JP2018202281A - Device for treating bathtub water, and bathtub apparatus - Google Patents

Abstract

To provide a device for treating bathtub water capable of rapidly sterilizing the bathtub water by efficiently generating plasma to shorten a time of treating the bathtub water, and a bathtub apparatus.SOLUTION: A gas phase G is generated in the vicinity of a revolution center of a revolving flow F1 of a liquid L1 by revolving the introduced liquid L1. The device includes: a treatment tank 12 capable of attaching a discharge part 17 to a bathtub 90; a pump 50 capable of connecting to the bathtub, and for introducing a bathtub water 92 held in the bathtub from an introduction part into the treatment tank; a first electrode 30 at least a part of which is disposed in the treatment tank, and contacts the bathtub water in the treatment tank; a second electrode 31 disposed so as to contact the bathtub water in the treatment tank; and an electric power source 60 for having the gas phase generate plasma by impressing a voltage between the first electrode and the second electrode. Plasma is generated to the gas phase to sterilize the liquid, and to produce a modified constituent, the produced modified constituent is solved in the bathtub water and dispersed into the bathtub water to produce a treatment liquid L2, and the produced treatment water is supplied into the bathtub from the discharge part.SELECTED DRAWING: Figure 6D

Description

  The present invention relates to a bathtub water treatment apparatus and a bathtub apparatus for sterilizing hot water (tub water) in a bathtub with a liquid treatment apparatus for electrochemically treating a liquid.

  FIG. 15 shows an example of a conventional liquid processing apparatus. A first electrode 801 and a second electrode 802 are disposed in a liquid 803 (for example, water), a high voltage pulse is applied between the electrodes 801 and 802 from a pulse power source 804 to vaporize the liquid 803, and a plasma 805 And a liquid processing apparatus that generates a processing liquid that sterilizes with a component having an oxidizing power such as hydroxyl radical (OH radical) or hydrogen peroxide by performing plasma processing on the liquid 803, for example. . In particular, it is known that OH radicals have a high oxidizing power, and it is said that, for example, by mixing a treatment solution containing these components, there is a high bactericidal action against bacteria. In addition, it is known that the plasma 805 is covered with the liquid 803 by generating the plasma 805 in the liquid 803, and the liquid-derived component is easily generated. For example, it is known that OH radicals or hydrogen peroxide is easily generated by generating plasma 805 in water.

  However, in the case of the above-described conventional liquid processing apparatus, not only a high applied voltage is required to vaporize the liquid 803, but also the generation efficiency of the plasma 805 is low, and it takes a long time to modify the liquid 803. was there.

  Therefore, a liquid processing apparatus is known in which a gas introduced from the outside is interposed between both electrodes in order to improve the plasma generation efficiency while lowering the applied voltage (see Patent Document 1). In the liquid processing apparatus described in Patent Document 1 (FIG. 16), a gas 904 (for example, oxygen) is interposed between an anode electrode 901 and a cathode electrode 902 together with a liquid to be processed 903, and then both electrodes 901 and 902 are interposed. A pulse voltage is applied between them. By applying the pulse voltage, plasma is generated in the gas 904, and the liquid 803 is sterilized by plasma treatment. According to the liquid processing apparatus described in Patent Document 1, the applied voltage can be reduced as compared with the case where no gas is interposed, and the liquid 903 to be processed can be sterilized by generating plasma efficiently.

  Application to a bathtub apparatus having a function of sterilizing bathtub water is conceivable by introducing the treatment liquid treated by such a liquid treatment apparatus into bathtub water in the bathtub.

Japanese Patent No. 40412224

  However, when the liquid processing apparatus described in Patent Document 1 is applied to a bathtub apparatus, there is a problem that plasma generation efficiency is low and it takes a long time to process the bathtub water.

  In view of such a point, the present invention has an object to provide a bathtub water treatment device and a bathtub device that can efficiently generate plasma to quickly sterilize bathtub water and shorten the treatment time of bathtub water. To do.

In order to achieve the above object, a bathtub water treatment apparatus according to one aspect of the present invention includes:
By rotating the liquid introduced from the introduction part around the central axis, a gas phase is generated in the vicinity of the rotation center of the swirling flow of the liquid, and the liquid introduced from the introduction part is exchanged with the introduction part. A treatment tank that swirls between and generates the swirl flow and then discharges it as a processing liquid, and the discharge section can be attached to a bathtub;
A pump that can be connected to the bathtub and is held in the bathtub as the liquid from the introduction unit into the treatment tank;
A first electrode that is at least partially disposed in the processing tank on one end side along the central axis of the processing tank and contacts the liquid in the processing tank;
A second electrode disposed on the other end side of the processing tank along the central axis so as to contact the liquid in the processing tank;
A voltage is applied between the first electrode and the second electrode to generate plasma in the gas phase to sterilize the liquid to form the treatment liquid and generate a modified component in the treatment liquid. With power supply,
The liquid introduced from the introduction part is swirled between the introduction part and the discharge part to generate the swirl flow, and the plasma is generated in the gas phase of the swirl flow to sterilize the liquid. The reforming component is generated and the generated reforming component is dissolved in the treatment liquid and dispersed in the treatment liquid, and the treatment liquid is supplied into the bathtub from the discharge unit, and the bathtub The bathtub water is sterilized, and the tub water discharged after sterilization is introduced into the treatment tank as at least part of the liquid by the pump.

In order to achieve the above object, a bathtub apparatus according to another aspect of the present invention includes the bathtub water treatment apparatus of the above aspect,
The bathtub for supplying the treatment liquid generated in the bathtub water treatment apparatus into the bathtub water;
Is provided.

