JP2019167587A - Aerosol quantitative feeder and aerosol deposition apparatus - Google Patents

Abstract

To provide an aerosol quantitative feeder capable of providing an excellent deposition film by eliminating a high-concentrated (aggregation) aerosol and uniformizing concentration dispersion of an aerosol.SOLUTION: An aerosol quantitative feeder 1 is arranged between an aerosolizing part 20 and a film deposition part 40, and includes a buffer space part 30 for uniformizing a concentration dispersion of an aerosol by giving a turbulence to an aerosol flow, an aerosol inlet 31 for flowing an aerosol into the buffer space part 30, an aerosol outlet 32 for flowing the aerosol out from the buffer space part 30, a cross-sectional area of the buffer space part 30 being set to larger than a cross-sectional area of the aerosol inlet 31 and the aerosol outlet 32.SELECTED DRAWING: Figure 2

Description

  The present invention relates to an aerosol fixed amount supply device that stabilizes an aerosol concentration, and an aerosol deposition apparatus that includes the aerosol fixed amount supply device.

  As a film forming method for forming a thin film on a substrate at room temperature, an aerosol deposition method is known. In the aerosol deposition method, raw material particles such as ceramic powder, which has been aerosolized by mixing with a carrier gas, are introduced into a decompressed film formation chamber, and the pressure difference between the internal pressure of the film formation chamber and the internal pressure of the injection nozzle. Based on the above, it is a film forming technique in which raw material particles collide and adhere to a substrate at high speed from an injection nozzle.

  Various inventions related to a film forming technique using the aerosol deposition method have been proposed. For example, Patent Document 1 discloses an accommodation mechanism that accommodates fine particles, an aerosolization mechanism that forms fine particles by dispersing the fine particles in a gas, a split supply mechanism that supplies fine particles from the accommodation mechanism to the aerosolization mechanism, and an aerosol. There has been proposed a composite structure forming system including a gas supply mechanism that supplies gas to the gasification mechanism, and a discharge port that injects aerosol toward the substrate. According to the technique of Patent Document 1, since the divided supply mechanism supplies fine particles divided into a plurality of groups, it is possible to stably supply a fixed amount of powder without forming an aggregate or the like.

JP 2006-233334 A

  When the powder supply becomes unstable, there is a problem that high concentration (aggregation) aerosol is mixed and dispersion of the aerosol concentration becomes non-uniform, resulting in film formation defects such as non-uniform film thickness and film chipping. .

  In view of the above circumstances, the present invention provides an aerosol fixed amount supply device and an aerosol deposition device that can remove high-concentration (aggregation) aerosol, uniformize the aerosol concentration dispersion, and obtain a good film formation. Is one of the purposes.

  One aspect of the aerosol fixed amount supply device according to the present invention is provided between the aerosol supply unit and the film forming unit, and provides a buffer space unit for imparting turbulent flow to the aerosol flow and uniformizing the aerosol concentration dispersion, An aerosol inlet for allowing aerosol to flow into the buffer space and an aerosol outlet for allowing aerosol to flow out of the buffer space, wherein the sectional area of the buffer space is larger than the sectional area of the aerosol inlet and the aerosol outlet. Is set.

  In the configuration of the aerosol fixed amount supply device, the aerosol inflow direction of the aerosol inlet and the aerosol outflow direction of the aerosol outlet are in the direction of 0 to 80 degrees or 0 to -80 degrees, and the inflow direction of the aerosol inlet and the aerosol outlet The outflow directions are set so as not to intersect within the buffer space.

  The buffer space part preferably includes a stirring device for generating a turbulent flow in the aerosol flow.

  Alternatively, it is preferable that a baffle plate serving as an aerosol flow barrier is interposed between the aerosol inlet and the aerosol outlet in the buffer space.

  Further, the aerosol inlet and the aerosol outlet are opposed to the buffer space portion, and a baffle plate serving as an aerosol flow barrier is interposed between the aerosol inlet and the aerosol outlet in the buffer space portion. It is preferable.

