JP2019072363A - Cleaning system and cleaning method, and information processing device, method of controlling the same, and program - Google Patents

Abstract

To provide a mechanism that can reduce the cost for deodorization while providing a proper cleaning ability.SOLUTION: A cleaning system has a production device that produces cleaning liquid, and a cleaning device that cleans a gas with cleaning liquid. The cleaning system stores a parameter for producing cleaning liquid with the cleaning device, acquires time, identifies a parameter corresponding to the time, and controls so that the production device produces cleaning liquid with the identified parameter.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a cleaning system and a cleaning method capable of reducing the cost for deodorization while providing an appropriate cleaning power, an information processing apparatus, a control method thereof, and a program.

  With increasing environmental awareness, when operating an apparatus or facility that generates odor, it is essential to take measures to reduce the odor. As a method of reducing the odor in the exhaust, a method is known in which the odor component in the exhaust is dissolved in water by washing the exhaust with water or a treatment liquid. There is also known a method of improving the odor reduction efficiency by using a treatment liquid having a deodorizing action at this time. For example, Patent Document 1 discloses a deodorizing device that reduces the odor in the air by spraying hypochlorous acid water on the air fed into the inside and exhausts the air in which the odor is reduced. ing.

Unexamined-Japanese-Patent No. 2012-100717

  There are changes in odor concentration depending on the time zone and progress of the manufacturing process, and the odor concentration and harmful gas generated in various manufacturing processes such as composting, animal husbandry, chemistry, food and waste processing, etc. vary depending on the time zone and progress of the manufacturing process. Absent. In particular, in the case of compost, when the organic matter is decomposed by microorganisms, the concentration of generated odor fluctuates according to the progress of the decomposition.

  In a system in which the deodorizing ability is fixed, there is a possibility of exhausting an offensive odor due to the lack of ability, and in the state where the deodorizing ability is constantly enhanced, the running cost becomes high.

  An object of the present invention is to provide a mechanism capable of suppressing the cost of deodorization while providing an appropriate cleaning power.

  In order to achieve the above object, the cleaning system of the present invention is a cleaning system including a generating device for generating a cleaning solution and a cleaning device for cleaning a gas with the cleaning solution, wherein the cleaning device generates the cleaning solution. Storage means for storing parameters for performing the process, acquisition means for acquiring the time, identification means for identifying the parameter for generating the cleaning fluid corresponding to the time, and the cleaning fluid identified by the identification means Control means for controlling the generator to generate the cleaning liquid with the parameters for

  ADVANTAGE OF THE INVENTION According to this invention, the cost concerning deodorizing can be held down, providing appropriate cleaning power.

It is a schematic diagram which shows an example of the system configuration | structure figure of the washing | cleaning system in this embodiment. It is a schematic diagram which shows an example of the hardware constitutions of the deodorizing apparatus 200. As shown in FIG. FIG. 2 is a schematic view showing an example of a hardware configuration of the information processing apparatus 100. FIG. 3 is a schematic view showing an example of a functional configuration of the information processing apparatus 100. It is a flowchart explaining the flow of a detailed process in a 1st embodiment. FIG. 7 is a configuration diagram showing an example of a setting value table 600. It is a flowchart explaining the flow of a detailed process in a 2nd embodiment. FIG. 8 is a block diagram showing an example of a mode table 800. It is a flowchart explaining the flow of a detailed process in 3rd Embodiment. FIG. 6 is a block diagram showing an example of a mode table 1000. FIG. 11 is a configuration diagram showing an example of a screen configuration of a mode selection screen 1100. It is a flowchart explaining the flow of a detailed process in a 4th embodiment. FIG. 16 is a block diagram showing an example of a mode table 1300.

  Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. The embodiment described below shows an example when the present invention is specifically implemented, and is only a specific example of the configuration described in the claims. In particular, the cleaning device, the cleaning system, and the cleaning method according to the present invention are not limited to devices, systems, and methods whose main purpose is to deodorize a gas to be deodorized. The cleaning apparatus, the cleaning system, and the cleaning method according to the present invention are for cleaning gas, and can be used for various purposes other than deodorization. For example, the cleaning apparatus, the cleaning system, and the cleaning method according to the present invention can also be used for the removal of bacteria in a gas. Therefore, the cleaning device, the cleaning system, and the cleaning method according to the present invention include devices, systems and methods which are mainly intended for purposes other than deodorization but can be used for deodorization. Hereinafter, an embodiment of the present invention will be described with an example of a (wet) deodorizing device, a deodorizing system, and a deodorizing method mainly intended to deodorize a gas to be deodorized.

  FIG. 1 is a system configuration diagram showing an example of the configuration of a deodorizing system (corresponding to a cleaning system) that controls the physical amount of the cleaning solution. The deodorizing system includes an information processing apparatus 100 that controls the cleaning system, a generating apparatus 400 that generates a cleaning liquid, and a deodorizing apparatus 200 that deodorizes an odor using the cleaning liquid. In the present embodiment, in the production apparatus 400, hypochlorous acid water, which is a cleaning liquid, is generated using a carbon dioxide gas mixing method. The carbon dioxide gas mixing method is a method of mixing sodium hypochlorite, carbon dioxide and water to produce hypochlorous acid water. The hypochlorous acid water may be produced by another method. The generating device 400 is connected to the deodorizing device 200, and the cleaning liquid 410 generated by the generating device 400 flows into the deodorizing device 200. The cleaning unit of the deodorizing apparatus 200 is provided with a sensor. The sensor will be described in detail in FIG. The gas 500 to be deodorized is supplied via the inflow port 101, and the gas 500 to be deodorized is deodorized by the cleaning unit in the deodorizing apparatus 200. The cleaning solution 410 overflowed by the deodorizing apparatus 200 is drained out through the outlet 103.

  This is the end of the description of the system configuration of the control system shown in FIG. The above-described system configuration is an example, and can be changed as appropriate according to the purpose and application.

  Next, the hardware configuration of the deodorizing apparatus 200 according to the present embodiment will be described with reference to FIG.

Embodiment 1
The wet deodorizing apparatus according to the first embodiment includes an inlet, a cleaning unit, an outlet, a cleaning solution supply unit, and an air bubble supply unit. FIG. 2: (A) (B) is schematic which shows the structure of an example of the wet deodorizing apparatus which concerns on Embodiment 1, respectively. The wet deodorizing apparatus according to the present embodiment will be described below with reference to FIGS.

  FIG. 2 (A) shows a deodorizing apparatus 200A according to the present embodiment, and FIG. 2 (B) shows a deodorizing apparatus 200B according to the present embodiment. A gas to be cleaned (deodorization target) flows into the deodorizing devices 200 A and 200 B via the inlet 101, and the gas flowing in is deodorized by washing with the cleaning liquid 122 and flows out via the outlet 103. In the present specification, the gas to be cleaned is referred to as a first gas.

