JP2019084509A - Deodorizer - Google Patents

Abstract

To provide a deodorizer capable of restraining reduction in deodorization efficiency by effectively restraining vertical fluctuations in a liquid level of an odor capturing liquid.SOLUTION: A deodorizer comprises a treatment tank 51 storing a deodorization treatment liquid, a gas introduction chamber 53 for introducing deodorization target gas into the treatment tank, a gas-liquid mixing chamber 54 for deodorization treating by gas-liquid mixing of the deodorization target gas and the deodorization treatment liquid in the treatment tank, gas-liquid mixing partition walls 52B and 52D partitioning the gas introduction chamber 53 and the gas-liquid mixing chamber 54 so that the deodorization treatment liquid rolls up to the gas-liquid mixing chamber together with the deodorization target gas from a lower end, an exhaust unit 51C for discharging the deodorization target gas after deodorization treatment from the treatment tank, and a liquid discharging unit 51D which is liquid-tightly sealed with the exhaust unit 51C by a blocking wall 52G and into which the deodorization treatment liquid after the deodorization treatment overflows from the treatment tank via an overflow wall 52I. The lower end of the gas-liquid partition wall extends at a lower position than the upper end of the overflow wall, and straightening mechanisms 55A and 55B is provided at a lower position than the gas-liquid mixing partition walls 52B and 52D in the gas introduction chamber 53.SELECTED DRAWING: Figure 4

Description

  The present invention relates to a scrubber-type deodorizing apparatus, for example, a deodorizing apparatus that deodorizes an odor gas containing an offensive odor generated when purifying human waste and the like in a human waste treatment facility and sludge generated in the liquid and gas purification process. About.

  In Patent Document 1, a gas-liquid mixture in which the introduction part for introducing the gas to be treated into the odor capture liquid, and the gas-liquid mixing of the gas to be treated and the odor capture liquid is performed to remove the odor in the gas to be treated There is disclosed a so-called scrubber type deodorizing apparatus provided with a part.

  The said deodorizing apparatus opposes the liquid supply port for supplying an odor capture liquid to an introductory part for the purpose of suppressing the pulsation of odor capture liquid and to-be-processed gas to the contact surface of to-be-processed gas and odor capture liquid. The structure provided on the bottom wall of the introduction part is adopted.

  It is a configuration intended to prevent the pulsation of the liquid level of the odor capture liquid in the device by balancing the pressure of the gas to be treated and the pressure of the odor capture liquid.

JP, 2015-196119, A

  However, even with the deodorizing device disclosed in Patent Document 1, it is difficult to maintain the pressure of the gas to be treated introduced into the device constant at all times, and it is inevitable that some fluctuation occurs. It was found to be very difficult to balance the two pressures in a situation where some variation in the inflow pressure of the odor capture liquid introduced into the device is also unavoidable.

  As a result of the balance between the two pressures breaking up and the liquid level fluctuating significantly up and down, not only the deodorizing efficiency is lowered because good gas-liquid mixing can not be carried out, but also the vibration of the device and incidental equipment due to the fluctuation of the liquid level. There was a problem to occur. In particular, a large load fluctuation occurs in the blower fan that guides the odorous gas, which is the gas to be treated, to the apparatus, and a large mechanical vibration occurs in the blower duct, which may cause damage to the incidental equipment.

  An object of the present invention is to provide a deodorizing device capable of effectively suppressing the vertical fluctuation of the liquid surface of the odor capture liquid and suppressing the reduction of the deodorizing efficiency in view of the above-mentioned problems.

  In order to achieve the above-mentioned object, the first characterizing feature of the deodorizing apparatus according to the present invention is, as described in claim 1 of the document of the claims, a treatment tank for containing a deodorizing treatment liquid and the treatment tank A gas introduction chamber for introducing a gas to be deodorized, a gas-liquid mixing chamber for deodorizing by mixing the introduced gas to be deodorized and the deodorizing treatment liquid in the treatment liquid, and a deodorizing treatment along with the gas to be deodorized from the lower end A gas-liquid mixing partition that divides the gas introduction chamber and the gas-liquid mixing chamber so that the liquid is rolled up in the gas-liquid mixing chamber, and an exhaust unit that discharges deodorizing target gas from the processing tank after deodorizing treatment And a drainage unit that is liquid-sealed with the exhaust unit by the blocking wall and allows the deodorizing solution after deodorization treatment to overflow from the treatment tank through the overflow wall, The lower end of the gas-liquid mixing partition is located below the upper end of the overflow wall Extends to so that, from below the gas-liquid mixing partition wall by the gas introduction chamber in that it includes a rectifying mechanism.

  When the liquid level on the gas introduction chamber side is lowered by the pressure of the gas to be deodorized under the condition that the volume of the deodorizing liquid stored in the processing tank does not fluctuate significantly, the liquid level of the gas-liquid mixing chamber relatively rises. When the water head on the gas-liquid mixing chamber side relatively rises, and the water head on the gas-liquid mixing chamber side rises, a pressure acts to raise the liquid level on the gas introduction chamber side. If such a phenomenon periodically and repeatedly occurs, the liquid level on the gas introduction chamber side may continuously and largely fluctuate, and good gas-liquid mixing in the gas-liquid mixing chamber may not be performed, and the deodorizing efficiency may be greatly reduced. There is.

  However, when the liquid level on the gas introducing chamber side is lowered, the deodorizing solution is rectified in the lateral direction along the liquid level by the rectifying mechanism disposed at a position deeper than the lower end of the gas-liquid mixing partition in the gas introducing chamber. As a result, transmission of pressure to the deodorizing treatment liquid that pushes up the liquid level in the gas-liquid mixing chamber is suppressed.

