JP2016200808A5 - - Google Patents

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JP2016200808A5
JP2016200808A5 JP2016054364A JP2016054364A JP2016200808A5 JP 2016200808 A5 JP2016200808 A5 JP 2016200808A5 JP 2016054364 A JP2016054364 A JP 2016054364A JP 2016054364 A JP2016054364 A JP 2016054364A JP 2016200808 A5 JP2016200808 A5 JP 2016200808A5
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light emitting
light
modulated
emitting elements
dimensional
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JP6546868B2 (en
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シングルパス結像システムにおいて、
2次元アレイ状に配置された複数の発光素子であって、各発光素子が第1の変調状態にある場合に前記各発光素子が第1の強度を有する関連する変調光部を伝達し、前記各発光素子が第2の変調状態にある場合に前記各発光素子が前記第1の強度よりも低い第2の強度を有する前記関連する光部を伝達し、前記各発光要素が対応する所定方向に前記関連する光の一部を向けるように配置され、それによって前記複数の発光素子が変調された2次元光照射野を生成するように前記各発光素子が2つ以上の変調状態間で調整可能である、前記複数の発光素子と、
受信した画像データに応じて前記複数の発光素子を制御するように構成されたコントローラと
を含む2次元光照射野発生装置と、
前記2次元光照射野発生装置から前記変調された2次元光照射野を受光するように配置され、前記集光された変調光部が細長い走査線画像を生成するように前記各発光素子から伝達された前記関連する光部を集光するように配置されたアナモフィック光学系と、を備え、
前記複数の発光素子が複数の行及び複数の列に配置され、前記各列における前記発光素子の全てが関連する画素群を形成し、
前記アナモフィック光学系が、前記細長い走査線画像の関連する前記走査線部上に前記複数の発光素子の各関連する画素群から受光した変調光部を集光するように配置され、
前記アナモフィック光学系が交差処理光学サブシステム及び処理方向光学サブシステムを含み、
前記交差処理光学サブシステムが交差処理方向にのみ前記変調光部を投影及び拡大するように配置された第1及び第2のフォーカスレンズを含み、
前記処理方向光学サブシステムが処理方向に平行に前記細長い走査線画像上で前記変調光部を集光するように配置されている第3のフォーカスレンズを含み、
前記第1、第2及び第3のフォーカスレンズのそれぞれが円筒状レンズ及び非円筒状レンズを含む、結像システム。
In a single pass imaging system
A plurality of light emitting elements arranged in a two-dimensional array, wherein each light emitting element transmits an associated modulated light portion having a first intensity when each light emitting element is in a first modulation state; Each light emitting element transmits the associated light portion having a second intensity lower than the first intensity when each light emitting element is in the second modulation state, and each light emitting element corresponds to a predetermined direction Each light emitting element being adjusted between two or more modulation states such that the plurality of light emitting elements are modulated to generate a modulated two-dimensional light field. Said plurality of light emitting elements being possible;
A two-dimensional light irradiation field generator including a controller configured to control the plurality of light emitting elements according to the received image data;
The light emitting device is disposed to receive the modulated two-dimensional light irradiation field from the two-dimensional light irradiation field generator, and transmitted from the respective light emitting elements such that the collected modulated light beam part generates an elongated scanning line image And anamorphic optics arranged to collect the associated light portion.
The plurality of light emitting elements are arranged in a plurality of rows and a plurality of columns, all of the light emitting elements in each of the columns forming an associated pixel group;
Said anamorphic optical system is arranged to focus the modulated light portion received from each associated pixel group of said plurality of light emitting elements onto said associated scan line portion of said elongated scan line image;
The anamorphic optical system includes a cross processing optical subsystem and a process direction optical subsystem,
The cross processing optical subsystem includes first and second focus lenses arranged to project and magnify the modulated light portion only in the cross processing direction,
The processing direction optical subsystem includes a third focusing lens arranged to focus the modulated light portion on the elongated scan line image parallel to the processing direction;
An imaging system , wherein each of the first, second and third focus lenses comprises a cylindrical lens and a non-cylindrical lens .
