JP2015189680A - unsaturated quaternary ammonium salt - Google Patents

unsaturated quaternary ammonium salt Download PDF

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JP2015189680A
JP2015189680A JP2014066417A JP2014066417A JP2015189680A JP 2015189680 A JP2015189680 A JP 2015189680A JP 2014066417 A JP2014066417 A JP 2014066417A JP 2014066417 A JP2014066417 A JP 2014066417A JP 2015189680 A JP2015189680 A JP 2015189680A
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quaternary ammonium
ammonium salt
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unsaturated quaternary
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繭 工藤
Mayu Kudo
繭 工藤
明理 平田
Akimichi Hirata
明理 平田
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KJ Chemicals Corp
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Abstract

PROBLEM TO BE SOLVED: To provide an unsaturated quaternary ammonium salt with high purity including no halogen in the molecule, high in safety, harmless in the environment, including no moisture, also excellent in dissolubility to water, organic solvents, conventional vinyl monomers and resins, and suitably usable even to various electrochemical devices, to provide an efficient and economical production method for the unsaturated quaternary ammonium salt, and to provide a composition using the unsaturated quaternary ammonium salt as a constituting component.SOLUTION: Provided is an unsaturated quaternary ammonium salt represented by general formula (1). Also provided is a method for producing an unsaturated quaternary ammonium salt including a process where a cyclic ether group-containing compound and a tertiary amine compound are reacted without using water and/or a protonic organic solvent as a reaction solvent. Also provided is a composition comprising the unsaturated quaternary ammonium salt.

Description

本発明はハロゲン原子を含まない不飽和第四級アンモニウム塩、その製造方法、及び該不飽和第四級アンモニウム塩を構成成分として含有する組成物に関する。 The present invention relates to an unsaturated quaternary ammonium salt containing no halogen atom, a method for producing the same, and a composition containing the unsaturated quaternary ammonium salt as a constituent component.

不飽和基を含有する第四級アンモニウム塩は、単独重合、あるいは、他のモノマーとの共重合が可能であるため、得られるポリマーに陽イオン性、導電性、接着性などの機能を付与することができ、凝集剤、帯電防止剤、土壌改良剤、導電加工剤、染色改良剤、紙力増強剤、紙の濾水性向上剤、化粧品、樹脂改質剤などの原料モノマーとして広く用いられている。 The quaternary ammonium salt containing an unsaturated group can be homopolymerized or copolymerized with other monomers, so that the resulting polymer has functions such as cationicity, conductivity and adhesiveness. Can be widely used as a raw material monomer for flocculants, antistatic agents, soil improvers, conductive processing agents, dye improvers, paper strength enhancers, paper drainage improvers, cosmetics, resin modifiers, etc. Yes.

特に、アクリレート系とアクリルアミド系カチオン性第四級アンモニウム塩は、ラジカル重合性に優れるため、高分子型帯電防止組成物のベースモノマーとして使用することが知られている(特許文献1−6)。しかし、多くの重合性アンモニウム塩はアニオンとして塩素、ブロモ、ヨウ素などのハロゲン系イオン、テトラフルオロボレート、ヘキサフルオロホスフェート、ビス(トリフルオロメタンスルホニル)イミドなどのフッ素系イオンが用いられている。これらのアニオンは原料の安全性が低く、自然環境において極めて難分解性であるため、環境に有害であり、さらに金属への腐食性が懸念され、特に電子材料として使用される場合、電子製品の機能低下、故障の原因になる可能性がある。 In particular, acrylate-based and acrylamide-based cationic quaternary ammonium salts are known to be used as base monomers for polymer antistatic compositions because of their excellent radical polymerizability (Patent Documents 1-6). However, many polymerizable ammonium salts use halogen ions such as chlorine, bromo and iodine, and fluorine ions such as tetrafluoroborate, hexafluorophosphate and bis (trifluoromethanesulfonyl) imide as anions. These anions are low in raw material safety and extremely indegradable in the natural environment. Therefore, they are harmful to the environment, and there is concern about corrosiveness to metals. Especially when they are used as electronic materials, It may cause deterioration of function or failure.

