JP2015197483A - Retardation film - Google Patents
Retardation film Download PDFInfo
- Publication number
- JP2015197483A JP2015197483A JP2014073996A JP2014073996A JP2015197483A JP 2015197483 A JP2015197483 A JP 2015197483A JP 2014073996 A JP2014073996 A JP 2014073996A JP 2014073996 A JP2014073996 A JP 2014073996A JP 2015197483 A JP2015197483 A JP 2015197483A
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- Japan
- Prior art keywords
- group
- carbon atoms
- retardation film
- mass
- alkyl group
- Prior art date
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- Granted
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- 239000000178 monomer Substances 0.000 claims abstract description 61
- 229920001577 copolymer Polymers 0.000 claims abstract description 30
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 18
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 claims abstract description 16
- 125000005395 methacrylic acid group Chemical group 0.000 claims abstract description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 61
- 125000000217 alkyl group Chemical group 0.000 claims description 24
- 125000003118 aryl group Chemical group 0.000 claims description 15
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 14
- 125000003545 alkoxy group Chemical group 0.000 claims description 12
- 125000005843 halogen group Chemical group 0.000 claims description 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 12
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 12
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 claims description 8
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 8
- 125000001424 substituent group Chemical group 0.000 claims description 8
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 claims description 7
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 claims description 4
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 239000010408 film Substances 0.000 description 65
- 238000000034 method Methods 0.000 description 32
- 239000006185 dispersion Substances 0.000 description 18
- -1 2-ethylhexyl Chemical group 0.000 description 14
- 238000006116 polymerization reaction Methods 0.000 description 13
- 229920000642 polymer Polymers 0.000 description 12
- 239000000126 substance Substances 0.000 description 11
- 229920005989 resin Polymers 0.000 description 10
- 239000011347 resin Substances 0.000 description 10
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 9
- 238000005259 measurement Methods 0.000 description 7
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 239000000654 additive Substances 0.000 description 6
- 239000003963 antioxidant agent Substances 0.000 description 6
- 238000005452 bending Methods 0.000 description 6
- 230000009477 glass transition Effects 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000002530 phenolic antioxidant Substances 0.000 description 6
- 239000002356 single layer Substances 0.000 description 6
- 239000012321 sodium triacetoxyborohydride Substances 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 5
- BGYHLZZASRKEJE-UHFFFAOYSA-N [3-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]-2,2-bis[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxymethyl]propyl] 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCC(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 BGYHLZZASRKEJE-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 238000000465 moulding Methods 0.000 description 5
- SSDSCDGVMJFTEQ-UHFFFAOYSA-N octadecyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 SSDSCDGVMJFTEQ-UHFFFAOYSA-N 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 229910052698 phosphorus Inorganic materials 0.000 description 5
- 239000011574 phosphorus Substances 0.000 description 5
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 4
- JKIJEFPNVSHHEI-UHFFFAOYSA-N Phenol, 2,4-bis(1,1-dimethylethyl)-, phosphite (3:1) Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP(OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC1=CC=C(C(C)(C)C)C=C1C(C)(C)C JKIJEFPNVSHHEI-UHFFFAOYSA-N 0.000 description 4
- 230000003078 antioxidant effect Effects 0.000 description 4
- 238000012662 bulk polymerization Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000113 methacrylic resin Substances 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 4
- XYXJKPCGSGVSBO-UHFFFAOYSA-N 1,3,5-tris[(4-tert-butyl-3-hydroxy-2,6-dimethylphenyl)methyl]-1,3,5-triazinane-2,4,6-trione Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C)=C1CN1C(=O)N(CC=2C(=C(O)C(=CC=2C)C(C)(C)C)C)C(=O)N(CC=2C(=C(O)C(=CC=2C)C(C)(C)C)C)C1=O XYXJKPCGSGVSBO-UHFFFAOYSA-N 0.000 description 3
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- STLLXWLDRUVCHL-UHFFFAOYSA-N [2-[1-[2-hydroxy-3,5-bis(2-methylbutan-2-yl)phenyl]ethyl]-4,6-bis(2-methylbutan-2-yl)phenyl] prop-2-enoate Chemical compound CCC(C)(C)C1=CC(C(C)(C)CC)=CC(C(C)C=2C(=C(C=C(C=2)C(C)(C)CC)C(C)(C)CC)OC(=O)C=C)=C1O STLLXWLDRUVCHL-UHFFFAOYSA-N 0.000 description 3
- 239000002250 absorbent Substances 0.000 description 3
- 230000002745 absorbent Effects 0.000 description 3
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 3
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 239000003505 polymerization initiator Substances 0.000 description 3
- 239000010734 process oil Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000010558 suspension polymerization method Methods 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- OWQPOVKKUWUEKE-UHFFFAOYSA-N 1,2,3-benzotriazine Chemical class N1=NN=CC2=CC=CC=C21 OWQPOVKKUWUEKE-UHFFFAOYSA-N 0.000 description 2
- VNQNXQYZMPJLQX-UHFFFAOYSA-N 1,3,5-tris[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]-1,3,5-triazinane-2,4,6-trione Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CN2C(N(CC=3C=C(C(O)=C(C=3)C(C)(C)C)C(C)(C)C)C(=O)N(CC=3C=C(C(O)=C(C=3)C(C)(C)C)C(C)(C)C)C2=O)=O)=C1 VNQNXQYZMPJLQX-UHFFFAOYSA-N 0.000 description 2
- KPQOXMCRYWDRSB-UHFFFAOYSA-N 1-(2-chlorophenyl)pyrrole-2,5-dione Chemical compound ClC1=CC=CC=C1N1C(=O)C=CC1=O KPQOXMCRYWDRSB-UHFFFAOYSA-N 0.000 description 2
- QDEQBRUNBFJJPW-UHFFFAOYSA-N 1-(3-chlorophenyl)pyrrole-2,5-dione Chemical compound ClC1=CC=CC(N2C(C=CC2=O)=O)=C1 QDEQBRUNBFJJPW-UHFFFAOYSA-N 0.000 description 2
- FPZQYYXSOJSITC-UHFFFAOYSA-N 1-(4-chlorophenyl)pyrrole-2,5-dione Chemical compound C1=CC(Cl)=CC=C1N1C(=O)C=CC1=O FPZQYYXSOJSITC-UHFFFAOYSA-N 0.000 description 2
- YAGPRJYCDKGWJR-UHFFFAOYSA-N 2-(2,4,8,10-tetratert-butylbenzo[d][1,3,2]benzodioxaphosphepin-6-yl)oxy-n,n-bis[2-(2,4,8,10-tetratert-butylbenzo[d][1,3,2]benzodioxaphosphepin-6-yl)oxyethyl]ethanamine Chemical compound O1C2=C(C(C)(C)C)C=C(C(C)(C)C)C=C2C2=CC(C(C)(C)C)=CC(C(C)(C)C)=C2OP1OCCN(CCOP1OC2=C(C=C(C=C2C=2C=C(C=C(C=2O1)C(C)(C)C)C(C)(C)C)C(C)(C)C)C(C)(C)C)CCOP(OC1=C(C=C(C=C11)C(C)(C)C)C(C)(C)C)OC2=C1C=C(C(C)(C)C)C=C2C(C)(C)C YAGPRJYCDKGWJR-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- AIBRSVLEQRWAEG-UHFFFAOYSA-N 3,9-bis(2,4-ditert-butylphenoxy)-2,4,8,10-tetraoxa-3,9-diphosphaspiro[5.5]undecane Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP1OCC2(COP(OC=3C(=CC(=CC=3)C(C)(C)C)C(C)(C)C)OC2)CO1 AIBRSVLEQRWAEG-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- 0 CC1*CCCC1 Chemical compound CC1*CCCC1 0.000 description 2
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000005396 acrylic acid ester group Chemical group 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 125000003354 benzotriazolyl group Chemical class N1N=NC2=C1C=CC=C2* 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 238000011088 calibration curve Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 2
- 238000010828 elution Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- HQKMJHAJHXVSDF-UHFFFAOYSA-L magnesium stearate Chemical compound [Mg+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O HQKMJHAJHXVSDF-UHFFFAOYSA-L 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 238000004260 weight control Methods 0.000 description 2
- FVQMJJQUGGVLEP-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOOC(C)(C)C FVQMJJQUGGVLEP-UHFFFAOYSA-N 0.000 description 1
- OQLRBFNNEQUJPK-UHFFFAOYSA-N (3,5-ditert-butyl-4-hydroxyphenyl)methyl diethyl phosphate Chemical compound CCOP(=O)(OCC)OCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 OQLRBFNNEQUJPK-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- KGSFMPRFQVLGTJ-UHFFFAOYSA-N 1,1,2-triphenylethylbenzene Chemical class C=1C=CC=CC=1C(C=1C=CC=CC=1)(C=1C=CC=CC=1)CC1=CC=CC=C1 KGSFMPRFQVLGTJ-UHFFFAOYSA-N 0.000 description 1
- RGASRBUYZODJTG-UHFFFAOYSA-N 1,1-bis(2,4-ditert-butylphenyl)-2,2-bis(hydroxymethyl)propane-1,3-diol dihydroxyphosphanyl dihydrogen phosphite Chemical compound OP(O)OP(O)O.C(C)(C)(C)C1=C(C=CC(=C1)C(C)(C)C)C(O)(C(CO)(CO)CO)C1=C(C=C(C=C1)C(C)(C)C)C(C)(C)C RGASRBUYZODJTG-UHFFFAOYSA-N 0.000 description 1
- HSLFISVKRDQEBY-UHFFFAOYSA-N 1,1-bis(tert-butylperoxy)cyclohexane Chemical compound CC(C)(C)OOC1(OOC(C)(C)C)CCCCC1 HSLFISVKRDQEBY-UHFFFAOYSA-N 0.000 description 1
- MGEJLLSWJCYSHK-UHFFFAOYSA-N 1-butyl-2-prop-1-en-2-ylbenzene Chemical compound CCCCC1=CC=CC=C1C(C)=C MGEJLLSWJCYSHK-UHFFFAOYSA-N 0.000 description 1
- OEVVKKAVYQFQNV-UHFFFAOYSA-N 1-ethenyl-2,4-dimethylbenzene Chemical compound CC1=CC=C(C=C)C(C)=C1 OEVVKKAVYQFQNV-UHFFFAOYSA-N 0.000 description 1
- VTPNYMSKBPZSTF-UHFFFAOYSA-N 1-ethenyl-2-ethylbenzene Chemical compound CCC1=CC=CC=C1C=C VTPNYMSKBPZSTF-UHFFFAOYSA-N 0.000 description 1
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 description 1
- XKMDZVINHIFHLY-UHFFFAOYSA-N 1-ethenyl-3,5-dimethylbenzene Chemical compound CC1=CC(C)=CC(C=C)=C1 XKMDZVINHIFHLY-UHFFFAOYSA-N 0.000 description 1
- XHUZSRRCICJJCN-UHFFFAOYSA-N 1-ethenyl-3-ethylbenzene Chemical compound CCC1=CC=CC(C=C)=C1 XHUZSRRCICJJCN-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- WHFHDVDXYKOSKI-UHFFFAOYSA-N 1-ethenyl-4-ethylbenzene Chemical compound CCC1=CC=C(C=C)C=C1 WHFHDVDXYKOSKI-UHFFFAOYSA-N 0.000 description 1
