JP2018058980A - Salt-forming compound, image forming material using the same and use of the material - Google Patents
Salt-forming compound, image forming material using the same and use of the material Download PDFInfo
- Publication number
- JP2018058980A JP2018058980A JP2016196693A JP2016196693A JP2018058980A JP 2018058980 A JP2018058980 A JP 2018058980A JP 2016196693 A JP2016196693 A JP 2016196693A JP 2016196693 A JP2016196693 A JP 2016196693A JP 2018058980 A JP2018058980 A JP 2018058980A
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- Prior art keywords
- group
- squarylium
- parts
- substituent
- salt
- Prior art date
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- 239000000463 material Substances 0.000 title claims abstract description 60
- 150000001875 compounds Chemical class 0.000 title claims abstract description 55
- 229920005989 resin Polymers 0.000 claims abstract description 93
- 239000011347 resin Substances 0.000 claims abstract description 93
- 125000002091 cationic group Chemical group 0.000 claims abstract description 37
- 125000001424 substituent group Chemical group 0.000 claims description 51
- 125000000217 alkyl group Chemical group 0.000 claims description 30
- 125000003277 amino group Chemical group 0.000 claims description 16
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 16
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 14
- 229920002554 vinyl polymer Polymers 0.000 claims description 13
- 125000003342 alkenyl group Chemical group 0.000 claims description 12
- 125000003118 aryl group Chemical group 0.000 claims description 12
- 125000002947 alkylene group Chemical group 0.000 claims description 10
- 238000007639 printing Methods 0.000 claims description 10
- 125000003545 alkoxy group Chemical group 0.000 claims description 7
- 125000004104 aryloxy group Chemical group 0.000 claims description 6
- 125000005843 halogen group Chemical group 0.000 claims description 6
- 150000001767 cationic compounds Chemical class 0.000 claims description 5
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 claims description 5
- 150000002892 organic cations Chemical class 0.000 claims description 5
- 150000001449 anionic compounds Chemical class 0.000 claims description 4
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 4
- 125000000732 arylene group Chemical group 0.000 claims description 4
- 150000002891 organic anions Chemical class 0.000 claims description 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 3
- 238000010521 absorption reaction Methods 0.000 abstract description 20
- 238000004220 aggregation Methods 0.000 abstract description 3
- 230000002776 aggregation Effects 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 description 146
- -1 tert-amyl group Chemical group 0.000 description 106
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 82
- 239000000976 ink Substances 0.000 description 46
- 238000000921 elemental analysis Methods 0.000 description 45
- 238000004949 mass spectrometry Methods 0.000 description 43
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 42
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 35
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 35
- 238000000034 method Methods 0.000 description 23
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 21
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 20
- 239000000178 monomer Substances 0.000 description 19
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 18
- 239000000975 dye Substances 0.000 description 17
- 239000007787 solid Substances 0.000 description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 16
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 16
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 15
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 15
- 230000015572 biosynthetic process Effects 0.000 description 15
- 150000003863 ammonium salts Chemical class 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 14
- 239000000203 mixture Substances 0.000 description 14
- 239000003960 organic solvent Substances 0.000 description 13
- 238000002360 preparation method Methods 0.000 description 13
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 12
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 12
- 238000006116 polymerization reaction Methods 0.000 description 12
- 150000003839 salts Chemical group 0.000 description 12
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 11
- 239000007864 aqueous solution Substances 0.000 description 11
- 239000003795 chemical substances by application Substances 0.000 description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- 238000003786 synthesis reaction Methods 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 229940125904 compound 1 Drugs 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 230000003595 spectral effect Effects 0.000 description 9
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 8
- POSWICCRDBKBMH-UHFFFAOYSA-N 3,3,5-trimethylcyclohexan-1-one Chemical compound CC1CC(=O)CC(C)(C)C1 POSWICCRDBKBMH-UHFFFAOYSA-N 0.000 description 8
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 8
- 239000006185 dispersion Substances 0.000 description 8
- 238000004821 distillation Methods 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- 239000000049 pigment Substances 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 8
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 7
- 238000010526 radical polymerization reaction Methods 0.000 description 7
- 238000003860 storage Methods 0.000 description 7
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 6
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 5
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical class C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000002270 dispersing agent Substances 0.000 description 5
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 5
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 4
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 4
- ZSGCMGCJGLHMLL-UHFFFAOYSA-N 3,5-diethylcyclohexan-1-one Chemical compound CCC1CC(CC)CC(=O)C1 ZSGCMGCJGLHMLL-UHFFFAOYSA-N 0.000 description 4
- MSANHHHQJYQEOK-UHFFFAOYSA-N 3,5-dimethylcyclohexan-1-one Chemical compound CC1CC(C)CC(=O)C1 MSANHHHQJYQEOK-UHFFFAOYSA-N 0.000 description 4
- NYYRRBOMNHUCLB-UHFFFAOYSA-N 3-chloro-n,n-dimethylpropan-1-amine Chemical class CN(C)CCCCl NYYRRBOMNHUCLB-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Natural products OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- 239000002202 Polyethylene glycol Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 150000001450 anions Chemical class 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 150000001768 cations Chemical class 0.000 description 4
- 239000012320 chlorinating reagent Substances 0.000 description 4
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- 239000000839 emulsion Substances 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 4
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 4
- 229920001223 polyethylene glycol Polymers 0.000 description 4
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 4
- 239000003381 stabilizer Substances 0.000 description 4
- 150000003440 styrenes Chemical class 0.000 description 4
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 3
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 3
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical class C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 3
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 239000001530 fumaric acid Substances 0.000 description 3
- 235000011187 glycerol Nutrition 0.000 description 3
- 238000007646 gravure printing Methods 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 3
- 238000007644 letterpress printing Methods 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 238000007645 offset printing Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000003505 polymerization initiator Substances 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 3
- 229920001567 vinyl ester resin Polymers 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 description 2
- YFOOEYJGMMJJLS-UHFFFAOYSA-N 1,8-diaminonaphthalene Chemical compound C1=CC(N)=C2C(N)=CC=CC2=C1 YFOOEYJGMMJJLS-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- 125000006017 1-propenyl group Chemical group 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 2
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 2
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 2
- VGVHNLRUAMRIEW-UHFFFAOYSA-N 4-methylcyclohexan-1-one Chemical compound CC1CCC(=O)CC1 VGVHNLRUAMRIEW-UHFFFAOYSA-N 0.000 description 2
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 2
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 2
- 208000012641 Pigmentation disease Diseases 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 2
- GCRTVIUGJCJVDD-UHFFFAOYSA-N Tetrahydrocarvone Chemical compound CC(C)C1CCC(C)C(=O)C1 GCRTVIUGJCJVDD-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- IAXXETNIOYFMLW-COPLHBTASA-N [(1s,3s,4s)-4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl] 2-methylprop-2-enoate Chemical compound C1C[C@]2(C)[C@@H](OC(=O)C(=C)C)C[C@H]1C2(C)C IAXXETNIOYFMLW-COPLHBTASA-N 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 2
- 150000003926 acrylamides Chemical class 0.000 description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
- 150000004996 alkyl benzenes Chemical class 0.000 description 2
- 150000003868 ammonium compounds Chemical class 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 238000010560 atom transfer radical polymerization reaction Methods 0.000 description 2
- 238000010533 azeotropic distillation Methods 0.000 description 2
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 2
- 229940073608 benzyl chloride Drugs 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- GZUXJHMPEANEGY-UHFFFAOYSA-N bromomethane Chemical compound BrC GZUXJHMPEANEGY-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- ZQMIGQNCOMNODD-UHFFFAOYSA-N diacetyl peroxide Chemical compound CC(=O)OOC(C)=O ZQMIGQNCOMNODD-UHFFFAOYSA-N 0.000 description 2
- 125000004663 dialkyl amino group Chemical group 0.000 description 2
- 125000004915 dibutylamino group Chemical group C(CCC)N(CCCC)* 0.000 description 2
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 2
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 2
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 2
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229940119545 isobornyl methacrylate Drugs 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 238000001254 matrix assisted laser desorption--ionisation time-of-flight mass spectrum Methods 0.000 description 2
- RBQRWNWVPQDTJJ-UHFFFAOYSA-N methacryloyloxyethyl isocyanate Chemical compound CC(=C)C(=O)OCCN=C=O RBQRWNWVPQDTJJ-UHFFFAOYSA-N 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 229940050176 methyl chloride Drugs 0.000 description 2
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 2
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 125000005186 naphthyloxy group Chemical group C1(=CC=CC2=CC=CC=C12)O* 0.000 description 2
- 239000011146 organic particle Substances 0.000 description 2
- 150000001451 organic peroxides Chemical class 0.000 description 2
- KJIFKLIQANRMOU-UHFFFAOYSA-N oxidanium;4-methylbenzenesulfonate Chemical compound O.CC1=CC=C(S(O)(=O)=O)C=C1 KJIFKLIQANRMOU-UHFFFAOYSA-N 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 2
- 239000001007 phthalocyanine dye Substances 0.000 description 2
- 230000019612 pigmentation Effects 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 125000001453 quaternary ammonium group Chemical group 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000003352 sequestering agent Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- PWEBUXCTKOWPCW-UHFFFAOYSA-N squaric acid Chemical compound OC1=C(O)C(=O)C1=O PWEBUXCTKOWPCW-UHFFFAOYSA-N 0.000 description 2
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 239000001384 succinic acid Substances 0.000 description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 2
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 2
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 2
- 125000000876 trifluoromethoxy group Chemical group FC(F)(F)O* 0.000 description 2
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 2
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 description 2
- IAXXETNIOYFMLW-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) 2-methylprop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C(=C)C)CC1C2(C)C IAXXETNIOYFMLW-UHFFFAOYSA-N 0.000 description 1
- 125000004400 (C1-C12) alkyl group Chemical group 0.000 description 1
- 125000006702 (C1-C18) alkyl group Chemical group 0.000 description 1
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
- DTCCVIYSGXONHU-CJHDCQNGSA-N (z)-2-(2-phenylethenyl)but-2-enedioic acid Chemical compound OC(=O)\C=C(C(O)=O)\C=CC1=CC=CC=C1 DTCCVIYSGXONHU-CJHDCQNGSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- MJYFYGVCLHNRKB-UHFFFAOYSA-N 1,1,2-trifluoroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(F)(F)CF MJYFYGVCLHNRKB-UHFFFAOYSA-N 0.000 description 1
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- 229940015975 1,2-hexanediol Drugs 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 description 1
- XQBHAZDVLGNSOJ-UHFFFAOYSA-N 1-(4-ethenylphenyl)-n,n-dimethylmethanamine Chemical compound CN(C)CC1=CC=C(C=C)C=C1 XQBHAZDVLGNSOJ-UHFFFAOYSA-N 0.000 description 1
- QLOKJRIVRGCVIM-UHFFFAOYSA-N 1-[(4-methylsulfanylphenyl)methyl]piperazine Chemical compound C1=CC(SC)=CC=C1CN1CCNCC1 QLOKJRIVRGCVIM-UHFFFAOYSA-N 0.000 description 1
- CYNYIHKIEHGYOZ-UHFFFAOYSA-N 1-bromopropane Chemical compound CCCBr CYNYIHKIEHGYOZ-UHFFFAOYSA-N 0.000 description 1
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- CNDHHGUSRIZDSL-UHFFFAOYSA-N 1-chlorooctane Chemical compound CCCCCCCCCl CNDHHGUSRIZDSL-UHFFFAOYSA-N 0.000 description 1
- GXZPMXGRNUXGHN-UHFFFAOYSA-N 1-ethenoxy-2-methoxyethane Chemical compound COCCOC=C GXZPMXGRNUXGHN-UHFFFAOYSA-N 0.000 description 1
- YAOJJEJGPZRYJF-UHFFFAOYSA-N 1-ethenoxyhexane Chemical compound CCCCCCOC=C YAOJJEJGPZRYJF-UHFFFAOYSA-N 0.000 description 1
- UDJZTGMLYITLIQ-UHFFFAOYSA-N 1-ethenylpyrrolidine Chemical compound C=CN1CCCC1 UDJZTGMLYITLIQ-UHFFFAOYSA-N 0.000 description 1
- GMLYXPGQZVOYNT-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethylperoxy)ethane Chemical group CCOCCOOCCOCC GMLYXPGQZVOYNT-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- 125000006039 1-hexenyl group Chemical group 0.000 description 1
- 125000006019 1-methyl-1-propenyl group Chemical group 0.000 description 1
- 125000006021 1-methyl-2-propenyl group Chemical group 0.000 description 1
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 1
- 125000006023 1-pentenyl group Chemical group 0.000 description 1
- CISIJYCKDJSTMX-UHFFFAOYSA-N 2,2-dichloroethenylbenzene Chemical compound ClC(Cl)=CC1=CC=CC=C1 CISIJYCKDJSTMX-UHFFFAOYSA-N 0.000 description 1
- AOFMCMJFSFMQCU-UHFFFAOYSA-N 2,6-bis(trifluoromethoxy)cyclohexan-1-one Chemical compound FC(OC1C(C(CCC1)OC(F)(F)F)=O)(F)F AOFMCMJFSFMQCU-UHFFFAOYSA-N 0.000 description 1
- AILVYPLQKCQNJC-UHFFFAOYSA-N 2,6-dimethylcyclohexan-1-one Chemical compound CC1CCCC(C)C1=O AILVYPLQKCQNJC-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- DRLRGHZJOQGQEC-UHFFFAOYSA-N 2-(2-methoxypropoxy)propyl acetate Chemical compound COC(C)COC(C)COC(C)=O DRLRGHZJOQGQEC-UHFFFAOYSA-N 0.000 description 1
- NCHBYORVPVDWBJ-UHFFFAOYSA-N 2-(3-methylbutoxy)ethanol Chemical compound CC(C)CCOCCO NCHBYORVPVDWBJ-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- INFFATMFXZFLAO-UHFFFAOYSA-N 2-(methoxymethoxy)ethanol Chemical compound COCOCCO INFFATMFXZFLAO-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- VUDVPVOIALASLB-UHFFFAOYSA-N 2-[(2-cyano-1-hydroxypropan-2-yl)diazenyl]-3-hydroxy-2-methylpropanenitrile Chemical compound OCC(C)(C#N)N=NC(C)(CO)C#N VUDVPVOIALASLB-UHFFFAOYSA-N 0.000 description 1
- PFHOSZAOXCYAGJ-UHFFFAOYSA-N 2-[(2-cyano-4-methoxy-4-methylpentan-2-yl)diazenyl]-4-methoxy-2,4-dimethylpentanenitrile Chemical compound COC(C)(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)(C)OC PFHOSZAOXCYAGJ-UHFFFAOYSA-N 0.000 description 1
- COBPKKZHLDDMTB-UHFFFAOYSA-N 2-[2-(2-butoxyethoxy)ethoxy]ethanol Chemical compound CCCCOCCOCCOCCO COBPKKZHLDDMTB-UHFFFAOYSA-N 0.000 description 1
- HXLLCROMVONRRO-UHFFFAOYSA-N 2-butoxyethenylbenzene Chemical compound CCCCOC=CC1=CC=CC=C1 HXLLCROMVONRRO-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- SZTBMYHIYNGYIA-UHFFFAOYSA-N 2-chloroacrylic acid Chemical compound OC(=O)C(Cl)=C SZTBMYHIYNGYIA-UHFFFAOYSA-N 0.000 description 1
- CCHNWURRBFGQCD-UHFFFAOYSA-N 2-chlorocyclohexan-1-one Chemical compound ClC1CCCCC1=O CCHNWURRBFGQCD-UHFFFAOYSA-N 0.000 description 1
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 1
- UOBQDYFTAJKQAL-UHFFFAOYSA-N 2-cyclohexylcyclohexan-1-one Chemical compound O=C1CCCCC1C1CCCCC1 UOBQDYFTAJKQAL-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- 125000006040 2-hexenyl group Chemical group 0.000 description 1
- UPGSWASWQBLSKZ-UHFFFAOYSA-N 2-hexoxyethanol Chemical compound CCCCCCOCCO UPGSWASWQBLSKZ-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- CTHJQRHPNQEPAB-UHFFFAOYSA-N 2-methoxyethenylbenzene Chemical compound COC=CC1=CC=CC=C1 CTHJQRHPNQEPAB-UHFFFAOYSA-N 0.000 description 1
- 125000004204 2-methoxyphenyl group Chemical group [H]C1=C([H])C(*)=C(OC([H])([H])[H])C([H])=C1[H] 0.000 description 1
- 125000006020 2-methyl-1-propenyl group Chemical group 0.000 description 1
- 125000006022 2-methyl-2-propenyl group Chemical group 0.000 description 1
- XVTXLKJBAYGTJS-UHFFFAOYSA-N 2-methylpenta-1,4-dien-3-one Chemical compound CC(=C)C(=O)C=C XVTXLKJBAYGTJS-UHFFFAOYSA-N 0.000 description 1
- BTOVVHWKPVSLBI-UHFFFAOYSA-N 2-methylprop-1-enylbenzene Chemical compound CC(C)=CC1=CC=CC=C1 BTOVVHWKPVSLBI-UHFFFAOYSA-N 0.000 description 1
- 125000006024 2-pentenyl group Chemical group 0.000 description 1
- DRLVMOAWNVOSPE-UHFFFAOYSA-N 2-phenylcyclohexan-1-one Chemical compound O=C1CCCCC1C1=CC=CC=C1 DRLVMOAWNVOSPE-UHFFFAOYSA-N 0.000 description 1
- FMFHUEMLVAIBFI-UHFFFAOYSA-N 2-phenylethenyl acetate Chemical compound CC(=O)OC=CC1=CC=CC=C1 FMFHUEMLVAIBFI-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- MGADZUXDNSDTHW-UHFFFAOYSA-N 2H-pyran Chemical compound C1OC=CC=C1 MGADZUXDNSDTHW-UHFFFAOYSA-N 0.000 description 1
- ZSMHBPQGODWVFF-UHFFFAOYSA-N 3,3-dibromocyclohexan-1-one Chemical compound BrC1(CC(CCC1)=O)Br ZSMHBPQGODWVFF-UHFFFAOYSA-N 0.000 description 1
- KFGFVPMRLOQXNB-UHFFFAOYSA-N 3,5,5-trimethylhexanoyl 3,5,5-trimethylhexaneperoxoate Chemical compound CC(C)(C)CC(C)CC(=O)OOC(=O)CC(C)CC(C)(C)C KFGFVPMRLOQXNB-UHFFFAOYSA-N 0.000 description 1
- YYNKQGWXRNGSOP-UHFFFAOYSA-N 3,5-bis(trifluoromethyl)cyclohexan-1-one Chemical compound FC(F)(F)C1CC(C(F)(F)F)CC(=O)C1 YYNKQGWXRNGSOP-UHFFFAOYSA-N 0.000 description 1
- VSNLJDIYVSNZBH-UHFFFAOYSA-N 3,5-difluorocyclohexan-1-one Chemical compound FC1CC(F)CC(=O)C1 VSNLJDIYVSNZBH-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- DHADFOYSYHBGIV-UHFFFAOYSA-N 3-(2-chloroethyl)cyclohexan-1-one Chemical compound ClCCC1CC(CCC1)=O DHADFOYSYHBGIV-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- XUDUTRMKKYUAKI-UHFFFAOYSA-N 3-[1-(1-phenylethyl)piperidin-4-yl]-1h-benzimidazol-2-one Chemical compound C1CC(N2C(NC3=CC=CC=C32)=O)CCN1C(C)C1=CC=CC=C1 XUDUTRMKKYUAKI-UHFFFAOYSA-N 0.000 description 1
- 125000006041 3-hexenyl group Chemical group 0.000 description 1
- OOPLQVRBYMJKDA-UHFFFAOYSA-N 3-methyl-3,4,4a,5,8,8a-hexahydro-2h-naphthalen-1-one Chemical compound C1C=CCC2C(=O)CC(C)CC21 OOPLQVRBYMJKDA-UHFFFAOYSA-N 0.000 description 1
- CEBRPXLXYCFYGU-UHFFFAOYSA-N 3-methylbut-1-enylbenzene Chemical compound CC(C)C=CC1=CC=CC=C1 CEBRPXLXYCFYGU-UHFFFAOYSA-N 0.000 description 1
- ZTHJQCDAHYOPIK-UHFFFAOYSA-N 3-methylbut-2-en-2-ylbenzene Chemical compound CC(C)=C(C)C1=CC=CC=C1 ZTHJQCDAHYOPIK-UHFFFAOYSA-N 0.000 description 1
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 1
- XDHMORMQXOUOHT-UHFFFAOYSA-N 4-(4-methylphenyl)cyclohexan-1-one Chemical compound C1=CC(C)=CC=C1C1CCC(=O)CC1 XDHMORMQXOUOHT-UHFFFAOYSA-N 0.000 description 1
- LMBFUMXVHAJSNJ-UHFFFAOYSA-N 4-(dimethylamino)cyclohexan-1-one Chemical compound CN(C)C1CCC(=O)CC1 LMBFUMXVHAJSNJ-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- AGAIBVLCUXWQRE-UHFFFAOYSA-N 4-[(4-carboxy-2-cyanobutan-2-yl)diazenyl]-4-cyanopentanoic acid methyl 2-[(1-methoxy-2-methyl-1-oxopropan-2-yl)diazenyl]-2-methylpropanoate Chemical compound COC(=O)C(C)(C)N=NC(C)(C)C(=O)OC.OC(=O)CCC(C)(C#N)N=NC(C)(CCC(O)=O)C#N AGAIBVLCUXWQRE-UHFFFAOYSA-N 0.000 description 1
- OTCYOBLTAQTFPW-UHFFFAOYSA-N 4-aminocyclohexan-1-one Chemical compound NC1CCC(=O)CC1 OTCYOBLTAQTFPW-UHFFFAOYSA-N 0.000 description 1
- DTEOFISCGXWYKE-UHFFFAOYSA-N 4-benzylcyclohexan-1-one Chemical compound C1CC(=O)CCC1CC1=CC=CC=C1 DTEOFISCGXWYKE-UHFFFAOYSA-N 0.000 description 1
- 125000004800 4-bromophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Br 0.000 description 1
- 125000004801 4-cyanophenyl group Chemical group [H]C1=C([H])C(C#N)=C([H])C([H])=C1* 0.000 description 1
- LVEFFFUKMDNCBN-UHFFFAOYSA-N 4-ethoxycyclohexan-1-one Chemical compound CCOC1CCC(=O)CC1 LVEFFFUKMDNCBN-UHFFFAOYSA-N 0.000 description 1
- 125000006042 4-hexenyl group Chemical group 0.000 description 1
- KOKPBCHLPVDQTK-UHFFFAOYSA-N 4-methoxy-4-methylpentan-2-one Chemical compound COC(C)(C)CC(C)=O KOKPBCHLPVDQTK-UHFFFAOYSA-N 0.000 description 1
- RFHYQGJFKZEPEB-UHFFFAOYSA-N 4-nitrocyclohexan-1-one Chemical compound [O-][N+](=O)C1CCC(=O)CC1 RFHYQGJFKZEPEB-UHFFFAOYSA-N 0.000 description 1
- NYTYBIAOZLAWHZ-UHFFFAOYSA-N 4-oxo-n-propylcyclohexane-1-carboxamide Chemical compound CCCNC(=O)C1CCC(=O)CC1 NYTYBIAOZLAWHZ-UHFFFAOYSA-N 0.000 description 1
- QIWQJGMBIABGRX-UHFFFAOYSA-N 4-oxocyclohexane-1-carbonitrile Chemical compound O=C1CCC(C#N)CC1 QIWQJGMBIABGRX-UHFFFAOYSA-N 0.000 description 1
- OWLXUYGCLDGHJJ-UHFFFAOYSA-N 4-oxocyclohexanecarboxylic acid Chemical compound OC(=O)C1CCC(=O)CC1 OWLXUYGCLDGHJJ-UHFFFAOYSA-N 0.000 description 1
- DZZLGMLLNNTZKL-UHFFFAOYSA-N 4-phenoxycyclohexan-1-one Chemical compound C1CC(=O)CCC1OC1=CC=CC=C1 DZZLGMLLNNTZKL-UHFFFAOYSA-N 0.000 description 1
- 125000006043 5-hexenyl group Chemical group 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- QDYNILIIORPZQG-UHFFFAOYSA-N C(C(=C)C)(=O)O.CN(C)CCCCCl Chemical compound C(C(=C)C)(=O)O.CN(C)CCCCCl QDYNILIIORPZQG-UHFFFAOYSA-N 0.000 description 1
- 125000004648 C2-C8 alkenyl group Chemical group 0.000 description 1
