JP2016051843A - Three-dimensional laminated wiring board, electronic apparatus, information processing system, and information communication system - Google Patents

Three-dimensional laminated wiring board, electronic apparatus, information processing system, and information communication system Download PDF

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JP2016051843A
JP2016051843A JP2014176935A JP2014176935A JP2016051843A JP 2016051843 A JP2016051843 A JP 2016051843A JP 2014176935 A JP2014176935 A JP 2014176935A JP 2014176935 A JP2014176935 A JP 2014176935A JP 2016051843 A JP2016051843 A JP 2016051843A
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wiring board
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processing system
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JP5993910B2 (en
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重信 関根
Shigenobu Sekine
重信 関根
池田 博明
Hiroaki Ikeda
博明 池田
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Napra Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a three-dimensional laminated wiring board, an electronic apparatus, an information processing system, and an information communication system that are capable of simply and reliably confirming that the three-dimensional laminated wiring board is adequately manufactured and implemented.SOLUTION: A three-dimensional laminated wiring board includes a board 1, wirings 311-326, and an authentication pattern Q. The wiring 311-326 are provided in the thickness direction of the board 1. The authentication pattern Q is provided on the board 1, and has the quality of material, shape, arrangement, structure or size that can be identified from the wirings 311-326 and the board 1.SELECTED DRAWING: Figure 1

Description

本発明は、3次元積層配線基板、電子機器、情報処理システム、及び、情報通信システムに係る。   The present invention relates to a three-dimensional multilayer wiring board, an electronic device, an information processing system, and an information communication system.

各種スケールの集積回路、各種半導体素子もしくはそのチップ等の電子デバイスにおいて、3次元回路配置を実現する手法として、回路基板に多数の貫通電極を設けるTSV(Through-Silicon-Via)技術を適用し、この回路基板の複数枚を積層した3次元積層配線基板が提案されている。TSV技術を用いた3次元積層配線基板についての先行技術文献としては、例えば、非特許文献1が知られている。   Applying TSV (Through-Silicon-Via) technology that provides a large number of through-electrodes on a circuit board as a technique to realize a three-dimensional circuit arrangement in various scales of integrated circuits, various semiconductor elements or electronic devices such as chips thereof, A three-dimensional multilayer wiring board in which a plurality of circuit boards are laminated has been proposed. For example, Non-Patent Document 1 is known as a prior art document regarding a three-dimensional multilayer wiring board using the TSV technology.

ところで、技術のグローバル化によって、3次元積層配線基板の製造プロセスがすべて信用できるとは限らない状況が生じている。製造プロセスにおいて、いわゆる「トロイの木馬」あるいは「バックドア」等の悪意のある回路が組み込まれる危険性がある。「トロイの木馬」とは、システムの誤動作を惹起させたり、或いは情報を持ち出す等を目的として、例えば、半導体チップ内のハードウェアを改変して不正な回路を組み込むことを指す。「バックドア」とは、例えば、コンピュータの機能を無許可で利用するために、コンピュータ内に密かに通信接続の機能を設けることを指す。   By the way, with the globalization of technology, a situation has arisen in which the manufacturing process of a three-dimensional multilayer wiring board is not always reliable. There is a risk of incorporating malicious circuits such as so-called “Trojan horses” or “back doors” in the manufacturing process. “Trojan horse” refers to, for example, modifying a hardware in a semiconductor chip to incorporate an illegal circuit for the purpose of causing a malfunction of the system or bringing out information. “Backdoor” refers to, for example, providing a function of communication connection secretly in a computer in order to use the function of the computer without permission.

「トロイの木馬」あるいは「バックドア」等の悪意のある回路が組み込まれる危険性を排除するためには、回路基板のそれぞれが、正当に製造され、実装されたものであることを、外部から確認できなければならない。   In order to eliminate the risk of incorporating malicious circuits such as “Trojan horses” or “back doors”, it is necessary to ensure that each circuit board is properly manufactured and mounted. Must be able to confirm.

そのような確認手段として、3次元積層構造を構成する各層のデバイスに、偽装不可能なID情報を組み込む技術(PUF Physical Unclonable Function)が活用されている。   As such a confirmation means, a technique (PUF Physical Unclonable Function) that incorporates ID information that cannot be impersonated into each layer of the devices constituting the three-dimensional stacked structure is utilized.

しかし、PUF技術を3次元積層構造に適用するには、情報読取系の外部接続が必要になる等、設計上の制約が多くなる等の難点を避けることができない。   However, in order to apply the PUF technology to a three-dimensional laminated structure, it is impossible to avoid difficulties such as an increase in design restrictions such as an external connection of an information reading system.

