JP2015197954A - Electrooptic device and electronic equipment - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an electrooptic device that is adaptable to higher definition and is enhanced in uniformity of emission luminance.SOLUTION: Function liquid containing function materials whose kinds are varied every thin film is applied and dried inside an opening portion formed by a partition wall to thereby form a function layer. The partition wall has a first step portion 26 forming a first opening portion 25a, and a second step portion 27 which is located at a higher stage than the first step portion 26, and forms a second opening portion 25b larger than the first opening portion 25a. The first step portion 26 is provided along an area where the first opening portion 25a and an area Lo which is relatively lower in height on the surface of a substrate are overlapped with each other in plan view. The second step portion 27 is provided along an area where the second opening portion 25b and an area Hi which is relatively higher in height on the surface of the substrate are overlapped with each other in plan view.

Description

  The present invention relates to an electro-optical device and an electronic apparatus.

  In recent years, an electro-optical device using a light emitting element called an organic light emitting diode (OLED) such as an organic electroluminescent (EL) element or a light emitting polymer element has been developed. In addition, since the organic EL element is a self-luminous type, it not only has high visibility, but is also thin and light and has excellent impact resistance, and thus has attracted attention as a display device that replaces a liquid crystal display device.

  The organic EL element is made of a transparent electrode material such as ITO (Indium Tin Oxide) on a light-transmitting substrate such as a glass substrate on which a switching element such as a thin film transistor (TFT) is formed. Anode electrode, hole injection layer (HIL), hole transport layer (HTL), emission layer (EML), electron transport layer (ETL) and electron injection It has a structure in which a functional layer including a layer (EIL: Electron Injection Layer) and a cathode electrode made of a conductive metal material such as an MgAg alloy are sequentially stacked.

  When forming a light emitting layer in an organic EL element, a method of forming a film of a low molecular weight organic material by a vapor deposition method and a method of applying a liquid form of a high molecular weight organic material are known. Recently, an electro-optical device has been developed that employs a method of applying a functional liquid (ink) in which an organic material is dissolved or dispersed in a solvent using an ink-jet method that can be easily and finely patterned without material waste. (For example, refer to Patent Documents 1 to 7.)

  Specifically, a partition wall for partitioning a region where a functional layer is formed is provided on a substrate, and an ink in which a light emitting layer forming material is dissolved or dispersed in a solvent is ink jetted inside an opening formed by the partition wall. A light emitting layer is formed by applying and drying the coating.

Japanese Patent No. 5343815 JP 2010-9815 A JP 2008-4378 A JP 2003-249377 A JP 2007-53334 A JP-A-2005-174907 Republished WO2008 / 149498

  By the way, in the electro-optical device described above, it is expected that the area of the opening portion will be reduced in the future due to further high definition of the light emitting pixels. In this case, there is a possibility that it is difficult to ensure a sufficient film thickness of each thin film due to insufficient filling of the ink filled inside the opening.

  In addition, the conventional electro-optical device has a problem in that the uniformity of light emission luminance is reduced due to non-uniform thickness (surface height) of the light emitting layer formed inside the partition after drying. It was. In particular, since the film thickness of the light emitting layer varies greatly at the boundary portion between the opening and the partition, that is, along the side surface of the partition forming the opening, the nonuniformity of the light emission luminance at this boundary portion is reduced. It is a problem.

  One aspect of the present invention has been proposed in view of such conventional circumstances, an electro-optical device that can cope with further higher definition and has improved emission luminance uniformity, and An object is to provide an electronic apparatus including such an electro-optical device.

An electro-optical device according to one aspect of the present invention includes a functional layer formed by laminating a plurality of thin films including at least a light-emitting layer on a substrate, and a partition partitioning a region where the functional layer is formed. . The functional layer is formed by applying and drying a functional liquid containing different types of functional materials for each thin film inside the opening formed by the partition walls. The partition wall includes a first step portion that forms the first opening portion, and a second step portion that is positioned higher than the first step portion and forms a second opening portion that is larger than the first opening portion. And a step portion. The first step portion is provided along a region where a region having a relatively low height on the surface of the substrate overlaps with the first opening in plan view. The second stepped portion is provided along a region where the region having a relatively high height on the surface of the substrate and the second opening overlap in plan view.
According to this configuration, it is possible to ensure a large light emitting region by the functional layer and to sufficiently secure the film thickness of each thin film formed inside the first opening and the second opening. Thereby, it is possible to cope with further high definition. In addition, the film thickness uniformity of each thin film is suppressed while suppressing the influence of the height difference between the region where the height is relatively low on the surface of the substrate and the region where the height is relatively high on the surface of the substrate. By ensuring the above, it is possible to further improve the uniformity of the light emission luminance. In particular, such a structure is suitable for application to a top emission structure in which light is extracted from the side opposite to the substrate.