- KKXTVAQORMBBJC-UHFFFAOYSA-N C=CC.COCC(=O)O Chemical compound C=CC.COCC(=O)O KKXTVAQORMBBJC-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- 102100026735 Coagulation factor VIII Human genes 0.000 description 1
- 239000004859 Copal Substances 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-UHFFFAOYSA-N Di-Et ester-Fumaric acid Natural products CCOC(=O)C=CC(=O)OCC IEPRKVQEAMIZSS-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- 239000004908 Emulsion polymer Substances 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical class OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 1
- 241000782205 Guibourtia conjugata Species 0.000 description 1
- MZNHUHNWGVUEAT-XBXARRHUSA-N Hexyl crotonate Chemical compound CCCCCCOC(=O)\C=C\C MZNHUHNWGVUEAT-XBXARRHUSA-N 0.000 description 1
- 101000911390 Homo sapiens Coagulation factor VIII Proteins 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- RFFFKMOABOFIDF-UHFFFAOYSA-N Pentanenitrile Chemical compound CCCCC#N RFFFKMOABOFIDF-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical class CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- RJFAYQIBOAGBLC-BYPYZUCNSA-N Selenium-L-methionine Chemical compound C[Se]CC[C@H](N)C(O)=O RJFAYQIBOAGBLC-BYPYZUCNSA-N 0.000 description 1
- 229920001800 Shellac Polymers 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- 229920007962 Styrene Methyl Methacrylate Polymers 0.000 description 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N Tetraethylene glycol, Natural products OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- YMOONIIMQBGTDU-VOTSOKGWSA-N [(e)-2-bromoethenyl]benzene Chemical compound Br\C=C\C1=CC=CC=C1 YMOONIIMQBGTDU-VOTSOKGWSA-N 0.000 description 1
- MZVQCMJNVPIDEA-UHFFFAOYSA-N [CH2]CN(CC)CC Chemical group [CH2]CN(CC)CC MZVQCMJNVPIDEA-UHFFFAOYSA-N 0.000 description 1
- KYIKRXIYLAGAKQ-UHFFFAOYSA-N abcn Chemical compound C1CCCCC1(C#N)N=NC1(C#N)CCCCC1 KYIKRXIYLAGAKQ-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 229920000800 acrylic rubber Polymers 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 150000001347 alkyl bromides Chemical class 0.000 description 1
- 150000001348 alkyl chlorides Chemical class 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 229940072049 amyl acetate Drugs 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 1
- 230000002421 anti-septic effect Effects 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 235000006708 antioxidants Nutrition 0.000 description 1
- 229940064004 antiseptic throat preparations Drugs 0.000 description 1
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- IPTLKMXBROVJJF-UHFFFAOYSA-N azanium;methyl sulfate Chemical compound N.COS(O)(=O)=O IPTLKMXBROVJJF-UHFFFAOYSA-N 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- AGEZXYOZHKGVCM-UHFFFAOYSA-N benzyl bromide Chemical compound BrCC1=CC=CC=C1 AGEZXYOZHKGVCM-UHFFFAOYSA-N 0.000 description 1
- ZGCZDEVLEULNLJ-UHFFFAOYSA-M benzyl-dimethyl-(2-prop-2-enoyloxyethyl)azanium;chloride Chemical compound [Cl-].C=CC(=O)OCC[N+](C)(C)CC1=CC=CC=C1 ZGCZDEVLEULNLJ-UHFFFAOYSA-M 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- LWMFAFLIWMPZSX-UHFFFAOYSA-N bis[2-(4,5-dihydro-1h-imidazol-2-yl)propan-2-yl]diazene Chemical compound N=1CCNC=1C(C)(C)N=NC(C)(C)C1=NCCN1 LWMFAFLIWMPZSX-UHFFFAOYSA-N 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- RDHPKYGYEGBMSE-UHFFFAOYSA-N bromoethane Chemical compound CCBr RDHPKYGYEGBMSE-UHFFFAOYSA-N 0.000 description 1
- MPMBRWOOISTHJV-UHFFFAOYSA-N but-1-enylbenzene Chemical compound CCC=CC1=CC=CC=C1 MPMBRWOOISTHJV-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 229910000389 calcium phosphate Inorganic materials 0.000 description 1
- 235000011010 calcium phosphates Nutrition 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 238000010538 cationic polymerization reaction Methods 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 235000010980 cellulose Nutrition 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 150000001793 charged compounds Chemical class 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 1
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000011162 core material Substances 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000000392 cycloalkenyl group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000002933 cyclohexyloxy group Chemical group C1(CCCCC1)O* 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- JBSLOWBPDRZSMB-BQYQJAHWSA-N dibutyl (e)-but-2-enedioate Chemical compound CCCCOC(=O)\C=C\C(=O)OCCCC JBSLOWBPDRZSMB-BQYQJAHWSA-N 0.000 description 1
- JBSLOWBPDRZSMB-FPLPWBNLSA-N dibutyl (z)-but-2-enedioate Chemical compound CCCCOC(=O)\C=C/C(=O)OCCCC JBSLOWBPDRZSMB-FPLPWBNLSA-N 0.000 description 1
- OGVXYCDTRMDYOG-UHFFFAOYSA-N dibutyl 2-methylidenebutanedioate Chemical compound CCCCOC(=O)CC(=C)C(=O)OCCCC OGVXYCDTRMDYOG-UHFFFAOYSA-N 0.000 description 1
- ZFTFAPZRGNKQPU-UHFFFAOYSA-N dicarbonic acid Chemical compound OC(=O)OC(O)=O ZFTFAPZRGNKQPU-UHFFFAOYSA-N 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- ZEFVHSWKYCYFFL-UHFFFAOYSA-N diethyl 2-methylidenebutanedioate Chemical compound CCOC(=O)CC(=C)C(=O)OCC ZEFVHSWKYCYFFL-UHFFFAOYSA-N 0.000 description 1
- XSBSXJAYEPDGSF-UHFFFAOYSA-N diethyl 3,5-dimethyl-1h-pyrrole-2,4-dicarboxylate Chemical compound CCOC(=O)C=1NC(C)=C(C(=O)OCC)C=1C XSBSXJAYEPDGSF-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-AATRIKPKSA-N diethyl fumarate Chemical compound CCOC(=O)\C=C\C(=O)OCC IEPRKVQEAMIZSS-AATRIKPKSA-N 0.000 description 1
- DENRZWYUOJLTMF-UHFFFAOYSA-N diethyl sulfate Chemical compound CCOS(=O)(=O)OCC DENRZWYUOJLTMF-UHFFFAOYSA-N 0.000 description 1
- 229940008406 diethyl sulfate Drugs 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 125000006202 diisopropylaminoethyl group Chemical group [H]C([H])([H])C([H])(N(C([H])([H])C([H])([H])*)C([H])(C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- ZWWQRMFIZFPUAA-UHFFFAOYSA-N dimethyl 2-methylidenebutanedioate Chemical compound COC(=O)CC(=C)C(=O)OC ZWWQRMFIZFPUAA-UHFFFAOYSA-N 0.000 description 1
- LDCRTTXIJACKKU-ONEGZZNKSA-N dimethyl fumarate Chemical compound COC(=O)\C=C\C(=O)OC LDCRTTXIJACKKU-ONEGZZNKSA-N 0.000 description 1
- 229960004419 dimethyl fumarate Drugs 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- LDCRTTXIJACKKU-ARJAWSKDSA-N dimethyl maleate Chemical compound COC(=O)\C=C/C(=O)OC LDCRTTXIJACKKU-ARJAWSKDSA-N 0.000 description 1
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- AFIQVBFAKUPHOA-UHFFFAOYSA-N ethenyl 2-methoxyacetate Chemical compound COCC(=O)OC=C AFIQVBFAKUPHOA-UHFFFAOYSA-N 0.000 description 1
- PNFYSMYGTNIRDO-UHFFFAOYSA-N ethenyl-(2,3,4-trimethylphenyl)azanium chloride Chemical compound [Cl-].CC1=C(C(=C(C=C1)[NH2+]C=C)C)C PNFYSMYGTNIRDO-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- FGSGHBPKHFDJOP-UHFFFAOYSA-N ethyl 2-oxocyclohexane-1-carboxylate Chemical compound CCOC(=O)C1CCCCC1=O FGSGHBPKHFDJOP-UHFFFAOYSA-N 0.000 description 1
- 229960003750 ethyl chloride Drugs 0.000 description 1
- 125000000031 ethylamino group Chemical group [H]C([H])([H])C([H])([H])N([H])[*] 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 239000000417 fungicide Substances 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- PBZROIMXDZTJDF-UHFFFAOYSA-N hepta-1,6-dien-4-one Chemical compound C=CCC(=O)CC=C PBZROIMXDZTJDF-UHFFFAOYSA-N 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- KETWBQOXTBGBBN-UHFFFAOYSA-N hex-1-enylbenzene Chemical compound CCCCC=CC1=CC=CC=C1 KETWBQOXTBGBBN-UHFFFAOYSA-N 0.000 description 1
- FHKSXSQHXQEMOK-UHFFFAOYSA-N hexane-1,2-diol Chemical compound CCCCC(O)CO FHKSXSQHXQEMOK-UHFFFAOYSA-N 0.000 description 1
- WJSATVJYSKVUGV-UHFFFAOYSA-N hexane-1,3,5-triol Chemical compound CC(O)CC(O)CCO WJSATVJYSKVUGV-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 150000004693 imidazolium salts Chemical class 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 150000008040 ionic compounds Chemical group 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-M isovalerate Chemical compound CC(C)CC([O-])=O GWYFCOCPABKNJV-UHFFFAOYSA-M 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 238000010551 living anionic polymerization reaction Methods 0.000 description 1
- 238000010552 living cationic polymerization reaction Methods 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000001819 mass spectrum Methods 0.000 description 1
- 238000000816 matrix-assisted laser desorption--ionisation Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 125000005641 methacryl group Chemical group 0.000 description 1
- MPHUYCIKFIKENX-UHFFFAOYSA-N methyl 2-ethenylbenzoate Chemical compound COC(=O)C1=CC=CC=C1C=C MPHUYCIKFIKENX-UHFFFAOYSA-N 0.000 description 1
- ADFPJHOAARPYLP-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;styrene Chemical compound COC(=O)C(C)=C.C=CC1=CC=CC=C1 ADFPJHOAARPYLP-UHFFFAOYSA-N 0.000 description 1
- VUQUOGPMUUJORT-UHFFFAOYSA-N methyl 4-methylbenzenesulfonate Chemical compound COS(=O)(=O)C1=CC=C(C)C=C1 VUQUOGPMUUJORT-UHFFFAOYSA-N 0.000 description 1
- CZXGXYBOQYQXQD-UHFFFAOYSA-N methyl benzenesulfonate Chemical compound COS(=O)(=O)C1=CC=CC=C1 CZXGXYBOQYQXQD-UHFFFAOYSA-N 0.000 description 1
- 229940102396 methyl bromide Drugs 0.000 description 1
- MQWCXKGKQLNYQG-UHFFFAOYSA-N methyl cyclohexan-4-ol Natural products CC1CCC(O)CC1 MQWCXKGKQLNYQG-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- LTCVQHQEKMEDLI-UHFFFAOYSA-N methyl-morpholin-4-yl-(2-prop-2-enoyloxyethyl)azanium chloride Chemical compound [Cl-].C(C=C)(=O)OCC[NH+](N1CCOCC1)C LTCVQHQEKMEDLI-UHFFFAOYSA-N 0.000 description 1
- 125000000250 methylamino group Chemical group [H]N(*)C([H])([H])[H] 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 150000005673 monoalkenes Chemical class 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- SDYRIBONPHEWCT-UHFFFAOYSA-N n,n-dimethyl-2-phenylethenamine Chemical compound CN(C)C=CC1=CC=CC=C1 SDYRIBONPHEWCT-UHFFFAOYSA-N 0.000 description 1
- SYUYXOYNRMMOGW-UHFFFAOYSA-N n,n-dimethyl-3-phenylprop-2-en-1-amine Chemical compound CN(C)CC=CC1=CC=CC=C1 SYUYXOYNRMMOGW-UHFFFAOYSA-N 0.000 description 1
- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 1
- QYZFTMMPKCOTAN-UHFFFAOYSA-N n-[2-(2-hydroxyethylamino)ethyl]-2-[[1-[2-(2-hydroxyethylamino)ethylamino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCNCCO QYZFTMMPKCOTAN-UHFFFAOYSA-N 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- 125000002004 n-butylamino group Chemical group [H]N(*)C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- WGESLFUSXZBFQF-UHFFFAOYSA-N n-methyl-n-prop-2-enylprop-2-en-1-amine Chemical compound C=CCN(C)CC=C WGESLFUSXZBFQF-UHFFFAOYSA-N 0.000 description 1
- 125000006608 n-octyloxy group Chemical group 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- DYUWTXWIYMHBQS-UHFFFAOYSA-N n-prop-2-enylprop-2-en-1-amine Chemical compound C=CCNCC=C DYUWTXWIYMHBQS-UHFFFAOYSA-N 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- SNMVRZFUUCLYTO-UHFFFAOYSA-N n-propyl chloride Chemical compound CCCCl SNMVRZFUUCLYTO-UHFFFAOYSA-N 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- 125000005184 naphthylamino group Chemical group C1(=CC=CC2=CC=CC=C12)N* 0.000 description 1
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 1
- 239000000025 natural resin Substances 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- HILCQVNWWOARMT-UHFFFAOYSA-N non-1-en-3-one Chemical compound CCCCCCC(=O)C=C HILCQVNWWOARMT-UHFFFAOYSA-N 0.000 description 1
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 1
- KPMKEVXVVHNIEY-UHFFFAOYSA-N norcamphor Chemical compound C1CC2C(=O)CC1C2 KPMKEVXVVHNIEY-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 229920002113 octoxynol Polymers 0.000 description 1
- 229940065472 octyl acrylate Drugs 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical class C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 description 1
- 125000000538 pentafluorophenyl group Chemical group FC1=C(F)C(F)=C(*)C(F)=C1F 0.000 description 1
- 125000005327 perimidinyl group Chemical group N1C(=NC2=CC=CC3=CC=CC1=C23)* 0.000 description 1
- 125000001792 phenanthrenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C=CC12)* 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- 125000004344 phenylpropyl group Chemical group 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002285 poly(styrene-co-acrylonitrile) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001610 polycaprolactone Polymers 0.000 description 1
- 239000004632 polycaprolactone Substances 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- HXHCOXPZCUFAJI-UHFFFAOYSA-N prop-2-enoic acid;styrene Chemical compound OC(=O)C=C.C=CC1=CC=CC=C1 HXHCOXPZCUFAJI-UHFFFAOYSA-N 0.000 description 1
- BWJUFXUULUEGMA-UHFFFAOYSA-N propan-2-yl propan-2-yloxycarbonyloxy carbonate Chemical compound CC(C)OC(=O)OOC(=O)OC(C)C BWJUFXUULUEGMA-UHFFFAOYSA-N 0.000 description 1
- KOPQZJAYZFAPBC-UHFFFAOYSA-N propanoyl propaneperoxoate Chemical compound CCC(=O)OOC(=O)CC KOPQZJAYZFAPBC-UHFFFAOYSA-N 0.000 description 1
- YPVDWEHVCUBACK-UHFFFAOYSA-N propoxycarbonyloxy propyl carbonate Chemical compound CCCOC(=O)OOC(=O)OCCC YPVDWEHVCUBACK-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229960004063 propylene glycol Drugs 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 125000004309 pyranyl group Chemical group O1C(C=CC=C1)* 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 150000003856 quaternary ammonium compounds Chemical class 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000004208 shellac Substances 0.000 description 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
- 229940113147 shellac Drugs 0.000 description 1
- 235000013874 shellac Nutrition 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- ISUXBNXLVOPNBA-UHFFFAOYSA-N spiro[5.5]undecan-5-one Chemical compound O=C1CCCCC11CCCCC1 ISUXBNXLVOPNBA-UHFFFAOYSA-N 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000005017 substituted alkenyl group Chemical group 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical compound [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- NMOALOSNPWTWRH-UHFFFAOYSA-N tert-butyl 7,7-dimethyloctaneperoxoate Chemical compound CC(C)(C)CCCCCC(=O)OOC(C)(C)C NMOALOSNPWTWRH-UHFFFAOYSA-N 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- NCDYOSPPJZENCU-UHFFFAOYSA-M triethyl(2-prop-2-enoyloxyethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CCOC(=O)C=C NCDYOSPPJZENCU-UHFFFAOYSA-M 0.000 description 1
- RJNGNWBDDLDAAP-UHFFFAOYSA-N triethyl-[2-(prop-2-enoylamino)ethyl]azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CCNC(=O)C=C RJNGNWBDDLDAAP-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- FZGFBJMPSHGTRQ-UHFFFAOYSA-M trimethyl(2-prop-2-enoyloxyethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CCOC(=O)C=C FZGFBJMPSHGTRQ-UHFFFAOYSA-M 0.000 description 1
- OEIXGLMQZVLOQX-UHFFFAOYSA-N trimethyl-[3-(prop-2-enoylamino)propyl]azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CCCNC(=O)C=C OEIXGLMQZVLOQX-UHFFFAOYSA-N 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 238000000108 ultra-filtration Methods 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- FUSUHKVFWTUUBE-UHFFFAOYSA-N vinyl methyl ketone Natural products CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Abstract
Description
本発明は、特定の造塩化合物、及びその造塩化合物が含まれることを特徴とする画像形成材料に関するものである。 The present invention relates to a specific salt-forming compound and an image forming material containing the salt-forming compound.
近年、通常の視覚条件では視認性がない不可視的な情報を文書等や、株券、債券、小切手、商品券、宝くじ、定期券等の証券類に記録し、その情報を光学的に読み取る技術が注目されている。こうした技術は、セキュリティー管理等において非常に有用であり、文書等の付加価値の向上や、証券等の偽造防止措置の強化に効果的である。 In recent years, there has been a technology for recording invisible information that is not visible under normal visual conditions on documents, stock certificates, bonds, checks, gift certificates, lottery tickets, commuter passes, and optically reading the information. Attention has been paid. Such a technique is very useful in security management and the like, and is effective in improving the added value of documents and the like and strengthening measures for preventing forgery of securities and the like.
不可視性情報の記録としては、人間の目では視認できない750nm以上1000nm以下の近赤外線領域に吸収を有する色素を用いた画像形成材料を使用する方法がある。これらの不可視性情報は、人間の目では視認できなくても、シリコンによる受光素子(CCD、CMOS等)等で検出することが可能である。 As a method for recording invisible information, there is a method of using an image forming material using a dye having absorption in the near infrared region of 750 nm to 1000 nm that cannot be visually recognized by human eyes. Such invisibility information can be detected by a light receiving element (CCD, CMOS, etc.) made of silicon, etc. even if it cannot be visually recognized by human eyes.
750nm以上1000nm以下の近赤外領域に吸収を有する代表的な色素としては、フタロシアニン系色素、シアニン系色素、ジイモニウム系色素、スクアリリウム色素、クロコニウム色素などが知られている。 As typical dyes having absorption in the near infrared region of 750 nm or more and 1000 nm or less, phthalocyanine dyes, cyanine dyes, diimonium dyes, squarylium dyes, croconium dyes and the like are known.
フタロシアニン系色素として、アミノ基を有するフタロシアニン化合物(例えば、特許文献1参照)、アリールオキシ基を有するフタロシアニン化合物(例えば、特許文献2参照)、含フッ素フタロシアニン化合物(例えば、特許文献3参照)等が知られている。しかし、可視光領域(400nm〜750nm)にフタロシアニン特有の吸収帯が存在するため、可視域の透明性が不十分である。また、耐熱性や耐光性も、必ずしも満足できるものではない。 Examples of phthalocyanine dyes include phthalocyanine compounds having an amino group (for example, see Patent Document 1), phthalocyanine compounds having an aryloxy group (for example, see Patent Document 2), fluorine-containing phthalocyanine compounds (for example, see Patent Document 3), and the like. Are known. However, since there is an absorption band peculiar to phthalocyanine in the visible light region (400 nm to 750 nm), the transparency in the visible region is insufficient. Also, heat resistance and light resistance are not always satisfactory.
一方、シアニン系色素、ジイモニウム系色素、スクアリリウム色素、クロコニウム色素などは、近赤外線吸収能に優れ、かつ可視域の透明性も比較的良好な材料であり、種々のものが知られている(例えば、特許文献4〜8参照)。さらに、これら色素は、高い溶解性、樹脂相溶性をも有している。しかしながら、色素としての安定性が著しく低く、耐熱性や耐光性を満足できていない。 On the other hand, cyanine dyes, diimonium dyes, squarylium dyes, croconium dyes, and the like are materials having excellent near-infrared absorption ability and relatively good transparency in the visible region, and various types are known (for example, And Patent Documents 4 to 8). Furthermore, these dyes also have high solubility and resin compatibility. However, the stability as a pigment is extremely low, and the heat resistance and light resistance are not satisfied.
また、スクアリリウム色素の中でもペリミジン系骨格を有する色素が知られており、特に耐光性に優れている(例えば、特許文献9参照)。しかしながら、凝集しやすい構造であるため、分散性、粘度、経時保存安定性などに課題があり、実用のための性能を満足できていない。 Among squarylium dyes, dyes having a perimidine skeleton are known, and are particularly excellent in light resistance (see, for example, Patent Document 9). However, since the structure tends to aggregate, there are problems in dispersibility, viscosity, storage stability with time, etc., and performance for practical use cannot be satisfied.
本発明が解決しようとする課題は、高い不可視性を有する、すなわち可視域(400nm〜750nm)に吸収が少なく、近赤外線吸収能に優れ、高耐光性であり、且つ凝集しにくい造塩化合物、並びに、前記特徴を有する造塩化合物を含む画像形成材料を提供することである。 The problem to be solved by the present invention is a salt-forming compound having high invisibility, that is, low absorption in the visible region (400 nm to 750 nm), excellent near infrared absorption ability, high light resistance, and hardly agglomerating, The present invention also provides an image forming material containing a salt-forming compound having the above-mentioned characteristics.
本発明者らは、前記諸問題を解決するために鋭意研究を重ねた結果、本発明に至った。
すなわち本発明は、下記一般式で表されるスクアリリウム[A]と側鎖にカチオン性基を有する樹脂[B]との造塩化合物に関する。
As a result of intensive studies to solve the above problems, the present inventors have reached the present invention.
That is, the present invention relates to a salt-forming compound of squarylium [A] represented by the following general formula and a resin [B] having a cationic group in the side chain.
一般式(1)
一般式(1)中、X1〜X10は、それぞれ独立に、水素原子、置換基を有してもよいアルキル基、置換基を有してもよいアルケニル基、置換基を有してもよいアリール基、置換基を有してもよいアラルキル基、置換基を有してもよいアルコキシ基、置換基を有してもよいアリールオキシ基、アミノ基、置換アミノ基、−SO2NR1R2、−COOR3、−CONR4R5、ニトロ基、シアノ基又はハロゲン原子を表し、隣接した基同士が環を形成しても良い。R1〜R5は、それぞれ独立に、水素原子又は置換基を有してもよいアルキル基を表す。nは、1〜4の整数を表す。Z+は、水素イオン又は無機若しくは有機のカチオンを表す。 In General Formula (1), X 1 to X 10 may each independently have a hydrogen atom, an alkyl group that may have a substituent, an alkenyl group that may have a substituent, or a substituent. A good aryl group, an aralkyl group which may have a substituent, an alkoxy group which may have a substituent, an aryloxy group which may have a substituent, an amino group, a substituted amino group, —SO 2 NR 1 R 2 , —COOR 3 , —CONR 4 R 5 , a nitro group, a cyano group, or a halogen atom may be represented, and adjacent groups may form a ring. R 1 to R 5 each independently represents a hydrogen atom or an alkyl group which may have a substituent. n represents an integer of 1 to 4. Z + represents a hydrogen ion or an inorganic or organic cation.
また、側鎖にカチオン性基を有する樹脂[B]が、下記一般式(2)で表される構造単位を含むビニル系樹脂である前記造塩化合物に関する。 Moreover, it is related with the said salt-forming compound whose resin [B] which has a cationic group in a side chain is a vinyl resin containing the structural unit represented by following General formula (2).
一般式(2)
一般式(2)中、R6は、水素原子又は置換基を有してもよいアルキル基を表す。R7〜R9は、それぞれ独立に、水素原子、置換基を有してもよいアルキル基、置換基を有してもよいアルケニル基又は置換基を有してもよいアリール基を表し、R7〜R9のうち2つが互いに結合して環を形成しても良い。Qは、アルキレン基、アリーレン基、−CONH−R10−又は−COO−R11−を表し、R10及びR11は、アルキレン基を表す。Y−は、無機又は有機のアニオンを表す。 In general formula (2), R 6 represents a hydrogen atom or an alkyl group which may have a substituent. R 7 to R 9 each independently represent a hydrogen atom, an alkyl group that may have a substituent, an alkenyl group that may have a substituent, or an aryl group that may have a substituent; Two of 7 to R 9 may be bonded to each other to form a ring. Q represents an alkylene group, an arylene group, —CONH—R 10 — or —COO—R 11 —, and R 10 and R 11 represent an alkylene group. Y − represents an inorganic or organic anion.
また、前記造塩化合物を含有する画像形成材料に関する。 The present invention also relates to an image forming material containing the salt-forming compound.
さらに、本発明は、電子写真用トナー、インクジェットプリンター用インク、又は活版、オフセット、フレキソ、グラビア若しくはシルク印刷用のインクである前記画像形成材料に関する。 Furthermore, the present invention relates to the image forming material which is an electrophotographic toner, an ink for an ink jet printer, or an ink for letterpress, offset, flexo, gravure or silk printing.
本発明により、分光特性、耐光性に優れ、且つ凝集しにくい、すなわち易分散であり、保存安定性に優れた造塩化合物、及び画像形成材料を提供することができる。 According to the present invention, it is possible to provide a salt-forming compound and an image forming material which are excellent in spectral characteristics and light resistance and hardly aggregate, that is, are easily dispersed and excellent in storage stability.
<スクアリリウム[A]>
本発明の一般式(1)で示されるスクアリリウム[A]について詳しく説明する。
<Squarylium [A]>
The squarylium [A] represented by the general formula (1) of the present invention will be described in detail.
