JP2019007059A5 - - Google Patents

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JP2019007059A5
JP2019007059A5 JP2017125159A JP2017125159A JP2019007059A5 JP 2019007059 A5 JP2019007059 A5 JP 2019007059A5 JP 2017125159 A JP2017125159 A JP 2017125159A JP 2017125159 A JP2017125159 A JP 2017125159A JP 2019007059 A5 JP2019007059 A5 JP 2019007059A5
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carbon
base material
hard coating
steel
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JP2017125159A
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JP6883805B2 (en
JP2019007059A (en
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Claims (8)

母材の表面に形成された表面層を備え、
前記表面層は、炭素−炭素結合、炭素−水素結合及び炭素−酸素結合を有する膜であり、前記炭素−炭素結合及び前記炭素−水素結合のうちsp2混成軌道を形成しているもの
のsp3混成軌道を形成しているものに対する比が1.4以上、1.6以下であり、膜中
に含まれる水素原子の量が0.5原子%以上、5原子%以下であり、ラマン分光法によるID/IGが0.45以上、0.75以下である、硬質被膜。
With a surface layer formed on the surface of the base material,
The surface layer is a film having a carbon-carbon bond, a carbon-hydrogen bond, and a carbon-oxygen bond. Of the carbon-carbon bond and the carbon-hydrogen bond, sp 3 that forms sp 2 hybrid orbitals is used. A ratio of those having a hybrid orbital of not less than 1.4 and not more than 1.6, the amount of hydrogen atoms contained in the film being not less than 0.5 atomic% and not more than 5 atomic%, and Raman spectroscopy A hard coating having an ID / IG of 0.45 or more and 0.75 or less.
前記母材と前記表面層との間に設けられた密着層と、
前記密着層と前記表面層との間に設けられ、前記密着層を構成する材料と前記表面層を構成する材料とが混合された混合層とをさらに備え、
前記密着層は、チタンであり、
前記混合層は、厚さが3nm以上である、請求項1に記載の硬質被膜。
An adhesion layer provided between the base material and the surface layer,
Further provided is a mixture layer provided between the adhesion layer and the surface layer, a mixture of a material constituting the adhesion layer and a material constituting the surface layer,
The adhesion layer is titanium,
The hard coating according to claim 1, wherein the mixed layer has a thickness of 3 nm or more.
前記表面層は、膜厚が1.0μm以上である、請求項1又は2に記載の硬質被膜。   The hard coating according to claim 1, wherein the surface layer has a thickness of 1.0 μm or more. 前記表面層は、硬度が35GPa以上、100GPa以下である、請求項1〜3のいずれか1項に記載の硬質被膜。   The hard coating according to any one of claims 1 to 3, wherein the surface layer has a hardness of 35 GPa or more and 100 GPa or less. 相対移動し得る互いに対向した一対の摺動面と、
前記摺動面に介在し得る潤滑剤とを備え、
前記摺動面の少なくとも一方には、請求項1〜4のいずれか1項に記載の硬質被膜が設けられ、
前記潤滑剤は、有機モリブデン化合物を含んでいる、摺動部材。
A pair of sliding surfaces facing each other that can move relative to each other,
A lubricant that can be interposed on the sliding surface,
At least one of the sliding surfaces is provided with the hard coating according to any one of claims 1 to 4,
The sliding member, wherein the lubricant contains an organic molybdenum compound.
前記母材は、銅、アルミニウム、炭素工具鋼、合金工具鋼、高速度工具鋼、ステンレス鋼、機械構造用炭素鋼、機械構造用合金鋼、軸受鋼、鋳鉄、又は超硬合金である、請求項5に記載の摺動部材。 The base material is copper, aluminum, carbon tool steel, alloy tool steel, high-speed tool steel, stainless steel, carbon steel for machine structure, alloy steel for machine structure, bearing steel, cast iron, or cemented carbide. Item 6. The sliding member according to Item 5. 前記母材は、炭素工具鋼、合金工具鋼、機械構造用炭素鋼、機械構造用合金鋼、又は軸受鋼であり、前記硬質被膜形成後のロックウェル硬度がHRC58以上である、又は、ステンレス鋼であり、前記硬質被膜形成後のロックウェル硬度がHRC56以上である、請求項5に記載の摺動部材。   The base material is carbon tool steel, alloy tool steel, carbon steel for machine structure, alloy steel for machine structure, or bearing steel, and the Rockwell hardness after the formation of the hard coating is HRC58 or more, or The sliding member according to claim 5, wherein the Rockwell hardness after the formation of the hard coating is HRC56 or more. 炭素−炭素結合、炭素−水素結合及び炭素−酸素結合を有し、前記炭素−炭素結合及び前記炭素−水素結合のうちsp2混成軌道を形成しているもののsp3混成軌道を形成しているものに対する比が1.4以上 、1.6以下であり、膜中に含まれる水素原子の量が
0.5原子%以上、5原子%以下であり、ラマン分光法によるID/IGが0.45以上、0.75以下である硬質被膜を母材の表面に成膜する工程を備え、
前記成膜する工程は、前記母材を保持するワークホルダと、アーク放電を発生させるカソード及びアノードと、前記カソードの表面に固定されたターゲットから前記ワークホルダに保持された母材まで延びる磁力線を発生させる磁力線発生源とを有する成膜チャンバを用い、
前記ターゲットの主面と直交し、前記母材側に延びる方向をX方向とし、前記ターゲットの動径方向をr方向とし、前記ターゲットの中心をX=0、r=0とする座標系において、前記ターゲットの半径をRとした場合に、X=R、r=Rの位置における磁束密度が0.5mT以上、5mT以下で、r方向の磁力ベクトルのX方向の磁力ベクトルに対する比|X/r|が1.5以下の条件で行う、硬質被膜の製造方法。
It has a carbon-carbon bond, a carbon-hydrogen bond, and a carbon-oxygen bond, and among the carbon-carbon bond and the carbon-hydrogen bond, those that form sp2 hybrid orbitals and those that form sp3 hybrid orbitals. The ratio is 1.4 or more and 1.6 or less, the amount of hydrogen atoms contained in the film is 0.5 to 5 atomic%, and the ID / IG by Raman spectroscopy is 0.45 or more. , A step of forming a hard coating of 0.75 or less on the surface of the base material,
The film forming step includes: a work holder for holding the base material; a cathode and an anode for generating arc discharge; and a magnetic field line extending from a target fixed to the surface of the cathode to the base material held by the work holder. Using a film forming chamber having a magnetic field line source to generate,
In a coordinate system in which a direction orthogonal to the main surface of the target and extending toward the base material is an X direction, a radial direction of the target is an r direction, and a center of the target is X = 0, r = 0, When the radius of the target is R, the magnetic flux density at the position of X = R and r = R is 0.5 mT or more and 5 mT or less, and the ratio of the magnetic vector in the r direction to the magnetic vector in the X direction | X / r | Is a condition of 1.5 or less.
JP2017125159A 2017-06-27 2017-06-27 Hard coating and its manufacturing method Active JP6883805B2 (en)

