JP2017068088A - Exposure device, temperature controller, and article manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an exposure device and a temperature controller capable of controlling temperatures of a mirror properly while easing restriction in optical designing.SOLUTION: The exposure device includes: a mirror 1 with an opening 2 provided therein, which reflects light 6 for exposing a substrate; and airflow forming means that forms an airflow such that a gas 7 passed through the opening 2 flows along a reflective surface of the mirror 1. The airflow forming means is disposed by being isolated from the mirror 1 on the reflective surface side of the mirror 1, and includes an air-guide member 3 having a counter surface opposing to at least a part of the opening 2 and a gas supply part that supplies the gas 7 toward the air-guide member 3.SELECTED DRAWING: Figure 2

Description

  The present invention relates to an exposure apparatus, a temperature control apparatus, and an article manufacturing method.

  An exposure apparatus used for manufacturing a liquid crystal display device or the like is an apparatus that transfers a mask pattern onto a substrate via a projection optical system including a plurality of mirrors. The mirror in the projection optical system absorbs part of the exposure light, and the absorbed light energy is converted into thermal energy. When exposure takes a long time, the mirror is thermally deformed, and the image performance projected by the projection optical system is degraded.

  Patent Document 1 discloses a temperature control device that includes a rectifying member disposed at the center of a light reflecting surface of a concave mirror and a blower that supplies a temperature-controlled gas from the reflecting surface side toward the rectifying member. Disclosure. The blower supplies gas through a pipe arranged on the reflecting surface side of the concave mirror. The rectifying member controls the temperature of the concave mirror to a predetermined temperature by causing the gas from the blower to flow radially along the light reflection surface of the concave mirror.

JP 2011-110141 A

  In Patent Document 1, a pipe for supplying gas has substantially the same length as the diameter of the concave mirror. For this reason, for example, in an optical system in which the light reflection area is in a ring shape (a state where two arc-shaped reflection areas are partially overlapped), the pipe blocks light. The temperature control device cannot be applied. As described above, if the temperature of the mirror is to be controlled using the temperature control device of Patent Document 1, the optical design is restricted.

  The present invention has been made in view of the above problems, and an object of the present invention is to provide an exposure apparatus and a temperature control apparatus that can control the temperature of a mirror satisfactorily while relaxing restrictions on optical design.

  An exposure apparatus according to an aspect of the present invention is an exposure apparatus that exposes a substrate, and includes an opening, a mirror that reflects light that exposes the substrate, and a gas that passes through the opening includes the mirror. Airflow forming means for forming an airflow so as to flow along the reflection surface of the mirror, and the airflow formation means is disposed on the reflection surface side of the mirror and spaced apart from the mirror, and at least one of the openings. It has a wind guide member which has a counter surface which opposes a section, and a gas supply part which supplies gas toward the wind guide member.

  The exposure apparatus and temperature control apparatus according to the present invention can satisfactorily control the temperature of the mirror while relaxing restrictions on optical design.

It is a figure which shows the structure of the exposure apparatus concerning 1st-5th embodiment. It is a figure which shows the structure of the temperature control apparatus of 1st Embodiment. It is a figure which shows the result of the fluid analysis of 1st Embodiment. It is a figure which shows the result of the thermal analysis of 1st Embodiment. It is a figure which shows the structure of the temperature control apparatus of 2nd Embodiment. It is a figure which shows the structure of the temperature control apparatus of 3rd Embodiment. The figure which shows the structure of the temperature control apparatus of 4th Embodiment. The figure which shows the structure of the mirror unit of 5th Embodiment. The figure which shows the structure of the mirror unit of 6th Embodiment.

[First Embodiment]
(Configuration of exposure apparatus)
FIG. 1 is a view showing the arrangement of an exposure apparatus 100 used in common with the first to fifth embodiments. The exposure apparatus 100 exposes the pattern of the mask 104 onto the glass substrate 101 by a step-and-scan method or a step-and-repeat method.