  According to the bathtub water treatment apparatus and the bathtub apparatus according to the aspect of the present invention, the liquid bathtub water introduced from the bathtub through the introduction unit is swung between the introduction unit and the discharge unit, and the swirl is performed. Generate a flow. Then, the plasma is generated in the gas phase generated by the swirling flow of the bath water to sterilize the liquid, generate a reforming component having a bactericidal action, and generate a treatment liquid having the generated reforming component. To do. And since the said process liquid produced | generated is supplied to the bathtub water in the said bathtub from the said discharge part, and the bathtub water in the said bathtub is sterilized, bathtub water can be disinfected efficiently. Here, the bathtub water is vaporized in a swirling flow, and a pulse voltage is applied to the generated gas phase to generate plasma. Since there is no need to vaporize bathtub water by applying voltage, plasma can be generated with a small amount of power, and sterilization of bathtub water can be performed efficiently and quickly. That is, plasma can be generated efficiently and bath water can be sterilized quickly, and the treatment time of bath water can be shortened.

Side surface sectional drawing which shows the structure of the liquid processing apparatus which is the bathtub water treatment apparatus concerning Embodiment 1 of this invention. Side sectional view of the main body of the liquid processing apparatus Sectional view along line 3-3 in FIG. Side surface sectional view showing a state where a swirl flow is generated inside the processing tank and no voltage is applied Sectional view taken along line 5-5 in FIG. Side surface sectional view showing a state where a swirl flow is generated inside the treatment tank and a voltage is applied FIG. 6A is a partially enlarged view showing a state where plasma is generated in the gas phase. Side surface sectional view of the state in which the bathtub water treatment device is disposed in the bathtub and the bathtub water is sterilized Side sectional view of the entire bathtub water circulation bathtub device Side surface sectional drawing which shows the structure of the bathtub water treatment apparatus concerning Embodiment 2 of this invention. Side surface sectional drawing which shows the structure of the bathtub water treatment apparatus concerning Embodiment 3 of this invention. Side sectional view showing a modified example of the apparatus main body Side sectional view showing a modified example of the apparatus main body Side sectional view showing a modified example of the apparatus main body Side surface sectional view which shows the modification of an apparatus main body different from FIG. 9A Side sectional view showing a modified example of the apparatus main body Side sectional view showing a modified example of the apparatus main body Side sectional view showing a modified example of the apparatus main body Side sectional view showing a modified example of the apparatus main body Side sectional view showing a modified example of the apparatus main body Side surface sectional view in which a copper material is arranged in a part of a bathtub in a modification of the apparatus main body Schematic configuration diagram of a conventional liquid processing apparatus Schematic configuration diagram of a conventional liquid processing apparatus provided with a gas introduction device

[Embodiment 1]
Hereinafter, with reference to drawings, the liquid treatment apparatus 100 which is the bathtub water treatment apparatus which concerns on Embodiment 1 of this invention is demonstrated in detail. In the drawings, the same or corresponding parts are denoted by the same reference numerals and description thereof will not be repeated. In addition, in order to make the explanation easy to understand, in the drawings referred to below, the configuration is shown in a simplified or schematic manner, or some components are omitted. Further, the dimensional ratio between the constituent members shown in each drawing does not necessarily indicate an actual dimensional ratio.

[overall structure]
First, the overall configuration of the liquid processing apparatus 100 according to the first embodiment will be described. FIG. 1 is a side sectional view showing a configuration of a liquid processing apparatus 100 according to Embodiment 1 of the present invention. In the following drawings, the arrow F indicates the forward direction of the liquid processing apparatus 100, and the arrow B indicates the backward direction. Arrow U indicates the upward direction, and arrow D indicates the downward direction. The arrow R indicates the right direction when viewed from the rear direction, and the arrow L indicates the left direction when viewed from the rear direction.

  The liquid processing apparatus 100 discharges in the liquid to sterilize the liquid and generate a modified component, and generates the processing liquid L2 by dispersing the generated modified component in the liquid. In the first embodiment, the circulating water L1 is sterilized as an example of the liquid, and the processing liquid L2 containing a modifying component such as OH radical or hydrogen peroxide for use in the sterilizing process in the bathtub 90 is generated. The case will be described. Here, the circulating water L1 refers to water or hot water (tub water) 92 held in the bathtub 90, including tap water supplied toward the bathtub 90 as necessary, through the circulation pipe 81 and the pipe 51. The liquid supplied to the processing tank 12 by the pump 50 is meant.

  The liquid processing apparatus 100 includes at least a processing tank 12, a first electrode 30, a second electrode 31, and a power source 60. More specifically, the liquid processing apparatus 100 includes an apparatus main body 10, a liquid supply unit 50, a bathtub 90, and a power supply 60. The apparatus main body 10 includes a processing tank 12, an introduction unit 15, a discharge unit 17, a first electrode 30, and a second electrode 31.

  The treatment tank 12 is a part that circulates the circulating water L1 introduced into the inside by plasma and sterilizes the circulating water L1 and generates a reforming component (for example, OH radical or hydrogen peroxide) to generate the treatment liquid L2. is there. The material of the treatment tank 12 may be an insulator or a conductor. In the case of a conductor, an insulator needs to be interposed between the electrodes 30 and 31. When the reforming component is discharged into the bathtub 90, the reforming component is dispersed in the circulating water L1, and the treatment liquid L2 is generated.

