JP2018047408A - Chemical reactor, and production method of particle using chemical reactor - Google Patents

Chemical reactor, and production method of particle using chemical reactor Download PDF

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JP2018047408A
JP2018047408A JP2016183162A JP2016183162A JP2018047408A JP 2018047408 A JP2018047408 A JP 2018047408A JP 2016183162 A JP2016183162 A JP 2016183162A JP 2016183162 A JP2016183162 A JP 2016183162A JP 2018047408 A JP2018047408 A JP 2018047408A
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aqueous solution
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JP6690485B2 (en
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和彦 土岡
Kazuhiko Tsuchioka
和彦 土岡
修平 中倉
Shuhei Nakakura
修平 中倉
槙 孝一郎
Koichiro Maki
孝一郎 槙
一臣 漁師
Kazuomi Ryoshi
一臣 漁師
元彬 猿渡
Motoaki Saruwatari
元彬 猿渡
慶彦 中尾
Norihiko Nakao
慶彦 中尾
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Sumitomo Metal Mining Co Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract

PROBLEM TO BE SOLVED: To provide a chemical reactor with which quality of particles can efficiently be improved.SOLUTION: In a chemical reactor, particles are deposited in a solution while a raw material liquid is supplied into the solution. The chemical reactor includes: a stirring vessel to contain the solution; a raw material liquid supply tube having a discharge part to discharge the raw material liquid in the stream of the solution; and a flow adjustment member to adjust the stream of the solution on the upstream side of the discharge part, in which the flow adjustment member has a wall surface to receive the stream of the solution and make it flow toward the discharge part, and has protrusions protruding from the wall surface.SELECTED DRAWING: Figure 3

Description

本発明は、化学反応装置、および、化学反応装置を用いた粒子の製造方法に関する。   The present invention relates to a chemical reaction apparatus and a method for producing particles using the chemical reaction apparatus.

近年、携帯電話、ノート型パーソナルコンピュータなどの携帯電子機器の普及に伴い、高いエネルギー密度を有する小型で軽量な二次電池の開発が要求されている。また、ハイブリット自動車を始めとする電気自動車用の電池として、高出力の二次電池の開発も要求されている。このような要求を満たす非水系電解質二次電池として、リチウムイオン二次電池がある。リチウムイオン二次電池は、負極、正極、電解液などで構成され、負極および正極の活物質には、リチウムを脱離および挿入することが可能な材料が用いられている。   In recent years, with the spread of portable electronic devices such as mobile phones and notebook personal computers, development of small and lightweight secondary batteries having high energy density is required. In addition, as a battery for electric vehicles such as hybrid vehicles, development of a high output secondary battery is also required. There is a lithium ion secondary battery as a non-aqueous electrolyte secondary battery that satisfies such requirements. A lithium ion secondary battery includes a negative electrode, a positive electrode, an electrolytic solution, and the like, and a material capable of desorbing and inserting lithium is used as an active material for the negative electrode and the positive electrode.

リチウム複合酸化物、特に合成が比較的容易なリチウムコバルト複合酸化物を正極材料に用いたリチウムイオン二次電池は、4V級の高い電圧が得られるため、高エネルギー密度を有する電池として期待され、実用化が進んでいる。リチウムコバルト複合酸化物を用いた電池では、優れた初期容量特性やサイクル特性を得るための開発はこれまで数多く行われてきており、すでにさまざまな成果が得られている。   A lithium ion secondary battery using a lithium composite oxide, particularly a lithium cobalt composite oxide that is relatively easy to synthesize as a positive electrode material, is expected as a battery having a high energy density because a high voltage of 4V class is obtained. Practical use is progressing. A battery using a lithium cobalt composite oxide has been developed so far to obtain excellent initial capacity characteristics and cycle characteristics, and various results have already been obtained.

しかしながら、リチウムコバルト複合酸化物は、原料に高価なコバルト化合物を用いるため、このリチウムコバルト複合酸化物を用いる電池の容量あたりの単価は、ニッケル水素電池より大幅に高くなり、適用可能な用途はかなり限定されている。したがって、携帯機器用の小型二次電池についてだけではなく、電力貯蔵用や電気自動車用などの大型二次電池についても、正極材料のコストを下げ、より安価なリチウムイオン二次電池の製造を可能とすることに対する期待は大きく、その実現は、工業的に大きな意義があるといえる。   However, since lithium cobalt composite oxide uses an expensive cobalt compound as a raw material, the unit price per capacity of a battery using this lithium cobalt composite oxide is significantly higher than that of a nickel metal hydride battery. Limited. Therefore, not only for small secondary batteries for portable devices, but also for large-sized secondary batteries for power storage and electric vehicles, it is possible to reduce the cost of positive electrode materials and manufacture cheaper lithium ion secondary batteries There is great expectation for this, and it can be said that its realization has great industrial significance.

リチウムイオン二次電池用活物質の新たなる材料としては、コバルトよりも安価なニッケルを用いたリチウムニッケル複合酸化物を挙げることができる、このリチウムニッケル複合酸化物は、リチウムコバルト複合酸化物よりも低い電気化学ポテンシャルを示すため、電解液の酸化による分解が問題になりにくく、より高容量が期待でき、コバルト系と同様に高い電池電圧を示すことから、開発が盛んに行われている。しかし、純粋にニッケルのみで合成したリチウムニッケル複合酸化物を正極材料としてリチウムイオン二次電池を作製した場合、コバルト系に比ベサイクル特性が劣り、また、高温環境下で使用や保存により比較的電池性能を損ないやすいという欠点を有しているため、ニッケルの一部をコバルトやアルミニウムで置換したリチウムニッケル複合酸化物が一般的に知られている。   As a new material of the active material for the lithium ion secondary battery, a lithium nickel composite oxide using nickel which is cheaper than cobalt can be cited. This lithium nickel composite oxide is more than the lithium cobalt composite oxide. Since it exhibits a low electrochemical potential, decomposition due to oxidation of the electrolytic solution is less likely to be a problem, higher capacity can be expected, and high battery voltage is exhibited in the same manner as cobalt-based, and therefore, development is actively performed. However, when a lithium-ion secondary battery is produced using a lithium-nickel composite oxide synthesized solely with nickel as a positive electrode material, the cycle characteristics are inferior to those of a cobalt-based battery, and the battery is relatively easy to use and store in a high-temperature environment. Lithium nickel composite oxides in which a part of nickel is substituted with cobalt or aluminum are generally known because they have a drawback that the performance tends to be impaired.

正極活物質の一般的な製造方法は、(1)まず、中和晶析法によりリチウムニッケル複合酸化物の前駆体であるニッケル複合水酸化物を作製し、(2)その前駆体をリチウム化合物と混合して焼成する方法が知られている。このうち、(1)の中和晶析法によって粒子を製造する方法として、代表的な実施の形態は、撹拌槽を用いたプロセスである。   A general method for producing a positive electrode active material is as follows: (1) First, a nickel composite hydroxide, which is a precursor of a lithium nickel composite oxide, is prepared by neutralization crystallization, and (2) the precursor is converted into a lithium compound. A method of mixing and baking is known. Among these, as a method for producing particles by the neutralization crystallization method of (1), a typical embodiment is a process using a stirring tank.

特許文献1では、撹拌槽内に、ニッケル塩およびコバルト塩を含む混合水溶液と、アンモニウムイオン供給体を含む水溶液と、苛性アルカリ水溶液とを供給して反応させ、ニッケルコバルト複合水酸化物の粒子を析出させている。混合水溶液の供給口当たりの反応水溶液量に対する供給量の割合を0.04体積%/分以下とすることで、粒径が大きく、結晶性が高く、形状が略球状の粒子が得られると記載されている。   In Patent Document 1, a mixed aqueous solution containing a nickel salt and a cobalt salt, an aqueous solution containing an ammonium ion supplier, and a caustic aqueous solution are allowed to react in a stirring tank, and the particles of nickel cobalt composite hydroxide are reacted. It is deposited. It is described that particles having a large particle size, high crystallinity, and a substantially spherical shape can be obtained by setting the ratio of the supply amount to the reaction aqueous solution amount per supply port of the mixed aqueous solution to 0.04 vol% / min or less. ing.

特開2011−201764号公報JP 2011-201764 A

従来から、撹拌槽を用いて所望の特性の粒子を得るため、様々な検討がなされている。   Conventionally, various studies have been made to obtain particles having desired characteristics using a stirring tank.

しかしながら、撹拌翼のタイプや翼径、撹拌槽の容積などの装置構造が変わると、その都度、条件出しが必要であった。   However, every time the structure of the apparatus such as the type and diameter of the stirring blade and the volume of the stirring tank changes, it is necessary to determine the conditions.

本発明者は、様々な構造の化学反応装置で普遍的に、粒子の品質を向上できる条件を検討し、撹拌槽内の溶液に占める高過飽和領域の体積割合に着目した。   The present inventor has studied the conditions that can improve the quality of particles universally in chemical reactors of various structures, and has focused on the volume ratio of the highly supersaturated region in the solution in the stirring tank.

ここで、高過飽和領域とは、溶液中に溶けている粒子成分の濃度が所定値以上の領域を意味する。高過飽和領域では、粒子成分の濃度が溶解度よりも十分に高いので、粒子成分の析出が有意な速さで進む。   Here, the high supersaturation region means a region where the concentration of the particle component dissolved in the solution is a predetermined value or more. In the high supersaturation region, the concentration of the particle component is sufficiently higher than the solubility, so that the precipitation of the particle component proceeds at a significant speed.

本発明者は、撹拌槽内の溶液に占める高過飽和領域の体積割合が小さいほど、粒子成分の析出が緩やかに進むので、粒子の品質を向上できることを見出した。   The present inventor has found that the smaller the volume ratio of the highly supersaturated region in the solution in the stirring tank, the more slowly the precipitation of the particle component proceeds, so that the particle quality can be improved.

ところで、高過飽和領域は、溶液中に原料液を吐出する吐出口付近に形成される。高過飽和領域の体積の低減には、粒子成分の速やかな分散が求められ、撹拌翼の回転数の増加が有効である。   By the way, the high supersaturation region is formed in the vicinity of the discharge port for discharging the raw material liquid into the solution. In order to reduce the volume of the high supersaturation region, prompt dispersion of the particle components is required, and an increase in the number of revolutions of the stirring blade is effective.

しかしながら、撹拌翼の回転数を増大させると、消費エネルギーが大きくなってしまう。   However, when the rotation speed of the stirring blade is increased, the energy consumption increases.

本発明は、上記課題に鑑みてなされたものであって、効率的に粒子の品質を向上できる、化学反応装置の提供を主な目的とする。   This invention is made | formed in view of the said subject, Comprising: It aims at provision of the chemical reaction apparatus which can improve the quality of particle | grains efficiently.

上記課題を解決するため、本発明の一態様によれば、
溶液の中に原料液を供給しながら、前記溶液の中で粒子を析出させる、化学反応装置であって、
前記溶液を収容する撹拌槽と、
前記溶液の流れの中で前記原料液を吐出する吐出部を有する原料液供給管と、
前記吐出部の上流側における前記溶液の流れを調整する流れ調整部材とを備え、
前記流れ調整部材は、前記吐出部に向けて前記溶液の流れを受け流す壁面と、前記壁面から突出する突起とを有する、化学反応装置が提供される。
In order to solve the above problems, according to one aspect of the present invention,
A chemical reaction device for precipitating particles in the solution while supplying the raw material liquid into the solution,
A stirring tank containing the solution;
A raw material liquid supply pipe having a discharge section for discharging the raw material liquid in the flow of the solution;
A flow adjusting member for adjusting the flow of the solution on the upstream side of the discharge unit,
A chemical reaction device is provided in which the flow adjusting member has a wall surface that receives the flow of the solution toward the discharge portion and a protrusion that protrudes from the wall surface.

本発明の一態様によれば、効率的に粒子の品質を向上できる、化学反応装置が提供される。   According to one embodiment of the present invention, a chemical reaction device that can efficiently improve the quality of particles is provided.