Further, in the above configuration, the partition wall includes a lower wall layer that is lyophilic with respect to the functional liquid and an upper wall layer that is lyophilic with respect to the functional liquid, and the first step portion. Is formed by the first bank layer including the lower wall layer and the upper wall layer, and the side surfaces of the lower wall layer and the upper wall layer forming the first opening are inclined toward the inside of the first opening. The second stepped portion having the first inclined surface is formed by the second bank layer including the lower wall layer and the upper wall layer on the surface of the first bank layer, and the second opening portion is formed. The side surfaces of the lower wall layer and the upper wall layer to be formed have a second inclined surface inclined toward the inside of the second opening, and are positioned below the light emitting layer among the plurality of thin films forming the functional layer. The at least one thin film is provided so as to protrude beyond the first inclined surface to the upper surface side of the first bank layer, and the thin film forming the light emitting layer is provided with the second inclined surface. It may be configured is also provided in a state of protruding on the upper surface side of the second bank layer than.
According to this configuration, the film thickness (surface height) of at least one thin film located in the lower layer of the light emitting layer at the boundary between the first opening and the first stepped portion (first bank layer). While suppressing the fluctuation, the fluctuation of the film thickness (surface height) of the thin film forming the light emitting layer at the boundary portion between the second opening and the second step portion (second bank layer) is suppressed to a low level. Can do.

In the above structure, the second bank layer may have a light shielding property.
According to this configuration, in the top emission structure in which light is extracted from the side opposite to the substrate, it is possible to avoid the influence of reflection due to the wiring and the like located in the lower layer of the second bank layer.

In any one of the above inclined surfaces, the inclination angle of the side surface of the upper wall layer may be smaller than the inclination angle of the side surface of the lower wall layer.
According to this structure, the uniformity of the thin film thickness can be ensured.

In the above configuration, the side wall may have an inclination angle of 45 ° or less and the thickness of the lower wall layer may be 10 μm or less.
According to this structure, the uniformity of the thin film thickness can be ensured.

An electronic apparatus according to an aspect of the invention includes any one of the above electro-optical devices.
According to this configuration, it is possible to provide an electronic apparatus including an electro-optical device that improves the uniformity of light emission luminance.

1 is a schematic diagram illustrating a circuit configuration of an electro-optical device according to an embodiment of the invention. FIG. 2 is a perspective plan view showing a planar structure of a pixel region of the electro-optical device shown in FIG. 1. FIG. 2 is a cross-sectional view illustrating a cross-sectional structure of a pixel region of the electro-optical device illustrated in FIG. 1. FIG. 2 is an enlarged cross-sectional view of a boundary portion between a partition wall and an opening of the electro-optical device illustrated in FIG. 1. FIG. 2 is a perspective view illustrating an example of an electronic apparatus including the electro-optical device illustrated in FIG. 1. FIG. 2 is a perspective view illustrating an example of an electronic apparatus including the electro-optical device illustrated in FIG. 1. FIG. 2 is a perspective view illustrating an example of an electronic apparatus including the electro-optical device illustrated in FIG. 1.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
In addition, in the drawings used in the following description, in order to make the features easy to understand, there are cases where the portions that become the features are enlarged for the sake of convenience, and the dimensional ratios of the respective components are not always the same as the actual ones. Absent. In addition, the materials, dimensions, and the like exemplified in the following description are merely examples, and the present invention is not necessarily limited thereto, and can be appropriately modified and implemented without departing from the scope of the invention. .

(Electro-optical device)
First, a circuit configuration of the electro-optical device 1 shown in FIG. 1 will be described as an embodiment of the present invention. FIG. 1 is a schematic diagram illustrating a circuit configuration of the electro-optical device 1.

