JP2019081922A - Film deposition apparatus - Google Patents

Abstract

To increase the area of an anode in a film deposition apparatus where a cylindrical vaporization source functions as a part of a chamber.SOLUTION: A film deposition apparatus 10 includes a cylindrical vaporization source 11 constituting a chamber and deposits emissions emitted from the vaporization source 11 by arc discharge on a workpiece 41. The film deposition apparatus 10 further includes a closed vessel 14 constituting the chamber together with the vaporization source 11. The closed vessel 14 has an internal space 44 communicating with a film deposition space 43 and is grounded. The film deposition apparatus 10 is equipped with a supporter 31 to support the workpiece 41. The film deposition apparatus 10 is equipped with an auxiliary electrode 20 that is electrically connected to the closed vessel 14, while electrically insulated from the vaporization source 11. The auxiliary electrode 20 has an insulation part 24 that contacts the supporter 31 and faces the workpiece 41 supported by the supporter 31.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a film forming apparatus that generates arc discharge to form a film on a work using a tubular evaporation source.

  As a film forming apparatus, an apparatus is known in which the entire sidewall of a chamber that divides a film forming space functions as an anode and the evaporation source disposed in the chamber functions as a cathode. In such a film forming apparatus, when the arc discharge generated between the evaporation source and the side wall of the chamber is maintained, an emission such as metal ions emitted from the evaporation source is deposited on the surface of the work by the arc discharge. Thereby, a film is formed on the work.

  Further, Patent Document 1 discloses an example of a film forming apparatus using a cylindrical evaporation source. In this film forming apparatus, a chamber for dividing the film forming space is constituted of an evaporation source and a closing member for closing the opening of the evaporation source. The closure member is electrically isolated from the evaporation source. Then, at the time of film formation on a work, the evaporation source functions as a cathode and the closing member functions as an anode. Thus, when the arc discharge is maintained in the chamber, metal ions emitted from the evaporation source by the arc discharge are deposited on the surface of the work to form a film on the work.

JP, 2016-020518, A

  In the film forming apparatus in which the cylindrical evaporation source functions as a part of the chamber as disclosed in Patent Document 1, the entire sidewall of the chamber can function as an anode by arranging the evaporation source in the chamber. The area of the anode tends to be smaller than that of the film forming apparatus. As described above, when the area of the anode is small, the area of the anode for maintaining the arc discharge may be insufficient and the arc discharge may become unstable. Under such circumstances, it is required to increase the area of the anode in a film forming apparatus in which a cylindrical evaporation source functions as a part of a chamber.

  A film forming apparatus for solving the above problems has a cylindrical evaporation source that constitutes a chamber, and the emission from the evaporation source is caused by arc discharge to the surface of a work placed in the chamber. And forming the chamber together with the evaporation source, and having an internal space communicating with a film formation space which is an inner space of the evaporation source, and The work piece is placed so that the work piece is located in the film formation space, a closed container which is grounded or to which a positive voltage is applied, an insulator interposed between the evaporation source and the closed container, and A support for supporting the support, and an auxiliary electrode electrically isolated from the evaporation source while electrically connected to the closed container, the support comprising Extends along the central axis of the source, The auxiliary electrode penetrates the wall portion of the closed container, and the auxiliary electrode is provided with an insulating portion, and the insulating portion is in contact with the support and is supported by the work supported by the support The point is to face each other.

  According to the above configuration, the work supported by the support and the auxiliary electrode are disposed in the chamber including the cylindrical evaporation source and the closed container. The auxiliary electrode is electrically insulated from the support and the work supported by the support, and is also electrically isolated from the evaporation source functioning as a cathode at the time of film formation on the work. On the other hand, the auxiliary electrode is electrically connected to the closed container grounded or the closed container to which a positive voltage is applied. Therefore, when forming a film on a work, both the auxiliary electrode and the closed container can function as an anode. In this case, the area of the anode is increased by increasing the area of the inner surface of the closed container exposed to the space in the chamber or increasing the surface area of the portion other than the insulating portion (ie, the conductive portion) of the auxiliary electrode. Can be increased.

