JP2019157343A - Urinal medical fluid feeding device, urinal washing system and urinal medical fluid feeding method - Google Patents

Abstract

To provide the urinal medical fluid feeding device that can reliably supply a predetermined amount of medical fluid regardless of a flow rate of washing water flowing through a washing water supply passage.SOLUTION: A configuration for feeding a medical fluid solution into a secondary pipe 2b comprises arranging a washing water sensor 10 in the secondary side pipe 2b of the washing water supply passage on a urinal side through a valve 3 and driving a pump 21 when the washing water sensor 10 detects a flow of the washing water in the secondary side pipe 2b. As a result, a medical fluid is conducted and can be reliably mixed regardless of the flow rate of the washing water, when the washing water flows.SELECTED DRAWING: Figure 3

Description

  The present invention relates to a urinal chemical supply device, a urinal cleaning system, and a urinal chemical supply method for mixing a chemical for cleaning, deodorization, sterilization and the like when supplying cleaning water to the urinal About.

  In general, flush toilets are treated with various chemicals for the purpose of washing, deodorization, sterilization, and the like. This chemical treatment method varies depending on the type of flush toilet. For example, there are a method in which a chemical is directly put into a toilet bowl or a washing water storage tank, and a method in which a medicine is placed in a water supply portion of the washing water storage tank. However, in such a method, there are various problems such as frequent drug replacement work and uneconomical.

  Therefore, conventionally, as shown in Patent Documents 1 and 2, every time flush water flows into a flush toilet (especially a urinal), the urinal is automatically supplied with a necessary amount of chemical solution for the purpose of washing, sterilization, etc. Devices that do this are known.

  The apparatus shown in Patent Documents 1 and 2 includes a washing water passage portion connected to a washing water supply path leading to a discharge port for discharging washing water into the urinal, and an intake port facing the washing water passage portion. When the cleaning water is taken into the container holding the chemical liquid and mixed with the chemical liquid and the pressure of the cleaning water supply path decreases, the cleaning water mixed with the chemical liquid is sent to the cleaning water supply path. .

Japanese Patent Publication No.49-21541 JP 2003-96873 A

  The devices shown in Patent Documents 1 and 2 basically use a pressure change accompanying a flow rate change at the start and end of the flow of cleaning water flowing through the cleaning water supply path to hold a chemical solution. The cleaning water is taken in and the cleaning water mixed with the chemical solution is returned to the cleaning water supply path. However, in recent years, water-saving toilet facilities in which the flow rate of washing water has been reduced as much as possible have become widespread. Therefore, there may be a case where a sufficient pressure difference cannot be ensured between the start and end of the flow of the cleaning water. In such equipment, a structure using the pressure difference as shown in Patent Documents 1 and 2 is used. In this apparatus, there is a concern that the mixing amount of the chemical solution is reduced.

  The present invention has been made in view of the above, and a urinal chemical supply device, a urinal cleaning system, and a urinal cleaning system capable of reliably supplying a predetermined amount of a chemical regardless of the flow rate of the cleaning water flowing through the cleaning water supply path, It is an object of the present invention to provide a method for supplying urinal drug solution.

In order to solve the above problems, the urinal drug supply device of the present invention comprises:
Washing supplied from the primary side pipe to the urinal through the secondary side pipe by the opening operation of a valve interposed between the primary side pipe and the secondary side pipe located on the urinal side A chemical supply device for urinals that mixes a chemical with water,
A washing water sensor for detecting the flow of the washing water in the secondary side pipe;
It has a chemical solution discharge pipe connecting the chemical solution tank containing the chemical solution and the secondary side pipe, and discharges the chemical solution in the chemical liquid tank to the secondary side pipe through the chemical solution discharge pipe by driving the pump. A chemical discharge mechanism,
The chemical solution discharge mechanism includes a drive control unit that drives the pump based on a detection signal that detects a flow of the cleaning water in the secondary side pipe by the cleaning water sensor.

It is preferable that the washing water sensor is a pressure sensor that detects a pressure in the secondary side pipe.
Moreover, it is preferable that the said washing water sensor is a wetness sensor which detects the contact of the washing water which flows in the said secondary side piping.
The control board of the cleaning water sensor outputs a detection signal of the cleaning water by the cleaning water sensor to the drive control unit of the chemical liquid discharge mechanism, and manages the number of outputs of the cleaning liquid remaining amount in the chemical liquid tank. It is preferable that it is the structure which transmits to a management apparatus.