一般式(1)
一般式(1)中、X1〜X10は、それぞれ独立に、水素原子、置換基を有してもよいアルキル基、置換基を有してもよいアルケニル基、置換基を有してもよいアリール基、置換基を有してもよいアラルキル基、置換基を有してもよいアルコキシ基、置換基を有してもよいアリールオキシ基、アミノ基、置換アミノ基、−SO2NR1R2、−COOR3、−CONR4R5、ニトロ基、シアノ基又はハロゲン原子を表し、隣接した基同士が環を形成しても良い。R1〜R5は、それぞれ独立に、水素原子又は置換基を有してもよいアルキル基を表す。nは、1〜4の整数を表す。Z+は、水素イオン又は無機若しくは有機のカチオンを表す。 In General Formula (1), X 1 to X 10 may each independently have a hydrogen atom, an alkyl group that may have a substituent, an alkenyl group that may have a substituent, or a substituent. A good aryl group, an aralkyl group which may have a substituent, an alkoxy group which may have a substituent, an aryloxy group which may have a substituent, an amino group, a substituted amino group, —SO 2 NR 1 R 2 , —COOR 3 , —CONR 4 R 5 , a nitro group, a cyano group, or a halogen atom may be represented, and adjacent groups may form a ring. R 1 to R 5 each independently represents a hydrogen atom or an alkyl group which may have a substituent. n represents an integer of 1 to 4. Z + represents a hydrogen ion or an inorganic or organic cation.
X1〜X10において「置換基を有してもよいアルキル基」としては、メチル基、エチル基、n−プロピル基、イソプロピル基、tert−ブチル基、tert−アミル基、2−エチルヘキシル基、ステアリル基、クロロメチル基、トリクロロメチル基、トリフルオロメチル基、2−メトキシエチル基、2−クロロエチル基、2−ニトロエチル基、シクロペンチル基、シクロヘキシル基、ジメチルシクロヘキシル基等を挙げることができ、これらの中でもメチル基、エチル基、n−プロピル基が、耐久性付与および合成難易度の観点で好ましく、特にメチル基が好ましい。 Examples of the “alkyl group which may have a substituent” in X 1 to X 10 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, a tert-butyl group, a tert-amyl group, a 2-ethylhexyl group, Stearyl group, chloromethyl group, trichloromethyl group, trifluoromethyl group, 2-methoxyethyl group, 2-chloroethyl group, 2-nitroethyl group, cyclopentyl group, cyclohexyl group, dimethylcyclohexyl group, etc. Among them, a methyl group, an ethyl group, and an n-propyl group are preferable from the viewpoint of imparting durability and difficulty in synthesis, and a methyl group is particularly preferable.
X1〜X10において「置換基を有してもよいアルケニル基」としては、ビニル基、1−プロペニル基、アリル基、2−ブテニル基、3−ブテニル基、イソプロペニル基、イソブテニル基、1−ペンテニル基、2−ペンテニル基、3−ペンテニル基、4−ペンテニル基、1−ヘキセニル基、2−ヘキセニル基、3−ヘキセニル基、4−ヘキセニル基、5−ヘキセニル基等を挙げることができ、これらの中でもビニル基、アリル基が、耐久性付与および合成難易度の観点で好ましい。 As the “alkenyl group which may have a substituent” in X 1 to X 10 , a vinyl group, 1-propenyl group, allyl group, 2-butenyl group, 3-butenyl group, isopropenyl group, isobutenyl group, 1 -Pentenyl group, 2-pentenyl group, 3-pentenyl group, 4-pentenyl group, 1-hexenyl group, 2-hexenyl group, 3-hexenyl group, 4-hexenyl group, 5-hexenyl group, etc. Among these, a vinyl group and an allyl group are preferable from the viewpoint of imparting durability and difficulty in synthesis.
X1〜X10において「置換基を有してもよいアリール基」としては、フェニル基、ナフチル基、4−メチルフェニル基、3,5−ジメチルフェニル基、ペンタフルオロフェニル基、4−ブロモフェニル基、2−メトキシフェニル基、4−ジエチルアミノフェニル基、3−ニトロフェニル基、4−シアノフェニル基等を挙げることができ、これらの中でもフェニル基、4−メチルフェニル基が、耐久性付与および合成難易度の観点で好ましい。 In X 1 to X 10 , as the “aryl group optionally having substituent (s)”, phenyl group, naphthyl group, 4-methylphenyl group, 3,5-dimethylphenyl group, pentafluorophenyl group, 4-bromophenyl Group, 2-methoxyphenyl group, 4-diethylaminophenyl group, 3-nitrophenyl group, 4-cyanophenyl group and the like, among which phenyl group and 4-methylphenyl group are used for durability and synthesis. It is preferable from the viewpoint of difficulty.
X1〜X10において「置換基を有してもよいアラルキル基」としては、ベンジル基、フェネチル基、フェニルプロピル基、ナフチルメチル基等を挙げることができ、これらの中でもベンジル基が、耐久性付与および合成難易度の観点で好ましい。 Examples of the “aralkyl group which may have a substituent” in X 1 to X 10 include a benzyl group, a phenethyl group, a phenylpropyl group, a naphthylmethyl group and the like. Among these, a benzyl group is a durable group. It is preferable from the viewpoint of imparting and synthesis difficulty.
X1〜X10において「置換基を有してもアルコキシ基」としては、メトキシ基、エトキシ基、n−プロポキシ基、イソプロポキシ基、n−ブトキシ基、n−オクチルオキシ基、2−エチルヘキシルオキシ基、トリフルオロメトキシ基、シクロヘキシルオキシ基、ステアリルオキシ基等を挙げることができ、これらの中でもメトキシ基、エトキシ基、トリフルオロメトキシ基が、耐久性付与および合成難易度の観点で好ましい。 In X 1 to X 10 , the “alkoxy group having a substituent” includes a methoxy group, an ethoxy group, an n-propoxy group, an isopropoxy group, an n-butoxy group, an n-octyloxy group, and 2-ethylhexyloxy. Group, trifluoromethoxy group, cyclohexyloxy group, stearyloxy group and the like. Among these, a methoxy group, an ethoxy group, and a trifluoromethoxy group are preferable from the viewpoint of imparting durability and difficulty in synthesis.
X1〜X10において「置換基を有してもよいアリールオキシ基」としては、フェノキシ基、ナフチルオキシ基、4−メチルフェニルオキシ基、3,5−クロロフェニルオキシ基、4−クロロ−2−メチルフェニルオキシ基、4−tert− ブチルフェニルオキシ基、4−メトキシフェニルオキシ基、4−ジエチルアミノフェニルオキシ基、4−ニトロフェニルオキシ基等を挙げることができ、これらの中でもフェノキシ基、ナフチルオキシ基が、耐久性付与および合成難易度の観点で好ましい。 As the “aryloxy group which may have a substituent” in X 1 to X 10 , phenoxy group, naphthyloxy group, 4-methylphenyloxy group, 3,5-chlorophenyloxy group, 4-chloro-2- Examples thereof include methylphenyloxy group, 4-tert-butylphenyloxy group, 4-methoxyphenyloxy group, 4-diethylaminophenyloxy group, 4-nitrophenyloxy group, and among these, phenoxy group, naphthyloxy group Is preferable from the viewpoint of imparting durability and difficulty in synthesis.
X1〜X10において「置換アミノ基」としては、メチルアミノ基、エチルアミノ基、イソプロピルアミノ基、n−ブチルアミノ基、シクロヘキシルアミノ基、ステアリルアミノ基、ジメチルアミノ基、ジエチルアミノ基、ジブチルアミノ基、N,N−ジ(2−ヒドロキシエチル)アミノ基、フェニルアミノ基、ナフチルアミノ基、4−tert−ブチルフェニルアミノ基、ジフェニルアミノ基、N−フェニル−N−エチルアミノ基等を挙げることができ、これらの中でもジメチルアミノ基、ジエチルアミノ基が、耐久性付与および合成難易度の観点で好ましい。 As the “substituted amino group” in X 1 to X 10 , the methylamino group, ethylamino group, isopropylamino group, n-butylamino group, cyclohexylamino group, stearylamino group, dimethylamino group, diethylamino group, dibutylamino group N, N-di (2-hydroxyethyl) amino group, phenylamino group, naphthylamino group, 4-tert-butylphenylamino group, diphenylamino group, N-phenyl-N-ethylamino group, and the like. Among these, a dimethylamino group and a diethylamino group are preferable from the viewpoint of imparting durability and difficulty in synthesis.
X1〜X10において「ハロゲン原子」としては、フッ素、臭素、塩素、ヨウ素が挙げられる。 Examples of the “halogen atom” in X 1 to X 10 include fluorine, bromine, chlorine, and iodine.
X1〜X10は、隣接した基同士が環を形成してもよく、例として以下の構造が挙げられるが、これらに限定されるものではない。 In X 1 to X 10 , adjacent groups may form a ring, and examples thereof include the following structures, but are not limited thereto.
R1〜R5において「置換基を有してもよいアルキル基」としては、X1〜X10と同様の意義である。 In R 1 to R 5 , the “alkyl group optionally having substituent (s)” has the same meaning as X 1 to X 10 .
X1〜X10は、無置換のアルキル基を含むことが好ましく、X3、X4、X7およびX8の少なくとも一つが無置換のアルキル基であることがより好ましく、X3およびX7が無置換のアルキル基であることが特に好ましい。無置換のアルキル基としてはメチル基であることが好ましい。 X 1 to X 10 preferably contain an unsubstituted alkyl group, more preferably at least one of X 3 , X 4 , X 7 and X 8 is an unsubstituted alkyl group, and X 3 and X 7 Is particularly preferably an unsubstituted alkyl group. The unsubstituted alkyl group is preferably a methyl group.
Z+の「無機若しくは有機のカチオン」としては、公知のものが制限なく採用でき、具体的には、金属原子、アンモニウム化合物、ピリジニウム化合物、イミダゾリウム化合物、ホスホニウム化合物、スルホニウム化合物等を挙げることができる。Z+としては、水素原子、金属原子、アンモニウム化合物が、合成難易度の観点で好ましい。 As the “inorganic or organic cation” of Z + , known ones can be used without limitation, and specific examples include metal atoms, ammonium compounds, pyridinium compounds, imidazolium compounds, phosphonium compounds, sulfonium compounds and the like. it can. As Z + , a hydrogen atom, a metal atom, or an ammonium compound is preferable from the viewpoint of synthesis difficulty.
一般式(1)におけるnは、耐光性の観点から1または2であることが好ましく、中でもn=2であることが、合成難易度の観点から特に好ましい。 N in the general formula (1) is preferably 1 or 2 from the viewpoint of light resistance, and n = 2 is particularly preferable from the viewpoint of difficulty in synthesis.
<スクアリリウム[A]の製造方法>
スクアリリウム[A]の製造方法としては、下記の方法が考えられるが、本発明に使用されるスクアリリウム[A]はこの下記製造方法によって限定されるものではない。下記式(3)に示した1,8−ジアミノナフタレンと、下記一般式(4)に示したシクロヘキサノン類とを、触媒とともに溶媒中で加熱還流して縮合させた後、下記式(5)に示した3,4−ジヒドロキシ−3−シクロブテン−1,2−ジオンを加えてさらに加熱還流させて縮合し、一般式(6)で示されるスクアリリウム[A]前駆体を得ることができる。更に、このスクアリリウム[A]前駆体を適切な濃度の硫酸中でスルホン化することで、一般式(7)で示されるスクアリリウム[A](Z+=水素イオン)を得ることができる。この一般式(7)で示されるスクアリリウム[A](Z+=水素イオン)を任意のイオン性化合物と塩交換反応させることで、Z+を任意の無機若しくは有機のカチオンへと変換することができる。
<Method for producing squarylium [A]>
Although the following method can be considered as a manufacturing method of squarylium [A], squarylium [A] used for this invention is not limited by this following manufacturing method. The 1,8-diaminonaphthalene represented by the following formula (3) and the cyclohexanone represented by the following general formula (4) were condensed with heating in a solvent together with a catalyst, and then the following formula (5) was obtained. The indicated 3,4-dihydroxy-3-cyclobutene-1,2-dione is added and further heated to reflux for condensation to obtain a squarylium [A] precursor represented by the general formula (6). Furthermore, squarylium [A] (Z + = hydrogen ion) represented by the general formula (7) can be obtained by sulfonating the squarylium [A] precursor in an appropriate concentration of sulfuric acid. The general formula (7) squarylium indicated [A] (Z + = hydrogen ion) to be to any ionic compound and salt exchange reaction, to convert Z + to any inorganic or organic cation it can.
<側鎖にカチオン性基を有する樹脂[B]>
本発明の一般式(2)で示される側鎖にカチオン性基を有する樹脂[B]について詳しく説明する。
<Resin having cationic group in side chain [B]>
The resin [B] having a cationic group in the side chain represented by the general formula (2) of the present invention will be described in detail.
一般式(2)
一般式(2)中、R6は、水素原子又は置換基を有してもよいアルキル基を表す。R7〜R9は、それぞれ独立に、水素原子、置換基を有してもよいアルキル基、置換基を有してもよいアルケニル基又は置換基を有してもよいアリール基を表し、R7〜R9のうち2つが互いに結合して環を形成しても良い。Qは、アルキレン基、アリーレン基、−CONH−R10−又は−COO−R11−を表し、R10及びR11は、アルキレン基を表す。Y−は、無機又は有機のアニオンを表す。 In general formula (2), R 6 represents a hydrogen atom or an alkyl group which may have a substituent. R 7 to R 9 each independently represent a hydrogen atom, an alkyl group that may have a substituent, an alkenyl group that may have a substituent, or an aryl group that may have a substituent; Two of 7 to R 9 may be bonded to each other to form a ring. Q represents an alkylene group, an arylene group, —CONH—R 10 — or —COO—R 11 —, and R 10 and R 11 represent an alkylene group. Y − represents an inorganic or organic anion.
R6において「置換基を有してもよいアルキル基」としては、メチル基、エチル基、プロピル基、n−ブチル基、i−ブチル基、t−ブチル基、n−ヘキシル基、シクロヘキシル基が挙げられる。該アルキル基としては、炭素数1〜12のアルキル基が好ましく、炭素数1〜8のアルキル基がより好ましく、炭素数1〜4のアルキル基が特に好ましい。 Examples of the “alkyl group which may have a substituent” in R 6 include a methyl group, an ethyl group, a propyl group, an n-butyl group, an i-butyl group, a t-butyl group, an n-hexyl group, and a cyclohexyl group. Can be mentioned. As this alkyl group, a C1-C12 alkyl group is preferable, a C1-C8 alkyl group is more preferable, and a C1-C4 alkyl group is especially preferable.
R6で表されるアルキル基が置換基を有する場合、該置換基としては、例えば、水酸基、
アルコキシル基等が挙げられる。
When the alkyl group represented by R 6 has a substituent, examples of the substituent include a hydroxyl group,
An alkoxyl group etc. are mentioned.
上記の中でも、R6としては、水素原子またはメチル基が最も好ましい。 Among the above, R 6 is most preferably a hydrogen atom or a methyl group.
R7〜R9において「置換基を有してもよいアルキル基」としては、直鎖アルキル基(メチル、エチル、n−プロピル、n−ブチル、n−ペンチル、n−オクチル、n−デシル、n−ドデシル、n−テトラデシル、n−ヘキサデシル及びn−オクタデシル等)、分岐アルキル基(イソプロピル、イソブチル、sec−ブチル、tert−ブチル、イソペンチル、ネオペンチル、tert−ペンチル、イソヘキシル、2−エチルヘキシル及び1,1,3,3−テトラメチルブチル等)、シクロアルキル基(シクロプロピル、シクロブチル、シクロペンチル及びシクロヘキシル等)及び架橋環式アルキル基(ノルボルニル、アダマンチル及びピナニル等)が挙げられる。該アルキル基としては、炭素数1〜18のアルキル基が好ましく、さらに好ましくは炭素数1〜8のアルキル基である。 As the “alkyl group optionally having substituent (s)” in R 7 to R 9 , a linear alkyl group (methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-octyl, n-decyl, n-dodecyl, n-tetradecyl, n-hexadecyl, n-octadecyl, etc.), branched alkyl groups (isopropyl, isobutyl, sec-butyl, tert-butyl, isopentyl, neopentyl, tert-pentyl, isohexyl, 2-ethylhexyl and 1, 1,3,3-tetramethylbutyl, etc.), cycloalkyl groups (cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, etc.) and bridged cyclic alkyl groups (norbornyl, adamantyl, pinanyl, etc.). As this alkyl group, a C1-C18 alkyl group is preferable, More preferably, it is a C1-C8 alkyl group.
R7〜R9において「置換基を有してもよいアルケニル基」としては、直鎖又は分岐のアルケニル基(ビニル、アリル、1−プロペニル、2−プロペニル、1−ブテニル、2−ブテニル、3−ブテニル、1−メチル−1−プロペニル、1−メチル−2−プロペニル、2−メチル−1−プロペニル及び2−メチル−2−プロぺニル等)、シクロアルケニル基(2−シクロヘキセニル及び3−シクロヘキセニル等)が挙げられる。該アルケニル基としては、炭素数2〜18のアルケニル基が好ましく、さらに好ましくは炭素数2〜8のアルケニル基である。 In R 7 to R 9 , the “optionally substituted alkenyl group” may be a linear or branched alkenyl group (vinyl, allyl, 1-propenyl, 2-propenyl, 1-butenyl, 2-butenyl, 3 -Butenyl, 1-methyl-1-propenyl, 1-methyl-2-propenyl, 2-methyl-1-propenyl, 2-methyl-2-propenyl, etc.), cycloalkenyl groups (2-cyclohexenyl and 3- Cyclohexenyl etc.). As this alkenyl group, a C2-C18 alkenyl group is preferable, More preferably, it is a C2-C8 alkenyl group.
R7〜R9において「置換基を有してもよいアリール基」としては、単環式アリール基(フェニル等)、縮合多環式アリール基(ナフチル、アントラセニル、フェナンスレニル、アン トラキノリル、フルオレニル及びナフトキノリル等)及び芳香族複素環炭化水素基(チエニル(チオフェンから誘導される基)、フリル(フランから誘導される基)、ピラニル(ピ ランから誘導される基)、ピリジル(ピリジンから誘導される基)、9−オキソキサンテニ ル(キサントンから誘導される基)及び9−オキソチオキサンテニル(チオキサントンから誘導される基)等)が挙げられる。 In R 7 to R 9 , the “aryl group which may have a substituent” includes a monocyclic aryl group (such as phenyl), a condensed polycyclic aryl group (naphthyl, anthracenyl, phenanthrenyl, anthraquinolyl, fluorenyl and naphthoquinolyl). Etc.) and aromatic heterocyclic hydrocarbon groups (thienyl (group derived from thiophene)), furyl (group derived from furan), pyranyl (group derived from pyran), pyridyl (group derived from pyridine) ), 9-oxoxanthenyl (a group derived from xanthone), 9-oxothioxanthenyl (a group derived from thioxanthone), and the like.
R7〜R9で表されるアルキル基、アルケニル基及びアリール基が置換基を有する場合、該置換基としては、例えば、ハロゲン原子、水酸基、アルコキシル基、アリールオキシ基、アルケニル基、アシル基、アルコキシカルボニル基、カルボキシル基、及びフェニル基等から選択される置換基が挙げられる。該置換基としては、中でも、ハロゲン原子、水酸基、アルコキシル基、フェニル基が特に好ましい。 When the alkyl group, alkenyl group and aryl group represented by R 7 to R 9 have a substituent, examples of the substituent include a halogen atom, a hydroxyl group, an alkoxyl group, an aryloxy group, an alkenyl group, an acyl group, Examples include a substituent selected from an alkoxycarbonyl group, a carboxyl group, a phenyl group, and the like. Among these substituents, a halogen atom, a hydroxyl group, an alkoxyl group, and a phenyl group are particularly preferable.
R7〜R9としては、安定性の観点から置換基を有してもよいアルキル基が好ましく、無置換のアルキル基が更に好ましい。 As R < 7 > -R < 9 >, the alkyl group which may have a substituent from a stability viewpoint is preferable, and an unsubstituted alkyl group is still more preferable.
また、R7〜R9のうち2つが互いに結合して環を形成しても良い。 Two of R 7 to R 9 may be bonded to each other to form a ring.
一般式(2)中、アクリル部位とアンモニウム塩基を連結するQの成分はアルキレン基、アリーレン基、−CONH−R10−、−COO−R11−を表し、R10及びR11はアルキレン基を表すが、中でも、重合性、入手性の理由から、−CONH−R10−、−COO−R11−であることが好ましい。また、R10及びR11おいて「アルキレン基」としては、メチレン基、エチレン基、プロピレン基、ブチレン基が挙げることができ、これらの中でもエチレン基であることが特に好ましい。 In the general formula (2), components of the Q connecting the acrylic sites and ammonium base is an alkylene group, an arylene group, -CONH-R 10 -, - COO-R 11 - represents, R 10 and R 11 represents an alkylene group Among them, -CONH-R 10 -and -COO-R 11 -are preferable because of polymerizability and availability. Examples of the “alkylene group” in R 10 and R 11 include a methylene group, an ethylene group, a propylene group, and a butylene group, and among these, an ethylene group is particularly preferable.
当該樹脂[B]の対アニオンを構成する一般式(2)中におけるY-の成分は、無機又は有機のアニオンであればよい。対アニオンとしては、公知のものが制限なく採用でき、具体的には、水酸化物イオン;塩化物イオン、臭化物イオン、ヨウ化物イオン等のハロゲンイオン;ギ酸イオン、酢酸イオン等のカルボン酸イオン;炭酸イオン、重炭酸イオン、硝酸イオン、硫酸イオン、亜硫酸イオン、クロム酸イオン、ニクロム酸イオン、リン酸イオン、シアン化物イオン、過マンガン酸イオン、さらには、ヘキサシアノ鉄(III)酸イオンのような錯体イオン等が挙げられる。合成適性や安定性の点からは、ハロゲンイオン及びカルボン酸イオンが好ましく、ハロゲンイオンが最も好ましい。対アニオンがカルボン酸イオン等の有機酸イオンである場合は、樹脂中に有機酸イオンが共有結合し、分子内塩を形成していてもよい。 The component of Y − in the general formula (2) constituting the counter anion of the resin [B] may be an inorganic or organic anion. As the counter anion, known ones can be used without limitation. Specifically, hydroxide ions; halogen ions such as chloride ions, bromide ions, and iodide ions; carboxylate ions such as formate ions and acetate ions; Carbonate ions, bicarbonate ions, nitrate ions, sulfate ions, sulfite ions, chromate ions, dichromate ions, phosphate ions, cyanide ions, permanganate ions, and even hexacyanoferrate (III) ions And complex ions. From the viewpoint of synthesis suitability and stability, halogen ions and carboxylate ions are preferable, and halogen ions are most preferable. When the counter anion is an organic acid ion such as a carboxylate ion, the organic acid ion may be covalently bonded in the resin to form an inner salt.
本発明の好ましい様態である一般式(2)で表される構造単位を含むビニル系樹脂を得るには、アンモニウム塩基を有するエチレン性不飽和単量体を単量体成分として共重合する方法だけでなく、アミノ基を有するエチレン性不飽和単量体を単量体成分として共重合したアミノ基を有するビニル系樹脂を得た後、オニウム塩化剤を反応させ、アンモニウム塩化する方法により得ても良い。 In order to obtain a vinyl resin containing a structural unit represented by the general formula (2) which is a preferred embodiment of the present invention, only a method of copolymerizing an ethylenically unsaturated monomer having an ammonium base as a monomer component is used. Alternatively, after obtaining a vinyl resin having an amino group obtained by copolymerizing an ethylenically unsaturated monomer having an amino group as a monomer component, it may be obtained by a method in which an onium chlorinating agent is reacted and ammonium salified. good.
以下に、本発明の好ましい様態である一般式(2)で表される構造単位を含むビニル系樹脂を得るために使用可能なエチレン性不飽和単量体の具体例を示す。なお、本明細書において「アクリル、メタクリル」、のいずれか或いは双方を示す場合「(メタ)アクリル」、と記載することがある。同様に、「アクリロイル、メタクリロイル」のいずれか或いは双方を示す場合、「(メタ)アクリロイル」と記載することがある。 Below, the specific example of the ethylenically unsaturated monomer which can be used in order to obtain the vinyl resin containing the structural unit represented by General formula (2) which is a preferable aspect of this invention is shown. In addition, in this specification, when showing either or both of "acryl, methacryl", it may describe as "(meth) acryl". Similarly, when one or both of “acryloyl and methacryloyl” are indicated, it may be described as “(meth) acryloyl”.
4級アンモニウム塩基を有するエチレン性不飽和単量体としては、例えば(メタ)アクリロイルオキシエチルトリメチルアンモニウムクロライド、(メタ)アクリロイルオキシエチルトリエチルアンモニウムクロライド、(メタ)アクリロイルオキシエチルジメチルベンジルアンモニウムクロライド、(メタ)アクリロイルオキシエチルメチルモルホリノアンモニウムクロライド等のアルキル(メタ)アクリレート系第4級アンモニウム塩、(メタ)アクリロイルアミノプロピルトリメチルアンモニウムクロライド、(メタ)アクリロイルアミノエチルトリエチルアンモニウムクロライド、(メタ)アクリロイルアミノエチルジメチルベンジルアンモニウムクロライド等のアルキル(メタ)アクリロイルアミド系第4級アンモニウム塩、ジメチルジアリルアンモニウムメチルサルフェート、トリメチルビニルフェニルアンモニウムクロライド等が挙げられる。 Examples of the ethylenically unsaturated monomer having a quaternary ammonium base include (meth) acryloyloxyethyltrimethylammonium chloride, (meth) acryloyloxyethyltriethylammonium chloride, (meth) acryloyloxyethyldimethylbenzylammonium chloride, (meta ) Alkyl (meth) acrylate quaternary ammonium salts such as acryloyloxyethylmethylmorpholino ammonium chloride, (meth) acryloylaminopropyltrimethylammonium chloride, (meth) acryloylaminoethyltriethylammonium chloride, (meth) acryloylaminoethyldimethylbenzyl Alkyl (meth) acryloylamide quaternary ammonium salts such as ammonium chloride, dimethyl Luzia Lil ammonium methyl sulfate, trimethyl vinyl phenyl ammonium chloride.
