JP2018194620A - Optical filter - Google Patents

Abstract

To eliminate a defect of an optical filter having conventional color reproducibility improvement characteristics to improve color reproducibility, and ensure ultraviolet ray shielding performance, unnecessary infrared ray shielding performance, and sensitivity of a near infrared sensor in various displays.SOLUTION: An optical filter according to the present invention has, within a light wavelength range of 380 nm or more and 725 nm or less, a first blocking band, a first transmission band, a second blocking band, a second transmission band, a third blocking band, a third transmission band, and a fourth blocking band, with respect to light made incident on the optical filter at one or more arbitrary angles selected from a range of 0° or more and 50° or less.SELECTED DRAWING: None

Description

The present invention relates to an optical filter used in a color liquid crystal display device, an organic EL color display device, a quantum dot color display device, a micro LED color display device, a color projector, a color imaging device, and a hologram display device. More specifically, the present invention relates to an optical filter having a color reproducibility improving characteristic that blocks a specific wavelength having low color purity of visible light.

In the liquid crystal display device, a liquid crystal layer sandwiched between two polarizing plates controls the amount of light passing through the first polarizing plate by controlling the degree of polarization of light passing through the first polarizing plate. The type using twisted nematic (TN) type liquid crystal is the mainstream. The liquid crystal display device can perform color display by providing a filter segment between two polarizing plates.

Other typical liquid crystal display devices include an in-plane switching (IPS) method in which a pair of electrodes are provided on one side of a base material, and electrolysis is applied in a direction parallel to the base material. Vertical alignment (VA) method that vertically aligns nematic liquid crystal with directionality, and Optically Convencence Bend (OCB) method that optically compensates by making optical axes of uniaxial retardation films orthogonal to each other Etc., and each has been put to practical use.

A color filter has two or more kinds of fine band (striped) filter segments of different hues arranged in parallel or intersecting on the surface of a transparent substrate such as resin or glass, or fine filter segments vertically and horizontally. It consists of things arranged in a fixed arrangement. In general, the filter segments are often formed of filter segments of three colors of red, green, and blue, and each filter segment is arranged in a predetermined arrangement for each hue from several microns to several hundred microns.

As a quality item required for a liquid crystal display device, color reproducibility is regarded as important. The color reproducibility of the color liquid crystal display device is determined by the color of light emitted from the red, green and blue filter segments, and the chromaticity points of the respective filter segments are (xR, yR), (xG, yG), When (xB, yB), the standard three primary colors, red, evaluated by the area of the triangle surrounded by these three points on the xy chromaticity diagram and defined by the US National Television System Committee (NTSC) The ratio to the area surrounded by (0.67, 0.33), green (0.21, 0.71), and blue (0.14, 0.08) (unit is%, hereinafter abbreviated as “NTSC ratio”). ). It is known that the color reproducibility increases when the color purity of each filter segment is increased (Non-Patent Document 1). However, sufficient color purity could not be obtained with the conventional filter segment alone.

In recent years, a light source unit using an organic electroluminescence (EL) element (hereinafter referred to as “OLED”) as a light emitter has been used. As an advantage of OLED, since light emission of the light source unit can be directly controlled, a polarizing plate is not required, and waste of energy can be significantly suppressed. As an OLED mechanism, color display is possible by directly turning on / off the light source of each pixel by a TFT (thin film transistor) or the like. An organic EL color display device has already been put on the market, for example, as “XEL-1” manufactured by Sony (see Patent Document 1). Color reproducibility is also important in organic EL color display devices (Patent Document 2). Even in an OLED, each conventional pixel cannot obtain a sufficient color purity. The same applies to a quantum dot color display device using a quantum dot light emitter instead of an organic EL light source and a micro LED using an inorganic LED.

In order to improve the color purity of these display devices, projectors, and holograms, color purity improving filters that block part of visible light are known (Patent Document 3, Patent Document 4, Patent Document 5, and Patent Document 6). However, these conventional color purity improving filters can be obtained that have both the effect of improving the color purity and sufficient transmittance of blue, green and red, and sufficient shielding of light having a wavelength of 400 nm or less. However, there is a problem that the display device is deteriorated by ambient light or ultraviolet light emitted from the backlight. Further, it has not been possible to obtain an effect of improving the color purity and sufficient transmittance of blue, green, and red while simultaneously achieving unnecessary near-infrared shielding properties with a wavelength of 700 nm or more. There was a problem that the near-infrared sensor in the vicinity caused malfunction due to near-infrared rays. In addition, it has not been possible to obtain an effect of improving the purity of color and sufficient transmittance of blue, green, and red while achieving sufficient transmittance of light having a specific wavelength of 800 nm to 1100 nm. It has been difficult to achieve both improved color purity and a near infrared sensor.

JP 2005-71735 A JP 2014-078037 A JP 57-178207 A JP-A-7-072450 JP 7-325301 A JP 2006-072249 A JP 2007-078771 A International Publication No. 2016/056485 JP 2009-300955 A JP2015-188792A

Yoichi Miyake “Introduction to Spectral Image Processing” Seiko Book Co., Ltd. 2006

The object of the present invention is to solve the above-described problems of the prior art and to improve both color reproducibility and ultraviolet shielding performance, unnecessary near-infrared shielding performance, and near-infrared sensor sensitivity in various display devices.

As a result of intensive studies to solve the above problems, the present inventors have improved the color reproducibility of the display device and shielded ultraviolet rays by using an optical filter that satisfies the following, shielding properties of unnecessary near infrared rays, The present inventors have found that compatibility with a near-infrared sensor is possible and have completed the present invention. Examples of aspects of the present invention are shown below.

The first stopband and the first transmission for light incident on the optical filter at any one or more angles selected from the range of 0 ° to 50 ° in the wavelength range of 380 nm to 725 nm. Having a first band, a second band, a second band, a second band, a third band, a third band, a third band, and a fourth band. And the fourth stop band do not include the same wavelength, and the first transmission band, the second transmission band, and the third transmission band do not include the same wavelength. .

According to the present invention, it is possible to improve color reproducibility of various display devices, shield ultraviolet rays, and achieve both near-infrared sensor sensitivity.

