JP2019165113A - Cleaning tool and cleaning device - Google Patents

Abstract

To provide a technique capable of cleaning the surface of an object without causing a cleaning liquid to leak.SOLUTION: A cleaning tool according to an aspect of the present disclosure includes a channel forming surface, a second channel, and a third channel. The channel forming surface is disposed opposite to the surface to be cleaned, and forms a first channel with an end communicating with the outside air between itself and the surface to be cleaned. The second channel opens to the channel forming surface and connects the first channel and a cleaning liquid supply unit. The third channel opens to the channel formation surface and connects the first channel and a suction mechanism. In the cleaning tool, a cleaning liquid supplied from the cleaning liquid supply unit via the second channel and an outside air flowing in from the end of the first channel are sucked into the third channel through the first channel to clean the surface to be cleaned.SELECTED DRAWING: Figure 10

Description

  The present disclosure relates to a cleaning tool and a cleaning apparatus.

  Conventionally, a cleaning device for cleaning the surface of an object is known. For example, in Patent Document 1, a nozzle that is disposed above a transport line that rolls a substrate and supplies a cleaning liquid to a substrate that is transported on the transport line, and a cleaning liquid that is disposed below the transport line and has flowed down from the substrate. A cleaning device is described comprising a pan for receiving.

JP 2010-199150 A

  The present disclosure provides a technique capable of cleaning the surface of an object without leaking a cleaning liquid.

  A cleaning tool according to an aspect of the present disclosure includes a flow path forming surface, a second flow path, and a third flow path. The flow path forming surface is disposed to face the surface to be cleaned, and forms a first flow path with an end communicating with the outside air between the surface to be cleaned. The second channel opens to the channel forming surface and connects the first channel and the cleaning liquid supply unit. The third channel opens to the channel forming surface and connects the first channel and the suction mechanism. In the cleaning tool, the cleaning liquid supplied from the cleaning liquid supply unit via the second flow path and the outside air flowing in from the end of the first flow path are sucked into the third flow path through the first flow path. To clean the surface to be cleaned.

  According to the present disclosure, it is possible to clean the surface of an object without leaking the cleaning liquid.

FIG. 1 is a diagram illustrating a configuration of a substrate processing system according to an embodiment of the present disclosure. FIG. 2 is a schematic diagram illustrating a configuration of a substrate processing apparatus according to an embodiment of the present disclosure. FIG. 3 is a schematic diagram illustrating an example of the configuration of the nozzle. FIG. 4 is a schematic perspective view of the cleaning device according to the embodiment of the present disclosure as viewed obliquely from above. FIG. 5 is a schematic perspective view of the cleaning device according to the embodiment of the present disclosure as viewed obliquely from below. FIG. 6 is a schematic cross-sectional view of a cleaning device according to an embodiment of the present disclosure. FIG. 7 is a flowchart illustrating a procedure of a cleaning process performed by the cleaning device according to an embodiment of the present disclosure. FIG. 8 is a schematic plan view of a cleaning tool according to a first modification according to an embodiment of the present disclosure. FIG. 9 is a schematic plan view of a cleaning tool according to a second modification according to an embodiment of the present disclosure. FIG. 10 is a schematic cross-sectional view of a cleaning tool according to a third modification according to an embodiment of the present disclosure.

  Hereinafter, modes for carrying out a cleaning tool and a cleaning apparatus according to the present disclosure (hereinafter referred to as “embodiments”) will be described in detail with reference to the drawings. In addition, the cleaning tool and the cleaning apparatus according to the present disclosure are not limited to the embodiment. In addition, the embodiments can be appropriately combined within a range that does not contradict processing contents. In the following embodiments, the same portions are denoted by the same reference numerals, and redundant description is omitted.

  In the following embodiments, an example in which the cleaning tool and the cleaning apparatus according to the present disclosure are applied to a nozzle cleaning apparatus that uses a nozzle that supplies a processing liquid to a substrate such as a semiconductor wafer as an object to be cleaned will be described. However, the cleaning object in the cleaning tool and the cleaning apparatus according to the present disclosure is not limited to the nozzle. In the following embodiments, an example in which a cleaning tool is arranged below the object to be cleaned will be described, but the arrangement of the object to be cleaned and the cleaning tool is not limited to this example, and the object to be cleaned A cleaning tool may be placed above or to the side of the object.

