JP2017139062A - Method for manufacturing electrode for organic el device, and method for manufacturing organic el device - Google Patents
Method for manufacturing electrode for organic el device, and method for manufacturing organic el device Download PDFInfo
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Abstract
Description
本発明は、有機EL素子用電極の製造方法、および有機EL素子の製造方法に関する。 The present invention relates to a method for producing an electrode for an organic EL element, and a method for producing an organic EL element.
有機エレクトロルミネッセンス素子(以下、有機EL素子という)は自発光素子として、ディスプレイ等の映像表示装置や面光源として用いられている。そして、このような有機EL素子は、一般的には、ガラス基板、透明プラスチックフィルム等の透光性支持基板上に陽極である透光性電極と、発光層を含む有機層と、陰極である金属電極を順に積層して作製されるものである。発光層を含む有機層は、ホール注入層、ホール輸送層、発光層、電子輸送層、電子注入層を有する。ホール注入層は透光性電極(陽極)側に位置し、電子注入層は、陰極(金属電極)側に位置する。
透光性電極と金属電極との間で印加された電圧により、陰極から供給された電子と陽極から供給されたホールとが有機層で再結合し、これに伴って生成される励起子が励起状態から基底状態へ移行する際にEL発光する。EL発光した光は透明電極を透過し、透明支持基板の側から外部に取り出される。
Organic electroluminescence elements (hereinafter referred to as organic EL elements) are used as self-luminous elements as video display devices such as displays and as surface light sources. Such an organic EL element is generally a translucent electrode as an anode on a translucent support substrate such as a glass substrate or a transparent plastic film, an organic layer including a light emitting layer, and a cathode. It is manufactured by sequentially laminating metal electrodes. The organic layer including the light emitting layer includes a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, and an electron injection layer. The hole injection layer is located on the translucent electrode (anode) side, and the electron injection layer is located on the cathode (metal electrode) side.
Due to the voltage applied between the translucent electrode and the metal electrode, the electrons supplied from the cathode and the holes supplied from the anode are recombined in the organic layer, and the excitons generated thereby are excited. EL light is emitted when transitioning from a state to a ground state. The light emitted from the EL is transmitted through the transparent electrode and taken out from the transparent support substrate side.
しかしながら、このような有機EL素子においては、発光層を含む有機層で生じた光を外部に十分に取り出すことができないという問題があった。すなわち、発光層を含む有機層で生じた光のうちその多くは、素子の内部において多重反射を繰り返すうちに熱になって消えてしまうか、或いは、素子内部を導波して素子端部から出射してしまうため、十分な外部取り出し効率を達成することができないという問題があった。そのため、近年では、有機EL素子の分野において、凹凸形状が形成された電極による回折効果を利用して外部への光の取り出し効率を向上させること等が提案されてきた。 However, such an organic EL element has a problem that light generated in the organic layer including the light emitting layer cannot be sufficiently extracted to the outside. That is, most of the light generated in the organic layer including the light-emitting layer disappears due to heat while repeating multiple reflections inside the element, or is guided from the end of the element through the inside of the element. Since the light is emitted, there is a problem that sufficient external extraction efficiency cannot be achieved. Therefore, in recent years, in the field of organic EL elements, it has been proposed to improve the efficiency of extracting light to the outside by using the diffraction effect by the electrode having the concavo-convex shape.
金属微粒子が誘電体層内部に分散された金属微粒子層を、発光層と電子輸送層との間や発光層と正孔輸送層との間に設け、発光層からの光が金属微粒子層内を伝搬する際、プラズモン共鳴を励起させ、高効率で光を外部に取り出す技術が考案されている(特許文献1)。
その他、周期格子構造による表面プラズモン共鳴を利用して、発光効率を向上する技術が開示されている(特許文献2〜特許文献9)。
A metal fine particle layer in which metal fine particles are dispersed inside the dielectric layer is provided between the light emitting layer and the electron transport layer, or between the light emitting layer and the hole transport layer, and light from the light emitting layer passes through the metal fine particle layer. A technology has been devised that excites plasmon resonance when propagating and takes out light outside with high efficiency (Patent Document 1).
In addition, a technique for improving luminous efficiency by utilizing surface plasmon resonance by a periodic grating structure is disclosed (Patent Documents 2 to 9).
これらの先行文献では周期格子構造を作製する方法として、フォトリソグラフィー、電子ビームリソグラフィー、機械式切削加工、レーザー加工、二光束干渉露光、縮小露光などが用いられる。しかし、二光束干渉露光を除いてこれらの手法は大面積に周期格子構造を作製するのに適さないため、工業的な利用面において面積の制約を受ける。また、二光束干渉露光による周期格子構造作製も、ある程度の大面積は作製可能であるが、一辺が数cm以上の大面積の場合は光学セットアップ全体に対する振動、風、熱収縮・膨張、空気の揺らぎ、電圧変動、等々の様々な外乱因子が影響して、均一で正確な周期格子構造を作製することはきわめて困難である。また、粒子単層膜をエッチングマスクとしたドライエッチング法による周期格子構造作製も、単層膜作製装置やエッチング装置が必須であり大面積化やコスト面での生産性が低いという課題がある。 In these prior documents, photolithography, electron beam lithography, mechanical cutting, laser processing, two-beam interference exposure, reduced exposure, and the like are used as methods for producing a periodic grating structure. However, except for two-beam interference exposure, these methods are not suitable for producing a periodic grating structure in a large area, and thus are limited in terms of industrial use. In addition, periodic grating structure fabrication by two-beam interference exposure can also be fabricated to a certain large area, but in the case of a large area with a side of several centimeters or more, vibration, wind, thermal contraction / expansion of the entire optical setup, It is extremely difficult to produce a uniform and accurate periodic grating structure due to various disturbance factors such as fluctuations, voltage fluctuations, and the like. In addition, the production of a periodic grating structure by a dry etching method using a particle monolayer film as an etching mask also has a problem that a monolayer film production apparatus and an etching apparatus are indispensable, resulting in a large area and low cost productivity.
本発明は、上記記載の従来技術の有する課題を鑑みてなされたものであり、素子内の短絡を誘引することがなく、より高い光取出し効率を達成することが可能な有機EL素子を提供することを目的とする。 The present invention has been made in view of the above-described problems of the prior art, and provides an organic EL device capable of achieving higher light extraction efficiency without inducing a short circuit in the device. For the purpose.
本発明者らは、前記問題を解決するため鋭意検討した結果、本発明に至った。
すなわち、本発明は、下記工程(1)〜(5)を含む有機EL素子用電極の製造方法である。
(1)分散体の平均粒子径が100〜500nmであり、変動係数が30%以下の有機粒子Aの分散体、無機粒子Bの分散体、および活性エネルギー線硬化性成分Cを混合してなる活性エネルギー線硬化性組成物であって、前記有機粒子Aの分散体中の有機粒子Aの平均粒子径が、前記無機粒子Bの分散体中の無機粒子Bの平均粒子径よりも大きい活性エネルギー線硬化性組成物を用意する工程。
(2)前記活性エネルギー線硬化性組成物を支持基板に塗工した後、乾燥し、前記有機粒子Aに起因する凸部を表面に有する活性エネルギー線硬化性膜Xであって、前記有機粒子Aの分散体中の有機粒子Aの平均粒子径の2〜20倍の厚みの活性エネルギー線硬化性膜Xを形成する工程。
(3)前記活性エネルギー線硬化性膜Xに活性エネルギー線を照射し、硬化膜Yを形成する工程。
(4)次いで、加熱し、前記硬化膜Yの表面の凸部を、その淵部を残すように破壊し、凹部を形成して、200〜450nmの間隔の凹凸の占める割合が30%以上である、硬化膜Zを得る工程。
(5)前記硬化膜Z上に金属を蒸着する工程。
As a result of intensive studies to solve the above problems, the present inventors have reached the present invention.
That is, this invention is a manufacturing method of the electrode for organic EL elements containing following process (1)-(5).
(1) An average particle size of the dispersion is 100 to 500 nm, and a dispersion of organic particles A having a coefficient of variation of 30% or less, a dispersion of inorganic particles B, and an active energy ray-curable component C are mixed. An active energy ray-curable composition, wherein the average particle size of the organic particles A in the dispersion of the organic particles A is larger than the average particle size of the inorganic particles B in the dispersion of the inorganic particles B A step of preparing a linear curable composition.
(2) The active energy ray-curable film X, which is coated with the active energy ray-curable composition on a support substrate and then dried and has convex portions due to the organic particles A on the surface, the organic particles A step of forming an active energy ray-curable film X having a thickness of 2 to 20 times the average particle diameter of the organic particles A in the dispersion of A.
(3) A step of irradiating the active energy ray-curable film X with active energy rays to form a cured film Y.
(4) Next, the surface of the cured film Y is heated to break the convex portions so as to leave the ridges, and the concave portions are formed, and the proportion of the concaves and convexes with an interval of 200 to 450 nm is 30% or more. A step of obtaining a cured film Z.
(5) A step of depositing a metal on the cured film Z.
硬化膜Zの凹凸の平均高さが10〜100nmである、請求項1記載の有機EL用素子電極の製造方法である。 It is a manufacturing method of the element electrode for organic EL of Claim 1 whose average height of the unevenness | corrugation of the cured film Z is 10-100 nm.
無機粒子Bの分散体の平均粒子径が5〜50nmである、請求項1または2記載の有機EL用素子電極の製造方法。 The manufacturing method of the element electrode for organic EL of Claim 1 or 2 whose average particle diameter of the dispersion | distribution of the inorganic particle B is 5-50 nm.
また、本発明は、下記工程(1)〜(8)を含む有機EL素子の製造方法に関する。
(1)分散体の平均粒子径が100〜500nmであり、変動係数が30%以下の有機粒子Aの分散体、無機粒子Bの分散体、および活性エネルギー線硬化性成分Cを混合してなる活性エネルギー線硬化性組成物であって、前記有機粒子Aの分散体中の有機粒子Aの平均粒子径が、前記無機粒子Bの分散体中の無機粒子Bの平均粒子径よりも大きい活性エネルギー線硬化性組成物を用意する工程。
(2)前記活性エネルギー線硬化性組成物を支持基板に塗工した後、乾燥し、前記有機粒子Aに起因する凸部を表面に有する活性エネルギー線硬化性膜Xであって、前記有機粒子Aの分散体中の有機粒子Aの平均粒子径の2〜20倍の厚みの活性エネルギー線硬化性膜Xを形成する工程。
(3)前記活性エネルギー線硬化性膜Xに活性エネルギー線を照射し、硬化膜Yを形成する工程。
(4)次いで、加熱し、前記硬化膜Yの表面の凸部を、その淵部を残すように破壊し、凹部を形成して、200〜450nmの間隔の凹凸の占める割合が30%以上である、硬化膜Zを得る工程。
(5)前記硬化膜Z上に金属を蒸着し、有機EL用素子電極を製造する工程。
(6)前記有機EL用電極上に、発光層を含む有機層を形成する工程。
(7)前記発光層を含む有機層上に、透明電極を形成する工程。
(8)接着剤を用いて前記透明電極上に、透明支持基板に貼り付ける工程。
Moreover, this invention relates to the manufacturing method of the organic EL element containing following process (1)-(8).