  The front sectional shape of the inner wall of the treatment tank 12 is circular (see FIG. 3). In other words, the processing tank 12 has a cylindrical processing chamber having a circular cross-sectional shape in which one end side along the turning axis X1 of the circulating water L1 of the processing tank 12 is closed. The introduction unit 15 is disposed at one end of the treatment tank 12 and introduces the circulating water L1 into the treatment tank 12 from a tangential direction of a circular cross-sectional shape orthogonal to the central axis X1 of the treatment tank 12. The introduction unit 15 communicates with the liquid supply unit 50 via the pipe 51. The discharge part 17 is arrange | positioned at the other end of the processing tank 12, and discharges the circulating water L1 introduced into the processing tank 12 and the reforming component produced | generated by the processing tank 12 from the processing tank 12 to the bathtub 90. In the first embodiment, the discharge unit 17 is connected to the intake port 91 of the bathtub 90.

  The first electrode 30 is disposed inside one end of the processing tank 12. The first electrode 30 is disposed so as to protrude along the longitudinal direction from the center of the inner wall at one end of the processing tank 12 into the processing tank 12.

  The second electrode 31 is disposed outside the wall at the other end of the processing tank 12 and is disposed in the vicinity of the discharge unit 17.

  The first electrode 30 is connected to a power source 60, and the second electrode 31 is grounded. A high voltage pulse voltage is applied to the first electrode 30 and the second electrode 31 by the power supply 60. The material of the first electrode 30 is, for example, tungsten.

  The liquid supply part 50 is a pump which supplies the circulating water L1 in the process tank 12, as an example. The liquid supply unit 50 is connected to the pipe 51. One end of the pipe 51 is connected to an introduction portion 15 as an inner opening disposed in the vicinity of the inner wall of one end of the treatment tank 12, and the other end of the pipe 51 is a liquid supply source (not shown) (for example, a water tank 80 or a water supply). Water) or the bath water 92 containing the treatment liquid L2 of the bath 90 can be circulated (see the circulation pipe 81 shown by the one-dot chain line in FIG. 1).

  The power source 60 applies a high voltage pulse voltage between the first electrode 30 and the second electrode 31. The power supply 60 can apply a so-called bipolar pulse voltage that alternately applies a positive pulse voltage and a negative pulse voltage.

  The bath 90 is a tank that shears the reforming component discharged from the liquid processing apparatus 100, generates microbubbles or nanobubbles containing the reforming component, and diffuses them into water. Specifically, the bathtub 90 has a cross-sectional area larger than the opening cross-sectional area of the discharge portion 17 of the treatment tank 12 inside, and shears the reforming component discharged from the discharge portion 17 into the bathtub 90 by the bathtub 90. Then, microbubbles containing the modifying component, or microbubbles and nanobubbles are generated in the bath 90 and diffused in the water. Therefore, the bathtub 90 functions as a microbubble generation tank. As the bath 90, at least an inner diameter or one side that is twice or more the inner diameter of the opening of the discharge portion 17 of the treatment tank 12 can be secured, and the treatment liquid L <b> 2 that can surely sterilize can be generated in the bath 90.

[Device main unit]
Next, the apparatus main body 10 will be described in detail. FIG. 2 is a side sectional view of the apparatus main body 10.

  The processing tank 12 has a first inner wall 21, a second inner wall 22, and a third inner wall 23. The first inner wall 21 is a cylindrical wall portion. The second inner wall 22 is provided at the left end portion of the first inner wall 21 in FIG. The third inner wall 23 is provided at the right end of the first inner wall 21 in FIG. The second inner wall 22 and the third inner wall 23 are substantially circular in a side view. The first inner wall 21, the second inner wall 22, and the third inner wall 23 form a substantially cylindrical accommodation space 83 inside the processing tank 12. The central axis of the first inner wall 21, that is, the virtual central axis of the substantially cylindrical accommodation space 83 configured inside the processing tank 12 is defined as an axis X <b> 1.

  The second inner wall 22 is provided with a cylindrical electrode support cylinder 24 projecting into the accommodation space 83 at the center. The electrode support cylinder 24 is cylindrical and extends rightward. The electrode support cylinder 24 is arranged such that its central axis coincides with the central axis X <b> 1 of the first inner wall 21. The first electrode 30 is supported inside the electrode support cylinder 24 via an insulator 53. The first electrode 30 has a rod shape, and the insulator 53 is disposed around the first electrode 30. For this reason, the first electrode 30 is arranged such that the longitudinal axis thereof coincides with the central axis X <b> 1 of the first inner wall 21. The inner end surface of the right end portion 301 of the first electrode 30, the inner end surface of the insulator 53, and the inner end surface 241 of the electrode support cylinder 24 are configured to be disposed in substantially the same plane.

  The introduction portion 15 penetrates the apparatus main body 10, and one open end 151 is formed on the first inner wall 21. The introduction portion 15 is disposed at a position adjacent to the second inner wall 22 in a side view. FIG. 3 is a cross-sectional view taken along line 3-3 in FIG. The introduction part 15 is disposed on the wall surface of the first inner wall 21.

  The discharge part 17 penetrates the central part of the third inner wall 23. The discharge portion 17 is formed such that its central axis coincides with the central axis X1 of the first inner wall 21.

  The 2nd electrode 31 is a plate-shaped metal member, and the opening part 311 is formed in the center part. The opening 311 is circular and is formed so that the center thereof coincides with the central axis X <b> 1 of the first inner wall 21.

[Operation]
Next, the operation of the liquid processing apparatus 100 will be described. In the following, for convenience of explanation, a state in which the gas phase G is generated inside the processing tank 12 (FIGS. 4 and 5), and a state in which a pulse voltage is applied to the generated gas phase G to generate plasma P (FIG. 5). 6A and 6B) will be described separately. FIG. 4 is a side cross-sectional view showing a state in which a swirling flow F1 is generated inside the processing tank 12 and no pulse voltage is applied.