It is a figure which shows an example of the optical filter which concerns on this invention. It is a figure which shows an example using the optical filter which concerns on this invention for a color liquid crystal display device. It is a figure which shows an example using the optical filter which concerns on this invention for an organic electroluminescent color display apparatus. It is a figure which shows an example using the optical filter which concerns on this invention for a color projector display apparatus and a near-infrared sensor. It is a schematic diagram in the top view and the side view of an example which used the optical filter which concerns on this invention for a display apparatus and a near-infrared sensor. It is a graph which shows the transmittance | permeability of the color filter segment used for evaluation of the optical filter which concerns on this invention. It is a graph which shows emission intensity distribution according to wavelength of B-LED + YAG type | system | group fluorescent light source used for evaluation of the optical filter which concerns on this invention. It is a graph which shows the light emission intensity distribution according to wavelength of each color of the organic electroluminescent light source used for evaluation of the optical filter which concerns on this invention. It is a schematic diagram of the sensitivity evaluation of the near-infrared sensor used for evaluation of the optical filter which concerns on this invention. It is the transmittance | permeability measurement result according to wavelength of the light which injected from the perpendicular direction of the optical filter 1 in one Example. It is the transmittance | permeability measurement result according to wavelength of the light which injected into the 45 degree from the perpendicular direction of the optical filter 3 in one Example. It is the transmittance | permeability measurement result according to wavelength of the light which injected from the perpendicular direction of the optical filter 5 in the comparative example 2. FIG. It is the transmittance | permeability measurement result according to wavelength of the light which injected from the perpendicular direction of the optical filter 6 in the comparative example 3. FIG. It is the transmittance | permeability measurement result according to wavelength of the light which injected from the perpendicular direction of the optical filter 7 in the comparative example 4. FIG. It is the transmittance | permeability measurement result according to wavelength of the light which injected from the perpendicular direction of the optical filter 8 in the comparative example 5. FIG. It is the transmittance | permeability measurement result according to wavelength of the light which injected from the perpendicular direction of the glass plate which is a transparent base material in one Example.

Although embodiments of the present invention will be described with reference to the drawings, the drawings are provided merely for illustration, and the present invention is not limited to the drawings. It should be noted that the drawings are schematic, and the relationship between the thickness and the planar dimensions, the thickness ratio, and the like are different from the actual ones. Further, in the following description, constituent uses having the same or substantially the same function and configuration are denoted by the same reference numerals, and redundant description is omitted. The optical filter (hereinafter referred to as “optical filter”) in one embodiment of the present invention includes a base material 10 and a dielectric multilayer film 11.

[Characteristics of optical filter]
The optical filter has a first stop band and a first transmission band for light incident on the optical filter at an arbitrary angle within a range of 0 ° to 50 ° in light having a wavelength in the range of 380 nm to 725 nm. , Second stop band, second transmission band, third stop band, third transmission band, and fourth stop band.

The optical filter further includes a first stop band, a second stop band, a third stop band, and a fourth stop band of light incident on the optical filter at an arbitrary angle within a range of 0 ° to 50 °. Are preferably 20% or less, more preferably 10% or less. If the transmittance of the first blocking zone is 10% or less, sufficient ultraviolet shielding properties are obtained. If the transmittance of the second stop band and the third stop band is 10% or less, the filter has sufficient characteristics as a color purity improving filter. If the transmittance of the fourth blocking zone is 10% or less, malfunctions of the surrounding near infrared sensors can be sufficiently suppressed.

In the optical filter, the transmittance of the first transmission band, the second transmission band, and the third transmission band of light incident on the optical filter at an arbitrary angle within the range of 0 ° to 50 ° is 70 respectively. % Or more is preferable. More preferably, it is 80% or more, More preferably, it is 90% or more. If it is the said range, it will become easy to obtain favorable brightness | luminance as a color purity improvement filter.

In the optical filter, the first stop band preferably includes 380 nm and preferably has a wavelength of less than 420 nm. More preferably, it is less than 410 nm, More preferably, it is less than 405 nm. If it is the said range, it is preferable as a blue color purity improvement characteristic, fully shielding an ultraviolet-ray.

In the optical filter, it is preferable that the first transmission band has a wavelength including 450 nm. By setting the wavelength in the above range as the transmission band, it is preferable as a blue color purity improving characteristic.

In the optical filter, it is preferable that the second stop band has a wavelength including 490 nm. By setting the wavelength in the above range as the stop band, it is preferable as a color purity improving characteristic of blue and green light.

It is preferable that the optical filter further transmits a wavelength whose second transmission band includes 520 nm. By setting the wavelength in the above range as the transmission band, it is preferable as a green color purity improving characteristic. More preferably, the wavelength includes 510 nm to 530 nm.

In the optical filter, it is preferable that the third stop band has a wavelength including 580 nm. By setting the wavelength in the above range as the stop band, it is preferable as a color purity improving characteristic of green and red light.

In the optical filter, it is preferable that the third transmission band has a wavelength including 630 nm. By setting the wavelength in the above range as the transmission band, it is preferable as the red color purity improving characteristic.

In the optical filter, it is preferable that the fourth stop band has a wavelength including 710 nm. By setting the wavelength in the above range as a blocking band, it is preferable as a characteristic for improving red color purity while sufficiently blocking the wavelength causing the malfunction of the surrounding near infrared sensor.

It is preferable that the optical filter further has a fourth transmission band at 780 nm to 1100 nm. By setting the wavelength in the above range as the transmission band, it is possible to sufficiently secure the sensitivity of the near infrared sensor. More preferably, it has a transmission band at 840 nm to 950 nm. The transmittance of the fourth transmission band is preferably 70% or more. More preferably, it is 80% or more, More preferably, it is 90% or more.

It is preferable that the optical filter further has a fifth stop band at 950 nm to 1100 nm. By having a stop band at a wavelength in the above range, unnecessary light is prevented from entering the near-infrared sensor, which is useful for improving the sensitivity of the near-infrared sensor. The transmittance of the fifth stop zone is more preferably 20% or less, and even more preferably 10% or less.

The bandwidth of the transmission band is preferably 100 nm or less, and the bandwidth of the second stop band and the third stop band is preferably 100 nm or less. The bandwidth of the transmission band is more preferably 80 nm or less, and further preferably 70 nm or less. The bandwidth of the second stop band and the third stop band is more preferably 80 nm or less, and further preferably 70 nm or less. If the bandwidth of the transmission band is within the above range, the color purity of each color is high and good. If the bandwidths of the second stop band and the third stop band are in the above range, the color purity of each color is high and the luminance can be kept high.

The transition band between the first transmission band and the first stop band is 20 nm or less, the transition band between the first stop band and the second transmission band is 20 nm or less, the second transmission band and the second transmission band The transition band between the second transmission band and the third transmission band is 20 nm or less, the transition band between the second transmission band and the third transmission band is 20 nm or less, and the transition band between the third transmission band and the third transmission band is It is preferably 20 nm or less, and the transition band between the third stop band and the fourth transmission band is preferably 20 nm or less. More preferably, the transition band between the first transmission band and the first stop band is 15 nm or less, the transition band between the first stop band and the second transmission band is 15 nm or less, and the second transmission band The transition band between the band and the second stop band is 15 nm or less, the transition band between the second stop band and the third transmission band is 15 nm or less, and between the third transmission band and the third stop band. Is preferably 15 nm or less, and the transition band between the third stop band and the fourth transmission band is preferably 15 nm or less. If it is the said range, it is favorable as a color purity improvement filter.