  Further, by thus increasing the area of the anode, it is possible to stabilize the arc discharge even when the film formation process on the work is continuously performed.

BRIEF DESCRIPTION OF THE DRAWINGS Sectional drawing which shows the film-forming apparatus of 1st Embodiment. FIG. 2 is a perspective view showing an auxiliary electrode according to the first embodiment. The perspective view which shows the auxiliary electrode with which the film-forming apparatus of a modification is equipped. The perspective view which shows the auxiliary electrode with which the film-forming apparatus of a modification is equipped. Sectional drawing which shows the film-forming apparatus of 2nd Embodiment.

First Embodiment
Hereinafter, a film forming apparatus 10 according to a first embodiment of the film forming apparatus will be described with reference to FIGS. 1 and 2.

  In FIG. 1, the cross-sectional structure of the film-forming apparatus 10 is shown. The film forming apparatus 10 is used for a film forming process in which a metal film or the like is formed on a work 41 which is a processing target. In the film forming apparatus 10, the evaporation source 11, the closed container 14, and the lid member 12 constitute a chamber.

  The evaporation source 11 is formed in a cylindrical shape. In FIG. 1, the central axis of the cylindrical evaporation source 11 is shown as an axis C. As the evaporation source 11, for example, a metal such as titanium, chromium, tungsten or the like is used. A power supply 51 is connected to the evaporation source 11, and a negative voltage is applied by the power supply 51 during the film forming process. Therefore, in the film forming process, the evaporation source 11 functions as a cathode.

  Among the openings in the cylindrical evaporation source 11, one opening is closed by the lid member 12. The lid member 12 is made of a conductive material such as iron or aluminum. At least one of the portion of the evaporation source 11 facing the lid member 12 and the portion of the lid member 12 facing the evaporation source 11 is subjected to an insulation treatment. Therefore, the lid member 12 is electrically insulated from the evaporation source 11.

  A closed container 14 is disposed on the opposite side of the lid member 12 in the evaporation source 11. The closed container 14 is made of a conductive material such as iron or aluminum. A cylindrical insulator 18 is interposed between the closed container 14 and the evaporation source 11. Therefore, the closed container 14 is electrically insulated from the evaporation source 11.

  The closed container 14 has a bottomed cylindrical shape. That is, the closed container 14 has a bottom portion 16 forming the bottom surface of the container, and a cylindrical portion 15 whose opening is closed by the bottom portion 16. The cylindrical portion 15 is formed in a cylindrical shape having the same diameter as the evaporation source 11. Of the two end portions of the cylindrical portion 15, the end portion on the side not connected to the bottom portion 16 (the upper end portion in FIG. 1) extends from the inner peripheral surface of the cylindrical portion 15 toward the axis C in the radial direction of the cylindrical portion 15 An extending projection 17 is provided. The protrusion 17 is continuously formed over the entire circumference of the cylindrical portion 15. That is, the protrusion 17 has a substantially annular shape.

  The closed container 14 is coaxially disposed with the evaporation source 11 so that the central axis of the cylindrical portion 15 coincides with the axis C. In addition, the closed container 14 is disposed such that the end of the cylindrical portion 15 on which the protrusion 17 is provided is located on the evaporation source 11 side. Therefore, the internal space 44 partitioned by the closed container 14 is in communication with the film forming space 43 which is the space inside the evaporation source 11. The film forming space 43 and the internal space 44 are collectively referred to as a chamber internal space 42.

The lid member 12 and the closed container 14 are grounded. Therefore, in the film forming process, the lid member 12 and the closed container 14 function as an anode.
Although not shown, a discharge pipe for discharging gas from the chamber space 42 is connected to the closed container 14. The discharge pipe is provided with a pump for evacuating the chamber space 42. Therefore, by operating the pump, the degree of vacuum of the chamber space 42 can be adjusted. Further, an introduction pipe for introducing an inert gas such as argon into the chamber space 42 at the time of film formation processing is connected to the closed container 14. The introduction pipe may be connected to the lid member 12. Furthermore, the closed container 14 is provided with a door that can communicate the internal space 44 of the closed container 14 with the outside of the closed container 14 by opening the closed container 14.

  In the film forming apparatus 10, the cylindrical auxiliary electrode 13 is provided in the film forming space 43. The outer diameter of the cylindrical auxiliary electrode 13 is smaller than the inner diameter of the evaporation source 11, and the cylindrical auxiliary electrode 13 is coaxially arranged with the evaporation source 11. Therefore, the cylindrical auxiliary electrode 13 is electrically insulated from the evaporation source 11. The cylindrical auxiliary electrode 13 is attached to the lid member 12. Therefore, the cylindrical auxiliary electrode 13 and the lid member 12 are electrically connected, and the cylindrical auxiliary electrode 13 functions as an anode in the film forming process.

  The film forming apparatus 10 includes a support 31 that supports the work 41 such that the work 41 is positioned in the film formation space 43. The support 31 extends in the axis C direction. The support 31 is disposed in the internal space 44 through the bottom portion 16 which is a wall portion of the closed container 14. The support 31 supports the work 41 at an end on the film formation space 43 side.

  The support 31 is connected to a moving mechanism that moves the support 31 in the extending direction of the axis C. Therefore, the support 31 moves between the deposition position and the preparation position by the operation of the moving mechanism. FIG. 1 illustrates the support 31 when in the film formation position. Moreover, the arrow which shows the moving direction of the support tool 31 is displayed on FIG.

A bias power supply 52 is connected to the work 41 supported by the support 31, and a negative bias voltage is applied by the bias power supply 52 during the film forming process.
A removable auxiliary electrode 20 is attached to the support 31. The auxiliary electrode 20 has a cylindrical masking portion 21. The masking portion 21 is supported by the support 31. Therefore, the auxiliary electrode 20 can move together with the support 31 in the extending direction of the axis C.

  The workpiece 41 supported by the support 31 passes through the space inside the masking portion 21 and is exposed to the film forming space 43. The inner diameter of the masking portion 21 is formed in such a size that the work 41 is in contact with the inner peripheral surface of the masking portion 21.

  In the masking portion 21, an insulating portion 24 is formed across the contact surface of the masking portion 21 with the support 31 and the inner peripheral surface of the masking portion 21. The insulating portion 24 is made of an insulating material. For example, the insulating portion 24 can be formed on the masking portion 21 by forming a coating using thermally sprayed alumina. In the present embodiment, the inner peripheral surface of the masking portion 21 in which the insulating portion 24 is formed, that is, the surface facing the workpiece 41 supported by the support 31 functions as the opening 22. Then, since the insulating portion 24 abuts on the work 41, the work 41 and the masking portion 21 are electrically insulated.

  As shown in FIGS. 1 and 2, the auxiliary electrode 20 includes a disk-shaped electrode portion 23 extending in the radial direction of the closed container 14 from the outer peripheral edge of the masking portion 21. The masking portion 21 and the electrode portion 23 are electrically connected. As the electrode part 23, metals, such as iron or aluminum, can be used. Further, the electrode portion 23 is formed with a large number of holes 23A. Therefore, the film forming space 43 and the internal space 44 communicate with each other through the holes 23A.

  The outer diameter of the electrode portion 23 is slightly smaller than the inner diameter of the cylindrical portion 15 in the closed container 14. The outer edge portion of the electrode portion 23 is in contact with the projection 17 of the closed container 14, and the auxiliary electrode 20 and the closed container 14 are electrically connected. Since the closed container 14 is grounded, the auxiliary electrode 20 electrically connected to the closed container 14 functions as an anode during the film forming process.