3次元LSI実装のためのTSV技術の研究開発動向(科学技術動向 2010年4月号)Research and development trends of TSV technology for 3D LSI packaging (Science and Technology Trends April 2010 issue)

本発明の課題は、LSIチップ等における誤作動及び情報漏洩等を防止する機能を有する電子回路システムの構築に極めて有用な先端技術を提供することである。   An object of the present invention is to provide an advanced technology that is extremely useful for constructing an electronic circuit system having a function of preventing malfunction and information leakage in an LSI chip and the like.

本発明の課題は、より具体的には、誤作動及び情報漏洩等の防止機能を有する電子機器構造の実現に寄与する3次元積層配線基板、電子機器、情報処理システム、及び、情報通信システムを提供することである。   More specifically, an object of the present invention is to provide a three-dimensional multilayer wiring board, an electronic device, an information processing system, and an information communication system that contribute to the realization of an electronic device structure having a function of preventing malfunction and information leakage. Is to provide.

本発明のもう一つの課題は、正当に製造され実装された真正品であることを、簡単、かつ、確実に確認し得る3次元積層配線基板、電子機器、情報処理システム、及び、情報通信システムを提供することである。   Another object of the present invention is to provide a three-dimensional multilayer wiring board, an electronic device, an information processing system, and an information communication system capable of easily and reliably confirming a genuine product that has been properly manufactured and mounted. Is to provide.

本発明の更にもう一つの課題は、正当に製造され実装されたものでないこと、すなわち、真正品ではなく、偽造品であることを、簡単、かつ、確実に確認し得る3次元積層配線基板、電子機器、情報処理システム、及び、情報通信システムを提供することである。   Yet another object of the present invention is to provide a three-dimensional multilayer wiring board that can easily and reliably confirm that the product is not properly manufactured and mounted, that is, not a genuine product but a counterfeit product, An electronic device, an information processing system, and an information communication system are provided.

上述した課題を解決するため、本発明に係る3次元積層配線基板は、基板と、配線と、認証パターンとを含む。前記配線は、前記基板に電気絶縁して設けられており、前記認証パターンは、前記基板に設けられ、前記配線及び前記基板から識別できる材質、形状、配置、構造又は寸法を有する。   In order to solve the above-described problem, a three-dimensional multilayer wiring board according to the present invention includes a board, wiring, and an authentication pattern. The wiring is provided on the substrate while being electrically insulated, and the authentication pattern is provided on the substrate and has a material, shape, arrangement, structure, or size that can be identified from the wiring and the substrate.

上述したように、本発明に係る3次元積層配線基板は、基板と、配線とを含み、配線は、基板に電気絶縁して設けられているから、TSV技術を適用し、3次元積層構造の実現に寄与することができる。   As described above, the three-dimensional multilayer wiring board according to the present invention includes a substrate and wiring, and the wiring is electrically insulated from the substrate. Therefore, the TSV technology is applied to form a three-dimensional multilayer structure. It can contribute to realization.

更に、本発明に係る3次元積層配線基板は、認証パターンを含む。この認証パターンは、前記基板に設けられ、前記配線及び前記基板から識別できる材質、形状、配置、構造又は寸法を有する。このような認証パターンは、外部観察によって、基板、配線、及び、絶縁部から区別して、確認することができる。よって、正当に製造され、実装された3次元積層配線基板であること、すなわち、真正の3次元積層配線基板であることを、外部観察によって、簡単、かつ、確実に確認し得る。   Furthermore, the three-dimensional multilayer wiring board according to the present invention includes an authentication pattern. This authentication pattern is provided on the substrate and has a material, shape, arrangement, structure, or size that can be identified from the wiring and the substrate. Such an authentication pattern can be confirmed separately from the substrate, the wiring, and the insulating portion by external observation. Therefore, it can be easily and reliably confirmed by external observation that it is a legitimately manufactured and mounted three-dimensional multilayer wiring board, that is, a genuine three-dimensional multilayer wiring board.

これは、正当に、製造もしくは実装されたものでないこと、すなわち、真正品ではなく、偽造品であることをも、簡単、かつ、確実に確認し得ることを意味する。認証パターンは、例えば、X線CT装置等を用いることにより、複数枚の配線基板を積層した3次元積層配線基板の状態で確認することができる。   This means that it can be easily and reliably confirmed that the product has not been manufactured or mounted properly, that is, it is not a genuine product but a forged product. The authentication pattern can be confirmed in a state of a three-dimensional laminated wiring board in which a plurality of wiring boards are laminated by using, for example, an X-ray CT apparatus.

