JP2018145415A - Curable resin composition for peeling sheet, process base material comprising the same, and method for protecting base material - Google Patents
Curable resin composition for peeling sheet, process base material comprising the same, and method for protecting base material Download PDFInfo
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- JP2018145415A JP2018145415A JP2018032795A JP2018032795A JP2018145415A JP 2018145415 A JP2018145415 A JP 2018145415A JP 2018032795 A JP2018032795 A JP 2018032795A JP 2018032795 A JP2018032795 A JP 2018032795A JP 2018145415 A JP2018145415 A JP 2018145415A
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- curable resin
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- 239000011342 resin composition Substances 0.000 title claims abstract description 68
- 238000000034 method Methods 0.000 title claims description 25
- 239000000463 material Substances 0.000 title claims description 24
- -1 polydimethylsiloxane Polymers 0.000 claims abstract description 66
- 150000003568 thioethers Chemical class 0.000 claims abstract description 41
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 39
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims abstract description 35
- 239000004205 dimethyl polysiloxane Substances 0.000 claims abstract description 15
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims description 41
- 239000000203 mixture Substances 0.000 claims description 20
- 125000004432 carbon atom Chemical group C* 0.000 claims description 18
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 16
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 13
- 239000003999 initiator Substances 0.000 claims description 9
- 239000011241 protective layer Substances 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 6
- 125000000524 functional group Chemical group 0.000 claims description 6
- 239000011347 resin Substances 0.000 claims description 6
- 229920005989 resin Polymers 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 3
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 claims description 3
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 claims description 3
- 239000004721 Polyphenylene oxide Substances 0.000 abstract description 14
- 229920000570 polyether Polymers 0.000 abstract description 14
- 230000000873 masking effect Effects 0.000 description 23
- 230000000052 comparative effect Effects 0.000 description 22
- 125000003396 thiol group Chemical class [H]S* 0.000 description 15
- 238000011156 evaluation Methods 0.000 description 14
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical group CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 8
- 150000001412 amines Chemical class 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 238000005336 cracking Methods 0.000 description 7
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- 238000007747 plating Methods 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 239000003505 polymerization initiator Substances 0.000 description 7
- 229920002799 BoPET Polymers 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- 230000005484 gravity Effects 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 229920001721 polyimide Polymers 0.000 description 5
- 238000007639 printing Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 5
- 239000004642 Polyimide Substances 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical group OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 125000000101 thioether group Chemical group 0.000 description 4
- 0 C**(C)(C(*)(*)COC(*N*C(O*)=O)=O)C(*)(*)*CC(C)(C)OC(**)=O Chemical compound C**(C)(C(*)(*)COC(*N*C(O*)=O)=O)C(*)(*)*CC(C)(C)OC(**)=O 0.000 description 3
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- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 239000004034 viscosity adjusting agent Substances 0.000 description 3
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 2
- NHCZYSDZAMNWGB-UHFFFAOYSA-N 3,4,6,7,8,9-hexahydro-2h-pyrimido[1,2-a]pyrimidine;2-(9-oxoxanthen-2-yl)propanoic acid Chemical compound C1CCN2CCCNC2=N1.C1=CC=C2C(=O)C3=CC(C(C(O)=O)C)=CC=C3OC2=C1 NHCZYSDZAMNWGB-UHFFFAOYSA-N 0.000 description 2
- UIDDPPKZYZTEGS-UHFFFAOYSA-N 3-(2-ethyl-4-methylimidazol-1-yl)propanenitrile Chemical compound CCC1=NC(C)=CN1CCC#N UIDDPPKZYZTEGS-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 150000003141 primary amines Chemical class 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 150000003335 secondary amines Chemical class 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- VJDHKUHTYJLWPV-UHFFFAOYSA-N (2-nitrophenyl)methyl 4-(2-methylprop-2-enoyloxy)piperidine-1-carboxylate Chemical compound C(C(=C)C)(=O)OC1CCN(CC1)C(=O)OCC1=C(C=CC=C1)[N+](=O)[O-] VJDHKUHTYJLWPV-UHFFFAOYSA-N 0.000 description 1
- OBETXYAYXDNJHR-SSDOTTSWSA-M (2r)-2-ethylhexanoate Chemical compound CCCC[C@@H](CC)C([O-])=O OBETXYAYXDNJHR-SSDOTTSWSA-M 0.000 description 1
- RUEBPOOTFCZRBC-UHFFFAOYSA-N (5-methyl-2-phenyl-1h-imidazol-4-yl)methanol Chemical compound OCC1=C(C)NC(C=2C=CC=CC=2)=N1 RUEBPOOTFCZRBC-UHFFFAOYSA-N 0.000 description 1
- YBBLOADPFWKNGS-UHFFFAOYSA-N 1,1-dimethylurea Chemical class CN(C)C(N)=O YBBLOADPFWKNGS-UHFFFAOYSA-N 0.000 description 1
- GIWQSPITLQVMSG-UHFFFAOYSA-N 1,2-dimethylimidazole Chemical compound CC1=NC=CN1C GIWQSPITLQVMSG-UHFFFAOYSA-N 0.000 description 1
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 description 1
- HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- XZKLXPPYISZJCV-UHFFFAOYSA-N 1-benzyl-2-phenylimidazole Chemical compound C1=CN=C(C=2C=CC=CC=2)N1CC1=CC=CC=C1 XZKLXPPYISZJCV-UHFFFAOYSA-N 0.000 description 1
- FODCFYIWOJIZQL-UHFFFAOYSA-N 1-methylsulfanyl-3,5-bis(trifluoromethyl)benzene Chemical compound CSC1=CC(C(F)(F)F)=CC(C(F)(F)F)=C1 FODCFYIWOJIZQL-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- RUFZNDNBXKOZQV-UHFFFAOYSA-N 2,3-dihydro-1h-pyrrolo[1,2-a]benzimidazole Chemical compound C1=CC=C2N(CCC3)C3=NC2=C1 RUFZNDNBXKOZQV-UHFFFAOYSA-N 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- LDXJRKWFNNFDSA-UHFFFAOYSA-N 2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound C1CN(CC2=NNN=C21)CC(=O)N3CCN(CC3)C4=CN=C(N=C4)NCC5=CC(=CC=C5)OC(F)(F)F LDXJRKWFNNFDSA-UHFFFAOYSA-N 0.000 description 1
- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 1
- ZJRNXDIVAGHETA-GQCTYLIASA-N 2-[(e)-2-(3,4-dimethoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=C(OC)C(OC)=CC=C1\C=C\C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 ZJRNXDIVAGHETA-GQCTYLIASA-N 0.000 description 1
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- PCKZAVNWRLEHIP-UHFFFAOYSA-N 2-hydroxy-1-[4-[[4-(2-hydroxy-2-methylpropanoyl)phenyl]methyl]phenyl]-2-methylpropan-1-one Chemical compound C1=CC(C(=O)C(C)(O)C)=CC=C1CC1=CC=C(C(=O)C(C)(C)O)C=C1 PCKZAVNWRLEHIP-UHFFFAOYSA-N 0.000 description 1
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- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 1
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- 125000006267 biphenyl group Chemical group 0.000 description 1
- VGZKCAUAQHHGDK-UHFFFAOYSA-M bis(4-tert-butylphenyl)iodanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC(C(C)(C)C)=CC=C1[I+]C1=CC=C(C(C)(C)C)C=C1 VGZKCAUAQHHGDK-UHFFFAOYSA-M 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000012663 cationic photopolymerization Methods 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- IUNMPGNGSSIWFP-UHFFFAOYSA-N dimethylaminopropylamine Chemical compound CN(C)CCCN IUNMPGNGSSIWFP-UHFFFAOYSA-N 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- ZRALSGWEFCBTJO-UHFFFAOYSA-O guanidinium Chemical compound NC(N)=[NH2+] ZRALSGWEFCBTJO-UHFFFAOYSA-O 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 150000002462 imidazolines Chemical class 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- LAQFLZHBVPULPL-UHFFFAOYSA-N methyl(phenyl)silicon Chemical compound C[Si]C1=CC=CC=C1 LAQFLZHBVPULPL-UHFFFAOYSA-N 0.000 description 1
- HYIMSNHJOBLJNT-UHFFFAOYSA-N nifedipine Chemical compound COC(=O)C1=C(C)NC(C)=C(C(=O)OC)C1C1=CC=CC=C1[N+]([O-])=O HYIMSNHJOBLJNT-UHFFFAOYSA-N 0.000 description 1
- 229960001597 nifedipine Drugs 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 125000001302 tertiary amino group Chemical group 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- UXVLEXMPXZXYSA-UHFFFAOYSA-N triazine-1,2-diamine Chemical group NN1C=CC=NN1N UXVLEXMPXZXYSA-UHFFFAOYSA-N 0.000 description 1
- ZZJNLOGMYQURDL-UHFFFAOYSA-M trifluoromethanesulfonate;tris(4-methylphenyl)sulfanium Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC(C)=CC=C1[S+](C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 ZZJNLOGMYQURDL-UHFFFAOYSA-M 0.000 description 1
- VMJFYMAHEGJHFH-UHFFFAOYSA-M triphenylsulfanium;bromide Chemical compound [Br-].C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 VMJFYMAHEGJHFH-UHFFFAOYSA-M 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Polymerisation Methods In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Paints Or Removers (AREA)
Abstract
Description
本発明は、硬化により、密着性および柔軟性に優れた剥離シートを得ることができる剥離シート用硬化性樹脂組成物に関する。また本発明は、剥離シート用硬化性樹脂組成物を硬化して得られる剥離シートを有する工程基材に関する。さらに本発明は、剥離シート用硬化性樹脂組成物を硬化して得られる剥離シートを保護層として、基材を保護する方法に関する。 The present invention relates to a curable resin composition for a release sheet, which can obtain a release sheet having excellent adhesion and flexibility by curing. Moreover, this invention relates to the process base material which has a peeling sheet obtained by hardening | curing curable resin composition for release sheets. Furthermore, this invention relates to the method of protecting a base material by using the peeling sheet obtained by hardening | curing the curable resin composition for peeling sheets as a protective layer.
従来より、電子材料など精密部品等の製造工程において基材の表面を保護するために剥離性シートが使用されている(例えば特許文献1)。しかしながら、これらの多くは基材に合わせて剥離シートを切断する必要があり、使用されないで廃棄される部分も生じていた。また、加熱処理後に剥離すると残渣が基材に残る場合があった。 Conventionally, a peelable sheet has been used to protect the surface of a substrate in the manufacturing process of precision parts such as electronic materials (for example, Patent Document 1). However, in many of these cases, it is necessary to cut the release sheet in accordance with the base material, and some parts are discarded without being used. Moreover, when it peels after heat processing, the residue may remain on the base material.
また特許文献2には、耐熱性を向上させ、液状で使用することにより必要な箇所だけに印刷し、保護することができ、廃棄物を減らせる手法が提案されている。しかしながら、この手法ではマスキングしたまま基材をメッキ加工する場合、洗浄液に樹脂が溶解し、容易に剥離できなくなる問題点があった。 Patent Document 2 proposes a technique that improves heat resistance and can be printed and protected only in necessary places by using it in a liquid state, thereby reducing waste. However, in this method, when the substrate is plated with masking, the resin dissolves in the cleaning solution and cannot be easily peeled off.
