JP2017032435A - Substrate processing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate processing device capable of accurately detecting leak of the fluid used therein despite its simple configuration.SOLUTION: A leak detecting unit 40 comprises: a hollow member 41 in which a passage of a process liquid is formed; a movable member 44 which can reciprocate along a direction of a flow of the process liquid from a process liquid piping 26 to a process liquid piping 27 in the hollow member 41; and a sensor composed of a light projecting unit 51 for detecting a position of the movable member 44 and a light-receiving unit 52. The movable member 44 has a spherical shape, and is composed of a material having larger specific gravity than the process liquid flowing in the hollow member 41. The sensor composed of the light projecting unit 51 and the light-receiving unit 52 is configured so as to detect whether or not the movable member 44 is located at a lower end part of a moving region 42.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a substrate processing apparatus for detecting leakage of fluid used in a substrate processing apparatus.

  In substrate processing apparatuses for processing substrates such as glass substrates for organic EL display devices, glass substrates for liquid crystal display devices, panel substrates for solar cells, glass substrates for plasma displays, glass substrates for photomasks, substrates for optical disks, and semiconductor wafers. Various fluids such as a liquid such as a treatment liquid and a gas such as an inert gas are used. The supply of this fluid is controlled by the opening and closing operation of the valve.

  In such a substrate processing apparatus, it is necessary to detect leakage of fluid from the valve. Patent Document 1 discloses a substrate processing apparatus that detects leakage of a processing liquid by a suck back method. In the substrate processing apparatus described in Patent Document 1, the suction of the processing liquid pipe is executed by the suction device after the valve is closed. And the structure which detects the leakage of a process liquid is employ | adopted by whether a process liquid is detected with a liquid level sensor.

Japanese Patent No. 5030767

  In the substrate processing apparatus described in Patent Document 1, since it is necessary to perform the suction operation of the processing liquid pipe when preventing leakage of the processing liquid, not only the time required for the suction is required, but also the processing liquid There arises a problem that the processing liquid in the pipe is wasted.

  On the other hand, in general, a flow meter is often provided in such a treatment liquid supply path, and it is not impossible to detect leakage of the treatment liquid using the flow meter. However, in order to detect a slight leakage of the processing liquid, it is necessary to use an expensive flow meter that can detect a minute flow rate. In addition, when the processing liquid is flowing in a certain amount, it is possible to accurately detect the flow rate with the flow meter. However, when the flow of the processing liquid is stopped, the flow meter may falsely detect due to foaming in the processing liquid. It may happen.

  The present invention has been made to solve the above-described problems, and an object thereof is to provide a substrate processing apparatus capable of accurately detecting leakage of a fluid used in the substrate processing apparatus while having a simple configuration. And

  According to the first aspect of the present invention, a valve disposed in a fluid flow path used in the substrate processing apparatus and a downstream side of the valve, the leakage of the fluid from the valve is detected. A leak detection unit, wherein the leak detection unit includes a hollow member in which the fluid flow path is formed, and the inside of the hollow member along the direction of the flow of the fluid. A movable member capable of reciprocating, and a sensor for detecting the position of the movable member, and the hollow member has an opening degree obtained by subtracting a cross-sectional area of the movable member from a cross-sectional area of the flow path of the fluid, A moving region that is constant or increases from the upstream side to the downstream side of the fluid flow path, and an open region in which the opening degree is larger than the moving region are provided.

  According to a second aspect of the present invention, there is provided a valve disposed in a fluid flow path used in the substrate processing apparatus and a downstream side of the valve, and detects leakage of the fluid from the valve. A leak detection unit, wherein the leak detection unit includes a hollow member in which the fluid flow path is formed, and the inside of the hollow member along the direction of the flow of the fluid. A movable member capable of reciprocating, and a sensor for detecting the position of the movable member, and the hollow member has an opening degree obtained by subtracting a cross-sectional area of the movable member from a cross-sectional area of the flow path of the fluid, A moving region that is constant or increases from the upstream side to the downstream side of the fluid flow path and a retreat area in which the movable member retreats from the flow path are provided.

