JP2015218394A - Rack for plating - Google Patents

Rack for plating Download PDF

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JP2015218394A
JP2015218394A JP2014177402A JP2014177402A JP2015218394A JP 2015218394 A JP2015218394 A JP 2015218394A JP 2014177402 A JP2014177402 A JP 2014177402A JP 2014177402 A JP2014177402 A JP 2014177402A JP 2015218394 A JP2015218394 A JP 2015218394A
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frame member
axial direction
plating rack
horizontal frame
plating
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JP5913486B2 (en
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詩濱 許
Shr-Bin Shiu
詩濱 許
聖智 張
Sheng Chih Chang
聖智 張
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Phoenix Pioneer Technology Co Ltd
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  • Electroplating Methods And Accessories (AREA)
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Abstract

PROBLEM TO BE SOLVED: To provide a rack for plating.SOLUTION: The rack for plating includes an interlocking frame and a support frame connected to an external driving device, one ends of the interlocking frame and the support frame are respectively connected to a first horizontal frame material and a second horizontal frame material, the first and second horizontal frame materials correspond to a telescopic rod provided for side ends on both sides in a first axial direction, a plurality of first pinching devices are provided for the first and second horizontal frame materials sequentially along a second axial direction, at least one pressing means is provided for both ends of the plurality of first pinching devices corresponding to a third axial direction, the pressing means is used for pressing and fixing a substrate, and first liquid stopping means is provided for one end of the first pinching devices contacting the substrate, the first liquid stopping means is installed in a ring mode so as to surround the pressing means, and a closed space is formed between the pressing means and the first liquid stopping means, and its objective is to inhibit ingression of medicine to prevent plating in the liquid stopping means region.

Description

本発明は一種のメッキ用ラックに係り、特にプリント基板の電気メッキ工程に使用されるラック装置に関する。   The present invention relates to a kind of plating rack, and more particularly to a rack apparatus used in an electroplating process of a printed circuit board.

プリント基板(PCB)は、印刷技術で作成される回路製品であり、基板の線路は微細化される傾向にあり、すでに印刷技術で線路を印刷して線路を製作するのは無理となり、ドライフィルム露光現像方式へと変化している。基板はそのフレキシビリティーにより硬質基板と軟性基板に分けられるが、一般に硬質多層基板の製造フローは以下のとおりである。
A.基板を開始材料とし、まず内層配線を製作する
B.ホトレジスト塗布、露光、現像、エッチング及びホトレジスト除去等のステップで必要な線路を形成する
C.並びに銅表面を粗化して、絶縁樹脂の接着性を増し、さらに樹脂片と圧着し、内外層の間の導通のため、機械或いはレーザーでさん孔する。
D.さらに電気メッキ工程で、基板間の導通通路を形成し、回路工程後の基板外層を完成する
E.最後にソルダレジスト塗布と抗酸化処理を行ない、電子部品をソルダリングするとき、半田が溢れて隣接線路と短絡を形成するのを防止し、これはまた、基板を空気中の水気と酸化より隔離し、ソルダレジストインクの塗布完成した基板は、顧客の要求により、表面抗酸化処理を行なうことで表層抗酸化能力を強化する。
A printed circuit board (PCB) is a circuit product created by printing technology, and the lines on the board tend to be miniaturized. It is already impossible to produce lines by printing lines using printing technology. It has changed to the exposure development system. Substrates are classified into hard substrates and soft substrates according to their flexibility. In general, the manufacturing flow of a hard multilayer substrate is as follows.
A. First, the inner layer wiring is manufactured using the substrate as the starting material. B. Form necessary lines in steps such as photoresist coating, exposure, development, etching, and photoresist removal. In addition, the surface of the copper is roughened to increase the adhesiveness of the insulating resin, and further crimped to the resin piece and punched by a machine or a laser for conduction between the inner and outer layers.
D. Further, in the electroplating process, a conduction path between the substrates is formed, and the outer layer of the substrate after the circuit process is completed. Finally, solder resist coating and anti-oxidation treatment are performed to prevent the solder from overflowing and forming a short circuit with the adjacent line when soldering electronic components, which also isolates the board from moisture and oxidation in the air. The substrate with the solder resist ink applied is subjected to surface anti-oxidation treatment to enhance the surface layer anti-oxidation capability according to customer requirements.

図1A〜図1Bには、周知のプリント基板の電気メッキ工程に用いられるラック装置1が示される。このラック装置1は、少なくとも一つのプリント基板を放置できる基板収容エリア2、及び、外部駆動装置(図示せず)に接続された連動フレーム10とサポートフレーム15を包含する。連動フレーム10とサポートフレーム15はプリント基板の第1軸方向において、相互に対向するよう設置され、連動フレーム10とサポートフレーム15は、一端がそれぞれ第1横枠材110と第2横枠材111に接続されている。   1A to 1B show a rack device 1 used in a known electroplating process of a printed circuit board. The rack device 1 includes a substrate housing area 2 in which at least one printed circuit board can be left, and an interlocking frame 10 and a support frame 15 connected to an external drive device (not shown). The interlocking frame 10 and the support frame 15 are installed so as to face each other in the first axis direction of the printed circuit board, and the interlocking frame 10 and the support frame 15 have one end of the first horizontal frame member 110 and the second horizontal frame member 111, respectively. It is connected to the.

