-CHO is an aldehyde contained in a reducing solution (polysaccharide is hydrolyzed with hydrochloric acid to form a monosaccharide).
[Ag (NH 3 ) 2 ] + is ammoniacal silver nitrate contained in the silver mirror solution.
Then, it washed with ion-exchange water.

(工程β)付着力が弱い銀粒子の除去(実施例1〜4のみ)
工程βは、付着力が弱い銀粒子を除去するために、前記基材に酸溶液を塗布してから水洗する工程である。
本実施例では、上記工程Bの表面調整剤aが酸溶液であることから、工程Bをそのまま工程βとして行った。
(Step β) Removal of silver particles having weak adhesion (only Examples 1 to 4)
Step β is a step of applying an acid solution to the substrate and then washing with water in order to remove silver particles having weak adhesion.
In this example, since the surface conditioner a in Step B was an acid solution, Step B was directly performed as Step β.

(工程D2)銀鏡膜(実施例1〜4のみ)
上記工程D1と同一内容の工程D2を行い、銀鏡膜の一部を形成した。
(Process D2) Silver mirror film (Examples 1 to 4 only)
Step D2 having the same contents as step D1 was performed to form a part of the silver mirror film.

(工程Da)フルグロス銀鏡膜(比較例1のみ)
上記工程D1と同一の銀鏡液と還元液とを二頭スプレーガンにより同時にスプレーし、空中で混合させて、アンダーコートの表面に30秒塗布した。
アンダーコート上で、上記工程D1で記した銀鏡反応式により銀粒子が析出し、フルグロス銀鏡膜(一般的な光輝性の銀鏡膜)が形成された。
その後、イオン交換水で水洗した。
(Process Da) Full gloss silver mirror film (Comparative Example 1 only)
The same silver mirror solution and reducing solution as in Step D1 were simultaneously sprayed with a two-head spray gun, mixed in the air, and applied to the surface of the undercoat for 30 seconds.
On the undercoat, silver particles were precipitated by the silver mirror reaction formula described in the above step D1, and a full-gloss silver mirror film (a general bright silver mirror film) was formed.
Then, it washed with ion-exchange water.

(工程Db)ハーフグロス銀鏡膜(比較例2〜5のみ)
銀鏡膜形成液の材料として、次の銀主液、銀副液、及び還元液を使用した。
・銀主液:表面化工研究所社の製品名「MFS銀主液L」、製品番号「MFS−10L」
・銀副液:表面化工研究所社の製品名「MFS銀副液L」、製品番号「MFS−20L」
・還元液:表面化工研究所社の製品名「MFS還元剤L」、製品番号「MFS−30L」
(Process Db) Half gloss silver mirror film (only Comparative Examples 2-5)
The following silver main liquid, silver secondary liquid, and reducing liquid were used as materials for the silver mirror film forming liquid.
・ Silver main liquid: Product name “MFS silver main liquid L”, product number “MFS-10L” of Surface Chemical Laboratory, Inc.
・ Silver secondary liquid: Product name “MFS Silver secondary liquid L” of Surface Chemical Laboratory, product number “MFS-20L”
・ Reducing solution: Product name “MFS reducing agent L”, product number “MFS-30L” of Surface Chemical Engineering Laboratory Co., Ltd.

銀主液をイオン交換水で15倍希釈し(例;銀主液5mL、水70mL)、銀副液をイオン交換水で15倍希釈し(例;銀副液5mL、水70mL)、これらの希釈液を混合して、銀鏡液を作製した。
還元液をイオン交換水で30倍希釈(例;還元液5mL、水145mL)し、もってアルデヒドを0.085〜0.258モル/L含むものとなった還元液(希釈液)を作製した。
The silver main solution is diluted 15 times with ion-exchanged water (eg; silver main solution 5 mL, water 70 mL), and the silver sub-solution is diluted 15 times with ion-exchanged water (eg; silver auxiliary solution 5 mL, water 70 mL). The diluted solution was mixed to prepare a silver mirror solution.
The reducing solution was diluted 30 times with ion-exchanged water (eg, reducing solution 5 mL, water 145 mL) to prepare a reducing solution (diluted solution) containing 0.085 to 0.258 mol / L of aldehyde.

