JP2016080450A - Block slit device and x-ray scattering measurement device having the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a block slit device with which it is possible to even more reduce the effect of scattering light on the block surface of an incident block.SOLUTION: A block slit device 100 has an incident-side block 2 having a block surface, an incident-side slit 3 disposed facing the block surface, and an emission-side block 4. The emission-side block 4 has two adjacent faces, i.e., a face A and a face B, and a ridge line 41 formed by the face A and face B exists in a plane S that includes the block surface. Furthermore, the formulas (1) and (2) below are satisfied. θ<α formula (1) 0°<β formula (2) (In formula (1), α denotes an angle (°) formed by a plane T, which includes an edge facing the incident-side block 2 of the incident-side slit 3 and the ridge line 41, and the face A, and θdenotes the total reflection critical angle (°) of incident X-rays at the face A. In formula (2), β denotes an angle (°) formed by a plane S and the face B.)SELECTED DRAWING: Figure 1

Description

  The present invention relates to a block slit apparatus that can be used in an optical system of an X-ray scattering apparatus, and an X-ray scattering measurement apparatus using the block slit apparatus, and more particularly to an X-ray small angle scattering measurement apparatus.

  The X-ray small angle scattering method is a method of irradiating a substance with X-rays and measuring scattering appearing in a scattering angle region of approximately 5 ° or less. According to the X-ray small angle scattering method, information reflecting the internal structure of about 2 nm to 100 nm in the sample can be obtained. Therefore, the X-ray small angle scattering method can be used for examining the size and shape of particles and phase separation structures contained in the sample, the structure of the surface and interface, the long-period structure found in crystals such as proteins, and the like.

  In the X-ray small angle scattering method, it is required to reduce the divergence angle of incident X-rays in order to obtain high angular resolution. As an optical system for reducing the divergence angle of incident X-rays, slit devices such as a block slit camera (block slit device), a bones heart camera, and a three slit camera are used (Non-Patent Document 1).

  Among these, the block slit device is characterized in that an X-ray bundle having a strong X-ray intensity can be obtained while the size of the device is compact. Therefore, it is often used in a relatively small X-ray scattering apparatus using, for example, a tube as an X-ray source.

  In FIG. 7, the structural example of the conventional general block slit apparatus 700 is shown. A conventional block slit device 700 includes an incident block 72, an incident slit 73, and an output block 74. The incident block 72 is disposed between the X-ray source 71 and the sample position 75. The entrance slit 73 is arranged at a desired interval at a position facing the block surface of the entrance block 72.

  The X-ray beam emitted from the X-ray source 71 is cut out by the block surface of the incident block 72 and the incident slit 73. The divergence angle of the X-ray flux is determined by the distance between the block surface of the incident block 72 and the incident slit 73. Further, a block-like exit block 74 is arranged on the downstream side of the X-ray of the entrance block 72. At this time, the block surface of the emission block 74 is arranged so as to be on the same plane as the block surface of the incident block 72. The emission block 74 suppresses the influence of scattered light from the block surface of the incident block 72 on the X-ray bundle that has passed through the block slit device.

Journal of the Crystallographic Society of Japan Volume 41 Issue 4 (1999) 227

  In the conventional block slit apparatus, the exit block and the block surface of the entrance block are arranged on the same plane so that the exit block does not affect the X-ray bundle itself cut out by the entrance block and the entrance slit. Therefore, in order to suppress the influence of the scattered light on the block surface of the incident block, it is important that these block surfaces are smoothed by the output block and are arranged with high accuracy without a positional deviation error.

  However, in practice, the block surfaces of the entrance block and the exit block often have misalignment errors, rough surface shapes that are not smooth, and surface shape errors. In that case, a part of the X-rays scattered on the block surface of the incident block enters the block surface of the output block at a very shallow angle. Scattered light that has entered the block surface of the output block at a very shallow angle is totally reflected by the block surface of the output block and passes through the slit device. As a result, there is a problem that the width of the X-ray bundle that has passed through the slit device is widened due to the influence of scattered light on the block surface of the incident block.

  Therefore, an object of the present invention is to provide a block slit device that can further reduce the influence of scattered light on the block surface of an incident block.

