JP2018056577A - Film formation processing device, and imprint device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an imprint system and the other which make possible to perform a film formation process satisfactorily and to execute stable imprint.SOLUTION: A film formation processing device comprises: a first hydrophilic treatment part 62 for hydrophilizing a surface of a target object; a second hydrophilic treatment part 64 for hydrophilizing a surface of a target object in a way different from that in the first hydrophilic treatment part 62; a surface-state detector part 72 for measuring a degree of hydrophilization on the surface of the target object subjected to the treatment by the first hydrophilic treatment part 62; a determination part 74 for comparing a measurement value measured by the surface-state detector part 72 with a threshold to determine whether the measurement value is equal to or under or over the threshold; a film formation treatment part 80 which is arranged so as to form a film on the surface of the target object if the detection value is equal to or under the threshold, and to form a film on the target object after a hydrophilic treatment on the surface of the target object by the second hydrophilic treatment part 64 if the detection value is equal to or over the threshold, although the detection value is made equal to or under the threshold as a result of treatment by the second hydrophilic treatment part 64; and a transfer part transferring a transfer pattern to a transfer base.SELECTED DRAWING: Figure 1

Description

  The present invention relates to an imprint system and an imprint method.

  In recent years, a pattern forming technique using an imprint method has attracted attention as a fine pattern forming technique that replaces the photolithography technique. The imprint method is a pattern formation technique that uses a mold material (mold) having a fine concavo-convex structure and transfers the concavo-convex structure to the imprint material to transfer the fine structure at an equal magnification. For example, in an imprint method using a photocurable resin composition as an imprint material, the photocurable resin composition is supplied to the surface of the transfer substrate, a mold having a concavo-convex pattern, and an imprint material on the surface of the transfer substrate And pressurizing as necessary to fill the concavo-convex pattern with the photocurable resin composition. In this state, light is irradiated to cure the photocurable resin composition, and then the mold is removed from the resin layer. By pulling apart, a pattern structure having a concavo-convex structure in which the concavo-convex provided in the mold is inverted is formed.

  In the imprint method, when the mold is separated from the resin layer, in order to prevent the resin layer used for transfer from adhering to the mold or peeling off from the transfer substrate, a mold release agent is formed on the mold, and the adhesive is applied to the transfer substrate. Is used to control the peeling and adhesion of the resin layer.

  Before forming a film on the mold or transfer substrate, it is necessary to remove the organic matter on the surface of the mold or transfer substrate to make it hydrophilic in order to perform the film forming process stably. As a well-known hydrophilization method, a wet method using a chemical such as acid or alkali, or a dry method using UV or plasma irradiation is known.

  Conventionally, there has been known an imprint apparatus that performs imprinting before a predetermined time elapses in order to reduce adhesion of substances in the atmosphere to sulfuric acid remaining at the time of cleaning after wet-type hydrophilization treatment. (See Patent Document 1).

JP 2011-66364 A

  By the way, the wet method is easy to hydrophilize the object in one treatment compared to the dry method, but because of the use of chemicals such as acid and alkali, depending on the material of the object, changes in the outer shape, etc. After washing, the chemical must be rinsed with a rinse solution, and then the rinse solution needs to be dried, which makes a series of processes complicated. On the other hand, the dry method can be easily hydrophilized as compared to the wet method, but there is a possibility that the temperature of the object may increase due to long-time irradiation, and the pattern size may be affected. . In order to stably perform imprinting with high productivity, it is desirable to appropriately hydrophilize the object, and to easily perform such hydrophilization.

  Accordingly, the present invention has been made with the above problem as an example of an object, and it is an object of the present invention to provide an imprint system or the like that can perform a film forming process satisfactorily and perform imprinting stably.

  In order to solve the above problems, the present invention employs the following configuration.

