JP2018002583A5 - Transistor and display device - Google Patents

Transistor and display device Download PDF

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JP2018002583A5
JP2018002583A5 JP2017116039A JP2017116039A JP2018002583A5 JP 2018002583 A5 JP2018002583 A5 JP 2018002583A5 JP 2017116039 A JP2017116039 A JP 2017116039A JP 2017116039 A JP2017116039 A JP 2017116039A JP 2018002583 A5 JP2018002583 A5 JP 2018002583A5
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display device
transistor
metal oxide
substrate
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JP2017116039A
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JP2018002583A (en
JP6800092B2 (en
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Claims (7)

金属酸化物をチャネル領域に有するトランジスタであって、A transistor having a metal oxide in a channel region, wherein
前記金属酸化物は、第1の領域と、第2の領域と、を有し、The metal oxide has a first region and a second region,
前記第1の領域は、In、Ga及びZnを有し、The first region includes In, Ga and Zn.
前記第2の領域は、In、Ga及びZnを有し、The second region includes In, Ga and Zn.
前記第1の領域は、前記第2の領域よりエネルギーバンドの伝導帯下端が低く、The first region has a lower conduction band lower end of the energy band than the second region,
前記第1の領域は、前記第2の領域よりもキャリアが多い、トランジスタ。The first region has more carriers than the second region.
金属酸化物をチャネル領域に有するトランジスタであって、A transistor having a metal oxide in a channel region, wherein
前記金属酸化物は、第1の領域と、第2の領域と、を有し、The metal oxide has a first region and a second region,
前記第1の領域は、In、Ga及びZnを有し、The first region includes In, Ga and Zn.
前記第2の領域は、In、Ga及びZnを有し、The second region includes In, Ga and Zn.
前記第1の領域は、前記第2の領域よりエネルギーバンドの伝導帯下端が低く、The first region has a lower conduction band lower end of the energy band than the second region,
前記第1の領域は、前記伝導帯下端が高い領域よりもキャリアが多く、The first region has more carriers than the region where the lower end of the conduction band is high,
前記第1の領域と前記第2の領域は、それぞれの価電子帯の位置が異なる、トランジスタ。The first region and the second region have different valence band positions.
請求項1又は請求項2において、In claim 1 or claim 2,
前記第2の領域は、前記第1の領域よりものGaの濃度が高く、前記第1の領域は、前記第2の領域よりもInの濃度が高い、トランジスタ。The second region has a higher concentration of Ga than the first region, and the first region has a higher concentration of In than the second region.
請求項1乃至3のいずれか一項において、In any one of claims 1 to 3,
前記金属酸化物は、0.5nm以上10nm以下の径の粒子を有する、トランジスタ。The transistor, wherein the metal oxide has particles with a diameter of 0.5 nm or more and 10 nm or less.
請求項1乃至4のいずれか一項に記載のトランジスタを有する表示装置であって、A display device comprising the transistor according to any one of claims 1 to 4;
前記表示装置は、基板上に表示部と、前記表示部を駆動させるドライバと、を有し、The display device includes a display portion on a substrate and a driver for driving the display portion.
前記ドライバは前記トランジスタを有する、表示装置。The display device, wherein the driver comprises the transistor.
請求項1乃至4のいずれか一項に記載のトランジスタを有する表示装置であって、A display device comprising the transistor according to any one of claims 1 to 4;
前記表示装置は、基板上に走査線駆動回路と、表示部と、を有し、The display device includes a scan line driving circuit and a display portion over a substrate,
前記走査線駆動回路は前記トランジスタを有する、表示装置。The display device, wherein the scan line drive circuit includes the transistor.
請求項1乃至4のいずれか一項に記載のトランジスタを有する表示装置であって、A display device comprising the transistor according to any one of claims 1 to 4;
前記表示装置は、基板上に信号線駆動回路と、表示部と、を有し、The display device includes a signal line driver circuit and a display portion on a substrate,
前記信号線駆動回路は前記トランジスタを有する、表示装置。The display device, wherein the signal line drive circuit includes the transistor.
JP2017116039A 2016-06-24 2017-06-13 Transistors and display devices Active JP6800092B2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2016125977 2016-06-24
JP2016125977 2016-06-24
JP2016126115 2016-06-25
JP2016126115 2016-06-25

Related Child Applications (1)

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JP2020194149A Division JP7048707B2 (en) 2016-06-24 2020-11-24 Transistors and display devices

Publications (3)

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JP2018002583A JP2018002583A (en) 2018-01-11
JP2018002583A5 true JP2018002583A5 (en) 2019-06-13
JP6800092B2 JP6800092B2 (en) 2020-12-16

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JP2017116039A Active JP6800092B2 (en) 2016-06-24 2017-06-13 Transistors and display devices
JP2020194149A Active JP7048707B2 (en) 2016-06-24 2020-11-24 Transistors and display devices

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Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9306078B2 (en) * 2008-09-08 2016-04-05 Cbrite Inc. Stable amorphous metal oxide semiconductor
JP2010153802A (en) 2008-11-20 2010-07-08 Semiconductor Energy Lab Co Ltd Semiconductor device and method of manufacturing the same
JP5328414B2 (en) 2009-02-25 2013-10-30 富士フイルム株式会社 Top gate type field effect transistor, method of manufacturing the same, and display device including the same
JP5626978B2 (en) * 2010-09-08 2014-11-19 富士フイルム株式会社 THIN FILM TRANSISTOR, MANUFACTURING METHOD THEREOF, AND APPARATUS HAVING THE THIN FILM TRANSISTOR
TWI618252B (en) 2013-02-12 2018-03-11 半導體能源研究所股份有限公司 Semiconductor device
JP6199581B2 (en) 2013-03-08 2017-09-20 株式会社半導体エネルギー研究所 Metal oxide film and semiconductor device
WO2015132697A1 (en) * 2014-03-07 2015-09-11 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
US20150255029A1 (en) * 2014-03-07 2015-09-10 Semiconductor Energy Laboratory Co., Ltd. Display device, display module including the display device, and electronic device including the display device or the display module
TWI652362B (en) 2014-10-28 2019-03-01 日商半導體能源研究所股份有限公司 Oxide and manufacturing method thereof

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