JP2019137594A - Plumbing member - Google Patents

Abstract

To provide a plumbing member that maintains design of a base material and has excellent water scale removability.SOLUTION: A plumbing member has an inorganic base material containing a silicon atom (Si), and a function part provided on the inorganic base material, the function part having the thickness of 10 nm or less, the function part containing a carbon atom, and a carbon atom concentration of the surface measured by X-ray photoelectron spectroscopy (XPS) being 25 at% or more and less than 70 at%.SELECTED DRAWING: None

Description

  The present invention relates to a water circumference member.

A member used around water (hereinafter also referred to as a water member) is used in an environment where water exists. Therefore, water tends to adhere to the surface of the water-surrounding member. There is a known problem that when the water adhering to the surface dries, scales containing silica and calcium, which are components contained in tap water, are formed on the surface of the water supply member. There is also a known problem that dirt such as protein, sebum, mold, microorganisms, soap and the like adheres to the surface of the water member.
Since it is difficult to prevent these stains from adhering to the surface of the water member, it is common practice to remove the stains on the surface by cleaning to restore the original shape. Specifically, these stains are removed by an operation such as rubbing the surface of a water-bowl member with a cloth or sponge using detergent or tap water. There is a demand for facilitating removal of dirt, that is, easy removability of water-related members.
In addition, the water member is also required to have high design properties. In particular, an inorganic base material such as glass or sanitary ware is preferably used on the surface of the water supply member for a beautiful appearance. Therefore, it is required to provide easy removal without impairing the design of the substrate.
In this regard, a descaling technique using a water-repellent antifouling layer is known. Japanese Patent Application Laid-Open No. 2000-265526 describes that an antifouling layer that shields a hydroxyl group on the surface of a pottery is provided to suppress the adhesion of silicate scale dirt. This antifouling layer discloses an antifouling layer obtained by applying and drying a mixture of a hydroxyl group and an alkyl group-containing organosilicon compound, a hydrolyzable group-containing methylpolysiloxane compound, and an organopolysiloxane compound on the surface of the earthenware. . However, the above compound (i) has a large molecular size, and the molecules themselves cannot be densely arranged due to the steric hindrance of the molecule itself. (Ii) Since the interaction between molecules is weak, it is difficult to form a dense layer by self-assembly For this reason, the hydroxyl group on the substrate surface cannot be completely shielded. Therefore, the technique disclosed in Japanese Patent Application Laid-Open No. 2000-265526 can provide sufficient adhesion prevention performance and easy removal performance of scale. could not.
In recent years, self-assembled monolayers (SAMs) that can control physical properties such as surface wettability, lubricity, and adhesion without damaging the substrate shape and optical properties have also been developed (International Publication No. 1). 2004/091810 pamphlet). Also developed is a thin film that consists of a chemisorbed monolayer containing fluorocarbon groups with a thickness that does not impair the original optical properties of the optical member, and is formed in a state in which the constituent molecules are oriented in a chemical bond with the member. (Patent No. 2500152). However, these documents do not describe or suggest any scaling prevention and easy removal of scale.

JP 2000-265526 A International Publication No. 2004/091810 Pamphlet Japanese Patent No. 2500152

  An object of the present invention is to provide a water member that maintains the design of a base material and is excellent in easy removal of scale.

In the functional part provided on the inorganic base material of the water supply member, which contains silicon atoms (Si), the present inventors increase the carbon atom concentration to a predetermined value or more, and form the functional part densely. It has been found that most of the hydroxyl groups on the surface of the substrate can be shielded to suppress the adhesion of scale on the surface of the base, and the scale adhering to the surface of the base can be easily removed. The present inventors have completed the present invention based on this finding. That is, the present invention
An inorganic substrate containing silicon atoms (Si);
A water member including a functional part provided on the inorganic base material,
The functional part has a thickness of 10 nm or less,
The functional part includes a carbon atom,
Provided is a water-surrounding member having a surface carbon atom concentration measured by X-ray photoelectron spectroscopy (XPS) of 25 at% or more and less than 70 at%.