本発明に係る3次元積層配線基板は、携帯によっては、そのまま電子機器として用いられ、もしくは、各種電子機器に組み込まれる。これらの電子機器は、情報処理システムや情報通信システム等の構成機器として用いられる。   The three-dimensional multilayer wiring board according to the present invention is used as an electronic device as it is depending on the mobile phone, or is incorporated into various electronic devices. These electronic devices are used as component devices such as information processing systems and information communication systems.

以上を要するに、本発明によれば、LSIチップ等における誤作動及び情報漏洩等を防止する機能を有する電子回路システムの構築に極めて有用な先端技術を提供することができる。   In summary, according to the present invention, it is possible to provide a cutting-edge technology that is extremely useful for the construction of an electronic circuit system having a function of preventing malfunction and information leakage in an LSI chip or the like.

上述したように、本発明によれば、次のような効果を得ることができる。
(a)3次元積層構造の実現に寄与する3次元積層配線基板、電子機器、情報処理システム、及び、情報通信システムを提供することができる。
(b)LSIチップ等における誤作動及び情報漏洩等を防止する機能を有する電子回路システムの構築に極めて有用な先端技術を提供ことができる。
(c)誤作動及び情報漏洩等の防止機能を有する電子機器構造の実現に寄与する3次元積層配線基板、電子機器、情報処理システム、及び、情報通信システムを提供することができる。
(d)正当に製造され実装された真正品であることを、簡単、かつ、確実に確認し得る3次元積層配線基板、電子機器、情報処理システム、及び、情報通信システムを提供することができる。
(e)正当に製造され実装されたものでないこと、すなわち、真正品ではなく、偽造品であることを、簡単、かつ、確実に確認し得る3次元積層配線基板、電子機器、情報処理システム、及び、情報通信システムを提供することができる。
As described above, according to the present invention, the following effects can be obtained.
(A) A three-dimensional multilayer wiring board, an electronic device, an information processing system, and an information communication system that contribute to the realization of a three-dimensional multilayer structure can be provided.
(B) It is possible to provide advanced technology that is extremely useful for the construction of an electronic circuit system having a function of preventing malfunction and information leakage in an LSI chip and the like.
(C) It is possible to provide a three-dimensional multilayer wiring board, an electronic device, an information processing system, and an information communication system that contribute to the realization of an electronic device structure having functions for preventing malfunction and information leakage.
(D) It is possible to provide a three-dimensional multilayer wiring board, an electronic device, an information processing system, and an information communication system that can easily and reliably confirm that the product is genuinely manufactured and mounted. .
(E) a three-dimensional multilayer wiring board, an electronic device, an information processing system, capable of easily and reliably confirming that the product is not properly manufactured and mounted, that is, not a genuine product but a counterfeit product; And an information communication system can be provided.

本発明の他の目的、構成及び利点については、添付図面を参照し、更に詳しく説明する。但し、添付図面は、単なる例示に過ぎない。   Other objects, configurations and advantages of the present invention will be described in more detail with reference to the accompanying drawings. However, the attached drawings are merely examples.

本発明に係る3次元積層配線基板に用いられる配線基板の一部を示す斜視図である。It is a perspective view which shows a part of wiring board used for the three-dimensional laminated wiring board which concerns on this invention. 本発明に係る3次元積層配線基板に用いられる認証パターンの一例を拡大して示す斜視図である。It is a perspective view which expands and shows an example of the authentication pattern used for the three-dimensional laminated wiring board which concerns on this invention. 本発明に係る3次元積層配線基板に用いられる配線の一例を拡大して示す斜視図である。It is a perspective view which expands and shows an example of the wiring used for the three-dimensional laminated wiring board which concerns on this invention. 本発明に係る3次元積層配線基板に用いられる配線の一例を拡大して示す断面図である。It is sectional drawing which expands and shows an example of the wiring used for the three-dimensional laminated wiring board which concerns on this invention. 本発明に係る3次元積層配線基板に用いられる認証パターンの別の形態を示す図である。It is a figure which shows another form of the authentication pattern used for the three-dimensional laminated wiring board which concerns on this invention. 本発明に係る3次元積層配線基板に用いられる配線基板の別の実施形態の一部を示す斜視図である。It is a perspective view which shows a part of another embodiment of the wiring board used for the three-dimensional laminated wiring board which concerns on this invention. 図1〜図6に示した配線基板について、X線CT装置による認証パターン確認を説明する斜視図である。FIG. 7 is a perspective view for explaining authentication pattern confirmation by an X-ray CT apparatus for the wiring board shown in FIGS. 本発明に係る3次元積層配線基板を示す斜視図である。1 is a perspective view showing a three-dimensional multilayer wiring board according to the present invention. 図8の3次元積層配線基板又は電子機器の正面図である。FIG. 9 is a front view of the three-dimensional multilayer wiring board or electronic device in FIG. 8. 図8〜図9に示した3次元積層配線基板について、X線CT装置による認証パターン確認を説明する斜視図である。FIG. 10 is a perspective view for explaining authentication pattern confirmation by an X-ray CT apparatus for the three-dimensional multilayer wiring board shown in FIGS. 8 to 9. 本発明に係る情報処理システム及び情報通信システムを示す図である。1 is a diagram showing an information processing system and an information communication system according to the present invention.