そこで、アニオンとしてハロゲン系イオンを用いない重合性アンモニウム塩が提案されている(特許文献7−10)。これらの特許文献では、無機酸または有機酸、第三級アミンおよび単官能または多官能エポキシドを用いて、水あるいは水とメタノールの混合溶液中で反応させることによりそれぞれの重合性第四級アンモニウム塩を合成している。しかし、これらの特許文献では、反応後には、原料である第三級アミンやエポキシド基、二重結合の定量は行っているものの、目的生成物である重合性第四級アンモニウム塩の純度と収率については全く言及されていない。 Then, the polymeric ammonium salt which does not use a halogen-type ion as an anion is proposed (patent documents 7-10). In these patent documents, each polymerizable quaternary ammonium salt is reacted with water or a mixed solution of water and methanol using an inorganic or organic acid, a tertiary amine, and a monofunctional or polyfunctional epoxide. Is synthesized. However, in these patent documents, the tertiary amine, epoxide group, and double bond as raw materials are quantified after the reaction, but the purity and yield of the target product, the polymerizable quaternary ammonium salt, are determined. There is no mention of rates.

特開2008−231196号公報JP 2008-231196 A 特開昭63−201151号公報Japanese Patent Laid-Open No. 63-201115 特開平07−150130号公報Japanese Patent Laid-Open No. 07-150130 特開2007−51241号公報JP 2007-51241 A 特開2007−9042号公報JP 2007-9042 A 特開2005−255843号公報JP 2005-255843 A 特開2011−506749号公報JP 2011-506749 A 特開2012−201764号公報JP 2012-201764 A 特開平06−128105号公報Japanese Patent Laid-Open No. 06-128105 特開平08−92177号公報Japanese Patent Laid-Open No. 08-92177

以上のように、塩素、フッ素などのハロゲン原子を分子内に含まず、安全性が高く、環境に無害で、高純度であり、且つ、水や有機溶媒、通用のビニルモノマー、樹脂への溶解性に優れ、さらに紫外線(UV)などの活性エネルギー線照射による重合が可能である不飽和第四級アンモニウム塩化合物及び該アンモニウム塩からなる帯電防止剤や抗菌剤は未だに得られていない。 As described above, it does not contain halogen atoms such as chlorine and fluorine in the molecule, is highly safe, harmless to the environment, high purity, and soluble in water, organic solvents, common vinyl monomers, and resins. Unsaturated quaternary ammonium salt compounds that are excellent in properties and can be polymerized by irradiation with active energy rays such as ultraviolet rays (UV), and antistatic agents and antibacterial agents comprising the ammonium salts have not yet been obtained.

本発明の第一課題は、ハロゲン原子を分子内に含まず、安全性が高く、環境に無害で、高純度であり、且つ、水や有機溶媒、通用のビニルモノマー、樹脂への溶解性に優れ、UVなどの活性エネルギー線照射による重合が可能である不飽和第四級アンモニウム塩を提供することを課題とする。本発明の第二課題は、該不飽和第四級アンモニウム塩化合物の効率的且つ経済的な製造方法を提供することにある。本発明の第三課題は、該不飽和第四級アンモニウム塩化合物を構成成分として含有する組成物を提供することにある。 The first object of the present invention is to contain no halogen atoms in the molecule, high safety, harmless to the environment, high purity, and solubility in water, organic solvents, common vinyl monomers and resins. It is an object to provide an unsaturated quaternary ammonium salt that is excellent and can be polymerized by irradiation with an active energy ray such as UV. The second object of the present invention is to provide an efficient and economical method for producing the unsaturated quaternary ammonium salt compound. The third object of the present invention is to provide a composition containing the unsaturated quaternary ammonium salt compound as a constituent component.

本発明者はこれらの課題を解決するために鋭意検討を行った結果、対イオンとして有機酸イオンを用いる特定の構造を有する不飽和第四級アンモニウム塩が、従来のハロゲン原子を含む不飽和第四級アンモニウム塩と同等の物性を有するとともに、これらの課題を解決できることを見出し、本発明を完成した。 As a result of intensive studies to solve these problems, the present inventor has found that an unsaturated quaternary ammonium salt having a specific structure using an organic acid ion as a counter ion is an unsaturated compound containing a conventional halogen atom. The present invention was completed by discovering that it has physical properties equivalent to quaternary ammonium salts and can solve these problems.