  A film forming apparatus according to claim 1 supplies an imprint material (5) to a transfer substrate (15) and forms a resin pattern on the transfer substrate using a mold (25). A film forming apparatus for the transfer substrate or the mold according to claim 1, wherein the first hydrophilic treatment section (62) for hydrophilizing the surface of the transfer substrate or the mold is different from the first hydrophilic treatment section. The degree of hydrophilicity of the surface of the transfer substrate or the mold treated by the first hydrophilization treatment part and the second hydrophilic treatment part (64) for hydrophilizing the surface of the transfer substrate or the mold. The surface state detection unit (72) to be measured has a threshold value indicating a predetermined surface state, the measured value measured by the surface state detection unit is compared with the threshold value, and the measured value is equal to or less than the threshold value ,or A determination unit (74) for determining whether the detection value is equal to or greater than a threshold value, and when the detection value is equal to or less than the threshold value, a film is formed on the surface of the transfer substrate or the mold; After the surface of the transfer substrate or the mold is hydrophilized by the second hydrophilization processing unit when the detection value is equal to or lower than the threshold value by the processing by the second hydrophilization processing unit. And a film formation processing unit (80) for forming a film on the surface of the transfer substrate or the mold.

  An imprint apparatus (2) according to claim 2 supplies an imprint material (5) to a transfer substrate (15) and forms a resin pattern on the transfer substrate using a mold (25). A first hydrophilic treatment section (62) for hydrophilizing the surface of the transfer substrate or the mold, and the surface of the transfer substrate or the mold by a method different from the first hydrophilic treatment section. A second hydrophilic treatment section (64) to be hydrophilic, a surface condition detection section (72) to measure the degree of hydrophilicity of the surface of the transfer substrate or the mold treated by the first hydrophilic treatment section, It has a threshold value indicating a predefined surface state, compares the measured value measured by the surface state detection unit with the threshold value, and determines whether the measured value is less than or equal to the threshold value Judgment (74) and when the detected value is less than or equal to the threshold value, a film is formed on the surface of the transfer substrate or the mold, and the detected value is greater than or equal to the threshold value, and the second hydrophilization treatment When the detected value is equal to or less than the threshold value by the processing by the unit, the second hydrophilic treatment unit hydrophilizes the transfer substrate or the mold surface, and then forms a film on the transfer substrate or the mold surface. And a transfer unit (30) for transferring a transfer pattern to a transfer substrate using the transfer substrate or the mold formed by the film formation unit. It is characterized by.

  According to the present invention, since the film forming process is performed satisfactorily, the mold release process or the adhesion process is stabilized, and the imprint can be executed stably.

It is a mimetic diagram showing composition of an imprint system concerning one embodiment of the present invention. It is a mimetic diagram showing an imprint system concerning one embodiment of the present invention. It is a flowchart figure of the imprint method which concerns on one Embodiment of this invention. It is process sectional drawing which shows the imprint method which concerns on one Embodiment of this invention.

  Hereinafter, the best embodiment of the present invention will be described with reference to the drawings.

<Imprint system>
(First embodiment)
As shown in FIG. 1, the imprint system 2 according to an embodiment of the present invention includes an imprint processing unit 10, a hydrophilization processing unit 60, a determination processing unit 70, and a film forming processing unit 80. ing.

  As shown in FIG. 2, the imprint processing unit 10 includes a discharge unit 20 that discharges droplets of the imprint material 5 onto a transfer substrate 15 and a mold material on which a concavo-convex pattern 25a is formed (hereinafter referred to as “mold 25”). And the transfer unit 30 for transferring the concavo-convex pattern 25a onto the transfer substrate 15 that functions as a transfer base material of the present application.

  For example, the ejection unit 20 ejects droplets of the imprint material 5 from the nozzles 17 a of the inkjet head 17 onto the surface of the transfer substrate 15. The discharge unit 20 is not limited to the ink jet system as in the present embodiment, and may be an aspect in which the imprint material 5 is wet spread on the transfer substrate 15 using, for example, spin coating.

  Further, for the imprint material 5, for example, a thermoplastic resin composition, a thermosetting resin composition, or a photocurable resin composition is used. For example, when the photocurable resin composition is used, The imprint material 5 is cured by irradiating a predetermined light L.

  The transfer unit 30 includes a stage 32 that supports the transfer substrate 15 and can be driven in the horizontal direction, a support 34 that supports the mold 25 against the transfer substrate 15, and a mold as indicated by an arrow in FIG. A moving unit (not shown) that moves the mold 25 downward to bring the mold 25 into contact with the imprint material 5 supplied to the transfer substrate 15, and moves the mold 25 upward to separate it from the imprint material 5. And an irradiation unit 35 for irradiating light L for curing the imprint material 5 when the mold 25 is brought into contact with the transfer substrate 15 having the surface supplied with droplets of the imprint material 5.

