JP2016001217A5 - Base material with antireflection film and method for producing base material with antireflection film - Google Patents
Base material with antireflection film and method for producing base material with antireflection film Download PDFInfo
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- JP2016001217A5 JP2016001217A5 JP2014120437A JP2014120437A JP2016001217A5 JP 2016001217 A5 JP2016001217 A5 JP 2016001217A5 JP 2014120437 A JP2014120437 A JP 2014120437A JP 2014120437 A JP2014120437 A JP 2014120437A JP 2016001217 A5 JP2016001217 A5 JP 2016001217A5
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- antireflection film
- silica
- film
- base material
- fine particles
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- 239000000463 material Substances 0.000 title claims 20
- 238000004519 manufacturing process Methods 0.000 title claims 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 46
- 239000002245 particle Substances 0.000 claims 24
- 239000000377 silicon dioxide Substances 0.000 claims 23
- 239000010419 fine particle Substances 0.000 claims 18
- 239000011248 coating agent Substances 0.000 claims 13
- 238000000576 coating method Methods 0.000 claims 13
- 239000011347 resin Substances 0.000 claims 10
- 229920005989 resin Polymers 0.000 claims 10
- 239000000758 substrate Substances 0.000 claims 10
- 239000011159 matrix material Substances 0.000 claims 7
- 229910044991 metal oxide Inorganic materials 0.000 claims 7
- 150000004706 metal oxides Chemical class 0.000 claims 7
- 125000004432 carbon atoms Chemical group C* 0.000 claims 6
- 239000007787 solid Substances 0.000 claims 6
- 239000007788 liquid Substances 0.000 claims 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 3
- 125000003545 alkoxy group Chemical group 0.000 claims 3
- 239000006185 dispersion Substances 0.000 claims 3
- 125000000524 functional group Chemical group 0.000 claims 3
- 229910052736 halogen Inorganic materials 0.000 claims 3
- 150000002367 halogens Chemical class 0.000 claims 3
- 150000002430 hydrocarbons Chemical group 0.000 claims 3
- 229910052739 hydrogen Inorganic materials 0.000 claims 3
- 239000001257 hydrogen Substances 0.000 claims 3
- 125000004435 hydrogen atoms Chemical class [H]* 0.000 claims 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 3
- 229920000089 Cyclic olefin copolymer Polymers 0.000 claims 2
- 229940014598 TAC Drugs 0.000 claims 2
- 238000001035 drying Methods 0.000 claims 2
- 239000000178 monomer Substances 0.000 claims 2
- 150000003961 organosilicon compounds Chemical class 0.000 claims 2
- 235000018936 Vitellaria paradoxa Nutrition 0.000 claims 1
- 241001135917 Vitellaria paradoxa Species 0.000 claims 1
- -1 acryl Chemical group 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- JOYRKODLDBILNP-UHFFFAOYSA-N ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims 1
- 238000005755 formation reaction Methods 0.000 claims 1
- 239000011859 microparticle Substances 0.000 claims 1
- 239000004417 polycarbonate Substances 0.000 claims 1
- 229920000515 polycarbonate Polymers 0.000 claims 1
- 150000003377 silicon compounds Chemical class 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 239000002023 wood Substances 0.000 claims 1
Claims (21)
前記ハードコート膜が、平均粒子径が５〜３００ｎｍの表面処理金属酸化物微粒子（Ｐ）とマトリックス成分（ＭH）とからなり、
（ｉ）前記表面処理金属酸化物微粒子（Ｐ）の前記ハードコート膜中の含有量（ＷPH）が５０〜９０重量％、
（ｉｉ）前記マトリックス成分（ＭH）の前記ハードコート膜中の含有量（ＷRH）が１０〜５０重量％、
（ｉｉｉ）前記含有量（ＷRH）と前記含有量（ＷPH）との比（Ｗ RH ／Ｗ PH ）が０．１２〜１．０、
（ｉｖ）前記ハードコート膜の平均膜厚（ＴH）が１〜１００μｍであり、
前記反射防止膜がシリカ系中空微粒子（Ａ）とマトリックス成分（ＭL）とを含み、
（ａ）前記シリカ系中空微粒子（Ａ）の前記反射防止膜中の含有量（ＷPLA）が５〜８０重量％、
（ｂ）前記マトリックス成分（ＭL）の前記反射防止膜中の含有量（ＷML）が２０〜９５重量％、
（ｃ）前記反射防止膜の膜厚（ＴL）が８０〜２００ｎｍ、
（ｄ）前記シリカ系中空微粒子（Ａ）の平均粒子径（Ｄｐａ）が１０〜４５ｎｍ、
（ｅ）前記シリカ系中空微粒子（Ａ）の平均粒子径（Ｄｐａ）と反射防止膜の膜厚（ＴL）との比（Ｄｐａ／Ｔ L ）が０．０５〜０．５６である
ことを特徴とする反射防止膜付基材。 A base material with an antireflection film in which a hard coat film and an antireflection film are formed on a base material,