- IXTPWSUCILMATH-UHFFFAOYSA-N 1-ethyl-2-prop-1-en-2-ylbenzene Chemical compound CCC1=CC=CC=C1C(C)=C IXTPWSUCILMATH-UHFFFAOYSA-N 0.000 description 1
- LMAUULKNZLEMGN-UHFFFAOYSA-N 1-ethyl-3,5-dimethylbenzene Chemical compound CCC1=CC(C)=CC(C)=C1 LMAUULKNZLEMGN-UHFFFAOYSA-N 0.000 description 1
- XKOIESNQSHAQIW-UHFFFAOYSA-N 1-hexyl-2-prop-1-en-2-ylbenzene Chemical compound CCCCCCC1=CC=CC=C1C(C)=C XKOIESNQSHAQIW-UHFFFAOYSA-N 0.000 description 1
- OGMSGZZPTQNTIK-UHFFFAOYSA-N 1-methyl-2-prop-1-en-2-ylbenzene Chemical compound CC(=C)C1=CC=CC=C1C OGMSGZZPTQNTIK-UHFFFAOYSA-N 0.000 description 1
- VBICKXHEKHSIBG-UHFFFAOYSA-N 1-monostearoylglycerol Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC(O)CO VBICKXHEKHSIBG-UHFFFAOYSA-N 0.000 description 1
- YZQCRYHZKMFKDE-UHFFFAOYSA-N 1-octadecylperoxyoctadecane Chemical compound CCCCCCCCCCCCCCCCCCOOCCCCCCCCCCCCCCCCCC YZQCRYHZKMFKDE-UHFFFAOYSA-N 0.000 description 1
- ICNSPHUQRZZYDE-UHFFFAOYSA-N 1-octyl-2-prop-1-en-2-ylbenzene Chemical compound CCCCCCCCC1=CC=CC=C1C(C)=C ICNSPHUQRZZYDE-UHFFFAOYSA-N 0.000 description 1
- OFALFBSBJGMFDF-UHFFFAOYSA-N 1-pentyl-2-prop-1-en-2-ylbenzene Chemical compound CCCCCC1=CC=CC=C1C(C)=C OFALFBSBJGMFDF-UHFFFAOYSA-N 0.000 description 1
- ZMYIIHDQURVDRB-UHFFFAOYSA-N 1-phenylethenylbenzene Chemical group C=1C=CC=CC=1C(=C)C1=CC=CC=C1 ZMYIIHDQURVDRB-UHFFFAOYSA-N 0.000 description 1
- ABCFMLHXPWKTLP-UHFFFAOYSA-N 1-prop-1-en-2-yl-2-propylbenzene Chemical compound CCCC1=CC=CC=C1C(C)=C ABCFMLHXPWKTLP-UHFFFAOYSA-N 0.000 description 1
- QEDJMOONZLUIMC-UHFFFAOYSA-N 1-tert-butyl-4-ethenylbenzene Chemical compound CC(C)(C)C1=CC=C(C=C)C=C1 QEDJMOONZLUIMC-UHFFFAOYSA-N 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- JHYLOZKQMTWGPP-UHFFFAOYSA-N 2,9-bis[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]decanedioic acid Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CC(CCCCCCC(CC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)C(O)=O)C(O)=O)=C1 JHYLOZKQMTWGPP-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- MTLWTRLYHAQCAM-UHFFFAOYSA-N 2-[(1-cyano-2-methylpropyl)diazenyl]-3-methylbutanenitrile Chemical compound CC(C)C(C#N)N=NC(C#N)C(C)C MTLWTRLYHAQCAM-UHFFFAOYSA-N 0.000 description 1
- FVEAIIZMVQXSQE-UHFFFAOYSA-N 2-[2-[2-[3-(3-tert-butyl-2-hydroxy-5-methylphenyl)propanoyloxy]ethoxy]ethoxy]ethyl 3-(3-tert-butyl-2-hydroxy-5-methylphenyl)propanoate Chemical compound CC(C)(C)C1=CC(C)=CC(CCC(=O)OCCOCCOCCOC(=O)CCC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O FVEAIIZMVQXSQE-UHFFFAOYSA-N 0.000 description 1
- VFBJXXJYHWLXRM-UHFFFAOYSA-N 2-[2-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]ethylsulfanyl]ethyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCCSCCOC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 VFBJXXJYHWLXRM-UHFFFAOYSA-N 0.000 description 1
- DBWWINQJTZYDFK-UHFFFAOYSA-N 2-ethenyl-1,4-dimethylbenzene Chemical compound CC1=CC=C(C)C(C=C)=C1 DBWWINQJTZYDFK-UHFFFAOYSA-N 0.000 description 1
- MSXXDBCLAKQJQT-UHFFFAOYSA-N 2-tert-butyl-6-methyl-4-[3-(2,4,8,10-tetratert-butylbenzo[d][1,3,2]benzodioxaphosphepin-6-yl)oxypropyl]phenol Chemical compound CC(C)(C)C1=C(O)C(C)=CC(CCCOP2OC3=C(C=C(C=C3C=3C=C(C=C(C=3O2)C(C)(C)C)C(C)(C)C)C(C)(C)C)C(C)(C)C)=C1 MSXXDBCLAKQJQT-UHFFFAOYSA-N 0.000 description 1
- KXYAVSFOJVUIHT-UHFFFAOYSA-N 2-vinylnaphthalene Chemical compound C1=CC=CC2=CC(C=C)=CC=C21 KXYAVSFOJVUIHT-UHFFFAOYSA-N 0.000 description 1
- WBWXVCMXGYSMQA-UHFFFAOYSA-N 3,9-bis[2,4-bis(2-phenylpropan-2-yl)phenoxy]-2,4,8,10-tetraoxa-3,9-diphosphaspiro[5.5]undecane Chemical compound C=1C=C(OP2OCC3(CO2)COP(OC=2C(=CC(=CC=2)C(C)(C)C=2C=CC=CC=2)C(C)(C)C=2C=CC=CC=2)OC3)C(C(C)(C)C=2C=CC=CC=2)=CC=1C(C)(C)C1=CC=CC=C1 WBWXVCMXGYSMQA-UHFFFAOYSA-N 0.000 description 1
- QRLSTWVLSWCGBT-UHFFFAOYSA-N 4-((4,6-bis(octylthio)-1,3,5-triazin-2-yl)amino)-2,6-di-tert-butylphenol Chemical compound CCCCCCCCSC1=NC(SCCCCCCCC)=NC(NC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=N1 QRLSTWVLSWCGBT-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- VSAWBBYYMBQKIK-UHFFFAOYSA-N 4-[[3,5-bis[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]-2,4,6-trimethylphenyl]methyl]-2,6-ditert-butylphenol Chemical compound CC1=C(CC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)C(C)=C(CC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)C(C)=C1CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 VSAWBBYYMBQKIK-UHFFFAOYSA-N 0.000 description 1
- PMZXJPLGCUVUDN-UHFFFAOYSA-N 4-ethenyl-1,2-dimethylbenzene Chemical compound CC1=CC=C(C=C)C=C1C PMZXJPLGCUVUDN-UHFFFAOYSA-N 0.000 description 1
- HQQTZCPKNZVLFF-UHFFFAOYSA-N 4h-1,2-benzoxazin-3-one Chemical class C1=CC=C2ONC(=O)CC2=C1 HQQTZCPKNZVLFF-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 235000021357 Behenic acid Nutrition 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 125000005915 C6-C14 aryl group Chemical group 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- DCXXMTOCNZCJGO-UHFFFAOYSA-N Glycerol trioctadecanoate Natural products CCCCCCCCCCCCCCCCCC(=O)OCC(OC(=O)CCCCCCCCCCCCCCCCC)COC(=O)CCCCCCCCCCCCCCCCC DCXXMTOCNZCJGO-UHFFFAOYSA-N 0.000 description 1
- OKOBUGCCXMIKDM-UHFFFAOYSA-N Irganox 1098 Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)NCCCCCCNC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 OKOBUGCCXMIKDM-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- GHAZCVNUKKZTLG-UHFFFAOYSA-N N-ethyl-succinimide Natural products CCN1C(=O)CCC1=O GHAZCVNUKKZTLG-UHFFFAOYSA-N 0.000 description 1
- HDFGOPSGAURCEO-UHFFFAOYSA-N N-ethylmaleimide Chemical compound CCN1C(=O)C=CC1=O HDFGOPSGAURCEO-UHFFFAOYSA-N 0.000 description 1
- FDBMBOYIVUGUSL-UHFFFAOYSA-N OP(O)OP(O)O.C(C)(C)(C)C1=C(C(=CC(=C1)C)C(C)(C)C)C(O)(C(CO)(CO)CO)C1=C(C=C(C=C1C(C)(C)C)C)C(C)(C)C Chemical compound OP(O)OP(O)O.C(C)(C)(C)C1=C(C(=CC(=C1)C)C(C)(C)C)C(O)(C(CO)(CO)CO)C1=C(C=C(C=C1C(C)(C)C)C)C(C)(C)C FDBMBOYIVUGUSL-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- CGRTZESQZZGAAU-UHFFFAOYSA-N [2-[3-[1-[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoyloxy]-2-methylpropan-2-yl]-2,4,8,10-tetraoxaspiro[5.5]undecan-9-yl]-2-methylpropyl] 3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C)=CC(CCC(=O)OCC(C)(C)C2OCC3(CO2)COC(OC3)C(C)(C)COC(=O)CCC=2C=C(C(O)=C(C)C=2)C(C)(C)C)=C1 CGRTZESQZZGAAU-UHFFFAOYSA-N 0.000 description 1
- YNUDZCVMRZTAOJ-UHFFFAOYSA-N [4-(4-dihydroxyphosphanylphenyl)phenyl]phosphonous acid Chemical compound C1=CC(P(O)O)=CC=C1C1=CC=C(P(O)O)C=C1 YNUDZCVMRZTAOJ-UHFFFAOYSA-N 0.000 description 1
- BEIOEBMXPVYLRY-UHFFFAOYSA-N [4-[4-bis(2,4-ditert-butylphenoxy)phosphanylphenyl]phenyl]-bis(2,4-ditert-butylphenoxy)phosphane Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP(C=1C=CC(=CC=1)C=1C=CC(=CC=1)P(OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC1=CC=C(C(C)(C)C)C=C1C(C)(C)C BEIOEBMXPVYLRY-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 229940116226 behenic acid Drugs 0.000 description 1
- 150000001558 benzoic acid derivatives Chemical class 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- CJZGTCYPCWQAJB-UHFFFAOYSA-L calcium stearate Chemical compound [Ca+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O CJZGTCYPCWQAJB-UHFFFAOYSA-L 0.000 description 1
- 235000013539 calcium stearate Nutrition 0.000 description 1
- 239000008116 calcium stearate Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000012986 chain transfer agent Substances 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 125000000853 cresyl group Chemical group C1(=CC=C(C=C1)C)* 0.000 description 1
- NLCKLZIHJQEMCU-UHFFFAOYSA-N cyano prop-2-enoate Chemical class C=CC(=O)OC#N NLCKLZIHJQEMCU-UHFFFAOYSA-N 0.000 description 1
- VBWIZSYFQSOUFQ-UHFFFAOYSA-N cyclohexanecarbonitrile Chemical compound N#CC1CCCCC1 VBWIZSYFQSOUFQ-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000001938 differential scanning calorimetry curve Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000012990 dithiocarbamate Substances 0.000 description 1
- 150000004659 dithiocarbamates Chemical class 0.000 description 1
- 238000010556 emulsion polymerization method Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000013033 iniferter Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 235000019359 magnesium stearate Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 235000010446 mineral oil Nutrition 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- RKISUIUJZGSLEV-UHFFFAOYSA-N n-[2-(octadecanoylamino)ethyl]octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(=O)NCCNC(=O)CCCCCCCCCCCCCCCCC RKISUIUJZGSLEV-UHFFFAOYSA-N 0.000 description 1
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 description 1
- KZCOBXFFBQJQHH-UHFFFAOYSA-N octane-1-thiol Chemical compound CCCCCCCCS KZCOBXFFBQJQHH-UHFFFAOYSA-N 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 150000002916 oxazoles Chemical class 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- YFMFSCRSAWIWOP-UHFFFAOYSA-N phenyl(trityl)diazene Chemical compound C1=CC=CC=C1N=NC(C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 YFMFSCRSAWIWOP-UHFFFAOYSA-N 0.000 description 1
- DOIRQSBPFJWKBE-UHFFFAOYSA-N phthalic acid di-n-butyl ester Natural products CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000012673 precipitation polymerization Methods 0.000 description 1
- FZYCEURIEDTWNS-UHFFFAOYSA-N prop-1-en-2-ylbenzene Chemical compound CC(=C)C1=CC=CC=C1.CC(=C)C1=CC=CC=C1 FZYCEURIEDTWNS-UHFFFAOYSA-N 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- OPQYOFWUFGEMRZ-UHFFFAOYSA-N tert-butyl 2,2-dimethylpropaneperoxoate Chemical compound CC(C)(C)OOC(=O)C(C)(C)C OPQYOFWUFGEMRZ-UHFFFAOYSA-N 0.000 description 1
- NMOALOSNPWTWRH-UHFFFAOYSA-N tert-butyl 7,7-dimethyloctaneperoxoate Chemical compound CC(C)(C)CCCCCC(=O)OOC(C)(C)C NMOALOSNPWTWRH-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
- Electroluminescent Light Sources (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polarising Elements (AREA)
Abstract
Description
本発明は、位相差フィルムに関する。 The present invention relates to a retardation film.
