JP2017152518A - Semiconductor device, placing table and method of manufacturing semiconductor device - Google Patents

Semiconductor device, placing table and method of manufacturing semiconductor device Download PDF

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Publication number
JP2017152518A
JP2017152518A JP2016032858A JP2016032858A JP2017152518A JP 2017152518 A JP2017152518 A JP 2017152518A JP 2016032858 A JP2016032858 A JP 2016032858A JP 2016032858 A JP2016032858 A JP 2016032858A JP 2017152518 A JP2017152518 A JP 2017152518A
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Prior art keywords
semiconductor device
outer peripheral
bonding agent
inner peripheral
semiconductor element
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Inventor
登志幸 玉手
Toshiyuki Tamate
登志幸 玉手
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Shindengen Electric Manufacturing Co Ltd
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Shindengen Electric Manufacturing Co Ltd
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Priority to JP2016032858A priority Critical patent/JP2017152518A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/2612Auxiliary members for layer connectors, e.g. spacers
    • H01L2224/26152Auxiliary members for layer connectors, e.g. spacers being formed on an item to be connected not being a semiconductor or solid-state body
    • H01L2224/26175Flow barriers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8338Bonding interfaces outside the semiconductor or solid-state body
    • H01L2224/83385Shape, e.g. interlocking features

Abstract

PROBLEM TO BE SOLVED: To provide a semiconductor device capable of positioning easily even when a small semiconductor element is employed, and capable of improving the tolerance of a bonding material when a large semiconductor element is employed, and to provide a placing table and a method of manufacturing a semiconductor device.SOLUTION: A semiconductor device includes a protrusion body 20 having a plurality of protrusions 22 protruding upward, and an inner peripheral recess 26 provided on the inner peripheral side of the protrusions 22, a bonding material provided on the protrusion body 20, a semiconductor element provided on the bonding material, and a mold resin covering the semiconductor element. At least a part of the outer peripheral surface of the protrusion 22 has a taper 22a directing toward the inner peripheral side as it directs upward. The inner peripheral recess 26 is formed when a plurality of protrusions 22 surround.SELECTED DRAWING: Figure 1

Description

本発明は半導体装置、載置台及び半導体装置の製造方法に関する。   The present invention relates to a semiconductor device, a mounting table, and a method for manufacturing a semiconductor device.

従来から、ダイパッドと、ダイパッド上に設けられたはんだ等の接合剤と、接合剤上に設けられた半導体素子と、半導体素子を覆うモールド樹脂とを有する半導体装置が知られている(例えば特許文献1参照)。特許文献1に開示されている態様によれば、接合剤が溝の外方にもれることを防止できる。しかしながら、特許文献1の図1に示すようにダイパッドがテーパー形状となっている場合には、仮に大きさの小さな半導体素子を採用したときには、半導体素子を中心に位置付けることが難しい。このため、そもそも特許文献1では一定以上の大きさにある半導体素子を採用することが念頭におかれている。   Conventionally, a semiconductor device having a die pad, a bonding agent such as solder provided on the die pad, a semiconductor element provided on the bonding agent, and a mold resin covering the semiconductor element is known (for example, Patent Documents). 1). According to the aspect disclosed in Patent Document 1, it is possible to prevent the bonding agent from leaking out of the groove. However, when the die pad has a tapered shape as shown in FIG. 1 of Patent Document 1, it is difficult to position the semiconductor element at the center when a small-sized semiconductor element is employed. Therefore, in the first place, in Patent Document 1, it is considered that a semiconductor element having a certain size or more is adopted.

特開2009−147094号JP 2009-147094 A

本発明は、小さな半導体素子を採用した場合であっても容易に位置決めでき、大きな半導体素子を採用した場合には接合剤の耐量を高めることができる半導体装置、載置台及び半導体装置の製造方法を提供する。   The present invention provides a semiconductor device, a mounting table, and a method for manufacturing a semiconductor device that can be easily positioned even when a small semiconductor element is employed, and can increase the tolerance of a bonding agent when a large semiconductor element is employed. provide.

本発明による半導体装置は、
上方側に突出した複数の突出部と、前記突出部の内周側に設けられた内周凹部と、を有する突出体を含む載置台と、
前記突出体上に設けられた接合剤と、
前記接合剤上に設けられた半導体素子と、
前記半導体素子を覆うモールド樹脂と、
を備え、
前記突出部の少なくとも外周面の一部が、上方に向かうにつれて内周側に向かうテーパー部を有し、
前記複数の突出部が取り囲むことで前記内周凹部が形成されている。
A semiconductor device according to the present invention includes:
A mounting table including a projecting body having a plurality of projecting portions projecting upward, and an inner circumferential concave portion provided on the inner circumferential side of the projecting portion;
A bonding agent provided on the protruding body;
A semiconductor element provided on the bonding agent;
A mold resin covering the semiconductor element;
With
At least a part of the outer peripheral surface of the protruding portion has a tapered portion that goes to the inner peripheral side as it goes upward,
The inner circumferential recess is formed by surrounding the plurality of protrusions.

