JP2017075370A - Production method of interference color ornament body, interference color ornament body, and magnetron sputtering device for producing interference color ornament body - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a production method of an interference color ornament body capable of achieving easily interference color pattern having a desired shape or hue change.SOLUTION: A production method of an interference color ornament body includes steps for: preparing a substrate 10 having a main surface 10a as a reflection surface; and depositing a transparent thin film 20 comprising a single layer on the main surface 10a of the substrate 10 in a non-uniform thickness distribution containing a different thickness part by magnetron sputtering using a magnetron sputtering device.SELECTED DRAWING: Figure 1

Description

  The present invention relates to an interference color decorative body having a reflecting surface covered with a transparent thin film, a method for manufacturing the same, and a magnetron sputtering apparatus for manufacturing the interference color decorative body.

  The interference color decorative body is configured by covering a reflective surface provided on a base material with a transparent thin film having a thickness comparable to the wavelength of light. When this interference color decoration is irradiated with white light or mixed color light, the interference fringes formed by the light reflected from the front and back surfaces of the transparent thin film interfere with each other have a color. Will be granted.

  Here, when the transparent thin film has a non-uniform thickness distribution, a colorful interference color pattern in which a plurality of hues are arranged is formed. Therefore, in order to manufacture a brighter interference color decorative body, it is indispensable to control the thickness of the transparent thin film with high accuracy for each part when forming the transparent thin film.

  Various methods are known as a method for producing an interference color decorative body. For example, a base material having a main surface as a reflecting surface is prepared in advance, and vapor deposition is performed on the main surface of the base material. A method of manufacturing an interference color decorative body by forming a transparent thin film by sputtering or the like is known. As a document disclosing the manufacturing method, there is, for example, JP 2009-51055 A (Patent Document 1).

  In the method for producing an interference color decorative body disclosed in Patent Document 1, in order to control the thickness of the transparent thin film with high accuracy for each part at the time of forming the transparent thin film, repeated evaporation or the like is performed using a mask. I am going to do that. That is, a plurality of previously formed transparent thin film patterns are formed by vapor deposition or the like with a mask placed at a distance from the main surface of the base material, and then the mask is shifted in a direction parallel to the surface direction of the substrate. By forming a plurality of transparent thin film patterns again by vapor deposition or the like so as to partially overlap the transparent thin film pattern, it is possible to control the thickness of the transparent thin film with high accuracy for each part.

JP 2009-51055 A

  However, in the method for producing an interference color decorative body disclosed in Patent Document 1, it is necessary to repeatedly form a transparent thin film pattern. There is a problem that the manufacturing operation becomes complicated and the manufacturing cost increases.

  Further, in the method for manufacturing an interference color decorative body disclosed in Patent Document 1, even if a relatively simple interference color pattern such as a dot shape or a line shape can be formed, a complicated interference color pattern is formed. There is a problem that it is difficult to form. Here, in order to form a complex interference color pattern, it is assumed that a plurality of different mask patterns are prepared and replaced every time a film forming process is performed a plurality of times, but the manufacture thereof is extremely difficult. End up.

  Accordingly, the present invention has been made to solve the above-described problems, and provides a method for manufacturing an interference color decorative body that can easily realize an interference color pattern having a desired shape and hue change. In addition to this, an interference color decorative body in which an interference color pattern having a desired shape and hue change is realized, and a magnetron sputtering apparatus that can be suitably used to manufacture the interference color decorative body The purpose is to provide.

  The method for producing an interference color decorative body according to the present invention comprises a step of preparing a base material having a main surface as a reflecting surface, and magnetron sputtering using a magnetron sputtering apparatus to form transparent thin films made of a single layer with different thicknesses. Forming a film on the main surface of the base material with a non-uniform thickness distribution including a portion.

  In the method for producing an interference color decorative body according to the present invention, the surface density distribution of the sputtered particles emitted from the target on the main surface of the substrate is different in the step of forming the transparent thin film. It is preferable that the transparent thin film is formed under the condition of non-uniform surface density distribution including the surface density portion.

  In the method for producing an interference color decorative body according to the present invention, in the step of forming the transparent thin film, the magnetron sputtering apparatus has a thickness distribution according to the shape and arrangement position of the magnet and the magnetic force. Since the transparent thin film is formed, it is preferable that the interference color pattern corresponds to the shape and arrangement position of the magnet and the magnetic force.

  In the method for producing an interference color decorative body according to the present invention, in the step of forming the transparent thin film, the transparent thin film is formed such that the exposed surface of the transparent thin film to be formed continuously undulates smoothly. It is preferable to form a film.

  In the method for producing an interference color decorative body according to the present invention, it is preferable to use a substrate whose surface is flatter than the exposed surface of the transparent thin film to be formed.

  In the method for producing an interference color decorative body according to the present invention, it is preferable to use a substrate in which the main surface is composed of an aluminum film or a silver film, and as the transparent thin film, It is preferable to form any one of a silicon oxide film, an aluminum oxide film, an indium tin oxide film, and a titanium dioxide film.