  According to the first and second aspects of the invention, it is possible to accurately detect the leakage of the fluid by detecting the position of the movable member by the sensor.

It is a schematic diagram for demonstrating the structure of the substrate processing apparatus which concerns on this invention. FIG. 3 is a schematic diagram showing a leak detection unit 40 according to the first embodiment together with an on-off valve 23. It is a block diagram which shows the main control systems in this substrate processing apparatus. It is a schematic diagram which shows the leak detection part 40 which concerns on 2nd Embodiment with the on-off valve 23. FIG. It is a schematic diagram which shows the leak detection part 40 which concerns on 3rd Embodiment with the on-off valve 23. FIG. It is a schematic diagram which shows the leak detection part 40 which concerns on 4th Embodiment with the on-off valve 23. FIG.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a schematic diagram for explaining the configuration of a substrate processing apparatus according to the present invention.

  This substrate processing apparatus is for processing a substrate 100 by supplying a processing liquid to a circular substrate 100 such as a semiconductor wafer. The substrate processing apparatus includes a support pin 11 that supports the substrate 100 at its edge, and includes a spin chuck 12 that rotates about an axis that faces the vertical direction together with the substrate 100.

  The substrate processing apparatus also includes a processing liquid nozzle 15 for supplying a processing liquid to the substrate 100. The treatment liquid nozzle 15 is supported by a swing arm 14 connected to the rotary shaft 13, and swings around the rotary shaft 13 together with the swing arm 14. The processing liquid nozzle 15 is connected to the processing liquid supply mechanism 20. By moving the tip of the processing liquid nozzle 15 while drawing an arc-shaped trajectory including the rotation center and edge of the substrate 100 held by the spin chuck 12, the surface of the substrate 100 is scanned over the entire surface. On the other hand, it becomes possible to supply the processing liquid.

  The substrate processing apparatus also includes a pre-dispense pod 31 for pre-dispensing the processing liquid in the processing liquid nozzle 15 before applying the processing liquid to the substrate 100. The pre-dispense pod 31 is connected to a treatment liquid recovery unit (not shown) via a drainage pipe 32.

  The processing liquid supply mechanism 20 includes processing liquid pipes 26 and 27 for sending the processing liquid from the processing liquid tank 21 storing the processing liquid to the processing liquid nozzle 15. In the processing liquid pipe 26, a pump 22 for pumping the processing liquid in the processing liquid tank 21, an open / close valve 23 for supplying and stopping the processing liquid, and a processing liquid supplied to the processing liquid nozzle 15 are provided. A flow rate adjusting valve 24 and a flow meter 25 for adjusting the flow rate are provided.

  Further, between the processing liquid pipe 26 and the processing liquid pipe 27, there is disposed a leakage detection unit 40 which is a characteristic part of the present invention for detecting leakage of the processing liquid. In this substrate processing apparatus, when the processing liquid leaks due to the malfunction of the opening / closing valve 23, the processing liquid flows out from the processing liquid nozzle 15. For this reason, in this substrate processing apparatus, in order to detect the leakage of the processing liquid, the leakage detection unit 40 is disposed between the opening / closing valve 23 on the downstream side of the opening / closing valve 23 and the processing liquid nozzle 15. Yes.

  FIG. 2 is a schematic diagram showing the leak detection unit 40 according to the first embodiment together with the open / close valve 23. In FIG. 2, the flow rate adjustment valve 24 and the flow meter 25 shown in FIG. 1 are not shown. 2A shows a state in which no treatment liquid leaks, and FIG. 2B shows a state in which the treatment liquid leaks.

  The leakage detection unit 40 reciprocates along the direction of the flow of the processing liquid from the processing liquid pipe 26 to the processing liquid pipe 27 through the hollow member 41 in which a flow path of the processing liquid is formed, and the inside of the hollow member 41. A movable member 44 that is movable, and a sensor 53 (see FIG. 3 described later) including a light projecting unit 51 and a light receiving unit 52 for detecting the position of the movable member 44 are provided.