本発明による半導体装置において、
少なくとも2つの突出部の間に、溝部が形成されてもよい。
In the semiconductor device according to the present invention,
A groove may be formed between at least two protrusions.

本発明による半導体装置において、
前記溝部は、上方に向かうにつれて幅が広くなる部分を有してもよい。
In the semiconductor device according to the present invention,
The groove portion may have a portion that becomes wider as it goes upward.

本発明による半導体装置において、
各突出部は、三角錐形状又は四角錐形状となっており、
ある突出部の一辺が別の突出部の一辺と重複してもよい。
In the semiconductor device according to the present invention,
Each protrusion has a triangular pyramid shape or a quadrangular pyramid shape,
One side of one protrusion may overlap with one side of another protrusion.

本発明による半導体装置において、
前記載置台は、前記突出部の外周側に設けられた外周凹部と、前記外周凹部の外周側に設けられた台座部と、を有してもよい。
In the semiconductor device according to the present invention,
The mounting table may include an outer peripheral concave portion provided on the outer peripheral side of the protruding portion and a pedestal portion provided on the outer peripheral side of the outer peripheral concave portion.

本発明による半導体装置において、
前記台座部の高さ位置と前記突出部の高さ位置とが同一となってもよい。
In the semiconductor device according to the present invention,
The height position of the pedestal part and the height position of the protruding part may be the same.

本発明による半導体装置において、
前記載置台は、前記突出部の外周側に設けられた外周凹部を有し、
前記外周凹部の下端の高さ位置と前記内周凹部の下端の高さ位置とが同一となってもよい。
In the semiconductor device according to the present invention,
The mounting table has an outer peripheral recess provided on the outer peripheral side of the protruding portion,
The height position of the lower end of the outer peripheral recess and the height position of the lower end of the inner peripheral recess may be the same.

本発明による載置台は、
接合剤を介して半導体素子が載置される載置台であって、
上方側に突出した複数の突出部と、前記突出部の内周側に設けられた内周凹部と、を有する突出体を備え、
前記突出部の少なくとも外周面の一部は、上方に向かうにつれて内周側に向かうテーパー部を有し、
前記複数の突出部が取り囲むことで前記内周凹部が形成されている。
The mounting table according to the present invention is:
A mounting table on which a semiconductor element is mounted via a bonding agent,
A projecting body having a plurality of projecting portions projecting upward and an inner circumferential recess provided on the inner circumferential side of the projecting portion;
At least a part of the outer peripheral surface of the protruding portion has a tapered portion that goes to the inner peripheral side as it goes upward,
The inner circumferential recess is formed by surrounding the plurality of protrusions.

本発明による半導体装置の製造方法は、
上方側に突出した複数の突出部と前記突出部の内周側に設けられた内周凹部とを有する突出体を含む載置台のうち、前記内周凹部内に接合剤を載置する工程と、
前記接合剤に熱を加えて溶かす工程と、
溶けた接合剤上に半導体素子を載置する工程と、
前記半導体素子をモールド樹脂で覆う工程と、
を備え、
前記突出部の少なくとも外周面の一部が、上方に向かうにつれて内周側に向かうテーパー部を有し、
前記複数の突出部が取り囲むことで前記内周凹部が形成されている。
A method for manufacturing a semiconductor device according to the present invention includes:
Of the mounting table including a protruding body having a plurality of protruding portions protruding upward and an inner peripheral concave portion provided on the inner peripheral side of the protruding portion, a step of mounting a bonding agent in the inner peripheral concave portion; ,
A step of dissolving the bonding agent by applying heat;
Placing the semiconductor element on the molten bonding agent;
Covering the semiconductor element with a mold resin;
With
At least a part of the outer peripheral surface of the protruding portion has a tapered portion that goes to the inner peripheral side as it goes upward,
The inner circumferential recess is formed by surrounding the plurality of protrusions.

本発明によれば、突出部の内周側に内周凹部が設けられている。このため、はんだ等の接合剤を溶かした際に、内周凹部内に溶けた接合剤が留まろうとする。この結果、仮に小さな半導体素子を採用した場合であっても、当該半導体素子を内周凹部の略中心位置に自動で位置決めすることができる。   According to the present invention, the inner peripheral recess is provided on the inner peripheral side of the protrusion. For this reason, when melt | dissolving joining agents, such as solder, the joining agent melt | dissolved in an inner peripheral recessed part tends to remain. As a result, even if a small semiconductor element is employed, the semiconductor element can be automatically positioned at the approximate center position of the inner peripheral recess.

また一般に、半導体素子の大きさが大きい場合(正確には平面方向における大きさが大きい場合)には、温度サイクル試験等の環境試験での接合剤の耐量を高くすることが要求される。この点、接合剤を厚くすることでその耐量を安定させることができる。本発明によれば、突出部の少なくとも外周面の一部が上方に向かうにつれて内周側に向かうテーパー部を有しているので、大きな半導体素子を採用した場合には、当該半導体素子の周縁部の下方における接合剤の厚みを厚くすることができる。この結果、接合剤の耐量を高くすることができる。   In general, when the size of the semiconductor element is large (more precisely, when the size in the planar direction is large), it is required to increase the tolerance of the bonding agent in an environmental test such as a temperature cycle test. In this respect, the tolerance can be stabilized by increasing the thickness of the bonding agent. According to the present invention, since at least a part of the outer peripheral surface of the projecting portion has a tapered portion that goes to the inner peripheral side as it goes upward, when a large semiconductor element is employed, the peripheral portion of the semiconductor element It is possible to increase the thickness of the bonding agent below the thickness of the adhesive. As a result, the tolerance of the bonding agent can be increased.