第1横枠材110と第2横枠材111は、プリント基板の第2軸方向の両端に、伸縮ロッド12が設けられている。   The first horizontal frame member 110 and the second horizontal frame member 111 are provided with telescopic rods 12 at both ends in the second axial direction of the printed circuit board.

この伸縮ロッド12は、プリント基板の大きさに応じて調整され、第1横枠材110と第2横枠材111は、該第2軸方向に沿って、順に複数の第1夾持手段13が設けられ、且つプリント基板の第3軸方向に対応する第1夾持手段13の両端には、それぞれプリント基板を押圧夾持する押圧手段Pが設けられている。   The telescopic rod 12 is adjusted according to the size of the printed circuit board, and the first horizontal frame member 110 and the second horizontal frame member 111 are provided with a plurality of first holding means 13 in order along the second axial direction. And pressing means P for pressing and holding the printed circuit board are provided at both ends of the first holding means 13 corresponding to the third axis direction of the printed circuit board.

しかし、押圧手段Pがプリント基板と接触する夾持ポイントエリアは、押圧手段Pが浸漬薬剤と直接接触し得るため、電気メッキ工程においてプリント基板の周囲に金属が付着して、電気メッキ夾持ポイントエリアの厚さが不均一となり、電気メッキ夾持ポイントエリアの膜厚が厚くなり銅さを発生し、後続工程での加工の難しさを招き、工程歩留りと生産コストに影響を及ぼす。   However, the holding point area where the pressing means P is in contact with the printed circuit board can be in direct contact with the dipping agent, so that the metal adheres to the periphery of the printed circuit board in the electroplating process and the electroplating holding point area. The thickness of the area becomes uneven, the film thickness of the electroplating holding point area becomes thick, and copper is generated, which causes difficulty in processing in the subsequent process, and affects the process yield and production cost.

以上を鑑み、上述の問題を改善するため、本発明は一種のメッキ用ラックを提供し、それは、連動フレームとサポートフレームを包含し、該連動フレームは外部駆動装置に接続され、該連動フレームの一端は第1横枠材に接続され、該サポートフレームの一端は第2横枠材に接続される。   In view of the above, in order to improve the above problems, the present invention provides a kind of plating rack, which includes an interlocking frame and a support frame, the interlocking frame being connected to an external drive device, One end is connected to the first horizontal frame member, and one end of the support frame is connected to the second horizontal frame member.

伸縮ロッドが、第1軸方向に沿って設けられ、該第1横枠材と該第2横枠材の両端に接続され、及び、複数の第1夾持装置が、第2軸方向に沿って、該第1横枠材と該第2横枠材において、順に設けられ、複数の第1夾持装置にあって第3軸方向の両端に、少なくとも一つの押圧手段が設けられ、押圧手段は基板を夾持固定するのに用いられ、該押圧手段の近隣の第1夾持装置は第1液止め手段を具え、該第1液止め手段は、該押圧手段を囲むように環状形態を以て設置され、該押圧手段と該第1液止め手段の間に閉じた空間を形成し、そのうち、該第1液止め手段は軟性材質のシールストリップとされ、且つ基板の第1軸方向の上辺の高さは第1液止め手段の上辺の高さを超過せず、第1液止め手段の材料はNBR合成ゴム、EPDM合成ゴム、VITONフッ化炭素ゴム、シリコーンゴム、或いはテフロン(登録商標)のいずれかとされる。   A telescopic rod is provided along the first axial direction, connected to both ends of the first horizontal frame member and the second horizontal frame member, and a plurality of first clamping devices are provided along the second axial direction. The first horizontal frame member and the second horizontal frame member are provided in order, and in the plurality of first holding devices, at least one pressing unit is provided at both ends in the third axial direction, and the pressing unit Is used for holding and fixing the substrate, and the first holding device in the vicinity of the pressing means includes first liquid stopping means, and the first liquid stopping means has an annular shape so as to surround the pressing means. And a closed space is formed between the pressing means and the first liquid stop means, wherein the first liquid stop means is a sealing strip made of a soft material and is formed on the upper side in the first axial direction of the substrate. The height does not exceed the height of the upper side of the first liquid stopper, and the material of the first liquid stopper is NBR synthetic rubber, EPDM synthetic Arm, VITON fluorocarbon rubbers, are one of silicone rubber, or Teflon.