  The hollow member 41 has an opening 45 serving as an inlet for a processing solution disposed at the lower end thereof, a moving region 42, an open region 43, and an opening serving as an outlet for the processing solution disposed at the upper end thereof. 46. The moving region 42 has an opening degree obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the processing liquid in the hollow member 41, as the opening increases from the upstream side to the downstream side of the flow path of the processing liquid. It is an area. The open area 43 is an area of the hollow member 41 in which the opening degree obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the processing liquid is larger than that of the moving area 42.

  The movable member 44 has a spherical shape and is made of a material having a specific gravity greater than that of the processing liquid flowing in the hollow member 41. The sensor 53 including the light projecting unit 51 and the light receiving unit 52 is configured to detect whether or not the movable member 44 is at the lower end of the moving region 42.

  FIG. 3 is a block diagram showing a main control system in the substrate processing apparatus. In this figure, only the control system related to leakage detection is shown.

  The substrate processing apparatus includes a CPU that performs logical operations, a ROM that stores an operation program necessary for controlling the apparatus, a RAM that temporarily stores data during control, and the like, and a control unit that controls the entire apparatus. 50. The control unit 50 is connected to the opening / closing valve 23 described above and a sensor 53 including a light projecting unit 51 and a light receiving unit 52. The control unit 50 is also connected to a warning display unit 59 that generates a warning display or a warning sound.

  In the leakage detection unit 40 of the substrate processing apparatus having the above-described configuration, when the opening / closing valve 23 is closed and the processing liquid is blocked by the opening / closing valve 23, the specific gravity of the movable member 44 is greater than that of the processing liquid. Therefore, as shown in FIG. 2A, the movable member 44 is disposed at the lower end portion of the moving region 42 in the hollow member 41. At this time, as indicated by an arrow in FIG. 2A, the light emitted from the light projecting unit 51 in the sensor 53 is blocked by the movable member 44 and does not reach the light receiving unit 52. The control unit 50 is in a state where the opening / closing valve 23 is closed and the sensor 53 detects the movable member 44 (that is, the light from the light projecting unit 51 has not reached the light receiving unit 52). It is determined that no leakage of the processing solution has occurred.

  On the other hand, when leakage occurs while the opening / closing valve 23 is closed, the processing liquid flows into the hollow member 41 from the opening 45 in the hollow member 41. Then, due to the flow of the processing liquid, as shown in FIG. 2B, the movable member 44 floats upward from the lower end portion of the moving region 42 in the hollow member 41 shown in FIG. That is, in the moving region 42, the opening degree obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the processing liquid increases from the upstream side to the downstream side of the flow path of the processing liquid. Therefore, even when a small flow rate of the processing liquid flows into the hollow member 41, the movable member 44 floats upward.

  When the movable member 44 floats, the light emitted from the light projecting unit 51 in the sensor 53 is not blocked by the movable member 44 as it is, as indicated by an arrow in FIG. To reach. The control unit 50 is in a state where the open / close valve 23 is closed and the sensor 53 does not detect the movable member 44 (that is, the light from the light projecting unit 51 reaches the light receiving unit 52). It is determined that the processing liquid has leaked. Then, the control unit 50 transmits a signal for displaying a warning to the warning display unit 59.

  Note that a small amount of processing liquid may have passed through the hollow member 41 immediately after the opening / closing valve 23 is closed. For this reason, leakage may be determined after a certain time has elapsed since the opening / closing valve 23 is closed.

  In a state where the open / close valve 23 is opened to supply the processing liquid from the processing liquid nozzle 15 to the substrate 100, a large amount of the processing liquid flows into the hollow member 41. At this time, as indicated by an imaginary line in FIG. 2B, the movable member 44 has an opening degree obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the processing liquid upstream of the flow path of the processing liquid. From the moving area 42 that becomes larger toward the downstream side, the ascending surface rises to an open area 43 where the opening degree is larger than the moving area 42. In the open region 43, the opening obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the processing liquid is designed to be sufficiently large, so that the movable member 44 interferes with the supply of the processing liquid. Never come.

