JP2019113759A - Method for producing wavelength conversion substrate - Google Patents

Abstract

To provide a method for producing a wavelength conversion substrate in a plurality of regions partitioned by a light-shielding partition wall on the substrate when producing a wavelength conversion substrate by filling a plurality of different types of wavelength conversion material by filling a wavelength conversion material in the aforementioned region which can suppress the mixing of different materials.SOLUTION: Only the photosensitive composition injected into a predetermined region is cured by selectively exposing it, and then only undesired splashes adhering to the region are removed by the cleaning solution after injecting the photosensitive composition containing quantum dots into a predetermined region by an ink jet method when producing a wavelength conversion substrate by filling a wavelength conversion material containing quantum dots by an ink jet method in a predetermined region partitioned by a light-shielding partition wall.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a method of producing a wavelength conversion substrate.

  Conventionally, very small particles (dots) formed to confine electrons are referred to as quantum dots, and their application in various fields has been studied. Here, the size of one quantum dot is several nanometers to several tens of nanometers in diameter, and is composed of about 10,000 atoms.

  Such a quantum dot can change the color (emission wavelength) of emitted fluorescence (wavelength conversion) by changing its size (changing the band gap). For this reason, in recent years, studies on application of quantum dots as a wavelength conversion material to a display element have been made intensively (see Patent Documents 1 and 2).

  As such a display element using quantum dots, an organic light emitting display element provided with an organic light emitting pixel array as a light source, a shielding portion, and a color conversion layer including quantum dots has been proposed (Patent Document 3) See). In the organic light emitting display device described in Patent Document 3, plural types of color conversion layers capable of extracting light of different hues by wavelength conversion are formed in the area divided by the shielding portion. Patent Document 3 proposes an inkjet method as a method of forming a color conversion layer.

JP, 2006-216560, A JP, 2008-112154, A JP, 2016-225273, A

  In the organic light emitting display device described in Patent Document 3, color conversion layers having different constituent materials and compositions which can extract light of different hues are generally formed in adjacent regions. By configuring the color conversion layer in this way, high quality images can be displayed by the organic light emitting display element.

However, in the case where the wavelength conversion material (color conversion layer) is filled between the light shielding partition walls (shielding portion) by the inkjet method, the wavelength conversion material can be efficiently filled in a predetermined region, while the wavelength conversion is performed. There is a problem that mixing of a plurality of materials is likely to occur for the materials.
If mixing of different kinds of materials occurs in the wavelength conversion material, the color purity of the light beam extracted from the wavelength conversion material may be reduced, and it may be difficult to display a high quality image by the display element.

  The mixing of the plurality of materials in the wavelength conversion material is due to the inevitable generation of small satellite droplets around the main ink droplet that is ejected toward the predetermined area in the inkjet method.

Hereinafter, mixing of different materials in the wavelength conversion material will be described with reference to FIG.
In FIG. 1, the ink main droplet made of the photosensitive composition is injected into a predetermined area, whereby the wavelength conversion material 12 is filled in the area partitioned by the partition wall 11 on the substrate 10. At this time, satellite droplets scattered around the main ink droplet land in the area adjacent to the desired area, whereby the droplets 13 adhere to the substrate 10 or the partition wall 11.
The region to which the droplets 13 are attached is then filled with a photosensitive composition different in type from the photosensitive composition that constitutes the droplets 13. Then, when the wavelength conversion material is filled in a desired region, mixing of the material forming the droplet 13 and the material different from the droplet 13 occurs.

  The present invention has been made in view of the above problems, and a plurality of different types of wavelength conversion materials are filled in a plurality of regions partitioned by light shielding partitions on a substrate to make a wavelength conversion substrate. It is an object of the present invention to provide a method for producing a wavelength conversion substrate capable of suppressing mixing of different materials in the wavelength conversion material filled in the above-mentioned region at the time of production.

  When the present inventors fill in the wavelength conversion material containing a quantum dot by the ink jet method in the predetermined field divided by light-shielding partition in a wavelength conversion base material, and manufacture a wavelength conversion base material Then, after injecting a photosensitive composition containing quantum dots into a predetermined area by an ink jet method, only the photosensitive composition injected into the predetermined area is selectively exposed and cured, and then, it is It has been found that the above-mentioned problems can be solved by removing only the adhered droplets with a cleaning liquid, and the present invention has been completed.

That is, the present invention is a method for producing a wavelength conversion base material in which n kinds of wavelength conversion materials are filled in a plurality of regions partitioned by light shielding partition walls on a substrate,
n is an integer of 2 or more,
The at least one wavelength conversion material comprises the following 1) to 3):
1) an injection step of injecting the photosensitive composition into the area by an inkjet method,
2) an exposure step of position-selectively exposing and curing only the photosensitive composition injected into the aforementioned region;
3) a cleaning step of removing uncured droplets of the photosensitive composition by contacting with a cleaning solution after exposure;
The wavelength conversion material is formed by a method including the steps of
A method of manufacturing, wherein the photosensitive composition comprises quantum dots.

  According to the present invention, when a plurality of different types of wavelength conversion materials are filled in a plurality of regions partitioned by the light shielding partition walls on the substrate to manufacture a wavelength conversion substrate, the above regions are filled. It is possible to provide a method for producing a wavelength conversion substrate capable of suppressing mixing of different materials in the wavelength conversion material.

When filling a wavelength conversion material into a desired area | region by the inkjet method, it is a figure which shows typically the state which the droplet adhered to the area | region adjacent to the desired area | region. It is a figure which shows typically the formation method of the 1st wavelength conversion material in the method of forming a 1st wavelength conversion material and a 2nd wavelength conversion material in a wavelength conversion base material. It is a figure which shows typically the formation method of the 2nd wavelength conversion material in the method of forming a 1st wavelength conversion material and a 2nd wavelength conversion material in a wavelength conversion base material. It is a figure which shows typically the cross section of the wavelength conversion base material coat | covered with the planarizing film.

«Method of manufacturing wavelength conversion base material»
In the method of manufacturing a wavelength conversion substrate, a wavelength conversion substrate is manufactured by filling n types of wavelength conversion materials in a plurality of regions partitioned by a light shielding partition on a substrate. Here, n is an integer of 2 or more.

The wavelength conversion material is a material capable of extracting a light beam of another hue different from the hue of the backlight by converting the wavelength of the light beam incident on the wavelength conversion substrate from a light source such as a backlight.
The wavelength conversion material may be filled in all the regions of the plurality of regions divided by the light shielding partition walls in the wavelength conversion substrate, and the region filled with the wavelength conversion material and the wavelength conversion material are filled There may be coexistence with the non-existing area.
In the area where the wavelength conversion material is not filled, nothing may be filled in the recess defined by the substrate and the light shielding partition wall, and the light transmitting property having no wavelength conversion ability The material of the above may be filled.
In the region not filled with the wavelength conversion material, light emitted from a light source such as a backlight is transmitted as it is without wavelength conversion.

  The wavelength conversion material is formed using a photosensitive composition as described later. The photosensitive composition contains quantum dots for the purpose of imparting wavelength conversion ability to the wavelength conversion material.

In the method for producing a wavelength conversion substrate, at least one wavelength conversion material comprises the following 1) to 3):
1) an injection step of injecting the photosensitive composition into the area by an inkjet method,
2) an exposure step of position-selectively exposing and curing only the photosensitive composition injected into the aforementioned region;
3) a cleaning step of removing uncured droplets of the photosensitive composition by contacting with a cleaning solution after exposure;
Are formed in a predetermined region by a method including the steps of

  At the said injection | pouring process, injection | pouring of a photosensitive composition is performed by the inkjet method. Because quantum dots are expensive, photosensitive compositions comprising quantum dots are also expensive. When the inkjet method is employed, only a small amount of waste of the photosensitive composition containing quantum dots occurs during the production of the wavelength conversion substrate. For this reason, it is easy to reduce the manufacturing cost of the wavelength conversion base material.

On the other hand, when the ink jet method is employed, there is a concern that droplets may adhere to the area adjacent to the area to which the photosensitive composition is to be injected due to the landing of the satellite droplets generated with the main ink droplet.
On the other hand, in the exposure step, the exposure is performed only on the area to which the photosensitive composition is to be injected. For this reason, while the photosensitive composition injected into the predetermined area cures, the droplets of the photosensitive composition derived from the satellite droplets adhering to the area adjacent to the predetermined area do not cure.
Then, in the cleaning step, the non-cured droplets are brought into contact with the cleaning solution, whereby the droplets attached to the region other than the desired region are removed.
In this manner, mixing of different materials in the wavelength conversion material is suppressed by removing the droplets adhering to the region other than the desired region.

In the above-mentioned washing step, the washing solution may be an organic solvent, and an embodiment in which the photosensitive composition is alkali-soluble while using a washing solution exhibiting basicity can also be adopted.
Among these, it is preferable to use a combination of a cleaning solution exhibiting basicity and a photosensitive composition which is alkali-soluble. In that case, problems such as film loss and swelling of the light-shielding partition wall and the cured photosensitive composition are less likely to occur when the cleaning is performed with the cleaning solution.

  In the method for producing a wavelength conversion substrate, at least one wavelength conversion material may be formed in a predetermined region by a method including the steps 1) to 3). Since mixing of different materials can be suppressed in all the regions where the wavelength conversion material is formed, n types of wavelength conversion materials are formed in a predetermined region by a method including the steps 1) to 3). Is preferred.

In the method for producing a wavelength conversion substrate, it is preferable that there are two types of wavelength conversion materials. That is, n is preferably 2.
When n is 2, it is preferable to use a blue backlight together with the wavelength conversion substrate. In this case, typically, all of a plurality of regions partitioned by the light-shielding partition walls in the wavelength conversion substrate are regions made of wavelength conversion materials capable of extracting red light, and green light is extracted. It is preferable to be composed of a region made of the wavelength conversion material that can be made and a region not filled with the wavelength conversion material.

As described above, in the region not filled with the wavelength conversion material, nothing may be filled in the recess defined by the substrate and the light shielding partition wall, and has wavelength conversion ability. It may be filled with a translucent material.
In the region not filled with the wavelength conversion material, blue light emitted from the blue backlight is transmitted as it is without wavelength conversion.

  As a result, there is provided a wavelength conversion substrate comprising a region made of wavelength conversion material capable of extracting red light, a region made of wavelength conversion material capable of extracting green light, and a region not filled with wavelength conversion material. The red light (R), the green light (G), and the blue light (B) can be extracted from the wavelength conversion substrate by using together with a blue backlight, so an image display device provided with such a wavelength conversion substrate is high quality. Can display full color images.

In addition to the above steps 1) to 3), the method of filling the wavelength conversion material into the area partitioned by the light shielding partition walls is the following 4) after the step 3):
4) a heating step of heating the cured photosensitive composition in the area after the cleaning step;
It is preferable to include the step of By performing such a heating step, volatile components such as an organic solvent can be removed from the wavelength conversion material filled in a predetermined region, or the wavelength conversion material can be made tight.
In this case, the steps 1) to 4) are repeated in order from the first to the n-th photosensitive composition.

150 degrees C or less is preferable, as for the heating temperature in said heating process, 120 degrees C or less is more preferable, and 100 degrees C or less is especially preferable.
The lower limit of the heating temperature is not particularly limited as long as the desired effect of heating can be obtained. The lower limit of the heating temperature may be, for example, 60 ° C., 80 ° C., or 100 ° C.

  In the case where the partition wall has an upper surface opposite to the surface in contact with the substrate, the wavelength conversion material is preferably filled in a predetermined region so as to cover at least a part of the upper surface of the partition wall. As described above, when the edge portion of the wavelength conversion material covers the upper surface of the partition wall, the portion with the large curvature of the wavelength conversion member deviates from the light guide portion, so that the wavelength of light emitted from the backlight is uniformly converted. can do.

The photosensitive composition preferably comprises light scattering particles together with the quantum dots. By using a photosensitive composition containing light scattering particles, a wavelength conversion material containing light scattering particles is formed.
In the wavelength conversion material containing the light scattering particle, the probability that the light beam is incident on the quantum dot is increased by scattering the light beam incident on the wavelength conversion material by the light scattering particle. For this reason, the wavelength conversion efficiency by a wavelength conversion material is raised.

The viscosity of the photosensitive composition is 5 cp or more and 15 cp or less as the viscosity at 25 ° C., because the dischargeability from the ink jet head in the ink jet method and the shape of the wavelength conversion material filled in a predetermined region are good. preferable.
The viscosity of the photosensitive composition can be adjusted by adjusting the solid content concentration, using a viscosity modifier, or the like.
The viscosity can be calculated, for example, by first measuring the kinematic viscosity of the photosensitive composition and correcting it by the density (specific gravity) of the photosensitive composition separately measured. The density (specific gravity) can be measured using a densitometer DA-650 manufactured by Kyoto Electronics Co., Ltd.

The surface tension of the photosensitive composition is 25 mN / m as a measured value at 25 ° C., because the dischargeability from the ink jet head in the ink jet method and the shape of the wavelength conversion material filled in a predetermined region are good. More than 40 mN / m is preferred.
The surface tension of the photosensitive composition can be adjusted by adjusting the solid concentration, changing the type of the organic solvent, using a surfactant, or the like.
The surface tension can be measured, for example, by using a drop volume method surface tension measurement apparatus TVT2 manufactured by Lauda.

  When each of n types of wavelength conversion materials is formed by a method including the steps 1) to 3), a photosensitive composition is prepared for each of the photosensitive compositions used to form the wavelength conversion materials from the first to the nth The volume average particle diameter of the core portion of the quantum dot contained in the material is equal to or greater than the volume average particle diameter of the core portion of the quantum dot contained in the photosensitive composition used to form the wavelength conversion material in the following order. preferable.

  According to the method described above, n types of wavelength conversion materials are filled by the inkjet method in a plurality of regions on the substrate. After the wavelength conversion material is filled, it is preferable to cover the partition walls and the wavelength conversion material with a planarizing film. By providing the planarization film, the wavelength conversion material is protected, and the lamination process of other members can be stably performed.

  Hereinafter, the method of manufacturing a wavelength conversion base material is demonstrated, referring to FIG.2 and FIG.3 by forming two types of wavelength conversion materials by the method including the process of said 1)-4), respectively. Do. FIG. 2 shows the formation of a first wavelength conversion material using a first photosensitive composition. FIG. 3 shows the formation of a second wavelength conversion material using a second photosensitive composition.

First, as shown in FIG. 2A, the light shielding partition wall 11 is formed on the substrate 10. The method of forming the light-shielding partition 11 is not particularly limited. For example, the light shielding partition wall 11 can be formed by a photolithography method using a photosensitive composition including a light shielding agent such as carbon black.
The height of the partition wall 11 is preferably, for example, 5 μm or more and 20 μm or less. 8 micrometers or more and 12 micrometers or less are more preferable.
The material of the substrate 10 is not particularly limited as long as it is a translucent material. As a material of the board | substrate 10, transparent resin materials, such as glass and acrylic resin and polyester resin (for example, polyethylene terephthalate), can be used, for example.

Next, as shown in FIG. 2B, the first photosensitive composition 101 including quantum dots is injected into the region partitioned by the partition wall 11 by the inkjet method. Under the present circumstances, while the ink main droplet which consists of the 1st photosensitive composition 101 lands in a predetermined area | region, the satellite drop which arises with an ink main droplet lands on the area | region adjacent to a predetermined area | region, and the 1st droplet 102 Can occur.
After the first photosensitive composition 101 is injected into a predetermined region, the first photosensitive composition 101 is prebaked, if necessary, for the purpose of removing volatile components such as organic solvents. It may be applied.

After the injection of the first photosensitive composition 101, as shown in FIG. 2 (c), position-selective exposure is performed only on the first photosensitive composition 101 injected into the predetermined area. .
The light source in the exposure step is not particularly limited, and examples thereof include a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a xenon lamp, a carbon arc lamp, and an LED. Using such a light source, ArF excimer laser coating, KrF excimer laser, _{F 2} excimer laser, extreme ultraviolet (EUV), vacuum ultraviolet (VUV), electron beams, X-rays, soft X-ray, g-line, i-line The first photosensitive composition 101 is exposed by irradiation with radiation or electromagnetic waves such as h-ray, j-ray and k-ray. Also, the position selective exposure here may be performed through a mask (not shown) provided with an opening in a position selective manner. Exposure dose varies depending on the composition of the photosensitive composition, for example, 10 mJ / cm ² or more 2000 mJ / cm ² or less are preferred, 100 mJ / cm ² or more 1500 mJ / cm ² and more preferably less, 500 mJ / cm ² or more 1200 mJ / cm ² or less is further preferable.

After the exposure, as shown in FIG. 2D, the first droplet 102 is removed by contacting with the cleaning solution 14.
The exposed first photosensitive composition 101 is insolubilized in the cleaning solution 14 by being cured by exposure, so that only the uncured first droplets 102 are removed by contact with the cleaning solution 14. .
Even if the second wavelength conversion material 203 is formed as shown in FIG. 3 after the formation of the first wavelength conversion material 103 by removing the first droplets 102, the second wavelength conversion material There is no mixing of dissimilar materials at 203.

  The cleaning liquid 14 is not particularly limited as long as it is a liquid that can dissolve the first droplets 102 or can be peeled off from the substrate 10 or the partition wall 11. The cleaning solution is appropriately selected according to the type and composition of the components contained in the first photosensitive composition 101.

  The method for bringing the cleaning solution 14 into contact with the first droplet 102 is not particularly limited, and an immersion method, a spray method, or the like can be used. Typical examples of the cleaning solution include organic solvents and cleaning solutions exhibiting basicity. As the washing solution, a washing solution exhibiting basicity as described above is preferable. When a cleaning solution exhibiting basicity is used, an alkali-soluble photosensitive composition is used as the first photosensitive composition 101.

  Specific examples of the cleaning solution exhibiting basicity include organic cleaning solutions such as monoethanolamine, diethanolamine and triethanolamine, sodium hydroxide, potassium hydroxide, sodium carbonate, ammonia, quaternary ammonium salts (eg, tetramethyl) And aqueous solutions such as ammonium hydroxide).

After washing using the washing solution 14, preferably, the first photosensitive composition 101 cured by exposure is heated. By heating, volatile component parts such as an organic solvent can be removed from the cured first photosensitive composition 101, and the wavelength conversion material can be made tight. The heating temperature is as described above.
Thus, the first wavelength conversion material 103 is formed in the predetermined region.

After forming the first wavelength conversion material 103 as shown in FIG. 2, as shown in FIG. 3A, quantum dots are formed in a region adjacent to the region where the first wavelength conversion material 103 is formed. The second photosensitive composition 201 including the above is injected by the inkjet method. At this time, the main ink droplet consisting of the second photosensitive composition 201 lands in the predetermined area, and the satellite droplets generated together with the main ink droplet land in the area adjacent to the predetermined area, and the second droplets 202 Can occur.
After the second photosensitive composition 201 is injected into a predetermined region, the second photosensitive composition 201 is prebaked, if necessary, for the purpose of removing volatile components such as an organic solvent. It may be applied.

  After injection of the second photosensitive composition 201, as shown in FIG. 3 (b), position-selective exposure is performed only on the second photosensitive composition 201 injected into the predetermined area. . The exposure is performed in the same manner as the exposure to the first photosensitive composition 101.

After the exposure, as shown in FIG. 3C, the second droplets 202 are removed by contacting with the cleaning solution 14. The cleaning liquid by the cleaning liquid 14 is as described for the formation of the first wavelength conversion material 103.
After washing, as in the formation of the first wavelength conversion material 103, the cured second photosensitive composition is heated to form the first wavelength conversion material 103 and the first wavelength conversion material 103, as shown in FIG. 3 (d). , And a second wavelength conversion material 203 are formed.

For example, when the first wavelength conversion material 103 is a wavelength conversion material capable of extracting red light and the second wavelength conversion material 203 is a wavelength conversion material capable of extracting green light, as shown in FIG. As shown in d), the area other than the area filled with the first wavelength conversion material 103 and the area filled with the second wavelength conversion material 203 is also regarded as an area not filled with the wavelength conversion material. Good.
In this case, as described above, by using the wavelength conversion base in combination with the blue backlight, it is possible to display a full color image using red light, green light and blue light.