また特許文献3には、ポリエーテル変性ポリジメチルシロキサンを含むコート剤をポリカーボネート基材表面へ塗工することで透明ですべり性付与する手法が提案されているが、この手法は、基材作製後に表面へ塗工する必要があり、基材に混ぜ込んで作製すると白濁してしまうなどの問題点があった。 Further, Patent Document 3 proposes a technique for imparting a transparent and slippery property by applying a coating agent containing polyether-modified polydimethylsiloxane to the surface of a polycarbonate substrate. There was a problem that it was necessary to apply to the surface and it would become cloudy if mixed with the substrate.
本発明は、基材へ比較的薄く塗工することが容易で、得られた硬化膜が耐熱性、印刷性、マスキング性、滑り性、透明性、および各種基材に対する剥離性に優れた材料を提供することを目的とする。また本発明は、基材から剥離した後、残留溶媒や可塑剤等による残渣が基材に残らない剥離シートが得られる材料を提供することを目的とする。 The present invention is a material that can be applied to a substrate relatively thinly, and the obtained cured film has excellent heat resistance, printability, masking property, slipperiness, transparency, and releasability from various substrates. The purpose is to provide. Moreover, an object of this invention is to provide the material from which the peeling sheet by which the residue by a residual solvent, a plasticizer, etc. does not remain in a base material after peeling from a base material is obtained.
また本発明は、かかる材料を硬化して得られる、マスキング性、柔軟性、滑り性、透明性、および剥離性に優れた剥離シートを有する工程基材を提供することを目的とする。
さらに本発明の目的は、かかる剥離シートを保護層として、基材を保護する方法を提供することを目的とする。
Another object of the present invention is to provide a process substrate having a release sheet excellent in masking property, flexibility, slipperiness, transparency and releasability obtained by curing such a material.
A further object of the present invention is to provide a method for protecting a substrate using such a release sheet as a protective layer.
本発明者らは、ポリエーテル変性ポリジメチルシロキサンを、特定構造のチオエーテル含有(メタ)アクリレート誘導体と、特定の多官能(メタ)アクリレートとの特定比率の混合物に対して、特定量組合せて、剥離シート用硬化性樹脂組成物として用いることにより、上記課題を解決することを見出し、本発明を完成するに至った。
すなわち、本発明は下記の〔1〕〜〔6〕である。
The present inventors peeled a polyether-modified polydimethylsiloxane by combining a specific amount of a mixture of a thioether-containing (meth) acrylate derivative having a specific structure and a specific polyfunctional (meth) acrylate in a specific ratio. By using it as a curable resin composition for sheets, the inventors have found that the above problems can be solved, and have completed the present invention.
That is, the present invention includes the following [1] to [6].
〔1〕(A)下記(式1)で表されるチオエーテル含有(メタ)アクリレート誘導体と、
(B)重量平均分子量が200〜50000である多官能(メタ)アクリレートと、
(C)ポリエーテル変性ポリジメチルシロキサン
を含有し、(A)成分と(B)成分との質量比((A)/(B))が0.05〜30であり、(A)成分と(B)成分との合計質量100質量部に対して、(C)成分の質量が0.01〜5質量部である剥離シート用硬化性樹脂組成物。
(式中のaは1〜5の整数であり、bは0〜2の整数であり、cは1〜5の整数であり、aとbとcの和は3〜4、又は、6である。dは0〜1の整数であり、R1は、メチレン基、エチレン基またはイソプロピレン基である。R2は、下記(式2)または下記(式3)で表される2価の官能基である。R3は、メチル基またはエチル基である。R4は、炭素数が1〜12の炭化水素基である。R6は炭素原子、下記式(4)で表される3価の官能基、及び、下記(式5)で表される6価の官能基から選ばれる何れかである。)
〔3〕(A)成分と(B)成分との合計質量100質量部に対し、さらに(E)重量平均分子量が80〜700であるアミン化合物0.01〜50質量部を含有する、前記の〔1〕または〔2〕に記載の剥離シート用硬化性樹脂組成物。
〔4〕前記の〔1〕から〔3〕のいずれか一つに記載の剥離シート用硬化性樹脂組成物を硬化させて得られる剥離シート。
〔5〕基材に、前記の〔1〕から〔3〕のいずれか一つに記載の剥離シート用硬化性樹脂組成物を塗布して硬化させて得られる剥離シートが積層されてなる工程基材。
〔6〕基材に、前記の〔1〕から〔3〕のいずれか一つに記載の剥離シート用硬化性樹脂組成物を塗布して硬化させて得られる剥離シートを保護層として設けることにより、基材を保護する方法。
[1] (A) a thioether-containing (meth) acrylate derivative represented by the following (formula 1);
(B) a polyfunctional (meth) acrylate having a weight average molecular weight of 200 to 50,000,
(C) It contains polyether-modified polydimethylsiloxane, the mass ratio ((A) / (B)) of the component (A) to the component (B) is 0.05 to 30, and the component (A) B) The curable resin composition for release sheets in which the mass of the component (C) is 0.01 to 5 parts by mass with respect to 100 parts by mass of the total mass with the component.
(In the formula, a is an integer of 1 to 5, b is an integer of 0 to 2, c is an integer of 1 to 5, and the sum of a, b, and c is 3 to 4, or 6. D is an integer of 0 to 1 , R 1 is a methylene group, an ethylene group or an isopropylene group, and R 2 is a divalent group represented by the following (formula 2) or the following (formula 3). R 3 is a methyl group or an ethyl group, R 4 is a hydrocarbon group having 1 to 12 carbon atoms, R 6 is a carbon atom, 3 represented by the following formula (4) And any one selected from a valent functional group and a hexavalent functional group represented by the following (formula 5).)
[3] For the total mass of 100 parts by mass of component (A) and component (B), (E) 0.01-50 parts by mass of an amine compound having a weight average molecular weight of 80-700, [1] or the curable resin composition for a release sheet according to [2].
[4] A release sheet obtained by curing the curable resin composition for a release sheet according to any one of [1] to [3].
[5] Process group in which a release sheet obtained by applying and curing the curable resin composition for a release sheet according to any one of [1] to [3] above is laminated on a substrate. Wood.
[6] By providing, as a protective layer, a release sheet obtained by applying and curing the curable resin composition for a release sheet according to any one of [1] to [3] on a base material , A method of protecting a substrate.
本発明の剥離シート用硬化性樹脂組成物は、所望の厚さに容易に塗工することができ、剥離時は、残渣なく容易に剥がすことができる。さらに、同組成物を硬化して得られた硬化膜は、マスキング性および剥離性にも優れているため、基材に積層して工程基材として用いることができ、滑り性にも優れるため重ねて保管した際に上下の基材とブロッキングを防ぐことができる。また、剥離シート自身を基材として用いることも可能であり、透明性が必要な用途へも適用することができる。本発明の剥離シート用硬化性樹脂組成物を硬化して得られる剥離シートを保護層として用いることにより、基材を保護する方法を提供することができる。 The curable resin composition for a release sheet of the present invention can be easily applied to a desired thickness, and can be easily peeled off without residue at the time of peeling. Furthermore, since the cured film obtained by curing the same composition is excellent in masking property and peelability, it can be laminated on a substrate and used as a process substrate, and is also excellent in slipperiness. Can be prevented from blocking with the upper and lower substrates. Further, the release sheet itself can be used as a base material, and can be applied to uses that require transparency. The method of protecting a base material can be provided by using as a protective layer the release sheet obtained by hardening | curing the curable resin composition for release sheets of this invention.
以下に、本発明について詳しく説明する。なお、本発明において「(メタ)アクリレート」とは、アクリレートとメタクリレートの双方を含む総称を意味し、「(メタ)アクリロキシ基」とは、アクリロキシ基とメタクリロキシ基の双方を含む総称を意味する。また、本発明において数値範囲を示す「○○〜××」とは、別途記載が無い限り、その下限値(「○○」)や上限値(「××」)を含む概念である。すなわち、正確には「○○以上××以下」を意味する。 The present invention is described in detail below. In the present invention, “(meth) acrylate” means a generic name including both acrylate and methacrylate, and “(meth) acryloxy group” means a generic name including both an acryloxy group and a methacryloxy group. In the present invention, “OO to XX” indicating a numerical range is a concept including a lower limit (“OO”) and an upper limit (“XX”) unless otherwise specified. In other words, it means “more than XX and less than xx”.
本発明の剥離シート用硬化性樹脂組成物は、下記(A)、(B)および(C)成分を必須成分とし、任意に(D)および(E)成分の少なくとも一方をさらに含有する硬化性樹脂組成物である。 The curable resin composition for a release sheet of the present invention comprises the following components (A), (B) and (C) as essential components, and optionally further contains at least one of components (D) and (E). It is a resin composition.
<チオエーテル含有(メタ)アクリレート誘導体((A)成分)>
(A)成分であるチオエーテル含有(メタ)アクリレート誘導体とは、下記(式1)で表される化合物であり、(メタ)アクリレートから誘導されるチオエーテル基を含有する化合物である。
(式中のaは1〜5の整数であり、bは0〜2の整数であり、cは1〜5の整数であり、aとbとcの和は3〜4、又は、6である。dは0〜1の整数であり、R1は、メチレン基、エチレン基またはイソプロピレン基である。R2は、下記(式2)または下記(式3)で表される2価の官能基である。R3は、メチル基またはエチル基である。R4は、炭素数が1〜12の炭化水素基である。R6は炭素原子、下記式(4)で表される3価の官能基、及び、下記(式5)で表される6価の官能基から選ばれる何れかである。)
The (A) component thioether-containing (meth) acrylate derivative is a compound represented by the following (formula 1), and is a compound containing a thioether group derived from (meth) acrylate.
(In the formula, a is an integer of 1 to 5, b is an integer of 0 to 2, c is an integer of 1 to 5, and the sum of a, b, and c is 3 to 4, or 6. D is an integer of 0 to 1 , R 1 is a methylene group, an ethylene group or an isopropylene group, and R 2 is a divalent group represented by the following (formula 2) or the following (formula 3). R 3 is a methyl group or an ethyl group, R 4 is a hydrocarbon group having 1 to 12 carbon atoms, R 6 is a carbon atom, 3 represented by the following formula (4) And any one selected from a valent functional group and a hexavalent functional group represented by the following (formula 5).)
上記(式1)中のR4である炭素数が1〜12の炭化水素基としては、直鎖のアルキル基、側鎖を持つアルキル基、環状のアルキル基が挙げられる。 Examples of the hydrocarbon group having 1 to 12 carbon atoms as R 4 in the above (formula 1) include a linear alkyl group, an alkyl group having a side chain, and a cyclic alkyl group.
上記(式1)中のR6が炭素原子である場合、aは1〜3、bは0、cは1〜3、dは0の整数が好ましい。
上記(式1)中のR6が(式4)で表される基である場合、aは1〜2、bは0または1、cは1〜2、dは1の整数が好ましい。
上記(式1)中のR6が(式5)で表される基である場合、aは1〜5、bは0〜2、cは1〜5、dは0の整数が好ましい。
When R 6 in (Formula 1) is a carbon atom, a is preferably an integer of 1 to 3, b is 0, c is 1 to 3, and d is an integer of 0.
When R 6 in (Formula 1) is a group represented by (Formula 4), a is preferably an integer of 1 to 2, b is 0 or 1, c is 1 to 2, and d is an integer of 1.
When R 6 in (Formula 1) is a group represented by (Formula 5), a is preferably an integer of 1 to 5, b is 0 to 2, c is 1 to 5, and d is an integer of 0.
