JP2016090363A - Measuring device, measuring system, processing device, and measuring method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a measuring device, measuring system, processing device, and measuring method capable of precisely measuring an amount of liquid.SOLUTION: The measuring device includes: a measurement pipe 2a configured to locate a first end 2a1 to which gas is supplied, in the upper side of a second end 2a2 to which liquid is supplied; an exhaust pipe 2c that is connected to the measurement pipe at the first end side; a discharge pipe 2b that is connected to the measurement pipe at the second end side; a first detection part 3b provided closer to the second end side than an opening 2c1 of the exhaust pipe for detecting liquid inside the measurement pipe; a second detection part 3a provided closer to the second end side than the first detection part and closer to the first end side than an opening 2b1 of the discharge pipe and detecting the liquid inside the measurement pipe; a gas control part 6 for controlling the pressure of gas to be supplied from the first end to the inside of the measurement pipe; a first on-off valve 2f provided at an end of the exhaust pipe in the opposite side of the measurement pipe side; and a second on-off valve 2e provided at the end of the discharge pipe in the opposite side of the measurement pipe side.SELECTED DRAWING: Figure 1

Description

  Embodiments described herein relate generally to a weighing device, a weighing system, a processing device, and a weighing method.

In the manufacture of electronic devices such as semiconductor devices and flat panel displays, an etching process or a cleaning process using a predetermined chemical solution is performed.
For example, chemical treatment using buffered hydrofluoric acid (BHF; buffered hydrogen fluoride), APM (ammonium hydrogen-peroxide mixture), SPM (sulfuric acid peroxide mixture) or the like is performed (for example, see Patent Document 1). .
In such chemical processing, it is necessary to accurately measure the amount (volume) of chemical to be supplied.
For example, it is necessary to accurately measure the amount of the chemical solution according to the concentration of the chemical solution.

Further, in such chemical solution processing, a plurality of types of raw material liquids may be mixed to generate a chemical solution, and processing may be performed using the generated chemical solution.
When processing is performed using the generated chemical solution, the ratio (component ratio) of each component constituting the chemical solution greatly affects the processing rate (for example, the etching rate).
Therefore, when producing a chemical solution, it is necessary to accurately measure the raw material solution of the chemical solution.
For example, it is necessary to accurately measure the amount of the raw material liquid for the chemical liquid according to the concentration of the raw material liquid for the chemical liquid.

In recent years, used chemicals have been reused.
In a used chemical solution, a part of components constituting the chemical solution may be consumed, or a part of components constituting the chemical solution may be volatilized.
Therefore, when reusing used chemicals, it is necessary to replenish components that are lost or insufficient.
Even in such a case, it is necessary to accurately measure the amount of the liquid containing the components of the chemical liquid that are lost or insufficient.
Therefore, development of a technique capable of accurately measuring the amount of liquid has been desired.

JP 2005-251936 A

  The problem to be solved by the present invention is to provide a measuring device, a measuring system, a processing device, and a measuring method capable of accurately measuring the amount of liquid.

  The metering device according to the embodiment has a tubular shape, the metering tube provided so that the first end to which the gas is supplied is located above the second end to which the liquid is supplied, An exhaust pipe connected to the metering pipe on the first end side, an exhaust pipe connected to the metering pipe on the second end side, and an opening inside the metering pipe A first detection unit that is provided closer to the second end than the opening of the exhaust pipe and detects the liquid in the metering pipe; and the second end of the first detection unit. A second detection unit that is provided on the first end side than the opening of the discharge pipe that opens to the inside of the metering tube and detects the liquid in the metering tube A gas control unit that controls the pressure of the gas supplied from the first end to the inside of the measuring pipe, and the exhaust A first on-off valve provided at an end of the discharge pipe opposite to the measuring pipe and a second on-off valve provided at an end of the discharge pipe opposite to the measuring pipe. I have.

  According to the embodiment of the present invention, a measuring device, a measuring system, a processing device, and a measuring method capable of accurately measuring the amount of liquid are provided.

It is a mimetic diagram for illustrating measuring device 1 concerning a 1st embodiment. It is a mimetic diagram for illustrating measurement system 11 concerning a 2nd embodiment. It is a block diagram for illustrating the processing apparatus 100 which concerns on 3rd Embodiment.

Hereinafter, embodiments will be illustrated with reference to the drawings. In addition, in each drawing, the same code | symbol is attached | subjected to the same component and detailed description is abbreviate | omitted suitably.
[First embodiment]
FIG. 1 is a schematic diagram for illustrating a weighing device 1 according to the first embodiment.
As shown in FIG. 1, the weighing device 1 is provided with a weighing unit 2, a detection unit 3, a gas supply unit 4, an introduction unit 5, and a control unit 6.

The measuring unit 2 is provided with a measuring pipe 2a, a discharge pipe 2b, an exhaust pipe 2c, and on-off valves 2d to 2g.
The measuring pipe 2a, the discharge pipe 2b, and the exhaust pipe 2c are tubular.
The measuring pipe 2a, the discharge pipe 2b, and the exhaust pipe 2c can be, for example, a cylindrical pipe.
In the measuring tube 2a, an end 2a1 (corresponding to an example of a first end) to which a gas is supplied is more gravitational than an end 2a2 (corresponding to an example of a second end) to which a chemical solution is supplied. It is provided so as to be located on the upper side in the direction. For example, the measuring tube 2a can be provided upright so as to extend in the vertical direction.