一実施形態による化学反応装置を示す上面図である。It is a top view which shows the chemical reaction apparatus by one Embodiment. 図1のII−II線に沿った断面図である。It is sectional drawing along the II-II line of FIG. 一実施形態による化学反応装置の要部を示す斜視図である。It is a perspective view which shows the principal part of the chemical reaction apparatus by one Embodiment. 第1変形例による化学反応装置の要部を示す斜視図である。It is a perspective view which shows the principal part of the chemical reaction apparatus by a 1st modification. 第2変形例による化学反応装置の要部を示す斜視図である。It is a perspective view which shows the principal part of the chemical reaction apparatus by a 2nd modification. 第3変形例による化学反応装置の要部を示す斜視図である。It is a perspective view which shows the principal part of the chemical reaction apparatus by a 3rd modification. 一実施形態によるニッケル含有水酸化物の製造方法のフローチャートである。It is a flowchart of the manufacturing method of the nickel containing hydroxide by one Embodiment. 一実施形態による粒子成長工程の前半で形成される凝集体を模式化した断面図である。It is sectional drawing which modeled the aggregate formed in the first half of the particle growth process by one Embodiment. 一実施形態による粒子成長工程の後半で形成される外殻を模式化した断面図である。It is sectional drawing which modeled the outer shell formed in the second half of the particle growth process by one Embodiment. 一実施形態による核生成工程における反応水溶液中の第1高過飽和領域を示す図である。It is a figure which shows the 1st highly supersaturated area | region in the reaction aqueous solution in the nucleation process by one Embodiment. 連続式の撹拌槽内の反応水溶液に占める第1高過飽和領域の体積割合が0.025%である場合に得られた粒子の一例のSEM写真である。It is a SEM photograph of an example of the particles obtained when the volume ratio of the first highly supersaturated region in the reaction aqueous solution in the continuous stirring tank is 0.025%. 連続式の撹拌槽内の反応水溶液に占める第1高過飽和領域の体積割合が0.100%である場合に得られた粒子の一例のSEM写真である。It is a SEM photograph of an example of the particle | grains obtained when the volume ratio of the 1st high supersaturation area | region which occupies for the reaction aqueous solution in a continuous stirring tank is 0.100%. 一実施形態による粒子成長工程における反応水溶液中の第2高過飽和領域を示す図である。It is a figure which shows the 2nd highly supersaturated area | region in the reaction aqueous solution in the particle growth process by one Embodiment. 連続式の撹拌槽内の反応水溶液に占める第2高過飽和領域の体積割合が0.379%である場合に得られた粒子の断面の一例のSEM写真である。It is a SEM photograph of an example of the section of the particle obtained when the volume ratio of the 2nd high supersaturation field to the reaction aqueous solution in a continuous stirring tank is 0.379%. 連続式の撹拌槽内の反応水溶液に占める第2高過飽和領域の体積割合が0.624%である場合に得られた粒子の断面の一例のSEM写真である。It is a SEM photograph of an example of the section of the particle obtained when the volume ratio of the 2nd high supersaturation field which occupies for the reaction aqueous solution in a continuous type stirring tank is 0.624%.

以下、本発明を実施するための形態について図面を参照して説明するが、各図面において、同一の又は対応する構成については同一の又は対応する符号を付して説明を省略する。   DESCRIPTION OF EMBODIMENTS Hereinafter, embodiments for carrying out the present invention will be described with reference to the drawings. In each of the drawings, the same or corresponding components are denoted by the same or corresponding reference numerals, and description thereof will be omitted.

図1は、一実施形態による化学反応装置を示す上面図である。図2は、図1のII−II線に沿った断面図である。   FIG. 1 is a top view showing a chemical reaction device according to an embodiment. FIG. 2 is a cross-sectional view taken along line II-II in FIG.

化学反応装置10は、溶液の中に原料液を供給しながら、溶液の中で粒子を析出させる。例えば、溶液は金属塩と塩基とを含み、原料液は金属塩を含み、粒子は中和晶析によって析出する。金属塩がニッケル塩を含む場合、粒子はニッケル含有水酸化物である。尚、粒子の種類は、ニッケル含有水酸化物には限定されない。   The chemical reaction apparatus 10 deposits particles in the solution while supplying the raw material liquid into the solution. For example, the solution contains a metal salt and a base, the raw material solution contains a metal salt, and the particles are precipitated by neutralization crystallization. When the metal salt includes a nickel salt, the particles are nickel-containing hydroxides. The kind of particles is not limited to nickel-containing hydroxide.

化学反応装置10は、例えば、撹拌槽20と、撹拌翼30と、撹拌軸40と、バッフル50とを有する。撹拌槽20は、円柱状の内部空間に溶液を収容する。撹拌翼30は、撹拌槽20内の溶液を撹拌させる。撹拌翼30は、撹拌軸40の下端に取付けられる。モータなどが撹拌軸40を回転させることで、撹拌翼30が回転される。撹拌槽20の中心線、撹拌翼30の中心線、および撹拌軸40の中心線は、一致してよく、鉛直とされてよい。バッフル50は、邪魔板とも呼ばれる。バッフル50は、撹拌槽20の内周面から突出しており、回転流を邪魔することで上昇流や下降流を生じさせ、溶液の撹拌効率を向上させる。   The chemical reaction apparatus 10 includes, for example, a stirring tank 20, a stirring blade 30, a stirring shaft 40, and a baffle 50. The stirring tank 20 stores the solution in a cylindrical internal space. The stirring blade 30 stirs the solution in the stirring tank 20. The stirring blade 30 is attached to the lower end of the stirring shaft 40. The stirring blade 30 is rotated by rotating the stirring shaft 40 by a motor or the like. The center line of the stirring tank 20, the center line of the stirring blade 30, and the center line of the stirring shaft 40 may coincide with each other and may be vertical. The baffle 50 is also called a baffle plate. The baffle 50 protrudes from the inner peripheral surface of the agitation tank 20, and generates an upward flow and a downward flow by obstructing the rotational flow, thereby improving the efficiency of stirring the solution.

本発明者は、様々な構造の化学反応装置で普遍的に、粒子の品質を向上できる条件を検討し、撹拌槽20内の溶液に占める高過飽和領域の体積割合に着目した。   The inventor has studied the conditions that can improve the quality of particles universally with chemical reaction apparatuses having various structures, and has focused on the volume ratio of the highly supersaturated region in the solution in the stirring tank 20.

高過飽和領域とは、溶液中に溶けている粒子成分の濃度が所定値以上の領域を意味する。高過飽和領域では、粒子成分の濃度が溶解度よりも十分に高いので、粒子成分の析出が有意な速さで進む。   The high supersaturated region means a region where the concentration of the particle component dissolved in the solution is a predetermined value or more. In the high supersaturation region, the concentration of the particle component is sufficiently higher than the solubility, so that the precipitation of the particle component proceeds at a significant speed.

撹拌槽20内の溶液に占める高過飽和領域の体積割合が小さいほど、粒子成分の析出が緩やかに進むので、粒子の品質を向上できる。ここで、高過飽和領域の数が複数の場合、高過飽和領域の体積とは合計の体積を意味する。   As the volume ratio of the highly supersaturated region occupying the solution in the stirring tank 20 is smaller, the precipitation of the particle component proceeds more gradually, so that the quality of the particles can be improved. Here, when there are a plurality of high supersaturation regions, the volume of the high supersaturation region means the total volume.

高過飽和領域は、原料液の吐出口付近に形成される。その吐出口は溶液の流れ場に設置されているため、高過飽和領域の体積などは流れ場の影響を受ける。流れ場は、撹拌翼30の回転数の他、撹拌翼30のタイプや翼径、撹拌槽20の容積などの条件により変化する。以下、撹拌槽20内の流れ場に影響を与える条件を撹拌条件と呼ぶ。   The high supersaturated region is formed in the vicinity of the raw material liquid discharge port. Since the discharge port is installed in the flow field of the solution, the volume of the highly supersaturated region is affected by the flow field. A flow field changes with conditions, such as the rotation speed of the stirring blade 30, the type and blade diameter of the stirring blade 30, and the volume of the stirring tank 20. Hereinafter, conditions that affect the flow field in the stirring tank 20 are referred to as stirring conditions.

撹拌槽20内の流れ場や高過飽和領域の体積は、シミュレーションにより確認できる。以下、連続式の撹拌槽内で、硫酸ニッケルと水酸化ナトリウムとを反応させて、水酸化ニッケルを製造する場合の定常状態の流体解析について主に説明する。流体解析ソフトとしては、ANSYS社製のANSYS CFX Ver15.0(商品名)を用いる。解析条件などを以下に示す。   The flow field in the stirring tank 20 and the volume of the highly supersaturated region can be confirmed by simulation. Hereinafter, steady state fluid analysis in the case of producing nickel hydroxide by reacting nickel sulfate and sodium hydroxide in a continuous stirring tank will be mainly described. As the fluid analysis software, ANSYS CFX Ver15.0 (trade name) manufactured by ANSYS is used. The analysis conditions are shown below.

<座標系>
・流体解析を行う領域(以下、「解析領域」とも呼ぶ。)のうち、撹拌軸や撹拌翼の周りは、撹拌軸や撹拌翼と共に回転する回転座標系で扱う。回転座標系で扱う領域は、円柱状であって、その中心線を撹拌軸や撹拌翼の中心線に重ね、その直径を撹拌翼の翼径の115%に設定し、上下方向の範囲を撹拌槽の内底面から液面までとする。
・解析領域のうち、その他の領域は、静止座標系で扱う。
・回転座標系と静止座標系とは、流体解析ソフトのインターフェース機能を使用して接続する。インターフェース機能としては、オプションの「Frozen Rotor」を用いる。
<Coordinate system>
-Of the region where fluid analysis is performed (hereinafter also referred to as "analysis region"), the area around the stirring shaft and stirring blade is handled by a rotating coordinate system that rotates together with the stirring shaft and stirring blade. The area handled in the rotating coordinate system is cylindrical, and its center line is overlapped with the center line of the stirring shaft and stirring blade, its diameter is set to 115% of the blade diameter of the stirring blade, and the vertical range is stirred. From the inner bottom of the tank to the liquid level.
・ Other analysis areas are handled in the stationary coordinate system.
• The rotating coordinate system and stationary coordinate system are connected using the interface function of the fluid analysis software. As an interface function, the optional “Frozen Rotor” is used.

<乱流モデル>
・撹拌槽内の流れは、層流ではなく、乱流である。その乱流モデルとしては、SST(Shear Stress Transport)モデルを用いる。
<Turbulent model>
・ The flow in the stirring tank is not laminar but turbulent. As the turbulence model, an SST (Shear Stress Transport) model is used.

<化学反応>
・撹拌槽内で生じる化学反応の式を下記に示す。
NiSO+2NaOH→Ni(OH)+NaSO
・流体解析では、以下の5成分が含まれる単相多成分の流体を扱う。
1)反応成分A:NiSO
2)反応成分B:NaOH
3)生成成分C:Ni(OH)
4)生成成分D:NaSO
5)水
・化学反応の速度の大きさは、渦消散モデルにより計算する。渦消散モデルは、乱流分散によって反応成分Aと反応成分Bとが分子レベルまで混合すると、上記化学反応が生じると仮定した反応モデルである。渦消散モデルの設定は、流体解析ソフトのデフォルトの設定のままとする。
<Chemical reaction>
-The formula of the chemical reaction that occurs in the stirred tank is shown below.
NiSO 4 + 2NaOH → Ni (OH) 2 + Na 2 SO 4 .
・ In fluid analysis, a single-phase multi-component fluid containing the following five components is handled.
1) Reaction component A: NiSO 4
2) Reaction component B: NaOH
3) Product component C: Ni (OH) 2
4) Product component D: Na 2 SO 4
5) The speed of water / chemical reaction is calculated by the eddy dissipation model. The vortex dissipation model is a reaction model that assumes that the chemical reaction occurs when the reaction component A and the reaction component B are mixed to the molecular level by turbulent dispersion. The vortex dissipation model setting is the default setting of the fluid analysis software.

<各成分の質量分率の計算方法>
・解析領域内の任意の位置および任意の時点で、上記5成分の合計の質量分率は1である。そこで、上記5成分のうち水を除く4成分のそれぞれの質量分率は、CFXによって輸送方程式を解いて求める値とし、水の質量分率は、1から、上記4成分の合計の質量分率を引いて得られる値とする。
<Calculation method of mass fraction of each component>
The total mass fraction of the five components is 1 at an arbitrary position in the analysis region and at an arbitrary time point. Therefore, the mass fraction of each of the four components excluding water among the above five components is a value obtained by solving the transport equation using CFX, and the mass fraction of water is from 1 to the total mass fraction of the above four components. The value obtained by subtracting.

<境界条件>
・壁境界(流体の出入りのない境界)
撹拌槽や撹拌軸、撹拌翼、バッフルなどの固体との境界では、滑り無しとする。一方、外気との境界(液面)では、滑り有りとする。尚、液面は、撹拌によって変形しないものとし、高さが一定の平面とする。
・流入境界(流体が入ってくる境界)
撹拌槽内の流体中に、反応成分Aを含む水溶液(以下、「水溶液A」と呼ぶ。)が流入する流入境界と、反応成分Bを含む水溶液(以下、「水溶液B」と呼ぶ。)が流入する流入境界とを別々に設ける。
水溶液Aの流入流量や水溶液Aに占める反応成分Aの割合、水溶液Bの流入流量や水溶液Bに占める反応成分Bの割合は一定とする。水溶液Bの流入流量は、撹拌槽内の水溶液のpHが所定値(例えば12.0)に維持されるように、設定する。
・流出境界(流体が出ていく境界)
撹拌槽の内周面の一部に、撹拌槽内の流体が出ていく流出境界を設ける。流出する液体は、生成成分CおよびD、未反応の反応成分AおよびB、並びに水を含むものである。その流出量は、解析領域と系外との圧力差がゼロになるように設定する。
尚、オーバーフロー型の連続式の場合、液面が流出境界である。
<Boundary conditions>
・ Wall boundary (boundary where fluid does not go in and out)
At the boundary with solids such as a stirring tank, a stirring shaft, a stirring blade, and a baffle, no slip is assumed. On the other hand, there is slippage at the boundary (liquid level) with the outside air. Note that the liquid surface is not deformed by stirring and is a flat surface having a constant height.
・ Inflow boundary (boundary where fluid enters)
An inflow boundary where an aqueous solution containing the reaction component A (hereinafter referred to as “aqueous solution A”) flows into the fluid in the stirring tank and an aqueous solution containing the reaction component B (hereinafter referred to as “aqueous solution B”). Provide separate inflow boundaries.
The inflow rate of the aqueous solution A, the ratio of the reaction component A in the aqueous solution A, and the inflow rate of the aqueous solution B and the ratio of the reaction component B in the aqueous solution B are constant. The inflow flow rate of the aqueous solution B is set so that the pH of the aqueous solution in the stirring tank is maintained at a predetermined value (for example, 12.0).
・ Outflow boundary (boundary where fluid flows out)
An outflow boundary through which the fluid in the agitation tank exits is provided on a part of the inner peripheral surface of the agitation tank. The liquid that flows out contains product components C and D, unreacted reaction components A and B, and water. The outflow amount is set so that the pressure difference between the analysis region and the outside of the system becomes zero.
In the case of an overflow type continuous type, the liquid level is the outflow boundary.

