JP2016540886A5 - - Google Patents

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Publication number
JP2016540886A5
JP2016540886A5 JP2016523265A JP2016523265A JP2016540886A5 JP 2016540886 A5 JP2016540886 A5 JP 2016540886A5 JP 2016523265 A JP2016523265 A JP 2016523265A JP 2016523265 A JP2016523265 A JP 2016523265A JP 2016540886 A5 JP2016540886 A5 JP 2016540886A5
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JP
Japan
Prior art keywords
plasma
relaxation region
region
afterglow
ions
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JP2016523265A
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Japanese (ja)
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JP6404918B2 (en
JP2016540886A (en
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Priority claimed from DE201310017107 external-priority patent/DE102013017107A1/en
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Publication of JP2016540886A publication Critical patent/JP2016540886A/en
Publication of JP2016540886A5 publication Critical patent/JP2016540886A5/ja
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これに対して、プラズマの緩和領域は、上記電極によって制限される励起領域の外にある。プラズマの緩和領域は時々「残光」範囲と呼ばれる。プラズマの緩和領域内には、自由電子とイオンはもはや存在せず、むしろ励起された原子または分子が存在する。   In contrast, the plasma relaxation region is outside the excitation region limited by the electrode. The relaxation region of the plasma is sometimes referred to as the “afterglow” range. Within the plasma relaxation region, free electrons and ions no longer exist, but rather excited atoms or molecules.

JP2016523265A 2013-10-15 2014-10-15 Method for pretreatment of substrate surface, method for coating substrate surface, and method for bonding substrate to member Active JP6404918B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102013017107.5 2013-10-15
DE201310017107 DE102013017107A1 (en) 2013-10-15 2013-10-15 A method of pretreating a substrate surface, a method of coating the substrate surface, and a method of bonding a substrate to an element
PCT/EP2014/072116 WO2015055717A1 (en) 2013-10-15 2014-10-15 Method for pre-treating a substrate surface, method for coating the substrate surface, and method for connecting a substrate to an element

Publications (3)

Publication Number Publication Date
JP2016540886A JP2016540886A (en) 2016-12-28
JP2016540886A5 true JP2016540886A5 (en) 2018-01-25
JP6404918B2 JP6404918B2 (en) 2018-10-17

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ID=51752109

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016523265A Active JP6404918B2 (en) 2013-10-15 2014-10-15 Method for pretreatment of substrate surface, method for coating substrate surface, and method for bonding substrate to member

Country Status (3)

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JP (1) JP6404918B2 (en)
DE (1) DE102013017107A1 (en)
WO (1) WO2015055717A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018110951A1 (en) 2017-11-03 2019-05-09 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Method for the adhesive bonding of electrical sheets and electrical sheets produced by a corresponding method
EP3840541A1 (en) * 2019-12-20 2021-06-23 Molecular Plasma Group SA Improved shield for atmospheric pressure plasma jet coating deposition on a substrate
CN113864302B (en) * 2021-11-02 2023-01-17 无锡斯贝尔磁性材料有限公司 Method for bonding magnetic cores

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000303039A (en) * 1999-04-23 2000-10-31 Konica Corp Supporting member and its production
DE10223865B4 (en) * 2002-05-29 2007-08-16 Plasmatreat Gmbh Process for the plasma coating of workpieces
WO2005083149A1 (en) * 2004-02-26 2005-09-09 Konica Minolta Holdings, Inc. Particle deposited substrate
DE102004033728B4 (en) * 2004-07-13 2009-07-23 Plasmatreat Gmbh Method for processing and bonding workpieces made of a metal or a metal alloy with a hydrated oxide and / or hydroxide layer
JP2006312660A (en) * 2005-05-06 2006-11-16 Sekisui Chem Co Ltd Pressure-sensitive adhesive tape for photomask protection
DE102006015591B3 (en) * 2006-03-31 2007-11-29 Technische Universität Clausthal Organic material with a catalytically coated surface and process for its production
DE102009048397A1 (en) 2009-10-06 2011-04-07 Plasmatreat Gmbh Atmospheric pressure plasma process for producing surface modified particles and coatings

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