JP2016046329A5

JP2016046329A5 -

Info

Publication number: JP2016046329A5
Application number: JP2014167957A
Authority: JP
Filing date: 2014-08-20
Publication date: 2017-09-07
Anticipated expiration: 2034-08-20

Claims

A lithographic apparatus that forms, on a first layer having an array of shot areas of a first shot size, a second layer having an array of shot areas of a second shot size that covers a plurality of shot areas of the first shot size. And
Assuming a candidate shot layout indicating the arrangement of the shot regions of the second layer, the pattern formed in each shot region of the first layer and the second when the second layer is formed with the candidate shot layout A calculation unit that calculates the amount of positional deviation relative to the pattern formed in the layer;
A determination unit that determines the candidate shot layout in which the positional deviation amount calculated by the calculation unit is within an allowable range as a shot layout when forming the second layer;
A lithographic apparatus comprising:

The arithmetic unit assumes the plurality of candidate shot layouts that can be selected for the first layer shot layout, and forms the second layer in each of the plurality of candidate shot layouts. Calculating the relative displacement between the pattern formed in each shot region and the pattern formed in the second layer,
The determining unit may form one of the candidate shot layouts in which the positional deviation amount calculated by the calculation unit is within an allowable range among the plurality of candidate shot layouts. The lithographic apparatus according to claim 1, wherein the lithographic apparatus is determined as a shot layout.

3. The determination unit according to claim 2, wherein the determination unit determines a candidate shot layout that minimizes the positional deviation amount calculated by the calculation unit as a shot layout when the second layer is formed. Lithographic apparatus.

The determination unit selects a candidate shot layout in which the number of shot areas included in the candidate shot layout is the smallest among the candidate shot layouts in which the positional deviation amount calculated by the calculation unit is within an allowable range. The lithographic apparatus according to claim 2, wherein the lithographic apparatus determines the shot layout when forming the second layer.

The lithographic apparatus according to claim 1, wherein the pattern formed on the second layer is a pattern of an original plate used when forming the second layer.

The storage unit further stores a first shift amount from the ideal position of the pattern position of the original plate and a second shift amount from the ideal position of the pattern position formed in each shot region of the first layer. And
The lithographic apparatus according to claim 5, wherein the arithmetic unit obtains the positional deviation amount based on the first deviation amount and the second deviation amount stored in the storage unit.

A detector that detects a relative position between a mark provided in each shot area of the first layer and a mark provided on the original;
The lithographic apparatus according to claim 5, wherein the calculation unit obtains the positional deviation amount based on the relative position detected by the detection unit.

A storage unit for storing a deviation amount from an ideal position of the pattern of the original plate;
A measurement unit that measures a deviation amount from an ideal position of a pattern formed in each shot region of the first layer;
Further comprising
6. The lithography according to claim 5 , wherein the arithmetic unit obtains the positional deviation amount based on the deviation amount stored in the storage unit and the deviation amount measured by the measurement unit. apparatus.

The lithographic apparatus according to claim 5 , wherein the second layer is formed by projecting the pattern of the original plate onto a substrate by a projection optical system.

The lithographic apparatus according to claim 5 , wherein the second layer is formed by molding an imprint material on a substrate with the original plate.

Forming a pattern on a substrate using the lithographic apparatus according to claim 1;
Processing the substrate on which the pattern has been formed in the step;
A method for producing an article comprising:

A shot in a lithographic apparatus, wherein a second layer having a second shot size array of shot areas covering a plurality of the first shot size shot areas is formed on a first layer having a first shot size shot area array. An information processing apparatus for determining a layout,
Assuming a candidate shot layout indicating the arrangement of the shot regions of the second layer, the pattern formed in each shot region of the first layer and the second when the second layer is formed with the candidate shot layout A calculation unit that calculates the amount of positional deviation relative to the pattern formed in the layer;
A determination unit that determines the candidate shot layout in which the positional deviation amount calculated by the calculation unit is within an allowable range as a shot layout when forming the second layer;
An information processing apparatus comprising:

A shot layout when forming a second layer having an array of shot areas having a second shot size covering a plurality of shot areas having the first shot size on a first layer having an array of shot areas having a first shot size A determination method for determining
Assuming a candidate shot layout indicating the arrangement of the shot regions of the second layer, the pattern formed in each shot region of the first layer and the second when the second layer is formed with the candidate shot layout A step of calculating a relative misalignment with the pattern in which the layer is formed;
Determining the candidate shot layout in which the positional deviation amount calculated in the step is within an allowable range as a shot layout when forming the second layer;
A determination method characterized by comprising: