JP2017152492A - Plating method and plating apparatus for printed wiring board - Google Patents

Plating method and plating apparatus for printed wiring board Download PDF

Info

Publication number
JP2017152492A
JP2017152492A JP2016032380A JP2016032380A JP2017152492A JP 2017152492 A JP2017152492 A JP 2017152492A JP 2016032380 A JP2016032380 A JP 2016032380A JP 2016032380 A JP2016032380 A JP 2016032380A JP 2017152492 A JP2017152492 A JP 2017152492A
Authority
JP
Japan
Prior art keywords
plating
wiring board
printed wiring
current
back surfaces
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2016032380A
Other languages
Japanese (ja)
Inventor
清男 小林
Kiyoo Kobayashi
清男 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2016032380A priority Critical patent/JP2017152492A/en
Publication of JP2017152492A publication Critical patent/JP2017152492A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a plating method for a printed wiring board and an electrolytic plating apparatus capable of easily controlling variations in plating thickness of a printed wiring board due to a plating method of a printed wiring board by a direct current plating method and an electrolytic plating apparatus to obtain a uniform plating thickness.SOLUTION: A plating method for electrolytically plating a printed wiring board includes: respectively applying a current to the front and back surfaces of the printed wiring board; alternately jetting a plating solution from a jet device; and applying a current of 5 to 20% of one surface from the other surface as well in a state where a current is applied from the one surface.SELECTED DRAWING: Figure 1

Description

本発明は、印刷配線板のめっき方法およびめっき装置に関する。   The present invention relates to a plating method and a plating apparatus for a printed wiring board.

従来、基板(印刷配線板)に電解めっきを施す場合には、公知の電解めっき装置が用いられる。この電解めっき装置は、めっき液(例えば硫酸銅溶液)が貯蔵されためっき槽の中に基板を浸漬させ、基板の両面と、基板の表裏面の両側に配置した電極とを、それぞれ通電させてめっき処理を行う。このような方法は直流めっき法と呼ばれる。   Conventionally, when electrolytic plating is performed on a substrate (printed wiring board), a known electrolytic plating apparatus is used. In this electrolytic plating apparatus, a substrate is immersed in a plating tank in which a plating solution (for example, a copper sulfate solution) is stored, and both surfaces of the substrate and electrodes disposed on both sides of the front and back surfaces of the substrate are energized. Plating is performed. Such a method is called a direct current plating method.

近年、基板の高板厚化・スルーホール小径化による高アスペクト比化に伴い、スルーホールめっきのスローイングパワーが低下することから、直流めっき法では、全体のめっき厚を厚くして、スルーホール内めっき厚を確保している。
しかしながら、このような高アスペクト比化(スルーホール径に対する板厚の比が高いこと)から、スルーホール内のめっき液の流動性が低下するだけでなく、スルーホール内の電流密度が低下してしまう問題がある。また、基板の表層のめっき厚も厚くなるので、微細回路形成するためには薄く均一に研磨しなければならず、回路形成が難しくなる。また、研磨後のめっき厚みにばらつきやムラが出たり、部分的に薄くなったりして、回路の接続信頼性が低下する。
In recent years, the throwing power of through-hole plating has decreased with the increase in the thickness of the substrate and the increase in the aspect ratio due to the reduction in the diameter of the through-hole. The plating thickness is secured.
However, this high aspect ratio (the ratio of the plate thickness to the through hole diameter is high) not only reduces the fluidity of the plating solution in the through hole, but also reduces the current density in the through hole. There is a problem. Further, since the plating thickness of the surface layer of the substrate is also increased, it is necessary to polish thinly and uniformly in order to form a fine circuit, which makes circuit formation difficult. In addition, variations and unevenness in the plating thickness after polishing occur, or the thickness of the plating is partially reduced, resulting in a decrease in circuit connection reliability.

上記した問題は、パルスめっき法では改善可能であるが、直流めっき法と比べて、設備などのコストがかかってしまう。   Although the above-described problems can be improved by the pulse plating method, the cost of facilities and the like is increased as compared with the direct current plating method.