  The mask 104 is illuminated from above by the light 6 emitted from the light source 102 and passed through the illumination optical system 103. The projection optical system 105 described later guides the light 6 onto the substrate 101 coated with a photosensitive material (not shown) in order to project a pattern formed on the mask 104 at a predetermined magnification.

  The lens barrel (housing) 106 includes a blower unit (second gas supply unit) 107 and an exhaust unit 108 that exhausts the gas supplied from the blower unit 107 and accommodates the projection optical system 105.

  The air blowing unit 107 is provided below the lens barrel 106, and supplies a gas whose temperature is adjusted to a predetermined temperature in the lens barrel 106, that is, vertically upward. The air blowing unit 107 has a filter such as a dust removal filter (not shown) such as a ULPA filter, or a thin mesh filter (not shown), and supplies gas from which dust has been removed. The dust existing inside the lens barrel 106 is prevented from adhering to the reflection surface, and deterioration of the exposure performance due to contamination of the reflection surface is suppressed.

  The gas supplied by the blower 107 circulates in the lens barrel 106, so that the temperature environment around the projection optical system 105 is kept constant. The exhaust unit 108 mainly includes an exhaust port that exhausts the gas in the space above the Z position of the convex mirror 5, and an exhaust port that mainly exhausts the gas in the space below the Z position of the convex mirror 5. The gas in the lens barrel 106 is exhausted through the respective exhaust ports.

  The stage 109 moves while holding the substrate 101. A desired mask 104 pattern is formed on the substrate 101 by moving the stage 109 and a stage (not shown) that holds the mask 104 in synchronization.

  The projection optical system 105 includes a trapezoidal mirror 4, a concave mirror 1 (hereinafter referred to as a mirror 1), and a convex mirror 5 arranged so that the reflecting surfaces of the light 6 face each other. The mirror 1 and the convex mirror 5 are arranged so that the light 6 is reflected in the order of the upper region of the reflective surface 1a of the mirror 1, the reflective surface 5a of the convex mirror 5, and the lower region of the reflective surface 1a of the mirror 4. . The reflection surface 1a refers to a surface including the reflection region of the light 6 (a surface facing the convex mirror 5).

  The trapezoidal mirror 4 directs the light 6 reflected toward the upper region of the reflecting surface 1 a of the mirror 1 and the light 6 reflected by the lower region of the reflecting surface 1 a of the mirror 4 toward the substrate 101. To deflect.

  Various films coated on the reflecting surface 1a for the purpose of obtaining predetermined exposure performance absorb a part of the light 6 and generate heat. Due to this heat generation, there is a possibility that the imaging performance becomes unstable due to thermal deformation caused by heat transmitted to the inside of the mirror 1 or temperature fluctuation in the space near the mirror 1.

  Therefore, the exposure apparatus 100 has a temperature control device (air flow forming means) that controls the temperature of the mirror 1 to a predetermined temperature. The temperature control device for the mirror 1 according to the present embodiment includes a blower unit (gas supply unit) 8 and an air guide member 3 (detailed later).

  A through-hole (opening) 2 that penetrates through the mirror 1 along the thickness direction of the mirror 1, that is, from the reflective surface 1a to the back surface 1b1b that is the surface opposite to the reflective surface 1a. Is provided. The central portion is a region including the center of the reflecting surface 1a.

  The air supply part 8 is arrange | positioned so that the supply port which supplies the gas of the air supply part 8 may be in the position which supplies the gas 7 temperature-controlled to predetermined temperature toward the through-hole 2 from the back surface 1b side. The air blowing unit 8 also includes a dust filter (not shown) such as a ULPA filter, a thin mesh filter (not shown), or the like, and supplies the gas 7 rectified so as to prevent clean and uneven supply.