図1は、本発明の実施の形態による載置台の斜視図である。FIG. 1 is a perspective view of a mounting table according to an embodiment of the present invention. 図2は、本発明の実施の形態による載置台の上方平面図である。FIG. 2 is an upper plan view of the mounting table according to the embodiment of the present invention. 図3は、本発明の実施の形態による半導体装置の断面図である。FIG. 3 is a cross-sectional view of the semiconductor device according to the embodiment of the present invention. 図4は、本発明の実施の形態の変形例1による半導体装置の断面図である。FIG. 4 is a cross-sectional view of a semiconductor device according to Modification 1 of the embodiment of the present invention. 図5は、本発明の実施の形態の変形例2による半導体装置の断面図である。FIG. 5 is a cross-sectional view of a semiconductor device according to Modification 2 of the embodiment of the present invention. 図6は、本発明の実施の形態の変形例3による半導体装置の断面図である。FIG. 6 is a cross-sectional view of a semiconductor device according to Modification 3 of the embodiment of the present invention. 図7は、本発明の実施の形態の変形例4による半導体装置の断面図である。FIG. 7 is a cross-sectional view of a semiconductor device according to Modification 4 of the embodiment of the present invention.

実施の形態
《構成》
図1に示すように、本実施の形態による半導体装置は、上方側に突出した複数の突出部22及び突出部22の内周側に設けられた内周凹部26を有する突出体20を含む載置台10と、突出体20上に設けられたはんだ等の接合剤50(図3乃至図7参照)と、接合剤50上に設けられた半導体素子91,92と、半導体素子91,92を覆うモールド樹脂60と、を有している。図3乃至図7に示されているように突出部22と半導体素子91,92とは接触せず、接合剤50を介して突出部22によって半導体素子91,92が支持されてもよいし、突出部22によって半導体素子91,92が接触して支持されてもよい。
Embodiment << Configuration >>
As shown in FIG. 1, the semiconductor device according to the present embodiment includes a protrusion 20 having a plurality of protrusions 22 protruding upward and an inner peripheral recess 26 provided on the inner peripheral side of the protrusion 22. The mounting table 10, a bonding agent 50 such as solder (see FIGS. 3 to 7) provided on the protrusion 20, semiconductor elements 91 and 92 provided on the bonding agent 50, and the semiconductor elements 91 and 92 are covered. Mold resin 60. As shown in FIGS. 3 to 7, the protrusion 22 and the semiconductor elements 91 and 92 may not be in contact with each other, and the semiconductor elements 91 and 92 may be supported by the protrusion 22 via the bonding agent 50. The semiconductor elements 91 and 92 may be contacted and supported by the protrusion 22.

突出部22の少なくとも外周面の一部は、上方に向かうにつれて内周側に向かうテーパー部22aを有している。また、複数の突出部22が取り囲むことで内周凹部26が形成されている。なお、一例としては、内周凹部26内にはんだ等の接合剤50が載置され、温度を上げることで当該接合剤50が溶けて、内周凹部26から外方へと溶けた接合剤50が流れ出してもよい。   At least a part of the outer peripheral surface of the protruding portion 22 has a tapered portion 22a that goes to the inner peripheral side as it goes upward. Moreover, the inner peripheral recessed part 26 is formed by the several protrusion part 22 surrounding. As an example, the bonding agent 50 such as solder is placed in the inner circumferential recess 26, and the bonding agent 50 is melted by increasing the temperature, and melted outward from the inner circumferential recess 26. May flow out.

図1に示すように、少なくとも2つの突出部22の間に溝部21が形成されてもよい。図1に示す態様では、4つの突出部22が設けられており、隣接する一対の突出部22の間に溝部21が設けられている。   As shown in FIG. 1, a groove 21 may be formed between at least two protrusions 22. In the aspect shown in FIG. 1, four protrusions 22 are provided, and a groove 21 is provided between a pair of adjacent protrusions 22.

溝部21は、上方に向かうにつれて幅が広くなる部分を有していてもよい。図1に示す態様では、各突出部22が三角錐形状となることで、溝部21の幅が上方に向かうにつれて広くなっている。図1に示す態様では各突出部22が三角錐形状となっているが、これに限られることはなく、各突出部22は他の多角錐形状(例えば四角錐形状、五角錐形状等)となってもよい。   The groove part 21 may have a part which becomes wide as it goes upwards. In the aspect shown in FIG. 1, each protrusion 22 has a triangular pyramid shape, so that the width of the groove 21 becomes wider as it goes upward. In the embodiment shown in FIG. 1, each protrusion 22 has a triangular pyramid shape. However, the present invention is not limited to this, and each protrusion 22 has another polygonal pyramid shape (for example, a quadrangular pyramid shape, a pentagonal pyramid shape, etc.). It may be.

