JP2018056139A - Method of manufacturing enamel wire - Google Patents

Method of manufacturing enamel wire Download PDF

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JP2018056139A
JP2018056139A JP2017247126A JP2017247126A JP2018056139A JP 2018056139 A JP2018056139 A JP 2018056139A JP 2017247126 A JP2017247126 A JP 2017247126A JP 2017247126 A JP2017247126 A JP 2017247126A JP 2018056139 A JP2018056139 A JP 2018056139A
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enamel wire
solvent
conductor
furnace
paint
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泰弘 船山
Yasuhiro Funayama
泰弘 船山
研 大森
Ken Omori
研 大森
佐藤 俊一郎
Shunichiro Sato
俊一郎 佐藤
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Proterial Ltd
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Hitachi Metals Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a method of manufacturing an enamel wire capable of forming a coated film good in appearance even when a solvent in an enamel wire coating is vaporized in short time and the enamel wire coating is dried.SOLUTION: There is provided a method of manufacturing an enamel wire having a process for irradiating a light having a wavelength which matches a peak wavelength of less than 4 μm in wavelengths absorbed by a solvent in an enamel wire coating applied to a conductor and vaporizing the solvent so that a curing reaction of a resin in the enamel wire coating is prevented.SELECTED DRAWING: Figure 3A

Description

本発明は、エナメル線の製造方法に関する。   The present invention relates to a method for manufacturing an enameled wire.

エナメル線は、通常、導体に塗布されたエナメル線塗料中の溶剤を蒸発させてエナメル線塗料を乾燥させる工程と、エナメル線塗料中の樹脂を硬化させて導体に皮膜を焼き付ける工程とを経て製造される。従来、これらの工程は1つの装置の中で行われていた。   Enamelled wire is usually manufactured through a process of evaporating the solvent in the enameled wire paint applied to the conductor to dry the enameled wire paint and a step of curing the resin in the enameled wire paint and baking the film on the conductor. Is done. Conventionally, these steps have been performed in one apparatus.

エナメル線塗料中の溶剤を蒸発させてエナメル線塗料を乾燥させる方法としては、熱風、誘導加熱、赤外線等により加熱する方法が知られている(例えば、特許文献1参照)。   As a method of evaporating the solvent in the enamel wire paint and drying the enamel wire paint, a method of heating with hot air, induction heating, infrared rays or the like is known (for example, see Patent Document 1).

特開2012−252868号公報(段落〔0052〕)JP2012-252868 (paragraph [0052])

しかしながら、従来の方法によれば、導体の外周に皮膜を短時間で形成しようとする場合、乾燥させたエナメル線塗料の表面に波形が生じたり、エナメル線塗料の表面のみが乾燥(いわゆる皮張り)して溶剤が蒸発せずに残留してしまい、残留した溶剤に起因した発泡が皮膜に生じたりする問題があった。そのため、導体の外周に外観が良好な皮膜を形成するには、エナメル線塗料中の溶剤を蒸発させて乾燥させるのに時間をかける必要があった。   However, according to the conventional method, when a film is formed on the outer periphery of the conductor in a short time, a waveform is generated on the surface of the dried enamel wire paint, or only the surface of the enamel wire paint is dried (so-called skin coating). ) And the solvent remains without evaporating, and foaming due to the remaining solvent occurs in the film. Therefore, in order to form a film having a good appearance on the outer periphery of the conductor, it is necessary to take time to evaporate the solvent in the enamel wire paint and dry it.

そこで、本発明の目的は、エナメル線塗料中の溶剤を短時間で蒸発させてエナメル線塗料を乾燥させても外観が良好な皮膜を形成することのできるエナメル線の製造方法及び製造装置を提供することにある。   Accordingly, an object of the present invention is to provide an enameled wire manufacturing method and apparatus capable of forming a film having a good appearance even when the solvent in the enameled wire paint is evaporated in a short time and the enameled wire paint is dried. There is to do.

本発明は、上記目的を達成するために、下記のエナメル線の製造方法を提供する。   In order to achieve the above object, the present invention provides the following enameled wire manufacturing method.