As will be described later, the amount (volume) of the chemical solution in the measuring tube 2a is measured by obtaining the liquid level position of the chemical solution supplied into the measuring tube 2a.
Therefore, it is preferable that the cross-sectional area in the direction perpendicular to the central axis of the measuring tube 2a is substantially constant.
In this way, highly accurate weighing can be easily performed.
There is no particular limitation on the cross-sectional area, length, thickness, etc. of the measuring tube 2a, and it is determined as appropriate in consideration of the amount and viscosity of the chemical solution to be weighed and the resistance (pressure resistance) against pressurization by the gas supply unit 4. Can do.
In this case, the thickness of the measuring tube 2a needs to be a dimension that enables the detection unit 3 to detect the liquid level of the chemical solution. Therefore, the thickness of the measuring tube 2a can be appropriately determined in consideration of the detection method (for example, the transmittance of detection light) in the detection unit 3.

The material of the measuring tube 2a is not particularly limited, and is appropriately determined in consideration of the detection method in the detection unit 3, resistance to chemicals to be measured (chemical resistance), resistance to pressurization by the gas supply unit 4 (pressure resistance), and the like. Can be determined.
The material of the measuring tube 2a is not particularly limited as long as the detection unit 3 can detect the liquid level of the chemical solution. The material of the measuring tube 2a can be glass, for example.

The discharge pipe 2b is connected to the measuring pipe 2a on the end 2a2 side of the measuring pipe 2a.
The discharge pipe 2b is provided to discharge the chemical solution measured in the measurement pipe 2a to the outside of the measurement pipe 2a.
For example, the discharge pipe 2b extends in a direction perpendicular to the central axis of the measuring pipe 2a.
The space inside the discharge pipe 2b is connected to the space inside the measuring pipe 2a.

There are no particular limitations on the cross-sectional area, length, thickness, and material in the direction perpendicular to the central axis of the discharge pipe 2b. The amount and viscosity of the chemical solution to be measured, resistance to the chemical solution to be measured (chemical resistance), gas supply unit 4 can be appropriately determined in consideration of the resistance to pressure (pressure resistance) due to 4.
In this case, the cross-sectional area, thickness, material, etc. of the discharge pipe 2b can be the same as those of the measuring pipe 2a.

The exhaust pipe 2c is connected to the measuring pipe 2a on the end 2a1 side of the measuring pipe 2a.
The exhaust pipe 2c is provided for discharging the gas supplied from the gas supply unit 4 to the inside of the measuring pipe 2a to the outside of the measuring pipe 2a.
The exhaust pipe 2c extends, for example, in a direction perpendicular to the central axis of the measuring pipe 2a.
The space inside the exhaust pipe 2c is connected to the space inside the measuring pipe 2a.

There are no particular limitations on the cross-sectional area, length, thickness, and material in the direction perpendicular to the central axis of the exhaust pipe 2c, resistance to chemicals to be measured (chemical resistance), resistance to pressurization by the gas supply unit 4 (pressure resistance) Etc.) can be appropriately determined.
In this case, the cross-sectional area, thickness, material, etc. of the exhaust pipe 2c can be the same as those of the measuring pipe 2a.
Further, the measuring pipe 2a, the discharge pipe 2b, and the exhaust pipe 2c can be formed integrally or can be formed by joining.

The on-off valve 2d is connected to the end 2a2 of the measuring tube 2a.
The on-off valve 2d supplies and stops supply of the chemical solution through the introduction unit 5 and prevents backflow of the chemical solution from the inside of the measuring tube 2a to the introduction unit 5.
The on-off valve 2e (corresponding to an example of a second on-off valve) is connected to the end of the discharge pipe 2b opposite to the measuring pipe 2a side.
The on-off valve 2e prevents the chemical liquid from being discharged and stopped via the discharge pipe 2b, and prevents the chemical liquid from flowing back into the measuring pipe 2a.
A pipe 112 for supplying the measured chemical solution to an external tank, a processing apparatus, or the like can be connected to the side of the on-off valve 2e opposite to the side to which the discharge pipe 2b is connected.
The on-off valve 2f (corresponding to an example of a first on-off valve) is connected to the end of the exhaust pipe 2c opposite to the measuring pipe 2a side.
The on-off valve 2f discharges gas through the exhaust pipe 2c, stops the discharge, and prevents backflow of gas into the measuring pipe 2a.
The on-off valve 2g is connected to the end 2a1 of the measuring tube 2a.
The on-off valve 2g supplies and stops the supply of gas from the gas supply unit 4 to the inside of the measuring tube 2a, and prevents backflow of gas from the inside of the measuring tube 2a to the gas supply unit 4.

The types of the on-off valves 2d to 2g are not particularly limited, and can be appropriately determined in consideration of resistance to chemicals to be measured (chemical resistance), resistance to pressurization by the gas supply unit 4 (pressure resistance), and the like.
The on-off valves 2d to 2g may be, for example, air operated valves for chemical solutions.

