JP2017149994A5 - - Google Patents
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- Publication number
- JP2017149994A5 JP2017149994A5 JP2017114636A JP2017114636A JP2017149994A5 JP 2017149994 A5 JP2017149994 A5 JP 2017149994A5 JP 2017114636 A JP2017114636 A JP 2017114636A JP 2017114636 A JP2017114636 A JP 2017114636A JP 2017149994 A5 JP2017149994 A5 JP 2017149994A5
- Authority
- JP
- Japan
- Prior art keywords
- acrylate
- methacrylate
- norbornyl
- methacrylic acid
- resin composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- -1 alicyclic acrylic acids Chemical class 0.000 claims 15
- 238000004519 manufacturing process Methods 0.000 claims 7
- 239000000178 monomer Substances 0.000 claims 7
- 239000011342 resin composition Substances 0.000 claims 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid Chemical compound OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 3
- 125000003700 epoxy group Chemical group 0.000 claims 3
- 239000003505 polymerization initiator Substances 0.000 claims 3
- 238000006116 polymerization reaction Methods 0.000 claims 3
- 125000005396 acrylic acid ester group Chemical group 0.000 claims 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims 2
- 125000005397 methacrylic acid ester group Chemical group 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- 238000010526 radical polymerization reaction Methods 0.000 claims 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 claims 1
- NOOLISFMXDJSKH-KXUCPTDWSA-N (-)-(1R,3R,4S)-menthol Chemical group CC(C)[C@@H]1CC[C@@H](C)C[C@H]1O NOOLISFMXDJSKH-KXUCPTDWSA-N 0.000 claims 1
- APAUNQLFVGBQQW-UHFFFAOYSA-N (1,2,2-trimethylcyclohexyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1(C)CCCCC1(C)C APAUNQLFVGBQQW-UHFFFAOYSA-N 0.000 claims 1
- IAXXETNIOYFMLW-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) 2-methylprop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C(=C)C)CC1C2(C)C IAXXETNIOYFMLW-UHFFFAOYSA-N 0.000 claims 1
- XJBRSZAYOKVFRH-UHFFFAOYSA-N (5-methyl-2-propan-2-ylcyclohexyl) prop-2-enoate Chemical compound CC(C)C1CCC(C)CC1OC(=O)C=C XJBRSZAYOKVFRH-UHFFFAOYSA-N 0.000 claims 1
- PHPRWKJDGHSJMI-UHFFFAOYSA-N 1-adamantyl prop-2-enoate Chemical compound C1C(C2)CC3CC2CC1(OC(=O)C=C)C3 PHPRWKJDGHSJMI-UHFFFAOYSA-N 0.000 claims 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 claims 1
- DJKKWVGWYCKUFC-UHFFFAOYSA-N 2-butoxyethyl 2-methylprop-2-enoate Chemical compound CCCCOCCOC(=O)C(C)=C DJKKWVGWYCKUFC-UHFFFAOYSA-N 0.000 claims 1
- PTJDGKYFJYEAOK-UHFFFAOYSA-N 2-butoxyethyl prop-2-enoate Chemical compound CCCCOCCOC(=O)C=C PTJDGKYFJYEAOK-UHFFFAOYSA-N 0.000 claims 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N 2-methyl-2-propenoic acid methyl ester Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims 1
- JOYHLVPQLYPBQF-UHFFFAOYSA-N 2-methylprop-2-enoic acid;propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(O)=O.CCCOC(=O)C(C)=C JOYHLVPQLYPBQF-UHFFFAOYSA-N 0.000 claims 1
- WGUJUIMHWNHXGB-UHFFFAOYSA-N 4-bicyclo[2.2.1]heptanyl prop-2-enoate Chemical compound C1CC2CCC1(OC(=O)C=C)C2 WGUJUIMHWNHXGB-UHFFFAOYSA-N 0.000 claims 1
- 229940119545 Isobornyl methacrylate Drugs 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 claims 1
- SOGAXMICEFXMKE-UHFFFAOYSA-N butyl 2-methylprop-2-enoate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 claims 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims 1
- CWTMXRBURASPSI-UHFFFAOYSA-N cyclodecyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCCCCCC1 CWTMXRBURASPSI-UHFFFAOYSA-N 0.000 claims 1
- XFZPHNSTUATEEQ-UHFFFAOYSA-N cyclodecyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCCCCCC1 XFZPHNSTUATEEQ-UHFFFAOYSA-N 0.000 claims 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 claims 1
- WRAABIJFUKKEJQ-UHFFFAOYSA-N cyclopentyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCC1 WRAABIJFUKKEJQ-UHFFFAOYSA-N 0.000 claims 1
- BTQLDZMOTPTCGG-UHFFFAOYSA-N cyclopentyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCC1 BTQLDZMOTPTCGG-UHFFFAOYSA-N 0.000 claims 1