  In the transfer unit 30, the stage 32 moves below the discharge unit 20, and the imprint material 5 is appropriately discharged from the discharge unit 20, whereby the imprint material 5 is obtained on the surface of the transfer substrate 15. . For example, when the ink jet method is used, the mold 25 is brought into contact with the transfer substrate 15 on which droplets of the imprint material 5 are arranged, and the imprint material 5 is transferred to the mold 25 using capillary force or the like. It is filled between the substrate 15.

  Furthermore, in this state, the imprint material 5 is cured and molded by irradiating the imprint material 5 with light L from the mold side by the irradiation unit 35, and the uneven pattern 25 a is transferred to the transfer substrate 15. The transfer substrate 15 is taken out by separating the mold 25 after the imprint material 5 is molded.

  It should be noted that the discharge unit 20 and the transfer unit 30 of the imprint processing unit 10 can employ general mechanisms, and detailed description of each configuration is omitted.

  As shown in FIG. 1, the hydrophilization processing unit 60 performs the hydrophilization processing of the mold 25 and the transfer substrate 15. For example, after imprinting by the imprint processing unit 10, This is performed when the transfer substrate 25 is installed.

  In order to stably perform imprinting, when a release layer is formed on the mold 25 or when an adhesion layer is formed on the transfer substrate 15, the hydrophilic treatment unit 60 performs the hydrophilic treatment. A film forming process is executed by the film processing unit 80.

  The hydrophilization treatment unit 60 includes a first hydrophilization treatment unit 62 (first treatment means) that performs a hydrophilization treatment on the surface of the mold 25 or the transfer substrate 15 that functions as an object of the present application by a predetermined method, and the mold. 25 or a second hydrophilic treatment section 64 (second treatment means) that performs hydrophilic treatment on the surface of the transfer substrate 15 by a method different from the first hydrophilic treatment. “Hydrophilization” refers to a state in which when a droplet such as water is dropped, it spreads without becoming a water droplet, and the contact angle of the droplet becomes close to 0 °. The hydrophilization treatment includes, for example, treatment such as surface organic substance removal and surface modification.

  The hydrophilic treatment unit 60 is for reducing the contact angle of the surface of the mold 25 or the transfer substrate 15, and the amount of decrease in the contact angle by the first hydrophilic treatment unit 62 is the second hydrophilic treatment unit 64. You may comprise so that it may become larger than the fall amount of the contact angle by. For example, the amount of decrease in the contact angle by the first hydrophilization processing unit 62 can be 70 to 100 °, and the amount of decrease in the contact angle by the second hydrophilization processing unit 64 can be 20 to 30 °. The contact angle is measured, for example, using a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.) 30 seconds after dropping a water drop from a microsyringe.

  Specifically, the first hydrophilization treatment unit 62 is intended to be hydrophilized by wet treatment using a solvent such as acid or alkali, and the second hydrophilization treatment unit 64 is used for UV irradiation or plasma irradiation. Hydrophilization is achieved by dry treatment using ozone treatment or plasma treatment.

  In the wet treatment, for example, a chemical such as acid or alkali is brought into contact with the surface of the mold 25 or the transfer substrate 15 and then washed with pure water or the like to remove the chemical and then dried. This processing method is performed by applying a generally known technique such as a spray method in which a chemical solution is sprayed on the surface of the mold 25 or the transfer substrate 15 in addition to an immersion method in which the mold 25 or the transfer substrate 15 is immersed in the chemical solution.

  On the other hand, in the dry treatment, for example, the surface of the mold 25 or the transfer substrate 15 is irradiated with light such as UV, or the surface of the mold 25 or the transfer substrate 15 is exposed to plasma. In this processing method, a generally known technique such as a plasma irradiation apparatus is applied in addition to the light irradiation apparatus described above.

  A light irradiation apparatus irradiates the light containing the wavelength range of 10-400 nm, for example, As a preferable range among this wavelength range, it is 170-260 nm. If light having a wavelength range of less than 170 nm is used, special protective equipment may be required. If light having a wavelength range of greater than 260 nm is used, it may be difficult to remove depending on the organic matter attached to the mold 25 or the transfer substrate 15. Because there is.

