JP2016072416A - Drawing device and drawing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a drawing technology capable of preventing jaggy from being generated, or reducing jaggy.SOLUTION: A plurality of selected graphic elements are classified into a plurality of line segment groups in accordance with angular characteristics (steps ST11 and ST12). After partial drawing data are generated for each of the plurality of line segment groups, data are rotated in such a manner that a main line segment direction is matched with a scan direction (Y direction) of a wafer W for each of the line segment groups, and RIP processing is performed on the partial drawing data. In a drawing step, a wafer rotation step of rotating the wafer W just at the same angle as the partial drawing data and a unit drawing step of performing plotting processing based on the partial drawing data on the rotated wafer W are executed successively for each of the line segment groups. As a result, an oblique line is prevented from being drawn by drawing only line segments in the Y direction in the drawing step, and jaggy is prevented from being generated.SELECTED DRAWING: Figure 5

Description

  The present invention relates to a drawing apparatus and a drawing method for drawing a planar pattern having a plurality of graphic elements on a main surface of a substrate.

  There is known a direct drawing technique for drawing a desired exposure pattern on the main surface by spatially modulating light emitted from a light source and irradiating the main surface of the substrate to which the modulated light is conveyed.

  For example, in the direct drawing apparatus described in Patent Document 1, while the substrate is transported along the first direction, spatial modulation is performed along the second direction orthogonal to the first direction on the upper surface of the transported substrate. Irradiate light. As a result, a two-dimensional pattern is drawn on the upper surface of the substrate with specific drawing pixels arranged in the first and second directions. In addition, this spatial modulation is realized by applying a voltage to a plurality of GLV elements arranged in a row, so that a plurality of movable ribbons are finely operated.

  For this reason, in the first direction, a minimum length is required to switch ON / OFF of the light irradiation from the relationship between the substrate conveyance speed and the movable ribbon operation speed. More specifically, in the first direction, it is necessary to continuously turn on light irradiation for at least a specific distance, or to turn off light irradiation for at least a specific distance, and light irradiation at a distance interval less than the specific distance. Cannot be switched on / off.

JP 2014-011264 A

  As a result, in the pattern drawn on the upper surface of the substrate W to be transported, a portion that does not follow the first direction or the second direction (a portion corresponding to an oblique line) has a backlash (also referred to as “jaggy”). End up. In the case of drawing a pattern requiring a high resolution or a thin line pattern having a small line width, the influence of jaggies is particularly problematic.

  The present invention has been made to solve these problems, and an object of the present invention is to provide a drawing apparatus and a drawing method capable of preventing or reducing jaggies.

  In order to solve the above problems, a drawing apparatus according to a first aspect of the present invention is a drawing apparatus that draws a planar pattern having a plurality of graphic elements on a main surface of a substrate, and holds the substrate. A holding unit, a rotating unit that rotates the substrate held by the holding unit around an axis orthogonal to the main surface, and the substrate held by the holding unit in a first direction parallel to the main surface. A drawing unit that spatially modulates light emitted from a light source and a light source emitted from a light source, and irradiates the modulated light to a region extending in a second direction perpendicular to the first direction within the plane along the main surface A data processing unit that performs data processing on design data including the pattern, and the data processing unit selects at least two line segments from the plurality of graphic elements; and Adapt at least two line segments to the angle characteristics of each line segment A classifying unit for classifying into two or more line segment groups, a partial drawing data generating unit for generating two or more partial drawing data corresponding to each of the two or more line segment groups, and the two or more line segment groups A data rotation unit configured to rotate the partial drawing data corresponding to the line segment group around the axis so that a main line segment direction of the line segment group matches the first direction. For each of the line segment groups, the substrate is rotated around the axis by the rotating unit so that the line segment direction of the line segment group drawn on the main surface is coincident with the first direction. A drawing process based on the partial drawing data is performed while the substrate is transported in the first direction.

  The drawing apparatus according to the second aspect of the present invention is the drawing apparatus according to the first aspect of the present invention, wherein each of the declination angles on the two-dimensional polar coordinates parallel to the principal surface has a finite angular width. A plurality of angle segments are defined, and the classification unit classifies a plurality of line segments belonging to the same angle segment into the same line segment group.

  A drawing apparatus according to a third aspect of the present invention is the drawing apparatus according to the first aspect or the second aspect of the present invention, wherein the classification unit converts a plurality of line segments orthogonal to each other into the same line segment. It is characterized by classifying into groups.

  A drawing apparatus according to a fourth aspect of the present invention is the drawing apparatus according to any one of the first to third aspects of the present invention, wherein the drawing processing includes the drawing element among the plurality of graphic elements. An anti-aliasing process is provided as a process executed for a graphic element having a portion extending in a direction that does not match one direction.

  A drawing apparatus according to a fifth aspect of the present invention is the drawing apparatus according to any one of the first to fourth aspects of the present invention, wherein the drawing processing includes the first of the plurality of graphic elements. An overwriting process is performed as a process executed for a graphic element having a portion extending in a direction that does not match one direction, and the overwriting process is offset by a specific amount in the second direction and has an overlapping part. A plurality of partial drawing data is generated, and the light amount of the light source is divided for each of the plurality of partial drawing data to sequentially perform drawing processing.

  A drawing apparatus according to a sixth aspect of the present invention is the drawing apparatus according to any one of the first to fifth aspects of the present invention, wherein the resolution condition and line width condition required in the drawing process are set. An input unit that receives an operation input of condition specifying information to be specified, wherein the selecting unit specifies the at least two line segments with reference to the condition specifying information, and selects the at least two line segments. Features.

  A drawing apparatus according to a seventh aspect of the present invention is the drawing apparatus according to any one of the first to fifth aspects of the present invention, and directly specifies each of the at least two line segments. An input unit that receives an operation input of line segment identification information, wherein the selection unit selects the at least two line segments according to the line segment identification information.

  A drawing apparatus according to an eighth aspect of the present invention is the drawing apparatus according to any one of the first to seventh aspects of the present invention, wherein spatial modulation is performed using a GLV (Grating Light Valve) element. It is characterized by being.

  A drawing apparatus according to a ninth aspect of the present invention is the drawing apparatus according to any one of the first to eighth aspects of the present invention, wherein the pattern is planar and has at least two different angles. It is a circuit pattern having a line segment.

  A drawing method according to a tenth aspect of the present invention is a drawing method for drawing a planar pattern having a plurality of graphic elements on a main surface of a substrate, wherein at least two line segments are selected from the plurality of graphic elements. A selection step of selecting, a classification step of classifying the at least two line segments into two or more line segment groups according to the angle characteristics of each line segment, and the two or more lines based on the design data including the pattern A partial drawing data generation step for generating two or more partial drawing data corresponding to each of the segment groups, and for each of the two or more line segment groups, the main line segment direction of the line segment group matches the first direction. A data rotation step of rotating the partial drawing data corresponding to the line segment group around an axis orthogonal to the main surface, spatially modulating the light emitted from the light source, and applying the modulated light to the main surface A drawing step of irradiating a region extending in a second direction perpendicular to the first direction within the surface and drawing the pattern on the main surface of the substrate to be held and transported, the drawing step comprising: As a step of sequentially executing each of two or more line segment groups, the substrate is rotated around the axis so that the line segment direction of the line segment group drawn on the main surface coincides with the first direction. And a unit drawing step of performing drawing processing based on the partial drawing data on the main surface while transporting the substrate in the first direction parallel to the main surface. .

  A drawing method according to an eleventh aspect of the present invention is the drawing method according to the tenth aspect of the present invention, wherein each of the declination angles on a two-dimensional polar coordinate parallel to the principal surface has a finite angular width. A plurality of angle segments are defined, and in the classification step, a plurality of line segments belonging to the same angle segment are classified into the same line segment group.

  A drawing method according to a twelfth aspect of the present invention is the drawing method according to the tenth aspect or the eleventh aspect of the present invention, wherein in the classification step, a plurality of line segments orthogonal to each other are the same line segment. It is classified into groups.