  In the method for producing an interference color decorative body according to the present invention, the magnetron sputtering apparatus is provided on the back surface side of the target and spaced from each other in a direction parallel to the back surface of the target. Alternatively, a device including a plurality of electromagnets and a current application unit capable of selectively applying a current to the plurality of electromagnets may be used.

  In the method for manufacturing an interference color decorative body according to the present invention, the magnetron sputtering device is a plurality of a plurality of spaced apart ones in a direction that is located on the back surface side of the target and parallel to the back surface of the target. While providing the magnet holder provided with the magnet attachment hole, you may use what can attach a permanent magnet to each of the said several magnet attachment hole so that attachment or detachment is possible.

  An interference color decorative body according to the present invention includes a base material having a main surface as a reflecting surface, and a transparent thin film composed of a single layer located on the main surface of the base material, the transparent thin film Have a non-uniform thickness distribution including different thickness portions.

  In the interference color decorative body according to the present invention, it is preferable that the exposed surface of the transparent thin film is continuously and smoothly undulated.

  In the interference color decorative body according to the present invention, the main surface of the substrate is preferably flatter than the exposed surface of the transparent thin film.

  In the interference color decorative body according to the present invention, the main surface of the substrate is preferably composed of an aluminum film or a silver film, and the transparent thin film is formed of a silicon oxide film, an oxidation film, or the like. Any of an aluminum film, an indium tin oxide film, and a titanium dioxide film is preferable.

  A magnetron sputtering apparatus for manufacturing an interference color decorative body according to the first aspect of the present invention includes a chamber, a target installed in the chamber, a back surface side of the target, and the above-described target of the target. A plurality of electromagnets provided at intervals in a direction parallel to the back surface, and a current application unit capable of selectively applying a current to the plurality of electromagnets.

  A magnetron sputtering apparatus for manufacturing an interference color decorative body according to the second aspect of the present invention includes a chamber, a target installed in the chamber, a back surface side of the target, and the above-described target of the target. A magnet holder provided with a plurality of magnet mounting holes spaced apart from each other in a direction parallel to the back surface, and a permanent magnet can be detachably attached to each of the plurality of magnet mounting holes. It is.

  ADVANTAGE OF THE INVENTION According to this invention, the manufacturing method of the interference color ornament which can implement | achieve the interference color pattern which has a desired shape and a hue change easily can be provided, and the interference which has a desired shape and a hue change It is possible to provide an interference color decorative body in which a color pattern is realized and a magnetron sputtering apparatus that can be suitably used to manufacture the interference color decorative body.

It is the model top view and schematic sectional drawing of the interference color decoration body in Embodiment 1 of this invention. It is the schematic block diagram of the magnetron sputtering device for manufacturing the interference color decoration body in Embodiment 1 of this invention, and the model top view of a magnetic unit. It is a graph which shows an example of correlation with the erosion distribution of a target, and the particle adhesion number distribution to the base material of a sputtered particle. It is a schematic plan view and a schematic sectional view of an interference color decorative body according to a first modification. It is the model top view of the interference color decoration body which concerns on a 2nd modification, and the model top view of the magnetic unit of a magnetron sputtering device. It is the model top view of the interference color decoration body which concerns on a 3rd modification, and the model top view of the magnetic unit of a magnetron sputtering device. It is a schematic top view of the interference color decoration body which concerns on a 4th modification, and a schematic top view of the magnetic unit of a magnetron sputtering device. It is the schematic block diagram of the magnetron sputtering apparatus in Embodiment 2 of this invention, and the model top view of a magnetic unit. It is a figure for demonstrating one usage example of the magnetron sputtering apparatus shown in FIG. FIG. 10 is a schematic plan view of an interference color decoration manufactured in the example of use shown in FIG. 9. FIG. 10 is a schematic plan view of an interference color decoration manufactured when the film formation conditions are changed in the usage example shown in FIG. 9. It is a schematic block diagram of the magnetron sputtering apparatus in Embodiment 3 of this invention.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In the following embodiments, the same or common parts are denoted by the same reference numerals in the drawings, and description thereof will not be repeated.

(Embodiment 1)
FIG. 1 (A) is a schematic plan view of an interference color decoration in Embodiment 1 of the present invention, and FIG. 1 (B) is an interference color decoration along the line IB-IB shown in FIG. 1 (A). It is a schematic cross section of a body. First, with reference to FIG. 1, an interference color decorative body 1A according to the present embodiment will be described.

  As shown in FIG. 1A, the interference color decorative body 1A has a circular interference color pattern 21 formed on the surface thereof. Here, the interference color pattern 21 is in order of purple (V), blue (B), green (G), yellow (Y), red (R), yellow (Y), green (G), blue (in order from the inside. B) It consists of an annular pattern exhibiting nine consecutive hue changes of purple (V).

