JP2019128334A - Analysis control device, analysis device, analysis control method, and analysis method - Google Patents

Abstract

To provide an analysis control device, an analysis device, an analysis control method, and an analysis method, capable of easily grasping qualitative information of one or a plurality of kinds of elements included in a sample and the quantitative information of a target element.SOLUTION: A value of a parameter corresponding to a target element in the sample is set to a setting part 3. An analysis part 20 is controlled so as to measure a distribution of a signal strength in a range of a value of a previously set parameter by an analysis control part 4. The analysis part 20 is controlled so that the value of the signal strength about the value of the set parameter is measured with sensitivity higher than that when measuring the distribution of the signal strength. Profile data indicating the distribution of the signal strength obtained by the measurement of the analysis part 20 and strength data indicating the value of the signal strength are generated by a data generation part 5. A display part 16 is controlled by a display control part 6, so as to overlap and display a profile based on the generated profile data and a strength index based on strength data.SELECTED DRAWING: Figure 2

Description

  The present invention relates to an analysis control apparatus, an analysis apparatus, an analysis control method, and an analysis method for analyzing a sample.

  As an analyzer using ICP (Inductively Coupled Plasma: inductively coupled plasma), an ICP mass spectrometer and an ICP emission spectrometer are known (see Patent Documents 1 to 3). There are two types of ICP emission spectroscopic analyzers: a sequential type and a multi-channel type. Hereinafter, among the elements contained in the sample, an element selected by the user is referred to as a target element, and an element other than the target element is referred to as a coexistent element.

  In an ICP mass spectrometer, atomic ions generated from a sample by ICP are scanned and a mass spectrum indicating the intensity of atomic ions in the range of the total mass-to-charge ratio is generated. It is possible to estimate the element contained in the sample from the mass-to-charge ratio of the peak in the mass spectrum. In addition, the selected ion monitoring measurement is performed for the target element selected by the user. The target element is quantified from the intensity of the peak in the mass-to-charge ratio of the target element obtained by the measurement.

  In a sequential type ICP emission spectroscopic analyzer, atoms contained in a sample are excited by ICP to emit light. The generated light is wavelength-dispersed by the diffraction grating, and only light having a specific wavelength is detected by the detector. By performing wavelength scanning of the detected light, an emission spectrum indicating the emission intensity in the entire wavelength range is generated. It is possible to estimate the element contained in the sample from the peak wavelength in the emission spectrum. Also in the ICP emission spectroscopic analyzer, the target element selected by the user is quantified.

  In the multi-channel ICP emission spectroscopic analyzer of Patent Document 3, the light wavelength-dispersed by the diffraction grating is simultaneously detected by a detector composed of a plurality of light receiving elements. Thereby, an emission spectrum is acquired. Based on the acquired emission spectrum, the quantitative value of the target element and the semiquantitative value (qualitative value) of the desired element are calculated, and the calculated quantitative value and the qualitative value are displayed together on the display unit.

JP 2017-156332 A JP 2011-232106 A JP 2007-333501 A

  In the ICP mass spectrometer, the measurement time (integrated time) is set short in the qualitative analysis. In this case, the accuracy of measurement is reduced, and the dispersion of mass spectrum peaks is increased. Therefore, it is difficult to grasp accurate intensity data from the mass spectrum. Therefore, in the quantitative analysis of a specific element after qualitative analysis, the measurement time is set long. Thereby, intensity data about a specific mass-to-charge ratio is acquired with high accuracy.

  Similarly, in the sequential ICP emission spectroscopic analyzer, the measurement time is set short in the qualitative analysis. In this case, the measurement accuracy is reduced, and the variation of the emission spectrum peaks is increased. Therefore, it is difficult to grasp accurate intensity data from the emission spectrum. Therefore, in the quantitative analysis of a specific element after qualitative analysis, the measurement time is set long. Thereby, intensity data for a specific wavelength is obtained with high accuracy.

  A mass spectrum or an emission spectrum is excellent in listability of a plurality of types of elements contained in a sample, but accurate intensity data of a target element cannot be grasped simultaneously. It is desirable to easily grasp qualitative information on elements contained in a sample and quantitative information on target elements.

  An object of the present invention is to provide an analysis control apparatus, an analysis apparatus, an analysis control method, and an analysis control apparatus capable of easily grasping qualitative information of one or more kinds of elements contained in a sample and quantitative information of the target element. It is to provide an analysis method.

