JP2017214625A - Mask for vapor deposition, and production method of organic el panel - Google Patents

Mask for vapor deposition, and production method of organic el panel Download PDF

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JP2017214625A
JP2017214625A JP2016109789A JP2016109789A JP2017214625A JP 2017214625 A JP2017214625 A JP 2017214625A JP 2016109789 A JP2016109789 A JP 2016109789A JP 2016109789 A JP2016109789 A JP 2016109789A JP 2017214625 A JP2017214625 A JP 2017214625A
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vapor deposition
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recess
opening holes
mask
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田所 豊康
Toyoyasu Tadokoro
豊康 田所
保博 五十嵐
Yasuhiro Igarashi
保博 五十嵐
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Nippon Seiki Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a mask for vapor deposition capable of performing vapor deposition stably regardless of area enlargement or definition heightening of an organic EL panel; and to provide a production method of the organic EL panel.SOLUTION: A tabular mask 2 for vapor deposition having a plurality of opening hole parts 2a for allowing a vapor deposition material 4 evaporated from a vapor deposition source 3 to vapor-deposit on a light-transmissible substrate 1 in a prescribed pattern, includes a first recess 2b formed on a surface on the light-transmissible substrate 1 side, and enclosing the plurality of opening hole parts 2a in view from a surface direction, a second recess 2c formed on a bottom surface of the first recess 2b, and adjacent to the plurality of opening hole parts 2a in view from the surface direction, and the plurality of opening hole parts 2a formed so as to penetrate a surface on the vapor deposition source 3 side from the bottom surface of the first recess 2b.SELECTED DRAWING: Figure 1

Description

本発明は、蒸着装置内に配設され、基板上に蒸着材料を蒸着するための蒸着用マスク及び有機ELパネルの製造方法に関するものである。   The present invention relates to a method for manufacturing a deposition mask and an organic EL panel, which are disposed in a deposition apparatus and deposit a deposition material on a substrate.

従来、有機ELパネルとしては、ガラス材料からなる透光性基板上に、ITO(Indium Tin Oxide)等によって陽極となる透明電極と、正孔注入層,正孔輸送層,有機発光層,電子輸送層及び電子注入層からなる機能層と、陰極となるアルミニウム(Al)等の非透光性の背面電極とを順次積層して積層体である有機EL素子を形成し、この積層体を覆うガラス材料からなる封止部材を透光性基板上に配設してなるものが知られている。このような有機ELパネルは、例えば特許文献1に開示されている。   Conventionally, as an organic EL panel, a transparent electrode serving as an anode by ITO (Indium Tin Oxide) or the like, a hole injection layer, a hole transport layer, an organic light emitting layer, an electron transport on a translucent substrate made of a glass material. A glass layer is formed by sequentially laminating a functional layer composed of a layer and an electron injection layer and a non-translucent back electrode such as aluminum (Al) serving as a cathode to form a laminated organic EL element, and covering the laminated body There is known one in which a sealing member made of a material is disposed on a translucent substrate. Such an organic EL panel is disclosed in Patent Document 1, for example.