  According to the second aspect of the present invention, in addition to the first aspect described above, the gas introduction chamber and the gas-liquid mixing chamber may be divided into a plurality of stages along the flow direction of the gas to be deodorized. The lower end of the gas-liquid mixing partition on the downstream side of the gas-liquid mixing partition is set higher than the lower end of the gas-liquid mixing partition on the upstream, and the flow straightening mechanism is arranged in each gas introduction chamber There is a point provided below the gas-liquid mixing partition wall.

  By providing the gas introduction chamber and the gas-liquid mixing chamber in a plurality of stages along the flow direction of the gas to be deodorized, the opportunity for scrubbing can be increased and the deodorizing efficiency can be improved. When such a configuration is adopted, the pressure of the gas to be deodorized decreases as the gas introduction chamber is positioned downstream along the flow direction of the gas to be deodorized, and the liquid level rises. Even in such a case, if the lower end of the downstream gas-liquid mixing partition is set to be higher than the lower end of the upstream gas-liquid mixing partition, good scrubbing is possible even in the downstream gas-liquid mixing chamber You will be able to do the processing.

  According to the third characteristic configuration, as described in the third aspect, in addition to the above-mentioned second characteristic configuration, a side wall constituting a gas introduction chamber on the most upstream side among wall portions constituting the processing tank Alternatively, the bottom wall is provided with a liquid supply port for supplying the deodorizing treatment liquid below the flow straightening mechanism.

  Even if the pressure of the deodorizing treatment liquid supplied from the liquid supply port fluctuates, the transmission of the pressure fluctuation to the liquid surface on the gas-liquid mixing chamber side is buffered by the flow straightening mechanism, and vertical fluctuation of the liquid surface is suppressed.

  According to a fourth feature of the present invention, in addition to any one of the first to third features described above, the flow straightening mechanism is composed of a flat plate, and It is located at a substantially horizontal position below the mixing partition wall.

  By arranging a flat plate in a substantially horizontal position below the gas-liquid mixing partition wall, vertical fluctuation of the liquid surface of the gas introduction chamber or the gas-liquid mixing chamber is effectively suppressed, and the liquid on the gas introduction chamber side When the surface rises, transmission of pressure in the direction of pushing up the liquid surface to the deodorizing treatment liquid present below the flow straightening mechanism is suppressed.

  According to the fifth feature of the present invention, as described in claim 5, in addition to the above-mentioned fourth feature, the rectifying mechanism is disposed at a depth of 120 mm or more below the gas-liquid mixing partition wall. The point is.

  If it is arrange | positioned in a deep position of 120 mm or more from the lower end of a gas-liquid mixing partition wall, the up-and-down fluctuation of a liquid level will be controlled more effectively.

  According to the sixth aspect, as described in the sixth aspect, in addition to any of the above-described first to fifth features, deodorizing treatment is performed between the gas-liquid mixing chamber and the exhaust unit. It has a point which has a splash recovery information board which leads a splash accompanied by subsequent deodorization object gas to a liquid level of deodorization processing liquid.

  Droplets entrained in the deodorizing target gas that has been gas-liquid mixed and deodorized in the gas-liquid mixing chamber are led to the liquid surface of the deodorizing liquid by the droplet recovery guide plate and are recovered in the deodorizing liquid, The contamination due to the deposition of droplets on the gas exhaust flow path is suppressed, and the occurrence of a situation in which the flow path is blocked can be avoided.

  According to a seventh aspect of the present invention, in addition to the sixth aspect, as described in the seventh aspect, the droplet recovery guide plate is inclined downward along the flow direction downstream side of the gas to be deodorized A top plate extension extending from the gas introduction chamber and the inclined top plate of the gas-liquid mixing chamber, a first vertical guide wall turning downward from the tip of the top plate extension, the first vertical It is in the point comprised by the 2nd vertical guide wall installed between the guide wall and the said gas-liquid mixing partition wall.

  A top plate extension, a first vertical guide wall that changes its direction downward from the tip of the top plate extension, and a second vertical guide wall installed between the first vertical guide wall and the gas-liquid mixing partition wall Thus, the deodorizing target gas flowing out upward from the gas-liquid mixing chamber becomes a U-turn flow channel facing the deodorizing treatment liquid side, and droplets are effectively recovered.

  According to an eighth aspect of the present invention, as recited in claim 8, in addition to any one of the above-described first to seventh features, a gas-liquid mixture for adjusting the lower end height of the gas-liquid mixing partition wall It is in the point provided with the partition wall height adjustment mechanism.

  By properly adjusting the height of the gas-liquid mixing partition, the differential pressure between the gas introduction chamber and the gas-liquid mixing chamber can be adjusted, and as a result, the degree of winding up of the liquid in the gas-liquid mixing chamber can be adjusted. The liquid mixing efficiency, that is, the deodorizing efficiency can be adjusted to the maximum.

  In the ninth characteristic structure, as described in the ninth aspect, in addition to any of the above first to eighth characteristic structures, a groove along the thickness direction is formed in the lower end surface of the gas-liquid mixing partition wall. It is in the point formed in plural.

  When the posture in the lower end face longitudinal direction of the gas-liquid mixing partition is slightly inclined with respect to the liquid surface, uniform scrubbing is inhibited, and deodorization is desired from the region where the gap between the lower end face of the gas-liquid mixing partition and the liquid surface is large There is a risk of gas leakage. However, if a plurality of grooves along the thickness direction are formed in the lower end surface of the gas-liquid mixing partition wall, the gas to be deodorized uniformly flows down from each groove along the lower end surface longitudinal direction of the gas-liquid mixing partition, A homogeneous scrubbing is possible.

  As described above, according to the present invention, it has become possible to effectively suppress the vertical fluctuation of the liquid surface of the odor capture liquid, and to provide a deodorizing device capable of suppressing the decrease in deodorizing efficiency.