<熱条件>
・撹拌槽内の流体の温度は、25℃一定とする。化学反応による熱の生成、流入境界や流出境界での熱の出入りは、無いものと仮定する。
<Thermal conditions>
-The temperature of the fluid in the stirring tank is kept constant at 25 ° C. It is assumed that there is no heat generation due to chemical reaction and no heat inflow or outflow at the inflow boundary or outflow boundary.

<初期条件>
・撹拌槽内の流体は、初期状態において、均質なものとし、上記5成分のうち反応成分Bと水の2成分のみを含むものとする。具体的には、撹拌槽内の流体のうち、反応成分Aの初期質量分率や生成成分Cの初期質量分率、生成成分Dの初期質量分率はゼロ、反応成分Bの初期質量分率は撹拌槽内の水溶液のpHが上記所定値になるように設定する。
尚、生成成分Cの初期質量分率や生成成分Dの初期質量分率は、ここではゼロに設定するが、定常解を求めるための反復計算の回数(つまり、計算時間)を減らすため、定常状態において到達すると予測される、解析領域全体での平均値に設定してもよい。解析領域全体での平均値は、水溶液Aの流入流量や水溶液Aに占める反応成分Aの割合、水溶液Bの流入流量や水溶液Bに占める反応成分Bの割合、化学反応式で表される量的関係などを基に算出できる。
<Initial conditions>
The fluid in the agitation tank is homogeneous in the initial state, and includes only two components of the reaction component B and water among the above five components. Specifically, among the fluid in the stirring tank, the initial mass fraction of reaction component A, the initial mass fraction of product component C, the initial mass fraction of product component D is zero, and the initial mass fraction of reaction component B Is set so that the pH of the aqueous solution in the agitation tank becomes the predetermined value.
Note that the initial mass fraction of the generation component C and the initial mass fraction of the generation component D are set to zero here, but in order to reduce the number of iterations (that is, calculation time) for obtaining a steady solution, You may set to the average value in the whole analysis area | region estimated to reach | attain in a state. The average value in the entire analysis region is the quantitative expression represented by the chemical reaction equation, the inflow rate of the aqueous solution A, the ratio of the reaction component A in the aqueous solution A, the inflow rate of the aqueous solution B and the ratio of the reaction component B in the aqueous solution B. It can be calculated based on the relationship.

<収束判定>
・定常解を求めるための反復計算は、解析領域内の任意の位置で、流れの流速成分(m/s)や圧力(Pa)、上記4成分のそれぞれの質量分率の、それぞれの二乗平均平方根の残差が10−4以下となるまで行う。
<Convergence judgment>
-Iterative calculation to obtain a steady solution is the mean square of the flow velocity component (m / s) and pressure (Pa) of each of the above four components at any position in the analysis region. Repeat until the square root residual is 10 -4 or less.

<高過飽和領域の体積の計算方法>
・高過飽和領域とは、撹拌槽内の水溶液中に溶けている生成成分Cの濃度が所定値以上の領域である。上記所定値は、詳しくは後述するが、核生成工程では5.0mol/m、粒子成長工程では1.7mol/mとする。以下、核生成工程で設定する高過飽和領域を「第1高過飽和領域」、粒子成長工程で設定する高過飽和領域を「第2高過飽和領域」とも呼ぶ。第1高過飽和領域の濃度の下限値が第2高過飽和領域の濃度の下限値よりも高い理由は、核生成が生じる下限濃度は粒子成長が生じる下限濃度よりも高いためである。高過飽和領域は、水溶液Aの流入境界の周囲に形成される。
・ところで、流体解析では、上述の如く、上記5成分を単相多成分の流体として扱うため、生成成分Cの全てを液体として扱う。一方、実際には、生成成分Cの大部分は析出して固体となり、生成成分Cの残りの一部のみが液体として水溶液中に溶けている。
・そこで、高過飽和領域の体積は、上記流体解析により得た生成成分Cの濃度分布を補正することで算出する。その補正では、水溶液Aの流入境界から十分に離れた流出境界において生成成分Cの濃度が溶解度相当になるように、撹拌槽内の流体の全体において一律に生成成分Cの濃度を所定値下げる。
・尚、撹拌槽が連続式ではなくバッチ式の場合、流出境界が存在しない。この場合、濃度分布の補正では、撹拌槽内の水溶液の液面において生成成分Cの濃度が溶解度相当になるように、撹拌槽内の流体の全体において一律に生成成分Cの濃度を所定値下げればよい。ちなみに、オーバーフロー型の連続式の場合、液面が流出境界である。
<Calculation method of volume in highly supersaturated region>
-A high supersaturation area | region is an area | region where the density | concentration of the production | generation component C melt | dissolved in the aqueous solution in a stirring tank is more than predetermined value. The predetermined value is, as will be described later in detail, in the nucleation step 5.0 mol / m 3, in the particle growth step to 1.7 mol / m 3. Hereinafter, the high supersaturation region set in the nucleation step is also referred to as “first high supersaturation region”, and the high supersaturation region set in the particle growth step is also referred to as “second high supersaturation region”. The reason why the lower limit value of the concentration of the first highly supersaturated region is higher than the lower limit value of the concentration of the second highly supersaturated region is that the lower limit concentration at which nucleation occurs is higher than the lower limit concentration at which particle growth occurs. The high supersaturation region is formed around the inflow boundary of the aqueous solution A.
In the fluid analysis, as described above, since the five components are handled as a single-phase multi-component fluid, all the generated components C are handled as liquids. On the other hand, most of the product component C is precipitated and becomes solid, and only the remaining part of the product component C is dissolved in the aqueous solution as a liquid.
Therefore, the volume of the highly supersaturated region is calculated by correcting the concentration distribution of the generated component C obtained by the fluid analysis. In the correction, the concentration of the generated component C is uniformly reduced by a predetermined value in the whole fluid in the stirring tank so that the concentration of the generated component C becomes equivalent to the solubility at the outflow boundary sufficiently separated from the inflow boundary of the aqueous solution A.
・ In addition, when the agitation tank is a batch type rather than a continuous type, there is no outflow boundary. In this case, in the concentration distribution correction, the concentration of the generated component C can be uniformly reduced in the entire fluid in the stirring tank by a predetermined value so that the concentration of the generated component C becomes equivalent to the solubility at the liquid level of the aqueous solution in the stirring tank. That's fine. Incidentally, in the case of the overflow type continuous type, the liquid level is the outflow boundary.

尚、上記説明では、水酸化ニッケルを得る場合の解析条件を示したが、ニッケル複合水酸化物を得る場合の解析条件も同様に設定できる。例えば、硫酸ニッケルや硫酸マンガンと水酸化ナトリウムとを反応させてニッケルマンガン複合水酸化物を得る場合、流体解析では、以下の7成分が含まれる単相多成分の流体を扱う。
1)反応成分A1:NiSO
2)反応成分A2:MnSO
3)反応成分B:NaOH
4)生成成分C1:Ni(OH)
5)生成成分C2:Mn(OH)
6)生成成分D:NaSO
7)水
ここでは、撹拌槽内で「A1+2B→C1+D」および「A2+2B→C2+D」の2つの化学反応が生じるとし、それぞれの化学反応に対応する渦消散モデルが反応モデルとして用いられる。反応成分A1と反応成分A2とは、均一に水に溶けた状態で、同一の流入境界から供給される。つまり、反応成分A1と反応成分A2の両方を含む水溶液Aが流入境界から供給される。水溶液Aの流入境界の周囲に、高過飽和領域が形成される。高過飽和領域とは、撹拌槽内の水溶液中に溶けている生成成分のうち全ての金属水酸化物(ここでは生成成分C1と生成成分C2)の合計のモル濃度が上記所定値以上の領域のことである。
In the above description, the analysis conditions for obtaining nickel hydroxide are shown, but the analysis conditions for obtaining nickel composite hydroxide can also be set similarly. For example, when nickel sulfate or manganese sulfate is reacted with sodium hydroxide to obtain a nickel manganese composite hydroxide, the fluid analysis handles a single-phase multi-component fluid containing the following seven components.
1) Reaction component A1: NiSO 4
2) Reaction component A2: MnSO 4
3) Reaction component B: NaOH
4) Product component C1: Ni (OH) 2
5) Product component C2: Mn (OH) 2
6) Product component D: Na 2 SO 4
7) Water Here, two chemical reactions of “A1 + 2B → C1 + D” and “A2 + 2B → C2 + D” occur in the stirring tank, and a vortex dissipation model corresponding to each chemical reaction is used as a reaction model. The reaction component A1 and the reaction component A2 are supplied from the same inflow boundary in a state of being uniformly dissolved in water. That is, the aqueous solution A containing both the reaction component A1 and the reaction component A2 is supplied from the inflow boundary. A highly supersaturated region is formed around the inflow boundary of the aqueous solution A. The high supersaturated region is a region where the total molar concentration of all metal hydroxides (here, the generated component C1 and the generated component C2) among the generated components dissolved in the aqueous solution in the stirring tank is equal to or higher than the predetermined value. That is.

ここで、生成成分のうち全ての金属水酸化物のモル濃度を合計する理由について説明する。先ず、上述の如く、反応成分A1と反応成分A2とは、均一に水に溶けた状態で、同一の流入境界から流入する。このとき、反応成分A1および反応成分A2は、反応成分Bと速やかに反応して、生成成分C1および生成成分C2を生じる。よって、生成成分C1と生成成分C2とは、生成した時点で、充分に混ざった状態で存在する。その結果、生成成分C1と生成成分C2とは、個別の水酸化物として析出するのではなく、それぞれの成分が複合した水酸化物の固溶体として析出する。   Here, the reason for summing up the molar concentrations of all the metal hydroxides among the generated components will be described. First, as described above, the reaction component A1 and the reaction component A2 flow from the same inflow boundary while being uniformly dissolved in water. At this time, the reaction component A1 and the reaction component A2 react quickly with the reaction component B to generate the product component C1 and the product component C2. Therefore, the generation component C1 and the generation component C2 exist in a sufficiently mixed state at the time of generation. As a result, the product component C1 and the product component C2 are not precipitated as individual hydroxides, but as a solid solution of hydroxides in which the respective components are combined.

水溶液Aの流入境界の数は複数でもよく、高過飽和領域の数は複数でもよい。高過飽和領域の数が複数である場合、高過飽和領域の体積とは合計の体積を意味する。   The number of inflow boundaries of the aqueous solution A may be plural, and the number of high supersaturation regions may be plural. When there are a plurality of high supersaturation regions, the volume of the high supersaturation region means the total volume.

ニッケル含有水酸化物の製造方法は、撹拌槽内の水溶液に占める高過飽和領域の体積割合を、シミュレーションにより確認する工程を有してよい。この確認は、製造条件の変更の度に行われてよい。例えば、バッチ式の場合、製造条件が同じ間、確認は一度行われればよく、毎回の確認は不要である。   The method for producing the nickel-containing hydroxide may include a step of confirming, by simulation, the volume ratio of the highly supersaturated region in the aqueous solution in the stirring tank. This confirmation may be performed every time the manufacturing conditions are changed. For example, in the case of a batch type, confirmation only needs to be performed once while the manufacturing conditions are the same, and each confirmation is unnecessary.

本発明者は、撹拌条件が同一であって且つ撹拌槽20内への原料液の供給流量が同一である場合に高過飽和領域の体積を小さくできる手段を、シミュレーションによって検討した。その結果、高過飽和領域の体積は、主に(1)原料液の吐出口の数N、および(2)原料液の吐出口付近でのUやK(詳しくは後述する。)に依存することを見出した。Uは流れの速さ(m/s)のことであり、Kは乱流拡散係数(m/s)のことである。 The inventor has studied, by simulation, means for reducing the volume of the high supersaturation region when the stirring conditions are the same and the supply flow rate of the raw material liquid into the stirring tank 20 is the same. As a result, the volume of the highly supersaturated region mainly depends on (1) the number N of raw material liquid outlets and (2) U and K in the vicinity of the raw material liquid outlets (details will be described later). I found. U is the flow speed (m / s), and K is the turbulent diffusion coefficient (m 2 / s).