[1]導体に塗布したエナメル線塗料中の溶剤が吸収する波長のうち4μm未満のピーク波長に合致する波長を持つ光を当てることにより前記エナメル線塗料中の樹脂を硬化反応させないように前記溶剤を蒸発させる工程を有するエナメル線の製造方法。 [1] The solvent so as not to cure the resin in the enamel wire paint by applying light having a wavelength that matches a peak wavelength of less than 4 μm among wavelengths absorbed by the solvent in the enamel wire paint applied to the conductor. The manufacturing method of an enameled wire which has the process of evaporating.

本発明によれば、エナメル線塗料中の溶剤を短時間で蒸発させてエナメル線塗料を乾燥させても外観が良好な皮膜を形成することのできるエナメル線の製造方法を提供することができる。   ADVANTAGE OF THE INVENTION According to this invention, even if the solvent in an enamel wire paint is evaporated in a short time and an enamel wire paint is dried, the manufacturing method of the enamel wire which can form a favorable external appearance can be provided.

本発明の実施の形態に係るエナメル線の製造装置の一例を示す概略図である。It is the schematic which shows an example of the manufacturing apparatus of the enamel wire which concerns on embodiment of this invention. 図1の製造装置の主要部を示す上面図である。It is a top view which shows the principal part of the manufacturing apparatus of FIG. 図1の蒸発炉の1実施形態を示す概略図(導体進行方向に垂直な断面図)である。It is the schematic (sectional drawing perpendicular | vertical to a conductor advancing direction) which shows one Embodiment of the evaporation furnace of FIG. 図3Aの蒸発炉(一部)を示す概略図(導体進行方向と平行な側面図)である。It is the schematic (side view parallel to a conductor advancing direction) which shows the evaporation furnace (part) of FIG. 3A. 図1の蒸発炉の別の1実施形態を示す概略図(導体進行方向に垂直な断面図)である。It is the schematic (sectional drawing perpendicular | vertical to a conductor advancing direction) which shows another one Embodiment of the evaporation furnace of FIG. 図4Aの蒸発炉を示す概略図(導体進行方向と平行な断面図)である。It is the schematic (sectional drawing parallel to a conductor advancing direction) which shows the evaporation furnace of FIG. 4A.

〔エナメル線の製造方法〕
本発明の実施の形態に係るエナメル線の製造方法は、導体に塗布したエナメル線塗料中の溶剤を、当該溶剤が吸収する波長のうち4μm未満のピーク波長に合致する波長を持つ光を当てることにより蒸発させる工程を有することを特徴とする。
[Method for producing enameled wire]
In the enameled wire manufacturing method according to the embodiment of the present invention, the solvent in the enameled wire coating applied to the conductor is irradiated with light having a wavelength that matches a peak wavelength of less than 4 μm among wavelengths absorbed by the solvent. It has the process of evaporating by.

図1は、本発明の実施の形態に係るエナメル線の製造装置の一例を示す概略図であり、図2は、図1の製造装置の主要部を示す上面図である。   FIG. 1 is a schematic view showing an example of an enameled wire manufacturing apparatus according to an embodiment of the present invention, and FIG. 2 is a top view showing a main part of the manufacturing apparatus of FIG.

図1に示されるように、導体1がプーリ11を介して焼鈍炉12に供給され、焼鈍しが行われる。焼鈍しは、必要が無ければ省略可能である。その後、導体1は、ターンプーリ13を介して塗料塗布部14へ走行され、導体1の外周にエナメル線塗料が塗布される。   As shown in FIG. 1, the conductor 1 is supplied to an annealing furnace 12 through a pulley 11 and annealing is performed. Annealing can be omitted if not necessary. Thereafter, the conductor 1 travels to the paint application unit 14 via the turn pulley 13 and the enamel wire paint is applied to the outer periphery of the conductor 1.

エナメル線塗料が塗布された導体1は、焼付炉10を構成する蒸発炉15及び硬化炉16中を走行し、エナメル線塗料中の溶剤の蒸発(すなわちエナメル線塗料の乾燥)及びエナメル線塗料中の樹脂の硬化(すなわち皮膜の焼付)が行われる。   The conductor 1 to which the enamel wire paint is applied travels in the evaporation furnace 15 and the curing furnace 16 constituting the baking furnace 10, and evaporates the solvent in the enamel wire paint (that is, the enamel wire paint is dried) and in the enamel wire paint. The resin is cured (that is, the film is baked).

