JP2017218338A - Glass substrate - Google Patents

Glass substrate Download PDF

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JP2017218338A
JP2017218338A JP2016112668A JP2016112668A JP2017218338A JP 2017218338 A JP2017218338 A JP 2017218338A JP 2016112668 A JP2016112668 A JP 2016112668A JP 2016112668 A JP2016112668 A JP 2016112668A JP 2017218338 A JP2017218338 A JP 2017218338A
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glass substrate
breakage
glass
semiconductor element
impact
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寛修 小澤
Hironaga Ozawa
寛修 小澤
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Disco Corp
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Disco Abrasive Systems Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a glass substrate capable of preventing damage, etc., due to a shock applied to the side surface from occurring.SOLUTION: A glass substrate 1 has a first surface 1a, a second surface 1b and a side surface 1c connecting the first surface 1a and the second surface 1b and can form a semiconductor element on the first surface 1a. The side surface 1c includes a damage prevention part 3 having a projection portion in which the edge of a cut surface is a curve when cut by a surface parallel to the first surface 1a constituted of a curved surface, and the damage prevention part 3 can be hemispherical and constituted of a wavy curved surface.SELECTED DRAWING: Figure 1

Description

本発明は、フラットパネルディスプレイ用のパネルや半導体デバイスチップ等の製造に用いられるガラス基板に関する。   The present invention relates to a glass substrate used for manufacturing a panel for a flat panel display, a semiconductor device chip and the like.

光を透過する性質を持つガラス基板は、フラットパネルディスプレイ(以下、FPD)のパネルに広く用いられている。一般的にFPDに用いられるパネルは、該パネルよりも大きいガラス基板(マザーガラスと呼ばれる)から切り出されたガラス基板を用いて作製されたものである。そして、該パネルが有するガラス基板上にはFPDを駆動するための半導体素子が設けられるが、該半導体素子は個々のガラス基板に切り出される前にマザーガラス上に形成される。   A glass substrate having a property of transmitting light is widely used for a panel of a flat panel display (hereinafter, FPD). The panel generally used for FPD is produced using the glass substrate cut out from the larger glass substrate (it is called mother glass) than this panel. A semiconductor element for driving the FPD is provided on the glass substrate included in the panel, and the semiconductor element is formed on the mother glass before being cut into individual glass substrates.

FPDの製造コストを下げるためには、1枚のマザーガラスから切り出すガラス基板の数を増やすことが有効である。マザーガラスから切り出されるガラス基板の数を増やすと、一の工程で処理できるガラス基板の数が増えるため、パネルの製造単価を下げることができる。   In order to reduce the manufacturing cost of FPD, it is effective to increase the number of glass substrates cut out from one mother glass. When the number of glass substrates cut out from the mother glass is increased, the number of glass substrates that can be processed in one step increases, so that the manufacturing cost of the panel can be reduced.

そして、近年マザーガラスから切り出せるガラス基板の数を増やすため、マザーガラスの大型化が進められており、1辺が1mを超える大きさのマザーガラスが実用化されている。また、マザーガラスの大型化に伴い、生産可能なFPD用パネルの大きさも大型化しており、対角100インチを超えるFPDも試作されるまでになっている。そのため、大型のガラス基板(マザーガラス)の需要は益々高まっている。   In recent years, in order to increase the number of glass substrates that can be cut out from the mother glass, the mother glass has been increased in size, and a mother glass having a side exceeding 1 m has been put into practical use. In addition, with the increase in the size of the mother glass, the size of the FPD panel that can be produced is also increased, and an FPD exceeding 100 inches diagonal has been prototyped. For this reason, the demand for large glass substrates (mother glass) is increasing.

ところで、ガラス基板は次世代半導体素子用の基板として、Siウェーハに代わる基板となることが期待されている。Siウェーハの大型化の傾向も近年著しく、450mm等の大口径Siウェーハに関するプロセスの開発も盛んではあるが、ガラス基板で実現されている1mを超えるような大きさのSiウェーハが実用化される兆しはない。   By the way, a glass substrate is expected to serve as a substrate to replace a Si wafer as a substrate for next-generation semiconductor elements. In recent years, the trend toward large-sized Si wafers has been remarkable, and although development of processes for large-diameter Si wafers such as 450 mm has been actively developed, Si wafers with a size exceeding 1 m, which is realized with glass substrates, will be put into practical use. There are no signs.

そこで、ガラス基板上に半導体素子を形成してデバイスチップを作製する研究が行われている。大型のガラス基板をマザーガラスとして用いて半導体素子を作製すると、1枚のマザーガラスから比較的多くのデバイスチップを作製することができるため、デバイスチップ1枚あたりのコストを下げることができる。また、そもそもガラス基板はSiウェーハよりも面積あたりの単価が低いため、その観点においてもガラス基板を用いるのはデバイスチップのコストを下げるのに有効であるといえる。   In view of this, research has been conducted on manufacturing a device chip by forming a semiconductor element on a glass substrate. When a semiconductor element is manufactured using a large glass substrate as a mother glass, a relatively large number of device chips can be manufactured from one mother glass, so that the cost per device chip can be reduced. In the first place, since the unit price per unit area of the glass substrate is lower than that of the Si wafer, it can be said that the use of the glass substrate is effective in reducing the cost of the device chip from this viewpoint.