<多官能(メタ)アクリレート((B)成分)>
(B)成分である多官能(メタ)アクリレートは、重量平均分子量が200〜50000で末端に(メタ)アクリロキシ基を有している化合物であり、その好ましい例として下記一般式(式5)で表される化合物が挙げられる。また、(B)成分である多官能(メタ)アクリレートは、1種のみを単独で使用することもできるし、2種以上を混合使用することもできる。
The polyfunctional (meth) acrylate as the component (B) is a compound having a weight average molecular weight of 200 to 50,000 and having a (meth) acryloxy group at the terminal, and a preferable example thereof is represented by the following general formula (formula 5). And the compounds represented. Moreover, the polyfunctional (meth) acrylate which is (B) component can also be used individually by 1 type, and 2 or more types can also be mixed and used for it.
式中のeは、好ましくは2〜10である。
R7は炭素数2〜300の炭化水素基、エーテル酸素(−O−)およびヒドロキシル基(−OH)からなる群より選択される少なくとも1種を含んでいてもよい炭素数2〜300の炭化水素基、またはイソシアヌレート環若しくはイソシアヌレート環と炭化水素基のみからなる基であり、好ましくは炭素数2〜20の炭化水素基、エーテル酸素(−O−)およびヒドロキシル基(−OH)からなる群より選択される少なくとも1種を含んでいてもよい炭素数2〜250の炭化水素基である。
さらにR7は、より好ましくは、次式で表される水素化ビスフェノールA型エポキシ樹脂縮合物残基(n=8〜18、重量平均分子量=2200〜7000)
E in the formula is preferably 2 to 10.
R 7 may contain at least one selected from the group consisting of a hydrocarbon group having 2 to 300 carbon atoms, an ether oxygen (—O—) and a hydroxyl group (—OH). A hydrogen group, or an isocyanurate ring or a group consisting only of an isocyanurate ring and a hydrocarbon group, preferably consisting of a hydrocarbon group having 2 to 20 carbon atoms, an ether oxygen (—O—) and a hydroxyl group (—OH) It is a C2-250 hydrocarbon group that may contain at least one selected from the group.
R 7 is more preferably a hydrogenated bisphenol A type epoxy resin condensate residue represented by the following formula (n = 8 to 18, weight average molecular weight = 2200 to 7000).
R8はそれぞれ独立して水素原子またはメチル基であり、水素原子の場合、チオールとの反応性に優れるため、樹脂組成物は硬化性に優れる。一方、R8がメチル基の場合、チオールとの反応性が劣るため、樹脂組成物は貯蔵安定性の観点で優れる。
Each R 8 is independently a hydrogen atom or a methyl group, and in the case of a hydrogen atom, the reactivity with thiol is excellent, so that the resin composition is excellent in curability. On the other hand, when R 8 is a methyl group, the reactivity with thiol is poor, so the resin composition is excellent from the viewpoint of storage stability.
また、(B)多官能(メタ)アクリレートとしては、ポリマータイプのものも好適に用いることができる。ポリマータイプの多官能(メタ)アクリレートとしては、グリシジル(メタ)アクリレート等のエポキシ基を有する(メタ)アクリレート単独あるいは共重合体に、(メタ)アクリル酸のようにエポキシ基と反応する基を有する(メタ)アクリレートを反応させて得られるポリマー、ヒドロキシエチル(メタ)アクリレート等の水酸基を有する(メタ)アクリレート単独あるいは共重合体に、2−メチルプロペン酸2−イソシアナトエチルのように水酸基と反応する基を有する(メタ)アクリレートを反応させて得られるポリマー、(メタ)アクリル酸等のカルボキシル基を有する(メタ)アクリレート単独あるいは共重合体に、グリシジル(メタ)アクリレートのようにカルボキシル基と反応する基を有する(メタ)アクリレートを反応させて得られるポリマー等が挙げられる。 Moreover, as (B) polyfunctional (meth) acrylate, a polymer type thing can also be used conveniently. As a polymer type polyfunctional (meth) acrylate, a (meth) acrylate having an epoxy group such as glycidyl (meth) acrylate or a copolymer has a group that reacts with an epoxy group such as (meth) acrylic acid. A polymer obtained by reacting (meth) acrylate, (meth) acrylate having a hydroxyl group such as hydroxyethyl (meth) acrylate, or a copolymer, reacting with a hydroxyl group such as 2-methylpropenoic acid 2-isocyanatoethyl A polymer obtained by reacting a (meth) acrylate having a group to react, (meth) acrylate having a carboxyl group such as (meth) acrylic acid or a copolymer, and reacting with a carboxyl group like glycidyl (meth) acrylate (Meth) acrylate having a group that reacts with Resulting Te polymers.
(B)多官能(メタ)アクリレートの重量平均分子量は、200〜50000、好ましくは220〜40000、より好ましくは240〜30000である。(B)多官能(メタ)アクリレートの重量平均分子量が200より小さくても密着性に関しては問題ないが、揮発性が高くなり臭気が強くなる傾向があるため好ましくない。一方、重量平均分子量が50000より大きいと、他の成分に対する溶解性が低くなる可能性があるため好ましくない。 (B) The weight average molecular weight of polyfunctional (meth) acrylate is 200-50000, Preferably it is 220-40000, More preferably, it is 240-30000. (B) Even if the weight average molecular weight of the polyfunctional (meth) acrylate is smaller than 200, there is no problem with respect to adhesion, but it is not preferable because the volatility tends to increase and the odor tends to increase. On the other hand, if the weight average molecular weight is more than 50000, the solubility in other components may be lowered, which is not preferable.
また、(B)多官能(メタ)アクリレートの(メタ)アクリレート当量は80〜6000g/mol、好ましくは80〜4500g/mol、より好ましくは85〜3000g/molとする。(メタ)アクリレート当量が80g/molより小さいと、単位体積あたりの(メタ)アクリロキシ基が過剰になって(A)チオエーテル含有(メタ)アクリレート誘導体のチオール基と未反応の(メタ)アクリロキシ基が多量に残存することで、硬化性樹脂組成物からなる硬化膜の靭性が低下するおそれがある。一方、(メタ)アクリレート当量が6000g/molより大きくなると、(メタ)アクリロキシ基濃度が著しく低いことから(A)チオエーテル含有(メタ)アクリレート誘導体のチオール基との反応効率が低下することで、硬化性樹脂組成物からなる硬化膜の靭性が低下するおそれがある。 The (meth) acrylate equivalent of (B) polyfunctional (meth) acrylate is 80 to 6000 g / mol, preferably 80 to 4500 g / mol, more preferably 85 to 3000 g / mol. When the (meth) acrylate equivalent is less than 80 g / mol, the (meth) acryloxy group per unit volume becomes excessive, and the thiol group of the (A) thioether-containing (meth) acrylate derivative and the unreacted (meth) acryloxy group By remaining in a large amount, the toughness of the cured film made of the curable resin composition may be reduced. On the other hand, when the (meth) acrylate equivalent is larger than 6000 g / mol, the (meth) acryloxy group concentration is extremely low, so that the reaction efficiency with the thiol group of the (A) thioether-containing (meth) acrylate derivative is reduced, thereby curing. There is a possibility that the toughness of the cured film made of the conductive resin composition is lowered.
<ポリエーテル変性ポリジメチルシロキサン((C)成分)>
(C)成分は、下記(式6)で表される構造を繰り返し単位とするポリジメチルシロキサン構造を主鎖をとし、下記(式7)で表される構造の少なくとも1種を繰り返し単位とするポリエーテル構造を側鎖及び/又は末端に有する化合物である。
なお、ポリエーテル構造を「側鎖」に有するとは、ポリジメチルシロキサン構造の一部のメチル基がポリエーテル構造を含んだ基に置換されていることを意味し、ポリエーテル構造を「末端」に有するとは、ポリジメチルシロキサン構造の末端がポリエーテル構造を含んだ基に置換されていることを意味する。
ポリジメチルシロキサン構造とポリエーテル構造は、下記(式8)で表されるアルキレン基を介して結合していることが挙げられる。
ポリエーテル構造の末端基としては、水素原子またはメチル基が挙げられる。
ポリエーテル構造の重合度としては、1〜10が挙げられる。
メチル基がポリエーテル構造を含んだ基に置換されているジメチルシロキサン単位の割合は、通常1〜99%である。
<Polyether-modified polydimethylsiloxane (component (C))>
The component (C) has a polydimethylsiloxane structure having a structure represented by the following (formula 6) as a repeating unit as a main chain, and at least one of structures represented by the following (formula 7) as a repeating unit. A compound having a polyether structure in the side chain and / or terminal.
In addition, having a polyether structure in the “side chain” means that some methyl groups in the polydimethylsiloxane structure are substituted with a group containing the polyether structure, and the polyether structure is “terminal”. Having in the formula means that the terminal of the polydimethylsiloxane structure is substituted with a group containing a polyether structure.
It can be mentioned that the polydimethylsiloxane structure and the polyether structure are bonded via an alkylene group represented by the following (formula 8).
Examples of the terminal group of the polyether structure include a hydrogen atom or a methyl group.
Examples of the polymerization degree of the polyether structure include 1 to 10.
The proportion of dimethylsiloxane units in which a methyl group is substituted with a group containing a polyether structure is usually 1 to 99%.
(C)成分は、ポリエーテル基を有しているため、チオエーテル基を有している(A)成分と組み合わせることで相溶性が良くなることから配合液にした際、配合液全体に分散しやすく透明性に優れる。一方で、ポリエーテル基を有していないシリコーン、例えばフェニル基を有するメチルフェニルシリコーンなどは、疎水性が高すぎることから(A)成分との相溶性が悪く、白濁してしまうことから適していない。また、本発明の剥離シート用硬化性樹脂組成物は、(A)チオエーテル含有(メタ)アクリレート誘導体と(B)多官能(メタ)アクリレートとの合計質量((A)+(B))100質量部に対し、(C)ポリエーテル変性ポリジメチルシロキサンが0.01〜5質量部、好ましくは0.03〜4質量部、さらに好ましくは、0.05〜3質量部となるよう配合する。((A)+(B))100質量部に対して(C)成分の配合量が0.01質量部未満では、ポリエーテル変性ポリジメチルシロキサンの効果が弱く剥離性が劣るおそれがあり、5質量部を超えると樹脂に対して過剰となり塗膜強度が落ちるおそれや、ポリエーテル変性ポリジメチルシロキサンが塗膜表面にブリードアウトするおそれがある。 Since the component (C) has a polyether group, the compatibility is improved by combining with the component (A) having a thioether group. Easy to be transparent. On the other hand, silicones that do not have a polyether group, such as methylphenyl silicones having a phenyl group, are suitable because they are too high in hydrophobicity and become cloudy. Absent. Moreover, the curable resin composition for release sheets of the present invention has a total mass ((A) + (B)) of 100 masses of (A) a thioether-containing (meth) acrylate derivative and (B) a polyfunctional (meth) acrylate. The (C) polyether-modified polydimethylsiloxane is blended in an amount of 0.01 to 5 parts by mass, preferably 0.03 to 4 parts by mass, and more preferably 0.05 to 3 parts by mass. When the blending amount of the component (C) is less than 0.01 parts by mass with respect to 100 parts by mass of ((A) + (B)), the effect of the polyether-modified polydimethylsiloxane is weak and the peelability may be inferior. If it exceeds the mass part, it may be excessive with respect to the resin and the coating strength may decrease, or the polyether-modified polydimethylsiloxane may bleed out on the coating surface.