  First, as shown in FIG. 4, the tap water is sucked from the bathtub 90 as the circulating water L1 through the pump 50 or the like from the tap water as the circulating water L1, and the circulating water L1 is supplied from the introduction unit 15 to the treatment tank 12. When introduced at a predetermined pressure, the circulating water L1 moves along the first inner wall 21 from the introduction part 15 toward the right in FIG. 4 while generating a swirling flow F1. The swirl flow F <b> 1 that moves to the right in FIG. 4 while swiveling moves toward the discharge unit 17.

  Due to the swirling flow F1, the pressure in the vicinity of the central axis X1 of the first inner wall 21 is reduced to the saturated water vapor pressure or less, and water vapor in which a part of the circulating water L1 is vaporized is generated. It is generated near the central axis X1. The gas phase G is generated near the turning center, specifically, from the right end 301 of the first electrode 30 to the vicinity of the opening 311 of the second electrode 31 along the central axis X1 of the first inner wall 21. The gas phase G is swirled in the same direction as the swirling flow F1 by the swirling flow F1 in contact therewith. The swirling vapor phase G receives the resistance of the water in the bathtub 90 in the vicinity of the discharge unit 17, is sheared into microbubbles or nanobubbles, and is diffused into the bathtub 90.

  5 is a cross-sectional view taken along line 5-5 of FIG. As described with reference to FIG. 4, when the circulating water L1 is introduced into the treatment tank 12 from the introduction unit 15 at a predetermined pressure, the circulating water L1 flows along the first inner wall 21 in the clockwise swirling flow F1 in FIG. Is generated. By circulating the circulating water L1 inside the treatment tank 12, the pressure in the vicinity of the center of the swirling flow F1, that is, the pressure in the vicinity of the central axis X1 of the first inner wall 21, drops below the saturated water vapor pressure, and the central axis of the first inner wall 21 A vapor phase G is generated by generating water vapor in which a part of the circulating water L1 is vaporized in the vicinity of X1.

  6A and 6B are side cross-sectional views showing a state in which a swirling flow F1 is generated inside the processing tank 12 and a pulse voltage is applied. As shown in FIG. 6A, in a state where the vapor phase G in which the circulating water L1 is vaporized is generated from the vicinity of the first electrode 30 to the vicinity of the second electrode 31, the power source 60 and the second electrode 30 A high voltage pulse voltage is applied between the electrodes 31. FIG. 6B is an enlarged view showing a state where plasma P is generated in the gas phase G. FIG. When a high pulse voltage is applied to the first electrode 30 and the second electrode 31, plasma P is generated in the gas phase G, the circulating water L1 is sterilized, and water-derived reforming components are derived. Generates radicals (OH radicals, etc.) or compounds (hydrogen peroxide, etc.) or ions. The gas phase G containing the reforming component is swirled in the same direction as the swirling flow F1 by the swirling flow F1 in the vicinity. When the gas phase G containing the reforming component is swirled, a part of the reforming component is dissolved to the swirling flow F1, whereby the reforming component is dispersed in the circulating water L1. In addition, the gas phase G containing the reforming component in the vicinity of the discharge unit 17 is sheared by receiving the resistance of the circulating water L1 in the bathtub 90, and generates a bubble BA containing the reforming component. In addition, the treatment liquid L2 is retained in the bathtub 90, thereby preventing air from entering the gas phase G, which is a negative pressure. In this way, the treatment liquid L2 dispersed in the circulating water L1 is retained in the bathtub 90 in a bubble state or a state in which the reforming component generated by the plasma P is dissolved in the circulating water L1. Sterilize.

  According to the first embodiment described above, the circulating water L1 is vaporized in the swirling flow F1, a pulse voltage is applied to the generated gas phase G to generate plasma P, and the circulating water L1 that is a liquid is sterilized. In addition, a treatment liquid L2 containing a modifying component (a radical or a compound derived from the liquid) is generated from the liquid. Therefore, the gas phase G has a negative pressure than the gas phase formed by the gas vaporized by Joule heat or the gas introduced from the outside, and the plasma P can be generated with a small voltage (that is, less electric power). Thus, the circulating water L1 can be sterilized efficiently. Furthermore, since water is not vaporized by Joule heat, the input energy is reduced. In addition, since no gas is introduced from the outside, a gas supply device becomes unnecessary, and the liquid processing apparatus 100 can be easily downsized.

  Further, the gas phase G formed by the gas vaporized by Joule heat or the gas introduced from the outside is difficult to be held in a certain shape or a certain position by buoyancy. However, in the gas phase G of the first embodiment, a force is applied in the direction in which the surrounding swirl flow F1 gathers around the central axis X1 of the swirl flow F1, so that a constant gas phase is present in the vicinity of the right end portion 301 of the first electrode 30. G can be generated. Therefore, since the time change of the amount of gas generated between the first electrode 30 and the second electrode 31 is small and the electric power necessary for the plasma P is difficult to change, the plasma P can be generated stably, and the bath water The circulating water L1 containing 92 can be sterilized efficiently and promptly, the processing time of the liquid can be shortened, and the sterilizing ability is enhanced.

  The volume of the plasma P is equal to or less than the volume of the gas phase in the vicinity of the cathode electrode, but the shape of the gas phase G formed by the gas vaporized by Joule heat or the gas introduced from the outside is a bubble shape. When the volume exceeds a certain level, it splits, making it difficult to generate plasma P having a certain volume or more. However, since the gas phase G of Embodiment 1 can easily increase the volume in the direction of the central axis X1 if the swirl speed of the swirl flow F1 can be secured, it is easy to increase the volume of the plasma P. Therefore, it is easy to increase the amount of sterilization treatment of the circulating water L1 including the bathtub water 92 and the generation amount of the reforming component, and the liquid can be sterilized quickly.