  According to the leak detection unit 40 having such a configuration, unlike the substrate processing apparatus described in Patent Document 1 described above, it is not necessary to perform the suction operation of the processing liquid pipes 26 and 27 in order to detect the leak. In addition, unlike the case of detecting leakage using a flow meter, there is no fear of malfunction due to foaming of the processing liquid. Further, by adjusting the height positions of the light projecting unit 51 and the light receiving unit 52 in the sensor 53, the flow rate of the processing liquid for detecting leakage can be changed.

  Next, another embodiment of the present invention will be described. FIG. 4 is a schematic diagram showing the leak detection unit 40 according to the second embodiment together with the opening / closing valve 23. Here, members similar to those in the first embodiment described above are denoted by the same reference numerals, and detailed description thereof is omitted. In FIG. 4, the flow rate adjustment valve 24 and the flow meter 25 shown in FIG. 1 are not shown. 4A shows a state in which no leakage of the processing liquid has occurred, and FIG. 4B shows a state in which the leakage of the processing liquid has occurred.

  In the leak detection unit 40 according to the first embodiment described above, the light projecting unit 51 and the light receiving unit 52 in the sensor 53 detect the movable member 44 when the processing liquid does not leak, and the leak occurs. The movable member 44 is disposed at a height position where the movable member 44 is not detected. On the other hand, in the leak detection unit 40 according to the second embodiment, the light projecting unit 51 and the light receiving unit 52 in the sensor 53 are moved to the side on which the movable member 44 moves when the processing liquid leaks. The point arrange | positioned in a height position differs from 1st Embodiment mentioned above.

  In the second embodiment, a multi-optical axis type sensor 53 (a three-axis sensor is shown in FIG. 4 for convenience of explanation) is used. Then, when the movable member 44 moves, the number of optical axes blocked by the movable member 44 changes, thereby detecting the leakage of the processing liquid. That is, when no leakage occurs, one optical axis is blocked by the movable member 44 as shown in FIG. On the other hand, when leakage occurs, all the optical axes are blocked by the movable member 44 as shown in FIG. Thus, by detecting a change in the number of optical axes blocked by the movable member 44, it is possible to detect the movement of the movable member 44 with high accuracy even when the movement distance of the movable member 44 is small. . In using such a multi-axis type sensor 53, a configuration in which all the optical axes are not blocked by the movable member 44 may be employed when no leakage occurs.

  The other configuration and leakage detection operation in the leakage detection unit 40 according to the second embodiment are the same as those in the first embodiment described above.

  Next, still another embodiment of the present invention will be described. FIG. 5 is a schematic diagram showing the leak detection unit 40 according to the third embodiment together with the opening / closing valve 23. Here, about the member similar to 1st Embodiment and 2nd Embodiment mentioned above, the same code | symbol is attached | subjected and detailed description is abbreviate | omitted. In FIG. 5, the flow rate adjustment valve 24 and the flow meter 25 shown in FIG. 1 are not shown. FIG. 5A shows a state where no leakage of the processing liquid has occurred, and FIG. 5B shows a state where the leakage of the processing liquid has occurred.

  In the leak detection unit 40 according to the first embodiment and the second embodiment described above, the movable member 44 is made of a material having a specific gravity greater than that of the processing liquid flowing in the hollow member 41, and leakage of the processing liquid. Therefore, the sensor 53 detects that the movable member 44 is lifted. On the other hand, in the leak detection unit 40 according to the third embodiment, the movable member 44 is made of a material having a specific gravity smaller than that of the processing liquid flowing in the hollow member 41, and due to leakage of the processing liquid. A configuration is adopted in which the sensor 53 detects that the movable member 44 is sinking.

