JP2016155734A - Ceramic joint body, ceramic flow channel body and heat exchanger including the ceramic flow channel body - Google Patents

Ceramic joint body, ceramic flow channel body and heat exchanger including the ceramic flow channel body Download PDF

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JP2016155734A
JP2016155734A JP2015036809A JP2015036809A JP2016155734A JP 2016155734 A JP2016155734 A JP 2016155734A JP 2015036809 A JP2015036809 A JP 2015036809A JP 2015036809 A JP2015036809 A JP 2015036809A JP 2016155734 A JP2016155734 A JP 2016155734A
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ceramic
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silicon
silicon carbide
flow channel
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JP6449680B2 (en
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中村 清隆
Kiyotaka Nakamura
清隆 中村
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Kyocera Corp
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Abstract

PROBLEM TO BE SOLVED: To provide a ceramic joint body having high joint strength, to provide a ceramic flow channel body obtained by disposing a flow channel on the ceramic joint body, and to provide a heat exchanger including the ceramic flow channel body.SOLUTION: A ceramic joint body 20 is obtained by joining a first member 1 to a second member 2, each of which members comprises a silicon carbide sintered compact, while interposing a joint layer 3 therebetween, which layer contains silicon carbide and metallic silicon. The joint layer 3 has a first area 4, which exists between the first member 1 and the second member 2, and a second area 5, which exists across both of the first member 1 and the second member 2 on the outside of the first area 4. Metallic silicon lumps each having 100 μm length exist on the joint surface of at least one of the first member 1 and the second member 2 in the second area 5.SELECTED DRAWING: Figure 1

Description

本発明は、セラミック接合体およびセラミック流路体ならびにこれを備える熱交換器に関する。   The present invention relates to a ceramic joined body, a ceramic flow path body, and a heat exchanger including the same.

従来、炭化珪素からなるセラミック接合体に関しては、接合層にSiとSiCを含む接合体が知られている。例えば、特許文献1に、接合層にSiとSiCを含むSiC接合体であって、接合層のSiCの含有割合であるSiC/(Si+SiC)が接合層の中央部と外周部において、中央部>外周部の関係を有することを特徴とするSiCからなるセラミック接合体が記載されている。   Conventionally, as for a ceramic joined body made of silicon carbide, a joined body containing Si and SiC in a joining layer is known. For example, in Patent Document 1, an SiC bonded body including Si and SiC in a bonding layer, and SiC / (Si + SiC), which is the content ratio of SiC in the bonding layer, is a central portion and an outer peripheral portion of the bonding layer. A ceramic joined body made of SiC characterized by having a relationship of outer peripheral portions is described.

特開2010−215419号公報JP 2010-215419 A

近年、セラミック接合体は、中実体の接合のみならず、中空体を接合することにより内部が媒体の流路とされた流路体として用いられてきており、接合部から流路を流れる流体が漏出することがあってはならないため、気密性を優れたものとすべく、さらに高い接合強度を有していることが求められている。   In recent years, ceramic bonded bodies have been used not only for solid bonding, but also as a flow path body in which a hollow body is bonded to form a medium flow path. Since it should not leak, it is required to have higher bonding strength in order to have excellent airtightness.

本発明は、このような問題点を解決すべく案出されたものであり、接合強度の高いセラミック接合体およびこれに流路を設けてなるセラミック流路体ならびにこれを備える熱交換器を提供することを目的とする。   The present invention has been devised to solve such problems, and provides a ceramic bonded body having high bonding strength, a ceramic flow path body provided with a flow path therein, and a heat exchanger including the same. The purpose is to do.

本発明のセラミック接合体は、炭化珪素質焼結体からなる第1部材および第2部材が、炭化珪素および金属珪素を含む接合層を介して接合されたセラミック接合体であって、前記接合層は、前記第1部材と前記第2部材との間に存在する第1の領域と、該第1の領域よりも外方において前記第1部材および前記第2部材にわたって存在する第2の領域とを有し、該第2の領域における前記第1部材および前記第2部材の少なくとも一方の接合面に、長さが100μm以上の金属珪素の塊が存在していることを特徴とするものである。   The ceramic joined body of the present invention is a ceramic joined body in which a first member and a second member made of a silicon carbide sintered body are joined via a joining layer containing silicon carbide and metal silicon, and the joining layer Are a first region existing between the first member and the second member, and a second region existing over the first member and the second member outside the first region. And a lump of metallic silicon having a length of 100 μm or more is present on at least one of the joining surfaces of the first member and the second member in the second region. .

また、本発明のセラミック流路体は、上記構成のセラミック接合体に流路が設けられてなることを特徴とするものである。   The ceramic channel body of the present invention is characterized in that a channel is provided in the ceramic joined body having the above configuration.

また、本発明の熱交換器は、上記構成のセラミック流路体を備えることを特徴とするものである。   Moreover, the heat exchanger of this invention is equipped with the ceramic flow path body of the said structure, It is characterized by the above-mentioned.

本発明のセラミック接合体は、高い接合強度を有する。   The ceramic joined body of the present invention has high joint strength.

また、本発明のセラミック流路体および熱交換器は、流体の漏出が少なく、高い信頼性を有する。   Moreover, the ceramic flow path body and the heat exchanger of the present invention have a high reliability with less fluid leakage.