  A drawing method according to a thirteenth aspect of the present invention is the drawing method according to any one of the tenth to twelfth aspects of the present invention, wherein the drawing step includes the first of the plurality of graphic elements. It is a process having an anti-aliasing process as a process executed for a graphic element having a portion extending in a direction that does not match one direction.

  A drawing method according to a fourteenth aspect of the present invention is the drawing method according to any one of the tenth to thirteenth aspects of the present invention, wherein the drawing step includes the first of the plurality of graphic elements. An overwriting process is performed as a process executed for a graphic element having a portion extending in a direction that does not match one direction, and the overwriting process is offset by a specific amount in the second direction and has an overlapping part. A plurality of partial drawing data is generated, and the light amount of the light source is divided for each of the plurality of partial drawing data to sequentially perform drawing processing.

  A drawing method according to a fifteenth aspect of the present invention is the drawing method according to any one of the tenth to fourteenth aspects of the present invention, wherein the selection step includes a resolution condition required in the drawing step. And setting the line width condition, then specifying the at least two line segments with reference to the resolution condition and the line width condition, and selecting the at least two line segments.

  A drawing method according to a sixteenth aspect of the present invention is the drawing method according to any one of the tenth to fifteenth aspects of the present invention, wherein a GLV (Grating Light Valve) element is used in the drawing step. And performing the spatial modulation.

  A drawing method according to a seventeenth aspect of the present invention is the drawing method according to any one of the tenth to sixteenth aspects of the present invention, wherein the pattern is planar and has at least two different angles. It is a circuit pattern having a line segment.

  In each aspect of the present invention, at least two line segments selected from a plurality of graphic elements are classified into two or more line segment groups according to the angle characteristics. Two or more partial drawing data corresponding to each of the two or more line segment groups are generated. Then, for each of the two or more line segment groups, the partial drawing data corresponding to the line segment group is rotated so that the main line segment direction of the line segment group matches the first direction (substrate transport direction).

  Thereafter, for each of the two or more line segment groups, the substrate is sequentially rotated so that the line segment direction of the line segment group drawn on the main surface of the substrate matches the first direction, and the substrate is moved in the first direction. The drawing process based on the partial drawing data is executed while being conveyed.

  As a result, in the drawing process, the main line segment is drawn along the first direction, and the occurrence of jaggy due to the drawing of the oblique line is prevented or reduced.

2 is a side view of the drawing apparatus 100. FIG. 2 is a top view of the drawing apparatus 100. FIG. 3 is a perspective view showing a configuration of a GLV element 56. FIG. 2 is a flowchart showing the flow of overall processing in the drawing apparatus 100. FIG. 6 is a flowchart showing a flow of drawing data generation processing in the drawing apparatus 100. FIG. It is a figure which shows pattern Pa10 in the process example 1. FIG. It is a figure which shows the patterns Pa11-Pa13 in the process example 1. FIG. It is a figure which shows pattern Pa11, Pa17, Pa18 in the process example 1. FIG. It is a figure which shows pattern Pa20 in the process example 2. FIG. It is a figure which shows the patterns Pa21-Pa23 in the process example 2. FIG. It is a figure which shows pattern Pa21, Pa27, Pa28 in the process example 2. FIG. It is a figure which shows pattern Pa30 in the process example 3. FIG. It is a figure which shows the patterns Pa31 and Pa32 in the process example 3. FIG. It is a figure which shows the patterns Pa31 and Pa37 in the process example 3. FIG. It is a figure which shows the process example of an anti-aliasing process. It is a figure which shows the process example of an overwriting process.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. Parts having similar configurations and functions are denoted by the same reference numerals in the drawings, and redundant description is omitted. In the drawings, the size and number of each part may be exaggerated or simplified for easy understanding. 1, 2, and 6 to 16 are attached with an XYZ orthogonal coordinate system in which the Z direction is the vertical direction and the XY plane is the horizontal plane in order to clarify the directional relationship between the respective parts.

<1 embodiment>
<1.1 Overall Configuration of Drawing Apparatus 100>
FIG. 1 is a side view illustrating a configuration example of a drawing apparatus 100 as an example of a drawing apparatus according to an embodiment. FIG. 2 is a top view showing a configuration example of the drawing apparatus 100 of FIG.

  The drawing apparatus 100 is a direct drawing apparatus that draws a pattern by irradiating spatially modulated light onto one main surface of a substrate W such as a semiconductor substrate or a glass substrate to which a photosensitive material is applied. Here, the substrate W is a concept including both a single-layer substrate composed of only a base layer and a multilayer substrate in which a functional layer is laminated on at least one main surface of the base layer.

  The drawing apparatus 100 includes a main body 105 having a main configuration of the apparatus inside a space formed by attaching a cover 102 to the main body frame 101, and an outer side of the main body 105 (as shown in FIG. A substrate storage cassette 110 disposed on the right hand side of 105 and a control unit 70.

  The pattern design apparatus 150, which is an external apparatus of the drawing apparatus 100, is connected to the control unit 70 of the drawing apparatus 100 via a communication line, and various data (for example, exposure patterns for CAD are used with the control unit 70). Design data can be exchanged in a format.

<1.2 Configuration of each part>
<1.2.1 Main Body 105>
The main body 105 serves as a processing unit 106 related to the exposure process, a stage 10 (holding unit) that holds the substrate W in a horizontal posture, a stage moving mechanism 20 that moves the stage 10, and a position parameter corresponding to the position of the stage 10. A position parameter measuring mechanism 30 that measures the above, an optical head unit 50 (drawing unit) that irradiates the upper surface of the substrate W with pulsed light, and an alignment camera 60.

  The main body unit 105 includes a transfer robot 120 that is arranged on the + Y side of the processing unit 106 and transfers the substrate W between the processing unit 106 and the substrate storage cassette 110. The transfer robot 120 receives an unprocessed substrate W stored in the substrate storage cassette 110 from the substrate storage cassette 110 and passes it to the main body unit 105. Further, the transfer robot 120 receives the processed substrate W that has been subjected to the exposure processing in the processing unit 106 from the processing unit 106 and transfers it to the substrate storage cassette 110.

  A base 130 for supporting each part of the processing unit 106 is disposed in a lower part of the processing unit 106. A substrate delivery area for delivering the substrate W between the processing unit 106 and the transfer robot 120 is set at a position on the base 130 on the + Y side. In addition, a pattern drawing area for drawing a pattern on the substrate W is set at a position on the base 130 in the center in the Y direction. In addition, an imaging region for imaging the upper surface of the substrate W is set at a position on the −Y side on the base 130.

  The head support unit 140 includes two leg members 141 erected upward from the base 130, and two legs erected upward from the base 130 on the −Y side of the two leg members 141. Leg member 142. Further, the head support portion 140 includes a beam member 143 provided so as to bridge between the top portions of the two leg members 141 and a beam provided so as to bridge between the top portions of the two leg members 142. Member 144. The optical head unit 50 is attached to the + Y side of the beam member 143, and the alignment camera 60 is attached to the −Y side of the beam member 143.

  The alignment camera 60 is an image pickup unit that picks up an image of the lower position of the alignment camera 60, and picks up an image of the upper surface of the substrate W that is held and conveyed by the stage 10 and comes to the lower position of the alignment camera 60. On the upper surface of the substrate W, a plurality of alignment marks (information such as the rotation and offset of the substrate W) and shape information (information such as strain of the substrate W) of the substrate W are detected. (Not shown) is formed. The alignment camera 60 images at least a part of the plurality of alignment marks and generates image data. The generated imaging data is transmitted to the control unit 70. The control unit 70 detects position information and shape information of the substrate W based on the received imaging data, and controls each part of the apparatus while referring to the detected position information and shape information.

  The stage 10 has a cylindrical outer shape, and is a holding unit for placing and holding the substrate W in a horizontal posture on the upper surface thereof. A plurality of suction holes (not shown) are formed on the upper surface of the stage 10. For this reason, when the substrate W is placed on the stage 10, the substrate W is attracted and fixed to the upper surface of the stage 10 by the suction pressure of the plurality of suction holes.

