JP2016069667A - Regulation member for deposition, and deposition apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a regulation member for deposition capable of miniaturizing a device, and depositing precisely on a surface desired to be deposited of a member to be deposited.SOLUTION: A regulation member 83 for deposition, which is mountable at a prescribed angle of on a fly part 81a of a deposition source 8 for flying a deposition material, regulates the deposition material flown from the fly part 81a of the deposition source 8 within a prescribed range from the deposition source 8.SELECTED DRAWING: Figure 5

Description

  The present invention relates to a vapor deposition regulating member used when forming a film by oblique vapor deposition by vacuum vapor deposition, and a vapor deposition apparatus using the same.

  2. Description of the Related Art Conventionally, there is a vapor deposition apparatus that is installed so that a vapor deposition source and a surface to be deposited face each other in order to selectively form a film on a surface of a member to be vapor deposited.

JP 2008-40025 A

  However, in the vapor deposition apparatus disclosed in Patent Document 1, the vapor deposition apparatus is tilted so that the vapor deposition source and the surface to be formed are opposed to each other, so that the vapor deposition apparatus is increased in size in the vertical direction. Further, there is a possibility that the vapor deposition material may fly so as to diffuse from the vapor deposition source, and there is a possibility that the vapor deposition may be performed on the surface where the film is not desired to be formed.

  The present invention provides a vapor deposition regulating member and a vapor deposition apparatus that can achieve downsizing of the apparatus and can be vapor-deposited accurately on the surface of the vapor deposition member to be formed.

The vapor deposition regulating member according to the present invention for achieving the above object is
It can be attached at a predetermined angle to the flying part of the vapor deposition source for flying the vapor deposition material,
The flying range of the vapor deposition material that has flown from the flying portion of the vapor deposition source is restricted to a predetermined range.

In addition, the evaporation regulating member according to the present invention is
An inclined surface formed on the surface of the base material having the front and back surfaces and inclined with respect to the back surface of the base material; and a reflective surface inclined with respect to the other surface of the base material and forming the inclined surface and the apex angle The flying range of the vapor deposition material is regulated so that a larger amount of vapor is deposited on the reflecting surface than the inclined surface of the plurality of prisms.

In addition, the evaporation regulating member according to the present invention is
The following conditional expression is satisfied.
FP ≦ FH × (sinφ1 × cosφ2−sinφ2 × cosφ1) / (cosφ1 × cosφ2)
φ2 = φ3-90 °
φ1> φ2
However,
FP is the pitch of the regulating member (mm),
FH is the height (mm) from the flying portion of the regulating member,
φ1 is the angle (Deg) of the regulating member with respect to the direction perpendicular to the flying part,
φ2 is the minimum angle (Deg) that can be deposited with respect to the direction perpendicular to the flying part,
φ3 is the angle of the inclined surface with respect to the back surface of the substrate (Deg),
It is.

Moreover, the vapor deposition apparatus according to the present invention includes:
The vapor deposition source;
The deposition regulating member;
It is characterized by providing.

Moreover, the vapor deposition apparatus according to the present invention includes:
The deposition source has a first deposition source and a second deposition source disposed within the width of the substrate,
The vapor deposition regulating member is:
A first vapor deposition regulating member extending at a first angle from the first vapor deposition source;
A second vapor deposition regulating member extending from the second vapor deposition source at a second angle different from the first angle;
It is characterized by having.

Moreover, the vapor deposition apparatus according to the present invention includes:
The first vapor deposition source and the second vapor deposition source are arranged so as to be shifted in a direction parallel to the vertical plane.

Moreover, the vapor deposition apparatus according to the present invention includes:
The perpendicular plane is a center plane of the width of the substrate.

Moreover, the vapor deposition apparatus according to the present invention includes:
The first vapor deposition restricting member and the second vapor deposition restricting member have a symmetrical angle with respect to the center plane.

  ADVANTAGE OF THE INVENTION According to this invention, while achieving size reduction of an apparatus, it becomes possible to provide the vapor deposition control member and vapor deposition apparatus which can be made to vapor-deposit exactly on the surface to form into a vapor deposition member.