ガラス基板を用いてデバイスチップを作製する場合、ガラス基板上に半導体層等を形成して、該半導体層を活性層として用いる半導体素子を作製する。または、予めSiウェーハ等に形成された半導体素子をガラス基板上に転写して半導体素子を設けてもよい。特許文献1にはガラス基板上に設けられたSOI(Silicon on insulator)素子が開示されている。   In the case where a device chip is manufactured using a glass substrate, a semiconductor layer or the like is formed on the glass substrate, and a semiconductor element using the semiconductor layer as an active layer is manufactured. Alternatively, a semiconductor element may be provided by transferring a semiconductor element previously formed on a Si wafer or the like onto a glass substrate. Patent Document 1 discloses an SOI (Silicon on Insulator) element provided on a glass substrate.

しかし、大型のガラス基板(マザーガラス)は重量も大きい。そのため、大型のガラス基板は搬送時等に加わる予期せぬ衝撃に弱い。ガラス基板に許容限度を超えた衝撃が加わると、割れ(クラック)や欠け等の損傷が生じて半導体素子を形成する基板として使用することができなくなる。一般的に大型のガラス基板は小型のガラス基板よりも高価であるため、ガラス基板に該損傷が生じたときの損害も大きい。   However, a large glass substrate (mother glass) is heavy. Therefore, a large glass substrate is vulnerable to an unexpected impact applied during transportation. When an impact exceeding an allowable limit is applied to the glass substrate, damage such as cracks or chipping occurs, and the glass substrate cannot be used as a substrate for forming a semiconductor element. In general, a large glass substrate is more expensive than a small glass substrate, so that the damage when the glass substrate is damaged is large.

そこで、衝撃等による損傷の発生を防ぐ方策としてガラス基板の強度を向上させることが検討されている。例えば、特許文献2には、ガラス基板の組成や性質を検討して強度を高めたガラス基板について開示されている。   Therefore, it has been studied to improve the strength of the glass substrate as a measure for preventing the occurrence of damage due to impact or the like. For example, Patent Document 2 discloses a glass substrate whose strength is increased by examining the composition and properties of the glass substrate.

特開2010−87067号公報JP 2010-87067 A 国際公開第2008/7676号International Publication No. 2008/7676

ところが、半導体素子が設けられるガラス基板は、ガラス基板から該半導体素子への不純物等の混入が生じない組成である必要があり、同時に、半導体素子の形成プロセスにおいて加えられる熱で歪み等を生じない性質でなければならない。そのため、ガラス基板の強度を高めるよう組成を検討する場合、半導体素子が形成されるガラス基板に求められる特性を満たす範囲の中で検討しなければならないため、検討可能な組成等の範囲は限られる。   However, the glass substrate on which the semiconductor element is provided needs to have a composition in which impurities or the like are not mixed into the semiconductor element from the glass substrate, and at the same time, distortion or the like does not occur due to heat applied in the process of forming the semiconductor element. Must be of nature. Therefore, when examining the composition so as to increase the strength of the glass substrate, it must be studied within a range that satisfies the characteristics required for the glass substrate on which the semiconductor element is formed, and therefore the range of the composition that can be examined is limited. .

また、マザーガラス等のガラス基板の一般的な形状は概略平板状である。すなわちガラス基板(マザーガラス)は、表面、裏面、側面のいずれもが平面である。一方、シリコンウェーハ等の基板の一般的な形状は概略円板状であり、側面は曲面となっている。基板の側面に予期せぬ衝撃が加えられるとき、シリコンウェーハの場合は曲面に衝撃を受けることとなるが、マザーガラス等のガラス基板の場合は該衝撃を平面で受けることとなる。   Moreover, the general shape of glass substrates, such as mother glass, is a substantially flat shape. That is, the glass substrate (mother glass) is flat on the front surface, the back surface, and the side surfaces. On the other hand, the general shape of a substrate such as a silicon wafer is generally disc-shaped, and the side surface is a curved surface. When an unexpected impact is applied to the side surface of the substrate, the impact is applied to the curved surface in the case of a silicon wafer, but in the case of a glass substrate such as mother glass, the impact is received on a flat surface.

一般に衝撃を受ける表面が平面であると、曲面であるよりも損傷等が生じやすくなる。そのため、ガラス基板においてはシリコンウェーハと比較して側面により一層の損傷対策が検討されねばならない。   In general, when a surface subjected to impact is a flat surface, damage or the like is more likely to occur than a curved surface. Therefore, in the glass substrate, further countermeasures against damage must be studied on the side surface as compared with the silicon wafer.

また、FPD用パネルの製造に使用される平板状のガラス基板においては、端部の(特に角部の)欠けやクラック等の発生を防止するために、面取り加工が施される場合がある。しかし、面取り加工が施されたガラス基板においても、第1の面または第2の面と、側面と、を接続する角部が除去されている一方で、側面の該角部以外の領域は依然として衝撃に対する対策が施されていないため衝撃に弱い。   Moreover, in the flat glass substrate used for manufacture of the panel for FPD, a chamfering process may be given in order to prevent generation | occurrence | production of the crack of an edge part (especially corner | angular part), a crack, etc. However, even in the glass substrate subjected to the chamfering process, the corners connecting the first surface or the second surface and the side surfaces are removed, but regions other than the corners on the side surfaces are still present. Since no measures against impact are taken, it is vulnerable to impact.

本発明はかかる点に鑑みてなされたものであり、その目的とするところは、側面に衝撃等が加えられても損傷等が生じにくいガラス基板を提供することである。   This invention is made | formed in view of this point, The place made into the objective is providing the glass substrate which is hard to produce a damage etc., even if an impact etc. are applied to a side surface.