  From the inflow port 101, the gas to be deodorized flows into the interior of the deodorizing devices 200A and 200B. For example, a pump (not shown) can be used to send the gas to be deodorized to the inlet 101. Here, the pump for sending the gas to the inlet 101 may be disposed either inside or outside the deodorizing devices 200A, 200B. The type of gas to be deodorized is not particularly limited. The high deodorizing performance of the deodorizing apparatuses 200A and 200B according to the present embodiment is suitable for deodorizing a gas having a high odor concentration. For example, as a gas to be deodorized, there may be mentioned a gas produced by fermentation of an organic substance, including the exhaust from a container for storing food waste or human waste. A specific example of the object to be deodorized includes the exhaust from compost (compost producing apparatus).

  The odor component to be removed is not particularly limited. Here, as an example of the odor component in the compost, a basic component such as ammonia or trimethylamine, a sulfide component such as methyl mercaptan, an aldehyde component such as acetaldehyde, or a carboxylic acid component such as propionic acid It can be mentioned. The deodorizing devices 200A, 200B according to the present embodiment are particularly suitable for reducing the ammonia concentration. For example, in one embodiment, the ammonia concentration of the gas to be deodorized is 100 ppm or more when cooled by the cooler, and is 3000 ppm or more when not cooled by the cooler. Further, the gas to be deodorized to flow in from the inflow port 101 may be a gas after being processed by another device such as a deodorizing device.

  The cleaning unit 120 cleans the gas to be deodorized, which has flowed into the deodorizing devices 200A and 200B, with the first cleaning solution 122. The cleaning unit 120 has a contact unit 121 where the gas to be deodorized contacts the first cleaning solution 122, and a portion where the first cleaning solution 122 is stored. In one embodiment, the first cleaning liquid 122 is stored in the lower part of the deodorizing devices 200A, B, so the washing unit 120 is also located in the lower part of the deodorizing devices 200A, B.

  FIG. 1C is an enlarged view of one of the contact portions 121 of FIG. 2A. A process of mixing the gas to be deodorized and the first cleaning solution 122 will be described using FIG. 1 (C). First, the gas to be deodorized moves toward the flow path narrowing portion 123 by being accelerated by the pump. In the example of FIG. 2A, the gas to be deodorized passes through the flow path narrowing portion 123 provided in the contact portion 121 and in close proximity to the liquid surface of the first cleaning liquid 122. At this time, since the flow of the gas to be deodorized is accelerated, it occurs after the vortex with the first cleaning liquid 122 passes through the passage narrowing portion. Therefore, the gas to be deodorized and the first cleaning liquid 122 are efficiently mixed, and the gas to be deodorized is cleaned. Thus, the cleaning unit 120 can mix the gas to be deodorized and the first cleaning solution 122, and can also stir the gas to be deodorized and the first cleaning solution 122 in one embodiment. . In the example of FIG. 2A, the cleaning unit 120 includes two contact parts 121 having a flow path narrowing part, but the number of the contact parts 121 is not particularly limited. For example, if it is desired to further improve the deodorizing efficiency, the deodorizing devices 200A and 200B may be provided with three or more contact portions (flow path narrowing portions). Moreover, the deodorizing devices 200A and 200B can be made smaller than in the case of including a plurality of contact portions by setting the number of the contact portions 121 to one.

  In the example shown in FIG. 2B, the gas to be deodorized passes through the inside of the first cleaning liquid 122 at the contact portion 121, and the gas to be deodorized is cleaned at this time. In the example of FIGS. 2A and 2B, the level of the liquid surface of the first cleaning liquid 122 is uneven due to the pressure of the gas to be deodorized flowing from the inflow port 101. The height of the liquid surface of the first cleaning liquid 122 is set to be higher than the inlet 153 and the outlet 154 and lower than the outlet 180. Further, the height of the liquid surface of the first cleaning liquid 122 during cleaning is close to the flow path narrowing portion 123. That is, by discharging the first cleaning liquid 122 by the outlet 180, it is possible to suppress the water level from becoming too high, and it becomes possible to discharge the first cleaning liquid 122 used for cleaning. . By maintaining the water level higher than the inlet 153 and the outlet 154, bubbles can be supplied to the first cleaning solution 122.

  However, the configuration of the cleaning unit 120 is not limited to this. For example, in the cleaning unit 120, the first cleaning solution 122 may be sprayed. In this case, the gas to be deodorized is cleaned when it passes through the mist of the first cleaning solution 122. Further, in the cleaning unit 120, the gas to be deodorized that has flowed in from the inflow port 101 may be bubbled into the first cleaning solution 122, and in this case also, the gas to be deodorized can be cleaned by the first cleaning solution 122.

  From the outlet 103, the gas after being cleaned by the first cleaning solution 122 flows out. The gas flowing out of the outlet 103 may be released to the atmosphere or may be further processed by another device such as a deodorizing device. Thus, the gas after being discharged from the outlet 103 is reduced in odor component to be deodorized as compared with the gas to be deodorized before flowing into the inlet 101. Specifically, when the odor to be deodorized is an odor from compost, the ammonia concentration is at least reduced by the cleaning processing by the deodorizing devices 200A and 200B.

  Next, the internal structure of the deodorizing devices 200A and 200B will be described. The inside of deodorizing apparatus 200A, B is divided into several divisions. The deodorizing devices 200A and 200B have an inflow section 131, and the inflow section 131 is provided with an inflow port 101. The inflow section 131 is a portion on the upstream side of the cleaning unit 120 where the cleaning with the first cleaning liquid 122 is performed, that is, a section between the inlet 101 and the cleaning unit 120. In addition, the deodorizing devices 200A, 200B have an outflow section 141, and the outflow section 141 is provided with an outlet 103. The outflow section 141 is a portion on the downstream side of the cleaning unit 120 where the cleaning with the first cleaning solution 122 is performed, that is, a section between the cleaning unit 120 and the outlet 103.

  The cleaning solution supply units 130 and 140 supply a second cleaning solution different from the first cleaning solution 122. The cleaning liquid supplies 130 and 140 can supply the second supply liquid so as to be mixed with the first cleaning liquid 122 used for cleaning in the cleaning section 120. Here, in at least one of the cleaning solution supply units 130 and 140 between the inlet 101 and the cleaning unit 120 or between the cleaning unit 120 and the outlet 103, the gas to be deodorized is cleaned with the second cleaning solution. The second cleaning solution can be supplied as it is. For example, the cleaning liquid supply units 130 and 140 can be used as the second cleaning liquid in a space between the inlet 101 and the cleaning unit 120 (ie, the inflow section 131) and a space between the cleaning unit 120 and the outlet 103. It can be sprayed on at least one of (i.e. the outflow compartment 141). The amount and presence of the spray are controlled by a valve that controls the spray.