(1) An average particle size of the dispersion is 100 to 500 nm, and a dispersion of organic particles A having a coefficient of variation of 30% or less, a dispersion of inorganic particles B, and an active energy ray-curable component C are mixed. An active energy ray-curable composition, wherein the average particle size of the organic particles A in the dispersion of the organic particles A is larger than the average particle size of the inorganic particles B in the dispersion of the inorganic particles B A step of preparing a linear curable composition.
(2) The active energy ray-curable film X, which is coated with the active energy ray-curable composition on a support substrate and then dried and has convex portions due to the organic particles A on the surface, the organic particles A step of forming an active energy ray-curable film X having a thickness of 2 to 20 times the average particle diameter of the organic particles A in the dispersion of A.
(3) A step of irradiating the active energy ray-curable film X with active energy rays to form a cured film Y.
(4) Next, the surface of the cured film Y is heated to break the convex portions so as to leave the ridges, and the concave portions are formed, and the proportion of the concaves and convexes with an interval of 200 to 450 nm is 30% or more. A step of obtaining a cured film Z.
(5) A step of manufacturing a device electrode for organic EL by depositing a metal on the cured film Z.
(6) A step of forming an organic layer including a light emitting layer on the organic EL electrode.
(7) A step of forming a transparent electrode on the organic layer including the light emitting layer.
(8) The process of sticking on a transparent support substrate on the said transparent electrode using an adhesive agent.
本発明により、素子内の短絡を誘引することがなく、より高い光取出し効率を達成することが可能な有機EL素子提供のための電極を簡便な方法で得ることができる。 According to the present invention, an electrode for providing an organic EL device capable of achieving higher light extraction efficiency without inducing a short circuit in the device can be obtained by a simple method.
以下に本発明の実施の形態を詳細に説明するが、以下に記載する構成要件の説明は、本発明の実施態様の一例(代表例)であり、本発明はその要旨を超えない限りこれらの内容に特定されない。 Embodiments of the present invention will be described in detail below, but the description of the constituent elements described below is an example (representative example) of an embodiment of the present invention, and the present invention does not exceed the gist thereof. Not specific to the content.
<有機粒子A>
有機粒子Aについて説明する。
有機粒子Aとしては、ポリアクリレートビーズ、ポリメタクリレートビーズ、アクリル−スチレン共重合体ビーズ、メラミン樹脂ビーズ、ポリカーボネートビーズ、架橋ポリスチレンビーズ、ポリ塩化ビニルビーズ、およびベンゾグアナミン−メラミンホルムアルデヒド縮合物ビーズ等が用いられるが、必ずしもこれらに限定されるものではない。
<Organic particle A>
The organic particles A will be described.
As the organic particles A, polyacrylate beads, polymethacrylate beads, acrylic-styrene copolymer beads, melamine resin beads, polycarbonate beads, crosslinked polystyrene beads, polyvinyl chloride beads, benzoguanamine-melamine formaldehyde condensate beads, and the like are used. However, it is not necessarily limited to these.
有機粒子Aは、種々の方法で得ることができ、分散体の状態で得ることができる。例えば乳化重合(この中の一態様にソープフリー乳化重合がある)、分散重合、懸濁重合、シード重合などが挙げられる。中でも、乳化重合、分散重合は粒度分布が比較的狭いものとなり、本発明における波長依存性の低減に寄与するため好ましい。また、種々の(メタ)アクリレートを含有させた重合体とすることで、立体反発による分散性を付与することが出来る。 The organic particles A can be obtained by various methods, and can be obtained in a dispersion state. Examples thereof include emulsion polymerization (one embodiment of which is soap-free emulsion polymerization), dispersion polymerization, suspension polymerization, seed polymerization and the like. Among these, emulsion polymerization and dispersion polymerization are preferable because they have a relatively narrow particle size distribution and contribute to the reduction of wavelength dependency in the present invention. Moreover, the dispersibility by steric repulsion can be provided by setting it as the polymer containing various (meth) acrylates.
上記のようにして得られる有機粒子Aの分散体の平均粒子径は、後述する無機粒子Bの分散体中の無機粒子Bの平均粒子径よりも大きいことが重要である。具体的には有機粒子Aの分散体の平均粒子径は、100〜500nmであることが好ましい。後述の硬化膜Zが有する凹凸の形状は、有機粒子Aの分散体の平均粒子径によって制御できる。有機粒子Aの分散体の平均粒子径は、100nm以上とすることで可視光波長に対する凹凸平均間隔を制御することができ、500nm以下とすることで回折効果に必要な回折角を確保することができる。好ましくは、100nm〜450nmであり、さらに好ましくは150nm〜370nmである。 It is important that the average particle size of the dispersion of organic particles A obtained as described above is larger than the average particle size of the inorganic particles B in the dispersion of inorganic particles B described later. Specifically, the average particle size of the dispersion of organic particles A is preferably 100 to 500 nm. The uneven shape of the cured film Z to be described later can be controlled by the average particle diameter of the dispersion of organic particles A. By setting the average particle diameter of the dispersion of organic particles A to 100 nm or more, the uneven average interval with respect to the visible light wavelength can be controlled, and by setting the average particle diameter to 500 nm or less, a diffraction angle necessary for the diffraction effect can be secured. it can. Preferably, it is 100 nm-450 nm, More preferably, it is 150 nm-370 nm.
本明細書において、有機粒子Aの分散体の「平均粒子径」とは、後述の平均1次粒子径とは異なり、凝集による2次粒子の粒子径を加味した分散粒径のことである。これは動的光散乱法によって求めることが出来る。ここで、平均1次粒子径と区別する理由は、同じ平均1次粒子径の有機粒子Aを用いた場合であっても、有機粒子Aの分散状態により、平均粒子径および粒度分布は異なる場合があるためである。
「平均粒子径」は測定サンプルの50体積%における分散粒径の値である。これらは動的光散乱法では日機装(株)社製「ナノトラックUPA」で測定することができる。
In the present specification, the “average particle size” of the dispersion of organic particles A is a dispersed particle size in consideration of the particle size of secondary particles due to aggregation, unlike the average primary particle size described later. This can be determined by the dynamic light scattering method. Here, even if the organic particles A having the same average primary particle size are used, the average primary particle size and the particle size distribution are different depending on the dispersion state of the organic particles A. Because there is.
“Average particle size” is the value of the dispersed particle size at 50% by volume of the measurement sample. These can be measured by “Nanotrack UPA” manufactured by Nikkiso Co., Ltd. in the dynamic light scattering method.
有機粒子Aの粒度分布としては、変動係数が30%以下であることが好ましい。「変動係数」とは、粒子径の標準偏差を平均粒子径で除した値の百分率で表されるものであり、平均粒子径に対するばらつきの大きさの指標となる。
変動係数が30%より大きいと、粒径のバラつきが大きくなり、所定の凹凸形状が得られなくなる場合がある。より好ましくは変動係数が20%以下である。
As the particle size distribution of the organic particles A, the coefficient of variation is preferably 30% or less. The “variation coefficient” is expressed as a percentage of a value obtained by dividing the standard deviation of the particle diameter by the average particle diameter, and is an index of the degree of variation with respect to the average particle diameter.
If the coefficient of variation is larger than 30%, the variation in particle size increases, and a predetermined uneven shape may not be obtained. More preferably, the coefficient of variation is 20% or less.
有機粒子Aの分散体は、予め溶剤に分散した分散液を用いることが好ましい。また、その際、界面活性剤など分散を安定化させる添加剤を加えてもよい。 As the dispersion of the organic particles A, a dispersion liquid previously dispersed in a solvent is preferably used. At that time, an additive such as a surfactant for stabilizing the dispersion may be added.
<無機粒子B>
硬化性膜X、硬化膜Yおよび硬化膜Zは、無機粒子Bを含む。無機粒子Bは、有機粒子Aと凝集がおきず、活性エネルギー線硬化性組成物、硬化性膜X、硬化膜Yおよび硬化膜Z中に均一に分散していることが望ましい。
無機粒子Bは、硬化膜Zを形成する際、表面近傍に位置する有機粒子Aの破壊・分解を促進する機能を担う。
無機粒子Bとしては、具体的には、酸化チタン(TiO2)、酸化ジルコニウム(ZrO2)、酸化セリウム(CeO2)、酸化ハフニウム(HfO2)、五酸化ニオブ(Nb2O5)、五酸化タンタル(Ta2O5)、酸化インジウム(In2O3)、酸化スズ(SnO2)、酸化インジウムスズ(ITO)、酸化亜鉛(ZnO)から成る群から選択された少なくとも1種の材料から成る粒子が挙げられるが、必ずしもこれらに限定されるものではない。
酸化チタン(TiO2)、および酸化ジルコニウム(ZrO2)は分散性の観点から特に好ましい。
<Inorganic particles B>
The curable film X, the cured film Y, and the cured film Z include inorganic particles B. It is desirable that the inorganic particles B do not aggregate with the organic particles A and are uniformly dispersed in the active energy ray-curable composition, the curable film X, the cured film Y, and the cured film Z.
When forming the cured film Z, the inorganic particles B have a function of promoting the destruction and decomposition of the organic particles A located in the vicinity of the surface.
Specifically, as the inorganic particles B, titanium oxide (TiO 2 ), zirconium oxide (ZrO 2 ), cerium oxide (CeO 2 ), hafnium oxide (HfO 2 ), niobium pentoxide (Nb 2 O 5 ), five From at least one material selected from the group consisting of tantalum oxide (Ta 2 O 5 ), indium oxide (In 2 O 3 ), tin oxide (SnO 2 ), indium tin oxide (ITO), and zinc oxide (ZnO). Particles, but not necessarily limited to these.
Titanium oxide (TiO 2 ) and zirconium oxide (ZrO 2 ) are particularly preferable from the viewpoint of dispersibility.
硬化膜Zに所定の凹凸を形成するためには、無機粒子Bの粒子間に強い凝集がないことが好ましい。そのため、無機粒子Bの平均1次粒子径は100nm以下が好ましく、さらに好ましくは5〜50nmである。
本明細書における「平均1次粒子径」とは凝集を加味しない個々の粒子径のことを示し、例えば、透過型電子顕微鏡(TEM)または走査型電子顕微鏡(SEM)などを用いて実測した50個の粒子直径の平均値である。
In order to form predetermined irregularities on the cured film Z, it is preferable that there is no strong aggregation between the inorganic particles B. Therefore, the average primary particle diameter of the inorganic particles B is preferably 100 nm or less, more preferably 5 to 50 nm.