アミノ基を有するエチレン性不飽和単量体としては、例えば、ジメチルアミノエチル(メタ)アクリレート、ジエチルアミノエチル(メタ)アクリレート、ジプロピルアミノエチル(メタ)アクリレート、ジイソプロピルアミノエチル(メタ)アクリレート、ジブチルアミノエチル(メタ)アクリレート、ジイソブチルアミノエチル(メタ)アクリレート、ジt−ブチルアミノエチル(メタ)アクリレート、ジメチルアミノプロピル(メタ)アクリルアミド、ジエチルアミノプロピル(メタ)アクリルアミド、ジプロピルアミノプロピル(メタ)アクリルアミド、ジイソプロピルアミノプロピル(メタ)アクリルアミド、ジブチルアミノプロピル(メタ)アクリルアミド、ジイソブチルアミノプロピル(メタ)アクリルアミド、ジt−ブチルアミノプロピル(メタ)アクリルアミド等のジアルキルアミノ基を有する(メタ)アクリル酸エステルまたは(メタ)アクリルアミドが挙げられ、ジメチルアミノスチレン、ジメチルアミノメチルスチレン等のジアルキルアミノ基を有するスチレン類、ジアリルメチルアミン、ジアリルアミン等のジアリルアミン化合物、N−ビニルピロリジン、N−ビニルピロリドン、N−ビニルカルバゾール等のアミノ基含有芳香族ビニル系単量体が挙げられる。 Examples of the ethylenically unsaturated monomer having an amino group include dimethylaminoethyl (meth) acrylate, diethylaminoethyl (meth) acrylate, dipropylaminoethyl (meth) acrylate, diisopropylaminoethyl (meth) acrylate, and dibutylamino. Ethyl (meth) acrylate, diisobutylaminoethyl (meth) acrylate, di-t-butylaminoethyl (meth) acrylate, dimethylaminopropyl (meth) acrylamide, diethylaminopropyl (meth) acrylamide, dipropylaminopropyl (meth) acrylamide, diisopropyl Aminopropyl (meth) acrylamide, dibutylaminopropyl (meth) acrylamide, diisobutylaminopropyl (meth) acrylamide, di-t-butyl Examples include (meth) acrylic acid esters having a dialkylamino group such as minopropyl (meth) acrylamide or (meth) acrylamide, and styrenes having a dialkylamino group such as dimethylaminostyrene and dimethylaminomethylstyrene, diallylmethylamine, diallylamine And amino group-containing aromatic vinyl monomers such as N-vinylpyrrolidine, N-vinylpyrrolidone and N-vinylcarbazole.
オニウム塩化剤としては、例えば、ジメチル硫酸、ジエチル硫酸、またはジプロピル硫酸等のアルキル硫酸、p−トルエンスルホン酸メチル、またはベンゼンスルホン酸メチル等のスルホン酸エステル、メチルクロライド、エチルクロライド、プロピルクロライド、またはオクチルクロライド等のアルキルクロライド、メチルブロマイド、エチルブロマイド、プロピルブロマイド、またはオクチルクロブロマイド等のアルキルブロマイド、あるいは、ベンジルクロライド、またはベンジルブロマイド等が挙げられる。 Examples of the onium chloride agent include alkyl sulfates such as dimethyl sulfate, diethyl sulfate, or dipropyl sulfate, sulfonate esters such as methyl p-toluenesulfonate, or methyl benzenesulfonate, methyl chloride, ethyl chloride, propyl chloride, or Examples thereof include alkyl chlorides such as octyl chloride, alkyl bromides such as methyl bromide, ethyl bromide, propyl bromide, and octyl chlorobromide, benzyl chloride, and benzyl bromide.
アミノ基を有するエチレン性不飽和単量体とオニウム塩化剤との反応は、通常はアミノ基に対して等モル以下のオニウム塩化剤を、アミノ基を有するエチレン性不飽和単量体溶液に滴下することによって行うことができる。アンモニウム塩化反応時の温度は90℃程度以下であり、特にビニルモノマーをアンモニウム塩化する場合には30℃程度以下が好ましく、反応時間は1〜4時間程度である。 The reaction between the ethylenically unsaturated monomer having an amino group and the onium chlorinating agent is usually performed by dropping an equimolar amount or less of the onium chlorinating agent into the amino group-containing ethylenically unsaturated monomer solution. Can be done. The temperature during the ammonium chlorination reaction is about 90 ° C. or less, and particularly when the vinyl monomer is ammonium chlorinated, it is preferably about 30 ° C. or less, and the reaction time is about 1 to 4 hours.
別に、オニウム塩化剤として、アルコキシカルボニルアルキルハライドを使用することもできる。アルコキシカルボニルアルキルハライドは下記一般式(8)で表される。
D−R12−COOR13 一般式(8)
(一般式(8)中、Dは、塩素、または臭素等のハロゲン、好ましくは臭素であり、R12は、炭素数1〜6、好ましくは1〜5、より好ましくは1〜3のアルキレン基であり、R13は、炭素数1〜6、好ましくは1〜3の低級アルキル基である。)
Alternatively, an alkoxycarbonylalkyl halide can also be used as the onium chlorinating agent. The alkoxycarbonylalkyl halide is represented by the following general formula (8).
D-R 12 -COOR 13 formula (8)
(In General Formula (8), D is a halogen such as chlorine or bromine, preferably bromine, and R 12 is an alkylene group having 1 to 6 carbon atoms, preferably 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms. And R 13 is a lower alkyl group having 1 to 6 carbon atoms, preferably 1 to 3 carbon atoms.)
アミノ基を有するエチレン性不飽和単量体とアルコキシカルボニルアルキルハライドとの反応は、アミノ基に対して等モル以下のアルコキシカルボニルアルキルハライドを上記オニウム塩化剤同様に反応させた後、−COOR13を加水分解してカルボキシレートイオン(−COO-)に変換することにより得られる。これにより、一般式(8)式で示すカルボキシベタイン構造を有しアンモニウム塩基を有するエチレン性不飽和単量体を得ることができる。 Reaction of the ethylenically unsaturated monomer and alkoxycarbonylalkyl halide with an amino group, after equimolar following alkoxycarbonylalkyl halide was reacted in the same manner as in the above onium chloride agent to an amino group, a -COOR 13 It is obtained by hydrolysis and conversion to carboxylate ions (—COO—). Thereby, the ethylenically unsaturated monomer which has a carboxybetaine structure shown by General formula (8) Formula, and has an ammonium base can be obtained.
その他、一般式(2)で表される構造単位以外で用いることができるエチレン性不飽和単量体としては、例えば、(メタ)アクリル酸エステル類、クロトン酸エステル類、ビニルエステル類、マレイン酸ジエステル類、フマル酸ジエステル類、イタコン酸ジエステル類、(メタ)アクリルアミド類、ビニルエーテル類、ビニルアルコールのエステル類、スチレン類、(メタ)アクリロニトリルなどが好ましい。 Other examples of the ethylenically unsaturated monomer that can be used other than the structural unit represented by the general formula (2) include (meth) acrylic acid esters, crotonic acid esters, vinyl esters, and maleic acid. Diesters, fumaric acid diesters, itaconic acid diesters, (meth) acrylamides, vinyl ethers, vinyl alcohol esters, styrenes, (meth) acrylonitrile and the like are preferable.
このようなビニルモノマーの具体例としては、例えば以下のような化合物が挙げられる。 Specific examples of such vinyl monomers include the following compounds.
(メタ)アクリル酸エステル類の例としては、(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸n−プロピル、(メタ)アクリル酸イソプロピル、(メタ)アクリル酸n−ブチル、(メタ)アクリル酸イソブチル、(メタ)アクリル酸t−ブチル、(メタ)アクリル酸n−ヘキシル、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸t−ブチルシクロヘキシル、(メタ)アクリル酸2−エチルヘキシル、(メタ)アクリル酸t−オクチル、(メタ)アクリル酸ドデシル、(メタ)アクリル酸オクタデシル、(メタ)アクリル酸アセトキシエチル、(メタ)アクリル酸フェニル、(メタ)アクリル酸2−ヒドロキシエチル、(メタ)アクリル酸2−メトキシエチル、(メタ)アクリル酸2−エトキシエチル、(メタ)アクリル酸2−(2−メトキシエトキシ)エチル、(メタ)アクリル酸3−フェノキシ−2−ヒドロキシプロピル、(メタ)アクリル酸ベンジル、(メタ)アクリル酸ジエチレングリコールモノメチルエーテル、(メタ)アクリル酸ジエチレングリコールモノエチルエーテル、(メタ)アクリル酸トリエチレングリコールモノメチルエーテル、(メタ)アクリル酸トリエチレングリコールモノエチルエーテル、(メタ)アクリル酸ポリエチレングリコールモノメチルエーテル、(メタ)アクリル酸ポリエチレングリコールモノエチルエーテル、(メタ)アクリル酸β−フェノキシエトキシエチル、(メタ)アクリル酸ノニルフェノキシポリエチレングリコール、(メタ)アクリル酸ジシクロペンテニル、(メタ)アクリル酸ジシクロペンテニルオキシエチル、(メタ)アクリル酸トリフロロエチル、(メタ)アクリル酸オクタフロロペンチル、(メタ)アクリル酸パーフロロオクチルエチル、(メタ)アクリル酸ジシクロペンタニル、(メタ)アクリル酸トリブロモフェニル、(メタ)アクリル酸トリブロモフェニルオキシエチルなどが挙げられる。 Examples of (meth) acrylic acid esters include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, and n-butyl (meth) acrylate. , Isobutyl (meth) acrylate, t-butyl (meth) acrylate, n-hexyl (meth) acrylate, cyclohexyl (meth) acrylate, t-butylcyclohexyl (meth) acrylate, (meth) acrylic acid 2- Ethylhexyl, t-octyl (meth) acrylate, dodecyl (meth) acrylate, octadecyl (meth) acrylate, acetoxyethyl (meth) acrylate, phenyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-Methoxyethyl (meth) acrylate, 2-ethoxyethyl (meth) acrylate 2- (2-methoxyethoxy) ethyl (meth) acrylate, 3-phenoxy-2-hydroxypropyl (meth) acrylate, benzyl (meth) acrylate, diethylene glycol monomethyl ether (meth) acrylate, (meth) acrylic acid Diethylene glycol monoethyl ether, (meth) acrylic acid triethylene glycol monomethyl ether, (meth) acrylic acid triethylene glycol monoethyl ether, (meth) acrylic acid polyethylene glycol monomethyl ether, (meth) acrylic acid polyethylene glycol monoethyl ether, ( Β-phenoxyethoxyethyl (meth) acrylate, nonylphenoxypolyethylene glycol (meth) acrylate, dicyclopentenyl (meth) acrylate, dicyclo (meth) acrylate Pentenyloxyethyl, trifluoroethyl (meth) acrylate, octafluoropentyl (meth) acrylate, perfluorooctylethyl (meth) acrylate, dicyclopentanyl (meth) acrylate, tribromophenyl (meth) acrylate And (meth) acrylic acid tribromophenyloxyethyl.
クロトン酸エステル類の例としては、クロトン酸ブチル、及びクロトン酸ヘキシル等が挙げられる。 Examples of crotonic acid esters include butyl crotonate and hexyl crotonate.
ビニルエステル類の例としては、ビニルアセテート、ビニルプロピオネート、ビニルブチレート、ビニルメトキシアセテート、及び安息香酸ビニルなどが挙げられる。マレイン酸ジエステル類の例としては、マレイン酸ジメチル、マレイン酸ジエチル、及びマレイン酸ジブチルなどが挙げられる。 Examples of vinyl esters include vinyl acetate, vinyl propionate, vinyl butyrate, vinyl methoxyacetate, vinyl benzoate, and the like. Examples of maleic acid diesters include dimethyl maleate, diethyl maleate, and dibutyl maleate.
フマル酸ジエステル類の例としては、フマル酸ジメチル、フマル酸ジエチル、及びフマル酸ジブチルなどが挙げられる。 Examples of the fumaric acid diesters include dimethyl fumarate, diethyl fumarate, and dibutyl fumarate.
イタコン酸ジエステル類の例としては、イタコン酸ジメチル、イタコン酸ジエチル、及びイタコン酸ジブチルなどが挙げられる。 Examples of itaconic acid diesters include dimethyl itaconate, diethyl itaconate, and dibutyl itaconate.
(メタ)アクリルアミド類の例としては、(メタ)アクリルアミド、N−メチル(メタ)アクリルアミド、N−エチル(メタ)アクリルアミド、N−プロピル(メタ)アクリルアミド、N−イソプロピル(メタ)アクリルアミド、N−n−ブチルアクリル(メタ)アミド、N−t−ブチル(メタ)アクリルアミド、N−シクロヘキシル(メタ)アクリルアミド、N−(2−メトキシエチル)(メタ)アクリルアミド、N,N−ジメチル(メタ)アクリルアミド、N,N−ジエチル(メタ)アクリルアミド、N−フェニル(メタ)アクリルアミド、N−ベンジル(メタ)アクリルアミド、(メタ)アクリロイルモルホリン、ジアセトンアクリルアミドなどが挙げられる。 Examples of (meth) acrylamides include (meth) acrylamide, N-methyl (meth) acrylamide, N-ethyl (meth) acrylamide, N-propyl (meth) acrylamide, N-isopropyl (meth) acrylamide, Nn -Butyl acryl (meth) amide, Nt-butyl (meth) acrylamide, N-cyclohexyl (meth) acrylamide, N- (2-methoxyethyl) (meth) acrylamide, N, N-dimethyl (meth) acrylamide, N , N-diethyl (meth) acrylamide, N-phenyl (meth) acrylamide, N-benzyl (meth) acrylamide, (meth) acryloylmorpholine, diacetone acrylamide and the like.
ビニルエーテル類の例としては、メチルビニルエーテル、ブチルビニルエーテル、ヘキシルビニルエーテル、及びメトキシエチルビニルエーテルなどが挙げられる。スチレン類の例としては、スチレン、メチルスチレン、ジメチルスチレン、トリメチルスチレン、エチルスチレン、イソプロピルスチレン、ブチルスチレン、ヒドロキシスチレン、メトキシスチレン、ブトキシスチレン、アセトキシスチレン、クロロスチレン、ジクロロスチレン、ブロモスチレン、クロロメチルスチレン、酸性物質により脱保護可能な基(例えばt−Bocなど)で保護されたヒドロキシスチレン、ビニル安息香酸メチル、及びα−メチルスチレンなどが挙げられる。 Examples of vinyl ethers include methyl vinyl ether, butyl vinyl ether, hexyl vinyl ether, and methoxyethyl vinyl ether. Examples of styrenes include styrene, methyl styrene, dimethyl styrene, trimethyl styrene, ethyl styrene, isopropyl styrene, butyl styrene, hydroxy styrene, methoxy styrene, butoxy styrene, acetoxy styrene, chlorostyrene, dichlorostyrene, bromostyrene, chloromethyl Examples thereof include styrene, hydroxystyrene protected with a group that can be deprotected by an acidic substance (for example, t-Boc and the like), methyl vinylbenzoate, and α-methylstyrene.
その他、一般式(2)で表される構造単位以外で用いることができるエチレン性不飽和単量体は、更に、酸基を有する単量体に由来する共重合単位を含んでもよい。 In addition, the ethylenically unsaturated monomer that can be used other than the structural unit represented by the general formula (2) may further include a copolymer unit derived from a monomer having an acid group.
酸基を有する単量体としては、アクリル酸、メタクリル酸、クロトン酸、α−クロルアクリル酸、けい皮酸等の不飽和モノカルボン酸類;マレイン酸、無水マレイン酸、フマル酸、イタコン酸、無水イタコン酸、シトラコン酸、無水シトラコン酸、メサコン酸等の不飽和ジカルボン酸またはその無水物類;3価以上の不飽和多価カルボン酸またはその無水物類;こはく酸モノ(2−アクリロイロキシエチル)、こはく酸モノ(2−メタクリロイロキシエチル)、フタル酸モノ(2−アクリロイロキシエチル)、フタル酸モノ(2−メタクリロイロキシエチル)等の2価以上の多価カルボン酸のモノ〔(メタ)アクリロイロキシアルキル〕エステル類;ω−カルボキシ−ポリカプロラクトンモノアクリレート、ω−カルボキシ−ポリカプロラクトンモノメタクリレート等の両末端カルボキシポリマーのモノ(メタ)アクリレート類等を挙げられる。 As monomers having an acid group, unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, α-chloroacrylic acid, cinnamic acid; maleic acid, maleic anhydride, fumaric acid, itaconic acid, anhydrous Unsaturated dicarboxylic acids such as itaconic acid, citraconic acid, citraconic anhydride and mesaconic acid or their anhydrides; trivalent or higher unsaturated polycarboxylic acids or their anhydrides; succinic acid mono (2-acryloyloxyethyl) ), Succinic acid mono (2-methacryloyloxyethyl), phthalic acid mono (2-acryloyloxyethyl), phthalic acid mono (2-methacryloyloxyethyl) monovalent polyvalent carboxylic acid mono [ (Meth) acryloyloxyalkyl] esters; ω-carboxy-polycaprolactone monoacrylate, ω-carboxy-polycaprolacto Include mono (meth) acrylates such as both terminal carboxy polymers such monomethacrylate.
本発明に好適な一般式(2)で表される構造単位を含むビニル系樹脂を得る方法としては、アニオン重合、リビングアニオン重合、カチオン重合、リビングカチオン重合、フリーラジカル重合、及びリビングラジカル重合等、公知の方法が使用できる。このうち、フリーラジカル重合またはリビングラジカル重合が好ましい。 Examples of a method for obtaining a vinyl resin containing the structural unit represented by the general formula (2) suitable for the present invention include anionic polymerization, living anionic polymerization, cationic polymerization, living cationic polymerization, free radical polymerization, and living radical polymerization. Any known method can be used. Of these, free radical polymerization or living radical polymerization is preferred.
フリーラジカル重合法の場合は、重合開始剤を使用するのが好ましい。重合開始剤としては例えば、アゾ系化合物及び有機過酸化物を用いることができる。アゾ系化合物の例としては、2,2'−アゾビスイソブチロニトリル、2,2'−アゾビス(2−メチルブチロニトリル)、1,1'−アゾビス(シクロヘキサン1−カルボニトリル)、2,2'−アゾビス(2,4−ジメチルバレロニトリル)、2,2'−アゾビス(2,4−ジメチル−4−メトキシバレロニトリル)、ジメチル2,2'−アゾビス(2−メチルプロピオネート)、4,4'−アゾビス(4−シアノバレリック酸)、2,2'−アゾビス(2−ヒドロキシメチルプロピオニトリル)、または2,2'−アゾビス[2−(2−イミダゾリン−2−イル)プロパン]等が挙げられる。有機過酸化物の例としては、過酸化ベンゾイル、t−ブチルパーベンゾエイト、クメンヒドロパーオキシド、ジイソプロピルパーオキシジカーボネート、ジ−n−プロピルパーオキシジカーボネート、ジ(2−エトキシエチル)パーオキシジカーボネート、t−ブチルパーオキシネオデカノエート、t−ブチルパーオキシビバレート、(3,5,5−トリメチルヘキサノイル)パーオキシド、ジプロピオニルパーオキシド、またはジアセチルパーオキシド等が挙げられる。これらの重合開始剤は、単独で、若しくは2種類以上組み合わせて用いることができる。反応温度は好ましくは40〜150℃、より好ましくは50〜110℃、反応時間は好ましくは3〜30時間、より好ましくは5〜20時間である。 In the case of the free radical polymerization method, it is preferable to use a polymerization initiator. As the polymerization initiator, for example, an azo compound and an organic peroxide can be used. Examples of the azo compounds include 2,2′-azobisisobutyronitrile, 2,2′-azobis (2-methylbutyronitrile), 1,1′-azobis (cyclohexane 1-carbonitrile), 2 , 2′-azobis (2,4-dimethylvaleronitrile), 2,2′-azobis (2,4-dimethyl-4-methoxyvaleronitrile), dimethyl 2,2′-azobis (2-methylpropionate) 4,4′-azobis (4-cyanovaleric acid), 2,2′-azobis (2-hydroxymethylpropionitrile), or 2,2′-azobis [2- (2-imidazolin-2-yl ) Propane] and the like. Examples of organic peroxides include benzoyl peroxide, t-butyl perbenzoate, cumene hydroperoxide, diisopropyl peroxydicarbonate, di-n-propyl peroxydicarbonate, di (2-ethoxyethyl) peroxy Examples thereof include dicarbonate, t-butyl peroxyneodecanoate, t-butyl peroxybivalate, (3,5,5-trimethylhexanoyl) peroxide, dipropionyl peroxide, and diacetyl peroxide. These polymerization initiators can be used alone or in combination of two or more. The reaction temperature is preferably 40 to 150 ° C., more preferably 50 to 110 ° C., and the reaction time is preferably 3 to 30 hours, more preferably 5 to 20 hours.
リビングラジカル重合法は一般的なラジカル重合に起こる副反応が抑制され、更には、重合の成長が均一に起こる為、容易にブロックポリマーや分子量の揃った樹脂を合成できる。 In the living radical polymerization method, side reactions that occur in general radical polymerization are suppressed, and further, since the growth of polymerization occurs uniformly, it is possible to easily synthesize block polymers and resins with uniform molecular weight.
中でも、有機ハロゲン化物、またはハロゲン化スルホニル化合物を開始剤とし、遷移金属錯体を触媒とする原子移動ラジカル重合法は、広範囲の単量体に適応できる点、既存の設備に適応可能な重合温度を採用できる点で好ましい。原子移動ラジカル重合法は、下記の参考文献10〜17等に記載された方法で行うことができる。
(参考文献10)Fukudaら、Prog.Polym.Sci.2004,29,329
(参考文献11)Matyjaszewskiら、Chem.Rev.2001,101,2921
(参考文献12)Matyjaszewskiら、J.Am.Chem.Soc.1995,117,5614
(参考文献13) Macromolecules 1995,28,7901,Science,1996,272,866
(参考文献14)国際公開第96/030421号パンフレット
(参考文献15)国際公開第97/018247号パンフレット
(参考文献16)特開平9−208616号公報
(参考文献17)特開平8−41117号公報
上記重合には有機溶剤を用いることが好ましい。有機溶剤としては、特に限定されるものではないが、例えば、酢酸エチル、酢酸n−ブチル、酢酸イソブチル、トルエン、キシレン、アセトン、ヘキサン、メチルエチルケトン、シクロヘキサノン、プロピレングリコールモノメチルエーテルアセテート、ジプロピレングリコールモノメチルエーテルアセテート、エチレングリコールモノエチルエーテルアセテート、エチレングリコールモノブチルエーテルアセテート、ジエチレングリコールモノエチルエーテルアセテート、またはジエチレングリコールモノブチルエーテルアセテート等が用いられる。これらの重合溶媒は、2種類以上混合して用いてもよい。
Among them, the atom transfer radical polymerization method using an organic halide or a sulfonyl halide compound as an initiator and a transition metal complex as a catalyst is applicable to a wide range of monomers, and has a polymerization temperature applicable to existing equipment. It is preferable in that it can be adopted. The atom transfer radical polymerization method can be performed by the method described in the following references 10 to 17 and the like.
(Reference 10) Fukuda et al., Prog. Polym. Sci. 2004, 29, 329
(Reference 11) Matyjaszewski et al., Chem. Rev. 2001, 101, 2921
(Reference 12) Matyjaszewski et al. Am. Chem. Soc. 1995, 117, 5614
(Reference 13) Macromolecules 1995, 28, 7901, Science, 1996, 272, 866
(Reference 14) Pamphlet of International Publication No. 96/030421 (Reference 15) Pamphlet of International Publication No. 97/018247 (Reference 16) JP-A-9-208616 (Reference 17) JP-A-8-411117 It is preferable to use an organic solvent for the polymerization. The organic solvent is not particularly limited, but for example, ethyl acetate, n-butyl acetate, isobutyl acetate, toluene, xylene, acetone, hexane, methyl ethyl ketone, cyclohexanone, propylene glycol monomethyl ether acetate, dipropylene glycol monomethyl ether Acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, or the like is used. Two or more kinds of these polymerization solvents may be mixed and used.
本発明に好適な一般式(2)で表される構造単位を含むビニル系樹脂中に存在するアンモニウム塩基の量は、特に限定されるものではないが、樹脂のアンモニウム塩価が10〜200mgKOH/gであることが好ましく、20〜130mgKOH/gであることがより好ましい。 The amount of the ammonium base present in the vinyl-based resin containing the structural unit represented by the general formula (2) suitable for the present invention is not particularly limited, but the ammonium salt value of the resin is 10 to 200 mgKOH / It is preferable that it is g, and it is more preferable that it is 20-130 mgKOH / g.
樹脂のアンモニウム塩価が、上記範囲を満たすためには、4級アンモニウム塩基を有する構造単位の好ましい含有量は、樹脂を構成する構造単位の合計100重量%中、4〜74重量%であり、より好ましい範囲は8〜48重量%である。 In order for the ammonium salt value of the resin to satisfy the above range, the preferred content of the structural unit having a quaternary ammonium base is 4 to 74% by weight in a total of 100% by weight of the structural units constituting the resin, A more preferred range is 8 to 48% by weight.
本発明に使用される一般式(2)で表される構造単位を含むビニル系樹脂の分子量は、特に限定されるものではないが、ゲルパーミエーションクロマトグラフィー(GPC)で測定した換算重量平均分子量が1,000〜500,000であることが好ましく、3,000〜15,000であることがより好ましい。 Although the molecular weight of the vinyl resin containing the structural unit represented by the general formula (2) used in the present invention is not particularly limited, the converted weight average molecular weight measured by gel permeation chromatography (GPC). Is preferably 1,000 to 500,000, and more preferably 3,000 to 15,000.