Here, when the supply of the chemical solution to the inside of the measuring tube 2a is stopped, the chemical solution in the portion through which the chemical solution inside the on-off valve 2d passes may be pushed out to the inside of the measuring tube 2a.
When the chemical liquid in the portion through which the chemical liquid passes is pushed out into the measuring tube 2a, the liquid level position of the chemical liquid becomes higher than the desired stop position.
That is, the amount of the chemical solution in the measuring tube 2a is larger than the desired amount, and the supply amount of the chemical solution varies.
Further, when the discharge of the chemical solution from the inside of the measuring tube 2a is stopped, the chemical solution in the portion through which the chemical solution inside the on-off valve 2e passes may be pushed out to the outside.
When the chemical solution in the portion through which the chemical solution passes is pushed out, the supply amount of the chemical solution varies.

Therefore, it is preferable that the opening / closing valves 2d and 2e have as small a capacity as possible for the portion through which the chemical solution passes.
For example, as the on-off valves 2d and 2e, it is preferable to select a valve having the shortest flow path inside.

The detection unit 3 includes a lower end detection unit 3a (corresponding to an example of a second detection unit), an upper end detection unit 3b (corresponding to an example of a first detection unit), and a bubble detection unit 3c. .
The lower end detection unit 3a and the upper end detection unit 3b detect the liquid level of the chemical solution inside the measuring tube 2a.
The lower end detection part 3a is provided above the opening 2b1 of the discharge pipe 2b.
The lower end detection unit 3a is provided below the upper end detection unit 3b.
The upper end detector 3b is provided below the opening 2c1 of the exhaust pipe 2c.
A plurality of upper end detectors 3b can be provided along the direction in which the measuring tube 2a extends.
For example, it is possible to arrange a plurality of upper end detection units 3b at equal intervals to measure the amount of the chemical solution or to determine whether or not the amount of the chemical solution is within an allowable range.
In this case, the amount of the chemical solution between the detection position by the lower end detection unit 3a and the liquid level detected by a predetermined one of the plurality of upper end detection units 3b is the measured amount of the chemical solution.
In FIG. 1, six upper end detection units 3b1 to 3b6 are illustrated, but the number and interval of the upper end detection units 3b and the distance between the lower end detection unit 3a and the upper end detection unit 3b can be changed as appropriate. it can.
For example, the interval between the upper end detection units 3b1 to 3b6 can be about 1 mm.
For example, the distance between the lower end detection unit 3a and the upper end detection unit 3b can be appropriately set according to the amount of the chemical solution supplied to an external tank, a processing apparatus, or the like.
Further, for example, one upper end detection unit 3b can be provided, the lower end detection unit 3a on the lower side can be used for measuring the medicinal solution, and the upper end detection unit 3b on the upper side can be used for detecting an allowable limit of the amount of the chemical solution.

However, if the number of the upper end detection units 3b is increased, the measurement range of the amount of the chemical solution can be expanded. Moreover, if the space | interval of upper end detection parts 3b is narrowed, since the tolerance | permissible_range in the measurement of a chemical | medical solution will become narrow, a measurement precision can be raised.
For example, if the upper end detection unit 3b is a fiber sensor or the like, the interval between the upper end detection units 3b can be reduced.

The bubble detection unit 3c detects passage of bubbles when returning a chemical solution containing bubbles to a supply unit 101 described later.
When bubbles are detected by the bubble detection unit 3c, the chemical solution inside the measuring tube 2a can be discarded through the discharge tube 2b or returned to the supply unit 101 through the introduction unit 5. .
Note that the bubble detector 3c is not necessarily required, and may be provided as necessary.
The lower end detection unit 3a, the upper end detection unit 3b, and the bubble detection unit 3c can be, for example, a photoelectric sensor having a light projecting unit and a light receiving unit.
In this case, since the refractive index of the chemical liquid is different from the refractive index of the gas or bubbles, the refraction angle changes depending on the presence or absence of the chemical liquid or the presence or absence of bubbles.
That is, the traveling direction of the light emitted from the measuring tube 2a changes. When the traveling direction of the light emitted from the measuring tube 2a changes, the amount of light incident on the light receiving portion changes, so that the liquid level and bubbles of the chemical solution can be detected.
Note that the lower end detection unit 3a, the upper end detection unit 3b, and the bubble detection unit 3c are not limited to photoelectric sensors, and may be any devices that can detect the liquid level and bubbles of a chemical solution.

The gas supply unit 4 supplies gas from the end 2a1 of the measuring tube 2a to the inside of the measuring tube 2a.
The gas supply unit 4 can be, for example, a cylinder in which a gas having a pressure higher than atmospheric pressure is stored.
The gas stored in the gas supply unit 4 can be difficult to react with the chemical solution.
The gas stored in the gas supply unit 4 can be, for example, an inert gas such as nitrogen gas or helium gas, air, or a mixed gas containing these.

Moreover, the gas control part 4a which controls the pressure, flow volume, etc. of the gas supplied from the gas supply part 4 can be provided.
The gas control unit 4a is connected to the gas supply unit 4 via a pipe 4b1.
The gas control unit 4a is connected to the on-off valve 2g via the pipe 4b2.