かかる有機ELパネルは、有機EL素子を構成する各層(正孔注入層,正孔輸送層,発光層,電子輸送層,電子注入層,背面電極)に対応する複数の蒸着室を有する蒸着装置に透明電極の形成された透光性基板を投入し、各層を形成することで得られるものである。かかる蒸着装置における各蒸着室は、例えば真空ポンプによって高真空に保たれ、これらの蒸着室内の下側に、蒸着材料を収納するルツボとこのルツボを取り巻くように巻回される加熱コイルとルツボ及び加熱コイルを包囲するように配設される熱遮蔽部材とを有する蒸着源が配設され、加熱コイルに電流が供給されることで蒸着材料が気化する。一方、各蒸着室の上側には、透光性基板を有する基板ホルダーと、基板ホルダーの背後に配設され蒸着用マスクを有するマスクホルダーとが配設されている。マスクホルダーに備えられる蒸着用マスクは、金属材料からなり、透光性基板に所定の蒸着パターンを形成するための複数の開口孔部と、透光性基板への蒸着パターンの形成を阻止するマスク部(遮蔽部)とを有しており、蒸発した蒸着材料が蒸着用マスクに設けられる各開口孔部を通過することで透光性基板上に所定の蒸着パターンが形成されるようになっている。このような蒸着用マスクは、例えば特許文献2に開示されている。   Such an organic EL panel is a vapor deposition apparatus having a plurality of vapor deposition chambers corresponding to each layer (hole injection layer, hole transport layer, light emitting layer, electron transport layer, electron injection layer, back electrode) constituting the organic EL element. The light-transmitting substrate on which the transparent electrode is formed is put in and formed by forming each layer. Each vapor deposition chamber in the vapor deposition apparatus is maintained at a high vacuum by, for example, a vacuum pump, and a crucible for storing a vapor deposition material, a heating coil and a crucible wound around the crucible, A vapor deposition source having a heat shielding member disposed so as to surround the heating coil is disposed, and a current is supplied to the heating coil to vaporize the vapor deposition material. On the other hand, a substrate holder having a translucent substrate and a mask holder having a deposition mask disposed behind the substrate holder are disposed above each deposition chamber. The vapor deposition mask provided in the mask holder is made of a metal material, a plurality of opening holes for forming a predetermined vapor deposition pattern on the translucent substrate, and a mask for preventing the formation of the vapor deposition pattern on the translucent substrate A predetermined vapor deposition pattern is formed on the translucent substrate by passing the evaporated vapor deposition material through each opening hole provided in the vapor deposition mask. Yes. Such a vapor deposition mask is disclosed in, for example, Patent Document 2.

また、蒸着用マスクとして、基板との間隙を一定に保つために、蒸着用マスクを構成する板体自身の表面を押圧変形によって突出させて突出部を設けるものが特許文献3に開示されている。これによれば、蒸着用マスクの着脱時に蒸着膜や他の構成部材に損傷を与えない。   Further, Patent Document 3 discloses a deposition mask in which a projection is provided by projecting the surface of a plate body constituting the deposition mask by pressing deformation in order to keep a gap with the substrate constant. . According to this, the vapor deposition film and other components are not damaged when the vapor deposition mask is attached or detached.

特開2001−267066号公報JP 2001-267066 A 特開2000−192224号公報JP 2000-192224 A 特開2004−214015号公報JP 2004-2104015 A

しかしながら、押圧変形による突出部を形成した蒸着用マスクは、加工精度が低く蒸着の精度が低下し、また、たわみによる構成部材への接触のおそれがある。そのため、有機ELパネルの大面積化や高精細化に十分に対応することができず、安定して蒸着を行うことができないという点で更なる改善の余地があった。   However, the vapor deposition mask in which the protruding portion is formed by pressing deformation has low processing accuracy and the vapor deposition accuracy is lowered, and there is a risk of contact with the constituent members due to deflection. For this reason, there is room for further improvement in that the organic EL panel cannot sufficiently cope with the increase in area and definition and cannot be stably deposited.

本発明の前述した問題点に着目し、有機ELパネルの大面積化や高精細化に関わらず、安定して蒸着を行うことが可能な蒸着用マスク及び有機ELパネルの製造方法を提供することを目的とする。   Focusing on the above-described problems of the present invention, to provide a deposition mask and an organic EL panel manufacturing method capable of performing stable deposition regardless of the increase in area or definition of the organic EL panel. With the goal.

本発明の蒸着用マスクは、前述した課題を解決するため、
蒸着源から気化した蒸着材料を所定のパターンで基板に蒸着させるための複数の開口孔部を有する板状の蒸着用マスクであって、
前記基板側の面に形成され、面方向からみて前記複数の開口部を囲む第1の凹部と、
前記第1の凹部の底面に形成され、面方向からみて前記複数の開口孔部と隣り合う第2の凹部と、
前記第1の凹部の底面から前記蒸着源側の面を貫通するように形成される前記複数の開口孔部と、
を備えてなることを特徴とする。
The vapor deposition mask of the present invention solves the aforementioned problems,
A plate-shaped vapor deposition mask having a plurality of opening holes for vapor-depositing a vapor deposition material evaporated from a vapor deposition source on a substrate in a predetermined pattern,
A first recess formed on the substrate-side surface and surrounding the plurality of openings as viewed from the surface direction;
A second recess formed on the bottom surface of the first recess and adjacent to the plurality of opening holes when viewed from the surface direction;
The plurality of opening holes formed so as to penetrate the deposition source side surface from the bottom surface of the first recess;
It is characterized by comprising.