  The wavelength conversion substrate obtained through the steps shown in FIGS. 2 and 3 is preferably covered with a planarizing film 15 as shown in FIG.

  Hereinafter, the photosensitive composition used for formation of a wavelength conversion material is demonstrated in detail.

<Photosensitive composition>
The photosensitive composition used to form the wavelength conversion material is not particularly limited as long as it is a photocurable composition containing a quantum dot.
As a preferable photosensitive composition, the photosensitive composition containing a base-material component (A), a quantum dot (B), and a photoinitiator (C) is mentioned. Hereinafter, components which the photosensitive composition may contain will be described.

[Base material component (A)]
The base component (A) is a component that forms a matrix that supports the quantum dots (B), the light scattering particles (D), and the like in a dispersed state in the wavelength conversion material cured after exposure.
As a suitable example of a base-material component (A), a resin component (A1) and a photopolymerizable monomer (A2) are mentioned.

The resin component (A1) is not particularly limited as long as it is a resin conventionally blended in a photopolymerizable photosensitive composition.
The resin component (A1) may contain an alkali soluble resin that is soluble in a basic liquid. When the photosensitive composition contains an alkali-soluble resin as the resin component (A1), it is preferable to use a cleaning liquid exhibiting basicity in the above-mentioned cleaning step.
It is also preferable that the resin component (A1) contains a resin having a photopolymerizable functional group containing an ethylenically unsaturated double bond such as a (meth) acryloyl group.

  Since the photosensitive composition is photocurable, it essentially contains at least one of a resin having a photopolymerizable functional group and a photopolymerizable monomer (A2).

  Hereinafter, the resin component (A1) and the photopolymerizable monomer (A2) will be described.

(Resin component (A1))
As the resin component (A1), unsaturated carboxylic acids such as (meth) acrylic acid, (meth) acrylic esters, and the like because it is easy to control the characteristics of the resin by selecting the kind and composition of monomers, etc. Preferred are homopolymers or copolymers of monomers having unsaturated double bonds such as styrenes.

  As mentioned above, the wavelength conversion material is preferably formed using an alkali-soluble photosensitive composition. Therefore, for the purpose of imparting alkali solubility to the photosensitive composition, the photosensitive composition preferably contains an alkali soluble resin as the resin component (A1).

As alkali-soluble resin, the polymer of the monomer containing unsaturated carboxylic acids, such as (meth) acrylic acid, is mentioned, for example. Examples of unsaturated carboxylic acids include monocarboxylic acids such as crotonic acid; dicarboxylic acids such as maleic acid, fumaric acid, citraconic acid, mesaconic acid and itaconic acid; anhydrides of these dicarboxylic acids; and the like.
The alkali solubility is also imparted to the resin by copolymerizing a monomer having a phenolic hydroxyl group such as hydroxystyrene.

  Furthermore, an alkali-soluble resin can also be obtained by reacting a polybasic acid anhydride with a resin having a hydroxyl group or an amino group. Specific examples of polybasic acid anhydrides include maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyl hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, Trimellitic anhydride, pyromellitic anhydride, benzophenonetetracarboxylic acid dianhydride, 3-methylhexahydrophthalic anhydride, 4-methylhexahydrophthalic anhydride, 3-ethylhexahydrophthalic anhydride, 4-ethylhexa Hydrophthalic anhydride, tetrahydrophthalic anhydride, 3-methyltetrahydrophthalic anhydride, 4-methyltetrahydrophthalic anhydride, 3-ethyltetrahydrophthalic anhydride, 4-ethyltetrahydrophthalic anhydride and the like can be mentioned.

For example, when acrylic acid is reacted with a structural unit derived from glycidyl methacrylate, a structural unit having a hydroxyl group shown in the following reaction formula is generated. By reacting a polybasic acid anhydride such as tetrahydrophthalic acid with a structural unit having such a hydroxyl group, a structural unit having an carboxy group and imparting alkali solubility to a resin is produced.

As alkali-soluble resin used as a resin component (A1), the acrylic resin containing the structural unit derived from (meth) acrylic acid and / or the structural unit derived from (meth) acrylic acid ester is preferable.
(Meth) acrylic acid is acrylic acid or methacrylic acid. The (meth) acrylic acid ester is represented by the following formula (a-1), and is not particularly limited as long as the object of the present invention is not impaired.

In the above formula (a-1), R ^a1 is a hydrogen atom or a methyl group, and R ^a2 is a monovalent organic group. The organic group may contain a bond or a substituent other than a hydrocarbon group such as a hetero atom in the organic group. The organic group may be linear, branched or cyclic.

The substituent other than the hydrocarbon group in the organic group of R ^a2 is not particularly limited as long as the effects of the present invention are not impaired, and a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a cyano group, an isocyano group, a cyanato group , Isocyanato group, thiocyanato group, isothiocyanato group, silyl group, silanol group, alkoxy group, alkoxycarbonyl group, carbamoyl group, thiocarbamoyl group, nitro group, nitroso group, carboxy group, carboxylate group, acyl group, acyloxy group, sulfino Group, sulfo group, sulfonato group, phosphino group, phosphinyl group, phosphono group, phosphonato group, hydroxy imino group, alkyl imino group, alkyl ether group, alkyl thio ether group, aryl ether group, aryl thio ether group, amino group (-NH ₂ , -NHR, -NRR ': R and R Each independently represents a hydrocarbon group) and the like. The hydrogen atom contained in the said substituent may be substituted by the hydrocarbon group. The hydrocarbon group contained in the above-mentioned substituent may be linear, branched or cyclic.

The organic group as R ^a2 may have a reactive functional group such as an acryloyloxy group, a methacryloyloxy group, an epoxy group or an oxetanyl group.
An acyl group having an unsaturated double bond or the like, such as an acryloyloxy group or a methacryloyloxy group, is, for example, acrylic acid or methacryl at least a part of an epoxy group in an acrylic resin containing a structural unit having an epoxy group. It can be produced by reacting an unsaturated carboxylic acid such as an acid.

As R ^a2 , an alkyl group, an aryl group, an aralkyl group or a heterocyclic group is preferable, and these groups may be substituted by a halogen atom, a hydroxyl group, an alkyl group or a heterocyclic group. In addition, when these groups contain an alkylene moiety, the alkylene moiety may be interrupted by an ether bond, a thioether bond or an ester bond.

  When the alkyl group is linear or branched, the number of carbon atoms is preferably 1 or more and 20 or less, more preferably 1 or more and 15 or less, and particularly preferably 1 or more and 10 or less. Examples of suitable alkyl groups include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, isopentyl, sec Pentyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert-octyl group, n-nonyl group, isononyl group, n-decyl group, An isodecyl group etc. are mentioned.

  When the alkyl group is an alicyclic group or a group containing an alicyclic group, suitable alicyclic groups contained in the alkyl group include monocyclic alicyclic groups such as a cyclopentyl group and a cyclohexyl group, and And polycyclic alicyclic groups such as adamantyl group, norbornyl group, isobornyl group, tricyclononyl group, tricyclodecyl group, and tetracyclododecyl group.

As a specific example of a compound represented by a formula (a-1) in case the compound represented by a formula (a-1) has a chain ^| strand-shaped group which has an epoxy group as R ^a2 , glycidyl (meth) is mentioned (Meth) acrylic acid epoxy alkyl esters such as acrylate, 2-methyl glycidyl (meth) acrylate, 3,4-epoxybutyl (meth) acrylate, 6,7-epoxyheptyl (meth) acrylate and the like.

  Moreover, an alicyclic epoxy group containing (meth) acrylic acid ester may be sufficient as the compound represented by Formula (a-1). The alicyclic group constituting the alicyclic epoxy group may be monocyclic or polycyclic. Examples of the monocyclic alicyclic group include a cyclopentyl group and a cyclohexyl group. In addition, examples of the polycyclic alicyclic group include norbornyl group, isobornyl group, tricyclononyl group, tricyclodecyl group, tetracyclododecyl group and the like.

  As a specific example in case the compound represented by Formula (a-1) is alicyclic epoxy group containing (meth) acrylic acid ester, it represents, for example with following formula (a-1 a)-(a-1 o) Compounds can be mentioned. Among these, in order to make developability appropriate, compounds represented by the following formulas (a-1a) to (a-1e) are preferable, and in the following formulas (a-1a) to (a-1c) The compounds represented are more preferred.

In the above formulae, R ^a20 represents a hydrogen atom or a methyl group, R ^a21 represents a divalent aliphatic saturated hydrocarbon group having 1 to 6 carbon atoms, and R ^a22 represents 1 to 10 carbon atoms. Is a hydrocarbon group having a valency of t, and t is an integer of 0 or more and 10 or less. As R ^a21 , a linear or branched alkylene group such as a methylene group, an ethylene group, a propylene group, a tetramethylene group, an ethylethylene group, a pentamethylene group or a hexamethylene group is preferable. The R ^a22, for example, methylene group, ethylene group, propylene group, tetramethylene group, ethylethylene group, pentamethylene group, hexamethylene group, a phenylene group, cyclohexylene _group, -CH 2 _-Ph-CH 2 - is (Ph Phenylene group is preferred).

  The acrylic resin may be one obtained by polymerizing a monomer other than (meth) acrylic acid ester. Examples of such monomers include (meth) acrylamides, unsaturated carboxylic acids, allyl compounds, vinyl ethers, vinyl esters, styrenes and the like. These monomers can be used alone or in combination of two or more.

  (Meth) acrylamides include (meth) acrylamide, N-alkyl (meth) acrylamide, N-aryl (meth) acrylamide, N, N-dialkyl (meth) acrylamide, N, N-aryl (meth) acrylamide, N And -methyl-N-phenyl (meth) acrylamide, N-hydroxyethyl-N-methyl (meth) acrylamide and the like.

  Examples of unsaturated carboxylic acids include monocarboxylic acids such as crotonic acid; dicarboxylic acids such as maleic acid, fumaric acid, citraconic acid, mesaconic acid and itaconic acid; anhydrides of these dicarboxylic acids; and the like.

  As allyl compounds, allyl esters such as allyl acetate, allyl caproate, allyl caprylate, allyl laurate, allyl palmitate, allyl stearate, allyl benzoate, allyl acetoacetate, allyl lactate, etc .; allyloxyethanol; etc. It can be mentioned.

  As vinyl ethers, hexyl vinyl ether, octyl vinyl ether, decyl vinyl ether, ethyl hexyl vinyl ether, methoxyethyl vinyl ether, ethoxyethyl vinyl ether, chloroethyl vinyl ether, 1-methyl-2,2-dimethylpropyl vinyl ether, 2-ethyl butyl vinyl ether, hydroxyethyl vinyl ether Alkyl vinyl ethers such as diethylene glycol vinyl ether, dimethylaminoethyl vinyl ether, diethylaminoethyl vinyl ether, butyl aminoethyl vinyl ether, benzyl vinyl ether, tetrahydrofurfuryl vinyl ether; vinyl phenyl ether, vinyl tolyl ether, vinyl chlorophenyl ether, vinyl-2,4-dichlorophenyl And the like; ethers, vinyl naphthyl ether, vinyl aryl ethers such as vinyl anthranyl ether.

  As vinyl esters, vinyl butyrate, vinyl isobutyrate, vinyl trimethyl acetate, vinyl diethyl acetate, vinyl valerate, vinyl caproate, vinyl chloroacetate, vinyl dichloro acetate, vinyl methoxy acetate, vinyl butoxy acetate, vinyl phenyl Examples include acetate, vinyl acetoacetate, vinyl lactate, vinyl-β-phenyl butyrate, vinyl benzoate, vinyl salicylate, vinyl chlorobenzoate, vinyl tetrachlorobenzoate, vinyl naphthoate and the like.

  As styrenes, styrene; methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene, diethylstyrene, isopropylstyrene, butylstyrene, hexylstyrene, cyclohexylstyrene, decylstyrene, benzylstyrene, chloromethylstyrene, trifluoromethylstyrene, ethoxy Alkylstyrenes such as methylstyrene and acetoxymethylstyrene; alkoxystyrenes such as methoxystyrene, 4-methoxy-3-methylstyrene and dimethoxystyrene; chlorostyrene, dichlorostyrene, trichlorostyrene, tetrachlorostyrene, pentachlorostyrene, bromostyrene, Dibromostyrene, iodostyrene, fluorostyrene, trifluorostyrene, 2-bromo-4-trifluoromethyl Styrene, halostyrenes such as 4-fluoro-3-trifluoromethyl styrene; and the like.

Furthermore, the acrylic resin may contain a structural unit that introduces a cyclic structure into the main chain of the resin. As such a structural unit, a structural unit containing a tetrahydrofuran ring or a tetrahydropyran ring is preferable. For example, a structural unit represented by the following formula (A-1) and a structural unit represented by the following formula (A-2) are mentioned as preferable units.

In the above formulas (A-1) and (A-2), R ^a30 and R ^a31 each independently represent a hydrogen atom or ^{-XR a 32} . Furthermore, X here is a single bond or a divalent linking group, and R ^a32 is each independently a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent. .
Examples of the divalent linking group include an oxygen atom (ether bond; -O-), an ester bond (-C (= O) -O-), an amide bond (-C (= O) -NH-), Non-hydrocarbon oxygen atom-containing linking group such as carbonyl group (-C (= O)-), carbonate bond (-O-C (= O) -O-), etc .; oxygen atom-containing linking group of the non-hydrocarbon system And the like, and the like.
As this combination, for ^{example, -R a33 -O -, - R} a34 -O-C (= O) -, - C (= O) -O-R a35 -O-C (= O) - ( wherein And R ^{a33 to} R ^a35 each independently represent an alkylene group.
The alkylene group of R ^{a33 to} R ^a35 is preferably a linear or branched alkylene group, and the number of carbon atoms of the alkylene group is preferably 1 or more and 12 or less, more preferably 1 or more and 5 or less, and 1 or more Particularly preferred is 3 or less.
As the alkylene group here, specifically, for example, methylene group [-CH _2- ]; -CH (CH ₃ )-, -CH (CH ₂ CH ₃ )-, -C (CH ₃ ) ₂ -,- An alkylmethylene group such as C (CH ₃ ) (CH ₂ CH ₃ )-, -C (CH ₃ ) (CH ₂ CH ₂ CH ₃ )-, -C (CH ₂ CH ₃ ) _2-, etc .; ethylene group [-CH ₂ CH _2- ]; -CH (CH ₃ ) CH _2- , -CH (CH ₃ ) CH (CH ₃ )-, -C (CH ₃ ) ₂ CH _2- , -CH (CH ₂ CH ₃ ) CH _{2 -, - CH (CH 2 CH} 3) CH 2 - alkyl groups such as, trimethylene group (n- propylene _{group) [- CH 2 CH 2 CH} 2 -]; - CH (CH 3) CH 2 CH 2 -, _{-CH 2 CH (CH 3) CH} 2 - and the like alkyl trimethylene ; Tetramethylene group _{[-CH 2 CH 2 CH 2 CH} 2 -]; - CH (CH 3) CH 2 CH 2 CH 2 -, - CH 2 CH (CH 3) CH 2 CH 2 - alkyl tetramethylene group such as ; pentamethylene group _{[-CH 2 CH 2 CH 2 CH} 2 CH 2 -] , and the like.
Among these, a divalent linking group is preferably a group represented by -C (= O) O-, and R ^a30 and R ^a31 are preferably -C (= O) O-R ^a32 .

The hydrocarbon group having 1 to 25 carbon atoms which may have a substituent as Ra ³² is not particularly limited. Specific examples of the hydrocarbon group include linear or branched alkyl such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, tert-pentyl, stearyl, lauryl and 2-ethylhexyl. An aryl group such as phenyl; an alicyclic group such as cyclohexyl, tert-butylcyclohexyl, dicyclopentadienyl, tricyclodecanyl, isobornyl, adamantyl, 2-methyl-2-adamantyl; 1-methoxyethyl; -An alkyl group substituted by alkoxy such as ethoxyethyl; an aralkyl group such as benzyl; and the like.

When R ^a32 is a hydrocarbon group, the hydrocarbon group preferably has 8 or less carbon atoms. As a hydrocarbon group as R ^a32 , a linear or branched alkyl group having 1 to 8 carbon atoms is preferable, and a linear or branched alkyl group having 1 to 5 carbon atoms is preferable. Is preferred.
A methyl group and an ethyl group are mentioned as a specific example of such a preferable hydrocarbon group, A methyl group is preferable.

  The amount of the structural unit having an alkali-soluble group such as a carboxy group or a phenolic hydroxyl group in the acrylic resin is not particularly limited as long as the object of the present invention is not impaired. 5 mass% or more and 50 mass% or less are preferable with respect to the mass of acrylic resin, and, as for the quantity of the structural unit which has alkali-soluble group in acrylic resin, 10 mass% or more and 30 mass% or less are more preferable.

When acrylic resin has a structural unit which has unsaturated double bond, 1 mass% or more and 70 mass% or less are preferable, and, as for the quantity of the structural unit which has unsaturated double bond in acrylic resin, 1 mass% More than 50 mass% is more preferred.
When the acrylic resin contains a structural unit having an unsaturated double bond in an amount within the above range, the acrylic resin can be incorporated into the crosslinking reaction in the resist film and uniformized, so that the heat resistance of the wavelength conversion material, It is effective to improve mechanical characteristics.

  When the acrylic resin has a structural unit for introducing a cyclic structure into the main chain, the amount of the structural unit for introducing the cyclic structure into the main chain in the acrylic resin is preferably 1% by mass or more and 30% by mass or less 1 mass% or more and 20 mass% or less are more preferable.

  2000 or more and 50000 or less are preferable, and, as for the weight average molecular weight of resin components (A1), such as said acrylic resin, 3000 or more 30000 or less are more preferable. By setting it as said range, there exists a tendency to be easy to take the balance of the dischargeability from the inkjet head of a photosensitive composition, and the solubility to the washing | cleaning liquid of the photosensitive composition in a washing | cleaning process.

  The content of the resin component (A1) in the photosensitive composition is preferably 3% by mass to 55% by mass, and more preferably 5% by mass to 45% by mass, with respect to the mass of the entire solid content of the photosensitive composition. In particular, when the binder resin (A) is an alkali-soluble resin, the photosensitive composition which is easily dissolved in the cleaning liquid in the cleaning step can be easily obtained by setting the above range.

(Photopolymerizable monomer (A2))
The photosensitive composition also preferably contains a photopolymerizable monomer (A2) as the base component (A). The photosensitive composition preferably contains a photopolymerizable monomer (A2) together with the above-mentioned resin component (A1). In particular, it is preferable to use a combination of a resin having a structural unit having an unsaturated double bond and a photopolymerizable monomer (A2).
As a photopolymerizable monomer (A2), there exist a monofunctional monomer and a polyfunctional monomer.

  Examples of monofunctional monomers include (meth) acrylamide, methylol (meth) acrylamide, methoxymethyl (meth) acrylamide, ethoxymethyl (meth) acrylamide, propoxymethyl (meth) acrylamide, butoxymethoxymethyl (meth) acrylamide, N-methylol ( Meta) acrylamide, N-hydroxymethyl (meth) acrylamide, (meth) acrylic acid, fumaric acid, maleic acid, maleic anhydride, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, crotonic acid, 2-acrylamido- 2-Methylpropanesulfonic acid, tert-butyl acrylamidesulfonic acid, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate , Cyclohexyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-phenoxy-2-hydroxypropyl (meth) acrylate, 2- (Meth) acryloyloxy-2-hydroxypropyl phthalate, glycerol mono (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, N, N-dimethylaminoethyl (meth) acrylate, glycidyl (meth) acrylate, 2,2,2 -Trifluoroethyl (meth) acrylate, 2,2,3,3- tetrafluoropropyl (meth) acrylate, the half (meth) acrylate of a phthalic acid derivative, etc. are mentioned. These monofunctional monomers can be used alone or in combination of two or more.