The “average primary particle diameter” in the present specification means an individual particle diameter not taking aggregation into account, and is, for example, 50 actually measured using a transmission electron microscope (TEM) or a scanning electron microscope (SEM). It is the average value of the particle diameter.
無機粒子Bは、粉体をそのまま用いることができるが、予め溶剤に分散した分散体を用いることが好適である。無機粒子Bの分散体の平均粒子径が5〜50nmであることが好ましい。 As the inorganic particles B, powder can be used as it is, but it is preferable to use a dispersion previously dispersed in a solvent. The average particle size of the dispersion of inorganic particles B is preferably 5 to 50 nm.
分散方法は、無機粒子Bの表面状態に合わせた分散剤を用い、分散機を用いる方法が好ましい。分散機としては、ペイントコンディショナー(レッドデビル社製)、ボールミル、サンドミル(シンマルエンタープライゼス社製「ダイノーミル」等)、アトライター、パールミル(アイリッヒ社製「DCPミル」等)、コボールミル、ホモミキサー、ホモジナイザー(エム・テクニック社製「クレアミックス」等)、湿式ジェットミル(ジーナス社製「ジーナスP Y 」、ナノマイザー社製「ナノマイザー」)、微小ビーズミル(寿工業(株)社製「スーパーアペックミル」および「ウルトラアペックミル」)、超音波分散機等が使用できる。
分散機にメディアを使う場合には、ガラスビーズ、ジルコニアビーズ、アルミナビーズ、磁性ビーズ、およびポリスチレンビーズ等を用いることが好ましい。
分散に関しては、2種類以上の分散機、または大きさの異なる2種類以上のメディアをそれぞれ用い、段階的に実施しても差し支えない。
The dispersing method is preferably a method using a dispersing machine using a dispersing agent that matches the surface state of the inorganic particles B. Dispersers include paint conditioner (manufactured by Red Devil), ball mill, sand mill (such as “Dyno mill” manufactured by Shinmaru Enterprises), attritor, pearl mill (such as “DCP mill” manufactured by Eirich), coball mill, homomixer, Homogenizers (such as “Clairemix” manufactured by M Technique Co., Ltd.), wet jet mills (“Genus PY” manufactured by Genus, “Nanomizer” manufactured by Nanomizer), microbead mills (“Super Apeck Mill” manufactured by Kotobuki Industries Co., Ltd.) And “Ultra Apeck Mill”), an ultrasonic disperser, and the like.
When media are used in the disperser, glass beads, zirconia beads, alumina beads, magnetic beads, polystyrene beads, and the like are preferably used.
Regarding dispersion, two or more types of dispersers or two or more types of media having different sizes may be used and may be implemented step by step.
無機粒子Bを分散させるために、必要に応じて分散剤を添加することが出来る。分散剤は、無機粒子Bの凝集を抑制し、分散性を良好なものにするものであればなんら構わない。好ましくは、低分子型分散剤、高分子型分散剤、界面活性剤型分散剤が好適に用いられる。 In order to disperse the inorganic particles B, a dispersant can be added as necessary. The dispersant is not particularly limited as long as it suppresses the aggregation of the inorganic particles B and improves the dispersibility. Preferably, a low molecular weight dispersant, a high molecular weight dispersant, and a surfactant type dispersant are suitably used.
<活性エネルギー線硬化性成分C>
活性エネルギー線硬化性を有する成分としては、エチレン性不飽和二重結合を有するものが好ましい。エチレン性不飽和二重結合としては、(メタ)アクリレート基、およびマレイミド基のような不飽和基が挙げられる。活性エネルギー線硬化性を有する成分は、エポキシ基、およびオキセタニル基などを有すこともできる。
活性エネルギー線硬化性を有する成分を硬化することにより、有機粒子Aあるいは無機粒子Bを硬化膜中に保持することが出来る。活性エネルギー線硬化性を有する成分の質量平均分子量(Mw)は5000〜20000であることが好ましい。質量平均分子量(Mw)が5000以上であることにより、有機粒子Aあるいは無機粒子Bを良好に分散させることが出来る。また、質量平均分子量(Mw)が20000以下であることにより、低粘度にでき、有機粒子Aあるいは無機粒子Bの凝集を抑制・防止し、平坦性に優れる硬化性膜Xを得ることが出来る。
<Active energy ray-curable component C>
As the component having active energy ray curability, those having an ethylenically unsaturated double bond are preferable. Examples of the ethylenically unsaturated double bond include (meth) acrylate groups and unsaturated groups such as maleimide groups. The component having active energy ray curability can also have an epoxy group, an oxetanyl group, and the like.
By curing the component having active energy ray curability, the organic particles A or the inorganic particles B can be held in the cured film. The component having active energy ray curability preferably has a mass average molecular weight (Mw) of 5,000 to 20,000. When the mass average molecular weight (Mw) is 5000 or more, the organic particles A or the inorganic particles B can be favorably dispersed. Further, when the mass average molecular weight (Mw) is 20000 or less, the viscosity can be reduced, and aggregation of the organic particles A or inorganic particles B can be suppressed / prevented, and a curable film X having excellent flatness can be obtained.
活性エネルギー線硬化性を有する成分がエチレン性不飽和二重結合を含む場合、その二重結合当量は400(g/mol)以上1600(g/mol)以下が好ましい。二重結合当量が400(g/mol)以上であると、硬化膜の硬化収縮が抑制でき、透光性電極に微細な亀裂あるいは剥離が生じ難くなる。一方、二重結合当量が1600(g/mol)以下であると架橋密度が大きくなり、洗浄工程での電極の剥離を抑制・防止できる。 When the component having active energy ray curability contains an ethylenically unsaturated double bond, the double bond equivalent is preferably 400 (g / mol) to 1600 (g / mol). When the double bond equivalent is 400 (g / mol) or more, curing shrinkage of the cured film can be suppressed, and a fine crack or peeling is hardly generated in the translucent electrode. On the other hand, when the double bond equivalent is 1600 (g / mol) or less, the crosslinking density increases, and peeling of the electrode in the cleaning step can be suppressed / prevented.
エチレン性不飽和二重結合を有する成分を得る方法としては、特に制限はない。
例えば、水酸基、エポキシ基、酸(カルボキシル)基、およびイソシアネート基の中から選ばれる1種または2種以上の官能基を有するエチレン性不飽和単量体を含む不飽和単量体成分を重合させてなる共重合体中の官能基を、この官能基と反応可能な官能基およびエチレン性不飽和二重結合を有するエチレン性不飽和単量体で変性する方法が挙げられる。
共重合体の官能基と、変性に使用するエチレン性不飽和単量体の官能基の組み合わせは特に制限は無いが、例えば、水酸基とイソシアネート基、水酸基とエポキシ基、およびエポキシ基と酸(カルボキシル)基等が挙げられる。
There is no restriction | limiting in particular as a method of obtaining the component which has an ethylenically unsaturated double bond.
For example, an unsaturated monomer component containing an ethylenically unsaturated monomer having one or more functional groups selected from a hydroxyl group, an epoxy group, an acid (carboxyl) group, and an isocyanate group is polymerized. And a method of modifying the functional group in the copolymer with an ethylenically unsaturated monomer having a functional group capable of reacting with the functional group and an ethylenically unsaturated double bond.
The combination of the functional group of the copolymer and the functional group of the ethylenically unsaturated monomer used for modification is not particularly limited. For example, a hydroxyl group and an isocyanate group, a hydroxyl group and an epoxy group, and an epoxy group and an acid (carboxyl) ) Group and the like.
また、活性エネルギー線硬化性を有する成分Cは、エチレン性不飽和二重結合の他に、架橋性基として熱架橋性基を有することが好ましい。熱架橋性官能基としては、水酸基、エポキシ基、オキセタニル基、酸(カルボキシル)基、およびイソシアネート基が挙げられる。これらは、1種または2種以上用いることができる。 Moreover, it is preferable that the component C which has active energy ray curability has a heat crosslinkable group as a crosslinkable group other than an ethylenically unsaturated double bond. Thermally crosslinkable functional groups include hydroxyl groups, epoxy groups, oxetanyl groups, acid (carboxyl) groups, and isocyanate groups. These can be used alone or in combination of two or more.
<活性エネルギー線硬化性組成物>、<活性エネルギー線硬化性膜X>
活性エネルギー線硬化性組成物は、有機粒子Aの分散体、および無機粒子Bの分散体をそれぞれ独立して作製し、その後、および活性エネルギー線硬化性を有する成分Cを混合あるいは混練することにより得ることができる。
分散安定性の観点からは、有機粒子Aの分散体と、無機粒子Bの分散体とを混合した後、活性エネルギー線硬化性を有する成分C、および必要に応じてその他の成分とを均一に混合する方法が好ましい。
活性エネルギー線硬化性組成物は、その他必要時応じて、シラン化合物、紫外線吸収剤、酸化防止剤、熱安定剤、光安定剤、帯電防止剤、界面活性剤、貯蔵安定剤、レベリング剤、および光安定剤などを含むこともできる。
<Active energy ray-curable composition>, <Active energy ray-curable film X>
The active energy ray-curable composition is prepared by independently preparing a dispersion of organic particles A and a dispersion of inorganic particles B, and then mixing or kneading the component C having active energy ray curability. Can be obtained.
From the viewpoint of dispersion stability, after mixing the dispersion of the organic particles A and the dispersion of the inorganic particles B, the component C having active energy ray curability and, if necessary, other components are uniformly mixed. A method of mixing is preferred.
The active energy ray-curable composition may be a silane compound, an ultraviolet absorber, an antioxidant, a heat stabilizer, a light stabilizer, an antistatic agent, a surfactant, a storage stabilizer, a leveling agent, Light stabilizers and the like can also be included.
活性エネルギー線硬化性膜Xは、有機粒子Aの分散体、無機粒子Bの分散体、および活性エネルギー線硬化性を有する成分Cを含む活性エネルギー線硬化性組成物を支持基材に塗工し、乾燥することによって得られる。以下、活性エネルギー線硬化性膜Xを硬化性膜Xと略すことがある。硬化性膜Xの厚みは、有機粒子Aの分散体中の有機粒子Aの平均粒子径の2〜20倍であることが重要であり、2〜10倍であることが好ましい。
硬化性膜Xは、有機粒子A、無機粒子B、および活性エネルギー線硬化性を有する成分Cの他に光重合開始剤を含むことができる。
The active energy ray curable film X is applied to a support substrate with an active energy ray curable composition containing a dispersion of organic particles A, a dispersion of inorganic particles B, and a component C having active energy ray curable properties. Obtained by drying. Hereinafter, the active energy ray-curable film X may be abbreviated as the curable film X. It is important that the thickness of the curable film X is 2 to 20 times the average particle diameter of the organic particles A in the dispersion of the organic particles A, and preferably 2 to 10 times.