The hard coat film, an average particle diameter becomes from the front surface treated metal oxide fine particles (P) of 5~300nm and matrix component (M H),
(I) the content of the in the hard coat film of the surface-treated metal oxide fine particles (P) (W PH) 50 to 90 wt%,
(Ii) content in said hard coating of the matrix component (M H) (W RH) is 10 to 50% by weight,
(Iii) the amount (W RH) and the content (W PH) and the ratio of (W RH / W PH) is from 0.12 to 1.0,
(Iv) the average thickness of the hard coat film (T H) is 1 to 100 [mu] m,
The antireflection film comprises a silica-based hollow particles (A) and the matrix component (M L),
(A) the content of the antireflection film of the silica-based hollow particles (A) (W PLA) is 5 to 80 wt%,
(B) the content of the antireflection film of the matrix component (M L) (W ML) 20 to 95 wt%,
(C) the thickness of the antireflection film (T L) is 80 to 200 nm,
; (D) an average particle size of the silica-based hollow particles (A) (Dpa) is 10～45Nm,
(E) a the ratio between the average particle diameter (Dpa) and the anti-reflection film having a film thickness of the silica-based hollow particles (A) (T L) ( Dpa / T L) is from 0.05 to 0.56 A base material with an antireflection film as a feature.
Ｒn−ＳｉＸ4-n （１）
（但し、式中、Ｒは炭素数１〜１０の非置換または置換炭化水素基であって、互いに同一であっても異なっていてもよい。Ｘは炭素数１〜４のアルコキシ基、水酸基、ハロゲン、水素、ｎは１〜３の整数） The surface-treated metal oxide fine particles (P) are surface-treated with an organosilicon compound represented by the following formula (1), wherein the antireflection film-attached base according to claim 1 is used. Wood.
R n -SiX 4-n (1)
(In the formula, R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, and may be the same or different. X is an alkoxy group having 1 to 4 carbon atoms, a hydroxyl group, Halogen, hydrogen, n is an integer of 1 to 3)
Ｒn−ＳｉＸ4-n （２）
（但し、式中、Ｒは炭素数１〜１０の非置換または置換炭化水素基であって、互いに同一であっても異なっていてもよい。Ｘは炭素数１〜４のアルコキシ基、水酸基、ハロゲン、水素、ｎは１〜３の整数） The silica hollow particles (A) and the silica fine particles (B) are, according to any one of claims 1 to 5, characterized in that it is surface treated with an organic silicon compound represented by the following formula (2) Base material with antireflection film.
R n -SiX 4-n (2)
(In the formula, R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, and may be the same or different. X is an alkoxy group having 1 to 4 carbon atoms, a hydroxyl group, Halogen, hydrogen, n is an integer of 1 to 3)
（Ｂ）シリカ系中空微粒子（Ａ）とマトリックス形成成分と溶媒とを含み、前記シリカ系中空微粒子（Ａ）の平均粒子径（Ｄｐａ）が１０〜４５ｎｍ、前記シリカ系中空微粒子（Ａ）の固形分としての濃度が０．２５〜９重量％、マトリックス形成成分の固形分としての濃度が０．７５〜９．５重量％で、全固形分濃度が１〜１０重量％の反射防止膜形成用塗布液を前記ハードコート膜表面に塗布し乾燥して、反射防止膜を形成することを特徴とする反射防止膜付基材の製造方法。 (A) and surface-treated metal oxide fine particles (P), and a matrix-forming solid content (M H), the concentration of the solid content of the surface-treated metal oxide fine particles (P) (C PH) is 45 A coating liquid for forming a hard coat film having a concentration (C RH ) of 15 to 50% by weight as a solid content of the matrix-forming component (M H ) is applied to the substrate surface and dried , A hard coat film having a treated metal oxide fine particle (P) content (W PH ) of 50 to 90% by weight and a matrix component (M H ) content (W RH ) of 10 to 50% by weight. After forming
(B) a silica-based hollow particles (A) and a solvent matrix-forming component, wherein the average particle size of the silica-based hollow particles (A) (Dpa) is 10～45Nm, solid of the silica-based hollow particles (A) concentration as a minute from 0.25 to 9 wt%, at a concentration of 0.75 to 9.5% by weight as solids of the matrix-forming component, the total solid concentration for preventing film formation reflection of 1-10 wt% A method for producing a substrate with an antireflection film, which comprises applying a coating solution to the surface of the hard coat film and drying to form an antireflection film.