Then, the film-forming method using the film-forming apparatus 10 is demonstrated.
First, the auxiliary electrode 20 is set on the support 31 while the support 31 is in the preparation position. Next, the work 41 is attached to the support 31. At this time, after the work 41 is attached to the support 31, the auxiliary electrode 20 may be set to the support 31. In this state, a part of the workpiece 41 is surrounded by the opening 22. When the preparation position is located in the internal space 44, the step of setting the auxiliary electrode 20 and the work 41 on the support 31 is continuously performed in the internal space 44. On the other hand, when the preparation position is outside the internal space 44, that is, when the support 31 moves to the outside of the closed container 14, the above process is not continuously performed in the internal space 44.

  Subsequently, the support 31 is moved to the film forming position by the operation of the moving mechanism. At this time, the outer edge of the electrode portion 23 of the auxiliary electrode 20 moves along the inner circumferential surface of the cylindrical portion 15 of the closed container 14. That is, the cylindrical portion 15 can function as a guide for the support 31 moved to the film formation position. Then, when the electrode portion 23 of the auxiliary electrode 20 moving with the support 31 abuts on the projection 17 of the closed container 14, the movement of the support 31 is stopped. Thus, the work 41 is disposed in the film forming space 43.

  Next, the chamber is closed, and the operation of the pump evacuates the space 42 in the chamber. Then, when the degree of vacuum of the chamber space 42 reaches a predetermined degree of vacuum, a bias voltage is applied to the work 41 by the bias power supply 52. In addition, a negative voltage is applied to the evaporation source 11 by the operation of the power supply 51. In this state, for example, when the striker is brought into contact with the evaporation source 11 and the striker is separated from the evaporation source 11, arc discharge is generated between the cathode and the anode in the chamber internal space 42. When the arc discharge is maintained, metal ions emitted from the evaporation source 11 by the arc discharge are deposited on the surface of the work 41. A film is formed on the work 41 by this. At this time, electrons and the like flow into the lid member 12, the cylindrical auxiliary electrode 13, the closing container 14 and the auxiliary electrode 20 which are grounded. At this time, an inert gas such as argon gas is introduced into the chamber space 42 from the introduction pipe.

  When the formation of the film on the work 41 is completed, the introduction of the gas from the introduction pipe is stopped, and the operations of the power supply 51 and the bias power supply 52 are stopped. Then, the support 31 is moved to the preparation position by the operation of the moving mechanism. Then, when the support 31 is moved to the preparation position, the work 41 on which the film is formed is removed from the support 31 and taken out of the chamber space 42 through the door provided in the closed container 14.

Thereafter, a new work 41 is set on the support 31 and the film forming process can be continuously performed by repeatedly performing the above steps.
Next, the effects of the film forming apparatus 10 and the film forming method using the film forming apparatus 10 according to the first embodiment will be described.

  In the film forming apparatus 10, in addition to the lid member 12 and the cylindrical auxiliary electrode 13, the auxiliary electrode 20 disposed in the chamber space 42 and the closed container 14 constituting the chamber function as an anode. By this, the area of the anode can be secured, and the arc discharge can be stabilized.

  Further, when the support 31 is moved to the film formation position in the film forming process, the electrode unit 23 abuts on the protrusion 17 so that the support 31 can be aligned. As a result, it is possible to suppress variations in the accuracy of film formation on the workpiece 41 supported by the support 31.

  Furthermore, in the film forming apparatus 10, a part of the work 41 supported by the support 31 is covered by the masking unit 21. As a result, during the film forming process, the film is not formed on the portion of the work 41 covered by the masking portion 21, and the film is formed on the portion of the work 41 exposed to the film forming space 43. be able to. That is, the area where the workpiece 41 is coated can be adjusted by the shape of the masking portion 21.