[Base material]
As the base material for forming the optical filter, those having transparency are preferable. The term “transparency” as used in the present invention means that the average transmittance at a wavelength of 420 nm to 650 nm is 70% or more. The material of these base materials is not particularly limited as long as it has the above-mentioned transparency, for example, but is not limited to glass plate, tempered glass plate, phosphate glass, fluorophosphate glass, alumina glass, yttrium aluminate. And special glasses such as yttrium oxide, birefringent crystals such as quartz, lithium niobate, and sapphire, and transparent resins.

Further, the substrate may be composed of one layer or a plurality of layers, may be composed of one kind of material selected from the above materials, may be composed of a plurality of kinds, or may be a material appropriately mixed. At least one layer may have an ultraviolet absorber.

[Glass plate]
Examples of the glass plate include silicate glass, phosphate glass, copper phosphate glass, fluorophosphate glass, and copper fluorophosphate glass.

[Tempered glass plate]
Examples of the tempered glass plate include physical tempered glass, tempered laminated glass, and chemically tempered glass. Preferably, a chemically tempered glass that can be processed with a thin compressed layer and a thin base material is preferred. Examples of chemically tempered glass include Dragonrail (registered trademark) manufactured by Asahi Glass Co., and GORILLA (registered trademark) manufactured by Corning.

[Special glass]
Various commercially available products can be used as the phosphate glass and fluorophosphate glass, and as the alumina glass, Hi-Serum (registered trademark) manufactured by NGK Japan is mentioned. Examples of yttrium aluminate and yttrium oxide include those manufactured by Coors Tech.

[Transparent resin]
Transparent resins include polyester resins, polyether resins, acrylic resins, polyolefin resins, polycycloolefin resins, norbornene resins, polycarbonate resins, ene / thiol resins, epoxy resins, polyamide resins, Examples thereof include a polyimide resin, a polyurethane resin, and a polystyrene resin. Among these, norbornene resins, polyimide resins, and polyether resins are preferable. The refractive index of the transparent resin can be adjusted by adjusting the molecular structure of the raw material components. Specifically, a method of imparting a specific structure to the main chain or side chain of the polymer of the raw material component can be mentioned. The structure provided in the polymer is not particularly limited, and examples thereof include a norbornene skeleton and a fluorene skeleton.

As these transparent resins, commercially available products may be used. Commercially available products include acrylic resin, Ogsol (registered trademark) EA-F5003 (manufactured by Osaka Gas Chemical Co., Ltd., trade name, refractive index: 1.60), polymethyl methacrylate (refractive index: 1.49), Polyisobutyl methacrylate (refractive index: 1.48) (all are manufactured by Tokyo Chemical Industry Co., Ltd., trade name), BR50 (manufactured by Mitsubishi Rayon Co., Ltd., trade name, refractive index: 1.56) and the like. It is done.

As polyester resins, OKP4HT (refractive index: 1.64), OKP4 (refractive index: 1.61), B-OKP2 (refractive index: 1.64), OKP-850 (refractive index: 1.65). (All of the above are manufactured by Osaka Gas Chemical Co., Ltd., trade name), Byron (registered trademark) 103 (trade name, refractive index: 1.55 manufactured by Toyobo Co., Ltd.), LeXan (registered trademark) as a polycarbonate resin. ) ML9103 (manufactured by sabic, trade name, refractive index: 1.59), EP5000 (manufactured by Mitsubishi Gas Chemical Company, trade name, refractive index: 1.63), SP3810 (manufactured by Teijin Chemicals Ltd., trade name) , Refractive index 1.63), SP1516 (manufactured by Teijin Chemicals Ltd., trade name, refractive index 1.60), TS2020 (manufactured by Teijin Chemicals Ltd., trade name, refractive index 1.59), xylex (registered) 750) (Trade name, manufactured by sabic), as norbornene-based resin, ARTON (registered trademark) (manufactured by JSR Corporation, product name, refractive index: 1.51), ZEONEX (registered trademark) (manufactured by Nippon Zeon Co., Ltd.) , Trade name, refractive index: 1.53) and the like.

The polyether-based resin is a polymer obtained by a reaction that forms an ether bond in the main chain, and at least one structure selected from a group consisting of structural units represented by the following formulas (1) and (2) A polymer having unit (i) is preferred. Moreover, you may have at least 1 structural unit (ii) chosen from the group which consists of a structural unit represented by following formula (3).

In formula (1), R ^{1 to} R ⁴ each independently represent a monovalent organic group having 1 to 12 carbon atoms. a to d each independently represent an integer of 0 to 4, preferably 0 or 1, and more preferably 0.

Of the formula (2), R ¹ to R ⁴ and a~d are the same as R ¹ to R ⁴ and a~d each independently formula (1), Y represents a single bond, -SO ₂ -Or> C = O, R ⁷ and R ⁸ each independently represent a halogen atom, a monovalent organic group having 1 to 12 carbon atoms or a nitro group, and m represents 0 or 1. However, when m is 0, R ⁷ is not a cyano group. g and h each independently represent an integer of 0 to 4, preferably 0.

In Formula (3), R ⁵ and R ⁶ each independently represent a monovalent organic group having 1 to 12 carbon atoms, Z represents a single bond, —O—, —S—, —SO ₂ —, > C═O, —CONH—, —COO— or a divalent organic group having 1 to 12 carbon atoms, and n represents 0 or 1. e and f each independently represent an integer of 0 to 4, preferably 0.

The thickness of the substrate can be appropriately selected according to the desired application and is not particularly limited. However, the thickness is preferably 250 μm or less, more preferably 200 μm or less, and even more preferably 150 μm or less, and the thickness is within the above range. If it exists, the obtained display device can be thinned. Further, the thickness is preferably 30 μm or more, more preferably 40 μm or more. When the thickness is within the above range, the optical filter is less warped and a sufficiently thin display device can be obtained.

<Method for producing transparent resin layer>
The resin base material may be formed by, for example, melt molding or cast molding, and if necessary, manufactured by a method of coating a coating agent such as an antireflection agent, a hard coating agent and / or an antistatic agent after molding. May be.

(A) A melt-molded transparent resin layer is a method of melt-molding pellets obtained by melt-kneading a resin and a near-infrared absorbing dye, melting a resin composition containing the resin and the near-infrared absorbing dye. You may manufacture by the method of shape | molding, or the method of melt-molding the pellet obtained by removing a solvent from the resin composition containing a near-infrared absorption pigment | dye, resin, and a solvent. Examples of the melt molding method include injection molding, melt extrusion molding, and blow molding.