  ADVANTAGE OF THE INVENTION According to this invention, the water-surrounding member excellent in the easily removed scale can be provided, without impairing the design of a base material.

It is the schematic showing the structure of the water periphery member of this invention which formed the functional part on the base material. It is the schematic which represented the functional part formed on the base material in the water periphery member of this invention on the molecular level. It is the schematic which represented the functional part formed on the base material in the water periphery member of a prior art at the molecular level. The carbon (C1s) spectrum obtained by the XPS analysis of the sample 15 is shown. The depth profile of the carbon atom concentration obtained by XPS analysis of Sample 15 is shown. The infrared reflection absorption spectrum of the samples 13 and 14 is shown.

  As shown in FIG. 1, the water-surrounding member of the present invention is a water-surrounding member 100 including an inorganic base material 70 containing silicon atoms (Si) and a functional unit 10 provided on the inorganic base material. . A direction from the inorganic base material 70 toward the functional unit 10 is defined as a Z direction. The inorganic base material 70 and the functional unit 10 are arranged in this order in the Z direction.

The functional part of the water-surrounding member of the present invention contains carbon atoms. Preferably, the functional part contains a hydrocarbon and has a C—C bond and a C—H bond. It can be confirmed, for example, by XPS that the functional unit has a C—C bond and a C—H bond (see FIG. 4 described later). Further, the carbon atom concentration on the surface of the water member measured by X-ray photoelectron spectroscopy (XPS) is 25 at% or more and less than 70 at%.
The functional part formed so as to have such a carbon atom concentration is dense and has a sufficient water scale removal property.

  The carbon atom concentration is preferably 28 at% or more. The carbon atom concentration is preferably 60 at% or less, and more preferably 40 at% or less. By making the carbon atom concentration in such a range, it is possible to improve the ease of removing scale.

The following can be inferred as a mechanism for improving the ease of water scale removal when the carbon atom concentration is in a specific range. That is, as shown in FIG. 2A, when the carbon atom concentration on the surface of the water-circulating member 100 is 25 at% or more, the distance d between the hydrocarbon chains constituting the functional unit 10 becomes narrow, and In order to suppress the bonding with the hydroxyl group of the base material 70, it is presumed that the easy removal of scale is improved. When the carbon atom concentration is 28 at% or more, the distance d between the hydrocarbon chains constituting the functional unit 10 becomes narrow, and the surface of the water-circulating member 100 has water repellency. Inferred to be improved. Here, “spacing d” is an average value of spacing between hydrocarbon chains.
On the other hand, in the technique disclosed in Japanese Patent Application Laid-Open No. 2000-265526, the following reason is presumed as the reason why sufficient adhesion prevention performance and easy removal of scale could not be obtained. That is, as shown in FIG. 3, in the member 200, since the distance d between the hydrocarbon chains constituting the functional unit 10 is wide, the scale S binds to the hydroxyl group of the base material 70 and is difficult to be removed. Inferred.

The carbon atom concentration on the surface of the water-surrounding member of the present invention can be determined by X-ray photoelectron spectroscopy (XPS) as follows. For example, X-ray conditions (100 μm, 25 W, 15 kv), neutralization gun conditions (emission: 20 μA), ion gun conditions (beam: 1.000 kV, TargetEmission: 7.00 mA), and tilt of the X-ray source (Mgkα, Alkα) A spectrum is obtained by surveying all elements in the range of 15.5 to 1100 eV under the conditions of an angle of 5 ° and a step (20 ms). The spectrum includes carbon atoms (C1s) detected from the functional part and atoms detected from the substrate, for example, silicon atoms (Si2p), oxygen atoms (O1s), tin atoms (Sn3d5) in the case of a glass substrate. It is measured in the form that includes each of From the obtained spectrum, for example, using data analysis software (MultiPuk), the C1s peak was 284.5 eV, charge correction was performed, and then the carbon atom concentration calculated in consideration of the sensitivity coefficient from the measured photoelectron peak of each atom ( (at%) can be calculated as a surface concentration representing the density of carbon atoms contained in the functional part of the present invention.
Prior to the measurement, the surface of the water member is cleaned to sufficiently remove the dirt adhering to the surface.