このような問題を解決するため、例えば、特許文献1には、硫酸銅めっき液中で正電流を印加して電気めっきし、電気めっきと同一のめっき液中で、導体形成とは逆の負電流を印加して局部の電解エッチングを行い所定のパターンを形成するパターン形成方法が挙げられている。また、特許文献1では、硫酸銅めっき液による電気めっきは、パターンめっき厚とスルーホールめっき厚が均一となるように行うとしている。
しかしながら、特許文献1では、印加時間をそれぞれ異なる時間にした正電流と負電流を交互に印加した周期的反転電流印加方式でめっきを行うので、作業が煩雑になる上、めっき厚のばらつきは解消されない。また、正電流と負電流の印加時間をそれぞれ異なる時間にしてもめっき厚は表裏面で均一になることはない。
In order to solve such a problem, for example, in Patent Document 1, a positive current is applied in a copper sulfate plating solution to perform electroplating, and in the same plating solution as the electroplating, a negative polarity opposite to conductor formation is applied. There is a pattern forming method in which a predetermined pattern is formed by applying an electric current to perform local electrolytic etching. In Patent Document 1, electroplating with a copper sulfate plating solution is performed so that the pattern plating thickness and the through-hole plating thickness are uniform.
However, in Patent Document 1, plating is performed by a periodic reversal current application method in which a positive current and a negative current are applied alternately at different times, so that the work becomes complicated and variations in plating thickness are eliminated. Not. Further, even if the application time of the positive current and the negative current is different, the plating thickness does not become uniform on the front and back surfaces.

特開2006−203013号公報JP 2006-203013 A

本発明は、直流めっき法による印刷配線板のめっき方法および電解めっき装置に起因する印刷配線板のめっき厚のばらつきを容易に制御し、均一なめっき厚を得ることができる印刷配線板のめっき方法および電解めっき装置を提供することを課題とする。   The present invention relates to a plating method for a printed wiring board by a direct current plating method and a plating method for a printed wiring board capable of easily controlling a variation in the plating thickness of the printed wiring board caused by an electrolytic plating apparatus and obtaining a uniform plating thickness. It is another object of the present invention to provide an electrolytic plating apparatus.

本発明は、上記課題を解決するべく完成されたものであって、以下の構成からなる。
(1)印刷配線板を電解めっきするめっき方法であって、印刷配線板の表裏面に対して、それぞれ電流を印加し且つ噴流装置からめっき液を噴流することを交互に行うことを特徴とする印刷配線板のめっき方法。
(2)一方の面から電流を印加している状態において、他方の面からも一方の面の5〜20%の電流を印加する(1)に記載の印刷配線板のめっき方法。
(3)前記印刷配線板がスルーホールを有し、このスルーホール内を電解めっきする(1)または(2)に記載の印刷配線板のめっき方法。
(4)めっき液が貯蔵されためっき槽と、前記めっき液に浸漬され且つ表裏面がそれぞれ外部電源の陰極と電気的に接続される被めっき物である印刷配線板と前記印刷配線板の表裏面にそれぞれ対向配置し且つ前記外部電源の陽極に電気的に接続された2つの電極と、前記印刷配線板と前記電極との間において、前記印刷配線板と対向配置しためっき液の噴流装置とを備え、前記印刷配線板の表裏面に対して、交互に前記外部電源から電流を流し且つ前記噴流装置からめっき液を噴流することを特徴とする電解めっき装置。
(5)前記印刷配線板の上部が治具で挟持して固定され、この治具が表裏で別々のブスバーを有する(4)に記載の電解めっき装置。
(6)前記印刷配線板がスルーホールを有し、このスルーホール内を電解めっきする(4)または(5)に記載の電解めっき装置。
The present invention has been completed in order to solve the above problems, and has the following configuration.
(1) A plating method for electrolytic plating of a printed wiring board, wherein current is applied to the front and back surfaces of the printed wiring board, and a plating solution is jetted from a jet device alternately. Plating method for printed wiring board.
(2) The method for plating a printed wiring board according to (1), wherein a current of 5 to 20% of one surface is applied also from the other surface in a state where a current is applied from one surface.
(3) The method for plating a printed wiring board according to (1) or (2), wherein the printed wiring board has a through hole, and the inside of the through hole is electrolytically plated.
(4) A plating tank in which a plating solution is stored, a printed wiring board that is a plating object that is immersed in the plating solution and whose front and back surfaces are electrically connected to a cathode of an external power source, respectively, and a surface of the printed wiring board Two electrodes respectively disposed opposite to the back surface and electrically connected to the anode of the external power source; and a plating solution jetting device disposed between the printed wiring board and the electrode so as to face the printed wiring board The electroplating apparatus is characterized in that a current is alternately supplied from the external power supply to the front and back surfaces of the printed wiring board and a plating solution is jetted from the jetting apparatus.
(5) The electroplating apparatus according to (4), wherein an upper portion of the printed wiring board is sandwiched and fixed by a jig, and the jig has separate bus bars on the front and back sides.
(6) The electrolytic plating apparatus according to (4) or (5), wherein the printed wiring board has a through hole, and the inside of the through hole is electrolytically plated.