上述の技術特徴に基づき、本発明は軟質の液止めストリップを利用することで薬剤の進入を防止し、液止めストリップエリア内の金属メッキを防止し、これにより、辺縁厚さが電気メッキ過程中に厚くなるか金属渣を発生するのを防止し、これにより後続の工程でエッジ研磨するかエッジ裁断プロセスを不要とし、製造コストを下げ、及び、金属渣の発生を防止して製造歩留りをアップする。   Based on the above technical features, the present invention uses a soft liquid stop strip to prevent drug ingress and prevent metal plating in the liquid stop strip area, so that the edge thickness is reduced by electroplating process. Prevents thickening or generation of metal residue, which eliminates the need for edge polishing or edge cutting in subsequent processes, lowers manufacturing costs and prevents production of metal residue. Up.

周知のメッキ用ラックの正面図である。It is a front view of a well-known plating rack. 周知のメッキ用ラックの側面図である。It is a side view of a well-known plating rack. 本発明のメッキ用ラックの正面図である。It is a front view of the rack for plating of this invention. 本発明の第1夾持装置の正面図である。It is a front view of the 1st clamping apparatus of this invention. 本発明の第1夾持装置の側面図である。It is a side view of the 1st clamping apparatus of this invention. 本発明のメッキ用ラックの別の実施例の正面図である。It is a front view of another Example of the rack for plating of this invention. 本発明の第2夾持装置の正面図である。It is a front view of the 2nd clamping apparatus of this invention. 本発明の第2夾持装置の側面図である。It is a side view of the 2nd clamping apparatus of this invention. 本発明のメッキ用ラックのまた別の実施例の正面図である。It is a front view of another Example of the rack for plating of this invention. 本発明の第2夾持装置及び第3夾持装置の正面図である。It is a front view of the 2nd holding device and the 3rd holding device of the present invention. 本発明の第2夾持装置及び第3夾持装置の側面図である。It is a side view of the 2nd holding device and the 3rd holding device of the present invention.

以下に本発明の技術内容、構造特徴、達成する目的及び作用効果について、以下に例を挙げ並びに図面を組み合わせて詳細に説明する。本技術領域における通常の知識を有する者であれば、この明細書に記載の内容により簡単に本発明が述べる目的を了解できる。   The technical contents, structural features, objects to be achieved, and operational effects of the present invention will be described in detail below with reference to examples and drawings. A person having ordinary knowledge in this technical field can easily understand the purpose of the present invention based on the contents described in this specification.

図2Aを参照されたい。本発明は一種のメッキ用ラック3を提示し、それは、外部駆動装置(図示せず)に接続された一つの連動フレーム30及び一つのサポートフレーム35を包含し、連動フレーム30とサポートフレーム35は、基板収容エリア2の第1軸方向において相互に対向するように設置され、連動フレーム30とサポートフレーム35の一端はそれぞれ第1横枠材310と第2横枠材311に接続され、第1横枠材310と第2横枠材311は基板収容エリア2の第2軸方向の両端において伸縮ロッド32に対応し、該伸縮ロッド32は該第1軸方向に沿って延伸或いは短縮され、第1横枠材310と第2横枠材311は基板収容エリア2の第2軸方向に沿って、順に複数の第1夾持装置33が離間配置され、且つ基板収容エリア2の第3軸方向に対応する第1夾持装置33の両端に、それぞれ少なくとも一つの押圧手段Pが設けられ、ここではその数量は限定せず、実際の必要に応じて設置され、押圧手段Pは基板に接触し並びに基板を圧迫固定するのに用いられ、且つこれら押圧手段Pは同一の直線上に設けられる。   See FIG. 2A. The present invention presents a kind of plating rack 3, which includes one interlocking frame 30 and one support frame 35 connected to an external driving device (not shown). The interlocking frame 30 and one end of the support frame 35 are connected to the first horizontal frame member 310 and the second horizontal frame member 311, respectively, so as to face each other in the first axis direction of the substrate housing area 2. The horizontal frame member 310 and the second horizontal frame member 311 correspond to the telescopic rod 32 at both ends in the second axial direction of the substrate housing area 2, and the telescopic rod 32 is extended or shortened along the first axial direction. In the first horizontal frame member 310 and the second horizontal frame member 311, a plurality of first holding devices 33 are sequentially spaced apart along the second axial direction of the substrate housing area 2, and the third axial direction of the substrate housing area 2 Vs. At least one pressing means P is provided at both ends of the first holding device 33, and the number of the pressing means P is not limited here. The pressing means P is installed according to actual needs. The pressing means P are provided on the same straight line.

図2B〜図2Cを共に参照されたい。本発明のメッキ用ラック3の特徴は、第1夾持装置33がロッド330を具え、押圧手段Pの近隣のロッド330の一側に、第1液止め手段34が設けられ、第1液止め手段34は、第3軸方向に向けて且つ基板収容エリア2に対向するように、これら押圧手段Pを囲むように環状形態に設置され、さらに説明すると、基板の該第1軸方向の上端の高さは第1液止め手段34の上端の高さを超過せず、押圧手段Pと第1液止め手段34の間に閉じた空間Aが形成される。   Please refer to FIGS. 2B to 2C together. The plating rack 3 according to the present invention is characterized in that the first holding device 33 includes a rod 330, a first liquid stopper 34 is provided on one side of the rod 330 adjacent to the pressing means P, and the first liquid stopper The means 34 is installed in an annular shape so as to surround the pressing means P so as to face the substrate housing area 2 toward the third axis direction. Further, the means 34 is arranged at the upper end of the substrate in the first axis direction. The height does not exceed the height of the upper end of the first liquid stopper 34, and a closed space A is formed between the pressing means P and the first liquid stopper 34.