<光重合開始剤((D)成分)>
本発明の剥離シート用硬化性樹脂組成物は、(A)〜(B)成分に加えて、さらに(D)光重合開始剤を含有させることができる。(D)成分は、(A)成分と(B)成分との合計質量100質量部に対し、0.01〜10質量部配合する。
<Photopolymerization initiator (component (D))>
The curable resin composition for a release sheet of the present invention may further contain (D) a photopolymerization initiator in addition to the components (A) to (B). (D) component mix | blends 0.01-10 mass parts with respect to 100 mass parts of total mass of (A) component and (B) component.
(D)成分である光重合開始剤は、チオール基と(メタ)アクリロキシ基との反応を促進するために添加され、硬化性組成物の硬化に必要な光照射を少なくすることができる。光重合開始剤としては、光ラジカル重合開始剤、光カチオン重合開始剤、光アニオン重合開始剤等があげられる。光ラジカル重合開始剤は、反応時間を短縮する際に用いることが好ましく、光カチオン重合開始剤は、硬化収縮を小さくする際に用いることが好ましく、光アニオン重合開始剤は、電子回路等の分野で用いることが好ましい。 (D) The photoinitiator which is a component is added in order to accelerate | stimulate reaction of a thiol group and a (meth) acryloxy group, and can reduce the light irradiation required for hardening of a curable composition. Examples of the photopolymerization initiator include a photoradical polymerization initiator, a photocationic polymerization initiator, and a photoanionic polymerization initiator. The photoradical polymerization initiator is preferably used for shortening the reaction time, the photocationic polymerization initiator is preferably used for reducing curing shrinkage, and the photoanionic polymerization initiator is used in the field of electronic circuits and the like. It is preferable to use in.
光ラジカル重合開始剤としては、例えば、2,2−ジメトキシ−1,2−ジフェニルエタン−1−オン、1−ヒドロキシ−シクロヘキシル−フェニル−ケトン、2−ヒドロキシ−2−メチル−1−フェニル−プロパン−1−オン、1−[4−(2−ヒドロキシエトキシ)−フェニル]−2−ヒドロキシ−2−メチル−1−プロパン−1−オン、2−ヒドロキシ−1−{4−[4−(2−ヒドロキシ−2−メチル−プロピオニル)−ベンジル]−フェニル}−2−メチル−プロパン−1−オン、2−メチル−1−[4−(メチルチオ)フェニル]−2−モルフォリノプロパン−1−オン、ビス(2,4,6−トリメチルベンゾイル)−フェニルフォスフィンオキサイド、および2,4,6−トリメチルベンゾイル−ジフェニル−フォスフィンオキサイド等が挙げられる。 Examples of the radical photopolymerization initiator include 2,2-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxy-cyclohexyl-phenyl-ketone, and 2-hydroxy-2-methyl-1-phenyl-propane. -1-one, 1- [4- (2-hydroxyethoxy) -phenyl] -2-hydroxy-2-methyl-1-propan-1-one, 2-hydroxy-1- {4- [4- (2 -Hydroxy-2-methyl-propionyl) -benzyl] -phenyl} -2-methyl-propan-1-one, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one Bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide, 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide, etc. And the like.
光カチオン重合開始剤としては、例えば、ビス(4−tert−ブチルフェニル)ヨードニウムヘキサフルオロホスファート、ビス(4−tert−ブチルフェニル)ヨードニウムトリフルオロメタンスルホナート、シクロプロピルジフェニルスルホニウムテトラフルオロボラート、ジフェニルヨードニウムヘキサフルオロホスファート、ジフェニルヨードニウムヘキサフルオロアルセナート、2−(3,4−ジメトキシスチリル)−4,6−ビス(トリクロロメチル)−1,3,5−トリアジン、トリフェニルスルホニウムテトラフルオロボラート、トリフェニルスルホニウムブロミド、トリ−p−トリルスルホニウムヘキサフルオロホスファート、およびトリ−p−トリルスルホニウムトリフルオロメタンスルホナート等が挙げられる。 Examples of the cationic photopolymerization initiator include bis (4-tert-butylphenyl) iodonium hexafluorophosphate, bis (4-tert-butylphenyl) iodonium trifluoromethanesulfonate, cyclopropyldiphenylsulfonium tetrafluoroborate, and diphenyl. Iodonium hexafluorophosphate, diphenyliodonium hexafluoroarsenate, 2- (3,4-dimethoxystyryl) -4,6-bis (trichloromethyl) -1,3,5-triazine, triphenylsulfonium tetrafluoroborate, Examples thereof include triphenylsulfonium bromide, tri-p-tolylsulfonium hexafluorophosphate, and tri-p-tolylsulfonium trifluoromethanesulfonate.
光アニオン重合開始剤としては、例えば、アセトフェノン o−ベンゾイルオキシム、ニフェジピン、2−(9−オキソキサンテン−2−イル)プロピオン酸1,5,7−トリアザビシクロ[4,4,0]デカ−5−エン、2−ニトロフェニルメチル4−メタクリロイルオキシピペリジン-1-カルボキシラート、1,2−ジイソプロピル−3−〔ビス(ジメチルアミノ)メチレン〕グアニジウム2−(3−ベンゾイルフェニル)プロピオナート、および1,2−ジシクロヘキシル−4,4,5,5−テトラメチルビグアニジウム n-ブチルトリフェニルボラート等が挙げられる。 Examples of the photoanionic polymerization initiator include acetophenone o-benzoyloxime, nifedipine, 2- (9-oxoxanthen-2-yl) propionic acid 1,5,7-triazabicyclo [4,4,0] deca- 5-ene, 2-nitrophenylmethyl 4-methacryloyloxypiperidine-1-carboxylate, 1,2-diisopropyl-3- [bis (dimethylamino) methylene] guanidinium 2- (3-benzoylphenyl) propionate, and 1, Examples include 2-dicyclohexyl-4,4,5,5-tetramethylbiguanidinium n-butyltriphenylborate.
<アミン化合物((E)成分)>
本発明の剥離シート用硬化性樹脂組成物は、(A)〜(C)成分、または、(A)〜(D)成分に加えて、さらに(E)重量平均分子量が80〜700であるアミン化合物を含有させることができる。当該(E)成分は、(A)成分と(B)成分との合計質量100質量部に対し、0.01〜50質量部配合する。
<Amine compound (component (E))>
In addition to the components (A) to (C) or the components (A) to (D), the curable resin composition for a release sheet of the present invention further includes (E) an amine having a weight average molecular weight of 80 to 700. Compounds can be included. The said (E) component mix | blends 0.01-50 mass parts with respect to 100 mass parts of total mass of (A) component and (B) component.
(E)成分であるアミン化合物は、チオール基と(メタ)アクリロキシ基との反応を促進(触媒)するために添加される。具体的には、(E)成分を含有することによって、チオール基と(メタ)アクリロキシ基とを低温で反応させることができるため、(A)成分と(B)成分とを含む硬化性樹脂組成物を低温硬化することが可能となる。(E)成分であるアミン化合物としては、重量平均分子量が90〜700、好ましくは100〜690、より好ましくは110〜680の、単官能アミンや複数個のアミノ基とを有するポリアミンが挙げられる。アミン化合物の重量平均分子量が90未満では、アミンの揮発性が高くなり、臭気やボイドの原因となる。アミン化合物の重量平均分子量が700を超えると、耐水性が低下し易くなる。 The amine compound as the component (E) is added to promote (catalyze) the reaction between the thiol group and the (meth) acryloxy group. Specifically, since the thiol group and the (meth) acryloxy group can be reacted at a low temperature by containing the component (E), the curable resin composition containing the component (A) and the component (B). An object can be cured at a low temperature. Examples of the amine compound as component (E) include monofunctional amines and polyamines having a weight average molecular weight of 90 to 700, preferably 100 to 690, more preferably 110 to 680, and a plurality of amino groups. When the weight average molecular weight of the amine compound is less than 90, the volatility of the amine increases, causing odor and voids. When the weight average molecular weight of an amine compound exceeds 700, water resistance will fall easily.
単官能アミンとしては、1級アミン、2級アミン、または3級アミンが挙げられる。ポリアミンとしては、1級アミン、2級アミン、3級アミン、複合アミンが挙げられる。複合アミンとは、1級アミノ基、2級アミノ基、3級アミノ基のうち2種以上を有するアミンのことである。このような複合アミンとしては、イミダゾリン化合物、イミダゾール化合物、N置換ピペラジン化合物、およびN,N−ジメチル尿素誘導体等が挙げられる。なお、アミン化合物は、1種のみを単独で使用することもできるし、2種以上を混合使用することもできる。 The monofunctional amine includes a primary amine, a secondary amine, or a tertiary amine. Examples of polyamines include primary amines, secondary amines, tertiary amines, and complex amines. A complex amine is an amine having two or more of a primary amino group, a secondary amino group, and a tertiary amino group. Examples of such complex amines include imidazoline compounds, imidazole compounds, N-substituted piperazine compounds, and N, N-dimethylurea derivatives. In addition, an amine compound can also be used individually by 1 type, and 2 or more types can also be mixed and used for it.
また、アミン化合物は、触媒活性を調整するために予め有機酸との塩を形成していてもよい。アミン化合物と予め反応させる有機酸としては、炭素数1〜20でカルボキシル基を分子中に1〜5個有するステアリン酸や2−エチルヘキサン酸等の脂肪族カルボン酸、炭素数1〜20でカルボキシル基を分子中に1〜10個有するピロメリット酸、トリメリット酸、安息香酸等の芳香族カルボン酸、またはイソシアヌル酸が挙げられる。 Further, the amine compound may form a salt with an organic acid in advance in order to adjust the catalytic activity. Examples of the organic acid to be reacted in advance with the amine compound include aliphatic carboxylic acids such as stearic acid and 2-ethylhexanoic acid having 1 to 5 carbon atoms and 1 to 5 carboxyl groups in the molecule, and carboxyl groups having 1 to 20 carbon atoms. Examples include pyrocarboxylic acid having 1 to 10 groups in the molecule, trimellitic acid, aromatic carboxylic acid such as benzoic acid, or isocyanuric acid.
アミン化合物の中でも、塩基性が高いイミダゾール化合物が最も低温における硬化に適している。また、フェノール樹脂等でコーティングしたイミダゾール化合物も用いることができる。
当該イミダゾール化合物は、下記(式10)で表される化合物である。
Among amine compounds, an imidazole compound having a high basicity is suitable for curing at the lowest temperature. Further, an imidazole compound coated with a phenol resin or the like can also be used.
The imidazole compound is a compound represented by the following (formula 10).
(R12はシアノ基、炭素数1〜10の炭化水素基、2,3−ジアミノトリアジンで置換された炭素数1〜10の炭化水素基、炭素数1〜4のアルコキシ基、または水素原子であり、R11、R13、およびR14は炭素数1〜20の炭化水素基、炭素数1〜4のアルコキシ基、または水素原子であり、R11〜R14が結合して環を形成している場合には炭素数2〜8の炭化水素基である。) (R 12 is a cyano group, a hydrocarbon group having 1 to 10 carbon atoms, a hydrocarbon group having 1 to 10 carbon atoms substituted with 2,3-diaminotriazine, an alkoxy group having 1 to 4 carbon atoms, or a hydrogen atom. R 11 , R 13 , and R 14 are each a hydrocarbon group having 1 to 20 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, or a hydrogen atom, and R 11 to R 14 are bonded to form a ring. If it is, it is a hydrocarbon group having 2 to 8 carbon atoms.)