図2に示されるように、エナメル線2は、下流側のターンプーリ13を介して上流側のターンプーリ13に戻り、エナメル線塗料の塗布、エナメル線塗料中の溶剤の蒸発及びエナメル線塗料中の樹脂の硬化が所望の皮膜厚さとなるまで繰り返し行われる。   As shown in FIG. 2, the enamel wire 2 returns to the upstream turn pulley 13 via the downstream turn pulley 13, the application of the enamel wire paint, the evaporation of the solvent in the enamel wire paint, and the resin in the enamel wire paint. Is repeated until the desired film thickness is obtained.

エナメル線塗料中の樹脂の硬化の方法は、特に限定されるものではなく、熱風等により加熱することで行なうことができる。   The method for curing the resin in the enamel wire paint is not particularly limited, and can be performed by heating with hot air or the like.

一方、エナメル線塗料中の溶剤の蒸発は、蒸発炉15中で、前述の通り、導体1に塗布したエナメル線塗料中の溶剤を、当該溶剤が吸収する波長のうち4μm未満のピーク波長に合致する波長を持つ光を当てることにより蒸発させることで行われる。   On the other hand, the evaporation of the solvent in the enamel wire paint matches the peak wavelength of less than 4 μm out of the wavelengths absorbed by the solvent in the enamel wire paint applied to the conductor 1 in the evaporation furnace 15 as described above. It is performed by evaporating by applying light having a wavelength to be applied.

上記ピーク波長は、2.0〜3.2μmの範囲内であることが好ましく、2.2〜3.1μmの範囲内であることがより好ましく、2.3〜3.0μmの範囲内であることがさらに好ましい。   The peak wavelength is preferably in the range of 2.0 to 3.2 μm, more preferably in the range of 2.2 to 3.1 μm, and in the range of 2.3 to 3.0 μm. More preferably.

エナメル線塗料が塗布された導体1に当てる上記光は、上記ピーク波長に合致するピーク波長を持つ光であることが好ましく、かつ、それ以外にピーク波長を持たない光であることがより好ましい。溶質である樹脂には吸収が無く、溶媒である溶剤にのみ吸収のある光を当てることにより、エナメル線塗料の表面の皮張りを抑制し、作業性が良化する。導体に塗布されたエナメル線塗料の表面の皮張りは、樹脂の架橋反応等の硬化反応が一因であるが、樹脂を加熱しないように溶剤のみが吸収する波長の光を照射することにより、樹脂の硬化反応を抑制でき、皮張りを抑制することができる。また、溶剤のみが吸収する波長の光を照射することにより、溶剤を低温で効率よく乾燥させることができる。このため、従来のように、短時間で乾燥させる場合に乾燥温度を高温にする必要が無く、溶剤の沸騰、突沸現象で生じる発泡を抑制することができる(発泡のリスクが減る)ため、導体の外周に形成した皮膜の外観が良好になる。   The light applied to the conductor 1 coated with the enamel wire paint is preferably light having a peak wavelength that matches the peak wavelength, and more preferably light having no other peak wavelength. Resin that is a solute has no absorption, and by applying light that is absorbed only to the solvent that is the solvent, the surface of the enamel wire paint is suppressed and the workability is improved. The surface of the enamel wire paint applied to the conductor is partly due to the curing reaction such as the crosslinking reaction of the resin, but by irradiating light of a wavelength that only the solvent absorbs so as not to heat the resin, Resin curing reaction can be suppressed, and skinning can be suppressed. Moreover, a solvent can be efficiently dried at low temperature by irradiating the light of the wavelength which only a solvent absorbs. For this reason, unlike the conventional case, when drying in a short time, there is no need to increase the drying temperature, and foaming caused by boiling and bumping of the solvent can be suppressed (the risk of foaming is reduced). The appearance of the film formed on the outer periphery of the film becomes good.

