JP2016143514A5

JP2016143514A5 - Charged particle beam apparatus and scanning electron microscope

Info

Publication number: JP2016143514A5
Application number: JP2015017319A
Authority: JP
Filing date: 2015-01-30
Publication date: 2017-08-10
Anticipated expiration: 2035-01-30

Description

一次電子線１２は、加速電源１４で加速されたエネルギーで試料２３上を走査する。そのとき二次電子２１ａは、第２の対物レンズ２６の磁場により磁束に巻きついて螺旋運動をしながら上昇する。試料２３表面から離れると急速に磁束密度が低下するので、二次電子２１ａは旋回から振りほどかれて発散し、二次電子検出器１９からの引込み電界により偏向されて二次電子検出器１９に捕獲される。すなわち、二次電子検出器１９から発生する電界が、荷電粒子線によって試料から放出される二次電子を引き付けるように、二次電子検出器１９は配置される、このようにして、二次電子検出器１９に入る二次電子２１ａを多くすることができる。 The primary electron beam 12 scans the sample 23 with energy accelerated by the acceleration power source 14. At that time, the secondary electrons 21a are wound around the magnetic flux by the magnetic field of the second objective lens 26 and rise while spiraling. Since the magnetic flux density rapidly decreases when the sample 23 moves away from the surface of the sample 23, the secondary electrons 21 a are unwound from the swirl and diverge, and are deflected by the drawn electric field from the secondary electron detector 19, and are then incident on the secondary electron detector 19. Be captured. That is, the secondary electron detector 19 is arranged so that the electric field generated from the secondary electron detector 19 attracts the secondary electrons emitted from the sample by the charged particle beam . The number of secondary electrons 21a entering the detector 19 can be increased.

Claims

  A charged particle source;
  An acceleration power source connected to the charged particle source, provided to accelerate the charged particle beam emitted from the charged particle source;
  A first objective lens that is installed on a side where the charged particle beam is incident on a sample and focuses the charged particle beam on the sample;
  A second objective lens that is placed on the opposite side of the sample where the charged particle beam is incident, and focuses the charged particle beam on the sample;
  A first objective lens power source for varying the intensity of the first objective lens;
  A second objective lens power source for varying the intensity of the second objective lens;
With
  When using only the first objective lens power source, the sample is disposed between the first objective lens and the second objective lens;
  When only the second objective lens power source is used, the charged particle beam apparatus is configured such that the distance between the second objective lens and the measurement sample surface is closer than the distance between the first objective lens and the measurement sample surface.

  A charged particle source;
  An acceleration power source connected to the charged particle source, provided to accelerate the charged particle beam emitted from the charged particle source;
  A first objective lens that is installed on a side where the charged particle beam is incident on a sample and focuses the charged particle beam on the sample;
  A second objective lens that is placed on the opposite side of the sample where the charged particle beam is incident, and focuses the charged particle beam on the sample;
  A first objective lens power source for varying the intensity of the first objective lens;
  A second objective lens power source for varying the intensity of the second objective lens;
  A first control device for controlling the first objective lens power source and the second objective lens power source;
With
  When using only the first objective lens power source, the distance between the first objective lens and the measurement sample surface is made closer than the distance between the second objective lens and the measurement sample surface;
  When only the second objective lens power source is used, the charged particle beam apparatus is configured such that the distance between the second objective lens and the measurement sample surface is closer than the distance between the first objective lens and the measurement sample surface.

  A charged particle source;
  An acceleration power source connected to the charged particle source, provided to accelerate the charged particle beam emitted from the charged particle source;
  A first objective lens that is installed on a side where the charged particle beam is incident on a sample and focuses the charged particle beam on the sample;
  A second objective lens that is placed on the opposite side of the sample where the charged particle beam is incident, and focuses the charged particle beam on the sample;
  A first objective lens power source for varying the intensity of the first objective lens;
  A second objective lens power source for varying the intensity of the second objective lens;
  A first control device for controlling the first objective lens power source and the second objective lens power source;
With
  The first control device has a function of independently controlling the strength of the first objective lens and the strength of the second objective lens, and a function of controlling the strength simultaneously.
  When using only the first objective lens power source, the distance between the first objective lens and the measurement sample surface is made closer than the distance between the second objective lens and the measurement sample surface;
  When only the second objective lens power source is used, the charged particle beam apparatus is configured such that the distance between the second objective lens and the measurement sample surface is closer than the distance between the first objective lens and the measurement sample surface.