<1. Configuration of substrate processing system>
First, the configuration of a substrate processing system provided with a cleaning apparatus according to an embodiment will be described with reference to FIG. FIG. 1 is a diagram illustrating a configuration of a substrate processing system according to an embodiment of the present disclosure. In the following, in order to clarify the positional relationship, the X axis, the Y axis, and the Z axis that are orthogonal to each other are defined, and the positive direction of the Z axis is the vertically upward direction.

  As shown in FIG. 1, the substrate processing system 1 includes a substrate carry-in / out unit 2, a substrate transport unit 3, and a substrate processing unit 4. The substrate carry-in / out unit 2, the substrate transfer unit 3 and the substrate processing unit 4 are connected in the order of the substrate carry-in / out unit 2, the substrate transfer unit 3 and the substrate processing unit 4 in the positive direction of the X axis.

  The substrate loading / unloading unit 2 is a processing unit for loading and unloading a plurality of substrates W (for example, 25) by the carrier 21 together. For example, four carriers 21 are placed side by side on the substrate carry-in / out unit 2 in close contact with the front wall 31 of the substrate transport unit 3.

  The substrate transfer unit 3 is disposed adjacent to the substrate carry-in / out unit 2 and includes a substrate transfer device 32 and a substrate delivery table 33 therein. The substrate transport device 32 transports the substrate W between the carrier 21 and the substrate delivery table 33.

  The substrate processing unit 4 is disposed adjacent to the substrate transport unit 3. The substrate processing unit 4 includes a substrate transfer device 41 and a plurality of substrate processing devices 42. The substrate processing apparatus 42 is arranged side by side along the moving direction of the substrate transfer apparatus 41, and the substrate transfer apparatus 41 transfers the substrate W between the substrate transfer table 33 and the substrate processing apparatus 42. Then, the substrate processing apparatus 42 performs a predetermined chemical solution process on the substrate W carried by the substrate transfer apparatus 41.

  Further, the substrate processing system 1 includes a control device 50. The control device 50 is a device that controls the operation of the substrate processing system 1. The control device 50 is a computer, for example, and includes a control unit 51 and a storage unit 52. The storage unit 52 stores a program for controlling various processes such as a nozzle cleaning process and a dummy dispense process which will be described later. The control unit 51 controls the operation of the substrate processing system 1 by reading and executing the program stored in the storage unit 52.

  The program may be recorded on a computer-readable recording medium, and may be installed in the storage unit 52 of the control device 50 from the recording medium. Examples of the computer-readable recording medium include a hard disk (HD), a flexible disk (FD), a compact disk (CD), a magnetic optical disk (MO), and a memory card.

<2. Configuration of substrate processing apparatus>
Next, the configuration of the substrate processing apparatus 42 according to the embodiment will be described with reference to FIG. FIG. 2 is a schematic diagram illustrating a configuration of the substrate processing apparatus 42 according to an embodiment of the present disclosure.

  As shown in FIG. 2, the substrate processing apparatus 42 according to the embodiment includes a substrate holding unit 12, a nozzle unit 13, and a cleaning device 5 in the processing chamber 11.

  The substrate holding unit 12 includes a rotation holding mechanism 14 and a processing liquid recovery mechanism 15. The rotation holding mechanism 14 holds the substrate W horizontally and rotates the held substrate W around the vertical axis. The processing liquid recovery mechanism 15 is disposed so as to surround the rotation holding mechanism 14, and receives and recovers the processing liquid scattered outward from the substrate W by the centrifugal force generated by the rotation of the substrate W.

  The nozzle unit 13 supplies a processing liquid from above the substrate W held by the rotation holding mechanism 14 toward the substrate W. The nozzle unit 13 includes a nozzle 16, a nozzle arm 17 that horizontally supports the nozzle 16, and a moving mechanism 18 that rotates and moves the nozzle arm 17 up and down.