The block slit device of the present invention is a block slit device having an incident side block having a block surface, an incident side slit disposed to face the block surface, and an output side block. A ridge line formed by the surface A and the surface B has a surface A close to the incident side block, and a surface B adjacent to the surface A and farther from the incident side block than the surface A. A block slitting device that exists on a plane S including the block surface and satisfies the following formulas (1) and (2).
θ _A <α Formula (1)
0 ° <β Formula (2)
(In the formula (1), α represents an angle (°) formed by the plane A and the plane T including the end facing the incident side block of the incident side slit and the ridge line, and θ _A is Indicates the critical angle (°) of total reflection of incident X-rays on the surface A. Also, in the equation (2), β indicates the angle (°) formed by the plane S and the surface B.)

  ADVANTAGE OF THE INVENTION According to this invention, the block slit apparatus which can reduce more the influence of the scattered light in the block surface of an incident block can be provided.

It is a schematic diagram which shows the structure of the block slit apparatus which concerns on this invention. It is a schematic diagram which shows the structure of a block slit apparatus in case (beta) of an output block is 90 degrees. 1 is a schematic diagram illustrating a configuration of a reflective X-ray small angle scattering measurement apparatus according to Example 1. FIG. 3 is a graph showing the result of measuring the X-ray reflectivity using the reflective X-ray small angle scattering measurement apparatus of Example 1. FIG. It is a graph of the result of having measured X-ray reflectivity using the reflection type X-ray small angle scattering measuring apparatus of a comparative example. It is a schematic diagram of the transmission X-ray small angle scattering measuring apparatus using the block slit apparatus which concerns on this invention. It is a schematic diagram which shows the structure of the conventional block slit apparatus.

  Hereinafter, embodiments of the present invention will be described in detail.

  FIG. 1A is a schematic diagram of an X-ray scattering measurement apparatus having a block slit apparatus 100 according to the present embodiment. The slit device 100 according to the present embodiment includes an incident block (incident side block) 2, an incident slit (incident side slit) 3, and an output block (exit side block) 4. The slit device 100 is a device that forms the X-ray bundle 6 by disposing the slit device 100 between the X-ray source 1 and the sample 5 and allowing X-rays emitted from the X-ray source 1 to pass therethrough.

  The incident block 2 is a block for cutting out X-rays emitted from the X-ray source 1. The incident block 2 is a block having at least one smooth block surface. The incident block 2 is a block made of a material that does not transmit X-rays, and X-rays can be cut out by the block surface of the incident block 2. As long as the incident block 2 is a block having at least one smooth block surface, the material and shape thereof are not particularly limited.

  For example, the incident block 2 may be a block having a plurality of block surfaces. For example, a so-called U-slit member that has a short plane portion at the end on the X-ray source 1 side and the end on the sample 5 side, and these two planes exist on the same plane. It may be.

  The entrance slit 3 is disposed to face the block surface of the entrance block 2. A slit (gap-shaped opening) is formed by providing a predetermined interval between the block surface of the incident block 2 and the incident slit. That is, the entrance slit 3 is an interval regulating member that regulates the interval between the slits. The X-rays emitted from the X-ray source 1 are cut out by this slit, and the X-ray bundle 6 is formed.

  The divergence angle of the X-ray bundle 6 that has passed through the slit device 100 is determined by the distance between the block surface of the entrance block 2 and the entrance slit 3. The distance between the block surface of the entrance block 2 and the entrance slit 3 is preferably adjusted so that the divergence angle of the X-ray bundle 6 that has passed through the slit device 100 is about 0.1 ° or less. By reducing the width of the X-ray bundle 6 in this way, for example, when the block slit device 100 is used in a small-angle X-ray scattering measurement device, measurement with higher angular resolution becomes possible.

  The exit block 4 is a block for limiting the scattered light generated on the block surface of the entrance block 2. The exit block 4 is disposed on the opposite side of the X-ray source 1 with respect to the positions where the entrance block 2 and the entrance slit 3 are disposed. That is, the emission block 4 is arranged on the downstream side of the X-rays emitted from the X-ray source 1 with respect to the incident block 2 and the incident slit 3.