またさらに望ましくは、本発明の蒸着用マスクは、前記第1の凹部を構成する第1の開口部が形成されてなる第1の金属板と、
前記第2の凹部を構成する第2の開口部と、前記複数の開口孔部を構成する複数の第3の開口部とが形成されてなる第2の金属板と、
前記複数の開口孔部を構成する複数の第4の開口部が形成されてなる第3の金属板と、
が前記蒸着部材側から順に重ねられてなることを特徴とする。
More preferably, the vapor deposition mask of the present invention includes a first metal plate in which a first opening constituting the first recess is formed;
A second metal plate in which a second opening constituting the second recess and a plurality of third openings constituting the plurality of opening holes are formed;
A third metal plate formed with a plurality of fourth openings forming the plurality of opening holes;
Are stacked in order from the vapor deposition member side.

またさらに望ましくは、本発明の蒸着用マスクは、前記複数の開口孔部が形成された複数の領域を有し、
前記第1の凹部が前記複数の領域の各々に対応して複数形成されてなる、
ことを特徴とする。
More preferably, the vapor deposition mask of the present invention has a plurality of regions in which the plurality of opening holes are formed,
A plurality of the first recesses are formed corresponding to each of the plurality of regions.
It is characterized by that.

またさらに望ましくは、本発明の蒸着用マスクにおいて、前記複数の開口孔部は、その断面が前記基板側に向かって幅狭となることを特徴とする。   More preferably, in the vapor deposition mask of the present invention, the plurality of opening holes have a cross-section narrowing toward the substrate side.

本発明の有機ELパネルの製造方法は、前述した課題を解決するため、前記基板上に一対の電極間に少なくとも有機発光層を含む機能層を挟持してなる有機EL素子を形成してなる有機ELパネルの製造方法であって、
前述した本発明の蒸着用マスクを用いた蒸着によって、前記機能層の少なくとも1層を形成する工程を含む、
ことを特徴とする。
In order to solve the above-described problems, the organic EL panel manufacturing method of the present invention is formed by forming an organic EL element having a functional layer including at least an organic light emitting layer between a pair of electrodes on the substrate. A method of manufacturing an EL panel,
Including the step of forming at least one of the functional layers by vapor deposition using the vapor deposition mask of the present invention described above.
It is characterized by that.

本発明によれば、有機ELパネルの大面積化や高精細化に関わらず、安定して有機ELパネルを製造することが可能となる。   ADVANTAGE OF THE INVENTION According to this invention, it becomes possible to manufacture an organic electroluminescent panel stably irrespective of the enlargement of area or high definition of an organic electroluminescent panel.

本発明の実施形態における蒸着室内を示す簡略断面図。BRIEF DESCRIPTION OF THE DRAWINGS FIG. 同上実施形態における蒸着用マスクを示す分解断面図。The exploded sectional view showing the mask for vapor deposition in the embodiment same as the above. 同上実施形態における蒸着用マスクの一例を示す上面図。The top view which shows an example of the mask for vapor deposition in embodiment same as the above. 有機ELパネルの一例を示す概略断面図。The schematic sectional drawing which shows an example of an organic electroluminescent panel.

以下、添付図面に基づいて本発明の実施形態を説明する。   Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.

図1は、一般的な蒸着装置の蒸着室内を簡略的に示す断面図である。蒸着室内には、透光性基板1と、蒸着用マスク2と、蒸着源3と、が配設されている。   FIG. 1 is a cross-sectional view schematically showing a vapor deposition chamber of a general vapor deposition apparatus. In the vapor deposition chamber, a translucent substrate 1, a vapor deposition mask 2, and a vapor deposition source 3 are arranged.

透光性基板1は、透明ガラス材からなる矩形状の板状部材である。透光性基板1上には蒸着用マスク2を介して蒸着源3から気化する蒸着材料4が所定のパターンで蒸着される。   The translucent substrate 1 is a rectangular plate member made of a transparent glass material. On the translucent substrate 1, the vapor deposition material 4 that is vaporized from the vapor deposition source 3 is vapor-deposited in a predetermined pattern via the vapor deposition mask 2.