本発明の一態様によれば、第1の面と、第2の面と、該第1の面及び該第2の面を連結する側面と、を備え、該第1の面上に半導体素子を形成することができるガラス基板であって、該側面は、破損防止部を備え、該破損防止部は、表面が曲面で構成され第1の面に平行な面で切断したときの切断面の縁が曲線となる凸部を有することを特徴とするガラス基板が提供される。   According to an aspect of the present invention, the semiconductor device includes a first surface, a second surface, and a side surface that connects the first surface and the second surface, and the semiconductor element is provided on the first surface. The side surface includes a breakage prevention portion, and the breakage prevention portion has a cut surface when the surface is formed by a curved surface and is cut by a plane parallel to the first surface. There is provided a glass substrate having a convex portion with a curved edge.

なお、本発明の一態様に係るガラス基板においては、該破損防止部は、半球状としてもよい。また、該破損防止部は、波型の曲面から構成されていてもよい。   Note that in the glass substrate according to one embodiment of the present invention, the breakage preventing portion may be hemispherical. In addition, the breakage prevention unit may be formed of a corrugated curved surface.

本願発明に係るガラス基板は、側面に破損防止部を備えている。そのため、該ガラス基板の側面に衝撃等が与えられるとき、ガラス基板は破損防止部の凸部で衝撃を受けることになる。破損防止部の凸部は表面が曲面で構成されるため、ガラス基板は該衝撃を曲面で受けることとなり損傷が生じにくい。   The glass substrate which concerns on this invention is equipped with the damage prevention part on the side surface. Therefore, when an impact or the like is applied to the side surface of the glass substrate, the glass substrate receives an impact at the convex portion of the breakage preventing portion. Since the convex portion of the breakage preventing portion has a curved surface, the glass substrate receives the impact on the curved surface and is not easily damaged.

該破損防止部は従来の面取り部と比べて、配設間隔、配設個数、ガラス基板側面からの高さ、材質や形状、配設方法等に高い自由度を有する。そのため、予想される衝撃の大きさや種類に合わせて適宜破損防止部の構成を決定することができ、あらゆる種類の衝撃に対応することができる。   Compared with the conventional chamfered portion, the breakage preventing portion has a higher degree of freedom in the arrangement interval, the number of arrangement, the height from the side surface of the glass substrate, the material and shape, the arrangement method, and the like. Therefore, the configuration of the breakage prevention unit can be determined as appropriate in accordance with the magnitude and type of the expected impact, and all types of impact can be handled.

したがって、本発明により、側面に衝撃等が加えられても損傷等が生じにくいガラス基板が提供される。   Therefore, the present invention provides a glass substrate that is less likely to be damaged even when an impact or the like is applied to the side surface.

図1(A)は、側面に半球状の破損防止部が配設されたガラス基板を模式的に表した斜視図であり、図1(B)は、該ガラス基板の隅を拡大した上面図である。FIG. 1A is a perspective view schematically showing a glass substrate in which a hemispherical damage prevention portion is disposed on a side surface, and FIG. 1B is a top view in which a corner of the glass substrate is enlarged. It is. 図2(A)は、側面に波型の曲面を有する破損防止部が配設されたガラス基板を模式的に表した斜視図であり、図2(B)は、該ガラス基板の隅を拡大した上面図である。FIG. 2A is a perspective view schematically showing a glass substrate in which a damage preventing portion having a corrugated curved surface is provided on the side surface, and FIG. 2B is an enlarged view of the corner of the glass substrate. FIG.

添付図面を参照して、本発明に係る実施形態について説明する。まず、本実施形態に係るガラス基板について説明する。図1(A)は、側面に半球状の破損防止部が配設されたガラス基板を模式的に表した斜視図であり、図1(B)は、該ガラス基板の隅を拡大した上面図である。図2(A)は、側面に波型の曲面を有する破損防止部が配設されたガラス基板を模式的に表した斜視図であり、図2(B)は、該ガラス基板の隅を拡大した上面図である。なお、破損防止部の数、形状、及び、配置は図面に限定されない。   Embodiments according to the present invention will be described with reference to the accompanying drawings. First, the glass substrate according to the present embodiment will be described. FIG. 1A is a perspective view schematically showing a glass substrate in which a hemispherical damage prevention portion is disposed on a side surface, and FIG. 1B is a top view in which a corner of the glass substrate is enlarged. It is. FIG. 2A is a perspective view schematically showing a glass substrate in which a damage preventing portion having a corrugated curved surface is provided on the side surface, and FIG. 2B is an enlarged view of the corner of the glass substrate. FIG. In addition, the number, shape, and arrangement of the breakage prevention portions are not limited to the drawings.

本実施形態に係るガラス基板1は概略平板状であり、第1の面1aと、第2の面1bと、該第1の面1a及び該第2の面1bを連結する側面1cと、を有し、第1の面1a上または第2の面1b上には半導体素子等を配置し設けることができる。半導体素子を配設する面には該半導体素子を構成する膜等を積層させるが、膜の被形成面に凹凸を有すると、積層される各種の膜に該凹凸が反映されるため、形成される半導体素子の特性のばらつきの原因となる。   The glass substrate 1 according to this embodiment has a substantially flat plate shape, and includes a first surface 1a, a second surface 1b, and a side surface 1c that connects the first surface 1a and the second surface 1b. A semiconductor element or the like can be provided on the first surface 1a or the second surface 1b. A film or the like constituting the semiconductor element is laminated on the surface on which the semiconductor element is disposed. However, if the film formation surface has irregularities, the irregularities are reflected in the various films to be laminated. Cause variations in the characteristics of the semiconductor elements.