The curable film X can contain a photopolymerization initiator in addition to the organic particles A, the inorganic particles B, and the component C having active energy ray curability.
硬化性膜Xは、有機粒子A、無機粒子B、および活性エネルギー線硬化性を有する成分Cの合計100質量%中、有機粒子Aを1〜35質量%、無機粒子Bを30〜75質量%、活性エネルギー線硬化性成分Cを1〜35質量%含むことが好ましく、有機粒子Aを10〜35質量%、無機粒子Bを35〜75質量%、活性エネルギー線硬化性成分Cを5〜30質量%含むことがより好ましく、有機粒子Aを15〜30質量%、無機粒子Bを40〜70質量%、活性エネルギー線硬化性成分Cを5〜30質量%含むことがさらに好ましい。
有機粒子Aの量は、硬化性膜Xおよび硬化膜Yの表面に所定の凹凸形状を発現させる点で上記範囲であることが好ましい。無機粒子Bの量は粒子同士の凝集抑制や形成される凹凸形状の強度確保の点で重要で上記範囲であることが好ましい。活性エネルギー線硬化性成分Cの量は活性エネルギー線硬化性硬化膜Xの安定性、操作性向上の点で上記範囲であることが好ましい。
The curable film X comprises the organic particles A, the inorganic particles B, and the active energy ray-curable component C in a total of 100% by mass, the organic particles A being 1 to 35% by mass, and the inorganic particles B being 30 to 75% by mass. The active energy ray-curable component C is preferably contained in an amount of 1 to 35% by mass, the organic particles A in an amount of 10 to 35% by mass, the inorganic particles B in an amount of 35 to 75% by mass, and the active energy ray curable component C in an amount of 5 to 30%. More preferably, the organic particle A contains 15 to 30% by mass, the inorganic particle B contains 40 to 70% by mass, and the active energy ray-curable component C contains 5 to 30% by mass.
The amount of the organic particles A is preferably in the above range in that a predetermined uneven shape is expressed on the surfaces of the curable film X and the cured film Y. The amount of the inorganic particles B is important in terms of suppressing aggregation of the particles and ensuring the strength of the uneven shape to be formed, and is preferably in the above range. The amount of the active energy ray-curable component C is preferably in the above range from the viewpoint of improving the stability and operability of the active energy ray-curable cured film X.
活性エネルギー線硬化性組成物を支持基材に塗工する方法としては、公知の方法を用いることができ、
例えばロットまたはワイヤーバーなどを用いた方法;
および、マイクログラビアコーティング、グラビアコーティング、ダイコーティング、カーテンコーティング、リップコーティング、スロットコーティングまたはスピンコーティングなどの各種コーティング方法を用いることができる。
パターニングする場合は、1)印刷方式により直接パターニングを行う方法 と、2)フォトリソグラフィー方式によりパターニングを行う方法を用いることが出来る。
1)印刷方式では、フレキソ印刷、グラビア印刷、グラビアオフセット印刷、オフセット印刷、反転オフセット印刷、スクリーン印刷、凸版印刷、インクジェット印刷等の通常の印刷方式で行うことができる。
2)フォトリソグラフィー方式では、感光性の活性エネルギー線硬化性組成物を使用する。その場合、活性エネルギー線硬化性組成物を基板に直接塗布、乾燥させた後、もしくはフィルム基材(以下セパレートフィルムと称す)上に溶剤に溶解させた上記組成物を塗工後、溶剤を乾燥させることにより得られる感光性ドライフィルムを、透光性基板に張り合わせたのち、ラミネートや真空ラミネートによって、基板への密着および気泡等の除去を行う事により活性エネルギー線硬化性硬化膜Xを形成した後に、溶液現像またはアルカリ現像工程によってパターン形成を行う。
As a method of applying the active energy ray-curable composition to the support substrate, a known method can be used,
For example using lots or wire bars;
In addition, various coating methods such as micro gravure coating, gravure coating, die coating, curtain coating, lip coating, slot coating or spin coating can be used.
In the case of patterning, 1) a method of directly patterning by a printing method and 2) a method of patterning by a photolithography method can be used.
1) The printing method can be performed by a normal printing method such as flexographic printing, gravure printing, gravure offset printing, offset printing, reverse offset printing, screen printing, letterpress printing, and ink jet printing.
2) In the photolithography method, a photosensitive active energy ray-curable composition is used. In that case, the active energy ray-curable composition is directly applied to the substrate and dried, or after coating the composition dissolved in a solvent on a film substrate (hereinafter referred to as a separate film), the solvent is dried. After bonding the photosensitive dry film obtained by the step to a light-transmitting substrate, the active energy ray-curable cured film X was formed by performing adhesion or removal of bubbles and the like by lamination or vacuum lamination. Later, pattern formation is performed by solution development or alkali development.
<硬化膜Y>
活性エネルギー線硬化性膜Xに活性エネルギー線を照射することによって、硬化膜Yを形成できる。
活性エネルギー線にて硬化することで、硬化性膜Xの表面の凹凸形状を固定化することができる。活性エネルギー線は、可視光線または紫外線または赤外線等による光(電磁波)硬化性、電子線照射の中より選ばれる1種または2種以上を併用して用いることが出来る。
<Curing film Y>
By irradiating the active energy ray-curable film X with active energy rays, the cured film Y can be formed.
By curing with active energy rays, the uneven shape on the surface of the curable film X can be fixed. The active energy rays can be used in combination of one or two or more selected from light (electromagnetic wave) curability by visible light, ultraviolet rays, infrared rays, and the like, and electron beam irradiation.
硬化性膜Xおよび硬化膜Yの表面は凹凸を有する。凹凸の平均高さは、10〜200nmであることが好ましく、20〜150nmであることがより好ましい。
硬化性膜Xおよび硬化膜Yの表面の「凹凸の平均高さ」、「凹凸の間隔」は、走査型プローブ顕微鏡(例えば、オックスフォード・インストゥルメンツ社製の製品名「アサイラムリサーチMFP−3D」等)を用いて求めることができる。即ち、粗さ曲線からその平均線の方向に基準長さ5μmだけ抜き取り、この抜き取り部分の平均線から縦方向に測定した最も高い山頂から10番目までの山頂の標高(Yp)の絶対値の平均値と、最も低い谷底から10番目までの谷底の標高(Yv)の絶対値の平均値との和を「凹凸の平均高さ」いう。
The surfaces of the curable film X and the cured film Y have irregularities. The average height of the irregularities is preferably 10 to 200 nm, and more preferably 20 to 150 nm.
“Average height of unevenness” and “interval of unevenness” on the surfaces of the curable film X and the cured film Y are measured with a scanning probe microscope (for example, product name “Asylum Research MFP-3D” manufactured by Oxford Instruments). Etc.). That is, the average of the absolute values of the altitudes (Yp) of the highest peak to the tenth peak measured from the average line of the extracted part in the vertical direction from the roughness line by a reference length of 5 μm. The sum of the value and the average value of the absolute values of the altitude (Yv) of the bottom valley from the lowest valley bottom to the tenth valley is called “average height of unevenness”.
また、硬化性膜Xおよび硬化膜Yの表面の凹凸の間隔分布状態も同様の装置を用いて、求めることができる。例えば、2.0μm×2.0μmの領域について、隣り合う凸部同士又は隣り合う凹部同士の間隔を測り、その分布によって凹凸の間隔分布状態を求めることができる。本発明における硬化性膜Xおよび硬化膜Yの表面の凹凸の間隔分布は、200〜450nmの間隔の凹凸の占める割合が10%以上であることが好ましく、20%以上であることがより好ましい。 Moreover, the uneven | corrugated space | interval distribution state of the surface of the curable film X and the cured film Y can be calculated | required using the same apparatus. For example, with respect to a 2.0 μm × 2.0 μm region, the interval between adjacent convex portions or adjacent concave portions can be measured, and the interval distribution state of the unevenness can be obtained from the distribution. In the distribution of the unevenness on the surfaces of the curable film X and the cured film Y in the present invention, the proportion of the unevenness with an interval of 200 to 450 nm is preferably 10% or more, and more preferably 20% or more.
<硬化膜Z>
硬化膜Yを加熱することにより、硬化膜Yの表面の凸部の淵部を残すよう、硬化膜Y表面近傍にあった有機粒子Aの少なくとも一部を破壊、分解することにより、硬化膜Zを得ることができる。例えば、10℃/分の条件で昇温した際に、有機粒子Aの質量が5〜10%減少する温度にて、硬化膜Yの加熱時間は、硬化膜Zの凹凸の間隔や深さが後述する範囲となる条件で加熱することができる。
<Curing film Z>
By heating and curing the cured film Y, at least a part of the organic particles A in the vicinity of the cured film Y surface is destroyed and decomposed so as to leave the ridges of the protrusions on the surface of the cured film Y. Can be obtained. For example, when the temperature is raised at 10 ° C./minute, the heating time of the cured film Y at a temperature at which the mass of the organic particles A is reduced by 5 to 10% is the distance between the unevenness and the depth of the cured film Z It can heat on the conditions used as the range mentioned later.
例えば、有機粒子Aの凸部を破壊し、凹部を形成するための加熱条件は温度、時間により制御することができる。加熱温度は、200〜300℃が好ましい。200℃以上とすることで徐々に分解させることができ、300℃以下とすることで、分解速度を任意に制御することが出来る。より好ましくは210℃〜280℃であり、さらに好ましくは220〜250℃である。加熱時間は、5〜60分が好ましい。5分以上とすることで、分解速度を任意に制御することができ、60分以下とすることで凹部の形状を維持し、所定の凹凸形状に制御することが出来る。好ましくは10〜50分であり、さらに好ましくは20〜40分である。 For example, the heating conditions for breaking the convex portions of the organic particles A and forming the concave portions can be controlled by temperature and time. The heating temperature is preferably 200 to 300 ° C. By making it 200 degreeC or more, it can be decomposed | disassembled gradually, and by making it 300 degreeC or less, a decomposition rate can be controlled arbitrarily. More preferably, it is 210 degreeC-280 degreeC, More preferably, it is 220-250 degreeC. The heating time is preferably 5 to 60 minutes. By setting it to 5 minutes or more, the decomposition rate can be arbitrarily controlled, and by setting it to 60 minutes or less, the shape of the recess can be maintained and controlled to a predetermined uneven shape. Preferably it is 10-50 minutes, More preferably, it is 20-40 minutes.