また図1に示すように、ある突出部22の一辺が別の突出部22の一辺と重複してもよい。図2に示す態様では(図1の上方平面図に示されるように)、各突出部22の下辺が隣接する突出部22の下辺と重複している。より具体的には、三角錐形状からなる突出部22のうちの2つの下辺が隣接する突出部22の下辺と重複する態様となっている。   Also, as shown in FIG. 1, one side of one protrusion 22 may overlap with one side of another protrusion 22. In the embodiment shown in FIG. 2 (as shown in the upper plan view of FIG. 1), the lower side of each protrusion 22 overlaps the lower side of the adjacent protrusion 22. More specifically, two lower sides of the protrusions 22 having a triangular pyramid shape overlap with the lower sides of the adjacent protrusions 22.

載置台10は、突出部22の外周側に設けられた外周凹部30と、外周凹部30の外周側に設けられた台座部40とを有してもよい。図2に示す態様では、外周凹部30が「ロの字」形状となっており、外周凹部30の周縁は正方形状となっている。   The mounting table 10 may include an outer peripheral recess 30 provided on the outer peripheral side of the protrusion 22 and a pedestal 40 provided on the outer peripheral side of the outer peripheral recess 30. In the embodiment shown in FIG. 2, the outer peripheral recess 30 has a “B” shape, and the outer periphery of the outer peripheral recess 30 has a square shape.

図3に示すように、台座部40の高さ位置と突出部22の高さ位置とは同一となってもよい。なお、本実施の形態において、「高さ位置」が「同一」とは、完全に同一となっていることまでは意味せず、全体の高さの±10%の範囲内になっていればよい。また、外周凹部30の下端の高さ位置と内周凹部26の下端の高さ位置とが同一となっていてもよい。   As shown in FIG. 3, the height position of the pedestal portion 40 and the height position of the protruding portion 22 may be the same. In the present embodiment, “height position” is “same” does not mean that it is completely the same, as long as it is within a range of ± 10% of the total height. Good. Moreover, the height position of the lower end of the outer periphery recessed part 30 and the height position of the lower end of the inner periphery recessed part 26 may be the same.

本実施の形態では、図3乃至図7に示すように、大きさの大きな半導体素子91及び大きさの小さな半導体素子92の両方を選別することなく用いてもよい。なお、本実施の形態において小さな半導体素子92(図3乃至図7の実線参照)とは、上方から見たときの内周凹部26の面積の120%未満のものを意味し、本実施の形態において大きな半導体素子91(図3乃至図7の破線参照)とは、上方から見たときの内周凹部26の面積の120%以上のものを意味する。   In this embodiment, as shown in FIGS. 3 to 7, both the large semiconductor element 91 and the small semiconductor element 92 may be used without being selected. In the present embodiment, the small semiconductor element 92 (refer to the solid line in FIGS. 3 to 7) means a semiconductor element that is less than 120% of the area of the inner circumferential recess 26 when viewed from above. The large semiconductor element 91 (see the broken lines in FIGS. 3 to 7) means a semiconductor element having a size of 120% or more of the area of the inner circumferential recess 26 when viewed from above.

《作用・効果》
次に、上述した構成からなる本実施の形態による作用・効果であって、まだ説明していないものについて説明する。
《Action ・ Effect》
Next, operations and effects of the present embodiment having the above-described configuration, which have not been described yet, will be described.

本実施の形態によれば、図1に示すように突出部22の内周側に内周凹部26が設けられている。このため、はんだ等の接合剤50を溶かした際に、内周凹部26内に溶けた接合剤50が留まろうとする。このため、半導体素子91,92を内周凹部26の略中心位置に自動で位置決めすることができる。この効果は、小さな半導体素子92を用いた場合の方が、大きな半導体素子91を用いた場合よりも効果が大きい。   According to the present embodiment, as shown in FIG. 1, the inner peripheral recess 26 is provided on the inner peripheral side of the protrusion 22. For this reason, when the bonding agent 50 such as solder is melted, the molten bonding agent 50 tends to stay in the inner circumferential recess 26. For this reason, the semiconductor elements 91 and 92 can be automatically positioned at substantially the center position of the inner peripheral recess 26. This effect is greater when the small semiconductor element 92 is used than when the large semiconductor element 91 is used.