図3Aは、本発明の別の実施例を示し、この実施例中にメッキ用ラック4が提示され、本実施例中の前の実施例と類似の部分は改めて説明せず、異なる部分について説明し、その類似の部品は前の実施例の部品符号を援用して説明する。   FIG. 3A shows another embodiment of the present invention, in which a plating rack 4 is presented, and similar parts to the previous embodiment in this embodiment will not be described again, and different parts will be described. The similar parts will be described with the aid of the part codes of the previous embodiment.

メッキ用ラック4は、前の実施例で述べられた連動フレーム30、サポートフレーム35、第1横枠材310と第2横枠材311を包含し、本実施例中のメッキ用ラック4は、前の実施例で述べられた伸縮ロッド32と第1夾持装置33を包含せず、且つ第1横枠材310或いは第2横枠材311のいずれかは、前述の第1軸方向に沿って自由に移動することができる。   The plating rack 4 includes the interlocking frame 30, the support frame 35, the first horizontal frame member 310, and the second horizontal frame member 311 described in the previous embodiment. The plating rack 4 in this embodiment includes: The telescopic rod 32 and the first holding device 33 described in the previous embodiment are not included, and either the first horizontal frame member 310 or the second horizontal frame member 311 extends along the first axial direction described above. Can move freely.

図3B〜図3Cを参照されたい。本実施例の特徴は以下のとおりである。   See FIGS. 3B-3C. The features of the present embodiment are as follows.

第2夾持装置43が前述の第1軸方向に沿って設置され、並びに第1横枠材310と第2横枠材311に接続され、該第2夾持装置43は前述の第2軸方向に沿って複数の第1縦ロッド430を具え且つ離間配列され、これら第1縦ロッド430の間距は同じ或いは異なるものとされ、ここでは限定せず、実際の必要により設計され、これら第1縦ロッド430の一端は第1横ロッド431に接続され、且つこの接続位置の第1横ロッド431に少なくとも一つの第1押圧手段P1が設けられ、それは該基板を押圧固定するのに用いられ、これら第1押圧手段P1は同一直線上に設けられ、さらに説明すると、第1縦ロッド430と第1横ロッド431は相互に垂直或いは相互に非垂直で、ここでは限定せず、実際の必要により設計される。   The second holding device 43 is installed along the first axis direction described above, and is connected to the first horizontal frame member 310 and the second horizontal frame member 311, and the second holding device 43 is connected to the second axis member described above. A plurality of first longitudinal rods 430 are arranged along the direction and spaced apart, and the distance between the first longitudinal rods 430 is the same or different, and is not limited here, and is designed according to actual needs. One end of the vertical rod 430 is connected to the first horizontal rod 431, and at least one first pressing means P1 is provided on the first horizontal rod 431 at this connection position, which is used to press and fix the substrate. These first pressing means P1 are provided on the same straight line, and will be further described. The first vertical rod 430 and the first horizontal rod 431 are perpendicular to each other or non-perpendicular to each other. Designed.

第2液止め手段44が、第1横ロッド431中に設けられ、且つ第2液止め手段44は前述の第2軸方向に沿って延伸されて第1横ロッド431の両側端に至り並びにこれら第1押圧手段P1を囲む環状形態に設置され、これら第1押圧手段P1と第2液止め手段44の間に第1の閉じた空間A1が形成されている。   The second liquid stop means 44 is provided in the first horizontal rod 431, and the second liquid stop means 44 extends along the second axial direction described above to reach both side ends of the first horizontal rod 431 and these. It is installed in an annular shape surrounding the first pressing means P1, and a first closed space A1 is formed between the first pressing means P1 and the second liquid stopper means 44.

以上を受け、第2液止め手段44の、該第2軸方向に対応する長さは、該基板に等しいかそれより小さく、且つ該第1軸方向に対応する基板の上辺の高さは第2液止め手段44の上辺高さを超過しない。   Accordingly, the length of the second liquid stopper 44 corresponding to the second axial direction is equal to or smaller than the substrate, and the height of the upper side of the substrate corresponding to the first axial direction is the first height. The upper side height of the two-liquid stopper 44 is not exceeded.

図4Aを参照されたい。それは本発明のさらに別の実施例を示し、この実施例中にはメッキ用ラック5が提示されている。この実施例中、直前の実施例と類似する部分については重複した説明は行なわず、僅かに異なる部分について説明し、その類似の部品は直前の実施例の部品符号を援用して説明する。   See FIG. 4A. It represents a further embodiment of the invention, in which a plating rack 5 is presented. In this embodiment, parts similar to those in the previous embodiment will not be described redundantly, and slightly different parts will be described. The similar parts will be described with reference to the part reference numerals in the previous embodiment.