本実施形態のセラミック接合体の一例を示す、(a)は斜視図であり、(b)は部分断面図である。An example of the ceramic joined body of this embodiment is shown, (a) is a perspective view, (b) is a partial sectional view. 図1に示す本実施形態のセラミック接合体の接合部における、(a)は部分断面図であり、(b)は(a)におけるBの拡大図である。(A) in the junction part of the ceramic joined body of this embodiment shown in FIG. 1 is a fragmentary sectional view, (b) is the enlarged view of B in (a). 本実施形態のセラミック接合体の他の例を示す、(a)は斜視図であり、(b)は断面図である。The other example of the ceramic joined body of this embodiment is shown, (a) is a perspective view, (b) is a sectional view. 本実施形態のセラミック流路体の一例を示す、(a)は斜視図であり、(b)は部分断面図である。An example of the ceramic flow path body of this embodiment is shown, (a) is a perspective view, (b) is a fragmentary sectional view. 本実施形態のセラミック流路体の他の例を示す、(a)は斜視図であり、(b)は断面図である。The other example of the ceramic flow path body of this embodiment is shown, (a) is a perspective view, (b) is sectional drawing. 本実施形態の熱交換器の一例を示す、(a)は斜視図であり、(b)は(a)における概略断面図である。An example of the heat exchanger of this embodiment is shown, (a) is a perspective view, (b) is a schematic sectional view in (a).

以下、本実施形態のセラミック接合体について、図面を用いて説明する。   Hereinafter, the ceramic joined body of the present embodiment will be described with reference to the drawings.

図1は、本実施形態のセラミック接合体の一例を示す、(a)は斜視図であり、(b)は部分断面図であり、図2は、図1に示す本実施形態のセラミック接合体の接合部における、(a)は部分断面図であり、(b)は(a)におけるBの拡大図である。   FIG. 1 shows an example of a ceramic joined body of the present embodiment, (a) is a perspective view, (b) is a partial sectional view, and FIG. 2 is a ceramic joined body of the present embodiment shown in FIG. (A) is a fragmentary sectional view in the joining part of (b), (b) is an enlarged view of B in (a).

図1に示す本実施形態のセラミック接合体20(20a)は、円柱状の第1部材1(1a)と平板状の第2部材2(2a)とを、第1部材1aと第2部材2aとの間に存在する第1の領域4(4a)と、第1部材1aと第2部材2aにわたって存在する第2の領域5(5a)とを有した接合層3(3a)で接合してある。このようなセラミック接合体20aにおいては、第1部材1aと第2部材2aとを第1の領域4aのみで接合する場合に比べて、高い接合強度を有する。   The ceramic joined body 20 (20a) of the present embodiment shown in FIG. 1 includes a columnar first member 1 (1a) and a flat plate-like second member 2 (2a), and a first member 1a and a second member 2a. Are joined by a joining layer 3 (3a) having a first region 4 (4a) existing between and a second region 5 (5a) existing across the first member 1a and the second member 2a. is there. Such a ceramic joined body 20a has a higher joining strength than when the first member 1a and the second member 2a are joined only by the first region 4a.

また、図2において、本実施形態のセラミック接合体20aの接合部における部分拡大図である図2(a)および図2(a)におけるBの拡大図である図2(b)に示すように、第1の領域4aおよび第2の領域5aは、炭化珪素6(6a)および金属珪素7(7a)を含み、第2の領域5aにおける第1部材1および第2部材2の接合面には、長さが100
μm以上の金属珪素の塊8(8a)が存在している。
Further, in FIG. 2, as shown in FIG. 2 (a) which is a partially enlarged view of a joined portion of the ceramic joined body 20a of the present embodiment and FIG. 2 (b) which is an enlarged view of B in FIG. 2 (a). First region 4a and second region 5a include silicon carbide 6 (6a) and metal silicon 7 (7a), and the bonding surfaces of first member 1 and second member 2 in second region 5a , Length 100
A lump of metal silicon 8 (8a) of μm or more exists.

本実施形態のセラミック接合体20aは、炭化珪素質焼結体からなる第1部材1aおよび第2部材2aが、炭化珪素6aおよび金属珪素7aを含む接合層3aを介して接合されてなり、接合層3aは、第1部材1aと第2部材2aとの間に存在する第1の領域4aと、第1の領域4aよりも外方において第1部材1aおよび第2部材2aにわたって存在する第2の領域5aとを有し、第2の領域5aにおける第1部材1aおよび第2部材2aの少なくとも一方の接合面に、長さが100μm以上の金属珪素の塊8(8a)が存在している
The ceramic joined body 20a of this embodiment is formed by joining a first member 1a and a second member 2a made of a silicon carbide sintered body via a joining layer 3a containing silicon carbide 6a and metal silicon 7a. The layer 3a includes a first region 4a that exists between the first member 1a and the second member 2a, and a second region that exists across the first member 1a and the second member 2a outside the first region 4a. And at least one joint surface of the first member 1a and the second member 2a in the second region 5a has a metal silicon lump 8 (8a) having a length of 100 μm or more. .

このような構成を満たす本実施形態のセラミック接合体20aは、第2の領域5aにおける第1部材1aおよび第2部材2aの少なくとも一方の接合面に、長さが100μm以上の
金属珪素の塊8aが存在していることにより、セラミック接合体20aを取り扱うときの力によって、第1部材1aと第2の領域5aの接合面や第2部材2aと第2の領域5aの接合面において、外方から内方に向かって生じやすいクラックの進展を止めることができる。それゆえ、本実施形態のセラミック接合体20aは、高い接合強度を有する。なお、金属珪素の塊8aの長さの上限については、第1部材1aと第2の領域5aの接合面の長さの1/2以下であることが好ましく、金属珪素の塊8aが複数個ある場合も、合計の長さが1/2以下であるのが好ましい。第2部材2aと第2の領域5aの接合面についても同様
である。
The ceramic joined body 20a of the present embodiment satisfying such a configuration has a metallic silicon lump 8a having a length of 100 μm or more on at least one joining surface of the first member 1a and the second member 2a in the second region 5a. Is present on the joint surface between the first member 1a and the second region 5a and the joint surface between the second member 2a and the second region 5a due to the force when handling the ceramic joined body 20a. It is possible to stop the development of cracks that tend to occur inward from the inside. Therefore, the ceramic joined body 20a of the present embodiment has a high joining strength. The upper limit of the length of the metal silicon lump 8a is preferably ½ or less of the length of the joint surface between the first member 1a and the second region 5a, and there are a plurality of metal silicon lumps 8a. In some cases, the total length is preferably ½ or less. The same applies to the joint surface between the second member 2a and the second region 5a.