  Another aspect of the aerosol fixed amount supply device according to the present invention is configured integrally with the aerosol supply unit, and provides a buffer space for uniforming the aerosol concentration dispersion by giving a turbulent flow to the aerosol flow, and in the buffer space A gas inlet through which a carrier gas flows in, an aerosol outlet through which aerosol flows out from the buffer space, and a powder supply unit provided on the buffer space with a partition wall having a powder inlet, A cross-sectional area of the buffer space is set to be larger than a cross-sectional area of the gas inlet and the aerosol outlet, the gas inlet and the aerosol outlet are opposed to the buffer space, and the gas inlet in the buffer space A baffle plate serving as a barrier for aerosol flow is interposed between the aerosol outlet and the aerosol outlet.

  One aspect of the aerosol deposition apparatus according to the present invention includes the aerosol quantitative supply apparatus described above.

  According to the present invention, high-concentration (aggregation) aerosol can be removed to uniformize the concentration distribution of the aerosol, and good film formation can be obtained.

It is a schematic diagram of the aerosol deposition apparatus provided with the aerosol fixed amount supply apparatus of 1st Embodiment. It is a schematic diagram of the aerosol fixed amount supply apparatus of 1st Embodiment. It is a schematic diagram of the deformation | transformation form of the aerosol fixed amount supply apparatus of 1st Embodiment. It is a schematic diagram of the aerosol fixed amount supply apparatus of 2nd Embodiment. It is a schematic diagram of the aerosol fixed amount supply apparatus of 3rd Embodiment. It is a schematic diagram of the aerosol fixed amount supply apparatus of 4th Embodiment. It is a schematic diagram of the aerosol fixed amount supply apparatus of a 1st comparison form. It is a schematic diagram of the aerosol fixed amount supply apparatus of the 2nd comparative form. It is a schematic diagram of the aerosol fixed amount supply apparatus of the 3rd comparative form. It is a schematic diagram of the aerosol fixed amount supply apparatus of the 4th comparison form.

  Hereinafter, first to fourth embodiments of the present invention will be described with reference to the accompanying drawings. In addition, in each figure, what attached | subjected the same code | symbol has the same or similar structure.

[First Embodiment]
(Outline of aerosol deposition equipment)
With reference to FIG. 1, the outline | summary of the aerosol deposition apparatus 100 provided with the aerosol fixed amount supply apparatus 1 which concerns on 1st Embodiment of this invention is demonstrated. FIG. 1 is a schematic diagram of an aerosol deposition apparatus provided with the aerosol fixed amount supply apparatus of the first embodiment.

  The aerosol deposition apparatus 100 is a film forming apparatus that forms a thin film on a substrate 42 by an aerosol deposition method (AD method). The aerosol deposition apparatus 100 includes an aerosol supply unit (aerosolization unit) 20, an aerosol fixed amount supply device 1, and a film forming unit 40. Hereinafter, each component will be described.

  The aerosol supply unit 20 generates aerosol by dispersing raw material particles in a carrier gas. The aerosol supply unit 20 is connected by a gas cylinder 21 that is a carrier gas supply source and a gas supply path 22. A supply pipe 23 at the tip of the gas supply path 22 is disposed in the aerosol supply unit 20. A discharge pipe 24 for discharging the aerosol is disposed in the aerosol supply unit 20. An aerosol supply path 25 is connected to the discharge pipe 24. As an aerosol carrier gas, an inert gas such as argon, nitrogen or helium is used. The flow rate of the carrier gas is adjusted by a mass flow controller 26 provided in the gas supply path 22.

  The aerosol supply unit 20 is loaded with raw material particles such as ceramic powder. The raw material particles are mixed and dispersed in the carrier gas supplied from the gas cylinder 21 in the aerosol supply unit 20 to generate an aerosol. The raw material particles are preferably fine particles having a size (average particle diameter) of about 0.1 μm to 1.0 μm. The average particle size can be measured by a laser diffraction particle size distribution measuring device. In addition to the small-sized raw material particles (fine particles), the raw material particles include aggregates of small-sized raw material particles (fine particles) and large-sized large-sized raw material particles. (Coarse particles) are included.

  The aerosol fixed amount supply device 1 is connected to an aerosol supply path 25 of the aerosol supply unit 20. The aerosol fixed amount supply device 1 includes a buffer space 30 for imparting turbulent flow to the aerosol flow and uniforming the aerosol concentration dispersion. The aerosol supply path 25 is connected to the aerosol inflow pipe 35 of the buffer space 30. The buffer space 30 stabilizes the aerosol concentration and causes the outflow pipe 36 to flow out. The details of the aerosol fixed amount supply device 1 will be described later.