  The exit block 4 according to the present embodiment is a surface on the incident side (X-ray source 1 side) that is inclined from the surface S (described later) toward the 11 direction, and on the exit side (sample 5 side). It is a block having at least two surfaces of a surface B which is a surface and is inclined from the surface S toward the 11 direction. The surface A and the surface B are smooth surfaces like the block surface of the incident block 2, and the surface A and the surface B are adjacent surfaces. The emission block 4 has a ridge line 41 formed by the surface A and the surface B. The output block 4 is arranged so that the ridge line 41 formed by the surfaces A and B is on the plane S including the block surface of the incident block 2. Thereby, the scattered light generated on the block surface of the entrance block 2 by the exit block 4 can be suppressed without the exit block 4 blocking the X-ray bundle 6 formed by the block surface of the entrance block 2 and the entrance slit 3. .

  In the present embodiment, the angle α between the plane T that is a plane including the tip of the incident slit 3 on the X-ray source 1 side and the ridge line 41 of the output block 4 and the surface A (incident side inclined block surface) is: It is larger than the total reflection critical angle of incident X-rays on the surface A.

That is, the emission block 4 according to the present embodiment satisfies the following formula (1).
θ _A <α Formula (1)
Since the block 4 has the surface A inclined toward the X-ray source 1 in this way, even if scattered light scattered on the block surface of the incident block 2 is incident on the surface A of the output block 4, Reflected in the direction of a relatively large angle with respect to the optical axis. Therefore, the influence on the X-ray beam 6 by the scattered light on the block surface of the incident block 2 can be reduced.

Furthermore, it is possible to reduce the reflection intensity of X-rays incident on the surface A by greater than the total reflection critical angle theta _A of the incident X-rays the angle α in the plane A. Thereby, the influence of the scattered light on the block surface of the incident block 2 on the X-ray bundle 6 can be further reduced. In addition, when the X-ray beam 6 is used at a wide angle on the 12 side in FIG. 1, it is preferable to increase the angle α. Thereby, the influence on the X-ray bundle 6 of the scattered light in the block surface of the incident block 2 can further be suppressed.

Table (1) shows the relationship between the type of material constituting the surface A and the total reflection critical angle θ _A when CuKα rays are used as X-rays.

  From Table (1), the total reflection critical angle when CuKα ray (λ = 0.154 nm) is used as the X-ray is the largest when platinum is used, and is approximately 0.6 ° or less. It can be seen that it is. Since the total reflection critical angle is proportional to the wavelength, the total reflection critical angle becomes smaller when X-rays having a shorter wavelength such as MoKα rays (λ = 0.071 nm) are used. For this reason, the angle α is preferably larger than 0.6 °, more preferably larger than 1 °. Thereby, when the most common CuKα ray or MoKα ray is used as the incident X-ray, the influence of the scattered light on the X-ray flux 6 on the block surface of the incident block 2 can be reduced.

When a longer wavelength X-ray such as CrKα ray (λ = 0.229 nm) is used, the total reflection critical angle becomes larger. When an X-ray tube which is a general X-ray source is used as the X-ray source 1, the wavelength of the X-ray is approximately 0.05 nm to 0.3 nm. When the material constituting the surface A is platinum, the following relationship is generally established between the X-ray total reflection critical angle θcrit (°) in this wavelength region and the incident X-ray wavelength λ (nm). is there.
θcrit = 3.8λ Equation (6)
Therefore, the angle α depends on the wavelength λ of the X-ray used.
α> 3.8λ
It is preferable to make the angle satisfying.

  Further, in the present embodiment, the surface between the surface 5 on the sample 5 (outgoing side) of the exit block, which is inclined from the surface S toward the 11 direction, and the plane S including the block surface of the entrance block 2. The angle β is greater than 0 °. That is, the surface B of the emission block 4 is not in the same plane as the plane S and is not orthogonal to the plane B.