  As an example, as illustrated in FIG. 2A, the deodorizing apparatus 200A sprays the first cleaning liquid supply unit 130 that sprays the second cleaning liquid to the inflow section 131 and the second cleaning liquid to spray the outflow section 141. And the second cleaning liquid supply unit 140. The first cleaning liquid supply unit 130 sprays the second cleaning liquid on the gas flow path from the inflow port 101 to the cleaning unit 120. In addition, the first cleaning liquid supply unit 130 sprays the second cleaning liquid on the gas flow path from the cleaning unit 120 to the outlet 103. However, as in the deodorizing apparatus 200B shown in FIG. 2B, a configuration may be employed in which the second cleaning liquid supply unit 140 is provided and the first cleaning liquid supply unit 130 is not provided. In addition, it is not essential that the cleaning liquid supply units 130 and 140 spray the second cleaning liquid. For example, a configuration may be adopted in which the gas to be deodorized passes through the inside of the second cleaning liquid as bubbles.

  The washing liquid supply units 130 and 140 are provided so that the second washing liquid after washing the gas to be deodorized is mixed with the first washing liquid used for washing in the washing unit 120. For example, as shown in FIGS. 2A and 2B, the deodorizing apparatuses 200A and 200B can have a single cleaning tank having the inlet 101, the cleaning unit 120, and the outlet 103. Then, the cleaning liquid supply units 130 and 140 are arranged such that the liquid level of the first cleaning liquid 122 in the cleaning unit 120 is lower than the second cleaning liquid supply position (that is, the positions of the cleaning liquid supply units 130 and 140). be able to.

  The sensors 110 and 111 are sensors capable of measuring the concentration of the odor of the gas 500. In the present embodiment, although a sensor for measuring the concentration of ammonia is described as an example, the present invention is not limited to this, and a sensor for measuring the concentration of other odorous components may be used. It may be a sensor that measures. A sensor 110 is provided near the inlet 101 and can measure the concentration of ammonia in the gas 500 before cleaning. A sensor 111 is provided near the outlet 103 and can measure the concentration of ammonia in the gas 500 before cleaning.

  The cleaning liquid supply units 130 and 140 can supply the second cleaning liquid supplied from the outside of the device instead of supplying the first cleaning liquid 122 stored in the deodorizing devices 200A and 200B. According to such a configuration, since the cleaning liquid supply units 130 and 140 can supply fresh cleaning liquid, and can use the fresh cleaning liquid to clean the gas to be deodorized, the odor can be reduced better. Here, the fresh cleaning liquid refers to a cleaning liquid that has not been used to clean the gas to be deodorized in the deodorizing devices 200A and 200B. For example, the fresh cleaning solution may be a cleaning solution substantially free of the odor component contained in the gas to be deodorized. In addition, the fresh washing solution may be washing water substantially free of components other than the washing solution itself. However, the fresh cleaning solution may be the cleaning solution after it has been used to clean the gas in another deodorizing device, as long as it is supplied from the outside of the device and has not been used for cleaning in this device. By using such a configuration in combination with the cleaning unit 120 that cleans the gas to be deodorized using the first cleaning solution 122, the odor removal capability can be improved. In particular, the second cleaning liquid supply unit 140 can remove odor better by further cleaning the gas after being cleaned using the first cleaning liquid 122 with fresh cleaning liquid. As described above, since the fresh second cleaning solution is supplied to be mixed with the first cleaning solution 122 used for cleaning in the cleaning unit 120, the component to be cleaned in the first cleaning solution 122 is further reduced. can do. In addition, in the case of the configuration having the outlet 180 described later, the first cleaning liquid 122 is appropriately discharged, so that it is possible to clean with a more fresh cleaning liquid.

  Hereinafter, the first cleaning solution 122 and the second cleaning solution will be further described. The second cleaning solution is not particularly limited. For example, the second cleaning solution may be water. In addition, the second washing solution may be a weakly acidic or acidic aqueous solution having a pH of less than 7 so as to improve the ability to remove a basic odor component such as ammonia. Furthermore, in order to improve the deodorizing efficiency, the second cleaning solution may be an aqueous solution containing a deodorizing agent. The type of deodorizing agent is not particularly limited, and may be, for example, an oxidizing agent, an antibacterial agent, or a microorganism. As an example of an oxidizing agent, ozone or hypochlorous acid etc. are mentioned. Examples of antibacterial agents include chitosan or catechin.

  In one embodiment, an aqueous solution containing hypochlorous acid or hypochlorite ion is used as the second cleaning solution. In this case, the pH of the second washing solution is not particularly limited, but the pH of the second washing solution can be 7 or less so as to improve the activity. In addition, from the viewpoint of stability, the pH of the second washing solution can be 5 or more. An aqueous solution containing hypochlorous acid or hypochlorite ion having a pH of 5 or more and 7 or less is known as hypochlorous acid water. From the viewpoint of deodorizing performance, the chlorine concentration in the second cleaning liquid can be 100 ppm or more, or can be 1000 ppm or more. On the other hand, from the economical point of view, the chlorine concentration in the second cleaning liquid may be 10 ppm or more, and may be 500 ppm or less.

  The second cleaning solution may be hypochlorous acid water containing hypochlorous acid and hydrogen carbonate ion. Such hypochlorous acid water has stable pH because of its buffering action, so its properties are also stable. Such hypochlorous acid water can be obtained by mixing and diluting sodium hypochlorite and carbon dioxide gas in water. However, hypochlorous acid water obtained by other methods such as electrolysis of water or mixing of sodium hypochlorite and dilute hydrochloric acid can also be used as the second cleaning liquid.

  The first cleaning solution 122 is mixed with a second cleaning solution after being used to clean the gas to be deodorized. Thus, in one embodiment, the composition of the first cleaning liquid 122 is different than the second cleaning liquid. For example, the odor component concentration of the first cleaning liquid 122 can be higher than that of the second cleaning liquid. As an example, when hypochlorous acid water is used as the cleaning solution, the first cleaning solution 122 and the second cleaning solution have different pH values. That is, the second washing solution, which is a fresh washing solution, is closer to the ideal pH range of hypochlorous water spray than the first washing solution 122 used for washing. Therefore, the second cleaning liquid has a pH value of the hypochlorite sprinkler closer to the acidic side or the alkaline side depending on the component to be deodorized. In addition, the deodorizing agent concentration (for example, chlorine concentration) of the second cleaning solution can be higher than that of the first cleaning solution.

  The liquid property of the first cleaning solution 122 can be adjusted using a method of adding a cleaning solution, a method of supplying air bubbles described later, or the like. In one embodiment, an aqueous solution containing hypochlorous acid or hypochlorite ion is used as the first cleaning solution. In this case, the pH of the first washing solution is not particularly limited, but the pH of the first washing solution can be 7 or less so as to improve the activity. Further, from the viewpoint of stability, the pH of the first cleaning solution can be 5 or more. From the viewpoint of deodorizing performance, the chlorine concentration in the first cleaning liquid can be 100 ppm or more, or can be 1000 ppm or more. On the other hand, from the viewpoint of economy, the chlorine concentration in the first cleaning solution may be 10 ppm or more and 500 ppm or less.