これらの銀鏡液と還元液とを二頭スプレーガンにより同時にスプレーし、空中で混合させて、アンダーコートの表面に塗布した。スプレー塗布時間は、比較例2では10秒、比較例3では8秒、比較例4では6秒、比較例5では4秒とした。
アンダーコート上で、上記工程D1で記した銀鏡反応式により銀粒子が析出し、ハーフグロスの銀鏡膜が形成された。
その後、イオン交換水で水洗した。
These silver mirror solution and reducing solution were sprayed simultaneously with a two-head spray gun, mixed in the air, and applied to the surface of the undercoat. The spray application time was 10 seconds in Comparative Example 2, 8 seconds in Comparative Example 3, 6 seconds in Comparative Example 4, and 4 seconds in Comparative Example 5.
On the undercoat, silver particles were precipitated by the silver mirror reaction formula described in the above step D1, and a half gloss silver mirror film was formed.
Then, it washed with ion-exchange water.

(工程Dc)ハーフグロス銀鏡膜(比較例6〜9のみ)
銀鏡膜形成液の材料として、次の銀主液、銀副液、及び還元液を使用した。
・銀主液:表面化工研究所社の製品名「MFS銀主液#50」、製品番号「MFS−10#50」
・銀副液:表面化工研究所社の製品名「MFS銀副液#50」、製品番号「MFS−20#50」
・還元液:表面化工研究所社の製品名「MFS還元剤#50」、製品番号「MFS−30#50」
(Process Dc) Half gloss silver mirror film (only Comparative Examples 6-9)
The following silver main liquid, silver secondary liquid, and reducing liquid were used as materials for the silver mirror film forming liquid.
・ Silver main liquid: Product name “MFS silver main liquid # 50” of Surface Chemical Laboratory, product number “MFS-10 # 50”
・ Silver secondary liquid: Product name “MFS silver secondary liquid # 50” of Surface Chemical Laboratory, product number “MFS-20 # 50”
・ Reducing liquid: Product name “MFS reducing agent # 50” of Surface Chemical Laboratory, product number “MFS-30 # 50”

銀主液をイオン交換水で15倍希釈し(例;銀主液5mL、水70mL)、銀副液をイオン交換水で15倍希釈し(例;銀副液5mL、水70mL)、これらの希釈液を混合して、銀鏡液を作製した。
還元液をイオン交換水で30倍希釈(例;還元液5mL、水145mL)し、もってアルデヒドを0.085〜0.258モル/L含むものとなった還元液(希釈液)を作製した。
The silver main solution is diluted 15 times with ion-exchanged water (eg; silver main solution 5 mL, water 70 mL), and the silver sub-solution is diluted 15 times with ion-exchanged water (eg; silver auxiliary solution 5 mL, water 70 mL). The diluted solution was mixed to prepare a silver mirror solution.
The reducing solution was diluted 30 times with ion-exchanged water (eg, reducing solution 5 mL, water 145 mL) to prepare a reducing solution (diluted solution) containing 0.085 to 0.258 mol / L of aldehyde.

これらの銀鏡液と還元液とを二頭スプレーガンにより同時にスプレーし、空中で混合させて、アンダーコートの表面に塗布した。スプレー塗布時間は、比較例6では30秒、比較例7では15秒、比較例8では10秒、比較例9では6秒とした。
アンダーコート上で、上記工程D1で記した銀鏡反応式により銀粒子が析出し、ハーフグロスの銀鏡膜が形成された。
その後、イオン交換水で水洗した。
These silver mirror solution and reducing solution were sprayed simultaneously with a two-head spray gun, mixed in the air, and applied to the surface of the undercoat. The spray application time was 30 seconds for Comparative Example 6, 15 seconds for Comparative Example 7, 10 seconds for Comparative Example 8, and 6 seconds for Comparative Example 9.
On the undercoat, silver particles were precipitated by the silver mirror reaction formula described in the above step D1, and a half gloss silver mirror film was formed.
Then, it washed with ion-exchange water.