  The temperature of the gas 7 is preferably adjusted based on a temperature sensor (not shown) arranged in the lens barrel 106 or a temperature sensor (not shown) arranged in the vicinity of the mirror 1. Alternatively, the temperature of the gas 7 may be adjusted based on the temperature of the mirror 1 itself.

(Configuration of wind guide member)
A temperature control device for the mirror 1 will be described with reference to FIGS. 2 (a), 2 (b), and 2 (c). 2A is a front view of the projection optical system 105, FIG. 2B is a view taken along the line AA of FIG. 2A, and FIG. .

  A region 9 indicates a reflection region of the light 6. Two semicircular arc-shaped reflection areas are vertically symmetric. Since the irradiation is performed so that a part of the upper region and the lower region overlap, the reflection region of the light 6 is annular.

  The wind guide member 3 includes a wind guide plate (a part of the wind guide member including the facing surface) 3a and a shaft portion 3b. The air guide plate 3a including a disc portion having a diameter larger than the diameter of the through hole 2 includes a surface (opposing surface) facing the through hole 2 on the reflective surface 2a side. The shaft portion 3 b is a columnar member that supports the surface of the air guide plate 3 a that faces the through hole 2, and is inserted into at least a part of the through hole 2.

  Here, the area of the air guide plate 3a is preferably larger than the area of the cross section of the through hole 2. In particular, the larger one is more preferable to the extent that it does not overlap the region 9, that is, not to be positioned on the optical path of the light 6. Thereby, the flow velocity of the gas supplied from the blower unit 8 can be made as low as possible, and the vibration of the mirror 1 can be suppressed as compared with the case where the flow velocity is high.

  The shape of the air guide plate 3a is not limited to a circle as shown in the figure. For example, a polygon such as a pentagon and a hexagon may be used. At this time, it is preferable that the number of polygon sides is as large as possible so as to be close to a circle. When the shape of the air guide plate 3a is a polygon, it is preferable that the central angle is equiangular. Thereby, the temperature of the mirror 1 can be controlled isotropically.

  The air guide member 3 guides the gas 7 so that the temperature-adjusted gas 7 blown from the air blowing unit 8 passes through the through hole 2 and goes toward the outer periphery of the mirror 1 along the reflection surface 1a. In addition, the surface which opposes the reflective surface 1b of the wind guide member 3 has a structure which has a curvature. Thereby, the impact to the air guide member 3 when the gas 7 collides is reduced, and temperature fluctuation due to vibration of the space around the air guide member 3 is less likely to occur.

  Since the gas 7 is guided by the wind guide plate 3a provided at the center, the airflow is formed radially in the radial direction (see FIG. 2B). Therefore, the temperature-controlled gas 7 can stably control the temperature of the mirror 1 without temperature unevenness.

  The gas 7 guided by the air guide member 3 is mixed with the gas supplied from the air blowing unit 107 and exhausted by the exhaust unit 108 (see FIG. 1).

  The temperature control effect of the mirror 1 by the temperature control apparatus of Embodiment 1 is demonstrated using FIG. 3, FIG. 3 and 4 show analysis results in a state where the light 6 is applied to the mirror 1 ′ and the mirror 1.

  FIG. 3 shows the result of the fluid analysis. FIG. 3A shows a fluid analysis result of a comparative form in which the temperature 7 is supplied from below the mirror 1 ′ whose reflecting surface is concave without implementing this embodiment, and FIG. It is an analysis result of an embodiment. The flow velocity distribution of gas 7 or gas 7 '(0.0 m / s to 1.5 m / s) is shown.

  In FIG. 3A, in the space on the reflecting surface 1a side, flow velocity unevenness occurs both in the X-axis direction (thickness direction of the mirror 1) and in the Y-axis direction (direction perpendicular to the thickness direction of the mirror 1). You can see that On the other hand, FIG. 3B showing the present embodiment shows that there is almost no flow velocity unevenness in the X-axis direction and the Y-axis direction in the space on the reflecting surface 1a side.