これに対し、金属珪素の塊8aが存在していたとしても、長さが100μm未満では、ク
ラックの進展を止める効果が少ない。
On the other hand, even if the metal silicon lump 8a exists, if the length is less than 100 μm, the effect of stopping the progress of cracks is small.

そして、金属珪素の塊8aとは、図2(a)、(b)に示すように、炭化珪素の粒子が存在せず金属珪素のみが存在しているもののことであり、金属珪素の塊8aの長さとは、金属珪素の塊8aと第1部材1aまたは第2部材2aとが接している距離(図2(b)におけるL1)のことである。   The metal silicon lump 8a is, as shown in FIGS. 2 (a) and 2 (b), a silicon silicon particle having no silicon carbide particles and only a metal silicon lump. Is the distance (L1 in FIG. 2B) where the metal silicon lump 8a is in contact with the first member 1a or the second member 2a.

また、図2(b)に示す、金属珪素8aの長さL1の垂線において最も長い長さL2については、50μm以上であることが好ましく、上限については、長さL2を第2の領域5aまで伸ばした長さの1/2以下であることが好ましい。   In addition, the longest length L2 in the perpendicular line of the length L1 of the metal silicon 8a shown in FIG. 2B is preferably 50 μm or more, and the upper limit is set to the length L2 up to the second region 5a. The length is preferably ½ or less of the stretched length.

そして、炭化珪素質焼結体からなる第1部材1aおよび第2部材2aにおいては、炭化珪素質焼結体を構成する全成分100質量%のうち、炭化珪素が70質量%以上を占めること
が好適である。
And in the 1st member 1a and 2nd member 2a which consist of a silicon carbide sintered body, silicon carbide may occupy 70 mass% or more among 100 mass% of all the components which comprise a silicon carbide sintered body. Is preferred.

また、第1の領域4aおよび第2の領域5aに含む炭化珪素6aおよび金属珪素7aのうち、炭化珪素6aは、第1の領域4aおよび第2の領域5aの強度を保つ骨材の役目を成し、一方の金属珪素7aは、炭化珪素6aとの濡れ性がよく骨材となる炭化珪素6a同士を繋ぐとともに、炭化珪素質焼結体からなる第1部材1aと第2部材2aとを強固に接合する役目を成すものである。   Of silicon carbide 6a and metal silicon 7a included in first region 4a and second region 5a, silicon carbide 6a serves as an aggregate that maintains the strength of first region 4a and second region 5a. One metal silicon 7a has good wettability with the silicon carbide 6a and connects the silicon carbide 6a as aggregates together, and the first member 1a and the second member 2a made of a silicon carbide sintered body. It plays the role of joining firmly.

第1の領域4aおよび第2の領域5aにおける炭化珪素6aと金属珪素7aの質量合計における炭化珪素6aの質量割合は、例えば、20%以上70%以下である。炭化珪素6aの質量割合が20%以上35%以下であれば、空隙を少なくして接合強度を高めることができる。炭化珪素6aの質量割合が35%を超えて70%以下であれば、接合強度を維持しつつクラックを少なくすることができる。   The mass ratio of silicon carbide 6a in the total mass of silicon carbide 6a and metal silicon 7a in first region 4a and second region 5a is, for example, not less than 20% and not more than 70%. If the mass ratio of silicon carbide 6a is 20% or more and 35% or less, the voids can be reduced and the bonding strength can be increased. If the mass ratio of silicon carbide 6a exceeds 35% and is 70% or less, cracks can be reduced while maintaining the bonding strength.

なお、第1の領域4aおよび第2の領域5aにおける炭化珪素6aと金属珪素7aの存在の有無については、走査型電子顕微鏡(SEM)および付設のエネルギー分散型分析装置(EDS)を用いて確認すればよい。具体的には、第1の領域4aおよび第2の領域5aを含むようにセラミック接合体20aを切断し、切断面をダイヤモンド砥粒などの研磨剤を用いて鏡面に加工した面を観察面とし、SEMで観察した後、SEMに付設のEDSにより、観察領域において確認される結晶粒子および結晶粒子以外の部分に電子線を照射して確認すればよい。なお、結晶粒子において珪素と炭素が観察されれば、炭化珪素が存在しているといえ、結晶粒子以外の部分に珪素が確認されれば、金属珪素が存在しているといえる。   The presence or absence of silicon carbide 6a and metal silicon 7a in first region 4a and second region 5a is confirmed using a scanning electron microscope (SEM) and an attached energy dispersive analyzer (EDS). do it. Specifically, a surface obtained by cutting the ceramic joined body 20a so as to include the first region 4a and the second region 5a and processing the cut surface into a mirror surface using an abrasive such as diamond abrasive grains is used as an observation surface. After observing with an SEM, the EDS attached to the SEM may be confirmed by irradiating the electron beam to the crystal particles to be confirmed in the observation region and portions other than the crystal particles. Note that if silicon and carbon are observed in the crystal particles, it can be said that silicon carbide is present, and if silicon is confirmed in a portion other than the crystal particles, it can be said that metallic silicon is present.