(工程E)腐食防止処理(全例)
銀鏡膜の未反応物除去及び銀の安定化(変色防止)を目的として、腐食防止液を吹き付けて、銀鏡膜の腐食防止処理を行った。
腐食防止液の材料として、次の腐食防止剤を使用した。
・腐食防止剤:表面化工研究所社の製品名「Ag腐食防止剤#50」、製品番号「MFS−50」(チオ硫酸ナトリウム1〜7%、酢酸<1%、硫酸アルミニウム<1%の混合水溶液)である。
(Process E) Corrosion prevention treatment (all examples)
For the purpose of removing unreacted substances from the silver mirror film and stabilizing silver (preventing discoloration), the anticorrosion solution was sprayed to carry out corrosion prevention treatment of the silver mirror film.
The following corrosion inhibitors were used as materials for the corrosion prevention liquid.
Corrosion inhibitor: Product name “Ag corrosion inhibitor # 50” of Surface Chemical Laboratory, product number “MFS-50” (mixture of sodium thiosulfate 1-7%, acetic acid <1%, aluminum sulfate <1% Aqueous solution).

この腐食防止剤をイオン交換水で50倍希釈(例;腐食防止剤10mL、水490mL)して腐食防止液を作製し、スプレーガンにより銀鏡膜の表面に吹き付けた。
腐食防止液で濡れている状態で、イオン交換水で水洗し、腐食防止液の余剰分を洗い流した。
恒温槽にて70℃×60分保持して乾燥させた。
This corrosion inhibitor was diluted 50 times with ion-exchanged water (eg; 10 mL of corrosion inhibitor, 490 mL of water) to prepare a corrosion inhibitor, and sprayed onto the surface of the silver mirror film with a spray gun.
While wet with the corrosion prevention liquid, it was washed with ion-exchanged water to wash away the excess of the corrosion prevention liquid.
It was kept at 70 ° C. for 60 minutes in a constant temperature bath and dried.

(工程F)トップコート層(全例)
腐食防止処理後の銀鏡膜に、銀鏡膜の保護等を目的として、トップコート液を塗布して、トップコートを施した。
トップコート液の材料として、次の主剤、硬化剤及び希釈剤を使用した。
・主剤:表面化工研究所社の製品名「MFSトップコートSpecial主剤(Clear)」製品番号「MFS−61−2」(アクリル樹脂33%、キシレン(混合)25.1%、エチルベンゼン25.1%、n−ブチルアルコール10〜15%、イソブチルアルコール5〜10%の混合物)である。
・硬化剤:表面化工研究所社の製品名「MFSトップコートSpecial硬化剤」製品番号「MFS−62−2」(キシレン10.7%、エチルベンゼン10.7%、イソプロピルアルコール25〜30%、n−ブチルアルコール1〜5%の混合物)である。
・希釈剤:表面化工研究所社の製品名「MFSトップコートSpecial希釈剤」製品番号「MFS−63−2」(トルエン30%、キシレン25%、エチルベンゼン25%、メトキシブチルアセテート5〜10%、プロピレングリコールモノメチルエーテルアセテート10〜15%の混合物)である。
(Process F) Topcoat layer (all examples)
A top coat solution was applied to the silver mirror film after the corrosion prevention treatment for the purpose of protecting the silver mirror film and the like, and a top coat was applied.
The following main agent, curing agent and diluent were used as the material for the topcoat solution.
・ Main agent: Product name of “MFS Topcoat Special Main Agent (Clear)”, product number “MFS-61-2” (33% acrylic resin, xylene (mixed) 25.1%, ethylbenzene 25.1% , N-butyl alcohol 10-15%, isobutyl alcohol 5-10% mixture).
・ Curing agent: Product name “MFS Topcoat Special Curing Agent” product number “MFS-62-2” (10.7% xylene, 10.7% ethylbenzene, 25-30% isopropyl alcohol, n -A mixture of 1 to 5% of butyl alcohol).
-Diluent: Product name "MFS Topcoat Special Diluent" product number "MFS-63-2" (Surface 30%, Xylene 25%, Ethylbenzene 25%, Methoxybutyl acetate 5-10% A mixture of 10-15% propylene glycol monomethyl ether acetate).