側鎖にカチオン性基を有する樹脂[B]において、上記一般式(2)で表される構造単位の総含有量は、特に制限はないが、側鎖にカチオン性基を有する樹脂[B]に含有される全構造単位を100質量%とした場合に、造塩化合物の溶剤溶解性と着色力の点から、上記一般式(2)で表される構造単位の総含有量は、5質量%以上であることが好ましく、10〜50質量%であることがより好ましい。 In the resin [B] having a cationic group in the side chain, the total content of the structural unit represented by the general formula (2) is not particularly limited, but the resin [B] having a cationic group in the side chain. From the viewpoint of solvent solubility and coloring power of the salt-forming compound, the total content of the structural unit represented by the general formula (2) is 5% by weight, assuming that the total structural unit contained in 100% by mass. % Or more, and more preferably 10 to 50% by mass.
<造塩化合物の製造方法>
本発明の造塩化合物は、スクアリリウム[A]と側鎖にカチオン性基を有する樹脂[B]とを溶解させた水溶液を攪拌または振動させるか、あるいはスクアリリウム[A]の水溶液と側鎖にカチオン性基を有する樹脂[B]の水溶液とを攪拌または振動下で混合させることにより、容易に得ることができる。水溶液中で、スクアリリウム[A]のアニオン性基と樹脂[B]のカチオン性基がイオン化され、これらがイオン結合し、該イオン結合部分が水不溶性となり析出する。逆に、スクアリリウム[A]の対カチオンと樹脂[B]の対アニオンからなる塩は水溶性のため、水洗等により除去が可能となる。使用するスクアリリウム[A]、および側鎖にカチオン性基を有する樹脂[B]は、各々単一種類のみを使用しても、構造の異なる複数種類を使用してもよい。
<Method for producing salt-forming compound>
The salt-forming compound of the present invention is prepared by stirring or vibrating an aqueous solution in which squarylium [A] and a resin [B] having a cationic group are dissolved in the side chain, or in an aqueous solution and side chain of squarylium [A]. It can be easily obtained by mixing an aqueous solution of the resin [B] having a functional group with stirring or vibration. In the aqueous solution, the anionic group of squarylium [A] and the cationic group of resin [B] are ionized and these are ionically bonded, and the ion-bonded portion becomes water-insoluble and precipitates. On the contrary, a salt composed of a counter cation of squarylium [A] and a counter anion of resin [B] is water-soluble and can be removed by washing or the like. The squarylium [A] and the resin [B] having a cationic group in the side chain may be used alone or in a plurality of types having different structures.
塩形成時に使用する水溶液として、スクアリリウム[A]、および側鎖にカチオン性基を有する樹脂[B]を溶解させるため、水と水溶性有機溶剤との混合溶液を使用してもよい。水溶性有機溶剤としては、メタノール、エタノール、n−プロパノール、イソプロパノール、1−メトキシ−2−プロパノール、1−エトキシ−2−プロパノール、n−ブタノール、イソブタノール、2−(メトキシメトキシ)エタノール、2−ブトキシエタノール、2−(イソペンチルオキシ)エタノール、2−(ヘキシルオキシ)エタノール、エチレングリコール、エチレングリコールモノエチルエーテル、エチレングリコールモノブチルエーテル、ジエチレングリコール、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノブチルエーテル、プロピレングリコール、プロピレンゴリコールモノメチルエーテルアセテート、ジプロピレングリコール、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、トリエチレングリコール、トリエチレングリコールモノメチルエーテル、ポリエチレングリコール、グリセリン、テトラエチレングリコール、ジプロピレングリコール、アセトン、ジアセトンアルコール、アニリン、ピリジン、酢酸エチル、酢酸イソプロピル、メチルエチルケトン、N,N−ジメチルホルムアミド、ジメチルスルホキシド、テトラヒドロフラン(THF)、ジオキサン、2−ピロリドン、2−メチルピロリドン、N−メチル−2−ピロリドン、1,2−ヘキサンジオール、2,4,6−ヘキサントリオール、テトラフルフリルアルコール、4−メトキシ−4メチルペンタノン等が挙げられる。これらの水溶性有機溶剤は、水溶液の全重量を基準(100重量%)として、5〜50重量%用いることが好ましく、5〜20重量%用いることが最も好ましい。 In order to dissolve squarylium [A] and the resin [B] having a cationic group in the side chain as an aqueous solution used at the time of salt formation, a mixed solution of water and a water-soluble organic solvent may be used. Examples of the water-soluble organic solvent include methanol, ethanol, n-propanol, isopropanol, 1-methoxy-2-propanol, 1-ethoxy-2-propanol, n-butanol, isobutanol, 2- (methoxymethoxy) ethanol, 2- Butoxyethanol, 2- (isopentyloxy) ethanol, 2- (hexyloxy) ethanol, ethylene glycol, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene Glycol, propylene glycolic monomethyl ether acetate, dipropylene glycol, dipropylene glycol Monomethyl ether, dipropylene glycol monoethyl ether, triethylene glycol, triethylene glycol monomethyl ether, polyethylene glycol, glycerin, tetraethylene glycol, dipropylene glycol, acetone, diacetone alcohol, aniline, pyridine, ethyl acetate, isopropyl acetate, methyl ethyl ketone , N, N-dimethylformamide, dimethyl sulfoxide, tetrahydrofuran (THF), dioxane, 2-pyrrolidone, 2-methylpyrrolidone, N-methyl-2-pyrrolidone, 1,2-hexanediol, 2,4,6-hexanetriol , Tetrafurfuryl alcohol, 4-methoxy-4-methylpentanone and the like. These water-soluble organic solvents are preferably used in an amount of 5 to 50% by weight, and most preferably 5 to 20% by weight, based on the total weight of the aqueous solution (100% by weight).
スクアリリウム[A]と、側鎖にカチオン性基を有する樹脂[B]との比率は、樹脂[B]の全カチオンユニットとスクアリリウム[A]の全アニオン性基とのモル比が10/1〜1/10の範囲であれば本発明の造塩化合物を好適に調整でき、4/1〜1/4の範囲であれば好ましく、2/1〜1/2の範囲であれば特に好ましい。 The ratio of the squarylium [A] and the resin [B] having a cationic group in the side chain is such that the molar ratio of the total cation unit of the resin [B] to the total anionic group of the squarylium [A] is 10/1. If it is in the range of 1/10, the salt-forming compound of the present invention can be suitably adjusted, preferably in the range of 4/1 to 1/4, and particularly preferably in the range of 2/1 to 1/2.
一般式(1)で表されるスクアリリウム[A]におけるnが、2以上でありスルホ基が複数存在する場合、全てのスルホ基が樹脂[B]と塩形成しても良いし、1以上のスルホ基が樹脂[B]と塩形成し、残りのスルホ基のカウンターカチオンはZ+の状態で残っていても良い。前記の製造する際のモル比を変更することで、樹脂[B]とZ+の比率を制御することができる。 When n in the squarylium [A] represented by the general formula (1) is 2 or more and a plurality of sulfo groups are present, all the sulfo groups may form a salt with the resin [B]. The sulfo group may form a salt with the resin [B], and the remaining counter cation of the sulfo group may remain in the Z + state. By changing the molar ratio in the production, the ratio of the resin [B] and Z + can be controlled.
<画像形成材料>
本発明の画像形成材料について詳しく説明する。
本発明の画像形成材料において、本発明の造塩化合物は、分散状態と溶解状態のどちらの状態でも使用可能である。本発明の画像形成材料における造塩化合物は、必要に応じて調節することができるが、画像形成材料中に0.05〜50質量%含有させることが好ましく、0.1〜30質量%含有させることがより好ましい。本発明の画像形成材料における、造塩化合物は1種または必要に応じて任意の比率で2種以上混合して用いることができる。
<Image forming material>
The image forming material of the present invention will be described in detail.
In the image forming material of the present invention, the salt-forming compound of the present invention can be used in either a dispersed state or a dissolved state. The salt-forming compound in the image-forming material of the present invention can be adjusted as necessary, but it is preferably contained in the image-forming material in an amount of 0.05 to 50% by mass, and 0.1 to 30% by mass. It is more preferable. In the image forming material of the present invention, the salt-forming compounds can be used alone or in combination of two or more at any ratio as required.
本発明の画像形成材料の用途は特に制限されないが、例えば、電子写真用トナー、インクジェットプリンター用インク、又は活版印刷、オフセット印刷、フレキソ印刷、グラビア印刷、若しくはシルク印刷用のインクなどの用途が挙げられる。 The application of the image forming material of the present invention is not particularly limited, and examples thereof include applications such as toner for electrophotography, ink for inkjet printer, or ink for letterpress printing, offset printing, flexographic printing, gravure printing, or silk printing. It is done.
本発明の画像形成材料が電子写真用トナーである場合、当該画像形成材料は、1成分現像剤として単独で用いても、あるいはキャリアと組み合わせた2成分現像剤として用いてもよい。キャリアとしては、公知のキャリアを用いることができる。例えば、芯材上に樹脂被覆層を有する樹脂コートキャリアを挙げることができる。この樹脂被覆層には導電粉等が分散されていてもよい。 When the image forming material of the present invention is an electrophotographic toner, the image forming material may be used alone as a one-component developer or as a two-component developer combined with a carrier. As the carrier, a known carrier can be used. For example, the resin coat carrier which has a resin coating layer on a core material can be mentioned. Conductive powder or the like may be dispersed in the resin coating layer.
また、本発明の画像形成材料が電子写真用トナーである場合、当該画像形成材料は結着樹脂を含有することができる。結着樹脂としては、スチレン、クロロスチレン等のスチレン類、エチレン、プロピレン、ブチレン、イソプレン等のモノオレフィン、酢酸ビニル、プロピオン酸ビニル、安息香酸ビニル、酪酸ビニル等のビニルエステル、アクリル酸メチル、アクリル酸エチル、アクリル酸ブチル、アクリル酸ドデシル、アクリル酸オクチル、アクリル酸フェニル、メタクリル酸メチル、メタクリル酸エチル、メタクリル酸ブチル、メタクリル酸ドデシル等のα−メチレン脂肪族モノカルボン酸エステル類、ビニルメチルエーテル、ビニルエチルエーテル、ビニルブチルエーテル等のビニルエーテル類、ビニルメチルケトン、ビニルヘキシルケトン、ビニルイソプロペニルケトン等のビニルケトン類の単独重合体あるいは共重合体を例示することができ、特に代表的な結着樹脂としては、ポリスチレン、スチレン−アクリル酸アルキル共重合体、スチレン−メタクリル酸アルキル共重合体、スチレン−アクリロニトリル共重合体、スチレン−ブタジエン共重合体、スチレン−無水マレイン酸共重合体、ポリエチレン、ポリプロピレン等を挙げることができる。さらに、ポリエステル、ポリウレタン、エポキシ樹脂、シリコーン樹脂、ポリアミド、変性ロジン、パラフィンワックス等も結着樹脂として使用してもよい。 In addition, when the image forming material of the present invention is an electrophotographic toner, the image forming material can contain a binder resin. Binder resins include styrenes such as styrene and chlorostyrene, monoolefins such as ethylene, propylene, butylene and isoprene, vinyl esters such as vinyl acetate, vinyl propionate, vinyl benzoate and vinyl butyrate, methyl acrylate, acrylic Α-methylene aliphatic monocarboxylic acid esters such as ethyl acetate, butyl acrylate, dodecyl acrylate, octyl acrylate, phenyl acrylate, methyl methacrylate, ethyl methacrylate, butyl methacrylate, dodecyl methacrylate, vinyl methyl ether And vinyl ethers such as vinyl ethyl ether and vinyl butyl ether, and homopolymers or copolymers of vinyl ketones such as vinyl methyl ketone, vinyl hexyl ketone, and vinyl isopropenyl ketone. Typical binder resins include polystyrene, styrene-alkyl acrylate copolymer, styrene-alkyl methacrylate copolymer, styrene-acrylonitrile copolymer, styrene-butadiene copolymer, styrene-maleic anhydride copolymer. Examples thereof include coalescence, polyethylene, and polypropylene. Furthermore, polyester, polyurethane, epoxy resin, silicone resin, polyamide, modified rosin, paraffin wax and the like may be used as the binder resin.
また、本発明の画像形成材料が電子写真用トナーである場合、当該画像形成材料は、必要に応じて帯電制御剤、オフセット防止剤等を更に含有することができる。帯電制御剤としては正帯電用のものと負帯電用のものがあり、正帯電用には、第4級アンモニウム系化合物がある。また、負帯電用には、アルキルサリチル酸の金属錯体、極性基を含有したレジンタイプの帯電制御剤等が挙げられる。オフセット防止剤としては、低分子量ポリエチレン、低分子量ポリプロピレン等が用いられる。 In addition, when the image forming material of the present invention is an electrophotographic toner, the image forming material can further contain a charge control agent, an offset preventive agent and the like as required. As the charge control agent, there are a positive charge agent and a negative charge agent. For the positive charge, there are quaternary ammonium compounds. For negative charging, alkylsalicylic acid metal complexes, resin-type charge control agents containing polar groups, and the like can be used. As the offset preventing agent, low molecular weight polyethylene, low molecular weight polypropylene or the like is used.
また、本発明の画像形成材料が電子写真用トナーである場合、流動性、粉体保存性の向上、摩擦帯電制御、転写性能、クリーニング性能向上等のために、無機粉粒子あるいは有機粒子を外添剤としてトナー表面に添加してもよい。無機粉粒子としては、公知のもの、例えば、シリカ、アルミナ、チタニア、炭酸カルシウム、炭酸マグネシウム、リン酸カルシウム、酸化セリウム等を挙げることができる。また目的に応じて無機粉粒子に公知の表面処理を施してもよい。また、有機粒子としては、フッ化ビニリデン、メチルメタクリレート、スチレン−メチルメタクリレート等を構成成分とする乳化重合体、あるいはソープフリー重合体等を挙げることができる。 In addition, when the image forming material of the present invention is an electrophotographic toner, the inorganic powder particles or the organic particles are removed for improving fluidity, powder storage stability, triboelectric charge control, transfer performance, and cleaning performance. It may be added to the toner surface as an additive. Examples of the inorganic powder particles include known ones such as silica, alumina, titania, calcium carbonate, magnesium carbonate, calcium phosphate, cerium oxide and the like. Further, a known surface treatment may be applied to the inorganic powder particles according to the purpose. Examples of the organic particles include an emulsion polymer having a constituent component such as vinylidene fluoride, methyl methacrylate, styrene-methyl methacrylate, or a soap-free polymer.
本発明の画像形成材料がインクジェットプリンター用インクである場合、画像形成材料は、水を含有する水性インクの態様をとってもよい。また画像形成材料が水性インクである場合、インクの乾燥防止及び浸透性の向上のために、水溶性の有機溶剤を更に含有してもよい。
水としては、例えば、イオン交換水、限外濾過水、純水等が挙げられる。
When the image forming material of the present invention is an ink for an ink jet printer, the image forming material may take the form of an aqueous ink containing water. When the image forming material is a water-based ink, it may further contain a water-soluble organic solvent in order to prevent the ink from drying and to improve the permeability.
Examples of water include ion exchange water, ultrafiltration water, and pure water.
また、水溶性の有機溶媒としては、例えば、エチレングリコール、ジエチレングリコール、ポリエチレングリコール、グリセリン等の多価アルコール類、N−アルキルピロリドン類、酢酸エチル、酢酸アミル等のエステル類、メタノール、エタノール、プロパノール、ブタノール等の低級アルコール類、メタノール、ブタノール、フェノールのエチレンオキサイドまたはプロピレンオキサイド付加物等のグリコールエーテル類等が挙げられる。使用される有機溶媒は1種類でも2種類以上でもよい。
有機溶媒は、吸湿性、保湿性、スクアリリウム色素の溶解度、浸透性、インクの粘度、氷点等を考慮して選択される。インクジェットプリンター用インク中の有機溶媒の含有率としては、例えば、1重量%以上60重量%以下の範囲が挙げられる。
Examples of the water-soluble organic solvent include polyhydric alcohols such as ethylene glycol, diethylene glycol, polyethylene glycol, and glycerin, esters such as N-alkylpyrrolidones, ethyl acetate, and amyl acetate, methanol, ethanol, propanol, Examples include lower alcohols such as butanol, and glycol ethers such as methanol, butanol, and phenol-ethylene oxide or propylene oxide adducts. The organic solvent used may be one type or two or more types.
The organic solvent is selected in consideration of hygroscopicity, moisture retention, solubility of squarylium dye, permeability, ink viscosity, freezing point, and the like. As content rate of the organic solvent in the ink for inkjet printers, the range of 1 weight% or more and 60 weight% or less is mentioned, for example.
また、本発明の画像形成材料がインクジェットプリンター用インクである場合、インクジェットプリンターのシステムに要求される諸条件を満たすために、本実施形態に係る画像形成材料は、インクの成分として従来知られている添加物を含有することができる。このような添加物としては、pH調製剤、比抵抗調製剤、酸化防止剤、防腐剤、防カビ剤、金属封鎖剤等が挙げられる。pH調整剤としては、アルコールアミン類、アンモニウム塩類、金属水酸化物等が挙げられる。また、比抵抗調製剤としては、有機塩類、無機塩類が挙げられる。金属封鎖剤としては、キレート剤等が挙げられる。 Further, when the image forming material of the present invention is an ink for an ink jet printer, the image forming material according to the present embodiment is conventionally known as an ink component in order to satisfy various conditions required for the ink jet printer system. May contain additives. Examples of such additives include pH adjusters, specific resistance adjusters, antioxidants, antiseptics, fungicides, and sequestering agents. Examples of the pH adjuster include alcohol amines, ammonium salts, metal hydroxides and the like. Examples of the specific resistance adjusting agent include organic salts and inorganic salts. Examples of the metal sequestering agent include chelating agents.
また、本発明の画像形成材料がインクジェットプリンター用インクである場合、噴封ノズル部の閉塞やインク吐出方向の変化等が生じない程度に、ポリビニルアルコール、ポリビニルピロリドン、カルボキシメチルセルロース、スチレン−アクリル酸樹脂、スチレン−マレイン酸樹脂等の水溶性樹脂を含有することもできる。 Further, when the image forming material of the present invention is an ink for an ink jet printer, polyvinyl alcohol, polyvinyl pyrrolidone, carboxymethyl cellulose, styrene-acrylic acid resin is used to such an extent that blocking of the jet nozzle part and change in the ink discharge direction do not occur. Water-soluble resins such as styrene-maleic acid resin can also be contained.
本発明の画像形成材料が活版印刷、オフセット印刷、フレキソ印刷、グラビア印刷又はシルク印刷用のインクである場合、当該画像形成材料はポリマーや有機溶剤を含有する油性インクの態様をとることができる。ポリマーとしては、一般的には、蛋白質、ゴム、セルロース類、シエラック、コパル、でん粉、ロジン等の天然樹脂;ビニル系樹脂、アクリル系樹脂、スチレン系樹脂、ポリオレフィン系樹脂、ノボラック型フェノール樹脂等の熱可塑性樹脂;レゾール型フェノール樹脂尿素樹脂、メラミン樹脂、ポリウレタン樹脂、エポキシ、不飽和ポリエステル等の熱硬化性樹脂等が挙げられる。また、有機溶媒としては、上記インクジェットプリンター用インクの説明において例示された有機溶媒が挙げられる。 When the image forming material of the present invention is an ink for letterpress printing, offset printing, flexographic printing, gravure printing, or silk printing, the image forming material can take the form of an oil-based ink containing a polymer or an organic solvent. Polymers generally include natural resins such as proteins, rubbers, celluloses, shellac, copal, starch, rosin; vinyl resins, acrylic resins, styrene resins, polyolefin resins, novolac phenol resins, etc. Thermoplastic resin; thermosetting resin such as resol type phenol resin urea resin, melamine resin, polyurethane resin, epoxy, unsaturated polyester, and the like. Moreover, as an organic solvent, the organic solvent illustrated in description of the said ink for inkjet printers is mentioned.
また、本発明の画像形成材料が活版印刷、オフセット印刷、フレキソ印刷、グラビア印刷又はシルク印刷用のインクである場合、当該画像形成材料は印刷皮膜の柔軟性や強度を向上させるための可塑剤、粘度調整、乾燥性向上のための溶剤、乾燥剤、粘度調整剤、分散剤、各種反応剤等の添加剤を更に含有することができる。 Further, when the image forming material of the present invention is an ink for letterpress printing, offset printing, flexographic printing, gravure printing or silk printing, the image forming material is a plasticizer for improving the flexibility and strength of the printed film, It may further contain additives such as a solvent for adjusting viscosity and improving drying property, a drying agent, a viscosity adjusting agent, a dispersing agent, and various reactants.
また本発明の画像形成材料は、安定化剤を更に含有してもよい。安定化剤は、励起状態の有機近赤外吸収色素からエネルギーを受け取るものであり、有機近赤外吸収色素の吸収帯よりも長波長側に吸収帯を有するものであることが好ましい。また、安定化剤は、一重項酸素による分解が起こり難く、本発明の造塩化合物と相溶性が高いことが好ましい。このような安定化剤としては、例えば、有機金属錯体化合物が挙げられ、中でもNi錯体化合物が特に好ましい。 The image forming material of the present invention may further contain a stabilizer. The stabilizer receives energy from the excited organic near-infrared absorbing dye, and preferably has an absorption band on the longer wavelength side than the absorption band of the organic near-infrared absorbing dye. The stabilizer is preferably not easily decomposed by singlet oxygen and highly compatible with the salt-forming compound of the present invention. Examples of such stabilizers include organometallic complex compounds, and Ni complex compounds are particularly preferable.
<画像形成材料の製造方法>
以下、本発明の画像形成材料の製造方法の一例について説明する。
例えば、分散状態で使用する場合、造塩化合物と分散剤とを混合し、その混合液について顔料化処理を行う方法が挙げられる。なお分散剤としては、トリトンXやアルキルベンゼンスルホン酸ナトリウム水溶液等の低分子系分散剤、ソルスパース等の高分子系分散剤等が挙げられる。上記混合液には、必要に応じて水を加えて濃度を調節してもよい。また、顔料化処理に使用する装置としては、ビーズミル加工装置が好適である。
<Method for producing image forming material>
Hereinafter, an example of the method for producing the image forming material of the present invention will be described.
For example, when used in a dispersed state, a method of mixing a salt-forming compound and a dispersant and subjecting the mixture to a pigmentation treatment can be mentioned. Examples of the dispersing agent include low molecular weight dispersing agents such as Triton X and sodium alkylbenzene sulfonate aqueous solutions, and high molecular weight dispersing agents such as Solsperse. You may adjust a density | concentration by adding water to the said liquid mixture as needed. Moreover, as an apparatus used for the pigmentation treatment, a bead mill processing apparatus is suitable.
<画像形成材料の評価方法>
本発明の造塩化合物は、400nm以上750nm以下の可視光波長領域における吸光度が十分に低く、かつ、750nm以上1000nm以下の近赤外光波長領域における吸光度が十分に高いものである。本発明の造塩化合物は、耐光性に優れるものである。したがって、本発明の造塩化合物を含有する本発明の画像形成材料は、情報の不可視性と不可視情報の読み取りやすさを両立することができ、更には不可視情報が記録された記録媒体における長期安定性を達成することが可能である。
<Evaluation method of image forming material>
The salt-forming compound of the present invention has sufficiently low absorbance in the visible light wavelength region of 400 nm or more and 750 nm or less, and sufficiently high absorbance in the near infrared light wavelength region of 750 nm or more and 1000 nm or less. The salt-forming compound of the present invention is excellent in light resistance. Therefore, the image forming material of the present invention containing the salt-forming compound of the present invention can achieve both invisibility of information and readability of invisible information, and furthermore, long-term stability in a recording medium on which invisible information is recorded. It is possible to achieve sex.
本発明の造塩化合物は、下記式(I)及び(II)で表される条件を満たすことが好ましい。下記式(I)及び(II)で表される条件を満たすことで、画像形成材料の色味によらず、情報の不可視性と不可視情報の読み取りやすさとを両立することが可能となり、さらに、不可視情報が記録された記録媒体における長期信頼性を実現することが可能となる。
0≦ΔE≦15 (I)
(100−R)≧75 (II)
[式(II)中、ΔEは下記式(III):
The salt-forming compound of the present invention preferably satisfies the conditions represented by the following formulas (I) and (II). By satisfying the conditions represented by the following formulas (I) and (II), it is possible to achieve both invisibility of information and readability of invisible information regardless of the color of the image forming material. Long-term reliability in a recording medium on which invisible information is recorded can be realized.
0 ≦ ΔE ≦ 15 (I)
(100-R) ≧ 75 (II)
[In the formula (II), ΔE represents the following formula (III):
式(III)
(式(III)中、L1、a1、b1はそれぞれ画像形成前における記録媒体表面のL値、a値、およびb値を示し、L2、a2、b2はそれぞれ前記画像形成材料を用いて付着量4g/m2の定着画像を記録媒体表面に形成した時の画像部におけるL値、a値、およびb値を示す。)
で表されるCIE1976L*a*b*表色系における色差を示し、式(II)中、R(単位:%)は前記画像部における波長850nmの赤外線反射率を示す。]
(In Formula (III), L 1 , a 1 , and b 1 represent the L value, a value, and b value of the surface of the recording medium before image formation, respectively, and L 2 , a 2 , and b 2 represent the image formation, respectively. (The L value, a value, and b value in the image area when a fixed image having an adhesion amount of 4 g / m 2 is formed on the surface of the recording medium using the material are shown.