Explanatory drawing of the human waste processing facility in which the deodorizing apparatus by this invention was integrated (A), (b) is a sectional view of the deodorizing device at the time of non-operation (A), (b) is an explanatory view of a gas-liquid mixing partition Explanatory drawing of the deodorizing process process of the deodorizing apparatus corresponding to Fig.2 (a) Explanatory drawing of the deodorizing process process of the deodorizing apparatus corresponding to FIG.2 (b) (A), (b) is explanatory drawing of the deodorizing apparatus which showed another embodiment.

Hereinafter, the deodorizing apparatus according to the present invention will be described with reference to the drawings.
As shown in FIG. 1, the deodorizing device 50 is incorporated in a human waste processing facility 1 in which a high load denitrification treatment system is adopted. Hereinafter, prior to the description of the deodorizing device 50, the human waste processing facility 1 will be outlined.

  The human waste treatment facility 1 is a pretreatment facility 2 that receives and carries in the human waste and septic tank sludge that has been carried in, a biological treatment facility 3 that purifies biological treatment that has been pretreated by biological treatment, and treated water after biological treatment And a sludge treatment facility 5 for treating excess sludge and the like generated in biological treatment and the like.

  The pretreatment facility 2 includes a receiving tank 2A, a storage tank 2C, and a reserve storage tank 2D, and the pretreatment apparatus 2B is installed between the receiving tank 2A and the storage tank 2C.

  Sewage such as human waste carried in by a human waste collection vehicle etc. is first introduced into the receiving tank 2A, sent to the pretreatment device 2B while the solid substance is crushed by a pump with a cutter, and then suitable for biological treatment or residue etc After the solid foreign matter is removed by the pretreatment device 2B, the solid foreign matter is stored in the storage tank 2C or a preliminary storage tank 2D provided as a spare.

  And the sewage stored by 2 C of storage tanks is water-supplied to the biological treatment installation 3 by a pump. In the biological treatment facility 3, for example, a deep reaction tank 3A, a nitrification tank 3B, a secondary denitrification tank 3C, a membrane separation tank 3D, a return sludge tank 3E, etc. are sequentially installed.

  The waste water supplied from the storage tank 2C is first led to the deep reaction tank 3A. The deep reaction tank 3A is a biological treatment tank having a depth of about 10 m, and a circulating pump tank 3a is continuously provided on the upper part thereof. A part of the waste water withdrawn from the circulation pump tank 3a by the pump 3d is circulated and supplied to the deep reaction tank 3A, and an ejector mechanism is incorporated in the circulation path to supply air together with the circulating sewage.

  A valve is installed in the air supply path communicating with the ejector mechanism, and the amount of air supplied with the circulating sewage is adjusted by periodically controlling the opening of the valve, which is suitable for denitrification treatment in the deep reaction tank 3A. An anoxic state and an aerobic state suitable for nitrification treatment can be switched at several time intervals. For example, the valve is opened and closed so as to repeat one hour of anaerobic treatment and two hours of aerobic treatment, and the anaerobic treatment and aerobic treatment are repeated in a cycle of about three hours.

  In the deep reaction tank 3A, the water pressure is high near the tank bottom, the oxygen dissolution efficiency is high, and highly efficient processing can be performed. Therefore, there is no need to supply dilution water even if the load of inflowing sewage is high. That is, the deep reaction tank 3A functions as a nitrification denitrification treatment apparatus.

  The wastewater in which the anaerobic treatment and the aerobic treatment are repeated in the deep reaction tank 3A is then transferred to the nitrification tank 3B for nitrification treatment. In the nitrification tank 3B maintained in an aerobic state, ammonia is decomposed by the aerobic microorganism into nitrification, that is, nitrate ion and nitrite ion.

  The wastewater subjected to the nitrification treatment in the nitrification tank 3B is supplied to the secondary denitrification tank 3C. In the secondary denitrification tank 3C maintained in an anaerobic state, denitrification treatment, that is, nitrate ions and nitrite ions are reduced to nitrogen by the anaerobic microorganism and degassed.

  The wastewater denitrified in the secondary denitrification tank 3C is then transferred to the membrane separation tank 3D. In the membrane separation tank 3D, a membrane separation apparatus 3F is immersed and installed, and the wastewater in the tank is sucked by a pump connected to the membrane separation apparatus 3F, and the water to be treated which has been solid-liquid separated by the membrane separation apparatus 3F is , Water to the post-processing equipment 4.

  In the post-treatment equipment 4, a mixing tank 4A, a coagulation tank 4B and a coagulation membrane separation tank 4C are installed. In the water to be treated which has been solid-liquid separated by the membrane separation device 3F, fine suspended matter in the form of colloid remains without solid-liquid separation. Therefore, an iron-based inorganic flocculant is first added to the water to be treated sent to the post-treatment equipment 4 and mixed in the mixing tank 4A, and the water is sent to the coagulation tank 4B adjusted in pH by the addition of caustic soda etc. It is processed.

  Thereafter, the membrane is separated in the coagulation membrane separation tank 4C, and is sent to the advanced treatment facility 6. The water to be treated sent to the advanced treatment facility 6 is discharged to a river or the like after COD and coloring components are adsorbed and removed by, for example, activated carbon adsorption treatment and further sterilized by hypochlorous acid or the like. The coagulated sludge is sent to the sludge treatment facility 5 and treated together with the excess sludge.

  The sludge accumulated in the membrane separation tank 3D of the biological treatment facility 3 is sent to the return sludge tank 3E, and a part of the sludge is pumped to the circulation pump tank 3a of the deep reaction tank 3A via the sludge return paths 3b and 3c. The excess sludge is returned to the sludge dewatering facility 5A.