  As shown in FIGS. 1A and 1B, the interference color decorative body 1 </ b> A includes a base material 10 and a transparent thin film 20. The base material 10 consists of a flat member, for example, and the one main surface 10a is comprised by the reflective surface. On the other hand, the transparent thin film 20 is composed of a single layer and covers the main surface 10 a of the substrate 10.

  The base material 10 may be comprised with the single member, for example, and may be comprised with the member by which the surface of the base was covered with the reflecting film. When the base material 10 is composed of a single member, a metal member (for example, an aluminum member, an aluminum alloy member, a silver member, etc.) or a resin having a sufficiently high surface reflectance is used. These members can be used. In addition, when the base 10 is constituted by a member whose surface of the base is covered with a reflective film, the material of the base is not particularly limited, and the reflectance of the surface of the reflective film is not limited. A sufficiently high metal film (for example, an aluminum film, an aluminum alloy film, or a silver film), a resin film, or the like can be used.

  In addition, it is preferable that the main surface 10a of the base material 10 is flatter, and it is preferable that the surface roughness is 10 [nm] or less by arithmetic mean roughness Ra. When the condition is satisfied, the light transmitted through the transparent thin film 20 is hardly scattered, and the brightness and vividness of the interference color can be increased. However, the main surface 10a of the base material 10 is not necessarily a flat surface, and may be constituted by an uneven surface, a curved surface, or the like.

  Transparent thin film 20 has a non-uniform thickness distribution in a direction parallel to main surface 10a of substrate 10. Here, the non-uniform thickness distribution means that different parts are included in the thickness of the transparent thin film 20, in other words, the thickness of the transparent thin film 20 is not uniform.

  In the present embodiment, the thickness distribution of the transparent thin film 20 is as shown in FIG. 1B, whereby the circular interference color pattern 21 described above is formed. More specifically, the transparent thin film 20 has an annularly raised portion on a part of the exposed surface 20a, and the thickness of the transparent thin film 20 at the annularly raised portion is approximately 200 [nm] to 450. [Nm]. In addition, the exposed surface 20a is a mountain in the radial direction so that the annularly raised portion undulates smoothly in a direction parallel to the main surface 10a of the substrate 10.

  Here, the transparent thin film 20 may be colorless or colored. The material of the transparent thin film 20 is not particularly limited, and any material can be used as long as it can be formed by magnetron sputtering described later. The transparent thin film 20 is preferably a silicon oxide film, an aluminum oxide film, an indium tin oxide film (so-called ITO film), a titanium dioxide film, or the like.

  In the interference color decorative body 1A having the above configuration, when white light is irradiated to the interference colored decorative body 1A, the front surface (that is, the exposed surface 20a) and the back surface (that is, the main surface of the substrate 10) of the transparent thin film 20 are irradiated. The white light reflected by each of the surfaces 10a) is interfered with each other, so that light of a certain wavelength intensifies each other according to the thickness of the transparent thin film 20 in the portion, and light of other wavelengths We will weaken each other. Therefore, the interference color pattern 21 composed of an annular pattern exhibiting a continuous hue change as described above is formed on the surface of the interference color decoration 1A.

  In addition, it is preferable that the exposed surface 20a of the transparent thin film 20 is continuously and smoothly undulated in the direction parallel to the main surface 10a of the base material 10 as described above. A colorful interference color pattern 21 whose hue changes smoothly and continuously can be formed.

  The interference color decoration 1A in the present embodiment described above is prepared by preparing a base material 10 having a main surface 10a as a reflecting surface in advance, and performing magnetron sputtering using a magnetron sputtering apparatus 100A (see FIG. 2) described later. The transparent thin film 20 made of a single layer can be produced by forming a film on the main surface 10a of the substrate 10 with a non-uniform thickness distribution including different thickness portions.

  That is, in the manufacturing method of the interference color decorative body in the present embodiment, when the transparent thin film 20 is formed on the main surface 10a of the substrate 10, the transparent thin film 20 is formed by a single film forming process using magnetron sputtering. The film is formed with a non-uniform thickness distribution. Hereinafter, the details will be described together with the configuration of the magnetron sputtering apparatus 100A described above for realizing the manufacturing method.

  FIG. 2A is a schematic configuration diagram of a magnetron sputtering apparatus for manufacturing the interference color decorative body in the present embodiment, and FIG. 2B is a schematic plan view of the magnetic unit shown in FIG. FIG. Prior to describing the method for manufacturing an interference color decorative body in the present embodiment, first, the configuration of a magnetron sputtering apparatus 100A used in the manufacturing method will be described with reference to FIG.

  As shown in FIG. 2A, the magnetron sputtering apparatus 100A mainly includes a chamber 110, a magnetic unit 120, and a target 160. The chamber 110 is constituted by a vacuum vessel, and the magnetic unit 120 and the target 160 are installed therein. The magnetic unit 120 is disposed in the lower part of the chamber 110, and the target 160 is disposed on the magnetic unit 120.