In the formula (II), R (unit:%) represents the infrared reflectance at a wavelength of 850 nm in the image portion. ]
L1、a1、b1、L2、a2、b2は反射分光濃度計を用いて得ることができる。本発明におけるL1、a1、b1、L2、a2、b2は、反射分光濃度計としてエックスライト株式会社製、x−rite939を用いて測定されたものである。 L 1 , a 1 , b 1 , L 2 , a 2 , and b 2 can be obtained using a reflection spectral densitometer. L 1 , a 1 , b 1 , L 2 , a 2 , and b 2 in the present invention are measured by using x-rite 939 manufactured by X-Rite Co., Ltd. as a reflection spectral densitometer.
本発明の画像形成材料を用いて記録された不可視情報は、例えば750nm以上1000nm以下のいずれかの波長で発光する半導体レーザーまたは発光ダイオードを光学読み取り用の光源として用い、近赤外光に高い分光感度を有する汎用の受光素子を使用することにより、非常に簡易にかつ高感度に読み出すことが可能である。受光素子としては、例えばシリコンによる受光素子(CCD等)が挙げられる。 The invisible information recorded using the image forming material of the present invention is, for example, a semiconductor laser or a light emitting diode that emits light at any wavelength of 750 nm to 1000 nm as a light source for optical reading, and has a high spectral intensity in near infrared light. By using a general-purpose light receiving element having sensitivity, it is possible to read out very easily and with high sensitivity. An example of the light receiving element is a light receiving element (CCD or the like) made of silicon.
また、本発明の造塩化合物は、上記画像形成材料に限らず、例えば、省エネルギー用に熱線を遮断する近赤外線吸収フィルムや近赤外線吸収板、太陽光の選択的な利用を目的とする農業用近赤外線吸収フィルム、近赤外線の吸収熱を利用する記録媒体、電子機器用近赤外線カットフィルタ、写真用近赤外線フィルタ、保護めがね、サングラス、熱線遮断フィルム、レーザー樹脂溶着など、幅広い用途で利用可能である。 Further, the salt-forming compound of the present invention is not limited to the image forming material, but for example, a near-infrared absorbing film or a near-infrared absorbing plate that blocks heat rays for energy saving, and agricultural use for selective use of sunlight. Near-infrared absorbing film, recording medium using near-infrared absorption heat, near-infrared cut filter for electronic equipment, near-infrared filter for photography, protective glasses, sunglasses, heat ray blocking film, laser resin welding, etc. is there.
以下に、実施例により本発明をより具体的に説明するが、本発明はその要旨を超えない限り、以下の実施例に限定されるものではない。なお、実施例及び比較例中、「部」及び「%」とは「質量部」及び「質量%」をそれぞれ意味する。 EXAMPLES The present invention will be described more specifically with reference to the following examples. However, the present invention is not limited to the following examples unless it exceeds the gist. In Examples and Comparative Examples, “part” and “%” mean “part by mass” and “% by mass”, respectively.
(スクアリリウム[A]の同定方法)
本発明に用いたスクアリリウム[A]の同定には、元素分析およびMALDI TOF−MSスペクトルを用いた。元素分析は、パーキン・エルマー社製 2400 CHN Elemant Analyzerを用いた。MALDI TOF−MSスペクトルは、ブルカー・ダルトニクス社製MALDI質量分析装置autoflexIIIを用い、得られたマススペクトラムの分子イオンピークと、計算によって得られる質量数との一致をもって、得られた化合物の同定を行った。
(Identification method of squarylium [A])
Elemental analysis and MALDI TOF-MS spectrum were used for identification of squarylium [A] used in the present invention. Elemental analysis was performed using a Perkin Elmer 2400 CHN Elegant Analyzer. The MALDI TOF-MS spectrum uses the MALDI mass spectrometer “autoflex III” manufactured by Bruker Daltonics, Inc. to identify the obtained compound with the coincidence between the molecular ion peak of the obtained mass spectrum and the mass number obtained by calculation. It was.
(側鎖にカチオン性基を有する樹脂[B]の重量平均分子量(Mw))
本発明に用いた側鎖にカチオン性基を有する樹脂[B]の重量平均分子量(Mw)は、TSKgelカラム(東ソー社製)を用い、RI検出器を装備したGPC(東ソー社製、HLC−8120GPC)で、展開溶媒にTHFを用いて測定したポリスチレン換算の重量平均分子量(Mw)である。
(Weight average molecular weight (Mw) of resin [B] having a cationic group in the side chain)
The weight average molecular weight (Mw) of the resin [B] having a cationic group in the side chain used in the present invention is a GPC (manufactured by Tosoh Corp., HLC-) equipped with an RI detector using a TSKgel column (Tosoh Corp.). 8120 GPC), and a polystyrene-reduced weight average molecular weight (Mw) measured using THF as a developing solvent.
(側鎖にカチオン性基を有する樹脂[B]の4級アンモニウム塩価)
本発明に用いた側鎖にカチオン性基を有する樹脂[B]の4級アンモニウム塩価は、5%クロム酸カリウム水溶液を指示薬として、0.1Nの硝酸銀水溶液で滴定して求めた後、水酸化カリウムの当量に換算した。下記樹脂[B]の4級アンモニウム塩価は、固形分の4級アンモニウム塩価を示す。
(Quaternary ammonium salt value of resin [B] having a cationic group in the side chain)
The quaternary ammonium salt value of the resin [B] having a cationic group in the side chain used in the present invention was determined by titrating with a 0.1N silver nitrate aqueous solution using a 5% potassium chromate aqueous solution as an indicator. Converted to the equivalent of potassium oxide. The quaternary ammonium salt value of the following resin [B] indicates the quaternary ammonium salt value of the solid content.
<スクアリリウム[A]の製造方法>
(スクアリリウム[A−1]の製造)
トルエン400部に、1,8−ジアミノナフタレン40.0部、シクロヘキサノン25.1部、p−トルエンスルホン酸一水和物0.087部を混合し、窒素ガスの雰囲気中で加熱攪拌し、3時間還流させた。反応中に生成した水は共沸蒸留により系中から除去した。反応終了後、トルエンを蒸留して得られた暗茶色固体をアセトンで抽出し、アセトンとエタノールの混合溶媒から再結晶することにより精製した。得られた茶色固体を、トルエン240部とn−ブタノール160部の混合溶媒に溶解させ、3,4−ジヒドロキシ−3−シクロブテン−1,2−ジオン13.8部を加えて、窒素ガスの雰囲気中で加熱撹拌し、8時間還流反応させた。反応中に生成した水は共沸蒸留により系中から除去した。反応終了後、溶媒を蒸留し、得られた反応混合物を攪拌しながら、ヘキサン200部を加えた。得られた黒茶色沈殿物を濾別した後、順次ヘキサン、エタノールおよびアセトンで洗浄を行い、減圧下で乾燥させた。得られた黒茶色固体を、90%硫酸1000部に溶解させ、30度で5時間撹拌した。反応終了後、水10000部を撹拌しているところに反応液を滴下し、20度で1時間撹拌した。得られた沈殿物を濾別し、0.5%塩酸で洗浄を行い、減圧下で乾燥させ、スクアリリウム[A−1]70.9部(収率:92%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−1]であることを同定した。
<Method for producing squarylium [A]>
(Manufacture of squarylium [A-1])
To 400 parts of toluene, 40.0 parts of 1,8-diaminonaphthalene, 25.1 parts of cyclohexanone, and 0.087 part of p-toluenesulfonic acid monohydrate are mixed, heated and stirred in an atmosphere of nitrogen gas, 3 Reflux for hours. Water generated during the reaction was removed from the system by azeotropic distillation. After completion of the reaction, the dark brown solid obtained by distilling toluene was extracted with acetone and purified by recrystallization from a mixed solvent of acetone and ethanol. The obtained brown solid was dissolved in a mixed solvent of 240 parts of toluene and 160 parts of n-butanol, 13.8 parts of 3,4-dihydroxy-3-cyclobutene-1,2-dione was added, and an atmosphere of nitrogen gas was added. The mixture was heated and stirred in, and refluxed for 8 hours. Water generated during the reaction was removed from the system by azeotropic distillation. After completion of the reaction, the solvent was distilled off, and 200 parts of hexane was added while stirring the obtained reaction mixture. The resulting black-brown precipitate was filtered off, washed successively with hexane, ethanol and acetone and dried under reduced pressure. The obtained black-brown solid was dissolved in 1000 parts of 90% sulfuric acid and stirred at 30 degrees for 5 hours. After completion of the reaction, the reaction solution was added dropwise to 10000 parts of water which was being stirred, and stirred at 20 degrees for 1 hour. The resulting precipitate was filtered off, washed with 0.5% hydrochloric acid and dried under reduced pressure to obtain 70.9 parts of squarylium [A-1] (yield: 92%). As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-1].
スクアリリウム[A−1]
(スクアリリウム[A−2]の製造)
スクアリリウム[A−1]の製造で使用した90%硫酸1000部の代わりに、98%硫酸1000部を使用した以外は、スクアリリウム[A−1]の製造と同様の操作を行い、スクアリリウム[A−2]79.8部(収率:92%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−2]であることを同定した。
(Manufacture of squarylium [A-2])
The same operation as the production of squarylium [A-1] was carried out except that 1000 parts of 98% sulfuric acid was used instead of 1000 parts of 90% sulfuric acid used in the production of squarylium [A-1]. 2] 79.8 parts (yield: 92%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-2].
スクアリリウム[A−2]
(スクアリリウム[A−3]の製造)
スクアリリウム[A−1]の製造で使用した90%硫酸1000部の代わりに、101%硫酸1000部を使用した以外は、スクアリリウム[A−1]の製造と同様の操作を行い、スクアリリウム[A−3]87.8部(収率:91%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−3]であることを同定した。
(Manufacture of squarylium [A-3])
The same operation as the production of squarylium [A-1] was performed except that 1000 parts of 101% sulfuric acid was used instead of 1000 parts of 90% sulfuric acid used in the production of squarylium [A-1]. 3] 87.8 parts (yield: 91%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-3].
スクアリリウム[A−3]
(スクアリリウム[A−4]の製造)
スクアリリウム[A−1]の製造で使用した90%硫酸1000部の代わりに、104.5%硫酸1000部を使用した以外は、スクアリリウム[A−1]の製造と同様の操作を行い、スクアリリウム[A−4]95.6部(収率:90%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−4]であることを同定した。
(Manufacture of squarylium [A-4])
The same operation as the production of squarylium [A-1] was performed except that 1000 parts of 104.5% sulfuric acid was used instead of 1000 parts of 90% sulfuric acid used in the production of squarylium [A-1]. A-4] 95.6 parts (yield: 90%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-4].
スクアリリウム[A−4]
(スクアリリウム[A−5]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、2,6−ジメチルシクロヘキサノン32.2部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−5]89.8部(収率:96%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−5]であることを同定した。
(Manufacture of squarylium [A-5])
The same operation as in the production of squarylium [A-2] was performed except that 32.2 parts of 2,6-dimethylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. , 89.8 parts (yield: 96%) of squarylium [A-5] were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-5].
スクアリリウム[A−5]
(スクアリリウム[A−6]の製造)
スクアリリウム[A−1]の製造で使用したシクロヘキサノン25.1部の代わりに、3,5−ジメチルシクロヘキサノン32.2部を使用した以外は、スクアリリウム[A−1]の製造と同様の操作を行い、スクアリリウム[A−6]82.2部(収率:98%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−6]であることを同定した。
(Production of squarylium [A-6])
The same operation as in the production of squarylium [A-1] was performed except that 32.2 parts of 3,5-dimethylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-1]. , 82.2 parts (yield: 98%) of squarylium [A-6] was obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-6].
スクアリリウム[A−6]
(スクアリリウム[A−7]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、3,5−ジメチルシクロヘキサノン32.2部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−7]90.8部(収率:97%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−7]であることを同定した。
(Manufacture of squarylium [A-7])
The same operation as in the production of squarylium [A-2] was performed except that 32.2 parts of 3,5-dimethylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. , 90.8 parts of squarylium [A-7] (yield: 97%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-7].
スクアリリウム[A−7]
(スクアリリウム[A−8]の製造)
スクアリリウム[A−3]の製造で使用したシクロヘキサノン25.1部の代わりに、3,5−ジメチルシクロヘキサノン32.2部を使用した以外は、スクアリリウム[A−3]の製造と同様の操作を行い、スクアリリウム[A−8]98.1部(収率:95%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−8]であることを同定した。
(Manufacture of squarylium [A-8])
The same operation as in the production of squarylium [A-3] was carried out except that 32.2 parts of 3,5-dimethylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-3]. , 98.1 parts (yield: 95%) of squarylium [A-8] were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-8].
スクアリリウム[A−8]
(スクアリリウム[A−9]の製造)
スクアリリウム[A−4]の製造で使用したシクロヘキサノン25.1部の代わりに、3,5−ジメチルシクロヘキサノン32.2部を使用した以外は、スクアリリウム[A−4]の製造と同様の操作を行い、スクアリリウム[A−9]106.2部(収率:94%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−9]であることを同定した。
(Manufacture of squarylium [A-9])
The same operation as in the production of squarylium [A-4] was carried out except that 32.2 parts of 3,5-dimethylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-4]. , 106.2 parts (yield: 94%) of squarylium [A-9] were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-9].
スクアリリウム[A−9]
(スクアリリウム[A−10]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、4−メチルシクロヘキサノン28.6部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−10]85.6部(収率:95%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−10]であることを同定した。
(Manufacture of squarylium [A-10])
The same operation as the production of squarylium [A-2] was carried out except that 28.6 parts of 4-methylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. [A-10] 85.6 parts (yield: 95%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-10].
スクアリリウム[A−10]
(スクアリリウム[A−11]の製造)
スクアリリウム[A−1]の製造で使用したシクロヘキサノン25.1部の代わりに、3,3,5−トリメチルシクロヘキサノン35.8部を使用した以外は、スクアリリウム[A−1]の製造と同様の操作を行い、スクアリリウム[A−11]81.1部(収率:93%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−11]であることを同定した。
(Manufacture of squarylium [A-11])
The same operation as the production of squarylium [A-1] except that 35.8 parts of 3,3,5-trimethylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-1]. To obtain 81.1 parts of squarylium [A-11] (yield: 93%). As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-11].
スクアリリウム[A−11]
(スクアリリウム[A−12]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、3,3,5−トリメチルシクロヘキサノン35.8部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−12]90.2部(収率:93%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−12]であることを同定した。
(Manufacture of squarylium [A-12])
The same operation as the production of squarylium [A-2] except that 35.8 parts of 3,3,5-trimethylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. To obtain 90.2 parts (yield: 93%) of squarylium [A-12]. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-12].
スクアリリウム[A−12]
(スクアリリウム[A−13]の製造)
スクアリリウム[A−3]の製造で使用したシクロヘキサノン25.1部の代わりに、3,3,5−トリメチルシクロヘキサノン35.8部を使用した以外は、スクアリリウム[A−3]の製造と同様の操作を行い、スクアリリウム[A−13]98.1部(収率:92%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−13]であることを同定した。
(Manufacture of squarylium [A-13])
The same operation as the production of squarylium [A-3] except that 35.8 parts of 3,3,5-trimethylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-3]. To obtain 98.1 parts of squarylium [A-13] (yield: 92%). As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-13].
スクアリリウム[A−13]
(スクアリリウム[A−14]の製造)
スクアリリウム[A−4]の製造で使用したシクロヘキサノン25.1部の代わりに、3,3,5−トリメチルシクロヘキサノン35.8部を使用した以外は、スクアリリウム[A−4]の製造と同様の操作を行い、スクアリリウム[A−14]104.8部(収率:90%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−14]であることを同定した。
(Manufacture of squarylium [A-14])
The same operation as the production of squarylium [A-4] except that 35.8 parts of 3,3,5-trimethylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-4]. To obtain 104.8 parts of squarylium [A-14] (yield: 90%). As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-14].
スクアリリウム[A−14]
(スクアリリウム[A−15]の製造)
スクアリリウム[A−1]の製造で使用したシクロヘキサノン25.1部の代わりに、3,5−ジエチルシクロヘキサノン39.4部を使用した以外は、スクアリリウム[A−1]の製造と同様の操作を行い、スクアリリウム[A−15]86.1部(収率:95%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−15]であることを同定した。
(Manufacture of squarylium [A-15])
The same operation as in the production of squarylium [A-1] was carried out except that 39.4 parts of 3,5-diethylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-1]. , 86.1 parts (yield: 95%) of squarylium [A-15] were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-15].
スクアリリウム[A−15]
(スクアリリウム[A−16]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、3,5−ジエチルシクロヘキサノン39.4部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−16]94.3部(収率:94%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−16]であることを同定した。
(Manufacture of squarylium [A-16])
The same operation as in the production of squarylium [A-2] was conducted except that 39.4 parts of 3,5-diethylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. , 94.3 parts of squarylium [A-16] (yield: 94%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-16].
スクアリリウム[A−16]
(スクアリリウム[A−17]の製造)
スクアリリウム[A−3]の製造で使用したシクロヘキサノン25.1部の代わりに、3,5−ジエチルシクロヘキサノン39.4部を使用した以外は、スクアリリウム[A−3]の製造と同様の操作を行い、スクアリリウム[A−17]103.5部(収率:94%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−17]であることを同定した。
(Manufacture of squarylium [A-17])
The same operation as in the production of squarylium [A-3] was carried out except that 39.4 parts of 3,5-diethylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-3]. , 103.5 parts of squarylium [A-17] (yield: 94%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-17].
スクアリリウム[A−17]
(スクアリリウム[A−18]の製造)
スクアリリウム[A−4]の製造で使用したシクロヘキサノン25.1部の代わりに、3,5−ジエチルシクロヘキサノン39.4部を使用した以外は、スクアリリウム[A−4]の製造と同様の操作を行い、スクアリリウム[A−18]110.2部(収率:92%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−18]であることを同定した。
(Manufacture of squarylium [A-18])
The same operation as in the production of squarylium [A-4] was carried out except that 39.4 parts of 3,5-diethylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-4]. , 110.2 parts (yield: 92%) of squarylium [A-18] were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-18].
スクアリリウム[A−18]
(スクアリリウム[A−19]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、5−イソプロピル−2−メチルシクロヘキサノン39.4部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−19]93.3部(収率:93%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−19]であることを同定した。
(Manufacture of squarylium [A-19])
The same operation as the production of squarylium [A-2] except that 39.4 parts of 5-isopropyl-2-methylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. And 93.3 parts of squarylium [A-19] (yield: 93%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-19].
スクアリリウム[A−19]
(スクアリリウム[A−20]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、2−シクロヘキシルシクロヘキサノン46.0部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−20]97.1部(収率:91%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−20]であることを同定した。
(Manufacture of squarylium [A-20])
The same operation as in the production of squarylium [A-2] was conducted except that 46.0 parts of 2-cyclohexylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. [A-20] 97.1 parts (yield: 91%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-20].
スクアリリウム[A−20]
(スクアリリウム[A−21]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、2−ノルボルナノン28.1部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−21]82.5部(収率:92%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−21]であることを同定した。
(Manufacture of squarylium [A-21])
Except for using 28.1 parts of 2-norbornanone instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2], the same operation as in the production of squarylium [A-2] was performed. A-21] was obtained 82.5 parts (yield: 92%). As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-21].
スクアリリウム[A−21]
(スクアリリウム[A−22]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、スピロ[5.5]ウンデカン−1−オン42.5部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−22]97.1部(収率:94%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−22]であることを同定した。
(Production of squarylium [A-22])
The production of squarylium [A-2] was performed except that 42.5 parts of spiro [5.5] undecan-1-one was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. The same operation was performed to obtain 97.1 parts of squarylium [A-22] (yield: 94%). As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-22].
スクアリリウム[A−22]
(スクアリリウム[A−23]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、3−メチル−3,4,4a,5,8,8a−ヘキサヒドロナフタレン−1(2H)−オン41.9部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−23]93.5部(収率:94%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−23]であることを同定した。
(Manufacture of squarylium [A-23])
Instead of 25.1 parts of cyclohexanone used in the preparation of squarylium [A-2], 41.9 parts of 3-methyl-3,4,4a, 5,8,8a-hexahydronaphthalen-1 (2H) -one Was used in the same manner as in the production of squarylium [A-2] to obtain 93.5 parts of squarylium [A-23] (yield: 94%). As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-23].
スクアリリウム[A−23]
(スクアリリウム[A−24]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、3−(2−クロロエチル)シクロヘキサノン41.0部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−24]95.8部(収率:94%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−24]であることを同定した。
(Manufacture of squarylium [A-24])
The same operation as the production of squarylium [A-2] except that 41.0 parts of 3- (2-chloroethyl) cyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. To obtain 95.8 parts of squarylium [A-24] (yield: 94%). As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-24].
スクアリリウム[A−24]
(スクアリリウム[A−25]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、3,5−ジ(トリフルオロメチル)シクロヘキサノン59.8部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−25]111.4部(収率:93%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−25]であることを同定した。
(Manufacture of squarylium [A-25])
The production of squarylium [A-2] was performed except that 59.8 parts of 3,5-di (trifluoromethyl) cyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. The same operation was performed to obtain 111.4 parts of squarylium [A-25] (yield: 93%). As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-25].
スクアリリウム[A−25]
(スクアリリウム[A−26]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、2−フェニルシクロヘキサノン44.5部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−26]96.8部(収率:92%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−26]であることを同定した。
(Manufacture of squarylium [A-26])
The same operation as the production of squarylium [A-2] was carried out except that 44.5 parts of 2-phenylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. [A-26] 96.8 parts (yield: 92%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-26].
スクアリリウム[A−26]
(スクアリリウム[A−27]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、4−p−トリルシクロヘキサノン48.1部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−27]102.1部(収率:94%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−27]であることを同定した。
(Manufacture of squarylium [A-27])
The same operation as in the production of squarylium [A-2] was carried out except that 48.1 parts of 4-p-tolylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. , 102.1 parts of squarylium [A-27] (yield: 94%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-27].
スクアリリウム[A−27]
(スクアリリウム[A−28]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、4−ベンジルシクロヘキサノン48.1部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−28]103.2部(収率:95%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−28]であることを同定した。
(Manufacture of squarylium [A-28])
The same operation as the production of squarylium [A-2] was carried out except that 48.1 parts of 4-benzylcyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. [A-28] 103.2 parts (yield: 95%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-28].
スクアリリウム[A−28]
(スクアリリウム[A−29]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、4−エトキシシクロヘキサノン36.3部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−29]88.7部(収率:91%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−29]であることを同定した。
(Manufacture of squarylium [A-29])
The same operation as the production of squarylium [A-2] was carried out except that 36.3 parts of 4-ethoxycyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. [A-29] 88.7 parts (yield: 91%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-29].
スクアリリウム[A−29]
(スクアリリウム[A−30]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、2,6−ジ(トリフルオロメトキシ)シクロヘキサノン68.0部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−30]118.6部(収率:93%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−30]であることを同定した。
(Manufacture of squarylium [A-30])
The production of squarylium [A-2] was performed except that 68.0 parts of 2,6-di (trifluoromethoxy) cyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. The same operation was performed to obtain 118.6 parts (yield: 93%) of squarylium [A-30]. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-30].
スクアリリウム[A−30]
(スクアリリウム[A−31]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、4−フェノキシシクロヘキサノン48.6部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−31]100.4部(収率:92%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−31]であることを同定した。
(Manufacture of squarylium [A-31])
The same operation as the production of squarylium [A-2] was carried out except that 48.6 parts of 4-phenoxycyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. [A-31] 100.4 parts (yield: 92%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-31].
スクアリリウム[A−31]
(スクアリリウム[A−32]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、N−エチル−3−オキソシクロヘキサン−1−スルホアミド52.4部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−32]106.0部(収率:94%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−32]であることを同定した。
(Manufacture of squarylium [A-32])
Production of squarylium [A-2] except that 52.4 parts of N-ethyl-3-oxocyclohexane-1-sulfoamide was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. The same operation was carried out to obtain 106.0 parts of squarylium [A-32] (yield: 94%). As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-32].
スクアリリウム[A−32]
(スクアリリウム[A−33]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、4−オキソシクロヘキサンカルボン酸36.3部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−33]87.7部(収率:90%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−33]であることを同定した。
(Manufacture of squarylium [A-33])
The same operation as in the production of squarylium [A-2] was performed except that 36.3 parts of 4-oxocyclohexanecarboxylic acid was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. , 87.7 parts (yield: 90%) of squarylium [A-33] were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-33].
スクアリリウム[A−33]
(スクアリリウム[A−34]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、2−オキソシクロヘキサンカルボン酸エチル43.5部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−34]96.9部(収率:93%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−34]であることを同定した。
(Manufacture of squarylium [A-34])
The same operation as in the production of squarylium [A-2] was conducted except that 43.5 parts of ethyl 2-oxocyclohexanecarboxylate was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. And 96.9 parts of squarylium [A-34] (yield: 93%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-34].
スクアリリウム[A−34]
(スクアリリウム[A−35]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、4−オキソ−N−プロピルシクロヘキサンカルボキシアミド46.8部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−35]102.0(収率:95%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−35]であることを同定した。
(Manufacture of squarylium [A-35])
Similar to the production of squarylium [A-2] except that 46.8 parts of 4-oxo-N-propylcyclohexanecarboxamide were used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. Then, squarylium [A-35] 102.0 (yield: 95%) was obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-35].
スクアリリウム[A−35]
(スクアリリウム[A−36]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、4−アミノシクロヘキサノン28.9部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−36]85.0部(収率:94%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−36]であることを同定した。
(Manufacture of squarylium [A-36])
The same operation as the production of squarylium [A-2] was carried out except that 28.9 parts of 4-aminocyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. [A-36] 85.0 parts (yield: 94%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-36].