硬化性膜Xおよび硬化膜Yの場合と同様に、硬化膜Zの凹凸の平均高さや、凹凸の間隔分布状態を求めることができる。
硬化膜Zの凹凸の平均高さは10〜100nmであることが好ましい。10nm以上とすることで、可視光波長に対する回折効果を確保でき、100nm以下とすることで前述した電界分布の不均一化の抑制、電界集中による発熱や素子破壊を防ぐことが出来る。平均高さは、20〜90nmがより好ましく、さらに好ましくは30〜80nm、さらに好ましくは40〜60nmである。
硬化膜Zの凹凸の間隔分布は、200〜450nmの間隔の凹凸の占める割合が30%以上であることが好ましく、40以上%であることがより好ましい。
硬化膜Zの表面の凹凸をこのような深さ・間隔にすることにより、硬化膜Z上に金属を蒸着した有機EL素子用電極の表面にも同様の凹凸を形成できる。その結果、凹凸構造により表面プラズモンとして失われていた光のエネルギーが取り出され、取り出されたエネルギーを輻射光として金属層表面から放射させることができる。
As in the case of the curable film X and the cured film Y, the average height of the unevenness of the cured film Z and the interval distribution state of the unevenness can be obtained.
The average height of the unevenness of the cured film Z is preferably 10 to 100 nm. When the thickness is 10 nm or more, the diffraction effect with respect to the visible light wavelength can be secured, and when the thickness is 100 nm or less, the above-described non-uniform electric field distribution can be suppressed, and heat generation and element destruction due to electric field concentration can be prevented. The average height is more preferably 20 to 90 nm, further preferably 30 to 80 nm, and further preferably 40 to 60 nm.
In the unevenness distribution of the cured film Z, the proportion of the unevenness with an interval of 200 to 450 nm is preferably 30% or more, and more preferably 40% or more.
By setting the unevenness on the surface of the cured film Z to such a depth and interval, similar unevenness can be formed on the surface of the electrode for an organic EL element in which a metal is vapor-deposited on the cured film Z. As a result, the energy of light lost as surface plasmons is extracted by the concavo-convex structure, and the extracted energy can be emitted from the surface of the metal layer as radiation light.
[有機EL素子用電極]、[有機EL素子]
有機EL素子用電極は、前記硬化膜Z上に金属を蒸着することにより得ることができる。
そして、有機EL素子は、前記有機EL素子用電極上に、発光層を含む有機層を形成し、次いで前記発光層を含む有機層上に、透明電極を形成し、さらに接着剤を用いて前記透明電極上に、透明支持基板に貼り付けることにより得ることができる。
蒸着に供する金属や蒸着方法は、公知の金属や公知の方法が挙げられる。
発光層を含む有機層、透明電極、接着剤、透明支持基板についても、同様に公知の材料、公知の作成方法が適宜選択できる。
[Electrode for organic EL element], [Organic EL element]
The electrode for an organic EL element can be obtained by vapor-depositing a metal on the cured film Z.
And an organic EL element forms the organic layer containing a light emitting layer on the said electrode for organic EL elements, then forms a transparent electrode on the organic layer containing the said light emitting layer, and also uses the adhesive agent, It can be obtained by pasting on a transparent support substrate on a transparent electrode.
As the metal used for vapor deposition and the vapor deposition method, a known metal and a known method can be used.
For the organic layer including the light emitting layer, the transparent electrode, the adhesive, and the transparent support substrate, similarly, a known material and a known production method can be appropriately selected.
有機EL素子用電極の表面は、前記硬化膜Zと同様の凹凸をその表面に有することができる。そして、有機EL素子において、発光層が発光する際に、ごく近傍に近接場光が発生する。発光層と金属層との距離は非常に近いため、近接場光は金属層の表面にて伝播型の表面プラズモンのエネルギーに変換される。その結果、取出し面から高強度の光が出射し、取出し効率が向上する。
本発明では、有機EL素子用電極の表面の凹凸の周期性が低く、凹部または凸部がランダムに分布している。この凹凸形状のランダム性が、広帯域の光の取出し効率の向上に寄与する。
The surface of the electrode for organic EL elements can have the same unevenness as that of the cured film Z on the surface. In the organic EL element, near-field light is generated in the very vicinity when the light emitting layer emits light. Since the distance between the light emitting layer and the metal layer is very short, the near-field light is converted into propagation-type surface plasmon energy on the surface of the metal layer. As a result, high-intensity light is emitted from the extraction surface, and the extraction efficiency is improved.
In this invention, the periodicity of the unevenness | corrugation of the surface of the electrode for organic EL elements is low, and a recessed part or a convex part is distributed at random. This randomness of the uneven shape contributes to the improvement of broadband light extraction efficiency.
以下に、実施例により本発明をさらに具体的に説明するが、以下の実施例は本発明の権利範囲を何ら制限するものではない。特に明記しない限り、「部」は「質量部」を表し、「%」は質量%を示す。 EXAMPLES The present invention will be described more specifically with reference to the following examples. However, the following examples do not limit the scope of rights of the present invention. Unless otherwise specified, “part” represents “part by mass” and “%” represents mass%.
先ず、有機粒子Aと無機粒子Bの分散粒子径、硬化膜Zを得るための加熱条件の測定方法、凹凸形状の測定方法について説明する。 First, the dispersion particle diameter of the organic particles A and the inorganic particles B, the measurement method of the heating conditions for obtaining the cured film Z, and the measurement method of the uneven shape will be described.
(分散粒子径)
分散粒子径は、日機装(株)社製「ナノトラックUPA」を用いて測定した。
サンプルセル内に有機粒子Aまたは無機粒子Bに使用する分散媒を充填し、ブランクを測定した。次に、有機粒子A分散液または無機粒子Bをこれに加え、測定可能な濃度範囲まで希釈した。動的光散乱法による測定を行い、測定サンプルの50体積%における分散粒径の値を粒子径とした。また、分散粒径のうち、600nm以上の粒子径の体積%を、粒子径600nm以上の粒子の含有量とした。
(Dispersed particle size)
The dispersed particle size was measured using “Nanotrack UPA” manufactured by Nikkiso Co., Ltd.
The sample cell was filled with a dispersion medium used for organic particles A or inorganic particles B, and a blank was measured. Next, organic particle A dispersion liquid or inorganic particle B was added thereto and diluted to a measurable concentration range. The measurement by the dynamic light scattering method was performed, and the value of the dispersed particle size at 50% by volume of the measurement sample was defined as the particle size. Further, among the dispersed particle diameters, the volume% of the particle diameter of 600 nm or more was defined as the content of particles having a particle diameter of 600 nm or more.
(硬化膜Zを得るための温度条件)
硬化膜Zを得るための加熱条件(温度、時間)は以下の方法で測定した。セイコーインスツルメンツ社製の示差熱熱質量同時測定装置EXSTER TG/DTA6300を用い、200ml/分の空気気流下、10℃/分の昇温速度にて測定し、有機粒子Aの質量が5%減少し、昇温前の95%となる温度を求めた。
(Temperature conditions for obtaining the cured film Z)
The heating conditions (temperature, time) for obtaining the cured film Z were measured by the following method. Using a differential thermal and thermal mass measuring device EXSTER TG / DTA6300 manufactured by Seiko Instruments Inc., the mass of the organic particles A is reduced by 5% under an air stream of 200 ml / min at a heating rate of 10 ° C./min. Then, a temperature of 95% before temperature increase was obtained.
(硬化性膜X、硬化膜Y、Zの膜厚の測定)
硬化性膜X、硬化膜Y、Zの膜厚の測定は以下の方法で測定した。ニコン社製の接触式膜厚計「デジマイクロカウンタTC−101」を用いて、10点以上の測定値の平均値を膜厚とした。
(Measurement of film thickness of curable film X and cured films Y and Z)
The film thicknesses of the curable film X and the cured films Y and Z were measured by the following method. Using a contact type film thickness meter “Digi Micro Counter TC-101” manufactured by Nikon Corporation, an average value of 10 or more measured values was defined as a film thickness.
(硬化性膜X、硬化膜Y、Zの表面の凹凸形状の測定)
オックスフォード・インストゥルメンツ社製の製品名「アサイラムリサーチMFP−3D」を用いて測定した。
カンチレバーの材質:シリコン
測定環境温度:25℃
測定面積:2μm×2μm
(Measurement of irregularities on the surfaces of the curable film X and the cured films Y and Z)
Measurement was performed using a product name “Asylum Research MFP-3D” manufactured by Oxford Instruments.
Cantilever material: Silicon Measurement environment temperature: 25 ° C
Measurement area: 2 μm × 2 μm
(1)有機粒子Aの分散液の作製
(製造例101)
N2雰囲気下、水566.7gの中に、トリフルオロエチルメタクリレート50g、メチルメタクリレート40g、アリルメタクリレート5g、およびイソボルニルアクリレート5gを添加・強撹拌し、80℃に昇温し、2,2’−アゾビス(2−アミジノプロパン)ジヒドロクロリド(以下「V−50」という)0.167gをごく少量の水に溶解した水溶液を一気に加え、80℃で8時間重合した。重合後、メトキシプロピルアセテートを加え、ストリッピングにより水を除去し、固形分20質量%に調整した有機粒子A分散液(A−1)(アクリル樹脂粒子分散液)を作製した。
得られた有機粒子A分散液(A−1)中の有機粒子Aの平均粒子径は290nm、変動係数は5%だった。
有機粒子A分散液(A−1)を乾燥し、有機粒子Aを得、5%熱分解温度を求めたところ、230℃であった。
(1) Preparation of dispersion of organic particles A
(Production Example 101)
Under N 2 atmosphere, 50 g of trifluoroethyl methacrylate, 40 g of methyl methacrylate, 5 g of allyl methacrylate, and 5 g of isobornyl acrylate were added to 566.7 g of water and stirred vigorously. An aqueous solution in which 0.167 g of '-azobis (2-amidinopropane) dihydrochloride (hereinafter referred to as “V-50”) was dissolved in a very small amount of water was added at once and polymerized at 80 ° C. for 8 hours. After the polymerization, methoxypropyl acetate was added, water was removed by stripping, and an organic particle A dispersion (A-1) (acrylic resin particle dispersion) adjusted to a solid content of 20% by mass was produced.
The average particle diameter of the organic particles A in the obtained organic particle A dispersion (A-1) was 290 nm, and the coefficient of variation was 5%.
The organic particle A dispersion (A-1) was dried to obtain organic particles A. The 5% thermal decomposition temperature was determined to be 230 ° C.
(製造例102)
水の量を900gとした以外は製造例101と同様の組成にて、重合およびストリッピングし、固形分20質量%の有機粒子A分散液(A−2)(アクリル樹脂粒子分散液)を作製した。
得られた有機粒子A分散液(A−2)中の有機粒子Aの平均粒子径は120nm、変動係数は5%だった。
有機粒子A分散液(A−2)を乾燥し、有機粒子Aを得、5%熱分解温度を求めたところ、230℃であった。
(Production Example 102)
Polymerization and stripping were carried out in the same composition as in Production Example 101 except that the amount of water was changed to 900 g to produce an organic particle A dispersion (A-2) (acrylic resin particle dispersion) having a solid content of 20% by mass. did.