  Further, since the volume expands when the liquid is vaporized, cavitation is known in which a shock wave is generated and a surrounding object is destroyed. In the first embodiment, the destruction due to cavitation is strongest in the discharge section 17 in which the inner diameter of the treatment tank 12 is the smallest and the swirling speed of the swirling flow F1 is the fastest. Therefore, the right end portion 301 of the first electrode 30 in the gas phase G is away from the location where the destruction of cavitation is strongest, so that the influence of the cavitation on the first electrode 30 is reduced and the plasma P is stably generated. And can be sterilized stably.

  In addition, since the circulating water L1 is processed without introducing air from the outside, it suppresses the generation of harmful nitrous acid generated in the plasma using a gas phase in which a gas containing a nitrogen component such as air is introduced. Can do. Furthermore, it is possible to generate the treatment liquid L2 containing bubbles BA enclosing OH radicals or hydrogen peroxide.

  The liquid treatment apparatus 100 functions as a bathtub water treatment apparatus. In the bathtub apparatus 101 having a configuration in which the liquid treatment apparatus 100 is disposed adjacent to the bathtub 90, a state in which the bathtub water 92 is sterilized is illustrated in FIG. The entire bathtub apparatus 101 is shown in FIG. 6D.

  In FIG. 6D, the pipe 51 is connected to the bathtub 90 to form a circulation pipe 81, and the bathtub water 92 in the bathtub 90 is supplied as circulating water L <b> 1 from the introduction unit 15 to the treatment tank 12 through the pump 50. Then, the processing liquid L2 discharged from the processing tank 12 through the discharge unit 17 is introduced into the bathtub 90, and is circulated. The following second and third embodiments have the same configuration.

  The operation as the bathtub apparatus 101 provided with the liquid processing apparatus 100 will be described below.

  First, as the circulating water L <b> 1 with the pump 50, the bathtub water 92 in the bathtub 90 is introduced from the bathtub 90 into the treatment tank 12 of the liquid treatment apparatus 100 through the introduction part 15 of the treatment tank 12.

  Next, a swirl flow F1 of the circulating water L1 is generated in the treatment tank 12 to generate a gas phase G on the central axis X1.

  Next, the power supply 60 is turned on, a pulse voltage is applied to the gas phase G, plasma P is generated in the gas phase G, and the circulating water L1 is sterilized.

  Next, active species such as OH radicals are generated in the gas phase G by the plasma P, and bubbles BA containing active species such as OH radicals are generated in the treatment tank 12. The bubble BA is contained in the processing liquid L2.

  Next, the bubble BA containing active species such as OH radicals together with the treatment liquid L2 is introduced from the treatment tank 12 through the discharge unit 17 into the bathtub water 92 in the bathtub 90, and the bathtub water 92 in the bathtub 90 is sterilized. To do.

  According to the first embodiment, the liquid circulating water L1 introduced from the bathtub 90 via the introducing portion 15 is swirled between the introducing portion 15 and the discharging portion 17 to generate the swirling flow F1, and the circulating water. Plasma P is generated in the gas phase G generated by the swirling flow F1 of L1 to sterilize the circulating water L1 and generate a reforming component, and the generated reforming component dissolves in the circulating water L1 and enters the circulating water L1. Disperse to produce the treatment liquid L2. And since the produced | generated process liquid L2 is supplied to the bathtub water 92 in the bathtub 90 from the discharge part 17, and the bathtub water 92 in the bathtub 90 is sterilized, the bathtub water 92 can be disinfected efficiently. Here, the circulating water L1, that is, the bath water is vaporized in the swirling flow, and a pulse voltage is applied to the generated gas phase G to generate the plasma P to sterilize the circulating water L1. A treatment liquid L2 having components can be generated. Since there is no need to vaporize the circulating water L1 by applying a voltage, the plasma P can be generated with a small amount of power, and the bathtub water 92 can be sterilized efficiently and quickly. That is, the plasma P can be generated efficiently and the bathtub water 92 can be sterilized quickly, and the treatment time of the bathtub water 92 can be shortened.

[Embodiment 2]
The bathtub apparatus 103 of Embodiment 2 is further provided with a water level sensor 95 and a first control unit 96 in the bathtub apparatus 101 of Embodiment 1 as shown in FIG. 6E.

  As the water level sensor 95, a publicly known water level sensor can be used. The water level sensor 95 is arranged above the bathtub 90 or above the bathtub 90 and detects the water surface 92a of the bathtub water 92 in the bathtub 90, and the detected value is set to the first control unit. 96.

  The first control unit 96 controls the output of the power supply 60 according to the input detection value of the water level sensor 95, and also controls the output of the pump 50 as necessary. The 1st control part 96 determines whether the water surface 92a of the bathtub water 92 in the bathtub 90 detected by the water level sensor 95 exists above the height of the known discharge part 17 memorize | stored previously. When the water surface 92a of the bathtub water 92 in the bathtub 90 is less than or equal to the height of the discharge portion 17, the circulating water L1 is insufficient in the treatment tank 12 to cause empty discharge, and the liquid processing apparatus 100 performs a desired operation. There is a possibility that the amount of water cannot. In addition, it is necessary to prevent loads on the electrodes 30 and 31 and the power source 60 due to the air discharge. For these reasons, the first control unit 96 applies a voltage from the power source 60 only when the water level 92a of the bath water 92 in the bath 90 detected by the water level sensor 95 is above the height of the discharge unit 17. In this way, the plasma P is generated in the gas phase G to sterilize the circulating water L1 and generate the processing liquid L2, so that the liquid processing apparatus 100 can reliably perform a desired operation and the electrode by empty discharge. 30 and 31 and the load on the power source 60 can be prevented.