  As shown in FIG. 1, the electro-optical device 1 includes a plurality of scanning lines 101 arranged at a predetermined interval on the surface of the substrate 100, and a direction that intersects the plurality of scanning lines 101 at a substantially right angle with a space therebetween. Wiring including a plurality of signal lines 102 arranged at predetermined intervals and a plurality of power supply lines 103 arranged at predetermined intervals in a direction substantially parallel to the signal lines 102 with a space therebetween. A plurality of pixel regions A are provided in a matrix in the vicinity of the intersections of the plurality of scanning lines 101 and the plurality of signal lines 102.

  Each signal line 102 is connected to a signal side drive circuit 104 including a shift register, a level shifter, a video line, and an analog switch. Each scanning line 101 is connected to a scanning side drive circuit 105 having a shift register and a level shifter.

  In each pixel region A, a switching TFT 106 to which a scanning signal is supplied via the scanning line 101, a holding capacitor 107 for holding a pixel signal supplied from the signal line 102 via the switching TFT 106, and this holding A driving TFT 108 to which a pixel signal held by the capacitor 107 is supplied; a pixel electrode (anode) 109 into which a driving current flows from the power supply line 103 when electrically connected to the power supply line 103 via the driving TFT 108; A counter electrode (cathode) 110 facing the pixel electrode 109 and a functional layer 111 sandwiched between the pixel electrode 109 and the counter electrode 110 are provided.

  In the electro-optical device 1 having the above configuration, when the scanning line 101 is driven and the switching TFT 106 is turned on, the potential of the signal line 102 at that time is held in the holding capacitor 107. The on / off state of the driving TFT 108 is determined according to the state of the storage capacitor 107. Then, current flows from the power supply line 103 to the pixel electrode (anode) 109 through the channel of the driving TFT 108, and further current flows to the counter electrode (cathode) 110 through the functional layer 111. The functional layer 111 emits light according to the amount of current that flows. A desired image can be displayed by controlling the light emission in the pixel region A.

  The electro-optical device 1 includes a bottom emission structure that extracts light from the substrate 100 side and a top emission structure that extracts light from the side opposite to the substrate 100. The electro-optical device 1 according to this embodiment can employ any structure. When the bottom emission structure is employed, a substrate (transparent substrate) having light transmittance such as various glass materials and transparent resin materials can be used for the substrate 100. On the other hand, when the top emission structure is adopted, a substrate made of a ceramic material or a metal material can be used as the substrate 100 in addition to the transparent substrate described above.

  Next, a specific structure in the pixel region A of the electro-optical device 1 will be described with reference to FIGS. 2 is a perspective plan view showing a planar structure of the pixel area A. FIG. FIG. 3 is a cross-sectional view showing a cross-sectional structure of the pixel region A.

  The electro-optical device 1 of this embodiment is an example in which a top emission structure is employed, and a glass substrate is used as the substrate 100. Specifically, as shown in FIGS. 2 and 3, the electro-optical device 1 has a structure in which a driving element unit 11 and a functional element unit 12 are sequentially stacked on the surface of the substrate 100 described above. Yes.

  The drive element unit 11 is configured by forming the above-described various wirings 101 to 103, the switching TFT 106, the storage capacitor 107, the drive TFT 108, and the like on the surface of the substrate 100. Among these, the driving TFT 108 has a gate electrode 13, a source electrode 14, and a drain electrode 15 formed on the surface of the substrate 100. The gate electrode 13 is electrically connected to the drain electrode (not shown) of the switching TFT 106. A semiconductor layer 17 is provided on the gate electrode 13 via a gate insulating film 16. A first interlayer insulating film 18 is provided on the semiconductor layer 17. The source electrode 14 and the drain electrode 15 are electrically connected to the source region and the drain region of the semiconductor layer 17 through contact plugs 19 a and 19 b formed in the first interlayer insulating film 18. Further, a planarizing layer 20 is provided on the substrate 100 to planarize the surface on which the drive element unit 11 is formed.