  The plasma apparatus, for example, places the mold 25 or the transfer substrate 15 in a vacuum chamber, supplies a mixed gas containing oxygen, fluorine, or an inert gas, generates a plasma by applying a high-frequency current, The layer formed on the surface of the mold 25 or the transfer substrate 15 is removed by ashing. For example, it is performed by oxygen plasma irradiation using oxygen gas, but nitrogen gas or oxygen gas suitable for continuous processing is used. The atmospheric pressure plasma irradiation used is preferred.

  The determination processing unit 70 determines whether the film forming process or the imprint can be appropriately executed based on the surface state of the mold 25 or the transfer substrate 15 after the wet process by the first hydrophilization processing unit 62.

  As shown in FIG. 1, the determination processing unit 70 includes a surface state detection unit 72 (detection unit) that measures the surface state of the mold 25 or the transfer substrate 15 that has been subjected to hydrophilic treatment in the first hydrophilic treatment unit 62, and A determination unit 74 (comparison means) for determining whether or not the film forming process or the imprint can be appropriately executed based on the measurement result.

  The surface state detection unit 72 includes a device that measures the degree of hydrophilicity of the mold 25 or the transfer substrate 15. Specifically, the degree of hydrophilization is obtained, for example, by measuring a contact angle. A droplet is dropped, an image of the droplet is taken from the side, and the contact angle of the droplet is obtained. . The smaller the contact angle of the droplet, the higher the degree of hydrophilicity, and the larger the contact angle of the droplet, the lower the degree of hydrophilicity. As the surface state detection unit 72, the CA-Z type contact angle meter manufactured by Kyowa Interface Science Co., Ltd. can be used.

  The determination unit 74 makes a determination for performing a predetermined process using two reference values that are large and small that indicate a threshold value of the surface state (contact angle) defined in advance. This threshold value is a value for determining the degree of hydrophilicity, and one threshold value is, for example, the upper limit value of the optimum contact angle for performing the film forming process. The degree of sex is good. The other threshold is a value of a contact angle that does not return to a value of the contact angle after the wet treatment even when the dry treatment is performed. That is, if the measured value is between one threshold value and the other threshold value, the hydrophilicity can be improved by dry treatment, and if the measured value exceeds the other threshold value, it indicates that the wet treatment needs to be performed again.

  As an example, one threshold value (threshold value of the present application) is 5 °, and the other threshold value is 25 to 35 °.

  In the determination unit 74 of the present embodiment, two threshold values are used, but only one threshold value may be used. When making a determination using one threshold value, if the measured value is larger than one threshold value, the difference between the measured value of the object processed by the wet process and the threshold value indicates the degree of hydrophilicity by the dry process. It is determined whether it is a value that can be satisfactorily processed (25 to 35 ° or less) or a value that cannot be satisfactorily processed by the dry treatment (when exceeding 25 to 35 °).

  Then, the determination unit 74 compares the measured value (detected value) with the two thresholds, and the measured value is less than one threshold, greater than the other threshold, and between the two thresholds. Determine if there is.

  In this determination result, if the measured value is equal to or less than one threshold value, the film forming process is performed by the film forming processing unit 80. If the measured value is equal to or greater than the other threshold value, the first hydrophilization of the hydrophilic treatment unit 60 is performed. After the wet process is performed again in the processing unit 62, the determination unit 74 determines again.

  In this determination result, if the measured value is between two reference values, it can be hydrophilized by dry treatment with little damage to the object, so the second hydrophilization treatment unit 64 of the hydrophilization treatment unit 60. The film is processed by the film forming process unit 80 after being dry-processed.

  In this determination result, if the measured value is equal to or greater than the other threshold value, it is difficult to make the object hydrophilic by dry treatment without damaging the object. Therefore, in the first hydrophilic treatment unit 62 of the hydrophilic treatment unit 60, After the wet process is performed again, the film forming process is performed by the film forming process unit 80.