  The stage moving mechanism 20 includes a rotating mechanism 21 (rotating unit) that rotates the stage 10, a support plate 22 that rotatably supports the stage 10, a sub-scanning mechanism 23 that moves the support plate 22 in the sub-scanning direction, and a sub-scanning mechanism 23. A base plate 24 that supports the support plate 22 via the scanning mechanism 23 and a main scanning mechanism 25 (conveying unit) that moves the base plate 24 in the main scanning direction are provided.

  The rotation mechanism 21 has a motor constituted by a rotor attached inside the stage 10. A rotary bearing mechanism is provided between the lower surface side of the center portion of the stage 10 and the support plate 22. For this reason, when the motor is operated, the rotor moves in the θ direction (the rotation direction around the Z axis), and the stage 10 rotates around the rotation axis of the rotary bearing mechanism.

  The sub-scanning mechanism 23 has a linear motor 23 a that generates a propulsive force in the sub-scanning direction by a mover attached to the lower surface of the support plate 22 and a stator laid on the upper surface of the base plate 24. The sub-scanning mechanism 23 has a pair of guide rails 23 b that guide the support plate 22 along the sub-scanning direction with respect to the base plate 24. Therefore, when the linear motor 23a is operated, the support plate 22 and the stage 10 move in the sub-scanning direction (X direction) along the guide rail 23b on the base plate 24.

  The main scanning mechanism 25 has a linear motor 25 a that generates a propulsive force in the main scanning direction by a moving element attached to the lower surface of the base plate 24 and a stator laid on the upper surface of the head support portion 140. The main scanning mechanism 25 has a pair of guide rails 25b for guiding the base plate 24 along the main scanning direction with respect to the head support portion 140. For this reason, when the linear motor 25a is operated, the base plate 24, the support plate 22, and the stage 10 move in the main scanning direction (Y direction) along the guide rail 25b on the base 130. As such a stage moving mechanism 20, various XY-θ axis moving mechanisms can be used.

  The position parameter measurement mechanism 30 is a mechanism that measures the position parameter of the stage 10 using the interference of laser light. The position parameter measurement mechanism 30 mainly includes a laser beam emitting unit 31, a beam splitter 32, a beam bender 33, a first interferometer 34, and a second interferometer 35.

  The laser beam emitting unit 31 is a light source device for emitting a measurement laser beam ML. The laser beam emitting unit 31 is provided at a position fixed with respect to the base 130 and the optical head unit 50. The laser light ML emitted from the laser light emitting unit 31 first enters the beam splitter 32, and the first branched light ML1 that travels from the beam splitter 32 to the beam bender 33, and the second interferometer 35 from the beam splitter 32. The light is branched to the second branched light ML2 that travels toward.

  The first branched light ML1 is reflected by the beam bender 33, enters the first interferometer 34, and is irradiated from the first interferometer 34 to the first part 10a on the −Y side end of the stage 10. Is done. Then, the first branched light ML1 reflected by the first part 10a is incident on the first interferometer 34 again. The first interferometer 34 is a position corresponding to the position of the first part 10a of the stage 10 based on the interference between the first branched light ML1 directed to the stage 10 and the first branched light ML1 reflected from the stage 10. Measure parameters.

  On the other hand, the second branched light ML2 is incident on the second interferometer 35, and the second part (the first part 10a is the second side of the -Y side end of the stage 10 from the second interferometer 35. Different parts) 10b are irradiated. Then, the second branched light ML2 reflected by the second part 10b is incident on the second interferometer 35 again. The second interferometer 35 is a position corresponding to the position of the second part 10b of the stage 10 based on the interference between the second branched light ML2 directed to the stage 10 and the second branched light ML2 reflected from the stage 10. Measure parameters.

  The first interferometer 34 and the second interferometer 35 transmit the position parameters acquired by the respective measurements to the control unit 70. The controller 70 controls the position of the stage 10 and the moving speed of the stage 10 using the position parameter.

  The optical head unit 50 is a light irradiating unit that irradiates pulse light for exposure processing toward the lower position thereof, and is pulsed onto the upper surface of the substrate W that is held and conveyed by the stage 10 and is positioned below the optical head unit 50. It is a part to irradiate. In the present embodiment, a case will be described in which a resist layer that is exposed to ultraviolet rays is formed in advance on the upper surface of the substrate W, and the optical head unit 50 emits pulsed light (ultraviolet rays) having a wavelength of 355 nm.

  The optical head unit 50 is connected to one laser oscillator 54 via the illumination optical system 53. The laser oscillator 54 is connected to a laser driving unit 55 that drives the laser oscillator 54. The laser driving unit 55, the laser oscillator 54, and the illumination optical system 53 are provided inside the box 172. When the laser driving unit 55 is operated, pulsed light is emitted from the laser oscillator 54, and the pulsed light is introduced into the optical head unit 50 through the illumination optical system 53.

  In the optical head unit 50, a spatial light modulator that spatially modulates the irradiated light, a drawing control unit that controls the spatial light modulator, and pulse light introduced into the optical head unit 50 is spatial light. An optical system for irradiating the upper surface of the substrate W via the modulator is mainly provided. The pulsed light introduced into the optical head unit 50 is directly irradiated onto the upper surface of the substrate W as a light beam shaped into a predetermined pattern shape by a spatial light modulator or the like, and exposes a photosensitive layer such as a resist on the substrate W. To do. Thereby, a pattern is drawn on the upper surface of the substrate W.

  As the spatial light modulator, for example, a GLV (registered trademark: Grading Light Valve) element array which is a diffraction grating type spatial light modulator is employed.

  FIG. 3 is a perspective view showing the configuration of the GLV element 56. The GLV element array is configured by, for example, 1080 GLV elements 56 arranged in one direction. The GLV element 56 is a diffraction grating type spatial light modulator having a deformable ribbon structure using a Coulomb attractive force generated by application of a voltage, and includes six movable ribbons 57 and three fixed ribbons 58. A ribbon is provided. When no voltage is applied to the GLV element 56, the upper surfaces of the three movable ribbons 57 are arranged side by side with the upper surfaces of the remaining three fixed ribbons 58, thereby forming a simple reflecting mirror (FIG. 3). When a voltage is applied to the three movable ribbons 57 under the control of the drawing controller, the height of the movable ribbon 57 from the GLV element substrate 59 to the upper surface of the ribbon and the distance from the GLV element substrate 59 of the fixed ribbon 58 to the upper surface of the ribbon are displayed. The height is different. For this reason, in the GLV element 56, diffracted light can be generated by the difference in the optical path length of the reflected light between the three movable ribbons 57 and the three fixed ribbons 58.

  Therefore, by controlling the voltage application to each GLV element 56 by the drawing control unit, the light beam incident on the GLV element array can be shaped into a predetermined pattern shape and emitted from the GLV element array. The GLV element array is a linear modulation element, and light emitted from the GLV element array is applied to a region extending in the X direction on the upper surface of the substrate W. For this reason, a two-dimensional pattern can be drawn in a predetermined region on the upper surface of the substrate W by transporting the substrate W along the Y direction in synchronization with the light modulation by the GLV element array.

<1.2.2 Substrate storage cassette 110>
The substrate storage cassette 110 includes a first storage unit that stores an unprocessed substrate W to be subjected to an exposure process, and a second storage unit that stores a processed substrate W that has been subjected to an exposure process. Further, as described above, the transfer robot 120 can transfer the substrate W to and from the substrate storage cassette 110.

  For this reason, the unprocessed substrate W stored in the first storage unit is transported to the processing unit 106 via the transport robot 120, and exposure processing is executed. Then, the processed substrate W that has been subjected to the exposure process is stored in the second storage unit via the transfer robot 120.

<1.2.3 Control Unit 70>
The control unit 70 is electrically connected to each unit included in the drawing apparatus 100, and controls the operation of each unit of the drawing apparatus 100 while executing various arithmetic processes. The control unit 70 also functions as a data processing unit that executes data processing to be described later on the design data.