The urinal washing system of the present invention is
A secondary pipe connected to the primary pipe via a valve and located on the urinal side;
A urinal washing system comprising a urinal chemical supply device for mixing a chemical with wash water supplied to the urinal from the primary side pipe through the secondary side pipe by opening the valve. ,
The urinal chemical supply device according to the present invention is used as the urinal chemical supply device.

Furthermore, the urinal drug supply method of the present invention includes:
In the urinal drug supply method for mixing the drug solution with the wash water supplied to the urinal,
Provided with a chemical liquid discharge pipe connecting the secondary side pipe located on the urinal side to the urinal side with a chemical liquid discharge pipe with respect to the primary side pipe, and a pump for sending the chemical liquid in the chemical liquid tank to the chemical liquid discharge pipe And a cleaning water sensor for detecting the flow of the cleaning water in the secondary pipe is disposed,
After the opening operation of the valve, when the flow of the cleaning water in the secondary pipe is detected by the cleaning water sensor, the detection signal is transmitted to the drive control unit of the pump, and the pump is driven to The chemical solution in the chemical solution tank is sent out to the chemical solution discharge pipe and supplied to the secondary side pipe.

  According to the present invention, when a wash water sensor is provided in the secondary side pipe of the wash water supply path on the urinal side via the valve, and the flow of the wash water flowing through the secondary side pipe is detected by the wash water sensor The pump is driven to supply the chemical solution into the secondary side pipe. If it is detected that the cleaning water has flowed in the secondary pipe, the chemical liquid is supplied by driving the pump.Therefore, the flow rate of the cleaning water or the pressure difference between the start and end of the cleaning water flow Regardless, the chemical solution can be mixed. And it is the structure which a pump drives based on a detection signal, and can mix a predetermined amount of chemical | medical solutions reliably according to the function of the pump set beforehand.

Fig.1 (a) is a top view which shows the urinal which arrange | positioned the urinal washing | cleaning system provided with the urinal chemical | medical solution supply apparatus based on one Embodiment of this invention, FIG.1 (b) is FIG. It is a front view of (a). FIG. 2 is a diagram showing a specific configuration of the urinal drug supply device according to the embodiment. FIG. 3 is a diagram showing a detailed configuration of the washing water sensor and the chemical solution discharge mechanism 20 of the urinal chemical solution supply apparatus.

  Hereinafter, the present invention will be described based on embodiments shown in the drawings. 1 to 3 show a urinal washing system 1 according to an embodiment of the present invention. The urinal washing system 1 according to this embodiment includes a urinal chemical liquid supply device 1A and a secondary side pipe 2b of the rinsing water piping path 2, and the urinal chemical liquid supply device 1A includes a washing water sensor 10. And a chemical solution discharge mechanism 20.

  As shown in FIG. 2, the washing water sensor 10 is arranged in a mechanism part arrangement chamber 4 a provided in the upper part of the urinal 4. A valve 3 interposed in a washing water piping path 2 through which washing water such as water flows is provided in the mechanism portion arranging chamber 4a. The upstream side of the valve 3 is the primary side pipe 2a of the cleaning water piping path 2, and the downstream side is the secondary side pipe 2b. When the valve 3 is opened, the cleaning water flows from the primary side pipe 2a to the secondary side pipe 2b, and further, the cleaning water flows into the bowl 4b of the urinal 4. The valve 3 is composed of an electromagnetic valve or the like, and is controlled to be opened and closed by a signal from a human sensor 4c that uses light, infrared rays, or the like that detects the separation / contact of the user.

  As shown in FIGS. 2 and 3, the washing water sensor 10 detects the flow of washing water in the secondary side pipe 2 b located on the downstream side of the valve 3. Since the washing water flows through the secondary side pipe 2b only when the valve 3 is opened, the washing water sensor 10 detects that the washing water is in the bowl 4b of the urinal 4 before and after using the urinal 4. Can be detected. Therefore, by providing the cleaning water sensor 10 for detecting the cleaning water flowing in the secondary side pipe 2b, even if the pressure change due to the flow rate difference is small, the flow of the cleaning water in the secondary side pipe 2b is detected. By configuring the pump 21 of the chemical solution discharge mechanism 20 to be described later, it becomes possible to reliably mix the chemical solution at a necessary timing.

  As long as the washing water sensor 10 can detect the washing water in the secondary pipe 2b as described above, the position of the washing water sensor 10 is not limited. In the present embodiment, as shown in FIG. 3, the secondary pipe 2 b is provided in the mixing pipe portion 2 c serving as a part where chemical liquid from a chemical liquid discharge pipe 23 of the chemical liquid discharge mechanism 20 described later merges. Specifically, the detection tube 2d is branched from the mixing pipe portion 2c, and a part of the washing water passing through the secondary side pipe 2b flows into the detection tube 2d from the mixing pipe portion 2c. The washing water sensor 10 is provided in the detection tube 2d.