蒸着用マスク2は、厚さが50μm〜200μm(大型化する場合は更に厚くすることができる)程度の板状部材であり、透光性基板1と蒸着源3との間に配設される。蒸着用マスク2は、SUS430やSUS304等の金属板を複数重ねてなり、本実施形態においては、4枚の金属板21,22,23,24を重ねてなる。蒸着用マスク2は、蒸着源3から気化(蒸発あるいは昇華)する蒸着材料4を所定のパターンで透光性基板1上に蒸着させるための複数の開口孔部2aを備えている。蒸着用マスク2のうち、複数の開口孔部2aが形成された以外の個所は、蒸着材料4を遮るマスク部(遮蔽部)となる。   The vapor deposition mask 2 is a plate-like member having a thickness of about 50 μm to 200 μm (which can be further increased when the size is increased), and is disposed between the translucent substrate 1 and the vapor deposition source 3. . The vapor deposition mask 2 is formed by stacking a plurality of metal plates such as SUS430 and SUS304, and in the present embodiment, four metal plates 21, 22, 23, and 24 are stacked. The vapor deposition mask 2 includes a plurality of opening holes 2a for vapor deposition (evaporation or sublimation) of the vapor deposition material 4 from the vapor deposition source 3 on the translucent substrate 1 in a predetermined pattern. Of the vapor deposition mask 2, a portion other than the plurality of opening holes 2 a is formed as a mask portion (shielding portion) that blocks the vapor deposition material 4.

蒸着源3は、蒸着材料4が収納される容器であり、例えば蒸着材料4を収納するルツボと、このルツボを取り巻くように巻回される加熱コイルと、前記ルツボ及び前記加熱コイルを包囲するように配設される熱遮蔽部材と、を有する。前記加熱コイルに電流が供給されることで蒸着材料4が気化し、蒸着経路4aを経て透光性基板1に向けられる。   The vapor deposition source 3 is a container in which the vapor deposition material 4 is accommodated. For example, a crucible for accommodating the vapor deposition material 4, a heating coil wound around the crucible, and the crucible and the heating coil are surrounded. And a heat shielding member disposed on the surface. By supplying an electric current to the heating coil, the vapor deposition material 4 is vaporized and directed to the translucent substrate 1 through the vapor deposition path 4a.

次に、蒸着用マスク2の特徴点について述べる。蒸着用マスク2は、複数の開口孔部2aと、透光性基板1側の面に形成され、面方向からみて複数の開口孔部2aを囲む第1の凹部2bと、第1の凹部2bの底面に形成され、面方向からみて複数の開口孔部2aと隣り合う第2の凹部2cと、を備える。   Next, features of the vapor deposition mask 2 will be described. The vapor deposition mask 2 is formed on the plurality of opening holes 2a and the surface on the translucent substrate 1 side, and includes a first recess 2b and a first recess 2b surrounding the plurality of opening holes 2a when viewed from the surface direction. And a second recess 2c adjacent to the plurality of opening holes 2a when viewed from the surface direction.

複数の開口孔部2aは、第1の凹部2bの底面から蒸着源3側の表面を貫通するように形成され、その断面が蒸着源3側から透光性基板1側に向かって幅狭となる台形状に形成されている。複数の開口孔部2aの平面形状は、蒸着パターンに応じて任意であるが、例えば正方形や長方形の矩形状や円状に形成される。このように開口孔部2aを形成したので、蒸着源3側の開口孔部2aの縁部で蒸着材料4が遮られるのを抑制し、微細な蒸着パターンを精度よく形成することができる。なお、開口孔部2aの断面形状は透光性基板1側に向かって幅狭となる形状であれば、台形状以外にも階段状などであってもよい。   The plurality of opening holes 2a are formed so as to penetrate the surface on the side of the vapor deposition source 3 from the bottom surface of the first recess 2b, and the cross section is narrower from the vapor deposition source 3 side toward the translucent substrate 1 side. It is formed in the trapezoid shape. Although the planar shape of the plurality of opening holes 2a is arbitrary according to the vapor deposition pattern, it is formed in, for example, a square or rectangular rectangle or circle. Since the opening hole 2a is formed in this way, it is possible to suppress the vapor deposition material 4 from being blocked by the edge of the opening hole 2a on the vapor deposition source 3 side, and to form a fine vapor deposition pattern with high accuracy. In addition, as long as the cross-sectional shape of the opening hole part 2a becomes a width | variety narrow toward the translucent board | substrate 1, the step shape etc. may be sufficient besides a trapezoid shape.