  The bubble supply unit 150 mixes bubbles of the second gas different from the gas to be cleaned (the gas to be deodorized or the first gas) into the first cleaning liquid 122. The bubble supply unit 150 can mix the bubbles of the gas supplied from the outside of the deodorizing devices 200A and 200B as the bubbles of the second gas. Since the contact area of the first cleaning liquid 122 and the gas to be deodorized in the cleaning unit 120 is increased by the function of the bubble supply unit 150, the cleaning efficiency is improved. In one embodiment, the bubble supply unit 150 supplies nanobubbles to the first cleaning solution 122 to further improve the cleaning efficiency. Nanobubbles refer to bubbles having an average bubble diameter of less than 1 μm. The first cleaning solution 122 can also be activated by using nanobubbles. In addition, generation of sludge in the first cleaning solution 122 can also be suppressed by using nano bubbles. The function of the bubble supply unit 150 is not limited to the function of supplying nanobubbles as long as the function of increasing the contact area between the first cleaning liquid 122 and the gas to be deodorized is provided. In one embodiment, the bubble supply unit 150 may supply microbubbles or millibubbles to the first cleaning liquid 122 or may supply bubbles mixed with these.

  The type of gas supplied by the bubble supply unit 150 is not particularly limited. For example, the bubble supply unit 150 may supply air. On the other hand, the bubble supply unit 150 can mix a gas having the function of adjusting the liquid property of the first cleaning liquid 122 into the first cleaning liquid 122. Examples of such gases include acid gases such as carbon dioxide. By adjusting the liquid property of the first cleaning solution 122, the removal efficiency of the odor component can be improved. For example, although the first cleaning solution 122 absorbs a basic component, its pH increases, but the acid component is used to lower the pH of the first cleaning solution 122 to improve the removal efficiency of the basic component. it can. In addition, when hypochlorous acid water is used as the first cleaning solution 122 or the second cleaning solution, the deodorizing activity can be improved by reducing the pH of the first cleaning solution 122 using an acid gas. In addition, the bubble supply unit 150 can mix a gas having a deodorizing action into the first cleaning solution 122. As an example of such a gas, ozone etc. are mentioned. That is, when the gas to be deodorized contains ammonia and the hypochlorous acid water is used for the first cleaning solution 122, it is preferable to use an acid gas for the bubbles. In such a configuration, it is possible to increase the gas-liquid contact while suppressing the pH of the first cleaning liquid 122 after the deodorizing treatment.

  The specific configuration of the bubble supply unit 150 is not particularly limited. FIGS. 2A and 2B show an example of a specific configuration of the bubble supply unit 150. FIG. In these examples, the bubble supply unit 150 includes a circulation passage 151 including an inlet 153 and an outlet 154, and a discharge unit 152 for mixing the bubbles into the first cleaning liquid 122 in the circulation passage 151. There is. The first cleaning liquid 122 stored in the cleaning unit 120 flows from the cleaning unit 120 into the circulation path 151 via the inlet 153 which is a connection portion between the circulation path 151 and the cleaning unit 120. Further, from the circulation path 151, the first cleaning fluid that has flowed in is supplied again to the cleaning unit 120 via the outlet 154 which is a connection portion between the circulation path 151 and the cleaning unit 120. According to such a configuration, the first cleaning liquid 122 can be agitated.

  Deodorizing apparatus 200A, B may have the further structure. For example, the deodorizing apparatuses 200A and 200B may have the input unit 170 for inputting the first cleaning liquid 122. Further, the deodorizing devices 200A and 200B may have an outlet 180 through which the first cleaning liquid 122 flows out. In one embodiment, the amount of first cleaning fluid 122 is limited by outlet 180. That is, even if the second cleaning liquid is mixed, the amount of the first cleaning liquid 122 is kept constant because the first cleaning liquid 122 flows out from the outlet 180 as an overflow. Furthermore, the deodorizing devices 200A and 200B may have a discharge port 190 at the bottom. The sludge accumulated in the deodorizing devices 200A, B can be discharged through the discharge port 190. Furthermore, as shown to FIG. 2 (B), in order to improve gas-liquid contact efficiency, you may provide the filler 195 in the location which the 2nd washing | cleaning liquid is sprayed and the gas of deodorizing object passes.

  Next, the deodorizing method according to an embodiment will be described. Although this deodorizing method can be realized, for example, using the wet deodorizing device according to the first embodiment described above, it is also possible to use another wet deodorizing device.

  First, the gas to be deodorized is guided to the cleaning unit that performs cleaning with the first cleaning solution (step S10). For example, the gas to be deodorized can be introduced into the cleaning unit 120 from the inlet 101. Next, bubbles of a gas different from the gas to be deodorized are mixed with the first cleaning liquid (step S20). For example, the bubble supply unit 150 can mix bubbles in the first cleaning liquid 122. Then, the gas after being cleaned by the first cleaning solution 122 is led out of the cleaning unit (step S30). For example, the gas cleaned in the cleaning unit 120 can be led to the outlet 103.

  Further, this deodorizing method is a process of supplying the second cleaning solution so as to be mixed with the first cleaning solution 122 used for cleaning in the cleaning unit 120, which is a second cleaning solution different from the first cleaning solution 122. Have a step to do. This process is called process A. This step can be performed, for example, in at least one of step S10 and step S30. For example, in at least one of step S10 and step S30, the first cleaning liquid is mixed with the first cleaning liquid after the introduced gas is washed with the second cleaning liquid and the introduced gas is washed. A second cleaning solution different in composition from the cleaning solution can be supplied. For example, the first cleaning liquid supply unit 130 can supply the second cleaning liquid so as to clean the gas introduced from the inlet 101 to the cleaning unit 120. In addition, the second cleaning liquid supply unit 140 can supply the second cleaning liquid so as to clean the gas led from the cleaning unit 120 to the outlet 103.

Modification of Embodiment 1
In order to achieve the purpose of the configuration according to the first embodiment to improve the deodorizing ability of the deodorizing device, it is not necessary to adopt all of the configurations shown in the first embodiment. Hereinafter, modifications of the first embodiment will be described.

[Modification 1]
The wet deodorizing apparatus according to one embodiment includes at least one of the above-described inlet 101, cleaning unit 120, outlet 103, and cleaning liquid supply unit 130 and cleaning liquid supply unit 140. According to such a configuration, the combination of the cleaning unit 120 and the cleaning liquid supply units 130 and 140 improves the deodorizing ability. Such a deodorizing method using a wet deodorizing apparatus can be realized by performing step S10 and step S30 in FIG. 4A and performing the process A in at least one of step S10 and step S30.