  (1) The analysis control device according to the first aspect of the invention controls an analysis unit that obtains signal intensity depending on the value of a predetermined parameter of an element contained in a sample using inductively coupled plasma, and can be connected to a display unit An analysis control apparatus, a setting unit for setting a parameter value corresponding to a target element in a sample, and controlling the analysis unit to measure a signal intensity distribution in a predetermined parameter value range, It is obtained by the analysis control unit that controls the analysis unit to measure the signal strength value for the parameter value set by the setting unit with higher sensitivity than the measurement of the signal intensity distribution, and by the measurement of the analysis unit. A data generation unit for generating profile data indicating the distribution of the measured signal strength and intensity data indicating the value of the signal strength obtained by measurement by the analysis unit, and a profile generated by the data generation unit. Superposing the intensity index based on the profile and intensity data based on -yl data and a display control unit for controlling the display unit to display.

  In this analysis control apparatus, the value of the parameter corresponding to the target element in the sample is set. The analyzer is controlled to measure the signal intensity distribution in the predetermined parameter value range, and the signal intensity value for the set parameter value is higher than the measurement of the signal intensity distribution. The analysis unit is controlled so as to perform measurement. Profile data indicating the distribution of the signal intensity obtained by the measurement of the analysis unit and intensity data indicating the value of the signal intensity obtained by the measurement of the analysis unit are generated. The display unit is controlled so that the profile based on the generated profile data and the intensity index based on the intensity data are superimposed and displayed.

  Since the concentration of the coexisting element that can interfere with the target element is high, profile data with little peak variation can be obtained even in a short integration. Therefore, it is possible to grasp qualitative information of one or more kinds of elements contained in the sample from the profile based on the profile data. In addition, since the intensity data is measured with high sensitivity, even when the concentration of the target element contained in the sample is low, it is possible to grasp quantitative information of the target element from the intensity index based on the intensity data. Therefore, by superimposing and displaying the profile and the strength index, it is possible to easily grasp qualitative information of one or more types of elements contained in the sample and quantitative information of the target element. Become.

  (2) The analysis control device further includes a specifying unit that specifies a correspondence relationship between the value of the parameter corresponding to the isotope and the abundance ratio of the isotope for the element set in the setting unit, and the display control unit The display unit may be controlled such that an abundance ratio index indicating the magnitude of the abundance ratio of isotopes is further superimposed on the profile and displayed based on the correspondence specified by the part. In this case, the user can easily determine whether or not each of the target elements is interfered by comparing the intensity indicator displayed superimposed on the profile with the abundance indicator.

  (3) The analysis control apparatus further includes a reception unit that receives designation of the type of the target element from the user, and the setting unit corresponds to the target element with a parameter value specific to the type of the target element received by the reception unit. You may set as a value of a parameter to do. In this case, the user can easily set the value of the parameter corresponding to the target element by specifying the desired target element.

  (4) The parameter is a mass-to-charge ratio, the signal intensity represents ion intensity, the analysis unit is a mass analysis unit, and the setting unit sets the value of the mass-to-charge ratio corresponding to the target element as the parameter value. The data generation unit generates mass profile data indicating the relationship between the mass-to-charge ratio and the ionic strength within a predetermined mass-to-charge ratio range, and sets the ionic strength for the mass-to-charge ratio value set by the setting unit. The display control unit may control the display unit to generate intensity data to be displayed, and superimpose a mass profile based on the mass profile data generated by the data generation unit and an intensity index based on the intensity data. . In this case, mass profile data and intensity data indicating ion intensity at mass-to-charge ratio values corresponding to the target element can be easily generated.

  (5) The parameter is the wavelength, the signal intensity represents the emission intensity, the analysis unit is the spectroscopic analysis unit, the setting unit sets the wavelength value corresponding to the target element as the parameter value, and the data generation unit Generates emission profile data indicating a relationship between the wavelength and the emission intensity in a predetermined wavelength range, generates intensity data indicating the emission intensity for the value of the wavelength set by the setting unit, and the display control unit May control the display unit to superimpose and display the light emission profile based on the light emission profile data generated by the data generation unit and the intensity index based on the intensity data. In this case, intensity data indicating the emission intensity at the wavelength value corresponding to the emission profile data and the target element can be easily generated.

  (6) The analyzer according to the second aspect of the invention is an analyzer that obtains signal intensity dependent on the value of a predetermined parameter of an element contained in a sample using inductively coupled plasma, a display, an analyzer, and a display The analysis control device according to the first aspect of the present invention for controlling the operation is provided.

  In this analyzer, the value of the parameter corresponding to the target element in the sample is set. The signal intensity distribution in the predetermined parameter value range is measured by the analysis unit, and the signal intensity value for the set parameter value is higher by the analysis unit than when measuring the signal intensity distribution. It is measured. Profile data indicating the distribution of the signal intensity obtained by the measurement of the analysis unit and intensity data indicating the value of the signal intensity obtained by the measurement of the analysis unit are generated. The profile based on the generated profile data and the intensity index based on the intensity data are superimposed and displayed on the display unit.