1/2波長板や1/4波長板などの位相差フィルムは有機ELディスプレイや液晶表示装置において、反射防止膜など多くの用途で使われている(例えば、特許文献1参照)。従来の位相差フィルムの複屈折率の絶対値は波長に対して単調減少するが、表示特性に優れる位相差フィルムには、光の波長が大きくなるほど位相差の絶対値が大きくなる波長分散性が求められる。本明細書では、このような性質を当業者に慣用されている呼び名に従い、また、一般的な高分子からなる光学部材が示す波長分散性とは逆であることに基づき、「逆波長分散性」と呼ぶ。 A retardation film such as a half-wave plate or a quarter-wave plate is used in many applications such as an antireflection film in an organic EL display or a liquid crystal display device (see, for example, Patent Document 1). Although the absolute value of the birefringence of the conventional retardation film monotonously decreases with respect to the wavelength, the retardation film having excellent display characteristics has a wavelength dispersion property that the absolute value of the retardation increases as the wavelength of light increases. Desired. In this specification, according to the name commonly used by those skilled in the art, this property is based on the fact that it is opposite to the wavelength dispersion exhibited by a general optical member made of a polymer. "
現在の位相差フィルムとしては、例えば、位相差が大きい複屈折性フィルムと位相差が小さい複屈折性フィルムとを積層することで逆波長分散性を発揮する位相差フィルムが開示されている(例えば、特許文献2参照)。 As a current phase difference film, for example, a phase difference film that exhibits reverse wavelength dispersion by laminating a birefringent film having a large phase difference and a birefringent film having a small phase difference is disclosed (for example, , See Patent Document 2).
また、例えば、特許文献3には、特殊ポリカーボネート配向フィルムを用いて単層で逆波長分散性を示す位相差フィルムが開示されている。これは正の屈折率異方性を有する高分子と負の屈折率異方性を有する高分子を共重合させることによって逆波長分散性を達成している。 Further, for example, Patent Document 3 discloses a retardation film that exhibits a reverse wavelength dispersion in a single layer using a special polycarbonate alignment film. This achieves reverse wavelength dispersion by copolymerizing a polymer having positive refractive index anisotropy and a polymer having negative refractive index anisotropy.
しかしながら、積層フィルムを用い、幅広い波長領域において必要な位相差特性を達成するには、二枚以上のポリマーフィルムを厳密に調整しながら積層する必要がある。また、特殊なポリマーを用いた位相差フィルムにおいては、広波長帯域で均一に位相差特性を発現することが難しい。また、ポリカーボネート配向フィルムを用いた場合、光弾性係数が高く応力による複屈折が大きく、位相差フィルムとして使用する場合に光抜けが起きるという問題がある。 However, in order to achieve a necessary retardation characteristic in a wide wavelength region using a laminated film, it is necessary to laminate two or more polymer films while strictly adjusting them. In addition, in a retardation film using a special polymer, it is difficult to uniformly exhibit retardation characteristics in a wide wavelength band. In addition, when a polycarbonate alignment film is used, there is a problem that a photoelastic coefficient is high and birefringence due to stress is large, and light leakage occurs when used as a retardation film.
本発明は、上記の従来技術が有する課題に鑑みてなされたものであり、単層であっても十分な耐熱性及び機械特性を有するだけでなく、十分に低い光弾性係数を有し、さらに優れた逆波長分散性をも有する位相差フィルムを提供することを目的とする。 The present invention has been made in view of the above-described problems of the prior art, and not only has sufficient heat resistance and mechanical properties even in a single layer, but also has a sufficiently low photoelastic coefficient, An object is to provide a retardation film having excellent reverse wavelength dispersion.
本発明者らは、上記課題を解決するために鋭意研究を重ねた結果、メタクリル系単量体単位と、マレイミド系単量体単位と、芳香族ビニル系単量体単位とを特定比率で含む共重合体を用いることで、良好な逆波長分散性を示す光学フィルムが得られることを見出し、本発明を完成するに至った。 As a result of intensive studies to solve the above problems, the present inventors include a methacrylic monomer unit, a maleimide monomer unit, and an aromatic vinyl monomer unit at a specific ratio. By using a copolymer, it discovered that the optical film which shows favorable reverse wavelength dispersion was obtained, and came to complete this invention.
すなわち、本発明は次のとおりである。
[1]
下記式(1)で表されるメタクリル系単量体単位(A)10〜55質量%と、下記式(2)で表されるマレイミド系単量体単位(B)40〜85質量%と、下記式(3)で表される芳香族ビニル系単量体単位(C)5〜29質量%と、を含有する共重合体を含み、
波長450nm、550nmで測定したレターデーション値Re(450)及びRe(550)が、下記関係式を満たす、位相差フィルム。
Re(450)/Re(550)<0.9
A群:ハロゲン基、ヒドロキシル基、ニトロ基、炭素数1〜12のアルコキシ基及び炭素数1〜12のアルキル基。)
B群:ハロゲン基、ヒドロキシル基、ニトロ基、炭素数1〜12のアルコキシ基、炭素数6〜14のアルキル基及び炭素数7〜14のアリールアルキル基。)
[2]
前記マレイミド系単量体(B)が、N−シクロヘキシルマレイミド及び/又はN−フェニルマレイミドを含む、[1]に記載の位相差フィルム。
[3]
前記芳香族ビニル系単量体単位(C)が、イソプロペニルベンゼン及び/又はスチレンを含む、[1]に記載の位相差フィルム。
[4]
光弾性係数の絶対値が55×10-12Pa-1以下である、[1]〜[3]のいずれかに記載の位相差フィルム。
That is, the present invention is as follows.
[1]
10-55 mass% of methacrylic monomer units (A) represented by the following formula (1), 40-85 mass% of maleimide monomer units (B) represented by the following formula (2), An aromatic vinyl monomer unit represented by the following formula (3) (C) 5 to 29% by mass, and a copolymer containing:
A retardation film in which retardation values Re (450) and Re (550) measured at wavelengths of 450 nm and 550 nm satisfy the following relational expression.
Re (450) / Re (550) <0.9
Group A: a halogen group, a hydroxyl group, a nitro group, an alkoxy group having 1 to 12 carbon atoms, and an alkyl group having 1 to 12 carbon atoms. )
Group B: a halogen group, a hydroxyl group, a nitro group, an alkoxy group having 1 to 12 carbon atoms, an alkyl group having 6 to 14 carbon atoms, and an arylalkyl group having 7 to 14 carbon atoms. )
[2]
The retardation film according to [1], wherein the maleimide monomer (B) includes N-cyclohexylmaleimide and / or N-phenylmaleimide.
[3]
The retardation film according to [1], wherein the aromatic vinyl monomer unit (C) contains isopropenylbenzene and / or styrene.
[4]
The retardation film according to any one of [1] to [3], wherein the absolute value of the photoelastic coefficient is 55 × 10 −12 Pa −1 or less.
本発明によれば、単層であっても十分な耐熱性及び機械特性を有するだけでなく、十分に低い光弾性係数を有し、さらに優れた逆波長分散性をも有する位相差フィルムを提供することができる。 According to the present invention, there is provided a retardation film that not only has sufficient heat resistance and mechanical properties even in a single layer, but also has a sufficiently low photoelastic coefficient and also has excellent reverse wavelength dispersion. can do.
以下、本発明を実施するための形態(以下、単に「本実施形態」という。)について、詳細に説明する。以下の本実施形態は、本発明を説明するための例示であり、本発明を以下の内容に限定する趣旨ではない。本発明はその要旨の範囲内で適宜に変形して実施できる。なお、本明細書において、「単量体単位」又は「単位」とは、所定の単量体に対応する、共重合体を構成する単位をいう。 Hereinafter, a mode for carrying out the present invention (hereinafter simply referred to as “the present embodiment”) will be described in detail. The following embodiments are examples for explaining the present invention, and are not intended to limit the present invention to the following contents. The present invention can be appropriately modified and implemented within the scope of the gist. In the present specification, “monomer unit” or “unit” refers to a unit constituting a copolymer corresponding to a predetermined monomer.
本実施形態の位相差フィルムは、下記式(1)で表されるメタクリル系単量体に由来する単位(A)10〜55質量%と、下記式(2)で表されるマレイミド系単量体に由来する単位(B)40〜85質量%と、下記式(3)で表される芳香族ビニル系単量体に由来する単位(C)5〜29質量%と、を含有する共重合体を含み、波長450nm、550nmで測定したレターデーション値Re(450)及びRe(550)が、下記関係式を満たす。
Re(450)/Re(550)<0.9
The retardation film of the present embodiment includes 10 to 55% by mass of a unit (A) derived from a methacrylic monomer represented by the following formula (1) and a maleimide monomer represented by the following formula (2). Co-weight containing 40 to 85% by mass of the unit (B) derived from the body and 5 to 29% by mass of the unit (C) derived from the aromatic vinyl monomer represented by the following formula (3) Retardation values Re (450) and Re (550) measured at wavelengths of 450 nm and 550 nm satisfy the following relational expression.
Re (450) / Re (550) <0.9
A群:ハロゲン基、ヒドロキシル基、ニトロ基、炭素数1〜12のアルコキシ基及び炭素数1〜12のアルキル基。)
Group A: a halogen group, a hydroxyl group, a nitro group, an alkoxy group having 1 to 12 carbon atoms, and an alkyl group having 1 to 12 carbon atoms. )
B群:ハロゲン基、ヒドロキシル基、ニトロ基、炭素数1〜12のアルコキシ基、炭素数6〜14のアルキル基及び炭素数7〜14のアリールアルキル基。)
Group B: a halogen group, a hydroxyl group, a nitro group, an alkoxy group having 1 to 12 carbon atoms, an alkyl group having 6 to 14 carbon atoms, and an arylalkyl group having 7 to 14 carbon atoms. )
本実施形態の位相差フィルムは、上記のように構成されているため、単層であっても十分な耐熱性及び機械特性を有するだけでなく、十分に低い光弾性係数を有し、さらに優れた逆波長分散性をも有するものとすることができる。すなわち、本実施形態の位相差フィルムは、単層フィルムで逆波長分散性を示し、耐熱性が高い位相差フィルムが提供でき、有機ELディスプレイ等の反射防止膜として利用できる。より詳細には、本実施形態の位相差フィルムにおいては、特定比率でメタクリル系単量体単位、マレイミド系単量体単位、芳香族ビニル系単量体単位の三成分を含むように構成されているため、単層であっても高分子延伸配向フィルムとして好適に用いることができ、測定波長が長くなるほど位相差が大きくなる傾向を有し、広い波長領域で高い位相差特性を発現することができる。なお、本実施形態の効果を達成できる範囲で、共重合可能な他の単量体単位を共重合させることもできる。 Since the retardation film of the present embodiment is configured as described above, it not only has sufficient heat resistance and mechanical properties even if it is a single layer, but also has a sufficiently low photoelastic coefficient and is further excellent. It can also have reverse wavelength dispersion. That is, the retardation film of the present embodiment is a single layer film that exhibits reverse wavelength dispersion, can provide a retardation film with high heat resistance, and can be used as an antireflection film for organic EL displays and the like. More specifically, the retardation film of the present embodiment is configured to include three components of a methacrylic monomer unit, a maleimide monomer unit, and an aromatic vinyl monomer unit at a specific ratio. Therefore, even if it is a single layer, it can be suitably used as a polymer stretched oriented film, has a tendency that the retardation increases as the measurement wavelength becomes longer, and can exhibit high retardation characteristics in a wide wavelength region. it can. In addition, the other monomer unit which can be copolymerized can also be copolymerized in the range which can achieve the effect of this embodiment.
<メタクリル酸エステル単量体に共重合可能な、他のビニル単量体>
上述したメタクリル酸エステル単量体に共重合可能な他のビニル単量体としては、下記一般式(4)で表されるアクリル酸エステル単量体が挙げられる。
<Other vinyl monomers copolymerizable with methacrylic acid ester monomers>
As another vinyl monomer copolymerizable with the methacrylic acid ester monomer mentioned above, an acrylic acid ester monomer represented by the following general formula (4) is exemplified.