前記アナモフィック光学系が、さらに、前記2次元光照射野発生装置及び複数の前記フォーカスレンズの間に配置されたコリメートレンズを備える、請求項1に記載の結像システム。  The imaging system according to claim 1, wherein said anamorphic optical system further comprises a collimating lens disposed between said two-dimensional light field generator and a plurality of said focusing lenses. 前記2次元光照射野発生装置がアレイに配置された複数の垂直キャビティ面発光レーザ(VCSEL)装置を備える、請求項1に記載の結像システム。  The imaging system of claim 1, wherein the two-dimensional light field generator comprises a plurality of vertical cavity surface emitting laser (VCSEL) devices arranged in an array. 前記関連する画素群それぞれが2又はそれ以上のVCSEL装置上に配置された前記発光素子のセットを配置して備える、請求項3に記載の結像システム。  4. The imaging system of claim 3, wherein each of the associated groups of pixels comprises the set of light emitting elements disposed on two or more VCSEL devices. シングルパス結像システムにおいて、  In a single pass imaging system
2次元アレイ状に配置された複数の発光素子であって、各発光素子が第1の変調状態にある場合に前記各発光素子が第1の強度を有する関連する変調光部を伝達し、前記各発光素子が第2の変調状態にある場合に前記各発光素子が前記第1の強度よりも低い第2の強度を有する前記関連する光部を伝達し、前記各発光要素が対応する所定方向に前記関連する光の一部を向けるように配置され、それによって前記複数の発光素子が変調された2次元光照射野を生成するように前記各発光素子が2つ以上の変調状態間で調整可能である、前記複数の発光素子と、  A plurality of light emitting elements arranged in a two-dimensional array, wherein each light emitting element transmits an associated modulated light portion having a first intensity when each light emitting element is in a first modulation state; Each light emitting element transmits the associated light portion having a second intensity lower than the first intensity when each light emitting element is in the second modulation state, and each light emitting element corresponds to a predetermined direction Each light emitting element being adjusted between two or more modulation states such that the plurality of light emitting elements are modulated to generate a modulated two-dimensional light field. Said plurality of light emitting elements being possible;
受信した画像データに応じて前記複数の発光素子を制御するように構成されたコントローラと  A controller configured to control the plurality of light emitting elements according to received image data;
を含む2次元光照射野発生装置と、A two-dimensional light field generator including:
前記2次元光照射野発生装置から前記変調された2次元光照射野を受光するように配置され、前記集光された変調光部が細長い走査線画像を生成するように前記各発光素子から伝達された前記関連する光部を集光するように配置されたアナモフィック光学系と、を備え、  The light emitting device is disposed to receive the modulated two-dimensional light irradiation field from the two-dimensional light irradiation field generator, and transmitted from the respective light emitting elements such that the collected modulated light beam part generates an elongated scanning line image. And anamorphic optics arranged to collect the associated light portion.
前記アナモフィック光学系が交差処理光学サブシステム及び処理方向光学サブシステムを含み、  The anamorphic optical system includes a cross processing optical subsystem and a process direction optical subsystem,
前記交差処理光学サブシステムが交差処理方向にのみ前記変調光部を投影及び拡大するように配置された第1及び第2のフォーカスレンズを含み、  The cross processing optical subsystem includes first and second focus lenses arranged to project and magnify the modulated light portion only in the cross processing direction,
前記処理方向光学サブシステムが処理方向に平行に前記細長い走査線画像上で前記変調光部を集光するように配置されている第3のフォーカスレンズを含み、  The processing direction optical subsystem includes a third focusing lens arranged to focus the modulated light portion on the elongated scan line image parallel to the processing direction;
前記第1、第2及び第3のフォーカスレンズのそれぞれが円筒状レンズ及び非円筒状レンズを含む、結像システム。  An imaging system, wherein each of the first, second and third focus lenses comprises a cylindrical lens and a non-cylindrical lens.
前記2次元光照射野発生装置が、マルチモード垂直キャビティ面発光レーザ(VCSEL)装置及びシングルモードVCSEL装置のうちの少なくとも一方を備える、請求項5に記載の結像システム。  6. The imaging system of claim 5, wherein the two-dimensional light field generator comprises at least one of a multimode vertical cavity surface emitting laser (VCSEL) device and a single mode VCSEL device. 前記コントローラが、複数の駆動電流を生成するように構成され、各駆動電流が関連する画素画像データ値に対応し、  The controller is configured to generate a plurality of drive currents, each drive current corresponding to an associated pixel image data value;
前記関連する画素群を形成する前記各列の前記発光素子の全てが、前記コントローラから前記発光素子の全てに送信される関連する前記駆動電流を受ける、請求項6に記載の結像システム。  7. The imaging system of claim 6, wherein all of the light emitting elements of each row forming the associated pixel group receive the associated drive current transmitted from the controller to all of the light emitting elements.
前記アナモフィック光学系が、さらに、前記2次元光照射野発生装置及び複数の前記フォーカスレンズの間に配置されたコリメートレンズを備える、請求項5に記載の結像システム。  6. The imaging system of claim 5, wherein the anamorphic optical system further comprises a collimating lens disposed between the two-dimensional light field generator and the plurality of focus lenses.
JP2016054364A 2015-04-08 2016-03-17 VCSEL-based variable image beam generator Active JP6546868B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/681,957 US9630424B2 (en) 2011-08-24 2015-04-08 VCSEL-based variable image optical line generator
US14/681,957 2015-04-08

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JP2016200808A5 true JP2016200808A5 (en) 2019-05-30
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