例えば、エナメル線塗料(例えばポリイミド塗料)中の溶剤としてN,N−ジメチルアセトアミド(DMAc)を用いた場合、N,N−ジメチルアセトアミド(DMAc)は、4μm未満において波長2.3μm及び3.0μmに吸収ピークを有しているため、2.3μm前後(2.3±0.2μm)又は3.0μm前後(3.0±0.2μm)にピーク波長を持つ光を照射することが好ましく、2.3μmか3.0μmにピーク波長を持つ光を照射することがより好ましく、かつそれら以外にピーク波長を持たない光を照射することがより好ましい。このとき、塗料中に溶けているポリアミック酸(硬化後にポリイミドとなる)には3.3μm以上にしか吸収が無いため、上記ピーク波長を持つ光を選ぶことにより、ポリアミック酸の閉環反応を抑制できるので、エナメル線塗料の表面を皮張りしにくくすることができる。   For example, when N, N-dimethylacetamide (DMAc) is used as a solvent in an enameled wire paint (for example, polyimide paint), N, N-dimethylacetamide (DMAc) has wavelengths of 2.3 μm and 3.0 μm at less than 4 μm. It is preferable to irradiate light having a peak wavelength around 2.3 μm (2.3 ± 0.2 μm) or around 3.0 μm (3.0 ± 0.2 μm). It is more preferable to irradiate light having a peak wavelength at 2.3 μm or 3.0 μm, and it is more preferable to irradiate light having no other peak wavelength. At this time, since the polyamic acid dissolved in the paint (which becomes a polyimide after curing) has an absorption of only 3.3 μm or more, the ring closure reaction of the polyamic acid can be suppressed by selecting light having the above peak wavelength. Therefore, it is possible to make the surface of the enamel wire paint difficult to skin.

以下、具体例を挙げて説明する。   Hereinafter, a specific example will be described.

図3Aは、図1の蒸発炉の1実施形態を示す概略図(導体進行方向に垂直な断面図)であり、図3Bは、図3Aの蒸発炉(一部)を示す概略図(導体進行方向と平行な側面図)である。   3A is a schematic diagram (cross-sectional view perpendicular to the conductor traveling direction) showing one embodiment of the evaporation furnace of FIG. 1, and FIG. 3B is a schematic diagram (partial) of the evaporation furnace (part) of FIG. 3A. Side view parallel to the direction).

蒸発炉の1実施形態である蒸発炉150には近赤外線ヒータ151及び集光板152が設置されており、蒸発炉150の炉開口部153を走行する導体1ないしエナメル線2に対し、近赤外線ヒータ151からの近赤外線を集光板152で集光して照射光151Aを当てることができる。   A near-infrared heater 151 and a light collector 152 are installed in an evaporation furnace 150 that is one embodiment of the evaporation furnace, and a near-infrared heater is provided to the conductor 1 or the enamel wire 2 that runs through the furnace opening 153 of the evaporation furnace 150. The near-infrared light from 151 can be condensed by the light collector 152 and irradiated with the irradiation light 151A.

また、図4Aは、図1の蒸発炉の別の1実施形態を示す概略図(導体進行方向に垂直な断面図)であり、図4Bは、図4Aの蒸発炉を示す概略図(導体進行方向と平行な断面図)である。   4A is a schematic diagram showing another embodiment of the evaporation furnace of FIG. 1 (cross-sectional view perpendicular to the conductor traveling direction), and FIG. 4B is a schematic diagram showing the evaporation furnace of FIG. 4A (conductor progressing). It is sectional drawing parallel to a direction).

蒸発炉の別の1実施形態である蒸発炉250にはレーザ照射ユニット251が設置されており、蒸発炉250の炉開口部252を走行する導体1ないしエナメル線2に対し、レーザ照射ユニット251からのレーザ光(照射光251A)を当てることができる。   A laser irradiation unit 251 is installed in an evaporation furnace 250, which is another embodiment of the evaporation furnace, and the laser irradiation unit 251 is connected to the conductor 1 or the enamel wire 2 that runs through the furnace opening 252 of the evaporation furnace 250. The laser beam (irradiation light 251A) can be applied.