  As the cleaning water sensor 10, a pressure sensor can be used. When washing water flows in the secondary side pipe 2b and a part of the water flows into the detection tube 2d, the pressure in the detection tube 24 changes and the washing water flows into the secondary side pipe 2b. It can be detected. As the washing water sensor 10, a wetness sensor can also be used. In this case, a part of the cleaning water flows into the detection tube 2d and the wetness sensor gets wet, so that the flow of the cleaning water in the secondary side pipe 2b can be detected. The wetness sensor is a so-called rain sensor, and changes in voltage value, current value, resistance value, etc. caused by a water droplet coming into contact between two detection electrodes and short-circuiting the detection electrodes. To detect the presence or absence of water droplet contact.

  The cleaning water sensor 10 is electrically connected to the control board 100. In addition to supplying power to the cleaning water sensor 10 and the like, the control board 100 outputs a detection signal for the cleaning water from the cleaning water sensor 10 to the drive control unit 211 of the chemical solution discharge mechanism 20 described later. In addition, the control board 100 includes a data communication unit 101 having a function of transmitting the number of detection signal outputs to the drive control unit 211 to the management device 30 that manages the remaining amount of the chemical solution in the chemical solution tank 22 of the chemical solution discharge mechanism 20. It is preferable to have a configuration. The urinal drug solution supply apparatus 10 according to the present embodiment is installed, for example, in a public toilet, a commercial building, or a toilet of an office building. The drug solution in the drug solution tank 22 needs to be periodically replenished by an administrator. . Therefore, the data communication unit 101 transmits information regarding the number of times the detection signal is output to a management apparatus 30 including a computer on the administrator side via a communication line such as a wired or wireless telephone line or the Internet. By receiving this information, for example, the management device 30 can calculate the total discharge amount of the chemical solution by multiplying the discharge amount of the chemical solution per one time of the management target pump 21 by the number of times of output of the detection signal, The remaining amount of the chemical solution can be obtained by subtracting from the initial amount of the chemical solution stored in the chemical solution tank 22.

  When the remaining amount of the chemical liquid in the chemical liquid tank 22 reaches a predetermined amount or less, the management device 30 causes the administrator to recognize a message composed of characters, sounds, images, etc., and prompts the chemical liquid to be replenished. be able to. In addition, when the management device 30 determines the remaining amount of the chemical solution, the date and time when the chemical solution falls below the predetermined amount, for example, by determining the average usage amount for the last few days or the average usage amount for all the predetermined management periods. It is also possible to adopt a configuration in which the prediction result is transmitted to the administrator. Thereby, the chemical solution can be reliably replenished before the remaining amount of the chemical solution reaches the bottom.

  The chemical solution discharge mechanism 20 includes a pump 21, a chemical solution tank 22, and a chemical solution discharge pipe 23. In the chemical liquid tank 22, a predetermined amount of chemical liquid, for example, a chemical liquid having functions such as cleaning, deodorization, and sterilization is stored. One end of the chemical liquid discharge pipe 23 is connected to the secondary side pipe 2 b of the cleaning water supply path 2 and the other end is connected to the chemical liquid tank 22. Then, the pump 21 sucks up the chemical liquid in the chemical liquid tank 22 and sends it out to the chemical liquid discharge pipe 23, and further mixes it with the cleaning water flowing through the secondary side pipe 2b of the cleaning water supply path 2 in the mixing pipe section 2c. The drive of the pump 21 is controlled by the drive control unit 211. As described above, the drive control unit 211 receives the detection signal from the washing water sensor 10 and drives the pump 21 when receiving the detection signal. By setting the amount of the chemical solution sent out to the chemical solution discharge pipe 23 by the pump 21 to be a predetermined amount, the mixing amount of the chemical solution when receiving the detection signal becomes constant.