これらの主剤:硬化剤:希釈剤を100:20:60〜80の質量比で混合し、スプレーガンにより銀鏡膜の表面にスプレー塗布した。
塗布後、恒温槽にて65℃×30分保持して、硬化させるとともに乾燥させ、膜厚15〜25μmのトップコート層を形成した。
These main agents: curing agents: diluents were mixed at a mass ratio of 100: 20: 60 to 80 and spray-coated on the surface of the silver mirror film with a spray gun.
After the application, it was held at 65 ° C. for 30 minutes in a thermostatic bath, cured and dried to form a topcoat layer having a film thickness of 15 to 25 μm.

以上のようにして実施例1〜4及び比較例1〜9を作製したが、(工程E)の腐食防止処理後に(トップコート層形成を行う前に)、次の測定及び観察を行った。   Examples 1 to 4 and Comparative Examples 1 to 9 were prepared as described above, and the following measurements and observations were performed after the corrosion prevention treatment in (Step E) (before the top coat layer was formed).

<1>L*a*b*色度
L*a*b*色度を、コニカミノルタ社製測色計CM−700dを用いてSCI方式にて測定した。測定結果を表1に示す。
<1> L * a * b * chromaticity L * a * b * chromaticity was measured by a SCI method using a colorimeter CM-700d manufactured by Konica Minolta. The measurement results are shown in Table 1.

<2>表面抵抗値
銀鏡膜の表面抵抗値を、1.0×104Ω/□以下の場合はJIS−K7194に準拠し4端子4深針法により、1.0×104Ω/□以上の場合はJIS−K6911に準拠し2重リングプローブ法により、それぞれ測定した。測定結果を表1に示す。
<2> surface of the surface resistance value of the silver mirror film, by 1.0 × 10 4 Ω / □ or less 4 terminal 4 depth probe method conforming to JIS-K7194 in the case of, 1.0 × 10 4 Ω / □ In the above cases, each was measured by the double ring probe method in accordance with JIS-K6911. The measurement results are shown in Table 1.

<3>ミリ波透過減衰量
ミリ波透過減衰量は、電磁波吸収測定装置(自由空間法、財団法人ファインセラミックスセンター所有)を用いて測定した。
具体的には、室温において、Wバンド(76.575GHz)の電磁波を発信器から入射角0°にて試料に入射させ、試料をはさんで発信器と対峙する受信器で試料を透過した電磁波を受信して、往復経路でのミリ波透過減衰量を測定した。参照値となる基材によるミリ波透過減衰量を差し引いて、銀鏡膜によるミリ波透過減衰量を算出した。その算出結果を1に示す。
<3> Millimeter-wave transmission attenuation The millimeter-wave transmission attenuation was measured using an electromagnetic wave absorption measuring device (free space method, owned by Fine Ceramics Center).
Specifically, at room temperature, W-band (76.575 GHz) electromagnetic waves are incident on the sample at an incident angle of 0 ° from the transmitter, and the electromagnetic waves are transmitted through the sample by a receiver facing the transmitter across the sample. The millimeter wave transmission attenuation in the round trip path was measured. The millimeter wave transmission attenuation by the silver mirror film was calculated by subtracting the millimeter wave transmission attenuation by the base material as the reference value. The calculation result is shown in 1.

<4>SEM観察
SEM(走査型電子顕微鏡)により、表1に図番を記載したものについて、銀鏡膜の表面観察と断面観察をした。そのSEM写真を図3〜図9に示す。
<4> SEM Observation With the SEM (scanning electron microscope), the surface observation and the cross-sectional observation of the silver mirror film were performed on those described in Table 1. The SEM photographs are shown in FIGS.