  The leak detection unit 40 according to the third embodiment includes a hollow member 41 in which a flow path for the treatment liquid is formed, and a flow of the treatment liquid from the treatment liquid pipe 26 to the treatment liquid pipe 27 in the hollow member 41. The movable member 44 is capable of reciprocating along the direction of, and a sensor 53 including a light projecting unit 51 and a light receiving unit 52 for detecting the position of the movable member 44.

  The hollow member 41 includes an opening 45 serving as an inlet for a processing solution disposed at an upper end thereof, a moving region 42, an open region 43, and an opening serving as an outlet for a processing solution disposed at the lower end thereof. 46. The moving region 42 has an opening degree obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the processing liquid in the hollow member 41, as the opening increases from the upstream side to the downstream side of the flow path of the processing liquid. It is an area. The open area 43 is an area of the hollow member 41 in which the opening degree obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the processing liquid is larger than that of the moving area 42.

  The movable member 44 has a spherical shape and is made of a material having a specific gravity smaller than that of the processing liquid flowing in the hollow member 41. The sensor 53 including the light projecting unit 51 and the light receiving unit 52 is configured to detect whether or not the movable member 44 is at the upper end of the moving region 42.

  In the leakage detection unit 40 of the substrate processing apparatus according to the third embodiment, when the on-off valve 23 is closed and the processing liquid is shut off at the on-off valve 23, the specific gravity of the movable member 44 is smaller than that of the processing liquid. Therefore, as shown in FIG. 5A, the movable member 44 is disposed at the upper end portion of the moving region 42 in the hollow member 41. At this time, as indicated by an arrow in FIG. 5A, the light emitted from the light projecting unit 51 in the sensor 53 is blocked by the movable member 44 and does not reach the light receiving unit 52. The control unit 50 is in a state where the opening / closing valve 23 is closed and the sensor 53 detects the movable member 44 (that is, the light from the light projecting unit 51 has not reached the light receiving unit 52). It is determined that no leakage of the processing solution has occurred.

  On the other hand, when leakage occurs while the opening / closing valve 23 is closed, the processing liquid flows into the hollow member 41 from the opening 45 in the hollow member 41. Then, due to the flow of the processing liquid, as shown in FIG. 5B, the movable member 44 sinks downward from the lower end of the moving region 42 in the hollow member 41 shown in FIG. 5A. That is, in the moving region 42, the opening degree obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the processing liquid increases from the upstream side to the downstream side of the flow path of the processing liquid. Therefore, even when a small flow rate of the processing liquid flows into the hollow member 41, the movable member 44 sinks downward.

  When the movable member 44 sinks, the light irradiated from the light projecting unit 51 in the sensor 53 is not blocked by the movable member 44 as it is, as indicated by an arrow in FIG. To reach. The control unit 50 is in a state where the open / close valve 23 is closed and the sensor 53 does not detect the movable member 44 (that is, the light from the light projecting unit 51 reaches the light receiving unit 52). It is determined that the processing liquid has leaked. Then, the control unit 50 transmits a signal for displaying a warning to the warning display unit 59.

  In a state where the open / close valve 23 is opened to supply the processing liquid from the processing liquid nozzle 15 to the substrate 100, a large amount of the processing liquid flows into the hollow member 41. At this time, as indicated by phantom lines in FIG. 5B, the movable member 44 has an opening degree obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the processing liquid upstream of the flow path of the processing liquid. From the moving area 42 that increases as it goes downstream from the moving area 42, the opening degree sinks to an open area 43 that is larger than the moving area 42. In the open region 43, similarly to the leak detection unit 40 according to the first embodiment, the opening obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the processing liquid is designed to be sufficiently large. For this reason, the movable member 44 does not interfere with the supply of the processing liquid.