The average particle diameter of the organic particles A in the obtained organic particle A dispersion (A-2) was 120 nm, and the coefficient of variation was 5%.
The organic particle A dispersion (A-2) was dried to obtain organic particles A. The 5% thermal decomposition temperature was determined to be 230 ° C.
(製造例103)
N2雰囲気下、メタノール365gおよび水201.7gの混合溶剤に、トリフルオロエチルメタクリレート50g、メチルメタクリレート40g、アリルメタクリレート5g、およびイソボルニルメタリレート5gを添加・強撹拌し、60℃に昇温し、「V−50」0.167gをごく少量の水に溶解した水溶液を一気に加え、60℃で8時間重合した。重合後、メトキシプロピルアセテートを加え、ストリッピングによりメタノールおよび水を除去し、固形分20質量%に調整した有機粒子A分散液(A−3)(アクリル樹脂粒子分散液)を作製した。
得られた有機粒子A分散液(A−3)中の有機粒子Aの平均粒子径は420nm、変動係数は11%だった。
有機粒子A分散液(A−3)を乾燥し、有機粒子Aを得、5%熱分解温度を求めたところ、230℃であった。
(Production Example 103)
Under N 2 atmosphere, 50 g of trifluoroethyl methacrylate, 40 g of methyl methacrylate, 5 g of allyl methacrylate, and 5 g of isobornyl metallate were added to a mixed solvent of 365 g of methanol and 201.7 g of water, and the mixture was vigorously stirred and heated to 60 ° C. Then, an aqueous solution in which 0.167 g of “V-50” was dissolved in a very small amount of water was added all at once and polymerized at 60 ° C. for 8 hours. After the polymerization, methoxypropyl acetate was added, and methanol and water were removed by stripping to prepare an organic particle A dispersion (A-3) (acrylic resin particle dispersion) adjusted to a solid content of 20% by mass.
The average particle diameter of the organic particles A in the obtained organic particle A dispersion (A-3) was 420 nm, and the variation coefficient was 11%.
The organic particle A dispersion (A-3) was dried to obtain organic particles A. The 5% thermal decomposition temperature was determined to be 230 ° C.
(製造例104)
N2雰囲気下、メタノール409.2gおよび水157.5gの混合溶剤に、トリフルオロエチルメタクリレート50g、メチルメタクリレート45g、アリルメタクリレート5gを添加・強撹拌し、40℃に昇温し、「V−50」0.167gをごく少量の水に溶解した水溶液を一気に加え、40℃で8時間重合した。重合後、メトキシプロピルアセテートを加え、ストリッピングによりメタノールおよび水を除去し、固形分20質量%に調整した有機粒子A分散液(A−4)(アクリル樹脂粒子分散液)を作製した。
得られた有機粒子A分散液(A−4)中の有機粒子Aの平均粒子径は588nm、変動係数は15%だった。
有機粒子A分散液(A−4)を乾燥し、有機粒子Aを得、5%熱分解温度を求めたところ、230℃であった。
(Production Example 104)
Under a N 2 atmosphere, 50 g of trifluoroethyl methacrylate, 45 g of methyl methacrylate, and 5 g of allyl methacrylate were added to a mixed solvent of 409.2 g of methanol and 157.5 g of water and stirred vigorously. An aqueous solution in which 0.167 g was dissolved in a very small amount of water was added all at once and polymerized at 40 ° C. for 8 hours. After polymerization, methoxypropyl acetate was added, methanol and water were removed by stripping, and an organic particle A dispersion (A-4) (acrylic resin particle dispersion) adjusted to a solid content of 20% by mass was produced.
The average particle diameter of the organic particles A in the obtained organic particle A dispersion (A-4) was 588 nm, and the coefficient of variation was 15%.
The organic particle A dispersion (A-4) was dried to obtain organic particles A. The 5% thermal decomposition temperature was determined to be 230 ° C.
(製造例105)
「V−50」0.167gをごく少量の水に溶解した水溶液を1時間掛けて徐々に滴下した以外は、製造例101と同様の組成にて、重合およびストリッピングし、固形分20質量%の有機粒子A分散液(A−5)(アクリル樹脂粒子分散液)を作製した。
得られた有機粒子A分散液(A−5)中の有機粒子Aの平均粒子径は340nm、変動係数は40%だった。
有機粒子A分散液(A−5)を乾燥し、有機粒子Aを得、5%熱分解温度を求めたところ、230℃であった。
(Production Example 105)
Polymerization and stripping were carried out with the same composition as in Production Example 101 except that 0.167 g of “V-50” dissolved in a very small amount of water was gradually added dropwise over 1 hour, and the solid content was 20% by mass. Organic particle A dispersion liquid (A-5) (acrylic resin particle dispersion liquid) was prepared.
The average particle diameter of the organic particles A in the obtained organic particle A dispersion (A-5) was 340 nm, and the variation coefficient was 40%.
The organic particle A dispersion (A-5) was dried to obtain organic particles A. The 5% thermal decomposition temperature was 230 ° C.
(製造例106)
市販の有機粒子であるアドバンセルNS(積水化学工業株式会社製)をメトキシプロピルアセテートに加え、固形分20質量%に調整した有機粒子A分散液(A−6)を得た。得られた有機粒子A分散液(A−6)中の有機粒子Aの平均粒子径は150nm、変動係数は13%だった。
有機粒子A分散液(A−6)を乾燥し、有機粒子Aを得、5%熱分解温度を求めたところ、230℃であった。
(Production Example 106)
Advancel NS (manufactured by Sekisui Chemical Co., Ltd.), which is a commercially available organic particle, was added to methoxypropyl acetate to obtain an organic particle A dispersion (A-6) adjusted to a solid content of 20% by mass. The average particle diameter of the organic particles A in the obtained organic particle A dispersion (A-6) was 150 nm, and the coefficient of variation was 13%.
The organic particle A dispersion (A-6) was dried to obtain organic particles A. The 5% thermal decomposition temperature was determined to be 230 ° C.
(製造例107)
市販の有機粒子であるタフチックF−120(東洋紡株式会社製)をメトキシプロピルアセテートに加え、固形分20質量%に調整した有機粒子A分散液(A−7)を得た。得られた有機粒子A分散液(A−7)中の有機粒子Aの平均粒子径は200nm、変動係数は10%だった。
有機粒子A分散液(A−7)を乾燥し、有機粒子Aを得、5%熱分解温度を求めたところ、230℃であった。
(Production Example 107)
Commercially available organic particles Tuftic F-120 (Toyobo Co., Ltd.) was added to methoxypropyl acetate to obtain an organic particle A dispersion (A-7) adjusted to a solid content of 20% by mass. The average particle diameter of organic particles A in the obtained organic particle A dispersion (A-7) was 200 nm, and the coefficient of variation was 10%.
The organic particle A dispersion (A-7) was dried to obtain organic particles A. The 5% thermal decomposition temperature was 230 ° C.
(2)分散剤の作製
撹拌機、還流冷却管、ドライエアー導入管、温度計を備えた4口フラスコにビフェニルテトラカルボン酸二無水物80.0部、ペンタエリスリトールトリアクリレート250.0部、メチルヒドロキノン0.24部、シクロヘキサノン217.83部を加え、85℃まで昇温した。次に触媒として1,8−ジアザビシクロ[5.4.0]−7−ウンデセン1. 65部を加え、90℃で8時間反応した。続いてこの溶液中に、ラウリルグリシジルエーテル134.3部、シクロヘキサノン86.9部、ジメチルベンジルアミン2.82部を加え、徐々に昇温度し、100度で反応させた。室温まで冷却し、固形分60質量%の分散剤溶液を得た。質量平均分子量(Mw)は3500であった。
(2) Preparation of dispersant
A 4-necked flask equipped with a stirrer, reflux condenser, dry air inlet tube, thermometer, 80.0 parts biphenyltetracarboxylic dianhydride, 250.0 parts pentaerythritol triacrylate, 0.24 parts methylhydroquinone, cyclohexanone 217.83 parts were added and the temperature was raised to 85 ° C. Next, 1,8-diazabicyclo [5.4.0] -7-undecene as a catalyst 65 parts was added and reacted at 90 ° C. for 8 hours. Subsequently, 134.3 parts of lauryl glycidyl ether, 86.9 parts of cyclohexanone, and 2.82 parts of dimethylbenzylamine were added to the solution, and the temperature was gradually raised and reacted at 100 degrees. The mixture was cooled to room temperature to obtain a dispersant solution having a solid content of 60% by mass. The weight average molecular weight (Mw) was 3,500.
(3)無機粒子Bの分散体の作製
平均1次粒子径が15nmの酸化チタン(TiO2)微粒子10gに、分散媒としてメトキシプロピルアセテート86.7g、(2)で得られた分散剤溶液3.3g(約1.98gの分散剤を含む)を加えた。得られた液に対して、2段階の分散処理を行った。前分散として、ジルコニアビーズ(平均径:1.25mm)をメディアとして用い、ペイントシェイカーで1時間分散した。本分散として、ジルコニアビーズ(平均径:0.1mm)をメディアとして用い、寿工業(株)社製分散機UAM−015で7時間分散した。以上のようにして、無機粒子B分散体(酸化チタン微粒子分散体)を作製した。分散液中の酸化チタン微粒子の平均粒子径は50nmであった。分散液は50%の不揮発成分を含み、不揮発成分100%中に含まれる酸化チタンは約83.5%、分散剤は16.5%である。
(3) Preparation of Dispersion of Inorganic Particle B Dispersant solution 3 obtained from 106.7 g of titanium oxide (TiO 2 ) fine particles having an average primary particle diameter of 15 nm and 86.7 g of methoxypropyl acetate as a dispersion medium, (2) .3 g (containing about 1.98 g of dispersant) was added. A two-stage dispersion treatment was performed on the obtained liquid. As pre-dispersion, zirconia beads (average diameter: 1.25 mm) were used as media and dispersed for 1 hour with a paint shaker. As this dispersion, zirconia beads (average diameter: 0.1 mm) were used as media, and the dispersion was carried out for 7 hours with a disperser UAM-015 manufactured by Kotobuki Industries Co., Ltd. As described above, an inorganic particle B dispersion (titanium oxide fine particle dispersion) was produced. The average particle diameter of the titanium oxide fine particles in the dispersion was 50 nm. The dispersion contains 50% non-volatile components, titanium oxide contained in 100% non-volatile components is about 83.5%, and the dispersant is 16.5%.