表1は、撹拌条件が同一であって且つ撹拌槽20内への原料液の供給流量が同一である場合の、原料液の吐出口の数Nと、高過飽和領域の体積V1、V2との関係を示す。Nが複数の場合の各吐出口からの供給流量は、Nが1の場合の吐出口からの供給流量の1/Nとした。供給流量とは、単位時間当たりの供給量のことである。また、Nが複数の場合の各吐出口付近でのUやKは、Nが1の場合の吐出口付近でのUやKと略同一とした。また、Nが複数の場合の吐出口同士の間隔は、高過飽和領域同士が重ならないように設定した。
表1において、V1は第1高過飽和領域の体積を、V2は第2高過飽和領域の体積をそれぞれ表す。また、V1はNが1の場合のV1の値を、V2はNが1の場合のV2の値をそれぞれ表す。Nが複数の場合、V1はN個の第1高過飽和領域の合計の体積を意味し、V2はN個の第2高過飽和領域の合計の体積を意味する。
Table 1 shows the number N of the raw material liquid discharge ports and the volumes V1 and V2 of the high supersaturation region when the stirring conditions are the same and the supply flow rate of the raw material liquid into the stirring tank 20 is the same. Show the relationship. The supply flow rate from each discharge port when N is plural is 1 / N of the supply flow rate from the discharge port when N is 1. The supply flow rate is the supply amount per unit time. Further, U and K in the vicinity of each discharge port when N is plural are substantially the same as U and K in the vicinity of the discharge port when N is 1. Further, the interval between the discharge ports when N is plural is set so that the highly supersaturated regions do not overlap each other.
In Table 1, V1 represents the volume of the first highly supersaturated region, and V2 represents the volume of the second highly supersaturated region. V1 0 represents the value of V1 when N is 1, and V2 0 represents the value of V2 when N is 1. When N is plural, V1 means the total volume of the N first high supersaturation regions, and V2 means the total volume of the N second high supersaturation regions.

表1から明らかなように、原料液の吐出口の数Nが多いほど、高過飽和領域の体積V1、V2が小さくなる傾向が見られた。この傾向は、撹拌条件を変更しても同様に見られた。また、この傾向は、撹拌槽内への原料液の供給流量を変更しても同様に見られた。本発明者は、原料液を分けて複数の吐出口から撹拌槽内に供給することで、高過飽和領域の体積V1、V2を小さくできることを見出した。 As is clear from Table 1, there was a tendency for the volumes V1 and V2 of the high supersaturation region to decrease as the number N of the raw material liquid discharge ports increased. This tendency was similarly observed even when the stirring conditions were changed. Further, this tendency was similarly observed even when the supply flow rate of the raw material liquid into the stirring tank was changed. The present inventor has found that the volumes V1 and V2 of the high supersaturation region can be reduced by dividing the raw material liquid and supplying it into the stirring tank from a plurality of discharge ports.

本実施形態の化学反応装置は、撹拌槽20内の溶液中に原料液を吐出する吐出部61(図3参照)を1つ有するが、複数有してもよい。この場合、各吐出部61には吐出口が1つずつ形成される。原料液を分けて複数の吐出部61から撹拌槽20内に供給することで、撹拌槽20内の溶液に占める高過飽和領域の体積V1、V2を小さくでき、得られる粒子の品質を向上できる。   Although the chemical reaction apparatus of this embodiment has one discharge part 61 (refer FIG. 3) which discharges a raw material liquid in the solution in the stirring tank 20, you may have multiple. In this case, one discharge port is formed in each discharge portion 61. By dividing the raw material liquid into the stirring tank 20 from the plurality of discharge units 61, the volumes V1 and V2 of the highly supersaturated region in the solution in the stirring tank 20 can be reduced, and the quality of the obtained particles can be improved.

この効果を十分に得るためには、高過飽和領域同士が重ならないように吐出部61同士の間隔が設定されることが好ましい。高過飽和領域同士が重なる程度に吐出部61同士が近いと、吐出部61の数を複数にする意義が薄れる。高過飽和領域同士が重なるか否かは、上記シミュレーションによって判定できる。   In order to sufficiently obtain this effect, it is preferable to set the interval between the discharge portions 61 so that the highly supersaturated regions do not overlap each other. If the discharge units 61 are close to each other so that the highly supersaturated regions overlap each other, the significance of making the number of the discharge units 61 plural is reduced. Whether or not the highly supersaturated regions overlap can be determined by the simulation.

核生成工程において第1高過飽和領域同士が重ならないためには、吐出部61の中心同士の間隔は例えば75mm以上である。また、粒子成長工程において第2高過飽和領域同士が重ならないためには、吐出部61の中心同士の間隔は例えば120mm以上である。   In order to prevent the first highly supersaturated regions from overlapping each other in the nucleation step, the interval between the centers of the discharge portions 61 is, for example, 75 mm or more. Further, in order to prevent the second highly supersaturated regions from overlapping each other in the particle growth step, the interval between the centers of the discharge portions 61 is, for example, 120 mm or more.

(A)核生成工程において第1高過飽和領域同士が重ならないこと、および、(B)粒子成長工程において第2高過飽和領域同士が重ならないことの一方のみが成立してもよいが、両方が成立するように、吐出部61同士の間隔が設定されてよい。   Only one of (A) the first highly supersaturated regions do not overlap each other in the nucleation step and (B) the second highly supersaturated regions do not overlap each other in the particle growth step may be established. The interval between the ejection units 61 may be set so as to be established.

吐出部61同士の間隔は、核生成工程と粒子成長工程とで同じでもよいが、核生成工程と粒子成長工程とが別々に行われる場合、工程に合わせて変更されてもよい。   The interval between the discharge units 61 may be the same in the nucleation step and the particle growth step, but may be changed according to the step when the nucleation step and the particle growth step are performed separately.

また、本発明者は、原料液の吐出口を撹拌槽内のUやKが大きい位置に設置することで、高過飽和領域の体積を小さくできることを見出した。Kが大きいほど、原料液が拡散しやすいので、高過飽和領域の体積が小さくなる。また、Uが大きいほど、原料液と溶液との合流地点で溶液の量が相対的に増えるので、原料液が分散しやすく、高過飽和領域の体積が小さくなる。   Further, the present inventor has found that the volume of the high supersaturation region can be reduced by installing the discharge port of the raw material liquid at a position where U and K in the stirring tank are large. The larger K is, the more easily the raw material liquid diffuses, so the volume of the highly supersaturated region becomes smaller. Further, as U is larger, the amount of the solution is relatively increased at the joining point of the raw material liquid and the solution, so that the raw material liquid is easily dispersed and the volume of the high supersaturation region is reduced.

図3は、一実施形態による化学反応装置の要部を示す斜視図である。図3において、矢印は溶液の流れの向きを表す。図3に示すように、化学反応装置は、溶液の流れの中で原料液を吐出する吐出部61を含む原料液供給管60と、吐出部61の上流側における溶液の流れを調整する流れ調整部材70とを有する。   FIG. 3 is a perspective view showing a main part of the chemical reaction device according to one embodiment. In FIG. 3, the arrow represents the direction of the solution flow. As shown in FIG. 3, the chemical reaction apparatus includes a raw material liquid supply pipe 60 including a discharge unit 61 that discharges a raw material liquid in the flow of the solution, and a flow adjustment that adjusts the flow of the solution on the upstream side of the discharge unit 61. Member 70.

原料液供給管60は、溶液の流れの中で原料液を吐出する吐出部61を含む。吐出部61には吐出口が形成されており、その吐出口から原料液が吐出される。原料液供給管60は、例えば、溶液の液面から下方に差し込まれ、下端部に吐出部61を有し、吐出部61から下向きに原料液を吐出する。   The raw material liquid supply pipe 60 includes a discharge portion 61 that discharges the raw material liquid in the flow of the solution. A discharge port is formed in the discharge unit 61, and the raw material liquid is discharged from the discharge port. The raw material liquid supply pipe 60 is, for example, inserted downward from the liquid surface of the solution, has a discharge portion 61 at the lower end portion, and discharges the raw material liquid downward from the discharge portion 61.

尚、原料液供給管60は、撹拌槽20の底部から上方に突出し、上端部に吐出部61を有し、吐出部61から上向きに原料液を吐出してもよい。また、原料液供給管60は、上下方向中央部に吐出部61を有し、吐出部61から水平向きに原料液を吐出してもよい。吐出部61の位置や吐出方向などは、特に限定されない。   The raw material liquid supply pipe 60 may protrude upward from the bottom of the agitation tank 20, have a discharge part 61 at the upper end, and discharge the raw material liquid upward from the discharge part 61. Further, the raw material liquid supply pipe 60 may have a discharge part 61 at the center in the vertical direction, and discharge the raw material liquid from the discharge part 61 in the horizontal direction. The position of the discharge unit 61 and the discharge direction are not particularly limited.

流れ調整部材70は、例えば板状の部材である。流れ調整部材70は、図3では原料液供給管60に対する姿勢を固定するため原料液供給管60に接続されているが、原料液供給管60から離間して設けられてもよい。流れ調整部材70の位置や向きは、吐出部61の位置や吐出方向などに応じて変更されてよい。   The flow adjusting member 70 is a plate-like member, for example. In FIG. 3, the flow adjusting member 70 is connected to the raw material liquid supply pipe 60 in order to fix the posture with respect to the raw material liquid supply pipe 60, but may be provided apart from the raw material liquid supply pipe 60. The position and orientation of the flow adjusting member 70 may be changed according to the position of the ejection unit 61 and the ejection direction.

流れ調整部材70は、吐出部61に向けて溶液の流れを受け流す壁面71を有する。壁面71は、壁面71に衝突する流れF1の主方向に対し傾斜しており、その流れF1を方向転換させ、壁面71に沿って吐出部61に向かう流れF11を形成する。壁面71に衝突して吐出部61に向けて方向転換した流れF11と、壁面71に衝突せずに吐出部61に向かう流れF2とが、吐出部61付近で合流する。よって、吐出部61の近傍での流れの速さUを大きくすることができ、効率的に高過飽和領域の体積を小さくすることができる。   The flow adjusting member 70 has a wall surface 71 that receives the flow of the solution toward the discharge unit 61. The wall surface 71 is inclined with respect to the main direction of the flow F <b> 1 that collides with the wall surface 71, changes the direction of the flow F <b> 1, and forms a flow F <b> 11 toward the discharge unit 61 along the wall surface 71. The flow F <b> 11 that has collided with the wall surface 71 and changed the direction toward the discharge unit 61 and the flow F <b> 2 that has not collided with the wall surface 71 and directed toward the discharge unit 61 merge in the vicinity of the discharge unit 61. Therefore, the flow speed U in the vicinity of the discharge unit 61 can be increased, and the volume of the high supersaturation region can be efficiently reduced.

流れ調整部材70は、壁面71から突出する突起72を有する。突起72は、図3に示すように間隔をおいて複数設けられてよい。突起72の形状は、図3では円柱状であるが、楕円柱状や角柱状などでもよい。壁面71に沿って吐出部61に向かう流れF11は突起72の裏側に完全には回り込めないので、流れの剥離と呼ばれる現象が生じ、突起72の裏側に渦流が形成され、この渦流が吐出部61の近傍に伝搬する。よって、吐出部61の近傍での乱流拡散係数Kを大きくすることができ、より効率的に高過飽和領域の体積を小さくすることができる。   The flow adjusting member 70 has a protrusion 72 protruding from the wall surface 71. A plurality of protrusions 72 may be provided at intervals as shown in FIG. The shape of the protrusion 72 is a columnar shape in FIG. 3, but may be an elliptical column shape, a rectangular column shape, or the like. Since the flow F11 toward the discharge part 61 along the wall surface 71 cannot completely wrap around the back side of the protrusion 72, a phenomenon called flow separation occurs, and a vortex is formed on the back side of the protrusion 72. Propagate to the vicinity of 61. Therefore, the turbulent diffusion coefficient K in the vicinity of the discharge unit 61 can be increased, and the volume of the high supersaturation region can be reduced more efficiently.

図4は、第1変形例による化学反応装置の要部を示す図である。上記実施形態では、吐出部61よりも上方の流れF1が流れ調整部材70に衝突する。これに対し、本変形例では、吐出部61よりも下方の流れF3が流れ調整部材70Aに衝突する。以下、相違点について主に説明する。   FIG. 4 is a diagram showing a main part of the chemical reaction device according to the first modification. In the above embodiment, the flow F <b> 1 above the discharge unit 61 collides with the flow adjustment member 70. On the other hand, in this modification, the flow F3 below the discharge unit 61 collides with the flow adjustment member 70A. Hereinafter, the difference will be mainly described.

流れ調整部材70Aは、図4に示すように、吐出部61の上流側で、吐出部61よりも下方の流れF3を吐出部61に向けて受け流す壁面71Aを有する。壁面71Aは、壁面71Aに衝突する流れF3の主方向に対し傾斜しており、その流れF3を方向転換させ、壁面71Aに沿って吐出部61に向かう流れF31を形成する。壁面71Aに衝突して吐出部61に向けて方向転換した流れF31と、壁面71Aに衝突せずに吐出部61に向かう流れF2とが、吐出部61付近で合流する。よって、吐出部61の近傍での流れの速さUを大きくすることができ、効率的に高過飽和領域の体積を小さくすることができる。   As shown in FIG. 4, the flow adjusting member 70 </ b> A has a wall surface 71 </ b> A that receives the flow F <b> 3 below the discharge unit 61 toward the discharge unit 61 on the upstream side of the discharge unit 61. The wall surface 71A is inclined with respect to the main direction of the flow F3 that collides with the wall surface 71A, changes the direction of the flow F3, and forms a flow F31 toward the discharge portion 61 along the wall surface 71A. The flow F31 that has collided with the wall surface 71A and changed the direction toward the discharge unit 61 and the flow F2 that has traveled toward the discharge unit 61 without colliding with the wall surface 71A merge in the vicinity of the discharge unit 61. Therefore, the flow speed U in the vicinity of the discharge unit 61 can be increased, and the volume of the high supersaturation region can be efficiently reduced.