  In this determination unit 74, defects increase with the lapse of time after the hydrophilization treatment. In the wet treatment, the hydrophilic treatment capacity per unit time is higher than that in the dry treatment, but the series of treatments is complicated and time-consuming. In view of the fact that the dry treatment is preferably a hydrophilic treatment for a short time, the contact angle that decreases with the passage of time after the wet treatment is measured, and the film formation treatment or A determination for performing an appropriate process for imprinting is performed. Specifically, as described above, when the measured value after the wet process is equal to or less than one threshold value, the film forming process or the imprint is performed as it is, while the measured value after the wet process is the other threshold value. In the case of exceeding, the film forming process or the imprint is not performed, and it is determined whether the film forming process or the imprint is performed after performing the wet process again. Further, after the wet treatment, if the range is within two thresholds (although there is some dirt, etc., the hydrophilic treatment can be sufficiently performed by the dry treatment), the dry treatment is performed and then the film formation treatment or imprinting is performed. To implement.

  By processing in this way, the hydrophilicity of the surface of the object such as the mold 25 or the transfer substrate 15 before the film forming process or imprinting is improved, so that the film forming process or imprint is stably and satisfactorily performed. Can be carried out.

  In addition, although the surface state detection part 72 of this embodiment is implemented by measuring the surface of a target object, it is good also as an aspect implemented by estimating the surface of a target object. Specifically, a time information acquisition device that acquires the elapsed time after the wet treatment, and a database that indicates the number of pattern formation defects with respect to the elapsed time after the hydrophilic treatment, the determination unit 74, The surface state may be predicted (estimated) by comparing with a threshold obtained by referring to this database, and the determination may be made.

  This database shows the number of defects when imprinting is performed after changing the elapsed time after processing after wet processing. The longer the elapsed time, the lower the hydrophilicity of the surface and the number of defects. It shows that it tends to increase. Therefore, two large and small threshold values are set based on the number of defects, determination is made based on the threshold values, and appropriate processing is performed. This threshold value is, for example, the elapsed time after the wet process, one threshold value is a limit time during which the hydrophilicity after the wet process does not change, and the other threshold value is the wet process even if the dry process is performed. What is necessary is just to prescribe | regulate the time which does not return to below hydrophilicity later.

  As shown in FIG. 1, the film forming unit 80 includes a release layer forming process unit 82 for forming a film on the surface of the mold 25 hydrophilized by the hydrophilizing unit 60, and a surface of the transfer substrate 15. An adhesion layer formation processing unit 84 for film processing.

  The release layer formation processing unit 82 forms a release layer by, for example, applying a release agent on the surface of the mold 25 to form a release layer in order to reduce adhesion to the imprint material 5. The adhesion layer formation processing unit 84 forms an adhesion layer by, for example, applying an adhesion agent and forming a film in order to increase the adhesion of the imprint material 5 to the surface of the transfer substrate 15.

  For example, a silane coupling agent having a silyl group is used as the release agent or the adhesive.

  In addition, the processing method of a mold release agent or an adhesive agent is executed by an injection process using a nozzle or the like, or an immersion process in which the mold 25 or the transfer substrate 15 is immersed in the processing agent.

  According to such an imprint system 2, imprint is appropriately executed after strictly managing the elapsed time after the wet process. Specifically, it is determined whether imprinting or film forming processing can be performed based on the elapsed time after the wet processing, and processing (wet processing or dry processing) suitable when it is determined that execution is impossible is performed. Above, the film forming process is executed. Therefore, the film forming process is favorably performed after an appropriate process is performed according to the state of the surface of the mold 25 or the transfer substrate 15 after the wet process, so that the mold release process or the adhesion process is stabilized. Imprinting can be executed stably.

(Second Embodiment)
Next, an embodiment showing another aspect of the imprint system 2 will be described. Note that this embodiment is different from the above-described embodiment only in the determination method, and other configurations are basically the same. Therefore, only differences from the above-described imprint system 2 will be described, and the same parts shown in the above-described embodiment will be denoted by the same reference numerals, and description thereof will also be omitted.

  In the first embodiment, the method of determining using two threshold values has been described, but the present embodiment is different in that it is a method of determining using one threshold value.

  Specifically, the determination unit 74 performs determination for performing a predetermined process using one reference value indicating a threshold value of the surface state (elapsed time) defined in advance. This threshold is, for example, an elapsed time after the wet treatment, and the threshold is a limit time at which the hydrophilicity after the wet treatment does not change.