  The film forming unit 40 is connected to the outflow pipe 36 of the buffer space 30. The film forming unit 40 includes a pressure-reduced film forming chamber 41, a substrate 42 provided in the film forming chamber 41, and an injection nozzle 43 provided so as to face the substrate 42. The aerosol deposition apparatus 100 guides raw material particles such as ceramic powder, which is aerosolized by mixing with a carrier gas, into the decompressed film forming chamber 41 and causes the spray nozzle 43 to collide and adhere to the substrate 42 at high speed. As a result, a thin film of raw material particles is formed on the substrate 42.

  A holder 44 for holding the base material 42 is provided in the film forming chamber 41. The holder 44 is movable and / or rotatable in a horizontal plane while the base material 42 is held by the driving device 45. The holder 44 can also be moved in the direction perpendicular to the horizontal plane by the driving device 45. A vacuum pump 46 is connected to the film forming chamber 41, and the inside of the film forming chamber 41 is kept under reduced pressure by the vacuum pump 46.

  The injection nozzle 43 is disposed in the film forming chamber 41 so that the injection port faces the surface of the base material 42. The injection nozzle 43 is connected to the outflow pipe 36 of the buffer space 30 via the aerosol lead-out path 47, and the aerosol is supplied from the aerosol fixed amount supply device 1 by the carrier gas flow and the suction of the vacuum pump 46. To be supplied. Then, the aerosol is injected from the injection nozzle 43 onto the surface of the base material 42 at a subsonic to supersonic injection speed. The spraying speed of the aerosol is adjusted by the supply pressure of the carrier gas from the gas cylinder 21 and the degree of decompression in the film forming chamber 41.

(Configuration of aerosol fixed amount supply device)
Next, with reference to FIG. 2, the structure of the aerosol fixed amount supply apparatus 1 which concerns on 1st Embodiment of this invention is demonstrated. FIG. 2 is a schematic diagram of the aerosol fixed amount supply device of the first embodiment.

  As shown in FIG. 2, the aerosol fixed amount supply device 1 according to the first embodiment includes a buffer space 30, an aerosol inlet 31, and an aerosol outlet 32. Hereinafter, each component will be described.

  The buffer space portion 30 is a space portion for imparting turbulent flow to the aerosol flow to make the aerosol concentration dispersion uniform. The buffer space part 30 is provided between the aerosol supply part (aerosolization part) 20 and the film forming part 40. The buffer space portion 30 of the present embodiment has a hollow rectangular parallelepiped shape. The shape of the buffer space 30 is not limited to the illustrated shape as long as the buffer space 30 has a volume sufficient to impart turbulent flow to the aerosol flow and make the aerosol concentration dispersion uniform.

  The aerosol inlet 31 is an inlet for allowing aerosol to flow into the buffer space 30. Connected to the aerosol inlet 31 is an inflow pipe 35 that communicates the aerosol-generating part 20 and the buffer space part 30.

  The aerosol outlet 32 is an outlet for allowing the aerosol to flow in from the buffer space 30. An outflow pipe 36 that connects the buffer space 30 and the film forming unit 40 is connected to the aerosol outlet 32.

  The sectional area A of the buffer space 30 is set larger than the sectional area B of the aerosol inlet 31 and the sectional area B of the aerosol outlet 32 described later. Here, the cross-sectional area A of the buffer space 30 means an area of a cross section perpendicular to the aerosol inflow direction IF of the aerosol inlet 31 and the aerosol outflow direction OF of the aerosol outlet 32. The cross-sectional area B of the aerosol inlet 31 refers to the opening cross-sectional area of the aerosol inlet 31. Furthermore, the sectional area C of the aerosol outlet 32 refers to the opening sectional area of the aerosol outlet 32.