That is, the emission block 4 according to the present embodiment satisfies the following formula (2).
0 ° <β Formula (2)
When the angle β is 0 °, since the surface B is arranged on the plane S, the X-rays scattered by the block surface of the incident block 2 are totally reflected by the surface B, and the beam shape of the X-ray bundle 6 is asymmetric. It will become. Therefore, the output block 4 according to the present embodiment suppresses the X-rays scattered by the block surface of the incident block 2 from being reflected by the surface B by making the angle β larger than 0 °. Thereby, the influence on the X-ray bundle 6 of the scattered light in the block surface of the incident block 2 can further be suppressed.

  FIG. 2 is a view showing the slit device 100 in the case of using the emission block 24 in which the angle β of the emission block is 90 °. At this time, when X-rays scattered on the block surface of the incident block 2 enter the vicinity of the ridgeline of the output block 24, the thickness of the output block 24 in the vicinity of the ridgeline in the traveling direction of the X-ray is small, so End up. As a result, the X-rays that have passed through the emission block 24 affect the X-ray bundle 6 and have a distribution with a tail on the emission block 24 side (11 direction) as in the X-ray intensity distribution 27 shown in FIG. That is, the beam shape of the X-ray bundle 6 spreads and becomes an asymmetric shape.

  Therefore, the exit block 4 according to the present embodiment suppresses the transmission of the X-rays scattered by the block surface of the entrance block 2 through the vicinity of the ridge line 41 of the exit block 4 by making the angle β smaller than 90 °. . Thereby, the influence on the X-ray bundle 6 of the scattered light in the block surface of the incident block 2 can further be suppressed.

  Furthermore, as shown in FIG. 1B, when the angle formed between the surface A and the surface B is an angle γ, the angle γ is preferably larger. By increasing the angle γ, it is possible to suppress transmission of X-rays in the vicinity of the ridge line 41 of the emission block 4. The angle γ is preferably set to an angle at which the X-rays can be sufficiently shielded in consideration of the transmittance, which is the ratio at which the X-rays used pass through the material constituting the emission block 4. The sum of the angle α and the angle β is preferably smaller than 10 °. The angle γ is a value obtained by subtracting the total value of the angle α, the angle β, and the angle formed by the plane S and the plane T from 180 °. Therefore, by reducing the sum of the angle α and the angle β, the angle γ can be increased, and transmission of X-rays in the vicinity of the ridge line 41 of the emission block 4 can be suppressed.

Further, the angle β is preferably larger than the critical angle θ _B of total reflection of incident X-rays on the surface B, similarly to the incident side (angle α). That is, it is preferable to satisfy the following formula (3).
θ _B <β Equation (3)
Thereby, even when X-rays scattered on the block surface of the incident block 2 enter the surface B, total reflection on the surface B can be prevented, and the intensity of the X-ray reflected on the surface B can be reduced. it can. Therefore, the influence on the X-ray beam 6 by the scattered light on the block surface of the incident block 2 can be reduced. Similarly to the angle α, the angle β is preferably larger than 0.6 °, more preferably larger than 1 °.

  When the X-ray scattering slit device 100 according to the present embodiment is used in an X-ray small angle scattering measurement device, it is necessary to limit the divergence angle of the X-ray bundle 6 to be very small in order to perform measurement in an extremely small scattering angle region. is there. Therefore, it is preferable that the entrance block 2, the entrance slit 3, and the exit slit 4 are produced and arranged with high accuracy. In particular, it is preferable that the block surface of the entrance block 2 and the surfaces A and B of the exit block 4 are smooth, and the tip of the entrance slit 3 and the like are manufactured with high accuracy. In general, materials that can be easily processed and can be preferably used for members of the X-ray slitting apparatus include alloys and glass materials that can be processed with high accuracy, such as stainless steel.

  Although it is possible to form the surface A and the surface B from different materials, it is preferable to form the surfaces A and B from the same material from the viewpoint of ease of processing the output block 4 and cost. Note that the surface A and the surface B of the emission block 4 may be coated with a material different from the material constituting the emission block 4 by plating, sputtering, or the like.