  In this case, it is possible to grasp qualitative information of one or more kinds of elements contained in the sample from the profile based on the profile data. It is also possible to grasp quantitative information of the target element from the strength index based on the strength data. Therefore, by overlaying and displaying the profile and the strength index, it becomes possible to easily grasp qualitative information of one or more types of elements contained in the sample and quantitative information of the target element. .

  (7) The analysis control method according to the third aspect of the invention is an analysis that controls an analysis unit that obtains signal intensity dependent on the value of a predetermined parameter of an element contained in a sample using inductively coupled plasma and controls a display unit. A control method, which sets a parameter value corresponding to a target element in a sample, and controls and sets an analysis unit to measure a distribution of signal intensity in a range of a predetermined parameter value. Controlling the analysis unit so as to measure the signal intensity value for the value of the different parameter with higher sensitivity than that of the measurement of the signal intensity distribution, and showing the distribution of the signal intensity obtained by the measurement of the analysis unit A step of generating intensity data indicating the value of the signal intensity obtained by the profile data and the measurement of the analysis unit, and a profile and an intensity based on the generated profile data; And controlling the display unit to display by superimposing the strength index based on the data.

  According to this analysis control method, it is possible to grasp qualitative information on one or more kinds of elements contained in a sample from a profile based on profile data. It is also possible to grasp quantitative information of the target element from the strength index based on the strength data. Therefore, by overlaying and displaying the profile and the strength index, it becomes possible to easily grasp qualitative information of one or more types of elements contained in the sample and quantitative information of the target element. .

  (8) The analysis method according to the fourth aspect of the present invention is an analysis method for obtaining signal intensity depending on the value of a predetermined parameter of an element contained in a sample using inductively coupled plasma, corresponding to a target element in the sample A parameter value distribution to be performed, and a signal intensity distribution in a predetermined parameter value range is measured by the analysis unit, and the signal intensity value for the set parameter value is determined from the signal intensity distribution The step of measuring by the analysis unit with higher sensitivity than the measurement time, the profile data indicating the distribution of the signal intensity obtained by the measurement of the analysis unit, and the intensity data indicating the value of the signal intensity obtained by the measurement of the analysis unit And a step of superimposing a profile based on the generated profile data and an intensity index based on the intensity data on the display unit. No.

  According to this analysis method, it is possible to grasp qualitative information of one or more kinds of elements contained in a sample from a profile based on profile data. It is also possible to grasp quantitative information of the target element from the strength index based on the strength data. Therefore, by overlaying and displaying the profile and the strength index, it becomes possible to easily grasp qualitative information of one or more types of elements contained in the sample and quantitative information of the target element. .

  According to the present invention, it is possible to easily grasp qualitative information of one or more types of elements contained in a sample and quantitative information of target elements.

It is a figure which shows the structure of the analyzer which concerns on one embodiment of this invention. It is a figure which shows the detailed structure of the analyzer of FIG. It is a figure which shows the relationship of the natural isotope of Cd, mass charge ratio, and abundance ratio. It is a figure which shows an example of the mass profile displayed on a display part. It is a figure which shows a part of mass profile enlargedly displayed on the display part. It is a figure which shows a part of mass profile enlargedly displayed on the display part. It is a flowchart which shows the algorithm of the analysis control process performed by an analysis control program.

  Hereinafter, an analysis control apparatus according to an embodiment of the present invention, an analysis apparatus including the same, an analysis control method, and an analysis method including the same will be described in detail with reference to the drawings.

(1) Configuration of Analyzer FIG. 1 is a diagram showing a configuration of an analyzer according to an embodiment of the present invention. As shown in FIG. 1, the analysis device 100 includes an analysis control device 10 and an analysis unit 20. In FIG. 1, the hardware configuration of the analyzer 100 is mainly shown.

  The analysis control device 10 includes a CPU (central processing unit) 11, a RAM (random access memory) 12, a ROM (read only memory) 13, a storage device 14, an operation unit 15, a display unit 16, and an input / output I / F (interface ) 17. The CPU 11, the RAM 12, the ROM 13, the storage device 14, the operation unit 15, the display unit 16, and the input / output I / F 17 are connected to the bus 18.

  The RAM 12 is used as a work area for the CPU 11. The ROM 13 stores a system program. The storage device 14 includes a storage medium such as a hard disk or a semiconductor memory, and stores an analysis control program. The CPU 11 executes an analysis control program stored in the storage device 14 on the RAM 12 to perform analysis control processing described later.