1.配線基板
図1〜図4を参照すると、本発明に係る3次元積層配線基板に用いられる配線基板の一部が示されている。図示された配線基板は、基板1と、配線311〜326による配線パターンP11〜Pnmと、認証パターンQとを含む。
1. Wiring Substrate Referring to FIGS. 1 to 4, a part of a wiring substrate used in the three-dimensional laminated wiring substrate according to the present invention is shown. The illustrated wiring board includes a substrate 1, wiring patterns P <b> 11 to Pnm by wirings 311 to 326, and an authentication pattern Q.

基板1は、厚みT1が例えば50μm以下のSi基板又はSiC基板等でなる半導体基板であり、厚みT11の基板層101と、厚みT12の半導体形成層102とを有する。半導体形成層102は、図3にも図示するように、内部に半導体回路部371、372を有している。半導体回路部371、372の少なくとも一部は、基板1の一面111とは反対側の他面112に設けられた電極381、382に接続される。電極381、382には、必要により、バンプ361、362が形成される。   The substrate 1 is a semiconductor substrate made of, for example, a Si substrate or a SiC substrate having a thickness T1 of 50 μm or less, and includes a substrate layer 101 having a thickness T11 and a semiconductor forming layer 102 having a thickness T12. The semiconductor formation layer 102 has semiconductor circuit portions 371 and 372 therein as shown in FIG. At least a part of the semiconductor circuit portions 371 and 372 is connected to electrodes 381 and 382 provided on the other surface 112 on the opposite side to the one surface 111 of the substrate 1. Bumps 361 and 362 are formed on the electrodes 381 and 382 as necessary.

配線パターンP11〜Pnmのそれぞれは、絶縁部51とともに、絶縁部51の面内に狭ピッチd1、d2で配置された複数n=16の配線311〜326を有する。数nは、任意数である。   Each of the wiring patterns P11 to Pnm has a plurality of n = 16 wirings 311 to 326 arranged at narrow pitches d1 and d2 in the plane of the insulating portion 51 together with the insulating portion 51. The number n is an arbitrary number.

絶縁部51は、基板1の一面111に形成された微細空間121に充填されている。この絶縁部51は、好ましくは、絶縁性微粒子と、Si微粒子と、液状の有機Si化合物とを含む絶縁ペーストを、基板1の厚み方向に形成された溝又は孔等(微細空間と称することがある)121の内部に充填し、硬化させて形成したものである。絶縁ペーストを、微細空間121の内部に充填し、熱処理すると、Si微粒子と有機Si化合物との反応によりSi-O結合が形成され、絶縁性微粒子を骨材とし、その周りをSi-O結合によって埋めた絶縁物構造が得られる。絶縁性微粒子及びSi微粒子は、ナノメータ サイズ(1μm以下)の粒径を有する。もっとも、絶縁性微粒子及びSi微粒子は、その粒径が均一である必要はなく、上述したナノメータ サイズの領域内で、異なる粒径のものを含むことができる。   The insulating part 51 is filled in a minute space 121 formed on the one surface 111 of the substrate 1. The insulating portion 51 is preferably made of an insulating paste containing insulating fine particles, Si fine particles, and a liquid organic Si compound, such as grooves or holes formed in the thickness direction of the substrate 1 (referred to as a fine space). It is formed by filling the inside of 121 and curing it. When the insulating paste is filled in the fine space 121 and heat-treated, Si—O bonds are formed by the reaction between the Si fine particles and the organic Si compound, and the insulating fine particles are used as an aggregate, and the surroundings are formed by Si—O bonds. A buried insulator structure is obtained. The insulating fine particles and the Si fine particles have a particle size of nanometer size (1 μm or less). However, the insulating fine particles and the Si fine particles need not have a uniform particle size, and can include particles having different particle sizes within the above-mentioned nanometer size region.