本発明によれば、電流の印加およびめっき液の噴流を、印刷配線板の表裏面から交互に行うことにより、印刷配線板のめっき厚のばらつきを容易に制御でき、且つ既存のめっき装置を活用して、安価に均一なめっき厚を得ることができる。   According to the present invention, the application of current and the jet of plating solution are alternately performed from the front and back surfaces of the printed wiring board, so that variations in the plating thickness of the printed wiring board can be easily controlled and the existing plating apparatus is utilized. Thus, a uniform plating thickness can be obtained at a low cost.

本発明に係る電解めっき装置の一実施形態を示す説明図である。It is explanatory drawing which shows one Embodiment of the electroplating apparatus which concerns on this invention. (a)は、本発明に係る電解めっき装置での印刷配線板の一実施形態を示す正面図であり、(b)は(a)の側面図である。(A) is a front view which shows one Embodiment of the printed wiring board in the electroplating apparatus which concerns on this invention, (b) is a side view of (a). (a)〜(c)は、本発明に係る印刷配線板のめっき方法の一実施形態を示す工程説明図である。(A)-(c) is process explanatory drawing which shows one Embodiment of the plating method of the printed wiring board based on this invention. 本発明に係る印刷配線板の表側と裏側へのそれぞれ電流の印加を示すグラフである。It is a graph which shows the application of each electric current to the front side and back side of the printed wiring board which concerns on this invention.

本実施形態に係る電解めっき装置100は、図1に示すように、めっき槽1と、めっき槽1に貯蔵されるめっき液2と、外部電源(整流器)3とを備える。めっき槽1内にはめっき液を吸い込み印刷配線板10へと噴流するノズル40を少なくとも1つ設けた噴流装置4が、印刷配線板10の両側に対向配置される。外部電源3の陽極は2本で一対となる電極(アノード)5に電気的に接続され、外部電源3の陰極はブスバー6を介して治具7に接続されている。治具7は印刷配線板10を固定し且つ外部電源3と印刷配線板10とを電気的に接続する。印刷配線板10は、治具7に固定され、めっき液2内に浸漬している。なお、図中の矢印は電子の流れる向きを示すものである。   As shown in FIG. 1, the electroplating apparatus 100 according to this embodiment includes a plating tank 1, a plating solution 2 stored in the plating tank 1, and an external power source (rectifier) 3. A jetting device 4 provided with at least one nozzle 40 that sucks a plating solution into the plating tank 1 and jets it to the printed wiring board 10 is disposed opposite to both sides of the printed wiring board 10. Two anodes of the external power source 3 are electrically connected to a pair of electrodes (anodes) 5, and a cathode of the external power source 3 is connected to a jig 7 via a bus bar 6. The jig 7 fixes the printed wiring board 10 and electrically connects the external power source 3 and the printed wiring board 10. The printed wiring board 10 is fixed to the jig 7 and immersed in the plating solution 2. In addition, the arrow in a figure shows the direction through which an electron flows.

めっき液2としては例えば、硫酸銅溶液、シアン化銅めっき液などが挙げられる。
なお、電解めっき前の印刷配線板10には、印刷配線板10を電解めっきの電極にできるように、化学めっき(無電解めっき)を行う。
Examples of the plating solution 2 include a copper sulfate solution and a copper cyanide plating solution.
The printed wiring board 10 before electrolytic plating is subjected to chemical plating (electroless plating) so that the printed wiring board 10 can be used as an electrode for electrolytic plating.