第1の凹部2bは、透光性基板1に形成された蒸着材料4(蒸着膜)や電極、配線、絶縁膜あるいは隔壁などの透光性基板1上の有機ELパネルの構成部材が蒸着用マスク2の表面と接触しないように、これら構成部材の高さよりも深く形成することが望ましい。これにより、透光性基板1との間隔を一定に保つことができる。なお、複数種類の蒸着用マスク2を用いて蒸着材料4の塗り分けを行う場合、第1の凹部2bは、複数の開口孔部2aを囲み、かつ、透光性基板1のうち有機EL素子(発光部)が形成される領域である発光領域1aよりも大きくなるように形成することが望ましい。   The first recess 2b is formed by vapor deposition material 4 (deposition film) formed on the translucent substrate 1 and components of the organic EL panel on the translucent substrate 1 such as electrodes, wiring, insulating films, and partition walls. It is desirable to form deeper than the height of these components so as not to contact the surface of the mask 2. Thereby, the space | interval with the translucent board | substrate 1 can be kept constant. In the case where the vapor deposition material 4 is separately applied using a plurality of types of vapor deposition masks 2, the first recess 2 b surrounds the plurality of opening holes 2 a and the organic EL element of the translucent substrate 1. It is desirable to form it so as to be larger than the light emitting region 1a which is a region where the (light emitting part) is formed.

第2の凹部2cは、第1の凹部2bの底面に、面方向から見て複数の開口孔部2aの間及び開口孔部2aと第1の凹部2bの側面との間に位置するようにそれぞれ形成されている。このように、第1の凹部2bの底面に、面方向から見て複数の開口孔部2aと隣り合うように第2の凹部2cを設けたので、有機ELパネルの大面積化や高精細化に伴って蒸着用マスク2が大面積化、高精細化して多少のたわみが生じても、蒸着用マスク2(第1の凹部2bの底面)が透光性基板1上の構成部材に接触することを避けることができ、安定して蒸着を行うことができる。   The second recessed portion 2c is located on the bottom surface of the first recessed portion 2b so as to be positioned between the plurality of opening hole portions 2a and between the opening hole portion 2a and the side surface of the first recessed portion 2b. Each is formed. Thus, since the 2nd recessed part 2c was provided in the bottom face of the 1st recessed part 2b so that it might adjoin with the several opening hole part 2a seeing from a surface direction, the enlargement of area and high definition of an organic electroluminescent panel were carried out. As a result, even if the deposition mask 2 becomes larger in area and higher in definition and some deflection occurs, the deposition mask 2 (the bottom surface of the first recess 2b) contacts the constituent members on the translucent substrate 1. This can be avoided and deposition can be performed stably.

