JP2018074041A5 - - Google Patents
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- JP2018074041A5 JP2018074041A5 JP2016213544A JP2016213544A JP2018074041A5 JP 2018074041 A5 JP2018074041 A5 JP 2018074041A5 JP 2016213544 A JP2016213544 A JP 2016213544A JP 2016213544 A JP2016213544 A JP 2016213544A JP 2018074041 A5 JP2018074041 A5 JP 2018074041A5
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- JP
- Japan
- Prior art keywords
- substrate
- mold
- pattern
- imprint
- mesa
- Prior art date
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- 239000000758 substrate Substances 0.000 claims description 50
- 238000001514 detection method Methods 0.000 claims description 30
- 239000000463 material Substances 0.000 claims description 15
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000005755 formation reaction Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000004642 transportation engineering Methods 0.000 claims 1
- 239000002023 wood Substances 0.000 description 1
Description
本発明のインプリント装置は、型と基板のそれぞれにメサ部が在るか否かを検出するメサ部検出手段と、該検出手段の検出結果に応じて前記型を用いて前記基板にインプリント材のパターンを形成する制御手段と、を有し、前記検出結果が前記型と前記基板の少なくとも一方にメサ部を有するとの結果である場合に、前記基板上のインプリント材と前記型とを接触させてパターンを形成するように制御し、前記検出結果が前記型及び前記基板のいずれにもメサ部を有さないとの結果である場合に、前記基板上のインプリント材と前記型とを接触させないように制御することを特徴とする。さらに、本発明のインプリント装置は、型と基板のそれぞれのメサ部の状態を検出するメサ部検出手段と、該検出手段の検出結果に応じて、型を用いて前記基板にパターンを形成する制御を行う制御手段と、を有し、前記制御手段は、前記検出結果が、前記型と前記基板とのメサ部の状態が何れも意図している状態であると判断された場合に、前記基板上のインプリント材と前記型とを接触させてパターンを形成するように制御し、前記検出結果が、前記型と前記基板の少なくとも一方のメサ部の状態が意図している状態でないと判断された場合に、前記基板上のインプリント材と前記型とを接触させないように制御する、ことを特徴とする。 The imprint apparatus of the present invention includes a mesa detection unit that detects whether or not each of the mold and the substrate has a mesa, and imprints the substrate using the mold according to the detection result of the detection unit. possess control means for forming a pattern of wood, and if the detection result is a result of having a mesa portion on at least one of the substrate and the mold, and the mold with imprint material on the substrate When the detection result is a result that neither the die nor the substrate has a mesa portion, the imprint material on the substrate and the die are controlled. you and controls so as not to contact and. Furthermore, the imprinting apparatus of the present invention forms a pattern on the substrate using a die according to the detection result of the mesa portion detecting means for detecting the state of each mesa portion of the die and the substrate. And a control means for performing control, wherein the control means determines that the detection result indicates that the states of the mesas of the mold and the substrate are both intended states. The imprint material on the substrate and the mold are controlled so as to be in contact with each other to form a pattern, and the detection result is determined that the state of the mesa portion of at least one of the mold and the substrate is not the intended state. In such a case, the imprint material on the substrate and the mold are controlled so as not to come into contact with each other.
Claims (16)
該検出手段の検出結果に応じて前記型を用いて前記基板にインプリント材のパターンを形成する制御手段と、を有し、
前記検出結果が前記型と前記基板の少なくとも一方にメサ部を有するとの結果である場合に、前記基板上のインプリント材と前記型とを接触させてパターンを形成するように制御し、
前記検出結果が前記型及び前記基板のいずれにもメサ部を有さないとの結果である場合に、前記基板上のインプリント材と前記型とを接触させないように制御する
ことを特徴とするインプリント装置。 Mesa detection means for detecting whether or not there is a mesa on each of the mold and the substrate,
In accordance with the detection result of the detection means have a, and control means for forming a pattern of the imprint material on the substrate using the mold,
When the detection result is a result of having a mesa portion on at least one of the mold and the substrate, the imprint material on the substrate and the mold are controlled to be contacted to form a pattern,
When the detection result indicates that neither the die nor the substrate has a mesa portion, the imprint material on the substrate is controlled so as not to come into contact with the die. Imprint device.