  Next, still another embodiment of the present invention will be described. FIG. 6 is a schematic diagram showing the leak detection unit 40 according to the fourth embodiment together with the opening / closing valve 23. Here, about the member similar to 1st Embodiment and 2nd Embodiment mentioned above, the same code | symbol is attached | subjected and detailed description is abbreviate | omitted. In FIG. 6, the flow rate adjustment valve 24 and the flow meter 25 shown in FIG. 1 are not shown. FIG. 6A shows a state in which no treatment liquid leaks, and FIG. 6B shows a state in which the treatment liquid leaks.

  The leak detection unit 40 according to the fourth embodiment includes a hollow member 61 in which a flow path for the processing liquid is formed, and a movable member that can reciprocate in the hollow member 61 in the direction of the flow of the processing liquid. 64 and a sensor 53 including a light projecting unit 51 and a light receiving unit 52 for detecting the position of the movable member 64.

  The hollow member 61 includes an opening 65 serving as an inlet for a processing solution disposed at a lower end portion thereof, a moving region 62, a retracting region 63, and an opening serving as an outlet for a processing solution disposed on a side portion thereof. 66. The moving region 62 is a region in the hollow member 61 where the opening degree obtained by subtracting the cross-sectional area of the movable member 64 from the cross-sectional area of the flow path of the processing liquid is constant. The retreat area 63 is an area in the hollow member 61 where the movable member 64 retreats from the treatment liquid flow path.

  Although not shown in FIG. 6, the retreat area 63 is connected to a processing liquid supply pipe for filling the hollow member 41 with the processing liquid at the start of the processing.

  The movable member 64 has a spherical shape whose diameter is slightly smaller than the inner diameter of the moving region 62 and is made of a material having a specific gravity greater than that of the processing liquid flowing in the hollow member 61. The sensor 53 including the light projecting unit 51 and the light receiving unit 52 is configured to detect whether or not the movable member 64 is at the lower end of the moving region 62.

  In the leakage detection unit 40 of the substrate processing apparatus according to the fourth embodiment having the above-described configuration, when the on-off valve 23 is closed and the processing liquid is shut off at the on-off valve 23, the movable member 64 Since the specific gravity is larger than that of the processing liquid, the movable member 64 is disposed at the lower end of the moving region 62 in the hollow member 61 as shown in FIG. At this time, as indicated by an arrow in FIG. 6A, the light emitted from the light projecting unit 51 in the sensor 53 is blocked by the movable member 64 and does not reach the light receiving unit 52. In the control unit 50 shown in FIG. 2, the open / close valve 23 is closed, and the sensor 53 detects the movable member 64 (that is, the light from the light projecting unit 51 has not reached the light receiving unit 52. ) State, it is determined that there is no leakage of the processing solution.

  On the other hand, when leakage occurs while the on-off valve 23 is closed, the processing liquid flows into the hollow member 61 from the opening 65 in the hollow member 61. And the movable member 64 floats upward from the lower end part of the movement area | region 62 in the hollow-shaped member 61 shown to Fig.6 (a) by the flow of this process liquid. That is, in the moving region 62, since the opening degree obtained by subtracting the cross-sectional area of the movable member 64 from the cross-sectional area of the flow path of the processing liquid is extremely small, when the processing liquid with a small flow rate flows into the hollow member 41, In addition, the movable member 64 floats upward.

  When the movable member 64 floats, the light emitted from the light projecting unit 51 in the sensor 53 reaches the light receiving unit 52 as it is without being blocked by the movable member 64. In the state where the opening / closing valve 23 is closed and the sensor 53 does not detect the movable member 64 (that is, the light from the light projecting unit 51 has reached the light receiving unit 52), the control unit 50 It is determined that the processing liquid has leaked. Then, the control unit 50 transmits a signal for displaying a warning to the warning display unit 59.

  In a state where the open / close valve 23 is opened to supply the processing liquid from the processing liquid nozzle 15 to the substrate 100, a large amount of the processing liquid flows into the hollow member 61. At this time, as shown in FIG. 6B, the movable member 64 floats from the moving area 62 to the retreat area 63. As a result, the movable member 64 is retracted from the flow path of the processing liquid, and the movable member 64 does not hinder the supply of the processing liquid.