すなわち本発明は、
(1)下記一般式(1)で表される飽和第四級アンモニウム塩。

Figure 2015189680
(式中、Rは水素原子またはメチル基、R、Rは各々独立に炭素数1〜3のアルキル基、炭素数1〜3のアルケニル基またはベンジル基で、互いに同一であっても異なっていてもよく、Xは酸素原子またはNH、Yは炭素数1〜3のアルキレン基を表し、nは1〜6の整数、Zは有機基、An-はn価の有機酸イオンを表す。)、
(2)前記nが1であり、且つ、Zが下記
Figure 2015189680
(式中、Rは、炭素数1〜20のアルキル基、炭素数1〜3のアルケニル基、フェノール基またはベンジル基で、環状エーテル基で置換されていてもよく、Rは水素原子またはメチル基であり、mは1〜30の整数を示す。)で示される基である前記(1)記載の不飽和第四級アンモニウム塩、
(3)前記nが2〜6であり、且つ、Zが、下記
Figure 2015189680
または
Figure 2015189680

(式中、Rは水素原子またはメチル基であり、mは1〜30の整数を示し、pおよびqは1〜29の整数を表し、その合計は2〜30である。)で示される基である前記(1)記載の不飽和第四級アンモニウム塩、
(4)不飽和第四級アンモニウム塩が、
(a)下記一般式(2)
Figure 2015189680
(式中、Rは水素原子またはメチル基、R、Rは各々独立に炭素数1〜3のアルキル基、炭素数1〜3のアルケニル基またはベンジル基で互いに同一であっても異なっていてもよく、Xは酸素原子またはNHを表し、Yは炭素数1〜3のアルキレン基を表す。)
で表される三級アミン化合物と、有機酸と、
(b)下記一般式(3)
Figure 2015189680
または
(c)下記一般式(4)
Figure 2015189680
(式中、Rは、炭素数1〜20のアルキル基、炭素数1〜3のアルケニル基、フェノール基またはベンジル基で、環状エーテル基で置換されていてもよく、Rは水素原子または炭素数1のアルキル基であり、mは1〜30の整数を示す。)で表される環状エーテル基含有化合物を反応させることを特徴とする前記(1)乃至(3)のいずれか一項に記載の不飽和第四級アンモニウム塩の製造方法、
(5)前記反応において、三級アミン化合物と有機酸をpH7以上、温度35℃以下で反応させた後、環状エーテル基含有化合物とを反応させることを特徴とする前記(4)記載の不飽和第四級アンモニウム塩の製造方法、
(6)前記(1)乃至(3)のいずれか一項に記載の不飽和第四級アンモニウム塩の単独重合または他の共重合可能なビニル系単量体との共重合で得られるオリゴマーまたはポリマー、
(7)前記(1)乃至(3)のいずれか一項に記載の不飽和第四級アンモニウム塩、及び/または、前記(6)記載のオリゴマーまたはポリマーからなる帯電防止剤、
(8)前記(7)記載の帯電防止剤を含有する帯電防止性樹脂組成物であって、前記(1)乃至請求項3のいずれか一項に記載の不飽和第四級アンモニウム塩を構成単位として0.1〜95重量%含有するもの、
(9)前記(8)記載の帯電防止性樹脂組成物であって、さらに多官能(メタ)アクリレート及び/または多官能(メタ)アクリルアミドを含有するもの、
(10)基材上に前記(7)記載の帯電防止剤及び/または前記(8)または(9)記載の帯電防止組成物を塗装した後、活性エネルギー線または熱により硬化して形成されることを特徴とする帯電防止層、
(11)少なくとも片面に前記(10)記載の帯電防止層を有することを特徴とするフィルム又はシート状の帯電防止薄膜、
(12)前記(1)乃至(3)のいずれか一項に記載の不飽和第四級アンモニウム塩、及び/または、前記(6)記載のオリゴマーまたはポリマーを用いることを特徴とする電池またはコンデンサ用電解質、
(13)前記(1)乃至(3)のいずれか一項に記載の不飽和第四級アンモニウム塩、及び/または、前記(6)記載のオリゴマーまたはポリマーを用いることを特徴とする抗菌剤、
を提供するものである。 That is, the present invention
(1) A saturated quaternary ammonium salt represented by the following general formula (1).
Figure 2015189680
Wherein R 1 is a hydrogen atom or a methyl group, R 2 and R 3 are each independently an alkyl group having 1 to 3 carbon atoms, an alkenyl group having 1 to 3 carbon atoms or a benzyl group, may be different, X represents an oxygen atom or NH, Y represents an alkylene group having 1 to 3 carbon atoms, n represents an integer from 1 to 6, Z is an organic group, a n-is an n-valent organic acid ion Represent),
(2) n is 1 and Z is
Figure 2015189680
(In the formula, R 4 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 1 to 3 carbon atoms, a phenol group or a benzyl group, which may be substituted with a cyclic ether group, and R 5 is a hydrogen atom or An unsaturated quaternary ammonium salt according to the above (1), which is a methyl group, and m is an integer of 1 to 30).
(3) Said n is 2-6, and Z is the following
Figure 2015189680
Or
Figure 2015189680