  The excess sludge sent to the sludge dewatering facility 5A and the solid content of the septic tank sludge which has been solid-liquid separated after pretreatment are dewatered after addition of a coagulant such as an iron-based inorganic coagulant or a polymer coagulant, Dewatered sludge is introduced into the fermentation equipment 30 as organic sludge. The outside air blown by the blower fan 21 is heated by the heater 22 and supplied to the fermentation facility 30, and the organic sludge is composted.

  The odor gas generated in the pretreatment unit 2 and the odor gas mixed with dust generated in the fermentation unit 30 are respectively supplied to the deodorizing unit 50 through a blower fan as a high concentration deodorization target gas, and from the return sludge tank 3E to the sludge return path 3b The sludge returned to the deep-layer reaction tank 3A through is supplied to the deodorizing apparatus 50 as a deodorizing treatment liquid. Then, ammonia which is an odor gas component captured in the deodorizing treatment liquid by the deodorizing device 50 is returned to the deep reaction tank 3A together with the deodorizing treatment liquid, and is subjected to nitrification denitrification treatment.

  The to-be-treated gas deodorized by gas-liquid contact by the deodorizing apparatus 50 is released to the atmosphere through the medium concentration deodorizing tower 80 and the activated carbon adsorption tower 90 together with other medium concentration odor gases generated in the biological treatment facility 3.

Hereinafter, the deodorizing device 50 will be described in detail.
The cross section of the deodorizing apparatus 50 is shown by FIG. 2 (a), (b). In the figure, the water surface shown by a solid line is the water surface at the time of non-operation, and the water surface at the time of deodorization processing is shown by a broken line. The deodorizing device 50 is a so-called scrubber type deodorizing device 50, and a deodorizing treatment space is partitioned by a corrosion resistant metal or resin bottom wall BW, an upper wall CW, and front and rear left and right side walls SW. The deodorization processing space is divided into a deodorization processing unit 51A, a spray removing unit 51B, an exhausting unit 51C, and a drainage unit 51D by a plurality of partition walls 52 (52A, 52E, 52G, 52H) made of corrosion resistant metal or resin. It is divided.

  Divided into a deodorizing section 51A located below and an exhaust section 51C located above by partition walls 52A and 52H which are disposed obliquely from the upper and lower center of the left side wall LSW toward the right side wall RSW. The partition wall 52E arranged in the vertical posture divides the area into the deodorization processing unit 51A located on the left and the droplet removal unit 51B located on the right, and the partition wall 52G places the droplet removal unit 51B located on the left and the right It is area-divided by the drainage part 51D located in.

  The part which comprises the deodorizing process part 51A in which a deodorizing process liquid is stored among the deodorizing process space, the droplet removal part 51B, and drain part 51D turns into the processing tank 51. FIG.

  An air supply port G1 for introducing the gas to be deodorized is formed at a position lower than a portion of the left side wall LSW in contact with the partition wall 52A, and an exhaust port G2 is formed in the upper wall CW located downstream of the exhaust portion 51C. ing. Further, the liquid supply port L1 for supplying the deodorizing treatment liquid is formed on the left wall LSW side of the bottom wall BW, and the drainage port L2 for discharging the deodorizing treatment liquid after the deodorizing treatment is formed on the lower portion of the drainage unit 51D. ing. Further, a drain port L3 for discharging the deodorizing treatment liquid from the inside of the processing tank 51 at the time of maintenance or the like is formed at an intermediate position between the liquid supply port L1 and the drainage port L2. A drain valve is disposed at the drain port L3.

  In the deodorizing processing unit 51A, four partition walls 52B, 52C, 52D, 52E are installed in the vertical posture in order from the left side wall LSW. A gap is formed between the lower end of each of the partition walls 52B, 52C, 52D, 52E, 52G and the bottom wall BW so that the deodorizing treatment solution injected into the treatment tank 51 from the liquid supply port L1 can flow therethrough. It is done.

  Each partition wall 52B, 52C, 52D, 52E, 52G is installed in such a way that both widthwise end portions (in the figure, the near side end and the depth side end) abut on both side walls SW on the near side and the depth side, The walls 52B and 52D are disposed so as to extend downward from the partition wall 52A, and the partition walls 52C and 52E are disposed such that a gap is formed between the wall 52B and the partition wall 52A. Further, the upper end of the partition wall 52G is in contact with and fixed to the right side wall RSW so that the deodorizing gas flowing in the exhaust part 51C does not flow into the drainage part 51D, and the lower end of the partition wall 52G is liquid-sealed with the deodorizing treatment liquid .

  A space defined by the left side wall LSW, the partition wall 52A and the partition wall 52B (including a virtual extension wall from the partition wall 52B to the bottom wall BW), a partition wall 52C, a partition wall 52A and a partition wall 52D (partition wall The spaces defined by the virtual extension wall from 52D to the bottom wall BW) become the gas introduction chamber 53, and the partition wall 52B, the partition wall 52A and the partition wall 52C (a partition from the partition wall 52C to the partition wall 52A) A space partitioned by the outlet wall and a space partitioned by the partition wall 52D and the partition wall 52A and the partition wall 52E (including the virtual extension wall from the partition wall 52E to the partition wall 52A) It becomes the mixing chamber 54.

  The drainage portion 51D is provided with an overflow wall 52I in a vertical posture, and the deodorizing treatment liquid after deodorization processing flowing from the lower end of the partition wall 52G is drained from the drainage port L2 after overflowing the overflow wall 52I. Ru.

  The drainage portion 51D is provided with an overflow height adjusting mechanism for adjusting the overflow height by the overflow wall 52I, and adjusts the amount of deodorizing treatment liquid that flows in from the liquid feed port L1 and is stored in the treatment tank 51. It is configured to be possible.