流れ調整部材70Aは、壁面71Aから突出する突起72Aを有する。突起72Aは、図4に示すように間隔をおいて複数設けられてよい。突起72Aの形状は、図4では円柱状であるが、楕円柱状や角柱状などでもよい。壁面71Aに沿って吐出部61に向かう流れF31は突起72Aの裏側に完全には回り込めないので、流れの剥離と呼ばれる現象が生じ、突起72Aの裏側に渦流が形成され、この渦流が吐出部61の近傍に伝搬する。よって、吐出部61の近傍での乱流拡散係数Kを大きくすることができ、より効率的に高過飽和領域の体積を小さくすることができる。   The flow adjusting member 70A has a protrusion 72A protruding from the wall surface 71A. A plurality of protrusions 72A may be provided at intervals as shown in FIG. The shape of the protrusion 72A is a columnar shape in FIG. 4, but may be an elliptical column shape, a rectangular column shape, or the like. Since the flow F31 directed toward the discharge portion 61 along the wall surface 71A cannot completely wrap around the back side of the protrusion 72A, a phenomenon called flow separation occurs, and a vortex is formed on the back side of the protrusion 72A. Propagate to the vicinity of 61. Therefore, the turbulent diffusion coefficient K in the vicinity of the discharge unit 61 can be increased, and the volume of the high supersaturation region can be reduced more efficiently.

図5は、第2変形例による化学反応装置の要部を示す斜視図である。上記実施形態では、流れ調整部材70の壁面71が単一の平面で構成される。これに対し、本変形例では、流れ調整部材70Bの壁面71Bが扇形の湾曲面で構成される。以下、相違点について主に説明する。   FIG. 5 is a perspective view showing a main part of a chemical reaction device according to a second modification. In the said embodiment, the wall surface 71 of the flow adjustment member 70 is comprised by a single plane. On the other hand, in the present modification, the wall surface 71B of the flow adjusting member 70B is configured by a fan-shaped curved surface. Hereinafter, the difference will be mainly described.

本変形例の流れ調整部材70Bは、上記実施形態の流れ調整部材70と同様に、吐出部61に向けて溶液の流れを受け流す壁面71Bと、壁面71Bから突出する突起72Bとを有する。よって、吐出部61の近傍でのUやKを大きくすることができ、効率的に高過飽和領域の体積を小さくすることができる。   Similar to the flow adjustment member 70 of the above-described embodiment, the flow adjustment member 70B of the present modification includes a wall surface 71B that receives the flow of the solution toward the discharge unit 61, and a protrusion 72B that protrudes from the wall surface 71B. Therefore, U and K in the vicinity of the discharge unit 61 can be increased, and the volume of the high supersaturation region can be efficiently reduced.

流れ調整部材70Bの壁面71Bは、例えば扇形の湾曲面である。壁面71Bは、吐出部61に向かうほど互いに近づく2つの直線状の側縁71Ba、71Bbを有し、且つ、両側縁71Ba、71Bbを結ぶ平面を基準として下流側に凹む。これにより、壁面71Bに沿う流れF11〜F13(壁面71Bの突起72Bによって形成される渦流を含む)を吐出部61に向けて集めることができる。よって、吐出部61の近傍でのUやKをより大きくすることができ、より効率的に高過飽和領域の体積を小さくすることができる。   The wall surface 71B of the flow adjusting member 70B is, for example, a fan-shaped curved surface. The wall surface 71B has two linear side edges 71Ba and 71Bb that are closer to each other toward the discharge section 61, and is recessed downstream with respect to a plane connecting both side edges 71Ba and 71Bb. Thereby, the flows F11 to F13 (including the vortex formed by the protrusion 72B of the wall surface 71B) along the wall surface 71B can be collected toward the discharge unit 61. Therefore, U and K in the vicinity of the discharge unit 61 can be increased, and the volume of the high supersaturation region can be reduced more efficiently.

尚、本変形例の流れ調整部材70Bは、壁面71Bから突出する突起72Bを有するが、突起72Bを有しなくてもよい。この場合、壁面71Bに沿う流れF11〜F13を吐出部61に向けて集めることで、吐出部61の近傍でのUを大きくすることができ、効率的に高過飽和領域の体積を小さくすることができる。また、本変形例の流れ調整部材70Bは、吐出部61よりも上方の流れF1を受け流すが、上記第1変形例の流れ調整部材70Aと同様に吐出部61よりも下方の流れF3(図4参照)を受け流してもよい。   In addition, although the flow adjustment member 70B of this modification has the protrusion 72B which protrudes from the wall surface 71B, it does not need to have the protrusion 72B. In this case, by collecting the flows F11 to F13 along the wall surface 71B toward the discharge unit 61, U in the vicinity of the discharge unit 61 can be increased, and the volume of the high supersaturation region can be efficiently reduced. it can. In addition, the flow adjusting member 70B of the present modification receives the flow F1 above the discharge unit 61, but the flow F3 below the discharge unit 61 (FIG. 4) in the same manner as the flow adjustment member 70A of the first modification. See).

図6は、第3変形例による化学反応装置の要部を示す斜視図である。上記実施形態では、流れ調整部材70の壁面71が単一の平面で構成される。これに対し、本変形例では、流れ調整部材70Cの壁面71Cが複数の平面で構成されV字状の断面形状を有する。以下、相違点について主に説明する。   FIG. 6 is a perspective view showing a main part of a chemical reaction device according to a third modification. In the said embodiment, the wall surface 71 of the flow adjustment member 70 is comprised by a single plane. On the other hand, in the present modification, the wall surface 71C of the flow adjusting member 70C is constituted by a plurality of planes and has a V-shaped cross-sectional shape. Hereinafter, the difference will be mainly described.

本変形例の流れ調整部材70Cは、上記実施形態の流れ調整部材70と同様に、吐出部61に向けて溶液の流れを受け流す壁面71Cと、壁面71Cから突出する突起72Cとを有する。よって、吐出部61の近傍でのUやKを大きくすることができ、効率的に高過飽和領域の体積を小さくすることができる。   Similarly to the flow adjusting member 70 of the above-described embodiment, the flow adjusting member 70C of the present modification includes a wall surface 71C that receives the flow of the solution toward the discharge unit 61, and a protrusion 72C that protrudes from the wall surface 71C. Therefore, U and K in the vicinity of the discharge unit 61 can be increased, and the volume of the high supersaturation region can be efficiently reduced.

流れ調整部材70Cの壁面71Cは、例えば複数の平面で構成される。壁面71Cは、吐出部61に向かうほど互いに近づく2つの直線状の側縁71Ca、71Cbを有し、且つ、両側縁71Ca、71Cbを結ぶ平面を基準として下流側に凹む。これにより、壁面71Cに沿う流れF11〜F13(壁面71Cの突起72Cによって形成される渦流を含む)を吐出部61に向けて集めることができる。よって、吐出部61の近傍でのUやKをより大きくすることができ、より効率的に高過飽和領域の体積を小さくすることができる。   The wall surface 71C of the flow adjusting member 70C is constituted by, for example, a plurality of planes. The wall surface 71 </ b> C has two linear side edges 71 </ b> Ca and 71 </ b> Cb that are closer to each other toward the discharge unit 61, and is recessed downstream with respect to a plane connecting both side edges 71 </ b> Ca and 71 </ b> Cb. Accordingly, the flows F11 to F13 (including the vortex formed by the protrusion 72C of the wall surface 71C) along the wall surface 71C can be collected toward the discharge unit 61. Therefore, U and K in the vicinity of the discharge unit 61 can be increased, and the volume of the high supersaturation region can be reduced more efficiently.

尚、本変形例の流れ調整部材70Cは、壁面71Cから突出する突起72Cを有するが、突起72Cを有しなくてもよい。この場合、壁面71Cに沿う流れF11〜F13を吐出部61に向けて集めることで、吐出部61の近傍でのUを大きくすることができ、効率的に高過飽和領域の体積を小さくすることができる。また、本変形例の流れ調整部材70Cは、吐出部61よりも上方の流れF1を受け流すが、上記第1変形例の流れ調整部材70Aと同様に吐出部61よりも下方の流れF3(図4参照)を受け流してもよい。   In addition, although the flow adjustment member 70C of this modification has the protrusion 72C which protrudes from the wall surface 71C, it does not need to have the protrusion 72C. In this case, by collecting the flows F11 to F13 along the wall surface 71C toward the discharge unit 61, U in the vicinity of the discharge unit 61 can be increased, and the volume of the high supersaturation region can be efficiently reduced. it can. Further, the flow adjusting member 70C of the present modification receives the flow F1 above the discharge unit 61, but the flow F3 below the discharge unit 61 (FIG. 4) in the same manner as the flow adjustment member 70A of the first modification. See).

図7は、一実施形態による化学反応装置を用いたニッケル含有水酸化物の製造方法のフローチャートである。図7に示すように、ニッケル含有水酸化物の製造方法は、中和晶析によりニッケル含有水酸化物の粒子を得るものであって、粒子の核を生成させる核生成工程S11と、粒子を成長させる粒子成長工程S12とを有する。以下、各工程について説明するが、その前に、得られるニッケル含有水酸化物について説明する。   FIG. 7 is a flowchart of a method for producing a nickel-containing hydroxide using a chemical reaction device according to an embodiment. As shown in FIG. 7, the method for producing a nickel-containing hydroxide is to obtain particles of nickel-containing hydroxide by neutralization crystallization, and a nucleation step S11 for generating nuclei of particles, And a particle growth step S12 for growth. Hereinafter, although each process is demonstrated, the nickel containing hydroxide obtained is demonstrated before that.

(ニッケル含有水酸化物)
ニッケル含有水酸化物は、リチウムイオン二次電池の正極活物質の前駆体として用いられるものである。ニッケル含有水酸化物は、例えば、(1)一般式:Ni1−x−yCoAl(OH)2+α(0≦x≦0.3、0.005≦y≦0.15、0≦α≦0.5)で表されるニッケル複合水酸化物であるか、または、(2)一般式:NiCoMn(OH)2+α(x+y+z+t=1、0.1≦x≦0.7、0.1≦y≦0.5、0.1≦z≦0.8、0≦t≦0.02、0≦α≦0.5、Mは、Ti、V、Cr、Zr、Nb、Mo、Hf、Ta、およびWから選択される1種以上の添加元素)で表されるニッケルコバルトマンガン複合水酸化物である。
(Nickel-containing hydroxide)
The nickel-containing hydroxide is used as a precursor of the positive electrode active material of the lithium ion secondary battery. Nickel-containing hydroxide is, for example, (1) the general formula: Ni 1-x-y Co x Al y (OH) 2 + α (0 ≦ x ≦ 0.3,0.005 ≦ y ≦ 0.15,0 ≦ or a nickel complex hydroxide represented by alpha ≦ 0.5), or, (2) the general formula: Ni x Co y Mn z M t (OH) 2 + α (x + y + z + t = 1,0.1 ≦ x ≦ 0.7, 0.1 ≦ y ≦ 0.5, 0.1 ≦ z ≦ 0.8, 0 ≦ t ≦ 0.02, 0 ≦ α ≦ 0.5, M is Ti, V, Cr And one or more additional elements selected from Zr, Nb, Mo, Hf, Ta, and W).

ニッケル含有水酸化物は、ニッケルを含有し、好ましくはニッケル以外の金属をさらに含有する。ニッケル以外の金属をさらに含有する水酸化物を、ニッケル複合水酸化物と呼ぶ。ニッケル複合水酸化物の金属の組成比(例えば、Ni:Mn:Co:M)は、得られる正極活物質においても維持されるので、正極活物質に要求される金属の組成比と一致するように調整される。   The nickel-containing hydroxide contains nickel, and preferably further contains a metal other than nickel. A hydroxide further containing a metal other than nickel is referred to as a nickel composite hydroxide. The metal composition ratio (for example, Ni: Mn: Co: M) of the nickel composite hydroxide is maintained even in the obtained positive electrode active material, so that it matches the metal composition ratio required for the positive electrode active material. Adjusted to

(ニッケル含有水酸化物の製造方法)
ニッケル含有水酸化物の製造方法は、上述の如く、核生成工程S11と、粒子成長工程S12とを有する。本実施形態では、バッチ式の撹拌槽を用いて、撹拌槽内の水溶液のpH値などを制御することで、核生成工程S11と、粒子成長工程S12とを分けて実施する。
(Method for producing nickel-containing hydroxide)
As described above, the method for producing the nickel-containing hydroxide includes the nucleation step S11 and the particle growth step S12. In this embodiment, the nucleation step S11 and the particle growth step S12 are performed separately by controlling the pH value of the aqueous solution in the stirring tank using a batch type stirring tank.