  Here, the configuration of the nozzle 16 will be described with reference to FIG. FIG. 3 is a schematic diagram illustrating an example of the configuration of the nozzle 16.

  As shown in FIG. 3, the nozzle 16 includes, for example, one discharge unit 19. The discharge unit 19 is connected to a processing liquid supply source (not shown), and discharges the processing liquid supplied from the processing liquid supply source vertically downward.

  The lower surface of the nozzle 16 is a flat surface 61, and the discharge unit 19 protrudes downward from the flat surface 61 of the nozzle 16. The discharge unit 19 includes a front end surface 91 provided with a discharge port (not shown) and a plurality of tapered side surfaces 92 that gradually become narrower from the flat surface 61 toward the front end surface 91. The tip surface 91 and the plurality of side surfaces 92 of the discharge unit 19 correspond to the cleaning target surface S.

  The cleaning device 5 is a device that cleans the discharge unit 19 included in the nozzle unit 13, and is disposed, for example, at a standby position of the nozzle unit 13 outside the substrate W.

<3. Configuration of cleaning device>
Next, the structure of the washing | cleaning apparatus 5 is demonstrated with reference to FIGS. FIG. 4 is a schematic perspective view of the cleaning device 5 according to an embodiment of the present disclosure as viewed obliquely from above. FIG. 5 is a schematic perspective view of the cleaning device 5 according to an embodiment of the present disclosure as viewed obliquely from below. FIG. 6 is a schematic cross-sectional view of the cleaning device 5 according to an embodiment of the present disclosure.

  As shown in FIGS. 4 and 5, the cleaning device 5 includes a cleaning tool 100 that cleans the surface S to be cleaned, a cleaning liquid supply unit 140 that supplies a cleaning liquid to the cleaning tool 100, and a cleaning liquid supplied to the cleaning tool 100. A suction mechanism 150 for sucking.

  The cleaning tool 100 includes a first member 101, a second member 102, and a third member 103. The second member 102 is a substantially rectangular parallelepiped member. The first member 101 is a substantially L-shaped member in a side view, and is attached to the second member 102 so as to cover two adjacent side surfaces among a plurality of surfaces of the second member 102. The third member 103 is attached to the second member 102. The second member 102 is detachable from the first member 101, and the third member 103 is detachable from the second member 102.

  The cleaning tool 100 includes a flow path forming surface 111, a second flow path 120, and a third flow path 130.

  The flow path forming surface 111 is a surface disposed to face the cleaning target surface S. Specifically, the flow path forming surface 111 includes a first surface 111 a that is disposed to face the distal end surface 91 of the cleaning target surface S, and a plurality of surfaces that are disposed to face the plurality of side surfaces 92 of the cleaning target surface S. Second surface 111b.

  As shown in FIG. 6, the flow path forming surface 111 forms a first flow path 110 whose end communicates with the outside air with the surface S to be cleaned.

  A seal surface 115 is provided on the periphery of the flow path forming surface 111. The seal surface 115 is a flat surface disposed opposite to the flat surface 61 provided on the periphery of the surface S to be cleaned. The first flow path 110 communicates with the outside air through a flow path formed by the seal surface 115 and the flat surface 61.

  In this embodiment, the outer shape of the cleaning target surface S has a square shape in plan view, and the flow path forming surface 111 is also formed in a square shape in plan view in accordance with the outer shape of the cleaning target surface S. In the present embodiment, the cleaning target surface S protrudes from the flat surface 61, and the flow path forming surface 111 is recessed from the seal surface 115. Thus, the flow path forming surface 111 is formed in a shape corresponding to the shape of the surface S to be cleaned.