  In the leak detection unit 40 of the substrate processing apparatus according to the fourth embodiment, the arrangement of the sensor 53 is changed as in the relationship between the first embodiment and the second embodiment described above, or the first embodiment. A configuration in which the vertical relationship is reversed as in the relationship with the third embodiment may be adopted.

  In the above-described embodiments, the case where the present invention is applied to the processing liquid as the fluid used in the substrate processing apparatus has been described, but the present invention may be applied to other liquids. Further, the present invention may be applied to a gas such as an inert gas or dry air used for drying the substrate.

  In the above-described embodiments, spherical members are used as the movable members 44 and 64, but conical or columnar members may be used.

  In each of the embodiments described above, a transmissive type is used as the sensor 53, but a reflective type may be used. The sensor 53 is not limited to an optical sensor, and other types of sensors such as a sensor for identifying the positions of the movable members 44 and 64 by electrostatic capacitance may be used.

  In the first to third embodiments described above, as the moving region 42, the opening obtained by subtracting the cross-sectional area of the movable member 44 from the cross-sectional area of the flow path of the processing liquid is from the upstream side of the flow path of the processing liquid. Although the shape which becomes large as it goes downstream is employ | adopted, the shape where this opening degree is constant may employ | adopt a cylindrical movement area | region. In this case, the movable member 44 may be guided from the open region 43 to the moving region by attaching an auxiliary member to the movable member 44 as necessary.

  Further, in the first to third embodiments described above, the open region 43 has a constant cross-sectional area from the upstream side to the downstream side of the flow path of the processing liquid. The cross-sectional area may increase as it goes from the upstream side of the flow path to the downstream side. The open area 43 only needs to have a significantly increased amount of change in opening compared to the moving area 42.

  In the above-described fourth embodiment, a moving region 62 having a constant opening degree is employed. However, as the moving region 62, the opening degree goes from the upstream side to the downstream side of the flow path of the processing liquid. You may employ | adopt the thing of the shape which becomes large according to this.

DESCRIPTION OF SYMBOLS 12 Spin chuck 15 Processing liquid nozzle 20 Processing liquid supply mechanism 23 Opening and closing valve 26 Processing liquid piping 27 Processing liquid piping 40 Leak detection part 41 Hollow member 42 Moving area 43 Open area 44 Movable member 45 Opening part 46 Opening part 50 Control part 51 Light projecting unit 52 Light receiving unit 53 Sensor 59 Warning display unit 61 Hollow member 62 Moving region 63 Retraction region 64 Movable member 65 Opening portion 66 Opening portion 100 Substrate

Claims (2)

A substrate comprising: a valve disposed in a fluid flow path used in the substrate processing apparatus; and a leakage detection unit disposed downstream of the valve and detecting leakage of the fluid from the valve. A processing device comprising:
The leak detection unit detects a hollow member in which the fluid flow path is formed, a movable member capable of reciprocating in the direction of the fluid flow in the hollow member, and a position of the movable member. And a sensor to
The hollow member moves so that the opening degree obtained by subtracting the cross-sectional area of the movable member from the cross-sectional area of the fluid flow path is constant or increases as it goes from the upstream side to the downstream side of the fluid flow path. A substrate processing apparatus comprising: a region; and an open region in which the opening degree is larger than the moving region. A substrate comprising: a valve disposed in a fluid flow path used in the substrate processing apparatus; and a leakage detection unit disposed downstream of the valve and detecting leakage of the fluid from the valve. A processing device comprising:
The leak detection unit detects a hollow member in which the fluid flow path is formed, a movable member capable of reciprocating in the direction of the fluid flow in the hollow member, and a position of the movable member. And a sensor to
The hollow member moves so that the opening degree obtained by subtracting the cross-sectional area of the movable member from the cross-sectional area of the fluid flow path is constant or increases as it goes from the upstream side to the downstream side of the fluid flow path. A substrate processing apparatus comprising: a region; and a retreat region in which the movable member retreats from the flow path.

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