１４ｃｍ×２５ｃｍ×４０μｍ（厚み）のＴＡＣフィルム基材上に厚みが１２μｍのハードコート膜が形成できるようにハードコート膜形成用塗布液を塗布し、２０時間静置し、その後、フィルムを１０ｃｍ×１０ｃｍサイズにカットし、塗布面を下にしてフィルムを平板上に置き、カーリング（湾曲）して浮上した基材の頂点の平板からの高さ。 The method for producing a base material with an antireflection film according to claim 11 , wherein the curling property of the hard coat film is 5 mm or less when measured under the following conditions.
A coating liquid for forming a hard coat film was applied on a TAC film substrate having a thickness of 14 cm × 25 cm × 40 μm (thickness) so that a hard coat film having a thickness of 12 μm could be formed, and allowed to stand for 20 hours. The height from the flat plate at the apex of the substrate which was cut into a size of 10 cm, placed on a flat plate with the coating surface down, and curled (curved) and floated.
Ｒn−ＳｉＸ4-n （３）
（但し、式中、Ｒは炭素数１〜１０の非置換または置換炭化水素基であって、互いに同一であっても異なっていてもよい。Ｘは炭素数１〜４のアルコキシ基、水酸基、ハロゲン、水素、ｎは１〜３の整数） The silica hollow particles (A) and the silica fine particles (B) is an anti-reflection film according to claim 15, characterized in that it is surface-treated with an organosilicon compound represented by the following formula (3) A method for producing a substrate.
R n -SiX 4-n (3)
(In the formula, R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, and may be the same or different. X is an alkoxy group having 1 to 4 carbon atoms, a hydroxyl group, Halogen, hydrogen, n is an integer of 1 to 3)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014120437A JP6450531B2 (en) | 2014-06-11 | 2014-06-11 | Manufacturing method of substrate with antireflection film |
| KR1020167026821A KR102379944B1 (en) | 2014-03-31 | 2015-03-30 | Coating liquid for forming transparent coating and method for producing said coating liquid, organic resin-dispersed sol, and substrate with transparent coating and method for producing said substrate |
| PCT/JP2015/059981 WO2015152171A1 (en) | 2014-03-31 | 2015-03-30 | Coating liquid for forming transparent coating and method for producing said coating liquid, organic resin-dispersed sol, and substrate with transparent coating and method for producing said substrate |
| CN201580017788.XA CN106164190B (en) | 2014-03-31 | 2015-03-30 | Coating liquid for forming transparent film and method for producing same, organic resin dispersion sol, substrate with transparent film and method for producing same |
| TW104110415A TWI670335B (en) | 2014-03-31 | 2015-03-31 | Coating liquid for forming transparent coating film and method for producing the same, organic resin dispersant sol, and substrate with transparent coating film and method for producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014120437A JP6450531B2 (en) | 2014-06-11 | 2014-06-11 | Manufacturing method of substrate with antireflection film |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016001217A JP2016001217A (en) | 2016-01-07 |
| JP2016001217A5 true JP2016001217A5 (en) | 2017-07-27 |
| JP6450531B2 JP6450531B2 (en) | 2019-01-09 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014120437A Active JP6450531B2 (en) | 2014-03-31 | 2014-06-11 | Manufacturing method of substrate with antireflection film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6450531B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7314982B2 (en) * | 2020-11-20 | 2023-07-26 | 荒川化学工業株式会社 | Low-reflection coating agents, coating agent kits, cured products and laminates |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004143201A (en) * | 2002-10-22 | 2004-05-20 | Toyo Ink Mfg Co Ltd | Active energy ray curing composition, method for forming cured film using the same and cured product thereof and antireflection body |
| JP4378972B2 (en) * | 2003-02-25 | 2009-12-09 | パナソニック電工株式会社 | Antireflection film, method of manufacturing antireflection film, antireflection member |
| JP2010095569A (en) * | 2008-10-14 | 2010-04-30 | Mitsubishi Chemicals Corp | Active energy ray-curable resin composition, cured material and article |
| JP5378771B2 (en) * | 2008-11-28 | 2013-12-25 | 日揮触媒化成株式会社 | Base material with antireflection film and coating liquid for forming antireflection film |
| JP5326994B2 (en) * | 2009-01-20 | 2013-10-30 | 信越化学工業株式会社 | Photo-curable resin composition and article having cured film thereof |
| JP6112753B2 (en) * | 2009-12-28 | 2017-04-12 | 日揮触媒化成株式会社 | Coating liquid for forming transparent film, substrate with transparent film, and method for producing hydrophobic metal oxide particles |
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- 2014-06-11 JP JP2014120437A patent/JP6450531B2/en active Active
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