The functional part of the water-surrounding member of the present invention has a thickness of 10 nm or less, preferably 5 nm or less, and more preferably 3 nm or less. By setting the thickness of the functional part in such a range, it is possible to impart easy removal of scale without impairing the design of the base material. Here, the “thickness” of the functional part refers to the length of the functional part along the Z direction.
Any of X-ray photoelectron spectroscopy (XPS), X-ray reflectance method (XRR), ellipsometry, and surface-enhanced Raman spectroscopy can be used as a method for measuring the thickness of the functional part. For example, when XPS is used, the thickness of the functional part can be measured by so-called XPS depth profile measurement in which surface composition analysis is sequentially performed while exposing the inside of the sample by using both XPS measurement and argon ion sputtering (described later). FIG. 5). A distribution curve obtained by such XPS depth profile measurement can be created with the vertical axis as the atomic ratio of carbon atoms (unit: at%) and the horizontal axis as the sputtering time. In the distribution curve having the horizontal axis as the sputtering time, the sputtering time is generally correlated with the distance from the surface in the depth direction. As the distance from the surface of the water-surrounding member (functional part) in the Z direction, the distance from the surface of the water-surrounding member (functional part) is calculated from the relationship between the sputter speed and the sputtering time employed in the XPS depth profile measurement. be able to. The measurement point at the sputtering time of 0 minutes is the surface (0 nm), and measurement is performed until the distance from the surface is 20 nm. The carbon concentration in the vicinity of a depth of 20 nm from the surface is defined as the carbon atom concentration in the substrate. The carbon atom concentration is measured from the surface in the depth direction, and the maximum depth at which the carbon atom concentration is 1 at% or more higher than the carbon atom concentration of the substrate is evaluated as the thickness of the functional part.

  In the water-surrounding member of the present invention, the functional part further includes a silicon atom (Si), preferably bonded to the silicon atom (Si) contained in the inorganic base material via a Si—O bond and fixed to the base material. The Thereby, scale removability can be expressed over a long period of time. The fact that the functional part is bonded to the inorganic base material through the Si—O bond can be confirmed by, for example, time-of-flight secondary ion mass spectrometry (TOF-SIMS) or surface enhanced Raman spectroscopy.

  In the water-surrounding member of the present invention, the functional part is preferably a monomolecular layer. By making the functional part a monomolecular layer, the carbon atom concentration can be increased and the denseness can be improved without impairing the design properties of the base material, and sufficient easy removal of scale can be imparted. Here, the monomolecular layer refers to a layer made of organic molecules and having a thickness approximately equal to the length of one molecule of the constituent molecules. Examples of the monomolecular layer include a self-assembled monolayer (SAM). Here, the self-assembled monolayer (SAM) is a molecular assembly formed on the substrate surface in the process of adsorbing organic molecules on the solid surface, and the assembly constituting molecules are formed by the interaction between the adsorbed molecules. Means something that is densely gathered. In the present invention, the organic molecule constituting the monomolecular layer further includes a silicon atom (Si), and forms a bond with the silicon atom (Si) contained in the inorganic base material via the Si—O bond. It is preferably fixed to the substrate.

The hydrocarbon chains of the molecules constituting the monomolecular layer may be regularly arranged and may have a structure in which the hydrocarbon chains are oriented in the same direction or a structure in which the hydrocarbon chains are not oriented. In the present invention, it is preferable that the hydrocarbon chain of the functional part has a non-oriented structure. In the oriented structure, the hydrocarbon chain is considered to have a linear shape. On the other hand, in an unoriented structure, it is considered that the hydrocarbon chain takes a bent structure and lies on the substrate. Therefore, it is considered that the structure that is not oriented can more efficiently cover the hydroxyl group on the substrate, and even when the carbon atom concentration is relatively low, the bond between scale dirt and the hydroxyl group on the substrate can be inhibited. Conceivable.
The orientation structure of the hydrocarbon chain can be evaluated by an infrared reflection absorption spectroscopy (IRRAS) method. Structure peak around 2917cm ^-1 and 2847cm ^-1 derived from CH ₂ groups regularly arranged are oriented what is detected, it determines a structure in which these peaks are not oriented shall not be detected (to be described later (See FIG. 6).