また一般に、半導体素子91,92の大きさが大きい場合(正確には平面方向における大きさが大きい場合)には、温度サイクル試験等の環境試験での接合剤50の耐量を高くすることが要求される。この点、接合剤50を厚くすることでその耐量を安定させることができる。本実施の形態によれば、突出部22の少なくとも外周面の一部が上方に向かうにつれて内周側に向かうテーパー部22aを有しているので、半導体素子91,92の周縁部の下方における接合剤50の厚みを厚くすることができる。この結果、接合剤50の耐量を高くすることができる。この効果は、大きな半導体素子91を用いた場合の方が、小さな半導体素子92を用いた場合よりも効果が大きい。なお、はんだ等の接合剤50へのクラック等は接合剤50の周縁部付近から起こることが多いので、このようなクラック等を防止する観点からは周縁部における接合剤50の厚みを厚くすることは有益である。   In general, when the size of the semiconductor elements 91 and 92 is large (more precisely when the size in the plane direction is large), it is required to increase the tolerance of the bonding agent 50 in an environmental test such as a temperature cycle test. Is done. In this respect, by increasing the thickness of the bonding agent 50, the withstand amount can be stabilized. According to the present embodiment, since at least a part of the outer peripheral surface of the projecting portion 22 has the tapered portion 22a that goes to the inner peripheral side as it goes upward, the bonding is performed below the peripheral portion of the semiconductor elements 91 and 92. The thickness of the agent 50 can be increased. As a result, the tolerance of the bonding agent 50 can be increased. This effect is greater when the large semiconductor element 91 is used than when the small semiconductor element 92 is used. In addition, since the cracks to the bonding agent 50 such as solder often occur from the vicinity of the peripheral portion of the bonding agent 50, the thickness of the bonding agent 50 at the peripheral portion is increased from the viewpoint of preventing such cracks and the like. Is beneficial.

図1に示すように、少なくとも2つの突出部22の間に溝部21が形成される態様を採用した場合には、内周凹部26内にある接合剤50を内周凹部26外に溝部21を介して供給できる。このため、半導体素子91,92の周縁部の下方における接合剤50の厚みを容易に厚くすることができる。   As shown in FIG. 1, when an embodiment in which the groove portion 21 is formed between at least two protrusions 22 is adopted, the bonding agent 50 in the inner peripheral recess portion 26 is placed outside the inner peripheral recess portion 26. Can be supplied via. For this reason, it is possible to easily increase the thickness of the bonding agent 50 below the peripheral portions of the semiconductor elements 91 and 92.

溝部21が上方に向かうにつれて幅が広くなる部分を有している場合には、大きな半導体素子91の周縁部の下方における接合剤50の厚みを極力厚くすることができる点で有益である。特に各突出部22が三角錐形状、四角錐形状等の多角錐形状となっている場合には、大きな半導体素子91と接触する部分は点となるとともに、連続的に接合剤50の厚みが厚くなっていくことから、半導体素子91,92の周縁部の下方における接合剤50の厚みを厚くすることができる。また、接合剤50に加わる負荷を連続的に変化させることができ、接合剤50の耐量を大きくすることができる。   When the groove portion 21 has a portion that increases in width as it goes upward, it is advantageous in that the thickness of the bonding agent 50 below the peripheral edge portion of the large semiconductor element 91 can be increased as much as possible. In particular, when each protrusion 22 has a polygonal pyramid shape such as a triangular pyramid shape or a quadrangular pyramid shape, the portion in contact with the large semiconductor element 91 becomes a point, and the thickness of the bonding agent 50 is continuously thick. Therefore, the thickness of the bonding agent 50 below the peripheral edge portions of the semiconductor elements 91 and 92 can be increased. Moreover, the load applied to the bonding agent 50 can be continuously changed, and the withstand amount of the bonding agent 50 can be increased.

図2に示すように、ある突出部22の一辺が別の突出部22の一辺と重複している態様を採用した場合には、溝部21の下端における幅を小さくすることができるので、溝部21を通過する溶けた接合剤50の速度を抑えることができる(速度が速い場合には半導体素子91,92の位置がずれてしまう可能性がある。)。このため、より確実に、半導体素子91,92を内周凹部26の略中心位置に自動で位置決めすることができる。   As shown in FIG. 2, when adopting a mode in which one side of one protruding portion 22 overlaps with one side of another protruding portion 22, the width at the lower end of the groove portion 21 can be reduced. The speed of the melted bonding agent 50 that passes through can be suppressed (if the speed is high, the positions of the semiconductor elements 91 and 92 may be shifted). For this reason, the semiconductor elements 91 and 92 can be automatically positioned at a substantially central position of the inner circumferential recess 26 more reliably.

図2に示すように、各突出部22が三角錐形状となり、上方から見たときに各突出部22の2辺が重複し、各突出部22の内周凹部26側の4つの頂点が内周凹部26の略中心で重複する態様を採用した場合には、突出部22の4つの頂点で半導体素子91,92を直接的に又は接合剤50を介して間接的にバランスよく支持することができる。また、このような態様によれば、4つの溝部21から均等に内周凹部26から周縁外方に溶けた接合剤50を流すことができるので、より確実に、半導体素子91,92を内周凹部26の略中心位置に自動で位置決めすることができる。   As shown in FIG. 2, each protrusion 22 has a triangular pyramid shape. When viewed from above, two sides of each protrusion 22 overlap, and the four apexes on the inner peripheral recess 26 side of each protrusion 22 are inward. In the case of adopting an overlapping mode at the approximate center of the circumferential recess 26, it is possible to support the semiconductor elements 91 and 92 at the four vertices of the protrusion 22 directly or indirectly through the bonding agent 50 in a balanced manner. it can. Further, according to such an aspect, since the bonding agent 50 melted from the inner peripheral recess 26 to the outer periphery can be made to flow evenly from the four groove portions 21, the semiconductor elements 91 and 92 can be more reliably connected to the inner periphery. It can be automatically positioned at a substantially central position of the recess 26.