  Then, the determination unit 74 compares the measurement value (detection value) measured by the surface state detection unit 72 with a threshold value, and determines whether the measured measurement value is less than or equal to the threshold value. .

  Then, in this determination result, if the measured value is equal to or less than the threshold value, the film forming process is performed by the film forming process unit 80.

  On the other hand, when the measured value is equal to or greater than the threshold value, and the difference between the measured value and the threshold value is equal to or less than the amount of decrease in the contact angle assumed by the processing of the second hydrophilization processing unit 64, the second The film is processed by the film forming unit 80 after being dry-processed in the hydrophilic treatment unit 64.

  Further, when the measured value is equal to or greater than the threshold value, and the difference between the measured value and the threshold value is larger than the contact angle reduction amount assumed by the processing of the second hydrophilization processing unit 64, hydrophilization is performed. After the wet treatment is performed again in the first hydrophilization processing unit 62 of the processing unit 60, the determination unit 74 determines again.

  As described above, in the present embodiment, after the wet process is performed on the surface of the object, the elapsed time after the wet process is measured before the film formation process or the imprint is performed. While it is determined that the film forming process or the imprint is performed, the contact angle of the surface of the object is wet processed by the process of the second hydrophilization processing unit 64 when a long time has elapsed after the wet process. When the hydrophilicity can be reduced below the subsequent hydrophilicity, after performing the dry treatment, the film forming process or the imprint is performed, and the contact angle of the object cannot be reduced below the hydrophilicity after the wet treatment. In this case, the film forming process or the imprint is performed again after performing the wet process again without performing the film forming process or the imprint.

  By processing in this way, the hydrophilicity of the surface of the object such as the mold 25 or the transfer substrate 15 before the film forming process or imprinting is improved, so that the film forming process or imprint is stably and satisfactorily performed. Can be carried out.

<Imprint method>
Next, a basic imprint method using the method of the first embodiment will be described.

  First, a target mold 25 or transfer substrate 15 (hereinafter referred to as an “object”) is prepared. And the surface of a target object is wet-processed in the 1st hydrophilization process part 62 (step S101).

  Next, the determination processing unit 70 measures the contact angle of the wet-processed object (step S102), and performs a determination for performing subsequent processing from the surface state of the object estimated based on the measurement result. Do. This determination is made by comparing the measured value with these threshold values using two threshold values.

  First, when the measured value is smaller than one threshold value (step S103), it is determined that the time after the hydrophilic treatment is short, the hydrophilicity is good, and is transported to the film forming unit 80. .

  On the other hand, when the measured value is within the range of the two threshold values (steps S103 and S104), the hydrophilicity is sufficiently improved by the dry treatment although some time has passed after the hydrophilic treatment. Therefore, the film is transported to the second hydrophilization processing unit 64 and dried (step S105), and then transported to the film forming processing unit 80.

  If the measured value is larger than the other threshold (step S104), it is determined that a long time has elapsed after the hydrophilic treatment, and the hydrophilicity cannot be improved by the dry treatment, and the first hydrophilic treatment section Then, the contact angle is measured again and determined by the determination processing unit 70 after being wet processed (step S101).

  Next, in the film formation processing unit 80, the object is subjected to a film formation process (step S106), conveyed to the imprint processing unit 10, and imprinting is executed. When the object is the mold 25, for example, a release agent is formed, and when the object is the transfer substrate 15, for example, an adhesive is formed.

  In the imprint processing unit 10, first, the imprint material 5 is dropped onto the transfer substrate 15 from the nozzle 17 a of the inkjet head 17 and supplied (FIG. 4A).

  Next, the mold 25 is brought close to the transfer substrate 15, the mold 25 having the uneven pattern 25 a formed on the surface is brought into contact with the imprint material 5, and the imprint material 5 is filled between the transfer substrate 15 and the mold 25. To do. In addition, after making the mold 25 contact the imprint material 5 as needed, you may apply pressure to the mold 25 further and may apply a pressure with respect to the imprint material 5 (FIG.4 (b)).

  Next, the imprint material 5 is cured by irradiating the imprint material 5 with light L for curing the imprint material 5 using the irradiation unit 35 while maintaining the position of the mold 25 with respect to the transfer substrate 15 ( FIG. 4 (c)).