  The control unit 70 includes, for example, a general computer in which a CPU, a ROM, a RAM, a storage device, and the like are interconnected via a bus line. The ROM stores basic programs and the like, and the RAM is used as a work area when the CPU performs predetermined processing. The storage device is configured by a non-volatile storage device such as a flash memory or a hard disk device. A program is stored in the storage device, and various processing (for example, alignment processing and drawing processing described later) is realized by the CPU as the main control unit performing arithmetic processing according to the procedure described in the program. The The program may be stored in a memory such as a storage device in advance, or provided to the storage device in a form (program product) recorded on a recording medium such as a CD-ROM or DVD-ROM or an external flash memory. It doesn't matter. Further, it may be provided to the storage device by downloading from an external server via a network. Note that some or all of the functions realized in the control unit 70 may be realized in hardware by a dedicated logic circuit or the like.

  The control unit 70 is also connected to an input unit, a display unit, a communication unit, etc. (all not shown) via a bus line. The input unit is an input device including, for example, a keyboard and a mouse, and accepts various operation inputs from an operator. The display unit is a display device including a liquid crystal display device, a lamp, and the like, and displays various types of information under the control of the CPU. The communication unit has a data communication function for transmitting and receiving commands and data to and from an external device via a network.

<1.3 Operation of Drawing Apparatus 100>
<1.3.1 Overall processing>
A series of processing in the drawing apparatus 100 will be described with reference to FIG. FIG. 4 is a diagram showing the flow of the processing. A series of operations described below is performed under the control of the control unit 70.

  The drawing apparatus 100 receives design data (for example, vector format data) including a specific pattern from the pattern design apparatus 150, and generates drawing data based on the design data (step ST1). The drawing data is data expressed in a description format (for example, raster format) that can be processed by the drawing apparatus 100. A specific example in the case of generating the drawing data will be described in detail in <1.3.3 Processing example> described later with reference to steps ST11 to ST15 in FIG. In the present embodiment, two or more groups are formed according to the angular characteristics of two or more line segments included in the specific pattern. Then, for each of the two or more groups, partial drawing data expressed in a description format that can be processed by the drawing apparatus 100 is generated.

  The transfer robot 120 takes out one unprocessed substrate W from the substrate storage cassette 110 and places it on the stage 10 (step ST2).

  At this time, the substrate W is placed on the stage 10 in consideration of the rotation position of the substrate W so that a notch (notch, orientation flat, etc.) (not shown) formed in a part of the periphery of the substrate W is in a predetermined position. Placed on top. As a result, the substrate W placed on the stage 10 is roughly aligned with the determined rotational position. When the substrate W is placed on the stage 10, the stage 10 holds the substrate W by suction.

  The stage moving mechanism 20 moves the stage 10 to a position below the alignment camera 60. Then, the alignment camera 60 images at least a part of the alignment mark formed on the upper surface of the substrate W while the stage moving mechanism 20 moves the stage 10. Imaging data generated by the alignment camera 60 by this imaging is transmitted to the control unit 70. Based on the received imaging data, the control unit 70 calculates the amount of deviation from the ideal position of the substrate W (the amount of positional deviation in the X-axis direction, the amount of positional deviation in the Y-axis direction, and the amount of rotational deviation about the Z-axis). To do. And the position of the board | substrate W is correct | amended by operating the stage moving mechanism 20 in the direction which reduces each calculated deviation | shift amount (step ST3).

  After the alignment process, the stage moving mechanism 20 moves the stage 10 to a position below the optical head unit 50. The stage moving mechanism 20 moves the stage 10 while irradiating the upper surface of the substrate W from the optical head unit 50 with light that is spatially modulated based on partial drawing data of a certain group, and the optical head unit 50, the substrate W, and the like. Relative movement. Thereby, the exposure pattern of the said group is drawn on the upper surface of the board | substrate W (step ST4).

  An example of the drawing process will be described. In this drawing process, first, the substrate W is moved by the stage moving mechanism 20 along the forward direction of the main scanning (for example, the + Y direction). At this time, the control unit 70 reads out the portion describing the data to be drawn in the region to be drawn in the main scanning among the partial drawing data. Then, the control unit 70 controls the modulation unit 82 according to the read data, and emits drawing light spatially modulated according to the data from the optical head unit 50 toward the substrate W. While the optical head unit 50 intermittently emits drawing light toward the substrate W, the stage moving mechanism 20 moves the substrate W once along the forward direction (+ Y direction) of the main scanning, so that the substrate W A specific pattern is drawn in one long region (region extending along the Y direction and having a width along the X direction corresponding to the width of the drawing light) on the upper surface. This movement of the substrate W along the forward direction of main scanning is referred to as forward main scanning.

  When the forward main scanning with the drawing light irradiation ends, the stage moving mechanism 20 moves the stage 10 in the sub-scanning direction (for example, the −X direction) by a distance corresponding to the width of the drawing light. When viewed from the substrate W, the optical head unit 50 moves in the + X direction by the width of the long region. Such movement of the substrate W in the sub-scanning direction (−X direction) is called sub-scanning.

  When the sub-scanning is completed, a return main scanning with irradiation of drawing light is executed. That is, while the optical head unit 50 intermittently emits drawing light toward the substrate W, the stage moving mechanism 20 moves the substrate W in the backward direction of the main scanning (the direction opposite to the forward direction). (-Y direction) is moved once along. By this backward pass main scan, a pattern is drawn in the long region adjacent to the long region drawn in the previous forward main scan.

  When the backward main scanning with the drawing light irradiation ends, the sub-scanning is performed, and then the forward main scanning with the drawing light irradiation is performed again. By the forward main scanning, a pattern is drawn in the long area adjacent to the long area drawn in the previous backward main scanning. In this manner, drawing of a long region by main scanning accompanied by irradiation of drawing light and sub-scanning are alternately performed, and the entire drawing target region is exposed with a specific pattern in the group.

  As another example of drawing processing, drawing of a long area (repetitive drawing) and sub-scanning, which are performed by repeating forward main scanning and backward main scanning, are alternately performed, and the entire drawing target area May be exposed with a specific pattern in the group.

  When the drawing process in the group is completed, the process branches to Yes in step ST5, and the same drawing process is executed for the remaining groups. When the drawing process is completed for all groups, the process branches to No in step ST5, and the substrate W is carried out. Specifically, the transfer robot 120 receives the processed substrate W from the stage 10 and stores it in the substrate storage cassette 110 (step ST6). Thus, a series of processes for the substrate W is completed.

  After the processed substrate W is stored in the substrate storage cassette 110, if there is a new unprocessed substrate W (subsequent substrate), the transfer robot 120 takes out the substrate W from the substrate storage cassette 110. This time, the above-described steps ST2 to ST6 are performed on the substrate W.

<1.3.2 Influence of jaggy>
As described above, in the drawing apparatus 100, the upper surface of the substrate W is irradiated with the spatially modulated light along the X direction, and the substrate W is transported along the Y direction, so that the upper surface of the substrate W is moved in the XY direction. A two-dimensional pattern is drawn with the specific drawing pixels arranged. In addition, this spatial modulation is realized by applying a voltage to the plurality of GLV elements 56 arranged in a row so that the plurality of movable ribbons 57 are finely operated.

  For this reason, in the Y direction, a minimum length is required to switch ON / OFF of the light irradiation from the relationship between the conveyance speed of the substrate W and the operation speed of the movable ribbon 57. More specifically, in the Y direction, it is necessary to continuously turn on light irradiation for at least a specific distance (for example, a distance corresponding to five pixels of drawing pixels), or to turn off light irradiation for at least a specific distance. Therefore, it is not possible to switch on / off the light irradiation at a distance interval less than the specific distance.

  In addition, a portion of the pattern drawn on the upper surface of the substrate W to be transported that does not follow the X direction or the Y direction (a portion corresponding to an oblique line) causes rattling (also referred to as “jaggy”).