  The overflow height adjustment mechanism includes mounting holes formed at two places separated in the width direction of the base 56C and the base 56C erected on the bottom wall BW, and upper and lower formed in the mounting hole and the overflow wall 52I. It is comprised by the fastening mechanism which consists of a volt | bolt and nut which fix the direction long hole, and vertical height is adjusted by adjusting the attachment position of the overflow wall 52I along a long hole. Both the base 56C and the overflow wall 52I are installed so that both ends (the front end and the depth end in the drawing) abut on the both side walls SW on the front side and the depth side.

  In addition, a gas-liquid mixing partition height adjusting mechanism is provided to adjust the lower end height of the gas-liquid mixing dividing walls 52B, 52D so as to be lower than the overflow height adjusted by the overflow height adjusting mechanism.

  The same structure as the overflow height adjustment mechanism is adopted for the gas-liquid mixing partition height adjustment mechanism, and as shown in FIGS. 3A and 3B, the base portions 56A and 56B are provided upright on the partition wall 52A. And bolts for fixing the mounting holes H1 formed at two locations separated in the width direction of the bases 56A and 56B, and the vertical holes H2 formed in the long holes H1 and the gas-liquid mixing partitions 52B and 52D. The upper and lower heights are adjusted by adjusting the mounting positions of the gas-liquid mixing partitions 52B and 52D along the elongated holes H2.

  By adjusting the height of the overflow wall 52I up and down by the overflow height adjustment mechanism, the volume of the deodorizing treatment liquid stored in the treatment tank 51 is adjusted to an appropriate amount corresponding to the odor concentration of the gas to be deodorized, The differential pressure of the whole can be adjusted, and the amount of liquid rising of the whole apparatus corresponding to the concentration of the gas to be deodorized can be adjusted. The lower end heights of the gas-liquid mixing partitions 52B and 52D are appropriately adjusted by the gas-liquid mixing partition height adjusting mechanism according to the adjustment amount.

  That is, when the odor concentration of the gas to be deodorized is high, the height of the overflow wall 52I is adjusted upward to increase the volume of the deodorizing treatment liquid stored in the treatment tank 51, and the liquid level rises accordingly. The lower end heights of the gas-liquid mixing partitions 52B and 52D are adjusted so that gas-liquid mixing is appropriately performed without pulsation, and when the odor concentration of the gas to be deodorized is low, the height of the overflow wall 52I is lowered. To reduce the volume of the deodorizing treatment liquid stored in the treatment tank 51, and accordingly, the lower end heights of the gas-liquid mixing partition walls 52B and 52D so that the liquid level is appropriately mixed without pulsation of the liquid level up and down. Adjust the

  By appropriately adjusting the lower end heights of the gas-liquid mixing partition walls 52B and 52D, the differential pressure between the gas introduction chamber 53 and the gas-liquid mixing chamber 54 can be adjusted. As a result, winding of liquid in the gas-liquid mixing chamber 54 is performed. The degree of rise can be adjusted, and the gas-liquid mixing efficiency, that is, the deodorizing efficiency can be adjusted to the maximum. Pulsation of the liquid surface can be effectively reduced mainly by adjusting the height of the gas-liquid mixing partition wall 52D on the downstream side.

  In a good gas-liquid mixing state in which a sufficient amount of deodorizing solution is rolled up in the gas-liquid mixing chamber 54, the pressure PA of the gas introduction chamber 53 at the front stage during deodorization, the gas-liquid mixing chamber 54 at the first stage, and the gas at the rear stage The relationship of PA-PB = PB-PC is established between the pressure PB of the introduction chamber 53 and the pressure PC of the gas-liquid mixing chamber 54 and the exhaust part 51C in the latter stage. The pressure PA is a pushing pressure by the blower fan for introducing the odor gas to the apparatus, and is a value that fluctuates to some extent, and the pressure PC is the atmospheric pressure at which the deodorized post-treatment gas is released from the apparatus or the suction pressure by the suction blower fan. , Almost constant value.

  By adjusting the lower end height of the gas-liquid mixing partition 52B, the pressure PA of the gas introduction chamber 53 in the previous stage can be adjusted to a stable value, and thereafter, the relationship of PA-PB = PB-PC is obtained. By adjusting the height of the lower end of the gas-liquid mixing partition wall 52D, a good gas-liquid mixing state can be obtained.

  Whether or not the lower end height of the gas-liquid mixing partition wall 52D is appropriate, visually check the winding-up state of the deodorizing treatment liquid in the gas-liquid mixing chambers 54, 54 before and after, or use a pressure gauge to measure the pressure PA, The judgment can be made based on the measured values of PB and PC.

  In FIG. 2A, when the odor concentration of the gas to be deodorized is high, the overflow wall adjustment mechanism adjusts the overflow wall 52I to a high position, and the amount of deodorization treatment liquid stored in the treatment tank 51 2B shows that when the odor concentration of the gas to be deodorized is low, the overflow height adjustment mechanism adjusts the overflow wall 52I to a low position and stores it in the treatment tank 51 (FIG. 2B). There is shown a case where the amount of the deodorizing treatment liquid adjusted is small.

  The height of the overflow wall 52I is adjusted by the overflow height adjustment mechanism according to the odor concentration of the gas to be deodorized, and the height of the lower end of the gas-liquid mixing partition 52B, 52D is adjusted by the gas-liquid mixing partition height adjustment mechanism After the adjustment, the gas to be deodorized is supplied from the air supply port G1 and the deodorizing process is performed. The case where the gas to be deodorized is supplied in the state of FIG. 2 (a) is shown in FIG. 4, and the case where the gas to be deodorized is supplied in the state of FIG. 2 (b) is shown in FIG.

  As shown in FIGS. 4 and 5, in the state where the deodorization treatment liquid is stored in the processing tank 51, when the gas to be deodorized is pressed into the gas introduction chamber 53 on the upstream side from the air supply port G1, the gas to be deodorized is Lowers the liquid surface of the deodorizing treatment liquid, that is, the gas-liquid boundary surface, and rolls up from the lower end of the partition wall 52B into the gas-liquid mixing chamber 54 on the upstream side together with the deodorizing treatment liquid.