前記一般式(4)で表されるアクリル酸エステル単量体としては、以下に限定されるものではないが、例えば、アクリル酸メチル、アクリル酸エチル、アクリル酸n−プロピル、アクリル酸n−ブチル、アクリル酸sec−ブチル、アクリル酸2−エチルヘキシル等が挙げられ、特に、アクリル酸メチル、アクリル酸エチル、アクリル酸n−ブチルが好ましく、アクリル酸メチルが入手しやすくより好ましい。 Examples of the acrylate monomer represented by the general formula (4) include, but are not limited to, methyl acrylate, ethyl acrylate, n-propyl acrylate, and n-butyl acrylate. , Sec-butyl acrylate, 2-ethylhexyl acrylate, and the like. In particular, methyl acrylate, ethyl acrylate, and n-butyl acrylate are preferable, and methyl acrylate is more easily available and more preferable.
また、前記メタクリル酸エステル単量体に共重合可能な、前記一般式(4)のアクリル酸エステル単量体以外の他のビニル単量体としては、以下の例に限定されるものではないが、例えば、アクリル酸やメタクリル酸等のα,β−不飽和酸、マレイン酸、フマル酸、イタコン酸、桂皮酸等の不飽和基含有二価カルボン酸及びそれらのアルキルエステルが挙げられる。 Further, the vinyl monomer other than the acrylic acid ester monomer of the general formula (4), which can be copolymerized with the methacrylic acid ester monomer, is not limited to the following examples. Examples thereof include α, β-unsaturated acids such as acrylic acid and methacrylic acid, unsaturated group-containing divalent carboxylic acids such as maleic acid, fumaric acid, itaconic acid, cinnamic acid, and alkyl esters thereof.
以下に各単量体単位(単量体成分ともいう)について詳細に記載する。 Each monomer unit (also referred to as a monomer component) is described in detail below.
<メタクリル酸エステル単量体単位(A)>
本実施形態における共重合体は、上記式(1)で表されるメタクリル酸エステル単量体単位(A)(以下、(A)成分、(A)と記載する場合がある。)を含む。
<Methacrylic acid ester monomer unit (A)>
The copolymer in the present embodiment includes a methacrylic acid ester monomer unit (A) represented by the above formula (1) (hereinafter may be referred to as component (A) or (A)).
上記式(1)中、R1はメチル基を示す。R2は、水素原子、炭素数1〜12のアルキル基、炭素数5〜12のシクロアルキル基、炭素数7〜14のアリールアルキル基、または下記A群から選ばれる少なくとも1種の置換基を有する炭素数6〜14のアリール基を示す。
A群:ハロゲン基、ヒドロキシル基、ニトロ基、炭素数1〜12のアルコキシ基及び、炭素数1〜12のアルキル基。
In said formula (1), R < 1 > shows a methyl group. R 2 represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an arylalkyl group having 7 to 14 carbon atoms, or at least one substituent selected from the following group A. And an aryl group having 6 to 14 carbon atoms.
Group A: a halogen group, a hydroxyl group, a nitro group, an alkoxy group having 1 to 12 carbon atoms, and an alkyl group having 1 to 12 carbon atoms.
上記式(1)に示すメタクリル酸エステル単量体の具体例としては、特に限定されるものではないが、メタクリル酸ブチル、メタクリル酸エチル、メタクリル酸メチル、メタクリル酸プロピル、メタクリル酸イソプロピル、メタクリル酸シクロヘキシル、メタクリル酸フェニル、メタクリル酸(2−エチルヘキシル)、メタクリル酸(t−ブチルシクロヘキシル)、メタクリル酸ベンジル、メタクリル酸(2,2,2−トリフルオロエチル)等が挙げられ、入手しやすさ等の観点からメタクリル酸エチルが好ましい。前記メタクリル酸エステル単量体単位は、一種類のみを単独で用いてもよく、二種以上を併用してもよい。 Specific examples of the methacrylic acid ester monomer represented by the above formula (1) are not particularly limited, but include butyl methacrylate, ethyl methacrylate, methyl methacrylate, propyl methacrylate, isopropyl methacrylate, methacrylic acid. Examples include cyclohexyl, phenyl methacrylate, methacrylic acid (2-ethylhexyl), methacrylic acid (t-butylcyclohexyl), benzyl methacrylate, methacrylic acid (2,2,2-trifluoroethyl) and the like. In view of the above, ethyl methacrylate is preferable. The said methacrylic acid ester monomer unit may be used individually by 1 type, and may use 2 or more types together.
メタクリル酸エステル単量体単位は、光学特性、機械強度の観点から、本実施形態の位相差フィルム用の共重合体中に10〜55質量%含まれ、好ましくは11〜50質量%、さらに好ましくは12〜40質量%含まれている。 From the viewpoint of optical properties and mechanical strength, the methacrylic acid ester monomer unit is contained in the copolymer for retardation film of this embodiment in an amount of 10 to 55% by mass, preferably 11 to 50% by mass, and more preferably. Is contained in an amount of 12 to 40% by mass.
<マレイミド系単量体単位(B)>
本実施形態における共重合体は、上記式(2)で表されるマレイミド系単量体単位(B)(以下、(B)成分、(B)と記載する場合がある。)を含む。
<Maleimide monomer unit (B)>
The copolymer in the present embodiment includes a maleimide monomer unit (B) represented by the above formula (2) (hereinafter, may be referred to as (B) component or (B)).
上記式(2)中のR3は、炭素数6〜14のアルキル基、炭素数6〜14の環状アルキル基、炭素数6〜14のアリール基、または下記B群から選ばれる少なくとも1種の置換基を有する炭素数6〜14のアリール基からなる群より選択されるいずれかを表す。
B群:ハロゲン基、ヒドロキシル基、ニトロ基、炭素数1〜12のアルコキシ基、炭素数6〜14のアルキル基及び炭素数7〜14のアリールアルキル基。)
R 3 in the above formula (2) is at least one selected from an alkyl group having 6 to 14 carbon atoms, a cyclic alkyl group having 6 to 14 carbon atoms, an aryl group having 6 to 14 carbon atoms, or the following group B: It represents one selected from the group consisting of a C6-C14 aryl group having a substituent.
Group B: a halogen group, a hydroxyl group, a nitro group, an alkoxy group having 1 to 12 carbon atoms, an alkyl group having 6 to 14 carbon atoms, and an arylalkyl group having 7 to 14 carbon atoms. )
マレイミド系単量体単位(B)の具体例としては、特に限定されるものではないが、マレイミド、N−メチルマレイミド、N−エチルマレイミド、N−シクロヘキシルマレイミド、N−フェニルマレイミド、N−(o−クロロフェニル)マレイミド、N−(m−クロロフェニル)マレイミド、N−(p−クロロフェニル)マレイミド等が挙げられる。好ましくは、N−シクロヘキシルマレイミド、N−フェニルマレイミド、N−(o−クロロフェニル)マレイミド、N−(m−クロロフェニル)マレイミド、N−(p−クロロフェニル)マレイミドが挙げられ、入手しやすさ、耐熱性付与の観点から、より好ましくは、N−シクロヘキシルマレイミド、N−フェニルマレイミドが挙げられ、さらに好ましくは、N−フェニルマレイミドである。すなわち、本実施形態においては、マレイミド系単量体(B)が、N−シクロヘキシルマレイミド及び/又はN−フェニルマレイミドを含むことが特に好ましい。上述したマレイミド系単量体単位(B)は、一種のみを単独で用いてもよく、二種以上を組み合わせて用いてもよい。 Specific examples of the maleimide monomer unit (B) are not particularly limited, but maleimide, N-methylmaleimide, N-ethylmaleimide, N-cyclohexylmaleimide, N-phenylmaleimide, N- (o -Chlorophenyl) maleimide, N- (m-chlorophenyl) maleimide, N- (p-chlorophenyl) maleimide and the like. Preferable examples include N-cyclohexylmaleimide, N-phenylmaleimide, N- (o-chlorophenyl) maleimide, N- (m-chlorophenyl) maleimide, N- (p-chlorophenyl) maleimide, and availability and heat resistance. From the viewpoint of imparting, N-cyclohexylmaleimide and N-phenylmaleimide are more preferable, and N-phenylmaleimide is more preferable. That is, in this embodiment, it is particularly preferable that the maleimide monomer (B) contains N-cyclohexylmaleimide and / or N-phenylmaleimide. The maleimide monomer units (B) described above may be used alone or in combination of two or more.
マレイミド系単量体単位(B)は、良好な位相差付与及び耐熱性の観点から、位相差フィルム用の共重合体中に40〜85質量%含まれ、好ましくは45〜80質量%、さらに好ましくは50〜75質量%含まれている。 The maleimide monomer unit (B) is contained in the copolymer for a retardation film in an amount of 40 to 85% by mass, preferably 45 to 80% by mass, from the viewpoint of imparting good retardation and heat resistance. Preferably 50 to 75 mass% is contained.
<芳香族ビニル系単量体単位(C)>
本実施形態における共重合体は、上記式(1)で表される芳香族ビニル系単量体単位(C)(以下、(C)成分、(C)と記載する場合がある。)を含む。
<Aromatic vinyl monomer unit (C)>
The copolymer in the present embodiment includes an aromatic vinyl monomer unit (C) represented by the above formula (1) (hereinafter may be referred to as (C) component or (C)). .
上記一般式(3)中、R6及びR7は、それぞれ同一でも、異なっていてもよく、水素原子、ハロゲン原子、水酸基、アルコキシ基、ニトロ基又は直線状若しくは分岐状の炭素数が1〜6のアルキル基を示す。nは、0〜5の整数を示す。なお、本実施形態における(C)成分は、負の屈折率異方性を持つ単量体単位ということもできる。 In the general formula (3), R 6 and R 7 may be the same or different and each has a hydrogen atom, a halogen atom, a hydroxyl group, an alkoxy group, a nitro group, or a linear or branched carbon number of 1 to 6 represents an alkyl group. n shows the integer of 0-5. In addition, (C) component in this embodiment can also be called monomer unit with negative refractive index anisotropy.
芳香族ビニル系単量体単位(C)は、良好な位相差特性及び表面硬度の観点から、5〜29質量%、好ましくは10〜25質量%、さらに好ましくは10〜20質量%含まれている。 The aromatic vinyl monomer unit (C) is contained in an amount of 5 to 29% by mass, preferably 10 to 25% by mass, and more preferably 10 to 20% by mass from the viewpoint of good retardation characteristics and surface hardness. Yes.
前記芳香族ビニル系単量体の具体例としては、特に限定されるものではないが、スチレン、o−メチルスチレン、m−メチルスチレン、p−メチルスチレン、2,4−ジメチルスチレン、2,5−ジメチルスチレン、3,4−ジメチルスチレン、3,5−ジメチルスチレン、o−エチルスチレン、m−エチルスチレン、p−エチルスチレン、p−tert−ブチルスチレン、1−ビニルナフタレン、2−ビニルナフタレン、1,1−ジフェニルエチレン、イソプロペニルベンゼン(α−メチルスチレン)、イソプロペニルトルエン、イソプロペニルエチルベンゼン、イソプロペニルプロピルベンゼン、イソプロペニルブチルベンゼン、イソプロペニルペンチルベンゼン、イソプロペニルヘキシルベンゼン、イソプロペニルオクチルベンゼン等が挙げられる。これらは、本実施形態における共重合体に要求される特性に応じて適宜選択することができる。上記の中でも、スチレン、イソプロペニルベンゼンが好ましく、流動性付与や、重合転化率の向上による未反応モノマー類の低減などの観点から、スチレンがより好ましい。すなわち、本実施形態においては、芳香族ビニル系単量体単位(C)が、イソプロペニルベンゼン及び/又はスチレンを含むことが特に好ましい。上述した芳香族ビニル系単量体(C)は一種のみを単独で用いてもよく、二種以上を組み合わせて用いてもよい。 Specific examples of the aromatic vinyl monomer are not particularly limited, but styrene, o-methylstyrene, m-methylstyrene, p-methylstyrene, 2,4-dimethylstyrene, 2,5 -Dimethylstyrene, 3,4-dimethylstyrene, 3,5-dimethylstyrene, o-ethylstyrene, m-ethylstyrene, p-ethylstyrene, p-tert-butylstyrene, 1-vinylnaphthalene, 2-vinylnaphthalene, 1,1-diphenylethylene, isopropenylbenzene (α-methylstyrene), isopropenyltoluene, isopropenylethylbenzene, isopropenylpropylbenzene, isopropenylbutylbenzene, isopropenylpentylbenzene, isopropenylhexylbenzene, isopropenyloctylbenzene, etc. And the like. These can be appropriately selected according to the properties required for the copolymer in the present embodiment. Among these, styrene and isopropenylbenzene are preferable, and styrene is more preferable from the viewpoints of imparting fluidity and reducing unreacted monomers by improving the polymerization conversion rate. That is, in this embodiment, it is particularly preferable that the aromatic vinyl monomer unit (C) contains isopropenylbenzene and / or styrene. The above aromatic vinyl monomers (C) may be used alone or in combination of two or more.