また、他の方法としては、上述した同様の観察面において、電子線マイクロアナライザー(EPMA)を用いたカラーマッピングにより、炭素が確認される領域で珪素が確認されれば炭化珪素の結晶粒子が存在するとみなすことができ、珪素が確認される領域で炭素が確認されなければ金属珪素が存在するとみなすことができる。   As another method, on the same observation surface as described above, if silicon is confirmed in a region where carbon is confirmed by color mapping using an electron beam microanalyzer (EPMA), silicon carbide crystal particles are present. If no carbon is confirmed in a region where silicon is confirmed, it can be regarded that metallic silicon is present.

なお、接合相3の構成が、炭化珪素6aと金属珪素7aであることが把握できているときには、金属珪素の塊8aの長さL1が200μm以上あれば、金属顕微鏡による色調差で
も金属珪素の塊8aの存在を確認することも可能である。
When it can be grasped that the configuration of the bonding phase 3 is silicon carbide 6a and metal silicon 7a, if the length L1 of the metal silicon lump 8a is 200 μm or more, even if the color difference by the metal microscope is different, It is also possible to confirm the presence of the mass 8a.

次に、本実施形態のセラミック接合体の他の例について図3を説明する。   Next, another example of the ceramic joined body of the present embodiment will be described with reference to FIG.

図3は、本実施形態のセラミック接合体の他の例を示す、(a)は斜視図であり、(b)は断面図である。   3A and 3B show another example of the ceramic joined body of the present embodiment, in which FIG. 3A is a perspective view and FIG. 3B is a cross-sectional view.

図3に示す例の本実施形態のセラミック接合体20(20b)は、円柱状の第1部材1(1b)および第2部材2(2b)のそれぞれが、接合層3(3b)で接合されているものである。このような構成においても、第2の領域5bにおける第1部材1bおよび第2部材2bの少なくとも一方の接合面に、長さが100μm以上の金属珪素の塊(図示せず)が存
在していることにより、セラミック接合体20bを取り扱うときの力によって、第1部材1bと第2の領域5bの接合面や第2部材2bと第2の領域5bの接合面において、外方から内方に向かって生じやすいクラックの進展を止めることができる。
In the ceramic joined body 20 (20b) of the embodiment shown in FIG. 3, each of the cylindrical first member 1 (1b) and the second member 2 (2b) is joined by the joining layer 3 (3b). It is what. Even in such a configuration, at least one joint surface of the first member 1b and the second member 2b in the second region 5b has a lump (not shown) of metal silicon having a length of 100 μm or more. As a result, due to the force when handling the ceramic joined body 20b, the joining surface of the first member 1b and the second region 5b and the joining surface of the second member 2b and the second region 5b are directed from the outside to the inside. It is possible to stop the development of cracks that tend to occur.

次に、本実施形態のセラミック流路体の一例について図4を用いて説明する。   Next, an example of the ceramic channel body of the present embodiment will be described with reference to FIG.

図4は、本実施形態のセラミック流路体の一例を示す、(a)は斜視図であり、(b)は部分断面図である。   4A and 4B show an example of the ceramic channel body of the present embodiment, in which FIG. 4A is a perspective view and FIG. 4B is a partial cross-sectional view.

本実施形態のセラミック流路体30(30c)における第1部材1(1c)および第2部材2(2c)は、図1に記載したセラミック接合体20aの第1部材1aおよび第2部材2aの内部に、それぞれ流路10(10c)を形成し連通させたものである。   The first member 1 (1c) and the second member 2 (2c) in the ceramic flow path body 30 (30c) of the present embodiment are the first member 1a and the second member 2a of the ceramic joined body 20a described in FIG. A flow path 10 (10c) is formed and communicated therein.

次に、本実施形態のセラミック流路体の他の例について図5を用いて説明する。   Next, another example of the ceramic channel body of the present embodiment will be described with reference to FIG.

図5は、本実施形態のセラミック流路体の他の例を示す、(a)は斜視図であり、(b)は断面図である。   5A and 5B show another example of the ceramic channel body of the present embodiment, in which FIG. 5A is a perspective view and FIG. 5B is a cross-sectional view.

本実施形態のセラミック流路体30(30d)における第1部材1(1d)および第2部材2(2d)は、図3に記載したセラミック接合体20bの第1部材1bおよび第2部材2bの内部に、それぞれ流路10(10d)を形成し連通させたものである。   The first member 1 (1d) and the second member 2 (2d) in the ceramic flow path body 30 (30d) of the present embodiment are the same as the first member 1b and the second member 2b of the ceramic joined body 20b described in FIG. A flow path 10 (10d) is formed and communicated therein.

図4および図5に示すセラミック流路体30においても、第2の領域5における第1部材1および第2部材2の少なくとも一方の接合面に、長さが100μm以上の金属珪素の塊(
図示せず)が存在していることにより、セラミック流路体30を取り扱うときの力によって、第1部材1と第2の領域5の接合面や第2部材2と第2の領域5の接合面において、外方から内方に向かって生じやすいクラックの進展を止めることができるため、高い接合強度を有するとともに、内部の流路10を流れる流体が漏出することのない信頼性の高いものとすることができる。
Also in the ceramic flow path body 30 shown in FIGS. 4 and 5, a lump of metallic silicon having a length of 100 μm or more (at least one joint surface of the first member 1 and the second member 2 in the second region 5)
(Not shown), the joint surface between the first member 1 and the second region 5 and the joint between the second member 2 and the second region 5 due to the force when handling the ceramic flow path body 30. In the surface, since it is possible to stop the development of cracks that are likely to occur from the outside to the inside, it has high bonding strength and is highly reliable with no fluid leaking through the internal flow path 10. can do.