さらに、図2に示すように、上方から見たときに各突出部22が直角2等辺三角形となり、底角が45度、頂角が90度となっている場合に、各突出部22の2辺が重複し、各突出部22の内周凹部26側の4つの頂点が内周凹部26の略中心で重複する態様を採用した場合には、各突出部22をピッタリとあわせることができるとともに、内周凹部26の形状をその中心に対して点対称とし、かつ、その中心を通過する4つの直線(図2の上下方向、左右方向、右45度で傾斜する方向及び左45度で傾斜する方向の直線)に対して線対称とすることができる。このため、4つの溝部21からより均等に内周凹部26から周縁外方に溶けた接合剤50を流すことができるので、さらに確実に、半導体素子91,92を内周凹部26の略中心位置に自動で位置決めすることができる。   Furthermore, as shown in FIG. 2, when each protrusion 22 is a right-angled isosceles triangle when viewed from above, the base angle is 45 degrees and the apex angle is 90 degrees, 2 of each protrusion 22 When the side is overlapped and the four vertices on the inner peripheral recess 26 side of each protrusion 22 are overlapped at the approximate center of the inner peripheral recess 26, each protrusion 22 can be perfectly aligned. , The shape of the inner circumferential recess 26 is point-symmetric with respect to its center, and four straight lines passing through the center (up and down direction, left and right direction in FIG. 2, tilted at 45 degrees right and tilted at 45 degrees left) Line symmetric). For this reason, since the bonding agent 50 melted from the inner peripheral recess 26 to the outer periphery can be more evenly flowed from the four grooves 21, the semiconductor elements 91 and 92 are more reliably positioned at the substantially central position of the inner peripheral recess 26. Can be automatically positioned.

また、上方から見たときに各突出部22の外縁によって形成される形状と、外周凹部30の外縁によって形成される形状とが相似形となっている場合には、外周凹部30に溜まる溶けた接合剤50の深さや外周凹部30に流れ出る溶けた接合剤50の速度をより均一にすることができる点で有益である。図2に示す態様では、各突出部22の外縁によって形成される形状は正方形状となり、外周凹部30の外縁によって形成される形状も正方形状となっているが、このような態様によれば、外周凹部30に溜まる溶けた接合剤50の深さや外周凹部30に流れ出る溶けた接合剤50の速度をさらに均一にすることができる点で有益である。   Further, when the shape formed by the outer edge of each protrusion 22 and the shape formed by the outer edge of the outer peripheral recess 30 are similar when viewed from above, the melt accumulated in the outer peripheral recess 30 is melted. This is advantageous in that the depth of the bonding agent 50 and the speed of the molten bonding agent 50 flowing out to the outer peripheral recess 30 can be made more uniform. In the aspect shown in FIG. 2, the shape formed by the outer edge of each projecting portion 22 is a square shape, and the shape formed by the outer edge of the outer peripheral recess 30 is also a square shape. This is advantageous in that the depth of the melted bonding agent 50 accumulated in the outer circumferential recess 30 and the speed of the melted bonding agent 50 flowing out to the outer circumferential recess 30 can be made more uniform.

図2に示すように、突出体20が突出部22の外周側に設けられた外周凹部30と外周凹部30の外周側に設けられた台座部40とを有している態様を採用した場合には、外周凹部30内に接合剤50を溜めることができる。このため、溶けた接合剤50が突出体20の外部まで流れ出すことを防止することができる。   As shown in FIG. 2, when the protrusion 20 has an outer peripheral recessed portion 30 provided on the outer peripheral side of the protruding portion 22 and a pedestal portion 40 provided on the outer peripheral side of the outer peripheral recessed portion 30. Can store the bonding agent 50 in the outer circumferential recess 30. For this reason, it is possible to prevent the melted bonding agent 50 from flowing out of the protrusion 20.

図3に示すように、外周凹部30の下端の高さ位置と内周凹部26の下端の高さ位置とが同一となっている場合には、溝部21を通過する溶けた接合剤50の速度を抑えることができる。このため、より確実に、半導体素子91,92を内周凹部26の略中心位置に自動で位置決めすることができる。   As shown in FIG. 3, when the height position of the lower end of the outer peripheral recessed portion 30 and the height position of the lower end of the inner peripheral recessed portion 26 are the same, the speed of the melted bonding agent 50 passing through the groove portion 21. Can be suppressed. For this reason, the semiconductor elements 91 and 92 can be automatically positioned at a substantially central position of the inner circumferential recess 26 more reliably.

なお、図4に示すように、外周凹部30の下端の高さ位置が内周凹部26の下端の高さ位置よりも高くなっていてもよい。このような態様を採用した場合には、溝部21を通過する溶けた接合剤50の速度をより抑えることができる。このため、さらに確実に、半導体素子91,92を内周凹部26の略中心位置に自動で位置決めすることができる。   In addition, as shown in FIG. 4, the height position of the lower end of the outer periphery recessed part 30 may be higher than the height position of the lower end of the inner periphery recessed part 26. FIG. When such an aspect is employ | adopted, the speed | rate of the melt | dissolved bonding agent 50 which passes the groove part 21 can be suppressed more. For this reason, the semiconductor elements 91 and 92 can be automatically positioned at a substantially central position of the inner peripheral recess 26 more reliably.