  In FIG. 1A, the intensity distribution 7 of the X-ray bundle 6 at the position of the sample 5 is determined by the size of the incident block 2 and the positional relationship between the incident block 2, the incident slit 3, and the exit block 4. It is preferable that the X-ray intensity distribution 7 has a symmetric shape (a shape symmetric between the 11 side and the 12 side in FIG. 1). By making the X-ray intensity distribution 7 symmetrical, that is, the beam shape of the X-ray bundle 6 is symmetrical, for example, when the slit device 100 is used in an X-ray scattering measurement device, the angular resolution of the X-ray scattering measurement Can be improved.

The length of the block surface of the entrance block 2 is L _b , the distance from the end of the block surface of the entrance block 2 on the exit block 4 side to the ridge line 41 of the exit block 4 is L ₁ , and the ridge line 41 of the exit block 4 to the sample 5 the distance between the _{L 2.}

  At this time, in order to set the ratio of the area on the 11 side and the area on the 12 side to 1: 2 to 2: 1 with respect to the vertex in FIG. Should be satisfied. As a result, the X-ray intensity distribution 7 can be formed into a substantially symmetrical shape. For example, when the slit device 100 is used in an X-ray scattering measurement device, the angular resolution of X-ray scattering measurement can be improved. Become.

Further, in order to make the intensity distribution 7 of the X-ray bundle 6 at the position of the sample 5 symmetrical, the following equation (5) may be satisfied.
_{L 2 (L b -L 1)} = L 1 (L b + L 1) (5)
Therefore, in order to make the X-ray intensity distribution 7 substantially symmetric, in the above formula (5), the entrance block 2, the entrance slit 3, and the exit block 4 are arranged so that the left side and the right side are substantially equal. good. Here, “substantially equal” means that the left side is 90% to 110% of the right side.

When L _b = L ₁ , the X-ray intensity distribution 7 has a symmetrical shape regardless of the value of L ₂ . Accordingly, incident block 2 as L _b and L ₁ is approximately equal, the entrance slit 3, by arranging the emitting block 4, the X-ray intensity distribution 7 regardless of the position of the sample 5 substantially symmetrical shapes be able to.

  Specific examples according to the present invention will be described.

Example 1
A first embodiment according to the present invention will be described with reference to FIGS.

  A block slit device 100 was fabricated using the stainless steel entrance block 2, entrance slit 3 and exit block 4. The length (Lb) in the X-ray traveling direction of the block surface of the incident block 2 was set to 100 mm, and the incident slit 3 was disposed opposite to the block surface of the incident block 2 with an interval of 170 μm. The exit block 4 is arranged so that the ridge line 41 of the exit block 4 is located at a position of 100 mm from the downstream end of the X-ray on the block surface of the entrance block 2. At this time, the output block 4 is arranged so that the ridge line 41 is on the surface S including the block surface of the incident block 2.

In the emission block 4, the incident side inclination angle α shown in FIG. 1B is 1 °, and the emission side inclination angle β is 5 °. In addition, the total reflection critical angle (θ _A , θ _B ) of stainless steel with respect to the CuKα line (8.048 keV) is about 0.4 °. That is, in this embodiment, both α and β are set to angles sufficiently larger than the total reflection critical angle on each surface.

  The block slit apparatus 100 according to the present embodiment is applied to a reflection type X-ray small angle scattering measurement apparatus as shown in FIG. The block slit device 100 according to the present embodiment is arranged on the optical path of the X-ray flux emitted from the X-ray source 1 to obtain the X-ray flux 6 having a divergence angle of about 0.05 °. The X-ray bundle 6 was incident on a sample 11 held on a sample holder (not shown). While changing the incident angle of the X-ray bundle 6 with respect to the sample 11, the intensity of the X-ray reflected by the sample 11 was measured using a scintillation counter (not shown) which is an X-ray detector disposed at the detector position 8. As the sample 11, a chrome film having a thickness of 5 nm was formed on a smooth polished quartz substrate, and a gold film having a thickness of 100 nm was further formed thereon.

  FIG. 4 shows the measurement results. In FIG. 4, the horizontal axis represents the incident angle of the X-ray bundle 6 with respect to the sample 11, and the vertical axis represents the X-ray reflectivity obtained by dividing the detected reflected X-ray intensity by the incident X-ray intensity. In FIG. 7, the solid line is the measured value, and the X-ray reflectivity gradually decreased as the incident angle increased from around 0 ° to around 1 °. On the low angle side near 0 °, X-rays are totally reflected on the gold layer on the outermost surface of the sample 11, but when the total reflection critical angle of gold with respect to CuKα rays exceeds 0.55 °, the X-ray reflectivity gradually increases. It will drop to.