The introduction unit 5 guides a chemical solution supplied from a supply unit 101 described later to the inside of the measuring tube 2a.
The introduction part 5 is provided with a first introduction pipe 5a, a second introduction pipe 5b, and an on-off valve 5c.
The first introduction tube 5a and the second introduction tube 5b are tubular.
The first introduction pipe 5a and the second introduction pipe 5b can be, for example, cylindrical pipes.

The first introduction pipe 5a has a connection part 5a1, a gas-liquid separation part 5a2, and a gas discharge part 5a3.
A connection part 5a1 is connected to one end of the gas-liquid separation part 5a2. A gas discharge part 5a3 is connected to the other end of the gas-liquid separation part 5a2.
In this case, the connection part 5a1, the gas-liquid separation part 5a2, and the gas discharge part 5a3 may be formed integrally or may be formed by joining.

One end of the connection part 5a1 is connected to the supply part 101.
Note that the connection portion 5a1 is not always necessary, and the gas-liquid separation portion 5a2 can be connected to the supply portion 101.
Further, the form of the connecting portion 5a1 is not limited to the illustrated one, and can be appropriately changed according to the positional relationship between the weighing device 1 and the supplying portion 101.

The gas-liquid separation unit 5a2 separates the chemical liquid and the gas such as bubbles.
For example, the gas-liquid separator 5a2 can be provided so as to extend in the horizontal direction.
In this way, the gas such as bubbles gathers on the upper side inside the gas-liquid separation unit 5a2, and thus the chemical solution and the gas such as bubbles can be separated.
In addition, the form of the gas-liquid separation part 5a2 is not necessarily limited to what was illustrated, and can be changed suitably. That is, the form of the gas-liquid separation part 5a2 should just be what can isolate | separate chemicals and gas, such as a bubble.

The gas discharge part 5a3 collects the separated gas and discharges it to the outside.
The gas discharge part 5a3 can be provided so as to extend upward from the gas-liquid separation part 5a2.
If it does in this way, gas, such as a bubble, will be collected by the gas discharge part 5a3 in the downstream by the flow of a chemical | medical solution. The collected gas is trapped inside the gas discharge part 5a3 extending upward.

The second introduction pipe 5b has a U-shape.
One end of the second introduction pipe 5b is connected to the lower surface of the gas-liquid separator 5a2.
In this case, the first introduction pipe 5a and the second introduction pipe 5b may be formed integrally or may be formed by joining.
If one end of the second introduction pipe 5b is connected to the lower surface of the gas-liquid separation part 5a2, the gas collected on the upper side in the gas-liquid separation part 5a2 enters the second introduction pipe 5b. Intrusion can be suppressed. If the second introduction pipe 5b having a U-shape is used, even if a gas such as a bubble enters the inside of the second introduction pipe 5b, the gas such as a bubble tends to move upward. Therefore, it is possible to suppress the flow of gas such as bubbles to the downstream side.

The on-off valve 5c is connected to the end of the gas discharge part 5a3.
The on-off valve 5c discharges the gas from the gas discharge unit 5a3 and stops the discharge (prevents foreign matter from entering the gas discharge unit 5a3).
There is no limitation in particular in the kind of on-off valve 5c, and it can determine suitably considering the tolerance (chemical resistance) with respect to the chemical | medical solution to measure.
The on-off valve 5c can be, for example, an air operated valve for chemicals.

The control unit 6 controls the operation of each element provided in the weighing device 1.
For example, the control unit 6 controls the on-off valve 2d based on the output from the detection unit 3 to supply the chemical solution via the introduction unit 5 and stop the supply. That is, the control part 6 performs the measurement operation | movement of a chemical | medical solution.
For example, the control unit 6 controls the on-off valve 2g and the gas supply unit 4 to remove bubbles in the measured chemical solution.
The control unit 6 controls the gas control unit 4a so that the gas pressure supplied to the inside of the measuring tube 2a when the on-off valve 2e is closed (when bubbles in the chemical solution are removed), and the on-off valve The pressure of the gas supplied to the inside of the measuring tube 2a when 2e is opened (when the chemical solution is discharged) is different.
In this case, the pressure of the gas supplied when the on-off valve 2e is closed is made higher than the pressure of the gas supplied when the on-off valve 2e is opened.
For example, the control unit 6 controls the on-off valve 2f to set the pressure of the gas above the measured chemical solution to a predetermined value (for example, atmospheric pressure).
For example, the control unit 6 controls the on-off valve 2e, the on-off valve 2g, and the gas supply unit 4 to discharge the measured chemical solution to the outside of the measuring tube 2a.
For example, the control unit 6 controls the on-off valve 5c to stop the discharge and discharge of the gas from the gas discharge unit 5a3.