また、図5に示すように、内周凹部26の下端の高さ位置が外周凹部30の下端の高さ位置よりも高くなっている態様を採用した場合には、大きな半導体素子91の周縁部の下方における接合剤50の厚みを中心部と比較して厚くすることができる。この結果、はんだ等の接合剤50にクラック等が入ることをより確実に防止することができる点では有益である。なお、内周凹部26の下端の高さ位置及び外周凹部30の下端の高さ位置は、中心部から外周に向かって連続的に深くなってもよい。このような態様によれば、外周側に向かうにつれてはんだ等の接合剤50の厚みを厚くすることができるので、はんだ等の接合剤50にクラック等が入ることをより確実に防止することができる点では有益である。   Further, as shown in FIG. 5, when the aspect in which the height position of the lower end of the inner peripheral recess 26 is higher than the height position of the lower end of the outer peripheral recess 30 is adopted, the peripheral portion of the large semiconductor element 91 The thickness of the bonding agent 50 can be increased compared to the central portion. As a result, it is advantageous in that cracks and the like can be more reliably prevented from entering the bonding agent 50 such as solder. In addition, the height position of the lower end of the inner peripheral recessed part 26 and the height position of the lower end of the outer peripheral recessed part 30 may be continuously deepened from the center part toward the outer periphery. According to such an aspect, since the thickness of the bonding agent 50 such as solder can be increased toward the outer peripheral side, cracks and the like can be more reliably prevented from entering the bonding agent 50 such as solder. It is beneficial in terms.

図3乃至図5に示すように、台座部40の高さ位置と突出部22の高さ位置とが同一となっている態様を採用した場合には、台座部40と突出部22とを同じ工程又は同様の工程で作成できるので、載置台10を容易に製造できる点で有益である。なお、このような態様に限られることはなく、図6に示すように突出部22の高さ位置が台座部40の高さ位置よりも低くなっていてもよいし、図7に示すように突出部22の高さ位置が台座部40の高さ位置よりも低くなっていてもよい。図6に示すように突出部22の高さ位置が台座部40の高さ位置よりも低くなっている場合には、半導体素子91,92の突出部22近辺と周縁部での接合剤50の厚みの差を小さくすることができる。他方、図7に示すように突出部22の高さ位置が台座部40の高さ位置よりも低くなっている場合には、半導体素子91,92の突出部22近辺と周縁部での接合剤50の厚みの差を大きくすることができる。このように、状況に応じて、適宜設計を変えることも可能である。   As shown in FIGS. 3 to 5, when the aspect in which the height position of the pedestal portion 40 and the height position of the protruding portion 22 are the same is adopted, the pedestal portion 40 and the protruding portion 22 are the same. Since it can create in the process or the same process, it is advantageous at the point which can mount the mounting base 10 easily. In addition, it is not restricted to such an aspect, As shown in FIG. 6, the height position of the protrusion part 22 may be lower than the height position of the base part 40, and as shown in FIG. The height position of the protruding portion 22 may be lower than the height position of the pedestal portion 40. As shown in FIG. 6, when the height position of the protruding portion 22 is lower than the height position of the pedestal portion 40, the bonding agent 50 in the vicinity of the protruding portion 22 and the peripheral edge portion of the semiconductor elements 91 and 92. The difference in thickness can be reduced. On the other hand, as shown in FIG. 7, when the height position of the protrusion 22 is lower than the height position of the pedestal 40, the bonding agent in the vicinity of the protrusion 22 and the peripheral edge of the semiconductor elements 91 and 92. The difference in thickness of 50 can be increased. In this way, the design can be appropriately changed according to the situation.

最後になったが、上述した実施の形態の記載、変形例の記載及び図面の開示は、特許請求の範囲に記載された発明を説明するための一例に過ぎず、上述した実施の形態の記載又は図面の開示によって特許請求の範囲に記載された発明が限定されることはない。   Lastly, the description of the above-described embodiment, the description of the modified examples, and the disclosure of the drawings are only examples for explaining the invention described in the claims, and the description of the above-described embodiment. The invention described in the scope of claims is not limited by the disclosure of the drawings.