外部電源3は、一般的な電解めっき装置において印刷配線板の電解めっきに使用され、印刷配線板10の表裏面に対向するように設置され、2本で一対となる電極5を陽極に接続し、印刷配線板10を陰極に接続する。この外部電源3から印刷配線板10の表裏面と一対の電極5間にそれぞれ電流を印加し、電解めっきを行う。表用の電極5と裏用の電極5に、それぞれ別の外部電源3を使用して、電流値を別々に制御し、表裏へ交互に電流を印加させる。印刷配線板10の表裏面でめっきの面積が異なる場合においても、表裏でそれぞれ別の外部電源3を使用して、電流値を別々に制御すればよい。
なお、電解めっき装置100には、めっき液2中の金属イオンの不均一性を解消するための攪拌装置(図示せず)が具備されている。
The external power source 3 is used for electrolytic plating of a printed wiring board in a general electrolytic plating apparatus, and is installed so as to face the front and back surfaces of the printed wiring board 10, and a pair of two electrodes 5 are connected to an anode. The printed wiring board 10 is connected to the cathode. Current is applied from the external power source 3 between the front and back surfaces of the printed wiring board 10 and the pair of electrodes 5 to perform electrolytic plating. A separate external power source 3 is used for the front electrode 5 and the back electrode 5, respectively, and the current value is controlled separately, and current is applied alternately to the front and back surfaces. Even when the plating areas on the front and back surfaces of the printed wiring board 10 are different, the current values may be controlled separately by using different external power sources 3 on the front and back surfaces.
The electrolytic plating apparatus 100 is provided with a stirring device (not shown) for eliminating the non-uniformity of metal ions in the plating solution 2.

噴流装置4は、めっき液2を噴流するノズル40を少なくとも1つ有する装置であり、めっき槽1のめっき液2中に設置される。この噴流装置4は、印刷配線板10の表裏面を移動するものであってもよいが、印刷配線板10と電極5の間に、例えばエダクターノズルなどのノズル40の孔が印刷配線板10と対向するように一対ずつ設置されるのがよい。一対は、必ずしもノズル40同士が互いに対向する必要はなく、多少のズレがあってもよい。
この噴流装置4は、印刷配線板10の表裏面に対して交互にノズル40からめっき液2の噴流を行う。
The jet device 4 is a device having at least one nozzle 40 for jetting the plating solution 2, and is installed in the plating solution 2 of the plating tank 1. The jet device 4 may move on the front and back surfaces of the printed wiring board 10, but a hole of a nozzle 40 such as an eductor nozzle is formed between the printed wiring board 10 and the electrode 5. It is preferable to install a pair so as to face each other. In the pair, the nozzles 40 do not necessarily face each other, and there may be some deviation.
The jet device 4 jets the plating solution 2 from the nozzle 40 alternately on the front and back surfaces of the printed wiring board 10.

電極(アノード)5は、上記したように、外部電源3の陽極に接続され、印刷配線板10の表裏面に対向するように一対設置される。   As described above, the electrodes (anodes) 5 are connected to the anode of the external power source 3 and are installed in a pair so as to face the front and back surfaces of the printed wiring board 10.

治具7は、図2(a)および(b)に示すように、印刷配線板10をめっき槽1に設置し且つ外部電源3の陰極と電気的に接続するものであり、印刷配線板10の上部を表裏面で挟持するクランプ70と、外部電源3からの電流を印刷配線板10の表裏面に対してそれぞれ印加する一対のブスバー6とを備える。この治具7は図2(a)に示すように、複数の印刷配線板10を同時に挟持することができる。   As shown in FIGS. 2A and 2B, the jig 7 is for installing the printed wiring board 10 in the plating tank 1 and electrically connecting the printed wiring board 10 to the cathode of the external power source 3. And a pair of bus bars 6 for applying a current from the external power supply 3 to the front and back surfaces of the printed wiring board 10, respectively. As shown in FIG. 2A, the jig 7 can hold a plurality of printed wiring boards 10 at the same time.