  On the other hand, as polyfunctional monomers, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, butylene glycol Di (meth) acrylate, neopentyl glycol di (meth) acrylate, 1,6-hexane glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, glycerin di (meth) acrylate, pentaerythritol triacrylate, pentaerythritol Tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, pentaerythritol di (meta Acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 2,2-bis (4- (meth) acryloxydi) Ethoxyphenyl) propane, 2,2-bis (4- (meth) acryloxypolyethoxyphenyl) propane, 2-hydroxy-3- (meth) acryloyloxypropyl (meth) acrylate, ethylene glycol diglycidyl ether di (meth) Acrylate, diethylene glycol diglycidyl ether di (meth) acrylate, phthalic acid diglycidyl ester di (meth) acrylate, glycerin triacrylate, glycerin polyglycidyl ether poly Meta) acrylate, urethane (meth) acrylate (ie, tolylene diisocyanate), reaction product of trimethylhexamethylene diisocyanate with hexamethylene diisocyanate and 2-hydroxyethyl (meth) acrylate, methylene bis (meth) acrylamide, (meth) acrylamide methylene Examples thereof include polyfunctional monomers such as ethers and condensates of polyhydric alcohols and N-methylol (meth) acrylamide, and triacrylic formals. These polyfunctional monomers can be used alone or in combination of two or more.

  The content of the photopolymerizable monomer (A2) is preferably 1% by mass to 30% by mass, and more preferably 3% by mass to 20% by mass, with respect to the solid content of the photosensitive composition. . By setting the above range, balance between sensitivity, developability and resolution tends to be easily obtained.

[Quantum dot (B)]
The photosensitive composition essentially comprises quantum dots (B).
As long as the quantum dot (B) is a fine particle having a function as a quantum dot, the structure or the component thereof is not particularly limited. The quantum dot (B) is a nanoscale material having unique optical properties (quantum confinement effect described later) according to quantum mechanics, and is generally a semiconductor nanoparticle. In the present specification, the quantum dots (B) are those coated on the surface of the semiconductor nanoparticle to further improve the light emission quantum yield (those having a shell structure described later) or to stabilize the quantum dots. And those which are surface-modified.

  The quantum dot (B) is a semiconductor nanoparticle that absorbs photons of energy greater than the band gap (the energy difference between the valence and conduction bands) and emits light of a wavelength according to the particle size. The elements contained in the material of the quantum dot (B) include, for example, group II elements (groups 2A and 2B), group III elements (especially group 3A), group IV elements (especially group 4A) and group V elements (especially group 4A) In particular, one or more selected from the group consisting of Group 5A) and Group VI elements (especially Group 6A) can be mentioned. As a compound or element preferable as a material of quantum dot (B), a II-VI group compound, a III-V group compound, a IV-VI group compound, a IV group element, a IV group compound, and these combination are mentioned, for example.

  As the II-VI group compound, at least one compound selected from the group consisting of CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, MgSe, MgS and a mixture thereof; CdSeS, CdSeTe, CdSTe At least one compound selected from the group consisting of ZnSeS, ZnSeTe, ZnSe, HgSeS, HgSeTe, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgSe, HgZnSe, HgZnSe, HgZnTe, MgZnSe, MgZnS, and mixtures thereof; And HgZnTeS, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe HgZnSTe and at least one compound selected from the group consisting of mixtures thereof; and the like.

  As the III-V group compound, at least one compound selected from GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof; GaNP, GaNAs, GaNSb, At least one compound selected from GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNPs, InNAs, InNSs, InNSb, InPAs, InPSb, GaAlNP and mixtures thereof; and GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs , GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb, and mixtures thereof At least one compound selected from; and the like.

  As IV-VI group compounds, at least one compound selected from SnS, SnSe, SnTe, PbS, PbSe, PbTe and mixtures thereof; SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe and And at least one compound selected from these mixtures; and at least one compound selected from SnPbSSe, SnPbSeTe, SnPbSTe, and mixtures thereof.

  Examples of group IV elements include at least one compound selected from Si, Ge and mixtures thereof. Group IV compounds include at least one compound selected from SiC, SiGe, and mixtures thereof.

  The structure of the quantum dot (B) may be a homogeneous structure consisting of one kind of compound or a complex structure consisting of two or more kinds of compounds, but in order to improve the luminescence quantum yield of the above compound Preferably, the structure of the quantum dot (B) is a core-shell structure in which the core is covered with one or more shell layers, and the particle surface of the compound to be the material of the core is epitaxially covered with a semiconductor material It is more preferable that the structure is the same. For example, when CdSe of II-VI group is used as the material of the core, ZnS, ZnSSe or the like is used as the covering layer (shell). The shell preferably has the same lattice constant as that of the core, and a combination of materials having a small difference in lattice constant between the core and the shell is appropriately selected.

  From the viewpoint of safety, it is preferable that the quantum dot (B) does not contain Cd or Pb as a component but contains In, Si or the like as a component, and more preferably contains In.

Preferable specific examples of the quantum dots of homogeneous structure type having no shell layer (B), AgInS _2, and Zn can be cited AgInS ₂ doped.
The core-shell type quantum dots (B) include InP / ZnS, InP / ZnSSe, CuInS ₂ / ZnS, and (ZnS / AgInS ₂ ) solid solution / ZnS.
In the above, the material of the core-shell type quantum dots (B) is described as (material of core) / (material of shell layer).

Further, in view of improving the safety and the light emission quantum yield, it is preferable to make the shell of the core-shell structure into a multilayer structure, and it is more preferable to make it into a double layer.
In the case of the core-multilayer shell structure, the material of the core is preferably at least one compound selected from the group consisting of InP, ZnS, and ZnSe, and more preferably InP. As a content rate, InP is 50 mass% or more and 100 mass% or less among the total mass of a core, 60 mass% or more and 99 mass% or less is preferable, and 82 mass% or more and 95 mass% or less is more preferable. Further, among the total mass of the core, ZnS and / or ZnSe is 0% by mass to 50% by mass, preferably 1% by mass to 40% by mass, and more preferably 5% by mass to 18% by mass. preferable.

  The material of the first shell in the multilayer shell structure is preferably at least one selected from ZnS, ZnSe, and ZnSSe. The content ratio of one or more selected from ZnS, ZnSe, and ZnSSe is, for example, 50% by mass or more and 100% by mass or less based on the total mass of the first shell, and 75% by mass or more and 98% by mass The following is preferable, and 80 to 97 mass% is more preferable. When the material of the first shell is a mixture of ZnS and ZnSe, the mixing ratio (mass ratio) is not particularly limited, and is 1/99 to 99/1, preferably 10/90 to 90/10. is there.

  In a multi-layered shell structure, a second shell is grown on the surface of the first shell. The material of the second shell is preferably equivalent to the material of the first shell (However, in each material, the difference in the lattice constant with respect to the core is different. That is, 99% or more of the same material is excluded in each material. ). The content ratio of one or more selected from ZnS, ZnSe, and ZnSSe is, for example, 50% by mass or more and 100% by mass or less based on the total mass of the second shell, and 75% by mass or more and 98% by mass The following is preferable, and 80 to 97 mass% is more preferable. When the material of the second shell is a mixture of two selected from ZnS, ZnSe, and ZnSSe, the mixing ratio (mass ratio) is not particularly limited, and is 1/99 or more and 99/1 or less, 10 / 90 or more and 90/10 or less.

The first shell and the second shell in the multilayer shell structure have a difference in lattice constant.
For example, the lattice constant difference between the core and the first shell is 2% or more and 8% or less, preferably 2% or more and 6% or less, and more preferably 3% or more and 5% or less.
Further, the lattice constant difference between the core and the second shell is 5% or more and 13% or less, preferably 5% or more and 12% or less, more preferably 7% or more and 10% or less, and 8% or more and 10% or less Is more preferred.

  Also. The difference in lattice constant between the first shell and the second shell is, for example, 3% or more and 9% or less, preferably 3% or more and 7% or less, and more preferably 4% or more and 6% or less.

  The quantum dots (B) having these core-multilayer shell structures should have an emission wavelength in the range of 400 nm to 800 nm (further, in the range of 470 nm to 650 nm, particularly in the range of 540 nm to 580 nm). it can.

  As a quantum dot (B) by these core-multilayer shell structures, InP / ZnS / ZnSe and InP / ZnSe / ZnS are mentioned, for example.

  The quantum dots (B) may also be surface modified. For example, phosphorus compounds such as phosphines, phosphine oxides and trialkylphosphines; organic nitrogen compounds such as pyridine, aminoalkanes and tertiary amines; organic sulfur such as mercapto alcohol, thiol, dialkyl sulfides and dialkyl sulfoxides Compounds; and surface modifiers (organic ligands) such as higher fatty acids and alcohols.

  The above-mentioned quantum dots (B) may be used in combination of 2 or more types, and it is used combining core- (multilayer) shell type quantum dots (B) and homogeneous structure type quantum dots (B) It is also good.

The average particle size of the quantum dot (B) is not particularly limited as long as it can function as a quantum dot, and is preferably 0.5 nm or more and 20 nm or less, more preferably 1.0 nm or more and 15 nm or less, and 2 nm or more and 7 nm or less Is more preferred.
In the case of the core- (multilayer) shell type quantum dot (B), the size of the core is, for example, 0.5 nm or more and 10 nm or less, and preferably 2 nm or more and 5 nm or less. The average thickness of the shell is preferably 0.4 nm or more and 2 nm or less, and more preferably 0.4 nm or more and 1.4 nm or less. When the shell consists of a first shell and a second shell, the average thickness of the first shell is, for example, 0.2 nm or more and 1 nm or less, and preferably 0.2 nm or more and 0.7 nm or less. The average thickness of the second shell is, for example, 0.2 nm or more and 1 nm or less, preferably 0.2 nm or more and 0.7 nm or less, regardless of the average thickness of the first shell.

The quantum dots (B) having an average particle diameter within this range exhibit a quantum confinement effect and function well as quantum dots, and are easy to prepare and have stable fluorescence characteristics.
The average particle diameter of the quantum dots (B) can be determined, for example, by applying a dispersion of the quantum dots (B) onto a substrate and drying it to remove volatile components, and then using a transmission electron microscope (TEM) on the surface. It can be defined by observing in. Typically, this average particle diameter can be defined as the number average diameter of the circle equivalent diameter of each particle obtained by image analysis of a TEM image.

The shape of the quantum dot (B) is not particularly limited. Examples of the shape of the quantum dot (B) include a sphere, an oval sphere, a cylinder, a polygonal column, a disc, and a polyhedron.
Among these, spherical shape is preferable in terms of ease of handling and availability.

  The quantum dot (B) has a compound (B1) having a fluorescence maximum in the wavelength range of 500 nm to 600 nm and a compound (B2) having a fluorescence maximum in the wavelength range of 600 nm to 700 nm, from the viewpoint of good wavelength conversion characteristics. It is preferable to contain 1 or more types selected from the group which consists of, and it is more preferable to consist of 1 or more types selected from the group which consists of a compound (B1) and a compound (B2).

The method of producing the quantum dot (B) is not particularly limited. Quantum dots manufactured by various known methods can be used as quantum dots (B). As a method of producing the quantum dot (B), for example, a method of thermally decomposing an organometallic compound in a coordinating organic solvent can be employed.
Also, the core-shell structured quantum dots (B) are produced by a method of forming a shell layer by reacting a precursor of a shell layer in the presence of a dispersed core after forming a homogeneous core by reaction. it can. For example, the quantum dot (B) which has the said core-multilayer shell structure can be manufactured by the method as described in WO2013 / 127662.
In addition, various quantum dots (B) marketed can also be used.

  The content of the quantum dots (B) is, for example, 0.05% by mass or more and 15% by mass with respect to the mass of the solid content of the photosensitive composition. When a quantum dot (B) has a shell layer or is surface-modified, 1 mass% or more and 12 mass% or less are preferable, and it is more preferable that they are 3 mass% or more and 10 mass% or less. When the quantum dot (B) is only a semiconductor nanoparticle (when it does not have a shell layer and / or a surface modifier), 0.07 mass% or more and 10 mass% or less is preferable, 0.1 mass% or more and 5 It is more preferable that the content is at most mass%. By making content of a quantum dot (B) into said range, it is easy to form the wavelength conversion material which has a favorable wavelength conversion characteristic.

[Photoinitiator (C)]
The photopolymerization initiator (C) is not particularly limited, and conventionally known photopolymerization initiators can be used.

  Specific examples of the photopolymerization initiator (C) include 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1- [4- (2-hydroxyethoxy) phenyl] 2-hydroxy-2-methyl-1-propan-1-one, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 1- (4-dodecylphenyl) -2-one Hydroxy-2-methylpropan-1-one, 2,2-dimethoxy-1,2-diphenylethan-1-one, bis (4-dimethylaminophenyl) ketone, 2-methyl-1- [4- (methylthio) Phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, O Acetyl-1- [6- (2-methylbenzoyl) -9-ethyl-9H-carbazol-3-yl] ethanone oxime, O-acetyl-1- [6- (pyrrol-2-ylcarbonyl) -9- Ethyl-9H carbazol-3-yl] ethanone oxime, (9-ethyl-6-nitro-9H-carbazol-3-yl) [4- (2-methoxy-1-methylethoxy) -2-methylphenyl] methanone O-acetyl oxime, 2- (benzoyloxyimino) -1- [4- (phenylthio) phenyl] -1-octanone, 2,4,6-trimethyl benzoyl diphenyl phosphine oxide, 4-benzoyl-4'-methyl dimethyl sulfide , 4-dimethylaminobenzoic acid, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, -Dimethylaminobenzoic acid butyl, 4-dimethylamino-2-ethylhexylbenzoic acid, 4-dimethylamino-2-isoamylbenzoic acid, benzyl-β-methoxyethyl acetal, benzyl dimethyl ketal, 1-phenyl-1,2-propane Dione-2- (O-ethoxycarbonyl) oxime, methyl o-benzoylbenzoate, 2,4-diethylthioxanthone, 2-chlorothioxanthone, 2,4-dimethylthioxanthone, 1-chloro-4-propoxythioxanthone, thioxanthene, 2-chlorothioxanthene, 2,4-diethylthioxanthene, 2-methylthioxanthene, 2-isopropylthioxanthene, 2-ethylanthraquinone, octamethylanthraquinone, 1,2-benzanthraquinone, 2,3-diphenylamine Traquinone, azobisisobutyronitrile, benzoyl peroxide, cumene hydroperoxide, 2-mercaptobenzoimidazole, 2-mercaptobenzoxazole, 2-mercaptobenzothiazole, 2- (o-chlorophenyl) -4,5-di (m -Methoxyphenyl) -imidazolyl dimer, benzophenone, 2-chlorobenzophenone, p, p'-bisdimethylaminobenzophenone, 4,4'-bisdiethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3-dimethyl- 4-methoxybenzophenone, benzyl, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin n-butyl ether, benzoin isobutyl ether, benzoin Ether, acetophenone, 2,2-diethoxyacetophenone, p-dimethylacetophenone, p-dimethylaminopropiophenone, dichloroacetophenone, trichloroacetophenone, p-tert-butylacetophenone, p-dimethylaminoacetophenone, p-tert-butyltrichloro Acetophenone, p-tert-butyldichloroacetophenone, α, α-dichloro-4-phenoxyacetophenone, thioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, dibenzosuberone, pentyl-4-dimethylaminobenzoate, 9-phenylacridine, 1,7-bis- (9-acridinyl) heptane, 1,5-bis- (9-acridinyl) pentane, 1,3-bis- (9-acridinyl) ester Bread, p-methoxytriazine, 2,4,6-tris (trichloromethyl) -s-triazine, 2-methyl-4,6-bis (trichloromethyl) -s-triazine, 2- [2- (5-methyl) Furan-2-yl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (furan-2-yl) ethenyl] -4,6-bis (trichloromethyl) -s- Triazine, 2- [2- (4-diethylamino-2-methylphenyl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (3,4-dimethoxyphenyl) ethenyl]- 4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-ethoxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-n-butoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2,4-bis-trichloromethyl-6 -(3-bromo-4-methoxy) phenyl-s-triazine, 2,4-bis-trichloromethyl-6- (2-bromo-4-methoxy) phenyl-s-triazine, 2,4-bis-trichloromethyl Examples include -6- (3-bromo-4-methoxy) styrylphenyl-s-triazine, 2,4-bis-trichloromethyl-6- (2-bromo-4-methoxy) styrylphenyl-s-triazine and the like.

These photoinitiators can be used individually or in combination of 2 or more types. The photopolymerization initiator (C) may contain two or more photopolymerization initiators in combination.
In this case, it is easy to effectively utilize the light of a wide range of wavelengths contained in the exposure light, and to adjust the sensitivity of the photosensitive composition to an appropriate range.

  Among these, the use of an oxime ester compound as the photopolymerization initiator (C) is particularly preferable in terms of sensitivity. Preferred examples of the oxime ester compound include O-acetyl-1- [6- (2-methylbenzoyl) -9-ethyl-9H-carbazol-3-yl] ethanone oxime, O-acetyl-1-oxime. [6- (Pyrrol-2-ylcarbonyl) -9-ethyl-9H carbazol-3-yl] ethanone oxime, and 2- (benzoyloxyimino) -1- [4- (phenylthio) phenyl] -1- Octanone is mentioned.

When using an oxime ester compound as a photoinitiator (C), it is also preferable to use together an oxime ester compound and other photoinitiators other than an oxime ester compound as mentioned above.
As another photoinitiator used together with an oxime ester compound, the photoinitiator of a (alpha)-amino alkyl phenone type | system | group is preferable. Preferred examples of the α-aminoalkylphenone photopolymerization initiator include 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one (IRGACURE 907 (IR-907) , Trade name, manufactured by BASF, and 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one (IRGACURE 369E (IR-369E), trade name, manufactured by BASF) Can be mentioned.
When an oxime ester compound and an α-aminoalkylphenone photopolymerization initiator are contained in combination as a photopolymerization initiator (C), the photosensitive composition is likely to exhibit sufficient photosensitivity.

（Ｒ^ｃ１は、１価の有機基、アミノ基、ハロゲン、ニトロ基、及びシアノ基からなる群より選択される基であり、
ｎ１は０以上４以下の整数であり、
ｎ２は０、又は１であり、
Ｒ^ｃ２は、置換基を有してもよいフェニル基、又は置換基を有してもよいカルバゾリル基であり、
Ｒ^ｃ３は、水素原子、又は炭素原子数１以上６以下のアルキル基である。） Moreover, it is also preferable to use the oxime ester compound represented by a following formula (c1) as an oxime ester compound.

(Wherein R ^c1 is a group selected from the group consisting of monovalent organic groups, amino groups, halogens, nitro groups, and cyano groups,
n1 is an integer of 0 or more and 4 or less,
n2 is 0 or 1,
R ^c2 is a phenyl group which may have a substituent or a carbazolyl group which may have a substituent,
R ^c3 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. )

In the formula (c1), R ^c1 is not particularly limited as long as the object of the present invention is not impaired, and is appropriately selected from various organic groups. Preferred examples of R ^{c1 when it} is an organic group include alkyl groups, alkoxy groups, cycloalkyl groups, cycloalkoxy groups, saturated aliphatic acyl groups, saturated aliphatic acyloxy groups, alkoxycarbonyl groups, and substituents. A phenyl group which may be substituted, a phenoxy group which may have a substituent, a benzoyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, a benzoyloxy which may have a substituent Group, phenylalkyl group which may have a substituent, naphthyl group which may have a substituent, naphthoxy group which may have a substituent, naphthoyl group which may have a substituent, substituent A naphthoxycarbonyl group which may have, a naphthyloxy group which may have a substituent, a naphthylalkyl group which may have a substituent, a heterocyclyl group which may have a substituent, A mino group, an amino group substituted with one or two organic groups, a morpholin-1-yl group, and a piperazin-1-yl group, a halogen, a nitro group, a cyano group and the like can be mentioned. When n1 is an integer of 2 or more and 4 or less, R ^c1 may be the same or different. In addition, the number of carbon atoms of the substituent does not include the number of carbon atoms of the substituent further included in the substituent.