(B) The cast-molded transparent resin layer comprises a method of removing a solvent by casting a resin composition containing a near-infrared absorbing dye, a resin and a solvent on a suitable substrate, an antireflective agent, a hard coat agent and / or Alternatively, a method of casting a resin composition containing a coating agent such as an antistatic agent, a near-infrared absorbing dye, and a resin on an appropriate substrate, or an antireflection agent, a hard coat agent and / or an antistatic agent You may manufacture by the method of casting and hardening and drying a curable composition containing coating agents, such as an agent, a pigment | dye compound, and resin on a suitable base material.

When the substrate is a transparent resin, it can be obtained by peeling the transparent resin layer from the substrate, and unless the effect of the present invention is impaired, the laminate with the coating film is not peeled off from the substrate. It is good also as a material.

Furthermore, optical components such as glass plate, quartz or transparent plastic made by coating a resin composition and drying the solvent, or coating and curing and drying the curable composition. A transparent resin substrate may be directly formed on the substrate.

The amount of residual solvent in the substrate obtained by the above method should be as small as possible, and is usually 3% by weight or less, preferably 1% by weight or less, more preferably 0.5% by weight based on the weight of the transparent resin layer. % By weight or less. When the residual solvent amount is in the above range, a transparent resin base material that is less likely to change its deformation and properties and can easily exhibit a desired function is obtained. Moreover, it is desirable that the halogen residual solvent is 50 ppm or less from the concern of the surrounding electric circuit corrosion.

[Dielectric multilayer film]
As shown in FIG. 1, the optical filter 1 has a dielectric multilayer film 11 in which a high refractive index material layer 13 and a low refractive index material layer 14 are alternately stacked on at least one surface of a substrate 10. As shown in FIG. 1, the dielectric multilayer film 12 may be provided on the other surface of the substrate 10, so that the dielectric multilayer film may be provided on both surfaces of the substrate 10. It is more preferable to have a dielectric multilayer film on both sides because warpage is reduced. As a material constituting the high refractive index material layer 13 included in the dielectric multilayer film, a material having a refractive index of 1.7 or more may be used, and the range of the refractive index is normally 1.7 to 2.5. The material is selected. Examples of such materials include titanium oxide, zirconium oxide, tantalum pentoxide, niobium pentoxide, lanthanum oxide, yttrium oxide, zinc oxide, zinc sulfide, or indium oxide, and the like, and titanium oxide, tin oxide. And / or those containing a small amount of cerium oxide or the like (for example, 0% to 10% relative to the main component).

As a material constituting the low refractive index material layer 14 included in the dielectric multilayer film, a material having a refractive index of 1.6 or less may be used, and the range of the refractive index is usually 1.2 to 1.6. The material is selected. Examples of such materials include silica, alumina, lanthanum fluoride, magnesium fluoride, and sodium hexafluoride sodium.

The method of laminating the high refractive index material layer 13 and the low refractive index material layer 14 is not particularly limited as long as a dielectric multilayer film in which these material layers are laminated is formed. For example, directly on a resin substrate by CVD (Chemical Vapor Deposition) method, sputtering method, vacuum deposition method, ion-assisted deposition method or ion plating method, ALD (Atomic Layer Deposition) method, aerosol deposition method, etc. Alternatively, a dielectric multilayer film in which high refractive index material layers and low refractive index material layers are alternately stacked may be formed.

Further, the total number of layers of the high refractive index material layer and the low refractive index material layer in the dielectric multilayer film is desirably 5 to 60 layers, and preferably 10 to 50 layers.

Furthermore, when the base material is warped when the dielectric multi-layer film is formed, in order to eliminate this, a multi-layer dielectric film is formed on both surfaces of the base material. A method of irradiating an electromagnetic wave such as ultraviolet rays on the surface on which the film is formed may be employed. In addition, when irradiating electromagnetic waves, you may irradiate during formation of a dielectric multilayer film, and you may irradiate separately after formation of a dielectric multilayer film.

[Ultraviolet absorber]
The ultraviolet absorbers that can be used in the present invention are azomethine compounds, indole compounds, benzotriazole compounds, triazine compounds, merophthalocyanine compounds, oxazole compounds, naphthylimide compounds, oxadiazole compounds, oxazine compounds, oxazolidine compounds. And at least one selected from the group consisting of anthracene compounds, and preferably has at least one absorption maximum at a wavelength of 300 nm to 400 nm.

<Other ingredients>
The transparent resin layer is added within the range not impairing the effects of the present invention, and further added with an antioxidant, an ultraviolet absorber, a dispersant, a flame retardant, a plasticizer, a heat stabilizer, a light stabilizer, a metal complex compound, and the like. An agent may be contained. Moreover, when manufacturing a resin-made base material by the above-mentioned cast shaping | molding, you may make manufacture of a resin-made base material easy by adding a leveling agent and an antifoamer. These other components may be used alone or in combination of two or more.

Examples of the antioxidant include 2,6-di -t- butyl-4-methylphenol, 2,2 _{'- dioxy-3,3'} - di -t- butyl-5,5 _'- dimethyldiphenylmethane, and tetrakis [Methylene-3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate] methane. These additives may be mixed with a resin or the like when producing a resin substrate, or may be added when producing a resin. Further, the addition amount is appropriately selected according to the desired properties, but is usually 0.01 parts by weight to 5.0 parts by weight, preferably 0.05 parts by weight to 100 parts by weight of the resin. 2.0 parts by weight.

As the ultraviolet absorber, for example, TINUVIN 326 (trade name, manufactured by BASF), BONASORB UA3911 (trade name, manufactured by Orient Chemical Co., Ltd.) or the like may be used.

[Other functional membranes]
The optical filter is a functional film such as an antireflection film, a hard coat film or an antistatic film for the purpose of improving the surface hardness, improving the chemical resistance, preventing antistatic and scratching, etc., as long as the effects of the present invention are not impaired. May be provided as appropriate.

The optical filter of the present invention may include one layer made of a functional film or two or more layers. When the optical filter of the present invention includes two or more layers composed of functional films, it may include two or more similar layers or two or more different layers.

The method of laminating the functional film is not particularly limited, and examples thereof include a method of melt-molding or cast-molding a coating agent such as an antireflection agent, a hard coating agent and / or an antistatic agent. it can.

Alternatively, the composition may be produced by applying a curable composition containing a coating agent or the like on a resin substrate or an infrared reflective film with a bar coater or the like and then curing the composition by ultraviolet irradiation or the like.

Examples of the coating agent include ultraviolet (UV) / electron beam (EB) curable resin and thermosetting resin, and specifically, vinyl compounds, urethane-based, urethane acrylate-based, acrylate-based, and epoxy-based resins. And epoxy acrylate resins. Examples of the curable composition containing these coating agents include vinyl, urethane, urethane acrylate, acrylate, epoxy, and epoxy acrylate curable compositions.