図2に示すように、蒸着用マスク2は、透光性基板1側から順に、金属板21,22,23,24が重ねられてなる。金属板21〜24は溶接や接着などの方法で互いに固定される。金属板21(第1の金属板の一例)は、第1の凹部2bを構成する第1の開口部21aが形成されてなる。第1の開口部21aは、例えばエッチングによって形成される。金属板22,23(第2の金属板の一例)は、第2の凹部2cを構成する第2の開口部22a,23aと、複数の開口孔部2aを構成する複数の第3の開口部22b,23bと、が形成されてなる。第2の開口部22a,23a及び第3の開口部22b,23bは、例えばエッチングによって形成される。金属板24(第3の金属板の一例)は、複数の開口孔部2aを構成する複数の第4の開口部24aが形成される。第4の開口部24aは、例えばエッチングによって形成される。蒸着用マスク2は、予めそれぞれ開口部21a,22a,23a,22b,23b,24aが形成された金属板21〜24を重ねてなる。このように、蒸着用マスク2をそれぞれ開口部21a,22a,23a,22b,23b,24aを有する複数の金属板21〜24を重ねて形成したので、精度よく複数の開口孔部2a,第1の凹部2b及び第2の凹部2cを設けることができ、精度よく蒸着することができる。   As shown in FIG. 2, the vapor deposition mask 2 is formed by stacking metal plates 21, 22, 23, and 24 in order from the translucent substrate 1 side. The metal plates 21 to 24 are fixed to each other by a method such as welding or adhesion. The metal plate 21 (an example of a first metal plate) is formed with a first opening 21a that constitutes the first recess 2b. The first opening 21a is formed by etching, for example. The metal plates 22 and 23 (an example of the second metal plate) include second openings 22a and 23a that constitute the second recess 2c, and a plurality of third openings that constitute the plurality of opening holes 2a. 22b and 23b are formed. The second openings 22a and 23a and the third openings 22b and 23b are formed by etching, for example. In the metal plate 24 (an example of a third metal plate), a plurality of fourth openings 24a constituting the plurality of opening holes 2a are formed. The fourth opening 24a is formed by etching, for example. The vapor deposition mask 2 is formed by overlapping metal plates 21 to 24 each having openings 21a, 22a, 23a, 22b, 23b, and 24a formed in advance. Thus, since the vapor deposition mask 2 is formed by overlapping the plurality of metal plates 21 to 24 each having the openings 21a, 22a, 23a, 22b, 23b, and 24a, the plurality of opening holes 2a and the first are accurately formed. The recess 2b and the second recess 2c can be provided and can be deposited with high accuracy.

なお、1つの透光性基板1から複数の有機ELパネルを製造するいわゆる多面取りを行う場合、蒸着用マスク2は、図3(a)に示すように、複数の開口孔部2aが形成された領域25が複数形成され、複数の領域25の各々に対応するように第1の凹部2bが複数形成される。また、図3(b)に示すように、1つの第1の凹部2bが複数の領域25を囲むように形成されてもよい。   In addition, when performing what is called multiple chamfering which manufactures several organic electroluminescent panel from one translucent board | substrate 1, as shown to Fig.3 (a), as for the mask 2 for vapor deposition, several opening part 2a is formed. A plurality of regions 25 are formed, and a plurality of first recesses 2 b are formed so as to correspond to each of the plurality of regions 25. Further, as shown in FIG. 3B, one first recess 2 b may be formed so as to surround a plurality of regions 25.