  As shown in FIGS. 2A and 2B, the magnetic unit 120 is mainly configured by a yoke 130, a nonmagnetic magnet holder 140, and a pair of permanent magnets 151 and 152. The yoke 130 is disposed below the magnetic unit 120, and the pair of permanent magnets 151 and 152 are held by the magnet holder 140. Here, the pair of permanent magnets 151 and 152 includes a columnar permanent magnet 151 and a cylindrical permanent magnet 152, and the pair of permanent magnets 151 and 152 are arranged concentrically.

  The columnar permanent magnet 151 is arranged such that its north pole is located on the target 160 side and its south pole is located on the yoke 130 side. Further, the cylindrical permanent magnet 152 is arranged so that the north pole is located on the yoke 130 side and the south pole is located on the target 160 side. Note that the columnar permanent magnet 151 and the cylindrical permanent magnet 152 are arranged with a predetermined distance in the radial direction.

  The target 160 is a material for forming the transparent thin film 20 and has, for example, a flat plate shape. The target 160 is arranged close to the magnetic unit 120 so that the magnetic lines of force ML formed by the pair of permanent magnets 151 and 152 described above pass through the inside along the thickness direction. A pair of permanent magnets 151 and 152 are disposed on the back surface side of the target 160.

  In the method of manufacturing an interference color decorative body in the present embodiment, first, the base material 10 as a work is a predetermined distance from the target 160 such that the main surface 10a as the reflecting surface faces the target 160. Is set in the chamber 110. In that case, the base material 10 is set so that the front surface of the target 160 and the main surface 10a of the base material 10 may become parallel.

  In this state, the chamber 110 is evacuated, and then Ar gas is introduced into the chamber 110 and a negative voltage is applied to the target 160. As a result, a donut-shaped plasma region P as illustrated is formed in the space between the base material 10 and the target 160.

  Ar ions generated in the plasma region P are accelerated by an electric field and collide with the front surface of the target 160 to eject atoms as a film forming material constituting the target 160. The ejected atoms (sputtered particles) reach the main surface 10a of the base material 10 arranged to face the target 160 and adhere to the main surface 10a. As a result, the sputtered particles as the film forming material adhere and deposit on the main surface 10a of the base material 10, and the transparent thin film 20 is formed.

  In the present embodiment, the diameter of the columnar permanent magnet 151 is 30 [mm], the inner diameter of the cylindrical permanent magnet 152 is 70 [mm], and the outer diameter of the cylindrical permanent magnet 152 is 100. [Mm], the distance between the substrate 10 and the target 160 is 15 [mm], and the pressure in the chamber 110 is 0.2 [Pa]. 1A is obtained.

  Here, in the manufacturing method of the interference color decorative body in the present embodiment, the distance between the base material 10 and the target 160 is set to be sufficiently short during the film formation described above, and the inside of the chamber 110 is set. The pressure is set sufficiently low.

  By performing film formation under such film formation conditions, the surface density distribution of the sputtered particles emitted from the target 160 on the main surface 10a of the substrate 10 becomes a non-uniform surface density distribution. Here, the non-uniform surface density distribution means that different surface density portions are included in the surface density of the sputtered particles on the main surface 10a of the substrate 10, in other words, This means that the surface density of the sputtered particles on the main surface 10a is not uniform.

  This is because the distance between the substrate 10 and the target 160 is sufficiently short and the pressure in the chamber 110 is sufficiently low, so that the sputtered particles ejected from the target 160 are exclusively the shortest distance from the main surface of the substrate 10. As a result of reaching 10a, the surface density of the sputtered particles on the main surface 10a of the substrate 10 is directly affected by the density of the plasma formed in the space between the target 160 and the substrate 10.

  This is clear from the following simulation results. FIG. 3 is a graph showing an example of a simulation result of the correlation between the erosion distribution of the target and the particle adhesion number distribution of the sputtered particles to the base material. FIG. FIG. 3B shows the particle number distribution of sputtered particles to the substrate.

  The simulation results shown in FIG. 3 show that the erosion distribution of the target 160 (that is, the shape change of the front surface of the target 160 caused by the atoms being ejected from the target 160), the basic conditions, The particle adhesion number distribution of sputtered particles adhering to the main surface 10a of the material 10 is calculated by simulation.

  In this case, as shown in FIG. 3A, the erosion distribution of the target 160 has a maximum depth at a portion of about 23 [mm] in the radial direction from the center. The depth gradually decreases in the inner portion and the radially outer portion, and the erosion is approximately in the portion inner than about 14 [mm] radially from the center and the portion outside about 36 [mm] radially from the center. It has not occurred.

  On the other hand, as shown in FIG. 3B, in the particle adhesion number distribution of sputtered particles, the particle adhesion number is maximum at a portion of about 22 [mm] in the radial direction from the center. In addition, the particle adhesion number gradually decreases in the radially inner portion and the radially outer portion. The particle adhesion number distribution of the sputtered particles corresponds to the surface density distribution of the sputtered particles on the main surface 10a of the base material 10.

