JP2018196852A - Liquid treatment apparatus - Google Patents

Abstract

To provide a liquid treatment apparatus possible to efficiently generate plasma and promptly decompose chlorine component of liquid, thereby shortening treatment time, increasing purification ability and chlorine removal ability, stabilizing discharge due to no need for air introduction, and possible to suppress generation of nitrite, which is a harmful substance.SOLUTION: An apparatus includes: a treatment tank 12 for generating a gas phase G in the vicinity of a swirling center of a swirling flow F1 of liquid L1 by swirling the introduced liquid L1; a first electrode 30 disposed at least partly in the treatment tank and contacting the liquid in the treatment tank; a second electrode 31 disposed so as to be in contact with the liquid in the treatment tank; and a power source 60 for applying a voltage between the first electrode and the second electrode to generate plasma in the gas phase. Plasma is generated in the gas phase to generate a reformed component, the produced reformed component is dissolved in the liquid and is dispersed in the liquid to form a treatment liquid. Then, the chlorine component of water 42 in the treatment tank 41 is decomposed using the generated treatment liquid, and thereafter for-treatment water is introduced into the treatment tank from the treatment tank 41.SELECTED DRAWING: Figure 6D

Description

  The present invention relates to a liquid processing apparatus for electrochemically processing a liquid, and relates to an apparatus for decomposing and removing a chlorine component from a liquid such as water containing excessive chlorine.

  FIG. 15 shows an example of a conventional liquid processing apparatus. The first electrode 801 and the second electrode 802 are disposed in a liquid 803 containing chlorine (for example, water), and a high voltage pulse is applied between the two electrodes 801 and 802 from the pulse power source 804 to supply the liquid 803. A liquid processing apparatus that vaporizes, generates plasma 805, and performs plasma processing on the liquid 803 to remove chlorine components is known.

  However, in the case of the above conventional liquid processing apparatus, not only a high applied voltage is required to vaporize the liquid 803, but also the generation efficiency of the plasma 805 is low, and it takes a long time to remove chlorine from the liquid 803. There was a problem.

  Therefore, a liquid processing apparatus is known in which a gas introduced from the outside is interposed between both electrodes in order to improve the plasma generation efficiency while lowering the applied voltage (see Patent Document 1). In the liquid processing apparatus described in Patent Document 1 (FIG. 16), a gas 904 (for example, oxygen) is interposed between an anode electrode 901 and a cathode electrode 902 together with a liquid to be processed 903, and then both electrodes 901 and 902 are interposed. A pulse voltage is applied between them. By applying the pulse voltage, plasma is generated in the gas 904, and plasma treatment is performed on the liquid 803 to remove chlorine components. According to the liquid processing apparatus described in Patent Document 1, the applied voltage can be reduced and plasma can be generated more efficiently than when no gas is interposed.

  An apparatus that decomposes and removes a chlorine component from a liquid such as water containing excessive chlorine by using such a liquid processing apparatus can be considered.

Japanese Patent No. 40412224

  However, the conventional liquid processing apparatus has a problem that the generation efficiency of plasma is low, the liquid chlorine removing process takes a long time, and the purification ability and the chlorine removing ability are weakened.

  Further, according to the liquid processing apparatus described in Patent Document 1, a gas supply device such as an oxygen tank or a pump is required to supply a gas (for example, oxygen) between the anode electrode and the cathode electrode. For this reason, there exists a problem that a liquid processing apparatus enlarges.

Here, in order to reduce the size of the gas supply device, it is conceivable to supply air between the anode electrode and the cathode electrode. In this case, an oxygen tank is unnecessary, and an increase in the size of the liquid processing apparatus is suppressed. However, when air is supplied between the anode electrode and the cathode electrode, nitrogen contained in the air is changed into nitrous acid (HNO ₂ ) harmful to the human body due to the plasma, and the nitrogen is contained in the treated liquid. Nitric acid will be contained. For this reason, when the liquid processing apparatus is used for adjusting chlorine in a pool or the like, air may not be supplied as a gas for generating plasma. Further, there is a problem that discharge is not stabilized by introducing air, and chlorine component removal cannot be performed stably.

  In view of these points, the present invention can generate plasma efficiently and can rapidly perform a liquid chlorine component decomposition process, shorten the processing time, increase the purification capacity and the chlorine removal capacity, and eliminate the need for air introduction. An object of the present invention is to provide a liquid processing apparatus capable of stabilizing discharge and suppressing generation of nitrous acid, which is a harmful substance.

A liquid processing apparatus according to one aspect of the present invention includes:
The liquid introduced from the introduction part and containing the chlorine component is swirled around the central axis to generate a gas phase in the vicinity of the swirling center of the swirling flow of the liquid, and the liquid introduced from the introduction part is A treatment tank having a discharge portion that is swirled with an introduction portion to generate the swirl flow and then discharged as a treatment liquid;
A first electrode that is at least partially disposed in the processing tank and contacts the liquid in the processing tank;
A second electrode arranged to contact the liquid in the treatment tank;
A power source that applies a voltage between the first electrode and the second electrode to generate plasma in the gas phase to decompose the chlorine component of the liquid and generate a reforming component in the processing liquid; ,
A microbubble generating chamber having a vertical cross-sectional area larger than the opening of the discharge portion of the processing tank, and microbubbles or nanobubbles are discharged by discharging the processing liquid from the discharge portion of the processing tank in the microbubble generating chamber. A microbubble generating unit for generating and diffusing the generated microbubbles or nanobubbles in the treatment liquid;
Water to be treated, which contains water containing chlorine components and decomposes the chlorine components of the water with the reforming components of the treatment liquid supplied from the microbubble generator, at least as part of the liquid , A tank to be treated that is discharged toward the treatment tank;
A residual chlorine concentration sensor in the liquid for detecting a residual chlorine concentration contained in the liquid introduced from the introduction part of the treatment tank;
A pump capable of circulating the liquid introduced into the processing tank from the introduction part of the processing tank through the microbubble generating unit between the processing tank and the processing tank;
A control unit for driving and controlling the power source based on the detection result of the residual chlorine concentration sensor in the liquid,
When the residual chlorine concentration of the liquid exceeds an upper limit threshold based on the detection result of the residual chlorine concentration sensor in the liquid, the power source is driven by the control unit, and the introduction unit and the discharge unit are driven by the liquid. The plasma is generated in the gas phase of the swirling flow formed between the liquid and the chlorine component of the liquid is decomposed and the reforming component is generated, and the generated reforming component is converted into the treatment liquid. Dissolving and dispersing in the treatment liquid, introducing the treatment liquid into the treatment tank through the microbubble generating unit, and decomposing the chlorine component of the water held in the treatment tank, The treated water discharged after decomposing the chlorine component is introduced into the treatment tank as at least a part of the liquid by the pump.