  FIG. 4 shows the result of thermal analysis. 4 (a) and 4 (c) show comparative thermal analysis results when the gas 7 'is supplied from below the mirror 1' without implementing this embodiment, and FIGS. 4 (b) and 4 (d) show the embodiment. It is a thermal analysis result.

  4 (a) and 4 (b) are front views of the mirror 1, and FIGS. 4 (c) and 4 (d) are views taken along arrows AA in FIGS. 4 (a) and 4 (b). The temperature distribution of 23.00 degreeC-23.16 degreeC is shown. In the comparative form shown in FIGS. 4 (a) and 4 (c), the gas 7 ′ includes heat recovered from the mirror 1 ′ as it advances in the + Z direction, so that the function of recovering the heat of the mirror 1 ′ becomes weak on the + Z side. To go. For this reason, the temperature of the mirror 1 ′ itself is uneven in the Z-axis direction, and the temperature of the space on the reflecting surface 1 a ′ side is also uneven in the Y-axis direction.

  In the present embodiment shown in FIGS. 4B and 4D, the air guide member 3 supplies the gas 7 radially. Therefore, it is shown that there is almost no temperature unevenness in the Y-axis direction of the mirror 1 and almost no temperature unevenness in the X-axis direction and the Y-axis direction on the reflecting surface 1a side as compared with the comparative embodiment.

  As described above, in the exposure apparatus 100 of the present embodiment, the air guide member 3 and the air blowing unit 8 form an air flow so that the gas passing through the through hole 2 flows along the reflection surface 1 a of the mirror 1. Thereby, the temperature of the mirror 1 can be adjusted. Furthermore, since the gas 7 guided from the air guide member 3 supplies the gas 7 radially, the temperature of the mirror 1 can be controlled with a small temperature unevenness. In addition, the temperature fluctuation of the mirror 1 can be made less likely to occur even during long exposure.

  Further, since the air blowing unit 8 is provided on the back surface 1b side of the mirror 1, the air blowing unit 8 is disposed outside the optical path of the light 6 regardless of the optical path by the projection optical system 105 and the range of the reflection area on the reflection surface 1a. be able to. Therefore, optical design restrictions can be relaxed.

[Second Embodiment]
FIG. 5 is a diagram for explaining a temperature adjustment method for the mirror 1 according to the second embodiment. 5A is a front view around the mirror 1, and FIG. 5B is a view taken along the line BB in FIG. 3A. The exposure apparatus 100 of the second embodiment further includes a gas recovery unit 16 including an annular recovery port (gas recovery port) 16a for recovering the gas 7 guided from the air guide member 3.

  As the gas recovery unit 8 sucks in the gas 7, the gas 7 that is about to move away from the mirror 1 in the −X direction as it approaches the outer periphery of the mirror 1 from the center is guided to flow along the mirror 1. . In this manner, it is possible to prevent or reduce the gas 7 guided by the wind guide member 3 from flowing efficiently along the reflecting surface 1a and staying around the mirror 1 to become a heat source of the space.

  It also has the same effect as the first embodiment. That is, the temperature of the mirror 1 can be controlled by forming an air flow so that the gas passing through the through hole 2 flows along the reflecting surface 1 a of the mirror 1. Furthermore, since the gas 7 guided from the air guide member 3 supplies the gas 7 radially, the temperature of the mirror 1 can be controlled with a small temperature unevenness. It is possible to make the temperature fluctuation of the mirror 1 less likely to occur.

  Further, since the air blowing unit 8 is provided on the rear surface 1b side of the mirror 1, the air blowing unit 8 is disposed outside the optical path of the light 6 regardless of the optical path by the projection optical system 105 and the range of the reflection area on the reflection surface 1a. be able to. Therefore, the restrictions in optical design can be relaxed.

  The collection ports 8 may be a plurality of collection ports that are discretely arranged at equal intervals along the outer periphery of the mirror 1.