  The functional element unit 12 constitutes an organic EL element unit by sequentially laminating the above-described pixel electrode 109, functional layer 111, and counter electrode 110 on the surface of the planarization layer 20. The pixel electrode 109 is formed in a rectangular shape using a transparent electrode material such as ITO (Indium Tin Oxide) as an anode electrode. The pixel electrode 109 is electrically connected to the drain electrode 15 through a contact plug 21 formed in the planarization layer 20. In addition, a second interlayer insulating film 22 is provided on the surface of the planarization layer 20 on which the pixel electrode 109 is formed. In addition, a rectangular opening 22 a is provided at a position facing the pixel electrode 109 of the second interlayer insulating film 22. The counter electrode 110 is provided as a cathode electrode so as to face the pixel electrode 109 using a conductive metal material such as an MgAg alloy.

  In the case of the top emission structure, a light reflection film (not shown) made of a metal material such as Al is provided under the pixel electrode 109 made of a transparent electrode material such as ITO. On the other hand, when the pixel electrode 109 is made of a metal material having light reflection characteristics, the light reflection film can be omitted.

  The functional layer 111 is configured by stacking a plurality of thin films including at least a light emitting layer (EML). Specifically, the functional layer 111 of this embodiment includes a hole injection layer (HIL), a hole transport layer (HTL), a light emitting layer (EML), an electron transport layer (ETL), and an electron injection layer (EIL). It is formed by laminating a plurality of thin films. In addition, about the light emitting layer (EML), when performing a color display, the thin film containing the organic material corresponding to each color light of red (R), green (G), and blue (B) is formed for every pixel area A. It is possible to make each color development different. Further, a sealing layer 23 and a sealing substrate 23b are provided on the substrate 100 so as to cover the surface on which the functional element portion 12 is formed.

  The functional element unit 12 includes a partition wall 24 that partitions a region where the functional layer 111 is formed. The functional layer 111 is formed by applying and drying a functional liquid containing different types of functional materials for each thin film inside the opening 25 formed by the partition wall 24.

  Specifically, FIG. 4 shows an enlarged cross-sectional view of the boundary portion between the partition wall 24 and the opening 25. 4 illustrates a state in which the hole injection layer (HIL), the hole transport layer (HTL), and the light-emitting layer (EML) are stacked among the thin films forming the functional layer 111. The illustration is simplified or omitted.

  As shown in FIGS. 2 to 4, the partition wall 24 has a first step portion 26 that forms the first opening portion 25 a and a first opening portion that is located above the first step portion 26. And a second step portion 27 that forms a second opening 25b larger than 25a.

  The first step portion 26 includes a first bank layer 28 including a lower wall layer 28a that is lyophilic with respect to the functional liquid and an upper wall layer 28b that is lyophilic with respect to the functional liquid. And is formed by. That is, the first bank layer 28 has a structure in which the lower wall layer 28a and the upper wall layer 28b are sequentially laminated on the surface of the second interlayer insulating film 22. Similarly, the second step portion 27 includes a lower wall layer 29a that is lyophilic with respect to the functional liquid, and an upper wall layer 29b that is lyophilic with respect to the functional liquid. The bank layer 29 is formed. That is, the second bank layer 29 has a structure in which the lower wall layer 29a and the upper wall layer 29b are sequentially laminated on the surface of the first bank layer 28.

For the lower wall layers 28a and 29a, for example, an inorganic insulating material such as SiO ₂ or TiO ₂ can be used as being lyophilic with respect to the functional liquid. As the upper wall layers 28b and 29b, those having water repellency by applying CF ₄ treatment or the like to an organic insulating material such as polyimide resin or acrylic resin are used as those exhibiting liquid repellency with respect to the functional liquid. be able to. The upper wall layers 28b and 29b may be formed by subjecting the surfaces of the lower wall layers 28a and 29a to a liquid repellency treatment using, for example, polytetrafluoroethylene. For the first bank layer 28 and the second bank layer 29, a composite material in which an inorganic material having lyophilicity and an organic material having liquid repellency are mixed is used. After the second bank layer 29 is formed, the first bank layer 28 and the second bank layer 29 are subjected to a heat treatment so that the lyophilic lower wall layers 28a and 29a and the liquid repellency can be obtained. The upper wall layers 28b and 29b shown may be separated into layers.