  According to the liquid processing apparatus according to the aspect of the present invention, the liquid can be vaporized in a swirling flow, and a pulse voltage can be applied to the generated gas phase to generate plasma to decompose chlorine components in the liquid. A treatment liquid having a reforming component having a chlorine component decomposition action can be generated. Since there is no need to vaporize the liquid by applying voltage, plasma can be generated efficiently with low power, and the chlorine component decomposition treatment of the liquid and the water to be treated can be performed efficiently and quickly, reducing the processing time. This increases the purification capacity and the chlorine removal capacity. In addition, since the chlorine removal treatment of the liquid and the water to be treated is performed without introducing air from the outside, the discharge is stabilized and the production of nitrous acid which is a harmful substance can be suppressed.

Side surface sectional drawing which shows the structure of the liquid processing part of the liquid processing apparatus concerning Embodiment 1 of this invention. Side cross-sectional view of the device body Sectional view along line 3-3 in FIG. Side surface sectional view showing a state where a swirl flow is generated inside the processing tank and no voltage is applied Sectional view taken along line 5-5 in FIG. Side surface sectional view showing a state where a swirl flow is generated inside the treatment tank and a voltage is applied FIG. 6A is a partially enlarged view showing a state where plasma is generated in the gas phase. Side sectional view of a state where microbubbles are generated in the microbubble generator of the liquid processing apparatus Explanatory drawing which shows the whole structure of a liquid processing apparatus. Explanatory drawing which shows the whole structure of the liquid processing apparatus concerning Embodiment 2 of this invention. Side sectional view showing a modified example of the apparatus main body Side sectional view showing a modified example of the apparatus main body Side sectional view showing a modified example of the apparatus main body Side surface sectional view which shows the modification of an apparatus main body different from FIG. 9A Side sectional view showing a modified example of the apparatus main body Side sectional view showing a modified example of the apparatus main body Side sectional view showing a modified example of the apparatus main body Side sectional view showing a modified example of the apparatus main body Side sectional view showing a modified example of the apparatus main body Side surface sectional view in which a copper material is arranged in a part of the microbubble generating part in a modification of the apparatus main body Schematic configuration diagram of a conventional liquid processing apparatus Schematic configuration diagram of a conventional liquid processing apparatus provided with a gas introduction device

[Embodiment 1]
Hereinafter, a liquid processing apparatus 101 having a liquid processing unit 100 according to an embodiment of the present invention will be described in detail with reference to the drawings. In the drawings, the same or corresponding parts are denoted by the same reference numerals and description thereof will not be repeated. In addition, in order to make the explanation easy to understand, in the drawings referred to below, the configuration is shown in a simplified or schematic manner, or some components are omitted. Further, the dimensional ratio between the constituent members shown in each drawing does not necessarily indicate an actual dimensional ratio.

[overall structure]
The liquid processing apparatus 101 includes at least a liquid processing unit 100 having a microbubble generating unit 90, a processing tank 41 that holds water 42 containing a chlorine component, a residual chlorine concentration sensor 43, and a control unit 48. (See FIG. 6D). The liquid processing unit 100 functions as a device that performs a chlorine component decomposition process and generates a processing liquid L2 used in a chlorine component decomposition process in the tank 41 to be processed. The tank 41 to be treated corresponds to, for example, a pool or a bathtub in a public bath.

  First, the overall configuration of the liquid processing unit 100 of the liquid processing apparatus 101 according to the first embodiment will be described. FIG. 1 is a side sectional view showing a configuration of a liquid processing unit 100 according to Embodiment 1 of the present invention. In the following drawings, the arrow F indicates the forward direction of the liquid processing unit 100, and the arrow B indicates the backward direction. Arrow U indicates the upward direction, and arrow D indicates the downward direction. The arrow R indicates the right direction when viewed from the rear direction, and the arrow L indicates the left direction when viewed from the rear direction.

  The liquid processing unit 100 generates a treatment liquid by decomposing a chlorine component in the liquid and generating a reforming component by discharging in the liquid and dispersing the generated reforming component in the liquid. . In the first embodiment, as an example of the liquid, tap water supplied as necessary or the chlorine component of the water L1 to be treated discharged from the tank 41 to be described later is decomposed and a reforming component is added. A case where the treatment liquid L2 containing a modifying component such as OH radical or hydrogen peroxide is generated will be described. Here, the water to be treated L1 is a liquid that is held in the tank 41 to be described later and that contains the chlorine component and comes into contact with the treatment liquid L2 so that the chlorine component is decomposed and discharged from the tank 41 to be treated. And a liquid containing water 42 containing a chlorine component, the treatment liquid L2, and the like, and means a liquid introduced into the treatment tank 12 by the pump 50 through the circulation pipe 81 and the pipe 51.