Next, the operation of the weighing device 1 will be described.
First, the on-off valve 2d is opened, and the chemical solution is supplied into the measuring tube 2a through the introduction part 5.
At this time, the on-off valve 2f is opened simultaneously with or before the on-off valve 2d. In this way, it is possible to suppress an increase in the pressure inside the measuring tube 2a, so that the chemical solution can be supplied smoothly.
Further, by applying a predetermined pressure to the chemical solution, the chemical solution can be supplied into the measuring tube 2a.
The liquid level of the chemical solution supplied into the measuring tube 2a is detected by the lower end detection unit 3a.
When the liquid level of the chemical solution is detected by the lower end detection unit 3a, control related to measurement is started.
When the liquid level of the chemical liquid further rises and the liquid level of the chemical liquid is detected by a predetermined one of the plurality of upper end detectors 3b, the on-off valve 2d is closed and the supply of the chemical liquid is stopped. The
At this time, after closing the on-off valve 2d, the on-off valve 2f is closed.
In addition, the chemical solution can be measured without using the detection unit 3.
For example, the supply time until the liquid level is detected by the predetermined upper end detection unit 3b may be obtained in advance, and the on-off valve 2d may be closed based on the obtained supply time.
The amount of the chemical solution between the detection position by the lower end detection unit 3a and the liquid level detected by the predetermined upper end detection unit 3b is the measured amount of the chemical solution.

Here, bubbles may exist in the measured chemical solution. In this case, if air bubbles adhere to the inner wall of the measuring tube 2a, the air bubbles do not escape from the chemical solution, and the measurement accuracy may be deteriorated.
Therefore, next, the bubbles in the measured chemical solution are removed.
When removing bubbles in the chemical solution, the on-off valve 2g is opened, and a gas of a predetermined pressure (corresponding to an example of the first pressure) is supplied from the gas supply unit 4 above the measured chemical solution. The
When the gas is supplied above the chemical solution, the chemical solution inside the measuring tube 2a is pressurized, and bubbles in the chemical solution are removed so as to be crushed.
When the amount of bubbles is large, the position of the liquid level is lowered. The position of the lowered liquid level is detected by one of a plurality of upper end detectors 3b provided.
In this case, when the upper end detection unit 3b detects that the position of the liquid level is out of the predetermined range, it can be determined that the measurement is defective. In the case of measurement failure, the chemical solution inside the measurement tube 2a can be discarded or returned to the supply unit 101 via the discharge tube 2b and the on-off valve 2e.
In addition, after discarding a chemical | medical solution or returning to the supply part 101, the measurement of the chemical | medical solution mentioned above can also be performed again. Alternatively, instead of discarding or returning to the supply unit 101, the supply unit 101 can add a chemical solution and measure the chemical solution again.
When returning the chemical solution to the supply unit 101 via the introduction unit 5, the bubble detection unit 3c can detect the passage of bubbles contained in the chemical solution.

Here, the pressure of the gas above the measured chemical solution is set to a pressure at which bubbles can be removed. In addition, the pressure which can remove a bubble can be calculated | required by experiment etc.
Next, the on-off valve 2f is opened, the gas above the measured chemical solution is discharged, and the pressure of the gas above the measured chemical solution is set to a predetermined value (for example, atmospheric pressure).
That is, the pressure of the gas above the chemical solution is reduced to a predetermined value.

Next, a gas at a pressure (corresponding to an example of the second pressure) that causes the discharge rate of the chemical solution to be appropriate when the on-off valve 2f is closed and the on-off valve 2g is opened causes the gas control unit 4a. It is supplied above the measured chemical solution. Further, the on-off valve 2e is opened.
Then, the measured chemical solution in the measuring tube 2a is pushed out by the pressure of the gas from the gas supply unit 4, and is sent to the chemical solution storage unit 102 and the processing unit 103, which will be described later, through the discharge tube 2b.
Here, when the pressure of the gas above the measured chemical solution is high, when the measured chemical solution is discharged through the discharge pipe 2b, the discharge speed becomes too fast, and the chemical solution at the peripheral portion of the liquid surface May be left behind in a state of adhering to the inner wall of the measuring tube 2a. If the chemical liquid is left in a state where it adheres to the inner wall of the measuring tube 2a, the amount of the discharged chemical liquid will be insufficient.
Therefore, the pressure is set so that the discharge rate of the chemical solution is appropriate.

Next, when the liquid level of the chemical is detected by the lower end detection unit 3a, the on-off valve 2e is closed.
Here, if the detection position of the lower end detection part 3a is not above the opening 2b1 of the discharge pipe 2b, there is a possibility that the chemical solution above the on-off valve 2d is caught and discharged. When the chemical solution above the on-off valve 2d is caught and discharged, the amount of the discharged chemical solution becomes excessive.
In the present embodiment, since the detection position of the lower end detection part 3a is above the opening 2b1 of the discharge pipe 2b, the chemical liquid above the on-off valve 2d is the chemical liquid measured inside the measurement pipe 2a. It is possible to prevent the chemical solution storage unit 102 and the processing unit 103 from being sent together.
Further, not only can the amount of the chemical solution be accurately measured, it can be sent to the chemical solution storage unit 102 and the processing unit 103 in the same amount and in the same state as when the measured chemical solution was measured.

  It should be noted that the pressure suitable for removing bubbles and the pressure at which the discharge rate of the chemical solution is appropriate are affected by the viscosity of the chemical solution, the cross-sectional area of the measuring tube 2a, the properties of the inner wall of the measuring tube 2a, and the like. receive. Therefore, it is preferable to obtain these pressures in advance through experiments and simulations.