メッキ用ラック5は、連動フレーム30、サポートフレーム35、第1横枠材310、第2横枠材311、第2夾持装置43、第1押圧手段P1及び第2液止め手段44を包含する。本実施例中のメッキ用ラック5は、以下のような特徴を有している。   The plating rack 5 includes an interlocking frame 30, a support frame 35, a first horizontal frame member 310, a second horizontal frame member 311, a second holding device 43, a first pressing unit P 1, and a second liquid stopper unit 44. . The plating rack 5 in this embodiment has the following characteristics.

該第2軸方向の各一つの基板の両側に、それぞれ第1縦枠材510と第2縦枠材511が配置され、第1縦枠材510と第2縦枠材511は、該第1軸方向の両側端に対応しそれぞれ第1横枠材310と第2横枠材311に接続され、第1縦枠材510と第2縦枠材511は、基板収容エリア2の対応側にそれぞれ第3夾持装置53が設けられている。   A first vertical frame member 510 and a second vertical frame member 511 are disposed on both sides of each substrate in the second axial direction, respectively, and the first vertical frame member 510 and the second vertical frame member 511 are connected to the first vertical frame member 511. Corresponding to both ends in the axial direction, the first horizontal frame member 310 and the second horizontal frame member 311 are connected to the first horizontal frame member 310 and the second horizontal frame member 311, respectively. A third gripping device 53 is provided.

図4B〜図4Cを参照されたい。第3夾持装置53は、該第1軸方向に複数の第2横ロッド530を有し且つ順に配列され、これら第2横ロッド530の間距は同じでも同じでなくともよく、ここでは限定せず、必要に応じて設計され、これら第2横ロッド530の一端は、第2縦ロッド531に接続され、前述の接続位置の第2縦ロッド531に少なくとも一つの第2押圧手段P2が設けられ、これら第2押圧手段P2は基板固定を強化するのに用いられ、それを移動過程中により安定させ、これら第2押圧手段P2は同一直線上に設けられ、さらに説明すると、第2縦ロッド531と第2横ロッド530は相互に垂直或いは非垂直とされ、ここでは限定せず、実際の必要に応じて設計される。   See FIGS. 4B-4C. The third gripping device 53 has a plurality of second horizontal rods 530 in the first axial direction and is arranged in order, and the distance between the second horizontal rods 530 may or may not be the same. Instead, one end of the second horizontal rod 530 is connected to the second vertical rod 531, and at least one second pressing means P2 is provided on the second vertical rod 531 at the aforementioned connection position. These second pressing means P2 are used to reinforce the substrate fixing and make it more stable during the moving process, and these second pressing means P2 are provided on the same straight line. And the second transverse rod 530 are perpendicular or non-vertical to each other, and are not limited here and are designed according to actual needs.

第3液止め手段54は、第2縦ロッド531中に設けられ、且つ第3液止め手段54は該第1軸方向に沿って延伸されて第2縦ロッド531の両側端まで延伸され、並びにこれら第2押圧手段P2を囲む環状形態に設置され、これら第2押圧手段P2と第3液止め手段54の間に第2の閉じた空間A2が形成される。   The third liquid stopper 54 is provided in the second vertical rod 531, and the third liquid stopper 54 is extended along the first axial direction and extended to both ends of the second vertical rod 531. A second closed space A2 is formed between the second pressing means P2 and the third liquid stopper means 54. The second closed space A2 is formed in an annular shape surrounding the second pressing means P2.

以上を受け、第3液止め手段54は該第1軸方向に対応する長さが基板に等しいかそれより小さく、且つ該第2軸方向に対応する基板の上辺高さは第3液止め手段54の上辺高さを超過しない。   Accordingly, the third liquid stopper 54 has a length corresponding to the first axial direction equal to or smaller than the substrate, and the height of the upper side of the substrate corresponding to the second axial direction is the third liquid stopper. The upper side height of 54 is not exceeded.

上述の本発明の三つの実施例は、上述の第1液止め手段34、第2液止め手段44、第3液止め手段54が軟性材質のシールストリップとされ、その材料は、NBR合成ゴム、EPDM合成ゴム、VITONフッ化炭素ゴム、シリコーンゴム、或いはテフロン(登録商標)、IIR(ブチルゴム)、CR(クロロプレンゴム)のいずれかとされる。   In the above-described three embodiments of the present invention, the first liquid stop means 34, the second liquid stop means 44, and the third liquid stop means 54 described above are made of a soft seal strip, and the material thereof is NBR synthetic rubber, EPDM synthetic rubber, VITON fluorocarbon rubber, silicone rubber, or Teflon (registered trademark), IIR (butyl rubber), CR (chloroprene rubber).