  The liquid processing unit 100 includes at least a processing tank 12, a first electrode 30, a second electrode 31, and a power source 60. More specifically, the liquid processing unit 100 includes an apparatus main body 10, a liquid supply unit 50, a microbubble generation unit 90, and a power source 60. The apparatus main body 10 includes a processing tank 12, an introduction unit 15, a discharge unit 17, a first electrode 30, and a second electrode 31.

  The treatment tank 12 decomposes the chlorine component contained in the liquid L1 with plasma from the water to be treated L1 introduced into the treatment tank 12 and generates a reforming component (for example, OH radical or hydrogen peroxide) to treat the treatment liquid L2. This is the part that generates The material of the treatment tank 12 may be an insulator or a conductor. In the case of a conductor, an insulator needs to be interposed between the electrodes 30 and 31. When the reforming component is discharged to the microbubble generator 90, the reforming component is dispersed in the water to be treated L1, and the treatment liquid L2 is generated.

  The front sectional shape of the inner wall of the treatment tank 12 is circular (see FIG. 3). In other words, the treatment tank 12 has a cylindrical treatment chamber having a circular cross-sectional shape in which one end side of the treated water L1 of the treatment tank 12 along the turning axis X1 is closed. The introduction unit 15 is disposed at one end of the treatment tank 12 and introduces the water to be treated L1 into the treatment tank 12 from a tangential direction of a circular cross-sectional shape orthogonal to the central axis X1 of the treatment tank 12. The introduction unit 15 communicates with the liquid supply unit 50 via the pipe 51. The discharge part 17 is arrange | positioned at the other end of the processing tank 12, and discharge | releases the to-be-processed water L1 introduced into the processing tank 12, and the modification | reformation component produced | generated by the processing tank 12 from the processing tank 12 to the microbubble generation part 90. Let In the first embodiment, the discharge unit 17 is connected to the processing liquid supply port 91 of the microbubble generating unit 90.

  The first electrode 30 is disposed inside one end of the processing tank 12. The first electrode 30 is disposed so as to protrude along the longitudinal direction from the center of the inner wall at one end of the processing tank 12 into the processing tank 12.

  The second electrode 31 is disposed outside the wall at the other end of the processing tank 12 and is disposed in the vicinity of the discharge unit 17.

  The first electrode 30 is connected to a power source 60, and the second electrode 31 is grounded. A high voltage pulse voltage is applied to the first electrode 30 and the second electrode 31 by the power supply 60. The material of the first electrode 30 is, for example, tungsten.

  The liquid supply part 50 is a pump which supplies the to-be-processed water L1 in the process tank 12, as an example. The liquid supply unit 50 is connected to the pipe 51. One end of the pipe 51 is connected to an introduction portion 15 as an inner opening disposed in the vicinity of the inner wall of one end of the treatment tank 12, and the other end of the pipe 51 is a liquid supply source (for example, a water tank 80) (not shown) or The microbubble generating unit 90 is connected between the processing tank 12 and the processing tank 41 to be processed water L1 from the processing tank 41 containing the processing liquid L2 of the microbubble generating unit 90 connected to the processing tank 41. Are connected in such a way that they can be circulated (see, for example, the circulation pipe 81 shown by the one-dot chain line in FIG. 1).

  The power source 60 applies a high voltage pulse voltage between the first electrode 30 and the second electrode 31. The power supply 60 can apply a so-called bipolar pulse voltage that alternately applies a positive pulse voltage and a negative pulse voltage.

  The microbubble generating unit 90 is a tank that shears the modified component discharged from the liquid processing unit 100 in the microbubble generating chamber 90f, generates microbubbles or nanobubbles containing the modified component, and diffuses them into water. It is. Specifically, the microbubble generation unit 90 has a microbubble generation chamber 90f having a cross-sectional area larger than the opening cross-sectional area of the discharge unit 17 of the processing tank 12 inside, and the microbubble generation unit 90 is disposed inside the microbubble generation unit 90 from the discharge unit 17. The modified component discharged in the tube is sheared by the microbubble generating unit 90, and microbubbles containing the modified component, or microbubbles and nanobubbles are generated in the microbubble generating unit 90 and diffused in water. . Therefore, the microbubble generating unit 90 functions as a microbubble generating tank. As the microbubble generator 90, at least the inner diameter or one side of the opening of the discharge section 17 of the treatment tank 12 is secured, so that the processing liquid L <b> 2 that can sterilize reliably can be obtained by the microbubble generator 90. It can be generated reliably.

  As shown in FIG. 6D, the microbubble generating unit 90 is disposed at the center of the side wall on the processing tank side and connected to the discharge part 17 of the processing tank 12, for example, and is opposite to the processing tank side. It has a processing liquid discharge port 90b disposed in the center similar to the processing liquid supply port 91 on the side wall. The microbubble generation chamber 90f has at least a vertical cross-sectional area larger than the opening of the discharge portion 17 of the processing tank 12.

  In such a microbubble generating unit 90, plasma P is generated in the gas phase G in the treatment tank 12 to decompose the chlorine component in the water to be treated L1 and generate a reforming component. The generated reforming component is dissolved in the liquid and dispersed in the liquid to generate the processing liquid L2. The generated processing liquid L2 is supplied from the discharge unit 17 of the processing tank 12 to the processing liquid supply port of the microbubble generation unit 90. After being discharged into the microbubble generator 90 through 91, it is discharged from the processing liquid outlet 90 b of the microbubble generator 90.