  Next, the relationship between the X-ray incident angle and the X-ray reflectivity in this example was estimated by calculation. The theoretical value 1 indicated by a broken line in FIG. 4 is a theoretical calculation value when it is assumed that the density of the gold layer of the sample 11 is maximum (bulk value) and there is no surface roughness (surface roughness is 0 nm). The theoretical value 1 indicates an ideal reflectance, and the actual sample 11 has roughness on the surface, and the density of the gold layer is usually lower than the bulk value. Less than 1. Actually, the actual measurement value obtained in this example was smaller than the theoretical value 1.

  Also, the theoretical value 2 indicated by the one-dot chain line in FIG. 4 is a theoretical calculation value when the density of the gold layer of the sample 11 is assumed to be 94% of the bulk value and the surface roughness is 0.5 nm. The X-ray reflectivity obtained at the theoretical value 2 was lower than the theoretical value 1 and was found to be almost coincident with the actual measurement value. The density and surface roughness of the gold film actually formed on the sample 11 were almost the same as the values assumed in the theoretical value 2.

  By using an X-ray small angle scattering measurement device using the block slit device 100 according to this example, it was possible to obtain a measurement result almost the same as the theoretical calculation result.

(Comparative example)
As a comparative example, a case where a conventional block slit device 700 (FIG. 7) is used in place of the block slit device 100 in the reflective X-ray small angle scattering measurement apparatus in the first embodiment will be described. FIG. 5 shows the result of measuring the X-ray reflectivity of the sample 11 by changing the X-ray incident angle in the same manner as in Example 1 using the reflective X-ray small angle scattering measurement apparatus of the comparative example.

  In FIG. 5, the theoretical value 1 is a theoretical calculation value when the density of the gold layer of the sample 11 is assumed to be a bulk value and the surface roughness is 0 nm, as in the case of Example 1. The theoretical value 1 indicates an ideal reflectance, and the actual sample 11 has roughness on the surface, and the density of the gold layer is usually lower than the bulk value. Less than 1. However, in the comparative example, the measured value was larger than the theoretical value 1 from around 0 ° to around 1.3 °.

  It is considered that this is because the scattered light on the block surface of the incident block 22 affects the X-ray bundle 26 that has passed through the block slit device 700 and the width of the X-ray bundle 26 is widened. Therefore, the intensity of the reflected X-ray is higher than the original intensity, particularly on the low angle side.

  On the other hand, in Example 1, an actual measurement result almost the same as the theoretical calculation value could be obtained. From this, it can be seen that by using the block slitting apparatus 100 according to the present invention, an X-ray bundle having a narrower width than that of the comparative example could be formed. That is, the block slit apparatus 100 according to the present invention was able to form an X-ray bundle in which the influence of scattered light on the block surface of the incident block was reduced.

(Example 2)
As a second embodiment of the present invention, FIG. 6 shows a case where the block slit device 100 of the first embodiment is applied to a transmission type X-ray scattering measurement device. In this example, the sample 18 was arranged at a position 720 mm from the ridge line 41 of the emission block 4.

  The X-ray bundle 6 that passed through the block slit device 100 was incident on a sample 18 that was a sample for transmission measurement. The X-ray beam 6 incident on the sample 18 is scattered by the internal structure of the sample 18 and forms an X-ray intensity distribution 19 reflecting the internal structure of the sample 18 at the detector position 8. By detecting a detector such as a CCD or a scintillation counter at the detector position 8, an X-ray scattering spectrum was obtained.

  As a result, the obtained X-ray scattering spectrum had a symmetrical shape (X-ray intensity distribution 19) with the center of the optical path of the X-ray bundle 6 as the center.

  In the conventional block slit device 700, even if the sizes and positional relationships of the entrance block 22 and the exit block 24 are set appropriately, a symmetrical intensity distribution X-ray flux is generated due to the influence of scattered light on the block surface of the entrance block 22. It was difficult to get.