10 載置台
20 突出体
21 溝部
22 突出部
22a テーパー部
26 内周凹部
30 外周凹部
40 台座部
50 接合剤
60 モールド樹脂
91 大きな半導体素子
92 小さな半導体素子
DESCRIPTION OF SYMBOLS 10 Mounting base 20 Protruding body 21 Groove part 22 Protruding part 22a Taper part 26 Inner peripheral recessed part 30 Outer peripheral recessed part 40 Base part 50 Bonding agent 60 Mold resin 91 Large semiconductor element 92 Small semiconductor element

Claims (9)

上方側に突出した複数の突出部と、前記突出部の内周側に設けられた内周凹部と、を有する突出体を含む載置台と、
前記突出体上に設けられた接合剤と、
前記接合剤上に設けられた半導体素子と、
前記半導体素子を覆うモールド樹脂と、
を備え、
前記突出部の少なくとも外周面の一部は、上方に向かうにつれて内周側に向かうテーパー部を有し、
前記複数の突出部が取り囲むことで前記内周凹部が形成されていることを特徴とする半導体装置。
A mounting table including a projecting body having a plurality of projecting portions projecting upward, and an inner circumferential concave portion provided on the inner circumferential side of the projecting portion;
A bonding agent provided on the protruding body;
A semiconductor element provided on the bonding agent;
A mold resin covering the semiconductor element;
With
At least a part of the outer peripheral surface of the protruding portion has a tapered portion that goes to the inner peripheral side as it goes upward,
The semiconductor device is characterized in that the inner circumferential recess is formed by surrounding the plurality of protrusions.
少なくとも2つの突出部の間に、溝部が形成されていることを特徴とする請求項1に記載の半導体装置。   The semiconductor device according to claim 1, wherein a groove is formed between at least two protrusions. 前記溝部は、上方に向かうにつれて幅が広くなる部分を有していることを特徴とする請求項2に記載の半導体装置。   The semiconductor device according to claim 2, wherein the groove portion has a portion whose width increases toward the top. 各突出部は、三角錐形状又は四角錐形状となっており、
ある突出部の一辺が別の突出部の一辺と重複していることを特徴とする請求項1乃至3のいずれか1項に記載の半導体装置。
Each protrusion has a triangular pyramid shape or a quadrangular pyramid shape,
4. The semiconductor device according to claim 1, wherein one side of a certain protruding portion overlaps with one side of another protruding portion.
前記載置台は、前記突出部の外周側に設けられた外周凹部と、前記外周凹部の外周側に設けられた台座部と、を有していることを特徴とする請求項1乃至4のいずれか1項に記載の半導体装置。   The mounting table according to any one of claims 1 to 4, wherein the mounting table includes an outer peripheral recess provided on an outer peripheral side of the projecting portion and a pedestal provided on an outer peripheral side of the outer peripheral recess. 2. The semiconductor device according to claim 1. 前記台座部の高さ位置と前記突出部の高さ位置とが同一となっていることを特徴とする請求項5に記載の半導体装置。   The semiconductor device according to claim 5, wherein a height position of the pedestal portion and a height position of the protruding portion are the same. 前記載置台は、前記突出部の外周側に設けられた外周凹部を有し、
前記外周凹部の下端の高さ位置と前記内周凹部の下端の高さ位置とが同一となっていることを特徴とする請求項1乃至6のいずれか1項に記載の半導体装置。
The mounting table has an outer peripheral recess provided on the outer peripheral side of the protruding portion,
7. The semiconductor device according to claim 1, wherein a height position of a lower end of the outer peripheral recess and a height position of a lower end of the inner peripheral recess are the same.
接合剤を介して半導体素子が載置される載置台において、
上方側に突出した複数の突出部と、前記突出部の内周側に設けられた内周凹部と、を有する突出体を備え、
前記突出部の少なくとも外周面の一部は、上方に向かうにつれて内周側に向かうテーパー部を有し、
前記複数の突出部が取り囲むことで前記内周凹部が形成されていることを特徴とする載置台。
In the mounting table on which the semiconductor element is mounted via the bonding agent,
A projecting body having a plurality of projecting portions projecting upward and an inner circumferential recess provided on the inner circumferential side of the projecting portion;
At least a part of the outer peripheral surface of the protruding portion has a tapered portion that goes to the inner peripheral side as it goes upward,
The mounting table is characterized in that the inner peripheral recess is formed by surrounding the plurality of protrusions.
上方側に突出した複数の突出部と前記突出部の内周側に設けられた内周凹部とを有する突出体を含む載置台のうち、前記内周凹部内に接合剤を載置する工程と、
前記接合剤に熱を加えて溶かす工程と、
溶けた接合剤上に半導体素子を載置する工程と、
前記半導体素子をモールド樹脂で覆う工程と、
を備え、
前記突出部の少なくとも外周面の一部は、上方に向かうにつれて内周側に向かうテーパー部を有し、
前記複数の突出部が取り囲むことで前記内周凹部が形成されていることを特徴とする半導体装置の製造方法。
Of the mounting table including a protruding body having a plurality of protruding portions protruding upward and an inner peripheral concave portion provided on the inner peripheral side of the protruding portion, a step of mounting a bonding agent in the inner peripheral concave portion; ,
A step of dissolving the bonding agent by applying heat;
Placing the semiconductor element on the molten bonding agent;
Covering the semiconductor element with a mold resin;
With
At least a part of the outer peripheral surface of the protruding portion has a tapered portion that goes to the inner peripheral side as it goes upward,
The method of manufacturing a semiconductor device, wherein the inner peripheral recess is formed by surrounding the plurality of protrusions.
JP2016032858A 2016-02-24 2016-02-24 Semiconductor device, placing table and method of manufacturing semiconductor device Pending JP2017152518A (en)

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