The lighting film of 1st Embodiment is shown. The metal mold forming process of the manufacturing method of the lighting film of a 1st embodiment is shown. The figure which expanded a part of base material and prism of FIG. 2 is shown. The vapor deposition process of the manufacturing method of the lighting film of 1st Embodiment is shown. The width direction sectional drawing at the time of the vapor deposition process of the manufacturing method of the lighting film of 1st Embodiment is shown. The top view at the time of the vapor deposition process of the manufacturing method of the lighting film of 1st Embodiment is shown. The control member for vapor deposition of a 1st embodiment is shown. 1 shows one unit prism of the daylighting film of the first embodiment. The state after the vapor deposition process of the manufacturing method of the lighting film of 1st Embodiment is shown. The lighting film of 2nd Embodiment is shown. The width direction sectional drawing at the time of the vapor deposition process of the manufacturing method of the lighting film of 2nd Embodiment is shown. The top view at the time of the vapor deposition process of the manufacturing method of the lighting film of 2nd Embodiment is shown. The lighting film of 3rd Embodiment is shown. The width direction sectional drawing at the time of the vapor deposition process of the manufacturing method of the lighting film of 3rd Embodiment is shown. The top view at the time of the vapor deposition process of the manufacturing method of the lighting film of 3rd Embodiment is shown.

  Hereinafter, the daylighting film 1 according to the present invention will be described with reference to the drawings.

  FIG. 1 shows the daylighting film of this embodiment.

  The daylighting film 1 of the first embodiment includes a base material 2 having front and back surfaces, a prism 3 formed on the surface 2a of the base material 2, a reflective film 4 formed on one surface of the prism 3, and the prism 3. An embedding unit 5 to be managed and a protection unit 6 covering the embedding unit 5 are provided.

  The substrate 2 is preferably a transparent film-like resin. For example, a thermoplastic resin, a thermosetting resin, or the like may be used, or a transparent material such as glass may be used.

  The prism 3 is formed on the surface 2 a of the substrate 2 using a roll mold 7 described later. The prism 3 includes at least a first unit prism 31 formed in a first region W1 defined by the first plane VS1 and the second plane VS2 perpendicular to the back surface 2b of the substrate 2 and the width W direction, and the substrate 2. And a second unit prism 32 formed in the second region W2 defined by the fourth plane VS4 and the third plane VS3 perpendicular to the width W direction. In the first embodiment, the prism 3 includes a plurality of first unit prisms 31 formed on one side and a plurality of second units formed on the other side with respect to the center plane CS in the width W direction of the base material 2. And a prism 32. The base material 2 and the prism 3 are integrally formed.

  In the first embodiment, the reflective film 4 is formed on the surface of the first unit prism 31 and the second unit prism 32 on the center plane CS side. In the first embodiment, the reflecting film 4 is formed on the first reflecting surface 31 a and the second reflecting surface 32 a that form the steepest slope with respect to the base material 2 among the surfaces of the prism 3, and reflects light. To do. The first reflective film 41 is formed on the first reflective surface 31a, and the second reflective film 42 is formed on the second reflective surface 32a. The reflective film 4 is preferably formed by aluminum vapor deposition or the like, but may have other configurations as long as it reflects. Further, the first reflection film 41 and the second reflection film 42 may have different lengths, angles, and pitches. Furthermore, the reflective film 4 may have three or more different types.

  For example, only specular reflection may be used, or diffusion may be added to the specular reflection. However, when a large particle size particle is added for diffusion, the viewability deteriorates due to diffraction. Therefore, a small particle size is used, and the thickness of the reflective layer is preferably several μm or less.

  The reflective layer is preferably formed by an oblique vapor deposition method or a spray method. In the case of aluminum vapor deposition by the oblique vapor deposition method, a sufficient reflectance is obtained with a film thickness of 50 to 60 nm or more. In the spray method, the film thickness is preferably 10 μm or less and about several μm. In the spray method, diffuse reflection can be imparted by adding a filler having a small particle diameter. By adding diffuse reflection, it is possible to expect a reduction effect of rainbow-like color separation that occurs near the edge when the collected light is projected onto the ceiling or wall surface.

  The embedding part 5 is formed so as to embrace the prism 3. The embedding part 5 is preferably formed of a UV curable resin or the like. The embedding part 5 preferably has the same refractive index as that of the base material 2 and the prism 3, but may have a different refractive index as long as it is transparent.

  The protection unit 6 is formed so as to cover the embedding unit 5, and protects each part of the base material 2, the prism 3, the reflective film 4, and the embedding unit 5. In addition, you may abbreviate | omit the protection part 6 by giving the embedding part 5 a protective effect.

  Next, the manufacturing method of the lighting film 1 of 1st Embodiment is demonstrated.

  FIG. 2 shows a mold forming step of the daylighting film manufacturing method according to the first embodiment. FIG. 3 shows an enlarged view of a part of the substrate 2 and the prism 3 of FIG.