次に、本実施形態の熱交換器の一例について図6を用いて説明する。   Next, an example of the heat exchanger of this embodiment will be described with reference to FIG.

図6は、本実施形態の熱交換器の一例を示す、(a)は斜視図であり、(b)は概略断面図である。   FIG. 6 shows an example of the heat exchanger of the present embodiment, where (a) is a perspective view and (b) is a schematic cross-sectional view.

本実施形態の熱交換器40は、熱交換用部材21の複数個と、それぞれの熱交換用部材21(21a、21b、21c)における流路24の流入口と連通するように熱交換用部材21間に配置された流体導入部材22(22a、22b、22c)と、それぞれの熱交換用部材21における流路24の流出口と連通するように熱交換用部材21間に配置された流体導出部材23(23d、23e、23f)とを備えている。なお、図6においては、熱交換器用部材21が3個の例を示し、最下部に第1の流体の導入口27および導出口28を備えるベース部29を備えている例を示しており、導入口27側の入側流路に「25」、導出口28側の出側流路に「26」の符号を付してい
る。また、各部材を接合する接合層3については、図6では省略している。
The heat exchanger 40 of the present embodiment includes a plurality of heat exchanging members 21 and heat exchanging members so as to communicate with the inlets of the flow paths 24 in the respective heat exchanging members 21 (21a, 21b, 21c) The fluid introduction member 22 (22a, 22b, 22c) disposed between 21 and the fluid outlet disposed between the heat exchange members 21 so as to communicate with the outlet of the flow path 24 in each heat exchange member 21 And a member 23 (23d, 23e, 23f). In addition, in FIG. 6, the member 21 for heat exchangers is shown as an example, and the example provided with the base part 29 provided with the inlet 27 and the outlet 28 of the first fluid at the lowermost part is shown. The inlet channel on the inlet 27 side is labeled “25”, and the outlet channel on the outlet 28 side is labeled “26”. Further, the bonding layer 3 for bonding the members is omitted in FIG.

なお、この熱交換器40の流体導入部材22および流体導出部材23が、図4に示すセラミック流路体30cの第1部材1cに相当し、熱交換用部材21が第2部材2cに相当するものである。そして、この熱交換器40は、例えば、熱交換器40内を流す媒体を第1の流体、熱交換器40外に存在する媒体を第2の流体としたとき、第1の流体が冷たい流体であり、第2の流体が各種装置等の稼働によって生じた高温ガスであるとき、流路24に冷たい第1の流体を流すことによって冷却された熱交換用部材21の表面に高温の第2の流体が接触することにより、熱交換が行われるものである。   The fluid introduction member 22 and the fluid outlet member 23 of the heat exchanger 40 correspond to the first member 1c of the ceramic flow path body 30c shown in FIG. 4, and the heat exchange member 21 corresponds to the second member 2c. Is. In the heat exchanger 40, for example, when the medium flowing through the heat exchanger 40 is the first fluid and the medium existing outside the heat exchanger 40 is the second fluid, the first fluid is a cold fluid. When the second fluid is a high-temperature gas generated by the operation of various devices or the like, the second high-temperature is applied to the surface of the heat exchange member 21 cooled by flowing the cold first fluid through the flow path 24. Heat exchange is performed by the contact of the fluid.

本実施形態の熱交換器40は、本実施形態のセラミック流路体を備えていることにより、熱交換効率に優れているとともに、流体の漏出が少ないため、高い信頼性を有する。   The heat exchanger 40 according to the present embodiment includes the ceramic flow path body according to the present embodiment, so that it has excellent heat exchange efficiency and low fluid leakage, and thus has high reliability.

なお、熱交換器40において効率のよい熱交換を行なうにあたっては、第1の流体と第2の流体とが対向流となるように配置することが好ましいが、必ずしも対向流となるように配置する必要はなく、例えば直交流となるように配置する、流体の流れを同じ方向となるように配置する等、適宜、目的とする流体の流れに合わせて配置することができる。   In order to perform efficient heat exchange in the heat exchanger 40, it is preferable to arrange the first fluid and the second fluid to be in a counterflow, but they are not necessarily arranged to be in a counterflow. It is not necessary, for example, it can be arranged in accordance with the intended fluid flow, for example, arranged so as to be a cross flow, or arranged so that the fluid flows are in the same direction.

次に、本実施形態のセラミック接合体の製造方法の一例について説明する。   Next, an example of the manufacturing method of the ceramic joined body of this embodiment is demonstrated.

まず、炭化珪素質焼結体からなる第1部材および第2部材を準備する。次に、平均粒径が2〜5μmの大きさの珪素粉末と、炭化珪素粉末と、テルピネオール等の有機溶媒と、エチルセルロースまたはアクリル系のバインダーとを攪拌脱泡装置内の収納容器に投入した後、攪拌・脱泡して、接合層となる第1のペーストを作製する。このとき、珪素粉末と炭化珪素粉末との質量合計における炭化珪素粉末の質量割合は、例えば20%以上70%以下とすればよい。また、珪素粉末、炭化珪素粉末、有機溶媒およびバインダーの合計100質
量%における有機溶媒の含有量は1.2質量%以上23.3質量%以下、バインダーの含有量は3.1質量%以上32.7質量%以下とすればよい。
First, a first member and a second member made of a silicon carbide sintered body are prepared. Next, after putting silicon powder having an average particle size of 2 to 5 μm, silicon carbide powder, an organic solvent such as terpineol, and ethyl cellulose or an acrylic binder into the storage container in the stirring deaerator. Then, stirring and defoaming are performed to produce a first paste to be a bonding layer. At this time, the mass ratio of the silicon carbide powder in the total mass of the silicon powder and the silicon carbide powder may be, for example, 20% to 70%. Further, if the total content of silicon powder, silicon carbide powder, organic solvent and binder is 100% by mass, the organic solvent content is 1.2% by mass to 23.3% by mass, and the binder content is 3.1% by mass to 32.7% by mass. Good.