  The second flow path 120 opens to the flow path forming surface 111 and connects the first flow path 110 and the cleaning liquid supply unit 140. The second flow path 120 is formed by the first member 101 and the second member 102. Specifically, the second flow path 120 includes a cleaning liquid supply port 121 and a cylindrical supply path 122 communicating with the supply port 121. The supply port 121 and the supply path 122 are formed in the first member 101. The second flow path 120 communicates with the supply path 122, and stores a storage part 123 that temporarily stores cleaning liquid, a slit part 124 that communicates with the storage part 123, and a slit-shaped outlet that communicates with the slit part 124. 125. The storage part 123, the slit part 124, and the outflow port 125 are formed by a recess formed on the side surface of the second member 102 and a side surface of the first member 101 attached to the second member 102 so as to cover the recess. The

  The supply port 121 is connected to the cleaning liquid supply unit 140 via the supply pipe 160. The cleaning liquid supply unit 140 includes, for example, a cleaning liquid supply source 141 and a valve 142. The cleaning liquid supply source 141 is, for example, a tank that stores the cleaning liquid. The valve 142 opens and closes the supply pipe 160. The valve 142 is electrically connected to the control unit 51 and is controlled by the control unit 51.

  The storage unit 123 temporarily stores the cleaning liquid supplied from the cleaning liquid supply unit 140 via the supply pipe 160, the supply port 121, and the supply path 122. The storage part 123 has the same width as the width of the slit part 124 in the length direction (here, the X-axis direction), and the cleaning liquid stored in the storage part 123 is in the length direction of the slit part 124. Evenly flows into the slit portion 124. Therefore, the cleaning liquid can be evenly discharged from the outlet 125.

  Even if the cleaning liquid is directly supplied to the slit portion 124, the cleaning liquid spreads in the length direction of the slit portion 124 while passing through the slit portion 124. For this reason, the 2nd flow path 120 does not necessarily need to have the storage part 123. FIG.

  The slit portion 124 is a slit-like flow path that extends along the periphery of the flow path forming surface 111, and is formed between the first member 101 and the second member 102. The slit portion 124 extends along one side of the four sides of the first surface 111 a in the flow path forming surface 111. The outlet 125 that communicates with the slit 124 also has a slit shape like the slit 124. That is, the outlet 125 opens along one side of the four sides of the first surface 111a.

  The third flow path 130 opens to the flow path forming surface 111 and connects the first flow path 110 and the suction mechanism 150. The third flow path 130 is formed by the second member 102 and the third member 103. Specifically, the third flow path 130 has an inlet 131 and a suction port 132, the inlet 131 is formed in the second member 102, and the suction port 132 is formed in the third member 103.

  The inflow port 131 is formed on the side of the four sides of the first surface 111a in the flow path forming surface 111 that faces the side where the above-described second flow path 120 is disposed. The suction port 132 is connected to the suction mechanism 150 via the suction tube 170. The suction mechanism 150 is, for example, an ejector, and sucks the first flow path 110, the second flow path 120, and the third flow path 130 through the suction pipe 170. The suction mechanism 150 is electrically connected to the control unit 51 and controlled by the control unit 51.

  Here, an example in which the inlet 131 of the third flow path 130 is circular is shown, but the inlet 131 has a slit shape extending in parallel with the outlet 125 of the second flow path 120. It may be.

  As described above, the cleaning tool 100 is configured by combining the first member 101, the second member 102, and the third member 103. Since the flow path forming surface 111 is formed on the second member 102, the second member 102 can be replaced according to the shape of the surface S to be cleaned. Therefore, it is possible to provide the cleaning tool 100 that can clean the surface S to be cleaned having various shapes.

<4. Operation of the cleaning device>
Next, a specific operation of the cleaning device 5 will be described with reference to FIG. FIG. 7 is a flowchart illustrating a procedure of a cleaning process performed by the cleaning device 5 according to an embodiment of the present disclosure.

  As shown in FIG. 7, in the cleaning process, first, the surface to be cleaned S is arranged to face the flow path forming surface 111 of the cleaning tool 100 (step S101). Specifically, the control unit 51 controls the moving mechanism 18 (see FIG. 2) to move the nozzle 16 so that the cleaning target surface S of the discharge unit 19 is disposed opposite to the flow path forming surface 111. Thereby, the first flow path 110 is formed.