  The water-surrounding member of the present invention preferably has a contact angle with water on the surface of the water-surrounding member of 90 ° or more, more preferably 100 ° or more. By making the contact angle of the surface of the water-surrounding member with water in such a range, it is possible to further enhance the easily removable scale. The contact angle can be determined using, for example, a contact angle meter (model number: SDMs-401, manufactured by Kyowa Interface Science Co., Ltd.).

  The functional part of the water-surrounding member of the present invention preferably further contains a fluorine atom. Thereby, the easy removal of scale can be further enhanced. The fluorine atom concentration measured by X-ray photoelectron spectroscopy (XPS) is preferably 20 at% or less. By setting the fluorine atom concentration in such a range, a decrease in the carbon atom concentration due to steric hindrance of the molecule can be suppressed.

  The fluorine atom concentration on the surface of the water-surrounding member of the present invention can be determined by X-ray photoelectron spectroscopy (XPS) as follows. For example, X-ray conditions (100 μm, 25 W, 15 kv), neutralization gun conditions (emission: 20 μA), ion gun conditions (beam: 1.000 kV, TargetEmission: 7.00 mA), and tilt of the X-ray source (Mgkα, Alkα) A spectrum is obtained by surveying all elements in the range of 15.5 to 1100 eV under the conditions of an angle of 5 ° and a step (20 ms). The spectrum includes fluorine atoms (F) and carbon atoms (C1s) detected from the functional part, and atoms detected from the substrate, for example, silicon atoms (Si2p) and oxygen atoms (O1s) in the case of a glass substrate. , Tin atoms (Sn3d5) and the like. From the obtained spectrum, for example, using data analysis software (MultiPuk), the C1s peak was 284.5 eV, and after charge correction, the fluorine atom concentration calculated in consideration of the sensitivity coefficient from the measured photoelectron peak of each atom ( at%) can be calculated.

  Examples of the material constituting the inorganic base material of the water-surrounding member of the present invention include glass, ceramics, enamel, and ceramics, and preferably contains glass or ceramics. In the present invention, the inorganic base material contains silicon atoms (Si). The inorganic base material may be composed of only one material, or may be composed of two or more materials. The surface property of the inorganic base material is not particularly limited, and can be applied to a glossy mirror surface and a matte surface such as a satin or a hairline. The substrate is preferably a sanitary ware. Alternatively, the substrate is preferably a mirror.

  The water supply area in which the water supply member of the present invention is used may be any place where water is used, and examples thereof include houses, public facilities such as parks and department stores, and are used in bathrooms, washrooms, kitchens, toilets, and the like. . Specifically, mirrors, bathroom mirrors, bathroom mirrors, walls, floors, doors, bathroom doors, windows, bathtubs, washbasins, wash basins, shower booth walls, kitchen counters, kitchen sinks, drains, toilets It is preferably used as a urinal, a warm water flush toilet seat, a toilet lid of a warm water flush toilet seat, a nozzle of a warm water flush toilet seat, and the like. The water-use member of the present invention is more preferably used as a bathroom mirror, a bathroom mirror, a shower booth wall, a door, a bathroom door, a bathtub, a washbasin, a hand-washer, a toilet, or a urinal.