  The storage device 14 stores element information indicating information about a plurality of elements in advance. The element information includes a value of a mass-to-charge ratio specific to the element. In addition, when a natural isotope exists in an element, the element information includes a value of a mass-to-charge ratio specific to each isotope and a correspondence relationship between the value of the mass-to-charge ratio of each isotope and the abundance ratio. including.

  The operation unit 15 is an input device such as a keyboard, a mouse, or a touch panel. The display unit 16 is a display device such as a liquid crystal display device. The user can give various instructions to the analysis control apparatus 10 using the operation unit 15. The display unit 16 can display a spectrum based on the spectrum data generated for the sample. The input / output I / F 17 is connected to the analysis unit 20. Details of the spectrum will be described later.

(2) Operation of Analyzer FIG. 2 is a diagram showing a detailed configuration of the analyzer 100 of FIG. The analysis apparatus 100 of FIG. 2 is an ICP (inductively coupled plasma) mass spectrometer, and includes an analysis control apparatus 10 and an analysis unit 20. In this embodiment, the value of the mass-to-charge ratio (m / z) corresponds to the value of the parameter, and a signal intensity indicating the ion intensity depending on the value of the mass-to-charge ratio (m / z) is obtained. The analysis unit 20 includes a sample supply unit 21, a plasma torch 22, and a mass analyzer 23. The mass analyzer 23 includes a quadrupole mass spectrometer 231 and a mass detector 232.

  The sample supply unit 21 is, for example, an autosampler, and supplies the liquid sample to the plasma torch 22 in a state of being atomized by a nebulizer (not shown). In addition to the sample, a plasma gas such as argon, a cooling gas, a high frequency current, and the like are supplied to the plasma torch 22. The plasma torch 22 generates atomic ions from the sample supplied from the sample supply unit 21 by ICP.

  Atomic ions generated by the plasma torch 22 pass through the quadrupole mass spectrometer 231 and are detected by the mass detector 232. The quadrupole mass spectrometer 231 passes atomic ions having a specific mass-to-charge ratio. The mass-to-charge ratio of atomic ions passing through the quadrupole mass spectrometer 231 is sequentially scanned. The mass detector 232 detects the intensity of atomic ions that sequentially pass through the quadrupole mass spectrometer 231 for each mass-to-charge ratio, and generates a signal corresponding to the ion intensity.

  The analysis control device 10 includes a reception unit 1, a specification unit 2, a setting unit 3, an analysis control unit 4, a data generation unit 5, and a display control unit 6. The data generation unit 5 includes a profile data generation unit 51 and an intensity data generation unit 52. The functions of the constituent elements (1 to 6) of the analysis control apparatus 10 are realized by the CPU 11 of FIG. 1 executing the analysis control program stored in the storage device 14. Some or all of the components (1 to 6) of the analysis control apparatus 10 may be realized by hardware such as an electronic circuit.

  The accepting unit 1 accepts designation of the element type from the user. The user can designate a desired element type by operating the operation unit 15. Hereinafter, among the elements contained in the sample, an element designated by the user is called a target element, and an element other than the target element is called a coexisting element. When natural isotopes exist as target elements, each isotope of the target elements is also simply referred to as a target element. When the natural isotope is present as the target element, the identifying unit 2 identifies the correspondence between the value of the mass of the isotope and the abundance ratio based on the element information stored in the storage device 14.

  The setting unit 3 sets the value of the mass-to-charge ratio specific to the target element based on the element information stored in the storage device 14. When a natural isotope exists in the target element, the setting unit 3 sets a plurality of mass-to-charge ratio values respectively corresponding to the plurality of isotopes based on the element information. Further, when the value of the mass to charge ratio is designated by the user, the setting unit 3 sets the value of the designated mass to charge ratio. The user can designate one or a plurality of desired mass to charge ratio values by operating the operation unit 15.

  Hereinafter, the measurement for the qualitative analysis by the analysis unit 20 is referred to as a first measurement, and the measurement for the quantitative analysis by the analysis unit 20 is referred to as a second measurement. In the first measurement, the analysis control unit 4 controls the analysis unit 20 so as to measure the signal intensity distribution in a predetermined mass-to-charge ratio range. Further, in the second measurement, the analysis control unit 4 measures the value of the signal intensity for the value of the mass-to-charge ratio set by the setting unit 3 with a sensitivity higher than that at the time of the first measurement. To control. Note that the sensitivity of measurement can be increased by increasing the number of times of atomic ion measurement (measurement time).