スクアリリウム[A−36]
(スクアリリウム[A−37]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、4−(ジメチルアミノ)シクロヘキサノン36.1部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−37]92.3部(収率:95%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−37]であることを同定した。
(Manufacture of squarylium [A-37])
The same operation as in the production of squarylium [A-2] was conducted except that 36.1 parts of 4- (dimethylamino) cyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. And 92.3 parts (yield: 95%) of squarylium [A-37] were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-37].
スクアリリウム[A−37]
(スクアリリウム[A−38]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、4−オキソシクロヘキサンカルボニトリル31.4部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−38]85.4部(収率:92%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−38]であることを同定した。
(Manufacture of squarylium [A-38])
The same operation as in the production of squarylium [A-2] was carried out except that 31.4 parts of 4-oxocyclohexanecarbonitrile was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. , 85.4 parts of squarylium [A-38] (yield: 92%). As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-38].
スクアリリウム[A−38]
(スクアリリウム[A−39]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、4−ニトロシクロヘキサノン36.6部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−39]89.9部(収率:92%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−39]であることを同定した。
(Manufacture of squarylium [A-39])
The same operation as the production of squarylium [A-2] was carried out except that 36.6 parts of 4-nitrocyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. [A-39] 89.9 parts (yield: 92%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-39].
スクアリリウム[A−39]
(スクアリリウム[A−40]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、3,5−ジフルオロシクロヘキサノン34.3部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−40]88.8部(収率:93%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−40]であることを同定した。
(Manufacture of squarylium [A-40])
The same operation as in the production of squarylium [A-2] was conducted except that 34.3 parts of 3,5-difluorocyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. , 88.8 parts of squarylium [A-40] (yield: 93%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-40].
スクアリリウム[A−40]
(スクアリリウム[A−41]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、2−クロロシクロヘキサノン33.9部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−41]87.5部(収率:92%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−41]であることを同定した。
(Manufacture of squarylium [A-41])
The same operation as the production of squarylium [A-2] was carried out except that 33.9 parts of 2-chlorocyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. [A-41] 87.5 parts (yield: 92%) were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-41].
スクアリリウム[A−41]
(スクアリリウム[A−42]の製造)
スクアリリウム[A−2]の製造で使用したシクロヘキサノン25.1部の代わりに、3,3−ジブロモシクロヘキサノン65.4部を使用した以外は、スクアリリウム[A−2]の製造と同様の操作を行い、スクアリリウム[A−42]116.3部(収率:93%)を得た。TOF−MSによる質量分析および元素分析の結果、スクアリリウム[A−42]であることを同定した。
(Manufacture of squarylium [A-42])
The same operation as in the production of squarylium [A-2] was carried out except that 65.4 parts of 3,3-dibromocyclohexanone was used instead of 25.1 parts of cyclohexanone used in the production of squarylium [A-2]. , 116.3 parts (yield: 93%) of squarylium [A-42] were obtained. As a result of mass spectrometry and elemental analysis by TOF-MS, it was identified as squarylium [A-42].
スクアリリウム[A−42]
以上、製造例で合成したスクアリリウム[A−1]〜[A−42]において、質量分析および元素分析を行った結果を表1および表2に示す。 Tables 1 and 2 show the results of mass spectrometry and elemental analysis of squarylium [A-1] to [A-42] synthesized in the production examples.
<側鎖にカチオン性基を有する樹脂[B]の調製方法>
(側鎖にカチオン性基を有する樹脂[B−1]の調製)
温度計、攪拌機、蒸留管、冷却器を具備した4つ口セパラブルフラスコに、メチルエチルケトン67.3 部を仕込み窒素気流下で75 ℃ に昇温した。別途、メチルメタクリレート33.2部、n−ブチルメタクリレート27.3部、2−エチルヘキシルメタクリレート27.3部、メタクリル酸ジメチルアミノエチルメチルクロライド塩12.2部、2,2'−アゾビス(2,4−ジメチルバレロニトリル)を6.5部、およびメチルエチルケトン25.1部を均一にした後、滴下ロートに仕込み、4つ口セパラブルフラスコに取り付け、2時間かけて滴下した。滴下終了2時間後、固形分から重合収率が98%以上であり、重量平均分子量(Mw)が、7500である事を確認し、50℃へ冷却した。その後、イソプロピルアルコールを72部加え、樹脂成分が40重量%の側鎖にカチオン性基を有する樹脂[B−1]を得た。得られた樹脂のアンモニウム塩価は33mgKOH/gであった。
<Preparation Method of Resin [B] Having Cationic Group in Side Chain>
(Preparation of resin [B-1] having a cationic group in the side chain)
Into a four-necked separable flask equipped with a thermometer, a stirrer, a distillation tube, and a condenser, 67.3 parts of methyl ethyl ketone was charged and heated to 75 ° C. under a nitrogen stream. Separately, 33.2 parts of methyl methacrylate, 27.3 parts of n-butyl methacrylate, 27.3 parts of 2-ethylhexyl methacrylate, 12.2 parts of dimethylaminoethyl methyl chloride salt, 2,2′-azobis (2,4 -Dimethylvaleronitrile) 6.5 parts and 21.5 parts of methyl ethyl ketone were homogenized, charged into a dropping funnel, attached to a four-necked separable flask, and dropped over 2 hours. Two hours after the completion of dropping, it was confirmed that the polymerization yield was 98% or more from the solid content and the weight average molecular weight (Mw) was 7500, and the mixture was cooled to 50 ° C. Thereafter, 72 parts of isopropyl alcohol was added to obtain a resin [B-1] having a cationic group in the side chain of 40% by weight of the resin component. The ammonium salt value of the obtained resin was 33 mgKOH / g.
(側鎖にカチオン性基を有する樹脂[B−2]の調製)
温度計、攪拌機、蒸留管、冷却器を具備した4つ口セパラブルフラスコに、メチルエチルケトン67.3 部を仕込み窒素気流下で75 ℃ に昇温した。別途、メチルメタクリレート22.4部、n−ブチルメタクリレート16.7部、2−エチルヘキシルメタクリレート27.3部、ヒドロキエチルメタクリレート15.0部、メタクリル酸2.5部、t−ブチルメタクリレート1.3部、イソブチルメタクリレート1.3部、シクロヘキシルメタクリレート1.3部、メタクリル酸ジメチルアミノエチルメチルクロライド塩12.2部、2,2'−アゾビス(2,4−ジメチルバレロニトリル)を6.5部、およびメチルエチルケトン25.1部を均一にした後、滴下ロートに仕込み、4つ口セパラブルフラスコに取り付け、2時間かけて滴下した。滴下終了2時間後、固形分から重合収率が98%以上であり、重量平均分子量(Mw)が、7950である事を確認し、50℃へ冷却した。その後、イソプロピルアルコールを72部加え、樹脂成分が40重量%の側鎖にカチオン性基を有する樹脂[B−2]を得た。得られた樹脂のアンモニウム塩価は33mgKOH/gであった。
(Preparation of resin [B-2] having a cationic group in the side chain)
Into a four-necked separable flask equipped with a thermometer, a stirrer, a distillation tube, and a condenser, 67.3 parts of methyl ethyl ketone was charged and heated to 75 ° C. under a nitrogen stream. Separately, 22.4 parts of methyl methacrylate, 16.7 parts of n-butyl methacrylate, 27.3 parts of 2-ethylhexyl methacrylate, 15.0 parts of hydroxyethyl methacrylate, 2.5 parts of methacrylic acid, 1.3 parts of t-butyl methacrylate 1.3 parts of isobutyl methacrylate, 1.3 parts of cyclohexyl methacrylate, 12.2 parts of dimethylaminoethyl methyl chloride salt, 6.5 parts of 2,2′-azobis (2,4-dimethylvaleronitrile), and After making 25.1 parts of methyl ethyl ketone uniform, it was charged in a dropping funnel, attached to a four-necked separable flask, and dropped over 2 hours. Two hours after the completion of the dropwise addition, it was confirmed that the polymerization yield was 98% or more from the solid content and the weight average molecular weight (Mw) was 7950, and the mixture was cooled to 50 ° C. Thereafter, 72 parts of isopropyl alcohol was added to obtain a resin [B-2] having a cationic group in the side chain of 40% by weight of the resin component. The ammonium salt value of the obtained resin was 33 mgKOH / g.
(側鎖にカチオン性基を有する樹脂[B−3]の調製)
温度計、攪拌機、蒸留管、冷却器を具備した4つ口セパラブルフラスコに、メチルエチルケトン67.3 部を仕込み窒素気流下で75 ℃ に昇温した。別途、メチルメタクリレート21.0部、n−ブチルメタクリレート27.3部、2−エチルヘキシルメタクリレート27.3部、メタクリル酸ジメチルアミノエチルメチルクロライド塩22.4部、2,2'−アゾビス(2,4−ジメチルバレロニトリル)を6.5部、およびメチルエチルケトン25.1部を均一にした後、滴下ロートに仕込み、4つ口セパラブルフラスコに取り付け、2時間かけて滴下した。滴下終了2時間後、固形分から重合収率が98%以上であり、重量平均分子量(Mw)が、7640である事を確認し、50℃へ冷却した。その後、イソプロピルアルコールを72部加え、樹脂成分が40重量%の側鎖にカチオン性基を有する樹脂[B−3]を得た。得られた樹脂のアンモニウム塩価は66mgKOH/gであった。
(Preparation of resin [B-3] having a cationic group in the side chain)
Into a four-necked separable flask equipped with a thermometer, a stirrer, a distillation tube, and a condenser, 67.3 parts of methyl ethyl ketone was charged and heated to 75 ° C. under a nitrogen stream. Separately, 21.0 parts of methyl methacrylate, 27.3 parts of n-butyl methacrylate, 27.3 parts of 2-ethylhexyl methacrylate, 22.4 parts of dimethylaminoethyl methyl chloride salt, 2,2′-azobis (2,4 -Dimethylvaleronitrile) 6.5 parts and 21.5 parts of methyl ethyl ketone were homogenized, charged into a dropping funnel, attached to a four-necked separable flask, and dropped over 2 hours. Two hours after the completion of the dropwise addition, it was confirmed that the polymerization yield was 98% or more from the solid content and the weight average molecular weight (Mw) was 7640, and the mixture was cooled to 50 ° C. Thereafter, 72 parts of isopropyl alcohol was added to obtain a resin [B-3] having a cationic group in the side chain of 40% by weight of the resin component. The ammonium salt value of the obtained resin was 66 mgKOH / g.
(側鎖にカチオン性基を有する樹脂[B−4]の調製)
温度計、攪拌機、蒸留管、冷却器を具備した4つ口セパラブルフラスコに、イソプロピルアルコール62.4 部を仕込み、窒素気流下で75 ℃ に昇温した。別途、メチルメタクリレート16.0部、ブチルメタクリレート17.0部、スチレン16.0部、メタクリル酸ジメチルアミノエチルメチルクロライド塩51.0部、2,2'−アゾビス(2,4−ジメチルバレロニトリル)を6部、およびメチルエチルケトン25.0部を均一にした後、滴下ロートに仕込み、4つ口セパラブルフラスコに取り付け、2時間かけて滴下した。滴下終了2時間後、固形分から重合収率が98%以上であり、重量平均分子量(Mw)が、7050である事を確認し、50℃へ冷却した。その後、イソプロピルアルコールを65部加え、樹脂成分が40重量%の側鎖にカチオン性基を有する樹脂[B−7]を得た。得られた樹脂のアンモニウム塩価は138mgKOH/gであった。
(Preparation of resin [B-4] having a cationic group in the side chain)
Into a four-necked separable flask equipped with a thermometer, a stirrer, a distillation tube, and a condenser, 62.4 parts of isopropyl alcohol was charged and heated to 75 ° C. under a nitrogen stream. Separately, 16.0 parts of methyl methacrylate, 17.0 parts of butyl methacrylate, 16.0 parts of styrene, 51.0 parts of dimethylaminoethyl methyl chloride salt, 2,2′-azobis (2,4-dimethylvaleronitrile) 6 parts and 25.0 parts of methyl ethyl ketone were homogenized, charged into a dropping funnel, attached to a four-necked separable flask, and dropped over 2 hours. Two hours after the completion of the dropping, it was confirmed that the polymerization yield was 98% or more from the solid content and the weight average molecular weight (Mw) was 7050, and the mixture was cooled to 50 ° C. Thereafter, 65 parts of isopropyl alcohol was added to obtain a resin [B-7] having a cationic group in the side chain of 40% by weight of the resin component. The ammonium salt value of the obtained resin was 138 mgKOH / g.
(側鎖にカチオン性基を有する樹脂[B−5]の調製)
温度計、攪拌機、蒸留管、冷却器を具備した4つ口セパラブルフラスコに、イソプロピルアルコール62.4 部を仕込み、窒素気流下で75 ℃ に昇温した。別途、メチルメタクリレート35.5部、ブチルメタクリレート30.0部、2−エチルヘキシルアクリレート16.8部、メタクリル酸ジメチルアミノプロピルメチルクロライド塩17.7部、2,2'−アゾビス(2,4−ジメチルバレロニトリル)を5.7部、およびメチルエチルケトン15.6部を均一にした後、滴下ロートに仕込み、4つ口セパラブルフラスコに取り付け、2時間かけて滴下した。滴下終了2時間後、固形分から重合収率が98%以上であり、重量平均分子量(Mw)が、7420である事を確認し、50℃へ冷却した。その後、イソプロピルアルコールを72部加え、樹脂成分が40重量%の側鎖にカチオン性基を有する樹脂[B−2]を得た。得られた樹脂のアンモニウム塩価は45mgKOH/gであった。
(Preparation of resin [B-5] having a cationic group in the side chain)
Into a four-necked separable flask equipped with a thermometer, a stirrer, a distillation tube, and a condenser, 62.4 parts of isopropyl alcohol was charged and heated to 75 ° C. under a nitrogen stream. Separately, 35.5 parts of methyl methacrylate, 30.0 parts of butyl methacrylate, 16.8 parts of 2-ethylhexyl acrylate, 17.7 parts of dimethylaminopropylmethyl chloride methacrylate, 2,2′-azobis (2,4-dimethyl) 5.7 parts of valeronitrile) and 15.6 parts of methyl ethyl ketone were homogenized, charged into a dropping funnel, attached to a four-necked separable flask, and dropped over 2 hours. Two hours after the completion of the dropwise addition, it was confirmed that the polymerization yield was 98% or more from the solid content and the weight average molecular weight (Mw) was 7420, and the mixture was cooled to 50 ° C. Thereafter, 72 parts of isopropyl alcohol was added to obtain a resin [B-2] having a cationic group in the side chain of 40% by weight of the resin component. The ammonium salt value of the obtained resin was 45 mgKOH / g.
(側鎖にカチオン性基を有する樹脂[B−6]の調製)
温度計、攪拌機、蒸留管、冷却器を具備した4つ口セパラブルフラスコに、メチルエチルケトン67.3 部を仕込み窒素気流下で75 ℃ に昇温した。別途、イソボルニルメタクリレート34.7部、n−ブチルメタクリレート1.7部、ヒドロキエチルメタクリレート30.0部、メタクリル酸2.5部、t−ブチルメタクリレート16.3部、イ
ソブチルメタクリレート2.5部、シクロヘキシルメタクリレート2.3部、ジメチルアミノエチルメタクリレート10.0部、2,2'−アゾビス(2,4−ジメチルバレロニトリル)を6.5部、およびメチルエチルケトン25.1部を均一にした後、滴下ロートに仕込み、4つ口セパラブルフラスコに取り付け、2時間かけて滴下した。滴下終了2時間後、固形分から重合収率が98%以上であり、重量平均分子量(Mw)が、6830である事を確認し、50℃へ冷却した。ここへ、塩化メチル3.2部、エタノール22.0 部を追加し、50℃で2時間反応させた後、1時間かけて80℃まで加温し、更に、2時間反応させた。このようにして樹脂成分が47重量%の側鎖にカチオン性基を有する樹脂[B−6]を得た。得られた樹脂のアンモニウム塩価は34mgKOH/gであった。
(Preparation of resin [B-6] having a cationic group in the side chain)
Into a four-necked separable flask equipped with a thermometer, a stirrer, a distillation tube, and a condenser, 67.3 parts of methyl ethyl ketone was charged and heated to 75 ° C. under a nitrogen stream. Separately, 34.7 parts of isobornyl methacrylate, 1.7 parts of n-butyl methacrylate, 30.0 parts of hydroxyethyl methacrylate, 2.5 parts of methacrylic acid, 16.3 parts of t-butyl methacrylate, 2.5 parts of isobutyl methacrylate , 2.3 parts of cyclohexyl methacrylate, 10.0 parts of dimethylaminoethyl methacrylate, 6.5 parts of 2,2′-azobis (2,4-dimethylvaleronitrile), and 25.1 parts of methyl ethyl ketone, The mixture was placed in a dropping funnel, attached to a four-necked separable flask, and dropped over 2 hours. Two hours after the completion of the dropwise addition, it was confirmed that the polymerization yield was 98% or more from the solid content and the weight average molecular weight (Mw) was 6830, and the mixture was cooled to 50 ° C. To this, 3.2 parts of methyl chloride and 22.0 parts of ethanol were added, reacted at 50 ° C. for 2 hours, heated to 80 ° C. over 1 hour, and further reacted for 2 hours. Thus, a resin [B-6] having a cationic group in the side chain of 47% by weight of the resin component was obtained. The ammonium salt value of the obtained resin was 34 mgKOH / g.
(側鎖にカチオン性基を有する樹脂[B−7]の調製)
温度計、攪拌機、蒸留管、冷却器を具備した4つ口セパラブルフラスコに、メチルエチルケトン67.3 部を仕込み窒素気流下で75 ℃ に昇温した。別途、メチルメタクリレート60.0部、n−ブチルメタクリレート10.0部、2−イソシアナトエチルメタクリレート10.0部、N,N−ジメチルアミノメチルスチレン20.0部、2,2'−アゾビス(2,4−ジメチルバレロニトリル)を6.7部、およびメチルエチルケトン25.1部を均一にした後、滴下ロートに仕込み、4つ口セパラブルフラスコに取り付け、2時間かけて滴下した。滴下終了2時間後、固形分から重合収率が98%以上であり、重量平均分子量(Mw)が、6770である事を確認し、50℃へ冷却した。ここへ、塩化ベンジル15.7部、エタノール22.0 部を追加し、50℃で2時間反応させた後、1時間かけて80℃まで加温し、更に、2時間反応させた。このようにして樹脂成分が50重量%の側鎖にカチオン性基を有する樹脂[B−7]を得た。得られた樹脂のアンモニウム塩価は60mgKOH/gであった。
(Preparation of resin [B-7] having a cationic group in the side chain)
Into a four-necked separable flask equipped with a thermometer, a stirrer, a distillation tube, and a condenser, 67.3 parts of methyl ethyl ketone was charged and heated to 75 ° C. under a nitrogen stream. Separately, 60.0 parts of methyl methacrylate, 10.0 parts of n-butyl methacrylate, 10.0 parts of 2-isocyanatoethyl methacrylate, 20.0 parts of N, N-dimethylaminomethylstyrene, 2,2′-azobis (2 , 4-dimethylvaleronitrile) and 25.1 parts of methyl ethyl ketone were made uniform, charged in a dropping funnel, attached to a four-necked separable flask, and dropped over 2 hours. Two hours after the completion of the dropping, it was confirmed that the polymerization yield was 98% or more from the solid content and the weight average molecular weight (Mw) was 6770, and the mixture was cooled to 50 ° C. To this, 15.7 parts of benzyl chloride and 22.0 parts of ethanol were added, reacted at 50 ° C. for 2 hours, heated to 80 ° C. over 1 hour, and further reacted for 2 hours. Thus, a resin [B-7] having a cationic group in the side chain of 50% by weight of the resin component was obtained. The ammonium salt value of the obtained resin was 60 mgKOH / g.
(側鎖にカチオン性基を有する樹脂[B−8]の調製)
温度計、攪拌機、蒸留管、冷却器を具備した4つ口セパラブルフラスコに、イソプロピルアルコール62.4 部を仕込み窒素気流下で75 ℃ に昇温した。別途、メチルメタクリレート30.0部、ブチルメタクリレート20.0部、ヒドロキエチルメタクリレート15.0部、メタクリル酸5.0部、スチレン10.0部、Nービニルピロリドン20.0部、2,2'−アゾビス(2,4−ジメチルバレロニトリル)を4.7部、およびイソプロピルアルコール15.6部を均一にした後、滴下ロートに仕込み、4つ口セパラブルフラスコに取り付け、2時間かけて滴下した。滴下終了2時間後、固形分から重合収率が98%以上であり、重量平均分子量(Mw)が、7550である事を確認し、50℃へ冷却した。ここへ、塩化メチル9.0部、イソプロピルアルコール22.0 部を追加し、50℃で2時間反応させた後、1時間かけて80℃まで加温し、更に、2時間反応させた。その後、イソプロピルアルコールを50部加え、樹脂成分が44重量%の側鎖にカチオン性基を有する樹脂[B−8]を得た。得られた樹脂のアンモニウム塩価は92mgKOH/gであった。
(Preparation of resin [B-8] having a cationic group in the side chain)
A 4-neck separable flask equipped with a thermometer, a stirrer, a distillation tube, and a condenser was charged with 62.4 parts of isopropyl alcohol and heated to 75 ° C. under a nitrogen stream. Separately, 30.0 parts of methyl methacrylate, 20.0 parts of butyl methacrylate, 15.0 parts of hydroxyethyl methacrylate, 5.0 parts of methacrylic acid, 10.0 parts of styrene, 20.0 parts of N-vinylpyrrolidone, 2,2 ′ -After 4.7 parts of azobis (2,4-dimethylvaleronitrile) and 15.6 parts of isopropyl alcohol were made uniform, charged into a dropping funnel, attached to a four-necked separable flask and dropped over 2 hours. . Two hours after the completion of the dropwise addition, it was confirmed that the polymerization yield was 98% or more from the solid content and the weight average molecular weight (Mw) was 7550, and the mixture was cooled to 50 ° C. To this, 9.0 parts of methyl chloride and 22.0 parts of isopropyl alcohol were added, reacted at 50 ° C. for 2 hours, heated to 80 ° C. over 1 hour, and further reacted for 2 hours. Thereafter, 50 parts of isopropyl alcohol was added to obtain a resin [B-8] having a cationic group in the side chain of 44% by weight of the resin component. The ammonium salt value of the obtained resin was 92 mgKOH / g.
以上、製造例で合成した樹脂[B−1]〜[B−8]の組成、アンモニウム塩価、重量平均分子量について、別途表3に示す。 The composition, ammonium salt value, and weight average molecular weight of the resins [B-1] to [B-8] synthesized in the production examples are separately shown in Table 3.
表3中の略称を以下に示す。
MMA:メチルメタクリレート
n−BMA:n−ブチルメタクリレート
2−EHMA:2−エチルヘキシルメタクリレート
2−EHA:2−エチルヘキシルアクリレート
HEMA:ヒドロキシエチルメタクリレート
MAA:メタクリル酸
tBMA:t−ブチルメタクリレート
IBMA:イソブチルメタクリレート
CHMA:シクロヘキシルメタクリレート
IBX:イソボルニルメタクリレート
St:スチレン
MOI:2−イソシアナトエチルメタクリレート
Abbreviations in Table 3 are shown below.
MMA: methyl methacrylate n-BMA: n-butyl methacrylate 2-EHMA: 2-ethylhexyl methacrylate 2-EHA: 2-ethylhexyl acrylate HEMA: hydroxyethyl methacrylate MAA: methacrylic acid tBMA: t-butyl methacrylate IBMA: isobutyl methacrylate CHMA: cyclohexyl Methacrylate IBX: Isobornyl methacrylate St: Styrene MOI: 2-Isocyanatoethyl methacrylate
<造塩化合物の製造方法>
[実施例1]
(造塩化合物1の製造)
下記の手順でスクアリリウム[A−1]とカチオン性基を有する樹脂[B−2]とからなる造塩化合物1を製造した。水2000部に51部の側鎖にカチオン性基を有する樹脂[B−2]を添加し、十分に攪拌混合を行った後、60℃に加熱する。一方、90部の水に6.03部のスクアリリウム[A−1]、0.85部の水酸化ナトリウムを溶解させた水溶液を調製し、先ほどの樹脂溶液に少しずつ滴下していく。滴下後、60℃で120分攪拌し、十分に反応を行う。反応の終点確認としては濾紙に反応液を滴下して、にじみがなくなったところを終点として、造塩化合物が得られたものと判断した。攪拌しながら室温まで放冷した後、吸引濾過を行い、水洗後、濾紙上に残った造塩化合物を乾燥機にて水分を除去して乾燥し、21部のスクアリリウム[A−1]とカチオン性基を有する樹脂[B−2]とからなる造塩化合物1を得た。
<Method for producing salt-forming compound>
[Example 1]
(Production of salt-forming compound 1)
A salt-forming compound 1 composed of squarylium [A-1] and a resin [B-2] having a cationic group was produced by the following procedure. The resin [B-2] having a cationic group in the side chain of 51 parts is added to 2000 parts of water, sufficiently stirred and mixed, and then heated to 60 ° C. On the other hand, an aqueous solution in which 6.03 parts of squarylium [A-1] and 0.85 parts of sodium hydroxide are dissolved in 90 parts of water is prepared and added dropwise to the above resin solution little by little. After dropping, the mixture is stirred at 60 ° C. for 120 minutes to sufficiently react. In order to confirm the end point of the reaction, it was judged that a salt-forming compound was obtained with the reaction solution dropped onto the filter paper and the point where the bleeding disappeared as the end point. After cooling to room temperature with stirring, suction filtration is performed, and after washing with water, the salt-forming compound remaining on the filter paper is dried by removing moisture with a dryer, and 21 parts of squarylium [A-1] and a cation are obtained. The salt-forming compound 1 consisting of the resin [B-2] having a functional group was obtained.