総合すると、本発明に提示されるメッキ用ラックの上述の各種実施例は、その技術特徴が、夾持ポイントエリア外に一層の液止めストリップ(34/44/54)を加える方式により、軟質の液止めストリップにより薬剤の進入を阻止し、液止めストリップエリア内に金属がメッキされるのを防止でき、これにより、辺枠の厚さが電気メッキの過程中に厚くなるか或いは金属渣を発生するのを防止し、後続工程で周辺を研磨するか周辺を裁断するプロセスを不要として製造コストを下げ、さらに金属渣の発生を防止することで製造歩留りをアップする。   In summary, the various embodiments described above of the plating rack presented in the present invention are characterized in that the technical feature is the addition of a single liquid stop strip (34/44/54) outside the holding point area. The liquid stop strip prevents the entry of chemicals and prevents metal from being plated in the liquid stop strip area, which causes the frame thickness to increase during the electroplating process or generate metal residue. This eliminates the need for a process of polishing or cutting the periphery in the subsequent process, lowers the manufacturing cost, and prevents the generation of metal residue, thereby increasing the manufacturing yield.

以上は本発明の好ましい実施例の説明に過ぎず、並びに本発明を限定するものではなく、本発明に提示の精神より逸脱せずに完成されるその他の同等の効果の修飾或いは置換は、いずれも本発明の権利請求範囲内に属する。   The foregoing is only a description of the preferred embodiment of the present invention, and is not intended to limit the present invention. Other equivalent effect modifications or substitutions that may be accomplished without departing from the spirit of the present invention are not Are also within the scope of the claims of the present invention.

[周知技術]
1 メッキ用ラック
2 基板収容エリア
10 連動フレーム
110 第1横枠材
111 第2横枠材
12 伸縮ロッド
13 夾持装置
15 サポートフレーム
[本発明]
2 基板収容エリア
3 メッキ用ラック
30 連動フレーム
310 第1横枠材
311 第2横枠材
32 伸縮ロッド
33 第1夾持装置
330 ロッド
34 第1液止め手段
35 サポートフレーム
4 メッキ用ラック
43 第2夾持装置
430 第1縦ロッド
431 第1横ロッド
44 第2液止め手段
5 メッキ用ラック
510 第1縦枠材
511 第2縦枠材
53 第3夾持装置
530 第2横ロッド
531 第2縦ロッド
54 第3液止め手段
A 閉じた空間
A1 第1の閉じた空間
A2 第2の閉じた空間
P 押圧手段
P1 第1押圧手段
P2 第2押圧手段
[Known technology]
DESCRIPTION OF SYMBOLS 1 Rack for plating 2 Substrate accommodation area 10 Interlocking frame 110 1st horizontal frame material 111 2nd horizontal frame material 12 Telescopic rod 13 Holding device 15 Support frame [this invention]
2 Substrate accommodation area 3 Plating rack 30 Interlocking frame 310 First horizontal frame member 311 Second horizontal frame member 32 Telescopic rod 33 First holding device 330 Rod 34 First liquid stopper 35 Support frame 4 Plating rack 43 Second Holding device 430 1st vertical rod 431 1st horizontal rod 44 2nd liquid stop means 5 Plating rack 510 1st vertical frame material 511 2nd vertical frame material 53 3rd clamping device 530 2nd horizontal rod 531 2nd vertical Rod 54 Third liquid stop means A Closed space A1 First closed space A2 Second closed space P Pressing means P1 First pressing means P2 Second pressing means

Claims (14)