配線311〜326は、基板1の厚みT1の方向に沿って延びていて、一端が、基板1の一面111の側において、絶縁層51の表面に露出し、露出する端面にバンプ351、352が接合されている。配線311〜326は、他端が、基板1の底面112に露出する貫通導体であってもよいし、基板1の内部に留まっている非貫通導体であってもよい。図には現れていないが、基板1の表面又は内部に、横配線が設けられることもある。   The wirings 311 to 326 extend along the direction of the thickness T1 of the substrate 1, one end is exposed on the surface 111 of the substrate 1 on the surface of the insulating layer 51, and bumps 351 and 352 are formed on the exposed end surfaces. It is joined. The other ends of the wirings 311 to 326 may be through conductors exposed on the bottom surface 112 of the substrate 1, or may be non-through conductors remaining inside the substrate 1. Although not shown in the drawing, a horizontal wiring may be provided on the surface or inside of the substrate 1.

配線311〜326は、この実施の形態では、平面4角形状であるが、他の多角形状又は円形状であってもよい。また、4行4列のマトリクス状に配列されているが、行列数は任意でよい。配線311〜326は、メッキ法、溶融金属充填法又は導電ペースト充填法など、公知技術の適用によって形成することができる。配線311〜326のディメンションは、一例として例示すると、配置ピッチd1、d2が4〜100μmの範囲、径が0.5〜25μmの範囲である。もっとも、配置ピッチは、一定寸法である必要はないし、径も上述した値に限定されるものではない。   In this embodiment, the wirings 311 to 326 are planar quadrangular shapes, but may be other polygonal shapes or circular shapes. Moreover, although it is arranged in a matrix of 4 rows and 4 columns, the number of matrices may be arbitrary. The wirings 311 to 326 can be formed by applying a known technique such as a plating method, a molten metal filling method, or a conductive paste filling method. As an example, the dimensions of the wirings 311 to 326 are such that the arrangement pitches d1 and d2 are in the range of 4 to 100 μm and the diameter is in the range of 0.5 to 25 μm. However, the arrangement pitch does not have to be a constant dimension, and the diameter is not limited to the above-described value.

図示の配線基板では、絶縁部51は、基板1の厚み方向に形成された溝又は孔等の微細空間121の内部に充填された絶縁物でなるから、絶縁部51はSi基板等でなる基板1と一体化される。   In the illustrated wiring board, the insulating portion 51 is made of an insulator filled in a minute space 121 such as a groove or a hole formed in the thickness direction of the substrate 1, and therefore the insulating portion 51 is a substrate made of a Si substrate or the like. 1.

複数の配線311〜326は、Si基板等でなる半導体基板と一体化された絶縁部51の面内に狭ピッチd1、d2で配置され、かつ、厚み方向に延びる溝又は孔等の微細空間の内部に充填されている。従って、複数の配線311〜326のそれぞれは、一つの絶縁部51によって、共通に支持され、相互に電気絶縁されるとともに、基板1からも電気絶縁される。この電気絶縁物構造は、複数の配線311〜326を個別的に電気絶縁して基板1に配置する場合と比較して、3次元配線間のピッチd1、d2を、例えば、4μm以下というように、著しく縮小することができる。よって、狭ピッチTSV配置、構造を持つ3次元配線基板を実現することができる。   The plurality of wirings 311 to 326 are arranged at narrow pitches d1 and d2 in the plane of the insulating portion 51 integrated with a semiconductor substrate made of a Si substrate or the like, and in a minute space such as a groove or a hole extending in the thickness direction. It is filled inside. Accordingly, each of the plurality of wirings 311 to 326 is supported in common by one insulating portion 51 and is electrically insulated from each other and also electrically insulated from the substrate 1. In this electrical insulator structure, the pitches d1 and d2 between the three-dimensional wirings are, for example, 4 μm or less as compared with the case where the plurality of wirings 311 to 326 are individually electrically insulated and arranged on the substrate 1. , Can be significantly reduced. Therefore, a three-dimensional wiring board having a narrow pitch TSV arrangement and structure can be realized.

配線311〜326は、Ag、Cu、Au、Pt、Ti、Zn、Al、Fe、B、Si及びNiの群から選択された少なくとも1種と、Sn、In、Bi、Gaの群から選択された少なくとも1種を含むことができる。第1群は、高融点金属材料であり、第2群は低融点金属材料である。   The wirings 311 to 326 are selected from at least one selected from the group of Ag, Cu, Au, Pt, Ti, Zn, Al, Fe, B, Si and Ni, and from the group of Sn, In, Bi, and Ga. Or at least one of them. The first group is a high melting point metal material, and the second group is a low melting point metal material.