  Thus, the surface density distribution of the sputtered particles on the main surface 10a of the base material 10 is determined by the density of the plasma formed in the space between the target 160 and the base material 10, and is closely related to the erosion distribution of the target 160. There is a strong correlation. Here, since the plasma formed in the space between the target 160 and the substrate 10 can be adjusted by the shape and arrangement position of the magnet provided in the magnetic unit 120, the interference color pattern 21 described above is It becomes a shape according to the shape and arrangement position of the magnet.

  Therefore, by performing the simulation as described above in advance, it is possible to derive film formation conditions suitable for making the desired thickness distribution of the transparent thin film to be formed. By following the film formation conditions, With a single film formation process using magnetron sputtering, it becomes possible to form the transparent thin film 20 made of a single layer with a non-uniform thickness distribution. It should be noted that it is naturally possible to derive the film forming conditions by a preliminary experiment or the like without performing a simulation in advance.

  The distance between the substrate 10 and the target 160 is preferably 40 [mm] or less, and more preferably 20 [mm] or less. Further, the pressure in the chamber 110 is preferably 0.7 [Pa] or less, and more preferably 0.2 [Pa] or less. By satisfying these conditions, the surface density distribution of the sputtered particles on the main surface 10a of the substrate 10 becomes non-uniform, and the transparent thin film to be formed can have a non-uniform thickness distribution. .

  Further, as described above, when the substrate 10 having a sufficiently flat main surface 10a is used, the transparent thin film 20 composed of a single layer formed by magnetron sputtering has a non-uniform thickness. By having the distribution, the main surface 10 a of the substrate 10 becomes flatter than the exposed surface 20 a of the transparent thin film 20. In this regard, the interference color decorative body 1A in the present embodiment is an interference color decorative body formed by forming irregularities on the main surface of the base material in advance and forming a transparent thin film by spin coating or the like. The configuration will be different.

  As described above, by adopting the interference color decorative body manufacturing method according to the present embodiment, the transparent thin film composed of a single layer has a non-uniform thickness distribution including different thickness portions. Since the film is formed on the main surface, an interference color pattern having a desired shape and hue change can be easily realized.

  Further, like the interference color decoration 1A in the present embodiment, the transparent thin film has a non-uniform thickness distribution including different thickness portions, thereby realizing an interference color pattern having a desired shape and hue change. Interference color decorations made.

(First modification)
FIG. 4A is a schematic plan view of the interference color decoration according to the first modification, and FIG. 4B is a diagram of the interference color decoration along the line IVB-IVB shown in FIG. It is a schematic cross section. Hereinafter, with reference to FIG. 4, an interference color decoration 1A ′ according to the first modification based on the above-described first embodiment will be described.

  As shown in FIG. 4A, the interference color decorative body 1A ′ has a circular interference color pattern 21 formed on the surface thereof, and the interference color pattern 21 is red (R) in order from the inside. ), Yellow (Y), green (G), blue (B), and purple (V), the interference color decorative body 1A according to the first embodiment described above in that it is formed of an annular pattern exhibiting five hue changes. And the configuration is different.

  In the present modification, the thickness distribution of the transparent thin film 20 is as shown in FIG. 4B, whereby the circular interference color pattern 21 described above is formed. More specifically, the transparent thin film 20 has a convex raised portion on a part of the exposed surface 20a, and the thickness of the transparent thin film 20 in the convex raised portion is approximately 200 [nm]. It is -300 [nm]. In addition, the exposed surface 20a is crested in the radial direction so that the convexly raised portion continuously and smoothly undulates in the direction parallel to the main surface 10a of the base material 10, and its top portion The part is almost flat.

  Here, the interference color decorative body 1A ′ according to the present modification has a distance of 25 [mm] between the base material 10 and the target 160 among the film forming conditions of the transparent thin film described in the first embodiment. It is obtained when it is changed to.

  Thus, by changing the distance between the base material 10 and the target 160, the interference color pattern 21 having a different aspect from the above-described first embodiment can be formed.

(Second modification)
FIG. 5A is a schematic plan view of an interference color decoration according to the second modification, and FIG. 5B is a magnetic diagram of a magnetron sputtering apparatus for producing the interference color decoration according to the second modification. It is a schematic plan view of a unit. Hereinafter, with reference to FIG. 5, an interference color decorative body 1 </ b> B according to the second modification based on the above-described first embodiment will be described.

  As shown in FIG. 5A, the interference color decorative body 1B has a rectangular interference color pattern 21 formed on the surface thereof. The interference color pattern 21 is purple (V) in order from the inside. , Blue (B), Green (G), Yellow (Y), Red (R), Yellow (Y), Green (G), Blue (B), Purple (V) It consists of a square pattern.

  The interference color decorative body 1B having the configuration is manufactured by using a magnetron sputtering apparatus 100B including a magnetic unit 120 having a configuration different from that of the magnetron sputtering apparatus 100A shown in the first embodiment.