The specific example of the method of manufacturing the water periphery member of this invention is shown below.
In this invention, after wash | cleaning an inorganic base material, a functional part is formed by making the inorganic base material contact the solution containing the organosilane compound represented by the below-mentioned General formula (1). The method for bringing the solution into contact with the inorganic base material is not particularly limited. For example, a dipping method in which the inorganic base material is immersed in the solution, a coating method by spraying or wiping, or a mist method in which the inorganic base material is brought into contact with the mist of the solution. A method is mentioned. Preferably, the functional part is formed by an immersion method in which an inorganic base material is immersed in a solution. The temperature and immersion time for immersing the inorganic base material in the solution vary depending on the type of the inorganic base material and the organic silane compound, but are generally 0 ° C. or higher and 60 ° C. or lower and 1 minute or longer and 48 hours or shorter. It is preferable to heat the inorganic substrate after forming the functional part on the inorganic substrate. Thereby, the coupling | bonding of a function part and an inorganic base material is accelerated | stimulated, and the abrasion resistance of a function part improves.

  Moreover, in this invention, after wash | cleaning a base material, you may form a functional part by making the vapor | steam of the organosilane compound represented by General formula (1) contact the said inorganic base material. The method for bringing the vapor into contact with the inorganic base material is not particularly limited. For example, the inorganic base material is placed in a heating furnace saturated with an organosilane compound. The temperature and time for bringing the inorganic base material into contact with the vapor vary depending on the kind of the inorganic base material and the organosilane compound, but are generally 80 ° C. or higher and 250 ° C. or lower and 1 minute or longer and 48 hours or shorter.

In the present invention, an organic silane compound represented by the general formula (1) can be used as the organic molecule for forming the functional part.
YR-SiX ₃ (1)
Here, X is independently selected from the group consisting of Cl, OCH ₃ and OC ₂ H ₅ . X is preferably OCH ₃ . R is a hydrocarbon group. R is preferably a hydrocarbon group having 3 to 25 carbon atoms. R ¹ is more preferably a hydrocarbon group having 5 to 20 carbon atoms. R is still more preferably a hydrocarbon group having 9 to 18 carbon atoms. Y is selected from the group consisting of Cl, SO ₃ , COOH, PO ₃ H, NH ₂ , CH ₃ and CF ₃ . Y is preferably CH ₃ or CF ₃ . Y is more preferably CH ₃ . When Y is a CH ₃ group, a denser functional part can be obtained and the carbon atom concentration can be increased. In the case of an organosilane compound having a large number of carbon atoms, the interaction between hydrocarbon groups is large, and a denser functional part can be obtained. On the other hand, when the number of carbon atoms is too large, the formation rate of the functional part is slow and the production efficiency is deteriorated. The organic silane compound represented by the general formula (1) is preferably octadecyltrimethoxysilane, hexadecyltrimethoxysilane, dodecyltrimethoxysilane, decyltrimethoxysilane, octyltrimethoxysilane, hexyltrimethoxysilane, and more. Preferred are octadecyltrimethoxysilane, hexadecyltrimethoxysilane, dodecyltrimethoxysilane, and decyltrimethoxysilane. More preferably, it is octadecyltrimethoxysilane.

  The following examples further illustrate the present invention. The present invention is not limited to these examples.

1. Sample preparation 1-1. Base material As a base material, soda lime glass plates (samples 1 to 12, 17, 18, 21, and 22), silicon wafers (samples 13 and 14), and sanitary ware (samples 15, 16, 19 and 20) were used. In order to remove the dirt on the surface of the substrate, the substrate was ultrasonically washed with an aqueous solution containing a neutral detergent, and the substrate was thoroughly washed with running water after washing. Furthermore, in order to remove the neutral detergent of the base material, ultrasonic cleaning was performed with ion exchange water, and then water was removed with an air duster.

1-2. Formation of functional part (samples 1-5, 13, 15 and 17-19)
A solution containing octadecyltrimethoxysilane and its hydrolyzate was used as a treating agent for forming the functional part. This solution contains octadecyltrimethoxysilane, its hydrolyzate, and aromatic hydrocarbons.
First, the base material was introduced into an optical surface treatment apparatus (PL21-200 (S), manufactured by Sen Engineering Co., Ltd.) and irradiated with UV ozone for a predetermined time. Next, the substrate irradiated with UV ozone was immersed in a treatment agent for a predetermined time, and washed with a hydrocarbon-based cleaning agent. Then, it was dried for a predetermined time at a predetermined temperature with a dryer, and a functional part was formed on the substrate surface.