  Next, the mold 25 is separated from the transfer substrate 15, and the resin pattern 5A is formed on the transfer substrate 15 (FIG. 4D).

  Then, if necessary, the remaining film 5a of the resin pattern 5A is removed by etching or the like (FIG. 4E). If necessary, the transfer substrate 15 may be further processed based on the resin pattern 5A to manufacture a replica mold, a magnetic recording medium, a semiconductor device, or the like. Further, when it is only desired to obtain a concavo-convex structure with the cured imprint material 5, it is not always necessary to remove the remaining film 5a. For example, it can be applied to anti-counterfeiting processing for the purpose of manufacturing optical members such as antireflection films and holograms, and forming random structures.

  Further, in this embodiment, as shown in step S101 as a pre-stage of the film forming process, after the surface of the object is wet-treated, the contact angle of the surface of the object is measured as shown in step S102. If the degree of hydrophilization is appropriate, a film forming process is performed. If not appropriate, an appropriate process (wet process or dry process) is performed for the degree of hydrophilization. , Without performing the process of step S101, as shown in step S102, the contact angle of the surface of the object is measured and an appropriate process (wet process or dry process) for performing the film forming process is performed. It is also possible to make a determination for By such a process, the hydrophilicity of the surface of the target object during the film forming process can be improved.

  According to such an imprint method, imprint is appropriately executed after strictly managing the elapsed time after the wet process. Specifically, it is determined whether imprinting or film forming processing can be performed based on the elapsed time after the wet processing, and processing (wet processing or dry processing) suitable when it is determined that execution is impossible is performed. Since the film formation process is performed above, the film formation process is appropriately performed, and the mold release process or the adhesion process is stabilized, so that the imprint can be stably performed.

5 Imprint Material 15 Transfer Substrate 25 Mold 62 First Hydrophilization Processing Unit 64 Second Hydrophilization Processing Unit 72 Surface State Detection Unit 74 Determination Unit 80 Deposition Processing Unit

Claims (2)

An imprint material is supplied to the transfer substrate, and a resin pattern is formed on the transfer substrate using a mold.
A first hydrophilization treatment section for hydrophilizing the surface of the transfer substrate or the mold;
A second hydrophilic treatment unit that hydrophilizes the surface of the transfer substrate or the mold by a method different from the first hydrophilic treatment unit;
A surface state detection unit for measuring the degree of hydrophilicity of the surface of the transfer substrate or the mold processed by the first hydrophilization processing unit;
It has a threshold value indicating a predefined surface state, compares the measured value measured by the surface state detection unit with the threshold value, and determines whether the measured value is less than or equal to the threshold value A determination unit to perform,
When the detected value is less than or equal to the threshold value, a film is formed on the surface of the transfer substrate or the mold, and when the detected value is greater than or equal to the threshold value, the processing by the second hydrophilization processing unit When the detected value is less than or equal to the threshold value, a film forming unit that forms a film on the surface of the transfer substrate or the mold after the surface of the transfer substrate or the mold is hydrophilized by the second hydrophilizing unit. When,
A film forming apparatus characterized by comprising: An imprint apparatus that supplies an imprint material to a transfer substrate and forms a resin pattern on the transfer substrate using a mold,
A first hydrophilization treatment section for hydrophilizing the surface of the transfer substrate or the mold;
A second hydrophilic treatment unit that hydrophilizes the surface of the transfer substrate or the mold by a method different from the first hydrophilic treatment unit;
A surface state detection unit for measuring the degree of hydrophilicity of the surface of the transfer substrate or the mold processed by the first hydrophilization processing unit;
It has a threshold value indicating a predefined surface state, compares the measured value measured by the surface state detection unit with the threshold value, and determines whether the measured value is less than or equal to the threshold value A determination unit to perform,
When the detected value is less than or equal to the threshold value, a film is formed on the surface of the transfer substrate or the mold, and when the detected value is greater than or equal to the threshold value, the processing by the second hydrophilization processing unit When the detected value is less than or equal to the threshold value, a film forming unit that forms a film on the surface of the transfer substrate or the mold after the surface of the transfer substrate or the mold is hydrophilized by the second hydrophilizing unit. When,
An imprint apparatus, further comprising: a transfer unit that transfers a transfer pattern to a transfer substrate using the transfer substrate or the mold formed by the film forming unit.

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