  In order to manufacture the daylighting film 1 of the first embodiment shown in FIG. 1, first, the prism 3 continuous with the base material 2 is integrally formed by the roll die 7.

  The prism 3 according to the first embodiment includes inclined surfaces 31b and 32b that are inclined with respect to the back surface 2b of the substrate 2, and a reflection that is inclined with respect to the back surface 2b of the substrate 2 and forms an apex angle with the inclined surfaces 31b and 32b. And surfaces 31a and 32a. As shown in FIG. 3, the prism 3 of the present embodiment forms the first reflection surface 31a of the first unit prism 31 with respect to the surface VS perpendicular to the back surface 2b of the substrate 2 at the first reflection angle α1, and the second The second reflection surface 32a of the unit prism 32 is formed at the second reflection angle α2. However, the right side of the drawing is a positive angle with respect to the plane VS perpendicular to the substrate 2 in FIG.

  In the prism 3 of the first embodiment, the first inclined surface 31b of the first unit prism 31 with respect to the surface VS perpendicular to the substrate 2 is formed at the first inclination angle β1, and the second inclination of the second unit prism 32 is formed. The surface 32b is formed at the second inclination angle β2. However, the right side of the drawing is a positive angle with respect to the plane VS perpendicular to the substrate 2 in FIG. That is, the apex angle of the first unit prism 31 is defined as a first reflection angle α1 + first inclination angle β1, and the apex angle of the second unit prism 32 is defined as second reflection angle α2 + second inclination angle β2.

  Furthermore, in the prism 3 of the first embodiment, the first unit prisms 31 are formed at the first pitch P1, and the second unit prisms 32 are formed at the second pitch P2. Further, the sum of the first region W1 in which the first unit prism 31 is formed and the second region W2 in which the second unit prism 32 is formed within the width W of the substrate 2 shown in FIG.

  FIG. 4 shows the vapor deposition process of the manufacturing method of the daylighting film of 1st Embodiment. FIG. 5: shows the cross section in the width direction at the time of the vapor deposition process of the manufacturing method of the daylighting film of 1st Embodiment. FIG. 6: shows the top view at the time of the vapor deposition process of the manufacturing method of the daylighting film of 1st Embodiment.

  In the manufacturing method of the daylighting film 1 of the first embodiment, vacuum aluminum vapor deposition is performed by the vapor deposition apparatus 10. The vapor deposition source 8 includes a first vapor deposition source 81 and a second vapor deposition source 82. The angle deposited from the first deposition source 81 is set to an angle corresponding to the first reflecting surface 31 a of the first unit prism 31. In addition, the angle deposited from the second deposition source 82 is set to an angle corresponding to the second reflecting surface 32 a of the second unit prism 32. The angle of vapor deposition is determined by a control plate (not shown) or the like.

  When the daylighting film 1 of the first embodiment is deposited, as shown in FIG. 5, at least a part of the first reflective film 41 of the first unit prism 31 is provided at an opposing position other than the first region W1. The second reflective film 42 of the second unit prism 32 is vapor-deposited from the vapor deposition source 81, and at least a part of the second reflective film 42 is vapor-deposited from the second vapor deposition source 82 provided at an opposing position other than the second region W2.

  In the first embodiment, the first reflective film 41 is formed on the other side of the first unit prism 31 in the width W direction, and the second reflective film 42 is formed on one side of the second unit prism 32 in the width W direction. . Therefore, the first deposition source 81 deposits the first reflective film 41 from one side of the first unit prism 31, and the second deposition source 82 deposits the second reflective film 42 from the other side of the second unit prism 32.

  The base material 2 on which the prism 3 is formed by a mold as shown in FIG. 2 is wound in a roller shape as shown in FIG. And the base material 2 wound by roller shape at the time of a vapor deposition process is pulled out in the direction of arrow D. A shield 9 is provided between the vapor deposition source 8 and the substrate 2. The shielding part 9 is formed with a first slit 91 and a second slit 92.

  The first slit 91 is formed at a position corresponding to a space connecting the first vapor deposition source 81 and the first reflective film 41 of the first unit prism 31. The second slit 92 is formed at a position corresponding to a space connecting the second vapor deposition source 82 and the second reflective film 42 of the second unit prism 32. The first slit 91 and the second slit 92 do not overlap with each other in the direction of the arrow D and the width W so that they do not interfere with each other at the time of vapor deposition, and are displaced in either direction.