図4は、上述の蒸着用マスク2を用いて製造される有機ELパネル100の一例を示す概略断面図である。
有機ELパネル100は、透光性基板1上にITO等の透明導電材料からなる透明電極(陽極)11と、絶縁性樹脂からなる絶縁膜12と、機能層13と、アルミニウム等の低抵抗金属材料からなる背面電極(陰極)14と、を形成してなる。透明電極11と背面電極14とは一対の電極として機能し、両電極11,14の間に機能層13が積層された個所が発光部である有機EL素子10となる。絶縁膜12は、有機EL素子10の形状を画定するべく縁部が透明電極11に重なるように形成され、有機EL素子10以外での両電極11,14の絶縁を確保する。機能層13は、少なくとも有機発光層を含む単数あるいは複数層からなり、一例としては透明電極11側から順に正孔注入層,正孔輸送層,有機発光層,電子輸送層及び電子注入層が形成される。
有機ELパネル100は、例えば機能層13のうち、有機発光層が上述の蒸着用マスク2を用いた蒸着によって形成される。有機発光層を形成する工程において、まず、透明電極11、絶縁膜12及び機能層13の一部(前述の例においては正孔注入層及び正孔輸送層)が形成された透光性基板1を蒸着用マスク2が配置された前記蒸着室に投入し、蒸着室内の基板ホルダー(図示しない)に蒸着用マスク2と対向するように配置して固定する(図1参照)。そして、蒸着材料4として有機発光層となる有機材料を収容した蒸着源3の前記ルツボを加熱し、蒸着材料4を気化させる。気化した蒸着材料4は蒸着経路4aを経て蒸着用マスク2に達し、さらに複数の開口孔部2aを通過して透光性基板1上に蒸着され、所定のパターンで有機発光層が成膜される。なお、有機発光層が例えば赤色、緑色、青色の3色の層を塗り分けして形成される場合、各色の発光層のパターンに応じた複数の開口孔部2aが形成された蒸着用マスク2を用いて各色の発光層毎に蒸着を行う。なお、機能層13のうち、有機発光層以外を形成する工程において、蒸着用マスク2を用いた蒸着を行ってもよい。
FIG. 4 is a schematic cross-sectional view showing an example of the organic EL panel 100 manufactured using the above-described vapor deposition mask 2.
An organic EL panel 100 includes a transparent electrode (anode) 11 made of a transparent conductive material such as ITO, an insulating film 12 made of an insulating resin, a functional layer 13, and a low-resistance metal such as aluminum on a translucent substrate 1. And a back electrode (cathode) 14 made of a material. The transparent electrode 11 and the back electrode 14 function as a pair of electrodes, and the portion where the functional layer 13 is laminated between the electrodes 11 and 14 becomes the organic EL element 10 which is a light emitting portion. The insulating film 12 is formed so that the edge overlaps the transparent electrode 11 so as to define the shape of the organic EL element 10, and ensures insulation of the electrodes 11 and 14 other than the organic EL element 10. The functional layer 13 is composed of one or more layers including at least an organic light emitting layer. As an example, a hole injection layer, a hole transport layer, an organic light emitting layer, an electron transport layer, and an electron injection layer are formed in this order from the transparent electrode 11 side. Is done.
In the organic EL panel 100, for example, the organic light emitting layer in the functional layer 13 is formed by vapor deposition using the vapor deposition mask 2 described above. In the step of forming the organic light emitting layer, first, the transparent substrate 1 on which the transparent electrode 11, the insulating film 12, and a part of the functional layer 13 (in the above example, a hole injection layer and a hole transport layer) are formed. Is placed in the vapor deposition chamber where the vapor deposition mask 2 is disposed, and is disposed and fixed to a substrate holder (not shown) in the vapor deposition chamber so as to face the vapor deposition mask 2 (see FIG. 1). And the said crucible of the vapor deposition source 3 which accommodated the organic material used as an organic light emitting layer as the vapor deposition material 4 is heated, and the vapor deposition material 4 is vaporized. The vaporized vapor deposition material 4 reaches the vapor deposition mask 2 through the vapor deposition path 4a, and further passes through the plurality of opening holes 2a to be vapor deposited on the translucent substrate 1, thereby forming an organic light emitting layer in a predetermined pattern. The In addition, when the organic light emitting layer is formed by separately coating layers of three colors, for example, red, green, and blue, the evaporation mask 2 in which a plurality of opening holes 2a corresponding to the pattern of the light emitting layer of each color is formed. Is used for each color light emitting layer. In the step of forming the functional layer 13 other than the organic light emitting layer, vapor deposition using the vapor deposition mask 2 may be performed.

なお、前述の実施形態は本発明の一例を示すものであって、本発明の要旨を逸脱しない範囲内で適宜変更(構成要素の削除を含む)が可能であることはもちろんである。   Note that the above-described embodiment shows an example of the present invention, and it is needless to say that modifications (including deletion of components) can be made as appropriate without departing from the gist of the present invention.

本発明は、蒸着装置内に配設され、基板に所定のパターンで蒸着材料を蒸着するための蒸着用マスク及び有機ELパネルの製造方法に好適である。   INDUSTRIAL APPLICABILITY The present invention is suitable for a deposition mask and an organic EL panel manufacturing method that are disposed in a deposition apparatus and deposit a deposition material in a predetermined pattern on a substrate.

1 透光性基板(基板)
1a 発光領域
2 蒸着用マスク
2a 開口孔部
2b 第1の凹部
2c 第2の凹部
3 蒸着源
4 蒸着材料
4a 蒸着経路
10 有機EL素子
11 透明電極
12 絶縁膜
13 機能層
14 背面電極
21 金属板
21a 第1の開口部
22 金属板
22a 第2の開口部
22b 第3の開口部
23 金属板
23a 第2の開口部
23b 第3の開口部
24 金属板
24a 第4の開口部
25 複数の開口孔部が形成された領域
100 有機ELパネル
1 Translucent substrate (substrate)
DESCRIPTION OF SYMBOLS 1a Light emission area | region 2 Mask for vapor deposition 2a Opening hole 2b 1st recessed part 2c 2nd recessed part 3 Deposition source 4 Deposition material 4a Deposition route 10 Organic EL element 11 Transparent electrode 12 Insulating film 13 Functional layer 14 Back surface electrode 21 Metal plate 21a 1st opening part 22 Metal plate 22a 2nd opening part 22b 3rd opening part 23 Metal plate 23a 2nd opening part 23b 3rd opening part 24 Metal plate 24a 4th opening part 25 Several opening hole part Region where 100 was formed 100 Organic EL panel