そのため、半導体素子が形成されるガラス基板の表面は十分に平坦でなければならない。そして、半導体素子を構成する膜が薄いほど半導体素子は被形成面の凹凸による影響を受けやすいが、近年ガラス基板上に形成される半導体素子の小型化・薄型化の傾向が著しいため、ガラス基板の表面にはより一層の平坦性が求められている。   Therefore, the surface of the glass substrate on which the semiconductor element is formed must be sufficiently flat. And the thinner the film constituting the semiconductor element, the more easily the semiconductor element is affected by the unevenness of the surface to be formed. However, in recent years, the trend of downsizing and thinning of the semiconductor element formed on the glass substrate is remarkable. Further flatness is demanded on the surface of.

例えば、半導体素子を構成する各膜のうち最も薄い膜は20nmかそれ以下の厚さとなる場合がある。該最も薄い膜においても被形成面の凹凸による影響が生じないようにするためには、例えば、ガラス基板の第1の面1aまたは第2の面1bは、平均表面粗さ(Ra)が10nm以下であること、特に5nm以下であることが好ましい。また、形成される半導体素子を構成する各膜のうち最も薄い膜の2分の1以下、特に4分の1以下の表面粗さ(Ra)であることが好ましい。   For example, the thinnest film among the films constituting the semiconductor element may have a thickness of 20 nm or less. In order to prevent the thin film from being affected by the unevenness of the surface to be formed, for example, the first surface 1a or the second surface 1b of the glass substrate has an average surface roughness (Ra) of 10 nm. It is preferable that it is below, especially 5 nm or less. Moreover, it is preferable that the surface roughness (Ra) is less than or equal to 1/2 of the thinnest film among the respective films constituting the semiconductor element to be formed, and particularly preferably less than or equal to 1/4.

また、ガラス基板1にアルカリ金属元素(ナトリウムやカリウム等)が含まれていると、該ガラス基板1上に配設される半導体素子にアルカリ金属元素が移動し半導体素子の電気特性に影響を与える場合がある。そのため、アルカリ金属元素の移動を防止するためにガラス基板1と半導体素子との間にバリア膜を設けるか、アルカリ金属元素の含有量の少ない無アルカリガラスをガラス基板に用いることが好ましい。   If the glass substrate 1 contains an alkali metal element (such as sodium or potassium), the alkali metal element moves to the semiconductor element disposed on the glass substrate 1 and affects the electrical characteristics of the semiconductor element. There is a case. Therefore, it is preferable to provide a barrier film between the glass substrate 1 and the semiconductor element in order to prevent the movement of the alkali metal element, or to use a non-alkali glass with a small content of the alkali metal element for the glass substrate.

次に、本実施形態に係るガラス基板1の側面1cが備える破損防止部3について説明する。該破損防止部3は凸部を有し、該凸部はガラス基板1の第1の面1aと平行な面において切断したときの切断面の縁が曲線となる。換言すると、破損防止部3を第1の面1aまたは第2の面1bに垂直な方向から観察したとき、曲線を有する形状である。ガラス基板1の側面1cに破損防止部を有するため、ガラス基板1の側面1cに衝撃等が与えられるとき、ガラス基板1は該破損防止部3に該衝撃を受けることになる。   Next, the damage prevention part 3 with which the side surface 1c of the glass substrate 1 which concerns on this embodiment is provided is demonstrated. The breakage preventing portion 3 has a convex portion, and the edge of the cut surface when the convex portion is cut in a plane parallel to the first surface 1a of the glass substrate 1 becomes a curve. In other words, when the breakage preventing portion 3 is observed from a direction perpendicular to the first surface 1a or the second surface 1b, it has a curved shape. Since the damage prevention portion is provided on the side surface 1c of the glass substrate 1, when the impact or the like is applied to the side surface 1c of the glass substrate 1, the glass substrate 1 receives the impact on the damage prevention portion 3.

側面が平面状の一般的なガラス基板の場合、その側面に衝撃を受けるとき、ガラス基板は平面で衝撃を受けることとなる。衝撃を受ける面が平面であるとガラス基板に欠けやクラック等の損傷が生じやすい。一方で、本実施形態に係るガラス基板1のように、側面に破損防止部3を有し、該破損防止部3が有する凸部が上述の形状である場合、衝撃を曲面で受けることとなり損傷が生じにくい。   In the case of a general glass substrate having a flat side surface, when the side surface receives an impact, the glass substrate receives an impact on the plane. If the surface subjected to impact is a flat surface, the glass substrate is likely to be damaged such as chipping or cracking. On the other hand, as in the case of the glass substrate 1 according to the present embodiment, when the damage prevention portion 3 is provided on the side surface and the convex portion of the breakage prevention portion 3 has the above-described shape, the impact is received on the curved surface and is damaged. Is unlikely to occur.

次に、該破損防止部3の形状について詳説する。該破損防止部3の形状の一例は、図1(A)及び図1(B)に示す通り半球状であり凸部3aを有する形状である。なお、半球状とは球の中心を通る面で切断した形状には限られず、中心を含まない面で切断した形状でもよい。また、球を切断した形状に限らず楕円体を切断した形状でもよい。   Next, the shape of the breakage preventing portion 3 will be described in detail. An example of the shape of the breakage preventing portion 3 is a shape that is hemispherical and has a convex portion 3a as shown in FIGS. 1 (A) and 1 (B). The hemispherical shape is not limited to a shape cut by a plane passing through the center of the sphere, and may be a shape cut by a plane not including the center. Moreover, not only the shape which cut | disconnected the ball | bowl but the shape which cut | disconnected the ellipsoid may be sufficient.