  In the case of drawing a pattern requiring a high resolution or a thin line pattern having a small line width, the influence of jaggies is particularly problematic. On the other hand, in the case of drawing a pattern that does not require a high resolution (in other words, a pattern that is acceptable even at a low resolution) or a thick line pattern that has a large line width, the influence of jaggy does not matter.

  Therefore, in the present embodiment, among the drawing patterns having a plurality of graphic elements, the drawing shown in Processing Examples 1 to 3 described later (drawing unique to the present embodiment having a jaggy reduction effect) is performed for a specific graphic element. The other graphic elements are drawn as usual. As described above, in the present embodiment, drawing processing is performed by selecting either angle division drawing or conventional drawing for each graphic element. Hereinafter, among the graphic elements drawn on the upper surface of the substrate W, the specific graphic element is expressed as “target graphic element”.

<1.3.3 Processing example>
Hereinafter, three processing examples will be described as examples of the drawing processing in the drawing apparatus 100. FIG. 5 is a diagram illustrating a flow of drawing data generation. The flow shown in FIG. 5 is common to each processing example. In the following, a processing example of a simple pattern is described for the purpose of preventing the description from becoming complicated, but each pattern may be configured more complicatedly.

<Processing example 1>
The processing example 1 will be described with reference to FIGS. Process example 1 is a process of drawing the pattern Pa10 (FIG. 6) on at least a part of the upper surface of the substrate W. FIG. 6 is a diagram showing the pattern Pa10. FIG. 7 is a diagram illustrating patterns Pa11 to Pa13 in three partial drawing data generated based on the pattern Pa10. FIG. 8 is a diagram illustrating patterns Pa11, Pa17, and Pa18 expressed by rotating the patterns Pa11 to Pa13.

  As shown in FIG. 6, the pattern Pa10 drawn on the upper surface of the substrate W in the processing example 1 is a planar pattern having three line segments 111 to 113 having different angles as a plurality of graphic elements.

  In generating the drawing data, the above-described target graphic element is selected from a plurality of graphic elements (step ST11, selection process). In the selection step, first, the operator of the apparatus operates and inputs condition specifying information for specifying the resolution condition and the line width condition required in the drawing process to the input unit. More specifically, the operator inputs numerical values for specifying resolution and line width from an input unit such as a keyboard. Then, the control unit 70 identifies the target graphic element with reference to the input resolution condition and line width condition, and selects this target graphic element. Below, the case where all the three line segments 111-113 are selected as an object figure element is demonstrated.

  Next, the control unit 70 classifies the three line segments 111 to 113 that are target graphic elements into three line segment groups according to the angle characteristics of each line segment (step ST12, classification step). Hereinafter, a case where each of the three line segments 111 to 113 is classified into different line segment groups by executing a program recorded in advance in the recording device of the control unit 70 will be described.

  Thereafter, the control unit 70 generates three partial drawing data having three patterns Pa11 to Pa13 corresponding to each of the three line segment groups based on the design data including the pattern Pa10 (step ST13, partial drawing). Data generation process).

  Further, for each of the three line segment groups, the control unit 70 converts the partial drawing data corresponding to the line segment group to the Z axis so that the main line segment direction of the line segment group matches the Y direction (first direction). Rotate around (step ST14, data rotation process). At this time, data rotation processing is not performed on the line segment 111 that originally matched the Y direction in the pattern Pa11. In addition, a data rotation process that rotates 30 degrees counterclockwise in the figure is performed on the line segment 112 that has rotated clockwise in the pattern Pa12 by a predetermined angle (for example, 30 degrees) from the Y direction, and a new pattern Pa17 is obtained. Is generated. In addition, a data rotation process that rotates 60 degrees counterclockwise is performed on the line segment 113 that has rotated clockwise by a predetermined angle (for example, 60 degrees) from the Y direction in the pattern Pa13, and a new pattern Pa18 is obtained. Is generated.

  The control unit 70 performs RIP processing on each of the three partial drawing data, and generates three partial drawing data after the RIP processing (step ST15).

  As described above, in this embodiment, the control unit 70 (data processing unit) functions as a selection unit that selects at least two line segments from a plurality of graphic elements, and at least two line segments are assigned to each line segment. A function as a classification unit for classifying into two or more line segment groups according to angle characteristics, and a function as a partial drawing data generation unit for generating two or more partial drawing data corresponding to each of the two or more line segment groups; A function as a data rotation unit that rotates the partial drawing data corresponding to the line segment group around the axis so that the main line segment direction of the line segment group matches the Y direction for each of two or more line segment groups; And a function as a RIP processing unit that performs RIP processing on each drawing data.

  Next, the drawing process (drawing process) in Process Example 1 will be described in detail.

  In the drawing process, first, a line segment 111 is drawn on the upper surface of the substrate W. As described above, the line drawing 111 is not subjected to the data rotation process, and the partial drawing data of the pattern Pa11 is subjected to the RIP process. For this reason, a line segment 111 is drawn on the upper surface of the substrate W by alternately performing drawing of a long region by main scanning accompanied by irradiation of drawing light and sub-scanning based on the partial drawing data. (Step ST4: unit drawing process).

  Since there are remaining line segment groups (line segment group including pattern Pa17 and line segment group including pattern Pa18), the process branches to Yes in step ST5.

  Next, a line segment 112 is drawn on the upper surface of the substrate W. As described above, the line segment 112 is subjected to the data rotation process of 30 degrees counterclockwise in the drawing, and the partial drawing data of the pattern Pa17 is subjected to the RIP process. Therefore, after the substrate W is rotated 30 degrees counterclockwise in the drawing so that the line segment direction of the line segment 112 drawn on the upper surface of the substrate W coincides with the Y direction, alignment is performed (step ST3: substrate Rotation step) Based on the partial drawing data, drawing of a long region by main scanning accompanied by irradiation of drawing light and sub-scanning are alternately performed, so that a line segment 112 is drawn on the upper surface of the substrate W. (Step ST4: unit drawing process).

  Then, since there are remaining line segment groups (line segment groups including the pattern Pa18), the process branches to Yes in step ST5.

  Next, a line segment 113 is drawn on the upper surface of the substrate W. As described above, the line segment 113 is subjected to the data rotation process of 60 degrees counterclockwise in the drawing, and the partial drawing data of the pattern Pa18 is subjected to the RIP process. Therefore, after the substrate W is rotated 60 degrees counterclockwise in the drawing so that the line segment direction of the line segment 113 drawn on the upper surface of the substrate W coincides with the Y direction, alignment is performed (step ST3: substrate). Rotation step) Based on the partial drawing data, the drawing of the long region by the main scanning accompanied by the drawing light irradiation and the sub-scanning are alternately performed, so that the line segment 113 is drawn on the upper surface of the substrate W. (Step ST4: unit drawing process).

  Thereby, the pattern Pa10 including the line segments 111 to 113 is drawn on the upper surface of the substrate W. As described above, in the processing example 1, first, the line segments are classified according to the angle characteristics, and the data is rotated so that the main line segment direction matches the scanning direction (Y direction) of the substrate W for each line segment group. Then, the partial drawing data is RIP processed. In the drawing process, a substrate rotation process for rotating the substrate W by the same angle as the partial drawing data and a unit drawing process for performing a drawing process based on the partial drawing data for the rotated substrate W are divided into line segments. It is executed sequentially for each of the groups. As a result, in the drawing process, only a line segment along the Y direction is drawn and an oblique line is prevented from being drawn, and jaggy is prevented from occurring.

<Processing example 2>
Processing example 2 will be described with reference to FIGS. Process example 2 is a process of drawing the pattern Pa20 (FIG. 9) on at least a part of the upper surface of the substrate W. FIG. 9 is a diagram showing a pattern Pa20. FIG. 10 is a diagram illustrating patterns Pa21 to Pa23 in three partial drawing data generated based on the pattern Pa20. FIG. 11 is a diagram illustrating patterns Pa21, Pa27, and Pa28 expressed by rotating the patterns Pa21 to Pa23.