  In addition, the auxiliary electrode 20 is removably attached to the support 31. Then, the auxiliary electrode 20 can be moved together with the support 31. Therefore, when the support 31 is moved to the preparation position and the work 41 is removed after completion of the film forming process, the auxiliary electrode 20 can also be removed from the support 31. Thus, foreign matter attached to the auxiliary electrode 20 can be removed, or the auxiliary electrode 20 can be replaced. Therefore, at the time of the film forming process, the auxiliary electrode 20 in which no foreign matter such as an insulator adheres or in which the amount of the foreign matter attached is small can be disposed in the chamber space 42. As the area of the auxiliary electrode 20 to which the foreign matter is attached is larger, the area which can function as the anode is smaller. In this respect, since the auxiliary electrode 20 to which no foreign matter is attached or the auxiliary electrode 20 having a small amount of foreign matter attached can be disposed in the chamber space 42, the film forming process is performed with the anode area being small. The arc discharge can be stabilized by the amount that can be suppressed.

The first embodiment can also be implemented in the following form, which is appropriately modified.
-If the portion of the work 41 supported by the support 31 is surrounded by the opening 22, the portion of the work 41 exposed to the film forming space 43 is made larger than the inner diameter of the masking portion 21. It can also be done.

  In the first embodiment, the masking unit 21 and the electrode unit 23 are electrically connected. An insulating member may be interposed between the masking portion 21 and the electrode portion 23 to electrically insulate the masking portion 21 and the electrode portion 23 from each other.

  In the first embodiment, the projection 17 is provided continuously over the entire circumference of the cylindrical portion 15 of the closed container 14. However, the projection 17 is necessarily provided continuously over the entire circumference. It does not have to be. For example, the protrusions 17 may be a plurality of protrusions extending in the radial direction of the cylindrical portion 15 from the inner peripheral surface of the cylindrical portion 15 toward the axis C.

  In the first embodiment, the protrusion 17 is provided on the closed container 14. However, if the auxiliary electrode 20 and the closed container 14 can be electrically connected to each other, the protrusion 17 is omitted. It is also good. For example, by bringing the electrode portion 23 into contact with the cylindrical portion 15, the auxiliary electrode 20 can function as an anode.

-The electrode part 23 which comprises the auxiliary electrode 20 may be a mesh which has mesh | network.
The auxiliary electrode 120 shown in FIG. 3 may be employed instead of the auxiliary electrode 20. The auxiliary electrode 120 includes six rod portions 125 radially extending from the masking portion 21. Further, the auxiliary electrode 120 includes a ring electrode 123 connected to the radial outer end of each rod portion 125. The auxiliary electrode 120 is disposed in the chamber space 42 while being electrically connected to the closed container 14 and electrically isolated from the evaporation source 11. Thus, in the film forming process, the ring electrode 123 of the auxiliary electrode 120 and each rod portion 125 can also function as an anode. The number of rod portions 125 can be set arbitrarily as long as the ring electrode 123 can be supported.

Further, the auxiliary electrode 120 may have a configuration in which the ring electrode 123 is omitted.
As a constituent material of the ring electrode 123 and the rod portion 125, for example, iron and aluminum can be adopted. Moreover, the heat-resistant performance of an auxiliary electrode can also be improved by employ | adopting molybdenum, tungsten, or electroconductive ceramics as a material of the ring electrode 123 and the rod part 125. FIG.

  The auxiliary electrode 220 shown in FIG. 4 may be employed instead of the auxiliary electrode 20. The auxiliary electrode 220 includes six rod-shaped connecting portions 225 extending from the masking portion 21 to the film forming space 43. In addition, the auxiliary electrode 220 includes a ribbon electrode 223 connected to the radial outer end of each connection portion 225. The ribbon electrode 223 has a shape in which a strip-shaped plate is formed into a ring. The ribbon electrode 223 is connected to the masking portion 21 by each connection portion 225. The auxiliary electrode 220 is disposed in the chamber space 42 while being electrically connected to the closed vessel 14 and electrically isolated from the evaporation source 11. Thus, during the film formation process, the ribbon electrode 223 of the auxiliary electrode 220 and each connection portion 225 can also function as an anode. The number of connection parts 225 can be set arbitrarily as long as the ribbon electrode 223 can be supported.