以上の測定結果のとおり、実施例1〜4は、L*a*b*表色系のL*値が65以上であり、表面抵抗値が1×1011Ω/□以上であり、ミリ波透過減衰量が2dB以下であり、光輝性とミリ波透過性とを両立して有している。これは、上記<作用>の項で図1を示して説明した作用によるものと考えられる。なお、図1は、紙面の都合で、工程βと工程D2の繰返しを2回分だけ示している。 As shown in the above measurement results, in Examples 1 to 4, the L * value of the L * a * b * color system is 65 or more, the surface resistance value is 1 × 10 11 Ω / □ or more, and millimeter waves The transmission attenuation is 2 dB or less, and it has both glitter and millimeter wave transparency. This is considered to be due to the action described with reference to FIG. FIG. 1 shows the repetition of the process β and the process D2 only twice for the convenience of space.

これに対して、比較例1(フルグロス)は、光輝性は有しているが、表面抵抗値が低く、ミリ波透過性は有していない。これは、図2に示すように、工程Daを1回で長時間行うことにより、銀粒子が互いにくっついて積み重なるためであると考えられる。また、比較例2〜9(ハーフグロス)にも、光輝性とミリ波透過性とを両立したものはない。   On the other hand, Comparative Example 1 (full gloss) has glitter, but has a low surface resistance and does not have millimeter wave permeability. As shown in FIG. 2, it is considered that the silver particles adhere to each other and are stacked when the process Da is performed once for a long time. Further, none of Comparative Examples 2 to 9 (half gloss) has both glitter and millimeter wave transparency.

なお、本発明は前記実施例に限定されるものではなく、発明の趣旨から逸脱しない範囲で適宜変更して具体化することができる。   In addition, this invention is not limited to the said Example, In the range which does not deviate from the meaning of invention, it can change suitably and can be actualized.

Claims (3)

基材に塩化スズ溶液を塗布してから水洗する工程Bと、
前記基材に銀鏡膜形成液を塗布し銀鏡膜の一部を形成してから水洗する工程D1と、
前記基材に酸溶液を塗布してから水洗する工程βと、
前記基材に銀鏡膜形成液を塗布し銀鏡膜のさらに一部を形成してから水洗する工程D2とを含み、
工程βから工程D2までを1回以上繰り返し行って銀鏡膜を完成させることを特徴とするミリ波透過性銀鏡膜の形成方法。
Step B in which a tin chloride solution is applied to a substrate and then washed with water;
A step D1 of applying a silver mirror film-forming liquid to the substrate to form part of the silver mirror film and then washing with water;
A step β of applying an acid solution to the substrate and then washing with water;
A step D2 of applying a silver mirror film-forming liquid to the substrate to form a part of the silver mirror film and then washing with water;
A method of forming a millimeter-wave permeable silver mirror film, wherein the process is repeated at least once from step β to complete a silver mirror film.
L*a*b*表色系のL*値が65以上であり、表面抵抗値が1×1011Ω/□以上であり、ミリ波透過減衰量が2dB以下であるミリ波透過性銀鏡膜。 L * a * b * color system L * value is 65 or more, surface resistance value is 1 × 10 11 Ω / □ or more, and millimeter wave transmission silver mirror film whose millimeter wave transmission attenuation is 2 dB or less . 基材と、基材の表面に形成された、L*a*b*表色系のL*値が65以上であり、表面抵抗値が1×1011Ω/□以上であり、ミリ波透過減衰量が2dB以下である銀鏡膜とを含むミリ波透過性加飾品。 A substrate, formed on the surface of the substrate, L * a * b * L * value of color system is not less 65 or more, the surface resistance of 1 × 10 11 Ω / □ or more, the millimeter wave transmission A millimeter-wave transparent decorative article including a silver mirror film having an attenuation of 2 dB or less.
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