  Next, the operation of this embodiment will be described. When the user approaches the urinal 4 and the valve 3 opens, the rinsing water flows from the primary side pipe 2a of the rinsing water supply path 2 to the secondary side pipe 2b and is discharged into the bowl 4b of the urinal 4. The As a result, the pressure in the detection tube 2d changes or a part of the cleaning water flows in the detection tube 2d, so that the cleaning water sensor 10 including a pressure sensor and a wetting sensor detects the cleaning water. . An electrical signal (detection signal) at the time of this detection is transmitted from the control substrate 100 to the drive control unit 211 of the chemical liquid ejection mechanism 20. When receiving the detection signal, the drive control unit 211 drives the pump 21. As a result, a predetermined amount of the chemical solution is sucked up from the chemical solution tank 22, supplied into the secondary side pipe 2 b via the chemical solution discharge pipe 23, and mixed with the cleaning water. As a result, the wash water mixed with a predetermined amount of the chemical solution is supplied into the bowl portion 4 b of the urinal 4.

  According to the present embodiment, the chemical liquid is not sucked and supplied from the chemical liquid tank 22 using the pressure difference associated with the flow rate change of the cleaning water in the secondary side pipe 2b of the cleaning water supply path 2, but the secondary It is the structure which detects whether washing water flows in the side piping 2b, drives the pump 21, and sucks up a chemical | medical solution. Therefore, even if the flow rate of the cleaning water flowing through the secondary side pipe 2b is small like a water-saving toilet facility, a certain amount of chemical solution can be reliably mixed.

  In addition, when it is set as the structure which supplies a fixed amount of chemical | medical solutions compulsorily by the drive of a pump, it is also considered that it is set as the structure which supplies a chemical | medical solution in the primary side piping 2a upstream from the valve 3, In that case, either Even when water leaks in one urinal, the chemical solution is consumed. Therefore, it is preferable to connect the chemical liquid discharge pipe 23 to the secondary side pipe 2b corresponding to each urinal 4 and mix the chemical liquid as in this embodiment.

DESCRIPTION OF SYMBOLS 1 Urinal washing system 1A Urinal chemical supply device 2 Washing water supply path 2a Primary side piping 2b Secondary side piping 2c Mixing piping part 2d Detection tube 3 Valve 4 Urinal 10 Washing water sensor 100 Control board 20 Chemical solution discharge mechanism 21 Pump 211 Drive control unit 22 Chemical liquid tank 23 Chemical liquid discharge pipe 30 Management device

Claims (6)

Washing supplied from the primary side pipe to the urinal through the secondary side pipe by the opening operation of a valve interposed between the primary side pipe and the secondary side pipe located on the urinal side A chemical supply device for urinals that mixes a chemical with water,
A washing water sensor for detecting the flow of the washing water in the secondary side pipe;
It has a chemical solution discharge pipe connecting the chemical solution tank containing the chemical solution and the secondary side pipe, and discharges the chemical solution in the chemical liquid tank to the secondary side pipe through the chemical solution discharge pipe by driving the pump. A chemical discharge mechanism,
The urinal drug solution supply, wherein the drug solution discharge mechanism includes a drive control unit that drives the pump based on a detection signal for detecting the flow of the wash water in the secondary pipe by the wash water sensor. apparatus.   The urinal chemical supply apparatus according to claim 1, wherein the washing water sensor is a pressure sensor that detects a pressure in the secondary pipe.   The urinal chemical supply device according to claim 1, wherein the washing water sensor is a wetting sensor that detects a contact of washing water flowing in the secondary pipe.   The control board of the cleaning water sensor outputs a detection signal of the cleaning water by the cleaning water sensor to the drive control unit of the chemical liquid discharge mechanism, and manages the number of outputs of the cleaning liquid remaining amount in the chemical liquid tank. The urinal drug supply device according to any one of claims 1 to 3, which is transmitted to the management device. A secondary pipe connected to the primary pipe via a valve and located on the urinal side;
A urinal washing system comprising a urinal chemical supply device for mixing a chemical with wash water supplied to the urinal from the primary side pipe through the secondary side pipe by opening the valve. ,
The urinal cleaning system, wherein the urinal chemical supply device according to any one of claims 1 to 4 is used as the urinal chemical supply device. In the urinal drug supply method for mixing the drug solution with the wash water supplied to the urinal,
Provided with a chemical liquid discharge pipe connecting the secondary side pipe located on the urinal side to the urinal side with a chemical liquid discharge pipe with respect to the primary side pipe, and a pump for sending the chemical liquid in the chemical liquid tank to the chemical liquid discharge pipe And a cleaning water sensor for detecting the flow of the cleaning water in the secondary pipe is disposed,
After the opening operation of the valve, when the flow of the cleaning water in the secondary pipe is detected by the cleaning water sensor, the detection signal is transmitted to the drive control unit of the pump, and the pump is driven to A chemical solution supply method for a urinal, characterized in that a chemical solution in a chemical solution tank is sent to the chemical solution discharge pipe and supplied to the secondary side pipe.