  Further, the first control unit 96 is positioned above the height of the discharge unit 17 by a predetermined amount when the water surface 92a of the bath water 92 in the bathtub 90 detected by the water level sensor 95 is equal to or less than the height of the discharge unit 17. It is also possible to drive and control the pump 50 to be driven to supply the circulating water L1 from the treatment tank 12 into the bathtub 90 through the discharge portion 17 so that the bathtub water 92 increases until the bath water 92 increases. .

  The first control unit 96 can also turn on the power supply 60 to sterilize the circulating water L1 and generate the treatment liquid L2 when there is no change in the detection value of the water level sensor 95 within a predetermined time. Conversely, the first control unit 96 can turn off the power supply 60 and stop the sterilization of the circulating water L1 and the generation of the treatment liquid L2 when the detection value of the water level sensor 95 varies within a predetermined time. This prevents air from entering the liquid processing apparatus 100 by responding to fluctuations in the water level caused by people entering or leaving the bathtub 90. That is, when a person or the like enters or exits the bathtub 90, the water surface 92a of the bathtub water 92 of the bathtub 90 may drop to the discharge unit 17 or less for a moment, and then air enters the liquid processing apparatus 100 in that moment. Therefore, when a person or the like enters or exits the bathtub 90, it is preferable to control the first control unit 96 so that the power source 60 is not turned on.

  As an operation of the bathtub apparatus 103 according to the second embodiment, the difference from the bathtub apparatus 101 according to the first embodiment is that when the power supply 60 is turned on, the first control unit 96 uses the detection value of the water level sensor 95 as a basis. If the water surface detection position is higher than the discharge unit 17, the power source 60 is turned on. If the water surface detection position is equal to or lower than the discharge unit 17, the power source 60 is turned off. The rest is the same as the liquid processing apparatus 101 according to the first embodiment, and a description thereof will be omitted.

  According to the second embodiment, in addition to the function and effect of the first embodiment, the first control unit 96 turns on the power supply 60 if the water surface detection position is higher than the discharge unit 17 based on the detection value of the water level sensor 95. If the water surface detection position is equal to or less than the discharge portion 17, the load on the electrodes 30, 31 and the power source 60 due to the air discharge can be prevented by turning off the power source 60.

[Embodiment 3]
The bathtub apparatus 104 of Embodiment 3 is further provided with a temperature sensor 97 and a second control unit 98 in the bathtub apparatus 101 of Embodiment 1 as shown in FIG. 6F.

  As the temperature sensor 97, a known temperature sensor can be used. The temperature sensor 97 is arranged at the bottom of the bathtub 90, detects the temperature of the bathtub water 92 in the bathtub 90, and inputs the detected value to the second control unit 98. . When the temperature of the bathtub water 92 is detected by the temperature sensor 97, it is better to detect the temperature after circulating the bathtub water 92 between the bathtub 90 and the liquid processing apparatus 100 for a predetermined time (for example, about 10 seconds). 90 and the liquid processing apparatus 100 are preferable because the temperatures are uniform.

  The second control unit 98 controls the discharge capacity (for example, discharge flow rate) of the pump 50 according to the detected value of the temperature sensor 97, and also controls the output of the power source 60 as necessary. The second control unit 98 pumps the operating conditions of the pump 50 for supplying the treatment tank 12 with the circulating water L1 having an amount corresponding to the pressure in the gas phase G generated by the swirling flow F1 according to the detection value of the temperature sensor 97. 50. This is because the vaporization temperature of the circulating water L1, for example, water differs depending on the water temperature, and the pressure of the gas phase G changes. By controlling the discharge flow rate of the pump 50 in accordance with the water temperature, the pressure of the gas phase G is kept within a certain range. It means that you can keep. As a result, the second control unit 98 adjusts the amount of water necessary for the swirling flow F1 that generates the gas phase G (satisfying the pressure condition in the gas phase G) in accordance with the water temperature of the bath water 92 in the bath 90. In addition, by applying the application condition of the power source 60 suitable for the amount of water to the liquid processing apparatus 100, it is possible to efficiently generate OH radicals and sterilize the bathtub water 92 in the bathtub 90.

  In addition, when the temperature of the bath water 92 fluctuates due to additional cooking in the bathtub 90, the fluctuation range of the value detected by the temperature sensor 97 is within a predetermined range (for example, a range of ± 5 ° C.). After the determination by the second control unit 98, the second control unit 98 can control the power supply 60 to be turned on.

  As an operation of the bathtub device 104 according to the third embodiment, the difference from the bathtub device 101 according to the first embodiment is that the water temperature sensor 97 measures the water temperature of the bathtub water 92 and then combines the measured water temperature with the second control unit 98. Thus, the discharge flow rate of the pump 50 is controlled. Since it is the same as that of the liquid processing apparatus 100 according to the first embodiment except that it is introduced into the processing tank 12 at a controlled discharge flow rate, description thereof is omitted.

  According to the third embodiment, in addition to the function and effect of the first embodiment, the second control unit 98 generates a swirl flow F1 in the gas phase G generated in the processing tank 12 based on the detection value of the temperature sensor 97. Circulating water L1 having an amount of water commensurate with the pressure can be supplied to the treatment tank 12, and a stable discharge can be obtained. Therefore, OH radicals can be generated efficiently and the bath water 92 in the bath 90 can be sterilized.

[Modification]
The configuration of the liquid processing apparatus 100 described in the first to third embodiments is an example, and various modifications can be made. For example, the internal structure of the processing tank 12 or the position of the first electrode 30 or the second electrode 31 is not limited to the structure of the first to third embodiments.