  A first reflective film 41 is formed on the first reflecting surface 31 a of the first unit prism 31 through the first slit 91 from the flying portion 81 a of the first vapor deposition source 81 of the vapor deposition source 8. Further, the second reflecting surface 32 a of the second unit prism 32 is vapor-deposited from the flying portion 82 a of the second vapor deposition source 82 of the vapor deposition source 8 through the second slit 92, thereby forming the second reflective film 42.

  Here, the vapor deposition regulating members 81b and 82b for controlling the flight direction of the vapor deposition material from the vapor deposition source 8 during vapor deposition will be described.

  FIG. 7 shows the regulating members 81b and 82b for vapor deposition according to this embodiment. FIG. 8 shows one unit prism of the daylighting film 1 of the present embodiment. 7 and 8 show only the first vapor deposition source 81 and the first unit prism 31 as an example, but the second vapor deposition source 82 and the second unit prism 32 are similarly shown by being inverted. It is.

  The vapor deposition regulating members 81b and 82b according to the present embodiment are plate-like members such as fins attached to the flying portions 81a and 82a of the vapor deposition source 8. The vapor deposition regulating members 81b and 82b guide the flight direction of the vapor deposition material from the vapor deposition source 8 during vapor deposition. As shown in FIG. 5, the vapor deposition regulating members 81 b and 82 b of the present embodiment are vapor deposition materials from the vapor deposition source 8 to the first reflective surface 31 a and the second reflective surface 32 a of the prism 3 through the shielding portion 9. It is attached so that it can fly diagonally. The flying portions 81a and 82a and the back surface 2b of the base material 2 are parallel.

  In the first embodiment, the vapor deposition regulating members 81b and 82b are formed as a second vapor deposition regulating member 81b and a first vapor deposition regulating member 81b that are symmetrical with respect to the center plane CS. The first vapor deposition regulating member 81b and the second vapor deposition regulating member 82b are disposed at positions shifted from each other when viewed from the width W direction and the direction perpendicular to the width W direction. The vapor deposition regulating member 81b is attached to the second unit prism 32 side with respect to the central plane CS, and the second vapor deposition regulating member 82b is attached to the first unit prism 31 side with respect to the central plane CS.

Moreover, it is preferable that the vapor deposition regulating members 81b and 82b satisfy the following conditional expression.
FP ≦ FH × (sinφ1 × cosφ2−sinφ2 × cosφ1) / (cosφ1 × cosφ2)
φ2 = φ3-90 °
φ1> φ2
However,
FP is the pitch (mm) of the evaporation regulating members 81b and 82b,
FH is the height (mm) from the flying portions 81a, 82a of the evaporation regulating members 81b, 82b,
φ1 is the angle (Deg) of the evaporation regulating member 83 with respect to the direction perpendicular to the flying parts 81a, 82a,
φ2 is the minimum angle (Deg) at which deposition is possible with respect to the direction perpendicular to the flying parts 81a and 82a.
φ3 is the angle (Deg) of the inclined surface 32 with respect to the back surface of the substrate 2,
It is.

  In the vapor deposition process of the present embodiment, in consideration of the performance of the daylighting film 1, the first reflecting surface 31 a of the first prism 31 and the second reflecting surface 32 a of the second prism 32 are second as shown in FIG. 5. It is necessary to deposit more than the first inclined surface 31b and the second inclined surface 32b. Therefore, the vapor deposition material needs to be guided at a predetermined angle from the vapor deposition source 8 to the first reflective surface 31a and the second reflective surface 32a. The above conditional expression is for vapor deposition only on the first reflecting surface 31 a of the first prism 31 and the second reflecting surface 32 a of the second prism 32.

  As described above, by arranging the vapor deposition regulating members 81b and 82b, the flying range of the vapor deposition material can be regulated, and the vapor deposition material can be accurately adjusted to the first reflecting surface 31a of the first prism 31 and the second prism 32. It becomes possible to deposit only on the 2nd reflective surface 32a.

  FIG. 9 shows a state after the vapor deposition step of the daylighting film manufacturing method of the first embodiment.

  After the vapor deposition step, the prism 2 and the reflective film 4 are formed on the base material 2. In the first embodiment, the prism 3 is formed with a first unit prism 31 and a second unit prism 32 symmetrically with respect to the center plane CS having a width W. That is, the reflective film 4 is also formed with the first reflective film 41 and the second reflective film 42 symmetrically with respect to the center plane CS having the width W.

  Thus, by forming the prism 3 and the reflective film 4 symmetrically with respect to the center plane CS of the width W on the base material 2, the first unit prism 31 and the second unit prism 32 have the same shape. A mold can be used, and the vapor deposition angles from the first vapor deposition source 81 and the second vapor deposition source 82 can be made equal when the first reflective film 41 and the second reflective film 42 are formed. Therefore, the daylighting film 1 can be easily manufactured at low cost.

