JP2018164103A - Plasma resistant member - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a plasma resistant member capable of enhancing close adhesion strength or close adhesion force of a coating film covering an inner wall of a chamber or reducing the number of particles.SOLUTION: Provided is a plasma resistant member which includes: a base material; and a layer structure formed on a surface of the base material, including polycrystalline yttria, and having plasma resistance. The layer structure includes: a first uneven structure; and a second uneven structure which is formed superimposed on the first uneven structure and has unevenness which is finer than that in the first uneven structure.SELECTED DRAWING: Figure 1

Description

Aspects of the present invention generally relate to a plasma-resistant member, and more specifically to a plasma-resistant member used in a semiconductor manufacturing apparatus that performs processes such as dry etching, sputtering, and CVD in a chamber.

2. Description of the Related Art In a semiconductor manufacturing process, there is a demand for reduction in particles of a workpiece and improvement in yield by reducing defects in a device to be manufactured.

On the other hand, there is an apparatus for manufacturing an electronic device in which the ceiling portion of the chamber is made of quartz glass, and the average surface roughness of the minute irregularities formed on the inner surface of the ceiling portion is 0.2 to 5 μm (Patent Document) 1). In addition, there is a plasma-resistant member that does not have pores or grain boundary layers and suppresses or reduces the occurrence of degranulation from the plasma-resistant member (Patent Document 2). Also, plasma reactor components having a plasma sprayed coating of ceramic or polymer material on the plasma exposed surfaces of the plasma reactor components, and surface roughness characteristics that promote adhesion of polymer deposits There is a component part of a plasma reactor (Patent Document 3). According to the components of the plasma reactor described in Patent Document 3, particle contamination during processing can be reduced. Further, SiO2 or periodic table 3rd is formed on the surface of the substrate made of the silicon nitride sintered body.
There is a plasma-resistant member formed by forming a corrosion-resistant surface layer made of at least one of metal fluoride, oxide and nitride through an intermediate layer made of a complex oxide of a group a element and silicon ( Patent Document 4). According to the plasma-resistant member described in Patent Document 4, since the silicon nitride-based sintered body has a lower loss and a higher strength, the corrosion resistance is further improved, and the reliability against breakage is increased.

During the semiconductor manufacturing process, the inner wall of the chamber may be covered substantially uniformly with a precoat film (film) in order to reduce particles. The precoat film is formed of a material that does not adversely affect the semiconductor device. When covering the inner wall of the chamber almost uniformly with a coating,
It is necessary to increase the adhesion strength or adhesion of the coating so that the coating is difficult to peel off. Also,
Even if reaction products or particles generated in the chamber are generated, the coating covering the chamber needs to attach and capture the reaction products and particles on the surface of the coating itself. In recent years, fine patterning of semiconductor devices has progressed, and control of particles at the nano level is required.

Japanese Patent No. 3251215 Japanese Patent No. 3864958 JP 2012-54590 A JP 2001-240482 A

It is an object of the present invention to provide a plasma-resistant member capable of increasing the adhesion strength or adhesion force of a coating covering the inner wall of a chamber or reducing particles.

1st invention is equipped with the base material and the layered structure which is formed in the surface of the said base material and has yttria polycrystal, and has plasma resistance, The said layered structure is the 1st uneven structure, A plasma-resistant member comprising: a second concavo-convex structure which is formed so as to overlap with the first concavo-convex structure and has finer concavo-convex structure than the first concavo-convex structure.

According to this plasma-resistant member, the inner wall of the chamber can be substantially uniformly covered with a precoat film (coating) that does not adversely affect the semiconductor device for the purpose of reducing particles generated during the semiconductor manufacturing process. Moreover, the adhesion strength or adhesion of the coating can be increased. The layered structure has a structure (a structure similar to a fractal structure) formed by overlapping the second uneven structure with the first uneven structure. Therefore, the anchor effect by a fine concavo-convex structure is obtained, and stable adhesion strength or adhesion force can be obtained with respect to the substrate. In addition, the coating formed on the layered structure having the anchor effect can more reliably attach and capture reaction products and particles on the surface of the coating itself. Thereby, particles generated during the semiconductor manufacturing process can be reduced.

According to a second invention, in the first invention, the first concavo-convex structure has a void formed in a part of the surface of the layered structure and a group of crystal grains dropped out, and the second concavo-convex structure Is a plasma-resistant member formed on the entire surface of the layered structure and having fine irregularities with the size of the crystal grains.

According to this plasma-resistant member, an anchor effect due to a fine uneven structure can be obtained over substantially the entire surface of the layered structure, and more stable adhesion strength or adhesion can be obtained with respect to the substrate. In addition, the coating formed on the layered structure having the anchor effect can more reliably attach and capture reaction products and particles on the surface of the coating itself. Thereby, particles generated during the semiconductor manufacturing process can be reduced.

According to a third invention, in the first or second invention, the arithmetic average Sa of the surface of the layered structure
Is 0.025 μm or more and 0.075 μm or less, and the substantial volume Vmc of the core portion determined from the load curve on the surface of the layered structure is 0.03 μm 3 / μm 2 or more and 0.08 μm 3 /
The hollow volume V of the core portion which is less than μm2 and is determined from the load curve on the surface of the layered structure
vc is 0.03 μm 3 / μm 2 or more and 0.1 μm 3 / μm 2 or less, and the developed area ratio Sdr of the interface of the surface of the layered structure is 3 or more and 28 or less. .

According to this plasma-resistant member, the three-dimensional surface property of the surface of the layered structure becomes clearer. Thereby, the adhesion strength or adhesion of the coating can be further increased. In addition, the coating can more reliably attach reaction products and particles to the surface of the coating itself and capture them. Thereby, particles generated during the semiconductor manufacturing process can be further reduced.

A fourth invention is characterized in that, in any one of the first to third inventions, the first concavo-convex structure and the second concavo-convex structure are formed by chemical treatment. It is a plasma resistant member.

According to this plasma-resistant member, it is possible to obtain a more preferable first concavo-convex structure and second concavo-convex structure for increasing the adhesion strength or adhesion of the coating and reducing particles.

The fifth invention comprises a base material and a layered structure formed on the surface of the base material and containing yttria polycrystals and having plasma resistance, and the cut-off in the surface analysis is 0.8 μm The arithmetic average Sa of the surface of the layered structure is 0.010 μm or more and 0.035 μm.
The actual volume Vmc of the core portion determined from the surface load curve of the layered structure is 0.01 μm3 / μm2 or more and 0.035 μm3 / μm2 or less, and is determined from the surface load curve of the layered structure. The hollow volume Vvc of the core part is 0.012 μm 3 / μm 2 or more and 0.05 μm 3 / μm 2 or less, and the development area ratio Sdr of the interface of the surface of the layered structure is
Is 1 or more and 17 or less, and the root mean square slope SΔq of the surface of the layered structure is 0.00.
It is a plasma-resistant member characterized by being 15 or more and 0.6 or less.

According to this plasma-resistant member, the inner wall of the chamber can be substantially uniformly covered with a precoat film (coating) that does not adversely affect the semiconductor device for the purpose of reducing particles generated during the semiconductor manufacturing process. Moreover, the adhesion strength or adhesion of the coating can be increased.

A sixth invention is the plasma-resistant member according to any one of the first to fifth inventions, wherein the layered structure has a dense structure of the yttria polycrystal.

When the inner wall of the chamber is covered with a coating, it is necessary to increase the adhesion strength or adhesion of the coating so that the coating is difficult to peel off.
On the other hand, according to the plasma-resistant member of the present invention, since the layered structure has a dense structure of yttria polycrystal, the first uneven structure and the second uneven structure are likely to occur. That is, the first concavo-convex structure is likely to be formed in a portion where the density is coarse. For this reason, it is considered that the second concavo-convex structure is easily formed so as to overlap the first concavo-convex structure. Thereby, the adhesion strength or adhesion of the coating can be increased.

A seventh invention is characterized in that, in the sixth invention, a rough portion of the dense structure becomes smaller when going from a layer on the surface of the layered structure to a deeper layer than the layer on the surface. It is a plasma resistant member.

When the inner wall of the chamber is covered with a coating, it is necessary to increase the adhesion strength or adhesion of the coating so that the coating is difficult to peel off.
On the other hand, according to the plasma-resistant member of the present invention, the rough portion of the dense structure becomes smaller when going from the surface layer of the layered structure to a layer deeper than the surface layer. Therefore, the concave portion of the fine concavo-convex structure is easily formed in a layer deeper than the layer on the surface of the layered structure. Thereby, an anchor effect is obtained and a stable adhesion strength or adhesion force to the substrate can be obtained.