When R ^c1 is an alkyl group, the number of carbon atoms is preferably 1 or more and 20 or less, and more preferably 1 or more and 6 or less. When R ^c1 is an alkyl group, it may be linear or branched. Specific examples of R ^c1 being an alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl and n-pentyl , Isopentyl group, sec-pentyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert-octyl group, n-nonyl group, isononyl group, n-decyl group, and isodecyl group etc. are mentioned. When R ^c1 is an alkyl group, the alkyl group may contain an ether bond (—O—) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include methoxyethyl group, ethoxyethyl group, methoxyethoxyethyl group, ethoxyethoxyethyl group, propyloxyethoxyethyl group, and methoxypropyl group.

When R ^c1 is an alkoxy group, the number of carbon atoms is preferably 1 or more and 20 or less, and more preferably 1 or more and 6 or less. When R ^c1 is an alkoxy group, it may be linear or branched. When R ^c1 is an alkoxy group, specific examples thereof include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, an isobutyloxy group, a sec-butyloxy group, a tert-butyloxy group, n Pentyloxy group, isopentyloxy group, sec-pentyloxy group, tert-pentyloxy group, n-hexyloxy group, n-heptyloxy group, n-octyloxy group, isooctyloxy group, sec-octyloxy group , Tert-octyloxy group, n-nonyloxy group, isononyloxy group, n-decyloxy group, isodecyloxy group and the like. When R ^c1 is an alkoxy group, the alkoxy group may contain an ether bond (-O-) in the carbon chain. Examples of the alkoxy group having an ether bond in the carbon chain include a methoxyethoxy group, an ethoxyethoxy group, a methoxyethoxyethoxy group, an ethoxyethoxyethoxy group, a propyloxyethoxyethoxy group, and a methoxypropyloxy group.

When R ^c1 is a cycloalkyl group or a cycloalkoxy group, the number of carbon atoms is preferably 3 or more and 10 or less, and more preferably 3 or more and 6 or less. When R ^c1 is a cycloalkyl group, specific examples thereof include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group. Specific examples of R ^c1 being a cycloalkoxy group include a cyclopropyloxy group, a cyclobutyloxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cycloheptyloxy group, and a cyclooctyloxy group.

When R ^c1 is a saturated aliphatic acyl group or a saturated aliphatic acyloxy group, the number of carbon atoms is preferably 2 or more and 20 or less, and more preferably 2 or more and 7 or less. When R ^c1 is a saturated aliphatic acyl group, specific examples thereof include acetyl group, propanoyl group, n-butanoyl group, 2-methylpropanoyl group, n-pentanoyl group, 2,2-dimethylpropanoyl group, n -Hexanoyl group, n-heptanoyl group, n-octanoyl group, n-nonanoyl group, n-decanoyl group, n-undecanoyl group, n-dodecanoyl group, n-tridecanoyl group, n-tetradecanoyl group, n-pentadeca Noyl group, and n-hexadecanoyl group etc. are mentioned. As specific examples in the case where R ^c1 is a saturated aliphatic acyloxy group, acetyloxy group, propanoyloxy group, n-butanoyloxy group, 2-methylpropanoyloxy group, n-pentanoyloxy group, 2, 2-dimethylpropanoyloxy group, n-hexanoyloxy group, n-heptanoyloxy group, n-octanoyloxy group, n-nonanoyloxy group, n-decanoyloxy group, n-undecanoyloxy group, n -Dodecanoyloxy group, n-tridecanoyloxy group, n-tetradecanoyloxy group, n-pentadecanoyloxy group, n-hexadecanoyloxy group, etc. are mentioned.

When R ^c1 is an alkoxycarbonyl group, the number of carbon atoms is preferably 2 or more and 20 or less, and more preferably 2 or more and 7 or less. When R ^c1 is an alkoxycarbonyl group, specific examples thereof include a methoxycarbonyl group, an ethoxycarbonyl group, an n-propyloxycarbonyl group, an isopropyloxycarbonyl group, an n-butyloxycarbonyl group, an isobutyloxycarbonyl group, and sec-butyl. Oxycarbonyl group, tert-butyloxycarbonyl group, n-pentyloxycarbonyl group, isopentyloxycarbonyl group, sec-pentyloxycarbonyl group, tert-pentyloxycarbonyl group, n-hexyloxycarbonyl group, n-heptyloxycarbonyl group Group, n-octyloxycarbonyl group, isooctyloxycarbonyl group, sec-octyloxycarbonyl group, tert-octyloxycarbonyl group, n-nonyloxycarbonyl group, Examples thereof include an isonononyloxycarbonyl group, an n-decyloxycarbonyl group, and an isodecyloxycarbonyl group.

When R ^c1 is a phenylalkyl group, it is preferably 7 to 20 carbon atoms, and more preferably 7 to 10 carbon atoms. When R ^c1 is a naphthylalkyl group, it preferably has 11 to 20 carbon atoms, and more preferably 11 to 14 carbon atoms. When R ^c1 is a phenylalkyl group, specific examples include a benzyl group, a 2-phenylethyl group, a 3-phenylpropyl group, and a 4-phenylbutyl group. Specific examples in the case where R ^c1 is a naphthylalkyl group include α-naphthylmethyl group, β-naphthylmethyl group, 2- (α-naphthyl) ethyl group, and 2- (β-naphthyl) ethyl group. . When R ^c1 is a phenylalkyl group or a naphthylalkyl group, R ^c1 may further have a substituent on the phenyl group or the naphthyl group.

When R ^c1 is a heterocyclyl group, the heterocyclyl group is a 5- or 6-membered single ring containing one or more of N, S and O, or such single rings or such single ring and benzene ring are condensed Heterocyclyl group. When the heterocyclyl group is a fused ring, the number of rings is up to 3. As the heterocyclic ring constituting such a heterocyclyl group, furan, thiophene, pyrrole, oxazole, isoxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, pyridazine, benzofuran, benzothiophene, indole, Isoindole, indolizine, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinazoline, phthalazine, cinnoline, quinoxaline and the like. When R ^c1 is a heterocyclyl group, the heterocyclyl group may further have a substituent.

When R ^c1 is an amino group substituted with an organic group of 1 or 2, suitable examples of the organic group include an alkyl group having 1 to 20 carbon atoms and a cycloalkyl group having 3 to 10 carbon atoms. A saturated aliphatic acyl group having 2 to 20 carbon atoms, a phenyl group which may have a substituent, a benzoyl group which may have a substituent, and 7 or more carbon atoms which may have a substituent 20 or less phenyl alkyl group, naphthyl group which may have a substituent, naphthoyl group which may have a substituent, naphthyl alkyl group having 11 to 20 carbon atoms which may have a substituent, and Heterocyclyl groups and the like can be mentioned. Specific examples of these suitable organic groups are the same as R ^c1 . Specific examples of the amino group substituted with one or two organic groups include methylamino group, ethylamino group, diethylamino group, n-propylamino group, di-n-propylamino group, isopropylamino group, n- Butylamino group, di-n-butylamino group, n-pentylamino group, n-hexylamino group, n-heptylamino group, n-octylamino group, n-nonylamino group, n-decylamino group, phenylamino group, Naphthylamino group, acetylamino group, propanoylamino group, n-butanoylamino group, n-pentanoylamino group, n-hexanoylamino group, n-heptanoylamino group, n-octanoylamino group, n- Examples include decanoylamino group, benzoylamino group, α-naphthoylamino group, and β-naphthoylamino group.

When the phenyl group, the naphthyl group and the heterocyclyl group contained in R ^c1 further have a substituent, examples of the substituent include an alkyl group having 1 to 6 carbon atoms and an alkoxy group having 1 to 6 carbon atoms, A saturated aliphatic acyl group having 2 to 7 carbon atoms, an alkoxycarbonyl group having 2 to 7 carbon atoms, a saturated aliphatic acyloxy group having 2 to 7 carbon atoms, an alkyl group having 1 to 6 carbon atoms And a monoalkylamino group having the formula, a dialkylamino group having an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, a piperazin-1-yl group, a halogen, a nitro group, a cyano group and the like. When the phenyl group, the naphthyl group, and the heterocyclyl group contained in R ^c1 further have a substituent, the number of the substituent is not limited as long as the object of the present invention is not impaired, but 1 or more and 4 or less is preferable. When the phenyl group, the naphthyl group and the heterocyclyl group contained in R ^c1 have a plurality of substituents, the plurality of substituents may be the same or different.

Among R ^c1 , an alkyl group having 1 to 6 carbon atoms, a carbon atom having 1 carbon atom, and the like, from the viewpoint of being chemically stable, having few steric hindrances and facilitating the synthesis of the oxime ester compound, etc. A group selected from the group consisting of an alkoxy group having 6 or less and a saturated aliphatic acyl group having 2 to 7 carbon atoms is preferable, an alkyl having 1 to 6 carbon atoms is more preferable, and a methyl group is particularly preferable. .

Position R ^c1 is bonded to the phenyl group, the phenyl group R ^c1 are attached the position of the bond to the main chain of the phenyl group and the oxime ester compound as a 1-position, if the 2-position of the position of the methyl group Preferably, 4- or 5-position is preferred, and 5-position is more preferred. In addition, n1 is preferably an integer of 0 or more and 3 or less, more preferably an integer of 0 or more and 2 or less, and particularly preferably 0 or 1.

R ^c2 is a phenyl group which may have a substituent or a carbazolyl group which may have a substituent. Moreover, when R ^c2 is a carbazolyl group which may have a substituent, the nitrogen atom on the carbazolyl group may be substituted by an alkyl group having 1 to 6 carbon atoms.

In R ^c2 , a substituent that a phenyl group or a carbazolyl group has is not particularly limited as long as the object of the present invention is not impaired. As an example of the suitable substituent which a phenyl group or carbazolyl group may have on a carbon atom, a C1-C20 alkyl group, a C1-C20 alkoxy group, a carbon atom A cycloalkyl group having 3 to 10 carbon atoms, a cycloalkoxy group having 3 to 10 carbon atoms, a saturated aliphatic acyl group having 2 to 20 carbon atoms, an alkoxycarbonyl group having 2 to 20 carbon atoms, a carbon atom A saturated aliphatic acyloxy group of 2 or more and 20 or less, a phenyl group which may have a substituent, a phenoxy group which may have a substituent, a phenylthio group which may have a substituent, and a substituent Benzoyl group which may be substituted, phenoxy carbonyl group which may have a substituent group, benzoyloxy group which may have a substituent group, and having 7 to 20 carbon atoms which may have a substituent group A phenyl group, a naphthyl group which may have a substituent, a naphthoxy group which may have a substituent, a naphthoyl group which may have a substituent, a naphthoxy carbonyl group which may have a substituent, With a naphthoyloxy group which may have a substituent, a naphthylalkyl group having 11 to 20 carbon atoms which may have a substituent, a heterocyclyl group which may have a substituent, and a substituent And heterocyclylcarbonyl group, amino group, amino group substituted with one or two organic groups, morpholin-1-yl group, piperazin-1-yl group, halogen, nitro group, cyano group and the like. .

When R ^c2 is a carbazolyl group, examples of suitable substituents which the carbazolyl group may have on a nitrogen atom include alkyl groups having 1 to 20 carbon atoms, and cyclos having 3 to 10 carbon atoms. An alkyl group, a saturated aliphatic acyl group having 2 to 20 carbon atoms, an alkoxycarbonyl group having 2 to 20 carbon atoms, a phenyl group which may have a substituent, and a benzoyl group which may have a substituent A phenoxycarbonyl group which may have a substituent, a phenylalkyl group having 7 to 20 carbon atoms which may have a substituent, a naphthyl group which may have a substituent, and a substituent Naphthoyl group, naphthoxy carbonyl group which may have a substituent, naphthylalkyl group having 11 to 20 carbon atoms which may have a substituent, heterocyclyl which may have a substituent Groups, and optionally substituted heterocyclylcarbonyl groups and the like. Among these substituents, an alkyl group having 1 to 20 carbon atoms is preferable, an alkyl group having 1 to 6 carbon atoms is more preferable, and an ethyl group is particularly preferable.

With respect to specific examples of the substituent which the phenyl group or the carbazolyl group may have, an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic acyl group, an alkoxycarbonyl group, a saturated aliphatic acyloxy group, a substituted group With regard to a phenylalkyl group which may have a group, a naphthylalkyl group which may have a substituent, a heterocyclyl group which may have a substituent, and an amino group substituted with one or two organic groups , R ^c1 .

As an example of the substituent in the case where the phenyl, naphthyl and heterocyclyl groups further contained a substituent, which is contained in the substituent that the phenyl group or the carbazolyl group has in R ^c2 , an alkyl having 1 to 6 carbon atoms can be mentioned Group: alkoxy group having 1 to 6 carbon atoms; saturated aliphatic acyl group having 2 to 7 carbon atoms; alkoxycarbonyl group having 2 to 7 carbon atoms; saturated aliphatic group having 2 to 7 carbon atoms Acyloxy group; phenyl group; naphthyl group; benzoyl group; naphthoyl group; alkyl group having 1 to 6 carbon atoms, morpholin-1-yl group, piperazin-1-yl group, and phenyl group selected from the group consisting of A benzoyl group substituted by a group; a monoalkylamino group having an alkyl group having 1 to 6 carbon atoms; 1 to 6 carbon atoms Dialkylamino group having the following alkyl group; morpholin-1-yl group; piperazin-1-yl group; halogen; nitro group; cyano group. When the phenyl group, the naphthyl group, and the heterocyclyl group contained in the substituent which a phenyl group or a carbazolyl group has further have a substituent, the number of the substituent is not limited as long as the object of the present invention is not hindered, 1 or more and 4 or less are preferable. When the phenyl group, the naphthyl group and the heterocyclyl group have a plurality of substituents, the plurality of substituents may be the same or different.

In R ^c2 , a group represented by the following formula (c2) or (c3) is preferable, and a group represented by the following formula (c2) is more preferable, from the viewpoint of easily obtaining a photopolymerization initiator excellent in sensitivity. Particularly preferred is a group represented by the following formula (c2), wherein A is S.

（Ｒ^ｃ４は、１価の有機基、アミノ基、ハロゲン、ニトロ基、及びシアノ基からなる群より選択される基であり、ＡはＳ又はＯであり、ｎ３は、０以上４以下の整数である。）

(R ^c4 is a group selected from the group consisting of monovalent organic groups, amino groups, halogens, nitro groups, and cyano groups, A is S or O, and n3 is an integer of 0 or more and 4 or less) Is)

（Ｒ^ｃ５及びＲ^ｃ６は、それぞれ、１価の有機基である。）

(R ^c5 and R ^c6 are each a monovalent organic group.)

When R ^c4 in the formula (c2) is an organic group, it can be selected from various organic groups as long as the object of the present invention is not impaired. As a suitable example in case ^Rc4 is an organic group in Formula (c2), it is an alkyl group having 1 to 6 carbon atoms; an alkoxy group having 1 to 6 carbon atoms; 2 to 7 carbon atoms A saturated aliphatic acyl group; an alkoxycarbonyl group having 2 to 7 carbon atoms; a saturated aliphatic acyloxy group having 2 to 7 carbon atoms; a phenyl group; a naphthyl group; a benzoyl group; a naphthoyl group; Benzoyl group substituted by a group selected from the group consisting of the following alkyl group, morpholin-1-yl group, piperazin-1-yl group, and phenyl group; Mono having an alkyl group having 1 to 6 carbon atoms Alkylamino group; dialkylamino group having an alkyl group having 1 to 6 carbon atoms; morpholin-1-yl group; piperazin-1-yl group; halogen Nitro group; cyano group.

In R ^c4 , substituted with a group selected from the group consisting of benzoyl group; naphthoyl group; alkyl group having 1 to 6 carbon atoms, morpholin-1-yl group, piperazin-1-yl group, and phenyl group Benzoyl group; nitro group is preferable, benzoyl group; naphthoyl group; 2-methylphenyl carbonyl group; 4- (piperazin-1-yl) phenylcarbonyl group; 4- (phenyl) phenylcarbonyl group is more preferable.

In the formula (c2), n3 is preferably an integer of 0 or more and 3 or less, more preferably an integer of 0 or more and 2 or less, and particularly preferably 0 or 1. If n3 is 1, binding position of R ^c4, to the bond to the phenyl group R ^c4 is bonded is bonded to an oxygen atom or a sulfur atom, it is preferably in the para position.

R ^c5 in the formula (c3) can be selected from various organic groups as long as the object of the present invention is not ^impaired . Preferable examples of R ^c5 include an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a saturated aliphatic acyl group having 2 to 20 carbon atoms, and 2 carbon atoms. More than 20 or less alkoxycarbonyl group, phenyl group which may have a substituent, benzoyl group which may have a substituent, phenoxycarbonyl group which may have a substituent, may have a substituent A phenylalkyl group having 7 to 20 carbon atoms, a naphthyl group which may have a substituent, a naphthoyl group which may have a substituent, a naphthoxy carbonyl group which may have a substituent, a substituent Examples thereof include a naphthylalkyl group having 11 to 20 carbon atoms which may have, a heterocyclyl group which may have a substituent, and a heterocyclylcarbonyl group which may have a substituent.

Among R ^c5 , an alkyl group having 1 to 20 carbon atoms is preferable, an alkyl group having 1 to 6 carbon atoms is more preferable, and an ethyl group is particularly preferable.

R ^c6 in Formula (c3) is not particularly limited as long as the object of the present invention is not impaired, and can be selected from various organic groups. Specific examples of the group suitable as R ^c6 include an alkyl group having 1 to 20 carbon atoms, a phenyl group which may have a substituent, a naphthyl group which may have a substituent, and a substituent And heterocyclyl groups which may be mentioned. As R ^c6 , among these groups, a phenyl group which may have a substituent is more preferable, and a 2-methylphenyl group is particularly preferable.

When the phenyl group, the naphthyl group and the heterocyclyl group contained in R ^c4 , R ^c5 or R ^c6 further have a substituent, examples of the substituent include an alkyl group having 1 to 6 carbon atoms and 1 carbon atom Alkoxy group of 6 or less, saturated aliphatic acyl group having 2 to 7 carbon atoms, alkoxycarbonyl group having 2 to 7 carbon atoms, saturated aliphatic acyloxy group having 2 to 7 carbon atoms, the number of carbon atoms Monoalkylamino group having 1 to 6 alkyl group, dialkylamino group having alkyl group having 1 to 6 carbon atoms, morpholin-1-yl group, piperazin-1-yl group, halogen, nitro group, and A cyano group etc. are mentioned. When the phenyl group, the naphthyl group and the heterocyclyl group contained in R ^c4 , R ^c5 or R ^c6 further have a substituent, the number of the substituent is not limited as long as the object of the present invention is not impaired, 1 or more and 4 or less are preferable. When the phenyl group, the naphthyl group and the heterocyclyl group contained in R ^c4 , R ^c5 or R ^c6 have a plurality of substituents, the plurality of substituents may be the same or different.

R ^c3 in the formula (c1) is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. As R ^c3 , a methyl group or an ethyl group is preferable, and a methyl group is more preferable.

Among the oxime ester compounds represented by the formula (c1), the following PI-1 to PI-42 may be mentioned as particularly preferable compounds.

  Moreover, the oxime ester compound represented by following formula (c4) is also preferable as a photoinitiator (C). Also when using an oxime ester compound and the photoinitiator of an alpha-amino alkyl phenone type together, the oxime ester compound represented by a following formula (c4) is used preferably.

