JP2018530665A - 発色処理された基板およびそのための発色処理方法 - Google Patents
発色処理された基板およびそのための発色処理方法 Download PDFInfo
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Abstract
Description
0.3≦400/π・W2≦20
横6cm×縦6cm×0.4Tのマグネシウム基材をアルカリ洗浄液に浸漬して脱脂し、脱脂された試片を乾式蒸着機に固定させた。その後、300℃の温度下で原子層堆積法(ALD)を遂行してマグネシウム基材上に酸化アルミニウム(Al2O3)を含む皮膜(平均厚さ:20±2nm)を形成した。その後、連続的にRF/DCスパッタリング法によりアルミニウム(Al)を含む波長変換層(平均厚さ:10±2nm)を形成して発色処理された基板を得た。
横6cm×縦6cm×0.4Tのマグネシウム基材をアルカリ洗浄液に浸漬して脱脂し、脱脂された試片を乾式蒸着機に固定させた。その後、300℃の温度下でプラズマ化学蒸着法(PECVD)を遂行して皮膜を形成し、連続的にE−beamを使って波長変換層が形成された発色処理された基板を得た。この時、皮膜と波長変換層の構成成分および平均厚さは下記の表1のとおりである。
前記実施例1〜4で得た発色処理された基板を乾式蒸着機に固定させ、300℃の温度下でプラズマ化学蒸着法(PECVD)を遂行して波長変換層上に酸化ケイ素(SiO2)を含む透明トップコートが形成された発色試片を製造した。この時、透明トップコートの平均厚さは5±0.1μmであった。
横6cm×縦6cm×0.4Tのマグネシウム基材をアルカリ洗浄液に浸漬して脱脂し、脱脂された試片を乾式蒸着機に固定させた。その後、下記の表2に示したように、300℃の温度下でRF/DCスパッタリング法によりマグネシウム基材上に皮膜を蒸着させて皮膜のみが単独で形成された基板を得た。
横6cm×縦6cm×0.4Tのチタニウム基材をアルカリ洗浄液に浸漬して脱脂し、脱脂された試片を乾式蒸着機に固定させた。その後、300℃の温度下でRF/DCスパッタリング法によりチタニウム基材上に酸化ケイ素(SiO2)を含む皮膜を蒸着させて発色処理されたチタニウム基板を得た。
マグネシウム基材上に形成された皮膜によるマグネシウム基材自体の耐摩耗性の変化を評価するために、下記のような実験を遂行した。
HS=8・L/π・W2
本発明に係る発色処理された基板の具現色相と色相の均一度を評価するために下記のような実験を遂行した。
トップコート形成による本発明に係る発色処理された基板の耐食性、耐久性、耐湿性、耐摩耗性などの信頼性を評価するために、下記のような実験を遂行した。
実施例5および7で得た発色処理された基板をそれぞれ塩水噴霧試験法(SST、Salt Spray Tester)を利用して、35℃、5重量%の塩水を均一に噴射した後、35℃で72時間の間放置して24時間間隔で表面を肉眼で評価したのであり、その結果を図6に示した。
実施例5および7で得た発色処理された基板を95℃の蒸溜水が入っている耐熱湯試験機に30分間浸漬した後、変色の有無を肉眼で確認し、クロスカットテープテストを通じてマグネシウム基材の表面で波長変換層とトップコートが剥離する程度を測定した。この時、クロスカットテープテストは、発色処理された基板の表面にカッターを利用して1mm間隔の横6線と縦6線とが互いに交差するようにカッティングした。その後、横線と縦線の交差点にテープを堅固に付着し、速やかに剥がす時の試片の全面積に対する薄膜の剥離面積を確認する方式で遂行したのであり、その結果は図7に示した。
実施例5で得た発色処理された基板を50℃、95%条件の恒温恒湿試験機に投入して72時間の間放置した後、表面状態を肉眼で評価したのであり、その結果を図8に示した。
ボールオンプレート(ball on plate)の形態の摩擦係数測定機(tribometer)を利用して実施例3および8で得た発色処理された基板の表面にそれぞれスクラッチ(scratch)を発生させた後、発生したスクラッチ(scratch)の平均深さ[D]とスクラッチによる母材であるマグネシウム基材の露出の有無を確認した。この時、前記スクラッチ(scratch)は、マグネシウム基板の表面をボール(ball、直径:6mm)を利用して20±2℃で5N、50Nまたは70Nの荷重、3cm/sの速度で遂行されたのであり、同一の位置を1回引っ掻くのを原則とした。このような一連の過程を3個のマグネシウム基板に3回繰り返し遂行して平均値を導き出したのであり、測定された結果は図9〜図11に示した。
Claims (15)
- マグネシウム基材;
前記基材上に設けられ、金属酸化物を含む皮膜;および