According to an eighth invention, in the sixth invention, the coarse-dense structure is characterized in that a coarse portion having a density smaller than the density of the dense portion is three-dimensionally distributed in the dense portion. It is a plasma member.

According to this plasma-resistant member, the density structure is distributed three-dimensionally on the surface of the laminated structure and in the thickness direction (depth direction). Therefore, the adhesion strength or adhesion of the coating can be further increased.

A ninth invention is the plasma-resistant member according to any one of the first to eighth inventions, wherein the layered structure is formed by an aerosol deposition method.

According to this plasma-resistant member, the layered structure has a dense structure as compared with the yttria fired body, the yttria sprayed film, and the like. Thereby, the plasma resistance of the plasma-resistant member is higher than the plasma resistance of the fired body or the sprayed film. In addition, the probability that the plasma-resistant member becomes a particle generation source is lower than the probability that the fired body or the sprayed film becomes a particle generation source. Thereby, while maintaining the plasma resistance of a plasma-resistant member, a particle can be reduced.

According to the aspect of the present invention, there is provided a plasma-resistant member capable of increasing the adhesion strength or adhesion force of the coating covering the inner wall of the chamber or reducing particles.

It is typical sectional drawing showing the semiconductor manufacturing apparatus provided with the plasma-resistant member concerning embodiment of this invention. It is a schematic diagram which illustrates an example of the manufacturing process of a semiconductor. It is a photograph figure showing the surface of the layered structure formed in the surface of a plasma-resistant member. It is the photograph figure which expanded the surface of the layered structure formed in the surface of a plasma-resistant member. It is a photograph figure showing the cross section of the layered structure formed in the surface of a plasma-resistant member. It is a photograph figure showing the other surface of the layered structure formed in the surface of a plasma-resistant member. It is a schematic diagram explaining a three-dimensional surface property parameter. It is a graph showing the arithmetic mean of the surface of a layered structure. It is a graph showing the substantial volume of the core part of the surface of a layered structure. It is a graph showing the hollow volume of the core part of the surface of a layered structure. It is a graph showing the number density of the protrusion top on the surface of the layered structure. It is a graph showing the expansion | deployment area ratio of the interface in the surface of a layered structure. It is the photograph which image | photographed the state inside the layered structure of this embodiment. It is the photograph figure which binarized the internal structure of the layered structure of this embodiment. It is the photograph which image | photographed the state of the upper part of the layered structure of this embodiment. It is the graph and table | surface which illustrate an example of the area ratio with respect to a depth position. It is a typical perspective view explaining the measuring method of the adhesion strength of a precoat film | membrane. It is a photograph figure explaining the measuring method of the adhesion strength of a precoat film. It is a photograph figure which illustrates the photograph of an optical microscope. It is the photograph which image | photographed the peeling area | region by SEM. It is a table | surface and a graph which illustrate an example of the measurement result of the adhesion strength of a precoat film | membrane. It is a graph explaining the cutoff in a surface analysis. It is a graph showing the arithmetic mean of the surface of a layered structure. It is a graph showing the substantial volume of the core part of the surface of a layered structure. It is a graph showing the hollow volume of the core part of the surface of a layered structure. It is a graph showing the number density of the protrusion top on the surface of the layered structure. It is a graph showing the root mean square inclination in the surface of a layered structure. It is a table | surface which illustrates an example of the measurement result of the adhesion strength of a precoat film | membrane. It is the photograph which image | photographed the inside of the layered structure of this embodiment. 3 is a table comparing average crystal grain sizes according to the difference in the formation method of layered structures. It is a graph which illustrates an example of the result of the XRD measurement about the layered structure formed by the aerosol deposition method. It is the photograph which image | photographed the other inside of the layered structure of this embodiment.

Embodiments of the present invention will be described below with reference to the drawings. In addition, in each drawing, the same code | symbol is attached | subjected to the same component and detailed description is abbreviate | omitted suitably.
FIG. 1 is a schematic cross-sectional view showing a semiconductor manufacturing apparatus provided with a plasma-resistant member according to an embodiment of the present invention.
FIG. 2 is a schematic view illustrating an example of a semiconductor manufacturing process.

The semiconductor manufacturing apparatus 100 shown in FIG. 1 includes a chamber 110 and a plasma resistant member 120.
And an electrostatic chuck 160. The plasma-resistant member 120 is called, for example, a top plate or the like, and is provided in the upper part inside the chamber 110. The electrostatic chuck 160 is
It is provided in the lower part inside the chamber 110. That is, the plasma resistant member 12
0 is provided on the electrostatic chuck 160 inside the chamber 110. An object to be attracted such as the wafer 210 is placed on the electrostatic chuck 160.

The plasma-resistant member 120 is, for example, a base material 121 (FIG. 5) containing alumina (Al 2 O 3).
And a layered structure 123 (see FIG. 5) including a yttria (Y 2 O 3) polycrystal. The layered structure 123 of yttria polycrystal is formed by the “aerosol deposition method”. The material of the substrate 121 is not limited to ceramics such as alumina, and may be quartz, anodized, metal, glass, or the like.

In the “Aerosol Deposition Method”, “aerosol” in which fine particles including brittle materials are dispersed in a gas is sprayed from a nozzle toward the base material 121, and the fine particles are applied to the base material 121 such as metal, glass, ceramics, and plastic. Collision, deformation and crushing of brittle material fine particles are caused by the impact of the collision, and these are joined together, and a layered structure (also referred to as a film-like structure) 123 made of a constituent material of fine particles is directly formed on the substrate 121. It is a method of forming. According to this method, the layered structure 123 can be formed at room temperature without requiring any heating means or cooling means, and the layered structure 123 having mechanical strength equal to or higher than that of the fired body can be obtained. it can. In addition, the density, mechanical strength, electrical characteristics, and the like of the layered structure 123 can be changed in various ways by controlling the conditions under which the fine particles collide and the shape and composition of the fine particles.

In the present specification, “polycrystal” refers to a structure formed by bonding and accumulating crystal particles. The crystal particles are substantially one and constitute a crystal. However, when the fine particles are taken into the structure without being crushed, the crystal particles are polycrystalline. The diameter of the average crystal particle is usually 5 nanometers (nm) or more and 50 nm or less. The average crystal particle diameter is more preferably 30 nm or less. As for the diameter of the average crystal particle, for example, XRD (X-ray Di
It can be calculated by the Scherrer method using ffraction (X-ray diffraction) analysis.

In the present specification, the term “fine particles” means that when the primary particles are dense particles, the average particle size identified by particle size distribution measurement or scanning electron microscope is 5 micrometers (μm).
) The following: When the primary particles are porous particles that are easily crushed by impact, the average particle size is 50 μm or less.

In the specification of the present application, “aerosol” refers to a solid-gas mixed phase body in which the aforementioned fine particles are dispersed in a gas such as helium, nitrogen, argon, oxygen, dry air, or a mixed gas containing these. Although it may contain an “aggregate”, it means a state in which fine particles are dispersed substantially alone. The gas pressure and temperature of the aerosol are arbitrary, but the concentration of the fine particles in the gas is 0 at the time of injection from the discharge port when the gas pressure is converted to 1 atm and the temperature is converted to 20 degrees Celsius.
It is desirable for the formation of the layered structure 123 to be in the range of 0003 mL / L to 5 mL / L.

The aerosol deposition process is usually performed at room temperature, and has one feature that the layered structure 123 can be formed at a temperature sufficiently lower than the melting point of the fine particle material, that is, at a temperature of 100 degrees centigrade or less.
In the present specification, “normal temperature” refers to a room temperature environment that is substantially lower than the sintering temperature of ceramics and is substantially 0 to 100 ° C.

The fine particles constituting the powder as the raw material of the layered structure 123 are mainly brittle materials such as ceramics and semiconductors, and the fine particles of the same material can be used alone or mixed with fine particles having different particle diameters. Different brittle material fine particles can be mixed or combined to be used. Moreover, it is also possible to mix fine particles such as metal materials and organic materials with brittle material fine particles, or to coat the surface of brittle material fine particles. Even in these cases, the main component of the formation of the layered structure 123 is a brittle material.
In the present specification, “powder” refers to a state in which the above-mentioned fine particles are naturally agglomerated.