（Ｒ^ｃ７は水素原子、ニトロ基又は１価の有機基であり、Ｒ^ｃ８及びＲ^ｃ９は、それぞれ、置換基を有してもよい鎖状アルキル基、置換基を有してもよい環状有機基、又は水素原子であり、Ｒ^ｃ８とＲ^ｃ９とは相互に結合して環を形成してもよく、Ｒ^ｃ１０は１価の有機基であり、Ｒ^ｃ１１は、水素原子、置換基を有してもよい炭素原子数１以上１１以下のアルキル基、又は置換基を有してもよいアリール基であり、ｎ４は０以上４以下の整数であり、ｎ５は０又は１である。）

(R ^c7 is a hydrogen atom, a nitro group or a monovalent organic group, and R ^c8 and R ^c9 are each a linear alkyl group which may have a substituent, and a cyclic organic which may have a substituent R ^c8 and R ^c9 may be mutually bonded to form a ring, R ^c10 is a monovalent organic group, and R ^c11 has a hydrogen atom or a substituent. It is an alkyl group having 1 to 11 carbon atoms which may be substituted or an aryl group which may have a substituent, n 4 is an integer of 0 to 4 and n 5 is 0 or 1.)

In formula (c4), R ^c7 is a hydrogen atom, a nitro group or a monovalent organic group. R ^c7 is bonded to a 6-membered aromatic ring different from the 6-membered aromatic ring bonded to the group represented by — (CO) _n5 — on the fluorene ring in the formula (c4). In Formula (c4), the bonding position to the fluorene ring of R ^c7 is not particularly limited. When the compound represented by the formula (c4) has one or more R ^c7 , synthesis of the compound represented by the formula (c 4) is easy and so on, one of the one or more R ^c7 is a fluorene ring It is preferable to bind to the 2-position in the inside. When R ^c7 is plural, plural R ^c7 may be the same or different.

When R ^c7 is an organic group, R ^c7 is not particularly limited as long as the object of the present invention is not ^{impaired, and} is appropriately selected from various organic groups. Preferred examples of R ^{c7 when it} is an organic group include alkyl groups, alkoxy groups, cycloalkyl groups, cycloalkoxy groups, saturated aliphatic acyl groups, saturated aliphatic acyloxy groups, alkoxycarbonyl groups, and substituents. A phenyl group which may be substituted, a phenoxy group which may have a substituent, a benzoyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, a benzoyloxy which may have a substituent Group, phenylalkyl group which may have a substituent, naphthyl group which may have a substituent, naphthoxy group which may have a substituent, naphthoyl group which may have a substituent, substituent A naphthoxycarbonyl group which may have, a naphthyloxy group which may have a substituent, a naphthylalkyl group which may have a substituent, a heterocyclyl group which may have a substituent, A heterocyclylcarbonyl group which may have a substituent, an amino group substituted with one or two organic groups, a morpholin-1-yl group, a piperazin-1-yl group and the like can be mentioned.

When R ^c7 is an alkyl group, the number of carbon atoms in the alkyl group is preferably 1 or more and 20 or less, and more preferably 1 or more and 6 or less. When R ^c7 is an alkyl group, it may be linear or branched. When R ^c7 is an alkyl group, specific examples thereof include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group and an n-pentyl group , Isopentyl group, sec-pentyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert-octyl group, n-nonyl group, isononyl group, n-decyl group, and isodecyl group etc. are mentioned. When R ^c7 is an alkyl group, the alkyl group may contain an ether bond (—O—) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include methoxyethyl group, ethoxyethyl group, methoxyethoxyethyl group, ethoxyethoxyethyl group, propyloxyethoxyethyl group, and methoxypropyl group.

When R ^c7 is an alkoxy group, the number of carbon atoms in the alkoxy group is preferably 1 or more and 20 or less, and more preferably 1 or more and 6 or less. When R ^c7 is an alkoxy group, it may be linear or branched. When R ^c7 is an alkoxy group, specific examples thereof include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, an isobutyloxy group, a sec-butyloxy group, a tert-butyloxy group, n Pentyloxy group, isopentyloxy group, sec-pentyloxy group, tert-pentyloxy group, n-hexyloxy group, n-heptyloxy group, n-octyloxy group, isooctyloxy group, sec-octyloxy group , Tert-octyloxy group, n-nonyloxy group, isononyloxy group, n-decyloxy group, isodecyloxy group and the like. When R ^c7 is an alkoxy group, the alkoxy group may contain an ether bond (—O—) in the carbon chain. Examples of the alkoxy group having an ether bond in the carbon chain include a methoxyethoxy group, an ethoxyethoxy group, a methoxyethoxyethoxy group, an ethoxyethoxyethoxy group, a propyloxyethoxyethoxy group, and a methoxypropyloxy group.

When R ^c7 is a cycloalkyl group or a cycloalkoxy group, the number of carbon atoms of the cycloalkyl group or the cycloalkoxy group is preferably 3 or more and 10 or less, and more preferably 3 or more and 6 or less. When R ^c7 is a cycloalkyl group, specific examples thereof include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group. When R ^c7 is a cycloalkoxy group, specific examples thereof include a cyclopropyloxy group, a cyclobutyloxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cycloheptyloxy group, and a cyclooctyloxy group.

When R ^c7 is a saturated aliphatic acyl group or a saturated aliphatic acyloxy group, the number of carbon atoms of the saturated aliphatic acyl group or the saturated aliphatic acyloxy group is preferably 2 or more and 21 or less, and more preferably 2 or more and 7 or less. When R ^c7 is a saturated aliphatic acyl group, specific examples thereof include an acetyl group, a propanoyl group, an n-butanoyl group, a 2-methylpropanoyl group, an n-pentanoyl group, a 2,2-dimethylpropanoyl group, n -Hexanoyl group, n-heptanoyl group, n-octanoyl group, n-nonanoyl group, n-decanoyl group, n-undecanoyl group, n-dodecanoyl group, n-tridecanoyl group, n-tetradecanoyl group, n-pentadeca Noyl group, and n-hexadecanoyl group etc. are mentioned. As a specific example when R ^c7 is a saturated aliphatic acyloxy group, acetyloxy group, propanoyloxy group, n-butanoyloxy group, 2-methylpropanoyloxy group, n-pentanoyloxy group, 2, 2-dimethylpropanoyloxy group, n-hexanoyloxy group, n-heptanoyloxy group, n-octanoyloxy group, n-nonanoyloxy group, n-decanoyloxy group, n-undecanoyloxy group, n -Dodecanoyloxy group, n-tridecanoyloxy group, n-tetradecanoyloxy group, n-pentadecanoyloxy group, n-hexadecanoyloxy group, etc. are mentioned.

When R ^c7 is an alkoxycarbonyl group, the number of carbon atoms of the alkoxycarbonyl group is preferably 2 or more and 20 or less, and more preferably 2 or more and 7 or less. When R ^c7 is an alkoxycarbonyl group, specific examples thereof include a methoxycarbonyl group, an ethoxycarbonyl group, an n-propyloxycarbonyl group, an isopropyloxycarbonyl group, an n-butyloxycarbonyl group, an isobutyloxycarbonyl group, and sec-butyl. Oxycarbonyl group, tert-butyloxycarbonyl group, n-pentyloxycarbonyl group, isopentyloxycarbonyl group, sec-pentyloxycarbonyl group, tert-pentyloxycarbonyl group, n-hexyloxycarbonyl group, n-heptyloxycarbonyl group Group, n-octyloxycarbonyl group, isooctyloxycarbonyl group, sec-octyloxycarbonyl group, tert-octyloxycarbonyl group, n-nonyloxycarbonyl group, Examples thereof include an isonononyloxycarbonyl group, an n-decyloxycarbonyl group, and an isodecyloxycarbonyl group.

When R ^c7 is a phenylalkyl group, the number of carbon atoms in the phenylalkyl group is preferably 7 or more and 20 or less, and more preferably 7 or more and 10 or less. When R ^c7 is a naphthylalkyl group, the number of carbon atoms in the naphthylalkyl group is preferably 11 or more and 20 or less, and more preferably 11 or more and 14 or less. When R ^c7 is a phenylalkyl group, specific examples include a benzyl group, a 2-phenylethyl group, a 3-phenylpropyl group, and a 4-phenylbutyl group. Specific examples in the case where R ^c7 is a naphthyl alkyl group include an α-naphthyl methyl group, a β-naphthyl methyl group, a 2- (α-naphthyl) ethyl group, and a 2- (β-naphthyl) ethyl group. . When R ^c7 is a phenylalkyl group or a naphthylalkyl group, R ^c7 may further have a substituent on the phenyl group or the naphthyl group.

When R ^c7 is a heterocyclyl group, the heterocyclyl group is a 5- or 6-membered single ring containing one or more of N, S and O, or such single rings or such single ring and benzene ring are condensed Heterocyclyl group. When the heterocyclyl group is a fused ring, the number of rings is up to 3. The heterocyclyl group may be either an aromatic group (heteroaryl group) or a non-aromatic group. As the heterocyclic ring constituting such a heterocyclyl group, furan, thiophene, pyrrole, oxazole, isoxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, pyridazine, benzofuran, benzothiophene, indole, Isoindole, indolizine, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinazoline, phthalazine, cinnoline, quinoxaline, piperidine, piperazine, morpholine, piperidine, tetrahydropyran, tetrahydrofuran and the like. Be When R ^c7 is a heterocyclyl group, the heterocyclyl group may further have a substituent.

When R ^c7 is a heterocyclylcarbonyl group, the heterocyclyl group contained in the heterocyclylcarbonyl group is the same as when R ^c7 is a heterocyclyl group.

When R ^c7 is an amino group substituted with an organic group of 1 or 2, suitable examples of the organic group include an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, A saturated aliphatic acyl group having 2 to 21 carbon atoms, a phenyl group which may have a substituent, a benzoyl group which may have a substituent, and 7 to 20 carbon atoms which may have a substituent The following phenylalkyl groups, naphthyl groups which may have a substituent, naphthoyl groups which may have a substituent, naphthylalkyl groups having 11 to 20 carbon atoms which may have a substituent, and heterocyclyl And the like. Specific examples of these suitable organic groups are the same as R ^c7 . Specific examples of the amino group substituted with one or two organic groups include methylamino group, ethylamino group, diethylamino group, n-propylamino group, di-n-propylamino group, isopropylamino group, n- Butylamino group, di-n-butylamino group, n-pentylamino group, n-hexylamino group, n-heptylamino group, n-octylamino group, n-nonylamino group, n-decylamino group, phenylamino group, Naphthylamino group, acetylamino group, propanoylamino group, n-butanoylamino group, n-pentanoylamino group, n-hexanoylamino group, n-heptanoylamino group, n-octanoylamino group, n- Examples include decanoylamino group, benzoylamino group, α-naphthoylamino group, and β-naphthoylamino group.

When the phenyl group, the naphthyl group and the heterocyclyl group contained in R ^c7 further have a substituent, examples of the substituent include an alkyl group having 1 to 6 carbon atoms and an alkoxy group having 1 to 6 carbon atoms, A saturated aliphatic acyl group having 2 to 7 carbon atoms, an alkoxycarbonyl group having 2 to 7 carbon atoms, a saturated aliphatic acyloxy group having 2 to 7 carbon atoms, an alkyl group having 1 to 6 carbon atoms And a monoalkylamino group having the formula, a dialkylamino group having an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, a piperazin-1-yl group, a halogen, a nitro group, a cyano group and the like. When the phenyl group, the naphthyl group and the heterocyclyl group contained in R ^c7 further have a substituent, the number of the substituent is not limited as long as the object of the present invention is not inhibited, but 1 or more and 4 or less is preferable. When the phenyl group, the naphthyl group and the heterocyclyl group contained in R ^c7 have a plurality of substituents, the plurality of substituents may be the same or different.

Among the groups described above, R ^c7 is preferably a nitro group or a group represented by R ^c12 -CO- because the sensitivity tends to be improved. R ^c12 is not particularly limited as long as the object of the present invention is not ^impaired , and can be selected from various organic groups. Examples of preferable groups as R ^c12 include an alkyl group having 1 to 20 carbon atoms, a phenyl group which may have a substituent, a naphthyl group which may have a substituent, and a substituent And heterocyclyl groups which may be mentioned. Among these groups, a 2-methylphenyl group, a thiophen-2-yl group, and an α-naphthyl group are particularly preferable as R ^c12 .
When R ^c7 is a hydrogen atom, the transparency tends to be good, which is preferable. When R ^c7 is a hydrogen atom and R ^c10 is a group represented by the formula (c4a) or (c4b) described later, the transparency tends to be better.

In formula (c4), R ^c8 and R ^c9 each represent a chain-like alkyl group which may have a substituent, a cyclic organic group which may have a substituent, or a hydrogen atom. R ^c8 and R ^c9 may be bonded to each other to form a ring. Among these groups, as R ^c8 and R ^c9 , chain-like alkyl groups which may have a substituent are preferable. When R ^c8 and R ^c9 are a linear alkyl group which may have a substituent, the linear alkyl group may be a linear alkyl group or a branched alkyl group.

When R ^c8 and R ^c9 are a chain alkyl group having no substituent, the number of carbon atoms in the chain alkyl group is preferably 1 or more and 20 or less, more preferably 1 or more and 10 or less, and particularly preferably 1 or more and 6 or less. preferable. When R ^c8 and R ^c9 are a chain alkyl group, specific examples thereof include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group and a tert-butyl group. , N-pentyl group, isopentyl group, sec-pentyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert-octyl group, n-nonyl Groups, isononyl groups, n-decyl groups, isodecyl groups and the like. When R ^c8 and R ^c9 are an alkyl group, the alkyl group may contain an ether bond (-O-) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include methoxyethyl group, ethoxyethyl group, methoxyethoxyethyl group, ethoxyethoxyethyl group, propyloxyethoxyethyl group, and methoxypropyl group.

When R ^c8 and R ^c9 are a chained alkyl group having a substituent, the number of carbon atoms of the chained alkyl group is preferably 1 or more and 20 or less, more preferably 1 or more and 10 or less, and particularly preferably 1 or more and 6 or less . In this case, the number of carbon atoms of the substituent is not included in the number of carbon atoms of the chain alkyl group. The chain alkyl group having a substituent is preferably linear.
The substituent which the alkyl group may have is not particularly limited as long as the object of the present invention is not impaired. Preferred examples of the substituent include a cyano group, a halogen atom, a cyclic organic group, and an alkoxycarbonyl group. The halogen atom includes a fluorine atom, a chlorine atom, a bromine atom and an iodine atom. Among these, fluorine atom, chlorine atom and bromine atom are preferable. The cyclic organic group includes a cycloalkyl group, an aromatic hydrocarbon group and a heterocyclyl group. Specific examples of the cycloalkyl group are the same as the preferred examples in the case where R ^c7 is a cycloalkyl group. Specific examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, a biphenylyl group, an anthryl group, and a phenanthryl group. Specific examples of the heterocyclyl group are the same as the preferred examples where R ^c7 is a heterocyclyl group. When R ^c7 is an alkoxycarbonyl group, the alkoxy group contained in the alkoxycarbonyl group may be linear or branched, and is preferably linear. 1 or more and 10 or less are preferable, and, as for the carbon atom number of the alkoxy group contained in the alkoxycarbonyl group, 1 or more and 6 or less are more preferable.

  When the chain alkyl group has a substituent, the number of substituents is not particularly limited. The number of preferred substituents varies depending on the number of carbon atoms in the chain alkyl group. The number of substituents is typically 1 or more and 20 or less, preferably 1 or more and 10 or less, and more preferably 1 or more and 6 or less.

When R ^c8 and R ^c9 are a cyclic organic group, the cyclic organic group may be an alicyclic group or an aromatic group. Examples of cyclic organic groups include aliphatic cyclic hydrocarbon groups, aromatic hydrocarbon groups and heterocyclyl groups. When R ^c8 and R ^c9 are cyclic organic groups, the substituents which the cyclic organic group may have are the same as in the case where R ^c8 and R ^c9 are chain alkyl groups.

When R ^c8 and R ^c9 are an aromatic hydrocarbon group, is the aromatic hydrocarbon group a phenyl group or a group formed by bonding a plurality of benzene rings via a carbon-carbon bond? And a plurality of benzene rings is preferably a group formed by condensation. When the aromatic hydrocarbon group is a phenyl group or a group formed by bonding or condensation of a plurality of benzene rings, the number of benzene rings contained in the aromatic hydrocarbon group is not particularly limited. 3 or less is preferable, 2 or less is more preferable, and 1 is especially preferable. Preferred specific examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, a biphenylyl group, an anthryl group, and a phenanthryl group.

When R ^c8 and R ^c9 are aliphatic cyclic hydrocarbon groups, the aliphatic cyclic hydrocarbon groups may be monocyclic or polycyclic. Although the number of carbon atoms of the aliphatic cyclic hydrocarbon group is not particularly limited, it is preferably 3 or more and 20 or less, and more preferably 3 or more and 10 or less. Examples of monocyclic cyclic hydrocarbon groups include cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclooctyl group, norbornyl group, isobornyl group, tricyclononyl group, tricyclodecyl group, and the like. Examples include tetracyclododecyl and adamantyl.

When R ^c8 and R ^c9 are heterocyclyl groups, the heterocyclyl group is a 5- or 6-membered single ring containing one or more of N, S, O, or such single rings, or such single ring and benzene ring And a fused heterocyclyl group. When the heterocyclyl group is a fused ring, the number of rings is up to 3. The heterocyclyl group may be either an aromatic group (heteroaryl group) or a non-aromatic group. As the heterocyclic ring constituting such a heterocyclyl group, furan, thiophene, pyrrole, oxazole, isoxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, pyridazine, benzofuran, benzothiophene, indole, Isoindole, indolizine, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinazoline, phthalazine, cinnoline, quinoxaline, piperidine, piperazine, morpholine, piperidine, tetrahydropyran, tetrahydrofuran and the like. Be

R ^c8 and R ^c9 may be bonded to each other to form a ring. The group formed of a ring formed by R ^c8 and R ^c9 is preferably a cycloalkylidene group. When R ^c8 and R ^c9 combine to form a cycloalkylidene group, the ring constituting the cycloalkylidene group is preferably a 5- to 6-membered ring, and more preferably a 5-membered ring.

When the group formed by combining R ^c8 and R ^c9 is a cycloalkylidene group, the cycloalkylidene group may be fused to one or more other rings. Examples of the ring which may be condensed with a cycloalkylidene group include benzene ring, naphthalene ring, cyclobutane ring, cyclopentane ring, cyclohexane ring, cycloheptane ring, cyclooctane ring, furan ring, thiophene ring, pyrrole ring, pyridine And rings, pyrazine rings, pyrimidine rings and the like.

Examples of preferable groups among R ^c8 and R ^c9 described above include groups represented by the formula -A ¹ -A ² . In the formula, A ¹ is a linear alkylene group, and A ² is an alkoxy group, a cyano group, a halogen atom, a halogenated alkyl group, a cyclic organic group, or an alkoxycarbonyl group.

The number of carbon atoms in a straight chain alkylene group A ¹ is preferably 1 to 10, 1 to 6 is more preferable. When A ² is an alkoxy group, the alkoxy group may be linear or branched, and is preferably linear. 1 or more and 10 or less are preferable, and, as for the carbon atom number of an alkoxy group, 1 or more and 6 or less are more preferable. When A ² is a halogen atom, a fluorine atom, a chlorine atom, a bromine atom and an iodine atom are preferable, and a fluorine atom, a chlorine atom and a bromine atom are more preferable. When A ² is a halogenated alkyl group, the halogen atom contained in the halogenated alkyl group is preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and more preferably a fluorine atom, a chlorine atom or a bromine atom. The halogenated alkyl group may be linear or branched, and is preferably linear. When A ² is a cyclic organic group, examples of the cyclic organic group are the same as the cyclic organic group that R ^c8 and R ^c9 have as a substituent. When A ² is an alkoxycarbonyl group, examples of the alkoxycarbonyl group are the same as the alkoxycarbonyl group which R ^c8 and R ^c9 have as a substituent.