例えば、球を切断した形状を破損防止部3に採用するときには、その曲率半径を1mm以下、好ましくは0.5mm以下とすればよい。ただし、破損防止部3の大きさがガラス基板1の厚さよりも大きく、ガラス基板1の側面に該破損防止部3を配設したときに破損防止部3が該ガラス基板1の厚さ方向にはみ出るときには、該はみ出る部分を除去してもよい。   For example, when a shape obtained by cutting a sphere is adopted for the breakage preventing portion 3, the radius of curvature may be 1 mm or less, preferably 0.5 mm or less. However, the size of the breakage prevention portion 3 is larger than the thickness of the glass substrate 1, and the breakage prevention portion 3 is arranged in the thickness direction of the glass substrate 1 when the breakage prevention portion 3 is disposed on the side surface of the glass substrate 1. When protruding, the protruding portion may be removed.

破損防止部3がガラス基板1の厚さ方向にはみ出ることのないように、破損防止部3の曲率半径をガラス基板1の厚さの0.5倍以下、好ましくは0.25倍以下と決定してもよい。ただし、本実施形態に係る破損防止部は、必ずしもこれに限定されない。   The radius of curvature of the breakage preventing portion 3 is determined to be 0.5 times or less, preferably 0.25 times or less the thickness of the glass substrate 1 so that the breakage preventing portion 3 does not protrude in the thickness direction of the glass substrate 1. May be. However, the breakage prevention unit according to the present embodiment is not necessarily limited to this.

また、破損防止部3が受ける衝撃を分散させるために、ガラス基板1の側面1cには複数の破損防止部3が配設されてもよい。配設される破損防止部3の数が多いほど衝撃をより分散させることができる。さらに、配設された複数の破損防止部3間の距離が小さい方が密に破損防止部3を配設できるため好ましい。   Moreover, in order to disperse the impact received by the breakage prevention unit 3, a plurality of breakage prevention units 3 may be disposed on the side surface 1 c of the glass substrate 1. The larger the number of breakage prevention portions 3 provided, the more the impact can be dispersed. Furthermore, since the one where the distance between the some damage prevention parts 3 arrange | positioned is small can arrange | position the damage prevention part 3 densely, it is preferable.

例えば、複数の半球状の破損防止部3をガラス基板1の側面1cに配設するとき、隣接する2つの破損防止部3間の距離(一方の破損防止部3の端部と、もう一方の破損防止部3の端部と、の距離)を1mm〜5mmの範囲とすればよい。より好ましくは1mm〜2mmの範囲とする。また、該距離を破損防止部3の曲率半径の1倍〜5倍の範囲で、より好ましくは1倍〜2倍の範囲で決定してもよい。ただし、本実施形態に係る破損防止部は、必ずしもこれに限定されない。   For example, when a plurality of hemispherical breakage prevention portions 3 are disposed on the side surface 1c of the glass substrate 1, the distance between two adjacent breakage prevention portions 3 (the end portion of one breakage prevention portion 3 and the other end) The distance from the end of the breakage prevention unit 3 may be in the range of 1 mm to 5 mm. More preferably, the range is 1 mm to 2 mm. Further, the distance may be determined in the range of 1 to 5 times the radius of curvature of the breakage preventing portion 3, more preferably in the range of 1 to 2 times. However, the breakage prevention unit according to the present embodiment is not necessarily limited to this.

なお、破損防止部3を半球状とするとき、複数の破損防止部3の曲率半径をすべて統一しなくてもよく、曲率半径の異なる複数の種類の破損防止部3をガラス基板1の側面1cに混載させてもよい。また、破損防止部3間の距離を側面全体で統一しなくてもよく、ガラス基板1の側面1cにおいて、破損防止部3の間隔の大きい領域と間隔の小さい領域とが混在していてもよい。   In addition, when making the breakage prevention part 3 hemispherical, it is not necessary to unify all the curvature radii of the plurality of breakage prevention parts 3, and a plurality of types of breakage prevention parts 3 having different curvature radii are arranged on the side surface 1 c of the glass substrate 1. May be mixed. Moreover, it is not necessary to unify the distance between the breakage prevention portions 3 over the entire side surface, and in the side surface 1c of the glass substrate 1, a region with a large interval between the breakage prevention portions 3 and a region with a small interval may be mixed. .

ガラス基板1の側面1cのうち大きな衝撃を受けることが予想される部分には破損防止部3を密に設けて重点的に保護してもよく、大きな衝撃を受ける可能性の小さい部分には破損防止部3を疎に設けてもよい。   The portion of the side surface 1c of the glass substrate 1 that is expected to receive a large impact may be provided with the damage prevention portion 3 in close proximity to protect it intensively, and the portion that is unlikely to receive a large impact is damaged. The prevention unit 3 may be provided sparsely.