前記皮膜上に設けられた波長変換層を含む、発色処理された基板。 - 金属酸化物は、酸化ケイ素、酸化チタン、および酸化アルミニウムからなる群から選択される1種であることを特徴とする、請求項1に記載の発色処理された基板。
- 波長変換層は、アルミニウム(Al)、クロム(Cr)、チタニウム(Ti)、金(Au)、モリブデン(Mo)、銀(Ag)、マンガン(Mn)、ジルコニウム(Zr)、パラジウム(Pd)、白金(Pt)、コバルト(Co)、カドミウム(Cd)、ニッケル(Ni)および銅(Cu)からなる群から選択される1種以上の金属またはそのイオンを含む、請求項1に記載の発色処理された基板。
- 波長変換層の平均厚さは、5nm〜200nmである、請求項1に記載の発色処理された基板。
- 皮膜の平均厚さは、1nm〜6μmである、請求項1に記載の発色処理された基板。
- 波長変換層上に存在する任意の領域(横1cmおよび縦1cm)に含まれる任意の3点は、
各点間の平均色座標偏差(ΔL*、Δa*、Δb*)がΔL*<0.5、Δa*<0.6、およびΔb*<0.6のうち1つ以上の条件を満足する、請求項1に記載の発色処理された基板。 - 波長変換層上に形成されたトップコートをさらに含む、請求項1に記載の発色処理された基板。
- トップコートは、酸化ケイ素、酸化チタン、および酸化アルミニウムからなる群から選択される1種以上の金属酸化物を含む、請求項7に記載の発色処理された基板。
- 皮膜が形成されたマグネシウム基材の表面に対する耐摩耗性の評価時、
下記の一般式1の条件を満足する、請求項1に記載の発色処理された基板:
[一般式1]
0.3≦400/π・W2≦20
前記一般式1で、
Wは平均直径6mmのボールを利用して50Nの荷重、3cm/sの速度で皮膜の表面を1回引っ掻く場合、表面に発生するスクラッチの平均幅を示し、単位はGPaである。 - マグネシウム基材上に皮膜を形成する段階;および
前記皮膜上に波長変換層を形成する段階を含み、
前記皮膜は金属酸化物を含む、基板の発色処理方法。 - 皮膜および波長変換層を形成する段階は、化学蒸着(CVD)、物理蒸着(PVD)または原子層堆積(ALD)により遂行される、請求項10に記載の基板の発色処理方法。
- 化学蒸着は、プラズマ化学蒸着(PECVD)を含む、請求項11に記載の基板の発色処理方法。
- プラズマ化学蒸着温度は、100〜500℃であることを特徴とする、請求項12に記載の基板の発色処理方法。
- プラズマ化学蒸着速度は、0.5〜1500nm/分であることを特徴とする、請求項12に記載の基板の発色処理方法。
- 皮膜を形成する段階の前に、
マグネシウム基材の表面を前処理する段階;および
波長変換層を形成する段階の後に、波長変換層上にトップコートを形成する段階のうちいずれか1つ以上の段階をさらに含む、請求項10に記載の基板の発色処理方法。
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KR10-2015-0132795 | 2015-09-21 | ||
KR1020150132795A KR101674316B1 (ko) | 2015-09-21 | 2015-09-21 | 발색 처리된 기판 및 이를 위한 발색 처리방법 |
KR10-2015-0173836 | 2015-12-08 | ||
KR1020150173836A KR101772772B1 (ko) | 2015-12-08 | 2015-12-08 | 표면 처리된 기판 및 이의 제조방법 |
PCT/KR2015/014157 WO2017051993A1 (ko) | 2015-09-21 | 2015-12-23 | 발색 처리된 기판 및 이를 위한 발색 처리방법 |
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JP2002363772A (ja) * | 2001-06-11 | 2002-12-18 | Ykk Corp | 干渉色発色金属体及びその製造方法 |
JP2004279382A (ja) * | 2003-03-19 | 2004-10-07 | Citizen Watch Co Ltd | 装飾軽量指針およびその製造方法 |
JP2010265522A (ja) * | 2009-05-15 | 2010-11-25 | Kansai Paint Co Ltd | 発色金属の保護方法 |
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JP2004279382A (ja) * | 2003-03-19 | 2004-10-07 | Citizen Watch Co Ltd | 装飾軽量指針およびその製造方法 |
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