  Subsequently, the control unit 51 controls the suction mechanism 150 to start suction in the first flow path 110, the second flow path 120, and the third flow path 130 (step S102). Further, the control unit 51 controls the valve 142 of the cleaning liquid supply unit 140 to open the supply pipe 160 (step S103). As a result, the cleaning liquid is supplied to the second flow path 120. The cleaning liquid supplied to the second flow path 120 flows into the slit portion 124 from the storage portion 123 due to the suction force of the suction mechanism 150, and advances through the slit portion 124 while spreading in the length direction of the slit portion 124 from the outlet 125. It flows out to the first flow path 110 (indicated by a black arrow in FIG. 6). As described above, since the cleaning tool 100 includes the slit portion 124 and the slit-shaped outlet 125, the cleaning liquid can be evenly supplied to the entire width direction of the surface S to be cleaned.

  Since the end of the first channel 110 communicates with the outside air, the outside air flows into the first channel 110 from the end of the first channel 110 by the suction force of the suction mechanism 150 (in FIG. Indicated by an arrow). The cleaning tool 100 can seal the gap between the nozzle 16 that is the cleaning target and the cleaning tool 100 by the flow of the outside air. For this reason, it is possible to suppress the cleaning liquid flowing out from the second flow path 120 to the first flow path 110 from leaking from the cleaning tool 100. Further, since a sealing member such as an O-ring is not required, it is possible to suppress the generation of cleaning liquid remaining on the contact surface between the sealing member and the nozzle 16 or the cleaning tool 100. Further, unlike a seal member that may be deteriorated by the cleaning liquid, there is no leakage due to deterioration.

  Further, since a flat seal surface 115 disposed opposite to the flat surface 61 provided on the periphery of the surface S to be cleaned is provided on the periphery of the flow path forming surface 111, the leakage of the cleaning liquid is more reliably suppressed. Can do.

  The cleaning liquid flowing out from the second flow path 120 to the first flow path 110 is mixed with the outside air flowing in from the end of the first flow path 110 to be mist. The misted cleaning liquid flows through the first flow path 110, then flows into the third flow path 130 from the inlet 131, and is discharged from the third flow path 130 to the outside of the cleaning tool 100 (in FIG. 6, hatching). (Indicated by an arrow with). The surface S to be cleaned is cleaned by the mist cleaning liquid flowing through the first flow path 110. As described above, the cleaning tool 100 is configured so that the cleaning liquid supplied from the cleaning liquid supply unit 140 via the second flow path 120 and the outside air flowing in from the end of the first flow path 110 pass through the first flow path 110. By being sucked into the third flow path 130, the surface S to be cleaned is cleaned. Thereby, since the washing | cleaning target surface S can be wash | cleaned with the cleaning liquid made into mist, the cleaning performance of the washing | cleaning target surface S can be improved.

  Subsequently, the control unit 51 determines whether or not an elapsed time after opening the valve 142 in step S103 has reached a first set time set in advance (step S104). In step S104, when the first set time has not been reached (No in step S104), the control unit 51 repeats the process of step S104.

  On the other hand, when it determines with having reached the 1st setting time in step S104 (step S104, Yes), the control part 51 controls the valve 142, and closes the supply pipe | tube 160 (step S105). Thereby, supply of the cleaning liquid to the cleaning tool 100 is stopped.

  When the supply of the cleaning liquid to the cleaning tool 100 is stopped, outside air flows into the first member 101 by the suction mechanism 150. Thereby, the surface S to be cleaned is dried by the outside air. Thus, according to the cleaning tool 100, for example, it is possible to smoothly shift from the cleaning process to the drying process without performing an operation such as switching the fluid supplied to the second flow path 120 from the cleaning liquid to the dry gas. .

  Subsequently, the control unit 51 determines whether or not the elapsed time since the start of suction in step S102 has reached a preset second set time (step S106). In step S106, when the second set time has not been reached (No in step S106), the control unit 51 repeats the process of step S106.

  On the other hand, when it determines with having reached the 2nd setting time in step S106 (step S106, Yes), the control part 51 controls the suction mechanism 150, the 1st flow path 110, the 2nd flow path 120, and the 3rd. Suction in the flow path 130 is stopped (step S107). Thereafter, the control unit 51 controls the moving mechanism 18 to retract the cleaning target surface S from the flow path forming surface 111 (step S108), and completes a series of cleaning processes.