Moreover, the on-off valve 5c is opened as necessary, and the gas inside the gas discharge part 5a3 is discharged.
The on-off valve 5c can be opened and closed, for example, every predetermined time.
According to the measuring device 1 according to the present embodiment, the amount of liquid can be accurately measured.

[Second Embodiment]
FIG. 2 is a schematic diagram for illustrating the weighing system 11 according to the second embodiment.

As shown in FIG. 2, the weighing system 11 is provided with a plurality of weighing devices 1, a mixing unit 13, and a control unit 16.
In FIG. 2, in order to avoid complication, some elements provided in the weighing device 1 are omitted.

The mixing unit 13 includes a mixing container 12, a gas supply unit 14, a gas control unit 14a, an on-off valve 15a, and an on-off valve 15b.
The mixing container 12 has a tubular shape.
The mixing container 12 is provided such that one end portion 12a1 is positioned above the other end portion 12a2 in the direction of gravity. For example, the mixing container 12 can be provided upright so as to extend in the vertical direction.
In addition, although the form of the mixing container 12 is not necessarily limited to a tube shape, if it is set as the mixing container 12 which has a tubular form, stirrability can be improved.

A supply pipe 12 b 1 and a supply pipe 12 b 2 are connected to the side wall of the mixing container 12.
The end of the supply pipe 12b1 opposite to the mixing container 12 side is connected to an on-off valve 2e provided in one metering device 1. Therefore, the chemical solution weighed by one weighing device 1 can be supplied into the mixing container 12.
The end of the supply pipe 12b2 opposite to the mixing container 12 side is connected to an on-off valve 2e provided in the other measuring device 1. Therefore, the chemical solution weighed by the other weighing device 1 can be supplied into the mixing container 12.

The mixing container 12, the supply pipe 12b1, and the supply pipe 12b2 can be formed integrally or can be formed by joining.
The materials of the mixing container 12, the supply pipe 12b1, and the supply pipe 12b2 are not particularly limited as long as they have resistance (chemical resistance) to the chemical solution to be measured.

The gas supply unit 14 supplies gas to the inside of the mixing container 12 in order to discharge the chemical solution generated by mixing.
The gas supply unit 14 can be the same as the gas supply unit 4 described above. The gas supplied from the gas supply unit 14 can be the same as the gas supplied from the gas supply unit 4.
The gas control unit 14 a controls the pressure and flow rate of the gas supplied from the gas supply unit 14.
The gas control unit 14a is connected to the gas supply unit 14 via a pipe 14b1.
The gas control unit 14a is connected to the on-off valve 15a via the pipe 14b2.
The on-off valve 15 a is connected to the end 12 a 1 of the mixing container 12.
The on-off valve 15 a supplies and stops the supply of gas from the gas supply unit 14 to the inside of the mixing container 12 and prevents backflow of gas from the inside of the mixing container 12 to the gas supply unit 14.
The on-off valve 15 b is connected to the end 12 a 2 of the mixing container 12.
The on-off valve 15b discharges the chemical solution from the inside of the mixing container 12, stops the discharge, and the like.
In addition, a chemical solution storage unit 102, a processing unit 103, and the like, which will be described later, can be connected to the on-off valve 15b via a pipe 122 or the like.
The on-off valve 15a and the on-off valve 15b can be, for example, air operated valves for chemicals.

The control unit 16 controls the operation of each element provided in the plurality of weighing devices 1 and the mixing unit 13.
For example, the control unit 16 controls the on-off valve 15a, the on-off valve 15b, and the gas supply unit 14 to discharge the chemical solution from the inside of the mixing container 12 and stop the discharge.
For example, the control unit 16 controls the on-off valve 2e connected to the supply pipe 12b1 and the on-off valve 2e connected to the supply pipe 12b2 to cause the chemical liquid to be generated by dilution or mixing.

Although FIG. 2 illustrates the case where two weighing devices 1 are provided, the number of weighing devices 1 can be changed as appropriate.
In this case, the number and arrangement of the upper end detection units 3b in each of the plurality of weighing devices 1, the distance between the lower end detection unit 3a and the upper end detection unit 3b, and the like may be changed as appropriate according to the type and viscosity of the chemical solution. Can do.
For example, the distance between the lower end detection unit 3a and the upper end detection unit 3b can be appropriately set according to the amount of chemical solution supplied to the chemical solution storage unit 102, the processing unit 103, and the like, which will be described later.

When a plurality of measuring devices 1 are provided, pure water or the like can be measured by at least one measuring device 1.
That is, the chemical solution in the present specification may be a liquid, for example, a liquid containing a chemical substance or pure water for dilution.
The chemical solution can be, for example, hydrofluoric acid, ammonium fluoride, ammonia, sulfuric acid, hydrochloric acid, hydrogen peroxide, pure water for dilution, alcohol, and the like.
In this case, bubbles are easily generated in a highly volatile chemical solution such as an ammonia-based chemical solution containing ammonium fluoride or an alcohol-based chemical solution. Therefore, it is difficult to accurately measure a highly volatile chemical without variation.
According to the measuring device 1 and the measuring system 11 according to the present embodiment, even a highly volatile chemical solution can be accurately measured without variation.
Therefore, the medicinal liquids weighed can be mixed to generate a stable chemical liquid having a predetermined concentration.
For example, if pure water or the like is weighed by at least one weighing device 1, it is possible to suppress variation in concentration in the diluted chemical solution.
Moreover, when mixing two or more chemical | medical solutions, the dispersion | variation in the component ratio in the chemical | medical solution produced | generated by mixing can be suppressed.