メッキ用ラックにおいて、
連動フレームであって、外部駆動装置に接続され、該連動フレームの一端は第1横枠材に接続される、上記連動フレームと、
サポートフレームであって、該連動フレームと、第1軸方向において相互に対向するように設置され、該サポートフレームの一端は、第2横枠材に接続される、上記サポートフレームと、
伸縮ロッドであって、該第1軸方向に沿って延伸され、それぞれ該第1横枠材と該第2横枠材の両端に接続される、上記伸縮ロッドと、
複数の第1夾持装置であって、第2軸方向に沿って該第1横枠材と該第2横枠材に順に設置され、第3軸方向に対応する該複数の第1夾持装置の両端にそれぞれ少なくとも一つの押圧手段が設けられる、上記複数の第1夾持装置と、
を包含し、該押圧手段の近隣の該第1夾持装置は第1液止め手段を具え、該第1液止め手段は該押圧手段を囲む環状形態に設置され、該押圧手段と該第1液止め手段の間に閉じた空間を形成することを特徴とする、メッキ用ラック。
In plating racks,
An interlocking frame, connected to an external drive device, one end of the interlocking frame connected to the first horizontal frame member, and the interlocking frame;
A support frame, the interlock frame, and the support frame, which are installed to face each other in the first axial direction, and one end of the support frame is connected to a second horizontal frame member;
A telescopic rod that extends along the first axial direction and is connected to both ends of the first horizontal frame member and the second horizontal frame member,
A plurality of first gripping devices, which are sequentially installed on the first horizontal frame member and the second horizontal frame member along the second axial direction, and the plurality of first gripping devices corresponding to the third axial direction A plurality of first gripping devices provided with at least one pressing means at each end of the device;
The first gripping device in the vicinity of the pressing means includes first liquid stopping means, and the first liquid stopping means is installed in an annular shape surrounding the pressing means, and the pressing means and the first A plating rack, wherein a closed space is formed between the liquid stoppers.
請求項1記載のメッキ用ラックにおいて、該第1液止め手段は軟性材質のシールストリップとされ、該第1液止め手段の材料は、NBR合成ゴム、EPDM合成ゴム、VITONフッ化炭素ゴム、シリコーンゴム、或いはテフロン(登録商標)のいずれかとされることを特徴とする、メッキ用ラック。   2. The plating rack according to claim 1, wherein the first liquid stop means is a soft material seal strip, and the material of the first liquid stop means is NBR synthetic rubber, EPDM synthetic rubber, VITON fluorocarbon rubber, silicone. A plating rack characterized by being made of either rubber or Teflon (registered trademark). 請求項1記載のメッキ用ラックにおいて、該押圧手段は基板を夾持固定するのに用いられ、該第1軸方向に対応する該基板の上辺の高さは該第1液止め手段の上辺の高さを超過しないことを特徴とする、メッキ用ラック。   2. The plating rack according to claim 1, wherein the pressing means is used for holding and fixing the substrate, and the height of the upper side of the substrate corresponding to the first axial direction is the upper side of the first liquid stopper means. A plating rack characterized by not exceeding the height. 請求項1記載のメッキ用ラックにおいて、これら押圧手段は同一直線上に配置されることを特徴とする、メッキ用ラック。   2. A plating rack according to claim 1, wherein said pressing means are arranged on the same straight line. 請求項1記載のメッキ用ラックにおいて、該伸縮ロッドは該第1軸方向に沿って伸縮することを特徴とする、メッキ用ラック。   The plating rack according to claim 1, wherein the telescopic rod expands and contracts along the first axial direction. メッキ用ラックにおいて、
連動フレームであって、一端が外部駆動装置に接続される、上記連動フレームと、
サポートフレームであって、該連動フレームと、第1軸方向において相互に対向するように設置され、該サポートフレームの一端は、第2横枠材に接続される、上記サポートフレームと、
第1横枠材であって、一端が該連動フレームに接続される、上記第1横枠材と、
第2横枠材であって、一端が該サポートフレームに接続される、上記第2横枠材と、
第2夾持装置であって、該第1軸方向において、それぞれ対向するよう設置され、該第2夾持装置はそれぞれ該第1横枠材と該第2横枠材に接続され、該第2夾持装置は第2軸方向において複数の第1縦ロッドを具え、これら第1縦ロッドの一端はそれぞれ第1横ロッドに接続され、この接続された該第1横ロッドの近隣に少なくとも一つの第1押圧手段が設けられた、上記第2夾持装置と、
第2液止め手段であって、該第2夾持装置の該第1横ロッド中に設けられ、且つ該第2液止め手段は該第2軸方向に沿って該第1横ロッドの両側端に延伸され、並びにこれら第1押圧手段を囲む環状形態に設置され、該第1押圧手段と該第2液止め手段の間に第1の閉じた空間を形成する、上記第2液止め手段と、
を包含することを特徴とする、メッキ用ラック。
In plating racks,
An interlocking frame, one end of which is connected to an external drive device;
A support frame, the interlock frame, and the support frame, which are installed to face each other in the first axial direction, and one end of the support frame is connected to a second horizontal frame member
A first horizontal frame member, one end of which is connected to the interlocking frame;
The second horizontal frame member, one end of which is connected to the support frame;
A second holding device, which is installed so as to face each other in the first axial direction, and the second holding device is connected to the first horizontal frame material and the second horizontal frame material, respectively, The two-grip device includes a plurality of first vertical rods in the second axial direction, and one end of each of the first vertical rods is connected to the first horizontal rod, and at least one is adjacent to the connected first horizontal rod. The second holding device provided with two first pressing means;
2nd liquid stop means, Comprising: It is provided in this 1st horizontal rod of this 2nd clamping apparatus, and this 2nd liquid stop means is a both-sides end of this 1st horizontal rod along this 2nd axial direction And the second liquid stop means installed in an annular shape surrounding the first press means and forming a first closed space between the first press means and the second liquid stop means ,
