JP2018002583A5 - Transistor and display device - Google Patents
Transistor and display device Download PDFInfo
- Publication number
- JP2018002583A5 JP2018002583A5 JP2017116039A JP2017116039A JP2018002583A5 JP 2018002583 A5 JP2018002583 A5 JP 2018002583A5 JP 2017116039 A JP2017116039 A JP 2017116039A JP 2017116039 A JP2017116039 A JP 2017116039A JP 2018002583 A5 JP2018002583 A5 JP 2018002583A5
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- region
- display device
- transistor
- metal oxide
- substrate
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- 229910044991 metal oxide Inorganic materials 0.000 claims 5
- 150000004706 metal oxides Chemical class 0.000 claims 5
- 229910052733 gallium Inorganic materials 0.000 claims 4
- 229910052738 indium Inorganic materials 0.000 claims 4
- 229910052725 zinc Inorganic materials 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 3
- 239000000969 carrier Substances 0.000 claims 2
- 239000002245 particle Substances 0.000 claims 1
Claims (7)
前記金属酸化物は、第1の領域と、第2の領域と、を有し、The metal oxide has a first region and a second region,
前記第1の領域は、In、Ga及びZnを有し、The first region includes In, Ga and Zn.
前記第2の領域は、In、Ga及びZnを有し、The second region includes In, Ga and Zn.
前記第1の領域は、前記第2の領域よりエネルギーバンドの伝導帯下端が低く、The first region has a lower conduction band lower end of the energy band than the second region,
前記第1の領域は、前記第2の領域よりもキャリアが多い、トランジスタ。The first region has more carriers than the second region.
前記金属酸化物は、第1の領域と、第2の領域と、を有し、The metal oxide has a first region and a second region,
前記第1の領域は、In、Ga及びZnを有し、The first region includes In, Ga and Zn.
前記第2の領域は、In、Ga及びZnを有し、The second region includes In, Ga and Zn.
前記第1の領域は、前記第2の領域よりエネルギーバンドの伝導帯下端が低く、The first region has a lower conduction band lower end of the energy band than the second region,
前記第1の領域は、前記伝導帯下端が高い領域よりもキャリアが多く、The first region has more carriers than the region where the lower end of the conduction band is high,
前記第1の領域と前記第2の領域は、それぞれの価電子帯の位置が異なる、トランジスタ。The first region and the second region have different valence band positions.
前記第2の領域は、前記第1の領域よりものGaの濃度が高く、前記第1の領域は、前記第2の領域よりもInの濃度が高い、トランジスタ。The second region has a higher concentration of Ga than the first region, and the first region has a higher concentration of In than the second region.
前記金属酸化物は、0.5nm以上10nm以下の径の粒子を有する、トランジスタ。The transistor, wherein the metal oxide has particles with a diameter of 0.5 nm or more and 10 nm or less.
前記表示装置は、基板上に表示部と、前記表示部を駆動させるドライバと、を有し、The display device includes a display portion on a substrate and a driver for driving the display portion.
前記ドライバは前記トランジスタを有する、表示装置。The display device, wherein the driver comprises the transistor.
前記表示装置は、基板上に走査線駆動回路と、表示部と、を有し、The display device includes a scan line driving circuit and a display portion over a substrate,
前記走査線駆動回路は前記トランジスタを有する、表示装置。The display device, wherein the scan line drive circuit includes the transistor.
前記表示装置は、基板上に信号線駆動回路と、表示部と、を有し、The display device includes a signal line driver circuit and a display portion on a substrate,
前記信号線駆動回路は前記トランジスタを有する、表示装置。The display device, wherein the signal line drive circuit includes the transistor.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016125977 | 2016-06-24 | ||
JP2016125977 | 2016-06-24 | ||
JP2016126115 | 2016-06-25 | ||
JP2016126115 | 2016-06-25 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020194149A Division JP7048707B2 (en) | 2016-06-24 | 2020-11-24 | Transistors and display devices |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2018002583A JP2018002583A (en) | 2018-01-11 |
JP2018002583A5 true JP2018002583A5 (en) | 2019-06-13 |
JP6800092B2 JP6800092B2 (en) | 2020-12-16 |
Family
ID=60948384
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017116039A Active JP6800092B2 (en) | 2016-06-24 | 2017-06-13 | Transistors and display devices |
JP2020194149A Active JP7048707B2 (en) | 2016-06-24 | 2020-11-24 | Transistors and display devices |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020194149A Active JP7048707B2 (en) | 2016-06-24 | 2020-11-24 | Transistors and display devices |
Country Status (1)
Country | Link |
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JP (2) | JP6800092B2 (en) |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9306078B2 (en) * | 2008-09-08 | 2016-04-05 | Cbrite Inc. | Stable amorphous metal oxide semiconductor |
JP2010153802A (en) | 2008-11-20 | 2010-07-08 | Semiconductor Energy Lab Co Ltd | Semiconductor device and method of manufacturing the same |
JP5328414B2 (en) | 2009-02-25 | 2013-10-30 | 富士フイルム株式会社 | Top gate type field effect transistor, method of manufacturing the same, and display device including the same |
JP5626978B2 (en) * | 2010-09-08 | 2014-11-19 | 富士フイルム株式会社 | THIN FILM TRANSISTOR, MANUFACTURING METHOD THEREOF, AND APPARATUS HAVING THE THIN FILM TRANSISTOR |
TWI618252B (en) | 2013-02-12 | 2018-03-11 | 半導體能源研究所股份有限公司 | Semiconductor device |
JP6199581B2 (en) | 2013-03-08 | 2017-09-20 | 株式会社半導体エネルギー研究所 | Metal oxide film and semiconductor device |
WO2015132697A1 (en) * | 2014-03-07 | 2015-09-11 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
US20150255029A1 (en) * | 2014-03-07 | 2015-09-10 | Semiconductor Energy Laboratory Co., Ltd. | Display device, display module including the display device, and electronic device including the display device or the display module |
TWI652362B (en) | 2014-10-28 | 2019-03-01 | 日商半導體能源研究所股份有限公司 | Oxide and manufacturing method thereof |
-
2017
- 2017-06-13 JP JP2017116039A patent/JP6800092B2/en active Active
-
2020
- 2020-11-24 JP JP2020194149A patent/JP7048707B2/en active Active
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