〔位相差の逆波長分散特性〕
本明細書における位相差(レターデーション)とは、位相差測定における位相差値のことを指し、光がフィルムを透過した時にフィルムの配向方向とそれに垂直な方向の光の進行速度の差に基づく位相の差をいう。一般に位相差は光の波長の増加とともにその絶対値が小さくなる。これを順波長分散性と呼ぶ。1/2波長板や1/4波長板には、波長の増加とともに位相差の絶対値が大きくなる、逆波長分散性が求められる。
[Reverse chromatic dispersion characteristics of phase difference]
The retardation in the present specification refers to a retardation value in retardation measurement, and is based on a difference in the traveling speed of light in a direction perpendicular to the film orientation direction when light is transmitted through the film. The phase difference. In general, the absolute value of the phase difference decreases as the wavelength of light increases. This is called forward wavelength dispersion. The half-wave plate and the quarter-wave plate are required to have reverse wavelength dispersion in which the absolute value of the phase difference increases as the wavelength increases.
本実施形態の位相差フィルムにおける逆波長分散性は、具体的には次のとおり評価することができる。すなわち、波長450nm、550nmで測定したレターデーション値、Re(450)、Re(550)が、上記関係式「Re(450)/Re(550)<0.95」を満たす。好ましくは波長800nmで測定したレターデーション値を用いて「1.1<Re(800)/Re(550)<1.7」を満たし、より好ましくは「Re(450)/Re(550)<0.9」を満たし、さらに好ましくは「1.1<Re(800)/Re(550)<1.6」を満たす。なお、上記レターデーション値は後述する実施例に記載の方法により求めることができる。 Specifically, the reverse wavelength dispersion in the retardation film of the present embodiment can be evaluated as follows. That is, the retardation values Re (450) and Re (550) measured at wavelengths of 450 nm and 550 nm satisfy the relational expression “Re (450) / Re (550) <0.95”. Preferably, “1.1 <Re (800) / Re (550) <1.7” is satisfied by using a retardation value measured at a wavelength of 800 nm, and more preferably “Re (450) / Re (550) <0”. .9 ”, more preferably“ 1.1 <Re (800) / Re (550) <1.6 ”. In addition, the said retardation value can be calculated | required by the method as described in the Example mentioned later.
〔光弾性係数〕
本実施形態の位相差フィルムの光弾性係数の絶対値は、好ましくは55×10-12Pa-1以下であり、より好ましくは45×10-12Pa-1以下であり、さらに好ましくは35×10-12Pa-1以下である。絶対値が55×10-12Pa-1以下である場合、応力による複屈折を十分に低減でき、位相差フィルムとして使用する場合の光抜けをより効果的に防止できる傾向にある。なお、上記光弾性係数は後述する実施例に記載の方法により求めることができる。
[Photoelastic coefficient]
The absolute value of the photoelastic coefficient of the retardation film of the present embodiment is preferably 55 × 10 −12 Pa −1 or less, more preferably 45 × 10 −12 Pa −1 or less, and further preferably 35 ×. 10 −12 Pa −1 or less. When the absolute value is 55 × 10 −12 Pa −1 or less, birefringence due to stress can be sufficiently reduced, and light leakage when used as a retardation film tends to be more effectively prevented. In addition, the said photoelastic coefficient can be calculated | required by the method as described in the Example mentioned later.
〔共重合体の分子量〕
本実施形態の位相差フィルム用の共重合体は、重量平均分子量が6万〜40万であることが好ましい。重量平均分子量がこの範囲の共重合体は、機械的強度、耐溶剤性及び流動性により優れる傾向にある。同様の観点から、好ましくは6万〜35万であり、さらに好ましくは7万〜30万である。
[Molecular weight of copolymer]
It is preferable that the copolymer for retardation films of this embodiment has a weight average molecular weight of 60,000 to 400,000. A copolymer having a weight average molecular weight within this range tends to be excellent in mechanical strength, solvent resistance and fluidity. From the same viewpoint, it is preferably 60,000 to 350,000, and more preferably 70,000 to 300,000.
なお、分子量分布(重量平均分子量/数平均分子量:Mw/Mn)は、流動性と機械強度、耐溶剤性のバランスを考慮すると、1.5以上5以下であることが好ましい。より好ましくは1.7以上4.5以下であり、さらに好ましくは、1.8以上4.0である。 The molecular weight distribution (weight average molecular weight / number average molecular weight: Mw / Mn) is preferably 1.5 or more and 5 or less in consideration of the balance between fluidity, mechanical strength, and solvent resistance. More preferably, it is 1.7 or more and 4.5 or less, More preferably, it is 1.8 or more and 4.0.
本実施形態の位相差フィルム用の共重合体の重量平均分子量、数平均分子量及びピーク分子量については、ゲルパーミエーションクロマトグラフィー(GPC)で測定することができる。 The weight average molecular weight, number average molecular weight, and peak molecular weight of the retardation film copolymer of the present embodiment can be measured by gel permeation chromatography (GPC).
〔共重合体の製造方法〕
以下、本実施形態における共重合体の製造方法について説明するが、以下に示す方法に限定されるものではない。
[Method for producing copolymer]
Hereinafter, although the manufacturing method of the copolymer in this embodiment is demonstrated, it is not limited to the method shown below.
共重合体は、メタクリル酸エステル単量体(A)、マレイミド系単量体(B)、及び、芳香族ビニル単量体(C)を用い、以下に限定されないが、例えば、塊状重合法、溶液重合法、懸濁重合法、沈殿重合法、乳化重合法等により製造できる。好ましくは塊状重合法、溶液重合法、懸濁重合法が用いられる。 The copolymer uses a methacrylic acid ester monomer (A), a maleimide monomer (B), and an aromatic vinyl monomer (C), and is not limited to the following, for example, a bulk polymerization method, It can be produced by a solution polymerization method, suspension polymerization method, precipitation polymerization method, emulsion polymerization method or the like. A bulk polymerization method, a solution polymerization method, and a suspension polymerization method are preferably used.
本実施形態のメタクリル樹脂の製造において、重合温度は40℃から90℃、好ましくは50℃から80℃で実施される。重合温度が90℃以上になると、単一組成の樹脂を得ることが困難となり、好ましくない。 In the production of the methacrylic resin of this embodiment, the polymerization temperature is 40 ° C to 90 ° C, preferably 50 ° C to 80 ° C. When the polymerization temperature is 90 ° C. or higher, it is difficult to obtain a resin having a single composition, which is not preferable.
本実施形態における共重合体を製造する各種重合方法、すなわち、塊状重合法、溶液重合法、懸濁重合法等における重合工程においては、製造する重合体の重合度を調整する目的で、重合開始剤を用いてもよい。 In various polymerization methods for producing the copolymer in the present embodiment, that is, in the polymerization step in the bulk polymerization method, the solution polymerization method, the suspension polymerization method, etc., the polymerization is started for the purpose of adjusting the polymerization degree of the polymer to be produced. An agent may be used.
重合開始剤としては、ラジカル重合を行う場合、以下に限定されないが、例えば、ジ−t−ブチルパーオキサイド、ラウロイルパーオキサイド、ステアリルパーオキサイド、ベンゾイルパーオキサイド、t−ブチルパーオキシネオデカネート、t−ブチルパーオキシピバレート、ジラウロイルパーオキサイド、ジクミルパーオキサイド、t−ブチルパーオキシ−2−エチルヘキサノエート、1,1−ビス(t−ブチルパーオキシ)−3,3,5−トリメチルシクロヘキサン、1,1−ビス(t−ブチルパーオキシ)シクロヘキサン等の有機過酸化物や、アゾビスイソブチロニトリル、アゾビスイソバレロニトリル、1,1−アゾビス(1−シクロヘキサンカルボニトリル)、2,2’−アゾビス−4−メトキシ−2,4−アゾビスイソブチロニトリル、2,2’−アゾビス−2,4−ジメチルバレロニトリル、2,2’−アゾビス−2−メチルブチロニトリル等のアゾ系の一般的なラジカル重合開始剤を挙げることができる。これらは一種のみを単独で用いてもよく、二種以上を併用してもよい。 As a polymerization initiator, when performing radical polymerization, it is not limited to the following. For example, di-t-butyl peroxide, lauroyl peroxide, stearyl peroxide, benzoyl peroxide, t-butylperoxyneodecanate, t -Butylperoxypivalate, dilauroyl peroxide, dicumyl peroxide, t-butylperoxy-2-ethylhexanoate, 1,1-bis (t-butylperoxy) -3,3,5-trimethyl Organic peroxides such as cyclohexane and 1,1-bis (t-butylperoxy) cyclohexane, azobisisobutyronitrile, azobisisovaleronitrile, 1,1-azobis (1-cyclohexanecarbonitrile), 2 , 2'-Azobis-4-methoxy-2,4-azobisisobutyro Tolyl, 2,2'-azobis-2,4-dimethylvaleronitrile, mention may be made of conventional radical polymerization initiator azo such as 2,2'-azobis-2-methylbutyronitrile. These may be used alone or in combination of two or more.
これらの重合開始剤は、使用する全単量体の総量100質量部に対して、0〜1質量部の範囲で用いるのが一般的であり、重合を行う温度と開始剤の半減期を考慮して適宜選ぶことができる。 These polymerization initiators are generally used in the range of 0 to 1 part by mass with respect to 100 parts by mass of the total amount of all monomers used, taking into consideration the polymerization temperature and the half-life of the initiator. Can be selected as appropriate.
本実施形態における共重合体の製造工程においては、本実施形態の目的を損なわない範囲で、製造する重合体の分子量を制御することができる。上記制御の方法としては、以下に限定されないが、例えば、アルキルメルカプタン類、ジメチルアセトアミド、ジメチルホルムアルデヒド、トリエチルアミン等の連鎖移動剤、ジチオカルバメート類、トリフェニルメチルアゾベンゼン、テトラフェニルエタン誘導体などのイニファータ等を用いることによって分子量の制御を行うことができ、さらにそれらの添加量を調節することで分子量を調節することが可能である。これらは要求される分子量に応じて適宜添加することができるが、一般的には使用する全単量体の総量100質量部に対して0.001質量部〜3質量部の範囲で用いられる。 In the production process of the copolymer in the present embodiment, the molecular weight of the polymer to be produced can be controlled within a range that does not impair the purpose of the present embodiment. Examples of the control method include, but are not limited to, chain transfer agents such as alkyl mercaptans, dimethylacetamide, dimethylformaldehyde, and triethylamine, and iniferters such as dithiocarbamates, triphenylmethylazobenzene, and tetraphenylethane derivatives. The molecular weight can be controlled by using it, and the molecular weight can be adjusted by adjusting the addition amount thereof. These can be appropriately added according to the required molecular weight, but generally used in the range of 0.001 to 3 parts by mass with respect to 100 parts by mass of the total amount of all monomers used.
また、その他の分子量制御方法としては、以下に限定されないが、例えば、重合方法を変える方法、重合開始剤の量を調整する方法、重合温度を変更する方法、重合途中で反応を強制的に止める方法等が挙げられる。 Other molecular weight control methods are not limited to the following, but include, for example, a method for changing the polymerization method, a method for adjusting the amount of the polymerization initiator, a method for changing the polymerization temperature, and forcibly stopping the reaction during the polymerization. Methods and the like.
これらの分子量制御方法は、一種の方法だけを単独で用いてもよいし、二種類以上の方法を併用してもよい。 As these molecular weight control methods, only one type of method may be used alone, or two or more types may be used in combination.
本実施形態における共重合体のガラス転移温度は、樹脂組成で任意に制御できるが、産業上の応用性の観点から、好ましくは130℃以上、より好ましくは140℃以上が実用上、好ましい。なお、上記ガラス転移温度は後述する実施例に記載の方法により求めることができる。 The glass transition temperature of the copolymer in the present embodiment can be arbitrarily controlled by the resin composition, but is preferably 130 ° C. or higher, more preferably 140 ° C. or higher, from the viewpoint of industrial applicability. In addition, the said glass transition temperature can be calculated | required by the method as described in the Example mentioned later.