[Modification 2]
The wet deodorizing apparatus according to one embodiment includes the above-described inlet 101, the cleaning unit 120, the outlet 103, and the bubble supply unit 150. Here, the cleaning unit 120 cleans the gas to be deodorized with the first cleaning liquid 122 by mixing the gas to be deodorized flowing from the inflow port 101 with the first cleaning liquid 122. According to such a configuration, the contact area is increased when the gas to be deodorized is mixed with the first cleaning liquid 122 due to the air bubbles mixed in the first cleaning liquid 122, so the deodorizing ability is improved. . A deodorizing method using such a wet deodorizing apparatus can be realized by performing step S10, step S20, and step S30 of FIG. 4 (A). It is not necessary to perform process A

[Modification 3]
The wet deodorizing apparatus according to one embodiment includes the above-described inlet 101, the cleaning unit 120, the outlet 103, and the bubble supply unit 150. Here, the bubble supply unit 150 mixes the bubbles of the gas having the function of adjusting the liquid property of the first cleaning liquid 122 or having the deodorizing function into the first cleaning liquid 122. According to such a configuration, as described above, the deodorizing ability can be improved. A deodorizing method using such a wet deodorizing apparatus can be realized by performing step S10, step S20, and step S30 of FIG. 4 (A). It is not essential to perform process A.

  This is the end of the description of the hardware configuration of the deodorizing devices 200A and 200B shown in FIG.

  Next, the hardware configuration of the information processing apparatus 100 illustrated in FIG. 1 will be described with reference to FIG.

  As shown in FIG. 3, the information processing apparatus 100 includes a central processing unit (CPU) 201, a random access memory (RAM) 202, a read only memory (ROM) 203, an input controller 205, and a video controller 206 via a system bus 204. A memory controller 207, a communication I / F controller 208, and the like are connected.

  The CPU 201 centrally controls the devices and controllers connected to the system bus 204.

  In addition, the ROM 203 or the external memory 211 (corresponding to a storage unit) implements a function that is executed by a BIOS (Basic Input / Output System) or an OS (Operating System), which is a control program of the CPU 201, and each server or PC. The various programs etc. which are needed in order to carry out later are stored. Also, information necessary for practicing the present invention is stored. The external memory may be a database.

  A RAM 202 (corresponding to a storage unit) functions as a main memory, a work area, and the like of the CPU 201. The CPU 201 loads programs necessary for execution of processing from the ROM 203 or the external memory 211 to the RAM 202 and executes the loaded programs to realize various operations.

  The input controller 205 also controls input from a keyboard (KB) 209 and a pointing device such as a mouse (not shown).

  The video controller 206 controls display on a display such as the display 210. The display may be a display such as a liquid crystal display. These are used by the administrator as needed.

  The memory controller 207 is an external storage device (hard disk (HD)) for storing a boot program, various applications, font data, user files, editing files, various data, etc., a flexible disk (FD), or PCMCIA (Personal Computer). Memory Card International Association) Control access to an external memory 211 (corresponding to storage means) such as a Compact Flash (registered trademark) memory or the like connected via an adapter to a card slot.

  The communication I / F controller 208 connects to and communicates with external devices via a network, and executes communication control processing in the network. For example, communication using TCP / IP (Transmission Control Protocol / Internet Protocol) is possible. In this embodiment, although it is connected communicably with the production | generation apparatus 400 and the deodorizing apparatus 200 via a network, you may make it connect with a wired cable etc. FIG.

  The CPU 201 can display the image on the display 210 by executing, for example, an outline font rasterization process on a display information area in the RAM 202. Further, the CPU 201 enables user instruction by a mouse cursor (not shown) or the like on the display 210.

  Various programs to be described later for realizing the present invention are stored in the external memory 211, and are executed by the CPU 201 by being loaded into the RAM 202 as necessary.

  This is the end of the description of the hardware configuration of the information processing apparatus 100 shown in FIG. The above configuration is an example, and may be appropriately changed according to the purpose or application.

  Next, an example of a functional configuration of the information processing apparatus 100 will be described using FIG. 4.

  The information processing apparatus 100 includes a time information acquisition unit 301, a determination unit 302, a notification unit 303, and a storage control unit 304.

  The time information acquisition unit 301 is a functional unit that acquires time information of the current time. In the present embodiment, time information is acquired in units of hours and minutes, but may be acquired in units of seconds, or units of time may be acquired.

  The determination unit 302 is a functional unit that determines an appropriate gas cleaning mode based on the time information acquired by the time information acquisition unit 301. The notification unit 303 is a functional unit that instructs the generation device 400 and the deodorizing device 200 of the mode determined by the determination unit 302. The storage control unit 304 is a functional unit that controls to store the content of the instruction to the generating device 400 and the deodorizing device 200, which is an instruction corresponding to time information.

  This is the end of the description of an example of the functional configuration shown in FIG.

  Next, the contents of processing in the present embodiment will be described using the flowchart of FIG.

  In step S501, the CPU 201 of the information processing apparatus 100 determines whether pressing of a start instruction button (not shown) has been received. The pressing of the start instruction button is received from the user, and the user presses the start instruction button, for example, at the timing when the organic substance is introduced into the compost for generating the gas 500 to be cleaned by the cleaning system. By charging the organic matter, decomposition of the organic matter starts and a gas 500 is generated.

  In step S502, the CPU 201 of the information processing apparatus 100 resets the timer based on the timing at which the start instruction button is pressed in step S501, and starts the timer.

  In step S503, the CPU 201 of the information processing apparatus 100 reads the setting value table 600. For example, it is a setting value table 600 shown in FIG. In the setting value table 600, elapsed time 601, assumed ammonia odor concentration 602, hypochlorous acid water concentration 603 (corresponding to parameter), hypochlorous acid water flow 604 (corresponding to parameter), carbon dioxide gas flow 605 ( ) Are stored in association with each other. The elapsed time 601 is an index of the value of the timer. The assumed ammonia odor concentration 602 is the concentration of the ammonia odor assumed corresponding to the elapsed time 601. The hypochlorous acid water concentration 603 is the concentration of hypochlorous acid water for instructing the generation device 400. The hypochlorous acid water flow rate 604 is a flow rate (production amount) of hypochlorous acid water for instructing the generation device 400. The carbon dioxide gas flow rate 605 is a flow rate of carbon dioxide gas for generating hypochlorous acid water with respect to the generation device 400. As shown in FIG. 6, as the elapsed time 601 becomes larger (time advances), the hypochlorous acid water concentration 603, the hypochlorous acid water flow rate 604, and the carbon dioxide gas flow rate 605 are increased, and It is set so as to cause hypochlorous acid water concentration 603, hypochlorous acid water flow rate 604, and carbon dioxide gas flow rate 605. This is because as shown in the assumed ammonia odor concentration 602, as the elapsed time 601 increases, the odor component gradually increases, and after reaching a certain peak, the odor component tends to decrease.

  In step S504, the CPU 201 of the information processing apparatus 100 refers to the value of the timer (corresponding to time information) started in step S502, and identifies the corresponding setting value based on the value of the timer. For example, when the timer value is "4: 36", the assumed ammonia odor concentration 602 is 1500, the hypochlorous acid water concentration 603 is 80, the hypochlorous acid water flow rate 604 is 4, carbon dioxide gas The flow rate 605 can be identified as five.