  The profile data generation unit 51 generates mass spectrum data indicating a mass spectrum based on a signal generated by the mass detector 232 during the first measurement by the analysis control unit 4. Hereinafter, the mass spectrum data generated during the first measurement is referred to as mass profile data. The mass profile indicates the relationship between the mass to charge ratio and the signal within a predetermined range of the mass to charge ratio. In the present embodiment, the signal intensity corresponds to the ion intensity.

  The intensity data generation unit 52 is intensity data indicating ion intensity at the mass-to-charge ratio value set by the setting unit 3 based on the signal generated by the mass detector 232 during the second measurement by the analysis control unit 4. Is generated.

  The display control unit 6 displays the mass profile based on the mass profile data generated by the profile data generation unit 51 and the intensity index based on the intensity data generated by the intensity data generation unit 52 in a superimposed manner on the display unit 16. To control. In the present embodiment, the strength index is a bar graph.

  In addition, when a natural isotope exists in the target element, the display control unit 6 displays an abundance ratio index indicating the abundance ratio of the isotope based on the correspondence specified by the specifying unit 2 as a mass profile. Further, the display unit 16 is controlled so as to be superimposed and displayed. In the present embodiment, the abundance ratio index is a bar graph.

(3) Display Example of Mass Profile Hereinafter, a display example of the mass profile when Cd (cadmium) is designated as the target element will be described. FIG. 3 is a diagram showing the relationship among natural isotopes, mass-to-charge ratios and abundance ratios of Cd. As shown in FIG. 3, there are eight types of Cd isotopes in nature. These isotopes have different mass to charge ratios and inherent natural abundance ratios.

  FIG. 4 is a diagram illustrating an example of a mass profile displayed on the display unit 16. In FIG. 4, the horizontal axis represents the mass-to-charge ratio, and the vertical axis represents the ionic strength. The same applies to FIGS. 5 and 6 described later.

  5 and 6 are diagrams showing a part of the mass profile displayed on the display unit 16 in an enlarged manner. In FIG. 5, a partial range A1 centering on the mass-to-charge ratio “112” of the mass profile of FIG. 4 is shown enlarged.

As shown in FIG. 5, peaks P1 to P7 appear at mass-to-charge ratios “108”, “110”, “111”, “112”, “113”, “114” and “116” in the mass profile. The peaks P1 to P7 correspond to Cd isotopes ¹⁰⁸ Cd, ¹¹⁰ Cd, ¹¹¹ Cd, ¹¹² Cd, ¹¹³ Cd, ¹¹⁴ Cd, and ¹¹⁶ Cd. Intensity indexes I1 to I7 based on the intensity data for ¹⁰⁸ Cd, ¹¹⁰ Cd, ¹¹¹ Cd, ¹¹² Cd, ¹¹³ Cd, ¹¹⁴ Cd, and ¹¹⁶ Cd are superimposed and displayed on the peaks P1 to P7, respectively. The intensity indexes I1 to I7 are shown as bar graphs with hatching patterns.

Further, abundance ratio indices E1 to E7 indicating the abundance ratios of ¹⁰⁸ Cd, ¹¹⁰ Cd, ¹¹¹ Cd, ¹¹² Cd, ¹¹³ Cd, ¹¹⁴ Cd, and ¹¹⁶ Cd are superimposed on peaks P1 to P7, respectively, and intensity indices I1 to I7 are displayed. They are displayed adjacent to each other. The abundance ratio indices E1 to E7 are indicated by dot pattern bar graphs.

  The user can visually grasp the qualitative information of the elements contained in the sample by visually recognizing the mass profile, and at the same time the quantitative information of the target element by visually recognizing the intensity indexes I1 to I7. Can be grasped visually.

  In addition, the user can easily determine whether or not each target element is interfered by comparing the intensity indexes I1 to I7 displayed superimposed on the mass profile with the abundance ratio indexes E1 to E7. can do. For example, when the ratio of the heights of the intensity indexes I1 to I7 is equal to the ratio of the heights of the abundance ratios E1 to E7, it can be determined that the peaks P1 to P7 are not interfered by other coexisting elements. In the example of FIG. 5, the peaks P <b> 1 to P <b> 7 are not affected by interference with other coexisting elements. On the other hand, when the ratio of the heights of the intensity indexes I1 to I7 is different from the ratio of the heights of the abundance ratios E1 to E7, it is assumed that any one of the peaks P1 to P7 is interfered by other coexisting elements Judgment can be made.

  When any target element is interfered, the user can easily identify the coexisting element that interferes with the target element by visually recognizing the mass profile.