In the composite structure formed by this method, when crystalline brittle material fine particles are used as a raw material, the layered structure 123 portion of the composite structure is a polycrystalline body whose crystal particle size is smaller than that of the raw material fine particles. In many cases, the crystal has substantially no crystal orientation. Moreover, the grain boundary layer which consists of a glass layer does not exist substantially in the interface of brittle material crystals. In many cases, the layered structure 123 portion of the composite structure forms an “anchor layer” that bites into the surface of the substrate 121. The layered structure 123 on which the anchor layer is formed is formed by being firmly attached to the base material 121 with extremely high strength.

The layered structure 123 formed by the aerosol deposition method is clearly different from the so-called “green compact” in which the fine particles are packed together by pressure and kept in physical form, and possesses sufficient strength. doing.

In the aerosol deposition method, the brittle material fine particles that have come to the surface are crushed and deformed on the base material 121. The brittle material fine particles used as a raw material and the crystallites (crystals of the brittle material structure formed) Particle) size can be confirmed by measuring by X-ray diffraction method or the like. That is, the crystallite size of the layered structure 123 formed by the aerosol deposition method is smaller than the crystallite size of the raw material fine particles. The “developed surface” or “fracture surface” formed by crushing or deforming fine particles is a “new surface” in which atoms that were originally present inside the fine particles and bonded to other atoms are exposed. Is formed. It is considered that the layered structure 123 is formed by joining this new surface having high surface energy and activity to the surface of the adjacent brittle material fine particles, the new surface of the adjacent brittle material, or the surface of the substrate 121.

In addition, when hydroxyl groups are present on the surface of the fine particles in the aerosol, a mechanochemical acid-base dehydration reaction occurs due to local shear stress generated between the fine particles or between the fine particles and the structure when the fine particles collide. It is also conceivable that these are joined together. The addition of a continuous mechanical impact force from the outside causes these phenomena to occur continuously, and the joining progress and densification are performed by repeatedly deforming and crushing the fine particles, and the layered structure 12 made of a brittle material.
3 is expected to grow.

In the semiconductor manufacturing apparatus 100, high-frequency power is supplied, and a source gas such as a halogen-based gas is introduced into the chamber 110 as indicated by an arrow A1 shown in FIG. Then, the source gas introduced into the chamber 110 is turned into plasma in a region 191 between the electrostatic chuck 160 and the plasma resistant member 120.

The plasma resistant member 120 is one of important members for generating high density plasma. Here, the particles 221 generated inside the chamber 110 become the wafer 2.
If attached to the semiconductor device 10, a defect may occur in the manufactured semiconductor device. Then
The yield and productivity of semiconductor devices may be reduced. Therefore, the plasma resistance member 120 is required to have plasma resistance.

Therefore, for example, as shown in FIG.
In order to reduce 21, the inner wall of the chamber 110 is precoated (hereinafter, for convenience of explanation, “
Also referred to as “coating”. ). In this case, the precoat film is formed of a material that does not adversely affect the semiconductor device. That is, the semiconductor manufacturing process shown in FIG. 2 will be described. First, in order to reduce the particles 221, the inner wall of the chamber 110 is covered with a coating (step S101). Subsequently, the wafer 210 is put into the chamber 110 (step S103), and the wafer 210 is attracted to the electrostatic chuck 160 (step S105).

Subsequently, etching is performed (step S107), and the wafer 210 is removed from the electrostatic chuck 16.
Detach from 0 (step S109), and carry the wafer 210 out of the chamber 110 (step S111). Subsequently, plasma is generated inside the chamber 110 to clean the inside of the chamber 110 (step S113). Then, the operation described above with respect to step S101 is performed again (step S101).

According to the knowledge obtained by the present inventors, it is considered that the precoat film has almost disappeared when the etching described above with respect to step S107 is completed. The raw materials and gas types that can be used for the precoat film and the thickness of the precoat film are limited depending on the purpose and application. In particular, the portion where the precoat film disappears in the middle of the etching process is directly exposed to plasma. For this reason, the members in the chamber 110 are required to have plasma resistance. On the other hand, in cleaning the chamber 110 (step S113), plasma is generated to perform cleaning. Therefore, plasma resistance is required for members inside the chamber 110.

On the other hand, the plasma-resistant member 120 of the present embodiment has a structure in which the layered structure 123 containing the yttria polycrystal is formed on the surface of the substrate 121 containing alumina by the aerosol deposition method. The layered structure 123 of the yttria polycrystal formed by the aerosol deposition method has a dense structure as compared with the yttria fired body or the yttria sprayed film. Thereby, the plasma resistance of the plasma-resistant member 120 of this embodiment is higher than the plasma resistance of a fired body or a sprayed film. Further, the plasma-resistant member 120 of this embodiment is used.
The probability that becomes a particle generation source is lower than the probability that a fired body or a sprayed film becomes a particle generation source.

On the other hand, when the inner wall of the chamber 110 is covered with a coating as in the semiconductor manufacturing process described above with reference to FIG. 2, it is necessary to increase the adhesion strength or adhesion of the coating so that the coating does not easily peel off. Further, even if reaction products or particles generated inside the chamber 110 are generated, the coating covering the inside of the chamber 110 needs to attach and capture the reaction products or particles on the surface of the coating itself. is there.

On the other hand, the plasma-resistant member 120 of this embodiment has a rough surface compared to the surface on which the polishing process has been performed. That is, the layered structure 123 formed on the surface of the plasma resistant member 120 may be subjected to a polishing process in order to further improve the plasma resistance or to further improve the sealing performance inside the chamber 110. is there. On the other hand, the plasma-resistant member 120 of this embodiment has a rough surface compared to the surface on which the polishing process has been performed. Specifically, the layered structure 123 formed on the surface of the plasma resistant member 120 of the present embodiment has an uneven structure.

According to this, the present inventor has obtained knowledge that particles can be reduced while maintaining the plasma resistance of the plasma resistant member 120.
Hereinafter, the concavo-convex structure of the layered structure 123 formed on the surface of the plasma-resistant member 120 of the present embodiment will be described with reference to the drawings.

FIG. 3 is a photograph showing the surface of the layered structure formed on the surface of the plasma-resistant member.
FIG. 4 is an enlarged photograph of the surface of the layered structure formed on the surface of the plasma resistant member.
FIG. 5 is a photograph showing a cross section of the layered structure formed on the surface of the plasma-resistant member.
3 to 5 are photographs taken with an SEM (Scanning Electron Microscope). FIG. 3 represents an ultra-low angle scattered reflected electron image.

The photograph on the left side of the photograph shown in FIG. 3 represents the surface of the layered structure 123c after being roughened. The photographic diagram on the right side of the photographic diagram shown in FIG. 3 represents the surface of the layered structure 123b before being roughened and after the polishing process. For convenience of explanation, in the following explanation, the layered structure after roughening is referred to as “layered structure 123c”. The layered structure before the roughening and after the polishing process is referred to as “layered structure 123b”.
The layered structure in the as-deposited state is referred to as “layered structure 123a”. In this specification, “
“As-deposited” refers to a state immediately after the layered structure including the yttria polycrystal is formed on the surface of the substrate 121 and before the surface treatment (for example, polishing treatment).

4 (a) and 4 (b) are enlarged photographic views of the surface of the as-deposited layered structure 123a. FIG. 4C and FIG. 4D are photographic views in which the surface of the layered structure 123b is enlarged before being roughened and after polishing. 4 (e) and 4 (f)
It is the photograph figure which expanded the surface of layer structure 123c after roughening. 4 (a) and FIG.
The enlargement ratio (10,000 times) of the photographic diagrams shown in (c) and FIG. 4 (e) is shown in FIG.
This is different from the magnification (50000 times) shown in (d) and FIG. 4 (a) and FIG.
(C) and FIG.4 (e) are the photograph figures which image | photographed the 1st position of the surface of the layered structure 123a, 123b, 123c. That is, FIG. 4C shows the layered structure 12 shown in FIG.
It is a photograph figure showing the state which polished the surface of 3a. FIG. 4E is a photographic diagram showing a state in which the surface of the layered structure 123b shown in FIG. 4 (b), 4 (
FIG. 4 (d) and FIG. 4 (f) are photographic views of the second positions on the surfaces of the layered structures 123a, 123b, and 123c. That is, FIG. 4D shows the layered structure 123 shown in FIG.
It is a photograph figure showing the state which polished the surface of a. FIG. 4F is a photographic diagram illustrating a state where the surface of the layered structure 123b illustrated in FIG.