  In step S505, the CPU 201 of the information processing device 100 notifies the generation device 400 of the setting value specified in step S504.

  In step S506, the CPU 201 of the information processing apparatus 100 determines whether to continue the cleaning process. For example, when the user receives a cleaning instruction end instruction, it can be determined not to continue. If it is determined to continue, the process returns to step S 503. If it is determined not to continue, the process ends.

  In step S511, the generating device 400 receives the setting value notified in step S505.

  In step S512, the generation device 400 generates the cleaning liquid (hypochlorous acid water) with the setting value received in step S511.

  This is the end of the description of the first embodiment.

  In this way, the generation device 400 generates hypochlorous acid water with an appropriate set value according to the elapsed time from the time when the user receives a cleaning start instruction from the user, for example, as in the case of compost, organic matter Even if the odor is gradually intensified from the point of introduction of the odor and the odor is gradually reduced at a certain point, it is appropriate by appropriately setting the cleaning power of the cleaning liquid generated by the cleaning liquid generator 400. Has the effect of being able to reduce the cost associated with the generation of the cleaning solution while maintaining a good cleaning power

Second Embodiment
Next, a second embodiment will be described. In the first embodiment, the parameters for generating the cleaning liquid generated by the generator 400 are changed according to the elapsed time. In the second embodiment, unlike the first embodiment, the cleaning mode of the deodorizing apparatus 200 is controlled according to the elapsed time. The system configuration, the hardware configuration, and the functional configuration are the same as those of the first embodiment, and thus the description thereof is omitted. The different part of the processing from the first embodiment will be described, and the description of the part having the same processing will be omitted.

  The detailed process flow of the second embodiment will be described below using the flowchart of FIG. 7.

  The contents of the process from step S501 to step S502 are the same as those in the first embodiment, and therefore the description thereof is omitted.

  In step S 701, the CPU 201 of the information processing apparatus 100 reads the mode table 800. For example, it is a mode table 800 shown in FIG. In the mode table 800, an elapsed time 601, an assumed ammonia odor concentration 602, and a spray mode 801 are stored in association with each other. The spray mode 801 is a mode that indicates the presence or absence of the spray of the cleaning liquid in the cleaning liquid supply units 130 and 140. When the spray mode 801 is ON, the deodorizing device 200 opens the valve for controlling the spray to spray the cleaning solution. In the present embodiment, although the presence or absence of the spray is controlled, the amount of the spray may be controlled to be increased according to the concentration of the odor acquired by the sensor 110. That is, as long as the deodorizing apparatus 200 can be operated to enhance the deodorizing ability according to the concentration of the odor of the gas 500, another mode may be used. In the present embodiment, the deodorizing mode of the deodorizing apparatus 200 is described as the spraying mode, but the mode does not necessarily have to be the spraying mode. For example, the number of times of cleaning may be increased. You may improve the deodorizing ability.

  As shown in FIG. 8, the elapsed time 601 increases (time advances), and the spray mode 801 is turned on from a predetermined timing, and the spray mode 801 is set to be turned off at a certain timing. . This is because as shown in the assumed ammonia odor concentration 602, as the elapsed time 601 increases, the odor component gradually increases, and after reaching a certain peak, the odor component tends to decrease. By doing this, the cleaning ability of the deodorizing apparatus 200 can be strengthened against the increase of the odor, and the increase of the odor can be coped with.

  In step S702, the CPU 201 of the information processing apparatus 100 specifies the spray mode 801 with reference to the value of the timer started in step S502. For example, when the value of the timer referred to is “9:12”, it can be specified that the corresponding spray mode 801 is ON.

  In step S703, the CPU 201 of the information processing device 100 notifies the deodorizing device 200 of the spray mode 801 specified in step S702.

  In step S704, the generating device 400 receives the spray mode 801 notified in step S703.

  In step S705, the generating device 400 performs cleaning in accordance with the spray mode 801 received in step S711. That is, when the spray mode 801 is ON, the deodorizing apparatus 200 opens the valve for controlling the spray and sprays the cleaning liquid to increase the number of places where the gas 500 is cleaned. Has the effect of being able to When the spray mode 801 is OFF, the deodorizing device 200 closes the valve for controlling the spray to reduce consumption of hypochlorous acid water which is a cleaning solution.

  This is the end of the description of the second embodiment. By appropriately changing the cleaning capacity of the deodorizing apparatus 200 according to the elapsed time from the time when the user receives a cleaning start instruction from the user, the odor becomes stronger gradually starting from the time of inputting the organic matter, for example, like composting. Therefore, even if the odor is gradually reduced at a certain point, there is an effect that it is possible to reduce the cost involved in the generation of the cleaning solution while maintaining an appropriate detergency. That is, according to the second embodiment, the gas which increases / decreases along the time series by changing the cleaning ability of the deodorizing device 200 without changing the cleaning ability such as the concentration of the cleaning liquid generated by the generating device. It has the effect of being able to provide an appropriate cleaning ability according to the concentration of odor contained in 500

Third Embodiment
Next, a third embodiment will be described. In the third embodiment, the mode for cleaning the cleaning system is stored in the form of a plurality of templates, and the user simply selects the template to generate hypochlorous acid water in the generating apparatus 400. A mechanism is provided in which parameters and the mode of cleaning of the deodorizing device 200 can be set easily. The present embodiment is the same as the first embodiment in the system configuration, the hardware configuration, and the functional configuration, and thus the description thereof will be omitted. The different part of the processing from the first embodiment will be described, and the description of the part having the same processing will be omitted.

  The detailed process flow of the third embodiment will be described below with reference to the flowchart of FIG.

  In step S <b> 901, the CPU 201 of the information processing apparatus 100 acquires the mode table 1000. For example, it is a mode table 1000 shown in FIG. In the mode table 1000, a mode 1001, a hypochlorous acid water concentration 1002, a hypochlorous acid water flow rate 1003, and a spray mode 1004 are stored in association with each other. The mode 1001 is an ID uniquely given to each mode. The hypochlorous acid water concentration 1002 is the concentration of hypochlorous acid water for instructing the generation device 400. The hypochlorous acid water flow rate 1003 is a flow rate (generation amount) of hypochlorous acid water for instructing the generation device 400. The spray mode 1004 is a mode indicating whether or not the cleaning solution is sprayed in the cleaning solution supply units 130 and 140. When the spray mode 801 is ON, the deodorizing device 200 opens the valve for controlling the spray to spray the cleaning solution. In the present embodiment, although the presence or absence of the spray is controlled, the amount of the spray may be controlled to be increased according to the concentration of the odor acquired by the sensor 110. That is, as long as the deodorizing apparatus 200 can be operated to enhance the deodorizing ability according to the concentration of the odor of the gas 500, another mode may be used. In the present embodiment, the deodorizing mode of the deodorizing apparatus 200 is described as the spraying mode, but the mode does not necessarily have to be the spraying mode. For example, the number of times of cleaning may be increased. You may improve the deodorizing ability. As shown in FIG. 10, template values are included for items that the user has to set.