  The angle between the aerosol inlet 31 and the aerosol outlet 32 is 0 to 80 degrees or 0 to −80 degrees, and the inflow direction IF of the aerosol inlet 31 and the outflow direction OF of the aerosol outlet 32 intersect in the buffer space 30. It is set not to. In the form illustrated in FIG. 2, the angle between the aerosol inlet 31 and the aerosol outlet 32 is 0 degree, and the inflow direction of the aerosol inlet 31 and the outflow direction of the aerosol outlet 32 do not intersect in the buffer space 30. Has been. In addition, the aerosol inflow direction IF of the aerosol inlet 31 and the aerosol outflow direction OF of the aerosol outlet 32 are set so that the directions are different by 180 degrees. That is, in the first embodiment, the aerosol inlet 31 and the aerosol outlet 32 are opened in the upper wall 38 that is a partition wall of the hollow rectangular parallelepiped buffer space 30. The inflow pipe 35 and the outflow pipe 36 are arranged in parallel.

  Drawing 3 is a mimetic diagram of the modification of the aerosol fixed amount supply device of a 1st embodiment. As shown in FIG. 3, the angle θ between the aerosol inlet 31 and the aerosol outlet 32 is in the direction of 0 to 80 degrees or 0 to −80 degrees, and the inflow direction IF of the aerosol inlet 31 and the outflow direction OF of the aerosol outlet 32. Are set so as not to cross each other in the buffer space section 30.

(Operation of aerosol fixed amount supply device)
Next, with reference to FIG.1 and FIG.2, operation | movement of the aerosol fixed amount supply apparatus 1 of 1st Embodiment is demonstrated.

  As described above, in the aerosol supply unit 20, the raw material particles are mixed and dispersed in the carrier gas supplied from the gas cylinder 21 to generate an aerosol. When the powder supply becomes unstable in the aerosol supply unit 20, a high concentration (aggregation) aerosol of particles is mixed. When high concentration (aggregated) aerosol is mixed, dispersion of the aerosol concentration becomes non-uniform, which causes film formation defects such as non-uniform film thickness and film chipping in the film forming process of the film forming unit 40.

  The aerosol fixed amount supply device 1 according to the present embodiment is interposed between the aerosol supply unit 20 and the film forming unit 40. The aerosol fixed amount supply device 1 includes a buffer space portion 30 for imparting a turbulent flow to the aerosol flow to make the aerosol concentration dispersion uniform. The cross-sectional area A of the buffer space 30 is set larger than the cross-sectional area B of the aerosol inlet 31 and the cross-sectional area B of the aerosol outlet 32, which will be described later, and has a volume sufficient to give a turbulent flow to the aerosol flow.

  In the form illustrated in FIG. 2, the angle between the aerosol inlet 31 and the aerosol outlet 32 is 0 degree, and the inflow direction of the aerosol inlet 31 and the outflow direction of the aerosol outlet 32 do not intersect in the buffer space 30. Has been. The aerosol inflow direction IF at the aerosol inlet 31 and the aerosol outflow direction OF at the aerosol outlet 32 are set to be 180 degrees different from each other, and the inflow pipe 35 and the outflow pipe 36 are arranged in parallel. Therefore, even if high-concentration (aggregation) aerosol is mixed in the aerosol flowing into the buffer space 30 from the aerosol inlet 31, turbulence occurs in the aerosol flow in the buffer space 30, and the high-concentration (aggregation) aerosol is Can be crushed and sized.

  Further, in the modification illustrated in FIG. 3, the angle θ between the aerosol inlet 31 and the aerosol outlet 32 is in the direction of 0 to 80 degrees or 0 to −80 degrees, and the inflow direction IF of the aerosol inlet 31 and the aerosol outlet 32. The outflow direction OF is set so as not to intersect the buffer space 30. Similarly, in the modified example illustrated in FIG. 3, even if high-concentration (aggregated) aerosol is mixed in the aerosol flowing into the buffer space 30 from the aerosol inlet 31, turbulence is generated in the aerosol flow in the buffer space 30. As a result, a high concentration (aggregated) aerosol can be pulverized and sized.

  Since the high-concentration (aggregation) aerosol is removed in the buffer space portion 30, the aerosol concentration dispersion can be made uniform, and good film formation can be obtained in the film-forming section 40 in the subsequent process.

  As described above, the aerosol fixed amount supply device 1 according to the first embodiment imparts turbulent flow to the aerosol flow in the buffer space 30 to pulverize and classify the high concentration (aggregated) aerosol. The aerosol deposition apparatus 100 includes an aerosol fixed amount supply device 1, and the aerosol fixed amount supply device 1 removes a high concentration (aggregated) aerosol to uniformize the concentration distribution of the aerosol. Film formation can be obtained.