配線311〜326の個数、形状、及び、配置等は、合理的な信号伝送経路の画定、信号伝送路として要求される電気的特性の充足等の種々の観点から選択される設計的事項である。   The number, shape, arrangement, and the like of the wirings 311 to 326 are design matters selected from various viewpoints such as the definition of a rational signal transmission path and the satisfaction of electrical characteristics required for the signal transmission path. .

次に、認証パターンQは、基板1に設けられ、配線311〜326、絶縁部51、52及び基板1から識別できる材質、形状、配置、構造又は寸法を有する。実施の形態に示す認証パターンQは、金属又は合金材料からなり、材質的には基板1と異なる。具体的には、配線311〜326と同じ材料を用いることができる。もっとも、認証パターンQは、配線311〜326及び基板1から識別できればよいので、必ずしも、金属又は合金の材料である必要はない。セラミック材料、セラミック材料と有機材料とを混合した複合材、又は、それらと金属もしくは合金材料との複合材であってもよい。   Next, the authentication pattern Q is provided on the substrate 1 and has a material, shape, arrangement, structure, or size that can be identified from the wirings 311 to 326, the insulating portions 51 and 52, and the substrate 1. The authentication pattern Q shown in the embodiment is made of a metal or alloy material and is different from the substrate 1 in terms of material. Specifically, the same material as the wirings 311 to 326 can be used. However, since the authentication pattern Q only needs to be identified from the wirings 311 to 326 and the substrate 1, it is not necessarily required to be a metal or alloy material. It may be a ceramic material, a composite material in which a ceramic material and an organic material are mixed, or a composite material of these materials and a metal or alloy material.

実施の形態に示す認証パターンQは、基板1の一面111に設けられた微細空間122に充填された絶縁部52の内部に形成されている。この絶縁部52は、配線パターンP11〜Pnmの絶縁部51と同じ材料によって構成することができるし、異なる材料によって構成することもできる。   The authentication pattern Q shown in the embodiment is formed inside the insulating portion 52 filled in the minute space 122 provided on the one surface 111 of the substrate 1. The insulating part 52 can be made of the same material as the insulating part 51 of the wiring patterns P11 to Pnm, or can be made of a different material.

認証パターンQは、絶縁部52の内部に、第1パターン要素331〜第5パターン要素335を形成した構造になっている。第1パターン要素331〜第5パターン要素335は、形状、配置、構造及び寸法の点で、配線311〜326とは異なる。配線311〜326は、その全てが、ほぼ同じ平面4角形状であるが、認証パターンQは、これとは異なって、第1パターン要素331が平面L形状、第2パターン要素332が平面4角形状、第3パターン要素333が平面クランク形状、第4パターン要素334が平面4角形状、第5パターン要素335が平面長方形状である。第1パターン要素331〜第5パターン要素335の配置間隔(ピッチ)は、例えば、数μm以下であることが好ましい。   The authentication pattern Q has a structure in which the first pattern element 331 to the fifth pattern element 335 are formed inside the insulating portion 52. The first pattern element 331 to the fifth pattern element 335 are different from the wirings 311 to 326 in terms of shape, arrangement, structure, and dimensions. All of the wirings 311 to 326 have substantially the same planar quadrangular shape, but the authentication pattern Q is different from this in that the first pattern element 331 has a planar L shape and the second pattern element 332 has a planar quadrangular shape. The third pattern element 333 has a planar crank shape, the fourth pattern element 334 has a planar square shape, and the fifth pattern element 335 has a planar rectangular shape. The arrangement interval (pitch) between the first pattern element 331 to the fifth pattern element 335 is preferably, for example, several μm or less.

第1パターン要素331〜第5パターン要素335の形状、配置、構造又は寸法等は、配線311〜326から識別できることを前提に、任意に設定変更することができる。例えば、クランク状、十字状、T状、折れ線状又はそれらの組合せ等、様々な形状、配置、構造を採ることができる。   The shape, arrangement, structure, dimensions, and the like of the first pattern element 331 to the fifth pattern element 335 can be arbitrarily set and changed on the assumption that they can be identified from the wirings 311 to 326. For example, various shapes, arrangements, and structures such as a crank shape, a cross shape, a T shape, a polygonal line shape, or a combination thereof can be adopted.