具体的には、2−メチルイミダゾール、2−ウンデシルイミダゾール、2−ヘプタデシルイミダゾール、2−フェニルイミダゾール、1,2−ジメチルイミダゾール、2−フェニル−4−メチルイミダゾール、1−ベンジル−2−メチルイミダゾール、1−ベンジル−2−フェニルイミダゾール、2−エチル−4−メチルイミダゾール、1−(2−シアノエチル)−2−メチルイミダゾール、1−(2−シアノエチル)−2−ウンデシルイミダゾール、1−(2−シアノエチル)−2−エチル−4−メチルイミダゾール、1−(2−シアノエチル−2−フェニルイミダゾール、1−(2−シアノエチル)−2−エチル−4−メチルイミダゾール、2,3−ジヒドロ−1H−ピロロ[1,2−a]ベンズイミダゾール、2,4−ジアミノ−6−[2−メチルイミダゾリル−(1)]エチル−s−トリアジン、2,4−ジアミノ−6−[2’−ウンデシルイミダゾリル−(1’)]−エチル−s−トリアジン、2,4−ジアミノ−6−[2’−エチル−4'−メチルイミダゾリル−(1')]−エチル−s−トリアジン、2−フェニル−4,5−ジヒドロキシメチルイミダゾール、および2−フェニル−4−メチル−5−ヒドロキシメチルイミダゾールが挙げられる。 Specifically, 2-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 2-phenylimidazole, 1,2-dimethylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methyl Imidazole, 1-benzyl-2-phenylimidazole, 2-ethyl-4-methylimidazole, 1- (2-cyanoethyl) -2-methylimidazole, 1- (2-cyanoethyl) -2-undecylimidazole, 1- ( 2-cyanoethyl) -2-ethyl-4-methylimidazole, 1- (2-cyanoethyl-2-phenylimidazole), 1- (2-cyanoethyl) -2-ethyl-4-methylimidazole, 2,3-dihydro-1H -Pyrrolo [1,2-a] benzimidazole, 2,4-diamino-6- [ -Methylimidazolyl- (1)] ethyl-s-triazine, 2,4-diamino-6- [2'-undecylimidazolyl- (1 ')]-ethyl-s-triazine, 2,4-diamino-6 [2'-Ethyl-4'-methylimidazolyl- (1 ')]-ethyl-s-triazine, 2-phenyl-4,5-dihydroxymethylimidazole, and 2-phenyl-4-methyl-5-hydroxymethylimidazole Is mentioned.
<組成比(配合バランス)>
本発明の剥離シート用硬化性樹脂組成物は、(A)チオエーテル含有(メタ)アクリレート誘導体と(B)多官能(メタ)アクリレートとの質量比((A)/(B))が0.05〜30となるように配合する。ここで、「(A)/(B)」とは、(A)チオエーテル含有(メタ)アクリレート誘導体の質量を(B)多官能(メタ)アクリレートの質量で除した値である。(A)/(B)が0.05未満の場合は剥離時に裂けや割れが発生し易くなり、(A)/(B)が30を超える場合は硬化膜を得にくくなる。最適な(A)/(B)の値は、硬化性樹脂組成物に求められる特性や、(A)チオエーテル含有(メタ)アクリレート誘導体や(B)多官能(メタ)アクリレートの種類によって異なる。硬化性樹脂組成物を硬化した後の特性は、厳密には硬化性樹脂組成物単位重量中の(チオール基数)/((メタ)アクリロキシ基数)(以下、チオール/エン比と称す)の値に影響を受ける。例えば、チオール/エン比が0.5〜1.5の範囲にあれば、密な架橋を形成し易く、且つ強靭な硬化物になり易い。一方、チオール/エン比が0.1以上0.5未満、あるいは1.5を超え2.0以下であれば、柔軟で粘着質な硬化物を得ることができる。
<Composition ratio (mixing balance)>
The curable resin composition for a release sheet of the present invention has a mass ratio ((A) / (B)) of (A) a thioether-containing (meth) acrylate derivative and (B) a polyfunctional (meth) acrylate of 0.05. It mix | blends so that it may become ~ 30. Here, “(A) / (B)” is a value obtained by dividing the mass of (A) the thioether-containing (meth) acrylate derivative by the mass of (B) polyfunctional (meth) acrylate. When (A) / (B) is less than 0.05, tearing or cracking is likely to occur during peeling, and when (A) / (B) exceeds 30, it is difficult to obtain a cured film. The optimum value of (A) / (B) varies depending on the characteristics required for the curable resin composition, the type of (A) thioether-containing (meth) acrylate derivative and (B) polyfunctional (meth) acrylate. Strictly speaking, the characteristics after curing the curable resin composition are the values of (number of thiol groups) / (number of (meth) acryloxy groups) (hereinafter referred to as thiol / ene ratio) in the unit weight of the curable resin composition. to be influenced. For example, when the thiol / ene ratio is in the range of 0.5 to 1.5, it is easy to form dense crosslinks and to become a tough cured product. On the other hand, if the thiol / ene ratio is 0.1 or more and less than 0.5 or more than 1.5 and 2.0 or less, a flexible and sticky cured product can be obtained.
また、本発明の剥離シート用硬化性樹脂組成物は、(A)チオエーテル含有(メタ)アクリレート誘導体と(B)多官能(メタ)アクリレートとの合計質量((A)+(B))100質量部に対し、(D)光重合開始剤を配合する場合には0.01〜10質量部、好ましくは0.3〜5質量部となるように配合する。 Moreover, the curable resin composition for release sheets of the present invention has a total mass ((A) + (B)) of 100 masses of (A) a thioether-containing (meth) acrylate derivative and (B) a polyfunctional (meth) acrylate. When the (D) photopolymerization initiator is blended with respect to parts, it is blended so as to be 0.01 to 10 parts by mass, preferably 0.3 to 5 parts by mass.
また、本発明の剥離シート用硬化性樹脂組成物に対して(E)アミン化合物も配合する場合は、(A)チオエーテル含有(メタ)アクリレート誘導体と(B)多官能(メタ)アクリレートとの合計重量((A)+(B))100質量部に対し、(E)アミン化合物が0.01〜50質量部、好ましくは0.01〜45質量部となるように配合する。 Moreover, when (E) amine compound is also mix | blended with respect to curable resin composition for release sheets of this invention, the sum total of (A) thioether containing (meth) acrylate derivative and (B) polyfunctional (meth) acrylate. It mix | blends so that (E) amine compound may be 0.01-50 mass parts with respect to 100 mass parts of weight ((A) + (B)), Preferably it is 0.01-45 mass parts.
<剥離シート(硬化膜)の形成>
本発明の剥離シートは、本発明の剥離シート用硬化性樹脂組成物を硬化して得られる。より具体的には、基材上に本発明の剥離シート用硬化性樹脂組成物を塗工し、硬化させることで、硬化膜すなわち剥離シートを形成させる。本発明の剥離シート用硬化性樹脂組成物は、(A)チオエーテル含有(メタ)アクリレート誘導体のチオエーテル基に起因して基材に対して密着性を発揮する。したがって、基材としては、チオエーテル基と化学的な結合を形成する(化学的な親和力の高い)基材、例えば、遷移金属あるいはその合金や珪素化合物、リン化合物、硫黄化合物、またはホウ素化合物等の無機基材、不飽和結合(芳香環を含む)を有する有機物、水酸基やカルボキシル基を有する有機物、またはプラズマやUVオゾン処理された有機物等の有機基材への密着性向上効果に優れる。具体的には、無機基材としては、ガラス、シリコン、各種金属などが挙げられる。有機基材として、ポリ(メタ)アクリル系樹脂、トリアセテートセルロース(TAC)系樹脂、ポリエチレンテレフタレート(PET)やポリブチレンテレフタレート等のポリエステル系樹脂、ポリカーボネート系樹脂、ポリイミド系樹脂、ポリエチレンやポリプロピレン等のポリオレフィン系樹脂、ABS樹脂、ポリビニルアルコール、塩化ビニル系樹脂、ポリアセタールなどが好ましく挙げられる。また、本発明の剥離シート用硬化性樹脂組成物は、(A)チオエーテル含有(メタ)アクリレート誘導体が特定の炭化水素基を有することで、硬化膜が柔軟性に優れる。そのため、フレキシブルな基材のコーティングに特に好適に使用することができる。
<Formation of release sheet (cured film)>
The release sheet of the present invention is obtained by curing the curable resin composition for a release sheet of the present invention. More specifically, a curable resin composition for a release sheet of the present invention is applied on a substrate and cured to form a cured film, that is, a release sheet. The curable resin composition for a release sheet of the present invention exhibits adhesion to a substrate due to the thioether group of the (A) thioether-containing (meth) acrylate derivative. Therefore, as a base material, a base material that forms a chemical bond with a thioether group (high chemical affinity), such as a transition metal or an alloy thereof, a silicon compound, a phosphorus compound, a sulfur compound, or a boron compound, etc. It is excellent in the effect of improving the adhesion to an organic substrate such as an inorganic substrate, an organic substance having an unsaturated bond (including an aromatic ring), an organic substance having a hydroxyl group or a carboxyl group, or an organic substance treated with plasma or UV ozone. Specifically, examples of the inorganic base material include glass, silicon, and various metals. Poly (meth) acrylic resins, triacetate cellulose (TAC) resins, polyester resins such as polyethylene terephthalate (PET) and polybutylene terephthalate, polycarbonate resins, polyimide resins, polyolefins such as polyethylene and polypropylene Preferable examples include resin, ABS resin, polyvinyl alcohol, vinyl chloride resin, polyacetal and the like. In the curable resin composition for a release sheet of the present invention, the cured film is excellent in flexibility because the (A) thioether-containing (meth) acrylate derivative has a specific hydrocarbon group. Therefore, it can be particularly suitably used for coating flexible substrates.
本発明の剥離シート用硬化性樹脂組成物は、例えば、光を照射することにより硬化させることができる。照射する光としては、UV(紫外線)やEB(電子線)などの活性エネルギー線等が挙げられる。また、硬化性樹脂組成物が(D)成分を含む場合は、通常2500mJ/cm2程度必要となる光照射量を100mJ/cm2程度まで少なくすることが可能となる。また、硬化性樹脂組成物が(E)成分を含む場合には、80℃程度の低温での加熱のみによって硬化が可能となる。更に、硬化性樹脂組成物が、(D)成分と(E)成分を含む場合には、光の照射による硬化工程と、加熱による硬化工程との二段階の工程を経て硬化させることもできる。 The curable resin composition for a release sheet of the present invention can be cured by, for example, irradiating light. Examples of the light to be irradiated include active energy rays such as UV (ultraviolet rays) and EB (electron beams). Further, if the curable resin composition comprises component (D), it is possible to reduce the amount of light irradiation to be usually 2,500 mJ / cm 2 about need to about 100 mJ / cm 2. Moreover, when the curable resin composition contains the component (E), it can be cured only by heating at a low temperature of about 80 ° C. Furthermore, when the curable resin composition contains the component (D) and the component (E), it can be cured through a two-stage process including a curing process by light irradiation and a curing process by heating.