As a constituent material of the ribbon electrode 223 and the connection portion 225, the same material as the ring electrode 123 and the rod portion 125 can be adopted.
A hole can also be provided in the ribbon electrode 223 in the same manner as the electrode portion 23 of the auxiliary electrode 20 of the first embodiment. The ribbon electrode 223 can also be configured by mesh.

Second Embodiment
A film forming apparatus 310 according to the second embodiment will be described with reference to FIG. The film forming apparatus 310 according to the second embodiment includes the film forming apparatus 10 according to the first embodiment including the auxiliary electrode 20 which can be separated from the closed container 14 in that the auxiliary electrode is fixed to the closed container. It is different. About the same composition as a 1st embodiment, the same numerals are attached and explanation is omitted suitably.

  As shown in FIG. 5, an inner cylindrical portion 64 having an outer shape smaller than the inner diameter of the cylindrical portion 15 is provided in the internal space 44 of the closed container 14. The inner cylindrical portion 64 is made of a conductive material such as iron or aluminum. The base end (lower end in the figure) of the inner cylindrical portion 64 is fixed to the bottom portion 16 of the closed container 14. On the other hand, the tip (upper end in the figure) of the inner cylindrical portion 64 is located at substantially the same position as the support portion of the work 41 in the support 31 (that is, the upper end of the support 31 in FIG. 5) in the extension direction of the axis C. doing. Further, the inner cylindrical portion 64 supports the masking member 65 at its tip.

  The masking member 65 is a disk-shaped member made of a conductive material such as iron or aluminum. A portion of the masking member 65 protrudes from the internal space 44 of the closed container 14 toward the film formation space 43. The insulating member 67 is formed on the inner peripheral surface of the masking member 65 and on the portion of the masking member 65 in contact with the support 31. For example, the insulating portion 67 can be formed on the masking member 65 by forming a coating using thermally sprayed alumina. Thus, in the masking member 65 in which the insulation part 67 is formed, the surface which opposes the workpiece | work 41 supported by the support tool 31 functions as the opening part 66. As shown in FIG.

  On the other hand, the portion of the masking member 65 in contact with the inner cylindrical portion 64 and the outer peripheral surface are not subjected to the insulation treatment. Therefore, while the masking member 65 is electrically insulated from the support 31 and the work 41 supported by the support 31, the masking member 65 is electrically connected to the closed container 14 via the inner cylindrical portion 64. The masking member 65 is electrically isolated from the evaporation source 11. Therefore, the auxiliary electrode is constituted by the masking member 65 and the inner cylindrical portion 64.

  The diameter of the opening 66 of the masking member 65 is larger than the diameter of the work 41. Therefore, when the support 31 moves in the extending direction of the axis C, the work 41 does not abut on the masking member 65. Therefore, when moving the work 41 to the film forming space 43, the work 41 supported by the support 31 passes through the opening 66, and the work 41 moves to the film forming space 43.

  In the film forming method using this film forming apparatus 310, when moving the support 31 to the film forming position, the support 31 moves to the film forming space 43 side until the support 31 abuts on the masking member 65. . In addition, since each process in the other film-forming method is substantially equivalent to the case of the said 1st Embodiment, description of each process is abbreviate | omitted here.

Next, the operation of the film forming apparatus 310 according to the second embodiment and the effect thereof will be described.
In the film forming apparatus 310, in addition to the lid member 12, the cylindrical auxiliary electrode 13, and the closing container 14, the masking member 65 and the inner cylindrical portion 64 can function as an anode. This makes it possible to secure the anode area.