また、平均粒径が3〜20μmの大きさの珪素粉末、有機溶媒およびバインダーを含む第2のペーストを作製する。なお、珪素粉末、有機溶媒およびバインダーの合計100質量%
における有機溶媒の含有量は1.2質量%以上23.3質量%以下、バインダーの含有量は3.1質量%以上32.7質量%以下とすればよい。
Also, a second paste containing silicon powder having an average particle size of 3 to 20 μm, an organic solvent and a binder is prepared. In addition, silicon powder, organic solvent and binder total 100% by mass
The organic solvent content in can be 1.2% by mass or more and 23.3% by mass or less, and the binder content can be 3.1% by mass or more and 32.7% by mass or less.

次に、第1部材および第2部材の少なくともいずれか一方の接合面に、第1のペーストを塗布した後、それぞれの接合面を合わせて、接合面に垂直な方向から加圧する。なお、加圧には、接合面の上部に第1部材または第2部材が位置するように置くことにより自重が加わるものも含む。   Next, after applying the first paste to the joining surface of at least one of the first member and the second member, the joining surfaces are combined and pressed from the direction perpendicular to the joining surface. Note that the pressurization includes those in which the weight is applied by placing the first member or the second member on the upper part of the joint surface.

なお、第2の領域における第1部材および第2部材の少なくとも一方の接合面に、長さが100μm以上の金属珪素の塊を存在させるには、所望の位置に、熱処理後に100μm以上の長さの金属珪素の塊となるように第2のペーストを予め塗布しておき、加圧後若しくは加圧中に、第1部材および第2部材にわたるように、かつ、第2のペーストを覆うように、第1のペーストをさらに塗布すればよい。   In addition, in order to make a lump of metal silicon having a length of 100 μm or more exist on at least one joint surface of the first member and the second member in the second region, the length of 100 μm or more after heat treatment is provided at a desired position. The second paste is applied in advance so as to form a lump of metallic silicon, and after or during pressurization, covers the second paste so as to cover the first member and the second member. The first paste may be further applied.

また、第2のペーストを予め塗布しておけば、第1部材および第2部材の少なくとも一方の接合面に塗布する第1のペーストを多めに塗布して加圧することにより、第1のペーストが第1部材と第2部材の間からはみ出して第2のペーストを覆うようにしてもよい。   In addition, if the second paste is applied in advance, the first paste is applied by applying a large amount of the first paste applied to at least one joint surface of the first member and the second member and pressurizing. The second paste may be covered by protruding from between the first member and the second member.

そして、ペースト塗布後においては、8時間以上16時間以下の間、80℃以上300℃以下
の温度に保持してペーストを乾燥する。その後、真空雰囲気中またはアルゴン等の不活性ガス雰囲気中で、圧力を1気圧、保持温度を1400℃以上1500℃以下、保持時間を30分以上90分以下として熱処理することにより、本実施形態のセラミック接合体を得ることができる。なお、1100℃から保持温度までの昇温速度は、例えば、120℃/時間以上150℃/時間以下とすることが好適である。
Then, after applying the paste, the paste is dried by maintaining the temperature at 80 ° C. or more and 300 ° C. or less for 8 hours or more and 16 hours or less. Thereafter, heat treatment is performed in a vacuum atmosphere or an inert gas atmosphere such as argon, with a pressure of 1 atm, a holding temperature of 1400 ° C. to 1500 ° C., and a holding time of 30 minutes to 90 minutes. A ceramic joined body can be obtained. In addition, the rate of temperature increase from 1100 ° C. to the holding temperature is preferably, for example, 120 ° C./hour or more and 150 ° C./hour or less.

また、接合層に空隙を有していないものとするには、上述した熱処理の昇温時に圧力の調整を行なうことが好ましい。具体的には、保持温度に到達するまでの昇温時には1気圧より低い圧力とし、保持温度に到達したときに、圧力を1気圧とすればよい。   In order to make the bonding layer have no voids, it is preferable to adjust the pressure when the temperature of the heat treatment is raised. Specifically, the pressure may be lower than 1 atm when the temperature rises until the holding temperature is reached, and the pressure may be 1 atm when the holding temperature is reached.

なお、本実施形態のセラミック流路体の製造方法については、上述した本実施形態のセラミック接合体の製造方法に対して、中空状の第1部材および第2部材を用いる点のみが異なるものであるため、記載を省略する。また、本実施形態の熱交換器の製造方法についても、第1部材および第2部材の形状や個数等が異なるのみであるため、記載を省略する。   In addition, the manufacturing method of the ceramic channel body of the present embodiment is different from the above-described manufacturing method of the ceramic joined body of the present embodiment only in that the hollow first member and the second member are used. Description is omitted because there are. In addition, the manufacturing method of the heat exchanger of the present embodiment is also omitted because only the shapes and the number of the first member and the second member are different.