A plating rack, comprising:
請求項6記載のメッキ用ラックにおいて、該第2液止め手段は軟性材質のシールストリップとされ、該第2液止め手段の材料は、NBR合成ゴム、EPDM合成ゴム、VITONフッ化炭素ゴム、シリコーンゴム、或いはテフロン(登録商標)のいずれかとされることを特徴とする、メッキ用ラック。   7. The plating rack according to claim 6, wherein the second liquid stop means is a soft material seal strip, and the material of the second liquid stop means is NBR synthetic rubber, EPDM synthetic rubber, VITON fluorocarbon rubber, silicone. A plating rack characterized by being made of either rubber or Teflon (registered trademark). 請求項6記載のメッキ用ラックにおいて、該第1押圧手段は基板を夾持固定するのに用いられ、該第2液止め手段の該第2軸方向に対応する長さは該基板に等しいかそれより小さく、且つ該第1軸方向に対応する該基板の上辺高さは、該第2液止め手段の上辺高さを超過しないことを特徴とする、メッキ用ラック。   7. The plating rack according to claim 6, wherein the first pressing means is used for holding and fixing the substrate, and the length of the second liquid stopper means corresponding to the second axial direction is equal to the substrate. The plating rack, wherein the height of the upper side of the substrate smaller than that and corresponding to the first axial direction does not exceed the height of the upper side of the second liquid stopper. 請求項6記載のメッキ用ラックにおいて、これら第1押圧手段は同一直線上に配置されることを特徴とする、メッキ用ラック。   The plating rack according to claim 6, wherein the first pressing means are arranged on the same straight line. 請求項6記載のメッキ用ラックにおいて、該第1横枠材或いは該第2横枠材のいずれかは、該第1軸方向に沿って自由に移動可能な枠材であることを特徴とする、メッキ用ラック。   The plating rack according to claim 6, wherein either the first horizontal frame member or the second horizontal frame member is a frame member that is freely movable along the first axial direction. , Rack for plating. 請求項6記載のメッキ用ラックにおいて、さらに、
第1縦枠材であって、その両端がそれぞれ該第1横枠材と該第2横枠材の一端に接続された、上記第1縦枠材と、
第2縦枠材であって、該第2軸方向において該第1縦枠材に対向するよう設置され、該第2縦枠材の両端は該第1横枠材と該第2横枠材の一端に接続され、該第1縦枠材と該第2縦枠材は相互に対向する側に第3夾持装置が設けられた、上記第2縦枠材と、
を包含し、該第1軸方向の該第3夾持装置は複数の第2横ロッドを具え、これら第2横ロッドの一端は、第2縦ロッドに接続され、この接続された第2縦ロッドに少なくとも一つの第2押圧手段が設けられたことを特徴とする、メッキ用ラック。
The plating rack according to claim 6, further comprising:
A first vertical frame member, the first vertical frame member having both ends connected to one end of the first horizontal frame member and the second horizontal frame member;
A second vertical frame member, which is disposed so as to face the first vertical frame member in the second axial direction; both ends of the second vertical frame member are the first horizontal frame member and the second horizontal frame member; The second vertical frame member, wherein the first vertical frame member and the second vertical frame member are provided with a third clamping device on opposite sides thereof,
The third holding device in the first axial direction includes a plurality of second transverse rods, one end of the second transverse rods being connected to the second longitudinal rods, and the connected second longitudinal rods A plating rack, wherein the rod is provided with at least one second pressing means.
請求項11記載のメッキ用ラックにおいて、該第2押圧手段は基板を夾持固定するのに用いられ、該第3夾持装置の該第2縦ロッド中に第3液止め手段が設けられ、該第3液止め手段は該第1軸方向に対応する方向に延伸されて該第2縦ロッドの両側端に至り、並びにこれら第2押圧手段を囲む環状形態に設置され、これら第2押圧手段と該第3液止め手段の間に第2の閉じた空間を形成することを特徴とする、メッキ用ラック。   The plating rack according to claim 11, wherein the second pressing means is used to clamp and fix the substrate, and a third liquid stopper is provided in the second vertical rod of the third clamping device, The third liquid stopper is extended in a direction corresponding to the first axial direction to reach both ends of the second longitudinal rod, and is installed in an annular shape surrounding the second pressing means. A plating rack, wherein a second closed space is formed between the third liquid stopper and the third liquid stopper. 請求項12記載のメッキ用ラックにおいて、該第3液止め手段は軟性材料のシールストリップとされ、該第3液止め手段の材料は、NBR合成ゴム、EPDM合成ゴム、VITONフッ化炭素ゴム、シリコーンゴム、或いはテフロン(登録商標)のいずれかとされることを特徴とする、メッキ用ラック。   13. The plating rack according to claim 12, wherein the third liquid stop means is a seal strip made of a soft material, and the material of the third liquid stop means is NBR synthetic rubber, EPDM synthetic rubber, VITON fluorocarbon rubber, silicone. A plating rack characterized by being made of either rubber or Teflon (registered trademark). 請求項12記載のメッキ用ラックにおいて、これら第2押圧手段は同一直線上に配置され、且つ該第2軸方向に対応する該基板の上辺高さは該第3液止め手段の上辺高さを超過しないことを特徴とする、メッキ用ラック。   13. The plating rack according to claim 12, wherein the second pressing means are arranged on the same straight line, and the upper side height of the substrate corresponding to the second axial direction is the upper side height of the third liquid stopper means. Plating rack, characterized by not exceeding.
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TW201542884A (en) 2015-11-16

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