本実施形態の位相差フィルムは高分子鎖が実質的に配向していない未配向フィルムを延伸することにより製造することができる。延伸方法としては、特に限定されず、縦、横延伸のいずれの一軸延伸でもよく、また幅自由一軸延伸、幅固定一軸延伸のいずれでもよい。二軸延伸は逐次二軸、同時二軸延伸法のいずれでもよい。より詳細には、以下に限定されないが、例えば、工業的には、ロール延伸またはテンター延伸による一軸延伸法、ロール延伸とテンター延伸の組み合わせによる逐次2次延伸法、テンター延伸による同時2軸延伸法、チューブラー延伸による2軸延伸法等によって延伸フィルムを製造することができる。 The retardation film of this embodiment can be produced by stretching an unoriented film in which polymer chains are not substantially oriented. The stretching method is not particularly limited, and may be uniaxial stretching of either longitudinal or lateral stretching, or may be any of width-free uniaxial stretching and fixed width uniaxial stretching. Biaxial stretching may be either sequential biaxial or simultaneous biaxial stretching. More specifically, although not limited to the following, for example, industrially, uniaxial stretching method by roll stretching or tenter stretching, sequential secondary stretching method by combination of roll stretching and tenter stretching, simultaneous biaxial stretching method by tenter stretching A stretched film can be produced by a biaxial stretching method using tubular stretching.
延伸倍率は、少なくともどちらか一方に、好ましくは0.1%以上300%以下であり、より好ましくは1%以上200%以下であり、更に好ましくは2%以上150%以下である。延伸倍率を上記範囲に設計する場合、複屈折、強度の観点でより好ましい延伸成形体(フィルム)が得られる傾向にある。 The stretching ratio is preferably 0.1% or more and 300% or less, more preferably 1% or more and 200% or less, and still more preferably 2% or more and 150% or less, at least in any one of them. When the stretching ratio is designed in the above range, a stretched molded body (film) more preferable in terms of birefringence and strength tends to be obtained.
延伸倍率は、得られたフィルムをガラス転移温度よりも20℃以上高い温度で収縮させ以下の関係式から決定できる。また、ガラス転移温度はDSC法や粘弾性法により求めることができる。
延伸倍率(%)=〔(収縮前の長さ/収縮後の長さ)−1〕×100
The draw ratio can be determined from the following relational expression by shrinking the obtained film at a temperature 20 ° C. or more higher than the glass transition temperature. The glass transition temperature can be determined by a DSC method or a viscoelastic method.
Stretch ratio (%) = [(length before shrinkage / length after shrinkage) −1] × 100
[その他の添加剤]
本実施形態における共重合体には、その他の添加剤を添加してもよい。上記添加剤としては、以下に限定されないが、例えば、ヒンダードフェノール系酸化防止剤及び/又はリン系酸化防止剤等の酸化防止剤等が挙げられ、好ましくはヒンダードフェノール系酸化防止剤である。
[Other additives]
You may add another additive to the copolymer in this embodiment. Examples of the additives include, but are not limited to, antioxidants such as hindered phenolic antioxidants and / or phosphorus antioxidants, and preferably hindered phenolic antioxidants. .
ヒンダードフェノール系酸化防止剤としては、特に限定されないが、具体例としては、ペンタエリスリトール−テトラキス(3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート)、チオジエチレン−ビス(3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート)、オクタデシル−3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート、N,N’−ヘキサン−1,6−ジイルビス(3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオナミド)、ジエチル((3,5−ビス(1,1−ジメチルエチル)−4−ヒドロキシフェニル)メチル)ホスフェート、3,3’,3’’,5,5’,5’’−ヘキサ−t−ブチル−a,a’,a’’−(メシチレン−2,4,6−トリイル)トリ−p−クレゾール、エチレンビス(オキシエチレン)ビス(3−(5−t−ブチル−4−ヒドロキシ−m−トリル)プロピオネート)、ヘキサメチレン−ビス(3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート)、1,3,5−トリス(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)−1,3,5−トリアジン−2,4,6(1H,3H,5H)−トリオン、1,3,5−トリス((4−t−ブチル−3−ヒドロキシ−2,6−キシリル)メチル)−1,3,5−トリアジン−2,4,6(1H,3H,5H)−トリオン、2,6−ジ−t−ブチル−4−(4,6−ビス(オクチルチオ)−1,3,5−トリアジン−2−イルアミノ)フェノール、3,9−ビス(2−(3−(3−t−ブチル−4−ヒドロキシ−5−メチルフェニル)プロピオニルオキシ)−1,1−ジメチルエチル)−2,4,8,10−テトラオキサスピロ(5,5)ウンデカン等が挙げられる。これらは単独で用いても、2種以上併用して用いても構わない。 Although it does not specifically limit as a hindered phenolic antioxidant, As a specific example, pentaerythritol tetrakis (3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate), thiodiethylene-bis (3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionate), octadecyl-3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionate, N, N′-hexane -1,6-diylbis (3- (3,5-di-t-butyl-4-hydroxyphenyl) propionamide), diethyl ((3,5-bis (1,1-dimethylethyl) -4-hydroxyphenyl) Methyl) phosphate, 3,3 ′, 3 ″, 5,5 ′, 5 ″ -hexa-t-butyl-a, a ′, a ″-(mesitylene-2,4 6-triyl) tri-p-cresol, ethylenebis (oxyethylene) bis (3- (5-t-butyl-4-hydroxy-m-tolyl) propionate), hexamethylene-bis (3- (3,5- Di-t-butyl-4-hydroxyphenyl) propionate), 1,3,5-tris (3,5-di-t-butyl-4-hydroxybenzyl) -1,3,5-triazine-2,4 6 (1H, 3H, 5H) -trione, 1,3,5-tris ((4-tert-butyl-3-hydroxy-2,6-xylyl) methyl) -1,3,5-triazine-2,4 , 6 (1H, 3H, 5H) -trione, 2,6-di-t-butyl-4- (4,6-bis (octylthio) -1,3,5-triazin-2-ylamino) phenol, 3, 9-bis (2- (3- (3-t- Chill-4-hydroxy-5-methylphenyl) propionyloxy) -1,1-dimethylethyl) -2,4,8,10-spiro (5,5) undecane. These may be used alone or in combination of two or more.
また、ヒンダードフェノール系酸化防止剤として市販のフェノール系酸化防止剤を使用してもよく、このような市販のフェノール系酸化防止剤としては、特に限定されないが、具体例としては、イルガノックス1010(Irganox 1010:ペンタエリスリトールテトラキス[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]、チバ・スペシャルティー・ケミカルズ製)、イルガノックス1076(Irganox 1076:オクタデシル−3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート、チバ・スペシャルティー・ケミカルズ製)、イルガノックス1330(Irganox 1330:3,3’,3’’,5,5’,5’’−ヘキサ−t−ブチル−a,a’,a’’−(メシチレン−2,4,6−トリイル)トリ−p−クレゾール、チバ・スペシャルティー・ケミカルズ製)、イルガノックス3114(Irganox 3114:1,3,5−トリス(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)−1,3,5−トリアジン−2,4,6(1H,3H,5H)−トリオン、チバ・スペシャルティー・ケミカルズ製)、イルガノックス3125(Irganox 3125、チバ・スペシャルティー・ケミカルズ製)、スミライザーBHT(Sumilizer BHT、住友化学製)、シアノックス1790(Cyanox 1790、サイテック製)、スミライザーGA−80(Sumilizer GA−80、住友化学製)、スミライザーGS(Sumilizer GS、住友化学製)、ビタミンE(エーザイ製)等が挙げられる。この中でも、特にイルガノックス1010、イルガノックス1076、スミライザーGS等を用いるのが好ましい。これらは単独で用いても、2種以上併用して用いても構わない。 Moreover, you may use a commercially available phenolic antioxidant as a hindered phenolic antioxidant, Although it does not specifically limit as such a commercially available phenolic antioxidant, As a specific example, Irganox 1010 (Irganox 1010: pentaerythritol tetrakis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], manufactured by Ciba Specialty Chemicals), Irganox 1076 (Irganox 1076: octadecyl-3- ( 3,5-di-t-butyl-4-hydroxyphenyl) propionate (manufactured by Ciba Specialty Chemicals), Irganox 1330 (3,3 ′, 3 ″, 5,5 ′, 5 ″) -Hexa-t-butyl-a, a ', a' '-( Sicilene-2,4,6-triyl) tri-p-cresol, manufactured by Ciba Specialty Chemicals), Irganox 3114: 1,3,5-tris (3,5-di-t-butyl- 4-hydroxybenzyl) -1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione, manufactured by Ciba Specialty Chemicals), Irganox 3125 (Irganox 3125, Ciba Specialty) Chemicals), Sumilizer BHT (Sumilizer BHT, manufactured by Sumitomo Chemical), Cyanox 1790 (Cyanox 1790, manufactured by Cytec), Sumilizer GA-80 (Sumizer GA-80, manufactured by Sumitomo Chemical), Sumilizer GS (Sumilizer GS, Sumitomo Chemical) , Bitami E (manufactured by Eisai), and the like. Among these, it is particularly preferable to use Irganox 1010, Irganox 1076, Sumilizer GS, or the like. These may be used alone or in combination of two or more.
また、リン系酸化防止剤としては、特に限定されないが、具体例としては、トリス(2,4−ジ−t−ブチルフェニル)フォスファイト、ビス(2,4−ビス(1,1−ジメチルエチル)−6−メチルフェニル)エチルエステル亜りん酸、テトラキス(2,4−ジ−t−ブチルフェニル)(1,1−ビフェニル)−4,4’−ジイルビスホスフォナイト、ビス(2,4−ジ−t−ブチルフェニル)ペンタエリスリトールジホスファイト、ビス(2,6−ジ−t−ブチル−4−メチルフェニル)ペンタエリスリトールジホスファイト、ビス(2,4−ジクミルフェニル)ペンタエリスリトール−ジホスファイト、テトラキス(2,4−t−ブチルフェニル)(1,1−ビフェニル)−4,4’−ジイルビスホスフォナイト、ジ−t−ブチル−m−クレジル−ホスフォナイト等が挙げられる。これらは単独で用いても、2種以上併用して用いても構わない。 Further, the phosphorus-based antioxidant is not particularly limited, but specific examples include tris (2,4-di-t-butylphenyl) phosphite, bis (2,4-bis (1,1-dimethylethyl). ) -6-methylphenyl) ethyl ester phosphorous acid, tetrakis (2,4-di-t-butylphenyl) (1,1-biphenyl) -4,4′-diylbisphosphonite, bis (2,4 -Di-t-butylphenyl) pentaerythritol diphosphite, bis (2,6-di-t-butyl-4-methylphenyl) pentaerythritol diphosphite, bis (2,4-dicumylphenyl) pentaerythritol- Diphosphite, tetrakis (2,4-t-butylphenyl) (1,1-biphenyl) -4,4′-diylbisphosphonite, di-t-butyl-m Cresyl - phosphonite, and the like. These may be used alone or in combination of two or more.