(Samples 6-12, 14, 16, 20, and 21)
Octadecyltrimethoxysilane, hexadecyltrimethoxysilane, dodecyltrimethoxysilane, or decyltrimethoxysilane was used as a raw material for forming the functional part.
First, the base material was introduced into an optical surface treatment apparatus (PL21-200 (S), manufactured by Sen Engineering Co., Ltd.) and irradiated with UV ozone for a predetermined time. Next, the base material irradiated with UV ozone was heated for a predetermined time in a heating furnace saturated with the raw material to form a functional part on the surface of the base material.

(Sample 22)
A commercial product having a functional part formed on a glass substrate was used. The functional part contained a fluorine atom.

2. Analysis / Evaluation Method The following analysis / evaluation was performed for each sample created above.
2-1. Water droplet contact angle measurement A contact angle meter (model number: SDMs-401, manufactured by Kyowa Interface Science Co., Ltd.) was used to measure the water droplet contact angle of each sample. The measurement results are shown in Table 1.

2-2. Easy removal of dirt 20 μl of tap water was dropped on the surface of each sample obtained in samples 1 to 22 and allowed to stand for 24 hours to form scale on the sample surface. Samples that formed scales were evaluated by the following procedure.
(I) An appropriate amount of tap water was applied to the surface of the sample, and the sample was reciprocated 10 times while applying a light load to the sample surface using a sponge urethane foam surface.
(Ii) If the scale cannot be completely removed in (i), apply an appropriate amount of neutral detergent for bathroom cleaning to the surface of the sample, and use the urethane foam surface of the sponge to lighten the surface of the sample. The sample was slid back and forth 10 times while applying a load.
Table 3 shows what was removed in step (i) as “3”, what was removed in step (ii) as “2”, and what could not be removed in step (ii) as “1”. Summarized in 1.
Whether or not the scale can be removed was determined by visually observing whether the scale remained on the sample surface after washing the sample surface with running water and removing moisture with an air duster.

2-3. Evaluation of Denseness of Functional Part The denseness of the functional part was evaluated using the carbon atom concentration obtained by X-ray photoelectron spectroscopy (XPS). Before the evaluation, each sample of Samples 1 to 22 was wiped and washed with a Kimwipe (Nippon Paper Crecia) impregnated with acetone, and then ultrasonically washed with an aqueous solution containing a neutral detergent. The substrate was washed away. Furthermore, in order to remove the neutral detergent of the base material, ultrasonic cleaning was performed twice with ion-exchanged water, and then water was removed with an air duster to sufficiently remove the surface contamination. As a measuring device, PHI5000 VersaProbe (manufactured by ULVAC-PHI) was used. The measurement conditions were X-ray conditions (100 μm, 25 W, 15 kv), neutralization gun conditions (emission: 20 μA), ion gun conditions (beam: 1.000 kV, TargetEmission: 7.00 mA), and measurement of the surface of water-related members In order to carry out, survey measurement was performed for all elements in the range of 15.5 to 1100 eV with the inclination angle of the X-ray source (Mgkα, Alkα) being 5 ° and the step (20 ms).
The spectrum includes carbon atoms (C1s) detected from the functional part and atoms detected from the base material, for example, glass atoms, silicon atoms (Si2p), oxygen atoms (O1s), tin atoms (Sn3d5) Is measured in a form that includes each of The obtained spectrum was measured using the data analysis software (MultiPuk), charge-corrected with a C1s peak of 284.5 eV, and the carbon atom concentration (at%) in consideration of the sensitivity coefficient from the measured photoelectron peak of each atom. Was calculated. The results are shown in Table 1. As a measurement example, the carbon (C1s) spectrum of Sample 15 is shown in FIG.

2-4. Measurement of fluorine atom concentration The fluorine atom concentration was measured by the same method as the measurement of the carbon atom concentration. All samples had a fluorine atom concentration of 1% or less.