核生成工程S11では、核生成が粒子成長よりも優先して起こり、粒子成長はほとんど生じない。一方、粒子成長工程S12では、粒子成長が核生成よりも優先して起こり新しい核はほとんど生成されない。核生成工程S11と粒子成長工程S12とを分けて実施することで、粒度分布の範囲が狭く均質な核が形成でき、その後に、核を均質に成長させることができる。   In the nucleation step S11, nucleation occurs prior to particle growth, and particle growth hardly occurs. On the other hand, in the grain growth step S12, grain growth takes precedence over nucleation and almost no new nuclei are produced. By carrying out the nucleation step S11 and the particle growth step S12 separately, homogeneous nuclei with a narrow particle size distribution range can be formed, and thereafter the nuclei can be grown homogeneously.

以下、核生成工程S11および粒子成長工程S12について説明する。核生成工程S11における撹拌槽内の水溶液と、粒子成長工程S12における撹拌槽内の水溶液とでは、pH値の範囲が異なるが、アンモニア濃度の範囲や温度の範囲は実質的に同じであってよい。   Hereinafter, the nucleation step S11 and the particle growth step S12 will be described. The aqueous solution in the stirring vessel in the nucleation step S11 and the aqueous solution in the stirring vessel in the particle growth step S12 have different pH value ranges, but the ammonia concentration range and temperature range may be substantially the same. .

尚、本実施形態では、バッチ式の撹拌槽を用いるが、連続式の撹拌槽を用いてもよい。後者の場合、核生成工程S11と粒子成長工程S12とは、同時に実施される。この場合、撹拌槽内の水溶液のpH値の範囲は当然に同じになり、例えば12.0の近傍に設定されてよい。   In addition, in this embodiment, although a batch type stirring tank is used, you may use a continuous stirring tank. In the latter case, the nucleation step S11 and the particle growth step S12 are performed simultaneously. In this case, the range of the pH value of the aqueous solution in the stirring tank is naturally the same, and may be set in the vicinity of 12.0, for example.

(核生成工程)
先ず、原料液を調製しておく。原料液は、少なくともニッケル塩を含み、好ましくはニッケル塩以外の金属塩をさらに含有する。金属塩としては、硝酸塩、硫酸塩、塩酸塩などが用いられる。より具体的には、例えば、硫酸ニッケル、硫酸マンガン、硫酸コバルト、硫酸チタン、ペルオキソチタン酸アンモニウム、シュウ酸チタンカリウム、硫酸バナジウム、バナジン酸アンモニウム、硫酸クロム、クロム酸カリウム、硫酸ジルコニウム、硝酸ジルコニウム、シュウ酸ニオブ、モリブデン酸アンモニウム、タングステン酸ナトリウム、タングステン酸アンモニウムなどが用いられる。
(Nucleation process)
First, a raw material liquid is prepared. The raw material liquid contains at least a nickel salt, and preferably further contains a metal salt other than the nickel salt. As the metal salt, nitrate, sulfate, hydrochloride and the like are used. More specifically, for example, nickel sulfate, manganese sulfate, cobalt sulfate, titanium sulfate, ammonium peroxotitanate, potassium oxalate, vanadium sulfate, ammonium vanadate, chromium sulfate, potassium chromate, zirconium sulfate, zirconium nitrate, Niobium oxalate, ammonium molybdate, sodium tungstate, ammonium tungstate and the like are used.

原料液の金属の組成比(例えば、Ni:Mn:Co:M)は、得られるニッケル複合水酸化物においても維持されるので、ニッケル複合水酸化物に要求される組成比と一致するように調整される。   Since the metal composition ratio (for example, Ni: Mn: Co: M) of the raw material liquid is also maintained in the obtained nickel composite hydroxide, it should match the composition ratio required for the nickel composite hydroxide. Adjusted.

また、撹拌槽内に、アルカリ水溶液、アンモニア水溶液、および水を供給して混合した水溶液を貯める。混合した水溶液を、以下、「反応前水溶液」と呼ぶ。反応前水溶液のpH値は、液温25℃基準で、12.0〜14.0、好ましくは12.3〜13.5の範囲内に調節しておく。また、反応前水溶液中のアンモニアの濃度は、好ましくは3〜25g/L、より好ましくは5〜20g/L、さらに好ましくは5〜15g/Lの範囲内に調節しておく。さらに、反応前水溶液の温度は、好ましくは20〜60℃、より好ましくは35〜60℃の範囲内に調節しておく。   Moreover, the aqueous solution which supplied and mixed alkaline aqueous solution, aqueous ammonia solution, and water in the stirring tank is stored. The mixed aqueous solution is hereinafter referred to as “pre-reaction aqueous solution”. The pH value of the pre-reaction aqueous solution is adjusted in the range of 12.0 to 14.0, preferably 12.3 to 13.5, based on the liquid temperature of 25 ° C. The concentration of ammonia in the pre-reaction aqueous solution is preferably adjusted within the range of 3 to 25 g / L, more preferably 5 to 20 g / L, and still more preferably 5 to 15 g / L. Furthermore, the temperature of the pre-reaction aqueous solution is preferably adjusted within the range of 20 to 60 ° C, more preferably 35 to 60 ° C.

アルカリ水溶液としては、例えば、水酸化ナトリウム、水酸化カリウムなどのアルカリ金属水酸化物を含むものが用いられる。アルカリ金属水酸化物は、固体として供給してもよいが、水溶液として供給することが好ましい。   As the alkaline aqueous solution, for example, one containing an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide is used. The alkali metal hydroxide may be supplied as a solid, but is preferably supplied as an aqueous solution.

アンモニア水溶液としては、アンモニア供給体を含むものが用いられる。アンモニア供給体としては、例えば、アンモニア、硫酸アンモニウム、塩化アンモニウム、炭酸アンモニウム、フッ化アンモニウムなどが使用できる。   As the aqueous ammonia solution, one containing an ammonia supplier is used. As the ammonia supplier, for example, ammonia, ammonium sulfate, ammonium chloride, ammonium carbonate, ammonium fluoride and the like can be used.

尚、本実施形態では、非還元性錯化剤として、アンモニア供給体が用いられるが、エチレンジアミン四酢酸、ニトリト三酢酸、ウラシル二酢酸、グリシンなどが用いられてもよい。非還元性錯化剤は、撹拌槽内の水溶液中でニッケルイオンなど結合して錯体を形成可能なものであればよい。   In this embodiment, an ammonia supplier is used as the non-reducing complexing agent, but ethylenediaminetetraacetic acid, nitritotriacetic acid, uracil diacetic acid, glycine, or the like may be used. Any non-reducing complexing agent may be used as long as it can form a complex by binding nickel ions or the like in an aqueous solution in a stirring tank.

反応前水溶液のpH、アンモニア濃度、温度などの調節後、反応前水溶液を撹拌しながら原料液を撹拌槽内に供給する。これにより、撹拌槽内には、反応前水溶液と原料液とが混合した反応水溶液が形成され、中和晶析によって核が生成され、核生成工程S11が開始される。   After adjusting the pH, ammonia concentration, temperature, etc. of the aqueous solution before reaction, the raw material solution is supplied into the stirring vessel while stirring the aqueous solution before reaction. As a result, a reaction aqueous solution in which the pre-reaction aqueous solution and the raw material liquid are mixed is formed in the stirring tank, nuclei are generated by neutralization crystallization, and the nucleation step S11 is started.

核生成工程S11において、反応水溶液のpH値が12.0以上であれば、核生成が粒子成長よりも支配的になる。また、核生成工程S11において、反応水溶液のpH値が14.0以下であれば、核が微細化し過ぎることを防止でき、反応水溶液のゲル化を防止できる。核生成工程S11において、反応水溶液のpH値の変動幅(最大値と最小値の幅)は、好ましくは0.4以下である。   In the nucleation step S11, if the pH value of the reaction aqueous solution is 12.0 or more, nucleation becomes more dominant than particle growth. In addition, in the nucleation step S11, if the pH value of the reaction aqueous solution is 14.0 or less, it is possible to prevent the nuclei from becoming too fine and to prevent the reaction aqueous solution from gelling. In the nucleation step S11, the fluctuation range (maximum value and minimum value range) of the pH value of the aqueous reaction solution is preferably 0.4 or less.

また、核生成工程S11において、反応水溶液中のアンモニア濃度が3g/L以上であると、金属イオンの溶解度を一定に保持でき、形状および粒径が整った核が生成しやすい。また、核生成工程S11において、反応水溶液中のアンモニア濃度が25g/L以下であると、析出せずに液中に残る金属イオンが減り、生産効率が向上する。核生成工程S11において、反応水溶液のpH値の変動幅(最大値と最小値の幅)は、好ましくは5g/L以下である。   Further, in the nucleation step S11, when the ammonia concentration in the reaction aqueous solution is 3 g / L or more, the solubility of metal ions can be kept constant, and nuclei having a uniform shape and particle size are easily generated. In addition, in the nucleation step S11, when the ammonia concentration in the reaction aqueous solution is 25 g / L or less, metal ions remaining in the liquid without being precipitated are reduced, and the production efficiency is improved. In the nucleation step S11, the fluctuation range (maximum value and minimum value) of the pH value of the aqueous reaction solution is preferably 5 g / L or less.

また、核生成工程S11において、反応水溶液の温度が20℃以上であれば、ニッケル含有水酸化物の溶解度が大きいため、核発生が緩やかに生じ、核発生の制御が容易である。一方、反応水溶液の温度が60℃以下であれば、アンモニアの揮発が抑制できるため、アンモニア水の使用量が削減でき、製造コストが低減できる。   Further, in the nucleation step S11, if the temperature of the reaction aqueous solution is 20 ° C. or higher, the solubility of the nickel-containing hydroxide is high, so that nucleation occurs slowly and nucleation control is easy. On the other hand, if the temperature of the reaction aqueous solution is 60 ° C. or lower, the volatilization of ammonia can be suppressed, so that the amount of ammonia water used can be reduced and the production cost can be reduced.

核生成工程S11では、反応水溶液のpH値やアンモニア濃度、温度が上記範囲内に維持されるように、撹拌槽内に、原料液の他に、アルカリ水溶液、アンモニア水溶液を供給する。これにより、反応水溶液中で、核の生成が継続される。そして、所定の量の核が生成されると、核生成工程S11を終了する。所定量の核が生成したか否かは、金属塩の供給量によって推定できる。   In the nucleation step S11, in addition to the raw material liquid, an alkaline aqueous solution and an aqueous ammonia solution are supplied into the stirring tank so that the pH value, ammonia concentration, and temperature of the aqueous reaction solution are maintained within the above ranges. Thereby, the production | generation of a nucleus is continued in reaction aqueous solution. Then, when a predetermined amount of nuclei is generated, the nucleation step S11 is terminated. Whether or not a predetermined amount of nuclei has been generated can be estimated from the supply amount of the metal salt.

(粒子成長工程)
核生成工程S11の終了後、粒子成長工程S12の開始前に、撹拌槽内の反応水溶液のpH値を、液温25℃基準で、10.5〜12.0、好ましくは11.0〜12.0、かつ、核生成工程S11におけるpH値よりも低く調整する。このpH値の調整は、撹拌槽内へのアルカリ水溶液の供給を停止すること、金属塩の金属を水素と置換した無機酸(例えば硫酸塩の場合、硫酸)を撹拌槽内へ供給することなどで調整できる。
(Particle growth process)
After the completion of the nucleation step S11 and before the start of the particle growth step S12, the pH value of the reaction aqueous solution in the stirring vessel is 10.5 to 12.0, preferably 11.0 to 12 on the basis of the liquid temperature of 25 ° C. 0.0 and lower than the pH value in the nucleation step S11. The pH value is adjusted by stopping the supply of the alkaline aqueous solution into the stirring tank, or supplying an inorganic acid (for example, sulfuric acid in the case of sulfate) in which the metal of the metal salt is replaced with hydrogen into the stirring tank. It can be adjusted with.

反応水溶液のpH、アンモニア濃度、温度などの調節後、反応水溶液を撹拌しながら原料液を撹拌槽内に供給する。これにより、中和晶析によって核の成長(粒子成長)が始まり、粒子成長工程S12が開始される。尚、本実施形態では、核生成工程S11と粒子成長工程S12とを、同一の撹拌槽で行うが、異なる撹拌槽で行ってもよい。   After adjusting the pH, ammonia concentration, temperature, etc. of the reaction aqueous solution, the raw material liquid is supplied into the stirring tank while stirring the reaction aqueous solution. Thereby, the growth of the nucleus (particle growth) starts by neutralization crystallization, and the particle growth step S12 is started. In the present embodiment, the nucleation step S11 and the particle growth step S12 are performed in the same stirring tank, but may be performed in different stirring tanks.

粒子成長工程S12において、反応水溶液のpH値が12.0以下であってかつ核生成工程S11におけるpH値よりも低ければ、新たな核はほとんど生成せず、核生成よりも粒子成長の方が優先して生じる。   In the particle growth step S12, if the pH value of the aqueous reaction solution is 12.0 or less and lower than the pH value in the nucleation step S11, new nuclei are hardly generated, and particle growth is more preferable than nucleation. Preferentially occurs.