FIG. 5A is a photographic diagram showing a cross section of the layered structure 123b before being roughened and after polishing. FIG. 5B is a photographic diagram showing a cross section of the layered structure 123c after the roughening.

The inventor performed chemical treatment on the layered structure 123b formed on the surface of the plasma-resistant member 120 to roughen the surface of the layered structure 123b.
In the specification of the present application, “chemical treatment” refers to treating the surface of an object with a substance that generates hydrogen ions in an aqueous solution. For example, chemical treatment includes hydrobromic acid, hydroiodic acid, hypochlorous acid, chlorous acid, chloric acid, perchloric acid, sulfuric acid, fluorosulfonic acid, nitric acid,
Hydrochloric acid, phosphoric acid, hexafluoroantimonic acid, tetrafluoroboric acid, hexafluorophosphoric acid, chromic acid, boric acid, methanesulfonic acid, ethanesulfonic acid, benzenesulfonic acid,
Use an aqueous solution containing at least one of p-toluenesulfonic acid, trifluoromethanesulfonic acid, polystyrenesulfonic acid, acetic acid, citric acid, formic acid, gluconic acid, lactic acid, oxalic acid, tartaric acid, hydrofluoric acid, carbonic acid and hydrogen sulfide. Surface treatment.
Alternatively, “chemical treatment” in the present specification means that the surface of an object is treated with a substance that generates hydroxide ions in an aqueous solution. For example, the chemical treatment includes surface treatment using an aqueous solution containing at least one of sodium hydroxide, potassium hydroxide, ammonia, calcium hydroxide, barium hydroxide, copper hydroxide, aluminum hydroxide, and iron hydroxide. Can be mentioned.

Then, the present inventor observed the layered structure 123b after the polishing process and the layered structure 123c after the surface roughening before the surface roughening. Layered structure 123b before roughening and after polishing
The photograph of the layered structure 123c after roughening is as shown in FIGS.

That is, as shown in FIG. 3, the surface of the layered structure 123 c subjected to chemical treatment is
The surface of the layered structure 123b is roughened before the chemical treatment and after the polishing treatment. In other words, the surface of the layered structure 123c that has been subjected to the chemical treatment has deeper irregularities than the surface of the layered structure 123b that has been subjected to the polishing treatment before the chemical treatment. It has a structure.

As shown in FIGS. 4 (a), 4 (b), 4 (e), 4 (f) and 5 (b),
The as-deposited layered structure 123a and the chemically treated layered structure 123c are the first concavo-convex structure 125 having a relatively large order of several hundred nm (for example, about 100 to 500 nm).
And a second concavo-convex structure 1 having a relatively small order of several tens of nm (for example, about 10 to 50 nm).
26. In other words, the first concavo-convex structure 125 has a larger swell compared to the second concavo-convex structure 126. The second concavo-convex structure 126 is formed so as to overlap with the undulations of the first concavo-convex structure 125, and has fine concavo-convex roughness as compared with the first concavo-convex structure 125. For example, in the layered structure 123c that has been subjected to chemical treatment, a second concavo-convex structure having fine concavo-convex size of crystal grains is formed on substantially the entire surface of the layered structure 123c, and a group of crystal grains has dropped out. A first concavo-convex structure having voids is formed in various places on the surface of the layered structure 123c.

The second uneven structure 126 is formed so as to overlap with the first uneven structure 125. Therefore, the layered structure 123c subjected to the chemical treatment has a structure similar to a “fractal structure” in which the shape of the part is similar to the entire shape.

According to the present embodiment, the inner wall of the chamber 110 can be covered substantially uniformly with a coating for the purpose of reducing particles generated during the semiconductor manufacturing process. Moreover, the adhesion strength or adhesion of the coating can be increased. As described above, the layered structures 123a, 12
3c has a structure (a structure similar to a fractal structure) in which a relatively small second uneven structure 126 is superimposed on a relatively large first uneven structure 125. Therefore, an anchor effect by a fine uneven structure can be obtained, and a stable adhesion strength or adhesion force to the base material 121 can be obtained. Further, the layered structures 123a and 123c from which the anchor effect is obtained.
The coating formed on the surface can more reliably attach reaction products and particles to the surface of the coating itself and capture them. Thereby, particles generated during the semiconductor manufacturing process can be reduced.

FIG. 6 is a photographic diagram showing another surface of the layered structure formed on the surface of the plasma-resistant member.
FIG. 6A is a photographic diagram showing the surface of the layered structure 123c after the first physical treatment. FIG. 6B is a photographic diagram showing the surface of the layered structure 123c after the second physical treatment.

The inventor performed the first physical treatment or the second physical treatment on the layered structure 123b formed on the surface of the plasma resistant member 120 to roughen the surface of the layered structure 123b.
In this specification, “physical treatment” refers to treating the surface of an object by at least one of machining, laser machining, electric discharge machining, blasting, shot peening, and plasma treatment. And this inventor observed the layered structure 123c after roughening. The photograph taken is as shown in FIGS. 6 (a) to 6 (b).

The surface of the layered structure 123c subjected to the physical treatment is roughened in the same manner as the surface of the layered structure 123c subjected to the chemical treatment, and has an uneven structure. Thereby, the same effect as that of the layered structure 123c subjected to the chemical treatment can be obtained.

Next, the result of examination of the surface state of the layered structure by the inventor will be described with reference to the drawings.
FIG. 7 is a schematic diagram for explaining the three-dimensional surface property parameter.
FIG. 7A is a graph illustrating the amplitude average (arithmetic average) Sa in the height direction. FIG. 7B is a graph illustrating the substantial volume Vmc of the core part and the hollow volume Vvc of the core part. FIG. 7C is a schematic plan view for explaining the protrusion (or hole) density in the defined segmentation.

The inventor has developed layered structures 123 a and 123 formed on the surface of the plasma-resistant member 120.
It was studied to express and evaluate the surface state of c in a form covering the entire surface of the layered structures 123a and 123c. As shown in FIG. 7A, the inventor first examined the amplitude average (arithmetic average) Sa in the height direction of the surfaces of the layered structures 123a and 123c using a laser microscope.

As the laser microscope, “OLS4000 / manufactured by Olympus” was used. The magnification of the objective lens is 100 times. The zoom is 5 times. The cut-off was set to 2.5 μm or 0.8 μm.

The arithmetic average Sa is a three-dimensional roughness parameter (three-dimensional height direction parameter) obtained by extending the two-dimensional arithmetic average roughness Ra to three dimensions. Specifically, the arithmetic average Sa is obtained by dividing the volume of the portion surrounded by the surface shape curved surface and the average surface by the measurement area. X
Arithmetic mean S, where y-plane, vertical direction is z-axis, and measured surface shape curve is z (x, y)
a is defined by the following equation. Here, “A” in the formula (1) is a measurement area.

Subsequently, as shown in FIG. 7B, the present inventor examined the core volume Vmc obtained from the load curve and the core volume hollow Vvc obtained from the load curve. Parameters relating to the substantial volume Vmc of the core part and the hollow volume Vvc of the core part are defined as a graph shown in FIG. 7B, and are three-dimensional volume parameters. That is, the load area ratio is 1
The height at 0% is the boundary between the peak volume Vmp, the core volume Vmc, and the core hollow volume Vvc. The height when the load area ratio is 80% is a boundary between the hollow volume Vvv of the valley part, the substantial volume Vmc of the core part, and the hollow volume Vvc of the core part. The substantial volume Vmp of the peak portion, the substantial volume Vmc of the core portion, the hollow volume Vvc of the core portion, and the hollow volume Vvv of the valley portion represent a volume per unit area (unit: m3 / m2).

Subsequently, as shown in FIG. 7C, the inventor examined the density of the protrusions (or holes) 193 in the defined segmentation. Specifically, the inventor examined the number density Sds on the top of the protrusion and the developed area ratio Sdr of the interface. The number density Sds on the top of the protrusion and the developed area ratio Sdr of the interface are three-dimensional protrusion densities. Number density S on top of protrusion
ds represents the number of peaks on the unit sampling plane. The number density Sds on the top of the protrusion is expressed by the following equation.

The number density Sds on the top of the protrusion varies depending on the definition of the top. Therefore, when determining the number density Sds of the top of the protrusion, it is necessary to clarify the definition of the top.

The developed area ratio Sdr of the interface is a parameter indicating the increase rate of the interface with respect to the sampling surface. The developed area ratio Sdr of the interface is a value obtained by dividing the total developed area of the small interfaces formed by four points by the measured area, and is defined by the following equation. Here, “A” in equation (3) represents the defined segmentation area.