  Further, in the film forming apparatus 310, since the workpiece 41 is inserted through the opening 66, a part of the workpiece 41 is covered by the masking member 65. As a result, during the film forming process, the film is not formed on the portion of the work 41 covered by the masking member 65, and the film is formed on the portion of the work 41 exposed to the film forming space 43. be able to. That is, the shape of the masking member 65 can adjust the area on which the workpiece 41 is coated.

  Further, when the support 31 is moved to the film formation position in the film forming process, the support 31 can be aligned by the contact of the support 31 with the masking member 65. As a result, it is possible to suppress variations in the accuracy of film formation on the workpiece 41 supported by the support 31.

The second embodiment described above can also be implemented in the following form in which this is appropriately changed.
In the second embodiment, the closed container 14 may be made to support the integrally formed inner cylindrical portion 64 and the masking member 65.

  The electrical connection between the masking member 65 and the closed container 14 is not limited to a tubular one such as the inner cylindrical portion 64. For example, the masking member 65 may be supported by a plurality of bar members extending in the direction of the axis C from the bottom portion 16 of the closed container 14. In this case, the masking member 65 can be electrically connected to the closed container 14 by making the rod member of a conductive material.

  Alternatively, a plurality of rod members extending radially inward from the inner peripheral surface of the cylindrical portion 15 of the closed container 14 may be radially provided, and the masking member 65 may be supported by the rod members. In this case, the masking member 65 can be electrically connected to the closed container 14 by making the rod member of a conductive material.

The moving mechanism for moving the support 31 in the direction of the arrow shown in FIG. 5 is not an essential configuration.
In addition to the above, there are the following elements which can be changed commonly to the above embodiments.
-In each said embodiment, the cover member 12, the cylindrical auxiliary electrode 13, the closed container 14 and the auxiliary electrode 20 are earth | grounded. A positive voltage may be applied to the lid member 12, the cylindrical auxiliary electrode 13, the closed container 14 and the auxiliary electrode 20 by a power supply different from the power supply 51.

  In each of the above embodiments, the inner diameter of the masking portion 21 is set such that the workpiece 41 abuts on the inner circumferential surface of the masking portion 21. The workpiece 41 does not have to be in contact with the inner circumferential surface of the masking portion 21, and the inner diameter of the masking portion 21 can be made larger than the diameter of the workpiece 41.

If the anode area can be secured, the cylindrical auxiliary electrode 13 can be omitted. That is, the cylindrical auxiliary electrode 13 is not an essential component.
The size and shape of the closed container 14 may be changed, and the area of the inner surface of the closed container 14 may be changed. As the area of the inner surface of the closed container 14 is increased, the area of the anode can be increased.

  The size of the auxiliary electrode can be changed to increase the area of the anode. In the first embodiment, the size of the auxiliary electrode 20 can be changed by changing the size and the shape of the masking portion 21 and the electrode portion 23. By changing the size and shape of the auxiliary electrode 20, the area of the anode can be adjusted. In the second embodiment, the size of the auxiliary electrode can be changed by changing the size and the shape of the masking member 65 and the inner cylindrical portion 64.

  The area where the workpiece 41 is masked can be adjusted by the shapes of the masking portion 21 and the masking member 65. For example, by changing the length in the direction of the axis C in the masking portion 21 or the masking member 65, the range of the workpiece 41 covered by the masking portion 21 or the masking member 65 can be changed.

  The insulating portion 24 may be formed by disposing an insulator such as nonconductive ceramic on the surface of the masking portion 21. Similarly, the insulating portion 67 of the masking member 65 can be formed of the above-described insulator.

  The entire part covering a part of the work 41 supported by the support 31 may be constituted by an insulating member. In the first embodiment, the entire masking portion 21 is formed of an insulating member. For example, the entire masking portion 21 may be formed of nonconductive ceramic. In this case, if the auxiliary electrode 20 has a conductive portion such as the electrode portion 23, the auxiliary electrode 20 can function as an anode.