Preferred specific examples of R ^c8 and R ^c9 include alkyl groups such as ethyl group, n-propyl group, n-butyl group, n-hexyl group, n-heptyl group, and n-octyl group; 2-methoxyethyl Group, 3-methoxy-n-propyl group, 4-methoxy-n-butyl group, 5-methoxy-n-pentyl group, 6-methoxy-n-hexyl group, 7-methoxy-n-heptyl group, 8-methoxy -N-octyl group, 2-ethoxyethyl group, 3-ethoxy-n-propyl group, 4-ethoxy-n-butyl group, 5-ethoxy-n-pentyl group, 6-ethoxy-n-hexyl group, 7- Alkoxyalkyl groups such as ethoxy-n-heptyl group and 8-ethoxy-n-octyl group; 2-cyanoethyl group, 3-cyano-n-propyl group, 4-cyano-n-butyl group, 5-cyano-n group - Cyanoalkyl groups such as ethyl, 6-cyano-n-hexyl, 7-cyano-n-heptyl and 8-cyano-n-octyl; 2-phenylethyl, 3-phenyl-n-propyl Phenylalkyl such as 4-phenyl-n-butyl, 5-phenyl-n-pentyl, 6-phenyl-n-hexyl, 7-phenyl-n-heptyl and 8-phenyl-n-octyl Group: 2-cyclohexylethyl group, 3-cyclohexyl-n-propyl group, 4-cyclohexyl-n-butyl group, 5-cyclohexyl-n-pentyl group, 6-cyclohexyl-n-hexyl group, 7-cyclohexyl-n- group Heptyl group, 8-cyclohexyl-n-octyl group, 2-cyclopentylethyl group, 3-cyclopentyl-n-propyl group, 4-cyclopenty Cycloalkylalkyl groups such as: n-butyl, 5-cyclopentyl-n-pentyl, 6-cyclopentyl-n-hexyl, 7-cyclopentyl-n-heptyl, and 8-cyclopentyl-n-octyl; 2-Methoxycarbonylethyl group, 3-methoxycarbonyl-n-propyl group, 4-methoxycarbonyl-n-butyl group, 5-methoxycarbonyl-n-pentyl group, 6-methoxycarbonyl-n-hexyl group, 7-methoxy Carbonyl-n-heptyl group, 8-methoxycarbonyl-n-octyl group, 2-ethoxycarbonylethyl group, 3-ethoxycarbonyl-n-propyl group, 4-ethoxycarbonyl-n-butyl group, 5-ethoxycarbonyl-n Pentyl group, 6-ethoxycarbonyl n-hexyl group, 7-ethoxy Alkoxycarbonylalkyl groups such as rubynyl-n-heptyl group and 8-ethoxycarbonyl-n-octyl group; 2-chloroethyl group, 3-chloro-n-propyl group, 4-chloro-n-butyl group, 5-chloro group -N-pentyl group, 6-chloro-n-hexyl group, 7-chloro-n-heptyl group, 8-chloro-n-octyl group, 2-bromoethyl group, 3-bromo-n-propyl group, 4-bromo -N-butyl group, 5-bromo-n-pentyl group, 6-bromo-n-hexyl group, 7-bromo-n-heptyl group, 8-bromo-n-octyl group, 3,3,3-trifluoro And propyl alkyl and halogenated alkyl groups such as 3,3,4,4,5,5,5-heptafluoro-n-pentyl group.

Preferred groups among the above as R ^c8 and R ^c9 are ethyl group, n-propyl group, n-butyl group, n-pentyl group, 2-methoxyethyl group, 2-cyanoethyl group, 2-phenylethyl group, 2-cyclohexylethyl group, 2-methoxycarbonylethyl group, 2-chloroethyl group, 2-bromoethyl group, 3,3,3-trifluoropropyl group, and 3,3,4,4,5,5,5-hepta It is a fluoro-n-pentyl group.

Examples of suitable organic groups as R ^c10 include, like R ^c7 , alkyl groups, alkoxy groups, cycloalkyl groups, cycloalkoxy groups, saturated aliphatic acyl groups, alkoxycarbonyl groups, saturated aliphatic acyloxy groups, substituents A phenyl group which may have a substituent, a phenoxy group which may have a substituent, a benzoyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, and a substituent A benzoyloxy group, a phenylalkyl group which may have a substituent, a naphthyl group which may have a substituent, a naphthoxy group which may have a substituent, a naphthoyl group which may have a substituent, A naphthoxy carbonyl group which may have a substituent, a naphthyloxy group which may have a substituent, a naphthylalkyl group which may have a substituent, a heterocyclist which may have a substituent Group, an optionally substituted heterocyclyl group, 1, or an amino group substituted with two organic groups, morpholin-1-yl group, and piperazine-1-yl group. Specific examples of these groups are the same as those described for R ^c7 . Further, R ^c10 is preferably a cycloalkylalkyl group, a phenoxyalkyl group which may have a substituent on the aromatic ring, or a phenylthioalkyl group which may have a substituent on the aromatic ring. The phenoxyalkyl group and the substituent which the phenylthioalkyl group may have are the same as the substituents which the phenyl group contained in R ^c7 may have.

Among organic groups, R ^c10 represents an alkyl group, a cycloalkyl group, a phenyl group which may have a substituent, or a cycloalkylalkyl group, a phenylthio which may have a substituent on an aromatic ring Alkyl groups are preferred. The alkyl group is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 8 carbon atoms, particularly preferably an alkyl group having 1 to 4 carbon atoms, and most preferably a methyl group. preferable. Among the phenyl group which may have a substituent, a methylphenyl group is preferable, and a 2-methylphenyl group is more preferable. The number of carbon atoms of the cycloalkyl group contained in the cycloalkylalkyl group is preferably 5 or more and 10 or less, more preferably 5 or more and 8 or less, and particularly preferably 5 or 6. 1 or more and 8 or less are preferable, as for the carbon atom number of the alkylene group contained in a cycloalkyl alkyl group, 1 or more and 4 or less are more preferable, and 2 is especially preferable. Among the cycloalkylalkyl groups, a cyclopentylethyl group is preferred. 1 or more and 8 or less are preferable, as for the carbon atom number of the alkylene group contained in the phenylthio alkyl group which may have a substituent on an aromatic ring, 1 or more and 4 or less are more preferable, and 2 is especially preferable. Among the phenylthioalkyl groups which may have a substituent on the aromatic ring, a 2- (4-chlorophenylthio) ethyl group is preferable.

Moreover, as R ^c10 , a group represented by -A ³ -CO-O-A ⁴ is also preferable. A ³ is a divalent organic group, preferably a divalent hydrocarbon group, and preferably an alkylene group. A ⁴ is a monovalent organic group, preferably a monovalent hydrocarbon group.

When A ³ is an alkylene group, the alkylene group may be linear or branched, and is preferably linear. When A ³ is an alkylene group, the number of carbon atoms in the alkylene group is preferably 1 or more and 10 or less, more preferably 1 or more and 6 or less, and particularly preferably 1 or more and 4 or less.

Preferred examples of A ^4, the number 1 to 10 alkyl group carbon atoms, having 7 or more carbon atoms and 20 or less aralkyl group, and an aromatic hydrocarbon group having 6 to 20 carbon atoms. Specific preferable examples of A ⁴ is methyl group, ethyl group, n- propyl group, an isopropyl group, n- butyl group, isobutyl group, sec- butyl group, tert- butyl group, n- pentyl group, n- hexyl Groups, phenyl group, naphthyl group, benzyl group, phenethyl group, α-naphthylmethyl group, β-naphthylmethyl group and the like.

Preferable specific examples of the group represented by -A ³ -CO-O-A ⁴ include 2-methoxycarbonylethyl group, 2-ethoxycarbonylethyl group, 2-n-propyloxycarbonylethyl group, 2-n -Butyloxycarbonylethyl group, 2-n-pentyloxycarbonylethyl group, 2-n-hexyloxycarbonylethyl group, 2-benzyloxycarbonylethyl group, 2-phenoxycarbonylethyl group, 3-methoxycarbonyl-n-propyl Group, 3-ethoxycarbonyl-n-propyl group, 3-n-propyloxycarbonyl-n-propyl group, 3-n-butyloxycarbonyl-n-propyl group, 3-n-pentyloxycarbonyl-n-propyl group , 3-n-hexyloxycarbonyl-n-propyl group, 3-benzyloxy carboni -n- propyl group, and 3-phenoxycarbonyl -n- propyl group and the like.

（式（ｃ４ａ）及び（ｃ４ｂ）中、Ｒ^ｃ１３及びＲ^ｃ１４はそれぞれ有機基であり、ｎ６は０以上４以下の整数であり、Ｒ^ｃ１３及びＲ^８がベンゼン環上の隣接する位置に存在する場合、Ｒ^ｃ１３とＲ^ｃ１４とが互いに結合して環を形成してもよく、ｎ７は１以上８以下の整数であり、ｎ８は１以上５以下の整数であり、ｎ９は０以上（ｎ８＋３）以下の整数であり、Ｒ^ｃ１５は有機基である。） ^Having described ^{R c10,} as the ^{R c10,} preferably a group represented by the following formula (C4a) or (C4b).

(In the formulas (c4a) and (c4b), R ^c13 and R ^c14 each represent an organic group, n6 is an integer of 0 or more and 4 or less, and R ^c13 and R ⁸ are present at adjacent positions on the benzene ring In the case, R ^c13 and R ^c14 may be bonded to each other to form a ring, n7 is an integer of 1 to 8; n8 is an integer of 1 to 5; n9 is 0 or more (n8 + 3) The following integers, and R ^c15 is an organic group.)

Examples of the organic group for R ^c13 and R ^c14 in the formula (c4a) are the same as R ^c7 . As R ^c13 , an alkyl group or a phenyl group is preferable. When R ^c13 is an alkyl group, the number of carbon atoms is preferably 1 or more and 10 or less, more preferably 1 or more and 5 or less, particularly preferably 1 or more and 3 or less, and most preferably 1. That is, R ^c13 is most preferably a methyl group. When R ^c13 and R ^c14 combine to form a ring, the ring may be an aromatic ring or an aliphatic ring. Preferred examples of the group represented by the formula (c4a), in which R ^c13 and R ^c14 form a ring, include a naphthalene-1-yl group, and 1,2,3,4- Tetrahydronaphthalen-5-yl and the like can be mentioned. In the above formula (c4a), n6 is an integer of 0 or more and 4 or less, preferably 0 or 1, and more preferably 0.

In the above formula (c4b), R ^c15 is an organic group. ^Examples of the organic group include the same groups as the organic groups described for R ^c7 . Of the organic groups, alkyl groups are preferred. The alkyl group may be linear or branched. The carbon atom number of the alkyl group is preferably 1 or more and 10 or less, more preferably 1 or more and 5 or less, and particularly preferably 1 or more and 3 or less. Preferred examples of R ^c15 include a methyl group, an ethyl group, a propyl group, an isopropyl group and a butyl group. Among these, a methyl group is more preferable.

  In the above formula (c4b), n8 is an integer of 1 or more and 5 or less, preferably an integer of 1 or more and 3 or less, and more preferably 1 or 2. In the above formula (c4b), n9 is 0 or more (n8 + 3) or less, preferably an integer of 0 or more and 3 or less, more preferably an integer of 0 or more and 2 or less, and particularly preferably 0. In the above formula (c4b), n7 is an integer of 1 to 8, preferably 1 to 5, more preferably 1 to 3, and particularly preferably 1 or 2.

In formula (c4), R ^c11 is a hydrogen atom, an alkyl group having 1 to 11 carbon atoms which may have a substituent, or an aryl group which may have a substituent. Preferred examples of the substituent which may be possessed when R ^c11 is an alkyl group include a phenyl group and a naphthyl group. Moreover, as a substituent which may be possessed when R ^c7 is an aryl group, an alkyl group having 1 to 5 carbon atoms, an alkoxy group, a halogen atom and the like are preferably exemplified.

In formula (c4), a hydrogen atom, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a phenyl group, a benzyl group, a methylphenyl group, a naphthyl group etc. are preferably exemplified as R ^c11 Among these, a methyl group or a phenyl group is more preferable.

Preferred specific examples of the compound represented by the formula (c4) include the following PI-43 to PI-83.

In the wavelength conversion substrate, the wavelength conversion material is often desired to be somewhat thick in order to reduce the amount of light passing through the wavelength conversion substrate without wavelength conversion. When the wavelength conversion material is thick, it may be difficult for a sufficient amount of exposure light to reach deep portions in the vicinity of the substrate for the photosensitive composition injected into a predetermined region. In this case, it is difficult to sufficiently cure the photosensitive composition in the vicinity of the substrate.
For this reason, it is desirable that the photosensitive composition has high sensitivity.
From the above, from the viewpoint of high sensitivity, the photosensitive composition is an oxime ester compound represented by the formula (c1) as the photopolymerization initiator (C) and / or an oxime ester compound represented by the formula (c4) It is preferable to include.

  The content of the photopolymerization initiator (C) is preferably 0.1% by mass to 30% by mass, and more preferably 0.5% by mass to 20% by mass, based on the total mass of the photosensitive composition. preferable. By making content of a photoinitiator (C) into said range, curability is favorable and it can obtain the photosensitive composition which pattern defect does not produce easily.

  When the photosensitive composition contains an oxime ester compound and an α-aminoalkylphenone photopolymerization initiator as a photopolymerization initiator (C) in combination, the content of the oxime ester compound in the photopolymerization initiator (C) Is preferably greater than the content of the .alpha.-aminoalkylphenone photopolymerization initiator. In this case, the content of the α-aminoalkylphenone photopolymerization initiator in the photopolymerization initiator (C) is preferably less than 50%, more preferably 1% by mass to 40% by mass, and 1% by mass. % Or more and 30% by mass or less is even more preferable. The upper limit of the content of the α-aminoalkylphenone photopolymerization initiator in the photopolymerization initiator (C) may be, for example, 20% by mass or less, as long as the object of the present invention is not inhibited. Or less. Moreover, 5 mass% or more may be sufficient as a minimum.

  Moreover, when a photosensitive composition contains the oxime ester compound represented by above-mentioned Formula (c4) as photoinitiator (C), it is represented by Formula (c4) in a photoinitiator (C). The content of the oxime ester compound is more preferably 10% by mass or more, still more preferably 30% by mass or more, and particularly preferably 50% by mass or more.

  When using together photoinitiators other than an oxime ester compound, 50 mass% or more is preferable, and, as for the ratio of the mass of an oxime ester compound with respect to the mass of a photoinitiator (C), 50 mass% or more and 99 mass% or less Is more preferably 70% by mass to 97% by mass, and most preferably 80% by mass to 95% by mass.

  A photoinitiator aid may be combined with the photopolymerization initiator (C). Examples of the photo-initiating aid include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 4-dimethylaminobenzoic acid 2- 4- Ethyl hexyl, 2-dimethylaminoethyl benzoate, N, N-dimethyl paratoluidine, 4,4'-bis (dimethylamino) benzophenone, 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9, 10-diethoxyanthracene, 2-ethyl-9, 10-diethoxyanthracene, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzoimidazole, 2-mercapto-5-methoxybenzothiazole 3-mercaptopropionic acid, 3-mercaptopropionic acid methyl, pentaerythritol tetra-mercapto acetate, thiol compounds such as 3-mercapto propionate. These photoinitiator adjuvants can be used individually or in combination of 2 or more types.

[Light scattering particle (D)]
As mentioned above, the photosensitive composition preferably comprises light scattering particles (D). The light scattering particles (D) change the traveling direction of light by scattering the light incident into the wavelength conversion material.

The light scattering particles (D) may be organic particles such as acrylic resin particles, styrene resin particles, melamine resin particles, and urethane resin particles. It is preferable that the light scattering particles (D) be inorganic particles, because they are excellent in heat resistance, scattering efficiency of incident light, and the like.
Preferred examples of the inorganic particles include aluminum-containing compounds such as Al ₂ O ₃ , zirconium-containing compounds such as ZrO ₂ , tin-containing compounds such as antimony-doped tin oxide (ATO) and indium tin oxide (ITO), MgO and MgF _And magnesium-containing compounds such as ₂ , titanium-containing compounds such as TiO ₂ and BaTiO ₃ , antimony-containing compounds such as Sb ₂ O ₅ , silicon-containing compounds such as SiO ₂ , and zinc-containing compounds such as ZnO.

The average particle diameter of the light scattering particles (D) is preferably 10 nm or more and 500 nm or less, and 30 nm or more, from the viewpoint that the discharge stability of the photosensitive composition from the ink jet head is good and the light scattering effect is good. 400 nm or less is more preferable, and 50 nm or more and 300 nm or less is particularly preferable.
The average particle size of the light scattering particles (D) can be defined as the 50% cumulative particle size (D ₅₀ ) in the cumulative distribution based on volume by laser diffraction.

  The light scattering particles (D) are treated with a coupling agent such as a silane coupling agent for the purpose of securing the light scattering particles in the cured product of the base component (A) or the base component (A). May be

  The content of the light scattering particles (D) in the photosensitive composition is excellent in a well-balanced manner between the effect of improving the wavelength conversion efficiency by light scattering of the wavelength conversion material and the ejection stability of the photosensitive composition from the ink jet head. From the point of view, 0.1 mass% or more and 10 mass% or less is preferable with respect to the mass of the photosensitive composition, 0.5 mass% or more and 8 mass% or less is more preferable, and 1 mass% or more and 5 mass% or less preferable.

[Thermosetting compound (E)]
The photosensitive composition also preferably contains a thermosetting compound (E). When the photosensitive composition contains the thermosetting compound (E), a wavelength conversion material which is well cured can be formed by heating after exposing the photosensitive composition.

  As a thermosetting compound (E), the various thermosetting compounds conventionally mix | blended with the photosensitive composition can be used. Moreover, you may contain the hardening agent according to the kind of thermosetting compound (E) and a thermosetting compound (E) as needed. When a curing agent is used, in view of the long-term stability of the photosensitive composition, it is preferable to use a latent curing agent which causes a function as a curing agent by baking.

  As a typical example of a thermosetting compound (E), an isocyanate compound, a melamine compound, an oxetane compound, an epoxy compound etc. are mentioned. Among these, an epoxy compound and an oxetane compound are preferable, and an epoxy compound is more preferable, because the curability is good.

  As the epoxy compound, a (E1) polyfunctional epoxy compound is preferable because it can form a crosslink densely in a cured wavelength conversion material. Here, the (E1) polyfunctional epoxy compound is an epoxy compound having two or more epoxy groups in one molecule. When the photosensitive composition contains (E1) a polyfunctional epoxy compound as a thermosetting compound (E), it is easy to form a wavelength conversion material having good adhesion to a substrate or partition, solvent resistance, heat resistance, etc. .

Examples of general-purpose epoxy compounds include bifunctional epoxy resins such as bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol S epoxy resin, bisphenol AD epoxy resin, naphthalene epoxy resin, and biphenyl epoxy resin. 9,9-bis [4- (glycidyloxy) phenyl] -9H-fluorene, 9,9-bis [4- [2- (glycidyloxy) ethoxy] phenyl] -9H-fluorene, 9,9-bis [ 4- [2- (glycidyloxy) ethyl] phenyl] -9H-fluorene, 9,9-bis [4- (glycidyloxy) -3-methylphenyl] -9H-fluorene, 9,9-bis [4- ( Glycidyloxy) -3,5-dimethylphenyl] -9H-fluorene, and 9,9-bis (6 Epoxy group-containing fluorene compounds such as glycidyl oxynaphthalen-2-yl) -9H-fluorene; glycidyls such as tetraglycidyl aminodiphenylmethane, triglycidyl-p-aminophenol, tetraglycidyl metaxylylene diamine, and tetraglycidyl bisaminomethyl cyclohexane Amine type epoxy resin; Phloroglycinol triglycidyl ether, trihydroxybiphenyl triglycidyl ether, trihydroxyphenylmethane triglycidyl ether, 2- [4- (2,3-epoxypropoxy) phenyl] -2- [4- [1 , 1-bis [4- (2,3-epoxypropoxy) phenyl] ethyl] phenyl] propane and 1,3-bis [4- [1- [4- (2,3-epoxypropoxy) phenyl]- Trifunctional epoxy resins such as-[4- [1- [4- (2,3-epoxypropoxy) phenyl] -1-methylethyl] phenyl] ethyl] phenoxy] -2-propanol; tetrahydroxyphenylethane tetraglycidyl 1,2-Epoxy-4- (2-) of tetrafunctional epoxy resin 2,2-bis (hydroxymethyl) -1-butanol such as ether, tetraglycidyl benzophenone, bisresorcinol tetraglycidyl ether, and tetraglycidoxybiphenyl Oxiranyl) cyclohexane adducts are mentioned.
A 1,2-epoxy-4- (2-oxiranyl) cyclohexane adduct of 2,2-bis (hydroxymethyl) -1-butanol is commercially available as EHPE-3150 (manufactured by Daicel).