  In FIG. 6D, the pipe 51 is connected to the processing tank 41 and constitutes a part of the circulation pipe 81. The treated water L1 in the treated tank 41 is supplied into the treatment tank 12 from the introduction unit 15 via the circulation pipe 81 and the pump 50, and the treatment liquid L2 is discharged from the discharge unit 17 of the treatment tank 12 and discharged. The processing liquid L2 is introduced into the microbubble generation unit 90 from the processing liquid supply port 91, and the processing liquid L2 is discharged from the processing liquid discharge port 90b of the microbubble generation unit 90 and supplied to the processing tank 41. The liquid is circulated among the processing tank 12, the microbubble generator 90, and the processing tank 41 by being discharged from the processing tank 41 and introduced into the processing tank 12 via the pump 50. Yes.

  In addition to the liquid processing unit 100, the liquid processing apparatus 101 further includes a processing tank 41.

  The to-be-treated tank 41 holds water 42 containing a chlorine component. The treatment liquid L2 is supplied from the microbubble generating unit 90, and the chlorine component is decomposed by the treatment liquid L2. The concentration can be reduced. Therefore, when the concentration of the chlorine component in the water 42 in the tank 41 to be treated is too high and excessive, the treatment liquid L2 is supplied to the tank 41 to decompose the chlorine component in the treatment liquid L2, and the water 42 The concentration of the chlorine component can be reduced.

  A commercially available chlorine concentration sensor can be used as the residual chlorine concentration sensor 43 in the liquid, and is disposed between the tank 41 and the processing tank 12, specifically, between the tank 41 and the pump 50. Has been. The residual chlorine concentration sensor 43 detects the residual chlorine concentration contained in the water to be treated L1 discharged from the tank 41 to be treated. The detection result is output from the residual chlorine concentration sensor 43 to the control unit 48.

  The controller 48 receives the detection result from the residual chlorine concentration sensor 43 and controls at least the power supply 50. That is, the power supply 60 is driven and controlled based on the detection result of the residual chlorine concentration sensor 43, or the power supply 60 and the pump 50 are independently driven and controlled so as to achieve the following operations. ing. Specifically, the control unit 48 drives the power supply 50 when the residual chlorine concentration of the water to be treated L1 as the detection result of the liquid residual chlorine concentration sensor 43 exceeds the upper limit threshold value. By driving the power source 50, plasma P is generated in the gas phase G, the chlorine component in the liquid L1 is decomposed, the reforming component is generated, and the processing liquid L2 is generated. And the chlorine component is decomposed | disassembled with the process liquid L2 in the to-be-processed tank 41, and it is made possible to reduce the residual chlorine concentration of the to-be-processed water L1. Therefore, when the chlorine concentration in the liquid is higher than necessary, the chlorine component can be decomposed. As an example of the upper limit threshold value of the residual chlorine concentration of the water L1 to be treated, the free residual chlorine concentration can be 1.0 mg / l. In other words, as an example of the residual chlorine concentration of the water to be treated L1, the free residual chlorine concentration in a pool or the like can be 0.4 mg / l or more and 1.0 mg / l or less.

[Device main unit]
Next, the apparatus main body 10 will be described in detail. FIG. 2 is a side sectional view of the apparatus main body 10.

  The processing tank 12 has a first inner wall 21, a second inner wall 22, and a third inner wall 23. The first inner wall 21 is a cylindrical wall portion. The second inner wall 22 is provided at the left end portion of the first inner wall 21 in FIG. The third inner wall 23 is provided at the right end of the first inner wall 21 in FIG. The second inner wall 22 and the third inner wall 23 are substantially circular in a side view. The first inner wall 21, the second inner wall 22, and the third inner wall 23 form a substantially cylindrical accommodation space 83 inside the processing tank 12. The central axis of the first inner wall 21, that is, the virtual central axis of the substantially cylindrical accommodation space 83 configured inside the processing tank 12 is defined as an axis X <b> 1.

  The second inner wall 22 is provided with a cylindrical electrode support cylinder 24 projecting into the accommodation space 83 at the center. The electrode support cylinder 24 is cylindrical and extends rightward. The electrode support cylinder 24 is arranged such that its central axis coincides with the central axis X <b> 1 of the first inner wall 21. The first electrode 30 is supported inside the electrode support cylinder 24 via an insulator 53. The first electrode 30 has a rod shape, and the insulator 53 is disposed around the first electrode 30. For this reason, the first electrode 30 is arranged such that the longitudinal axis thereof coincides with the central axis X <b> 1 of the first inner wall 21. The inner end surface of the right end portion 301 of the first electrode 30, the inner end surface of the insulator 53, and the inner end surface 241 of the electrode support cylinder 24 are configured to be disposed in substantially the same plane.

  The introduction portion 15 penetrates the apparatus main body 10, and one open end 151 is formed on the first inner wall 21. The introduction portion 15 is disposed at a position adjacent to the second inner wall 22 in a side view. FIG. 3 is a cross-sectional view taken along line 3-3 in FIG. The introduction part 15 is disposed on the wall surface of the first inner wall 21.

  The discharge part 17 penetrates the central part of the third inner wall 23. The discharge portion 17 is formed such that its central axis coincides with the central axis X1 of the first inner wall 21.

  The 2nd electrode 31 is a plate-shaped metal member, and the opening part 311 is formed in the center part. The opening 311 is circular and is formed so that the center thereof coincides with the central axis X <b> 1 of the first inner wall 21.

[Operation]
Next, the operation of the liquid processing apparatus 101 will be described. In the following, for convenience of explanation, a state in which a gas phase is generated inside the processing tank 12 (FIGS. 4 and 5), and a state in which a pulse voltage is applied to the generated gas phase G to generate plasma P (FIG. 6A). And FIG. 6B) will be described separately. FIG. 4 is a side cross-sectional view showing a state in which a swirling flow F1 is generated inside the processing tank 12 and no pulse voltage is applied.