  In the first step portion 26 (first bank layer 28), the side surfaces of the lower wall layer 28a and the upper wall layer 28b forming the first opening 25a are inclined toward the inside of the first opening 25a. It has the 1st inclined surface 26a. Similarly, in the second stepped portion 27 (second bank layer 29), the side surfaces of the lower wall layer 29a and the upper wall layer 29b forming the second opening 25b face the inside of the second opening 25b. And a second inclined surface 27a inclined.

  As shown in FIGS. 2 and 4, in the first step portion 26, the first region Lo and the first opening 25 overlap each other in plan view on the surface of the substrate 100. A substantially rectangular frame is provided along the region. The first region Lo is a region where the pixel electrode 109 is mainly disposed, and a relatively flat surface is formed by the above-described planarization layer 20 on the surface where the pixel electrode 109 is disposed.

  On the other hand, the second stepped portion 27 is substantially along the region where the second region Hi and the second opening 25b whose height is relatively high on the surface of the substrate 100 overlap in plan view. It is provided in a rectangular frame shape. The second region Hi is a region where the above-described various wirings 101 to 103, the storage capacitor 107, and the like are arranged. That is, in the second region Hi, various wirings 101 to 103, the storage capacitor 107, and the like are three-dimensionally overlapped. Further, in order to suppress the specific resistance of the power supply line 103, when the power supply line 103 is a two-layer wiring, or when the line width of the wiring is reduced for high definition, the dimension in the height direction further increases. It will be. Therefore, the height difference is large between the first region Lo and the second region Hi.

  Among the plurality of thin films forming the functional layer 111, the hole injection layer (HIL) and the hole transport layer (HTL) were coated with a functional liquid containing each forming material inside the first opening 25a. Thereafter, it is formed by drying. Further, the hole injection layer (HIL) and the hole transport layer (HTL) are provided in a state of protruding from the upper surface side of the first bank layer 28 with respect to the first inclined surface 26a. On the other hand, the light emitting layer (EML) is formed by applying a functional liquid in which a light emitting layer forming material is dissolved or dispersed in a solvent to the inside of the first opening 25a and then drying. Further, the light emitting layer (EML) is provided in a state of protruding beyond the second inclined surface 27a to the upper surface side of the second bank layer 29. As a method for applying the functional liquid, an ink jet method that can be patterned finely and easily without waste of materials can be preferably used.

  Here, in the partition including the conventional lower wall layer showing lyophilicity and the upper wall layer showing liquid repellency, when the functional liquid was applied inside the opening, it was filled inside the opening. The liquid leakage of the upper wall layer restricts the functional liquid from protruding from the side surface of the lower wall layer forming the opening to the side surface or the upper surface side of the upper wall layer. In this case, the end of the thin film is positioned near the boundary between the lower wall layer and the upper wall layer. Therefore, the film thickness of the thin film greatly changes at the boundary portion between the opening and the partition, that is, the position along the side surface of the partition that forms the opening.

  On the other hand, in the electro-optical device 1 of the present embodiment, the hole injection layer (HIL) and the hole transport layer (HTL) are on the upper surface side of the first bank layer 28 with respect to the first inclined surface 26a. It is provided in a protruding state. Further, the light emitting layer (EML) is provided in a state of protruding beyond the second inclined surface 27a to the upper surface side of the second bank layer 29.

  In the following description, the first inclined surface 26a and the second inclined surface 27a are collectively referred to as inclined surfaces 26a and 27a, and the first opening 25a and the second opening 25b are collectively referred to as the opening 25a. 25b, the first bank layer 28 and the second bank layer 29 are collectively referred to as the bank layers 28, 29, and are referred to as a hole injection layer (HIL), a hole transport layer (HTL), and an emission layer (EML). Are collectively referred to as a thin film.

  In this case, the boundary portions between the openings 25a and 25b and the bank layers 28 and 29 are inclined surfaces 26a and 27a, and the end portions of the thin film are positioned on the upper surface side of the bank layers 28 and 29 with respect to the boundary portions. Variations in the thickness (surface height) of the thin film at the boundary can be suppressed to a low level.