ほんの一例であるが、図5には、図4との対比において、長い平面形状を持つ3つの第1パターン要素331〜333によって構成された認証パターンQが示されている。   As just an example, FIG. 5 shows an authentication pattern Q constituted by three first pattern elements 331 to 333 having a long planar shape in comparison with FIG.

更に、認証パターンQは、一つの配線基板において、複数設けることもできる。例えば、図6に例示するように、複数の認証パターンQを適当な間隔をおいて配置してもよい。   Further, a plurality of authentication patterns Q can be provided on one wiring board. For example, as illustrated in FIG. 6, a plurality of authentication patterns Q may be arranged at appropriate intervals.

上述したように、認証パターンQは、基板1に設けられ、配線311〜326及び基板1から識別できる材質、形状、配置、構造又は寸法を有する。このような認証パターンQは、外部観察によって、基板1及び配線311〜326から区別して、確認することができる。   As described above, the authentication pattern Q is provided on the substrate 1 and has a material, shape, arrangement, structure, or size that can be identified from the wirings 311 to 326 and the substrate 1. Such an authentication pattern Q can be confirmed separately from the substrate 1 and the wirings 311 to 326 by external observation.

外部観察の手段としては、例えば、X線CT装置を用いることができる。図7は、認証パターンQを構成する第1パターン要素331〜第5パターン要素335を、配線311〜326と同じ金属又は合金材料によって構成した場合に想定されるX線CT画像を示している。これによって、正当に製造され、実装された真正の配線基板であることを、認証パターンQの外部観察によって、簡単、かつ、確実に確認し得る。これは、正当に、製造もしくは実装されたものでないこと、即ち、真正品ではなく、偽造品であることをも、簡単、かつ、確実に確認し得ることを意味する。   As an external observation means, for example, an X-ray CT apparatus can be used. FIG. 7 shows an X-ray CT image assumed when the first pattern element 331 to the fifth pattern element 335 constituting the authentication pattern Q are made of the same metal or alloy material as the wirings 311 to 326. As a result, it is possible to easily and reliably confirm that the authentic wiring board is properly manufactured and mounted by external observation of the authentication pattern Q. This means that it can be easily and reliably confirmed that the product has not been manufactured or mounted, that is, it is not a genuine product but a counterfeit product.

2.3次元積層配線基板及び電子機器
本発明に係る3次元積層配線基板は、上述した配線基板を、必要枚数積層して構成される。この3次元積層配線基板は、電子機器の構成要素として用いることができる。このような電子機器は、代表的には、3次元システム・パッケージ(3D-SiP)としての形態をとるシステムLSI、メモリLSI、DRAMのようなメモリ回路、CPUのようなロジック回路、通信回路、MEMS等を含むことができる。デジタル回路のみならず、アナログ回路を含む電子デバイスであってもよい。更に、上述した電子デバイスを内蔵する電子機器、例えば、MPU、パーソナル・コンピュータ、スーパーコンピュータ、携帯電話機、車載機器等、凡そ、電子回路を機能要素とする電子機器、電子デバイスのほとんどのものが含まれ得る。
2. Three-dimensional laminated wiring board and electronic apparatus The three-dimensional laminated wiring board according to the present invention is configured by laminating a required number of the above-described wiring boards. This three-dimensional multilayer wiring board can be used as a component of an electronic device. Such electronic devices typically include system LSIs, memory LSIs, memory circuits such as DRAMs, logic circuits such as CPUs, communication circuits, etc. that take the form of three-dimensional system packages (3D-SiP). MEMS etc. can be included. It may be an electronic device including an analog circuit as well as a digital circuit. In addition, electronic devices incorporating the above-described electronic devices, such as MPUs, personal computers, supercomputers, mobile phones, in-vehicle devices, etc., almost all of electronic devices and electronic devices having electronic circuits as functional elements Can be.

図8は、3D-SiPの形態をとる3次元積層配線基板の一例を示し、図1〜図7の何れかに示した複数枚nの配線基板131〜13nを順次に積層したパッケージである。   FIG. 8 shows an example of a three-dimensional laminated wiring board in the form of 3D-SiP, which is a package in which a plurality of n wiring boards 131 to 13n shown in any of FIGS.

組立完了形としては、図9に示すように、下面にボール・グリッド・アレイ13を配置したパッケージ基板17の上面に、図8に示したように、配線基板131〜13nを順次に配置し、接合91〜9nした構造をとることができる。このパッケージの状態でも、例えば、X線CT装置等を用いることにより、図10に示すように、認証パターンQの存在、不存在を確認することができる。   As the assembly completion type, as shown in FIG. 9, the wiring substrates 131 to 13n are sequentially arranged on the upper surface of the package substrate 17 having the ball grid array 13 arranged on the lower surface, as shown in FIG. A structure having junctions 91 to 9n can be employed. Even in this package state, for example, by using an X-ray CT apparatus or the like, the presence or absence of the authentication pattern Q can be confirmed as shown in FIG.