  A charged particle source;
  An acceleration power source connected to the charged particle source, provided to accelerate the charged particle beam emitted from the charged particle source;
  A charged particle beam apparatus having an objective lens for focusing the charged particle beam on a sample,
  The objective lens is
    A first objective lens installed on the side on which the charged particle beam is incident on the sample;
    A second objective lens installed on the opposite side to the side on which the charged particle beam is incident on the sample,
  The charged particle beam device comprises:
    A first objective lens power source for varying the intensity of the first objective lens;
    A second objective lens power source for varying the intensity of the second objective lens;
    A first control device for controlling the first objective lens power source and the second objective lens power source;
  The first control device includes a function of independently controlling the intensity of the first objective lens and the intensity of the second objective lens, a function of simultaneously controlling the intensity, and the charged particle beam for the first objective lens. A function of focusing the sample only on the lens, a function of focusing the charged particle beam on the sample only by the second objective lens, and the charging using the first objective lens and the second objective lens simultaneously. The opening angle of the particle beam incident on the sample is varied by the first objective lens so that the opening angle is smaller than when the charged particle beam is focused on the sample by the second objective lens alone. And a charged particle beam device having a function of focusing on the sample.

  A two-stage deflecting member for two-dimensionally scanning the charged particle beam;
    The two-stage deflection member has an upper deflection member and a lower deflection member,
  An upper deflection power source for varying the strength or voltage of the upper deflection member;
  A lower deflection power source for varying the strength or voltage of the lower deflection member;
  A second control device for controlling the upper deflection power source and the lower deflection power source;
  The upper deflection member and the lower deflection member are installed on the side from which the charged particle beam comes from the inside of the first objective lens,
  5. The charged particle beam device according to claim 1, wherein the second control device varies a use current ratio or a use voltage ratio of the upper deflection power supply and the lower deflection power supply. 6.

  Having a two-stage deflection member for two-dimensionally scanning the charged particle beam;
    The two-stage deflection member has an upper deflection member and a lower deflection member,
  An upper deflection power source for varying the strength or voltage of the upper deflection member;
  A lower deflection power source for varying the strength or voltage of the lower deflection member;
  A second control device for controlling the upper deflection power source and the lower deflection power source;
  The upper deflection member and the lower deflection member are installed on the side from which the charged particle beam comes from the inside of the first objective lens,
  The lower deflection member is a plurality of coils each having a different number of turns,
  The charged particle beam device according to claim 1, wherein the second control device controls one of the plurality of coils to be used.

The charged particle beam apparatus according to claim 5, wherein the deflection member is a deflection coil or a deflection electrode.

The charged particle beam apparatus according to claim 1, further comprising a retarding power supply for decelerating the charged particle beam that applies a negative potential to the sample.

The second objective lens sees the charged particle beam accelerated by setting the acceleration power source to any one of −30 kV to −10 kV from a position closest to the sample of the magnetic pole of the second objective lens, The charged particle beam apparatus according to any one of claims 1 to 8, wherein the charged particle beam apparatus can be focused to a position at any height of 0 mm to 4.5 mm.

  An insulating plate disposed on the second objective lens;
  A conductive sample stage disposed on the insulating plate;
  The charged particle beam apparatus according to claim 1, wherein the second objective lens and the conductive sample stage are insulated.

The charged particle beam apparatus according to claim 10, wherein the conductive sample stage is shaped so as to move away from the insulating plate as it approaches the peripheral edge.

The charged particle beam apparatus according to claim 10 or 11, wherein a space between the insulating plate and the conductive sample stage is filled with an insulating material.

Further comprising a potential plate with an opening on the conductive sample stage,
The charged particle beam device according to claim 10, wherein a ground potential, a positive potential, or a negative potential is applied to the potential plate.

The charged particle beam device according to claim 13, wherein the opening of the potential plate has a circular shape or a mesh shape with a diameter of 2 mm to 20 mm.

The charged particle beam apparatus according to claim 13 or 14, wherein the potential plate has a shape that is separated from the conductive sample stage at a place other than the vicinity of the sample.

The charged particle beam apparatus according to claim 13, further comprising a moving unit that moves the potential plate.

The moving means is a stage connected to the potential plate;
The charged particle beam apparatus according to claim 16, wherein the stage can mount the sample.

  The magnetic pole forming the second objective lens is
    A central magnetic pole whose central axis coincides with the ideal optical axis of the charged particle beam;
    The top pole,
    A cylindrical side pole,
    A disk-shaped lower magnetic pole,
  The upper part of the central magnetic pole close to the sample side has a shape with a smaller diameter toward the upper part, and the lower part of the central magnetic pole has a cylindrical shape,
  18. The upper magnetic pole is a magnetic pole having a circular opening at the center, and has a disk shape that tapers toward the center and becomes thinner near the center of gravity of the central magnetic pole. 18. Charged particle beam equipment.

The charged particle beam apparatus according to claim 18, wherein a surface of the central magnetic pole on the sample side and a surface of the upper magnetic pole on the sample side are the same height.

The upper tip diameter D of the central magnetic pole is larger than 6 mm and smaller than 14 mm,
The charged particle beam device according to claim 18 or 19, wherein a relationship between a diameter d of the circular opening of the upper magnetic pole and the upper tip diameter D of the central magnetic pole is dD ≧ 4 mm.

21. The charged particle beam apparatus according to claim 1, wherein a thermoelectron source type is used as the charged particle source.

A scanning electron microscope comprising the charged particle beam device according to any one of claims 1 to 21.