Next, the operation of the weighing system 11 will be described.
First, in the same manner as described above, the first chemical liquid is weighed by one weighing device 1 and the second chemical liquid is weighed by the other weighing device 1.
Next, the on-off valve 2e connected to the supply pipe 12b1 and the on-off valve 2e connected to the supply pipe 12b2 are opened, and the first chemical liquid and the second chemical liquid are supplied into the mixing container 12 simultaneously or sequentially. Is done.
The first chemical liquid and the second chemical liquid are mixed inside the mixing container 12 to generate a diluted chemical liquid having a predetermined concentration and a chemical liquid having a predetermined component ratio.

Next, the on-off valve 2e connected to the supply pipe 12b1 and the on-off valve 2e connected to the supply pipe 12b2 are closed. Thereafter, the open / close valves 15a and 15b are opened, and a gas having a predetermined pressure is supplied into the mixing container 12 through the gas control unit 14a.
The diluted chemical solution in the mixing container 12 and the chemical solution generated by mixing are sent to a chemical solution storage unit 102 and a processing unit 103, which will be described later, via a pipe (not shown).

  As described above, the diluted chemical solution or the chemical solution generated by mixing can be sent to the chemical solution storage unit 102, the processing unit 103, or the like.

In addition, although the case where the chemical | medical solution used for a process was produced | generated by diluting or mixing a chemical | medical solution was illustrated above, it is not necessarily limited to this.
For example, the amount of the chemical solution supplied to the processing unit 103 or the type of the chemical solution can be changed according to the material to be processed.
In addition, when a part of the components of the chemical solution stored in the chemical solution storage unit 102 is consumed or a part of the components of the chemical solution is volatilized, the components of the chemical solution that are lost or insufficient It is also possible to measure and supply the liquid containing the chemical liquid to the chemical liquid storage unit 102.

  According to the measuring device 1 and the measuring system 11 according to the present embodiment, not only can the amount of the chemical solution be accurately measured, but also the chemical solution storage unit 102 and the processing unit 103 in the same amount and in the same state as when the measured chemical solution was measured. Can be sent to. Therefore, it is possible to suppress variation in concentration in the diluted chemical solution. Or the dispersion | variation in the component ratio in the chemical | medical solution produced | generated by mixing can be suppressed.

[Third embodiment]
Next, a processing apparatus 100 according to the third embodiment is illustrated.
FIG. 3 is a block diagram for illustrating the processing apparatus 100 according to the third embodiment.
FIG. 3 shows a case where a plurality of weighing devices 1 and a mixing unit 13 are provided, that is, a weighing system 11 is provided. The same applies when one weighing device 1 is provided.
As shown in FIG. 3, the processing apparatus 100 includes a measuring system 11, a supply unit 101, a chemical solution storage unit 102, a processing unit 103, and a control unit 106.

The supply unit 101 supplies a chemical solution to be measured to the measuring device 1.
The chemical solution can be, for example, hydrofluoric acid, ammonium fluoride, ammonia, sulfuric acid, hydrochloric acid, hydrogen peroxide, or pure water for dilution.
For example, the supply unit 101 may supply a chemical solution by pressurization with a gas, or may supply a chemical solution using a chemical pump or the like.

The chemical solution storage unit 102 stores the diluted chemical solution supplied from the weighing system 11 or the chemical solution generated by mixing.
Further, the chemical solution storage unit 102 supplies the stored chemical solution to the processing unit 103. The chemical solution storage unit 102 may supply, for example, a chemical solution by pressurizing with a gas, or may supply a chemical solution using a chemical pump or the like.

In addition, the chemical | medical solution storage part 102 is not necessarily required, The chemical | medical solution diluted by the measurement system 11 to the process part 103 or the chemical | medical solution produced | generated by mixing can also be supplied.
However, if the chemical solution storage unit 102 is provided, a diluted chemical solution or a chemical solution generated by mixing can be stably supplied to the processing unit 103.

The processing unit 103 can be an etching apparatus or a cleaning apparatus that uses a diluted chemical solution or a chemical solution generated by mixing.
In this case, the processing unit 103 includes a single wafer type device (for example, a device that supplies a chemical to a rotated processed product), a batch type device (for example, a device that immerses a plurality of processed products in the chemical), and the like. can do.
Note that a detailed description of the processing unit 103 is omitted because a known etching device, cleaning device, or the like can be used.
When the chemical solution measured by the metering device 1 and the metering system 11, the diluted chemical solution, or the chemical solution generated by mixing is used in, for example, an etching apparatus, fluctuations in the etching rate can be suppressed, and thus stable. Etching can be performed.

In addition, a recovery device (not shown) may be provided to recover the chemical solution used in the processing unit 103 and return it to the chemical solution storage unit 102 after removing metal ions and the like. That is, the chemical solution can be reused.
Further, when the chemical solution is circulated and reused, the chemical solution can be discarded depending on the deterioration state of the chemical solution, and a new chemical solution can be generated and used by the measuring device 1 and the measuring system 11.
The reference for discarding the chemical solution or generating a new chemical solution can be appropriately determined based on the time of predetermined processing, the detection result of the deterioration of the chemical solution, and the like.
In addition, a plurality of measuring devices 1 and measuring systems 11 may be installed to supply the chemical solution to the processing unit 103.