(Wherein R 5 is a hydrogen atom or a methyl group, m represents an integer of 1 to 30, p and q represent an integer of 1 to 29, and the sum thereof is 2 to 30). The unsaturated quaternary ammonium salt according to (1), which is a group,
(4) Unsaturated quaternary ammonium salt
(A) The following general formula (2)
Figure 2015189680
Wherein R 1 is a hydrogen atom or a methyl group, R 2 and R 3 are each independently an alkyl group having 1 to 3 carbon atoms, an alkenyl group having 1 to 3 carbon atoms or a benzyl group, which may be the same or different. X represents an oxygen atom or NH, and Y represents an alkylene group having 1 to 3 carbon atoms.)
A tertiary amine compound represented by the formula:
(B) The following general formula (3)
Figure 2015189680
Or (c) the following general formula (4)
Figure 2015189680
(In the formula, R 4 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 1 to 3 carbon atoms, a phenol group or a benzyl group, which may be substituted with a cyclic ether group, and R 5 is a hydrogen atom or (1) to (3), wherein the cyclic ether group-containing compound represented by (1) is an alkyl group having 1 carbon atom and m is an integer of 1 to 30. A method for producing the unsaturated quaternary ammonium salt according to claim 1,
(5) In the reaction, the tertiary amine compound and the organic acid are reacted at a pH of 7 or more and a temperature of 35 ° C. or less, and then reacted with a cyclic ether group-containing compound. Production method of quaternary ammonium salt,
(6) An oligomer obtained by homopolymerization of the unsaturated quaternary ammonium salt according to any one of (1) to (3) above or copolymerization with another copolymerizable vinyl monomer or polymer,
(7) An antistatic agent comprising the unsaturated quaternary ammonium salt according to any one of (1) to (3) and / or the oligomer or polymer according to (6),
(8) An antistatic resin composition containing the antistatic agent according to (7), wherein the unsaturated quaternary ammonium salt according to any one of (1) to (3) is configured. Containing 0.1 to 95% by weight as a unit;
(9) The antistatic resin composition described in (8) above, which further contains polyfunctional (meth) acrylate and / or polyfunctional (meth) acrylamide,
(10) After coating the antistatic agent described in (7) and / or the antistatic composition described in (8) or (9) on a base material, it is formed by curing with active energy rays or heat. An antistatic layer, characterized by
(11) A film or sheet-shaped antistatic thin film having the antistatic layer according to (10) on at least one surface;
(12) A battery or capacitor comprising the unsaturated quaternary ammonium salt according to any one of (1) to (3) and / or the oligomer or polymer according to (6). Electrolyte,
(13) An antibacterial agent characterized by using the unsaturated quaternary ammonium salt according to any one of (1) to (3) and / or the oligomer or polymer according to (6),
Is to provide.

本発明の不飽和第四級アンモニウム塩化合物は、水や有機溶媒、通用のビニルモノマー、樹脂への溶解性、親和性に優れるため、基材上にムラ無く塗工でき、UVなどの活性エネルギー線照射による硬化後もブリードアウトせず、帯電防止効果や抗菌効果が持続することから、帯電防止コーティング剤、抗菌剤にも好適に用いられる。また、本発明の方法によると、本発明の不飽和第四級アンモニウム塩化合物を高純度、高収率且つ簡便に製造することができる。 The unsaturated quaternary ammonium salt compound of the present invention has excellent solubility and affinity in water, organic solvents, common vinyl monomers, and resins, so it can be applied evenly on the substrate, and active energy such as UV Since it does not bleed out even after being cured by irradiation with radiation and the antistatic effect and antibacterial effect are maintained, it is also suitably used for an antistatic coating agent and an antibacterial agent. Moreover, according to the method of the present invention, the unsaturated quaternary ammonium salt compound of the present invention can be easily produced with high purity and high yield.