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JP2019007059A JP2019007059A (en) 2019-01-17
JP2019007059A5 true JP2019007059A5 (en) 2020-03-26
JP6883805B2 JP6883805B2 (en) 2021-06-09

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* Cited by examiner, † Cited by third party
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JP7421775B2 (en) * 2019-12-06 2024-01-25 富士電機株式会社 steam turbine parts
WO2022107467A1 (en) * 2020-11-19 2022-05-27 富士電機株式会社 Steam turbine member

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JP3718664B2 (en) * 2001-06-13 2005-11-24 住友電気工業株式会社 Amorphous carbon coated tool and method for manufacturing the same
JP3719709B2 (en) * 2001-06-13 2005-11-24 住友電気工業株式会社 Amorphous carbon coated tool and method for manufacturing the same
JP4985490B2 (en) * 2008-03-12 2012-07-25 日新電機株式会社 Deposition equipment
JP5342365B2 (en) * 2009-08-05 2013-11-13 株式会社豊田中央研究所 Low friction sliding member
DE102012219930A1 (en) * 2012-10-31 2014-04-30 Federal-Mogul Burscheid Gmbh Sliding element, in particular piston ring, with a coating
JP2014173129A (en) * 2013-03-08 2014-09-22 Ngk Insulators Ltd Deposition method of thin film using plasma

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