[Third Embodiment]
The configuration of the temperature control device for the mirror 1 according to the third embodiment will be described with reference to FIGS. 6 (a) and 6 (b). 6A is a front view around the mirror 1, and FIG. 6B is a view taken along the line CC in FIG. 6A. The configuration of the air guide member 3 and the configuration of the air blowing unit 8 are different from those of the above-described embodiment.

  The air guide member 3 includes a flow path for the gas 10 to pass inside the air guide member 3. The gas 10 flows in from the shaft portion 3b, and flows out from the air guide plate 3a toward the radial direction through an outlet 3c provided in a predetermined radial direction inside the air guide plate 3a. In this embodiment, as shown in FIG.6 (b), eight outflow ports 3c are arrange | positioned at 45 degree intervals.

  The blower unit 8 includes a blower unit (first supply unit) 8a that supplies a gas (a gas that flows at a first flow rate) 7 and a blower unit (second supply that supplies a gas (a gas that flows at a second flow rate)) 10. Part) 8b. The ventilation part 8b is provided in the center part, and the ventilation part 8a surrounds the circumference | surroundings. As described above, the gas 7 is guided in the through hole 2 so as to pass around the air guide member 3 and to flow in the radial direction (in a wider range than the predetermined radial direction) along the reflective surface 1a. .

  Since the gas 10 ejected from the outlet 3c induces the Coanda effect and draws the surrounding gas 11 in the direction of the gas 10, the gas 10 is supplied onto the reflective surface 1a rather than the gas 7 and the gas 10 alone. The gas can be increased. As a result, the temperature of the mirror 1 can be adjusted even with a small amount of gas 7, and the vibration applied to the mirror 1 by the flow of the gas can be reduced.

  It also has the same effect as the first embodiment. That is, the temperature of the mirror 1 can be controlled by forming an air flow so that the gas passing through the through hole 2 flows along the reflecting surface 1 a of the mirror 1. Furthermore, since the gas 7 guided from the air guide member 3 supplies the gas 7 radially, the temperature of the mirror 1 can be controlled with a small temperature unevenness. It is possible to make the temperature fluctuation of the mirror 1 less likely to occur.

  Further, since the air blowing unit 8 is provided on the rear surface 1b side of the mirror 1, the air blowing unit 8 is disposed outside the optical path of the light 6 regardless of the optical path by the projection optical system 105 and the range of the reflection area on the reflection surface 1a. be able to. Therefore, the restrictions in optical design can be relaxed.

  In addition, if the Coanda effect can be induced, arrangement | positioning of the ventilation port 3c is not restricted to the form shown in FIG.5 (b). As long as there is at least one blower port 3c and the gas 10 having a larger flow rate than the gas 7 can be supplied from each blower port 3c, a large number of blower ports such as 48 or 64 may be provided. Good.

[Fourth Embodiment]
The configuration of the temperature control device for the mirror 1 according to the fourth embodiment will be described with reference to FIGS. 7 (a) to 7 (c). 7 (a) is a front view around the mirror 1, FIG. 7 (b) is a DD arrow view of FIG. 7 (a), and FIG. 7 (c) is an EE arrow view of FIG. 7 (a). It is. The configuration of the air guide plate 3a and the configuration of the shaft portion 3b are different from the above-described embodiment.

  In the air guide member 3, the shaft portion 3 b is divided and connected by a bearing 12. By the bearing 12, the air guide plate 3a is movable in the rotation direction.

  On the reflection surface 1a side of the air guide plate 3a, a groove 13 having a shape toward the center (center of the air guide plate 3a) is provided while drawing a curve from the outer periphery of the air guide plate 3a. The grooves 13 are provided at equal intervals in the circumferential direction.

  The wind guide plate 3 is rotated in the direction 14 by the wind pressure of the gas 7 supplied from the blower 8. As the wind guide plate 3a rotates, an airflow in the direction opposite to the direction 14 is generated on the reflecting surface 1a as shown in FIG. 7B. Since a force is applied to the airflow when the air guide plate 3a rotates, the gas 7 can be guided to a farther place even with the same air volume. This is suitable when the gas 7 is desired to flow to the vicinity of the outer periphery of the mirror 1 or when the gas recovery port 8 is not provided as in the second embodiment.