  In order to make the thin film protrude beyond the inclined surfaces 26a and 27a to the upper surface side of the bank layers 28 and 29, it is necessary to increase the amount of the functional liquid filled inside the openings 25a and 25b. In this case, the upper surfaces of the bank layers 28 and 29 can prevent the functional liquid from largely flowing out of the openings 25a and 25b due to the liquid-repellent properties of the upper wall layers 28b and 29b. Thereby, the edge part of the thin film after drying can be located on the upper surface side of the bank layers 28 and 29.

  Further, the first inclined surface 26a and the second inclined surface 27a are formed so that the inclination angle β of the side surfaces of the upper wall layers 28a and 29b is smaller than the inclination angle α of the side surfaces of the lower wall layers 28a and 29a. It is preferable to do. In this case, uniformity of the film thickness of the thin film can be ensured by suppressing the fluctuation of the film thickness (surface height) at the boundary portion.

  Moreover, it is preferable that the inclination | tilt angle (alpha) of the side surface of lower wall layer 28a, 29a is 45 degrees or less. Further, the thickness of the lower wall layers 28a and 29a is preferably 10 μm or less. In this case, uniformity of the film thickness of the thin film can be ensured by suppressing the fluctuation of the film thickness (surface height) at the boundary portion.

  Therefore, in this embodiment, it is possible to provide the electro-optical device 1 in which the uniformity of the light emission luminance is improved by ensuring the uniformity of the thin film thickness.

  Further, in the electro-optical device 1 according to the present embodiment, the first region Lo and the first opening 25a whose height is relatively low on the surface of the substrate 100 overlap the first opening 25a in the plan view. Step portion 26 is provided. In addition, a second stepped portion 27 is provided along a region where the second region Hi and the second opening 25b having a relatively high height on the surface of the substrate 100 overlap in plan view.

  In the case of this configuration, a large light emitting region by the functional layer 111 can be secured, and a sufficient film thickness can be secured for each thin film formed inside the first opening 25a and the second opening 25b. As a result, the electro-optical device 1 according to this embodiment can cope with higher definition.

  Further, in the electro-optical device 1 according to the present embodiment, it is possible to ensure the uniformity of the thickness of each thin film while suppressing the influence of the height difference between the first region Lo and the second region Hi. As a result, it is possible to further improve the uniformity of light emission luminance. In particular, such a structure is suitable for application to a top emission structure in which light is extracted from the side opposite to the substrate 100.

  Further, the second bank layer 29 may have a light shielding property. According to this configuration, in the top emission structure in which light is extracted from the side opposite to the substrate 100, it is possible to avoid the influence of reflection due to the wirings 101 to 103 and the like located below the second bank layer 29.

(Electronics)
Next, specific examples of the electronic apparatus including the electro-optical device 1 will be described with reference to FIGS. 5, 6, and 7.
FIG. 5 is a perspective view showing an example of the mobile phone 200. As shown in FIG. 5, the mobile phone 200 is an example in which the mobile phone main body 201 is provided, and the electro-optical device 1 is used for the display unit 202 provided in the mobile phone main body 201.

  FIG. 6 is a perspective view showing an example of a wrist watch 300. As shown in FIG. 6, the wristwatch 300 includes a timepiece main body 301, and the electro-optical device 1 is used for a display unit 302 provided in the timepiece main body 301.

  FIG. 7 is a perspective view showing an example of a portable information processing apparatus 400 such as a personal computer. As shown in FIG. 7, the portable information processing apparatus 400 includes an apparatus main body 401 and is an example in which the electro-optical device 1 is used for a display unit 402 provided in the apparatus main body 401.

  In addition, as an electronic apparatus including the electro-optical device 1, for example, a digital still camera, a vehicle-mounted monitor, a digital video camera, a viewfinder type or a monitor direct-view type video tape recorder, a car navigation device, An electronic device having a display unit such as a pager, electronic notebook, calculator, workstation, video phone, or POS terminal can be given.

In addition, this invention is not necessarily limited to the thing of the said embodiment, A various change can be added in the range which does not deviate from the meaning of this invention.
For example, in the above-described embodiment, a two-stage structure including the first step part 26 and the second step part 27 is provided, but the structure is not necessarily limited to such a structure, and a functional film is formed. The structure, arrangement, number, and the like of the step portions can be changed as appropriate in accordance with the thin film to be processed.