  First, as shown in FIG. 4, the treated water L1 in the treated tank 41 is sucked from the tap water through the pump 50 or the like, or the treated water L1 is introduced into the treated tank 12 from the introduction unit 15. It is introduced at a predetermined pressure. Then, the to-be-processed water L1 moves toward the right side of FIG. 4 from the introduction part 15 along with the 1st inner wall 21, generating the swirling flow F1. The swirl flow F <b> 1 that moves to the right in FIG. 4 while swiveling moves toward the discharge unit 17.

  Due to the swirling flow F1, the pressure in the vicinity of the central axis X1 of the first inner wall 21 is reduced to the saturated water vapor pressure or less, and water vapor in which a part of the treated water L1 is vaporized is generated. Is generated near the central axis X1. The gas phase G is generated near the turning center, specifically, from the right end 301 of the first electrode 30 to the vicinity of the opening 311 of the second electrode 31 along the central axis X1 of the first inner wall 21. The gas phase G is swirled in the same direction as the swirling flow F1 by the swirling flow F1 in contact therewith. The swirling gas phase G is sheared into microbubbles or nanobubbles by receiving the resistance of water in the microbubble generating unit 90 in the vicinity of the discharging unit 17, and is connected from the discharging unit 17 to the discharging unit 17. It is diffused into the microbubble generator 90 via the processing liquid supply port 91 of the microbubble generator 90.

  5 is a cross-sectional view taken along line 5-5 of FIG. As described with reference to FIG. 4, when the water to be treated L1 is introduced into the treatment tank 12 from the introduction unit 15 at a predetermined pressure, the water to be treated L1 turns clockwise along the first inner wall 21 in FIG. 5. A flow F1 is generated. As the treated water L1 swirls inside the treatment tank 12, the pressure near the center of the swirling flow F1, that is, the pressure near the central axis X1 of the first inner wall 21, drops below the saturated water vapor pressure, and the center of the first inner wall 21 is reached. A vapor phase G is generated by the generation of water vapor in which a part of the treated water L1 is vaporized in the vicinity of the axis X1.

  6A and 6B are side cross-sectional views showing a state in which a swirling flow F1 is generated inside the processing tank 12 and a pulse voltage is applied. As shown in FIG. 6A, in a state where the vapor phase G in which the water to be treated L1 is vaporized is generated from the vicinity of the first electrode 30 to the vicinity of the second electrode 31, the power source 60 and the first electrode 30 A high voltage pulse voltage is applied between the two electrodes 31. FIG. 6B is an enlarged view showing a state where plasma P is generated in the gas phase G. FIG. When a high pulse voltage is applied to the first electrode 30 and the second electrode 31, plasma P is generated in the gas phase G, the chlorine component in the liquid L1 is decomposed, and as a reforming component It generates water-derived radicals (such as OH radicals) or compounds (such as hydrogen peroxide) or ions. The gas phase G containing the reforming component is swirled in the same direction as the swirling flow F1 by the swirling flow F1 in the vicinity. When the gas phase G containing the reforming component is swirled, a part of the reforming component is dissolved to the swirling flow F1, whereby the reforming component is dispersed in the water to be treated L1. In addition, the gas phase G containing the reforming component in the vicinity of the discharge unit 17 is sheared by receiving the resistance of the treatment liquid L2 in the microbubble generating unit 90, and generates bubbles BA containing the reforming component. In addition, the processing liquid L2 is supplied into the microbubble generator 90, thereby preventing air from being mixed into the gas phase G that is a negative pressure. In this manner, the processing liquid L2 is supplied to the microbubble generating unit 90 in a bubble state or in a state where the modified component generated by the plasma P is dissolved in the processing liquid L2.

  The processing liquid L2 supplied to the microbubble generating unit 90 is supplied to the processing tank 41.

  When the treatment liquid L2 comes into contact with the water 42 in the tank 41 to be treated, the chlorine component of the water 42 is decomposed by OH radicals or hydrogen peroxide in the treatment liquid L2. A portion of the water 42 that has been decomposed to reduce the chlorine component is discharged from the tank 41 to be treated, and is introduced into the treatment tank 12 via the pump 50 as the water to be treated L1. It will circulate again to the processing tank 12 through the bubble generation part 90 and the to-be-processed tank 41. FIG.

  As a result, this liquid treatment apparatus 101 removes only the chlorine component corresponding to the chlorine concentration of the excess amount of tap water or water 42 in the treated tank 41, and does not remove all the chlorine components. Absent.

  The liquid processing apparatus 101 in FIG. 6D further includes a liquid detection sensor 49 and a control unit 48.

  The liquid detection sensor 49 is disposed between the processing tank 41 and the processing tank 12, more specifically, between the processing tank 41 and the pump 50, and water to be processed introduced from the processing tank 41 to the processing tank 12. It is a sensor that detects the liquid amount or pressure of L1.

  When the liquid detection sensor 49 is provided, the control unit 48 controls driving of the power source 60 and the pump 50 independently based on the detection results of the residual chlorine concentration sensor 43 and the liquid detection sensor 49. Thus, control can be performed so that the previous operation can be achieved. The control unit 48 performs discharge after the entire processing tank 12 is filled with the liquid, and controls so as not to discharge when the entire processing tank 12 is not filled with the liquid, and also controls the discharge time. can do. As a result, when the chlorine concentration in the liquid is higher than necessary, plasma P is generated and the chlorine component in the liquid is decomposed in a state in which the inside of the treatment tank 12 is filled with the water to be treated L1 and air is not mixed. At the same time, the treatment liquid L2 containing the reforming component can be generated, and the chlorine component can be further decomposed with the reforming component, so that the discharge can be stabilized more reliably.