The present inventor has calculated the arithmetic average Sa, the core volume Vmc, and the core hollow volume Vv described above.
c, the surface state of the layered structures 123a and 123c formed on the surface of the plasma-resistant member 120 by the number density Sds on the top of the protrusion and the developed area ratio Sdr of the interface,
It was judged that the entire surface of 3a and 123c could be expressed and evaluated in a comprehensive manner.

FIG. 8 is a graph showing the arithmetic mean of the surface of the layered structure.
This inventor examined the arithmetic mean Sa of the surface of a layered structure using the laser microscope. The cut-off is 2.5 μm. The result is as shown in FIG. The horizontal axis of the graph shown in FIG. 8 represents another form of the layered structure formed on the surface of the plasma-resistant member 120.
The vertical axis of the graph shown in FIG. 8 represents the arithmetic mean Sa (μm).

“Spraying” shown on the horizontal axis of the graph of FIG. 8 is an yttria sprayed film. The “mirror surface” shown on the horizontal axis of the graph of FIG. 8 is obtained by performing mirror polishing on the surface of the layered structure 123a containing the yttria polycrystal.

The layered structure 123c described above with reference to FIGS. 3 to 5 corresponds to “chemical treatment (2)”. The layered structure 123a described above with reference to FIGS. 3 to 5 corresponds to “As Depot”. FIG.
The layered structure 123c described above with respect to a) corresponds to “physical treatment (1)”. FIG.
The layered structure 123c described above with respect to b) corresponds to “physical treatment (2)”.

The three curves shown in the graph of FIG. 8 represent data when three measurements are performed in one sample. That is, the three curves shown in the graph of FIG. 8 represent the number of measurements n (n = 3 in the graph of FIG. 8). The same applies to the graphs described later with reference to FIGS.

According to the graph shown in FIG. 8, “chemical treatment (1)”, “chemical treatment (2)”, “as depot”, “physical treatment (1)”, and “physical treatment (2)”. Each arithmetic mean Sa
Is included in the range of 0.025 μm to 0.075 μm. In the graph shown in FIG. 8, the arithmetic average Sa of “As Depot” is 0.026 μm. In the graph shown in FIG. 8, the arithmetic average Sa of “physical processing (2)” is 0.030 μm.

FIG. 9 is a graph showing the actual volume of the core portion on the surface of the layered structure.
This inventor calculated | required the substantial volume Vmc of the core part of the surface of a layered structure from a load curve. The cut-off is 2.5 μm. The result is as shown in FIG. The horizontal axis of the graph shown in FIG. 9 represents another form of the layered structure formed on the surface of the plasma resistant member 120. The horizontal axis of the graph shown in FIG. 9 is the same as the horizontal axis of the graph shown in FIG. The vertical axis of the graph shown in FIG. 9 indicates the actual volume Vmc (μm3 / μm2) of the core portion obtained from the load curve.
Represents.

According to the graph shown in FIG. 9, “chemical treatment (1)”, “chemical treatment (2)”, “chemical treatment (3)”, “as depot”, “physical treatment (1)”. And the physical volume Vmc of each core part of “physical treatment (2)” is 0.03 μm 3 / μm 2 or more and 0.08 μm 3 / μ.
It is included in the range of m2 or less.

FIG. 10 is a graph showing the hollow volume of the core portion on the surface of the layered structure.
This inventor calculated | required the hollow volume Vvc of the core part of the surface of a layered structure from a load curve. The cut-off is 2.5 μm. The result is as shown in FIG. The horizontal axis of the graph shown in FIG. 10 represents another form of the layered structure formed on the surface of the plasma resistant member 120. The horizontal axis of the graph shown in FIG. 10 is the same as the horizontal axis of the graph shown in FIG. The vertical axis of the graph shown in FIG. 10 indicates the hollow volume Vvc (μm3 /
μm2).

According to the graph shown in FIG. 10, “chemical treatment (1)”, “chemical treatment (2)”, “
"Chemical treatment (3)", "Azdepo", "Physical treatment (1)" and "Physical treatment (2)"
The hollow volume Vvc of each core part is 0.03 μm 3 / μm 2 or more and 0.1 μm 3 / μ.
It is included in the range of m2 or less.

FIG. 11 is a graph showing the number density of the tops of the protrusions on the surface of the layered structure.
The inventor obtained the number density Sds on the top of the protrusion on the surface of the layered structure. The cut-off is 2.5 μm. The result is as shown in FIG. The horizontal axis of the graph shown in FIG. 11 represents another form of the layered structure formed on the surface of the plasma-resistant member 120. The horizontal axis of the graph shown in FIG. 11 is the same as the horizontal axis of the graph shown in FIG. FIG.
The vertical axis | shaft of the graph represented to represents the number density Sds of protrusion top.

In the graph shown in FIG. 11, the number density Sds on the top of the protrusions depending on the form of the layered structure.
No significant difference was found.

FIG. 12 is a graph showing the developed area ratio of the interface on the surface of the layered structure.
FIG. 12A is a graph showing a range where the developed area ratio of the interface is 0 or more and 300 or less. FIG. 12B is a graph showing an enlarged display of a range where the developed area ratio of the interface is 0 or more and 35 or less.

The present inventor obtained the developed area ratio Sdr of the interface on the surface of the layered structure. The cut-off is 2.5 μm. The results are as shown in FIGS. 12 (a) and 12 (b). The horizontal axis of the graphs shown in FIGS. 12A and 12B represents the plasma-resistant member 12.
This represents another type of layered structure formed on the surface of 0. The horizontal axis of the graphs shown in FIGS. 12A and 12B is the same as the horizontal axis of the graph shown in FIG. The vertical axis of the graphs shown in FIGS. 12A and 12B represents the developed area ratio Sdr of the interface.

According to the graphs shown in FIGS. 12 (a) and 12 (b), “chemical treatment (1)”,
The development area ratio Sdr of each interface of “chemical treatment (2)”, “chemical treatment (3)”, “as depot”, “physical treatment (1)” and “physical treatment (2)” is It is included in the range of 3 or more and 28 or less.

Next, the result of examination of the internal state of the layered structure by the inventor will be described with reference to the drawings.
FIG. 13 is a photograph of the internal state of the layered structure of this embodiment.
FIG. 14 is a photograph of the internal structure of the layered structure of the present embodiment binarized.
FIGS. 13 and 14 are photographs taken with a TEM (Transmission Electron Microscope: Transmission Electron Microscope / H-9000NAR manufactured by Hitachi, Ltd.). The binarization process was performed in the area A12 shown in FIG.

The layered structure 123 (123c) illustrated in FIG. 13 includes a yttria polycrystal. FIG.
The layered structure 123 (123c) of the yttria polycrystal shown in the above is formed by the “aerosol deposition method”. As described above with reference to FIGS. 1 and 2, the layered structure 123 of the yttria polycrystal formed by the aerosol deposition method has a dense structure as compared with the yttria fired body, the yttria sprayed film, and the like.

On the other hand, as in the region A11 shown in FIG. 13 and the region A12 shown in FIG. 14, a dense structure exists inside the layered structure 123 (123c) containing the yttria polycrystal. That is, the layered structure 123 (123c) includes a portion having a relatively coarse density and a portion having a relatively dense density. In the region A12 shown in FIG. 14, the density density of the yttria polycrystal is represented by binarized shading. The light-colored portion is a portion with a coarse density.

When the inner wall of the chamber 110 is covered with a coating as in the semiconductor manufacturing process described above with reference to FIG. 2, it is necessary to increase the adhesion strength or adhesion of the coating so that the coating does not easily peel off.

Since the layered structure 123 (123c) shown in FIG. 13 has a dense structure of yttria polycrystals, a first layer having a relatively large size on the order of several hundred nm is obtained by chemical treatment or physical treatment. The uneven structure 125 and a relatively small second uneven structure 126 on the order of several tens of nm.
And are likely to occur. That is, in a chemical treatment or the like, a portion with a coarse density is more easily eroded than a portion with a dense density. The portion with the coarse density is eroded earlier than the portion with the dense density. Therefore, it is considered that the second concavo-convex structure 126 is easily formed so as to overlap the first concavo-convex structure 125. Thereby, the adhesion strength or adhesion of the coating can be increased.