本発明の不飽和第四級アンモニウム塩化合物は、通用のビニルモノマーと容易に共重合できるため、疎水性ビニルモノマーとの共重合による非水溶性の様々な帯電防止組成物が提供できる。 Since the unsaturated quaternary ammonium salt compound of the present invention can be easily copolymerized with a common vinyl monomer, various water-insoluble antistatic compositions by copolymerization with a hydrophobic vinyl monomer can be provided.

さらに、本発明の製法方法で得られる不飽和第四級アンモニウム塩化合物は、ハロゲンも水分も含有しないため、ハロゲン、水分を含まない本発明の組成物は、腐食が問題となる用途、例えば各種電気化学デバイスにも好適に用いられる。 Furthermore, since the unsaturated quaternary ammonium salt compound obtained by the production method of the present invention does not contain halogen or moisture, the composition of the present invention which does not contain halogen or moisture can be used in applications where corrosion is a problem, such as various types. It is also suitably used for electrochemical devices.

以下、本発明を詳細に説明する。
本発明の不飽和第四級アンモニウム塩は、一般式(1)で表わされる(メタ)アクリレート系第四級アンモニウム塩または(メタ)アクリルアミド系第四級アンモニウム塩である。
Hereinafter, the present invention will be described in detail.
The unsaturated quaternary ammonium salt of the present invention is a (meth) acrylate quaternary ammonium salt or a (meth) acrylamide quaternary ammonium salt represented by the general formula (1).

Figure 2015189680
(式中、Rは水素原子またはメチル基、R、Rは各々独立に炭素数1〜3のアルキル基、炭素数1〜3のアルケニル基またはベンジル基で、互いに同一であっても異なっていてもよく、Xは酸素原子またはNH、Yは炭素数1〜3のアルキレン基を表し、nは1〜6の整数、Zは有機基、An-はn価の有機酸イオンを表す。)
Figure 2015189680
Wherein R 1 is a hydrogen atom or a methyl group, R 2 and R 3 are each independently an alkyl group having 1 to 3 carbon atoms, an alkenyl group having 1 to 3 carbon atoms or a benzyl group, may be different, X represents an oxygen atom or NH, Y represents an alkylene group having 1 to 3 carbon atoms, n represents an integer from 1 to 6, Z is an organic group, a n-is an n-valent organic acid ion Represents.)

本発明の一般式(1)で示される不飽和第四級アンモニウム塩は、(a)下記一般式(2)

Figure 2015189680
で表される不飽和三級アミン化合物と、有機酸と、(b)下記一般式(3)
Figure 2015189680
または(c)下記一般式(4)
Figure 2015189680
で表される環状エーテル基含有化合物とを反応させることにより得ることができる。
(各式中、Rは水素原子またはメチル基、R、Rは各々独立に炭素数1〜3のアルキル基、炭素数1〜3のアルケニル基またはベンジル基で互いに同一であっても異なっていてもよく、Xは酸素原子またはNHを表し、Yは炭素数1〜3のアルキレン基を表す。また、Rは、炭素数1〜20のアルキル基、炭素数1〜3のアルケニル基、フェノール基またはベンジル基で、環状エーテル基で置換されていてもよく、Rは水素原子または炭素数1のアルキル基であり、mは1〜30の整数を示す。) The unsaturated quaternary ammonium salt represented by the general formula (1) of the present invention includes (a) the following general formula (2)
Figure 2015189680
(B) the following general formula (3):
Figure 2015189680
Or (c) the following general formula (4)
Figure 2015189680
It can obtain by making it react with the cyclic ether group containing compound represented by these.
(In each formula, R 1 is a hydrogen atom or a methyl group, R 2 and R 3 are each independently an alkyl group having 1 to 3 carbon atoms, an alkenyl group having 1 to 3 carbon atoms, or a benzyl group, X may represent an oxygen atom or NH, Y represents an alkylene group having 1 to 3 carbon atoms, and R 4 represents an alkyl group having 1 to 20 carbon atoms or an alkenyl group having 1 to 3 carbon atoms. A group, a phenol group or a benzyl group, which may be substituted with a cyclic ether group, R 5 is a hydrogen atom or an alkyl group having 1 carbon atom, and m is an integer of 1 to 30.)