  In the first to third embodiments, the processing tank 12 has a simple cylindrical shape, but is a cylindrical processing tank having a circular cross-sectional shape, and on the central axis of the processing tank at one end of the processing tank or As long as it has a hole-shaped discharge portion constricted in the vicinity of the central axis, various shapes can be adopted. For example, as shown in FIG. 7, the same effect can be obtained even in a processing tank 121 in which cylinders having different radii are combined. In FIG. 7, the radius on the introduction part side is configured to be larger than the radius on the discharge part side. Or the same effect is acquired even if it is the cone-shaped process tank 122 shown in FIG. Preferably, in order to prevent the swirl flow F1 from sliding in the forward direction F, as shown in FIG.

  In the first to third embodiments, the shape of the first electrode 30 is a rod electrode. However, the shape is not limited as long as electrolysis concentrates on the right end portion 301 of the first electrode 30. For example, as shown in FIG. 9A, a plate-shaped first electrode 32 with a conical shape sharpened toward the discharge portion side may be used. Further, as shown in FIG. 9B, instead of the conical shape, a plate-shaped first electrode 32A having a mountain-shaped convex portion 32B protruding so as to curve toward the discharge portion side may be used. In the first electrode 32A, since the central portion closest to the generated plasma P is easily worn, an electrode having a mountain-shaped convex portion 32B that projects the central portion into the processing tank 12 is more than a simple plate electrode. Is preferable because of its long life. More preferably, instead of the plate-shaped first electrode 32, a rod electrode that can easily feed the electrode into the treatment tank 12 when the electrode is worn may be used.

  Further, as shown in FIG. 10, the same effect can be obtained even if the first electrode 30 and the insulator 53 are attached to the second inner wall 22 without using the electrode support cylinder 24 of the first electrode 30. Preferably, in order to suppress the electrolysis of water or the generation of Joule heat, it is better to cover the first electrode 30 necessary for plasma generation except for the connection portion between the right end 301 and the power source 60 with an insulator.

  In the first to third embodiments, the material of the first electrode 30 is tungsten as an example. However, the material is not particularly limited as long as the material is particularly conductive. Preferably, a metal material capable of causing a Fenton reaction and exhibiting a high bactericidal effect when contacted with hydrogen peroxide in water is preferable. For example, SUS (stainless steel) or copper or copper tungsten is preferable.

  In the first to third embodiments, the second electrode 31 is disposed in the discharge unit 17, but this is not limited as long as at least a part of the second electrode grounded in the treatment tank 12 is disposed. For example, with respect to the arrangement location, as shown in FIG. 11, the same effect can be obtained by arranging the rod-like second electrode 33 on the side of the central axis X <b> 1 of the first inner wall 21. In addition, as shown in FIG. 12, the rod-shaped second electrode 33 may be disposed in the bathtub 90 outside the processing tank 12 and in the vicinity of the intake 91 of the bathtub 90. Further, as shown in FIG. 13, the cylindrical second electrode 34 may be disposed inside the first inner wall 21. The opening 311 is circular, but may be polygonal. Furthermore, the second electrode may be configured by combining a plurality of divided metal members. Preferably, in order not to disturb the swirling flow F1, a plate shape or a cylindrical shape having a round hole is preferable. In addition, the shorter the distance between the gas phase G and the second electrode, the smaller the resistance of the water, and the Joule heat can be suppressed. It is better to arrange the electrodes.

  The flow rate of the circulating water L1 introduced into the treatment tank 12 is set to a flow rate at which the gas phase G is generated in the swirling flow F1 according to the shape of the treatment tank 12 and the like. In addition, the pulse voltage applied to the first electrode 30 and the second electrode 31 is applied in a monopolar rather than bipolar, or the voltage, pulse width, or frequency is a gas phase generated in the swirling flow F1. It is possible to appropriately set a value at which G can generate plasma P.

  Furthermore, as long as the effects of the present invention can be obtained, the power supply 60 may be a high-frequency power supply other than the pulse power supply. Preferably, since the pH between the electrodes is biased due to the electrolysis of water, bipolar application capable of alternately exchanging the cathode and the anode is preferable.

  Although the bathtub 90 is used as a tank, it is not limited to this as long as the bathtub water can be retained in the bathtub 90 in order to shear the swirling flow F1. Preferably, in order to fill the discharge part 17 with the circulating water L1 and prevent air from entering the treatment tank 12, the apparatus body 10 discharges the treatment liquid L2 upward as shown in FIG. It should be on the upper side.

  Moreover, as a material of the material which comprises the bathtub 90, water should just not permeate | transmit. Further, for example, as shown in FIG. 14B, a plate member 93 containing copper or iron that can cause a Fenton reaction with hydrogen peroxide solution, which is one of the reforming components, to exhibit a high bactericidal effect is provided. Can be used for parts or all. Further, the plate member 93 may be disposed in the bathtub 90 as a separate member from the bathtub 90. In short, if the plate member 93 comes into contact with the treatment liquid in the bath 90, a high sterilizing effect can be exhibited by causing a Fenton reaction with hydrogen peroxide solution which is one of the reforming components.

  In addition, by containing a copper or iron component as the material of the first electrode 30, copper or iron nanoparticles are generated by the plasma P, and the hydrogen peroxide generated by the plasma P similarly causes a Fenton reaction to perform the treatment. It can also be accelerated.

  As mentioned above, although Embodiment 1-3 of this invention and the modification were demonstrated, Embodiment 1-3 mentioned above and a modification are only the illustrations for implementing this invention. Therefore, the present invention is not limited to the above-described first to third embodiments and modification examples, and can be implemented by appropriately modifying the above-described first to third embodiments and modification examples without departing from the spirit thereof. It is.