As described above with reference to FIGS. 4E and 4F, the first uneven structure 125 and the second uneven structure 126 are distributed on the surface of the layered structure 123c. On the other hand, as shown in FIG. 13 and FIG. 14, in the thickness direction (depth direction) of the layered structure 123 c, a portion with a relatively coarse density, a portion with a relatively dense density, , Is distributed. in this way,
The coarse and dense structure of the layered structure 123c of this embodiment has a structure in which coarse portions having a density smaller than the density of the dense portion are three-dimensionally distributed in the dense portion. For example, the layered structure 123c of this embodiment has a three-dimensional network structure. Further, the layered structure 123c of the present embodiment
Has an ant nest structure or a coral reef structure. According to this, the adhesion strength or adhesion of the coating can be further increased.

FIG. 15 is a photograph of the upper part of the layered structure of the present embodiment taken.
FIG. 16 is a graph and a table illustrating an example of the area ratio with respect to the depth position.
FIG. 15A to FIG. 15E are photographic images obtained by photographing the state of the upper part (upper layer) of the layered structure of the present embodiment with TEM (Hitachi Ltd. HD-2700). FIG.
These are graphs which illustrate an example of the area ratio with respect to a depth position. FIG. 16B is a table illustrating an example of the area ratio with respect to the depth position.

FIG. 15B shows a region A shown in FIG. 15B among the regions A13 shown in FIG.
It is the photograph figure which binarized 131. FIG. 15C is a photographic diagram in which the area A132 shown in FIG. 15C is binarized in the area A13 shown in FIG. FIG. 15D is a photographic diagram in which the area A133 shown in FIG. 15D is binarized in the area A13 shown in FIG. FIG. 15E is a photograph showing the binarized region A134 shown in FIG. 15E among the region A13 shown in FIG. That is, the area where binarization processing is performed is as shown in FIG.
The region A131 shown in (b), the region A132 shown in FIG. 15C, the region A133 shown in FIG. 15D, and the region A134 shown in FIG. From the shallow layer to the lower layer (relatively deeper from the surface).

“Depth position (1)” shown in FIGS. 16A and 16B corresponds to a region A131 shown in FIG. 15B. “Depth position (2)” shown in FIG. 16A and FIG.
"Corresponds to the region A132 shown in FIG. 16 (a) and 16 (b)
The “depth position (3)” shown in FIG. 15 corresponds to the region A133 shown in FIG. FIG.
The “depth position (4)” shown in (a) and FIG. 16 (b) is the region A shown in FIG. 15 (e).
This corresponds to 134.

The layered structure 123c shown in FIG. 15 includes a yttria polycrystal. The yttria polycrystalline layered structure 123c shown in FIG. 15 is formed by the “aerosol deposition method”. A chemical treatment is applied to the surface of the layered structure 123c. The density density of the layered structure 123 (123c) containing the yttria polycrystal is represented by binarized shading. The light-colored portion is a portion with a coarse density.

According to the binarized photographs shown in FIGS. 15B to 15E, the layered structure 1
The portion where the density of 23c is coarse becomes smaller from the upper layer toward the lower layer. That is, the concave portion of the concavo-convex structure of the layered structure 123c becomes smaller from the upper layer toward the lower layer. In other words, the fine grooves on the surface of the layered structure 123c become thinner from the upper layer toward the lower layer.

Specifically, as shown in FIGS. 16A and 16B, the depth positions (1) to (4)
) Each area ratio is 87 as it goes from the depth position (1) to the depth position (4).
. Decrease to 41%, 34.84%, 22.70%, 2.56%.
According to this, the same effect as described above with reference to FIGS. 13 and 14 can be obtained.

Next, the result of examination of the adhesion strength of the precoat film by the present inventor will be described with reference to the drawings.
FIG. 17 is a schematic perspective view illustrating a method for measuring the adhesion strength of the precoat film.
FIG. 18 is a photographic diagram illustrating a method for measuring the adhesion strength of a precoat film.
FIG. 19 is a photographic view illustrating a photograph of an optical microscope.
FIG. 20 is a photograph of the peeled area taken by SEM.
FIG. 19A is a photographic view illustrating a scratch mark and a peeled area of a film formed on the surface of the layered structure 123b. FIG. 19B is a photographic diagram illustrating a scratch mark and a peeled area of a coating film formed on the surface of the layered structure 123c.
FIG. 20A is a photograph of the area A21 shown in FIG. 19A taken by SEM. FIG. 20B is a photograph of the area A22 shown in FIG. 19B taken by SEM.

First, the inventor applied a film (Si in this specific example) to the surface of the layered structure 123 by a CVD method.
O2 film) was formed. The thickness of the coating is about 0.4 to 0.6 μm.

Subsequently, the inventor measured the adhesion strength of the precoat film (coating film) by a method called “nano scratch tester method” or the like. Specifically, as a scratch test apparatus, “N
anano Scratch Tester (NST) / manufactured by CSM Instruments ". The load speed is 30 Newtons / minute (N / min). As shown by the arrow A2 in FIG. 17, in this measurement method, the film formed on the surface of the layered structure 123 is
A load is applied via the indenter 251. Subsequently, as indicated by an arrow A <b> 3 illustrated in FIG. 17, the indenter 251 is moved along the surface of the layered structure 123 while continuously increasing the load load, and the adhesion strength is measured. The material of the tip of the indenter 251 is diamond. The radius of curvature of the tip of the indenter 251 is 100 μm.

Subsequently, as shown in FIG. 18A, a photograph was obtained with an optical microscope immediately before the point at which peeling (destruction) of substantially the entire coating started. In FIG. 18A, a scratch mark 141 and a peeling region 143 are shown. Other examples of photographs acquired with an optical microscope are as shown in FIGS. 19 (a) and 19 (b). As shown in FIG. 20A, in the layered structure 123b before the roughening and after the polishing process, it can be seen that peeling occurs at the interface between the coating and the layered structure 123b. As shown in FIG. 20B, it can be seen that in the layered structure 123c after roughening, peeling occurs at the interface between the film and the layered structure 123c. In addition, it turned out that there is no film in area | region A23 represented to Fig.19 (a).

Subsequently, as shown in FIG. 18B, an OHP sheet 145 was put on the acquired photograph of the optical microscope.

Subsequently, as shown in FIG. 18C, the coating peeling area 143 was traced with a writing tool such as a marker in a predetermined area having the scratch mark 141 as a center. In this specific example, the length L1 of one side of the predetermined region is 70 μm. 7 in a given area
The length L2 of the other side substantially orthogonal to the one side of 0 μm is 170 μm.

Subsequently, as shown in FIG. 18D, the traced peeled area 143 was painted using, for example, image processing software, and the image was binarized. As image processing software, “W
inROOF Ver. 6.5 / Mitani Corporation "was used.
Subsequently, the area ratio of the film peeling region 143 was calculated.

FIG. 21 is a table and a graph illustrating an example of the measurement result of the adhesion strength of the precoat film.
FIG. 21A is a table illustrating an example of the measurement result of the adhesion strength of the precoat film. FIG.
FIG. 1B is a graph illustrating an example of the measurement result of the adhesion strength of the precoat film.

The inventor uses the measurement method described above with reference to FIGS.
The peeled area ratio (%) of the iO2 film was calculated. The evaluation of the peeled area ratio of the film and the adhesion strength of the film is as shown in FIGS. 21 (a) and 21 (b). The horizontal axis of the graph shown in FIG. 21B represents another form of the layered structure formed on the surface of the plasma resistant member 120. The vertical axis on the left side of the graph shown in FIG. 21B represents the peeled area ratio (%) of the film. FIG.
The vertical axis on the right side of the graph shown in 1 (b) represents the evaluation of the adhesion strength of the coating.

The present inventor has determined that the adhesion strength of the coating is “excellent (◯): OK” when the peeled area ratio of the coating is included in the range of 0% or more and less than 10%. The present inventor has determined that the adhesion strength of the coating is “good (Δ): OK” when the peeled area ratio of the coating is within the range of 10% or more and less than 20%.
When the peeled area ratio of the film is 20% or more, the present inventor determines the adhesion strength of the film as “impossible (×):
NG ". According to FIG. 21 (a) and FIG. 21 (b), “chemical treatment (1)”,
The peeling area ratio of each film of “chemical treatment (2)”, “as-depot” and “physical treatment (2)” is included in the range of 0% or more and less than 20%.

As for “thermal spraying”, the surface irregularity of the sprayed film was intense compared to other surface treatments, and cracks were generated on the surface of the sprayed film. In addition, a large number of peeling portions existed on the surface of the sprayed film. Therefore, the peeled area ratio of the coating for “thermal spraying” was not measurable.