エナメル線塗料中の溶剤が吸収する波長のうち4μm未満のピーク波長に合致する波長を照射する光源としては、上記の近赤外線ヒータや半導体レーザ光に限られない。例えば、LED(発光ダイオード)、高輝度放電ランプ、EL(エレクトロルミネセンス)ライトであってもよい。   The light source for irradiating the wavelength that matches the peak wavelength of less than 4 μm out of the wavelengths absorbed by the solvent in the enamel wire paint is not limited to the near infrared heater and the semiconductor laser light. For example, it may be an LED (light emitting diode), a high-intensity discharge lamp, or an EL (electroluminescence) light.

近赤外線は、近赤外線ヒータ151のみならず、石英管とタングステンフィラメントで赤外線を発生し、冷却により遠赤外線領域をカットすることで近赤外線のみを照射することができる波長制御ヒータを用いて照射することもできる。   Near-infrared rays are irradiated not only with the near-infrared heater 151 but also with a wavelength control heater that generates infrared rays with a quartz tube and a tungsten filament, and can irradiate only near-infrared rays by cutting the far-infrared region by cooling. You can also.

レーザ照射ユニット251としては、例えば半導体レーザ照射ユニットが好適である。   As the laser irradiation unit 251, for example, a semiconductor laser irradiation unit is suitable.

近赤外線ヒータ151やレーザ照射ユニット251は、導体の進行方向に対し垂直な方向に、複数個(例えば12個)、配列されている。また、近赤外線ヒータ151は、導体進行方向に対し平行な方向に、走行する導体を挟むように互いに対向する位置(図3A、図3Bでは走行する導体の上下)に1つずつ50〜800cmの長さのものが設けられており、レーザ照射ユニット251は、導体の進行方向に対し平行な方向に、走行する導体を挟むように互いに対向する位置(図4A、図4Bでは走行する導体の上下)にそれぞれ複数個(例えば2個)、配列されている。近赤外線ヒータ151の長さ・設置個数、及びレーザ照射ユニット251の設置個数は、適宜設定すればよく、これらに限定されるものではない。   A plurality of (for example, twelve) near infrared heaters 151 and laser irradiation units 251 are arranged in a direction perpendicular to the traveling direction of the conductor. Further, the near infrared heater 151 is 50 to 800 cm at a position facing each other so as to sandwich the traveling conductor in a direction parallel to the conductor traveling direction (up and down of the traveling conductor in FIGS. 3A and 3B). The laser irradiation unit 251 is provided at a position facing each other so as to sandwich the traveling conductor in a direction parallel to the traveling direction of the conductor (in FIG. 4A and FIG. 4B, ) Are arranged in plural (for example, two). The length and the number of installed near infrared heaters 151 and the number of installed laser irradiation units 251 may be set as appropriate, and are not limited thereto.

焼付が終了したエナメル線2は、巻取機17に巻き取られる。   The enameled wire 2 that has been baked is wound around the winder 17.

本実施の形態において使用される導体1の素材は、銅、銅合金等、特に限定されることなく使用できる。また、導体1の形状としては、丸線、平角導体等が挙げられるが、特に平角導体の場合に従来方法に比べてメリットがある。   The material of the conductor 1 used in the present embodiment can be used without any particular limitation, such as copper or copper alloy. In addition, examples of the shape of the conductor 1 include a round wire, a rectangular conductor, and the like. In the case of a rectangular conductor, there is an advantage over the conventional method.

平角エナメル線に塗布すると従来の方法では、乾燥させる速度が遅く、短時間で乾燥させることができないことにより、塗膜(平角導体に塗布したエナメル線塗料)が乾燥する前に流れてしまう、特に平角導体の角部に塗布したエナメル線塗料が角部の周辺へと流れてしまうため、皮膜の付き回りが悪くなる。つまり、皮膜の厚さが均一にならなかった。これに対して、本発明の実施形態に係る方法によれば、短時間で(かつ好ましい実施形態では低温で)乾燥できるため、塗膜が流れるのを抑制した状態で乾燥させることができる。このため、皮膜の付き回りが悪くなるのを抑制することができる。このように、本発明の実施形態では、乾燥速度を速くすることができるため、塗膜が垂れにくくなり、良好な皮膜状態の太線や平角線が製造できるようになる。   When applied to a flat enameled wire, the conventional method has a slow drying speed and cannot be dried in a short time, so that the coating film (enameled wire paint applied to the flat conductor) flows before drying. Since the enameled wire paint applied to the corners of the flat conductor flows to the periphery of the corners, the coating of the coating becomes worse. That is, the thickness of the film was not uniform. On the other hand, according to the method according to the embodiment of the present invention, since it can be dried in a short time (and at a low temperature in a preferred embodiment), it can be dried in a state where the coating film is prevented from flowing. For this reason, it can suppress that the surroundings of a film worsen. Thus, in the embodiment of the present invention, since the drying speed can be increased, the coating film is less likely to sag, and a thick line or a rectangular line having a good coating state can be manufactured.