  According to the first embodiment described above, the water to be treated L1 is vaporized in the swirling flow F1, and a plasma voltage P is generated by applying a pulse voltage to the generated gas phase G to generate the plasma P to be treated. A treatment liquid L2 containing a reforming component (a radical or a compound derived from a liquid, etc.) is generated from the liquid while decomposing the chlorine component therein. Therefore, the gas phase G has a negative pressure than the gas phase formed by the gas vaporized by Joule heat or the gas introduced from the outside, and the plasma P can be generated with a small voltage (that is, less electric power). Therefore, the chlorine component decomposition process of the liquid in a processing tank can be performed efficiently. Furthermore, since water is not vaporized by Joule heat, the input energy is reduced. Further, since no gas is introduced from the outside, a gas supply device is not necessary, and the liquid processing apparatus 101 can be easily downsized.

  Further, the gas phase G formed by the gas vaporized by Joule heat or the gas introduced from the outside is difficult to be held in a certain shape or a certain position by buoyancy. However, in the gas phase G of the first embodiment, a force is applied in the direction in which the surrounding swirl flow F1 gathers around the central axis X1 of the swirl flow F1, so that a constant gas phase is present in the vicinity of the right end portion 301 of the first electrode 30. G can be generated. Therefore, since the time change of the amount of gas generated between the first electrode 30 and the second electrode 31 is small and the electric power necessary for the plasma P is difficult to change, the plasma P can be generated stably, and the processing tank The chlorine component decomposition treatment of the liquid can be efficiently and rapidly carried out, the treatment time of the liquid can be shortened, and the purification ability and the chlorine removal ability are enhanced.

  The volume of the plasma P is equal to or less than the volume of the gas phase in the vicinity of the cathode electrode, but the shape of the gas phase G formed by the gas vaporized by Joule heat or the gas introduced from the outside is a bubble shape. When the volume exceeds a certain level, it splits, making it difficult to generate plasma P having a certain volume or more. However, since the gas phase G of Embodiment 1 can easily increase the volume in the direction of the central axis X1 if the swirl speed of the swirl flow F1 can be secured, it is easy to increase the volume of the plasma P. Therefore, it is easy to increase the amount of liquid chlorine component decomposition treatment and the amount of reforming component generated, and the chlorine component decomposition treatment can be performed quickly.

  Further, since the volume expands when the liquid is vaporized, cavitation is known in which a shock wave is generated and a surrounding object is destroyed. In the first embodiment, the destruction due to cavitation is strongest in the discharge section 17 in which the inner diameter of the treatment tank 12 is the smallest and the swirling speed of the swirling flow F1 is the fastest. Therefore, the right end portion 301 of the first electrode 30 in the gas phase G is away from the location where the destruction of cavitation is strongest, so that the influence of the cavitation on the first electrode 30 is reduced and the plasma P is stably generated. it can.

  In addition, since the treated water L1 is treated without introducing air from the outside, the discharge is stabilized, and harmful sub- stances generated by plasma utilizing a gas phase in which a gas containing a nitrogen component such as air is introduced. Generation of nitric acid can be suppressed. Furthermore, it is possible to generate the treatment liquid L2 containing bubbles BA enclosing OH radicals or hydrogen peroxide.

[Embodiment 2]
As shown in FIG. 6E, the liquid processing apparatus 102 according to the second embodiment further includes a chlorine injecting device 45 with respect to the liquid processing apparatus 101 according to the first embodiment.

  The chlorine injecting device 45 is disposed between the microbubble generating unit 90 and the processing tank 41 and can impart a chlorine component to the liquid supplied to the processing tank 41. Therefore, when the processing liquid L2 is supplied to the water 42 of the processing tank 41, or the plasma P is not generated when the power is turned off, the processing water L1 is processed from the processing tank 12 via the microbubble generator 90. When supplying to the tank 41, a chlorine component can be injected from the chlorine injection device 45 into the water to be treated L1 instead of the treatment liquid L2, thereby increasing the residual chlorine concentration of the water 42 in the tank 41 to be treated.

  Note that the chlorine injection device 45 may be driven and controlled by the control unit 48, as indicated by a dotted line in FIG. 6E. For example, when the residual chlorine concentration of the water to be treated L1 becomes less than the lower limit threshold based on the detection result of the in-liquid residual chlorine concentration sensor 43, the chlorine injection device 45 is driven by the controller 48, and the tank to be treated A chlorine component can be given to the liquid supplied to 41, and the residual chlorine concentration of the to-be-treated water L1 can be increased. As an example of the lower limit threshold value of the residual chlorine concentration of the water L1 to be treated, the free residual chlorine concentration can be 0.4 mg / l.

  According to such a configuration, the residual chlorine concentration of the water 42 in the tank 41 to be treated is detected by the residual chlorine concentration sensor 43 in the liquid, the chlorine component is monitored, and the chlorine injection device 45 is controlled. The concentration of the component can be stabilized.

[Modification]
The configuration of the liquid processing unit 100 described in the first and second embodiments is an example, and various modifications can be made. For example, the internal structure of the treatment tank 12 or the position of the first electrode 30 or the second electrode 31 is not limited to the structure of the first and second embodiments.

  In the first and second embodiments, the processing tank 12 has a simple cylindrical shape, but is a cylindrical processing tank having a circular cross-sectional shape, and on the central axis of the processing tank at one end of the processing tank or As long as it has a hole-shaped discharge portion constricted in the vicinity of the central axis, various shapes can be adopted. For example, as shown in FIG. 7, the same effect can be obtained even in a processing tank 121 in which cylinders having different radii are combined. In FIG. 7, the radius on the introduction part side is configured to be larger than the radius on the discharge part side. Or the same effect is acquired even if it is the cone-shaped process tank 122 shown in FIG. Preferably, in order to prevent the swirl flow F1 from sliding in the forward direction F, as shown in FIG.