  In the second embodiment, the entire masking member 65 is made of an insulating member such as nonconductive ceramic. In this case, if the inner cylindrical portion 64 is made of a conductive material, the inner cylindrical portion 64 can function as an anode.

  -When moving the support 31 to the film forming position in the film forming process, the laser sensor is used to grasp the position of the support 31 in the direction of the axis C, thereby aligning the work 41 supported by the support 31 You can also do

  -In each said embodiment, the cylindrical-shaped evaporation source 11 is employ | adopted. The evaporation source 11 may not be cylindrical as long as it is cylindrical. Similarly, the closed container 14 is not limited to the cylindrical shape.

  In each of the above embodiments, the chamber internal space 42 is partitioned by the closed container 14 and the evaporation source 11 having the same diameter as the closed container 14. Instead of such a configuration, it is possible to use the film forming container having the same diameter as the closed container 14 and to divide the chamber internal space 42 by the film forming container and the closed container 14. In this case, the evaporation source is formed smaller in diameter than the closed container 14 and disposed in the film forming container. That is, it is not an essential configuration that the closed container 14 and the evaporation source 11 have the same diameter.

  In each of the above embodiments, the evaporation source 11 and the closed container 14 are coaxially arranged, but the central axes of the evaporation source 11 and the closed container 14 may be offset from each other. Likewise, it is not essential to arrange the cylindrical auxiliary electrode 13 coaxially with the evaporation source 11 or the closed container 14.

  -When the above film forming process is the first film forming process, after the first film forming process is completed, the second film forming process is continued while the work 41 is accommodated in the film forming space 43. Can also be done. For example, as the second film forming process, it is conceivable to perform a process of forming a film of diamond like carbon (DLC) on the surface of the workpiece 41. In this case, the insulating material derived from the hydrocarbon gas introduced into the chamber space 42 when depositing the DLC may adhere to the anode. In the case where the work 41 is replaced in this state and the first film forming process is performed again, arc discharge may become unstable if the area of the anode is insufficient. In this respect, according to the film forming apparatus of each of the above-described embodiments, since the area of the anode can be secured large, the absolute area of the anode is large even if the effective area of the anode decreases due to the adhesion of the insulating material. Thus, arc discharge can be generated stably.

  DESCRIPTION OF SYMBOLS 10, 310 ... Film-forming apparatus, 11 ... Evaporation source, 12 ... Lid member, 13 ... Cylindrical auxiliary electrode, 14 ... Blocking container, 15 ... Cylinder part, 16 ... Bottom part, 17 ... Protrusion, 18 ... Insulator, 20 ... Auxiliary electrode 21 masking portion 22 opening portion 23 electrode portion 23A mesh, 24 insulating portion 31 support member 41 work 42 internal chamber space 43 film forming space 44 Internal space, 51: power source, 52: bias power source, 64: inner cylinder portion, 65: masking member, 66: opening portion, 67: insulating portion, 120: auxiliary electrode, 123: ring electrode, 125: connecting portion, 220: 220 Auxiliary electrode, 223 ... ribbon electrode, 225 ... connection portion.

Claims (1)

A film forming apparatus having a cylindrical evaporation source that constitutes a chamber, depositing a substance emitted from the evaporation source by arc discharge on a surface of a work placed in the chamber to form a film. ,
It constitutes the chamber together with the evaporation source, has an internal space communicating with a film formation space which is the space inside the evaporation source, and is grounded or a positive voltage is applied. Closed container,
An insulator interposed between the evaporation source and the closed vessel;
A support for supporting the work so that the work is positioned in the film forming space;
And an auxiliary electrode electrically connected to the closed container while being electrically insulated from the evaporation source.
The support extends in the central axial direction of the evaporation source and penetrates the wall of the closed container,
An insulating portion is provided on the auxiliary electrode, and the insulating portion is in contact with the support and faces the work supported by the support.