  Specifically, as shown in FIG. 5B, the magnetic unit 120 of the magnetron sputtering apparatus 100B is mainly configured by a magnet holder 140 and a pair of permanent magnets 151 and 152, and the pair of permanent magnets 151 and 151 Reference numeral 152 denotes a quadrangular prism-shaped permanent magnet 151 and a rectangular tubular permanent magnet 152 that are concentrically arranged.

  In this way, by changing the shapes and arrangement positions of the permanent magnets 151 and 152 in the magnetic unit 120, the interference color pattern 21 having a different aspect from the above-described first embodiment can be formed.

(Third Modification)
FIG. 6A is a schematic plan view of an interference color decoration according to the third modification, and FIG. 6B is a magnetic diagram of a magnetron sputtering apparatus for producing the interference color decoration according to the third modification. It is a schematic plan view of a unit. Hereinafter, with reference to FIG. 6, an interference color decorative body 1 </ b> C according to the third modification based on the above-described first embodiment will be described.

  As shown in FIG. 6A, the interference color decorative body 1C has a triangular interference color pattern 21 formed on the surface thereof, and the interference color pattern 21 is purple (V) in order from the inside. , Blue (B), Green (G), Yellow (Y), Red (R), Yellow (Y), Green (G), Blue (B), Purple (V) Consists of a triangular pattern.

  The interference color decorative body 1C having the configuration is manufactured by using a magnetron sputtering apparatus 100C provided with a magnetic unit 120 having a configuration different from the magnetron sputtering apparatus 100A shown in the first embodiment.

  Specifically, as shown in FIG. 6B, the magnetic unit 120 of the magnetron sputtering apparatus 100C is mainly composed of a magnet holder 140 and a pair of permanent magnets 151 and 152, and the pair of permanent magnets 151 and 151 Reference numeral 152 denotes a triangular prism-shaped permanent magnet 151 and a triangular cylindrical permanent magnet 152 that are arranged concentrically.

  In this way, by changing the shapes and arrangement positions of the permanent magnets 151 and 152 in the magnetic unit 120, the interference color pattern 21 having a different aspect from the above-described first embodiment can be formed.

(Fourth modification)
FIG. 7A is a schematic plan view of an interference color decoration according to the fourth modification, and FIG. 7B is a magnetic diagram of a magnetron sputtering apparatus for manufacturing the interference color decoration according to the fourth modification. It is a schematic plan view of a unit. Hereinafter, with reference to FIG. 7, an interference color decoration 1D according to a fourth modification based on the above-described first embodiment will be described.

  As shown in FIG. 7A, the interference color decorative body 1D is formed by forming three circular interference color patterns 21 on the surface thereof. Like the form 1, it consists of the cyclic | annular pattern (refer FIG. 1 (A)) which exhibits the change of nine hues.

  The interference color decorative body 1D having the configuration is manufactured by using a magnetron sputtering apparatus 100D including a magnetic unit 120 having a configuration different from that of the magnetron sputtering apparatus 100A described in the first embodiment.

  Specifically, as shown in FIG. 7B, the magnetic unit 120 of the magnetron sputtering apparatus 100D is mainly configured by a magnet holder 140 and three sets of permanent magnet pairs. Each includes a pair of permanent magnets 151 and 152. The pair of permanent magnets 151 and 152 includes a columnar permanent magnet 151 and a cylindrical permanent magnet 152 that are arranged concentrically.

  In this way, by changing the shapes and arrangement positions of the permanent magnets 151 and 152 in the magnetic unit 120, the interference color pattern 21 having a different aspect from the above-described first embodiment can be formed.

(Embodiment 2)
FIG. 8A is a schematic configuration diagram of a magnetron sputtering apparatus according to Embodiment 2 of the present invention, and FIG. 8B is a schematic plan view of the magnetic unit shown in FIG. 8A. First, the configuration of magnetron sputtering apparatus 100E in the present embodiment will be described with reference to FIG.

  As shown in FIGS. 8A and 8B, the magnetron sputtering apparatus 100E includes a magnetic unit 120 having a different configuration when compared to the magnetron sputtering apparatus 100A in the first embodiment described above. The only difference is in

  Specifically, the magnetic unit 120 has a plurality of electromagnets 153, and each of the plurality of electromagnets 153 is individually held by a magnet holder 141. Each of the plurality of electromagnets 153 includes a rod-shaped iron core 153a and a coil 153b wound around the iron core 153a.

  The plurality of electromagnets 153 are arranged in an array at intervals in a direction parallel to the back surface of the target 160. As shown in FIG. 8B, in the present embodiment, electromagnets 153 are arranged in 9 rows and 9 columns, and the total number is 81.

  A current application unit 154 is connected to the coils 153b included in the plurality of electromagnets 153. The current application unit 154 has energization state switching means such as a relay, for example, and can be excited by selecting a specific electromagnet from a plurality of electromagnets 153 and applying a current thereto, The magnetic force can also be changed variously. In addition, the current application unit 154 can also switch the energization direction with respect to a specific coil, thereby reversing the polarity of each electromagnet.