  At this time, in the gas-liquid mixing chamber 54, the contact between the deodorizing treatment gas and the deodorizing treatment liquid rolled up as small water droplets by the deodorizing gas is promoted to be efficiently gas-liquid mixing, and the odor in the deodorizing gas Components, water vapor, fine particles, and the like are deodorized by being trapped in the deodorizing solution.

  Furthermore, when the gas to be deodorized is introduced to the gas introduction chamber 53 on the downstream side along with the deodorizing treatment liquid that has become water droplets from the gas-liquid mixing chamber 54 on the upstream side, the gas to be deodorized similarly It is pushed down and rolled up from the lower end of the partition wall 52D to the gas-liquid mixing chamber 54 on the downstream side together with the deodorizing liquid, and deodorizing is performed again in the same manner as described above. That is, the partition walls 52B and 52D become gas-liquid mixing partitions 52B and 52D that divide the gas introduction chamber 53 and the gas-liquid mixing chamber 54.

  As shown in FIGS. 3A and 3B, on the lower end surface 520 of the gas-liquid mixing partition walls 52B and 52D, a plurality of grooves 521 are formed in the direction along the thickness direction, and the lower end surface 520 starts from the horizontal posture. Even in a slightly inclined posture, uniform scrubbing is realized along the width direction.

  If the lower end surface 520 of the gas-liquid mixing partitions 52B and 52D has a flat shape, when the posture in the longitudinal direction of the lower end surface 520 is slightly inclined with respect to the horizontal liquid surface, the gap between the lower end surface 520 and the liquid surface The gas to be deodorized leaks from the large area of the large area, and the uniform scrubbing may be impaired, and the deodorization efficiency may be reduced.

  In FIGS. 3 (a) and 3 (b), the shape of the groove 521 is formed linearly along the thickness direction of the gas-liquid mixing partition 52B, 52D, but the gas to be deodorized is the liquid mixing partition 52B, 52D. The shape of the groove is not particularly limited as long as it flows uniformly along the width direction of the groove. Also, the depth of the groove is not particularly limited. For example, the lower end surface 520 of the gas-liquid mixing partitions 52B and 52D may be processed into a random concavo-convex shape, and the recess may be connected to form a groove.

  Returning to FIG. 4 and FIG. 5, the gas to be deodorized deodorized in the gas-liquid mixing chamber 54 passes through the droplet removal part 51B and the exhaust part 51C, and is exhausted from the exhaust port G2 to the external space. The spray removing unit 51B includes a top extending portion 52H, a first vertical guide wall 52F, and a partition wall 52E as a second vertical guide wall.

  The top plate extension portion 52H is extended from the upper portion of the air supply port G1 to the tip of the partition wall 52A which is an inclined top plate that inclines downward, and the first vertical guide wall 52F is from the tip of the top plate extension portion 52H. The second vertical guide wall 52E is installed between the first vertical guide wall 52F and the gas-liquid mixing partition wall 52D so as to extend about 100 mm vertically downward.

  Gas to be mixed in the gas / liquid mixing chamber 54 on the downstream side and deodorizing target gas with droplets of deodorizing treatment liquid is constituted by the top plate extension portion 52H, the first vertical guide wall 52F, and the second vertical guide wall 52E When flowing toward the liquid surface of the deodorizing solution from the top along the U-turn flow path, droplets collide with each wall surface, or droplets are dropped efficiently toward the deodorizing solution. Droplets are collected.

  As a result, the amount of droplets deposited on the exhaust portion 51C, which is an exhaust flow path of the gas to be deodorized, is reduced, and the occurrence of an adverse situation such as clogging of the flow path due to contamination can be avoided. Even when the second vertical guide wall 52E is not provided as the droplet removal unit 51B, it is possible to recover a considerable amount of droplets by the deodorizing target gas with the droplets colliding with the first vertical guide wall 52F. Needless to say.

  The gas to be deodorized that has passed through the droplet removal unit 51B is exhausted from the exhaust port G2 to the external space through the U-turn flow path formed of the partition wall 52A, the top plate extension portion 52H, and the inclined wall 52J.

  The partition wall 52A and the top plate extension portion 52H are linearly extended so that the tip end side is inclined downward by 5 ° to 8 ° with respect to the horizontal surface, and downward from the right side wall RSW to the left side wall downward The inclined wall 52J is formed such that the distal end side is inclined downward by 5 ° to 8 ° so as to extend in

  When the liquid level on the gas introduction chamber 53 side is lowered due to the pressure of the gas to be deodorized under the condition that the inflow of the deodorizing treatment liquid stored in the treatment tank 51 does not greatly fluctuate, the liquid level of the gas-liquid mixing chamber 54 is relative. When the liquid head on the gas-liquid mixing chamber 54 side rises, the pressure acting on the liquid surface on the gas introduction chamber 53 side acts. When such a phenomenon occurs periodically and repeatedly, the liquid level on the gas introduction chamber side is continuously and largely fluctuated, so that the deodorization treatment liquid in the gas-liquid mixing chamber 54 is less likely to be rolled up. As a result, the gas passes from the lower part of the gas-liquid mixing partition, and good gas-liquid mixing is not performed, and the deodorizing efficiency may be greatly reduced.

  Therefore, the flow straightening mechanism 55 is provided below the liquid surface of the gas introduction chamber 53 during the deodorizing process and deeper than the lower ends of the gas-liquid mixing partitions 52B and 52D. The flow straightening mechanism 55 is composed of flat plate-like flow straightening plates 55A, 55B disposed substantially parallel to the liquid surface. The straightening vanes 55A and 55B are formed to have substantially the same width as the left and right width of each gas introduction chamber 53, and both ends are disposed on the front side and the depth side so as to be disposed in the entire area along the depth direction of the processing tank 51. It is installed to abut on the wall SW.