  Here, compound ions or multivalent ions of coexisting elements may also interfere with the target element. Therefore, in order to facilitate the search for these ions, the display unit 16 displays a pull-down menu A and an input field B in addition to the mass profile. The user can select a desired compound ion by operating the pull-down menu A using the operation unit 15 of FIG. Compound ions include, for example, oxide ions, chloride ions, or hydroxide ions.

  When the oxide ion is selected from the pull-down menu A in the display state of FIG. 5, as shown in FIG. 6, the range of the mass-to-charge ratio obtained by subtracting the shift amount “16” from the range of the mass-to-charge ratio in FIG. The mass profile in (a partial range A2 centered on the mass-to-charge ratio “96” of the profile in FIG. 4) is displayed on the display unit 16.

As shown in FIG. 6, peaks P11 to P17 appear at mass-to-charge ratios "92", "94", "95", "96", "97", "98" and "100" in the mass profile. Peak P11~P17 corresponds to a isotope Mo ^{(molybdenum) 92 Mo, 94 Mo, 95} Mo, 96 Mo, 97 Mo, 98 Mo and ¹⁰⁰ Mo. The user can easily determine whether the oxide ion of any element (specifically, Mo) interferes with the target element by visually recognizing the displayed mass profile.

  The shift amount when the chloride ion is selected from the pull-down menu A is “35.45”. Further, the shift amount when the hydroxide ion is selected from the pull-down menu A is “17”. These shift amounts may be displayed in the input field B.

  When the shift amount is input to the input column B in the display state of FIG. 5, the mass profile in the mass-to-charge ratio range in which the shift amount input is reduced from the mass-to-charge ratio range in FIG. 16 is displayed. The user inputs an appropriate shift amount into the input field B using the operation unit 15 and visually confirms the displayed mass profile, so that whether or not multivalent ions of any element interfere with the target element. Can be easily determined.

(4) Analysis Control Process FIG. 7 is a flowchart showing an algorithm of the analysis control process performed by the analysis control program. First, the receiving unit 1 determines whether or not the type of the target element has been designated (step S1). The user can specify the type of the target element by operating the operation unit 15. When the type of the target element is designated, the setting unit 3 sets the value of the mass-to-charge ratio of the target element based on the element information stored in the storage device 14 (step S2).

  Further, the specifying unit 2 determines whether or not a natural isotope exists in the target element (step S3). When the isotope does not exist, the specifying unit 2 proceeds to step S8. When the isotope is present, the identifying unit 2 identifies the correspondence between the mass-to-charge ratio value and the abundance ratio of each isotope in the target element based on the element information stored in the storage device 14 (step S4). ), Go to step S8.

  When the type of the target element is not specified in step S1, the setting unit 3 determines whether or not the mass to charge ratio value is specified (step S5). The user can specify a desired mass-to-charge ratio value by operating the operation unit 15. When the value of the mass to charge ratio is not specified, the setting unit 3 returns to step S1. Steps S1 and S5 are repeated until the type of the target element is designated in step S1 or the value of mass to charge ratio is designated in step S5.

  When the mass to charge ratio value is designated in step S5, the setting unit 3 sets the designated mass to charge ratio value (step S6). Thereafter, the setting unit 3 determines whether or not an instruction to add a value of the mass-to-charge ratio is given (step S7). The user can instruct addition of the value of the mass to charge ratio by operating the operation unit 15 and further specifying the value of the mass to charge ratio. Further, the user can instruct the end of the addition of the value of the mass to charge ratio by operating the operation unit 15.

  When the addition of the value of the mass to charge ratio is instructed in step S7, the setting unit 3 returns to step S6. In this case, the setting unit 3 further sets a mass-to-charge ratio value specified additionally. Steps S6 and S7 are repeated until the end of addition of the mass-to-charge ratio value is instructed. If the end of adding the mass-to-charge ratio value is instructed in step S7, the setting unit 3 proceeds to step S8.

  In step S8, the analysis control unit 4 performs the first measurement by the analysis unit 20 (step S8). In this case, in the analysis unit 20, atomic ions are generated from the sample by ICP, and the ion intensity is detected within a predetermined mass-to-charge ratio range. The mass detector 232 generates a signal in the mass to charge ratio range. Next, the profile data generation unit 51 generates mass profile data based on the signal generated from the mass detector 232 (step S9).

  Subsequently, the analysis control unit 4 performs the second measurement by the analysis unit 20 (step S10). In this case, in the analysis unit 20, atomic ions are generated from the sample by ICP, and the ion intensity is detected at any value of the mass-to-charge ratio set in step S2 or step S6. From the mass detector 232, the ion intensity for the set mass-to-charge ratio is detected with high sensitivity. Next, the intensity data generation unit 52 generates intensity data based on the signal generated by the mass detector 232 (step S11).