<5. Modification of cleaning apparatus>
Next, a modified example of the above-described cleaning device 5 will be described. FIG. 8 is a schematic plan view of a cleaning tool according to a first modification according to an embodiment of the present disclosure. FIG. 9 is a schematic plan view of a cleaning tool according to a second modification according to an embodiment of the present disclosure.

  As shown in FIG. 8, a cleaning apparatus 5A according to the first modification includes a cleaning tool 100A. The cleaning tool 100A includes a plurality of (here, three) second flow paths 120 and a single third flow path 130.

  The inlet 131 of the single third channel 130 is disposed on one side of the four sides of the channel forming surface 111A that is formed in a square shape in plan view. In addition, the outlets 125 of the three second flow paths 120 are arranged on each side of the four sides of the flow path forming surface 111A other than the one side where the inlet 131 is arranged. The three second flow paths 120 are connected to the cleaning liquid supply unit 140 via the supply pipe 160.

  In the cleaning tool 100A, the cleaning liquid can be supplied from three directions to the surface to be cleaned (not shown) having a square shape in plan view. Therefore, for example, even when the area of the surface to be cleaned is large, the cleaning liquid can be evenly supplied to the surface to be cleaned.

  Here, an example in which the cleaning tool 100A includes the three second flow paths 120 has been shown, but the cleaning tool 100A is a single U-shaped single unit in plan view in which the three second flow paths 120 are connected. One second flow path may be provided.

  Moreover, as shown in FIG. 9, the cleaning apparatus 5B according to the second modification includes a cleaning tool 100B. The cleaning tool 100B includes a plurality of (here, four) second flow paths 120 and a single third flow path 130.

  The outlets 125 of the four second flow paths 120 are arranged on the four sides of the flow path forming surface 111B that is formed in a square shape in plan view. The four second flow paths 120 are connected to the cleaning liquid supply unit 140 via the supply pipe 160. Further, the inlet 131 of the single third flow path 130 is disposed at the center of the flow path forming surface 111B.

  In such a cleaning tool 100B, the cleaning liquid can be supplied from four directions to a surface to be cleaned (not shown) having a square shape in plan view. Therefore, for example, even when the area of the surface to be cleaned is large, the cleaning liquid can be evenly supplied to the surface to be cleaned.

  The shape of the surface to be cleaned is not limited to a square shape in plan view. The surface to be cleaned may have a polygonal shape other than a quadrangle. Further, the number of the second flow paths 120 is not limited to the number described above, and can be increased or decreased according to the shape of the surface to be cleaned. Moreover, the surface to be cleaned may have a circular shape in plan view.

  Next, a third modification will be described with reference to FIG. FIG. 10 is a schematic cross-sectional view of a cleaning tool according to a third modification according to an embodiment of the present disclosure. Here, although it demonstrates using the washing | cleaning apparatus 5, it is the same also about washing | cleaning apparatus 5A, 5B.

  As shown in FIG. 10, the cleaning device 5 can also be applied to the cleaning target 16 </ b> C with the cleaning target surface SC facing upward. In this case, the cleaning liquid is supplied to the surface SC to be cleaned from above, but the end of the first channel 110 is blocked by the outside air flowing into the first channel 110 from the end of the first channel 110. Since the sealing is performed, it is possible to prevent the cleaning liquid from leaking from the gap between the cleaning object 16 </ b> C and the cleaning tool 100. Therefore, for example, it is not necessary to arrange a pan or the like that receives the leaked cleaning liquid below the cleaning tool 100. Further, in order to suppress leakage, the work of inverting the cleaning object 16C and cleaning it is not necessary. Note that the surface SC to be cleaned has, for example, a tip surface 91C and a plurality of tapered side surfaces 92C that gradually become narrower from the flat surface 61C toward the tip surface 91C.