上記一般式(2)で表される不飽和三級アミン化合物の具体例としては、N,N−ジメチルアミノエチル(メタ)アクリレート、N,N−ジエチルアミノエチル(メタ)アクリレート、N,N−ジメチルアミノプロピル(メタ)アクリレート、N,N−ジエチルアミノプロピル(メタ)アクリレート、N,N−メチルエチルアミノエチル(メタ)アクリレート、N,N−メチルプロピルアミノエチル(メタ)アクリレート、N,N−メチルエチルアミノプロピル(メタ)アクリレート、N,N−メチルプロピルアミノプロピル(メタ)アクリレート、N,N−ジプロピルアミノプロピル(メタ)アクリレートなどのアクリレート、N,N−ジメチルアミノエチル(メタ)アクリルアミド、N,N−ジエチルアミノエチル(メタ)アクリルアミド、N,N−ジメチルアミノプロピル(メタ)アクリルアミド、N,N−ジエチルアミノプロピル(メタ)アクリルアミド、N,N−メチルエチルアミノエチル(メタ)アクリルアミド、N,N−メチルプロピルアミノエチル(メタ)アクリルアミド、N,N−メチルエチルアミノプロピル(メタ)アクリルアミド、N,N−メチルプロピルアミノプロピル(メタ)アクリルアミド、N,N−ジプロピルアミノプロピル(メタ)アクリルアミドなどのアクリルアミド、が挙げられる。 Specific examples of the unsaturated tertiary amine compound represented by the general formula (2) include N, N-dimethylaminoethyl (meth) acrylate, N, N-diethylaminoethyl (meth) acrylate, and N, N-dimethyl. Aminopropyl (meth) acrylate, N, N-diethylaminopropyl (meth) acrylate, N, N-methylethylaminoethyl (meth) acrylate, N, N-methylpropylaminoethyl (meth) acrylate, N, N-methylethyl Acrylates such as aminopropyl (meth) acrylate, N, N-methylpropylaminopropyl (meth) acrylate, N, N-dipropylaminopropyl (meth) acrylate, N, N-dimethylaminoethyl (meth) acrylamide, N, N-diethylaminoethyl (meth) acrylami N, N-dimethylaminopropyl (meth) acrylamide, N, N-diethylaminopropyl (meth) acrylamide, N, N-methylethylaminoethyl (meth) acrylamide, N, N-methylpropylaminoethyl (meth) acrylamide, Examples thereof include acrylamides such as N, N-methylethylaminopropyl (meth) acrylamide, N, N-methylpropylaminopropyl (meth) acrylamide, and N, N-dipropylaminopropyl (meth) acrylamide.

上記一般式(3)および一般式(4)で表される環状エーテル基含有化合物の具体例としては、アルキレンオキサイド付加体のグリシジルエーテルが挙げられ、市販品としては、デナコールEX−171、145、810、811、850、851、821、830、832、841、861、911、941、920、931、611、612、614、614B、622、512、521(ナガセケムテックス株式会社製)、エポライト40E、100E、200E、400E、70P、200P、400P(共栄社化学株式会社製)などが挙げられる。 Specific examples of the cyclic ether group-containing compound represented by the general formula (3) and the general formula (4) include glycidyl ethers of alkylene oxide adducts, and commercially available products include Denacol EX-171, 145, 810, 811, 850, 851, 821, 830, 832, 841, 861, 911, 941, 920, 931, 611, 612, 614, 614B, 622, 512, 521 (manufactured by Nagase ChemteX Corporation), Epolite 40E , 100E, 200E, 400E, 70P, 200P, 400P (manufactured by Kyoeisha Chemical Co., Ltd.).

本発明の一般式(1)で表される不飽和第四級アンモニウム塩の製造方法において、前記一般式(2)で表される不飽和三級アミン化合物と、前記一般式(3)または一般式(4)で表される環状エーテル基含有化合物との反応モル比は、三級アミン化合物に1モルに対して、環状エーテル基含有化合物0.5〜1.5モルであり、好ましくは0.8〜1.2モルである。モル比が0.5モルよりも少ない、又は1.5モルよりも多いと、一方の原料が過剰に残存するため、反応後の精製が困難となり、目的物の収率を低下させるので好ましくない。また、経済的にも不利である。 In the method for producing an unsaturated quaternary ammonium salt represented by the general formula (1) of the present invention, the unsaturated tertiary amine compound represented by the general formula (2) and the general formula (3) or The reaction molar ratio with the cyclic ether group-containing compound represented by the formula (4) is 0.5 to 1.5 mol of the cyclic ether group-containing compound with respect to 1 mol of the tertiary amine compound, preferably 0. .8 to 1.2 moles. If the molar ratio is less than 0.5 mol or more than 1.5 mol, one of the raw materials remains excessively, so that purification after the reaction becomes difficult and the yield of the target product is lowered. . It is also economically disadvantageous.