さらに、リン系酸化防止剤として市販のリン系酸化防止剤を使用してもよく、このような市販のリン系酸化防止剤としては、特に限定されないが、具体例としては、イルガフォス168(Irgafos 168:トリス(2,4−ジ−t−ブチルフェニル)フォスファイト、チバ・スペシャルティー・ケミカルズ製)、イルガフォス12(Irgafos 12:トリス[2−[[2,4,8,10−テトラ−t−ブチルジベンゾ[d,f][1,3,2]ジオキサフォスフェフィン−6−イル]オキシ]エチル]アミン、チバ・スペシャルティー・ケミカルズ製)、イルガフォス38(Irgafos 38:ビス(2,4−ビス(1,1−ジメチルエチル)−6−メチルフェニル)エチルエステル亜りん酸、チバ・スペシャルティー・ケミカルズ製)、アデカスタブ329K(ADK STAB 329K、旭電化製)、アデカスタブPEP36(ADK STAB PEP36、旭電化製)、アデカスタブPEP−8(ADK STAB PEP−8、旭電化製)、Sandstab P−EPQ(クラリアント製)、ウェストン618(Weston 618、GE製)、ウェストン619G(Weston 619G、GE製)、ウルトラノックス626(Ultranox 626、GE製)、スミライザーGP(Sumilizer GP、住友化学製)等が挙げられる。これらは単独で用いても、2種以上併用して用いても構わない。 Furthermore, a commercially available phosphorus antioxidant may be used as the phosphorus antioxidant, and such a commercially available phosphorus antioxidant is not particularly limited, but specific examples thereof include Irgafos 168 (Irgafos 168). : Tris (2,4-di-t-butylphenyl) phosphite, manufactured by Ciba Specialty Chemicals), Irgafos 12 (Irgafos 12: Tris [2-[[2,4,8,10-tetra-t- Butyldibenzo [d, f] [1,3,2] dioxaphosphin-6-yl] oxy] ethyl] amine, manufactured by Ciba Specialty Chemicals, Irgafos 38 (Irgafos 38: Bis (2,4 -Bis (1,1-dimethylethyl) -6-methylphenyl) ethyl ester phosphorous acid, Ciba Specialty Ke Kalz), ADK STAB 329K (ADK STAB 329K, manufactured by Asahi Denka), ADK STAB PEP36 (ADK STAB PEP36, manufactured by Asahi Denka), ADK STAB PEP-8 (ADK STAB PEP-8, manufactured by Asahi Denka), Sandstab P-EPQ (Clariant) Manufactured), Weston 618 (manufactured by Weston 618, manufactured by GE), Weston 619G (manufactured by Weston 619G, manufactured by GE), Ultranox 626 (manufactured by Ultranox 626, manufactured by GE), Sumilizer GP (manufactured by Sumitizer GP, manufactured by Sumitomo Chemical), and the like. These may be used alone or in combination of two or more.
(紫外線吸収剤)
本実施形態における共重合体には、紫外線吸収剤を含んでいてもよい。特に、光学用途に用いる場合には、紫外線吸収効果を有していることが好ましく、例えば、液晶ディスプレイ周辺の位相差フィルムとして用いる場合は、紫外線吸収効果を付与することが特に好ましいといえる。
(UV absorber)
The copolymer in the present embodiment may contain an ultraviolet absorber. In particular, when used for optical applications, it preferably has an ultraviolet absorption effect. For example, when used as a retardation film around a liquid crystal display, it can be said that it is particularly preferable to impart an ultraviolet absorption effect.
紫外線吸収剤としては、特に限定されないが、具体例としては、ベンゾトリアゾール系化合物、ベンゾトリアジン系化合物、ベンゾエート系化合物、ベンゾフェノン系化合物、オキシベンゾフェノン系化合物、フェノール系化合物、オキサゾール系化合物、マロン酸エステル系化合物、シアノアクリレート系化合物、ラクトン系化合物、サリチル酸エステル系化合物、ベンズオキサジノン系化合物等が挙げられる。この中でも、好ましくはベンゾトリアゾール系化合物、ベンゾトリアジン系化合物である。これらは単独で用いても、2種以上併用して用いても構わない。 Although it does not specifically limit as an ultraviolet absorber, As a specific example, a benzotriazole type compound, a benzotriazine type compound, a benzoate type compound, a benzophenone type compound, an oxybenzophenone type compound, a phenol type compound, an oxazole type compound, a malonic acid ester Compounds, cyanoacrylate compounds, lactone compounds, salicylic acid ester compounds, benzoxazinone compounds, and the like. Among these, benzotriazole compounds and benzotriazine compounds are preferable. These may be used alone or in combination of two or more.
紫外線吸収剤は、成形加工性に優れる傾向にあるため、20℃における蒸気圧(P)が、好ましくは1.0×10-4Pa以下であり、より好ましくは1.0×10-6Pa以下であり、さらに好ましくは1.0×10-8Pa以下である。なお、本明細書において、「成形加工性に優れる」とは、例えば、フィルム成形時に、低分子化合物のロールへの付着が少ないこと等を示す。例えば、低分子化合物がロールへ付着すると、光学材料用成形体表面へロールを介して低分子化合物が付着しうるため、低分子化合物のロールへの付着を低減することは、光学材料用成形体の外観、光学特性をより良好なものとする観点から好ましいといえる。ここで、本明細書における「低分子化合物」とは、例えば、紫外線吸収剤由来の熱分解物や揮発分のことを言う。 Since the ultraviolet absorber tends to be excellent in moldability, the vapor pressure (P) at 20 ° C. is preferably 1.0 × 10 −4 Pa or less, more preferably 1.0 × 10 −6 Pa. Or less, more preferably 1.0 × 10 −8 Pa or less. In the present specification, “excellent in molding processability” indicates, for example, that the low molecular compound adheres little to the roll during film formation. For example, when a low molecular compound adheres to a roll, the low molecular compound can adhere to the surface of the optical material molded body via the roll. It can be said that it is preferable from a viewpoint of making the external appearance and optical characteristics better. Here, the “low molecular compound” in the present specification refers to, for example, a thermal decomposition product or a volatile matter derived from an ultraviolet absorber.
紫外線吸収剤は、成形加工性に優れる傾向にあるため、融点(Tm)が、好ましくは80℃以上であり、より好ましくは130℃以上であり、さらに好ましくは160℃以上である。 Since the ultraviolet absorbent tends to be excellent in moldability, the melting point (Tm) is preferably 80 ° C. or higher, more preferably 130 ° C. or higher, and further preferably 160 ° C. or higher.
紫外線吸収剤は、成形加工性に優れる傾向にあるため、23℃から260℃まで20℃/minの速度で昇温した場合の紫外線吸収剤の重量減少率が、好ましくは50%以下であり、より好ましくは15%以下であり、さらに好ましくは2%以下である。 Since the ultraviolet absorbent tends to be excellent in moldability, the weight reduction rate of the ultraviolet absorbent when heated at a rate of 20 ° C./min from 23 ° C. to 260 ° C. is preferably 50% or less, More preferably, it is 15% or less, More preferably, it is 2% or less.
本実施形態の位相差フィルムは、分光光度計を用いて測定した380nmにおける分光透過率が5%以下、且つ400nmにおける分光透過率が65%以上であることが好ましい。紫外領域である380nmの分光透過率が低いほど偏光子や液晶素子の劣化を防ぎ、可視領域である400nm分光透過率が高いほど色再現性に優れる傾向にあるため、光学フィルムとして好ましく用いることができる。 The retardation film of the present embodiment preferably has a spectral transmittance at 380 nm measured with a spectrophotometer of 5% or less and a spectral transmittance at 400 nm of 65% or more. The lower the spectral transmittance at 380 nm in the ultraviolet region, the lower the deterioration of the polarizer and the liquid crystal element, and the higher the 400 nm spectral transmittance in the visible region, the better the color reproducibility. it can.
本実施形態における共重合体には、本実施形態の効果を損なわない範囲で、他の重合体を混合することができる。このような重合体としては、特に限定されないが、具体的には、ポリエチレン、ポリプロピレン等のポリオレフィン樹脂、ポリアミド樹脂、ポリフェニレンサルファイド樹脂、ポリエーテルエーテルケトン樹脂、ポリエステル樹脂、ポリスルホン樹脂、ポリフェニレンオキサイド樹脂、ポリイミド樹脂、ポリエーテルイミド樹脂、並びにポリアセタール等の熱可塑性樹脂;フェノール樹脂、メラミン樹脂、シリコーン樹脂、エポキシ樹脂等の熱硬化性樹脂等が挙げられる。 The copolymer in the present embodiment can be mixed with other polymers as long as the effects of the present embodiment are not impaired. Such a polymer is not particularly limited, and specifically, polyolefin resin such as polyethylene and polypropylene, polyamide resin, polyphenylene sulfide resin, polyether ether ketone resin, polyester resin, polysulfone resin, polyphenylene oxide resin, polyimide Examples thereof include thermoplastic resins such as resins, polyetherimide resins, and polyacetals; thermosetting resins such as phenol resins, melamine resins, silicone resins, and epoxy resins.
また、本実施形態における共重合体には、各種目的に応じてさらに任意の添加剤を配合することができる。上記添加剤の種類は、樹脂の配合に一般的に用いられるものであれば特に限定されない。具体的には、ゴム質重合体;ブタジエン系ABSゴム、アクリル系、ポリオレフィン系、シリコーン系、フッ素ゴム等の多層構造を有するゴム粒子、二酸化珪素等の無機充填剤;酸化鉄等の顔料;ステアリン酸、ベヘニン酸、ステアリン酸亜鉛、ステアリン酸カルシウム、ステアリン酸マグネシウム、エチレンビスステアロアミド等の滑剤;離型剤;パラフィン系プロセスオイル、ナフテン系プロセスオイル、芳香族系プロセスオイル、パラフィン、有機ポリシロキサン、ミネラルオイル等の軟化剤・可塑剤;難燃剤;帯電防止剤;有機繊維、ガラス繊維、炭素繊維、金属ウィスカ等の補強剤;着色剤;その他添加剤或いはこれらの混合物等が挙げられる。 Moreover, arbitrary additives can be further mix | blended with the copolymer in this embodiment according to various objectives. The kind of said additive will not be specifically limited if it is generally used for the mixing | blending of resin. Specifically, rubbery polymers; rubber particles having a multilayer structure such as butadiene-based ABS rubber, acrylic, polyolefin-based, silicone-based, and fluorine rubber; inorganic fillers such as silicon dioxide; pigments such as iron oxide; stearin Lubricants such as acid, behenic acid, zinc stearate, calcium stearate, magnesium stearate, ethylene bisstearamide; mold release agent; paraffinic process oil, naphthenic process oil, aromatic process oil, paraffin, organic polysiloxane Softeners and plasticizers such as mineral oil, flame retardants, antistatic agents, reinforcing agents such as organic fibers, glass fibers, carbon fibers, and metal whiskers; colorants; other additives or a mixture thereof.
以下、本実施形態を実施例及び比較例に基づいて説明するが、本実施形態は以下の実施例に限定されるものではない。実施例及び比較例で用いた各成分は以下のものである。 Hereinafter, although this embodiment is described based on an Example and a comparative example, this embodiment is not limited to the following examples. Each component used in Examples and Comparative Examples is as follows.
〔共重合体の分子量測定〕
各例で得られた共重合体の重量平均分子量、分子量分布を下記の装置及び条件で測定した。
測定装置:東ソー株式会社製ゲルパーミエーションクロマトグラフィー(HLC−8320GPC)を用いた。
カラム:TSKguardcolumn SuperH−H 1本、TSKgel SuperHM−M 2本、TSKgel SuperH2500 1本を順に直列接続して使用した。すなわち、本カラムでは、高分子量成分が早く溶出し、低分子量成分は溶出する時間が遅くなるように構成した。
検出器:RI(示差屈折)検出器を用いた。
検出感度:3.0mV/minとした。
カラム温度:40℃とした。
サンプル:0.02gのメタクリル系樹脂のテトラヒドロフラン20mL溶液を用いた。
注入量:10μLとした。
展開溶媒:テトラヒドロフラン、流速;0.6mL/minとした。
内部標準:2,6−ジ−t−ブチル−4−メチルフェノール(BHT)を、0.1g/L添加した。
検量線用標準サンプル:単分散の重量ピーク分子量が既知で分子量が異なる以下の10種のポリメタクリル酸メチル(Polymer Laboratories製;PMMA Calibration Kit M−M−10)を用いた。
[Molecular weight measurement of copolymer]
The weight average molecular weight and molecular weight distribution of the copolymer obtained in each example were measured with the following apparatus and conditions.
Measuring apparatus: Tosoh Corporation gel permeation chromatography (HLC-8320GPC) was used.
Column: One TSK guard column SuperH-H, two TSK gel Super HM-Ms, and one TSK gel Super H 2500 were connected in series in this order. That is, this column was configured so that the high molecular weight component eluted earlier and the low molecular weight component eluted later.
Detector: RI (differential refraction) detector was used.
Detection sensitivity: 3.0 mV / min.
Column temperature: 40 ° C.
Sample: A 20 mL tetrahydrofuran solution of 0.02 g methacrylic resin was used.
Injection volume: 10 μL.
Developing solvent: tetrahydrofuran, flow rate; 0.6 mL / min.
Internal standard: 2,6-di-t-butyl-4-methylphenol (BHT) was added at 0.1 g / L.
Standard sample for calibration curve: The following 10 polymethyl methacrylates (manufactured by Polymer Laboratories; PMMA Calibration Kit M-M-10) having different molecular weights and known monodisperse weight peak molecular weights were used.