該検出手段の検出結果に応じて、型を用いて前記基板にパターンを形成する制御を行う制御手段と、を有し、Control means for controlling the formation of a pattern on the substrate using a mold according to the detection result of the detection means,
前記制御手段は、The control means is
前記検出結果が、前記型と前記基板とのメサ部の状態が何れも意図している状態であると判断された場合に、前記基板上のインプリント材と前記型とを接触させてパターンを形成するように制御し、When the detection result indicates that the state of the mesa portion between the die and the substrate is the intended state, the imprint material on the substrate is brought into contact with the die to form a pattern. Control to form,
前記検出結果が、前記型と前記基板の少なくとも一方のメサ部の状態が意図している状態でないと判断された場合に、前記基板上のインプリント材と前記型とを接触させないように制御する、When the detection result determines that the state of the mesa portion of at least one of the die and the substrate is not the intended state, the imprint material on the substrate is controlled so as not to contact the die. ,
ことを特徴とするインプリント装置。An imprint apparatus characterized by the above.
前記型検出手段は、前記型を前記型保持部へ搬送する途中で、前記型のメサ部の有無を検出することを特徴とする、請求項3乃至6の何れか1項に記載のインプリント装置。 A mold holding unit for holding the mold,
Said sensing means is in the course of transporting the mold to the mold holding unit, and detecting the presence or absence of the type of the mesa, the imprint of any one of claims 3 to 6 apparatus.
前記制御手段は、前記基板検出手段の検出結果に応じて前記インプリント材のパターンを形成することを特徴とする請求項1乃至7の何れか1項に記載のインプリント装置。 The mesa portion detecting means, on the surface of the substrate, includes a substrate detecting means for detecting whether or not the region in which the pattern of the imprint material is formed is more convex than the surroundings,
The control means, the imprint apparatus according to any one of claims 1 to 7, characterized in that in accordance with a detection result of said substrate detecting means to form a pattern of the imprint material.
前記基板検出手段は、前記基板を前記基板保持部へ搬送する途中で、前記基板のメサ部の有無を検出することを特徴とする、請求項8乃至11の何れか1項に記載のインプリント装置。 A substrate holding unit for holding the substrate,
The substrate detection unit detects the presence or absence of a mesa portion of the substrate during the transportation of the substrate to the substrate holding unit, according to any one of claims 8 to 11. Printing equipment.
該検出手段の検出結果、基板にメサ部を有さない場合に、型を用いて前記基板にインプリント材のパターンを形成しない制御を行う制御手段と、を有する
ことを特徴とするインプリント装置。 A mesa detection means for detecting whether or not there is a mesa on the substrate,
An imprint apparatus comprising: a control unit that performs control so that a pattern of an imprint material is not formed on the substrate by using a mold when the substrate does not have a mesa portion as a detection result of the detection unit. ..
前記取得された結果が、前記型と前記基板の少なくとも一方にメサ部を有するとの結果である場合に、前記型を用いて前記基板にインプリント材のパターンを形成し、前記取得された結果が、前記型と前記基板の少なくとも一方にメサ部を有さないとの結果である場合に、前記基板上のインプリント材と前記型とを接触させないようにする工程と、を有することを特徴とするインプリント方法。 Obtaining a result of whether or not there is a mesa portion on each of the mold and the substrate,
When the obtained result is a result that at least one of the mold and the substrate has a mesa portion, a pattern of an imprint material is formed on the substrate using the mold, and the obtained result When the result is that at least one of the die and the substrate does not have a mesa portion, a step of preventing the imprint material on the substrate from coming into contact with the die. And imprint method.