本発明に係る印刷配線板のめっき方法を説明する。
電解めっき装置100を用いて印刷配線板10にめっき処理するには、まず、予め化学銅めっきを行った印刷配線板10の表裏面の上部を治具7のクランプ70で固定し、治具7の表裏に備えたブスバー6により、外部電源3の陰極に接続する。
次に、印刷配線板10を、外部電源3の陽極と接続された一対の電極5の間で且つノズル40を備えた噴流装置4の間になるように、めっき液2が貯蔵されためっき槽1へ浸漬する。
このとき、印刷配線板10の表裏面はそれぞれ噴流装置4および電極5と対向する。
次に、表用の電極5と裏用の電極5に接続したそれぞれ別の外部電源3から印刷配線板10の表裏面に対して交互に電流を印加する。このとき、印刷配線板10の電流の印加された側の噴流装置4のノズル40からめっき液2が印刷配線板10の表面に吹き付けられ、表層にめっきが形成される。これを表裏面のそれぞれの方向から交互に繰り返すことにより、印刷配線板10の表層に均一な厚さのめっきが形成される。
A method for plating a printed wiring board according to the present invention will be described.
In order to perform the plating process on the printed wiring board 10 using the electrolytic plating apparatus 100, first, the upper portions of the front and back surfaces of the printed wiring board 10 on which chemical copper plating has been performed in advance are fixed with the clamps 70 of the jig 7. These are connected to the cathode of the external power source 3 by bus bars 6 provided on the front and back sides.
Next, the plating tank in which the plating solution 2 is stored so that the printed wiring board 10 is located between the pair of electrodes 5 connected to the anode of the external power source 3 and between the jet device 4 provided with the nozzle 40. Immerse into 1.
At this time, the front and back surfaces of the printed wiring board 10 face the jet device 4 and the electrode 5, respectively.
Next, a current is alternately applied to the front and back surfaces of the printed wiring board 10 from different external power sources 3 connected to the front electrode 5 and the back electrode 5. At this time, the plating solution 2 is sprayed onto the surface of the printed wiring board 10 from the nozzle 40 of the jet device 4 on the side to which the current of the printed wiring board 10 is applied, and plating is formed on the surface layer. By repeating this alternately from the front and back directions, plating with a uniform thickness is formed on the surface layer of the printed wiring board 10.

印刷配線板10の表裏でめっき面積が異なる場合においても、表裏でそれぞれ別の外部電源3を使用して、電流値を別々に制御すれば、表裏のめっき厚を揃えることができる。
また、表裏でめっき厚に疎密差がある場合、密の部分では、めっきレジスト(ドライフィルム)の密着が弱くなりめっき液が染み込み易い。そのため、めっき液の噴流量を調整すれば、密の部分のめっきレジストの形成部にめっき液が染み込むことなく、表裏のめっき厚を揃えることができる。
Even when the plating areas on the front and back sides of the printed wiring board 10 are different, if the current values are controlled separately by using different external power sources 3 on the front and back sides, the plating thicknesses on the front and back sides can be made uniform.
Further, when there is a difference in density between the front and back surfaces, the plating resist (dry film) is weakly adhered in the dense part and the plating solution is likely to penetrate. Therefore, if the jet flow of the plating solution is adjusted, the plating thickness of the front and back surfaces can be made uniform without causing the plating solution to permeate into the dense portion where the plating resist is formed.

印刷配線板10は表裏面を貫通するスルーホール9を有していてもよい。このスルーホール9内に均一なめっき厚を確保することに、電解めっき装置100は効果が高い。   The printed wiring board 10 may have through-holes 9 penetrating the front and back surfaces. The electrolytic plating apparatus 100 is highly effective in ensuring a uniform plating thickness in the through hole 9.