  The straightening vanes 55A, 55B are preferably installed so as to be submerged at a depth of 120 mm or more from the lower ends of the gas-liquid mixing partitions 52B, 52D. Furthermore, it is more preferable to arrange in a depth range of 130 mm and at least 130 ± 10 mm from the lower ends of the gas-liquid mixing partition walls 52B and 52D, and vertical fluctuation of the liquid surface of the gas introduction chamber 53 is effective. Will be suppressed.

  In the present embodiment, the distance D1 from the bottom of the processing tank 51 to the lower end of the gas-liquid mixing partition 52B is set to 250 mm, and the straightening vane 55A from the bottom of the processing tank 51 to the lower end of the gas-liquid mixing partition 52B. It is preferable to set the depth D2 of 48% of the distance of d, and the depth range of at least 48. +-. 4% (see FIG. 2A).

  Further, the distance D3 from the bottom of the processing tank 51 to the lower end of the gas-liquid mixing partition 52D is set to 395 mm, and the straightening vane 55B is 67% of the distance from the bottom of the processing tank 51 to the lower end of the gas-liquid mixing partition 52D. It is preferable to set in the range of the depth D 4 of at least 67 ± 2.5% depth (see FIG. 2A).

  By providing the flow straightening mechanism 55, when the liquid surface on the side of each gas introduction chamber 53 descends, the flow straightening mechanism disposed in the gas introduction chamber 53 at a position deeper than the lower ends of the gas-liquid mixing partitions 52B and 52D. Since the deodorizing treatment liquid and the gas to be deodorized are rectified in the lateral direction along the liquid level by 55, transmission of pressure to the deodorizing treatment liquid that pushes up the liquid level in each gas-liquid mixing chamber 54 is suppressed . If the flow straightening mechanism 55 extends too far to the gas-liquid mixing chamber 54 downstream of the gas-liquid mixing partition walls 52B and 52D vertically below, deodorization in the entire gas-liquid mixing chamber 54 will not be successful, and deodorization efficiency will be improved. descend.

  When the flow straightening plates 55A and 55B are provided as the flow straightening mechanism 55, when the liquid surface on the gas introduction chamber 53 side is pushed down by the pressure of the gas to be deodorized, the pressure to the deodorizing treatment liquid present below the flow straightening plates 55A and 55B. Transmission is suppressed, and conversely, when the liquid level on the gas introduction chamber 53 rises due to the pressure of the deodorizing treatment liquid, the transmission of pressure to the deodorizing treatment liquid present below the flow straighteners 55A, 55B is suppressed. It will be. As a result, the deodorizing treatment liquid present below the rectifying plates 55A and 55B functions as a buffer layer that suppresses the transmission of pressure that raises or lowers the liquid level of the gas introduction chamber 53 or the gas-liquid mixing chamber 54. Or, vertical fluctuation of the liquid level of the gas-liquid mixing chamber 54 is effectively suppressed.

  In the case where the gas introduction chamber 53 and the gas-liquid mixing chamber 54 are provided in two or more stages along the flow direction of the gas to be deodorized as in the present embodiment, among the gas-liquid mixing partition walls 52B and 52D The lower end of the gas-liquid mixing partition 52D on the downstream side is set to be higher than the lower end of the gas-liquid mixing partition 52B on the upstream side by a predetermined distance or more. It is preferable to be provided below.

  By providing the gas introduction chamber 53 and the gas-liquid mixing chamber 54 in a plurality of stages along the flow direction of the gas to be deodorized, it is possible to increase the chance of scrubbing and improve the deodorization efficiency. When such a configuration is adopted, the pressure of the gas to be deodorized decreases as the gas introduction chamber is positioned downstream along the flow direction of the gas to be deodorized, and the liquid level rises.

  Even in such a case, the lower end heights of the gas-liquid mixing partitions 52B and 52D are appropriately adjusted by the gas-liquid mixing partition height adjustment mechanism, so that the differential pressure between the respective gas introduction chambers and the gas-liquid mixing chambers is It becomes substantially the same, the degree of rolling up of the liquid in each gas-liquid mixing chamber becomes equal, the gas-liquid mixing efficiency, that is, the deodorizing efficiency can be maximized, and the deodorizing efficiency of the entire apparatus can be maximized. If the lower end of the downstream gas-liquid mixing partition 52D is set to be higher than the lower end of the upstream gas-liquid mixing partition 52B by a predetermined distance or more, the downstream gas-liquid mixing chamber 53 is also preferable. Can perform the scrubbing process.

  As already shown in FIG. 4 and FIG. 5, the liquid supply port L1 is the left side wall LSW or the bottom wall BW facing the gas introduction chamber 53 on the most upstream side among It is provided below the current plate 55A. Therefore, even if there is fluctuation in the pressure of the deodorizing treatment liquid supplied from the liquid supply port L1, transmission of the pressure fluctuation to the liquid surface is buffered by the rectifying plate 55A, and vertical fluctuation of the liquid surface is suppressed.

When 220 ± 20 mmAq, 28 m ³ / min of deodorization target gas is allowed to flow from the air supply port G1 of the above-described deodorizing apparatus 50, the vertical fluctuation of the liquid surface by 11 mm at maximum when the rectifying plates 55A and 55B are not provided Can be suppressed by providing the current plate 55A, 55B, it can be suppressed to about 2% of the vertical fluctuation of the liquid surface reduced by about 80%, the pressure loss can be suppressed to about 199 mmAq reduced by about 14%, and good scrubbing can be realized. Is known. As a result, there is no risk of damage due to vibration in the deodorizing device 50, the blower fan, the duct and the like.