該破損防止部3の形状の他の一例は、図2(A)及び図2(B)に示す通り波型の曲面から構成される形状である。波型の曲面から構成される破損防止部3は凸部3aを有する。また、破損防止部3が有する凸部3aは、ガラス基板1の第1の面1aに平行な面で切断したときの切断面の縁が曲線となる。また、図2(A)及び図2(B)に示す通り該凸部3aは近接する凹部3bに挟まれている。   Another example of the shape of the breakage preventing portion 3 is a shape constituted by a corrugated curved surface as shown in FIGS. 2 (A) and 2 (B). The breakage preventing portion 3 formed of a corrugated curved surface has a convex portion 3a. Moreover, as for the convex part 3a which the breakage prevention part 3 has, the edge of a cut surface when it cut | disconnects in a surface parallel to the 1st surface 1a of the glass substrate 1 becomes a curve. Further, as shown in FIGS. 2A and 2B, the convex portion 3a is sandwiched between adjacent concave portions 3b.

なお、波型の曲面から構成される破損防止部3は、例えば該波型の波高(該波の振幅)は1mm程度としてもよい。また該波型の凹部3bから凸部3aを経て隣接する凹部3bまでの間の距離(以下、波長とする)は1mm〜5mmの範囲で決定してもよい。より好ましくは1mm〜2mmの範囲とする。また、波長を波高の1倍〜5倍の範囲で、より好ましくは1倍〜2倍の範囲で決定する。ただし、本実施形態に係る破損防止部3は、必ずしもこれに限定されない。   Note that the breakage prevention unit 3 formed of a corrugated curved surface may have, for example, a corrugated wave height (the amplitude of the corrugation) of about 1 mm. Further, the distance (hereinafter referred to as wavelength) from the corrugated recess 3b to the adjacent recess 3b through the projection 3a may be determined in the range of 1 mm to 5 mm. More preferably, the range is 1 mm to 2 mm. The wavelength is determined in the range of 1 to 5 times the wave height, more preferably in the range of 1 to 2 times. However, the breakage prevention unit 3 according to the present embodiment is not necessarily limited to this.

また、破損防止部3が波型の曲面から構成される形状である場合、凹部3bから凸部3aを経て隣接する凹部3bまでの間を一つの破損防止部3としたとき、複数の破損防止部3をガラス基板1の側面1cに配設してもよい。複数の該破損防止部3を側面1cに配設する場合、図2(A)に示す通り、複数の破損防止部3が側面1cの全体に渡って連続する波型の曲面を形成してもよい。   Further, when the breakage prevention part 3 has a shape composed of a corrugated curved surface, when one breakage prevention part 3 is formed from the recess 3b to the adjacent recess 3b through the projection 3a, a plurality of breakage preventions are provided. The part 3 may be disposed on the side surface 1 c of the glass substrate 1. When a plurality of the breakage prevention portions 3 are arranged on the side surface 1c, as shown in FIG. 2A, even if the plurality of breakage prevention portions 3 form a corrugated curved surface that extends over the entire side surface 1c. Good.

また、波型の曲面から構成された複数の破損防止部3がすべて同一の波長・波高とならなくてもよく、波長・波高の異なる複数の破損防止部3が混在していてもよい。例えば、ガラス基板1の側面1cのうち大きな衝撃を受ける可能性が高い部分には、該波型の波長を小さくし凸部3aを密にして重点的に保護してもよく、可能性が低い部分には凸部3aを疎にして設けてもよい。なお、複数の破損防止部3の間において、ガラス基板1の側面1cに、波型とは異なる形状(例えば直線)を有していてもよい。   In addition, the plurality of breakage prevention units 3 formed of corrugated curved surfaces may not all have the same wavelength and wave height, and a plurality of breakage prevention units 3 having different wavelengths and wave heights may be mixed. For example, the portion of the side surface 1c of the glass substrate 1 that is highly likely to receive a large impact may be protected intensively by reducing the wavelength of the corrugated wave and making the convex portions 3a dense, and the possibility is low. The convex portions 3a may be provided sparsely in the portion. In addition, between the some damage prevention parts 3, you may have the shape (for example, straight line) different from a corrugation in the side surface 1c of the glass substrate 1. FIG.

また、波型の曲面から構成された破損防止部3は、ガラス基板1の第1の面1aと接続する角部、及び、第2の面1bと接続する角部が面取りされた形状となっていてもよい。   Further, the breakage preventing portion 3 formed of a corrugated curved surface has a shape in which a corner portion connected to the first surface 1a of the glass substrate 1 and a corner portion connected to the second surface 1b are chamfered. It may be.

本実施形態に係るガラス基板1における破損防止部3は、該破損防止部3の配設個数、配設間隔、ガラス基板1の側面1cからの高さ、材質や形状、配設方法等に高い自由度を有する。そのため、予想される衝撃の大きさや種類等に合わせて適宜破損防止部3の構成を決定することができ、あらゆる種類の衝撃に対応することができる。   The breakage prevention portions 3 in the glass substrate 1 according to the present embodiment are high in the number of the breakage prevention portions 3 to be arranged, the arrangement interval, the height from the side surface 1c of the glass substrate 1, the material and shape, the arrangement method, and the like. Has freedom. Therefore, the configuration of the breakage prevention unit 3 can be determined as appropriate in accordance with the expected magnitude and type of impact, and can cope with all types of impact.