本発明の剥離シート用硬化性樹脂組成物は、反応系を均一にし、塗工を容易にするために有機溶媒で希釈して使用してもよい。そのような有機溶媒としては、アルコール系溶剤、芳香族炭化水素系溶剤、エーテル系溶剤、エステル系溶剤およびエーテルエステル系溶剤、ケトン系溶剤、リン酸エステル系溶剤が挙げられる。これらの有機溶媒は硬化性樹脂組成物100質量部に対して、10000質量部未満の配合量に抑えることが好ましいが、基本的に溶剤は硬化膜になる時点では揮発しているため、硬化膜の物性に大きな影響は与えない。 The curable resin composition for a release sheet of the present invention may be used after diluted with an organic solvent in order to make the reaction system uniform and facilitate coating. Examples of such organic solvents include alcohol solvents, aromatic hydrocarbon solvents, ether solvents, ester solvents, ether ester solvents, ketone solvents, and phosphate ester solvents. These organic solvents are preferably suppressed to a blending amount of less than 10000 parts by mass with respect to 100 parts by mass of the curable resin composition, but basically the solvent is volatilized at the time of becoming a cured film. It does not have a big influence on the physical properties.
また、本発明の剥離シート用硬化性樹脂組成物は、粘度を調整する目的でシリカ粉末等の粘度調整剤を配合してもよい。これらの粘度調整剤は、硬化性樹脂組成物100質量部に対して、300質量部未満の配合量に抑えることが好ましい。粘度調整剤の配合量が300質量部を超えると、硬化膜が得られない可能性がある。 Moreover, the curable resin composition for release sheets of the present invention may contain a viscosity modifier such as silica powder for the purpose of adjusting the viscosity. These viscosity modifiers are preferably suppressed to a blending amount of less than 300 parts by mass with respect to 100 parts by mass of the curable resin composition. If the blending amount of the viscosity modifier exceeds 300 parts by mass, a cured film may not be obtained.
また、本発明の剥離シート用硬化性樹脂組成物は、通常の塗料や接着剤に用いられるような各種添加剤を添加してもよい。このような添加剤としては、塗工面を平滑にするための界面活性剤、可使用時間を長くするためのアルミニウム塩等が挙げられる。これらの添加剤は、硬化性樹脂組成物100質量部に対して、80質量部未満の配合量に抑えることが好ましい。これらの添加剤の配合量が80質量部を超えると、反応が進行するのに多くの積算光量が必要となる可能性がある。 Further, the curable resin composition for a release sheet of the present invention may contain various additives such as those used in ordinary paints and adhesives. Examples of such an additive include a surfactant for smoothing the coated surface, and an aluminum salt for increasing the usable time. These additives are preferably suppressed to a blending amount of less than 80 parts by mass with respect to 100 parts by mass of the curable resin composition. If the amount of these additives exceeds 80 parts by mass, a large amount of integrated light may be required for the reaction to proceed.
本発明の剥離シート用硬化性樹脂組成物は、硬化して剥離シートとして用いることができる。本発明の剥離シート用硬化性樹脂組成物は、例えばガラス、PET(ポリエチレンテレフタレート)、ポリエチレン、ポリプロピレン、ナイロン、ITO(酸化インジウムスズ)、ポリイミド(PI)、ポリカーボネート(PC)、Siウエハー、金属全般(ステンレス鋼、銅、アルミニウム等)、アクリル樹脂、およびエポキシ樹脂等の基材に塗布、硬化して剥離シートとし、必要に応じて剥離することができる。 The curable resin composition for a release sheet of the present invention can be cured and used as a release sheet. Examples of the curable resin composition for a release sheet of the present invention include glass, PET (polyethylene terephthalate), polyethylene, polypropylene, nylon, ITO (indium tin oxide), polyimide (PI), polycarbonate (PC), Si wafer, and general metals. (Stainless steel, copper, aluminum, etc.), acrylic resin, and epoxy resin can be applied and cured to form a release sheet, which can be peeled off if necessary.
本発明の工程基材は、基材に、本発明の剥離シート用硬化性樹脂組成物を塗布、硬化して得られる剥離シートが積層されてなる。基材としては、上述の基材を用いることができる。 The process substrate of the present invention is formed by laminating a release sheet obtained by applying and curing the curable resin composition for a release sheet of the present invention on a substrate. As the substrate, the above-described substrates can be used.
本発明の工程基材は、製品製造工程における、いわば中間工程品であり、例えばタッチパネル製造時に、基材であるタッチパネルに、本発明の剥離シート用硬化性樹脂組成物を塗布、硬化して得られる剥離シートを設けた積層体をいう。タッチパネル製造においては、剥離シートは、基材であるタッチパネルを割れ、傷、埃や汚れなどから保護する。あるいは、基材を印刷やメッキ加工する際は、剥離シートは、基材の非印刷部分や非メッキ部分をマスキングするために用いることができる。 The process substrate of the present invention is a so-called intermediate process product in the product manufacturing process, and is obtained, for example, by applying and curing the curable resin composition for a release sheet of the present invention to the touch panel that is the substrate during touch panel manufacture. A laminate provided with a release sheet. In touch panel manufacture, the release sheet protects the touch panel as a base material from cracks, scratches, dust, dirt, and the like. Or when printing or plating a base material, a peeling sheet can be used in order to mask the non-printing part and non-plating part of a base material.
本発明の工程基材は、本発明の剥離シート用硬化性樹脂組成物を硬化して得られる、マスキング性、柔軟性、および剥離性に優れた剥離シートを有するため、種々の基材を用いて構成することが可能である。 Since the process base material of the present invention has a release sheet excellent in masking property, flexibility and releasability obtained by curing the curable resin composition for a release sheet of the present invention, various base materials are used. Can be configured.
本発明の基材を保護する方法は、本発明の剥離シート用硬化性樹脂組成物を塗布、硬化して得られる剥離シートを保護層として設けることにより、基材を保護する方法である。
基材としては、上述の基材を用いることができる。剥離シート用硬化性樹脂組成物としては、上述した本発明の剥離シート用硬化性樹脂組成物を用いることができる。剥離シート用硬化性樹脂組成物の塗布、硬化は、上述のような条件により行うことができる。
The method for protecting the substrate of the present invention is a method for protecting the substrate by providing, as a protective layer, a release sheet obtained by applying and curing the curable resin composition for a release sheet of the present invention.
As the substrate, the above-described substrates can be used. As the curable resin composition for release sheet, the curable resin composition for release sheet of the present invention described above can be used. Application | coating and hardening of curable resin composition for peeling sheets can be performed on the above conditions.
本発明の基材を保護する方法は、例えば、基材であるタッチパネルに、剥離シート用硬化性樹脂組成物を塗布、硬化して、タッチパネルを割れ、傷、埃や汚れなどから保護する。あるいは、本発明の基材を保護する方法は、基材を印刷やメッキ加工する際には、基材の非印刷部分や非メッキ部分に剥離シート用硬化性樹脂組成物を塗布、硬化して、基材を印刷やメッキから保護する。 In the method for protecting a substrate of the present invention, for example, a curable resin composition for a release sheet is applied to a touch panel as a substrate and cured to protect the touch panel from cracks, scratches, dust, dirt, and the like. Alternatively, in the method for protecting a substrate of the present invention, when the substrate is printed or plated, a release sheet curable resin composition is applied and cured on a non-printed portion or a non-plated portion of the substrate. Protect the substrate from printing and plating.
次に、実施例および比較例を挙げて、本発明をさらに具体的に説明する。本実施例および比較例で用いた各成分は、次のとおりである。なお、Mwは重量平均分子量を示す。 Next, the present invention will be described more specifically with reference to examples and comparative examples. The components used in the examples and comparative examples are as follows. Mw represents a weight average molecular weight.
[チオエーテル含有(メタ)アクリレート誘導体の合成1]
温度計、攪拌機、滴下ポンプを備えた3つ口フラスコに、下記表に従いチオール成分を仕込み、60℃に昇温後、(メタ)アクリレート成分を1時間かけて滴下した。滴下終了後さらに60℃で2時間攪拌をして反応させて、(A)成分であるチオエーテル含有(メタ)アクリレート誘導体A−1〜A−5をそれぞれ合成した。
[Synthesis 1 of thioether-containing (meth) acrylate derivative 1]
A thiol component was charged in a three-necked flask equipped with a thermometer, a stirrer, and a dropping pump according to the following table, and the temperature was raised to 60 ° C. After completion of the dropwise addition, the mixture was further stirred at 60 ° C. for 2 hours for reaction to synthesize thioether-containing (meth) acrylate derivatives A-1 to A-5 as component (A).
<(A)成分>
(A−1:チオエーテル含有(メタ)アクリレート誘導体)
<(A) component>
(A-1: (Meth) acrylate derivative containing thioether)
[チオエーテル含有(メタ)アクリレート誘導体の合成2]
温度計、攪拌機、滴下ポンプを備えた3つ口フラスコに、下記表に従いチオール成分を仕込み、60℃に昇温後、(メタ)アクリレート成分を1時間かけて滴下した。滴下終了後さらに60℃で2時間攪拌をして反応させて、(A)成分であるチオエーテル含有(メタ)アクリレート誘導体A−6〜A−9をそれぞれ合成した。
[Synthesis 2 of thioether-containing (meth) acrylate derivative 2]
A thiol component was charged in a three-necked flask equipped with a thermometer, a stirrer, and a dropping pump according to the following table, and after raising the temperature to 60 ° C., the (meth) acrylate component was added dropwise over 1 hour. After completion of the dropwise addition, the mixture was further stirred at 60 ° C. for 2 hours to react to synthesize (A) component thioether-containing (meth) acrylate derivatives A-6 to A-9.
<(A)成分>
(A−6:チオエーテル含有(メタ)アクリレート誘導体)
(A-6: (Meth) acrylate derivative containing thioether)
(A−7:チオエーテル含有(メタ)アクリレート誘導体)
(A−8:チオエーテル含有(メタ)アクリレート誘導体)
(A−9:チオエーテル含有(メタ)アクリレート誘導体)
[チオエーテル含有(メタ)アクリレート誘導体の合成3]
温度計、攪拌機、滴下ポンプを備えた3つ口フラスコに、下記表に従いチオール成分を仕込み、60℃に昇温後、(メタ)アクリレート成分を1時間かけて滴下した。滴下終了後さらに60℃で2時間攪拌をして反応させて、(A)成分であるチオエーテル含有(メタ)アクリレート誘導体A−10〜A−13をそれぞれ合成した。
[Synthesis of thioether-containing (meth) acrylate derivative 3]
A thiol component was charged in a three-necked flask equipped with a thermometer, a stirrer, and a dropping pump according to the following table, and the temperature was raised to 60 ° C. After completion of the dropwise addition, the mixture was further stirred at 60 ° C. for 2 hours for reaction to synthesize thioether-containing (meth) acrylate derivatives A-10 to A-13 as component (A).
<(A)成分>
(A−10:チオエーテル含有(メタ)アクリレート誘導体)
(A-10: (Meth) acrylate derivative containing thioether)
(A−11:チオエーテル含有(メタ)アクリレート誘導体)
(A−12:チオエーテル含有(メタ)アクリレート誘導体)
(A−13:チオエーテル含有(メタ)アクリレート誘導体)
<(A’)成分:(式1)で表されるチオエーテル含有(メタ)アクリレート誘導体以外の化合物>
(A’−1:チオエーテル含有アルコキシシラン誘導体)
(A′-1: thioether-containing alkoxysilane derivative)
(A’−2:チオエーテル含有(メタ)アクリレート誘導体)
<(B)成分:多官能(メタ)アクリレート>
(B−1、Mw:5000)
(B-1, Mw: 5000)
(B−2、Mw:246)
(B−3、Mw:352)
(B−4、Mw:22000)
グリシジルメタクリレート(GMA)とシクロヘキシルメタクリレート(CHMA)の共重合体に下記D−3を触媒としメタクリル酸(MA)を当モル付加したポリマー(50wt%メチルイソブチルケトン溶液をヘキサンで再沈した白色固体)。CHMA/GMAMA=4/1(モル比)。
(B-4, Mw: 22000)
Polymer obtained by adding equimolar amount of methacrylic acid (MA) to the copolymer of glycidyl methacrylate (GMA) and cyclohexyl methacrylate (CHMA) using the following D-3 as a catalyst. . CHMA / GMMAMA = 4/1 (molar ratio).