  In the magnetron sputtering apparatus 100E provided with the magnetic unit 120 configured as described above, the electromagnet 153 to be excited is variously switched by the current application unit 154 to be formed between the magnetic unit 120 and the substrate 10. The magnetic field lines ML can be changed variously. Therefore, various interference color patterns can be formed with a high degree of freedom by changing the magnetic field lines ML in various ways.

  FIG. 9 is a diagram for explaining an example of use of the magnetron sputtering apparatus shown in FIG. 8. FIG. 9 (A) shows an excitation state of a plurality of electromagnets in the example of use. B) represents a schematic cross section of the magnetron sputtering apparatus in the one usage example along the line IXB-IXB shown in FIG. FIG. 10 is a schematic plan view of the interference color decoration manufactured in the example of use shown in FIG. In addition, this example of use is a case where the interference color decoration 1E in which the interference color pattern 21 is formed so that the letter “D” appears on the surface is manufactured.

  As shown in FIG. 9 (A) and FIG. 9 (B), in this use example, by exciting a specific electromagnet among a plurality of electromagnets 153 arranged in an array, the letter “D” is obtained. A corresponding plasma region P is formed. Here, the part of the electromagnet corresponding to the inner side of the “D” has an N pole formed at the end of the electromagnet on the target 160 side, and corresponds to the outer side of the “D”. With respect to the portion of the electromagnet, an S pole is formed at the end of the electromagnet on the target 160 side. It should be noted that the electromagnet in the portion corresponding to the inside of the “D” character and the electromagnet other than the electromagnet in the portion corresponding to the outside of the “D” character are not excited.

  In this state, by forming the transparent thin film 20 using the magnetron sputtering apparatus 100E in the present embodiment, an interference color decorative body 1E as shown in FIG. 10 can be manufactured. Here, the interference color pattern 21 consisting of the letter “D” is adjusted in order from the inside as shown in the figure by appropriately adjusting the distance between the substrate 10 and the target 160 and the pressure in the chamber 110. Nine consecutive hues of purple (V), blue (B), green (G), yellow (Y), red (R), yellow (Y), green (G), blue (B), purple (V) It is possible to exhibit a change of

  FIG. 11 is a schematic plan view of an interference color decorative body manufactured when the film forming conditions are changed in the above-described usage example. The interference color ornament 1E ′ shown in FIG. 11 reduces the strength of the magnetic field formed by these electromagnets by lowering the energization current of the electromagnets given the symbol “*” in FIG. In this state, the transparent thin film 20 is formed.

  In one example of use described above, as shown in FIG. 10, the interference color pattern 21 is formed so that nine hues are included in the entire area of the letter “D”. When the transparent thin film 20 is formed, as shown in FIG. 11, the interference color pattern 21 ′ is formed so that only the five hues are included in the right shoulder portion of the letter “D”.

  Thus, by changing the magnitude of the magnetic field formed by the magnet, the interference color pattern to be formed has a shape corresponding to not only the shape and location of the magnet but also the magnetic force of the magnet. Accordingly, by appropriately adjusting not only the shape and location of the magnet but also the magnetic force, the distribution of the lines of magnetic force ML can be changed, so that various interference color patterns can be formed with a very high degree of freedom. .

(Embodiment 3)
FIG. 12 is a schematic configuration diagram of a magnetron sputtering apparatus according to Embodiment 3 of the present invention. Hereinafter, the magnetron sputtering apparatus 100F according to the present embodiment will be described with reference to FIG.

  As shown in FIG. 12, the magnetron sputtering apparatus 100F is different only in that it includes a magnetic unit 120 having a different configuration when compared to the magnetron sputtering apparatus 100E in the second embodiment.

  Specifically, the magnetic unit 120 has a plurality of rod-shaped permanent magnets 155, and the plurality of permanent magnets 155 are held by a magnet holder 140. The magnet holder 140 is provided with a plurality of magnet mounting holes 140a in an array in the direction parallel to the back surface of the target 160, and a plurality of permanent magnets 155 are provided in the plurality of magnet mounting holes 140a. Each of these can be detachably attached.

  In the magnetron sputtering apparatus 100F provided with the magnetic unit 120 configured as described above, the magnetic field lines formed between the magnetic unit 120 and the base material 10 depending on which magnet mounting hole 140a the permanent magnet 155 is mounted on. The ML can be changed variously. Therefore, the use according to the use example described in the second embodiment described above is possible, and various interference color patterns can be formed with a high degree of freedom.

  In the above-described first to third embodiments of the present invention and the modifications thereof, an example in which an interference color pattern such as a circular shape, a triangular shape, a quadrangular shape, or a “D” shape is formed on the interference color decorative body is illustrated. Although described, according to the method of manufacturing an interference color decorative body according to the present invention, various interference color patterns can be formed with a high degree of freedom without being limited thereto.