次に、破損防止部3をガラス基板1の側面1cに配設する方法について説明する。破損防止部3は、例えば、側面1cが平坦なガラス基板1の側面1cを部分的に除去して形成できる。その場合、破損防止部3は切削装置またはレーザー加工装置を使用して形成できる。なお、ガラス基板1の一部を除去して破損防止部3を形成するとき、該破損防止部3はガラス基板1と同じ材質となるため、両者の境界は必ずしも明確にはならない。   Next, a method for disposing the breakage preventing portion 3 on the side surface 1c of the glass substrate 1 will be described. The breakage preventing portion 3 can be formed, for example, by partially removing the side surface 1c of the glass substrate 1 having a flat side surface 1c. In that case, the breakage preventing portion 3 can be formed using a cutting device or a laser processing device. Note that when the breakage prevention part 3 is formed by removing a part of the glass substrate 1, the breakage prevention part 3 is made of the same material as the glass substrate 1, so the boundary between the two is not necessarily clear.

また、破損防止部3はマザーガラスの製造過程において形成することもできる。マザーガラスの製造方法は、フュージョン法やフロート法等が知られているが、各方法に共通する特徴として、材料であるガラスを加熱して溶融ガラスに変化させる工程がある。そして溶融ガラスを板状に整形して徐冷し硬化させて所定の長さに切断することで平板状のガラス基板(マザーガラス)を形成する。そこで、溶融ガラスを板状に整形してから徐冷し硬化させるまでの間にガラス基板(マザーガラス)の側面に破損防止部3を形成する。   Moreover, the breakage prevention part 3 can also be formed in the manufacturing process of the mother glass. As a method for producing a mother glass, a fusion method, a float method, or the like is known. As a feature common to each method, there is a step of heating glass as a material to change it into molten glass. Then, the molten glass is shaped into a plate shape, slowly cooled and cured, and cut into a predetermined length to form a flat glass substrate (mother glass). Therefore, the breakage preventing portion 3 is formed on the side surface of the glass substrate (mother glass) after the molten glass is shaped into a plate shape and then slowly cooled and cured.

この場合、例えば転写されて破損防止部3となる形状の型を準備しておき、溶融ガラスが平板状に整形されてから徐冷されるまでの間に、ガラスの側面に向けて該型を適度に押し込む。すると、型により押し込まれた側面に該型の形状が転写される。そして、ガラスを徐冷して硬化させ、所定の長さに切断したときに、側面に破損防止部3が配設されたガラス基板(マザーガラス)となる。   In this case, for example, a mold having a shape to be transferred and serving as the breakage prevention unit 3 is prepared, and the mold is directed toward the side of the glass after the molten glass is shaped into a flat plate and slowly cooled. Push in moderately. Then, the shape of the mold is transferred to the side surface pushed by the mold. Then, when the glass is gradually cooled to be cured and cut into a predetermined length, a glass substrate (mother glass) having a damage prevention portion 3 disposed on the side surface is obtained.

さらに、ガラスを所定の長さに切断してガラス基板(マザーガラス)を形成する際に、例えば波型等に切断することで、切断面にも破損防止部3を形成できる。   Furthermore, when the glass is cut into a predetermined length to form a glass substrate (mother glass), the breakage preventing portion 3 can be formed on the cut surface by cutting into a corrugated shape, for example.

また、破損防止部3はガラス基板1とは別に準備した部材をガラス基板1の側面1cに配設して形成してもよい。例えば、半球状、球状、または、柱状等の部材を複数準備する。そして、ガラス基板1の側面1cまたは該部材の表面に接着部材を配設する。次に、該接着部材を介してガラス基板1の側面1cに破損防止部3を形成する部材を接着することで、破損防止部3を形成する。   Further, the breakage prevention unit 3 may be formed by arranging a member prepared separately from the glass substrate 1 on the side surface 1 c of the glass substrate 1. For example, a plurality of members such as a hemispherical shape, a spherical shape, or a columnar shape are prepared. Then, an adhesive member is disposed on the side surface 1c of the glass substrate 1 or the surface of the member. Next, the breakage preventing portion 3 is formed by bonding a member that forms the breakage preventing portion 3 to the side surface 1c of the glass substrate 1 through the adhesive member.

このように、破損防止部3を形成する部材をガラス基板1とは別に準備し、接着部材を介してガラス基板1の側面1cに接着する場合、該破損防止部3にはガラス以外の材料を採用することができる。例えば、ポリイミド、アクリル、ウレタン等の樹脂材料を用いてもよく、二酸化ケイ素、窒化ケイ素、アルミニウム等の無機材料を用いてもよい。ガラス基板1の側面1cに与えられる衝撃の種類や程度に応じて、破損防止部3に用いる材料を適宜選択することができる。   Thus, when the member which forms the breakage prevention part 3 is prepared separately from the glass substrate 1 and bonded to the side surface 1c of the glass substrate 1 via the adhesive member, the breakage prevention part 3 is made of a material other than glass. Can be adopted. For example, resin materials such as polyimide, acrylic, and urethane may be used, and inorganic materials such as silicon dioxide, silicon nitride, and aluminum may be used. The material used for the breakage prevention unit 3 can be appropriately selected according to the type and degree of impact applied to the side surface 1c of the glass substrate 1.