[Second Embodiment]
Next, the aerosol fixed amount supply device 2 of the second embodiment will be described with reference to FIG. FIG. 4 is a schematic diagram of an aerosol fixed amount supply device according to a second embodiment. The same components as those in the first embodiment are denoted by the same reference numerals, and description thereof is omitted.

  The aerosol fixed amount supply device 2 according to the second embodiment is different in that the buffer space 30 includes a stirring device 50 for generating a turbulent flow in the aerosol flow, and the rest is illustrated in FIG. 2 of the first embodiment. It is comprised similarly to the form to do.

  That is, the aerosol inlet 31 and the aerosol outlet 32 are opened in the upper wall 38 of the buffer space 30, and the inflow pipe 35 and the outflow pipe are arranged in parallel. A stirring device 50 is provided at the bottom 39 of the buffer space 30. The stirrer 50 has a function of generating a turbulent flow in the aerosol flow flowing from the aerosol inlet 31.

  Examples of the stirring device 50 include a fan. The stirring device 50 includes a rotating shaft 51 that is rotationally driven by a driving device (not shown), and a plurality of rotating blades 52 that rotate as the rotating shaft 51 rotates.

  The aerosol fixed amount supply device 2 of the second embodiment basically has the same operational effects as the first embodiment. Especially in 2nd Embodiment, the buffer space part 30 is equipped with the stirring apparatus 50 for producing a turbulent flow in an aerosol flow. Therefore, according to the aerosol fixed amount supply device 2 of the second embodiment, it is possible to positively remove the high concentration (aggregated) aerosol by actively generating turbulence in the aerosol flow in the buffer space 30. As a result, according to the aerosol fixed amount supply device 2 of the second embodiment, the aerosol concentration distribution can be made uniform and the favorable film formation can be promoted as compared with the first embodiment.

[Third Embodiment]
Next, the aerosol fixed amount supply device 3 of the second embodiment will be described with reference to FIG. FIG. 5 is a schematic diagram of an aerosol fixed amount supply device according to a third embodiment. The same components as those in the first embodiment are denoted by the same reference numerals, and description thereof is omitted.

  In the aerosol fixed amount supply device 3 according to the third embodiment, the aerosol inlet 31 and the aerosol outlet 32 are arranged to face each other, and a baffle plate 60 is interposed between the aerosol inlet 31 and the aerosol outlet 32 in the buffer space 30. The other points are the same as in the first embodiment.

  That is, the aerosol inlet 31 and the aerosol outlet 32 are disposed to face each other. A side wall 33 in which the aerosol inlet 31 is opened and a side wall 34 in which the aerosol outlet 32 is opened are partition walls facing each other in the buffer space 30.

  A baffle plate 60 is interposed between the aerosol inlet 31 and the aerosol outlet 32 in the buffer space 30. The baffle plate 60 serves as a barrier for the aerosol flow that flows in from the aerosol inlet 31 and flows out of the aerosol outlet 32. When the aerosol flowing in from the aerosol inlet 31 collides with the baffle plate 60, a turbulent flow is generated in the aerosol flow, and the high concentration (aggregated) aerosol is pulverized and sized.

  The central axis of the aerosol inlet 31 and the central axis of the aerosol outlet 32 are not necessarily arranged on a straight line, and the central axis of the aerosol inlet 31 and the central axis of the aerosol outlet 32 may be shifted. However, it is preferable that the aerosol inlet 31 and the aerosol outlet 32 are arranged so that at least the baffle plate 60 blocks the aerosol flow.

  The aerosol fixed amount supply device 3 of the third embodiment basically has the same function and effect as the first embodiment. Particularly in the third embodiment, the aerosol inlet 31 and the aerosol outlet 32 are arranged to face each other, and the baffle plate 60 is interposed between the aerosol inlet 31 and the aerosol outlet 32 in the buffer space 30. Therefore, according to the aerosol fixed amount supply device 3 of the third embodiment, when the aerosol flowing in from the aerosol inlet 31 collides with the baffle plate 60, turbulent flow is generated in the aerosol flow, and high concentration (aggregated) aerosol is positively removed. can do. As a result, according to the aerosol fixed amount supply device 2 of the third embodiment, the aerosol concentration distribution can be made uniform and good film formation can be promoted without the stirring device as in the second embodiment. Has an advantageous effect.