本実施の形態において使用されるエナメル線塗料としては、エナメル線に使用可能なものであれば特に限定されることなく用いることができる。例えば、エナメル線塗料中の溶剤としては、N−メチル−2−ピロリドン(NMP)、クレゾール、N,N−ジメチルアセトアミド(DMAc)、シクロヘキサノン等が挙げられる。また、エナメル線塗料中の樹脂としては、ポリアミドイミド、ポリイミド、ポリエステルイミド等が挙げられる。   The enamel wire paint used in the present embodiment is not particularly limited as long as it can be used for the enamel wire. Examples of the solvent in the enamel wire paint include N-methyl-2-pyrrolidone (NMP), cresol, N, N-dimethylacetamide (DMAc), cyclohexanone and the like. Examples of the resin in the enamel wire paint include polyamideimide, polyimide, and polyesterimide.

〔エナメル線の製造装置〕
本発明の実施の形態に係るエナメル線の製造装置は、4μm未満にピーク波長を持つ光をエナメル線塗料が塗布された走行導体に照射する照射装置が設置された焼付炉を備えることを特徴とする。
[Enamel wire manufacturing equipment]
An enameled wire manufacturing apparatus according to an embodiment of the present invention includes a baking furnace provided with an irradiation device for irradiating a traveling conductor coated with an enameled wire paint with light having a peak wavelength of less than 4 μm. To do.

エナメル線の製造装置の具体的な構成例は、図1〜4に示す通りであり、前述した焼付炉10〜巻取機17の通りである。   A specific configuration example of the enameled wire manufacturing apparatus is as shown in FIGS. 1 to 4, and is the same as the baking furnace 10 and the winder 17 described above.

本実施形態においては、別々の蒸発炉15と硬化炉16からなる焼付炉10とし、蒸発炉15に上記照射装置を設けたが、蒸発炉15と硬化炉16とが一体となった焼付炉としてもよく、当該焼付炉の上流側(導体入口側)に上記照射装置を設ける構成としてもよい。硬化炉16における硬化処理(熱風等)の影響を受けにくくする点においては、本実施形態のように蒸発炉15と硬化炉16とを別々にすることが好ましい。これにより、外観がより良好な皮膜を形成することができる。   In the present embodiment, the baking furnace 10 including the separate evaporation furnace 15 and the curing furnace 16 is provided, and the irradiation apparatus is provided in the evaporation furnace 15. However, as the baking furnace in which the evaporation furnace 15 and the curing furnace 16 are integrated. Alternatively, the irradiation device may be provided on the upstream side (conductor inlet side) of the baking furnace. In terms of making it difficult to be affected by the curing process (hot air or the like) in the curing furnace 16, it is preferable to separate the evaporation furnace 15 and the curing furnace 16 as in the present embodiment. Thereby, a film with a better appearance can be formed.

また、本実施形態においては、焼付炉を横型炉としたが、前述の特許文献1に示されるような縦型炉としてもよい。   In the present embodiment, the baking furnace is a horizontal furnace, but it may be a vertical furnace as disclosed in Patent Document 1 described above.

