JP2016107603A5 - - Google Patents

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Publication number
JP2016107603A5
JP2016107603A5 JP2014250292A JP2014250292A JP2016107603A5 JP 2016107603 A5 JP2016107603 A5 JP 2016107603A5 JP 2014250292 A JP2014250292 A JP 2014250292A JP 2014250292 A JP2014250292 A JP 2014250292A JP 2016107603 A5 JP2016107603 A5 JP 2016107603A5
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JP
Japan
Prior art keywords
image
threshold
dither mask
dot
images
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Application number
JP2014250292A
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English (en)
Japanese (ja)
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JP6320907B2 (ja
JP2016107603A (ja
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Priority to JP2014250292A priority Critical patent/JP6320907B2/ja
Priority claimed from JP2014250292A external-priority patent/JP6320907B2/ja
Priority to US14/958,376 priority patent/US9682550B2/en
Publication of JP2016107603A publication Critical patent/JP2016107603A/ja
Publication of JP2016107603A5 publication Critical patent/JP2016107603A5/ja
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Publication of JP6320907B2 publication Critical patent/JP6320907B2/ja
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JP2014250292A 2014-12-10 2014-12-10 ディザマスク生成方法及び装置、並びにプログラム Active JP6320907B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2014250292A JP6320907B2 (ja) 2014-12-10 2014-12-10 ディザマスク生成方法及び装置、並びにプログラム
US14/958,376 US9682550B2 (en) 2014-12-10 2015-12-03 Dither mask generation method and device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014250292A JP6320907B2 (ja) 2014-12-10 2014-12-10 ディザマスク生成方法及び装置、並びにプログラム

Publications (3)

Publication Number Publication Date
JP2016107603A JP2016107603A (ja) 2016-06-20
JP2016107603A5 true JP2016107603A5 (cg-RX-API-DMAC7.html) 2017-06-01
JP6320907B2 JP6320907B2 (ja) 2018-05-09

Family

ID=56110315

Family Applications (1)

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JP2014250292A Active JP6320907B2 (ja) 2014-12-10 2014-12-10 ディザマスク生成方法及び装置、並びにプログラム

Country Status (2)

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US (1) US9682550B2 (cg-RX-API-DMAC7.html)
JP (1) JP6320907B2 (cg-RX-API-DMAC7.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6366143B2 (ja) * 2015-09-18 2018-08-01 富士フイルム株式会社 ディザマスク生成方法及び装置、並びにプログラム
JP6342372B2 (ja) * 2015-09-18 2018-06-13 富士フイルム株式会社 ディザマスク生成方法及び装置、並びにプログラム
JP6601225B2 (ja) * 2016-01-08 2019-11-06 ブラザー工業株式会社 制御装置、および、コンピュータプログラム
JP2018052051A (ja) * 2016-09-30 2018-04-05 ブラザー工業株式会社 制御装置およびコンピュータプログラム

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6601935B2 (en) * 2001-08-01 2003-08-05 Hewlett-Packard Development Company, L.P. Data driven pen nozzle masks
EP1918112A1 (en) * 2006-11-03 2008-05-07 Mutoh Europe N.V. Print smoothing method
JP5633110B2 (ja) * 2009-01-15 2014-12-03 セイコーエプソン株式会社 印刷装置、ディザマスク及び印刷方法
JP2011121248A (ja) * 2009-12-10 2011-06-23 Seiko Epson Corp ディザマスク及び割当情報の生成方法、印刷装置及びプログラム
JP2013173266A (ja) * 2012-02-24 2013-09-05 Dainippon Screen Mfg Co Ltd 画像記録方法、画像記録装置および画像記録物

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