  The inflow pipe 35 connected to the aerosol inlet 31 and the outflow pipe 36 connected to the aerosol outlet 32 are not necessarily arranged in a straight line unless the aerosol flow is blocked by the baffle plate 60 and a short-circuit flow occurs. Or it does not need to be parallel arrangement. For example, the baffle plate 60 may be interposed between the aerosol inlet 31 and the aerosol outlet 32 in the buffer space 30 in the aerosol fixed amount supply device 1 of the first embodiment of FIGS. 2 and 3.

[Fourth Embodiment]
Next, the aerosol fixed amount supply device 4 according to the fourth embodiment will be described with reference to FIG. FIG. 6 is a schematic diagram of an aerosol fixed amount supply device according to a fourth embodiment. The same components as those in the third embodiment are denoted by the same reference numerals, and description thereof is omitted.

  The aerosol fixed amount supply device 4 of the fourth embodiment is configured as an apparatus in which the buffer space portion 30 for imparting turbulent flow to the aerosol flow and uniforming the aerosol concentration dispersion and the aerosol supply portion 20 are integrated. Is different. Moreover, the powder supply part 10 is provided on the buffer space part 30, and the point in which the powder inflow port 71 is formed in the partition 70 provided between the buffer space part 30 and the powder supply part 10 differs. Furthermore, the inlet of the buffer space 30 is configured as a gas inlet 81 for allowing the carrier gas to flow in, and the gas inlet 81 is connected to the gas inlet 81. Otherwise, the third embodiment is the same as the third embodiment. It is constituted similarly.

  In other words, the powder supply unit 10 is provided on the buffer space unit 30 with the partition wall 70 between the buffer space unit 30 and the powder supply unit 10. The partition wall 70 is formed with a powder inlet 71 for allowing the raw material particles 11 to fall and flow into the buffer space 30.

  The gas inlet 81 and the aerosol outlet 32 are disposed to face each other. The side wall 33 in which the gas inlet 81 is opened and the side wall 34 in which the aerosol outlet 32 is opened are partition walls facing each other in the buffer space 30.

  A sectional area A of the buffer space 30 is set larger than a sectional area D of a gas inlet 81 and a sectional area B of an aerosol outlet 32 described later. Here, the cross-sectional area A of the buffer space 30 means an area of a cross section perpendicular to the carrier gas inflow direction GF of the gas inlet 81 and the aerosol outflow direction OF of the aerosol outlet 32. The sectional area D of the gas inlet 81 refers to the opening sectional area of the gas inlet 81. Furthermore, the sectional area C of the aerosol outlet 32 refers to the opening sectional area of the aerosol outlet 32.

  A baffle plate 60 is interposed between the gas inlet 81 and the aerosol outlet 32 in the buffer space 30. The baffle plate 60 hangs down from the partition wall 70 and is disposed closer to the aerosol outlet 32 than the powder inlet 71. The carrier gas flowing in from the gas inlet 81 falls and flows in from the powder inlet 71 and is mixed with the raw material particles 11 to become an aerosol. The baffle plate 60 serves as a barrier for the aerosol flow that flows out of the aerosol outlet 32. When the aerosol collides with the baffle plate 60, a turbulent flow is generated in the aerosol flow, and the high concentration (aggregated) aerosol is pulverized and sized.

  The central axis of the gas inlet 81 and the central axis of the aerosol outlet 32 are shifted from each other, but may be necessarily arranged on a straight line. However, it is preferable that the gas inlet 81 and the aerosol outlet 32 are arranged so that at least the baffle plate 60 blocks the aerosol flow.