  It also has the same effect as the first embodiment. That is, the temperature of the mirror 1 can be controlled by forming an air flow so that the gas passing through the through hole 2 flows along the reflecting surface 1 a of the mirror 1. Furthermore, since the gas 7 guided from the air guide member 3 supplies the gas 7 radially, the temperature of the mirror 1 can be controlled with a small temperature unevenness. It is possible to make the temperature fluctuation of the mirror 1 less likely to occur.

  Further, since the air blowing unit 8 is provided on the rear surface 1b side of the mirror 1, the air blowing unit 8 is disposed outside the optical path of the light 6 regardless of the optical path by the projection optical system 105 and the range of the reflection area on the reflection surface 1a. be able to. Therefore, the restrictions in optical design can be relaxed.

  Note that the air guide plate 3 may be rotated not by the wind pressure of the gas 7 but by using a driving source such as a motor.

[Fifth Embodiment]
The configuration of the temperature control device for the mirror 1 according to the fourth embodiment will be described with reference to FIGS. 8 (a) to 8 (d). 8A is a front view around the mirror 1, and FIG. 8B is a view taken along the line FF in FIG. 8A. The point which has the ventilation part 15 and the collection | recovery part 17 which collect | recovers the gas 7 supplied from the ventilation part 15, and the structure of the baffle plate 3a and the through-hole 2 differ from the above-mentioned embodiment.

  Eight air blowing parts 15 are arranged at equal intervals in the circumferential direction along the outer periphery of the mirror 1. On the reflection surface 1a side, the gas 7 is supplied in a direction inclined with respect to the radial direction. The diameter of the through hole 2 decreases from the reflective surface 1a toward the back surface 1b.

  In the air guide plate 3a of FIG. 8C, a groove 16 is formed so as to spiral toward the center so as to deflect the flow of the gas 7. A recovery unit 17 that recovers the gas 7 is connected to a position facing the through hole 2 on the back surface 1b side. The recovery part 17 has an intake part 19 inside, and the gas 7 that has entered the space 18 is sucked by the intake part 19.

  With these configurations, the gas 7 from the blower 15 is sucked to the center according to the intake force by the recovery unit 17, and the gas 7 moves while rotating along the reflection surface 1 a and is sucked into the intake 19. At this time, the groove 16 generates an air flow in which the gas 7 rotates around the shaft portion 3 b in the through hole 2. Since the air guide plate 3a guides the gas 7 so as to deflect the gas 7 in the rotation direction, the surrounding gas 20 can also be entrained. Therefore, the temperature of the mirror 1 can be controlled by efficiently using the surrounding gas 20 in addition to the gas 7 supplied from the eight blowers 15.

It also has the same effect as the first embodiment. That is, the temperature of the mirror 1 can be controlled by forming an air flow so that the gas passing through the through hole 2 flows along the reflecting surface 1 a of the mirror 1. Furthermore, since the gas 7 guided from the air guide member 3 supplies the gas 7 radially, the temperature of the mirror 1 can be controlled with a small temperature unevenness. It is possible to make the temperature fluctuation of the mirror 1 less likely to occur.
Furthermore, since the air blower 8 is arranged along the outer periphery of the mirror 1, it can be arranged outside the optical path of the light 6 regardless of the optical characteristics of the projection optical system 105. Therefore, the restrictions in optical design can be relaxed.