〔本発明の実施の形態の効果〕
本発明の実施の形態によれば、エナメル線塗料中の溶剤を短時間で蒸発させてエナメル線塗料を乾燥させても外観が良好な皮膜を形成することのできるエナメル線の製造方法及び製造装置を提供することができる。すなわち、熱風等を利用してエナメル線塗料を乾燥させる場合に比べ、短時間で溶剤を蒸発させてエナメル線塗料を乾燥できるため、エナメル線の製造速度がアップし、製造コストダウンが可能となる。また、焼付炉を短くできるため、製造装置の設置場所の省スペース化が可能となる。さらに、溶剤分子を振動させて溶剤を揮散させることにより溶剤を均一的に蒸発させてエナメル線塗料を乾燥させることを可能としたため、熱を利用する場合に比べて、発泡や皮張り等を抑制できる。
[Effect of the embodiment of the present invention]
According to an embodiment of the present invention, an enameled wire manufacturing method and a manufacturing apparatus capable of forming a film having a good appearance even when the solvent in the enameled wire paint is evaporated in a short time to dry the enameled wire paint Can be provided. That is, the enameled wire paint can be dried by evaporating the solvent in a short time compared with the case of drying the enameled wire paint using hot air or the like, so that the production speed of the enameled wire can be increased and the production cost can be reduced. . In addition, since the baking furnace can be shortened, it is possible to save the space for installing the manufacturing apparatus. In addition, the solvent is volatilized by vibrating the solvent molecules, allowing the solvent to evaporate uniformly and drying the enamel wire paint, thereby suppressing foaming and skinning compared to when heat is used. it can.

なお、本発明は、上記実施の形態に限定されず種々に変形実施が可能である。例えば、本発明の効果を奏する限りにおいて、蒸発炉15において、熱風(好ましくは低温・低風速)を併用することもできる。   In addition, this invention is not limited to the said embodiment, A various deformation | transformation implementation is possible. For example, hot air (preferably low temperature and low wind speed) can be used in combination in the evaporation furnace 15 as long as the effects of the present invention are exhibited.

1:導体、2:エナメル線
10:焼付炉、11:プーリ、12:焼鈍炉、13:ターンプーリ
14:塗料塗布部、15:蒸発炉、16:硬化炉、17:巻取機
150:蒸発炉、151:近赤外線ヒータ、151A:照射光
152:集光板、153:炉開口部
250:蒸発炉、251:レーザ照射ユニット、251A:照射光
252:炉開口部
DESCRIPTION OF SYMBOLS 1: Conductor, 2: Enamel wire 10: Baking furnace, 11: Pulley, 12: Annealing furnace, 13: Turn pulley 14: Paint application part, 15: Evaporating furnace, 16: Curing furnace, 17: Winding machine 150: Evaporating furnace , 151: near infrared heater, 151A: irradiation light 152: light collector, 153: furnace opening 250: evaporating furnace, 251: laser irradiation unit, 251A: irradiation light 252: furnace opening

Claims (1)

導体に塗布したエナメル線塗料中の溶剤が吸収する波長のうち4μm未満のピーク波長に合致する波長を持つ光を当てることにより前記エナメル線塗料中の樹脂を硬化反応させないように前記溶剤を蒸発させる工程を有するエナメル線の製造方法。   The solvent is evaporated so that the resin in the enamel wire paint does not undergo a curing reaction by applying light having a wavelength that matches a peak wavelength of less than 4 μm among wavelengths absorbed by the solvent in the enamel wire paint applied to the conductor. The manufacturing method of an enameled wire which has a process.
JP2017247126A 2017-12-25 2017-12-25 Method of manufacturing enamel wire Pending JP2018056139A (en)

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10289625A (en) * 1997-04-16 1998-10-27 Hitachi Cable Ltd Enamel wire baking furnace
JP2012252870A (en) * 2011-06-02 2012-12-20 Sumitomo Electric Wintec Inc Apparatus for manufacturing insulated wire and method for manufacturing insulated wire

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10289625A (en) * 1997-04-16 1998-10-27 Hitachi Cable Ltd Enamel wire baking furnace
JP2012252870A (en) * 2011-06-02 2012-12-20 Sumitomo Electric Wintec Inc Apparatus for manufacturing insulated wire and method for manufacturing insulated wire

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
上嶋由紀夫,: "ハロゲンヒータを用いた赤外線加熱の特長と加熱事例,", ライトエッジ, JPN6018015709, June 2013 (2013-06-01), JP, pages 10 - 19, ISSN: 0004045729 *

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