Also, oligomeric or polymeric polyfunctional epoxy compounds can be preferably used as the epoxy compound.
Typical examples include phenol novolac epoxy compounds, brominated phenol novolac epoxy compounds, ortho cresol novolac epoxy compounds, xylenol novolac epoxy compounds, naphthol novolac epoxy compounds, bisphenol A novolac epoxy compounds, bisphenol AD novolac Type epoxy compounds, epoxy compounds of dicyclopentadiene type phenol resin, epoxy compounds of naphthalene type phenol resin, and the like.

（式（ｅ１）中、ＯＧｌｙは、グリシジルオキシ基であり、Ｒ^ｅ１は、ハロゲン原子、又は炭素原子数１以上８以下の１価の基であり、ｎａは０以上４以下の整数であり、ｎｂは括弧内のユニットの繰り返し数であり、ａが２以上の整数である場合、ベンゼン環上で隣接する２つのＲ^ｅ１は、互いに結合して環を形成してもよく、Ｒ^ｅ２は、２価の脂肪族環式基、又は下記式（ｅ１−１）：

で表される基であり、式（ｅ１−１）中、ＯＧｌｙは、グリシジルオキシ基であり、Ｒ^ｅ３は、芳香族炭化水素基であり、Ｒ^ｅ４は、ハロゲン原子、又は炭素原子数１以上４以下のアルキル基であり、ｎｃは０又は１であり、ｎｄは０以上８以下の整数であり、Ｒ^ｅ５は、水素原子、又は下記式（ｅ１−２）：

で表される基であり、式（ｅ１−２）中、ＯＧｌｙは、グリシジルオキシ基であり、Ｒ^ｅ６は、ハロゲン原子、炭素原子数１以上４以下のアルキル基、又はフェニル基であり、ｎｅは０以上４以下の整数である。） Moreover, the compound represented by following formula (e1) is also mentioned as a preferable example of a polyfunctional epoxy compound of an oligomer or a polymer type.

In the formula (e1), O GIy is a glycidyloxy group, R ^e1 is a halogen atom, or a monovalent group having 1 to 8 carbon atoms, and na is an integer of 0 to 4 When n b is the repeating number of the unit in parentheses and a is an integer of 2 or more, two adjacent R ^e1s on the benzene ring may bond to each other to form a ring, and R ^e2 is A divalent aliphatic cyclic group, or the following formula (e1-1):

In the formula (e1-1), O Gly is a glycidyloxy group, R ^e3 is an aromatic hydrocarbon group, R ^e4 is a halogen atom, or one or more carbon atoms 4 or less alkyl group, nc is 0 or 1, nd is an integer of 0 or more and 8 or less, R ^e5 is a hydrogen atom, or the following formula (e1-2):

In the formula (e1-2), O Gly is a glycidyloxy group, R ^e6 is a halogen atom, an alkyl group having 1 to 4 carbon atoms, or a phenyl group, ne Is an integer of 0 or more and 4 or less. )

The epoxy compound represented by the above formula (e1) preferably has an average molecular weight of 800 or more. By using a compound having such an average molecular weight as the epoxy compound represented by the formula (e1), it is easy to form a wavelength conversion material excellent in water resistance and strength.
1000 or more are preferable, as for the average molecular weight of the epoxy compound represented by Formula (e1), 1200 or more are more preferable, and 1500 or more are especially preferable. Moreover, 50000 or less is preferable and, as for the average molecular weight of the epoxy compound represented by Formula (e1), 20000 or less is more preferable.

In formula (e1), R ^e1 is a halogen atom or a monovalent group having 1 to 8 carbon atoms. Specific examples of the monovalent group having 1 to 8 carbon atoms include an alkyl group, an alkoxy group, a phenoxy group, an aliphatic acyl group, an aliphatic acyloxy group, a benzoyl group, a benzyl group, a phenethyl group, and an unsaturated fatty acid. Group hydrocarbon groups.
The alkyl group, alkoxy group, aliphatic acyl group, aliphatic acyloxy group, and unsaturated aliphatic hydrocarbon group may be linear or branched.

Preferred examples of the halogen atom as R ^e1 include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom. Preferred examples of the alkyl group as R ^e1 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group and a tert-butyl group, and a methyl group And ethyl groups are more preferred.

When R ^e1 is a monovalent group having 1 to 8 carbon atoms, the monovalent group is preferably an alkyl group or an alkoxy group.
Specific examples of the alkyl group are methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, and 2-ethylhexyl group are mentioned.
Specific examples of the alkoxy group are methoxy group, ethoxy group, n-propyloxy group, isopropyloxy group, n-butyloxy group, isobutyloxy group, sec-butyloxy group, tert-butyloxy group, n-pentyloxy group, n And -hexyloxy group, n-heptyloxy group, n-octyloxy group, and 2-ethylhexyloxy group.

Further, when na is an integer of 2 or more and 4 or less, two R ^e1 adjacent to each other on the benzene ring among a plurality of R ^e1 may be bonded to each other to form a ring. The ring formed by combining 2 R ^e1 may be an aromatic ring or an aliphatic ring, and may be a hydrocarbon ring or a heterocyclic ring.
When the ring formed by combining 2 R ^e1 is a heterocyclic ring, examples of the hetero atom contained in the ring include N, O, S, and Se.
Preferred examples of the group which is formed together with the benzene ring by the bonding of R ^{e1 of} 2 include a naphthalene ring and a tetralin ring.

In Formula (e1), the divalent aliphatic cyclic group as R ^e2 is not particularly limited, and two or more rings of monocyclic groups may be other cyclic groups. In addition, it is preferable that a bivalent aliphatic cyclic group does not generally contain an epoxy group in the structure, and does not contain an epoxy group.
Specific examples of the divalent aliphatic cyclic group include groups in which two hydrogen atoms have been removed from a polycycloalkane such as a monocycloalkane, bicycloalkane, tricycloalkane or tetracycloalkane. More specifically, monocycloalkanes such as cyclopentane and cyclohexane, and groups in which two hydrogen atoms have been removed from polycycloalkanes such as adamantane, norbornane, isobornane, tricyclodecane and tetracyclododecane can be mentioned.
The number of carbon atoms of the divalent aliphatic cyclic group is preferably 3 or more and 50 or less, more preferably 3 or more and 30 or less, particularly preferably 3 or more and 20 or less, and most preferably 3 or more and 15 or less.

Specific examples of the divalent aliphatic cyclic group as R ^e2 include the groups shown below.

R ^e3 is an aromatic hydrocarbon group. The valence of the aromatic hydrocarbon group as R ^e3 is 2 + nc + nd. The aromatic hydrocarbon group is not particularly limited. The aromatic hydrocarbon ring constituting the aromatic hydrocarbon group is typically a 6-membered aromatic hydrocarbon ring (benzene ring) or two or more benzene rings fused to each other or bonded via a single bond Ring.
Preferred specific examples of the aromatic hydrocarbon ring constituting the aromatic hydrocarbon group are benzene, naphthalene, anthracene, phenanthrene, biphenyl and terphenyl. These aromatic hydrocarbon rings 2 + nc + nd number of groups other than a hydrogen atom are preferred as the aromatic hydrocarbon group as R ^A3.

In the group represented by formula (e1-1), nc is 0 or 1. That is, the glycidyloxy group may not be bonded to the aromatic hydrocarbon group R ^e3, and one glycidyloxy group may be bonded.

In the group represented by formula (e1-1), R ^e4 is a halogen atom or an alkyl group having 1 to 4 carbon atoms, and d is an integer of 0 to 8 inclusive. That is, R ^e4 is a substituent other than the glycidyloxy group on R ^e3 which is an aromatic hydrocarbon group, and the number of substituents on R ^e3 is 0 or more and 8 or less. The integer of 0 or more and 4 or less is preferable, as for nd, the integer of 0 or more and 2 or less is more preferable, and 0 or 1 is especially preferable.
Preferred examples of the halogen atom as R ^e4 include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom. Preferred examples of the alkyl group as R ^e4 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group and a tert-butyl group, and a methyl group And ethyl groups are more preferred.

In the group represented by Formula (e1-1), R ^e5 is a hydrogen atom or a group represented by Formula (e1-2) described above.
R ^e6 in the formula (e1-2) is a halogen atom, an alkyl group having 1 to 4 carbon atoms, or a phenyl group. About the specific example of a halogen atom and a C1-C4 alkyl group, it is the same as that of R ^e4 .

With regard to the epoxy compound represented by the formula (e1) described above, R ^e2 is a divalent aliphatic cyclic group or a divalent group represented by the above-mentioned formula (e1-1) Preferably, nc is 0 and R ^e5 is a hydrogen atom.
In this case, the presence of an appropriate distance between the plurality of epoxy groups contained in the epoxy compound represented by the formula (e1) facilitates the formation of a cured product having better water resistance.

  The epoxy compound represented by Formula (e1) is available as a commercial item. Specific examples of commercially available products include NC-series and XD-series manufactured by Nippon Kayaku Co., Ltd. Also, equivalent products having a specific structure can be obtained from DIC Corporation and Showa Denko Corporation.

The chemical structures of preferred examples of the epoxy compound represented by the formula (e1) are described below. In the following formula, OCly represents a glycidyloxy group, and p represents the number of repeating units in parentheses.

Other examples of suitable epoxy compounds include polyfunctional alicyclic epoxy compounds having an alicyclic epoxy group. Specific examples of such alicyclic epoxy compounds include 2- (3,4-epoxycyclohexyl-5,5-spiro-3,4-epoxy) cyclohexane-meta-dioxane, bis (3,4-epoxycyclohexylmethyl) Adipate, bis (3,4-epoxy-6-methylcyclohexylmethyl) adipate, 3,4-epoxy-6-methylcyclohexyl-3 ', 4'-epoxy-6'-methylcyclohexanecarboxylate, ε-caprolactone modified 3 , 4-Epoxycyclohexylmethyl-3 ', 4'-epoxycyclohexanecarboxylate, trimethylcaprolactone modified 3,4-epoxycyclohexylmethyl-3', 4'-epoxycyclohexanecarboxylate, β-methyl-δ-valerolactone modified 3 , 4-Epoxycyclohexyl Methyl-3 ', 4'-epoxycyclohexanecarboxylate, methylenebis (3,4-epoxycyclohexane), di (3,4-epoxycyclohexylmethyl) ether of ethylene glycol, ethylenebis (3,4-epoxycyclohexanecarboxylate) And polyfunctional epoxy compounds having a tricyclodecene oxide group, and compounds represented by the following formulas (E1-1) to (E1-5).
These alicyclic epoxy compounds may be used alone or in combination of two or more.

（式（Ｅ１−１）中、Ｚは単結合又は連結基（１以上の原子を有する二価の基）を示す。Ｒ^Ｅ１〜Ｒ^Ｅ１８は、それぞれ独立に、水素原子、ハロゲン原子、及び有機基からなる群より選択される基である。）

(In Formula (E1-1), Z represents a single bond or a linking group (a divalent group having one or more atoms). R ^{E1 to} R ^E18 each independently represent a hydrogen atom, a halogen atom, or an organic group A group selected from the group consisting of groups)

As the linking group Z, for example, a divalent hydrocarbon group, —O—, —O—CO—, —S—, —SO—, —SO ₂ —, —CBr ₂ —, —C (CBr ₃ ) _{2 -, - C (CF 3)} 2 -, and ^-R E19 -O-CO- 2 divalent group and which are selected from the group consisting of these can be exemplified a plurality bonded group.

  Examples of the divalent hydrocarbon group as the linking group Z include linear or branched alkylene groups having 1 to 18 carbon atoms, and divalent alicyclic hydrocarbon groups. it can. As a linear or branched alkylene group having 1 to 18 carbon atoms, for example, methylene, methylmethylene, dimethylmethylene, dimethylene, trimethylene and the like can be mentioned. Examples of the divalent alicyclic hydrocarbon group include a 1,2-cyclopentylene group, a 1,3-cyclopentylene group, a cyclopentylidene group, a 1,2-cyclohexylene group, and a 1,3-disubstituted cycloaliphatic hydrocarbon group. Cycloalkylene groups (including cycloalkylidene groups) such as cyclohexylene group, 1,4-cyclohexylene group, cyclohexylidene group and the like can be mentioned.

R ^E19 is an alkylene group having 1 to 8 carbon atoms, and is preferably a methylene group or an ethylene group.

(In Formula (E1-2), R ^{E1 to} R ^E12 are a group selected from the group consisting of a hydrogen atom, a halogen atom, and an organic group.)

（式（Ｅ１−３）中、Ｒ^Ｅ１〜Ｒ^Ｅ１０は、水素原子、ハロゲン原子、及び有機基からなる群より選択される基である。Ｒ^Ｅ２及びＲ^Ｅ８は、互いに結合してもよい。）

(In Formula (E1-3), R ^{E1 to} R ^E10 are a group selected from the group consisting of a hydrogen atom, a halogen atom, and an organic group. R ^E2 and R ^E8 may be bonded to each other. )

（式（Ｅ１−４）中、Ｒ^Ｅ１〜Ｒ^Ｅ１２は、水素原子、ハロゲン原子、及び有機基からなる群より選択される基である。Ｒ^Ｅ２及びＲ^Ｅ１０は、互いに結合してもよい。）

(In Formula (E1-4), R ^{E1 to} R ^E12 are a group selected from the group consisting of a hydrogen atom, a halogen atom, and an organic group. R ^E2 and R ^E10 may be bonded to each other. )

（式（Ｅ１−５）中、Ｒ^Ｅ１〜Ｒ^Ｅ１２は、水素原子、ハロゲン原子、及び有機基からなる群より選択される基である。）

(In formula (E1-5), R ^{E1 to} R ^E12 are a group selected from the group consisting of a hydrogen atom, a halogen atom, and an organic group.)

In the formulas (E1-1) to (E1-5), when R ^{E1 to} R ^E18 is an organic group, the organic group is not particularly limited as long as the object of the present invention is not impaired, and even if it is a hydrocarbon group Or a group consisting of a carbon atom and a halogen atom, or may be a group containing a halogen atom, an oxygen atom, a sulfur atom, a nitrogen atom, a hetero atom such as a silicon atom, as well as a carbon atom and a hydrogen atom . Examples of the halogen atom include chlorine atom, bromine atom, iodine atom, and fluorine atom.

  As an organic group, a group consisting of a hydrocarbon group, a carbon atom, a hydrogen atom and an oxygen atom, a halogenated hydrocarbon group, a group consisting of a carbon atom, an oxygen atom and a halogen atom, a carbon atom and a hydrogen atom And the group which consists of an oxygen atom and a halogen atom is preferable. When the organic group is a hydrocarbon group, the hydrocarbon group may be an aromatic hydrocarbon group, an aliphatic hydrocarbon group, or a group containing an aromatic skeleton and an aliphatic skeleton. The number of carbon atoms in the organic group is preferably 1 or more and 20 or less, more preferably 1 or more and 10 or less, and particularly preferably 1 or more and 5 or less.

  Specific examples of the hydrocarbon group include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-pentyl group and n-hexyl group , N-heptyl group, n-octyl group, 2-ethylhexyl group, n-nonyl group, n-decyl group, n-undecyl group, n-tridecyl group, n-tetradecyl group, n-pentadecyl group, n-hexadecyl group And linear alkyl groups such as n-heptadecyl, n-octadecyl, n-nonadecyl and n-icosyl; vinyl, 1-propenyl, 2-n-propenyl (allyl), 1-n -Chain-like alkenyl groups such as butenyl group, 2-n-butenyl group and 3-n-butenyl group; cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group And cycloalkyl groups such as cycloheptyl group; phenyl group, o-tolyl group, m-tolyl group, p-tolyl group, α-naphthyl group, β-naphthyl group, β-naphthyl group, biphenyl-4-yl group, biphenyl-3-yl group Aryl group such as biphenyl-2-yl group, anthryl group and phenanthryl group; benzyl group, phenethyl group, α-naphthylmethyl group, β-naphthylmethyl group, α-naphthylethyl group and β-naphthylethyl group And aralkyl groups such as

  Specific examples of the halogenated hydrocarbon group are chloromethyl group, dichloromethyl group, trichloromethyl group, bromomethyl group, dibromomethyl group, tribromomethyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, 2, 2 , 2-trifluoroethyl group, pentafluoroethyl group, heptafluoropropyl group, perfluorobutyl group, perfluoropentyl group, perfluorohexyl group, perfluoroheptyl group, perfluorooctyl group, perfluorononyl group, and Halogenated linear alkyl group such as perfluorodecyl group; 2-chlorocyclohexyl group, 3-chlorocyclohexyl group, 4-chlorocyclohexyl group, 2,4-dichlorocyclohexyl group, 2-bromocyclohexyl group, 3-bromocyclohexyl group , And 4- Halogenated cycloalkyl group such as mocyclohexyl group; 2-chlorophenyl group, 3-chlorophenyl group, 4-chlorophenyl group, 2,3-dichlorophenyl group, 2,4-dichlorophenyl group, 2,5-dichlorophenyl group, 2, 6 -Dichlorophenyl group, 3,4-dichlorophenyl group, 3,5-dichlorophenyl group, 2-bromophenyl group, 3-bromophenyl group, 4-bromophenyl group, 2-fluorophenyl group, 3-fluorophenyl group, 4- Halogenated aryl groups such as fluorophenyl group; 2-chlorophenylmethyl group, 3-chlorophenylmethyl group, 4-chlorophenylmethyl group, 2-bromophenylmethyl group, 3-bromophenylmethyl group, 4-bromophenylmethyl group, 2 -Fluorophenylmethyl group, 3-fluorophenyl Methyl group, a halogenated aralkyl group such as 4-fluorophenyl methyl group.