Examples of components contained in the urethane-based or urethane acrylate-based curable composition include tris (2-hydroxyethyl) isocyanurate tri (meth) acrylate, bis (2-hydroxyethyl) isocyanurate di (meth) acrylate, and molecules. Examples thereof include oligourethane (meth) acrylates having two or more (meth) acryloyl groups. These components may be used alone or in combination of two or more. Furthermore, oligomers or polymers such as polyurethane (meth) acrylate and oligomers or polymers such as polyester (meth) acrylate may be blended.

Examples of vinyl compounds include vinyl acetate, vinyl propionate, divinylbenzene, ethylene glycol divinyl ether, diethylene glycol divinyl ether, and triethylene glycol divinyl ether, but are not limited to these examples. . These components may be used alone or in combination of two or more.

The component contained in the epoxy-based or epoxy acrylate-based curable composition is not particularly limited, but glycidyl (meth) acrylate, methyl glycidyl (meth) acrylate, and oligoepoxy having two or more (meth) acryloyl groups in the molecule. (Meth) acrylates and the like can be mentioned. These components may be used alone or in combination of two or more. Furthermore, an oligomer or polymer such as polyepoxy (meth) acrylate may be blended.

Commercial products of coating agents (curable compositions containing coating agents, etc.) include Toyo Ink Manufacturing Co., Ltd. LCH and LAS; Arakawa Chemical Industries, Ltd. Beam Set; Daicel-Cytech Co., Ltd. EBECRYL, UVACURE; JSR Corporation For example, company-made Opstar.

Moreover, the curable composition may contain the polymerization initiator. As the polymerization initiator, a known photopolymerization initiator or thermal polymerization initiator may be used, and a photopolymerization initiator and a thermal polymerization initiator may be used in combination. A polymerization initiator may be used individually by 1 type, and may use 2 or more types together.

In the curable composition, the blending ratio of the polymerization initiator is preferably 0.1% by weight to 10% by weight, more preferably 0.5% by weight to 10% by weight when the total amount of the curable composition is 100% by weight. % By weight, more preferably 1% by weight to 5% by weight. When the blending ratio of the polymerization initiator is within the above range, it is possible to obtain a functional film such as an antireflective film, a hard coat film or an antistatic film having excellent curing characteristics and handleability of the curable composition and having a desired hardness. it can.

Furthermore, an organic solvent may be added to the curable composition as a solvent, and known organic solvents may be used. Specific examples of organic solvents include alcohols such as methanol, ethanol, isopropanol, butanol and octanol; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone; ethyl acetate, butyl acetate, ethyl lactate, γ-butyrolactone, propylene Esters such as glycol monomethyl ether acetate and propylene glycol monoethyl ether acetate; Ethers such as ethylene glycol monomethyl ether and diethylene glycol monobutyl ether; Aromatic hydrocarbons such as benzene, toluene and xylene; Dimethylformamide, dimethylacetamide, N- Examples include amides such as methylpyrrolidone. These solvents may be used alone or in combination of two or more.

The thickness of the functional film is preferably 0.1 μm to 20 μm, more preferably 0.5 μm to 10 μm, and particularly preferably 0.7 μm to 5 μm.

In addition, for the purpose of improving the adhesion between the resin substrate and the functional film and / or the dielectric multilayer film and the adhesion between the functional film and the dielectric multilayer film, the surface of the resin substrate and the functional film is corona. Surface treatment such as treatment or plasma treatment may be performed.

In the case where a birefringent crystal such as quartz, lithium niobate, sapphire, or the like is used as the material of the base material 10, the above material can impart the function of a wave plate to the optical filter according to the present embodiment. As a result, the number of parts can be reduced, which is particularly effective for reducing the size and thickness of a display device such as a projector.

[Use of optical filter]
Since the optical filter of the present invention transmits blue, green, and red light with high color purity, it is useful for color liquid crystal display devices, organic EL color display devices, micro LED display devices, color projectors, and the like. In addition to blue, green, and red having high color purity, a transmission band can be provided at 780 nm to 1100 nm, so that it is also useful for a distance measuring sensor using blue, green, red, and near infrared lasers.

FIG. 2 is a diagram illustrating an example in which the optical filter according to the present invention is used in a color liquid crystal display device. In FIG. 2, 101 is an optical filter of the present invention, 102 and 109 are polarizing plates, 103 and 108 are holding substrates, 104 is a light shielding portion, 105 is a common electrode, 106 is a liquid crystal layer, 107 is an insulating layer, 110 is a light source, 111 is a signal electrode, 112 is a pixel electrode, 113 is a sealing layer, 114 and 115 are light distribution films, 116 is a blue color filter segment, 117 is a green color filter segment, and 118 is a red color filter segment. When the optical filter according to the present invention is applied to, for example, a color liquid crystal display device, the optical filter 101 according to the present invention is provided on the front side (opposite side of the light source 110, light emission side) of the display device as shown in FIG. It is possible to improve the color reproducibility of displayed colors, prevent the penetration of ultraviolet rays into the liquid crystal display device, and prevent the emission of near infrared rays that may cause the malfunction of the surrounding near infrared sensor. Although FIG. 2 shows an example in which the optical filter 101 of the present invention is provided in the forefront portion of the display device, the position where the optical filter 101 is provided is not limited to the forefront portion.

FIG. 3 is a diagram showing an example in which the optical filter according to the present invention is used in an organic EL color display device. In FIG. 3, 201 is an optical filter according to the present invention, 202 is a sealing layer, 203 is a cathode layer, 204 is a bank, 205 is an insulating layer, 206 is a holding substrate, 207 is an electron injection layer, 208 is a hole transport layer, 209 is a hole injection layer, 210 is a transparent electrode, 211 is an anode layer, 212 is a blue light emitting layer, 213 is a green light emitting layer, and 214 is a red light emitting layer. When the optical filter according to the present invention is applied to, for example, an organic EL color display device, color reproduction displayed by providing the optical filter 201 according to the present invention on the front side (light emitting side) of the display device as shown in FIG. And the penetration of ultraviolet rays into the organic EL display device can be prevented. Although FIG. 3 shows an example in which the optical filter 201 of the present invention is provided at the forefront of the display device, the position at which the optical filter 201 is provided is not limited to the forefront.

FIG. 4 is a diagram showing an example in which the optical filter according to the present invention is used for a color projector display device and a near infrared sensor. In FIG. 4, 301 is an optical filter according to the present invention, 302 is a light source for a near infrared sensor, and 303 is a light source. For example, when the optical filter 301 according to the present invention is applied to a color projector, the optical filter 301 may be provided in the front portion (light emission side) of the light source 303 as shown in FIG. The optical filter 301 may be designed at an arbitrary angle, or may be designed assuming that light is incident obliquely as shown in FIG.