[実施例2〜42]
(造塩化合物2〜42の製造)
以下、造塩化合物1の製造で使用したスクアリリウム[A]および樹脂[B]を、表4に示す化合物、量に変更した以外は、造塩化合物1と同様にして、造塩化合物2〜42を得た。
[Examples 2 to 42]
(Production of salt-forming compounds 2 to 42)
Hereinafter, the salt-forming compounds 2 to 42 are the same as the salt-forming compound 1 except that the squarylium [A] and the resin [B] used in the production of the salt-forming compound 1 are changed to the compounds and amounts shown in Table 4. Got.
[比較例1]
(スクアリリウム[C−1]の製造)
特許第3590694号を参考にして下記のスクアリリウム[C−1]を合成した。
[Comparative Example 1]
(Manufacture of squarylium [C-1])
The following squarylium [C-1] was synthesized with reference to Japanese Patent No. 3590694.
スクアリリウム[C−1]
[比較例2]
(スクアリリウム[C−2])
特開2009−209297号公報を参考にして下記のスクアリリウム[C−2]を合成した。
[Comparative Example 2]
(Squarylium [C-2])
The following squarylium [C-2] was synthesized with reference to Japanese Patent Application Laid-Open No. 2009-209297.
スクアリリウム[C−2]
<画像形成材料の製造>
以下に、本発明で用いられる画像形成材料として、トナーおよびインクジェット用インキの製造法を上げるが、本発明はこれらに限定されるものではない。
<Manufacture of image forming materials>
Hereinafter, as an image forming material used in the present invention, a method for producing toner and ink-jet ink will be described, but the present invention is not limited to these.
<トナーの製造>
[実施例43]
(トナーT1の製造)
実施例1で製造した、造塩化合物1を用い、下記の方法により凝集法トナーT1を得た。
(1)分散液の調製
造塩化合物(1)20部に、イオン交換水70部、ドデシルベンゼンスルホン酸ナトリウム(ネオペレックスG−15、花王社製)3部を添加し、アイガーミルで4時間分散処理して、色素の分散液を得た。
(2)ポリマー乳化液の調製
反応器に、エステルワックスエマルジョン320部((SELOSOL R−586、中京油脂社製)固形分として)、イオン交換水14000部を入れ、90℃に昇温し、アルキルベンゼンスルホン酸塩3部、スチレン2500部、n−ブチルアクリレート650部、メタクリル酸170部、8%過酸化水素水溶液330部、8%アスコルビン酸水溶液330部を添加した。90℃で7時間反応を継続してポリマー乳化液を得た。
(3)トナーの製造
上記ポリマー乳化液150部に、上記分散液9.5部を注入し混合撹拌した。この中に、0.5%の硫酸アルミニウム溶液40部を撹拌しながら注入した。60℃に昇温し、2時間撹拌を継続し、ろ過、洗浄、乾燥し、本発明のトナーを得た。
<Manufacture of toner>
[Example 43]
(Manufacture of toner T1)
Using the salt-forming compound 1 produced in Example 1, an aggregation method toner T1 was obtained by the following method.
(1) Preparation of dispersion liquid To 20 parts of the salt-forming compound (1), 70 parts of ion-exchanged water and 3 parts of sodium dodecylbenzenesulfonate (Neopelex G-15, manufactured by Kao Corporation) were added and dispersed for 4 hours with an Eiger mill. The pigment dispersion was obtained by processing.
(2) Preparation of polymer emulsion In a reactor, 320 parts of ester wax emulsion (as solids (SELOSOL R-586, manufactured by Chukyo Yushi Co., Ltd.)) and 14000 parts of ion-exchanged water were heated to 90 ° C., and alkylbenzene 3 parts of sulfonate, 2500 parts of styrene, 650 parts of n-butyl acrylate, 170 parts of methacrylic acid, 330 parts of 8% aqueous hydrogen peroxide solution, and 330 parts of 8% ascorbic acid aqueous solution were added. The reaction was continued at 90 ° C. for 7 hours to obtain a polymer emulsion.
(3) Manufacture of toner 9.5 parts of the dispersion was poured into 150 parts of the polymer emulsion and mixed and stirred. Into this, 40 parts of 0.5% aluminum sulfate solution was poured while stirring. The temperature was raised to 60 ° C., and stirring was continued for 2 hours, followed by filtration, washing and drying to obtain the toner of the present invention.
[実施例44〜84、比較例3、4]
(トナーT2〜T44の製造)
造塩化合物1を表5に記載の造塩化合物又はスクアリリウム色素に変更した以外は、トナーT1と同様にして、凝集法トナーT2〜T44を得た。
[Examples 44 to 84, Comparative Examples 3 and 4]
(Manufacture of toners T2 to T44)
Aggregation method toners T2 to T44 were obtained in the same manner as toner T1, except that salt formation compound 1 was changed to the salt formation compounds or squarylium dyes shown in Table 5.
<インクジェット用インキの製造>
[実施例85]
(インクジェット用インキJ1)
実施例1で製造した、造塩化合物1を用い、下記の方法によりインクジェット用インキJ1を得た。
(1)分散液の調製
造塩化合物20部に、イオン交換水200部、特殊芳香族スルホン酸ホルマリン縮合物のナトリウム塩(デモールSN−B、花王社製)2部を添加し、アイガーミルで3時間分散処理して、色素の分散液を得た。
(2)インキの製造
上記各分散液40.3部に、グリセリン10部、トリエチレングリコール10部、トリエチレングリコールモノブチルエーテル10部、トリエタノールアミン0.2部、アセチレングリコール系界面活性剤(オルフィンE1010、日信化学社製)1部を混合し、35℃で1時間撹拌した。その後、1.0μmのフィルタで濾過して、本発明のインクジェット用インキを得た。なお、残りは超純水(比抵抗値18MΩ・cm以上)を添加し、全量が100部となるように調製した。
<Manufacture of inkjet ink>
[Example 85]
(Inkjet ink J1)
Ink jet ink J1 was obtained by the following method using salt-forming compound 1 produced in Example 1.
(1) Preparation of dispersion To 20 parts of the salt-forming compound, 200 parts of ion-exchanged water and 2 parts of a sodium salt of special aromatic sulfonic acid formalin condensate (Demol SN-B, manufactured by Kao Corporation) are added, and 3 parts with an Eiger mill. A time dispersion treatment was performed to obtain a pigment dispersion.
(2) Manufacture of ink In each of the above dispersions (40.3 parts), 10 parts of glycerin, 10 parts of triethylene glycol, 10 parts of triethylene glycol monobutyl ether, 0.2 part of triethanolamine, an acetylene glycol surfactant (Orphine) 1 part of E1010 (manufactured by Nissin Chemical Co., Ltd.) was mixed and stirred at 35 ° C. for 1 hour. Then, it filtered with a 1.0 micrometer filter, and obtained the inkjet ink of this invention. The remainder was prepared so that ultrapure water (specific resistance value of 18 MΩ · cm or more) was added and the total amount was 100 parts.
[実施例86〜126、比較例5、6]
(インクジェット用インキJ2〜J44)
造塩化合物1を表5に記載の造塩化合物又はスクアリリウム色素に変更した以外は、インクジェット用インキJ1と同様にして、インクジェット用インキJ2〜J44を得た。
[Examples 86 to 126, Comparative Examples 5 and 6]
(Inkjet inks J2 to J44)
Ink jet inks J2 to J44 were obtained in the same manner as the ink jet ink J1, except that the salt forming compound 1 was changed to the salt forming compound or squarylium pigment shown in Table 5.
<画像形成材料の評価>
[トナーの評価]
得られたトナーT1〜T44を用いて以下の評価を行った。結果を表5に示す。
(分散性)
得られたトナーT1〜T44をミクロトームにて厚さ0.9μmにスライス形成し、透過型電子顕微鏡により顔料の分散状態を観察した。顔料が着色樹脂組成物中に均一に分配されているものを○、顔料凝集物が存在し、均一に分配されていないものを△、顔料凝集物が多数あり均一に分配されていないものを×とした。
<Evaluation of image forming material>
[Evaluation of toner]
The following evaluations were performed using the obtained toners T1 to T44. The results are shown in Table 5.
(Dispersibility)
The obtained toners T1 to T44 were sliced to a thickness of 0.9 μm with a microtome, and the pigment dispersion state was observed with a transmission electron microscope. ○ when the pigment is uniformly distributed in the colored resin composition, △ when the pigment aggregate is present and not uniformly distributed, × when the pigment aggregate is many and not uniformly distributed It was.
(不可視性および近赤外線吸収能)
得られたトナーT1〜T44について、それぞれ50部に疎水性シリカ0.3部を外添し、電子写真プリンターでベタ画像を上質紙に印刷し、以下の方法で評価を行った。ベタ画像を上質紙にプリントして得られた画像について、反射分光濃度計(エックスライト株式会社製、x−rite939)を用いて測定を行い、前述の<画像形成材料の評価方法>の項における式(II)中のΔEおよび式(III)中のRを求めた。なお、◎は非常に良好なレベル、○は良好なレベル、×は実用には適さないレベルである。評価基準は下記の通りである。
(Invisibility and near infrared absorption ability)
About 50 parts of the obtained toners T1 to T44, 0.3 part of hydrophobic silica was externally added, and a solid image was printed on high-quality paper with an electrophotographic printer, and evaluated by the following method. An image obtained by printing a solid image on fine paper is measured using a reflection spectral densitometer (x-rite 939, manufactured by X-Rite Co., Ltd.), and in the above-mentioned <Method for evaluating image forming material> ΔE in formula (II) and R in formula (III) were determined. In addition, (double-circle) is a very good level, (circle) is a favorable level, and x is a level unsuitable for practical use. The evaluation criteria are as follows.
〈不可視性〉
◎ :ΔE 10未満
○ :ΔE 10以上、15未満
× :ΔE 15以上
〈近赤外線吸収能〉
◎ :(100−R) 80以上
○ :(100−R) 75以上、80未満
× :(100−R) 75以下
<Invisibility>
◎: Less than ΔE 10 ○: ΔE 10 or more, less than 15 ×: ΔE 15 or more <Near-infrared absorbing ability>
◎: (100-R) 80 or more ○: (100-R) 75 or more, less than 80 ×: (100-R) 75 or less
(耐光性)
上記の不可視性と近赤外線吸収能を評価する際に作製した場合と同様にして得られた試験片を、耐光性試験機(TOYOSEIKI社製「SUNTEST CPS+」)に入れ、24時間放置した。耐光性試験前後の画像について、反射分光濃度計(エックスライト株式会社製、x−rite939)を用いて測定を行い、式(III)中のRを求めた。光照射前のそれに対する残存率を求め、耐光性を、下記基準で評価した。なお、残存率の算出は、以下の式を用いて算出した。
(Light resistance)
A test piece obtained in the same manner as that prepared when evaluating the invisibility and near infrared absorption ability was placed in a light resistance tester (“SUNTEST CPS +” manufactured by TOYOSEIKI) and allowed to stand for 24 hours. About the image before and after a light resistance test, it measured using the reflection spectral densitometer (The X-lite KK make, x-rite939), and calculated | required R in Formula (III). The residual rate relative to that before light irradiation was determined, and the light resistance was evaluated according to the following criteria. The residual rate was calculated using the following formula.
残存率=〈照射後の(100−R)〉÷〈照射前の(100−R)〉×100 Residual rate = <(100-R) after irradiation> / ((100-R) before irradiation) × 100
◎ :残存率 が95%以上
○ :残存率 が92.5%以上、95%未満
△ :残存率 が90%以上、92.5%未満
× :残存率 が90%未満
◎: Residual rate is 95% or more ○: Residual rate is 92.5% or more and less than 95% △: Residual rate is 90% or more and less than 92.5% ×: Residual rate is less than 90%
本発明の造塩化合物を含む画像形成材料は、非常に高い分散性、不可視性、近赤外線吸収能、及び耐光性を有していること示された。特に、スクアリリウム[A]のシクロ環のX3、X4、X7およびX8がメチル基で置換された造塩化合物 6〜9、11〜14を含む画像形成材料が良好な結果であった。その中でも、スルホ基の置換数 n=1または2である造塩化合物6、7、11、12が、特に良好な結果であった。一方で、n=3または4である造塩化合物は耐光性がやや劣る結果であった。また、アンモニウム塩価が130mgKOH/g以上である樹脂[B−4]を使用した造塩化合物20、28、36は分散性がやや劣る結果であった。一方で、本発明ではないスクアリリウム[C−1]を含む画像形成材料は、不可視性と耐光性が悪化していた。更に、本発明ではないスクアリリウム[C−2]を含む画像形成材料は、不可視性、近赤外線吸収能、及び耐光性は良好であるが、分散性が著しく悪化しているため、実用には不適である。 The image forming material containing the salt-forming compound of the present invention has been shown to have very high dispersibility, invisibility, near infrared absorption ability, and light resistance. In particular, the image forming material containing the salt-forming compounds 6 to 9 and 11 to 14 in which X 3 , X 4 , X 7 and X 8 in the cyclo ring of squarylium [A] were substituted with a methyl group was a good result. . Among them, the salt-forming compounds 6, 7, 11, and 12 having a sulfo group substitution number n = 1 or 2 gave particularly good results. On the other hand, the salt-forming compound in which n = 3 or 4 was slightly inferior in light resistance. In addition, the salt-forming compounds 20, 28, and 36 using the resin [B-4] having an ammonium salt value of 130 mgKOH / g or more were slightly inferior in dispersibility. On the other hand, the image forming material containing squarylium [C-1] which is not the present invention has deteriorated invisibility and light resistance. Further, the image forming material containing squarylium [C-2] which is not the present invention has good invisibility, near-infrared absorption ability, and light resistance, but is not suitable for practical use because its dispersibility is remarkably deteriorated. It is.
[インクジェット用インキの評価]
得られたインクジェット用インキJ1〜J44を用いて以下の評価を行った。結果を表6に示す。
(保存安定性)
得られたインクジェット用インキJ1〜J44を70℃の恒温機に1週間保存、経時促進させた後、経時前後でのインキの粘度変化について測定した。インキの粘度はE型粘度計(東機産業社製「ELD型粘度計」)を用いて、25℃において回転数50rpmという条件で測定した。
◎ :変化率が±3%未満
○ :変化率が±3%以上±5%未満
△ :変化率が±5%以上±15%未満
× :変化率が±15%以上
[Evaluation of ink for inkjet]
The following evaluation was performed using the obtained inkjet inks J1 to J44. The results are shown in Table 6.
(Storage stability)
The obtained inkjet inks J1 to J44 were stored in a thermostat at 70 ° C. for 1 week and allowed to accelerate with time, and the viscosity change of the ink before and after aging was measured. The viscosity of the ink was measured using an E-type viscometer (“ELD type viscometer” manufactured by Toki Sangyo Co., Ltd.) at 25 ° C. and a rotation speed of 50 rpm.
◎: Change rate is less than ± 3% ○: Change rate is ± 3% or more and less than ± 5% △: Change rate is ± 5% or more and less than ± 15% ×: Change rate is ± 15% or more
(不可視性および近赤外線吸収能)
得られたインクジェット用インキJ1〜J44について、インクジェットプリンターPM−A700(商品名、EPSON社製)用のブラックインク用のインクカートリッジに詰めてフォト光沢紙(EPSON社製PM写真紙<光沢>(KA420PSK、EPSON)(商品名)にカラー設定「黒」にてベタ画像を印刷し、以下の方法で評価を行った。ベタ画像をフォト光沢紙にフォト光沢紙にプリントして得られた画像について、反射分光濃度計(エックスライト株式会社製、x−rite939)を用いて測定を行い、式(II)中のΔEおよび式(III)中のRを求めた。なお、◎は非常に良好なレベル、○は良好なレベル、×は実用には適さないレベルである。評価基準は下記の通りである。
(Invisibility and near infrared absorption ability)
The obtained ink-jet inks J1 to J44 are packed in a black ink ink cartridge for an ink jet printer PM-A700 (trade name, manufactured by EPSON) and photo glossy paper (PM photo paper manufactured by EPSON <gloss> (KA420PSK) , EPSON (trade name), a solid image was printed with a color setting of “black” and evaluated by the following method: For an image obtained by printing a solid image on photo glossy paper, Measurement was performed using a reflection spectral densitometer (x-rite 939, manufactured by X-Rite Co., Ltd.), and ΔE in formula (II) and R in formula (III) were determined. , O is a good level, x is a level not suitable for practical use, and evaluation criteria are as follows.
〈不可視性〉
◎ :ΔE 10未満
○ :ΔE 10以上、15未満
× :ΔE 15以上
〈近赤外線吸収能〉
◎ :(100−R) 80以上
○ :(100−R) 75以上、80未満
× :(100−R) 75以下
<Invisibility>
◎: Less than ΔE 10 ○: ΔE 10 or more, less than 15 ×: ΔE 15 or more <Near-infrared absorbing ability>
◎: (100-R) 80 or more ○: (100-R) 75 or more, less than 80 ×: (100-R) 75 or less
(耐光性)
上記の不可視性と近赤外線吸収能を評価する際に作製した場合と同様にして得られた試験片を、耐光性試験機(TOYOSEIKI社製「SUNTEST CPS+」)に入れ、24時間放置した。耐光性試験前後の画像について、反射分光濃度計(エックスライト株式会社製、x−rite939)を用いて測定を行い、式(III)中のRを求めた。光照射前のそれに対する残存率を求め、耐光性を、下記基準で評価した。なお、残存率の算出は、以下の式を用いて算出した。
残存率=〈照射後の(100−R)〉÷〈照射前の(100−R)〉×100
◎ :残存率 が95%以上
○ :残存率 が92.5%以上、95%未満
△ :残存率 が90%以上、92.5%未満
× :残存率 が90%未満
(Light resistance)
A test piece obtained in the same manner as that prepared when evaluating the invisibility and near infrared absorption ability was placed in a light resistance tester (“SUNTEST CPS +” manufactured by TOYOSEIKI) and allowed to stand for 24 hours. About the image before and after a light resistance test, it measured using the reflection spectral densitometer (The X-lite KK make, x-rite939), and calculated | required R in Formula (III). The residual rate relative to that before light irradiation was determined, and the light resistance was evaluated according to the following criteria. The residual rate was calculated using the following formula.
Residual rate = <(100-R) after irradiation> / ((100-R) before irradiation) × 100
◎: Residual rate is 95% or more ○: Residual rate is 92.5% or more and less than 95% △: Residual rate is 90% or more and less than 92.5% ×: Residual rate is less than 90%
本発明の造塩化合物を含む画像形成材料は、非常に高い不可視性、近赤外線吸収能、耐光性及び保存安定性を有していること示された。特に、スクアリリウム[A]のシクロ環のX3、X4、X7およびX8がメチル基で置換された造塩化合物 6〜9、11〜14を含む画像形成材料が極めて良好な結果であった。その中でも、スルホ基の置換数 n=1または2である造塩化合物6、7、11、12が、特に良好な結果であった。一方で、n=3または4である造塩化合物は耐光性がやや劣る結果であった。また、アンモニウム塩価が130mgKOH/g以上である樹脂[B−4]を使用した造塩化合物20、28、36は分散性がやや劣る結果であった。
本発明ではないスクアリリウム[C−1]を含む画像形成材料は、不可視性と耐光性が悪化していた。更に、本発明ではないスクアリリウム[C−2]を含む画像形成材料は、不可視性、近赤外線吸収能、及び耐光性は良好であるが、保存安定性が著しく悪化しており、インクジェットインキとして安定的に使用できない。
The image forming material containing the salt-forming compound of the present invention has been shown to have very high invisibility, near infrared absorption ability, light resistance and storage stability. In particular, the image forming material containing the salt-forming compounds 6-9 and 11-14 in which X 3 , X 4 , X 7 and X 8 of the cyclo ring of squarylium [A] are substituted with a methyl group was an excellent result. It was. Among them, the salt-forming compounds 6, 7, 11, and 12 having a sulfo group substitution number n = 1 or 2 gave particularly good results. On the other hand, the salt-forming compound in which n = 3 or 4 was slightly inferior in light resistance. In addition, the salt-forming compounds 20, 28, and 36 using the resin [B-4] having an ammonium salt value of 130 mgKOH / g or more were slightly inferior in dispersibility.
The image forming material containing squarylium [C-1] which is not the present invention has deteriorated invisibility and light resistance. Further, the image forming material containing squarylium [C-2] which is not the present invention has good invisibility, near-infrared absorption ability, and light resistance, but storage stability is remarkably deteriorated and stable as an inkjet ink. Cannot be used.
このようにして作製された画像形成材料は、可視域(400nm〜750nm)に吸収が少なく近赤外線吸収能に優れているため、非常に分光特性に優れていると言える。更には耐光性にも優れたものであり、且つ凝集しにくいため、トナーとしての分散性、インクジェットインキとしての保存安定性にも優れている。そのため、不可視性情報を記録するための画像形成材料として優れた性能を有していると言える。 The image forming material thus prepared has very little absorption in the visible region (400 nm to 750 nm) and is excellent in near infrared absorption ability, and therefore can be said to have excellent spectral characteristics. Furthermore, since it is excellent in light resistance and hardly aggregates, it is excellent in dispersibility as a toner and storage stability as an inkjet ink. Therefore, it can be said that it has excellent performance as an image forming material for recording invisible information.
Claims (4)
一般式(1)
[一般式(1)中、X1〜X10は、それぞれ独立に、水素原子、置換基を有してもよいアルキル基、置換基を有してもよいアルケニル基、置換基を有してもよいアリール基、置換基を有してもよいアラルキル基、置換基を有してもよいアルコキシ基、置換基を有してもよいアリールオキシ基、アミノ基、置換アミノ基、−SO2NR1R2、−COOR3、−CONR4R5、ニトロ基、シアノ基又はハロゲン原子を表し、隣接した基同士が環を形成しても良い。R1〜R5は、それぞれ独立に、水素原子又は置換基を有してもよいアルキル基を表す。nは、1〜4の整数を表す。Z+は、水素イオン又は無機若しくは有機のカチオンを表す。] A salt-forming compound of squarylium [A] represented by the following general formula and resin [B] having a cationic group in the side chain.
General formula (1)
[In General Formula (1), X 1 to X 10 each independently have a hydrogen atom, an alkyl group that may have a substituent, an alkenyl group that may have a substituent, or a substituent. An aryl group which may have a substituent, an aralkyl group which may have a substituent, an alkoxy group which may have a substituent, an aryloxy group which may have a substituent, an amino group, a substituted amino group, —SO 2 NR 1 R 2 , —COOR 3 , —CONR 4 R 5 , a nitro group, a cyano group, or a halogen atom may be represented, and adjacent groups may form a ring. R 1 to R 5 each independently represents a hydrogen atom or an alkyl group which may have a substituent. n represents an integer of 1 to 4. Z + represents a hydrogen ion or an inorganic or organic cation. ]
一般式(2)
[一般式(2)中、R6は、水素原子又は置換基を有してもよいアルキル基を表す。R7〜R9は、それぞれ独立に、水素原子、置換基を有してもよいアルキル基、置換基を有してもよいアルケニル基又は置換基を有してもよいアリール基を表し、R7〜R9のうち2つが互いに結合して環を形成しても良い。Qは、アルキレン基、アリーレン基、−CONH−R10−又は−COO−R11−を表し、R10及びR11は、アルキレン基を表す。Y−は、無機又は有機のアニオンを表す。] The salt-forming compound according to claim 1, wherein the resin [B] having a cationic group in the side chain is a vinyl resin containing a structural unit represented by the following general formula (2).
General formula (2)
[In General Formula (2), R 6 represents a hydrogen atom or an alkyl group which may have a substituent. R 7 to R 9 each independently represent a hydrogen atom, an alkyl group that may have a substituent, an alkenyl group that may have a substituent, or an aryl group that may have a substituent; Two of 7 to R 9 may be bonded to each other to form a ring. Q represents an alkylene group, an arylene group, —CONH—R 10 — or —COO—R 11 —, and R 10 and R 11 represent an alkylene group. Y − represents an inorganic or organic anion. ]
Priority Applications (1)
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JP2018100315A (en) * | 2016-12-19 | 2018-06-28 | 東洋インキScホールディングス株式会社 | Resin composition for laser welding |
JP2018192636A (en) * | 2017-05-12 | 2018-12-06 | 東洋インキScホールディングス株式会社 | Laser marking composition and use thereof |
KR20210033506A (en) | 2018-09-14 | 2021-03-26 | 후지필름 가부시키가이샤 | Near-infrared absorbing composition, manufacturing method of dispersion, film, optical filter, pattern forming method, laminate, solid-state imaging device, image display device, and infrared sensor |
WO2023145700A1 (en) * | 2022-01-31 | 2023-08-03 | 富士フイルム株式会社 | Infrared absorbing composition, film, optical filter, solid-state imaging element, image display device, infrared sensor, and camera module |
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JP2012172106A (en) * | 2011-02-23 | 2012-09-10 | Toyo Ink Sc Holdings Co Ltd | Inkjet ink |
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JP2018100315A (en) * | 2016-12-19 | 2018-06-28 | 東洋インキScホールディングス株式会社 | Resin composition for laser welding |
JP2018192636A (en) * | 2017-05-12 | 2018-12-06 | 東洋インキScホールディングス株式会社 | Laser marking composition and use thereof |
KR20210033506A (en) | 2018-09-14 | 2021-03-26 | 후지필름 가부시키가이샤 | Near-infrared absorbing composition, manufacturing method of dispersion, film, optical filter, pattern forming method, laminate, solid-state imaging device, image display device, and infrared sensor |
WO2023145700A1 (en) * | 2022-01-31 | 2023-08-03 | 富士フイルム株式会社 | Infrared absorbing composition, film, optical filter, solid-state imaging element, image display device, infrared sensor, and camera module |
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