  Further, in order to form the prism 3 and the reflective film 4 on the base material 2, for example, after the first unit prism 31 is formed, the second unit prism 32 is made the same mold only by re-installing the base material 2. 7 can be formed. Similarly, for example, after the first reflective film 41 is formed by vapor deposition from the first vapor deposition source 81, the second reflective film 42 may be formed by vapor deposition from the first vapor deposition source 81. Therefore, the metal mold 7 and the vapor deposition source 8 can be saved, and the daylighting film 1 can be manufactured at a lower cost.

  In the first embodiment, two types of prisms 3 and reflection film 4 are formed, but three or more types of prisms 3 and reflection film 4 may be formed. By forming at least two or more types of prisms 3 and the reflective film 4, it is possible to reflect the collected light in more directions. When the daylighting film 1 is attached to a window, it reflects light from a high summer angle to the ceiling away from the window and reflects light from a low angle in the morning and evening and winter so that it does not enter the interior of the room. It becomes possible to make it.

  After such a vapor deposition process, the daylighting film 1 of the first embodiment is completed by covering the prism 3 with the resin embedding unit 4 shown in FIG. 1 and further protecting the embedding unit 4 with the protection unit 5. To do.

Here, the Example of the lighting film 1 of this embodiment is demonstrated compared with a comparative example. Table 1 below shows the first inclined surface 31b and the second inclined surface 32b in Examples 1 to 4 that satisfy the conditional expression of the present embodiment and Comparative Examples 1 and 2 that do not satisfy the conditional expression of the present embodiment. Deposition state is shown.

  Thus, as in Examples 1 to 4, when the conditional expression is satisfied, there is no vapor deposition on the inclined surfaces 31b and 32b of the prism 3, and vapor deposition is performed only on the reflective surfaces 31a and 32a. When the conditional expression is not satisfied as in the case of 1 and 2, vapor deposition is performed on the inclined surfaces 31 b and 32 b of the prism 3.

  FIG. 10 shows the daylighting film 1 of the second embodiment.

  The daylighting film 1 according to the second embodiment includes two unit prisms in a first area W1 and a second area W2 defined by a back surface 2b of the base material 2 and a first plane VS1 to a fourth plane VS4 perpendicular to the width W direction. Each group is formed. The first region W1 and the second region W2 are arranged in order from one to the other in the width W direction.

  In the second embodiment, the first unit prism 31 is formed in the first region W1 defined by the first plane VS1 and the second plane VS2, and the second unit prism 32 is defined by the second plane VS2 and the third plane VS3. The second region W2 is formed.

  At least one of the first unit prism 31 and the second unit prism 32 may have a different shape, but all may have different shapes. Further, the reflective film 41 of the first unit prism 31 and the reflective film 42 of the second unit prism 32 may be formed on either side in the width W direction.

  FIG. 11: shows the cross section in the width direction at the time of the vapor deposition process of the manufacturing method of the daylighting film of 2nd Embodiment.

  When the daylighting film 1 of the second embodiment is deposited, as shown in FIG. 11, at least a part of the first reflective film 41 of the first unit prism 31 is provided at an opposing position other than the first region W1. The second reflective film 42 of the second unit prism 32 is vapor-deposited from the vapor deposition source 81, and at least a part of the second reflective film 42 is vapor-deposited from the second vapor deposition source 82 provided at an opposing position other than the second region W2.

  In the second embodiment, the first reflective film 41 is formed on the other side of the first unit prism 31 in the width W direction, the second reflective film 42 is formed on one side of the second unit prism 32 in the width W direction, The third reflective film 43 is formed on one side of the third unit prism 33 in the width W direction. Therefore, the first deposition source 81 deposits the first reflective film 41 from one side of the first unit prism 31, and the second deposition source 82 deposits the second reflective film 42 from the other side of the second unit prism 32.

  The vapor deposition regulating members 81b and 82b according to the second embodiment are plate-shaped members such as fins attached to the flying portions 81a and 82a of the vapor deposition source 8. The vapor deposition regulating members 81b and 82b guide the flight direction of the vapor deposition material from the vapor deposition source 8 during vapor deposition. As shown in FIG. 11, the vapor deposition regulating members 81 b and 82 b of the present embodiment are vapor deposition materials from the vapor deposition source 8 toward the first reflective surface 31 a and the second reflective surface 32 a of the prism 3 through the shielding portion 9. It is attached so that it can fly diagonally. The flying portions 81a and 82a and the back surface 2b of the base material 2 are parallel.