- 239000006185 dispersion Substances 0.000 claims 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 claims 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N dodecyl prop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 claims 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims 1
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 claims 1
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 claims 1
- FSAJWMJJORKPKS-UHFFFAOYSA-N octadecyl prop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C=C FSAJWMJJORKPKS-UHFFFAOYSA-N 0.000 claims 1
- GYDSPAVLTMAXHT-UHFFFAOYSA-N pentyl 2-methylprop-2-enoate Chemical compound CCCCCOC(=O)C(C)=C GYDSPAVLTMAXHT-UHFFFAOYSA-N 0.000 claims 1
- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 claims 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 claims 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 claims 1
- 239000007870 radical polymerization initiator Substances 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 238000003756 stirring Methods 0.000 claims 1
- 238000010558 suspension polymerization method Methods 0.000 claims 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Claims (6)
前記単量体の1種として、エポキシ基含有モノマを含み、
他の前記単量体が、アクリル酸エステル類、メタクリル酸エステル類及び脂環式類アクリル酸からなる群より選ばれる少なくとも1種を含み、
ただし前記単量体は、アクリロニトリルを含まず、
前記重合反応が懸濁重合法を用いて行われ、単量体、重合開始剤及び水を加えて得られた分散液に、加熱撹拌しながら、前記エポキシ基含有モノマを連続添加又は間隔を空けて何回かに分けての添加を行う工程を備える、樹脂組成物の製造方法。 A method for producing a resin composition in which a monomer mixture containing two or more types of monomers and a polymerization initiator is subjected to a polymerization reaction,
As one of the monomers, an epoxy group-containing monomer is included,
The other monomer includes at least one selected from the group consisting of acrylic acid esters, methacrylic acid esters, and alicyclic acrylic acids,
However, the monomer does not contain acrylonitrile,
The polymerization reaction is performed using a suspension polymerization method, and the epoxy group-containing monomer is continuously added to the dispersion obtained by adding a monomer, a polymerization initiator, and water with stirring, or at intervals. A method for producing a resin composition, comprising a step of performing addition in several times.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017114636A JP6447665B2 (en) | 2017-06-09 | 2017-06-09 | Method for producing resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017114636A JP6447665B2 (en) | 2017-06-09 | 2017-06-09 | Method for producing resin composition |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015208744A Division JP6278023B2 (en) | 2015-10-23 | 2015-10-23 | Method for producing resin composition |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2017149994A JP2017149994A (en) | 2017-08-31 |
JP2017149994A5 true JP2017149994A5 (en) | 2017-11-02 |
JP6447665B2 JP6447665B2 (en) | 2019-01-09 |
Family
ID=59741667
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017114636A Active JP6447665B2 (en) | 2017-06-09 | 2017-06-09 | Method for producing resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP6447665B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102377565B1 (en) * | 2018-12-13 | 2022-03-21 | 주식회사 엘지화학 | Acryl based copolymer, method for preparing the same and acryl based copolymer composition comprising the acryl based copolymer |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61266418A (en) * | 1985-05-20 | 1986-11-26 | Sekisui Plastics Co Ltd | Production of styrene copolymer |
JPS6274909A (en) * | 1985-09-30 | 1987-04-06 | Dainippon Ink & Chem Inc | Production of transparent heat-resistant copolymer |
JP2004155810A (en) * | 2002-11-01 | 2004-06-03 | Hitachi Chem Co Ltd | Pseudo-crosslinked resin composition, molding and optical part molded from the same, and method for producing the same resin composition |
JP5391590B2 (en) * | 2008-06-26 | 2014-01-15 | 日立化成株式会社 | Method for producing acrylic copolymer |
JP5298704B2 (en) * | 2008-08-26 | 2013-09-25 | 日立化成株式会社 | Acrylic resin composition |
JP5768318B2 (en) * | 2009-12-16 | 2015-08-26 | 東ソー株式会社 | Vinyl chloride resin latex and method for producing the same |
-
2017
- 2017-06-09 JP JP2017114636A patent/JP6447665B2/en active Active
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