JP2017110293A5 - - Google Patents

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Publication number
JP2017110293A5
JP2017110293A5 JP2016219861A JP2016219861A JP2017110293A5 JP 2017110293 A5 JP2017110293 A5 JP 2017110293A5 JP 2016219861 A JP2016219861 A JP 2016219861A JP 2016219861 A JP2016219861 A JP 2016219861A JP 2017110293 A5 JP2017110293 A5 JP 2017110293A5
Authority
JP
Japan
Prior art keywords
carbon film
forming method
film forming
film formation
etching step
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2016219861A
Other languages
English (en)
Japanese (ja)
Other versions
JP2017110293A (ja
Filing date
Publication date
Application filed filed Critical
Priority to US15/377,141 priority Critical patent/US20170170065A1/en
Publication of JP2017110293A publication Critical patent/JP2017110293A/ja
Publication of JP2017110293A5 publication Critical patent/JP2017110293A5/ja
Pending legal-status Critical Current

Links

JP2016219861A 2015-12-15 2016-11-10 カーボン膜の成膜方法および成膜装置 Pending JP2017110293A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US15/377,141 US20170170065A1 (en) 2015-12-15 2016-12-13 Carbon film forming method, carbon film forming apparatus, and storage medium

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015244234 2015-12-15
JP2015244234 2015-12-15

Publications (2)

Publication Number Publication Date
JP2017110293A JP2017110293A (ja) 2017-06-22
JP2017110293A5 true JP2017110293A5 (fr) 2019-07-11

Family

ID=59079425

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016219861A Pending JP2017110293A (ja) 2015-12-15 2016-11-10 カーボン膜の成膜方法および成膜装置

Country Status (1)

Country Link
JP (1) JP2017110293A (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10446736B2 (en) * 2017-11-27 2019-10-15 International Business Machines Corporation Backside coupling with superconducting partial TSV for transmon qubits
JP2022133762A (ja) * 2021-03-02 2022-09-14 東京エレクトロン株式会社 成膜方法、処理装置及び処理システム

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG195494A1 (en) * 2012-05-18 2013-12-30 Novellus Systems Inc Carbon deposition-etch-ash gap fill process
JP6045975B2 (ja) * 2012-07-09 2016-12-14 東京エレクトロン株式会社 カーボン膜の成膜方法および成膜装置

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