  In the above-described embodiment, an electro-optical device having an organic EL element has been described as an example of an electro-optical device. However, the present invention is not limited to this, and optical characteristics are obtained by an electrical action. The present invention can be widely applied to electro-optical devices in which the angle changes.

  In the above embodiment, the case where a TFT is used as a drive element or a switching element as an active matrix type electro-optical device has been described. However, a TFD (thin film diode) can also be used as the drive element or the switching element. Further, the present invention can be similarly applied to a passive matrix electro-optical device instead of an active matrix electro-optical device.

  DESCRIPTION OF SYMBOLS 1 ... Electro-optical apparatus 11 ... Drive element part 12 ... Functional element part 13 ... Gate electrode 14 ... Source electrode 15 ... Drain electrode 16 ... Gate insulating film 17 ... Semiconductor layer 18 ... 1st interlayer insulation film 19a, 19b ... Contact plug DESCRIPTION OF SYMBOLS 20 ... Planarization layer 21 ... Contact plug 22 ... 2nd interlayer insulation film 23a ... Seal layer 23b ... Sealing substrate 24 ... Partition 25 ... Opening 25a ... 1st opening 25b ... 2nd opening 26 ... 1st 1 stepped portion 26a ... first inclined surface 27 ... second stepped portion 27a ... second inclined surface 28 ... first bank layer 28a ... lower wall layer 28b ... upper wall layer 29 ... second bank layer 29a ... lower wall layer 29b ... upper wall layer HIL ... hole injection layer (thin film) HTL ... hole transport layer (thin film) EML ... light emitting layer (thin film) ETL ... electron transport layer (thin film) EIL ... electron injection Layer (thin film) 100 ... Substrate 101 ... Scanning line 102 ... Signal line 103 ... Power supply line 104 ... Signal side driving circuit 105 ... Scanning side driving circuit 106 ... Switching TFT 107 ... Retention capacitor 108 ... Driving TFT 109 ... Pixel electrode 110 ... Counter electrode 111 ... Functional layer 200 ... Mobile phone (electronic device) 300 ... Watch (electronic device) 400 ... Portable information processing device (electronic device)

Claims (6)

A functional layer formed by laminating a plurality of thin films including at least a light emitting layer on a substrate; and a partition partitioning a region where the functional layer is formed;
The functional layer is formed by applying and drying a functional liquid containing a different type of functional material for each thin film inside the opening formed by the partition,
The partition wall forms a first step portion that forms a first opening portion and a second opening portion that is located above the first step portion and that is larger than the first opening portion. A second step portion,
The first step portion is provided along a region where the height of the first step portion is relatively low on the surface of the substrate and the first opening portion overlap in plan view.
The second step portion is provided along a region where a region having a relatively high height on the surface of the substrate overlaps the second opening in a plan view. Optical device. The partition wall includes a lower wall layer that is lyophilic with respect to the functional liquid, and an upper wall layer that is lyophilic with respect to the functional liquid.
The first step portion is formed by a first bank layer including the lower wall layer and the upper wall layer, and side surfaces of the lower wall layer and the upper wall layer forming the first opening are A first inclined surface inclined toward the inside of the first opening;
The second step portion is formed on the surface of the first bank layer by a second bank layer including the lower wall layer and the upper wall layer, and forms the second opening. A side surface of the wall layer and the upper wall layer has a second inclined surface inclined toward the inside of the second opening;
Among the plurality of thin films forming the functional layer, at least one thin film positioned below the light emitting layer is provided in a state of protruding from the upper surface side of the first bank layer with respect to the first inclined surface. ,
2. The electro-optical device according to claim 1, wherein the thin film forming the light emitting layer is provided in a state of protruding from an upper surface side of the second bank layer with respect to the second inclined surface.   The electro-optical device according to claim 2, wherein the second bank layer has a light shielding property.   4. The electro-optic according to claim 1, wherein, in any one of the inclined surfaces, an inclination angle of a side surface of the upper wall layer is smaller than an inclination angle of a side surface of the lower wall layer. apparatus.   The electro-optical device according to claim 4, wherein an inclination angle of a side surface of the lower wall layer is 45 ° or less, and a thickness of the lower wall layer is 10 μm or less.   An electronic apparatus comprising the electro-optical device according to claim 1.

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