2-5. Thickness evaluation of functional part The thickness of the functional part was evaluated by XPS depth profile measurement. The XPS measurement was performed under the same conditions as the measurement of the carbon atom concentration. Argon ion sputtering conditions were such that the sputtering rate was 1 nm / min. Using this sputtering speed, the sputtering time was converted to a distance from the surface of the water-circulating member in the Z direction. The measurement point at a sputtering time of 0 minutes was defined as the surface (0 nm), and the measurement was performed until the distance from the surface was 20 nm deep. The carbon concentration in the vicinity of a depth of 20 nm from the surface was defined as the carbon atom concentration in the substrate. The carbon atom concentration was measured in the depth direction from the surface of the water member, and the maximum depth at which the carbon atom concentration was 1 at% or more higher than the carbon atom concentration of the base material was evaluated as the thickness of the functional part. In any sample, the thickness of the functional part was 3 nm or less. As a measurement example, an XPS depth profile of the sample 15 is shown in FIG.

2-6. Evaluation of Orientation of Functional Part Constituent Molecules The oriented structure was evaluated by an infrared reflection absorption spectroscopy (IRRAS) method. The measurement apparatus used was Varian 660-IR (Varian), and analysis was performed with a high-sensitivity angle variable reflection IR attachment (HARRICK SCIENTIFIC) attached to the apparatus. The measurement conditions were incident angle: 85 °, measuring instrument: transmission MCT, integration number: 1024 times, wave number resolution: 4 cm ⁻¹ , scan speed: 25 kHz. As a measurement example, the spectra of Samples 13 and 14 are shown in FIG. Sample 13, since the peak was detected around 2917 cm ^-1 and 2847cm ^-1, was determined to be aligned. On the other hand, it was determined that Sample 14 was not oriented because these peaks were not detected.

Claims (17)

An inorganic substrate containing silicon atoms (Si);
A water member including a functional part provided on the inorganic base material,
The functional part has a thickness of 10 nm or less,
The functional part includes a carbon atom,
A water member having a surface carbon atom concentration of 25 at% or more and less than 70 at% as measured by X-ray photoelectron spectroscopy (XPS).   The water function member according to claim 1, wherein the functional part further includes a silicon atom (Si), and is bonded to the silicon atom (Si) contained in the inorganic base material through a Si-O bond.   The water-surrounding member according to claim 1 or 2, wherein the functional part has a thickness of 5 nm or less.   The water-surrounding member according to claim 3, wherein the thickness of the functional part is 3 nm or less.   The water function member according to any one of claims 1 to 4, wherein the functional part includes a hydrocarbon and has a C-C bond and a C-H bond.   The water-surrounding member according to any one of claims 1 to 5, wherein a contact angle with water is 90 ° or more.   The water function member according to any one of claims 1 to 6, wherein the functional part further includes a fluorine atom.   The water-surrounding member according to claim 7, wherein the fluorine atom concentration on the surface measured by X-ray photoelectron spectroscopy (XPS) is 20 at% or less.   The water circumference member according to any one of claims 1 to 8, wherein the inorganic base material includes at least one of glass and ceramics.   The water-surrounding member according to claim 9, wherein the inorganic base material is sanitary ware.   The water-surrounding member according to claim 9, wherein the inorganic base material is a mirror.   The water-surrounding member according to any one of claims 1 to 11, wherein the carbon atom concentration measured by XPS is 28 at% or more.   The water-surrounding member according to any one of claims 1 to 12, wherein the carbon atom concentration measured by XPS is 60 at% or less.   The water-surrounding member according to any one of claims 1 to 13, wherein a contact angle with water is 100 ° or more.   The water function member according to claim 1, wherein the functional unit is a monomolecular layer.   The water-surrounding member according to claim 15, wherein in the functional part, hydrocarbon chains of molecules constituting the monomolecular layer are not oriented.   The water-surrounding member according to claim 15 or 16, wherein the carbon atom concentration measured by XPS is 40 at% or less.

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