  As shown in FIG. 9, the pattern Pa20 drawn on the upper surface of the substrate W in the processing example 2 is a planar pattern having five line segments 211 to 215 having different angles as a plurality of graphic elements.

  In generating the drawing data, the above-described target graphic element is selected from a plurality of graphic elements (step ST11, selection process). In the selection step, first, the operator of the apparatus operates and inputs condition specifying information for specifying the resolution condition and the line width condition required in the drawing process to the input unit. More specifically, the operator inputs numerical values for specifying resolution and line width from an input unit such as a keyboard. Then, the control unit 70 identifies the target graphic element with reference to the input resolution condition and line width condition, and selects this target graphic element. Below, the case where all the five line segments 211-215 are selected as an object figure element is demonstrated.

  Next, the control unit 70 classifies the five line segments 211 to 215 that are target graphic elements into three line segment groups according to the angle characteristics of each line segment (step ST12, classification step). More specifically, the control unit 70 classifies a plurality of line segments orthogonal to each other into the same line segment group. In the following, a first line segment group including the line segment 211, a second line segment group including the line segment 212 and the line segment 214 orthogonal to each other, and a third line including the line segment 213 and the line segment 215 orthogonal to each other. A case where it is classified into a line segment group will be described. This classification is realized by executing a program recorded in advance in the recording device of the control unit 70.

  Thereafter, the control unit 70 generates three partial drawing data having three patterns Pa21 to Pa23 corresponding to each of the three line segment groups based on the design data including the pattern Pa20 (step ST13, partial drawing). Data generation process).

  Further, for each of the three line segment groups, the control unit 70 converts the partial drawing data corresponding to the line segment group to the Z axis so that the main line segment direction of the line segment group matches the Y direction (first direction). Rotate around (step ST14, data rotation process). At this time, data rotation processing is not performed on the line segment 211 that originally matched the Y direction in the pattern Pa21. Further, in the pattern Pa22, the line segment 212 (main line segment) rotated clockwise by a predetermined angle (for example, 30 degrees) from the Y direction and the clockwise direction illustrated by a predetermined angle (for example, 120 degrees) from the Y direction. The rotated line segment 214 is subjected to a data rotation process that rotates 30 degrees counterclockwise in the drawing, and partial drawing data having a pattern Pa27 is newly generated. Further, in the pattern Pa23, the line segment 213 (main line segment) rotated clockwise by a predetermined angle (for example, 60 degrees) from the Y direction and the clockwise direction illustrated by a predetermined angle (for example, 150 degrees) from the Y direction. The rotated line segment 215 is subjected to data rotation processing that rotates 60 degrees counterclockwise in the drawing, and partial drawing data having a pattern Pa28 is newly generated.

  The control unit 70 performs RIP processing on each of the three partial drawing data, and generates three partial drawing data after the RIP processing (step ST15).

  Next, the drawing process (drawing process) in Process Example 2 will be described in detail.

  In the drawing process, first, a line segment 211 is drawn on the upper surface of the substrate W. As described above, the line drawing 211 is not subjected to the data rotation process, and the partial drawing data of the pattern Pa21 is subjected to the RIP process. For this reason, a line segment 211 is drawn on the upper surface of the substrate W by alternately performing drawing of a long region by main scanning accompanied by irradiation of drawing light and sub-scanning based on the partial drawing data. (Step ST4: unit drawing process).

  Since there are remaining line segment groups (line segment group including pattern Pa27 and line segment group including pattern Pa28), the process branches to Yes in step ST5.

  Next, a line segment 212 and a line segment 214 are drawn on the upper surface of the substrate W. As described above, the line segment 212 and the line segment 214 are subjected to the data rotation process of 30 degrees counterclockwise in the drawing, and the partial drawing data of the pattern Pa27 is subjected to the RIP process. For this reason, after the substrate W is rotated 30 degrees counterclockwise in the drawing so that the line segment direction of the line segment 212 (main line segment) drawn on the upper surface of the substrate W matches the Y direction, the alignment is performed. (Step ST3: Substrate rotating step) Based on the partial drawing data, the drawing of the long region by the main scanning accompanied by the irradiation of the drawing light and the sub scanning are alternately performed, so that the upper surface of the substrate W is The line segment 212 and the line segment 214 are drawn (step ST4: unit drawing process).

  Since there are remaining line segment groups (line segment groups including the pattern Pa28), the process branches to Yes in step ST5.

  Next, a line segment 213 and a line segment 215 are drawn on the upper surface of the substrate W. As described above, the line segment 213 and the line segment 215 are subjected to the data rotation process of rotation of 60 degrees counterclockwise in the drawing, and the partial drawing data of the pattern Pa28 is subjected to the RIP process. For this reason, after the alignment is performed by rotating the substrate W 60 degrees counterclockwise in the figure so that the line segment direction of the line segment 213 (main line segment) drawn on the upper surface of the substrate W matches the Y direction. (Step ST3: Substrate rotating step) Based on the partial drawing data, the drawing of the long region by the main scanning accompanied by the irradiation of the drawing light and the sub scanning are alternately performed, so that the upper surface of the substrate W is The line segment 213 and the line segment 215 are drawn (step ST4: unit drawing step).

  Thereby, the pattern Pa20 including the line segments 211 to 215 is drawn on the upper surface of the substrate W. As described above, in Processing Example 2, first, a plurality of line segments orthogonal to each other are classified into the same line segment group, and the main line segment direction of each line segment group matches the scanning direction (Y direction) of the substrate W. The data is rotated and the partial drawing data is RIP processed. In the drawing process, a substrate rotation process for rotating the substrate W by the same angle as the partial drawing data and a unit drawing process for performing a drawing process based on the partial drawing data for the rotated substrate W are divided into line segments. It is executed sequentially for each of the groups. As a result, in the drawing process, only the line segment along the Y direction (the main line segment) and the line segment along the X direction orthogonal to the Y direction are prevented from being drawn and oblique lines are prevented, and jaggy occurs. Is prevented.

  Further, in Processing Example 2, a plurality of line segments orthogonal to each other are classified into the same line segment group, and the substrate rotation process and the unit drawing process are performed simultaneously. For this reason, in the processing example 2, the throughput can be improved compared to the processing example 1 in which a plurality of line segments are individually drawn.

<Processing example 3>
Processing example 3 will be described with reference to FIGS. Process example 3 is a process of drawing the pattern Pa30 (FIG. 12) on at least a part of the upper surface of the substrate W. FIG. 12 is a diagram showing the pattern Pa30. FIG. 13 is a diagram illustrating patterns Pa31 and Pa32 in two pieces of partial drawing data generated based on the pattern Pa30. FIG. 14 is a diagram illustrating patterns Pa31 and Pa37 expressed by rotating the patterns Pa31 and Pa32.

  As shown in FIG. 12, the pattern Pa30 drawn on the upper surface of the substrate W in the processing example 3 is a planar pattern having four line segments 311 to 314 having different angles as a plurality of graphic elements.

  In generating the drawing data, the above-described target graphic element is selected from a plurality of graphic elements (step ST11, selection process). In the selection step, first, the operator of the apparatus operates and inputs condition specifying information for specifying the resolution condition and the line width condition required in the drawing process to the input unit. More specifically, the operator inputs numerical values for specifying resolution and line width from an input unit such as a keyboard. Then, the control unit 70 identifies the target graphic element with reference to the input resolution condition and line width condition, and selects this target graphic element. Hereinafter, a case where all of the four line segments 311 to 314 are selected as target graphic elements will be described.

  Next, the control unit 70 classifies the four line segments 311 to 314, which are target graphic elements, into two line segment groups according to the angle characteristics of each line segment (step ST12, classification process). More specifically, a plurality of angle segments (for example, 36 angle segments) each having a finite angle width (for example, an angle width of 10 degrees) with respect to the deflection angle on the two-dimensional polar coordinate of the XY plane are defined. The control unit 70 classifies a plurality of line segments belonging to the same angle segment into the same line segment group. In the following, a first line group including line segments 311 and 312 belonging to the same angle segment, and a second line group including line segments 313 and line 314 belonging to the same angle segment, and The case of being classified into, will be described. This classification is realized by executing a program recorded in advance in the recording device of the control unit 70.