  In the second embodiment, the vapor deposition regulating members 81b and 82b include a first vapor deposition regulating member 81b and a second vapor deposition regulating member 82b oriented in a different direction from the first vapor deposition regulating member 81b. The first vapor deposition regulating member 81b and the second vapor deposition regulating member 82b are disposed at positions shifted from the width W direction and the direction perpendicular to the width W direction, and the first vapor deposition regulating member 81b The second deposition prism regulating member 82b is attached to the first unit prism 31 side with respect to the center surface CS.

  FIG. 12: shows the top view at the time of the vapor deposition process of the manufacturing method of the daylighting film of 2nd Embodiment.

  In the second embodiment, a shielding part 9 is provided between the vapor deposition source 8 and the substrate 2. The shield 9 is formed with a first slit 91 and a second slit 92.

  The first slit 91 is formed at a position corresponding to a space connecting the first vapor deposition source 81 and the first reflective film 41 of the first unit prism 31. The second slit 92 is formed on the side corresponding to the space connecting the second vapor deposition source 82 and the second reflection film 42 of the second unit prism 32. The first slit 91 and the second slit 92 are arranged shifted in the direction of arrow D so that they do not interfere with each other during vapor deposition.

  That is, the first reflective surface 31 a of the first unit prism 31 is vapor-deposited from the flying portion 81 a of the first vapor deposition source 81 of the vapor deposition source 8 through the first slit 91, thereby forming the first reflective film 41. . Further, the second reflecting surface 32 a of the second unit prism 32 is vapor-deposited from the flying portion 82 a of the second vapor deposition source 82 of the vapor deposition source 8 through the second slit 92, thereby forming the second reflective film 42.

  FIG. 13 shows the daylighting film 1 of the third embodiment.

  The daylighting film 1 of the third embodiment has three unit prisms in the first region W1 to the third region W3 defined by the back surface 2b of the base material 2 and the first plane VS1 to the fifth plane VS5 perpendicular to the width W direction. Each group is formed. The first region W1 to the third region W3 are arranged in order from one to the other in the width W direction.

  In the third embodiment, the first unit prism 31 is formed in the first region W1 defined by the first plane VS1 and the second plane VS2, and the second unit prism 32 is defined by the second plane VS2 and the third plane VS3. The third unit prism 33 is formed in the third region W3 defined by the fourth plane VS4 and the fifth plane VS5.

  At least one of the first unit prism 31, the second unit prism 32, and the third unit prism 33 may have a different shape, but may have a different shape. Further, the reflection film 41 of the first unit prism 31, the reflection film 42 of the second unit prism 32, and the reflection film 43 of the third unit prism 33 may be formed on either side in the width W direction.

  FIG. 14: shows the width direction sectional drawing at the time of the vapor deposition process of the manufacturing method of the lighting film of 3rd Embodiment.

  When the daylighting film 1 of the third embodiment is deposited, as shown in FIG. 12, at least a part of the first reflecting film 41 of the first unit prism 31 is provided at an opposing position other than the first region W1. The second reflective film 42 of the second unit prism 32 is vapor-deposited from the vapor deposition source 81, and at least a part of the second reflective film 42 is vapor-deposited from the second vapor deposition source 82 provided at an opposing position other than the second region W2. The third reflective film 43 is vapor-deposited from a third vapor deposition source 83 provided at least at a part of the third reflective film 43 at an opposing position other than the third region W3.

  In the third embodiment, the first reflective film 41 is formed on the other side of the first unit prism 31 in the width W direction, the second reflective film 42 is formed on one side of the second unit prism 32 in the width W direction, The third reflective film 43 is formed on one side of the third unit prism 33 in the width W direction. Therefore, the first deposition source 81 deposits the first reflective film 41 from one side of the first unit prism 31, the second deposition source 82 deposits the second reflective film 42 from the other side of the second unit prism 32, and The third deposition source 83 deposits the third reflective film 43 from the other side of the third unit prism 33.

  The vapor deposition regulating members 81b, 82b, 83b of the third embodiment are plate-shaped members such as fins attached to the flying portions 81a, 82a, 83a of the vapor deposition source 8. The vapor deposition regulating members 81b, 82b, 83b guide the flight direction of the vapor deposition material from the vapor deposition source 8 during vapor deposition. As shown in FIG. 14, the vapor deposition regulating members 81 b, 82 b, and 83 b of the present embodiment are connected to the first reflection surface 31 a, the second reflection surface 32 a, and the first reflection surface of the prism 3 from the vapor deposition source 8 through the shielding portion 9. 3 It attaches so that vapor deposition material may fly diagonally toward the reflective surface 33a, respectively. The flying portions 81a, 82a, 83a and the back surface 2b of the base material 2 are parallel.