  However, by using the block slit device 100 according to the present invention, the influence of the scattered light on the block surface of the incident block 2 on the X-ray flux 6 could be reduced. Thereby, the X-ray intensity distribution 7 having a substantially symmetrical shape on the sample 18 could be obtained. As a result, the X-ray intensity distribution 19 of scattered X-rays from the sample 18 also has a symmetric shape with the optical path center of the X-ray bundle 6 as the center. Therefore, measurement can be performed on both sides (11 direction and 12 direction in FIG. 6) across the center of the optical path of the X-ray bundle 6. Thereby, the scattered X-ray distribution can be measured with good S / N by using the block slit 100 according to the present invention. Further, when the sample 18 is a sample having an orientation in the internal structure, it is possible to evaluate the orientation.

  The block slit apparatus according to the present invention obtains an X-ray flux that is less affected by scattered light in addition to the feature that a small apparatus that is a feature of the block slit apparatus can obtain an X-ray bundle having a relatively strong intensity and a small divergence angle. It becomes possible. Therefore, by using the block slit apparatus according to the present invention in an X-ray small angle scattering measuring apparatus using an X-ray tube or the like as an X-ray source, for example, highly accurate measurement can be performed. The block slit apparatus according to the present invention can be suitably used not only for qualitative measurement but also for quantitative measurement. The block slit apparatus according to the present invention can be applied not only to an X-ray small angle scattering measuring apparatus but also to a measuring apparatus using other X-ray optical systems such as an X-ray microscope and a fluorescent X-ray measuring apparatus. is there.

2 entrance block 3 entrance slit 4 exit block A, B block surface of exit block 4 100 slitting device

Claims (11)

An incident side block having a block surface;
An incident-side slit disposed to face the block surface;
In the block slit device having the emission side block,
The exit side block has a surface A close to the entrance side block, and a surface B adjacent to the surface A and farther from the entrance side block than the surface A,
A ridge formed by the surface A and the surface B exists on the plane S including the block surface,
The block slit apparatus characterized by satisfy | filling following formula (1) and (2).
θ _A <α Formula (1)
0 ° <β Formula (2)
(In the formula (1), α represents an angle (°) formed by the plane A and the plane T including the end facing the incident side block of the incident side slit and the ridge line, and θ _A is Indicates the critical angle (°) of total reflection of incident X-rays on the surface A. Also, in the equation (2), β indicates the angle (°) formed by the plane S and the surface B.) Furthermore, the following formula (3) is satisfy | filled, The block slit apparatus of Claim 1 characterized by the above-mentioned.
θ _B <β Equation (3)
(However, in Formula (3), θ _B represents the total reflection critical angle (°) of the X-ray on the surface B.)   The block slit apparatus according to claim 1 or 2, wherein the sum of α and β is smaller than 10 °. Furthermore, following formula (6) is satisfy | filled, The block slit apparatus as described in any one of Claim 1 thru | or 3 characterized by the above-mentioned.
α> 3.8λ Equation (6)
(However, in formula (6), λ represents the wavelength (nm) of incident X-rays.)   The block slit device according to any one of claims 1 to 3, wherein α is larger than 0.6 °.   The block slit device according to any one of claims 1 to 5, wherein a divergence angle of the X-ray bundle that has passed through the block slit device is smaller than 0.1 °.   7. The block slit device according to claim 1, wherein the incident side block includes a plurality of the block surfaces on the plane S. 8.   The block slit device according to any one of claims 1 to 7, wherein the material constituting the surface A and the material constituting the surface B are the same material.   An X-ray scattering measurement apparatus comprising: the block slit device according to claim 1; an X-ray source; a holding unit that holds a sample; and an X-ray detector. The X-ray scattering measurement apparatus according to claim 9, further satisfying the following formula (4).

(However, Lb indicates the length of the block surface, L1 indicates the distance between the ridge line and the block surface, and L2 indicates the distance between the ridge line and the sample.)   The X-ray scattering measurement apparatus according to claim 9, wherein the X-ray detector detects light reflected from the sample held by the sample holding unit.

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