  That is, the effects possessed by any one of the embodiments or the various modifications can be obtained by appropriately combining them. In addition, combinations of the embodiments, combinations of the examples, or combinations of the embodiments and examples are possible, and combinations of features in different embodiments or examples are also possible.

  The bathtub water treatment apparatus and the bathtub apparatus according to the above aspect of the present invention can sterilize bathtub water and reuse the bathtub water (refreshing water or recycling water to a washing machine or the like). Useful for. Moreover, the said aspect of this invention is applicable also to the use of water reuse, such as a pool.

DESCRIPTION OF SYMBOLS 100 Liquid processing apparatus 10 Apparatus main body 12 Processing tank 15 Introduction part 17 Discharge part 21 1st inner wall 22 2nd inner wall 23 3rd inner wall 24 Electrode support cylinder 30 1st electrode 31 2nd electrode 32 Plate-shaped 1st electrode 32A Mountain shape Plate-shaped first electrode 32B mountain-shaped convex portion 33 rod-shaped second electrode 34 cylindrical second electrode 50 liquid supply portion 53 insulator 60 power supply 80 water tank 81 one-dot chain line (circulation piping)
83 Storage space 90 Bath 92 Bath water 92a Water surface 93 Plate member 95 Water level sensor 96 First control unit 97 Temperature sensor 98 Second control unit 101, 103, 104 Bath apparatus 121, 122 Treatment tank 151 Open end 241 Inner end surface 301 Right end 311 Opening 801 First electrode 802 Second electrode 803 Liquid 804 Pulse power source 805 Plasma 901 Anode electrode 902 Cathode electrode 903 Liquid to be treated 904 Gas B Backward BA Bubble D Downward F Forward F1 Swirling flow G Gas phase L Backward Left direction L1 when viewed from the circulating water L2 Treatment liquid P Plasma R Right direction U when viewed from the rear direction Up direction X1 Virtual center axis of the substantially cylindrical accommodation space

Claims (12)

By rotating the liquid introduced from the introduction part around the central axis, a gas phase is generated in the vicinity of the rotation center of the swirling flow of the liquid, and the liquid introduced from the introduction part is exchanged with the introduction part. A treatment tank that swirls between and generates the swirl flow and then discharges it as a processing liquid, and the discharge section can be attached to a bathtub;
A pump that can be connected to the bathtub and is held in the bathtub as the liquid from the introduction unit into the treatment tank;
A first electrode that is at least partially disposed in the processing tank on one end side along the central axis of the processing tank and contacts the liquid in the processing tank;
A second electrode disposed on the other end side of the processing tank along the central axis so as to contact the liquid in the processing tank;
A voltage is applied between the first electrode and the second electrode to generate plasma in the gas phase to sterilize the liquid to form the treatment liquid and generate a modified component in the treatment liquid. With power supply,
The liquid introduced from the introduction part is swirled between the introduction part and the discharge part to generate the swirl flow, and the plasma is generated in the gas phase of the swirl flow to sterilize the liquid. The reforming component is generated and the generated reforming component is dissolved in the treatment liquid and dispersed in the treatment liquid, and the treatment liquid is supplied into the bathtub from the discharge unit, and the bathtub Sterilizing bathtub water, introducing the bathtub water discharged after sterilization as at least part of the liquid into the treatment tank by the pump,
Bathtub water treatment device. The first electrode is disposed so as to contact the gas phase generated near the swirling center of the swirling flow of the liquid, or to be positioned near the gas phase.
The bathtub water treatment apparatus according to claim 1. The treatment tank has a cylindrical or frustoconical first inner wall that swirls the liquid supplied from the introduction section to generate the swirling flow,
The first electrode is disposed on or near the central axis of the first inner wall, which is the central axis of the treatment tank.
The bathtub water treatment apparatus according to claim 1 or 2. The first electrode is disposed on one end side near the central axis or the central axis,
The second electrode is disposed on the other end side in the vicinity of the central axis or the central axis,
The introduction portion is disposed on the one end side of the central axis,
The discharge portion is disposed on the other end side of the central axis.
The bathtub water treatment apparatus according to claim 3. The second electrode is a plate-like electrode disposed on a part of the first inner wall on the other end side of the first inner wall around the central axis or so as to surround the entire circumference of the central axis. Is,
The bathtub water treatment apparatus according to claim 4. The second electrode is disposed on a side of the central axis of the first inner wall on the other end side of the first inner wall.
The bathtub water treatment apparatus according to claim 4. The second electrode is a cylindrical electrode disposed so as to surround a part or the entire circumference of the central axis of the first inner wall on the other end side of the first inner wall.
The bathtub water treatment apparatus according to claim 4. The treatment tank has a cylindrical treatment chamber having a circular cross-sectional shape in which one end side along the swirl axis of the liquid of the treatment tank is closed,
The pump introduces the bath water from the introduction portion into the processing tank from the tangential direction of the cylindrical processing chamber of the processing tank.
The bathtub water treatment apparatus according to any one of claims 1 to 7. According to the detection value of the water level sensor that detects the water surface in the bathtub, further comprising a first control unit that controls the output of the power source,
The bathtub water treatment apparatus according to any one of claims 1 to 8. The first control unit turns on the power to generate the treatment liquid when there is no change in the detection value of the water level sensor within a predetermined time.
The bathtub water treatment apparatus according to claim 9.   The bathtub water according to any one of claims 1 to 10, further comprising a second control unit that controls a discharge capacity of the pump according to a detection value of a temperature sensor that detects a water temperature of the bathtub water in the bathtub. Processing equipment. The bathtub water treatment device according to any one of claims 1 to 11,
The bathtub for supplying the treatment liquid generated in the bathtub water treatment apparatus into the bathtub water;
A bathtub apparatus.

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