  Thereafter, the control unit 70 generates two partial drawing data having two patterns Pa31 and Pa32 corresponding to each of the two line segment groups based on the design data including the pattern Pa30 (step ST13, partial drawing). Data generation process).

  Further, for each of the two line segment groups, the control unit 70 converts the partial drawing data corresponding to the line segment group to the Z axis so that the main line segment direction of the line segment group matches the Y direction (first direction). Rotate around (step ST14, data rotation process). At this time, the line segment 311 (main line segment) originally matching the Y direction in the pattern Pa31 and the line segment 312 rotated clockwise by a predetermined angle (for example, 5 degrees) from the Y direction include data The rotation process is not performed. Further, in the pattern Pa32, the line segment 313 (main line segment) rotated clockwise by a predetermined angle (for example, 60 degrees) from the Y direction and the clockwise direction illustrated by a predetermined angle (for example, 65 degrees) from the Y direction. The rotated line segment 314 is subjected to data rotation processing that rotates 60 degrees counterclockwise in the drawing, and partial drawing data having a pattern Pa37 is newly generated.

  The control unit 70 performs RIP processing on each of the two partial drawing data, and generates two partial drawing data after the RIP processing (step ST15).

  Next, the drawing process (drawing process) in Process Example 3 will be described in detail.

  In the drawing process, first, a line segment 311 and a line segment 312 are drawn on the upper surface of the substrate W. As described above, the line drawing 311 and the line 312 are not subjected to the data rotation process, and the partial drawing data of the pattern Pa31 is subjected to the RIP process. For this reason, the line segment 311 and the line segment are formed on the upper surface of the substrate W by alternately performing the drawing of the long region by the main scanning accompanied with the irradiation of the drawing light and the sub scanning based on the partial drawing data. 312 is drawn (step ST4: unit drawing step).

  Then, since there are remaining line segment groups (line segment groups including the pattern Pa37), the process branches to Yes in step ST5.

  Next, a line segment 313 and a line segment 314 are drawn on the upper surface of the substrate W. As described above, the line segment 313 and the line segment 314 are subjected to the data rotation process of rotation of 60 degrees counterclockwise in the drawing, and the partial drawing data of the pattern Pa37 is subjected to the RIP process. For this reason, after the alignment is performed by rotating the substrate W 60 degrees counterclockwise in the drawing so that the line segment direction of the line segment 313 (main line segment) drawn on the upper surface of the substrate W coincides with the Y direction. (Step ST3: Substrate rotating step) Based on the partial drawing data, the drawing of the long region by the main scanning accompanied by the irradiation of the drawing light and the sub scanning are alternately performed, so that the upper surface of the substrate W is A line segment 313 and a line segment 314 are drawn (step ST4: unit drawing step).

  Thereby, the pattern Pa20 including the line segments 311 to 314 is drawn on the upper surface of the substrate W. As described above, in Processing Example 3, first, a plurality of line segments belonging to the same angle section are classified into the same line segment group, and the main line segment direction for each line segment group is the scanning direction (Y direction) of the substrate W. The data is rotated so as to match, and the partial drawing data is RIP processed. In the drawing process, a substrate rotation process for rotating the substrate W by the same angle as the partial drawing data and a unit drawing process for performing a drawing process based on the partial drawing data for the rotated substrate W are divided into line segments. It is executed sequentially for each of the groups. As a result, in the drawing process, only the line segment along the Y direction (main line segment) and the line segment in the same angle segment as the Y direction (line segment with a small angular deviation from the Y direction) are drawn. For this reason, the diagonal line is prevented from being drawn and the jaggy is prevented from being generated with respect to the main line segment, and the diagonal line is not generated with respect to the line segment of the same angle section (a line segment having a small angular deviation from the Y direction). Jaggy is reduced by the small angular deviation from the Y direction of what is drawn.

  Further, in the processing example 3, a plurality of line segments belonging to the same angle segment are classified into the same line segment group, and the substrate rotation process and the unit drawing process are simultaneously performed. For this reason, in the processing example 3, the throughput can be improved compared to the processing example 1 in which a plurality of line segments are individually drawn.

<Other processing examples to reduce jaggy>
In the processing example 1 to the processing example 3 described above, by rotating the partial drawing data and the substrate W so that the main line segment of the graphic elements is along the Y direction, the technology for preventing the jaggy from occurring on the main line segment. explained.

  However, when the pattern to be formed on the upper surface of the substrate W is a polygonal line or a curved pattern, or when the pattern to be formed on the upper surface of the substrate W includes an oblique line in addition to the main line segment (in the case of Processing Example 3). For example, when drawing is performed with a pattern including a graphic element having a portion extending in a direction that does not coincide with the Y direction, jaggies are generated in portions other than the main line segment. Hereinafter, two processing examples for reducing jaggy in such a case will be described with reference to FIGS. 15 and 16.

  FIG. 15 is a diagram illustrating a drawing pattern in the anti-aliasing process. In FIG. 15, a line segment 411 is a drawing area drawn with a normal light amount. In FIG. 15, a line segment 412 is an intermediate drawing area drawn with a normal light amount of 60%. In FIG. 15, a line segment 413 is an intermediate drawing area drawn with a normal light amount of 30%.

  In the anti-aliasing processing, an intermediate light amount between a normal light amount and zero light amount (a normal light amount of 60%, a normal light amount of 30%, etc.) in the peripheral portion of the rattling portion in the two line segments 411 constituting the oblique line. A line segment 412 and a line segment 413, which are intermediate drawing areas to be drawn, are drawn. As a result, in this aspect, jaggy is reduced as compared with other aspects in which anti-aliasing processing is not performed.

  In particular, the Y-direction distance D4 of the intermediate drawing area (D4 is represented by the sum of the Y-direction distance D2 of the line segment 412 and the Y-direction distance D3 of the line segment 413) is the Y-direction distance D1 (line If it is sufficiently shorter than the distance in the Y direction of the minute 411, it is desirable that the drawing of the jaggy portion is difficult to blur. Therefore, it is particularly desirable if the Y-direction distance D2 and the Y-direction distance D3 are set at the specific distance described above.

  FIG. 16 is a diagram showing a drawing pattern in the overwriting process. In FIG. 15, a diagonal line 511 is a drawing area (area shown by diagonal hatching rising to the right) drawn with a normal light amount of 50%. In FIG. 15, a diagonal line 512 is a drawing area (area shown by slanting hatching downward to the right) that is offset by a specific amount in the X direction from the diagonal line 511 and drawn with a normal light amount of 50%. .

  In the overwriting process, partial drawing data is generated for each of the diagonal lines 511 and 512 that are offset by a specific amount in the X direction and have overlapping portions, and the light amount of the light source is divided for each partial drawing data. The drawing process is performed sequentially. As a result, in this aspect, dark drawing processing is executed in the overlapping portion (the portion on the center side in the X direction in the drawing region), and thin drawing processing is executed in the portion not overlapping (the portion on the both ends in the X direction in the drawing region). Thus, jaggies are reduced as compared with other modes in which the overwriting process is not executed.

<2 Modification>
Although the embodiment of the present invention has been described above, the present invention can be modified in various ways other than those described above without departing from the spirit of the present invention.

  As the pattern formed on the upper surface of the substrate W, various patterns having at least two line segments that are planar and have different angles are employed in addition to the patterns shown in the processing examples 1 to 3 described above. sell. In particular, the circuit pattern is generally planar and has at least two line segments with different angles, and is a pattern suitable for application of the present invention.