(B−5、Mw:45000)
グリシジルメタクリレート(GMA)とシクロヘキシルメタクリレート(CHMA)の共重合体に下記D−3を触媒としメタクリル酸(MA)を当モル付加したポリマー(50wt%メチルイソブチルケトン溶液をヘキサンで再沈した白色固体)。CHMA/GMAMA=1/1(モル比)。
(B-5, Mw: 45000)
Polymer obtained by adding equimolar amount of methacrylic acid (MA) to the copolymer of glycidyl methacrylate (GMA) and cyclohexyl methacrylate (CHMA) using the following D-3 as a catalyst. . CHMA / GMMAMA = 1/1 (molar ratio).
<(C)成分:ポリエーテル変性ポリジメチルシロキサン>
(C−1)BYK−307(ビックケミージャパン(株)製)
比重(20℃):1.03
(C−2)BYK−330(ビックケミージャパン(株)製)
比重(20℃):0.98
(C−3)BYK−378(ビックケミージャパン(株)製)
比重(20℃):1.02、屈折率(20℃):1.440
(C−4)KF−353(信越化学工業(株)製)
(側鎖型(側鎖にポリエーテル構造を有するポリジメチルシロキサン)、粘度(25℃):430mm2/s、比重(25℃):1.04、屈折率(25℃):1.438、HLB:10)
(C−5)KF−6020(信越化学工業(株)製)
(側鎖型(側鎖にポリエーテル構造を有するポリジメチルシロキサン)、粘度(25℃):180mm2/s、比重(25℃):1.00、屈折率(25℃):1.417、HLB:4)
<(C) component: polyether-modified polydimethylsiloxane>
(C-1) BYK-307 (manufactured by Big Chemie Japan Co., Ltd.)
Specific gravity (20 ° C.): 1.03
(C-2) BYK-330 (manufactured by Big Chemie Japan Co., Ltd.)
Specific gravity (20 ° C): 0.98
(C-3) BYK-378 (Bic Chemie Japan Co., Ltd.)
Specific gravity (20 ° C.): 1.02, Refractive index (20 ° C.): 1.440
(C-4) KF-353 (manufactured by Shin-Etsu Chemical Co., Ltd.)
(Side chain type (polydimethylsiloxane having a polyether structure in the side chain), viscosity (25 ° C.): 430 mm 2 / s, specific gravity (25 ° C.): 1.04, refractive index (25 ° C.): 1.438, HLB: 10)
(C-5) KF-6020 (manufactured by Shin-Etsu Chemical Co., Ltd.)
(Side chain type (polydimethylsiloxane having a polyether structure in the side chain), viscosity (25 ° C.): 180 mm 2 / s, specific gravity (25 ° C.): 1.00, refractive index (25 ° C.): 1.417, HLB: 4)
<(C’)成分:メチルフェニルシリコーン>
(C’−6)SH−710(東レ・ダウコーニング・シリコーン(株)製)
(C’−7)SH−556(東レ・ダウコーニング・シリコーン(株)製)
<(C ′) component: methylphenyl silicone>
(C'-6) SH-710 (Toray Dow Corning Silicone Co., Ltd.)
(C'-7) SH-556 (Toray Dow Corning Silicone Co., Ltd.)
<(D)成分:光重合開始剤>
(D−1、Mw:204)
1−ヒドロキシ−シクロヘキシル−フェニル−ケトン
(D−2、Mw:348)
2,4,6−トリメチルベンゾイル−ジフェニル−フォスフィンオキサイド
(D−3、Mw:407)
2−(9−オキソキサンテン−2−イル)プロピオン酸1,5,7−トリアザビシクロ[4.4.0]デカ−5−エン
<(D) component: Photopolymerization initiator>
(D-1, Mw: 204)
1-hydroxy-cyclohexyl-phenyl-ketone (D-2, Mw: 348)
2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide (D-3, Mw: 407)
2- (9-Oxoxanthen-2-yl) propionic acid 1,5,7-triazabicyclo [4.4.0] dec-5-ene
<(E)成分:アミン化合物>
(E−1、Mw:110)
N,N−ジメチル−1,3−プロパンジアミン
<(E) component: amine compound>
(E-1, Mw: 110)
N, N-dimethyl-1,3-propanediamine
(E−3、Mw:680)
表4〜表15に示す配合比で(A)〜(E)成分をそれぞれ混合し、スパチュラで均一になるまで撹拌し、実施例および比較例の剥離シート用硬化性樹脂組成物のサンプルを得た。得られた実施例および比較例の各硬化性樹脂組成物のサンプルに対して以下の剥離性、耐熱性、印刷性、マスキング性、滑り性、透明性の評価を行った。その結果を表4〜表15に示す。 Components (A) to (E) were mixed at the blending ratios shown in Tables 4 to 15, and stirred with a spatula until uniform, to obtain samples of curable resin compositions for release sheets of Examples and Comparative Examples. It was. The following peelability, heat resistance, printability, masking property, slipperiness, and transparency were evaluated for the samples of the curable resin compositions obtained in Examples and Comparative Examples. The results are shown in Tables 4-15.
[剥離性および耐熱性評価用試験片1の作製]
剥離シート用硬化性樹脂組成物の各サンプルを10cm×10cmの各種基材にダイコーターで150μmの厚みに塗布し、表4〜表15に示す硬化条件でUV照射を行い、剥離シートを有する評価用試験片1を得た。使用した基材は、ガラス(コーニング社製、イーグルXG)、PETフィルム(東レ(株)製、ルミラーU46−100)、ポリイミド(PI)フィルム(東レ・デュポン(株)製、カプトン100H)、ITOガラス(ソーダガラスにラインアンドスペースで長さ20mm×幅50μm 100Ω/□でパターンが形成されているもの)である。UV照射には、ヘレウス・ノーブルライト・フュージョン・ユーブイ(株)製UVランプシステム「ライトハンマー6」を用い、ランプバルブは、Hバルブを使用した。
[Preparation of test piece 1 for evaluation of peelability and heat resistance]
Each sample of the curable resin composition for release sheet was applied to various substrates of 10 cm × 10 cm to a thickness of 150 μm with a die coater, and UV irradiation was performed under the curing conditions shown in Tables 4 to 15, and evaluations having release sheets A test piece 1 was obtained. The substrate used was glass (Corning, Eagle XG), PET film (Toray Industries, Lumirror U46-100), polyimide (PI) film (Toray DuPont, Kapton 100H), ITO Glass (soda glass having a pattern of 20 mm in length and 50 μm in width and 100 Ω / □ in line and space). For UV irradiation, a UV lamp system “Light Hammer 6” manufactured by Heraeus Noblelight Fusion Ubuy Co., Ltd. was used, and an H bulb was used as the lamp bulb.
[剥離性]
評価用試験片1を作製後、テープを剥離シートの端部に貼り剥離シートを剥離した後、基材の外観と剥離性を目視で確認して、以下の通り評価した。
○ :剥離(残渣なし)
×A:剥離時に裂けや割れが発生
×B:硬化不良
×C:硬化膜表面へブリードアウトテープが貼りつかない
[Peelability]
After producing the test piece 1 for evaluation, the tape was applied to the end of the release sheet, the release sheet was peeled off, and then the appearance and peelability of the substrate were visually confirmed and evaluated as follows.
○: peeling (no residue)
× A: Cracking or cracking occurs during peeling × B: Poor curing × C: Bleed-out tape does not stick to the cured film surface
[耐熱性]
評価用試験片1のガラス基材品を100℃で30分加熱し、テープを剥離シートの端部に貼り剥離した後、基材の外観と剥離性を目視で確認して、以下の通り評価した。
○ :剥離(残渣なし)
×A:剥離時に裂けや割れが発生
×B:硬化不良
×C:硬化膜表面へブリードアウトしテープが貼りつかない
[Heat-resistant]
After the glass substrate product of the test piece 1 for evaluation was heated at 100 ° C. for 30 minutes and the tape was attached to and peeled from the edge of the release sheet, the appearance and peelability of the substrate were visually confirmed and evaluated as follows. did.
○: peeling (no residue)
× A: Cracking or cracking occurs at the time of peeling × B: Poor curing × C: Bleed out to the surface of the cured film and the tape does not stick
[印刷性評価用試験片2の作製]
剥離シート用硬化性樹脂組成物の各サンプルを10cm×10cmのガラス(コーニング社製、イーグルXG)にスクリーン印刷機を用いてラインアンドスペース=100μm/100μmで印刷した後、表4〜表15に示す硬化条件でUV照射を行い、剥離シートを有する評価用試験片2を得た。スクリーン印刷機はマイクロ・テック(株)製、MT−320TVを用いた。
[Preparation of test piece 2 for printability evaluation]
Each sample of the curable resin composition for release sheet was printed on a 10 cm × 10 cm glass (Corning Corp., Eagle XG) using a screen printer at a line and space = 100 μm / 100 μm, and then in Tables 4 to 15 UV irradiation was performed under the curing conditions shown to obtain a test piece 2 for evaluation having a release sheet. As a screen printing machine, MT-320TV manufactured by Micro Tech Co., Ltd. was used.
[印刷性]
評価用試験片2の剥離シートのライン間の距離を、光学顕微鏡を用いて測定して、以下の通り評価した。
○:スペースの幅が100〜80μm
×:スペースの幅が80μm未満
[Printability]
The distance between the lines of the release sheet of the evaluation test piece 2 was measured using an optical microscope and evaluated as follows.
○: The width of the space is 100 to 80 μm
×: Space width is less than 80 μm
[マスキング性評価用試験片3の作製]
10cm×10cm銅板の半分に剥離シート用硬化性樹脂組成物の各サンプルを厚さ200μmで塗工し、表4〜表15に示す硬化条件でUV照射を行い、剥離シートを有する評価用試験片3を得た。
[Preparation of test piece 3 for masking evaluation]
Each sample of the curable resin composition for release sheet was applied to a half of a 10 cm × 10 cm copper plate with a thickness of 200 μm, UV irradiation was performed under the curing conditions shown in Tables 4 to 15, and an evaluation test piece having a release sheet 3 was obtained.
[マスキング性]
評価用試験片3を60℃の硫酸水溶液(0.5N)に1時間浸漬後、銀メッキを1分間施した。次に、水道水で銀メッキを洗浄した後、剥離性を目視で確認して、以下の通り評価した。
○ :剥離(残渣なし)
×A:剥離時に裂けや割れが発生
×B:硬化不良
×C:硬化膜表面へブリードアウトしテープが貼りつかない
[Masking properties]
The test piece 3 for evaluation was immersed in an aqueous sulfuric acid solution (0.5N) at 60 ° C. for 1 hour, and then subjected to silver plating for 1 minute. Next, after the silver plating was washed with tap water, the peelability was visually confirmed and evaluated as follows.