  The object to be cleaned may be any object as long as it is an object that is connected to a drive source and can be moved to the flow path forming surfaces 111, 111A, and 111B by the drive source. For example, the substrate transport apparatuses 32 and 41 (see FIG. 1) include a holding unit that horizontally holds the substrate W and a moving mechanism that moves the holding unit, and the substrate W is placed on the holding unit. A placement surface and a claw portion projecting upward from the placement surface are provided. The cleaning devices 5, 5 </ b> A, 5 </ b> B can use the surface of the claw portion as a surface to be cleaned. Further, the object to be cleaned does not necessarily need to be an object connected to the drive source. When an object that is not connected to a drive source is an object to be cleaned, the cleaning devices 5, 5 </ b> A, and 5 </ b> B may include a drive source that can move the cleaning tools 100, 100 </ b> A, and 100 </ b> B in the horizontal direction and the vertical direction. . That is, the cleaning tools 100, 100A, and 100B may be moved to the object to be cleaned, and the flow path forming surfaces 111, 111A, and 111B may be opposed to the surface to be cleaned.

  In addition, the surface to be cleaned does not necessarily have a convex shape, and may have a concave shape. That is, the surface to be cleaned may be recessed with respect to the flat surface. In this case, the cleaning tool only needs to have a flow path forming surface protruding with respect to the seal surface 115.

  As described above, the cleaning devices 5, 5 </ b> A, 5 </ b> B according to the embodiment of the present disclosure include the cleaning tools 100, 100 </ b> A, 100 </ b> B, the cleaning liquid supply unit 140, and the suction mechanism 150. The cleaning tools 100, 100A, 100B clean the surfaces to be cleaned S, SC. The cleaning liquid supply unit 140 supplies the cleaning liquid to the cleaning tools 100, 100A, and 100B. The suction mechanism 150 sucks the cleaning liquid supplied to the cleaning tools 100, 100A, 100B. Moreover, the cleaning tools 100, 100 </ b> A, 100 </ b> B include flow path forming surfaces 111, 111 </ b> A, 111 </ b> B, a second flow path 120, and a third flow path 130. The flow path forming surfaces 111, 111 </ b> A, 111 </ b> B are arranged to face the cleaning target surfaces S, SC, and form a first flow path 110 whose ends communicate with the outside air between the cleaning target surfaces S, SC. The second flow path 120 opens to the flow path forming surfaces 111, 111 </ b> A, 111 </ b> B, and connects the first flow path 110 and the cleaning liquid supply unit 140. The third flow path 130 opens to the flow path forming surfaces 111, 111 </ b> A, and 111 </ b> B, and connects the first flow path 110 and the suction mechanism 150. In the cleaning devices 5, 5 </ b> A, 5 </ b> B, the cleaning liquid supplied from the cleaning liquid supply unit 140 via the second flow path 120 and the outside air flowing from the end of the first flow path 110 pass through the first flow path 110. The surfaces to be cleaned S and SC are cleaned by being sucked into the third flow path 130 through the cleaning target surfaces S and SC.

  As a result, the end of the first flow path 110 is sealed by the outside air flowing into the first flow path 110 from the end of the first flow path 110, so that the space between the cleaning object 16 </ b> C and the cleaning tool 100 is reduced. It is possible to suppress the cleaning liquid from leaking from the gap. Therefore, according to the cleaning apparatuses 5, 5A, 5B, the surface of the object can be cleaned without leaking the cleaning liquid.

  Further, the cleaning devices 5, 5A, 5B are provided on the periphery of the flow path forming surfaces 111, 111A, 111B, and are flat and arranged to face the flat surfaces 61, 61C provided on the periphery of the cleaning target surfaces S, SC. A sealing surface 115 is further provided. Thereby, the leakage of the cleaning liquid can be more reliably suppressed.

  In addition, the cleaning tools 100, 100 </ b> A, and 100 </ b> B include a first member 101 and a second member 102. The first member 101 has a cleaning liquid supply port 121 in the second flow path 120. The second member 102 is detachable from the first member 101, has flow path forming surfaces 111, 111 </ b> A, and 111 </ b> B, and forms a slit portion of the second flow path 120 with the first member 101. Has a recess. Thereby, the cleaning tools 100, 100A, and 100B that can clean the cleaning target surfaces S and SC of various shapes can be provided by replacing the second member 102 according to the shapes of the cleaning target surfaces S and SC. .