  In the third embodiment, the vapor deposition regulating members 81b, 82b, and 83b include a first vapor deposition regulating member 81b, a second vapor deposition regulating member 82b that is directed in a different direction from the first vapor deposition regulating member 81b, A first vapor deposition regulating member 81b, a second vapor deposition regulating member 82b, and a third vapor deposition regulating member 83b oriented in a different direction from the first vapor deposition regulating member 81b and the second vapor deposition regulating member 82b. And the 3rd vapor deposition control member 83b is arrange | positioned in the position shifted | deviated seeing from the direction perpendicular | vertical to the width W direction.

  FIG. 15: shows the top view at the time of the vapor deposition process of the manufacturing method of the lighting film of 3rd Embodiment.

  In the third embodiment, a shielding part 9 is provided between the vapor deposition source 8 and the substrate 2. The shield 9 is formed with a first slit 91, a second slit 92, and a third slit 93.

  The first slit 91 is formed at a position corresponding to a space connecting the first vapor deposition source 81 and the first reflective film 41 of the first unit prism 31. The second slit 92 is formed on the side corresponding to the space connecting the second vapor deposition source 82 and the second reflection film 42 of the second unit prism 32. Further, the third slit 93 is formed on the side corresponding to the space connecting the third vapor deposition source 83 and the third reflection film 43 of the third unit prism 33. The first slit 91, the second slit 92, and the third slit 93 are displaced in the direction of the arrow D so that they do not interfere with each other during vapor deposition.

  That is, the first reflective surface 31 a of the first unit prism 31 is vapor-deposited from the flying portion 81 a of the first vapor deposition source 81 of the vapor deposition source 8 through the first slit 91, thereby forming the first reflective film 41. . Further, the second reflecting surface 32 a of the second unit prism 32 is vapor-deposited from the flying portion 82 a of the second vapor deposition source 82 of the vapor deposition source 8 through the second slit 92, thereby forming the second reflective film 42. In addition, the third reflecting surface 33 a of the third unit prism 33 is vapor-deposited from the flying portion 83 a of the third vapor deposition source 83 of the vapor deposition source 8 through the third slit 93 to form the third reflective film 43.

  As described above, according to the vapor deposition regulating members 81b and 82b of the present embodiment, the vapor deposition material 8 can be attached at a predetermined angle to the flying portions 81a and 82a of the vapor deposition source 8, and the flying portions 81a and 82a of the vapor deposition source 8 can be attached. Since the flying range of the vapor deposition material flying from 82a is restricted to a predetermined range, it is possible to reduce the size of the apparatus and to accurately deposit on the surface of the member to be vapor deposited.

  Further, according to the vapor deposition regulating members 81b and 82b of the present embodiment, the inclined surfaces 31b and 32b that are formed on the surface of the substrate 2 having the front and back surfaces 2a and 2b and are inclined with respect to the back surface 2b of the substrate 2; The reflecting surfaces 31a and 32a are more inclined than the inclined surfaces 31b and 32b of the plurality of prisms 3 having the reflecting surfaces 31a and 32a that are inclined with respect to the back surface 2b of the substrate 2 and form the inclined surfaces 31b and 32b. Since the flying range of a large amount of vapor deposition material is regulated, the vapor deposition material can be accurately vapor-deposited on the reflecting surfaces 31a and 32a.

Further, according to the vapor deposition regulating members 81b and 82b of the present embodiment, the following conditional expression is satisfied, so that it is possible to deposit the vapor deposition material on the reflecting surfaces 31a and 32a more accurately.
FP ≦ FH × (sinφ1 × cosφ2−sinφ2 × cosφ1) / (cosφ1 × cosφ2)
φ2 = φ3-90 °
φ1> φ2
However,
FP is the pitch (mm) of the evaporation regulating member 83,
FH is the height (mm) from the flying portions 81a and 82a of the vapor deposition regulating member 83,
φ1 is the angle (Deg) of the evaporation regulating member 83 with respect to the direction perpendicular to the flying parts 81a, 82a,
φ2 is the minimum angle (Deg) at which deposition is possible with respect to the direction perpendicular to the flying parts 81a, 82a,
φ3 is the angle (Deg) of the inclined surfaces 31b, 32b with respect to the back surface 2b of the base material 2,
It is.