○: peeling (no residue)
× A: Cracking or cracking occurs at the time of peeling × B: Poor curing × C: Bleed out to the surface of the cured film and the tape does not stick
[耐傷性評価用試験片4の作製]
剥離シート用硬化性樹脂組成物の各サンプルを10cm×10cmのガラス(コーニング社製、イーグルXG)にダイコーターで100μmの厚みに塗布し、表4〜表15に示す硬化条件でUV照射を行い、剥離シートを有する評価用試験片4を得た。
[Preparation of scratch resistance evaluation test piece 4]
Each sample of the curable resin composition for the release sheet was applied to 10 cm × 10 cm glass (Corning Corp., Eagle XG) with a die coater to a thickness of 100 μm, and UV irradiation was performed under the curing conditions shown in Tables 4 to 15. The test piece 4 for evaluation which has a peeling sheet was obtained.
[滑り性]
評価用試験片4の剥離シートに対してPETフィルムを重ね合わせ25℃で1kgの力でラミネートした後、PETフィルムを手で引いて、剥離シートとPETフィルムの状態を目視で確認し、以下の通り評価した。
○:PETフィルムのみ引ける
×:PETフィルムに剥離シートが付いてくる
[Sliding]
After overlaying a PET film on the release sheet of the test piece 4 for evaluation and laminating with a force of 1 kg at 25 ° C., the PET film is pulled by hand, and the state of the release sheet and the PET film is visually confirmed. The street was evaluated.
○: Only the PET film can be pulled ×: A release sheet is attached to the PET film
[透明性]
評価用試験片4の剥離シートをヘーズメーター(スガ試験機(株)製、HZ−V3)を用いて測定し、以下の通り評価した。
○:ヘーズ値5%未満
×:ヘーズ値5%以上
[transparency]
The release sheet of the test piece 4 for evaluation was measured using a haze meter (HZ-V3, manufactured by Suga Test Instruments Co., Ltd.) and evaluated as follows.
○: Haze value of less than 5% ×: Haze value of 5% or more
上記各試験の結果、各実施例の組成物は優れた剥離性、耐熱性、印刷性、マスキング性、滑り性および透明性を有していた。一方、比較例1−1は、(A)成分と(B)成分との質量比((A)/(B))が本発明の規定範囲の下限を下回るため、剥離性、耐熱性、マスキング性が得られなかった。また、(C)成分を含有していないことから滑り性も得られなかった。比較例1−2は(A)成分と(B)成分との質量比((A)/(B))が本発明の規定範囲の下限を上回るため、剥離性、耐熱性、マスキング性が得られなかった。また、(C)成分を含有していないことから滑り性も得られなかった。比較例1−3は(C)成分が少なすぎるため、滑り性が劣っていた。比較例1−4は(C)成分が多すぎるため、塗膜表面にブリードアウトし剥離性、耐熱性、マスキング性、滑り性が得られなかった。 As a result of each of the above tests, the composition of each example had excellent peelability, heat resistance, printability, masking property, slipperiness and transparency. On the other hand, in Comparative Example 1-1, since the mass ratio ((A) / (B)) of the component (A) to the component (B) is below the lower limit of the specified range of the present invention, peelability, heat resistance, masking Sex was not obtained. Moreover, since the component (C) was not contained, slipperiness was not obtained. In Comparative Example 1-2, the mass ratio ((A) / (B)) of the component (A) to the component (B) exceeds the lower limit of the specified range of the present invention, so that peelability, heat resistance, and masking properties are obtained. I couldn't. Moreover, since the component (C) was not contained, slipperiness was not obtained. Since Comparative Example 1-3 had too little (C) component, the slipperiness was inferior. Since Comparative Example 1-4 had too much (C) component, it bleeded out to the coating-film surface, and peelability, heat resistance, masking property, and slipperiness were not obtained.
比較例1−5および1−6は(C)成分が、ポリエーテル変性ポリジメチルシロキサンでないことから白濁し透明性が劣っていた。比較例1−7はチオエーテル含有(メタ)アクリレート誘導体ではなく、チオエーテル含有アルコキシシラン誘導体であることから剥離性、耐熱性、マスキング性が得られなかった。比較例1−8はチオエーテル含有(メタ)アクリレートにチオール基が存在しないことから硬化膜が得られず剥離性、耐熱性、マスキング性が得られなかった。また、(C)成分を含有していないことから滑り性も得られなかった。比較例1−9および1−10は光照射量が少なすぎたことから剥離性、耐熱性、マスキング性が得られなかった。また、(C)成分を含有していないことから滑り性も得られなかった。 In Comparative Examples 1-5 and 1-6, the component (C) was not polyether-modified polydimethylsiloxane, and thus became cloudy and inferior in transparency. Since Comparative Example 1-7 was not a thioether-containing (meth) acrylate derivative but a thioether-containing alkoxysilane derivative, peelability, heat resistance, and masking properties were not obtained. In Comparative Example 1-8, no thiol group was present in the thioether-containing (meth) acrylate, so a cured film was not obtained, and peelability, heat resistance, and masking property were not obtained. Moreover, since the component (C) was not contained, slipperiness was not obtained. In Comparative Examples 1-9 and 1-10, the amount of light irradiation was too small, so that peelability, heat resistance and masking properties were not obtained. Moreover, since the component (C) was not contained, slipperiness was not obtained.
上記各試験の結果、各実施例の組成物は優れた剥離性、耐熱性、印刷性、マスキング性、滑り性および透明性を有していた。一方、比較例2−1は、(A)成分と(B)成分との質量比((A)/(B))が本発明の規定範囲の下限を下回るため、剥離性、耐熱性、マスキング性が得られなかった。また、(C)成分を含有していないことから滑り性も得られなかった。比較例2−2は(A)成分と(B)成分との質量比((A)/(B))が本発明の規定範囲の下限を上回るため、剥離性、耐熱性、マスキング性が得られなかった。また、(C)成分を含有していないことから滑り性も得られなかった。比較例2−3は(C)成分が少なすぎるため、滑り性が劣っていた。比較例2−4は(C)成分が多すぎるため、塗膜表面にブリードアウトし剥離性、耐熱性、マスキング性、滑り性が得られなかった。 As a result of each of the above tests, the composition of each example had excellent peelability, heat resistance, printability, masking property, slipperiness and transparency. On the other hand, in Comparative Example 2-1, since the mass ratio ((A) / (B)) of the component (A) to the component (B) is below the lower limit of the specified range of the present invention, peelability, heat resistance, masking Sex was not obtained. Moreover, since the component (C) was not contained, slipperiness was not obtained. In Comparative Example 2-2, the mass ratio ((A) / (B)) between the component (A) and the component (B) exceeds the lower limit of the specified range of the present invention, so that peelability, heat resistance, and masking properties are obtained. I couldn't. Moreover, since the component (C) was not contained, slipperiness was not obtained. Since Comparative Example 2-3 had too little (C) component, the slipperiness was inferior. Since Comparative Example 2-4 contained too much (C) component, it bleeded out to the coating-film surface, and peelability, heat resistance, masking property, and slipperiness were not obtained.
比較例2−5および2−6は(C)成分が、ポリエーテル変性ポリジメチルシロキサンでないことから白濁し透明性が劣っていた。 Comparative Examples 2-5 and 2-6 were cloudy and inferior in transparency because component (C) was not polyether-modified polydimethylsiloxane.
上記各試験の結果、各実施例の組成物は優れた剥離性、耐熱性、印刷性、マスキング性、滑り性および透明性を有していた。一方、比較例3−1は、(A)成分と(B)成分との質量比((A)/(B))が本発明の規定範囲の下限を下回るため、剥離性、耐熱性、マスキング性が得られなかった。また、(C)成分を含有していないことから滑り性も得られなかった。比較例3−2は(A)成分と(B)成分との質量比((A)/(B))が本発明の規定範囲の下限を上回るため、剥離性、耐熱性、マスキング性が得られなかった。また、(C)成分を含有していないことから滑り性も得られなかった。比較例3−3は(C)成分が少なすぎるため、滑り性が劣っていた。比較例3−4は(C)成分が多すぎるため、塗膜表面にブリードアウトし剥離性、耐熱性、マスキング性、滑り性が得られなかった。 As a result of each of the above tests, the composition of each example had excellent peelability, heat resistance, printability, masking property, slipperiness and transparency. On the other hand, in Comparative Example 3-1, since the mass ratio ((A) / (B)) between the component (A) and the component (B) is below the lower limit of the specified range of the present invention, the peelability, heat resistance, masking Sex was not obtained. Moreover, since the component (C) was not contained, slipperiness was not obtained. In Comparative Example 3-2, since the mass ratio ((A) / (B)) of the component (A) to the component (B) exceeds the lower limit of the specified range of the present invention, peelability, heat resistance, and masking properties are obtained. I couldn't. Moreover, since the component (C) was not contained, slipperiness was not obtained. Since Comparative Example 3-3 has too little (C) component, the slipperiness was inferior. Since Comparative Example 3-4 contained too much (C) component, it bleeded out to the coating-film surface, and peelability, heat resistance, masking property, and slipperiness were not obtained.
比較例3−5および3−6は(C)成分が、ポリエーテル変性ポリジメチルシロキサンでないことから白濁し透明性が劣っていた。 Comparative Examples 3-5 and 3-6 were cloudy and inferior in transparency because component (C) was not polyether-modified polydimethylsiloxane.
本発明の剥離シート用硬化性樹脂組成物は、例えばタッチパネルを割れ、傷、埃や汚れなどから保護する保護層として、また印刷における非印刷部分やメッキにおける非メッキ部分の保護層として利用することができる。 The curable resin composition for a release sheet of the present invention is used, for example, as a protective layer for protecting a touch panel from cracks, scratches, dust, dirt, and the like, and as a protective layer for a non-printing part in printing and a non-plating part in plating. Can do.
Claims (6)
(B)重量平均分子量が200〜50000である多官能(メタ)アクリレートと、
(C)ポリエーテル変性ポリジメチルシロキサン
を含有し、(A)成分と(B)成分との質量比((A)/(B))が0.05〜30であり、(A)成分と(B)成分との合計質量100質量部に対して、(C)成分の質量が0.01〜5質量部である剥離シート用硬化性樹脂組成物。
(式中のaは1〜5の整数であり、bは0〜2の整数であり、cは1〜5の整数であり、aとbとcの和は3〜4、又は、6である。dは0〜1の整数であり、R1は、メチレン基、エチレン基またはイソプロピレン基である。R2は、下記(式2)または下記(式3)で表される2価の官能基である。R3は、メチル基またはエチル基である。R4は、炭素数が1〜12の炭化水素基である。R6は炭素原子、下記式(4)で表される3価の官能基、及び、下記(式5)で表される6価の官能基から選ばれる何れかである。)
(B) a polyfunctional (meth) acrylate having a weight average molecular weight of 200 to 50,000,
(C) It contains polyether-modified polydimethylsiloxane, the mass ratio ((A) / (B)) of the component (A) to the component (B) is 0.05 to 30, and the component (A) B) The curable resin composition for release sheets in which the mass of the component (C) is 0.01 to 5 parts by mass with respect to 100 parts by mass of the total mass with the component.
(In the formula, a is an integer of 1 to 5, b is an integer of 0 to 2, c is an integer of 1 to 5, and the sum of a, b, and c is 3 to 4, or 6. D is an integer of 0 to 1 , R 1 is a methylene group, an ethylene group or an isopropylene group, and R 2 is a divalent group represented by the following (formula 2) or the following (formula 3). R 3 is a methyl group or an ethyl group, R 4 is a hydrocarbon group having 1 to 12 carbon atoms, R 6 is a carbon atom, 3 represented by the following formula (4) And any one selected from a valent functional group and a hexavalent functional group represented by the following (formula 5).)
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