  Thereafter, the intensity data generation unit 52 determines whether intensity data has been generated for all the mass-to-charge ratio values set in step S2 or step S6 (step S12). If all the intensity data has not been generated, the intensity data generating unit 52 returns to step S10. Steps S10 to S12 are repeated until all the intensity data is generated.

  When all the intensity data is generated, the display control unit 6 superimposes and displays the mass profile based on the mass profile data generated in step S9 and the intensity index based on the intensity data generated in step S11. The display unit 16 is controlled (step S13). When the correspondence relationship is specified in step S4, the display control unit 6 further adds an abundance ratio index indicating the magnitude of the isotope abundance ratio to the mass profile based on the identified correspondence relationship in step S13. The display unit 16 is controlled so as to be displayed in a superimposed manner. Thereafter, the display control unit 6 ends the analysis control process.

(5) Effect In the analyzer 100 according to the present embodiment, the value of the mass-to-charge ratio corresponding to the target element in the sample is set in the setting unit 3. The analysis unit 20 is controlled to measure the distribution of signal intensity in the range of mass-to-charge ratio determined in advance by the analysis control unit 4, and the value of signal intensity for the set value of mass-to-charge ratio is The analysis unit 20 is controlled so as to perform measurement with higher sensitivity than when the distribution is measured. The data generation unit 5 generates profile data indicating the distribution of signal intensity obtained by the measurement of the analysis unit 20 and intensity data indicating the value of the signal intensity obtained by the measurement of the analysis unit 20. The display unit 16 is controlled by the display control unit 6 so that the profile based on the generated profile data and the intensity index based on the intensity data are superimposed and displayed.

  Since the concentration of the coexisting element that can interfere with the target element is high, profile data with little peak variation can be obtained even in a short integration. Therefore, it is possible to grasp qualitative information of one or more kinds of elements contained in a sample from a profile based on profile data. In addition, since the intensity data is measured with high sensitivity, even when the concentration of the target element contained in the sample is low, it is possible to grasp quantitative information of the target element from the intensity index based on the intensity data. Therefore, by overlaying and displaying the profile and the strength index, it becomes possible to easily grasp qualitative information of one or more types of elements contained in the sample and quantitative information of the target element. .

  Further, since the intensity data is displayed on the display unit 16 as an intensity index such as a bar graph, the intensity data can be analyzed without using a separate spreadsheet software.

(6) Other Embodiments (a) In the above embodiment, the analyzer 100 is an ICP mass spectrometer, but the present invention is not limited to this. The analyzer 100 may be a sequential type ICP emission spectroscopic analyzer. In this configuration, the analysis unit 20 includes a spectroscopic analysis unit instead of the mass analyzer 23. The spectroscopic analysis unit includes a diffraction grating, a slit, and a photodetector.

  In the ICP emission spectroscopic analyzer, the sample emits light when excited by ICP in the plasma torch 22. The generated light is wavelength-dispersed by the diffraction grating of the spectroscopic analyzer, and only light having a specific wavelength is detected by the photodetector through the slit.

  Here, at the time of the first measurement, the light intensity distribution is detected in a predetermined wavelength range by sequentially scanning the light wavelengths. At the time of the second measurement, the emission intensity is detected at a higher sensitivity than at the time of the first measurement at the value of the wavelength corresponding to the target element.

  At the time of the first measurement, emission profile data indicating the relationship between the wavelength and the emission intensity is generated based on the signal generated by the photodetector. During the second measurement, intensity data indicating the emission intensity at the wavelength value corresponding to the target element is generated based on the signal generated by the photodetector. The light emission profile based on the generated light emission profile data and the intensity index based on the intensity data are superimposed and displayed on the display unit 16.

  (B) In the above embodiment, the measurement for the quantitative analysis by the analysis unit 20 is performed after the measurement for the qualitative analysis by the analysis unit 20, but the present invention is not limited to this. The measurement for the qualitative analysis by the analysis unit 20 may be performed after the measurement for the quantitative analysis by the analysis unit 20.