  The aerosol fixed amount supply device 4 of the fourth embodiment has basically the same functions and effects as those of the third embodiment. Particularly in the fourth embodiment, the powder supply unit 10 is provided on the buffer space 30, and the powder inlet 71 is formed in the partition wall 70 provided between the buffer space 30 and the powder supply unit 10. . That is, the aerosol supply unit 20 and the buffer space unit 30 are configured as an integrated device. Therefore, according to the aerosol fixed amount supply device 4 of the fourth embodiment, the aerosolization function of mixing the carrier gas and the raw material particles 11 and the buffer function of causing the aerosol to collide with the baffle plate 60 and causing turbulent flow in the aerosol flow. And the advantageous effect of having both. As a result, according to the aerosol fixed amount supply device 4 of the fourth embodiment, the high concentration (aggregation) aerosol can be positively removed without providing the stirring device as in the second embodiment, and the concentration of the aerosol It is possible to make the dispersion uniform and promote good film formation.

[First comparative form]
Next, the aerosol fixed amount supply apparatus 201 of the first comparative embodiment will be described with reference to FIG. FIG. 7 is a schematic diagram of an aerosol fixed amount supply device according to a first comparative embodiment.

  As shown in FIG. 7, in the aerosol fixed amount supply device 201 of the first comparative embodiment, the aerosol inlet 31 and the aerosol outlet 32 are arranged to face each other, and the central axis of the aerosol inlet 31 and the central axis of the aerosol outlet 32 are It is arranged on a straight line. Further, unlike the third embodiment, no baffle plate is provided between the aerosol inlet 31 and the aerosol outlet 32.

  In the aerosol fixed amount supply device 201 of the first comparative embodiment, the aerosol flowing from the aerosol inlet 31 directly flows out to the aerosol outlet 32, so that no turbulent flow occurs and the buffer function is not achieved. Therefore, the high concentration (aggregation) aerosol cannot be removed, and the concentration of the aerosol becomes non-uniform, which causes film formation defects such as non-uniform film thickness and film chipping.

[Second comparative form]
Next, the aerosol fixed amount supply apparatus 202 of the second comparative embodiment will be described with reference to FIG. FIG. 8 is a schematic diagram of an aerosol quantitative supply device of a second comparative embodiment.

  As shown in FIG. 8, in the aerosol fixed amount supply device 202 of the second comparative form, the aerosol inlet 31 is disposed on the one side wall 33 and the aerosol outlet 32 is disposed on the upper wall 38. The central axis of the inflow pipe 35 connected to the aerosol inlet 31 and the central axis of the outflow pipe 36 connected to the aerosol outlet 32 are arranged so as to be orthogonal to each other. Further, unlike the third embodiment, no baffle plate is provided between the aerosol inlet 31 and the aerosol outlet 32.

  In the aerosol fixed amount supply device 202 of the second comparative embodiment, the aerosol flowing from the aerosol inlet 31 flows out to the aerosol outlet 32 in a short circuit, so that no turbulent flow occurs and the buffer function is not achieved. Therefore, the high concentration (aggregation) aerosol cannot be removed, and the concentration of the aerosol becomes non-uniform, which causes film formation defects such as non-uniform film thickness and film chipping.

[Third comparative form]
Next, the aerosol fixed amount supply apparatus 203 of the third comparative embodiment will be described with reference to FIG. FIG. 9 is a schematic diagram of an aerosol quantitative supply device of a second comparative embodiment.

  As shown in FIG. 9, in the aerosol fixed amount supply device 203 of the third comparative embodiment, the aerosol inlet 31 is disposed on the upper wall 38 and the aerosol outlet 32 is disposed on the one side wall 34. The inflow direction IF of the aerosol inlet 31 and the outflow direction OF of the aerosol outlet 32 are set so as not to intersect in the buffer space 30, but the angle θ between the aerosol inlet 31 and the aerosol outlet 32 exceeds 90 degrees. Yes. Further, a baffle plate is not provided between the aerosol inlet 31 and the aerosol outlet 32.

  In the aerosol fixed amount supply device 203 of the third comparative embodiment, the aerosol that flows in from the aerosol inlet 31 flows out to the aerosol outlet 32 in a short circuit, so that no turbulent flow occurs and the buffer function is not achieved. Therefore, the high concentration (aggregation) aerosol cannot be removed, and the concentration of the aerosol becomes non-uniform, which causes film formation defects such as non-uniform film thickness and film chipping.

[Fourth comparison form]
Next, the aerosol fixed amount supply apparatus 204 of the third comparative embodiment will be described with reference to FIG. FIG. 10 is a schematic diagram of an aerosol fixed-quantity supply device of a fourth comparative embodiment.