FIG. 5 is a schematic view in an upper surface view and a side view of an example in which the optical filter according to the present invention is used for the display device and the near infrared sensor. FIG. 5 shows an aspect in which the display device 402 is provided with the optical filter 401 and the near-infrared sensor 403 according to the present invention. For example, the optical filter 401 according to the present invention may be used by covering the entire display device 402 and near-infrared sensor 403 as shown in FIG. When the optical filter 401 according to the present invention covers the entire display device 402 and the near-infrared sensor 403, it is preferable because the manufacturing method is simplified and the number of steps is reduced. In order to enable a configuration that covers the entire display device 402 and the near-infrared sensor 403, the display device 402 and the near-infrared sensor 403 may be used as an integrated type.

[Transmission band]
The transmission band according to the present invention represents a wavelength region having a transmittance of 70% or more continuously for 1 nm or more. The transmission band represents a wavelength region that forms the transmission band.

[Stop zone]
The stop band according to the present invention represents a wavelength region in which the transmittance is 20% or less continuously for 1 nm or more. The stop band represents a wavelength region that forms the stop band.

[Transition zone]
The transition band according to the present invention represents a wavelength region having a transmittance of less than 70% continuously for 1 nm or more and a transmittance of 20% or more. The transition band represents a wavelength region that forms the transition band.

[Color filter segment]
The color filter segments that form blue, green, and red may be obtained by a generally known method. For example, the methods described in Patent Document 5, Patent Document 6, Patent Document 7, Patent Document 8, and the like may be used. May be obtained. For evaluation according to the present invention, blue, green, and red color filter segments having transmittance characteristics shown in FIG. 6 were used.

[light source]
Depending on the display device, various commonly known light sources may be used as the backlight. For example, a C light source, a B-LED + YAG phosphor light source, a D65 light source, an organic EL light source, a laser light source, or the like may be used. Although it does not specifically limit as a B-LED + YAG type | system | group fluorescent light source as evaluation based on this invention, You may use the light source known by patent document 9 grade | etc.,. As the B-LED + YAG phosphor light source as an evaluation according to the present invention, a backlight having the light emission characteristics shown in FIG. 7 was used. In FIG. 7, the relative intensity when the emission intensity of the wavelength with the strongest emission intensity is 1 and the emission intensity of the wavelength with the weakest emission intensity is 0 is the normalized intensity (vertical axis in FIG. 7). Although it does not specifically limit as an organic EL light source, You may use the light source known by patent document 10 grade | etc.,. As an organic EL light source as an evaluation according to the present invention, an organic EL having light emission characteristics shown in FIG. 8 was used. In FIG. 8, the relative intensity when the emission intensity of the wavelength with the strongest emission intensity is 1 and the emission intensity of the wavelength with the weakest emission intensity is 0 is the normalized intensity (vertical axis in FIG. 8).

[Near infrared sensor]
Near-infrared sensors include optical radar method (time-of-flight method), spatial coding method, illuminance difference stereo method, stereo image method, coded projection method, distance sensor, fingerprint authentication sensor, iris authentication sensor, vein authentication sensor Further, a face authentication sensor, an individual identification sensor, a near infrared communication receiver can be used, and a commercially available product may be used. Examples of the near infrared sensor include TB-7Z-TCDK-GC2 manufactured by Tokyo Electron Device Co., Ltd., Sentis-ToF-M100 manufactured by Positive One Co., Ltd., and the like. Depending on the wavelength of the sensor, the wavelength of the fourth transmission band of the optical filter may be adjusted within a range that does not impair the effects of the present invention.

EXAMPLES Hereinafter, although an Example demonstrates this invention, this invention is not limited at all by these Examples.

<Evaluation method>
[optical properties]
The optical characteristics of the substrate and the optical filter were measured using an ultraviolet visible spectrophotometer (U-4100, manufactured by Hitachi High-Technology Corporation). In the measurement, the slit width was 1 nm, the scanning wavelength was 1 nm, and the average value of each transmittance of the P-polarized light source and the S-polarized light source was used as the transmittance of the optical filter.

[Color reproducibility]
Color display method defined in JISZ8701—The X, Y, Z of each color was calculated using the XYZ color system, and (x, y) was calculated from the X, Y, Z. That is, it was calculated from the following formula (4).

Here, S (λ) is the spectral distribution of light from various light sources used for color display, x (λ), y (λ), x (λ) are color matching functions defined in JISZ8701, and T (λ) is the spectral distribution. Transmittance. After calculating (x, y) for each color, a region surrounded by three points of blue, green, and red and three points (0.67, 0.33), (0.21, 0.71), (0 .14, 0.08) was evaluated as the color reproducibility, which was the ratio of the area to the area surrounded by.

[Near infrared sensor sensitivity]
As a near-infrared sensor sensitivity evaluation according to the present invention, a time-of-flight distance measuring sensor having two 800 nm laser light sources or two 850 nm laser light sources and a halogen light source (ALA-100 manufactured by Asahi Spectroscopic Co., Ltd.) are arranged as shown in FIG. did. FIG. 9 is a schematic diagram of sensitivity evaluation of a near-infrared sensor used for evaluation of an optical filter according to the present invention. In FIG. 9, 500 is a distance measuring near infrared sensor, 501 and 502 are 800 nm laser light sources or 850 nm laser light sources, 503 is a lens, 504 is an optical filter, 505 is a subject, and 506 is a halogen light source. When the distance of an object (subject 505) 6 mm away can be measured through the optical filter according to the present invention, ◯, when the distance of an object 6 mm away cannot be measured, and the distance of an object 4 mm away can be measured Δ 4 mm It was set as x when the distance of the distanced object cannot be measured.

[Example 1]
100 parts by weight of norbornene resin “ARTON, refractive index 1.52, glass transition temperature 160 ° C.” manufactured by JSR, 0.1 parts by weight of oxazole-based UV absorber “Uvitex OB” manufactured by BASF, methylene chloride And dissolved to obtain a solution having a solid content of 30%. Next, the obtained solution was cast on a flat glass plate, peeled after drying at 50 ° C. for 8 hours and further under reduced pressure at 140 ° C. for 3 hours, and was a rectangular transparent substrate having a thickness of 0.1 mm and a side of 60 mm A was obtained. The average transmittance at a wavelength of 420 nm to 650 nm measured from the vertical direction of the transparent substrate A was 90% and had transparency. Moreover, the average transmittance | permeability of wavelength 780nm-1100nm measured from the perpendicular direction of the transparent base material A was 91%, and had transparency of near infrared rays. Subsequently, a dielectric multilayer film of design 1 consisting of a dielectric multilayer film at a deposition temperature of 120 ° C. on both surfaces of the obtained transparent substrate A using an ion-assisted vacuum deposition apparatus [silica (SiO ₂ : 550 nm refractive index). 1.45) layer and titania (TiO ₂ : 550 nm refractive index 2.45) layer] were formed to obtain an optical filter 1 having a thickness of 0.106 mm. Table 1 shows the film thickness design of design 1.