以上、本実施形態について詳細を説明したが、本実施形態は上述の実施の形態に限定されるものではなく、本実施形態の要旨を逸脱しない範囲内において、種々の変更、改良等が可能である。   Although the present embodiment has been described in detail above, the present embodiment is not limited to the above-described embodiment, and various changes and improvements can be made without departing from the scope of the present embodiment. is there.

また、本実施形態のセラミック流路体は、例えば、半導体素子用の載置部材として用いれば、放熱性にすぐれたものとすることができる。さらに、本実施形態の熱交換器は、例えば、半導体製造装置用等の熱交換器として用いることができるものである。   Moreover, if the ceramic flow path body of this embodiment is used, for example as a mounting member for semiconductor elements, it can be excellent in heat dissipation. Furthermore, the heat exchanger of this embodiment can be used as, for example, a heat exchanger for a semiconductor manufacturing apparatus.

以下、本発明の実施例を具体的に説明するが、本発明はこれらの実施例により限定されるものではない。   Examples of the present invention will be specifically described below, but the present invention is not limited to these examples.

まず、炭化珪素質焼結体からなる第1部材および第2部材を準備した。第1部材、第2部材の大きさは、共に3×4×25mmとした。3×4mmの面が接合面である。   First, a first member and a second member made of a silicon carbide sintered body were prepared. The size of the first member and the second member was 3 × 4 × 25 mm. A 3 × 4 mm surface is the bonding surface.

次に、平均粒径が3μmの大きさの珪素粉末と、炭化珪素粉末と、テルピネオール等の有機溶媒と、エチルセルロースまたはアクリル系のバインダーとを攪拌脱泡装置内の収納容器に投入した後、攪拌・脱泡して、接合層となる第1のペーストを作製した。このとき、珪素粉末と炭化珪素粉末との質量合計における炭化珪素粉末の質量割合は40%とした。また、珪素粉末、炭化珪素粉末、有機溶媒およびバインダーの合計100質量%における有
機溶媒およびバインダーの各含有量は共に12質量%とした。
Next, silicon powder having an average particle size of 3 μm, silicon carbide powder, an organic solvent such as terpineol, and ethyl cellulose or an acrylic binder are put into a storage container in a stirring deaerator, and then stirred. -A defoaming was performed to prepare a first paste to be a bonding layer. At this time, the mass ratio of the silicon carbide powder in the total mass of the silicon powder and the silicon carbide powder was 40%. In addition, each content of the organic solvent and the binder in a total of 100% by mass of the silicon powder, the silicon carbide powder, the organic solvent and the binder was 12% by mass.

また、平均粒径が8μmの大きさの珪素粉末と、テルピネオール等の有機溶媒と、エチルセルロースまたはアクリル系のバインダーとを攪拌脱泡装置内の収納容器に投入した後、攪拌・脱泡して、第2のペーストを作製した。そして、珪素粉末、有機溶媒およびバインダーの合計100質量%における有機溶媒およびバインダーの各含有量は共に10質量%と
した。
Moreover, after putting silicon powder having an average particle size of 8 μm, an organic solvent such as terpineol, and ethyl cellulose or an acrylic binder into a storage container in the stirring and defoaming apparatus, stirring and defoaming are performed. A second paste was prepared. And each content of the organic solvent and binder in the total 100 mass% of silicon powder, organic solvent, and binder was 10 mass%.

そして、第2の領域に相当する第1部材および第2部材の表面に、表1に示す大きさの金属珪素の塊が形成可能な第2のペーストを塗布して乾燥した。   And the 2nd paste which can form the lump of the metal silicon of the magnitude | size shown in Table 1 was apply | coated to the surface of the 1st member and 2nd member which correspond to a 2nd area | region, and it dried.

次に、第1部材の接合面に、第1のペーストを塗布した後、第1部材の端面と第2部材の端面を合わせて、接合面に垂直な方向から加圧し、第1のペースト、第1部材および第2部材にわたるように、かつ、第2のペーストを覆うように、第1のペーストをさらに塗
布して乾燥させた。その後、真空雰囲気中で、保持温度を1400℃以上1500℃以下、保持時間を30分として熱処理することにより、セラミック接合体を得た。
Next, after applying the first paste to the bonding surface of the first member, the end surface of the first member and the end surface of the second member are aligned and pressed from the direction perpendicular to the bonding surface, The first paste was further applied and dried so as to cover the second paste so as to cover the first member and the second member. Thereafter, heat treatment was performed in a vacuum atmosphere at a holding temperature of 1400 ° C. or higher and 1500 ° C. or lower and a holding time of 30 minutes to obtain a ceramic joined body.

なお、試料No.1については、第2のペーストを塗布せず作製し、第1部材と第2部材との間に存在する第1の領域における厚みは50μmとし、第2の領域における長さは4100μmとした。   Sample No. No. 1 was prepared without applying the second paste, the thickness in the first region existing between the first member and the second member was 50 μm, and the length in the second region was 4100 μm.

そして、各試料につき、曲げ強度を測定した。測定試料の形状を3×4×50mmとしたこと以外は、JIS R 1624−2010に記載された4点曲げ強度試験に沿って、曲げ強度を測定した。なお、測定にあたっては、接合層が荷重点の中央になるように配置して行ない、各試料につき5個の平均値を表1に示した。   And bending strength was measured about each sample. The bending strength was measured according to the 4-point bending strength test described in JIS R 1624-2010 except that the shape of the measurement sample was 3 × 4 × 50 mm. In the measurement, the bonding layer was arranged so as to be in the center of the load point, and the average value of five for each sample is shown in Table 1.