  Here, various uses of the interference color decorative body according to the present invention are assumed. For example, daily necessities such as containers, dishes, and packaging materials, casings of electrical equipment, interiors of vehicles, ships, aircraft, buildings, etc. The applicable range of materials and exterior materials is very wide. In particular, the interference color decorative body according to the present invention can be suitably used for a back cover of a smartphone that has been widely used in recent years.

  In addition, by randomly setting a plurality of base materials on a magnetron sputtering apparatus and performing film formation, by setting a large base material on a magnetron sputtering apparatus and forming a film, and cutting this randomly, etc. It is also possible to manufacture an interference color decorative body having a unique interference color pattern. Therefore, when the interference color decorative body according to the present invention is used for the back cover of the smartphone described above, it can be a unique back cover.

  As described above, the above-described embodiment and its modifications disclosed herein are illustrative in all respects and are not restrictive. The technical scope of the present invention is defined by the terms of the claims, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.

  1A, 1A ′, 1B-1E, 1E ′ interference color decorative body, 10 substrate, 10a main surface, 20 transparent thin film, 20a exposed surface, 21,21 ′ interference color pattern, 100A-100F magnetron sputtering apparatus, 110 chamber, 120 Magnetic unit, 130 Yoke, 140, 141 Magnet holder, 140a Magnet mounting hole, 151, 152, 155 Permanent magnet, 153 Electromagnet, 153a Iron core, 153b Coil, 154 Current application unit, 160 Target, ML Magnetic field line, P plasma region .

Claims (14)

Preparing a base material having a main surface as a reflective surface;
A step of forming a transparent thin film consisting of a single layer on the main surface of the base material with a non-uniform thickness distribution including different thickness portions by magnetron sputtering using a magnetron sputtering apparatus, Method for producing interference color decorative body.   In the step of forming the transparent thin film, the surface density distribution of the sputtered particles emitted from the target on the main surface of the base material is a non-uniform surface density distribution including different surface density portions. The method for producing an interference color decorative body according to claim 1, wherein the transparent thin film is formed.   In the step of forming the transparent thin film, the transparent thin film is formed so as to have a thickness distribution according to the shape and arrangement position of the magnet and the magnetic force in the magnetron sputtering apparatus. The method for producing an interference color decorative body according to claim 1 or 2, wherein the interference color decoration body is in accordance with a shape, an arrangement position, and a magnetic force.   The interference according to any one of claims 1 to 3, wherein in the step of forming the transparent thin film, the transparent thin film is formed such that an exposed surface of the transparent thin film to be formed continuously undulates smoothly. A method for producing a colored decorative body.   The method for producing an interference color decorative body according to any one of claims 1 to 4, wherein the base material has a surface on which the main surface is flatter than an exposed surface of the transparent thin film to be formed. As the base material, the main surface is composed of an aluminum film or a silver film,
6. The method for producing an interference color decorative body according to claim 1, wherein any one of a silicon oxide film, an aluminum oxide film, an indium tin oxide film, and a titanium dioxide film is formed as the transparent thin film.   As the magnetron sputtering apparatus, a plurality of electromagnets positioned on the back surface side of the target and spaced apart from each other in a direction parallel to the back surface of the target, and a current is selectively applied to the plurality of electromagnets The method for producing an interference color decorative body according to any one of claims 1 to 6, wherein a device provided with a possible current application unit is used.   The magnetron sputtering apparatus includes a magnet holder that is located on the back surface side of a target and is provided with a plurality of magnet mounting holes spaced apart from each other in a direction parallel to the back surface of the target. The method for manufacturing an interference color decorative body according to any one of claims 1 to 6, wherein a permanent magnet can be removably attached to each of the magnet attachment holes. A substrate having a main surface as a reflective surface;
A transparent thin film consisting of a single layer located on the main surface of the substrate,
The interference color decorative body, wherein the transparent thin film has a non-uniform thickness distribution including different thickness portions.   The interference color decorative body according to claim 9, wherein the exposed surface of the transparent thin film undulates smoothly continuously.   The interference color decorative body according to claim 9 or 10, wherein the main surface of the substrate is flatter than an exposed surface of the transparent thin film. The main surface of the substrate is composed of an aluminum film or a silver film,
The interference color decorative body according to any one of claims 9 to 11, wherein the transparent thin film is any one of a silicon oxide film, an aluminum oxide film, an indium tin oxide film, and a titanium dioxide film. A chamber;
A target installed in the chamber;
A plurality of electromagnets positioned on the back side of the target and spaced apart from each other in a direction parallel to the back side of the target;
A magnetron sputtering apparatus for manufacturing an interference color decorative body, comprising: a current application unit capable of selectively applying a current to the plurality of electromagnets. A chamber;
A target installed in the chamber;
A magnet holder located on the back surface side of the target and provided with a plurality of magnet mounting holes spaced apart from each other in a direction parallel to the back surface of the target;
A magnetron sputtering apparatus for producing an interference color decorative body, wherein a permanent magnet can be detachably attached to each of the plurality of magnet attachment holes.

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