  Moreover, according to the vapor deposition apparatus 10 of this embodiment, since the vapor deposition source 8 and the vapor deposition regulating members 81b and 82b are provided, the vapor deposition apparatus 10 can be appropriately vapor-deposited on the surface of the vapor deposition member to be deposited. It becomes.

  Moreover, according to the vapor deposition apparatus 10 of this embodiment, the vapor deposition source 8 has the 1st vapor deposition source 81 and the 2nd vapor deposition source 82 which are arrange | positioned in the width | variety of the base material 2, and the vapor deposition control members 81b and 82b. Includes a first vapor deposition regulating member 81b extending from the first vapor deposition source 81 at a first angle, and a second vapor deposition regulating member 82b extending from the second vapor deposition source 82 at a second angle different from the first angle. Therefore, it is possible to deposit the prism 3 accurately on the surface on which the prism 3 is to be formed.

  Moreover, according to the vapor deposition apparatus 10 of this embodiment, since the 1st vapor deposition source 81 and the 2nd vapor deposition source 82 are arrange | positioned and shifted | deviated in the direction parallel to a perpendicular | vertical plane, each vapor deposition material of the time of vapor deposition is arranged. Interference can be suppressed.

  Moreover, according to the vapor deposition apparatus 10 of this embodiment, since the perpendicular plane VS is the center plane CS having the width W of the base material 2, it can be easily manufactured at low cost.

  Moreover, according to the vapor deposition apparatus 10 of this embodiment, since the 1st vapor deposition control member 81b and the 2nd vapor deposition control member 82b have a symmetrical angle with respect to the center plane CS, they are easily manufactured at low cost. It becomes possible.

  As described above, the vapor deposition regulating member 83 and the vapor deposition apparatus 10 have been described based on several embodiments. However, the present invention is not limited to these embodiments, and various combinations or modifications are possible.

DESCRIPTION OF SYMBOLS 1 ... Daylight film 2 ... Base material 3 ... Prism 4 ... Reflective film 5 ... Enveloping part 6 ... Protection part 7 ... Roll metal mold | die 8 ... Deposition source 83 ... Deposition control member 9 ... Shielding part 10 ... Deposition apparatus

Claims (8)

It can be attached at a predetermined angle to the flying part of the vapor deposition source for flying the vapor deposition material,
A vapor deposition regulating member that regulates a flying range of the vapor deposition material that has jumped from a flying portion of the vapor deposition source to a predetermined range. An inclined surface formed on the surface of a base material having front and back surfaces and inclined with respect to the back surface of the base material; and a reflective surface inclined with respect to the back surface of the base material and forming the inclined surface and an apex angle. 2. The vapor deposition regulating member according to claim 1, wherein a flying range of the vapor deposition material is regulated so that a larger amount of vapor deposition is performed on the reflecting surface than the inclined surfaces of the plurality of prisms. The vapor deposition regulating member according to claim 2, wherein the following conditional expression is satisfied.
FP ≦ FH × (sinφ1 × cosφ2−sinφ2 × cosφ1) / (cosφ1 × cosφ2)
φ2 = φ3-90 °
φ1> φ2
However,
FP is the pitch of the regulating member (mm),
FH is the height (mm) from the flying portion of the regulating member,
φ1 is the angle (Deg) of the regulating member with respect to the direction perpendicular to the flying part,
φ2 is the minimum angle (Deg) that can be deposited with respect to the direction perpendicular to the flying part,
φ3 is the angle of the inclined surface with respect to the back surface of the substrate (Deg),
It is. The vapor deposition source;
A vapor deposition regulating member according to any one of claims 1 to 3,
A vapor deposition apparatus comprising: The deposition source has a first deposition source and a second deposition source disposed within the width of the substrate,
The vapor deposition regulating member is:
A first vapor deposition regulating member extending at a first angle from the first vapor deposition source;
A second vapor deposition regulating member extending from the second vapor deposition source at a second angle different from the first angle;
The vapor deposition apparatus according to claim 4, comprising: The vapor deposition apparatus according to claim 5, wherein the first vapor deposition source and the second vapor deposition source are arranged to be shifted in a direction parallel to the vertical plane. The said vertical plane is a center plane of the width | variety of the said base material, The vapor deposition apparatus of Claim 5 or 6 characterized by the above-mentioned. The vapor deposition apparatus according to claim 7, wherein the first vapor deposition restriction member and the second vapor deposition restriction member have an angle symmetric with respect to the center plane.

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