次に、各試料につき、第1の領域および第2の領域における炭化珪素と金属珪素の存在の有無をSEMおよび付設のEDSを用いて確認した。具体的には、第1の領域および第2の領域を含むように、試料の長手方向に沿って切断した。   Next, for each sample, the presence or absence of silicon carbide and metal silicon in the first region and the second region was confirmed using an SEM and an attached EDS. Specifically, the sample was cut along the longitudinal direction of the sample so as to include the first region and the second region.

そして、さらにこの断面をダイヤモンド砥粒などの研磨剤を用いて鏡面に加工した。この加工面を観察面としSEMで観察した後、SEMに付設のEDSにより、観察領域において確認される結晶粒子および結晶粒子以外の部分に電子線を照射して確認した。なお、結晶粒子において珪素と炭素が観察され、結晶粒子以外の部分に珪素が確認されたので、炭化珪素および金属珪素が接合層に存在することが確認できた。また、SEMの観察により、金属珪素の塊の大きさを測定し、表1に示した。   Further, this cross section was processed into a mirror surface using an abrasive such as diamond abrasive grains. This processed surface was used as an observation surface and observed with an SEM, and then confirmed by irradiating an electron beam to crystal particles and portions other than the crystal particles confirmed in the observation region with an EDS attached to the SEM. In addition, since silicon and carbon were observed in the crystal particles and silicon was confirmed in portions other than the crystal particles, it was confirmed that silicon carbide and metal silicon were present in the bonding layer. Further, the size of the metallic silicon lump was measured by SEM observation and shown in Table 1.

Figure 2016155734
Figure 2016155734

表1に示すように、金属珪素の塊が存在していない試料No.1は、曲げ強度が298M
Paと低かった。また、金属珪素の塊が存在しているものの、その長さが100μm未満で
ある試料No.2は310MPa、試料No.3は314MPaであった。
As shown in Table 1, sample no. 1, the bending strength is 298M
It was low with Pa. In addition, although there is a lump of metallic silicon, the sample No. 2 is 310 MPa, sample no. 3 was 314 MPa.

これに対し、試料No.4〜19は、330MPa以上と高い曲げ強度の値が得られており
、金属珪素の塊が存在するとともに、その長さが100μm以上であることにより高い接合
強度を有することがわかった。
In contrast, sample no. Nos. 4 to 19 have a high bending strength value of 330 MPa or more, and it has been found that the metal silicon lump is present and that the length is 100 μm or more and thus has high bonding strength.

以上のことから、本実施形態のセラミック接合体に流路が設けられてなるセラミック流路体および、本実施形態のセラミック流路体を備える熱交換器は、高い接合強度を有し、流体の漏出が少ないため、高い信頼性を有するものであることがわかった。   From the above, the ceramic flow path body in which the flow path is provided in the ceramic joined body of the present embodiment and the heat exchanger including the ceramic flow path body of the present embodiment have high joint strength, It was found to have high reliability because of less leakage.

1:第1部材
2:第2部材
3:接合層
4:第1の領域
5:第2の領域
6:炭化珪素
7:金属珪素
8:金属珪素の塊
10、24:流路
20:セラミック接合体
30:セラミック流路体
21:熱交換用部材
22:流体導入部材
23:流体導出部材
25:入側流路
26:出側流路
27:導入口
28:導出口
29:ベース部
40:熱交換器
1: first member 2: second member 3: bonding layer 4: first region 5: second region 6: silicon carbide 7: metallic silicon 8: lump of metallic silicon
10, 24: Flow path
20: Ceramic joint
30: Ceramic channel body
21: Heat exchange member
22: Fluid introduction member
23: Fluid outlet member
25: Inlet channel
26: Outlet channel
27: Introduction
28: Outlet
29: Base section
40: Heat exchanger

Claims (3)

炭化珪素質焼結体からなる第1部材および第2部材が、炭化珪素および金属珪素を含む接合層を介して接合されたセラミック接合体であって、前記接合層は、前記第1部材と前記第2部材との間に存在する第1の領域と、該第1の領域よりも外方において前記第1部材および前記第2部材にわたって存在する第2の領域とを有し、該第2の領域における前記第1部材および前記第2部材の少なくとも一方の接合面に、長さが100μm以上の金属珪素の塊が存在していることを特徴とするセラミック接合体。   The first member and the second member made of a silicon carbide-based sintered body are ceramic joined bodies joined via a joining layer containing silicon carbide and metal silicon, and the joining layer includes the first member and the A first region existing between the second member and a second region existing across the first member and the second member outside the first region, the second region A ceramic joined body, wherein a lump of metallic silicon having a length of 100 μm or more exists on at least one joining surface of the first member and the second member in the region. 請求項1に記載のセラミック接合体に流路が設けられてなることを特徴とするセラミック流路体。   A ceramic flow path body comprising a flow path in the ceramic joined body according to claim 1. 請求項2に記載のセラミック流路体を備えることを特徴とする熱交換器。   A heat exchanger comprising the ceramic channel body according to claim 2.
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JP2015193518A (en) * 2014-03-28 2015-11-05 Toto株式会社 reaction sintered silicon carbide member
JP2016108170A (en) * 2014-12-03 2016-06-20 京セラ株式会社 Ceramic flow passage body, and heat exchanger including the same
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JP2006188428A (en) * 2000-04-26 2006-07-20 Ibiden Co Ltd Ceramic member and table for wafer polishing device
JP2005041193A (en) * 2003-07-25 2005-02-17 Taiheiyo Cement Corp SiC-BASED STRUCTURE
JP2007246319A (en) * 2006-03-15 2007-09-27 Taiheiyo Cement Corp Ceramic joined body having hollow structure
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