[Sixth Embodiment]
FIG. 9 is a view of a concave mirror used in place of the above-described mirror 1 in this embodiment, as viewed from the reflection surface side of the light 6. As shown in FIG. 9, as a mirror unit 23 having a semicircular mirror (first mirror) 21 disposed on the upper side and a semicircular mirror (second mirror) 22 disposed on the lower side. It is configured. The reflecting surface of the light 6 of the mirror 21 and the reflecting surface of the light 22 of the mirror 22 are arranged in parallel so as to face the same direction (−X direction). Here, the parallel arrangement includes a case where the mirror 21 and the mirror 22 are arranged so as to be shifted in the X-axis direction so that at least a part of the thickness of the mirror 21 and the mirror 22 overlap.

  When the mirror unit 23 is used, the reflection area of the light 6 on the mirror unit 23 by the projection optical system 105 is on the mirror 21 and the mirror 22 with the upper reflection area 9a and the lower reflection area 9b being separated from each other. . The mirror unit 23 is an advantageous mirror when it is desired to correct optical characteristics such as aberration correction by locally and minutely deforming.

  The air guide plate 3 a has a surface that is separated from the mirror unit 23 on the reflection surface side of the mirror unit 23 and faces at least a part of the opening 24 between the mirror 21 and the mirror 22. At least a part of the opening 24 is a space including the center of the mirror unit 23, for example.

  At least a part of the air guide plate 3 a faces the upper mirror 21 and the lower mirror 22. As a result, the gas 7 supplied from the back surface 1b side toward the air guide plate 3a from the blower unit 8 flows along the air guide plate 3 and the reflecting surface 1a through the through hole 2.

  Thereby, similarly to 1st Embodiment, the mirror 1 can be temperature-controlled by forming an air current so that the gas which passes the opening part 24 may flow along the reflective surface 1a of the mirror 1. FIG. Furthermore, since the gas 7 guided from the air guide member 3 supplies the gas 7 radially, the temperature of the mirror 1 can be controlled with a small temperature unevenness. It is possible to make the temperature fluctuation of the mirror 1 less likely to occur.

  Further, even if the concave mirror in the projection optical system 105 is a mirror unit 23 that is a combination of semicircular mirrors as in the present embodiment, temperature unevenness of the mirror unit 23 is reduced and temperature fluctuations are less likely to occur. Can do. In this way, it is possible to relax the restrictions in optical design.

  You may apply the temperature control apparatus of 2nd-5th embodiment with respect to the mirror unit 23 concerning this embodiment.

[Other Embodiments]
The air guide plate 3a does not necessarily have to be arranged at the center. If the gas 7 guided by the air guide member 3 flows along the reflection surface 1a, it is allowed even if the air guide plate 3a is shifted to a position not facing the center of the reflection surface 1a.

  An exposure apparatus according to the present invention forms a latent image pattern with a resist on a substrate by irradiating light rays such as g-line (wavelength 436 nm), ArF laser light (wavelength 193 nm), EUV light (wavelength 13 nm), etc. Applicable to.

  The temperature control apparatus of the present invention may be mounted on an optical apparatus other than the exposure apparatus. Further, the temperature control target is not limited to the concave mirror, and may be used for temperature control of the mirror that does not irradiate light at least at the position where the air guide member 3 is disposed.

[Product Manufacturing Method]
An article manufacturing method according to an embodiment of the present invention includes a step of forming a pattern on a substrate (wafer, glass plate, etc.) using an exposure apparatus, and a step of processing the substrate on which the pattern is formed. Including. The article is, for example, a semiconductor integrated circuit element, a liquid crystal display element, an imaging element, a magnetic head, a CD-RW, an optical element, a photomask, or the like. The processing process is, for example, an etching process or an ion implantation process. Furthermore, other known processing steps (development, oxidation, film formation, vapor deposition, planarization, resist peeling, dicing, bonding, packaging, etc.) may be included.

  As mentioned above, although preferable embodiment of this invention was described, it cannot be overemphasized that this invention is not limited to these embodiment, A various deformation | transformation and change are possible within the range of the summary.