  DESCRIPTION OF SYMBOLS 1 ... reception part, 2 ... specification part, 3 ... setting part, 4 ... analysis control part, 5 ... data generation part, 51 ... profile data generation part, 52 ... intensity data generation part, 6 ... display control part, 10 ... analysis Control device, 11 ... CPU, 12 ... RAM, 13 ... ROM, 14 ... storage device, 15 ... operation unit, 16 ... display unit, 17 ... I / F, 18 ... bus, 20 ... analysis unit, 21 ... sample supply unit , 22 ... plasma torch, 23 ... mass analyzer, 231 ... quadrupole mass spectrometer, 232 ... mass detector, 100 ... analyzer, A ... pull down menu, B ... input column, E1 to E7 ... existence ratio index, I1-I7 ... Intensity index, P1-P7, P11-P17 ... Peak

Claims (8)

An analysis control device that uses an inductively coupled plasma to control an analysis unit that obtains a signal intensity that depends on the value of a predetermined parameter of an element contained in a sample, and that can be connected to a display unit,
A setting unit for setting the value of the parameter corresponding to the target element in the sample;
The analysis unit is controlled to measure a signal strength distribution in a predetermined parameter value range, and the signal strength value for the parameter value set by the setting unit is calculated as the signal strength distribution. An analysis control unit that controls the analysis unit to measure with higher sensitivity than at the time of measurement;
A data generator for generating profile data indicating a distribution of signal intensity obtained by measurement of the analyzer and intensity data indicating a value of signal intensity obtained by measurement of the analyzer;
An analysis control apparatus comprising: a display control unit that controls the display unit so as to superimpose and display a profile based on profile data generated by the data generation unit and an intensity index based on intensity data. A specifying unit for specifying a correspondence relationship between a value of a parameter corresponding to an isotope and an abundance ratio of the isotope for the element set in the setting unit;
The display control unit controls the display unit to further superimpose an abundance ratio index indicating the magnitude of the abundance ratio of the isotope on a profile based on the correspondence identified by the identification unit. The analysis control device according to claim 1. A reception unit for receiving designation of the type of the target element from a user;
The analysis control apparatus according to claim 1, wherein the setting unit sets a parameter value specific to the type of the target element received by the receiving unit as a parameter value corresponding to the target element. The parameter is a mass to charge ratio, the signal intensity represents ion intensity,
The analysis unit is a mass analysis unit,
The setting unit sets a value of mass-to-charge ratio corresponding to the target element as the value of the parameter,
The data generation unit generates mass profile data indicating a relationship between mass to charge ratio and ion intensity in a predetermined range of mass to charge ratio, and ion intensity for the value of mass to charge ratio set by the setting unit Generate intensity data indicating
The display control unit according to claim 1, wherein the display control unit controls the display unit to superimpose and display a mass profile based on mass profile data generated by the data generation unit and an intensity index based on intensity data. The analysis control device according to any one of the above. The parameter is a wavelength, and the signal intensity represents emission intensity,
The analysis unit is a spectroscopic analysis unit,
The setting unit sets the value of the wavelength corresponding to the target element as the value of the parameter,
The data generation unit generates emission profile data indicating a relationship between the wavelength and the emission intensity within a predetermined wavelength range, and generates intensity data indicating the emission intensity for the wavelength value set by the setting unit. And
The analysis according to claim 1, wherein the display control unit controls the display unit to display a light emission profile based on the light emission profile data generated by the data generation unit and an intensity index based on the intensity data in a superimposed manner. Control device. An analysis unit for obtaining a signal intensity depending on a value of a predetermined parameter of an element included in a sample using inductively coupled plasma;
A display unit,
An analysis apparatus comprising: the analysis control apparatus according to claim 1 that controls operations of the analysis unit and the display unit. An analysis control method for controlling a display unit and controlling an analysis unit for obtaining a signal intensity depending on a value of a predetermined parameter of an element contained in a sample using inductively coupled plasma,
Setting a parameter value corresponding to the target element in the sample;
The analysis unit is controlled to measure a signal intensity distribution in a predetermined parameter value range, and the signal intensity value for the set parameter value is set to be greater than that at the time of measurement of the signal intensity distribution. Controlling the analyzer to measure with high sensitivity;
Generating profile data indicating a distribution of signal strength obtained by measurement of the analysis unit and intensity data indicating a value of signal strength obtained by measurement of the analysis unit;
And controlling the display unit to superimpose and display a profile based on the generated profile data and an intensity index based on the intensity data. An analysis method for obtaining a signal intensity depending on a value of a predetermined parameter of an element contained in a sample using inductively coupled plasma,
Setting a parameter value corresponding to the target element in the sample;
The signal intensity distribution within a predetermined parameter value range is measured by the analysis unit, and the signal intensity value for the set parameter value is analyzed with higher sensitivity than when the signal intensity distribution is measured. Measuring by the part;
Generating profile data indicating a distribution of signal strength obtained by measurement of the analysis unit and intensity data indicating a value of signal strength obtained by measurement of the analysis unit;
And a step of superimposing a profile based on the generated profile data and an intensity index based on the intensity data on a display unit.

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