重量ピーク分子量(Mp)
標準試料1 1,916,000
標準試料2 625,500
標準試料3 298,900
標準試料4 138,600
標準試料5 60,150
標準試料6 27,600
標準試料7 10,290
標準試料8 5,000
標準試料9 2,810
標準資料10 850
Weight peak molecular weight (Mp)
Standard sample 1 1,916,000
Standard sample 2 625,500
Standard sample 3 298,900
Standard sample 4 138,600
Standard sample 5 60,150
Standard sample 6 27,600
Standard sample 7 10,290
Standard sample 85,000
Standard sample 9 2,810
Standard document 10 850
上記の条件で、メタクリル系樹脂の溶出時間に対する、RI検出強度を測定した。GPC溶出曲線におけるエリア面積と、7次近似式の検量線を基にメタクリル系樹脂の重量平均分子量(Mw)、分子量分布(Mw/Mn)を求めた。 Under the above conditions, the RI detection intensity with respect to the elution time of the methacrylic resin was measured. The weight average molecular weight (Mw) and molecular weight distribution (Mw / Mn) of the methacrylic resin were determined based on the area area in the GPC elution curve and a calibration curve of a seventh-order approximation.
〔共重合体のガラス転移温度測定〕
重合により得られた各例の共重合体のガラス転移温度(Tg)は、示差走査熱量計(パーキンエルマージャパン(株)製 Diamond DSC)を用いて、窒素ガス雰囲気下、α−アルミナをリファレンスとし、JIS−K−7121に準拠して、試料約10mgを常温から250℃まで昇温速度20℃/minで昇温して得られたDSC曲線から中点法で算出した。
[Measurement of glass transition temperature of copolymer]
The glass transition temperature (Tg) of the copolymer of each example obtained by polymerization was determined using a differential scanning calorimeter (Diamond DSC, manufactured by PerkinElmer Japan Co., Ltd.) and α-alumina as a reference in a nitrogen gas atmosphere. Based on JIS-K-7121, the sample was calculated by a midpoint method from a DSC curve obtained by heating about 10 mg of a sample from room temperature to 250 ° C. at a rate of temperature increase of 20 ° C./min.
〔プレスフィルムの成型〕
各例で得られた位相差フィルムを、真空圧縮成型機((株)神藤金属工業所製 SFV−30型)を用いて、大気圧下、260℃で25分間予熱後、真空下(約10kPa)、260℃、約10MPaで5分間圧縮して、プレスフィルムを成型した。
[Molding of press film]
The retardation film obtained in each example was preheated at 260 ° C. under atmospheric pressure for 25 minutes using a vacuum compression molding machine (SFV-30 type, manufactured by Shindo Metal Industries Co., Ltd.), and then under vacuum (about 10 kPa). ), And compressed at 260 ° C. and about 10 MPa for 5 minutes to form a press film.
〔延伸フィルムの成型〕
各例で得られた位相差フィルムを、インストロン社製5t引張試験機を用いて、延伸温度(Tg+20)℃、延伸速度500mm/分で一軸フリー延伸して延伸フィルムを作成した。延伸倍率は、100%で延伸した。
[Molding of stretched film]
The retardation film obtained in each example was uniaxially stretched at a stretching temperature (Tg + 20) ° C. and a stretching speed of 500 mm / min using an Instron 5t tensile tester to prepare a stretched film. The draw ratio was drawn at 100%.
〔位相差の逆波長分散性測定〕
位相差測定装置(KOBRA−WR、王子測定機器(株)製)を用いて、波長400nmから800nmまでの範囲で、23℃における上記延伸フィルムの位相差を測定した。ここで、面内位相差(Re)は下記式により定義される値を採用した。
Re=(nx−ny)×d
(式中、nx、ny:面内の主屈折率、d:厚み)
[Inverse wavelength dispersion measurement of phase difference]
Using a phase difference measuring device (KOBRA-WR, manufactured by Oji Scientific Instruments), the retardation of the stretched film at 23 ° C. was measured in the wavelength range of 400 nm to 800 nm. Here, a value defined by the following equation was adopted as the in-plane retardation (Re).
Re = (nx−ny) × d
(Where nx, ny: in-plane main refractive index, d: thickness)
得られた位相差はフィルムの厚さ100μmに換算して評価した。Re(450nm)/Re(550nm)を求めることで、位相差の逆波長分散性を評価した。 The obtained retardation was evaluated in terms of a film thickness of 100 μm. By obtaining Re (450 nm) / Re (550 nm), the reverse wavelength dispersion of the phase difference was evaluated.
〔光弾性係数〕
Polymer Engineering and Science 1999, 39, 2349−2357に記載のある複屈折測定装置を用いた。具体的には、レーザー光の経路に上記延伸フィルムの引っ張り装置(井本製作所製)を配置し、23℃で延伸応力をかけながらその複屈折を、大塚電子(株)製RETS−100を用いて回転検光子法により波長400nm〜800nmの範囲について測定した。伸張時の歪速度は50%/分(チャック間:50mm、チャック移動速度:5mm/分)、試験片幅は6mmで測定を行った。複屈折の絶対値(|Δn|)と延伸応力σRの関係から、最小二乗近似によりその直線の傾きを求め、光弾性係数(CR)を計算した。計算には伸張応力が2.5MPa≦σR≦10MPaの間のデータを用いた。
CR=|Δn|/σR
|Δn|=|nx−ny|
(CR:光弾性係数、σR:伸張応力、|Δn|:複屈折の絶対値、nx:伸張方向の屈折率、ny:伸張方向に垂直な屈折率)
[Photoelastic coefficient]
A birefringence measuring apparatus described in Polymer Engineering and Science 1999, 39, 2349-2357 was used. Specifically, the stretched film pulling device (manufactured by Imoto Seisakusho) is placed in the laser beam path, and the birefringence is applied using a RETS-100 manufactured by Otsuka Electronics Co., Ltd. while applying stretching stress at 23 ° C. It measured about the range of wavelength 400nm -800nm by the rotation analyzer method. The strain rate during stretching was 50% / min (between chucks: 50 mm, chuck moving speed: 5 mm / min), and the test piece width was 6 mm. From the relationship between the absolute value of birefringence (| Δn |) and the stretching stress σR, the slope of the straight line was obtained by least square approximation, and the photoelastic coefficient (CR) was calculated. For the calculation, data with an extensional stress between 2.5 MPa ≦ σR ≦ 10 MPa was used.
CR = | Δn | / σR
| Δn | = | nx−ny |
(CR: photoelastic coefficient, σR: stretching stress, | Δn |: absolute value of birefringence, nx: refractive index in the stretching direction, ny: refractive index perpendicular to the stretching direction)
〔耐折強度の測定(靭性の評価)〕
上記のプレス成形で得られた各種プレスフィルムを180°折り曲げて、耐折強度の試験を行った。以下の○〜×を判定基準とした。
○;2回以上の180°折り曲げで割れなかった。
△;1回の180°折り曲げで割れなかった。2回以上の折り曲げで割れた。
×;1回の180°折り曲げで割れた。
[Measurement of bending strength (evaluation of toughness)]
Various press films obtained by the above press molding were bent 180 ° and tested for bending strength. The following ○ to × were used as judgment criteria.
○: It was not cracked by bending 180 ° twice or more.
(Triangle | delta): It was not cracked by 180 degree | times bending once. It broke by bending twice or more.
X: Cracked by one 180 ° bending.
〔表面鉛筆硬度〕
上記のプレス成形で得られた各種プレスフィルムを対象として、JIS−K5600規格に準拠して測定を行い、表面鉛筆硬度の指標とした。
[Surface pencil hardness]
The measurement was performed according to JIS-K5600 standard for various press films obtained by the above press molding, and used as an index of surface pencil hardness.
[実施例1]
実施例1の位相差フィルムに含まれる共重合体の製造は塊状重合法によって行った。すなわち、試験管中にメタクリル酸エチル(表1中では単に「MMA」と表記)6g、N−フェニルマレイミド(表1中では単に「PMI」と表記)10g、スチレン(表1中では単に「St」と表記)4gを投入し、開始剤としてラウロイルパーオキサイド0.02g、連鎖移動剤としてn−オクチルメルカプタン0.02gを加えて、60℃で約3時間放置して重合を行った。重合したサンプルを50mlテトラヒドロフランに溶解し、2Lメタノール中で再沈殿操作を行った。この工程を2回繰り返し、残モノマーを除去した。
[Example 1]
The copolymer contained in the retardation film of Example 1 was produced by a bulk polymerization method. That is, 6 g of ethyl methacrylate (simply indicated as “MMA” in Table 1), 10 g of N-phenylmaleimide (simply indicated as “PMI” in Table 1) and styrene (simply indicated as “St in Table 1) in a test tube. 4 g) was added, 0.02 g of lauroyl peroxide as an initiator and 0.02 g of n-octyl mercaptan as a chain transfer agent were added, and the mixture was allowed to stand at 60 ° C. for about 3 hours for polymerization. The polymerized sample was dissolved in 50 ml tetrahydrofuran, and reprecipitation operation was performed in 2 L methanol. This process was repeated twice to remove residual monomer.
これにより得られた樹脂をプレス成形して、約200μmの未延伸フィルムを得た。そして、未延伸フィルムを幅が50mmになるように切り出し、引張試験機を用いて一軸延伸(チャック間:50mm、チャック移動温度:500mm/分)を行い、一軸延伸フィルムを得た。この配向フィルムについて、上記評価を行った。評価結果を表1に示す。 The resulting resin was press-molded to obtain an unstretched film of about 200 μm. And an unstretched film was cut out so that a width | variety might be set to 50 mm, and it was uniaxially stretched using a tensile tester (between chucks: 50 mm, chuck movement temperature: 500 mm / min), and obtained the uniaxially stretched film. The above evaluation was performed on this oriented film. The evaluation results are shown in Table 1.
[実施例2〜6、比較例1〜4]
表1に記載の組成において、実施例1と同様の方法でフィルムを作成し、上記評価を行った。その結果を表1に示す。なお、実施例5,6においては、B成分としてN−シクロヘキシルマレイミド(表1中では単に「CyMI」と表記)を表1に示す配合で使用した。
[Examples 2-6, Comparative Examples 1-4]
In the composition described in Table 1, a film was prepared in the same manner as in Example 1, and the above evaluation was performed. The results are shown in Table 1. In Examples 5 and 6, N-cyclohexylmaleimide (simply referred to as “CyMI” in Table 1) was used as the B component in the formulation shown in Table 1.
実施例1〜6については、十分な耐熱性を有し位相差は優れた逆波長分散性を示した。また、光弾性係数、耐熱性、表面硬度のバランスも良好であった。比較例1〜4は、位相差は順波長分散性を示し、耐熱性や光弾性係数、表面硬度のバランスも好ましくなかった。 About Examples 1-6, it had sufficient heat resistance and the phase difference showed the reverse wavelength dispersion which was excellent. Moreover, the balance of a photoelastic coefficient, heat resistance, and surface hardness was also favorable. In Comparative Examples 1 to 4, the phase difference exhibited forward wavelength dispersion, and the balance of heat resistance, photoelastic coefficient, and surface hardness was not preferable.
本発明の位相差フィルムは、有機ELディスプレイなどにおいて反射防止膜として使われる1/2波長板や1/4波長板として、産業上利用可能性がある。 The retardation film of the present invention has industrial applicability as a half-wave plate or a quarter-wave plate used as an antireflection film in an organic EL display or the like.
Claims (4)
波長450nm、550nmで測定したレターデーション値Re(450)及びRe(550)が、下記関係式を満たす、位相差フィルム。
Re(450)/Re(550)<0.9
A群:ハロゲン基、ヒドロキシル基、ニトロ基、炭素数1〜12のアルコキシ基及び炭素数1〜12のアルキル基。)
B群:ハロゲン基、ヒドロキシル基、ニトロ基、炭素数1〜12のアルコキシ基、炭素数6〜14のアルキル基及び炭素数7〜14のアリールアルキル基。)
A retardation film in which retardation values Re (450) and Re (550) measured at wavelengths of 450 nm and 550 nm satisfy the following relational expression.
Re (450) / Re (550) <0.9
Group A: a halogen group, a hydroxyl group, a nitro group, an alkoxy group having 1 to 12 carbon atoms, and an alkyl group having 1 to 12 carbon atoms. )
Group B: a halogen group, a hydroxyl group, a nitro group, an alkoxy group having 1 to 12 carbon atoms, an alkyl group having 6 to 14 carbon atoms, and an arylalkyl group having 7 to 14 carbon atoms. )
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