Claims (5)

蒸着源から気化した蒸着材料を所定のパターンで基板に蒸着させるための複数の開口孔部を有する板状の蒸着用マスクであって、
前記基板側の面に形成され、面方向からみて前記複数の開口孔部を囲む第1の凹部と、
前記第1の凹部の底面に形成され、面方向からみて前記複数の開口孔部と隣り合う第2の凹部と、
前記第1の凹部の底面から前記蒸着源側の面を貫通するように形成される前記複数の開口孔部と、
を備えてなることを特徴とする蒸着用マスク。
A plate-shaped vapor deposition mask having a plurality of opening holes for vapor-depositing a vapor deposition material evaporated from a vapor deposition source on a substrate in a predetermined pattern,
A first recess formed on the substrate-side surface and surrounding the plurality of opening holes as viewed from the surface direction;
A second recess formed on the bottom surface of the first recess and adjacent to the plurality of opening holes when viewed from the surface direction;
The plurality of opening holes formed so as to penetrate the deposition source side surface from the bottom surface of the first recess;
A vapor deposition mask characterized by comprising:
前記第1の凹部を構成する第1の開口部が形成されてなる第1の金属板と、
前記第2の凹部を構成する第2の開口部と、前記複数の開口孔部を構成する複数の第3の開口部とが形成されてなる第2の金属板と、
前記複数の開口孔部を構成する複数の第4の開口部が形成されてなる第3の金属板と、
が前記蒸着部材側から順に重ねられてなることを特徴とする請求項1に記載の蒸着用マスク。
A first metal plate formed with a first opening constituting the first recess;
A second metal plate in which a second opening constituting the second recess and a plurality of third openings constituting the plurality of opening holes are formed;
A third metal plate formed with a plurality of fourth openings forming the plurality of opening holes;
The vapor deposition mask according to claim 1, wherein the layers are stacked in order from the vapor deposition member side.
前記複数の開口孔部が形成された複数の領域を有し、
前記第1の凹部が前記複数の領域の各々に対応して複数形成されてなる、
ことを特徴とする請求項1に記載の蒸着用マスク。
A plurality of regions in which the plurality of opening holes are formed;
A plurality of the first recesses are formed corresponding to each of the plurality of regions.
The vapor deposition mask according to claim 1.
前記複数の開口孔部は、その断面が前記基板側に向かって幅狭となることを特徴とする請求項1に記載の蒸着用マスク。   The deposition mask according to claim 1, wherein a cross section of each of the plurality of opening holes becomes narrower toward the substrate side. 前記基板上に一対の電極間に少なくとも有機発光層を含む機能層を挟持してなる有機EL素子を形成してなる有機ELパネルの製造方法であって、
請求項1から請求項4の何れかに記載の蒸着用マスクを用いた蒸着によって、前記機能層の少なくとも1層を形成する工程を含む、
ことを特徴とする有機ELパネルの製造方法。
A method for producing an organic EL panel, wherein an organic EL element is formed by sandwiching a functional layer including at least an organic light emitting layer between a pair of electrodes on the substrate,
Including a step of forming at least one of the functional layers by vapor deposition using the vapor deposition mask according to any one of claims 1 to 4.
An organic EL panel manufacturing method characterized by the above.
JP2016109789A 2016-06-01 2016-06-01 Mask for vapor deposition, and production method of organic el panel Pending JP2017214625A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI677978B (en) * 2018-01-09 2019-11-21 鴻海精密工業股份有限公司 Vapor deposition source and method for making organic light emitting diode display panel

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI677978B (en) * 2018-01-09 2019-11-21 鴻海精密工業股份有限公司 Vapor deposition source and method for making organic light emitting diode display panel

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