FIG. 22 is a graph for explaining the cut-off in the surface analysis.
FIG. 22A is a graph when the cutoff is set to 2.5 μm. FIG.
b) is a graph when the cut-off is set to 0.8 μm.

Each of FIG. 22 (a) and FIG. 22 (b) has a “cross-section curve” representing the cross-sectional shape of the surface.
In addition, a “waviness curve” representing the first uneven structure 125 and a “roughness curve” representing the second uneven structure 126 are represented. As described above with reference to FIGS. 4A to 4F, the first concavo-convex structure 125 has a large swell compared to the second concavo-convex structure 126. The second concavo-convex structure 126 has fine concavo-convex roughness as compared with the first concavo-convex structure 125.

As shown in FIG. 22A, when the cut-off is set to 2.5 μm, there is a range in which the roughness curve by the second uneven structure 126 overlaps with the undulation curve by the first uneven structure 125. To do.

On the other hand, as shown in FIG. 22B, when the cutoff is set to 0.8 μm,
Compared with the case where the cut-off is set to 2.5 μm, the waviness curve by the first uneven structure 125 shows a tendency similar to the cross-sectional curve. On the other hand, the range in which the roughness curve formed by the second concavo-convex structure 126 overlaps with the undulation curve formed by the first concavo-convex structure 125 is narrower than when the cutoff is set to 2.5 μm.

Thereby, by setting the cut-off to 0.8 μm in the surface analysis, it is possible to more clearly separate the “waviness” due to the first uneven structure 125 and the “roughness” due to the second uneven structure 126. confirmed. That is, by setting the cut-off to 0.8 μm in the surface analysis, the first concavo-convex structure 125 and the second concavo-convex structure 126 can be more clearly distinguished.

FIG. 23 is a graph showing the arithmetic mean of the surface of the layered structure.
The inventor set the cut-off to 0.8 μm, and examined the arithmetic average Sa of the surface of the layered structure using a laser microscope. The results are as shown in FIGS. 23 (a) and 23 (b).

FIG. 23A is a graph showing the arithmetic average of the first concavo-convex structure 125. FIG.
) Is a graph showing the arithmetic mean of the second concavo-convex structure 126. FIG. 23 (a) and FIG.
The horizontal axis of the graph shown in FIG. 3B represents another form of the layered structure formed on the surface of the plasma-resistant member 120. The horizontal axis of the graphs shown in FIGS. 23A and 23B is the same as the horizontal axis of the graph shown in FIG. The vertical axis of the graphs shown in FIGS. 23A and 23B represents the arithmetic mean Sa (μm).

According to the graph shown in FIG. 23B, “chemical treatment (1)”, “chemical treatment (2)”.
"," Chemical treatment (3) "," Azdepo "," Physical treatment (1) "and" Physical treatment (
2) ”has an arithmetic average Sa of each second concavo-convex structure 126 of 0.010 μm or more and 0.0
It is included in the range of 35 μm or less.

FIG. 24 is a graph showing the actual volume of the core portion on the surface of the layered structure.
The inventor sets the cut-off to 0.8 μm, and the substantial volume V of the core portion on the surface of the layered structure.
mc was determined from the load curve. The results are as shown in FIGS. 24 (a) and 24 (b).

FIG. 24A is a graph showing the actual volume of the core portion of the first concavo-convex structure 125. FIG. 24B is a graph showing the actual volume of the core portion of the second concavo-convex structure 126. FIG.
The horizontal axis of the graph shown to (a) and FIG.24 (b) represents another of the form of the layered structure formed in the surface of the plasma-resistant member 120. FIG. The horizontal axis of the graphs shown in FIGS. 24A and 24B is the same as the horizontal axis of the graph shown in FIG. 24 (a) and 24 (
The vertical axis of the graph shown in b) represents the core volume Vmc (μm3 / μm) obtained from the load curve.
μm2).

According to the graph shown in FIG. 24B, “chemical treatment (1)”, “chemical treatment (2)”.
"," Chemical treatment (3) "," Azdepo "," Physical treatment (1) "and" Physical treatment (
2) ”, the substantial volume Vmc of the core portion of each second concavo-convex structure 126 is 0.01 μm 3.
/ Μm 2 or more and 0.035 μm 3 / μm 2 or less.

FIG. 25 is a graph showing the hollow volume of the core portion on the surface of the layered structure.
The inventor set the cut-off to 0.8 μm, and obtained the hollow volume Vvc of the core portion on the surface of the layered structure from the load curve. The results are as shown in FIGS. 25 (a) and 25 (b).

FIG. 25A is a graph showing the hollow volume of the core portion of the first concavo-convex structure 125. FIG. 25B is a graph showing the hollow volume of the core portion of the second concavo-convex structure 126. FIG.
The horizontal axis of the graph shown to (a) and FIG.25 (b) represents another of the form of the layered structure formed in the surface of the plasma-resistant member 120. FIG. The horizontal axis of the graphs shown in FIGS. 25A and 25B is the same as the horizontal axis of the graph shown in FIG. FIG. 25A and FIG.
The vertical axis of the graph shown in b) indicates the hollow volume Vvc (μm3 / μm) of the core obtained from the load curve.
μm2).

According to FIG. 25 (b), “Chemical treatment (1)”, “Chemical treatment (2)”, “Chemical treatment (3)”, “Azdepo”, “Physical treatment (1)” and “ The hollow volume Vvc of the core portion of each second concavo-convex structure 126 in the “physical treatment (2)” is 0.012 μm 3 / μm 2 or more and 0
. It is included in the range of 05 μm 3 / μm 2 or less.

FIG. 26 is a graph showing the developed area ratio of the interface on the surface of the layered structure.
The inventor set the cut-off to 0.8 μm and obtained the developed area ratio Sdr of the interface on the surface of the layered structure. The results are as shown in FIGS. 26 (a) and 26 (b).

FIG. 26A is a graph showing the developed area ratio of the interface of the first concavo-convex structure 125. FIG. 26B is a graph showing the developed area ratio of the interface of the second concavo-convex structure 126. FIG.
The horizontal axis of the graph shown to (a) and FIG.26 (b) represents another of the form of the layered structure formed in the surface of the plasma-resistant member 120. FIG. The horizontal axis of the graphs shown in FIGS. 26A and 26B is the same as the horizontal axis of the graph shown in FIG. 26 (a) and 26 (
The vertical axis of the graph shown in b) represents the developed area ratio Sdr of the interface.

According to FIG. 26 (b), “chemical treatment (1)”, “chemical treatment (2)”, “chemical treatment (3)”, “as depot”, “physical treatment (1)” and “ The developed area ratio Sdr of the interface of each second concavo-convex structure 126 of “physical treatment (2)” is included in the range of 1 to 17.

FIG. 27 is a graph showing the root mean square slope on the surface of the layered structure.
The inventor determined the root mean square slope SΔq on the surface of the layered structure with the cutoff set at 0.8 μm. The results are as shown in FIGS. 27 (a) and 27 (b).

FIG. 27A is a graph showing the root mean square slope of the first concavo-convex structure 125.
FIG. 27B is a graph showing the root mean square slope of the second concavo-convex structure 126. The horizontal axes of the graphs shown in FIG. 27A and FIG. 27B represent different types of layered structures formed on the surface of the plasma-resistant member 120. The horizontal axis of the graphs shown in FIGS. 27A and 27B is the same as the horizontal axis of the graph shown in FIG. FIG. 27 (a) and FIG.
The vertical axis of the graph shown in FIG. 7B represents the root mean square slope SΔq.

The root mean square slope SΔd represents a two-dimensional mean square slope angle Δq on the sampling surface. At every point, the surface slope is expressed as:

Therefore, the root mean square slope SΔq is expressed by the following equation.

According to FIG. 27 (b), “chemical treatment (1)”, “chemical treatment (2)”, “chemical treatment (3)”, “as depot”, “physical treatment (1)” and “ The root mean square slope SΔq of each second concavo-convex structure 126 in the “physical treatment (2)” is included in the range of 0.15 to 0.6.

FIG. 28 is a table illustrating an example of the measurement result of the adhesion strength of the precoat film.
The inventor calculated the peeled area ratio (%) of the coating film (in this specific example, SiO 2 film) by the measurement method described above with reference to FIGS. 17 to 20 with the cutoff set at 0.8 μm. The evaluation of the peeled area ratio of the film and the adhesion strength of the film is as shown in FIG. The criteria for evaluating the adhesion strength of the coating are as described above with reference to FIG.