  Specific examples of the group consisting of carbon atom, hydrogen atom and oxygen atom are hydroxy chain such as hydroxymethyl group, 2-hydroxyethyl group, 3-hydroxy-n-propyl group and 4-hydroxy-n-butyl group Alkyl group; halogenated cycloalkyl group such as 2-hydroxycyclohexyl group, 3-hydroxycyclohexyl group, and 4-hydroxycyclohexyl group; 2-hydroxyphenyl group, 3-hydroxyphenyl group, 4-hydroxyphenyl group, 2, 3 -Hydroxyaryl groups such as dihydroxyphenyl group, 2,4-dihydroxyphenyl group, 2,5-dihydroxyphenyl group, 2,6-dihydroxyphenyl group, 3,4-dihydroxyphenyl group, and 3,5-dihydroxyphenyl group 2-hydroxyphenylmethyl group, 3-hydroxy Hydroxyaralkyl groups such as phenylmethyl group and 4-hydroxyphenylmethyl group; methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butyloxy group, isobutyloxy group, sec-butyloxy group, tert-butyloxy group, n-pentyloxy group, n-hexyloxy group, n-heptyloxy group, n-octyloxy group, 2-ethylhexyloxy group, n-nonyloxy group, n-decyloxy group, n-undecyloxy group, n-trioxy group Decyloxy, n-tetradecyloxy, n-pentadecyloxy, n-hexadecyloxy, n-heptadecyloxy, n-octadecyloxy, n-nonadecyloxy, n-icosyloxy, etc. Linear alkoxy group; vinyloxy group, 1-propenyl group A chain alkenyloxy group such as a cis group, 2-n-propenyloxy group (allyloxy group), 1-n-butenyloxy group, 2-n-butenyloxy group, and 3-n-butenyloxy group; phenoxy group, o-tolyloxy Group, m-tolyloxy group, p-tolyloxy group, α-naphthyloxy group, β-naphthyloxy group, biphenyl-4-yloxy group, biphenyl-3-yloxy group, biphenyl-2-yloxy group, anthryloxy group, And aryloxy groups such as phenanthryloxy groups; benzyloxy groups, phenethyloxy groups, α-naphthylmethyloxy groups, β-naphthylmethyloxy groups, α-naphthylethyloxy groups, β-naphthylethyloxy groups and the like Aralkyloxy group; methoxymethyl group, ethoxymethyl group, n-propoxymethyl group , 2-methoxyethyl group, 2-ethoxyethyl group, 2-n-propoxyethyl group, 3-methoxy-n-propyl group, 3-ethoxy-n-propyl group, 3-n-propoxy-n-propyl group, Alkoxyalkyl groups such as 4-methoxy-n-butyl group, 4-ethoxy-n-butyl group, and 4-n-propoxy-n-butyl group; methoxymethoxy group, ethoxymethoxy group, n-propoxymethoxy group, 2 4-methoxyethoxy group, 2-ethoxyethoxy group, 2-n-propoxyethoxy group, 3-methoxy-n-propoxy group, 3-ethoxy-n-propoxy group, 3-n-propoxy-n-propoxy group, 4- Alkoxy alkoxy such as methoxy-n-butyloxy group, 4-ethoxy-n-butyloxy group, and 4-n-propoxy-n-butyloxy group Groups; alkoxyaryl groups such as 2-methoxyphenyl group, 3-methoxyphenyl group, and 4-methoxyphenyl group; alkoxyaryloxy groups such as 2-methoxyphenoxy group, 3-methoxyphenoxy group, and 4-methoxyphenoxy group Aliphatic acyl groups such as formyl group, acetyl group, propionyl group, butanoyl group, pentanoyl group, hexanoyl group, heptanoyl group, octanoyl group, nonanoyl group, and decanoyl group; benzoyl group, α-naphthoyl group, and β-naphthoyl group Aromatic acyl groups such as groups; methoxycarbonyl group, ethoxycarbonyl group, n-propoxycarbonyl group, n-butyloxycarbonyl group, n-pentyloxycarbonyl group, n-hexylcarbonyl group, n-heptyloxycarbonyl group, n -Octyloxy Chain-like alkyloxycarbonyl groups such as rubonyl group, n-nonyloxycarbonyl group and n-decyloxycarbonyl group; and aryloxycarbonyl groups such as phenoxycarbonyl group, α-naphthoxy carbonyl group and β-naphthoxy carbonyl group Aliphatics such as formyloxy group, acetyloxy group, propionyloxy group, butanoyloxy group, pentanoyloxy group, hexanoyloxy group, heptanoyloxy group, octanoyloxy group, nonanoyloxy group, and decanoyloxy group Acyloxy groups; aromatic acyloxy groups such as benzoyloxy group, α-naphthoyloxy group, and β-naphthoyloxy group.

R ^{E1 to} R ^E18 are preferably each independently a group selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms, In particular, it is more preferable that all of R ^{E1 to} R ^E18 be hydrogen atoms because it is easy to form a wavelength conversion material excellent in mechanical properties.

Wherein ^{(E1-2) ~ (E1-5),} R E1 ~R E12 is the same as ^R E1 ^{to R E12} in Formula (E1-1). In Formula (E1-2) and Formula (E1-4), examples of the divalent group formed when R ^E2 and R ^E10 bond to each other include, for example, -CH ₂ -and -C (CH ₃ ). _2- . In Formula (E1-3), examples of the divalent group formed when R ^E2 and R ^E8 bond to each other include -CH ₂ -and -C (CH ₃ ) _2- .

Among the alicyclic epoxy compounds represented by the formula (E1-1), specific examples of suitable compounds include those represented by the following formulas (E1-1a), (E1-1b), and (E1-1c) May include the alicyclic epoxy compounds, 2,2-bis (3,4-epoxycyclohexan-1-yl) propane [= 2,2-bis (3,4-epoxycyclohexyl) propane], etc. it can.

Among the alicyclic epoxy compounds represented by the formula (E1-2), specific examples of preferable compounds include bicyclononadiene diepoxide represented by the following formula (E1-2a) or dicyclononadiene diepoxide Etc.

As a specific example of a suitable compound among the alicyclic epoxy compounds represented by Formula (E1-3), S spiro [3-oxatricyclo [3.2.1.0 ^2,4 ] octane-6 , 2′-oxirane] and the like.

  Among the alicyclic epoxy compounds represented by the formula (E1-4), specific examples of preferable compounds include 4-vinylcyclohexene dioxide, dipentene dioxide, limonene dioxide, 1-methyl-4- (3) And -methyl oxirane-2-yl) -7-oxabicyclo [4.1.0] heptane and the like.

  Among the alicyclic epoxy compounds represented by the formula (E1-5), specific examples of suitable compounds include 1,2,5,6-diepoxycyclooctane and the like.

（式（Ｅ−１）中、Ｘ^ｅ１、Ｘ^ｅ２、及びＸ^ｅ３は、それぞれ独立に、水素原子、又はエポキシ基を含んでいてもよい有機基であり、Ｘ^ｅ１、Ｘ^ｅ２、及びＸ^ｅ３が有するエポキシ基の総数が２以上である。）、 Furthermore, a compound represented by the following formula (E-1) can be suitably used as an epoxy compound.

(In the formula (E-1), X ^e1 , X ^e2 and X ^e3 each independently represent a hydrogen atom or an organic group which may contain an epoxy group, and X ^e1 , X ^e2 and X ^e3 Has a total number of epoxy groups of 2 or more),

（式（Ｅ１−６）中、Ｒ^ｅ２０〜Ｒ^ｅ２２は、直鎖状、分岐鎖状又は環状のアルキレン基、アリーレン基、−Ｏ−、−Ｃ（＝Ｏ）−、−ＮＨ−及びこれらの組み合わせからなる基であり、それぞれ同一であってもよいし、異なっていてもよい。Ｅ^１〜Ｅ^３は、エポキシ基、オキセタニル基、エチレン性不飽和基、アルコキシシリル基、イソシアネート基、ブロックイソシアネート基、チオール基、カルボキシ基、水酸基及びコハク酸無水物基からなる群より選択される少なくとも１種の置換基又は水素原子である。ただし、Ｅ^１〜Ｅ^３のうち少なくとも２つは、エポキシ基を有する基である。） As a compound represented by the said Formula (E-1), the compound represented by a following formula (E1-6) is preferable.

(In the formula (E1-6), R ^{e20 to} R ^{e22 each} represents a linear, branched or cyclic alkylene group, an arylene group, -O-, -C (= O)-, ^-NH- , and the like, E ^{1 to} E ³ may each be an epoxy group, an oxetanyl group, an ethylenically unsaturated group, an alkoxysilyl group, an isocyanate group, or a blocked isocyanate. At least one type of substituent or hydrogen atom selected from the group consisting of groups, thiol groups, carboxy groups, hydroxyl groups and succinic anhydride groups, provided that at least two of E ^{1 to} E ³ are epoxy groups Is a group having

In the formula (E1-6), at least two of groups represented by R ^e20 and E ¹ , R ^e21 and E ² , and R ^e22 and E ³ are represented by the following formula (E1-6 a), for example Are preferably groups, and each is more preferably a group represented by the following formula (E1-6a). It is preferable that the several group represented by Formula (E1-6a) couple | bonded with one compound is the same group.
-L-C ^a (E1-6a)
(In the formula (E1-6a), L represents a linear, branched or cyclic alkylene group, an arylene group, -O-, -C (= O)-, -NH- and a combination thereof C ^a is an epoxy group, and in the formula (E1-6a), L and C ^a may combine to form a cyclic structure.)

  In the formula (E1-6a), as a linear, branched or cyclic alkylene group as L, an alkylene group having 1 to 10 carbon atoms is preferable, and as the arylene group as L, carbon is An arylene group having 5 to 10 atoms is preferable. In the formula (E1-6a), L is a linear alkylene group having 1 to 3 carbon atoms, a phenylene group, -O-, -C (= O)-, -NH- and a combination thereof And is preferably at least one of a linear alkylene group having 1 to 3 carbon atoms such as methylene group and a phenylene group, or these, -O-, -C (= O)-and The group which consists of a combination with at least 1 sort (s) of NH- is preferable.

（式（Ｅ１−６ｂ）中、Ｒ^ｅ２３は、水素原子又はメチル基である。） In the case where in the formula (E1-6a), L and C ^a are bonded to form a cyclic structure, for example, a branched alkylene group and an epoxy group are bonded to form a cyclic structure (alicyclic structure When it has formed the structure which has an epoxy group, the organic group represented by a following formula (E1-6b) or (E1-6c) is mentioned.

(In the formula ^{(E1-6b), R e23} is a hydrogen atom or a methyl group.)

Hereinafter, although the example of the epoxy compound which has oxiranyl group or an alicyclic epoxy group is shown as an example of a compound represented by Formula (E1-6), it is not limited to these.

  Moreover, as a compound which can be suitably used as an epoxy compound, the siloxane compound (Hereinafter, it is only described also as a "siloxane compound.") Which has a 2 or more epoxy group in a molecule | numerator can be mentioned.

A siloxane compound is a compound which has a siloxane skeleton comprised by the siloxane bond (Si-O-Si), and two or more glycidyl groups in a molecule | numerator.
Examples of the siloxane skeleton in the siloxane compound include a cyclic siloxane skeleton and a cage-type or ladder-type polysilsesquioxane skeleton.

Among these, as the siloxane compound, a compound having a cyclic siloxane skeleton represented by the following formula (E1-7) (hereinafter sometimes referred to as “cyclic siloxane”) is preferable.

In the formula (E1-7), R ^e24 and R ^{e25 each} represent a monovalent group containing an epoxy group or an alkyl group. However, among the x1 amino ^{R e24} and x1 amino ^{R e25} in the compound represented by formula (E1-7), at least two is a monovalent group containing an epoxy group. Further, x1 in the formula (E1-7) represents an integer of 3 or more. In the compounds represented by formula (E1-7), R ^e24 and R ^e25 may be identical to or different from each other. In addition, plural ^{Re 24} may be identical or different. Plural ^{Re 25} may also be the same or different.

The monovalent group containing an epoxy group, a glycidyl ether group represented by -D-O-R ^e26 [D represents an alkylene group, R ^e26 represents a glycidyl group] are preferable. As the above-mentioned D (alkylene group), for example, a linear or branched alkylene group having 1 to 18 carbon atoms, such as methylene group, methyl methylene group, dimethyl methylene group, dimethylene group, trimethylene group, etc. It can be mentioned.
In addition, an alicyclic epoxy group-containing group represented by -D-R ^e27 is also preferable. R ^e27 is an epoxy cycloalkyl group. D is an alkylene group as described above. Preferred examples of the alkylene group as D are also as described above. As an epoxy cycloalkyl group as R ^{e 27} , a 2,3-epoxycyclopentyl group, a 3,4-epoxycyclohexyl group, and a 2,3-epoxycyclohexyl group are preferable. As a group represented by -D-R ^e27 , a 2- (3,4-epoxycyclohexyl) ethyl group is preferable.

Preferred examples of the alkyl group as R ^e24 and R ^e25 include, for example, 1 to 18 carbon atoms such as methyl, ethyl, propyl and isopropyl groups (preferably 1 to 6 carbon atoms, particularly preferably Preferably, a linear or branched alkyl group having 1 to 3 carbon atoms can be mentioned.

  In the formula (E1-7), x1 represents an integer of 3 or more, and in particular, an integer of 3 or more and 6 or less is preferable in terms of excellent crosslinking reactivity when forming a wavelength conversion material.

  The number of epoxy groups that the siloxane compound has in the molecule is 2 or more, and 2 or more and 6 or less are preferable, and 2 or more and 4 or less are preferable from the viewpoint of excellent crosslinking reactivity when forming a wavelength conversion material. It is below.

  The photosensitive composition is, besides the siloxane compound represented by the formula (E1-7), an alicyclic epoxy group-containing cyclic siloxane, an alicyclic epoxy group-containing silicone resin described in JP-A-2008-248169, And a compound having a siloxane skeleton such as an organopolysilsesquioxane resin having at least two epoxy functional groups in one molecule described in JP-A-2008-19422.

  As a siloxane compound, more specifically, cyclic siloxane etc. which have 2 or more epoxy groups in a molecule | numerator represented by a following formula can be mentioned. Moreover, as a siloxane compound, for example, trade names "X-40-2670", "X-40-2701", "X-40-2728", "X-40-2738", "X-40-2740" Commercial products such as (manufactured by Shin-Etsu Chemical Co., Ltd.) can be used.

  The content of the thermosetting compound (E) in the photosensitive composition is preferably 1% by mass or more and 15% by mass or less, and more preferably 1.5% by mass or more and 12% by mass or less in the total solid content of the photosensitive composition. Preferably, 2% by mass or more and 10% by mass or less is particularly preferable.

[Light Absorber (F)]
The photosensitive composition may contain a light absorber (F). The light absorbing agent is not particularly limited, and those capable of absorbing exposure light can be used, and in particular, those capable of absorbing light in the wavelength range of 200 to 450 nm are preferable. For example, naphthalene compounds, dinaphthalene compounds, anthracene compounds, phenanthroline compounds, dyes and the like can be mentioned.

  Specifically, cinnamic acid derivatives such as 2-ethylhexyl cinnamic acid, 2-ethylhexyl paramethoxycinnamate, isopropyl methoxycinnamate, isoamyl methoxycinnamate, etc .; α-naphthol, β-naphthol, α-naphthol methyl ether, α -Naphthol ethyl ether, 1,2-dihydroxynaphthalene, 1,3-dihydroxynaphthalene, 1,4-dihydroxynaphthalene, 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 1,7-dihydroxynaphthalene, 1,8 -Naphthalene derivatives such as dihydroxynaphthalene, 2,3-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, 2,7-dihydroxynaphthalene; anthracenes such as anthracene and 9,10-dihydroxyanthracene and derivatives thereof; azo Fee, benzophenone dyes, aminoketone dyes, quinoline dyes, anthraquinone dyes, diphenyl cyanoacrylate dyes, triazine dyes, dyes such as p- aminobenzoic acid dyes; and the like. Among these, cinnamic acid derivatives and naphthalene derivatives are preferable, and cinnamic acid derivatives are particularly preferable. These light absorbers can be used alone or in combination of two or more.

  When the light absorber (F) is contained, its content is preferably 0.5 parts by mass or more and 20 parts by mass or less with respect to 100 parts by mass of the solid content of the photosensitive composition. By setting it as said range, it is easy to adjust the hardenability according to an exposure amount, maintaining the destruction strength of a wavelength conversion material favorably.

[Organic solvent (S)]
The photosensitive composition preferably contains an organic solvent (S) for the purpose of adjusting the viscosity of the photosensitive composition to a viscosity suitable for the inkjet method. As the organic solvent (S), for example, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol n-propyl ether, ethylene glycol mono n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n -Propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n- Butyl ether, dipropylene glycol monomethyl ether (Poly) alkylene glycol monoalkyl ethers such as dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether, etc .; (Poly) alkylene glycol monoalkyl ether acetates such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate; The Other ethers such as chill ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether and tetrahydrofuran; Ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone and 3-heptanone; methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate and the like Alkyl lactates; ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, hydroxyacetic acid Ethyl, methyl 2-hydroxy-3-methylbutanoate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutyl Propionate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-pentyl formate, isopentyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate , Other esters such as methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, ethyl 2-oxobutanoate; aromatic hydrocarbons such as toluene and xylene; N-methylpyrrolidone And amides such as N, N-dimethylformamide, N, N-dimethylacetamide and the like.

  Among these, alkylene glycol monoalkyl ethers, alkylene glycol monoalkyl ether acetates, other ethers mentioned above, lactic acid alkyl esters, and other esters mentioned above are preferable, and alkylene glycol monoalkyl ether acetates, mentioned above Other ethers, the other esters mentioned above are more preferred. These solvents can be used alone or in combination of two or more.

The content of the organic solvent (S) is not particularly limited, and is appropriately determined in consideration of the viscosity of the photosensitive composition.
As described above, the viscosity of the photosensitive composition is preferably 5 cp or more and 15 cp or less as the viscosity at 25 ° C.
In this case, the solid content concentration of the photosensitive composition is typically 10% by mass or more and 50% by mass or less, and more preferably 20% by mass or more and 40% by mass or less.

[Other ingredients]
The photosensitive composition may contain various additives as needed. Examples of additives include sensitizers, curing accelerators, dispersants, adhesion promoters such as silane coupling agents, antioxidants, aggregation inhibitors, thermal polymerization inhibitors, antifoaming agents, surfactants, and the like. .

[Method of preparing photosensitive composition]
The photosensitive composition is prepared by mixing the above-mentioned components with a stirrer. In addition, you may filter using a membrane filter etc. so that the prepared photosensitive composition may become uniform.

According to the method of manufacturing a wavelength conversion substrate of the present invention, a plurality of different types of wavelength conversion materials are filled in a plurality of regions partitioned by the light shielding partition walls on the substrate to manufacture a wavelength conversion substrate. At the same time, mixing of different materials in the wavelength conversion material filled in the above-mentioned region can be suppressed.
Thereby, the process can be further stabilized as compared with the conventional production of the wavelength conversion base material.

DESCRIPTION OF SYMBOLS 10 substrate 11 partition 12 wavelength conversion material 13 splash 14 washing | cleaning liquid 15 planarization film 101 1st photosensitive composition 102 1st droplet 103 1st wavelength conversion material 201 2nd photosensitive composition 202 2nd droplet 203 Second wavelength conversion material

Claims (12)

A method for producing a wavelength conversion substrate, in which n types of wavelength conversion materials are filled in a plurality of regions partitioned by a light shielding partition wall on a substrate,
n is an integer of 2 or more,
The at least one wavelength conversion material comprises the following 1) to 3):
1) an injection step of injecting a photosensitive composition into the area by an inkjet method,
2) an exposure step of position-selectively exposing and curing only the photosensitive composition injected into the region;
3) a washing step of removing uncured droplets of the photosensitive composition by contacting with a washing solution after exposure;
The wavelength conversion material is formed by a method including the steps of
The method of manufacturing, wherein the photosensitive composition comprises quantum dots.   The manufacturing method according to claim 1, wherein the n types of wavelength conversion materials are formed by a method including the steps 1) to 3).   The method according to claim 1, wherein the cleaning solution exhibits basicity, and the photosensitive composition is alkali-soluble.   The method according to any one of claims 1 to 3, wherein n is 2. After the above step 3), the following 4):
4) a heating step of heating the cured photosensitive composition in the region after the cleaning step;
Including the process of
The method according to any one of claims 1 to 4, wherein the steps 1) to 4) are repeated in order from the first to the n-th photosensitive composition.   The manufacturing method of Claim 5 whose heating temperature in the said heating process is 150 degrees C or less.   The wavelength conversion material according to any one of claims 1 to 6, wherein the wavelength conversion material covers at least a part of the upper surface of the partition wall when the surface opposite to the surface in contact with the substrate is the upper surface. Production method.   The method according to any one of claims 1 to 7, wherein the photosensitive composition further comprises light scattering particles.   The method according to any one of claims 1 to 8, wherein the viscosity of the photosensitive composition at 25 ° C is 5 cp or more and 15 cp or less.   The manufacturing method of any one of Claims 1-9 whose surface tension in 25 degreeC of the said photosensitive composition is 25 mN / m or more and 40 mN / m or less. The n types of wavelength conversion materials are formed by the method including any of the steps 1) to 3), and the quantum dots have a core-shell structure,
For each of the photosensitive compositions used to form the wavelength conversion material from the first to the nth, the volume average particle diameter of the core part of the quantum dots contained in the photosensitive composition is the wavelength in the following order: The manufacturing method according to any one of claims 1 to 10, which is equal to or more than the volume average particle diameter of the core portion of the quantum dot contained in the photosensitive composition used for forming the conversion material.   The method according to any one of claims 1 to 11, further comprising covering the partition walls and the wavelength conversion material with a planarization film after the n types of wavelength conversion materials are filled in the plurality of regions. Manufacturing method described.

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