尚、pH値が12.0の場合は、核生成と粒子成長の境界条件であるため、反応水溶液中に存在する核の有無により、優先順位が変わる。例えば、核生成工程S11のpH値を12.0より高くして多量に核生成させた後、粒子成長工程S12でpH値を12.0とすると、反応水溶液中に多量の核が存在するため、粒子成長が優先する。一方、反応水溶液中に核が存在しない状態、すなわち、核生成工程S11においてpH値を12.0とした場合、成長する核が存在しないため、核生成が優先する。その後、粒子成長工程S12においてpH値を12.0より小さくすれば、生成した核が成長する。核生成と粒子成長を明確に分離するためには、粒子成長工程のpH値を核生成工程のpH値より0.5以上低くすることが好ましく、1.0以上低くすることがより好ましい。   When the pH value is 12.0, it is a boundary condition between nucleation and particle growth, and therefore the priority order changes depending on the presence or absence of nuclei present in the reaction aqueous solution. For example, if the pH value of the nucleation step S11 is higher than 12.0 to cause a large amount of nucleation, and then the pH value is set to 12.0 in the particle growth step S12, a large amount of nuclei exist in the reaction aqueous solution. , Grain growth is a priority. On the other hand, when no nuclei exist in the reaction aqueous solution, that is, when the pH value is set to 12.0 in the nucleation step S11, nucleation takes precedence because there are no growing nuclei. Thereafter, if the pH value is made smaller than 12.0 in the particle growth step S12, the generated nucleus grows. In order to clearly separate nucleation and particle growth, the pH value of the particle growth step is preferably 0.5 or more lower than the pH value of the nucleation step, more preferably 1.0 or more.

また、粒子成長工程S12において、反応水溶液のpH値が10.5以上であれば、アンモニアによる溶解度が低いため、析出せずに液中に残る金属イオンが減り、生産効率が向上する。   In the particle growth step S12, when the pH value of the reaction aqueous solution is 10.5 or more, the solubility by ammonia is low, so that metal ions remaining in the liquid without being precipitated are reduced, and the production efficiency is improved.

粒子成長工程S12では、反応水溶液のpH値やアンモニア濃度、温度が上記範囲内に維持されるように、撹拌槽内に、原料液の他に、アルカリ水溶液、アンモニア水溶液を供給する。これにより、反応水溶液中で、粒子成長が継続される。   In the particle growth step S12, in addition to the raw material liquid, an alkaline aqueous solution and an aqueous ammonia solution are supplied into the stirring tank so that the pH value, ammonia concentration, and temperature of the aqueous reaction solution are maintained within the above ranges. Thereby, particle growth is continued in the reaction aqueous solution.

粒子成長工程S12は、撹拌槽内の雰囲気を切り換えることで前半と後半とに分けることができる。前半の雰囲気は、核生成工程S11と同様に酸化性雰囲気とされる。酸化性雰囲気の酸素濃度は、1容量%以上、好ましくは2容量%以上、より好ましくは10容量%以上である。酸化性雰囲気は、制御が容易な大気雰囲気(酸素濃度:21容量%)であってよい。酸化性雰囲気の酸素濃度の上限は、特に限定されるものではないが、30容量%以下である。一方、後半の雰囲気は、非酸化性雰囲気とされる。非酸化性雰囲気の酸素濃度は、1容量%以下、好ましくは0.5容量%以下、より好ましくは0.3容量%以下である。非酸化性雰囲気の酸素濃度は、酸素ガスまたは大気と、不活性ガスとを混合することにより制御する。   The particle growth step S12 can be divided into a first half and a second half by switching the atmosphere in the stirring tank. The first half atmosphere is an oxidizing atmosphere as in the nucleation step S11. The oxygen concentration in the oxidizing atmosphere is 1% by volume or more, preferably 2% by volume or more, more preferably 10% by volume or more. The oxidizing atmosphere may be an easily controlled air atmosphere (oxygen concentration: 21% by volume). The upper limit of the oxygen concentration in the oxidizing atmosphere is not particularly limited, but is 30% by volume or less. On the other hand, the latter atmosphere is a non-oxidizing atmosphere. The oxygen concentration in the non-oxidizing atmosphere is 1% by volume or less, preferably 0.5% by volume or less, more preferably 0.3% by volume or less. The oxygen concentration in the non-oxidizing atmosphere is controlled by mixing oxygen gas or air with an inert gas.

図8は、一実施形態による粒子成長工程の前半で形成される凝集体を模式化した断面図である。図9は、一実施形態による粒子成長工程の後半で形成される外殻を模式化した断面図である。   FIG. 8 is a cross-sectional view schematically showing aggregates formed in the first half of the particle growth step according to an embodiment. FIG. 9 is a cross-sectional view schematically showing an outer shell formed in the latter half of the particle growth process according to an embodiment.

粒子成長工程S12の前半では、核が成長することで種晶粒子2が形成され、種晶粒子2がある程度大きくなると、種晶粒子2同士が衝突するようになり、複数の種晶粒子2からなる凝集体4が形成される。一方、粒子成長工程S12の後半では、凝集体4の周りに緻密な外殻6が形成される。その結果、凝集体4と外殻6とで構成される粒子が得られる。   In the first half of the particle growth step S12, the seed crystal particles 2 are formed by the growth of the nuclei, and when the seed crystal particles 2 become large to some extent, the seed crystal particles 2 collide with each other. Aggregates 4 are formed. On the other hand, a dense outer shell 6 is formed around the aggregate 4 in the latter half of the particle growth step S12. As a result, particles composed of the aggregate 4 and the outer shell 6 are obtained.

尚、ニッケル含有水酸化物の粒子の構造は、図9に示す構造に限定されない。例えば、核生成工程S11と粒子成長工程S12とが同時に実施される場合、中和晶析の完了時に得られる粒子の構造は、図9に示す構造とは別の構造である。その構造は、例えば種晶粒子2に相当するものと外殻6に相当するものとが混じり合い、容易にその境界が分からない一様な構造となる。   The structure of the nickel-containing hydroxide particles is not limited to the structure shown in FIG. For example, when the nucleation step S11 and the particle growth step S12 are performed at the same time, the structure of the particles obtained upon completion of neutralization crystallization is a structure different from the structure shown in FIG. For example, the structure corresponding to the seed crystal particles 2 and the structure corresponding to the outer shell 6 are mixed to form a uniform structure in which the boundary is not easily understood.

ニッケル含有水酸化物の粒子が所定の粒径まで成長した時点で、粒子成長工程S12を終了させる。その粒径は、核生成工程S11と粒子成長工程S12のそれぞれにおける金属塩の供給量から推測できる。   When the nickel-containing hydroxide particles grow to a predetermined particle size, the particle growth step S12 is terminated. The particle size can be estimated from the supply amount of the metal salt in each of the nucleation step S11 and the particle growth step S12.

尚、核生成工程S11の終了後、粒子成長工程S12の途中で、原料液などの供給を停止すると共に反応水溶液の撹拌を停止し、粒子を沈降させ、上澄み液を排出してもよい。これにより、中和晶析によって減少した反応水溶液中の金属イオン濃度を、高めることができる。   In addition, after completion | finish of nucleation process S11, supply of raw material liquid etc. may be stopped in the middle of particle growth process S12, stirring of reaction aqueous solution may be stopped, particle | grains may be settled, and supernatant liquid may be discharged | emitted. Thereby, the metal ion density | concentration in the reaction aqueous solution decreased by neutralization crystallization can be raised.

図10は、一実施形態による核生成工程における反応水溶液中の第1高過飽和領域を示す図である。尚、図10では、図3の流れ調整部材70が用いられるが、図4の流れ調整部材70Aや、図5の流れ調整部材70B、図6の流れ調整部材70Cなどが用いられてもよい。   FIG. 10 is a diagram showing a first highly supersaturated region in the aqueous reaction solution in the nucleation step according to one embodiment. In FIG. 10, the flow adjustment member 70 of FIG. 3 is used, but the flow adjustment member 70A of FIG. 4, the flow adjustment member 70B of FIG. 5, the flow adjustment member 70C of FIG.

第1高過飽和領域12Aとは、反応水溶液中に溶けているニッケル含有水酸化物のモル濃度が5.0mol/m以上である領域を意味する。第1高過飽和領域12Aでは、ニッケル含有水酸化物のモル濃度が溶解度よりも十分に高いので、核生成が有意な速さで生じる。 The first highly supersaturated region 12A means a region where the molar concentration of the nickel-containing hydroxide dissolved in the reaction aqueous solution is 5.0 mol / m 3 or more. In the first highly supersaturated region 12A, the molar concentration of the nickel-containing hydroxide is sufficiently higher than the solubility, so that nucleation occurs at a significant rate.

ここで、溶解度とは、水100gに溶けるニッケル含有水酸化物の限界量(g/100g−HO)を意味する。水酸化ニッケル(Ni(OH))の溶解度は、例えば10−7(g/100g−HO)である。このようにニッケル含有水酸化物の溶解度は、ゼロに近いので、第1高過飽和領域12Aのモル濃度の下限値5.0mol/mに比べ無視できるほど小さい。 Here, the solubility means a limit amount (g / 100 g-H 2 O) of a nickel-containing hydroxide that is soluble in 100 g of water. The solubility of nickel hydroxide (Ni (OH) 2 ) is, for example, 10 −7 (g / 100 g-H 2 O). Thus, since the solubility of nickel-containing hydroxide is close to zero, it is negligibly small compared to the lower limit value of 5.0 mol / m 3 of the molar concentration of the first highly supersaturated region 12A.

図11は、連続式の撹拌槽内の反応水溶液に占める第1高過飽和領域の体積割合が0.025%である場合に得られた粒子の一例のSEM写真である。図11に示す粒子の外表面は滑らかであり、凸凹はほとんど認められなかった。一方、図12は、連続式の撹拌槽内の反応水溶液に占める第1高過飽和領域の体積割合が0.100%である場合に得られた粒子の一例のSEM写真である。図12に示す粒子の外表面には顕著な凹凸が認められた。   FIG. 11 is an SEM photograph of an example of particles obtained when the volume ratio of the first highly supersaturated region in the reaction aqueous solution in the continuous stirring tank is 0.025%. The outer surface of the particle | grains shown in FIG. 11 was smooth, and unevenness was hardly recognized. On the other hand, FIG. 12 is a SEM photograph of an example of particles obtained when the volume ratio of the first highly supersaturated region in the reaction aqueous solution in the continuous stirring tank is 0.100%. Remarkable irregularities were observed on the outer surface of the particles shown in FIG.

図11および図12から明らかなように、中和晶析の完了時に得られる粒子の外表面の凸凹の発生を抑制する観点から、核生成工程S11における反応水溶液に占める第1高過飽和領域の体積割合(以下、第1体積割合と呼ぶ)が0.100%未満であることが好ましい。第1体積割合が0.100%未満であれば、中和晶析の完了時に得られる粒子の外表面の凹凸の発生を抑制できる理由は下記のように推定される。   As apparent from FIGS. 11 and 12, from the viewpoint of suppressing the occurrence of irregularities on the outer surface of the particles obtained upon completion of neutralization crystallization, the volume of the first highly supersaturated region in the reaction aqueous solution in the nucleation step S11. The ratio (hereinafter referred to as the first volume ratio) is preferably less than 0.100%. If the first volume ratio is less than 0.100%, the reason why it is possible to suppress the occurrence of irregularities on the outer surface of the particles obtained at the completion of neutralization crystallization is estimated as follows.

核生成工程S11において、核は、主に第1高過飽和領域12Aにおいて生成され、その後、反応水溶液全体に分散する。第1体積割合が0.100%未満であれば、反応水溶液の単位体積当たりの核の発生数が少ない。そのため、粒子成長工程S12の前半において、反応水溶液の単位体積当たりの種晶粒子2の数も相対的に少なく、複数の種晶粒子2からなる凝集体4の数も相対的に少ない。その結果、粒子成長工程S12の後半において、凝集体4の周りに形成される外殻6の厚さが厚くなる。よって、凝集体4の外表面の凸凹を厚い外殻6で被覆でき、最終的に得られる粒子の外表面の凸凹を低減できる。尚、この効果は、核生成工程S11と粒子成長工程S12とが同時に行われる場合にも得られる。   In the nucleation step S11, nuclei are mainly generated in the first highly supersaturated region 12A and then dispersed throughout the reaction aqueous solution. When the first volume ratio is less than 0.100%, the number of nuclei generated per unit volume of the reaction aqueous solution is small. Therefore, in the first half of the particle growth step S12, the number of seed crystal particles 2 per unit volume of the reaction aqueous solution is relatively small, and the number of aggregates 4 composed of a plurality of seed crystal particles 2 is also relatively small. As a result, in the latter half of the particle growth step S12, the thickness of the outer shell 6 formed around the aggregate 4 increases. Therefore, the unevenness of the outer surface of the aggregate 4 can be covered with the thick outer shell 6, and the unevenness of the outer surface of the finally obtained particles can be reduced. This effect is also obtained when the nucleation step S11 and the particle growth step S12 are performed simultaneously.

中和晶析の完了時に得られる粒子の外表面の凸凹を低減する観点からは、第1体積割合が小さいほど好ましい。第1体積割合は、吐出部61付近の流れ場のUやKなどに依存する。UやKが大きいほど、第1体積割合が小さい。第1体積割合は、好ましくは0.070%以下、より好ましくは0.050%以下、さらに好ましくは0.030%以下である。但し、UやKは撹拌軸40を回転させるモータの容量などの制約を受けるので、第1体積割合は好ましくは0.004%以上である。   From the viewpoint of reducing unevenness on the outer surface of the particles obtained upon completion of neutralization crystallization, the smaller the first volume ratio, the better. The first volume ratio depends on U and K of the flow field in the vicinity of the discharge unit 61. The larger the U and K, the smaller the first volume ratio. The first volume ratio is preferably 0.070% or less, more preferably 0.050% or less, and still more preferably 0.030% or less. However, since U and K are restricted by the capacity of the motor that rotates the stirring shaft 40, the first volume ratio is preferably 0.004% or more.