前記パターンが形成された前記基板を加工するステップと、
を有することを特徴とする物品の製造方法。 Forming a pattern on a substrate using the imprint apparatus according to any one of claims 1 to 14,
Processing the substrate on which the pattern is formed,
A method for manufacturing an article, comprising:
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016213544A JP6779748B2 (en) | 2016-10-31 | 2016-10-31 | Imprinting equipment, imprinting methods, and manufacturing methods for articles |
KR1020170137234A KR102246569B1 (en) | 2016-10-31 | 2017-10-23 | Imprint apparatus, imprint method, and method of manufacturing article |
Applications Claiming Priority (1)
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JP2016213544A JP6779748B2 (en) | 2016-10-31 | 2016-10-31 | Imprinting equipment, imprinting methods, and manufacturing methods for articles |
Publications (3)
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JP2018074041A JP2018074041A (en) | 2018-05-10 |
JP2018074041A5 true JP2018074041A5 (en) | 2020-07-27 |
JP6779748B2 JP6779748B2 (en) | 2020-11-04 |
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JP2016213544A Active JP6779748B2 (en) | 2016-10-31 | 2016-10-31 | Imprinting equipment, imprinting methods, and manufacturing methods for articles |
Country Status (2)
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JP (1) | JP6779748B2 (en) |
KR (1) | KR102246569B1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7278163B2 (en) | 2019-07-11 | 2023-05-19 | キヤノン株式会社 | IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD |
JP7475185B2 (en) | 2020-04-10 | 2024-04-26 | キヤノン株式会社 | MEASUREMENT METHOD, IMPRINT APPARATUS, AND PRODUCTION METHOD OF ARTICLE |
Family Cites Families (15)
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JP4810496B2 (en) * | 2007-04-25 | 2011-11-09 | 株式会社東芝 | Pattern forming apparatus, pattern forming method, and template |
JP4641552B2 (en) | 2008-06-23 | 2011-03-02 | キヤノン株式会社 | Fine processing method and fine processing apparatus |
JP5407525B2 (en) | 2009-04-27 | 2014-02-05 | 大日本印刷株式会社 | Nanoimprint transfer substrate and nanoimprint transfer method |
JP2011066180A (en) * | 2009-09-17 | 2011-03-31 | Toshiba Corp | Method of forming and managing template, template, and template forming and managing device |
US20120261849A1 (en) * | 2011-04-14 | 2012-10-18 | Canon Kabushiki Kaisha | Imprint apparatus, and article manufacturing method using same |
JP6029268B2 (en) * | 2011-09-12 | 2016-11-24 | キヤノン株式会社 | Imprint apparatus and article manufacturing method using the same |
JP5686779B2 (en) * | 2011-10-14 | 2015-03-18 | キヤノン株式会社 | Imprint apparatus and article manufacturing method using the same |
JP6071221B2 (en) | 2012-03-14 | 2017-02-01 | キヤノン株式会社 | Imprint apparatus, mold, imprint method, and article manufacturing method |
JP5865208B2 (en) * | 2012-08-07 | 2016-02-17 | 富士フイルム株式会社 | Mold manufacturing method |
JP6412317B2 (en) * | 2013-04-24 | 2018-10-24 | キヤノン株式会社 | Imprint method, imprint apparatus, and article manufacturing method |
JP6381184B2 (en) * | 2013-07-09 | 2018-08-29 | キヤノン株式会社 | Calibration method, measuring apparatus, exposure apparatus, and article manufacturing method |
JP6317620B2 (en) * | 2014-05-02 | 2018-04-25 | キヤノン株式会社 | Imprint method, imprint apparatus, and article manufacturing method |
JP6450105B2 (en) * | 2014-07-31 | 2019-01-09 | キヤノン株式会社 | Imprint apparatus and article manufacturing method |
JP6379937B2 (en) * | 2014-09-30 | 2018-08-29 | 大日本印刷株式会社 | Stage control method, correction template manufacturing method, and template observation correction device |
CN105487151A (en) * | 2016-01-22 | 2016-04-13 | 武汉理工大学 | Grating preparation method through pattern transfer based on nano-imprint |
-
2016
- 2016-10-31 JP JP2016213544A patent/JP6779748B2/en active Active
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2017
- 2017-10-23 KR KR1020170137234A patent/KR102246569B1/en active IP Right Grant
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7278163B2 (en) | 2019-07-11 | 2023-05-19 | キヤノン株式会社 | IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD |
JP7475185B2 (en) | 2020-04-10 | 2024-04-26 | キヤノン株式会社 | MEASUREMENT METHOD, IMPRINT APPARATUS, AND PRODUCTION METHOD OF ARTICLE |
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