In step S 902, the CPU 201 of the information processing device 100 displays the mode selection screen 1100 on the display 210. For example, it is a mode selection screen 1100 shown in FIG. The mode buttons 1101 to 1104 of the mode selection screen 1100 are managed in association with each mode 1001, and, for example, the mode 1 button 1101 and the mode 1001 "1" are managed in association. That is, when the user presses the mode 1 button 1101 of FIG. 11, the mode 1001 managed in association with the mode 1 button 1101 is applied to the cleaning mode of the cleaning system. In step S903, the information processing apparatus The CPU 201 of the CPU 100 determines whether the selection of any of the mode buttons 1101 to 1104 has been received. If it is determined that the selection of the button has been accepted, the process proceeds to nest 904, and if not, the process waits until the selection of the button is accepted.

  In step S904, the setting value corresponding to mode 1001 (parameter: hypochlorous acid water concentration 1002) corresponding to any of the mode buttons 1101 to 1104 determined to be selected in step S903 by the CPU 201 of the information processing apparatus 100. Hypochlorous acid water flow rate 1003 and spray mode 1004) to the corresponding devices. That is, the hypochlorous acid water concentration 1002 and the hypochlorous acid water flow rate 1003 are notified to the generation device 400, and the spray mode 1004 is notified to the deodorizing device 200.

  In step S905, the CPU 201 of the information processing apparatus 100 determines whether the CPU 201 of the information processing apparatus 100 continues the cleaning process. For example, when the user receives a cleaning instruction end instruction, it can be determined not to continue. If it is determined to continue, the process returns to step S 503. If it is determined not to continue, the process ends.

  In step S911, the deodorizing apparatus 200 receives the setting value (spraying mode 1004) notified in step S904.

  In step S912, the deodorizing apparatus 200 controls the spray of the cleaning liquid based on the spray mode 1004 received in step S911.

  In step S921, the generation device 400 receives the set values (hypochlorous acid water concentration 1002, hypochlorous acid water flow rate 1003) notified in step S904.

  In step S922, the generating apparatus 400 executes generation of hypochlorous acid water based on the hypochlorous acid water concentration 1002 and the hypochlorous acid water flow rate 1003 received in step S921.

  As described above, in the third embodiment, the user can appropriately set a plurality of parameters that must be set in the cleaning system simply by pressing the button. Provided is a mechanism capable of reducing such labor and setting parameters relating to the cleaning system in a simple manner. By doing this, even if the user notices that the odor of the gas 500 has increased and wants to change the setting of the cleaning system immediately, it is possible to set an appropriate parameter simply by pressing the button.

  This is the end of the description of the third embodiment.

Fourth Embodiment
Next, a fourth embodiment will be described. The third embodiment is the same as the third embodiment in the system configuration, the hardware configuration, and the functional configuration, and thus the description thereof will be omitted. The parts different from the third embodiment in the processing will be described, and the parts having the same processing will not be described.

  The present embodiment differs from the first embodiment in that appropriate cleaning system parameters are stored for each time zone in units of 24 hours, and one day is set by setting appropriate parameters according to the current time. Appropriate parameters can be applied to the cleaning system even if the concentration of odor changes in a constant cycle.

  The contents of the process will be described in detail below with reference to the flowchart of FIG.

  In step S1201, the CPU 201 of the information processing apparatus 100 acquires the mode table 1300. As shown in FIG. 13, in the mode table 1300, a time zone 1301 and a mode 1001 are stored in association with each other. In mode 1001, as shown in FIG. 10, hypochlorous acid water concentration 603 (corresponding to parameter), hypochlorous acid water flow rate 604 (corresponding to parameter), carbon dioxide gas flow rate corresponding to mode 1001 605 (corresponding to parameters) are stored in association with each other. For example, in compost making, etc., there is a time zone in which the concentration of odor contained in the gas 500 to be cleaned becomes high and a time zone in which it becomes low depending on the time zone. Therefore, by managing the mode 1001 in this way in association with the time zone 1301, parameters can be appropriately applied to the cleaning system according to the change in the odor concentration of the gas 500.

  In step S1202, the CPU 201 of the information processing apparatus 100 acquires the current time.

  In step S1203, the mode corresponding to the current time acquired in step S1202 is specified. For example, when the current time acquired in step S1202 is 10:37, it can be specified that the corresponding mode 1001 is "3". That is, the hypochlorous acid water concentration 603 (corresponding to the parameter), the hypochlorous acid water flow 604 (corresponding to the parameter), and the carbon dioxide gas flow 605 (corresponding to the parameter) corresponding to the mode 1001 of “3” are also included. It can be specified.

  About step S904 to step S905, since the contents of processing are the same as a 3rd embodiment, explanation is omitted.

  About step S911 to step S912, since the contents of processing are the same as that of a 3rd embodiment, explanation is omitted.

  About step S921 to step S922, since the contents of processing are the same as a 3rd embodiment, explanation is omitted.

  This is the end of the description of the fourth embodiment.

  According to the fourth embodiment, the appropriate cleaning system parameters are stored for each time zone in units of 24 hours, and by setting appropriate parameters according to the current time, it is possible to keep constant within a day. Appropriate parameters can be applied to the cleaning system even if the concentration of odor changes with a period of. In particular, even if the concentration of the odor contained in the gas 500 goes up and down during the day, such as the gas 500 discarded from compost, the parameters of the cleaning system can be set efficiently.

  As mentioned above, according to the present invention, the cost concerning deodorization can be held down while providing appropriate cleaning power.

  The deodorizing apparatus 200 may use the wet deodorizing apparatus according to the first embodiment, or may use another deodorizing apparatus. For example, as shown in FIG. 13, the deodorizing device 200 may be provided with only the sensor 110 without providing the sensor 111.

  When the deodorizing devices 200A and 200B according to the first embodiment are used as the first deodorizing device 200, the cleaning solution 410 is supplied as a second cleaning solution, and the outlet 214 from which the cleaning solution 420 flows corresponds to the outlet 180. The inlet 101 corresponds to the inlet 101, the outlet 212 corresponds to the outlet 103, and the outlet 213 corresponds to the outlet 190. In this case, the cleaning liquid 410 supplied from the external generation device 400 can be sprayed to the inside of the first deodorizing device 200 as it is. According to such a configuration, since the gas to be deodorized can be cleaned using a fresh cleaning liquid at the latter stage of the wet deodorizing system, the odor can be reduced better. When the deodorizing devices 200A and 200B according to the first embodiment are used as the second deodorizing device 200, the cleaning solution 420 is supplied as a second cleaning solution, and the outlet 224 from which the cleaning solution 430 flows corresponds to the outlet 180. The inlet 221 corresponds to the inlet 101, the outlet 222 corresponds to the outlet 103, and the outlet 223 corresponds to the outlet 190.