核生成工程S11では、原料液を分けて複数の吐出部61から反応水溶液中に吐出してよい。これにより、効率的に第1体積割合を小さくできる。このとき、複数の吐出部61から吐出される複数の第1高過飽和領域12Aが重ならないように、複数の吐出部61の間隔が設定されることが好ましい。   In the nucleation step S <b> 11, the raw material liquid may be divided and discharged from the plurality of discharge portions 61 into the reaction aqueous solution. Thereby, a 1st volume ratio can be made small efficiently. At this time, it is preferable that the intervals between the plurality of discharge units 61 are set so that the plurality of first highly supersaturated regions 12A discharged from the plurality of discharge units 61 do not overlap.

図13は、一実施形態による粒子成長工程における反応水溶液中の第2高過飽和領域を示す図である。尚、図13では、図3の流れ調整部材70が用いられるが、図4の流れ調整部材70Aや、図5の流れ調整部材70B、図6の流れ調整部材70Cなどが用いられてもよい。   FIG. 13 is a diagram showing a second highly supersaturated region in the aqueous reaction solution in the particle growth step according to an embodiment. In FIG. 13, the flow adjustment member 70 of FIG. 3 is used, but the flow adjustment member 70A of FIG. 4, the flow adjustment member 70B of FIG. 5, the flow adjustment member 70C of FIG.

第2高過飽和領域12Bとは、反応水溶液中に溶けているニッケル含有水酸化物のモル濃度が1.7mol/m以上である領域を意味する。第2高過飽和領域12Bでは、ニッケル含有水酸化物のモル濃度が溶解度よりも十分に高いので、粒子成長が有意な速さで生じる。 The second highly supersaturated region 12B means a region where the molar concentration of the nickel-containing hydroxide dissolved in the reaction aqueous solution is 1.7 mol / m 3 or more. In the second highly supersaturated region 12B, the molar concentration of the nickel-containing hydroxide is sufficiently higher than the solubility, so that particle growth occurs at a significant rate.

尚、上述の如くニッケル含有水酸化物の溶解度は、ゼロに近いので、第2高過飽和領域12Bのモル濃度の下限値1.7mol/mに比べ無視できるほど小さい。 As described above, since the solubility of the nickel-containing hydroxide is close to zero, it is negligibly small compared to the lower limit value of 1.7 mol / m 3 of the molar concentration of the second highly supersaturated region 12B.

図14は、連続式の撹拌槽内の反応水溶液に占める第2高過飽和領域の体積割合が0.379%である場合に得られた粒子の断面の一例のSEM写真である。図14に示す粒子の断面には年輪状の構造は認められなかった。一方、図15は、連続式の撹拌槽内の反応水溶液に占める第2高過飽和領域の体積割合が0.624%である場合に得られた粒子の断面の一例のSEM写真である。図15に示す粒子の断面には矢印で示す箇所に年輪状の構造が認められた。   FIG. 14 is an SEM photograph of an example of a cross section of particles obtained when the volume ratio of the second highly supersaturated region in the reaction aqueous solution in the continuous stirring tank is 0.379%. No annual ring-like structure was observed in the cross section of the particle shown in FIG. On the other hand, FIG. 15 is an SEM photograph of an example of a cross section of the particles obtained when the volume ratio of the second highly supersaturated region in the reaction aqueous solution in the continuous stirring tank is 0.624%. In the cross section of the particle shown in FIG. 15, an annual ring-like structure was observed at a position indicated by an arrow.

図14および図15から明らかなように、年輪状の構造の発生を抑制する観点から、反応水溶液に占める第2高過飽和領域12Bの体積割合(以下、第2体積割合と呼ぶ)が0.624%未満であることが好ましい。第2体積割合が0.624%未満であれば、年輪状の構造の発生を抑制できる理由は下記のように推定される。   As apparent from FIGS. 14 and 15, from the viewpoint of suppressing the generation of annual ring-like structures, the volume ratio of the second highly supersaturated region 12B in the reaction aqueous solution (hereinafter referred to as the second volume ratio) is 0.624. It is preferable that it is less than%. If the second volume ratio is less than 0.624%, the reason why generation of an annual ring-like structure can be suppressed is estimated as follows.

粒子成長工程S12において、粒子は、反応水溶液全体に分散しており、主に第2高過飽和領域12Bを通過する際に成長する。反応水溶液全体に占める第2高過飽和領域12Bの体積割合が0.624%未満であれば、粒子成長が緩やかに生じ、密度の異なる複数の層からなる年輪状の構造の発生が抑制できる。粒子成長を緩やかに生じさせることで、結晶成長方位の変化やその変化に伴う空隙の発生などを抑制できるためと推定される。   In the particle growth step S12, the particles are dispersed throughout the reaction aqueous solution and grow mainly when passing through the second highly supersaturated region 12B. If the volume ratio of the second highly supersaturated region 12B in the entire reaction aqueous solution is less than 0.624%, particle growth occurs gently, and generation of an annual ring-like structure composed of a plurality of layers having different densities can be suppressed. It is presumed that the slow growth of grain growth can suppress the change in crystal growth orientation and the generation of voids accompanying the change.

年輪状の構造の発生を抑制する観点からは、反応水溶液に占める第2高過飽和領域12Bの体積割合(以下、第2体積割合と呼ぶ)は小さいほど好ましい。第2体積割合は、吐出部61付近の流れ場のUやKなどに依存する。UやKが大きいほど、第2体積割合が小さい。第2体積割合は、好ましくは0.600%以下、より好ましくは0.500%以下、さらに好ましくは0.400%以下である。但し、UやKは撹拌軸40を回転させるモータの容量などの制約を受けるので、第2体積割合は好ましくは0.019%以上である。   From the viewpoint of suppressing the generation of an annual ring-like structure, the volume ratio of the second highly supersaturated region 12B in the reaction aqueous solution (hereinafter referred to as the second volume ratio) is preferably as small as possible. The second volume ratio depends on U and K of the flow field in the vicinity of the discharge unit 61. The larger the U or K, the smaller the second volume ratio. The second volume ratio is preferably 0.600% or less, more preferably 0.500% or less, and still more preferably 0.400% or less. However, since U and K are restricted by the capacity of the motor that rotates the stirring shaft 40, the second volume ratio is preferably 0.019% or more.

粒子成長工程S12では、原料液を分けて複数の吐出部61から反応水溶液中に吐出してよい。これにより、効率的に第2体積割合を小さくできる。このとき、複数の吐出部61から吐出される複数の第2高過飽和領域12Bが重ならないように複数の吐出部61の間隔が設定されることが好ましい。   In the particle growth step S12, the raw material liquid may be divided and discharged from the plurality of discharge portions 61 into the reaction aqueous solution. Thereby, a 2nd volume ratio can be made small efficiently. At this time, it is preferable that the intervals between the plurality of discharge units 61 are set so that the plurality of second highly supersaturated regions 12B discharged from the plurality of discharge units 61 do not overlap.

以上、化学反応装置の実施形態等について説明したが、本発明は上記実施形態等に限定されるものではなく、特許請求の範囲に記載された本発明の要旨の範囲内において、種々の変形、改良が可能である。   Although the embodiments of the chemical reaction apparatus have been described above, the present invention is not limited to the above-described embodiments and the like, and various modifications are possible within the scope of the gist of the present invention described in the claims. Improvements are possible.

吐出部61の数は、図3〜図6では1つであるが、複数でもよい。その場合、少なくとも1つの吐出部61の近傍に、流れ調整部材が設けられていればよい。好ましくは、各吐出部61の近傍に、流れ調整部材が設けられてよい。   Although the number of the discharge parts 61 is one in FIGS. 3-6, multiple may be sufficient. In that case, the flow adjustment member should just be provided in the vicinity of the at least 1 discharge part 61. FIG. Preferably, a flow adjusting member may be provided in the vicinity of each discharge unit 61.

一の吐出部61の近傍に、図3〜図6では一の流れ調整部材が設けられるが、複数の流れ調整部材が設けられてもよい。例えば、一の吐出部61の近傍に、図3に示す流れ調整部材70と、図4に示す流れ調整部材70Aとが両方設けられてもよい。   In FIG. 3 to FIG. 6, one flow adjustment member is provided in the vicinity of one discharge portion 61, but a plurality of flow adjustment members may be provided. For example, both the flow adjusting member 70 shown in FIG. 3 and the flow adjusting member 70A shown in FIG.

流れ調整部材に衝突し向きを変える流れは、図3〜図6では流れ調整部材に衝突せずに吐出部61に向かう流れF2を基準として上方の流れF1または下方の流れF3であるが、流れ調整部材に衝突せずに吐出部61に向かう流れF2を基準として横の流れでもよい。   The flow that collides with the flow adjusting member and changes its direction is the upper flow F1 or the lower flow F3 on the basis of the flow F2 toward the discharge unit 61 without colliding with the flow adjusting member in FIGS. A horizontal flow may be used with reference to the flow F <b> 2 toward the discharge unit 61 without colliding with the adjustment member.

2 種晶粒子
4 凝集体
6 外殻
10 化学反応装置
12 高過飽和領域
20 撹拌槽
30 撹拌翼
40 撹拌軸
50 バッフル
60 原料液供給管
61 吐出部
70 流れ調整部材
71 壁面
72 突起
2 Seed crystal particle 4 Aggregate 6 Outer shell 10 Chemical reactor 12 High supersaturation region 20 Stirrer tank 30 Stirrer blade 40 Stirrer shaft 50 Baffle 60 Raw material liquid supply pipe 61 Discharge unit 70 Flow adjusting member 71 Wall surface 72 Projection

Claims (5)

溶液の中に原料液を供給しながら、前記溶液の中で粒子を析出させる、化学反応装置であって、
前記溶液を収容する撹拌槽と、
前記溶液の流れの中で前記原料液を吐出する吐出部を有する原料液供給管と、
前記吐出部の上流側における前記溶液の流れを調整する流れ調整部材とを備え、
前記流れ調整部材は、前記吐出部に向けて前記溶液の流れを受け流す壁面と、前記壁面から突出する突起とを有する、化学反応装置。
A chemical reaction device for precipitating particles in the solution while supplying the raw material liquid into the solution,
A stirring tank containing the solution;
A raw material liquid supply pipe having a discharge section for discharging the raw material liquid in the flow of the solution;
A flow adjusting member for adjusting the flow of the solution on the upstream side of the discharge unit,
The said flow control member is a chemical reaction apparatus which has the wall surface which receives the flow of the said solution toward the said discharge part, and the protrusion which protrudes from the said wall surface.
前記壁面は、前記吐出部に向かうほど互いに近づく2つの直線状の側縁を有し、前記2つの直線状の側縁を結ぶ平面を基準として下流側に凹むことで、前記壁面に沿う流れを前記吐出部に向けて集める、請求項1に記載の化学反応装置。   The wall surface has two linear side edges that are closer to each other toward the discharge section, and is recessed downstream with respect to a plane connecting the two linear side edges, thereby allowing the flow along the wall surface to flow. The chemical reaction device according to claim 1, wherein the chemical reaction device collects toward the discharge unit. 溶液の中に原料液を供給しながら、前記溶液の中で粒子を析出させる、化学反応装置であって、
前記溶液を収容する撹拌槽と、
前記溶液の流れの中で前記原料液を吐出する吐出部を有する原料液供給管と、
前記吐出部の上流側における前記溶液の流れを調整する流れ調整部材とを備え、
前記流れ調整部材は、前記吐出部に向けて前記溶液の流れを受け流す壁面を有し、
前記壁面は、前記吐出部に向かうほど互いに近づく2つの直線状の側縁を有し、前記2つの直線状の側縁を結ぶ平面を基準として下流側に凹むことで、前記壁面に沿う流れを前記吐出部に向けて集める、化学反応装置。
A chemical reaction device for precipitating particles in the solution while supplying the raw material liquid into the solution,
A stirring tank containing the solution;
A raw material liquid supply pipe having a discharge section for discharging the raw material liquid in the flow of the solution;
A flow adjusting member for adjusting the flow of the solution on the upstream side of the discharge unit,
The flow adjusting member has a wall surface for receiving the flow of the solution toward the discharge part,
The wall surface has two linear side edges that are closer to each other toward the discharge portion, and is recessed downstream with respect to a plane connecting the two linear side edges, thereby allowing the flow along the wall surface to flow. A chemical reaction apparatus that collects toward the discharge unit.
請求項1〜3のいずれか1項に記載の化学反応装置を用いて、前記溶液の中に前記原料液を供給しながら、前記溶液の中で粒子を析出させる、粒子の製造方法。   A method for producing particles, wherein the chemical reaction apparatus according to claim 1 is used to deposit particles in the solution while supplying the raw material liquid into the solution. 前記溶液は水溶液であって、前記原料液はニッケル塩を含み、前記粒子はニッケル含有水酸化物である、請求項4に記載の粒子の製造方法。   The method for producing particles according to claim 4, wherein the solution is an aqueous solution, the raw material liquid contains a nickel salt, and the particles are nickel-containing hydroxide.
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