The transmittance characteristics of light incident from the vertical direction of the optical filter 1 are shown in FIG. The optical filter 1 has a first stop band, a first transmission band, a second stop band, a second transmission band, a third stop band, a third band in a wavelength range of 380 nm to 725 nm at 0 ° incidence. It can be seen that it has a transmission band and a fourth stop band.

Table 2 shows the results of evaluating the color reproducibility of light transmitted through the color filter segment and the optical filter 1 using the C light source as the light source, and the results of evaluating the near infrared sensor sensitivity using the 800 nm laser light source. The obtained optical filter had good characteristics such as an effect of improving color reproducibility, near infrared sensor sensitivity, and ultraviolet shielding property.

[Example 2]
The glass substrate whose transmittance characteristics of light incident from the vertical direction are shown in FIG. 16 (Shot Japan Co., Ltd., D263, thickness 0.1 mm, average transmittance of 420 nm to 650 nm in the vertical direction is 91%, 780 nm to 1100 nm. The dielectric multilayer film of the design 1 consisting of a dielectric multilayer film at a deposition temperature of 120 ° C. [silica (SiO ₂ : refractive index of 1.550 nm) on both surfaces with an average transmittance of 91%) using an ion-assisted vacuum deposition apparatus. 45) and titania (TiO ₂ : 550 nm refractive index 2.45) layer] were formed, and an optical filter 2 having a thickness of 0.106 mm was obtained. The optical filter 2 is incident at 0 ° as in the first embodiment, and has a first stop band, a first transmission band, a second stop band, a second transmission band, a third band in a wavelength range of 380 nm to 725 nm. And a fourth transmission band and a fourth transmission band. Table 2 shows the results of evaluating the color reproducibility of the light transmitted through the color filter segment and the optical filter 2 and the sensitivity of the near-infrared sensor using an 800 nm laser light source, using a B-LED + YAG phosphor light source as the light source. Show. The obtained optical filter had good characteristics such as an effect of improving color reproducibility, near infrared sensor sensitivity, and ultraviolet shielding property.

[Example 3]
The transmittance characteristics of light incident from the vertical direction are shown in FIG. 16 on both surfaces of a glass substrate (D263, manufactured by Shot Japan Co., Ltd., thickness 0.1 mm) using an ion-assisted vacuum deposition apparatus at a deposition temperature of 120 ° C. Dielectric multilayer film of design 2 composed of dielectric multilayer films [silica (SiO ₂ : refractive index 1.45 at 550 nm) layers and titania (TiO ₂ : refractive index 2.45 at 550 nm) layers are alternately laminated. The optical filter 3 having a thickness of 0.106 mm was obtained. Table 3 shows the film thickness design of Design 2.

FIG. 11 shows the transmittance characteristics of light incident on the optical filter 3 from a direction 45 ° from the vertical direction. The optical filter 3 has a first stopband, a first transmission band, a second stopband, a second stopband in the wavelength range of 380 nm to 725 nm at an incident angle of 45 ° from the vertical direction of the optical filter. It had a transmission band, a third stop band, a third transmission band, and a fourth stop band. Table 2 shows the results of evaluating the color reproducibility of the light transmitted through the optical filter 3 at 45 ° using the organic EL illuminant and the results of evaluating the near-infrared sensor sensitivity using the 850 nm laser light source. The obtained optical filter had good characteristics such as an effect of improving color reproducibility, sensitivity of near infrared sensor, and ultraviolet shielding property.

[Comparative Example 1]
Methylene chloride was added and dissolved in 100 parts by weight of norbornene resin “ARTON, refractive index 1.52, glass transition temperature 160 ° C.” manufactured by JSR to obtain a solution having a solid content of 30%. Next, the obtained solution was cast on a smooth glass plate, peeled off after drying at 50 ° C. for 8 hours and further under reduced pressure at 140 ° C. for 3 hours to form a dielectric multilayer film having a thickness of 0.1 mm and a side of 60 mm. The optical filter 4 which does not have was obtained. Table 2 shows the results of evaluating the color reproducibility of the light transmitted through the color filter segment and the optical filter 4 and the near-infrared sensor sensitivity, using the C light source as the light source. The obtained optical filter 4 was not suitable because it did not have the effect of improving color reproducibility, the near infrared sensor sensitivity, and the ultraviolet shielding property.

[Comparative Example 2]
Methylene chloride was added and dissolved in 100 parts by weight of norbornene resin “ARTON, refractive index 1.52, glass transition temperature 160 ° C.” manufactured by JSR to obtain a solution having a solid content of 30%. Next, the obtained solution was cast on a smooth glass plate and peeled after drying at 50 ° C. for 8 hours and further under reduced pressure at 140 ° C. for 3 hours to obtain a transparent substrate having a thickness of 0.1 mm and a side of 60 mm. It was. Subsequently, a dielectric multilayer film of design 3 consisting of a dielectric multilayer film at a deposition temperature of 120 ° C. [silica (SiO ₂ : refractive index of 550 nm) on both surfaces of the obtained transparent substrate using an ion-assisted vacuum deposition apparatus. 1.45) layers and titania (TiO ₂ : 550 nm refractive index 2.45) layers] were formed to obtain an optical filter 5 having a thickness of 0.106 mm. Table 4 shows the film thickness design of Design 3.

FIG. 12 shows the transmittance characteristics of light incident from the vertical direction of the optical filter 5. It can be seen that the optical filter 5 does not have a stop band near 490 nm. Table 2 shows the results of evaluating the color reproducibility of the light transmitted through the color filter segment and the optical filter 5 and the sensitivity of the near-infrared sensor using the C light source as the light source. The obtained optical filter 5 was suitable for near-infrared sensor sensitivity and ultraviolet shielding property, but was not suitable for improving the color reproducibility.

[Comparative Example 3]
Methylene chloride was added and dissolved in 100 parts by weight of norbornene resin “ARTON, refractive index 1.52, glass transition temperature 160 ° C.” manufactured by JSR to obtain a solution having a solid content of 30%. Next, the obtained solution was cast on a smooth glass plate and peeled after drying at 50 ° C. for 8 hours and further under reduced pressure at 140 ° C. for 3 hours to obtain a transparent substrate having a thickness of 0.1 mm and a side of 60 mm. It was. Subsequently, the dielectric multilayer film of design 4 consisting of a dielectric multilayer film at a deposition temperature of 120 ° C. [silica (SiO ₂ : refractive index of 550 nm) on both surfaces of the obtained transparent substrate using an ion-assisted vacuum deposition apparatus. 1.45) layer and titania (TiO ₂ : 550 nm refractive index 2.45) layer] were formed to obtain an optical filter 6 having a thickness of 0.106 mm. Table 5 shows the film thickness design of design 4.