  Further, the second flow path 120 has a slit portion 124 extending along the periphery of the flow path forming surfaces 111, 111A, 111B. As a result, the cleaning liquid can be supplied uniformly over the entire width direction of the surface S to be cleaned.

  Further, the second flow path 120 includes a storage unit 123 that communicates with the slit unit 124 on the upstream side of the slit unit 124 and temporarily stores the cleaning liquid supplied from the cleaning liquid supply unit 140. Accordingly, since the cleaning liquid can be evenly introduced into the slit portion 124 in the length direction of the slit portion 124, the cleaning liquid can be supplied uniformly over the entire width direction of the surface S to be cleaned.

  In addition, the cleaning devices 5A and 5B include a plurality of second flow paths 120 and a single third flow path 130. The flow path forming surfaces 111A and 111B have a polygonal shape in plan view. The third channel 130 is disposed on one side of the plurality of sides of the channel formation surfaces 111A and 111B. The plurality of second flow paths 120 are arranged on each side other than the one side among the plurality of sides of the flow path forming surfaces 111A and 111B. As a result, the cleaning liquid can be supplied to the cleaning target surfaces S and SC having a polygonal shape in plan view from a plurality of directions. Therefore, for example, even when the areas of the surfaces to be cleaned S and SC are large, the cleaning liquid can be evenly supplied to the surfaces to be cleaned S and SC.

  It should be thought that embodiment disclosed this time is an illustration and restrictive at no points. Indeed, the above-described embodiment can be embodied in various forms. The above embodiments may be omitted, replaced, and changed in various forms without departing from the scope and spirit of the appended claims.

S surface to be cleaned 5 cleaning device 100 cleaning tool 110 first channel 111 channel forming surface 120 second channel 130 third channel 140 cleaning liquid supply unit 150 suction mechanism

Claims (7)

A flow path forming surface that is disposed opposite to the surface to be cleaned and forms a first flow path between which the end portion communicates with the outside air,
A second flow path that opens to the flow path forming surface and connects the first flow path and the cleaning liquid supply unit;
A third flow path that opens to the flow path forming surface and connects the first flow path and the suction mechanism;
The cleaning liquid supplied from the cleaning liquid supply unit via the second flow path and the outside air flowing in from the end of the first flow path are sucked into the third flow path through the first flow path. A cleaning tool for cleaning the surface to be cleaned. The cleaning tool according to claim 1, further comprising: a flat seal surface provided at a peripheral edge of the flow path forming surface and disposed opposite to a flat surface provided at a peripheral edge of the surface to be cleaned. The second flow path is
The cleaning tool according to claim 1, comprising a slit portion extending along a peripheral edge of the flow path forming surface. A first member having a supply port for the cleaning liquid in the second flow path;
A second member that is detachable from the first member, has a flow path forming surface, and has a concave portion that forms the slit portion with the first member. Cleaning tools. The second flow path is
The cleaning tool according to claim 3, further comprising a storage unit that communicates with the slit unit on an upstream side of the slit unit and temporarily stores the cleaning liquid supplied from the cleaning liquid supply unit. A plurality of the second flow paths;
A single third flow path,
The flow path forming surface has a polygonal shape in plan view.
The third flow path is disposed on one side of a plurality of sides of the flow path forming surface,
The cleaning tool according to claim 1, wherein the plurality of second flow paths are arranged on each side of the plurality of sides of the flow path forming surface other than the one side. A cleaning tool for cleaning the surface to be cleaned;
A cleaning liquid supply unit for supplying a cleaning liquid to the cleaning tool;
A suction mechanism for sucking the cleaning liquid supplied to the cleaning tool,
The cleaning tool is
A flow path forming surface that is disposed opposite to the surface to be cleaned and forms a first flow path between the surface to be cleaned and an end communicating with the outside air;
A second flow path that opens to the flow path forming surface and connects the first flow path and the cleaning liquid supply unit;
A third channel that opens to the channel formation surface and connects the first channel and the suction mechanism;
The cleaning liquid supplied from the cleaning liquid supply unit via the second flow path and the outside air flowing in from the end of the first flow path are sucked into the third flow path through the first flow path. A cleaning device that cleans the surface to be cleaned.

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