3.情報処理システム及び情報通信システム
図11は、本発明に係る情報処理システム及び情報通信システムを図示している。情報処理システムとは、電子計算機及びプログラムの集合体であって、情報処理の業務を一体的に行うよう構成されたものをいう。情報通信システムとは、情報処理システムとともに、通信装置及びネットワークを含み、情報の送受信を行うシステムをいう。図示の情報処理システムは、複数nの端末装置171〜17nによって構成されており、情報通信システムは、上述した端末装置171〜17nとともに、ネットワーク19を含んで構成されている。
3. Information Processing System and Information Communication System FIG. 11 illustrates an information processing system and an information communication system according to the present invention. An information processing system is a collection of electronic computers and programs, and is configured to perform information processing work in an integrated manner. An information communication system refers to a system that includes a communication device and a network together with an information processing system and transmits and receives information. The illustrated information processing system includes a plurality of n terminal devices 171 to 17n, and the information communication system includes a network 19 together with the terminal devices 171 to 17n described above.

端末装置171〜17nには、パーソナル・コンピュータ、携帯電話機、タブレット等が含まれる他、各種センサ等も含まれる。ネットワーク19には、インターネットの他、車載ローカル・エリア・ネットワーク等で代表されるLAN(Local Area Network)も含まれる。そのほか、例えば、プリンタ、ファクシミリ、電話、スキャンなどが接続されるパーソナル・エリア・ネットワークであってもよい。   The terminal devices 171 to 17n include personal computers, mobile phones, tablets, and the like, as well as various sensors. In addition to the Internet, the network 19 includes a LAN (Local Area Network) represented by an in-vehicle local area network. In addition, for example, a personal area network to which a printer, a facsimile, a telephone, a scan, and the like are connected may be used.

本発明に係る情報処理システム及び情報通信システムは、正当に製造され実装されたものであることが確認された3次元配線基板及び電子機器で構成されているから、いわゆる「トロイの木馬」あるいは「バックドア」等の悪意のある回路が組み込まれる危険性を回避し、高度の安全性を確保し得る。   Since the information processing system and the information communication system according to the present invention are composed of a three-dimensional wiring board and electronic equipment that have been confirmed to be legitimately manufactured and mounted, a so-called “Trojan horse” or “ The danger of incorporating a malicious circuit such as a “back door” can be avoided, and a high level of safety can be ensured.

以上、好ましい実施例を参照して本発明を詳細に説明したが、本発明はこれらに限定されるものではなく、当業者であれば、その基本的技術思想および教示に基づき、種々の変形例を想到できることは自明である。   The present invention has been described in detail with reference to the preferred embodiments. However, the present invention is not limited to these embodiments, and various modifications can be made by those skilled in the art based on the basic technical idea and teachings. It is self-evident that

1 基板
311〜316 配線
Q 認証マーク
1 Substrate 311 to 316 Wiring Q Certification mark

Claims (4)

基板と、配線と、認証パターンとを含む3次元積層配線基板であって、
前記配線は、前記基板に電気絶縁して設けられており、
前記認証パターンは、前記基板に設けられ、前記配線及び前記基板から識別できる材質、形状、配置、構造又は寸法を有する、
3次元積層配線基板。
A three-dimensional laminated wiring board including a substrate, wiring, and an authentication pattern,
The wiring is provided to be electrically insulated from the substrate,
The authentication pattern is provided on the substrate and has a material, shape, arrangement, structure, or size that can be identified from the wiring and the substrate.
Three-dimensional laminated wiring board.
3次元積層配線基板を有する電子機器であって、前記3次元積層配線基板は、請求項1に記載されたものでなる電子機器。   An electronic apparatus having a three-dimensional multilayer wiring board, wherein the three-dimensional multilayer wiring board is the one described in claim 1. 電子機器を含む情報処理システムであって、前記電子機器は、請求項2に記載されたものでなる、情報処理システム。   An information processing system including an electronic device, wherein the electronic device is the information processing system according to claim 2. 電子機器を含む情報通信システムであって、前記電子機器は、請求項2に記載されたものでなる、情報通信システム。   An information communication system including an electronic device, wherein the electronic device is the information communication system according to claim 2.
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