  As mentioned above, some examples of composition of a wet deodorization system concerning this embodiment were introduced. However, the wet deodorizing system according to the present embodiment is not limited to the above configuration. That is, the wet deodorizing system according to the present embodiment can include one or more arbitrary number of cooling devices and one or more arbitrary number of deodorizing devices. For example, in the configuration of FIG. 3, only the first deodorizing device 200 may be used as the deodorizing device, and the cleaning liquid in the first deodorizing device may be supplied to the cooling device to cool the gas to be deodorized. Further, in the configuration of FIG. 3, a further third deodorizing device may be used as the deodorizing device. The configuration of each of the cooling device and the deodorizing device is not particularly limited, and the wet deodorizing device according to the first embodiment can be adopted as one or more of the cooling device and the deodorizing device. Moreover, the wet deodorizing apparatus which concerns on one or more Embodiment 1 which has a mutually different structure is also employable. For example, the first deodorizing device 200 may have the configuration shown in FIG. 2 (B), and the second deodorizing device 200 may have the configuration shown in FIG. 2 (A).

  Further, it is obvious that combinations of the first to fourth embodiments are also within the scope of the present invention.

  The present invention is also applicable to, for example, an embodiment as a system, an apparatus, a method, a program, a storage medium, etc. Specifically, the present invention may be applied to a system composed of a plurality of devices. The present invention may be applied to an apparatus consisting of two devices. Note that the present invention includes one that directly or remotely supplies a program of software that implements the functions of the above-described embodiments to a system or an apparatus. The present invention also includes the case where the information processing apparatus of the system or apparatus achieves the same by reading and executing the supplied program code.

  Therefore, the program code itself installed in the information processing apparatus to realize the functional processing of the present invention by the information processing apparatus also implements the present invention. That is, the present invention also includes a computer program itself for realizing the functional processing of the present invention.

  In that case, as long as it has the function of a program, it may be in the form of an object code, a program executed by an interpreter, script data supplied to an OS, or the like.

  Examples of recording media for supplying the program include a flexible disk, a hard disk, an optical disk, a magneto-optical disk, an MO, a CD-ROM, a CD-R, and a CD-RW. There are also magnetic tapes, non-volatile memory cards, ROMs, DVDs (DVD-ROMs, DVD-Rs) and the like.

  In addition, as a program supply method, a browser on a client computer is used to connect to an Internet home page. Then, the program can be supplied by downloading the computer program of the present invention itself or a compressed file including an automatic installation function from the home page to a recording medium such as a hard disk.

  The present invention can also be realized by dividing the program code constituting the program of the present invention into a plurality of files and downloading each file from different home pages. That is, the present invention also includes a WWW server which causes a plurality of users to download program files for realizing the functional processing of the present invention by the information processing apparatus.

  In addition, the program of the present invention is encrypted, stored in a storage medium such as a CD-ROM, and distributed to users, and the user who has cleared predetermined conditions downloads key information that decrypts encryption from the homepage via the Internet. Let Then, it is possible to execute the program encrypted by using the downloaded key information and install it in the information processing apparatus.

  Also, the information processing apparatus executes the read program to realize the functions of the above-described embodiment. In addition, an OS or the like operating on the information processing apparatus performs a part or all of the actual processing based on the instruction of the program, and the functions of the above-described embodiment may be realized by the processing.

  Furthermore, the program read from the recording medium is written to a memory provided in a function expansion board inserted in the information processing apparatus or a function expansion unit connected to the information processing apparatus. Thereafter, based on the instruction of the program, a CPU or the like provided in the function expansion board or the function expansion unit performs part or all of the actual processing, and the function of the above-described embodiment is also realized by the processing.

  The embodiments described above merely show examples of implementation in practicing the present invention, and the technical scope of the present invention should not be interpreted in a limited manner by these. That is, the present invention can be implemented in various forms without departing from the technical concept or the main features thereof.

100 information processor 201 CPU
202 RAM
203 ROM
204 system bus 205 input controller 206 video controller 207 memory controller 208 communication I / F controller 209 keyboard 210 display 211 external memory

Claims (12)

A cleaning system comprising: a generation device for generating a cleaning solution; and a cleaning device for cleaning a gas with the cleaning solution,
Storage means for storing parameters for generating the cleaning fluid by the cleaning device;
Acquisition means for acquiring time,
Specifying means for specifying a parameter for generating the cleaning solution corresponding to the time;
A control unit configured to control the generation device to generate the cleaning liquid at a parameter for generating the cleaning liquid specified by the specifying unit. The storage means stores the parameters in association with each time zone, and
The time acquired by the acquisition means is the current time,
The cleaning system according to claim 1, wherein the specifying unit specifies the parameter stored in association with a time zone corresponding to the current time. The storage means stores the parameter in association with time information based on the starting point,
The time acquired by the acquisition means is time information based on a starting point, and
The cleaning system according to claim 1, wherein the specifying unit specifies the parameter based on the time information acquired by the acquiring unit. The cleaning system according to any one of claims 1 to 3, wherein the parameter is a parameter related to the flow rate of the cleaning solution. The said parameter is a parameter regarding the density | concentration of the said washing | cleaning liquid. The washing | cleaning system of any one of the Claims 1 thru | or 4 characterized by these. The cleaning system according to any one of claims 1 to 5, wherein the parameter is a parameter related to a flow rate of carbon dioxide gas. The cleaning system according to any one of claims 1 to 6, wherein the cleaning solution is an aqueous solution containing a deodorizing agent. The cleaning system according to any one of claims 1 to 7, wherein the cleaning solution is an aqueous solution containing hypochlorous acid or hypochlorite ion. A cleaning system comprising: a generating device for generating a cleaning liquid; and a cleaning device for cleaning a gas with the cleaning liquid, the control method including a storage unit for storing parameters for generating the cleaning liquid by the cleaning device. And
An acquisition process for acquiring time,
A specifying step of specifying a parameter for generating the cleaning solution corresponding to the time;
A control step of controlling the generation device to generate the cleaning liquid with the parameter for generating the cleaning liquid specified in the specific step. An information processing apparatus capable of communicating with a generating device for generating a cleaning liquid and a cleaning device for cleaning a gas with the cleaning liquid,
Storage means for storing parameters for generating the cleaning fluid by the cleaning device;
Acquisition means for acquiring time,
Specifying means for specifying a parameter for generating the cleaning solution corresponding to the time;
An information processing apparatus comprising: control means for controlling the generation device to generate the cleaning liquid by the parameter for generating the cleaning liquid specified by the specifying means. An information processing apparatus capable of communicating with a cleaning apparatus for generating a cleaning liquid and a cleaning apparatus for cleaning a gas with the cleaning liquid, the information processing comprising storage means for storing parameters for generating the cleaning liquid by the cleaning apparatus A control method of the device,
Acquisition means for acquiring time,
Specifying means for specifying a parameter for generating the cleaning solution corresponding to the time;
A control unit configured to control the generation device to generate the cleaning liquid based on the parameter for generating the cleaning liquid specified by the specifying unit.   A program causing a computer to function as each means of the information processing apparatus according to claim 10.

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