  In the first and second embodiments, the shape of the first electrode 30 is a rod electrode. However, the shape is not limited as long as the electrolysis concentrates on the right end portion 301 of the first electrode 30. For example, as shown in FIG. 9A, a plate-shaped first electrode 32 with a conical shape sharpened toward the discharge portion side may be used. Further, as shown in FIG. 9B, instead of the conical shape, a plate-shaped first electrode 32A having a mountain-shaped convex portion 32B protruding so as to curve toward the discharge portion side may be used. In the first electrode 32A, since the central portion closest to the generated plasma P is easily worn, an electrode having a mountain-shaped convex portion 32B that projects the central portion into the processing tank 12 is more than a simple plate electrode. Is preferable because of its long life. More preferably, instead of the plate-shaped first electrode 32, a rod electrode that can easily feed the electrode into the treatment tank 12 when the electrode is worn may be used.

  Further, as shown in FIG. 10, the same effect can be obtained even if the first electrode 30 and the insulator 53 are attached to the second inner wall 22 without using the electrode support cylinder 24 of the first electrode 30. Preferably, in order to suppress the electrolysis of water or the generation of Joule heat, it is better to cover the first electrode 30 necessary for plasma generation except for the connection portion between the right end 301 and the power source 60 with an insulator.

  In the first and second embodiments, the material of the first electrode 30 is tungsten as an example. However, the material is not particularly limited as long as the material is particularly conductive. Preferably, a metal material capable of causing a Fenton reaction and exhibiting a high bactericidal effect when contacted with hydrogen peroxide in water is preferable. For example, SUS (stainless steel) or copper or copper tungsten is preferable.

  In the first and second embodiments, the second electrode 31 is disposed in the discharge unit 17. However, the second electrode 31 is not limited to this as long as at least a part of the grounded second electrode is disposed in the processing tank 12. For example, with respect to the arrangement location, as shown in FIG. 11, the same effect can be obtained by arranging the rod-like second electrode 33 on the side of the central axis X <b> 1 of the first inner wall 21. In addition, as shown in FIG. 12, the rod-shaped second electrode 33 may be disposed in the microbubble generating unit 90 outside the processing tank 12 and in the vicinity of the processing liquid supply port 91 of the microbubble generating unit 90. Further, as shown in FIG. 13, the cylindrical second electrode 34 may be disposed inside the first inner wall 21. The opening 311 is circular, but may be polygonal. Furthermore, the second electrode may be configured by combining a plurality of divided metal members. Preferably, in order not to disturb the swirling flow F1, a plate shape or a cylindrical shape having a round hole is preferable. In addition, the shorter the distance between the gas phase G and the second electrode, the smaller the resistance of the water, and the Joule heat can be suppressed. It is better to arrange the electrodes.

  The flow rate of the water to be treated L1 introduced into the treatment tank 12 is set to a flow rate at which the gas phase G is generated in the swirling flow F1 according to the shape of the treatment tank 12 and the like. In addition, the pulse voltage applied to the first electrode 30 and the second electrode 31 is applied in a monopolar rather than bipolar, or the voltage, pulse width, or frequency is a gas phase generated in the swirling flow F1. It is possible to appropriately set a value at which G can generate plasma P.

  Furthermore, as long as the effects of the present invention can be obtained, the power supply 60 may be a high-frequency power supply other than the pulse power supply. Preferably, since the pH between the electrodes is biased due to the electrolysis of water, bipolar application capable of alternately exchanging the cathode and the anode is preferable.

  Although the microbubble generator 90 is a tank, the microbubble generator 90 is not limited to this as long as it can hold water in the microbubble generator 90 in order to shear the swirl flow F1. For example, it is good also as piping which conveys process liquid L2. Preferably, in order to fill the discharge portion 17 with the water to be treated L1 and prevent air from entering the treatment tank 12, the apparatus body 10 discharges the treatment liquid L2 upward as shown in FIG. It is better to be on the upper side of the apparatus main body 10.

  Moreover, as a material of the material which comprises the microbubble generating part 90, water should just not permeate | transmit. Further, for example, as shown in FIG. 14B, a plate member 93 containing copper or iron that can generate a high sterilizing effect by causing a Fenton reaction with a hydrogen peroxide solution which is one of the reforming components, It can be used for some or all of 90. Further, the plate member 93 may be disposed in the microbubble generating unit 90 as a separate member from the microbubble generating unit 90. In short, when the plate member 93 comes into contact with the treatment liquid in the microbubble generating unit 90, a high sterilizing effect can be exhibited by causing a Fenton reaction with hydrogen peroxide solution which is one of the reforming components.

  As mentioned above, although Embodiment 1-2 of this invention was demonstrated, Embodiment 1-2 mentioned above is only the illustration for implementing this invention. Therefore, the present invention is not limited to Embodiments 1 and 2 described above, and can be implemented by appropriately modifying Embodiments 1 and 2 described above without departing from the spirit of the invention.

  That is, the effects possessed by any one of the embodiments or the various modifications can be obtained by appropriately combining them. In addition, combinations of the embodiments, combinations of the examples, or combinations of the embodiments and examples are possible, and combinations of features in different embodiments or examples are also possible.

  When the chlorine concentration in the liquid is higher than necessary, the liquid processing apparatus according to the aspect of the present invention generates plasma in the liquid to decompose the chlorine component and from the liquid to the reforming component (a radical derived from the liquid or A treatment liquid containing a compound or the like) can be generated, and the chlorine component can be decomposed even by a modified component of the treatment liquid. For this reason, the liquid processing apparatus concerning the said aspect of this invention can be utilized for uses, such as a chlorine odor deodorizing in a pool.