(4)活性エネルギー線硬化性成分の作製
攪拌機、温度計、滴下装置、還流冷却器、およびガス導入管を備えた反応容器に、溶剤としてメトキシプロピルアセテート100部を入れた。この容器内に窒素ガスを注入しながら80℃に加熱した。この温度を保持し、ジシクロペンタニルメタクリレート24部、ヒドロキシエチルメタクリレート15部、メタクリル酸36.6部、および2,2’−アゾビスイソブチロニトリル3部の混合物を1時間かけて滴下して重合反応を行った。滴下終了後、さらに80℃で3時間反応させた後、アゾビスイソブチロニトリル0.5部をメトキシプロピルアセテート40部に溶解させたものを添加し、その後3時間、同じ温度で攪拌を続けて、共重合体を得た。
次いで、反応容器内に乾燥空気を導入し、グリシジルメタクリレート(GMA)30部、メトキシプロピルアセテート37部、ジメチルベンジルアミン0.6部、およびメトキノン0.1部を仕込み、その後10時間、同じ温度で攪拌を続けた。室温に冷却後、メトキシプロピルアセテートで希釈することにより、固形分35質量%の活性エネルギー線硬化性成分の溶液を得た。活性エネルギー線硬化性成分の5%熱分解温度は230℃以上、質量平均分子量(Mw)は15000、二重結合当量は500であった。
(4) Production of active energy ray-curable component 100 parts of methoxypropyl acetate as a solvent was placed in a reaction vessel equipped with a stirrer, a thermometer, a dropping device, a reflux condenser, and a gas introduction tube. The container was heated to 80 ° C. while injecting nitrogen gas. While maintaining this temperature, a mixture of 24 parts of dicyclopentanyl methacrylate, 15 parts of hydroxyethyl methacrylate, 36.6 parts of methacrylic acid, and 3 parts of 2,2′-azobisisobutyronitrile was added dropwise over 1 hour. The polymerization reaction was carried out. After completion of the dropwise addition, the mixture was further reacted at 80 ° C. for 3 hours, and then 0.5 parts of azobisisobutyronitrile dissolved in 40 parts of methoxypropyl acetate was added, and then stirring was continued for 3 hours at the same temperature. Thus, a copolymer was obtained.
Next, dry air was introduced into the reaction vessel, charged with 30 parts of glycidyl methacrylate (GMA), 37 parts of methoxypropyl acetate, 0.6 part of dimethylbenzylamine, and 0.1 part of methoquinone, and then at the same temperature for 10 hours. Stirring was continued. After cooling to room temperature, a solution of an active energy ray-curable component having a solid content of 35% by mass was obtained by dilution with methoxypropyl acetate. The active energy ray-curable component had a 5% thermal decomposition temperature of 230 ° C. or higher, a mass average molecular weight (Mw) of 15000, and a double bond equivalent of 500.
(実施例1)
(5)活性エネルギー線硬化性組成物の作製
有機粒子A:無機粒子B:活性エネルギー線硬化性成分:光重合開始剤:シランカップリング剤:レベリング剤の質量比が20:60.1:8.2:0.6:11:0.1となるよう、有機粒子A分散液(A−1)、無機粒子B分散体、活性エネルギー線硬化性成分の溶液等を混合した後。メッシュ径5μmのフィルタで濾過し、活性エネルギー線硬化性組成物を作製した。
Example 1
(5) Preparation of active energy ray-curable composition Organic particle A: inorganic particle B: active energy ray-curable component: photopolymerization initiator: silane coupling agent: leveling agent mass ratio is 20: 60.1: 8 After mixing the organic particle A dispersion (A-1), the inorganic particle B dispersion, the solution of the active energy ray curable component, and the like so as to be 2: 0.6: 11: 0.1. The mixture was filtered through a filter having a mesh diameter of 5 μm to prepare an active energy ray curable composition.
(6)活性エネルギー線硬化性膜Xの作製
100mm×100mm、0.7mm厚のガラス基板(コーニング社製ガラス「イーグル2000」)に、スピンコーターを用いて、前記活性エネルギー線硬化性組成物を塗布し、110℃に加熱したホットプレート上で2分間保持した後、放冷し、1.3μmの厚みの活性エネルギー線硬化性膜Xを作製した。
(6) Production of active energy ray-curable film X Using a spin coater, the active energy ray-curable composition is applied to a 100 mm × 100 mm, 0.7 mm thick glass substrate (Corning glass “Eagle 2000”). After coating and holding on a hot plate heated to 110 ° C. for 2 minutes, it was allowed to cool to produce an active energy ray-curable film X having a thickness of 1.3 μm.
(7)硬化膜Yの作製
次に、超高圧水銀ランプを用いて、前記硬化性膜Xに、照度20mW/cm2、200mJ/cm2の紫外線を照射し、硬化膜Yを得た。
(7) Production of cured film Y Next, the cured film Y was irradiated with ultraviolet rays having illuminances of 20 mW / cm 2 and 200 mJ / cm 2 using an ultrahigh pressure mercury lamp.
(8)硬化膜Zの作製
次に、硬化膜Yを230℃に加熱したオーブンに入れ、20分放置した。その後、室温で放冷することで硬化膜Zを得た。
(8) Production of Cured Film Z Next, the cured film Y was placed in an oven heated to 230 ° C. and left for 20 minutes. Then, the cured film Z was obtained by standing to cool at room temperature.
(9)有機EL素子用電極の作製
前記硬化膜Z上に、真空蒸着法によりMgとAgを共蒸着し、厚さ100nmのMgAg層を形成後、MgAgの酸化防止の観点から、さらに、その上にAgを50nm蒸着し、有機EL素子用の背面電極(陰極)とした。
(9) Preparation of electrode for organic EL element After vapor-depositing Mg and Ag on the cured film Z to form a MgAg layer having a thickness of 100 nm, from the viewpoint of preventing MgAg oxidation, Ag was deposited thereon to a thickness of 50 nm to form a back electrode (cathode) for an organic EL device.
(10)有機EL素子の作製
前記有機EL素子用電極上に、30nmの厚さの電子注入層(表2に示す[Alq3])を形成し、前記電子注入層上に40nmの厚さの赤色の発光層(表2参照)を形成した。
次に、前記赤色の発光層上に、正孔輸送層として、N,N‘−ジ−(1−ナフチル)−N,N’−ジフェニルベンジン(以下、α−NPD)を50nmの厚さに形成し、前記正孔輸送層上に、正孔注入層として、銅フタロシアニン(以下、CuPcという)を15nmの厚さに形成した。
その後、ITOセラミックターゲット(In2O3:SnO2=90:10(質量比))を用い、DCスパッタリング法にて厚さ150nmのITO膜を、前記正孔注入層上に、形成した。フォトレジストを用いて上記ITO膜をエッチングして、発光面積が5mm×5mmとなるようにパターンを形成した。超音波洗浄を行った後、低圧紫外線ランプを用いてオゾン洗浄し、透明電極(陽極)とした。
その後、紫外線硬化性エポキシ樹脂を滴下し、その上に透明支持基板としてスライドガラスを被せ、高圧紫外線ランプを用いてエポキシ樹脂を硬化させ、赤色の有機EL素子素得た。
上記と同様にして、表2に示す発光層と電子注入層を使用し、青色、緑色、および白色の発光素子をそれぞれ作製し、有機EL素子を得た。
(10) Production of Organic EL Element A 30 nm thick electron injection layer ([Alq3] shown in Table 2) is formed on the organic EL element electrode, and a 40 nm thick red color is formed on the electron injection layer. The light emitting layer (see Table 2) was formed.
Next, N, N′-di- (1-naphthyl) -N, N′-diphenylbenzine (hereinafter referred to as α-NPD) is formed to a thickness of 50 nm as a hole transport layer on the red light emitting layer. On the hole transport layer, copper phthalocyanine (hereinafter referred to as CuPc) was formed to a thickness of 15 nm as a hole injection layer.
Thereafter, an ITO ceramic target (In 2 O 3 : SnO 2 = 90: 10 (mass ratio)) was used to form an ITO film having a thickness of 150 nm on the hole injection layer by DC sputtering. The ITO film was etched using a photoresist to form a pattern so that the light emission area was 5 mm × 5 mm. After ultrasonic cleaning, ozone cleaning was performed using a low-pressure ultraviolet lamp to obtain a transparent electrode (anode).
Thereafter, an ultraviolet curable epoxy resin was dropped, and a slide glass was placed thereon as a transparent support substrate, and the epoxy resin was cured using a high-pressure ultraviolet lamp to obtain a red organic EL device element.
In the same manner as described above, a light emitting layer and an electron injection layer shown in Table 2 were used to produce blue, green, and white light emitting elements, respectively, thereby obtaining organic EL elements.
(11)評価
得られた有機EL素子の光取り出し効率、発光外観、波長依存性を下記基準に基づき、評価した。
<<光取り出し効率>>
コニカミノルタセンシング(株)社製分光放射輝度計「CS−2000」により、硬化膜Zを形成した場合の有機EL素子、硬化膜Zを形成せず、ガラス基板で作製した有機EL素子の正面輝度をそれぞれ測定した。
硬化膜Zを形成しなかった場合を基準とし、硬化膜Zを形成した場合の白色発光素子の正面輝度の向上率を有機EL素子の正面輝度の向上率を求めた。
正面輝度向上率1.5倍以上:優(◎)、
正面輝度向上率1.2倍以上〜1.5倍未満:良(○)、
正面輝度向上率1.2倍未満:可(△)
(11) Evaluation The light extraction efficiency, the light emission appearance, and the wavelength dependency of the obtained organic EL element were evaluated based on the following criteria.
<< light extraction efficiency >>
Front luminance of organic EL element produced by glass substrate without forming cured film Z by using Konica Minolta Sensing Co., Ltd. spectral radiance meter “CS-2000” Was measured respectively.
Based on the case where the cured film Z was not formed, the improvement rate of the front luminance of the white light emitting element when the cured film Z was formed was obtained as the improvement rate of the front luminance of the organic EL element.
Front brightness improvement rate 1.5 times or more: Excellent (◎),
Front brightness improvement rate of 1.2 times to less than 1.5 times: good (○),
Front brightness improvement rate less than 1.2 times: Possible (△)
<<発光外観(ダークスポット、ムラ)>>
各有機EL素子の発光素子に、室温において順方向電流を10mA/cm2通電し、発光外観(ダークスポット、ムラ)を観察した。
ダークスポット、ムラが観察されない:良(○)、
ダークスポット、ムラが僅かに観察される:可(△)、
ダークスポット、ムラが観察される:不可(×)
<< Luminous appearance (dark spots, unevenness) >>
A forward current of 10 mA / cm 2 was applied to the light-emitting element of each organic EL element at room temperature, and the light emission appearance (dark spots, unevenness) was observed.