次に、印刷配線板10のスルーホール9へのめっき方法を説明する。なお、前述した印刷配線板10の表面へのめっき方法と同じ説明は省略する。
電解めっき装置100を用いて印刷配線板10のスルーホール9内にめっき処理する場合、まず、化学銅めっきを行う。このとき、印刷配線板10とスルーホール9内もめっきされる。
次に、印刷配線板10の端部側面の化学銅めっきを研磨などで除去し、印刷配線板10の表裏面の導通はスルーホール9のみにする。このように印刷配線板10の表裏面の導通をスルーホール9のみにすることで、印刷配線板10の端部側面から反対側に電流が回ることを防止し、スルーホール9に電解めっきの電流を集中させる。
次に、印刷配線板10の表裏面の上部を治具7のクランプ70で固定し、治具7の表裏に備えたブスバー6により、外部電源3の陰極に接続し、外部電源3の陽極と接続された一対の電極5の間で且つノズル40を備えた噴流装置4の間になるように、めっき液2が貯蔵されためっき槽1へ浸漬させる。
次に、表用の電極5と裏用の電極5に接続したそれぞれ別の外部電源3から印刷配線板10の表裏面に対して交互に電流を印加する。このとき、印刷配線板10の電流の印加された側の噴流装置4から、めっき液2がスルーホール9内に吹き付けられて、スルーホール9内にめっきが形成される。これを表裏面のそれぞれの方向から交互に繰り返すことにより、スルーホール9内に均一な厚さのめっきが形成される。このように、印刷配線板10の表裏面から交互に電流を印加することで、電流の両表面への集中を防止することができ、印刷配線板10の表面のめっき厚を抑えることができる。さらに、印刷配線板10の表裏面から交互にめっき液2を吹き付けることで、スルーホール9内でめっき液2が停滞することがなく循環し、スルーホール9内のめっき形成を促進する。
Next, a method for plating the printed wiring board 10 on the through hole 9 will be described. In addition, the description same as the plating method to the surface of the printed wiring board 10 mentioned above is abbreviate | omitted.
When plating in the through hole 9 of the printed wiring board 10 using the electrolytic plating apparatus 100, first, chemical copper plating is performed. At this time, the printed wiring board 10 and the through hole 9 are also plated.
Next, the chemical copper plating on the side surface of the end portion of the printed wiring board 10 is removed by polishing or the like, and the conduction on the front and back surfaces of the printed wiring board 10 is limited to the through hole 9 only. In this way, the conduction on the front and back surfaces of the printed wiring board 10 is limited to the through hole 9 only, so that current is prevented from flowing from the end side surface of the printed wiring board 10 to the opposite side. Concentrate.
Next, upper portions of the front and back surfaces of the printed wiring board 10 are fixed with clamps 70 of the jig 7 and connected to the cathode of the external power source 3 by the bus bar 6 provided on the front and back surfaces of the jig 7. It is immersed in the plating tank 1 in which the plating solution 2 is stored so as to be between the connected pair of electrodes 5 and between the jet device 4 provided with the nozzle 40.
Next, a current is alternately applied to the front and back surfaces of the printed wiring board 10 from different external power sources 3 connected to the front electrode 5 and the back electrode 5. At this time, the plating solution 2 is sprayed into the through hole 9 from the jet device 4 on the side to which the current of the printed wiring board 10 is applied, and plating is formed in the through hole 9. By repeating this alternately from the front and back directions, plating with a uniform thickness is formed in the through hole 9. In this way, by alternately applying current from the front and back surfaces of the printed wiring board 10, it is possible to prevent the current from being concentrated on both surfaces, and to suppress the plating thickness on the surface of the printed wiring board 10. Furthermore, by alternately spraying the plating solution 2 from the front and back surfaces of the printed wiring board 10, the plating solution 2 circulates in the through hole 9 without stagnation and promotes the formation of plating in the through hole 9.

スルーホール9内へのめっきの形成を、図3(a)〜(c)を用いて説明する。
図3(a)は印刷配線板10の表側から電流の印加とめっき液の噴流を行ったものである。このとき、スルーホール9内のめっき8は、断面が三角形状となり、スルーホール9の表側の開口付近はめっきが密であるが、裏側へかけてめっきが疎となっている。
次に、印刷配線板10の裏側から電流の印加とめっき液の噴流を行う。このとき、図3(b)に示すように、スルーホール9内のめっき8は、断面が三角形状となり、スルーホール9の裏側の開口付近はめっきが密であるが、表側へかけてめっきが疎となっていく。
この図3(a)および(b)に示す電流の印加とめっき液の噴流を交互に繰り返すと、図3(c)に示すように均一な厚みのめっき8を得ることができる。
The formation of plating in the through hole 9 will be described with reference to FIGS.
FIG. 3A shows a case where a current is applied and a plating solution is jetted from the front side of the printed wiring board 10. At this time, the plating 8 in the through hole 9 has a triangular cross section, and the plating is dense in the vicinity of the opening on the front side of the through hole 9, but the plating is sparse toward the back side.
Next, current is applied and a plating solution is jetted from the back side of the printed wiring board 10. At this time, as shown in FIG. 3B, the plating 8 in the through hole 9 has a triangular cross section, and the plating is dense in the vicinity of the opening on the back side of the through hole 9, but the plating is applied to the front side. It becomes sparse.
When the current application and the plating solution jet shown in FIGS. 3 (a) and 3 (b) are alternately repeated, plating 8 having a uniform thickness can be obtained as shown in FIG. 3 (c).