The control unit 106 controls the operation of each element provided in the processing apparatus 100.
For example, the control unit 106 controls the supply unit 101 to send the chemical solution to the measuring system 11.
For example, the control unit 106 controls the measuring system 11 to generate a diluted chemical solution or a chemical solution generated by mixing, and supplies these to the chemical solution storage unit 102.
For example, the control unit 106 controls the chemical solution storage unit 102 to supply the stored chemical solution to the processing unit 103.
For example, the control unit 106 controls the processing unit 103 to perform processing with a chemical solution on a processing object (for example, a semiconductor wafer).

[Fourth Embodiment]
Next, a weighing method according to the fourth embodiment will be exemplified.
The weighing method according to the fourth embodiment can include, for example, the following steps.
Supplying liquid to the inside of the measuring tube 2a having a tubular shape until a predetermined amount is reached.
Supplying a gas having a first pressure above the liquid in the measuring tube 2a;
Reducing the pressure of the gas above the liquid to a predetermined value.
Supplying a gas having a second pressure above the liquid in the measuring tube 2a to discharge the liquid in the measuring tube 2a;
In this case, the first pressure can be higher than the second pressure.
Moreover, the process of mixing the liquid discharged | emitted from the inside of the some measuring tube 2a can be further provided.
In addition, since the content in each process can be the same as that of what was mentioned above, detailed description is abbreviate | omitted.

The embodiment has been illustrated above. However, the present invention is not limited to these descriptions.
Regarding the above-described embodiment, those in which those skilled in the art appropriately added, deleted, or changed the design, or added the process, omitted, or changed the conditions also have the features of the present invention. As long as it is within the scope of the present invention.
For example, the shape, dimensions, material, arrangement, number, and the like of each element provided in the weighing device 1 and the weighing system 11 are not limited to those illustrated, but can be changed as appropriate.
Moreover, each element with which each embodiment mentioned above is combined can be combined as much as possible, and what combined these is also included in the scope of the present invention as long as the characteristics of the present invention are included.

  DESCRIPTION OF SYMBOLS 1 Metering device, 2 Measuring part, 2a Measuring pipe, 2b Discharge pipe, 2b1 opening part, 2c Exhaust pipe, 2c1 opening part, 2d-2g On-off valve, 3 detection part, 3a lower end detection part, 3b upper end detection part, 3b1 3b6 Upper end detection unit, 4 gas supply unit, 4a gas control unit, 5 introduction unit, 6 control unit, 11 metering system, 12 mixing container, 13 mixing unit, 14 gas supply unit, 14a gas control unit, 15a on-off valve, 16 Control unit, 100 processing device, 101 supply unit, 102 chemical solution storage unit, 103 processing unit, 106 control unit

Claims (8)

A measuring tube that is tubular and is provided such that the first end to which the gas is supplied is located above the second end to which the liquid is supplied;
An exhaust pipe connected to the metering pipe on the first end side;
A discharge pipe connected to the metering pipe on the second end side;
A first detection unit that is provided closer to the second end than the opening of the exhaust pipe that opens to the inside of the metering tube, and that detects the liquid inside the metering tube;
Provided on the second end side with respect to the first detection unit and on the first end side with respect to the opening portion of the discharge pipe that opens to the inside of the measurement pipe; A second detection unit for detecting the liquid inside,
A gas control unit for controlling the pressure of the gas supplied from the first end to the inside of the measuring tube;
A first on-off valve provided at an end of the exhaust pipe opposite to the measuring pipe;
A second on-off valve provided at an end of the discharge pipe opposite to the measuring pipe side;
Weighing device equipped with. A control unit for controlling the gas control unit, the first on-off valve, and the second on-off valve;
The control unit controls the gas control unit to supply a first pressure of the gas supplied to the inside of the measuring pipe when the second on-off valve is closed, and the second on-off valve. The metering device according to claim 1, wherein a second pressure of the gas supplied to the inside of the metering pipe when the is opened is different.   The metering device according to claim 2, wherein the first pressure is higher than the second pressure. A plurality of weighing devices according to any one of claims 1 to 3,
A mixing section for mixing liquids discharged from the plurality of weighing devices;
With weighing system. A weighing device according to any one of claims 1 to 3, or a weighing system according to claim 4,
A processing unit for processing a processed object using the liquid discharged from the weighing device or the weighing system;
A processing apparatus comprising: Supplying a liquid to a predetermined amount inside a tubular measuring tube;
Supplying a gas at a first pressure above the liquid inside the metering tube;
Reducing the pressure of the gas above the liquid to a predetermined value;
Supplying a gas at a second pressure above the liquid inside the metering tube and discharging the liquid inside the metering tube;
Weighing method with.   The measuring method according to claim 6, wherein the first pressure is higher than the second pressure.   The measuring method according to claim 6 or 7, further comprising a step of mixing liquid discharged from the inside of the plurality of measuring tubes.

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