Dark spots and unevenness are not observed: Good (○),
Dark spots and unevenness are slightly observed: Yes (△),
Dark spots and unevenness are observed: Impossible (×)
<<波長依存性>>
表2に示す赤・青・緑の発光層を用いた発光装置における正面輝度の違い、および、白色発光層を用いた発光装置における発光スペクトルの形状変化の有無により評価した。発光スペクトルの測定は、大塚電子(株)社製MCPD−9800を用いて行なった
赤・青・緑のそれぞれの正面輝度向上率の値の差が10%未満かつ白色のスペクトル形状が変化していない:良(○)、
赤・青・緑のそれぞれの正面輝度向上率の値の差が10%以上20%未満かつ白色のスペクトル形状が変化していない:可(△)、
赤・青・緑のそれぞれの正面輝度向上率の値の差が20%以上かつ白色のスペクトル形状が変化している:不可(×)
<< Wavelength dependence >>
Evaluation was made based on the difference in front luminance in the light emitting device using the red, blue, and green light emitting layers shown in Table 2 and the presence or absence of a change in the shape of the emission spectrum in the light emitting device using the white light emitting layer. The emission spectrum was measured using an MCPD-9800 manufactured by Otsuka Electronics Co., Ltd. The difference in front luminance improvement values of red, blue, and green was less than 10%, and the white spectrum shape was changed. No: Good (○),
The difference in the value of the front luminance improvement rate for each of red, blue, and green is 10% or more and less than 20%, and the white spectrum shape is not changed: Yes (△),
The difference between the values of the front luminance improvement ratios of red, blue, and green is 20% or more and the white spectrum shape is changed: Impossible (×)
(実施例2〜5)
実施例1で用いた有機粒子A分散液(A−1)の代わりに、有機粒子A分散液(A−2)、(A−3)、(A−6)、(A−7)を用いた以外は、実施例1と同様に硬化性膜X、硬化膜Y、Z、有機EL素子用電極、および有機EL素子を順次作成し、同様に評価した。
(Examples 2 to 5)
Instead of the organic particle A dispersion (A-1) used in Example 1, the organic particle A dispersions (A-2), (A-3), (A-6), and (A-7) are used. In the same manner as in Example 1, a curable film X, a cured film Y, Z, an organic EL element electrode, and an organic EL element were sequentially prepared and evaluated in the same manner.
(比較例1〜2)
実施例1で用いた有機粒子A分散液(A−1)の代わりに、有機粒子A分散液(A−4)、(A−5)を用いた以外は、実施例1と同様に硬化性膜X、硬化膜Y、Z、有機EL素子用電極、および有機EL素子を順次作成し、同様に評価した。
(Comparative Examples 1-2)
Curability was the same as in Example 1 except that the organic particle A dispersions (A-4) and (A-5) were used instead of the organic particle A dispersion (A-1) used in Example 1. A film X, a cured film Y, Z, an organic EL element electrode, and an organic EL element were sequentially formed and evaluated in the same manner.
(比較例3〜5)
硬化膜Yを作成した後、表3に示すように加熱条件を変更した以外は実施例1と同様にして、硬化膜Z、有機EL素子用電極、および有機EL素子を順次作成し、同様に評価した。
(Comparative Examples 3-5)
After creating the cured film Y, the cured film Z, the organic EL element electrode, and the organic EL element were sequentially formed in the same manner as in Example 1 except that the heating conditions were changed as shown in Table 3. evaluated.
(比較例6)
実施例1で用いた有機粒子A分散液(A−1)を用いず、実施例1と同様に硬化性膜X、硬化膜Yを作成し、加熱することなく硬化膜Y上に蒸着層を形成した有機EL素子用電極、および有機EL素子を順次作成し、同様に評価した。
(Comparative Example 6)
The organic particle A dispersion liquid (A-1) used in Example 1 was not used, but a curable film X and a cured film Y were prepared in the same manner as in Example 1, and a vapor deposition layer was formed on the cured film Y without heating. The formed electrodes for organic EL elements and organic EL elements were sequentially prepared and evaluated in the same manner.
実施例1〜5では、所定の凹凸形状を有することにより取り出し効率の向上が認められ、素子内の短絡による発光外観の不良は確認されなかった。一方、比較例1、2では、所定の粒子径、変動係数を満たしていないため、目的とする凹凸形状の平均高さ、平均間隔の割合を満たせず、取り出し効率、発光外観が悪い結果となった。
比較例3〜5では、実施例1と同じ活性エネルギー線硬化性組成物を用いても、加熱条件の違いにより、硬化膜Zの200〜450nmの平均間隔の割合が30%未満となり、取り出し効率、発光外観が悪い結果となった。比較例6では、凹凸形状を持たないため、発光外観は良好であるが、取り出し効率は低い結果となった。
In Examples 1 to 5, improvement in extraction efficiency was recognized by having a predetermined concavo-convex shape, and no defect in light emission appearance due to a short circuit in the element was confirmed. On the other hand, in Comparative Examples 1 and 2, since the predetermined particle diameter and the coefficient of variation are not satisfied, the average height of the target uneven shape and the ratio of the average interval are not satisfied, and the extraction efficiency and the light emission appearance are poor. It was.
In Comparative Examples 3 to 5, even if the same active energy ray-curable composition as in Example 1 was used, the ratio of the average interval of 200 to 450 nm of the cured film Z was less than 30% due to the difference in heating conditions, and the extraction efficiency was The luminescent appearance was poor. In Comparative Example 6, there was no uneven shape, so the light emission appearance was good, but the extraction efficiency was low.
以上説明したように、本発明によれば、素子内の短絡を誘引することがなく、光取出し効率をより向上させることができ、十分に高い発光効率を達成することが可能な有機EL素子を提供することが可能となる。 As described above, according to the present invention, there is provided an organic EL device capable of further improving the light extraction efficiency without causing a short circuit in the device and achieving sufficiently high light emission efficiency. It becomes possible to provide.
Claims (4)
(1)分散体の平均粒子径が100〜500nmであり、変動係数が30%以下の有機粒子Aの分散体、無機粒子Bの分散体、および活性エネルギー線硬化性成分Cを混合してなる活性エネルギー線硬化性組成物であって、前記有機粒子Aの分散体中の有機粒子Aの平均粒子径が、前記無機粒子Bの分散体中の無機粒子Bの平均粒子径よりも大きい活性エネルギー線硬化性組成物を用意する工程。
(2)前記活性エネルギー線硬化性組成物を支持基板に塗工した後、乾燥し、前記有機粒子Aに起因する凸部を表面に有する活性エネルギー線硬化性膜Xであって、前記有機粒子Aの分散体中の有機粒子Aの平均粒子径の2〜20倍の厚みの活性エネルギー線硬化性膜Xを形成する工程。
(3)前記活性エネルギー線硬化性膜Xに活性エネルギー線を照射し、硬化膜Yを形成する工程。
(4)次いで、加熱し、前記硬化膜Yの表面の凸部を、その淵部を残すように破壊し、凹部を形成して、200〜450nmの間隔の凹凸の占める割合が30%以上である、硬化膜Zを得る工程。
(5)前記硬化膜Z上に金属を蒸着する工程。 The manufacturing method of the electrode for organic EL elements containing following process (1)-(4).
(1) An average particle size of the dispersion is 100 to 500 nm, and a dispersion of organic particles A having a coefficient of variation of 30% or less, a dispersion of inorganic particles B, and an active energy ray-curable component C are mixed. An active energy ray-curable composition, wherein the average particle size of the organic particles A in the dispersion of the organic particles A is larger than the average particle size of the inorganic particles B in the dispersion of the inorganic particles B A step of preparing a linear curable composition.
(2) The active energy ray-curable film X, which is coated with the active energy ray-curable composition on a support substrate and then dried and has convex portions due to the organic particles A on the surface, the organic particles A step of forming an active energy ray-curable film X having a thickness of 2 to 20 times the average particle diameter of the organic particles A in the dispersion of A.
(3) A step of irradiating the active energy ray-curable film X with active energy rays to form a cured film Y.
(4) Next, the surface of the cured film Y is heated to break the convex portions so as to leave the ridges, and the concave portions are formed, and the proportion of the concaves and convexes with an interval of 200 to 450 nm is 30% or more. A step of obtaining a cured film Z.
(5) A step of depositing a metal on the cured film Z.
(1)分散体の平均粒子径が100〜500nmであり、変動係数が30%以下の有機粒子Aの分散体、無機粒子Bの分散体、および活性エネルギー線硬化性成分Cを混合してなる活性エネルギー線硬化性組成物であって、前記有機粒子Aの分散体中の有機粒子Aの平均粒子径が、前記無機粒子Bの分散体中の無機粒子Bの平均粒子径よりも大きい活性エネルギー線硬化性組成物を用意する工程。
(2)前記活性エネルギー線硬化性組成物を支持基板に塗工した後、乾燥し、前記有機粒子Aに起因する凸部を表面に有する活性エネルギー線硬化性膜Xであって、前記有機粒子Aの分散体中の有機粒子Aの平均粒子径の2〜20倍の厚みの活性エネルギー線硬化性膜Xを形成する工程。
(3)前記活性エネルギー線硬化性膜Xに活性エネルギー線を照射し、硬化膜Yを形成する工程。
(4)次いで、加熱し、前記硬化膜Yの表面の凸部を、その淵部を残すように破壊し、凹部を形成して、200〜450nmの間隔の凹凸の占める割合が30%以上である、硬化膜Zを得る工程。
(5)前記硬化膜Z上に金属を蒸着し、有機EL用素子電極を製造する工程。
(6)前記有機EL用電極上に、発光層を含む有機層を形成する工程。
(7)前記発光層を含む有機層上に、透明電極を形成する工程。
(8)接着剤を用いて前記透明電極上に、透明支持基板に貼り付ける工程。
The manufacturing method of the organic EL element containing following process (1)-(7).
(1) An average particle size of the dispersion is 100 to 500 nm, and a dispersion of organic particles A having a coefficient of variation of 30% or less, a dispersion of inorganic particles B, and an active energy ray-curable component C are mixed. An active energy ray-curable composition, wherein the average particle size of the organic particles A in the dispersion of the organic particles A is larger than the average particle size of the inorganic particles B in the dispersion of the inorganic particles B A step of preparing a linear curable composition.
(2) The active energy ray-curable film X, which is coated with the active energy ray-curable composition on a support substrate and then dried and has convex portions due to the organic particles A on the surface, the organic particles A step of forming an active energy ray-curable film X having a thickness of 2 to 20 times the average particle diameter of the organic particles A in the dispersion of A.
(3) A step of irradiating the active energy ray-curable film X with active energy rays to form a cured film Y.
(4) Next, the surface of the cured film Y is heated to break the convex portions so as to leave the ridges, and the concave portions are formed, and the proportion of the concaves and convexes with an interval of 200 to 450 nm is 30% or more. A step of obtaining a cured film Z.
(5) A step of manufacturing a device electrode for organic EL by depositing a metal on the cured film Z.
(6) A step of forming an organic layer including a light emitting layer on the organic EL electrode.
(7) A step of forming a transparent electrode on the organic layer including the light emitting layer.
(8) The process of sticking on a transparent support substrate on the said transparent electrode using an adhesive agent.
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