  In the above embodiment, in the selection step, the mode is described in which the operator inputs the condition specifying information and the control unit 70 selects the target graphic element according to the input condition specifying information. It is not something that can be done. For example, in the selection step, the operator of the apparatus inputs line segment specifying information for directly specifying the target graphic element to the input unit, and the control unit 70 selects the target graphic element according to the input specific information. An aspect may be sufficient. In this case, as an input mode of the line segment specifying information by the operator, an object graphic element (for example, line segments 111 to 113) is selected from the patterns (for example, pattern Pa10 shown in FIG. 6) displayed on the display unit. The aspect selected by input devices, such as these, is mentioned.

  Moreover, although the processing example 1-the processing example 3 of the said embodiment demonstrated the aspect in which all the graphic elements which comprise a pattern were selected as an object graphic element, it is not restricted to this. A mode in which a part of the graphic elements constituting the pattern is selected as the target graphic element may be used.

  Moreover, although the said embodiment demonstrated the aspect in which a classification | category process was automatically performed by running the program previously recorded on the recording device of the control part 70, it is not restricted to this. The classification process may be performed in accordance with an operation input from an operator of the apparatus.

  In the above embodiment, the stage 10 moves the substrate W in the XY plane so that the relative movement between the substrate W and the optical head unit 50 and the relative movement between the substrate W and the alignment camera 60 are described. However, it is not limited to this. For example, a moving mechanism that moves the optical head unit 50 in the XY plane and a moving mechanism that moves the alignment camera 60 in the XY plane may be provided.

  Although the drawing apparatus and the drawing method according to the embodiment and the modifications thereof have been described above, these are examples of the preferred embodiment of the present invention and do not limit the scope of implementation of the present invention. Within the scope of the invention, the present invention can be freely combined with each embodiment, modified with any component in each embodiment, or omitted with any component in each embodiment.

DESCRIPTION OF SYMBOLS 10 Stage 20 Stage moving mechanism 30 Position parameter measuring mechanism 50 Optical head part 56 GLV element 60 Alignment camera 70 Control part 100 Drawing apparatus 110 Substrate storage cassette 120 Transfer robot W Substrate Pa10-Pa13, Pa17, Pa18, Pa20-Pa23, Pa27, Pa28, Pa30 to Pa32, Pa37 Patterns 111 to 113, 211 to 215, 311 to 314, 411 to 413 Line segment 511, 512 Diagonal line

Claims (17)

A drawing device for drawing a planar pattern having a plurality of graphic elements on a main surface of a substrate,
A holding unit for holding the substrate;
A rotating unit that rotates the substrate held by the holding unit around an axis orthogonal to the main surface;
A transport unit configured to transport the substrate held by the holding unit along a first direction parallel to the main surface;
A drawing unit that spatially modulates light emitted from a light source and irradiates the modulated light to a region extending in a second direction perpendicular to the first direction in a plane along the main surface;
A data processing unit for executing data processing on design data including the pattern;
With
The data processing unit
A selection unit for selecting at least two line segments from the plurality of graphic elements;
A classifying unit that classifies the at least two line segments into two or more line segment groups according to an angle characteristic of each line segment;
A partial drawing data generation unit that generates two or more partial drawing data corresponding to each of the two or more line segment groups;
For each of the two or more line segment groups, a data rotation unit that rotates the partial drawing data corresponding to the line segment group around the axis so that the main line segment direction of the line segment group matches the first direction; ,
Have
For each of the two or more line segment groups,
The substrate is rotated around the axis by the rotating unit so that the line segment direction of the line segment group drawn on the main surface matches the first direction, and the substrate is conveyed in the first direction. A drawing apparatus that performs drawing processing based on the partial drawing data. The drawing apparatus according to claim 1,
A plurality of angular sections each having a finite angular width are defined for declination on a two-dimensional polar coordinate parallel to the principal surface,
The classifying unit classifies a plurality of line segments belonging to the same angle segment into the same line segment group. The drawing apparatus according to claim 1 or 2, wherein
The classification unit classifies a plurality of line segments orthogonal to each other into the same line segment group. A drawing apparatus according to any one of claims 1 to 3,
The drawing apparatus, wherein the drawing process includes an anti-aliasing process as a process to be executed for a graphic element having a portion extending in a direction that does not match the first direction among the plurality of graphic elements. The drawing apparatus according to any one of claims 1 to 4,
The drawing process includes an overwriting process as a process executed for a graphic element having a portion extending in a direction not matching the first direction among the plurality of graphic elements,
In the overwriting process, a plurality of partial drawing data offset by a specific amount in the second direction and having overlapping portions are generated, and the light quantity of the light source is divided sequentially for each of the plurality of partial drawing data. A drawing apparatus characterized by performing drawing processing. A drawing apparatus according to any one of claims 1 to 5,
An input unit for receiving an operation input of condition specifying information for specifying a resolution condition and a line width condition required in the drawing process;
With
The drawing device, wherein the selection unit specifies the at least two line segments with reference to the condition specifying information, and selects the at least two line segments. A drawing apparatus according to any one of claims 1 to 5,
An input unit for receiving an operation input of line segment specifying information for directly specifying each of the at least two line segments;
With
The drawing device, wherein the selection unit selects the at least two line segments according to the line segment specifying information. A drawing apparatus according to any one of claims 1 to 7,
A drawing apparatus, wherein spatial modulation is performed using a GLV (Grating Light Valve) element. The drawing apparatus according to claim 1, wherein:
The drawing apparatus, wherein the pattern is a circuit pattern having at least two line segments that are planar and have different angles. A drawing method for drawing a planar pattern having a plurality of graphic elements on a main surface of a substrate,
A selection step of selecting at least two line segments from the plurality of graphic elements;
A classification step of classifying the at least two line segments into two or more line segment groups according to the angle characteristics of each line segment;
A partial drawing data generation step of generating two or more partial drawing data corresponding to each of the two or more line segment groups based on the design data including the pattern;
For each of the two or more line segment groups, the partial drawing data corresponding to the line group group is rotated around an axis orthogonal to the main surface so that the main line segment direction of the line segment group matches the first direction. Data rotation process,
The light emitted from the light source is spatially modulated, and the modulated light is irradiated onto a region extending in a second direction perpendicular to the first direction within the plane along the main surface, and the substrate of the substrate to be held and conveyed A drawing step of drawing the pattern on the main surface;
With
The drawing step includes
As a step of sequentially executing each of the two or more line segment groups,
A substrate rotation step of rotating the substrate about the axis so that the line segment direction of the line segment group drawn on the main surface matches the first direction;
A unit drawing step for carrying out drawing processing based on the partial drawing data on the main surface while transporting the substrate in the first direction parallel to the main surface;
A drawing method characterized by comprising: The drawing method according to claim 10, wherein
A plurality of angular sections each having a finite angular width are defined for declination on a two-dimensional polar coordinate parallel to the principal surface,
In the classification step, a plurality of line segments belonging to the same angle segment are classified into the same line segment group. The drawing method according to claim 10 or 11,
In the classification step, a plurality of line segments orthogonal to each other are classified into the same line group. A drawing method according to any one of claims 10 to 12,
The drawing method, wherein the drawing step includes an anti-aliasing process as a process to be executed for a graphic element having a portion extending in a direction that does not match the first direction among the plurality of graphic elements. . A drawing method according to any one of claims 10 to 13,
The drawing step has an overwriting process as a process to be executed on a graphic element having a portion extending in a direction not matching the first direction among the plurality of graphic elements,
In the overwriting process, a plurality of partial drawing data offset by a specific amount in the second direction and having overlapping portions are generated, and the light quantity of the light source is divided sequentially for each of the plurality of partial drawing data. A drawing method characterized by performing drawing processing. The drawing method according to any one of claims 10 to 14,
In the selection step, after setting the resolution condition and the line width condition required in the drawing step, the at least two line segments are specified with reference to the resolution condition and the line width condition, and the at least two lines A drawing method characterized by being a step of selecting minutes. A drawing method according to any one of claims 10 to 15,
In the drawing process, the spatial modulation is performed using a GLV (Grating Light Valve) element. A drawing method according to any one of claims 10 to 16, wherein
The drawing method, wherein the pattern is a circuit pattern having at least two line segments that are planar and have different angles.

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