印刷配線板10の表裏面に対して、電流の印加とめっき液の噴流は、一定時間ごとに表裏を交互に切り替えて行うのがよく、この切り替え時間としては例えば5〜30分程度がよい。
切り替え時間が5分より短い場合、電流と噴流の切り替え頻度が上がるので、スルーホール9内のめっき厚が均一化するが、印刷配線板10の表裏面の表層のめっき厚のばらつきが増える。反対に、切り替え時間が30分より長い場合、印刷配線板10の表裏面の表層のめっき厚のばらつきは低下するが、スルーホール9内でのめっき厚のばらつきが増えてしまう。
The application of current and the jet of the plating solution to the front and back surfaces of the printed wiring board 10 are preferably performed by alternately switching the front and back at regular intervals, and the switching time is preferably about 5 to 30 minutes, for example.
When the switching time is shorter than 5 minutes, the frequency of switching between the current and the jet increases, so that the plating thickness in the through hole 9 becomes uniform, but the variation in the plating thickness on the front and back surfaces of the printed wiring board 10 increases. On the other hand, when the switching time is longer than 30 minutes, the variation in the plating thickness of the surface layer on the front and back surfaces of the printed wiring board 10 decreases, but the variation in the plating thickness in the through hole 9 increases.

めっき処理中に電流印加していない面に起きる可能性があるバイボーラ現象への対策として、図4に示すように、印刷配線板10の表裏面に対して、ブスバー6で一方の面に電流を印加している状態において、他方の面のブスバー6にも一方の面の5〜20%の電流を印加するとよい。このとき、電流は通常の直流めっきで使用する電流密度のレンジと同じでよく、例えば0.8〜3.0ASDであるのがよい。   As a countermeasure against a bipolar phenomenon that may occur on a surface to which no current is applied during the plating process, a current is applied to one surface with a bus bar 6 with respect to the front and back surfaces of the printed wiring board 10 as shown in FIG. In the applied state, a current of 5 to 20% of one surface may be applied to the bus bar 6 on the other surface. At this time, the current may be the same as the current density range used in normal DC plating, and is preferably 0.8 to 3.0 ASD, for example.

以上のように、この印刷配線板のめっき方法によると、既存のめっき装置を活用した直流めっき法で製造できるので、パルスめっき法に対応した新規設備導入などの必要がなく、コスト増を抑制できる。   As described above, according to the plating method of this printed wiring board, since it can be manufactured by the direct current plating method utilizing the existing plating apparatus, it is not necessary to introduce new equipment corresponding to the pulse plating method, and the cost increase can be suppressed. .

1 めっき槽
2 めっき液
3 外部電源(整流器)
4 噴流装置
5 電極
6 ブスバー
7 治具
8 めっき
9 スルーホール
10 印刷配線板
40 ノズル
70 クランプ
100 電解めっき装置
1 Plating tank 2 Plating solution 3 External power supply (rectifier)
DESCRIPTION OF SYMBOLS 4 Jet apparatus 5 Electrode 6 Bus bar 7 Jig 8 Plating 9 Through hole 10 Printed wiring board 40 Nozzle 70 Clamp 100 Electrolytic plating apparatus

Claims (6)