According to FIG. 28, the peeling area ratio of each film of “chemical treatment (1)”, “chemical treatment (2)”, “as-depot” and “physical treatment (2)” is 0% or more and 20 It is included in the range of less than%.
Note that “thermal spraying” could not be measured for the reason described above with reference to FIG.

Next, the aerosol deposition method will be further described.
FIG. 29 is a photograph of the inside of the layered structure of the present embodiment taken.
FIG. 30 is a table comparing the average crystal grain sizes according to the difference in the formation method of the layered structure.

As described above with reference to FIG. 1, the layered structure 123 is formed by the aerosol deposition method. According to the aerosol deposition method, no heating means is required,
The layered structure 123 can be formed at room temperature. Therefore, the layered structure 123 (123a)
There is no grain boundary layer at the interface between the substrate 121 and the substrate 121 or inside the layered structure 123 (123a).

FIG. 29 is a photograph taken by a TEM. In the photographic diagram shown in FIG. 29, a layered structure 123 of yttria polycrystal is formed on the surface of a quartz substrate 121 by an aerosol deposition method. According to the photographic diagram shown in FIG. 29, there was no grain boundary layer at the interface between the layered structure 123 (123a) and the base material 121 or inside the layered structure 123 (123a). Moreover, an amorphous phase or a heterogeneous phase was not induced.
According to this, the presence / absence of the grain boundary layer can be one of the materials for determining whether or not the layered structure 123 is formed by the aerosol deposition method.

In the aerosol deposition method (AD method), there is no heating process, and the fine particles are deformed or crushed. Therefore, in the composite structure formed by the aerosol deposition method, when crystalline brittle material fine particles are used as a raw material, the crystal particle size of the layered structure 123 portion of the composite structure is the raw material fine particle size, sintered body The crystal grain size is smaller than the crystal grain size of the sprayed film.

As shown in the photograph shown in FIG. 29, the crystal grain size of the yttria polycrystal is about 15-2.
It was about 0 nm. Further, as shown in the comparison table shown in FIG. 30, the average crystal grain size of the yttria polycrystal formed by the aerosol deposition method (AD method) is XRD (X-ra
It was 19 nm as calculated by y Diffraction (X-ray diffraction) analysis. On the other hand, the average crystal grain size of the yttria sintered body was 218 nm. The average crystal grain size of the yttria sprayed film was 71 nm. That is, the average crystal particle size of the yttria polycrystal formed by the aerosol deposition method is about 15 to 20 nm, which is smaller than the average crystal particle size of the yttria sintered body and the average crystal particle size of the yttria sprayed film. .
According to this, the average crystal particle size can be one of the materials for determining whether or not the layered structure 123 is formed by the aerosol deposition method.
In the present embodiment, the average crystal particle diameter is usually 5 nanometers (nm) or more, 50
Nanometer (nm) or less. The average crystal particle diameter is 30 nanometers (nm).
The following is more preferable.

FIG. 31 is a graph illustrating an example of a result of XRD measurement for a layered structure formed by the aerosol deposition method.
In the composite structure formed by the aerosol deposition method, when crystalline brittle material fine particles are used as a raw material, there is no crystal orientation. In contrast, CVD (Chemical
In composite structures formed by Vapor Deposition (chemical vapor deposition) method,
When crystalline brittle material fine particles are used as a raw material, there is crystal orientation.

As shown in the graph of FIG. 31, the crystal structure of the layered structure 123 formed by the aerosol deposition method is a mixed crystal structure including cubic crystals and monoclinic crystals. The crystal of the layered structure 123 formed by the aerosol deposition method has no orientation.
According to this, the presence or absence of crystal orientation can be one of the materials for determining whether or not the layered structure 123 is formed by the aerosol deposition method.

FIG. 32 is a photographic view of the other interior of the layered structure of the present embodiment.
FIG. 32 is a photograph taken by TEM. In the photograph shown in FIG. 32, a layered structure 123 of yttria polycrystal is formed on the surface of a quartz substrate 121 by an aerosol deposition method. An anchor layer 128 that bites into the surface of the substrate 121 is formed in the layered structure 123. Layered structure 123 in which this anchor layer 128 is formed
Is firmly attached to the substrate 121 with extremely high strength.

The embodiment of the present invention has been described above. However, the present invention is not limited to these descriptions. Regarding the above-described embodiments, those appropriately modified by those skilled in the art
As long as the features of the present invention are provided, they are included in the scope of the present invention. For example, the semiconductor manufacturing apparatus 1
The shape, size, material, arrangement, etc. of each element included in 00 and the like, the installation form of the plasma-resistant member 120 and the electrostatic chuck 160 are not limited to those illustrated, and can be appropriately changed.
Moreover, each element with which each embodiment mentioned above is provided can be combined as long as technically possible, and the combination of these is also included in the scope of the present invention as long as it includes the features of the present invention.

100 semiconductor manufacturing apparatus, 110 chamber, 120 plasma-resistant member, 12
DESCRIPTION OF SYMBOLS 1 Base material, 123, 123a, 123b, 123c Layered structure, 125 1st uneven structure, 126 2nd uneven structure, 128 Anchor layer, 160 Electrostatic chuck, 1
91 area, 193 protrusion (or hole), 210 wafer, 221 particle, 251 indenter, 141 scratch mark, 143 peeling area, 145 OHP sheet

1st invention is equipped with the base material and the layered structure which is formed in the surface of the said base material and has yttria polycrystal, and has plasma resistance, The said layered structure is the 1st uneven structure, have a, a second concavo-convex structure having a fine irregularities than the first formed by superimposing the embossed surface of the first relief structure in the entire surface of the layered structure creation, of the layered structure The arithmetic average surface Sa of the surface is a plasma resistant member characterized by being 0.025 μm or more .

Claims (9)

A substrate;
A layered structure formed on the surface of the substrate and containing yttria polycrystals and having plasma resistance;
With
The layered structure is
A first uneven structure;
A second concavo-convex structure formed to overlap the first concavo-convex structure and having finer concavo-convex structure than the first concavo-convex structure;
A plasma-resistant member characterized by comprising: The first concavo-convex structure has a void formed in a part of the surface of the layered structure and a group of crystal grains dropped off,
2. The plasma-resistant member according to claim 1, wherein the second concavo-convex structure is formed on the entire surface of the layered structure and has fine concavo-convex portions having a size of the crystal particles. The arithmetic mean Sa of the surface of the layered structure is 0.025 μm or more and 0.075 μm or less,
The substantial volume Vmc of the core portion determined from the load curve on the surface of the layered structure is 0.03.
μm3 / μm2 or more and 0.08 μm3 / μm2 or less,
The hollow volume Vvc of the core portion determined from the load curve on the surface of the layered structure is 0.03.
It is not less than μm3 / μm2 and not more than 0.1 μm3 / μm2,
3. The plasma-resistant member according to claim 1, wherein a development area ratio Sdr at an interface of the surface of the layered structure is 3 or more and 28 or less. The plasma-resistant member according to any one of claims 1 to 3, wherein the first concavo-convex structure and the second concavo-convex structure are formed by chemical treatment. A substrate;
A layered structure formed on the surface of the substrate and containing yttria polycrystals and having plasma resistance;
With
When the cut-off in the surface analysis is 0.8 μm,
The arithmetic mean Sa of the surface of the layered structure is 0.010 μm or more and 0.035 μm or less,
The substantial volume Vmc of the core portion obtained from the load curve on the surface of the layered structure is 0.01.
μm3 / μm2 or more and 0.035 μm3 / μm2 or less,
The hollow volume Vvc of the core portion obtained from the load curve on the surface of the layered structure is 0.01.
2 μm 3 / μm 2 or more and 0.05 μm 3 / μm 2 or less,
The development area ratio Sdr of the interface of the surface of the layered structure is 1 or more and 17 or less,
The root mean square slope SΔq of the surface of the layered structure is 0.15 or more and 0.6 or less. The plasma-resistant member according to any one of claims 1 to 5, wherein the layered structure has a dense structure of the yttria polycrystal. 7. The plasma-resistant member according to claim 6, wherein a rough portion of the dense structure becomes smaller when going from a surface layer of the layered structure to a deeper layer than the surface layer. The plasma-resistant member according to claim 6, wherein in the dense structure, coarse portions having a density smaller than that of the dense portion are three-dimensionally distributed in the dense portion. The plasma-resistant member according to any one of claims 1 to 8, wherein the layered structure is formed by an aerosol deposition method.