反応条件としては、一般式(1)で表される不飽和第四級アンモニウム塩が得られる条件であれば特に限定されない。通常、前記一般式(2)で表される不飽和三級アミン化合物と有機酸とを反応させた後、前記一般式(3)または一般式(4)で表される環状エーテル基含有化合物とを反応させることが一般的である。また、三級アミン化合物と有機酸の反応に用いる酸としては、第四級アンモニウム塩になった際、金属に対する腐食性を有しない有機酸であれば特に制限無く用いることができる。 The reaction conditions are not particularly limited as long as the unsaturated quaternary ammonium salt represented by the general formula (1) is obtained. Usually, after reacting the unsaturated tertiary amine compound represented by the general formula (2) and an organic acid, the cyclic ether group-containing compound represented by the general formula (3) or the general formula (4) Is generally reacted. Moreover, as an acid used for reaction of a tertiary amine compound and organic acid, when it becomes a quaternary ammonium salt, if it is an organic acid which does not have corrosivity with respect to a metal, it can use without a restriction | limiting especially.

上記有機酸の具体例としては、炭素数1〜7のモノ又はジカルボン酸(ギ酸、酢酸、プロピオン酸、シュウ酸、コハク酸など)、炭素数1〜7のスルホン酸(メタンスルホン酸、トリフルオロメタンスルホン酸及びp−トルエンスルホン酸など)、ヒドロキシカルボン酸(グリコール酸、乳酸、ヒドロキシアクリル酸、オキシ酪酸、グリセリン酸、リンゴ酸、酒石酸、クエン酸、サリチル酸など)、芳香族カルボン酸(サリチル酸、安息香酸など)が挙げられ、炭素数1〜12の直鎖又は分岐のアルキル又はアルケニルリン酸エステル、アクリル酸、メタクリル酸、チオシアン酸、アシッドホスホオキシエチルメタクリレートなどの含リンメタアクリル酸エステル、含リンアクリル酸エステルなど、分子内にハロゲンを含まない有機酸を好適に使用することができる。 Specific examples of the organic acid include mono- or dicarboxylic acids having 1 to 7 carbon atoms (formic acid, acetic acid, propionic acid, oxalic acid, succinic acid, etc.), and sulfonic acids having 1 to 7 carbon atoms (methanesulfonic acid, trifluoromethane). Sulfonic acid and p-toluenesulfonic acid), hydroxycarboxylic acid (glycolic acid, lactic acid, hydroxyacrylic acid, oxybutyric acid, glyceric acid, malic acid, tartaric acid, citric acid, salicylic acid, etc.), aromatic carboxylic acid (salicylic acid, benzoic acid) Acid or the like), a linear or branched alkyl or alkenyl phosphate having 1 to 12 carbon atoms, a phosphorus-containing methacrylic acid ester such as acrylic acid, methacrylic acid, thiocyanic acid, acid phosphooxyethyl methacrylate, phosphorus-containing Suitable for organic acids that do not contain halogens in the molecule, such as acrylic esters It can be used.

上記有機酸は不飽和三級アミン化合物に対して過剰に用いたり、少なめに用いることができるが、溶液のpHが7以上となる範囲で行うことが好ましく、特に、pH7〜9の範囲になるように有機酸の供給量を制御することが、三級アミンの反応性を向上させることができるために好適である。 The organic acid can be used in excess or in a small amount with respect to the unsaturated tertiary amine compound, but it is preferably carried out in the range where the pH of the solution is 7 or more, and particularly in the range of pH 7-9. In this way, it is preferable to control the supply amount of the organic acid because the reactivity of the tertiary amine can be improved.

pHが7未満になると、三級アミンの反応性が低下し、供給した有機酸が環状エーテル基含有化合物と接触し副反応が生じる可能性があるため好ましくない。 When the pH is less than 7, the reactivity of the tertiary amine decreases, and the supplied organic acid may come into contact with the cyclic ether group-containing compound to cause a side reaction, which is not preferable.