FIG. 13 shows the transmittance characteristics of light incident from the vertical direction of the optical filter 6. It can be seen that the optical filter 6 does not have a stop band near 590 nm. Table 2 shows the results of evaluating the color reproducibility of the light transmitted through the optical filter 6 and the sensitivity of the near-infrared sensor using the organic EL illuminant as a light source. The obtained optical filter 6 was suitable for near-infrared sensor sensitivity and ultraviolet shielding property, but was not suitable for improving the color reproducibility.

[Comparative Example 4]
A dielectric multilayer film of design 5 consisting of a dielectric multilayer film at a deposition temperature of 120 ° C. on both surfaces of a glass substrate (Shot Nippon Co., Ltd., D263, thickness 0.1 mm) at an evaporation temperature of 120 ° C. [silica (SiO ₂ : 550 nm refractive index 1.45) layer and titania (TiO ₂ : 550 nm refractive index 2.45) layer] are formed, and an optical filter having a thickness of 0.106 mm 7 was obtained. Table 6 shows the film thickness design of design 5.

FIG. 14 shows the transmittance characteristics of light incident on the optical filter 7 from the vertical direction. It can be seen that the optical filter 7 does not have a stop band near 710 nm. Table 2 shows the results of evaluating the color reproducibility of the light transmitted through the color filter segment and the optical filter 7 and the evaluation of the near-infrared sensor sensitivity using the C light source as the light source. The obtained optical filter 7 had a color reproducibility improving effect and an ultraviolet shielding property, but the near infrared sensor sensitivity was unsuitable.

[Comparative Example 5]
A dielectric multilayer film of design 6 consisting of a dielectric multilayer film at a deposition temperature of 120 ° C. on both surfaces of a glass substrate (Shot Nippon Co., Ltd., D263, thickness 0.1 mm) at an evaporation temperature of 120 ° C. [silica (SiO ₂ : 550 nm refractive index 1.45) layer and titania (TiO ₂ : 550 nm refractive index 2.45) layer] are formed, and an optical filter having a thickness of 0.106 mm 8 was obtained. Table 7 shows the film thickness design of design 6.

FIG. 15 shows the transmittance characteristics of light incident on the optical filter 8 from the vertical direction. It can be seen that the optical filter 8 does not have a stop band near 490 nm or a stop band near 590 nm. Table 2 shows the results of evaluating the color reproducibility of the light transmitted through the optical filter 8 using the organic EL illuminant as the light source and the results of evaluating the near-infrared sensor sensitivity. The obtained optical filter 8 had an ultraviolet shielding property, but the effect of improving the color reproducibility and the near infrared sensor sensitivity were unsuitable.

The optical filter of the present invention is useful as a color liquid crystal display device, an organic EL color display device, a quantum dot color display device, a micro LED color display device, a color projector, a color imaging device, and a hologram display device. In particular, personal digital assistants, smartphones, smart glasses, virtual reality display devices, digital video cameras, personal computers, TVs, car navigation systems, video games, portable game machines, fingerprint authentication systems, iris authentication systems, face authentication systems, distance measurement sensors Useful for distance measuring cameras, digital music players, etc.

1: optical filter, 10: base material, 11, 12: dielectric multilayer film, 101: optical filter, 102, 109: polarizing plate, 103, 108: holding substrate, 104: light shielding part, 105: common electrode, 106: Liquid crystal layer, 107: insulating layer, 110: light source, 111: signal electrode, 112: pixel electrode, 113: sealing layer, 114, 115: light distribution film, 116: blue color filter segment, 117: green color filter segment, 118: Red color filter segment, 201: Optical filter, 202: Sealing layer, 203: Cathode layer, 204: Bank, 205: Insulating layer, 206: Holding substrate, 207: Electron injection layer, 208: Hole transport layer, 209 : Hole injection layer, 210: transparent electrode, 211: anode layer, 212: blue light emitting layer, 213: green light emitting layer, 214: red light emitting layer Layer: 301: Optical filter, 302: Light source for near infrared sensor, 303: Light source, 401: Example of optical filter, 402: Display device, 403: Near infrared sensor, 500: Distance measurement near infrared sensor, 501, 502: 800 nm LED Light source, 503: lens, 504: optical filter, 505: subject, 506: halogen light source

Claims (14)

The first stopband and the first transmission for light incident on the optical filter at any one or more angles selected from the range of 0 ° to 50 ° in the wavelength range of 380 nm to 725 nm. Band, second stop band, second transmission band, third stop band, third transmission band, and fourth stop band, wherein the first stop band, the second stop band, The third stop band and the fourth stop band do not include the same wavelength, and the first transmission band, the second transmission band, and the third transmission band do not include the same wavelength. An optical filter characterized by that. 2. The optical according to claim 1, wherein transmittances of the first stop band, the second stop band, the third stop band, and the fourth stop band are each 20% or less. filter. The optical filter according to claim 1 or 2, wherein transmittances of the first transmission band, the second transmission band, and the third transmission band are 70% or more, respectively. The optical filter according to any one of claims 1 to 3, wherein the first stop band has a wavelength including 380 nm and a wavelength of less than 420 nm. The optical filter according to any one of claims 1 to 4, wherein the first transmission band has a wavelength including 450 nm. The optical filter according to claim 1, wherein the second stop band has a wavelength including 490 nm. The optical filter according to claim 1, wherein the second transmission band has a wavelength including 520 nm. The optical filter according to claim 1, wherein the third stop band has a wavelength including 580 nm. The optical filter according to any one of claims 1 to 8, wherein the third transmission band has a wavelength including 630 nm. The optical filter according to any one of claims 1 to 9, wherein the fourth stop band has a wavelength including 710 nm. 11. The optical filter according to claim 1, wherein the optical filter has a fourth transmission band in a light wavelength range of 780 nm to 1100 nm. 11. The optical filter according to claim 1, wherein the optical filter has a fifth stop band in a light wavelength range of 900 nm to 1100 nm. 13. The bandwidth of each of the transmission bands is 100 nm or less, and the bandwidth of the second stop band and the third stop band is 100 nm or less, respectively. The optical filter according to any one of the above. The transition region between the first transmission band and the first stop band is 20 nm or less, the transition region between the first stop band and the second transmission band is 20 nm or less, and the second The transition region between the transmission band and the second stop band is 20 nm or less, the transition region between the second stop band and the third transmission band is 20 nm or less, the third transmission band and the 14. The transition region between the third stop band is 20 nm or less, and the transition region between the third stop band and the fourth transmission band is 20 nm or less. The optical filter according to any one of the above.