ただし、ガラス基板1の側面1cに破損防止部3を配設した後にガラス基板1上に半導体素子を形成する場合、該破損防止部3を構成する材料は半導体素子を形成する工程において加えられる熱に耐える材料でなければならない。   However, when a semiconductor element is formed on the glass substrate 1 after disposing the breakage prevention part 3 on the side surface 1c of the glass substrate 1, the material constituting the breakage prevention part 3 is heat applied in the process of forming the semiconductor element. Must be a material that can withstand

また、マザーガラスから切り出されたガラス基板1の側面に波型の曲面から構成される破損防止部3を配設する場合には、マザーガラスの分断と同時に破損防止部3を形成できる。例えば、レーザー加工装置を用いてマザーガラスを切断する際に、形成予定の破損防止部3の外形と同じ波型の分断溝をマザーガラスに形成する。該分断溝を境界としてマザーガラスを分割すると、該分断溝を構成していたガラス基板1の縁が波型となり、ガラス基板1の側面1cに波型の破損防止部3が形成される。   Further, in the case where the breakage prevention portion 3 composed of a corrugated curved surface is disposed on the side surface of the glass substrate 1 cut out from the mother glass, the breakage prevention portion 3 can be formed simultaneously with the division of the mother glass. For example, when the mother glass is cut using a laser processing apparatus, the same wave-shaped dividing groove as the outer shape of the breakage preventing portion 3 to be formed is formed in the mother glass. When the mother glass is divided with the dividing groove as a boundary, the edge of the glass substrate 1 constituting the dividing groove becomes corrugated, and the corrugated breakage preventing portion 3 is formed on the side surface 1 c of the glass substrate 1.

以上により、側面1cに破損防止部3を備えたガラス基板1を作製することができる。該破損防止部3は曲面で構成されており、第1の面1aに平行な面で切断したときの切断面の縁が曲線となる凸部を有する。つまり、ガラス基板1の側面1cに曲面が設けられるため、ガラス基板1に損傷等が生じにくい。   By the above, the glass substrate 1 provided with the damage prevention part 3 on the side surface 1c can be produced. The breakage preventing portion 3 is formed of a curved surface, and has a convex portion whose edge of the cut surface becomes a curve when cut along a plane parallel to the first surface 1a. That is, since the curved surface is provided on the side surface 1c of the glass substrate 1, the glass substrate 1 is hardly damaged.

なお、本発明は、上記実施形態の記載に限定されず、種々変更して実施可能である。例えば、上記実施形態では側面1cに破損防止部3が形成されたガラス基板1について説明した。しかし、例えば、該破損防止部3を有するガラス基板1が半導体素子の製造装置に運ばれたとき、または、ガラス基板1上に半導体素子が形成された後に、該破損防止部3の一部またはすべてがガラス基板1の側面1cから除去されてもよい。   In addition, this invention is not limited to description of the said embodiment, A various change can be implemented. For example, in the above embodiment, the glass substrate 1 in which the breakage preventing portion 3 is formed on the side surface 1c has been described. However, for example, when the glass substrate 1 having the breakage prevention unit 3 is carried to a semiconductor element manufacturing apparatus, or after a semiconductor element is formed on the glass substrate 1, a part of the breakage prevention unit 3 or All may be removed from the side surface 1 c of the glass substrate 1.

側面に衝撃を受けて破損が生じる可能性が低くなったとき、該破損防止部3を除去することにより、FPD用パネルやデバイスチップを形成しやすくなる場合がある。一方で、側面に破損防止部3が配設された状態でガラス基板1がFPD用パネルやデバイスチップに用いられていてもよい。   When the possibility of breakage due to impact on the side surface is reduced, the FPD panel or device chip may be easily formed by removing the breakage prevention portion 3. On the other hand, the glass substrate 1 may be used for the panel for FPD and a device chip in the state by which the damage prevention part 3 was arrange | positioned on the side surface.

その他、上記実施形態に係る構造、方法等は、本発明の目的の範囲を逸脱しない限りにおいて適宜変更して実施できる。   In addition, the structure, method, and the like according to the above-described embodiment can be appropriately modified and implemented without departing from the scope of the object of the present invention.

1 ガラス基板
1a 第1の面
1b 第2の面
1c 側面
3 破損防止部
3a 凸部
3b 凹部
DESCRIPTION OF SYMBOLS 1 Glass substrate 1a 1st surface 1b 2nd surface 1c Side surface 3 Damage prevention part 3a Convex part 3b Concave part

Claims (3)

第1の面と、第2の面と、該第1の面及び該第2の面を連結する側面と、を備え、該第1の面上に半導体素子を形成することができるガラス基板であって、
該側面は、破損防止部を備え、
該破損防止部は、曲面で構成され第1の面に平行な面で切断したときの切断面の縁が曲線となる凸部を有することを特徴とするガラス基板。
A glass substrate comprising: a first surface; a second surface; and a side surface connecting the first surface and the second surface, wherein a semiconductor element can be formed on the first surface. There,
The side surface includes a breakage prevention portion,
The glass substrate characterized in that the breakage prevention part has a convex part which is formed of a curved surface and the edge of the cut surface becomes a curve when cut along a plane parallel to the first surface.
該破損防止部は、半球状である請求項1記載のガラス基板。   The glass substrate according to claim 1, wherein the breakage preventing portion is hemispherical. 該破損防止部は、波型の曲面から構成される請求項1記載のガラス基板。   The glass substrate according to claim 1, wherein the breakage preventing portion is constituted by a corrugated curved surface.
JP2016112668A 2016-06-06 2016-06-06 Glass substrate Pending JP2017218338A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018104238A (en) * 2016-12-27 2018-07-05 日本電気硝子株式会社 Glass plate, and method for producing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018104238A (en) * 2016-12-27 2018-07-05 日本電気硝子株式会社 Glass plate, and method for producing the same
WO2018123416A1 (en) * 2016-12-27 2018-07-05 日本電気硝子株式会社 Glass plate, and method for producing glass plate

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