DESCRIPTION OF SYMBOLS 10 Apparatus main body 12 Processing tank 15 Introduction | transduction part 17 Discharge part 21 1st inner wall 22 2nd inner wall 23 3rd inner wall 24 Electrode support cylinder 30 1st electrode 31 2nd electrode 32 Plate-shaped 1st electrode 32A A mountain-shaped convex part Plate-shaped first electrode 32B Mountain-shaped convex portion 33 Rod-shaped second electrode 34 Cylindrical second electrode 41 Treated tank 42 Water in treated tank 43 Residual chlorine concentration sensor 45 Chlorine injection device 48 Control section 49 Liquid detection sensor 50 Liquid supply part 53 Insulator 60 Power supply 80 Water tank 81 Circulation pipe 83 Storage space 90 Micro bubble generation part 90b Treatment liquid discharge port 90f Micro bubble generation chamber 91 Treatment liquid supply port 93 Plate member 100 Liquid treatment part 101 , 102, 103 Liquid processing apparatus 121, 122 Processing tank 151 Open end 241 Inner end surface 301 Right end 311 Opening 801 First electrode 802 Second Electrode 803 Liquid 804 Pulse power source 805 Plasma 901 Anode electrode 902 Cathode electrode 903 Liquid to be treated 904 Gas B Backward BA Bubble D Downward F Forward F1 Swirl G Gas phase L Leftward direction L1 Water to be treated L2 Treatment liquid P Plasma R Right direction U when viewed from the rear direction Up direction X1 Virtual center axis of substantially cylindrical accommodation space

Claims (11)

The liquid introduced from the introduction part and containing the chlorine component is swirled around the central axis to generate a gas phase in the vicinity of the swirling center of the swirling flow of the liquid, and the liquid introduced from the introduction part is A treatment tank having a discharge portion that is swirled with an introduction portion to generate the swirl flow and then discharged as a treatment liquid;
A first electrode that is at least partially disposed in the processing tank and contacts the liquid in the processing tank;
A second electrode arranged to contact the liquid in the treatment tank;
A power source that applies a voltage between the first electrode and the second electrode to generate plasma in the gas phase to decompose the chlorine component of the liquid and generate a reforming component in the processing liquid; ,
A microbubble generating chamber having a vertical cross-sectional area larger than the opening of the discharge portion of the processing tank, and microbubbles or nanobubbles are discharged by discharging the processing liquid from the discharge portion of the processing tank in the microbubble generating chamber. A microbubble generating unit for generating and diffusing the generated microbubbles or nanobubbles in the treatment liquid;
Water to be treated, which contains water containing chlorine components and decomposes the chlorine components of the water with the reforming components of the treatment liquid supplied from the microbubble generator, at least as part of the liquid , A tank to be treated that is discharged toward the treatment tank;
A residual chlorine concentration sensor in the liquid for detecting a residual chlorine concentration contained in the liquid introduced from the introduction part of the treatment tank;
A pump capable of circulating the liquid introduced into the processing tank from the introduction part of the processing tank through the microbubble generating unit between the processing tank and the processing tank;
A control unit for driving and controlling the power source based on the detection result of the residual chlorine concentration sensor in the liquid,
When the residual chlorine concentration of the liquid exceeds an upper limit threshold based on the detection result of the residual chlorine concentration sensor in the liquid, the power source is driven by the control unit, and the introduction unit and the discharge unit are driven by the liquid. The plasma is generated in the gas phase of the swirling flow formed between the liquid and the chlorine component of the liquid is decomposed and the reforming component is generated, and the generated reforming component is converted into the treatment liquid. Dissolving and dispersing in the treatment liquid, introducing the treatment liquid into the treatment tank through the microbubble generating unit, and decomposing the chlorine component of the water held in the treatment tank, Introducing the treated water discharged after decomposing the chlorine component into the treatment tank as at least part of the liquid by the pump;
Liquid processing equipment. A chlorine injecting device that is disposed between the microbubble generating unit and the processing tank and imparts a chlorine component to the processing liquid supplied to the processing tank;
The liquid processing apparatus according to claim 1. The control unit drives the chlorine injection device by the control unit when the residual chlorine concentration of the liquid is less than a lower limit threshold based on the detection result of the residual chlorine concentration sensor in the liquid, Providing the chlorine component to the processing liquid supplied to the processing tank;
The liquid processing apparatus according to claim 2. A liquid detection sensor disposed between the processing tank and the processing tank and further detecting a liquid amount or a liquid pressure of the liquid introduced into the processing tank;
The control unit controls the power source based on a detection result of the liquid detection sensor;
The liquid processing apparatus as described in any one of Claims 1-3. The first electrode is disposed so as to be in contact with the gas phase generated in the vicinity of the swirling center of the swirling flow of the liquid, or to be positioned in the vicinity of the gas phase.
The liquid processing apparatus as described in any one of Claims 1-4. The liquid introduced from the introduction part of the treatment tank includes tap water and the treated water discharged from the treated tank.
The liquid processing apparatus as described in any one of Claims 1-5. The treatment tank has a cylindrical or frustoconical first inner wall that swirls the liquid supplied from the introduction section to generate the swirling flow,
The first electrode is disposed on or near the central axis of the first inner wall.
The liquid processing apparatus according to claim 6. The first electrode is disposed on one end side near the central axis or the central axis,
The second electrode is disposed on the other end side in the vicinity of the central axis or the central axis,
The introduction portion is disposed on the one end side of the central axis,
The discharge portion is disposed on the other end side of the central axis.
The liquid processing apparatus according to claim 7. The second electrode is a plate-like electrode disposed on a part of the first inner wall on the other end side of the first inner wall around the central axis or so as to surround the entire circumference of the central axis. Is,
The liquid processing apparatus according to claim 8. The second electrode is disposed on a side of the central axis of the first inner wall on the other end side of the first inner wall.
The liquid processing apparatus according to claim 8. The second electrode is a cylindrical electrode disposed so as to surround a part or the entire circumference of the central axis of the first inner wall on the other end side of the first inner wall.
The liquid processing apparatus according to claim 8.

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