DESCRIPTION OF SYMBOLS 1 (Concave surface) Mirror 1a Reflective surface 1b Back surface 2 Through-hole 3 Air guide member 3a Air guide part 5 Convex mirror 6 Light 7 Gas (from the air blower 9) 8 Air blower 8a 1st supply part 8b 2nd supply part 9 Reflection Region 10 Gas (from air blowing unit 10) 15 Air blowing unit 16 Recovery unit 16a Recovery port 17 Recovery unit 21 First mirror 22 Second mirror 23 Mirror unit 100 Exposure apparatus 105 Projection optical system 106 Lens barrel

Claims (15)

An exposure apparatus for exposing a substrate,
A mirror provided with an opening and reflecting light for exposing the substrate;
An airflow forming means for forming an airflow so that the gas passing through the opening flows along the reflecting surface of the mirror, and
The airflow forming means includes
An air guide member disposed on the reflecting surface side of the mirror and spaced apart from the mirror, and having a facing surface facing at least a part of the opening;
An exposure apparatus comprising: a gas supply unit that supplies gas toward the air guide member.   The exposure apparatus according to claim 1, wherein the opening is a through-hole penetrating along a thickness direction of the mirror. The mirror has a first mirror and a second mirror arranged in parallel so that the respective reflecting surfaces face the same direction,
The exposure apparatus according to claim 1, wherein the opening is located between the first mirror and the second mirror.   The exposure apparatus according to claim 2, wherein the gas supply port of the gas supply unit is provided at a position where gas is supplied from the back surface side of the mirror toward the opposing surface.   5. The gas recovery part according to claim 1, further comprising: a gas recovery part that recovers the gas guided by the air guide member by a gas recovery port disposed along the outer periphery of the mirror. The exposure apparatus described in 1. The mirror is a part of a projection optical system that guides the light to the substrate, and the gas supply unit is a first gas supply unit,
6. The apparatus according to claim 1, further comprising: a housing that houses the projection optical system; and a second gas supply unit that supplies a temperature-controlled gas to the housing. The exposure apparatus described in 1. The gas supply unit includes a first supply unit that supplies a gas that flows at a first flow rate, and a second supply unit that supplies a gas that flows at a second flow rate greater than the first flow rate,
The air guide member guides the gas from the second supply unit in a predetermined radial direction and guides the gas from the first supply unit in a wider range than the predetermined radial direction. The exposure apparatus according to any one of claims 1 to 6.   The portion of the wind guide member including the facing surface is movable in the rotational direction, and the facing surface has a groove shaped toward the center of the wind guide member while drawing a curve from the outer periphery of the wind guide member. 8. The exposure apparatus according to claim 1, wherein the exposure apparatus is provided. The gas supply unit has a plurality of gas supply ports provided along the outer periphery of the mirror,
The exposure apparatus according to any one of claims 1 to 3, further comprising a gas recovery unit that recovers the gas on a back surface side of the mirror.   The exposure apparatus according to claim 1, wherein the opening is located at a central portion of the mirror.   11. The member according to claim 1, wherein a member that supports a portion including the facing surface of the air guide member is inserted into at least a part of the opening. Exposure device. A temperature control device for controlling the temperature of a light reflecting surface of a mirror provided with an opening,
An airflow forming means for forming an airflow so that the gas passing through the opening flows along the reflecting surface of the mirror;
The airflow forming means includes
An air guide member disposed on the reflecting surface side of the mirror and spaced apart from the mirror, and having a facing surface facing at least a part of the opening;
And a gas supply unit that supplies gas toward the air guide member.   The temperature control device according to claim 11, wherein the opening is a through-hole penetrating along the thickness direction of the mirror. The mirror has a first mirror and a second mirror arranged in parallel so that the respective reflecting surfaces face the same direction,
The temperature control device according to claim 11, wherein the opening is located between the first mirror and the second mirror. Forming a pattern on a substrate using the exposure apparatus according to any one of claims 1 to 11, and
Processing the substrate after the step;
A method for producing an article comprising:

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