印刷配線板を電解めっきするめっき方法であって、印刷配線板の表裏面に対して、それぞれ電流を印加し且つ噴流装置からめっき液を噴流することを交互に行うことを特徴とする印刷配線板のめっき方法。   A plating method for electrolytically plating a printed wiring board, wherein a current is applied to each of the front and back surfaces of the printed wiring board and a plating solution is jetted from a jetting device alternately. Plating method. 一方の面から電流を印加している状態において、他方の面からも一方の面の5〜20%の電流を印加する請求項1に記載の印刷配線板のめっき方法。   The method for plating a printed wiring board according to claim 1, wherein a current of 5 to 20% of one surface is applied also from the other surface in a state where a current is applied from one surface. 前記印刷配線板がスルーホールを有し、このスルーホール内を電解めっきする請求項1または2に記載の印刷配線板のめっき方法。   The method for plating a printed wiring board according to claim 1 or 2, wherein the printed wiring board has a through hole, and the inside of the through hole is electrolytically plated. めっき液が貯蔵されためっき槽と、
前記めっき液に浸漬され且つ表裏面がそれぞれ外部電源の陰極と電気的に接続される被めっき物である印刷配線板と
前記印刷配線板の表裏面にそれぞれ対向配置し且つ前記外部電源の陽極に電気的に接続された2つの電極と、
前記印刷配線板と前記電極との間において、前記印刷配線板と対向配置しためっき液の噴流装置とを備え、
前記印刷配線板の表裏面に対して、交互に前記外部電源から電流を流し且つ前記噴流装置からめっき液を噴流することを特徴とする電解めっき装置。
A plating tank in which a plating solution is stored;
A printed wiring board, which is an object to be plated, immersed in the plating solution and whose front and back surfaces are electrically connected to the cathode of the external power source, respectively, and opposed to the front and back surfaces of the printed wiring board and to the anode of the external power source Two electrically connected electrodes;
Between the printed wiring board and the electrode, comprising a plating solution jetting device disposed opposite to the printed wiring board,
An electroplating apparatus, wherein current is alternately supplied from the external power source to the front and back surfaces of the printed wiring board, and a plating solution is jetted from the jet device.
前記印刷配線板の上部が治具で挟持して固定され、この治具が表裏で別々のブスバーを有する請求項4に記載の電解めっき装置。   The upper part of the said printed wiring board is clamped and fixed with a jig | tool, This jig | tool has a separate bus bar in the front and back, The electroplating apparatus of Claim 4. 前記印刷配線板がスルーホールを有し、このスルーホール内を電解めっきする請求項4または5に記載の電解めっき装置。   The electrolytic plating apparatus according to claim 4 or 5, wherein the printed wiring board has a through hole, and the inside of the through hole is subjected to electrolytic plating.
JP2016032380A 2016-02-23 2016-02-23 Plating method and plating apparatus for printed wiring board Pending JP2017152492A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2016032380A JP2017152492A (en) 2016-02-23 2016-02-23 Plating method and plating apparatus for printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016032380A JP2017152492A (en) 2016-02-23 2016-02-23 Plating method and plating apparatus for printed wiring board

Publications (1)

Publication Number Publication Date
JP2017152492A true JP2017152492A (en) 2017-08-31

Family

ID=59739744

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016032380A Pending JP2017152492A (en) 2016-02-23 2016-02-23 Plating method and plating apparatus for printed wiring board

Country Status (1)

Country Link
JP (1) JP2017152492A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023504254A (en) * 2019-11-27 2023-02-02 ワイエムティー カンパニー リミテッド Method for filling through holes in circuit board and circuit board using the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023504254A (en) * 2019-11-27 2023-02-02 ワイエムティー カンパニー リミテッド Method for filling through holes in circuit board and circuit board using the same
JP7438578B2 (en) 2019-11-27 2024-02-27 ワイエムティー カンパニー リミテッド Method for filling through holes in a circuit board and circuit board using the same

Similar Documents

Publication Publication Date Title
US6524461B2 (en) Electrodeposition of metals in small recesses using modulated electric fields
JP5078142B2 (en) Electrical treatment for filling metal in through holes, especially electrical treatment for filling copper in printed circuit board through holes
US10306768B2 (en) Method for manufacturing traces of PCB
US6783654B2 (en) Electrolytic plating method and device for a wiring board
US10851464B1 (en) Method for producing chromium plated parts, and chromium plating apparatus
JP6448494B2 (en) Suction plating equipment
CN114642084A (en) Single step electrolytic process for filling vias in printed circuit boards and other substrates
JP2010138483A (en) Shielding plate and electroplating device
KR20150093620A (en) Electroplating methods for semiconductor substrates
JP2017152492A (en) Plating method and plating apparatus for printed wiring board
KR102381835B1 (en) Anode for electrolytic copper plating and electrolytic copper plating apparatus using same
US20200181791A1 (en) Gold electroplating solution and method
CN104073845A (en) Gold plating method for PCB
JP4428299B2 (en) Plating equipment
EP4359588A1 (en) Complex waveform for electrolytic plating
US3645855A (en) Ultrasonic repair plating of microscopic interconnections
CN105862097B (en) HDI plate through-holes based on pulse technique fill out copper system system
KR20150055254A (en) Method and apparatus for electroplating
US20200402851A1 (en) Roughening of a Metallization Layer on a Semiconductor Wafer
JP2015129330A (en) Electrolytic treatment method and device
US20090047783A1 (en) Method of removing unwanted plated or conductive material from a substrate, and method of enabling metallization of a substrate using same
TWI355219B (en) Micro-etching process of pcb without causing galva
JPS6277494A (en) Plating device for printed circuit board
JPH0819546B2 (en) Electroplating method
KR20240008885A (en) Single-step electrolytic method for filling through holes in printed circuit boards and other substrates