Another embodiment of the deodorizing device 50 is shown in FIGS. 6 (a) and 6 (b).
FIG. 6A shows that there is no inclined wall 52J in the exhaust part 51C, and the deodorizing gas that has passed through the droplet removal part 51B passes the flow path between the partition wall 52A and the top plate extension part 52H and the upper wall CW. It is an example configured to be exhausted to the external space from the exhaust port G2 provided at the left end of the upper wall CW.

  FIG. 6B is an example in which the deodorizing processing unit 51A is configured of a single gas introduction chamber 53 and a gas-liquid mixing chamber 54.

  In the embodiment described above, the configuration has been described in which the droplet recovery guide plate for guiding the droplets entrained in the gas to be deodorized after deodorization to the liquid surface of the deodorizing solution is provided between the gas-liquid mixing chamber and the exhaust unit. If the purpose is to collect the droplets accompanied by the gas to be deodorized by gas-liquid mixing in the gas-liquid mixing chamber, it is sufficient if the deodorizing device is provided with a droplet collection guide plate, and the rectifying plate 55A described above , 55B may be used, or the deodorizing apparatus may not be provided with a gas-liquid mixing partition height adjustment mechanism.

  In the embodiment described above, the configuration provided with the gas-liquid mixing partition height adjusting mechanism for adjusting the height of the lower end of the gas-liquid mixing partition has been described, but the degree of winding up of the liquid in the gas-liquid mixing chamber is adjusted In order to improve the gas-liquid mixing efficiency, it is sufficient if the deodorizing apparatus is provided with a gas-liquid mixing partition height adjustment mechanism, and even if the above-described deodorizing apparatus is not provided with the flow regulating plates 55A and 55B. It may be a deodorizing device that does not have the splash recovery guide plate.

Is guided to the liquid surface of the deodorizing treatment liquid by the droplet collection guide plate and collected in the deodorizing treatment liquid, so that the contamination due to the deposition of droplets on the exhaust gas flow path of the gas to be deodorized is suppressed, It will be possible to avoid the occurrence of a blocking situation.

  The above-described embodiment is an aspect of the present invention, and the present invention is not limited by the description, and the specific structure, size, material, and the like of each portion are appropriately selected as long as the effects of the present invention are exhibited. It is needless to say that change design is possible.

50: Deodorization device 51: Treatment tank 51A: Deodorization processing unit 51B: Splash removal unit 51C: Exhaust unit 51D: Drainage unit 53: Gas introduction chamber 54: Gas-liquid mixing chamber 52B, 52D: Gas-liquid mixing partition 52G: Interruption Wall 52I: Overflow wall 55A, 55B: Rectification mechanism

Claims (9)

A treatment tank containing the deodorizing treatment solution;
A gas introduction chamber for introducing a gas to be deodorized into the treatment tank;
A gas-liquid mixing chamber in which the introduced deodorized gas and the deodorizing treatment liquid in the treatment tank are mixed by gas-liquid mixing and deodorizing treatment;
A gas-liquid mixing partition that divides the gas introduction chamber and the gas-liquid mixing chamber such that the deodorizing treatment liquid rolls up from the lower end together with the gas to be deodorized into the gas-liquid mixing chamber;
An exhaust unit for discharging deodorizing target gas after deodorizing treatment from the treatment tank;
A drainage part which is liquid-sealed with the exhaust part by a blocking wall and which allows the deodorizing liquid after deodorization to overflow from the processing tank through the overflow wall;
A deodorizing device provided with
The lower end of the gas-liquid mixing partition is extended so as to be positioned lower than the upper end of the overflow wall,
A deodorizing device comprising a flow straightening mechanism below the gas-liquid mixing partition in the gas introduction chamber.   The gas introducing chamber and the gas-liquid mixing chamber are provided in a plurality of stages along the flow direction of the gas to be deodorized, and the lower end of the gas-liquid mixing partition on the downstream side of the gas-liquid mixing partition is the gas-liquid mixing partition on the upstream side The deodorizing apparatus according to claim 1, wherein the deodorizing device is set to be higher than the lower end of the wall, and the rectifying mechanism is provided below the gas-liquid mixing partition in each gas introduction chamber.   It is a side wall or bottom wall which constitutes the gas introduction chamber on the most upstream side among the wall parts constituting the processing tank, and is provided with a liquid supply port for supplying the deodorizing liquid downward from the flow straightening mechanism. The deodorizing device according to or 2.   The deodorizing apparatus according to any one of claims 1 to 3, wherein the flow straightening mechanism is formed of a flat plate-like body, and is disposed below the gas-liquid mixing partition wall in a substantially horizontal posture.   5. The deodorizing apparatus according to claim 4, wherein the straightening mechanism is disposed at a deep position of 120 mm or more below the gas-liquid mixing partition wall.   A spray recovery guide plate for guiding a spray entrained to a gas to be deodorized after deodorization to a liquid surface of the deodorization treatment liquid is provided between the gas-liquid mixing chamber and the exhaust unit. Deodorizing device as described in.   The spray recovery guide plate is a gas introduction chamber which inclines downward along the flow direction downstream side of the gas to be deodorized, and a top plate extension which extends from a tilt top plate of the gas-liquid mixing chamber; The first vertical guide wall that is turned downward from the tip of the extension, and the second vertical guide wall installed between the first vertical guide wall and the gas-liquid mixing partition wall. The deodorizing apparatus according to claim 6.   The deodorizing apparatus according to any one of claims 1 to 7, further comprising a gas-liquid mixing partition height adjusting mechanism for adjusting the height of the lower end of the gas-liquid mixing partition. The deodorizing apparatus according to any one of claims 1 to 8, wherein a plurality of groove portions extending in the thickness direction are formed in the lower end surface of the gas-liquid mixing partition wall.

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