  As shown in FIG. 10, in the aerosol fixed amount supply device 203 of the third comparative embodiment, the aerosol inlet 31 is disposed on the upper wall 38 and the aerosol outlet 32 is disposed on the one side wall 34. The angle θ between the aerosol inlet 31 and the aerosol outlet 32 is in the range of 0 to 80 degrees or 0 to −80 degrees. The inflow direction IF of the aerosol inlet 31 and the outflow direction OF of the aerosol outlet 32 are the buffer space 30. It's inside. Further, a baffle plate is not provided between the aerosol inlet 31 and the aerosol outlet 32.

  In the aerosol fixed amount supply device 204 of the fourth comparative embodiment, the aerosol flowing in from the aerosol inlet 31 flows out to the aerosol outlet 32 in a short circuit, so that no turbulent flow occurs and the buffer function is not achieved. Therefore, the high concentration (aggregation) aerosol cannot be removed, and the concentration of the aerosol becomes non-uniform, which causes film formation defects such as non-uniform film thickness and film chipping.

  The embodiments described above are for facilitating the understanding of the present invention, and are not intended to limit the present invention. Each element included in the embodiment and its arrangement, material, condition, shape, size, and the like are not limited to those illustrated, and can be changed as appropriate. In addition, the structures shown in different embodiments can be partially replaced or combined.

1, 2, 3, 4 Aerosol fixed amount supply device 10 Powder supply unit 20 Aerosolization unit 30 Buffer space unit 31 Aerosol inlet 32 Aerosol outlet 40 Film formation unit 50 Stirrer 60 Baffle plate 70 Partition wall 71 Powder inlet 81 Gas introduction 82 Gas Inflow pipe 100 Aerosol deposition apparatus A Cross sectional area B of buffer space B Cross sectional area of aerosol inlet C Cross sectional area of aerosol outlet IF Inflow direction OF Outflow direction

Claims (7)

A buffer space part provided between the aerosol supply part and the film forming part, for imparting turbulent flow to the aerosol flow and homogenizing the aerosol concentration dispersion;
An aerosol inlet for flowing aerosol into the buffer space;
An aerosol outlet for allowing aerosol to flow out of the buffer space;
With
The aerosol fixed amount supply device, wherein a cross-sectional area of the buffer space is set larger than a cross-sectional area of the aerosol inlet and the aerosol outlet.   The aerosol inflow direction of the aerosol inlet and the aerosol outflow direction of the aerosol outlet intersect with each other in the direction of 0 to 80 degrees or 0 to -80 degrees, and the inflow direction of the aerosol inlet and the outflow direction of the aerosol outlet intersect in the buffer space. The aerosol fixed-quantity supply apparatus of Claim 1 set so that it may not exist.   The aerosol fixed amount supply device according to claim 1 or 2, wherein the buffer space portion includes a stirring device for generating turbulent flow in the aerosol flow.   The aerosol fixed-quantity supply device according to claim 1 or 2, wherein a baffle plate serving as a barrier for aerosol flow is interposed between the aerosol inlet and the aerosol outlet in the buffer space.   The aerosol inlet and the aerosol outlet are disposed opposite to each other in the buffer space, and a baffle plate serving as an aerosol flow barrier is interposed between the aerosol inlet and the aerosol outlet in the buffer space. Item 4. The aerosol quantitative supply device according to Item 1. A buffer space part configured to be integrated with the aerosol supply part, to impart a turbulent flow to the aerosol flow and to make the aerosol concentration dispersion uniform;
A gas inlet through which a carrier gas flows into the buffer space;
An aerosol outlet for allowing aerosol to flow out of the buffer space;
On the buffer space part, a powder supply part provided across a partition wall having a powder inlet,
With
The cross-sectional area of the buffer space is set larger than the cross-sectional area of the gas inlet and the aerosol outlet,
An aerosol in which the gas inlet and the aerosol outlet are opposed to each other in the buffer space, and a baffle plate serving as a barrier for the aerosol flow is interposed between the gas inlet and the aerosol outlet in the buffer space. Metering device. The aerosol deposition apparatus provided with the aerosol fixed amount supply apparatus as described in any one of Claims 1-6.