三級アミン化合物と有機酸とを反応させる際、反応液のpHを7以上に調整するために、他の塩基性化合物を添加してもよい。塩基性化合物としては、特に限定するものではないが、例えば、テトラメチルアンモニウムヒドロキシドなどの四級アンモニウム塩類、水酸化ナトリウム、水酸化カリウムなどのアルカリ金属類、水酸化カルシウムなどのアルカリ土類金属類が挙げられる。これらは単独で使用または複数を組み合わせて使用することができる。 When the tertiary amine compound and the organic acid are reacted, another basic compound may be added in order to adjust the pH of the reaction solution to 7 or more. The basic compound is not particularly limited, but examples thereof include quaternary ammonium salts such as tetramethylammonium hydroxide, alkali metals such as sodium hydroxide and potassium hydroxide, and alkaline earth metals such as calcium hydroxide. Kind. These can be used alone or in combination.

また、上記の三級アミン化合物と有機酸との反応は、35℃以下で行われることが好ましい。35℃を超えると、反応時に発生する中和熱による反応液の温度が急速に上昇し、重合などの副反応が起こる可能性がある。 Moreover, it is preferable that reaction of said tertiary amine compound and organic acid is performed at 35 degrees C or less. If it exceeds 35 ° C., the temperature of the reaction solution due to the heat of neutralization generated during the reaction rises rapidly, and side reactions such as polymerization may occur.

本発明の不飽和第四級アンモニウム塩の製造は、不飽和三級アミンと有機酸の反応生成物と、一般式(3)または(4)で表される環状エーテル基含有化合物とを混合することにより行われ、反応温度及び反応時間は反応に応じて適宜設定されうるが、反応を加速するために反応温度を高めることが有効である。 In the production of the unsaturated quaternary ammonium salt of the present invention, a reaction product of an unsaturated tertiary amine and an organic acid is mixed with a cyclic ether group-containing compound represented by the general formula (3) or (4). The reaction temperature and reaction time can be appropriately set depending on the reaction, but it is effective to increase the reaction temperature in order to accelerate the reaction.

反応温度は、通常10℃以上、15〜150℃が好ましく、20〜120℃が特に好ましい。反応温度が10℃未満の場合、反応速度が遅くなり、完結する所要反応時間が長くなる。一方、120℃を超えると中間体として不飽和三級アミンと有機酸の反応生成物、生成物である不飽和第四級アンモニウム塩が重合してしまう可能性がある。 The reaction temperature is usually 10 ° C. or higher, preferably 15 to 150 ° C., and particularly preferably 20 to 120 ° C. When reaction temperature is less than 10 degreeC, reaction rate becomes slow and the required reaction time to complete becomes long. On the other hand, when it exceeds 120 ° C., the reaction product of unsaturated tertiary amine and organic acid as an intermediate, and the product unsaturated quaternary ammonium salt may be polymerized.

本発明において、反応は必要に応じて適当な溶媒の存在下で行うことができるが、溶媒を使用しないで反応を行うこともできる。溶媒の存在下で行う場合、使用可能な溶媒としては、前記一般式(3)と(4)で表される環状エーテル基含有化合物と低温において高速に反応しないものであれば特に限定するものではないが、水、メタノール、エタノール、2−プロパノールなどのプロトン性極性溶媒、アセトン、メチルエチルケトン、メチルイソブチルケトン、ジエチルケトン、メチルプロピルケトン、アセトニトリル、テトラヒドロフラン、1,4-ジオキサン、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、ジメチルスルホキシド、N−メチル−2−ピロリドン、酢酸エチル、酢酸プロピル、プロピレングリコールモノメチルエーテルアセテートなどの非プロトン性極性溶媒、ペンタン、ヘキサン、ヘプタンなどの直鎖状脂肪族炭化水素、2−メチルブタン、2−メチルペンタンなどの分岐状脂肪族炭化水素、シクロヘキサン、メチルシクロヘキサンなどの環状脂肪族炭化水素、ベンゼン、トルエン、キシレンなどの芳香族炭化水素、ジクロロメタン、クロロホルムなどの脂肪族ハロゲン化合物、クロロベンゼン、ジクロロベンゼンなどの芳香族ハロゲン化合物などが挙げられ、これら有機溶媒を単独あるいは2種以上混合して用いることができる。これらの反応溶媒の使用量は、通常、本発明の不飽和第四級アンモニウム塩に対して重量比で0.01〜20倍量である。 In the present invention, the reaction can be carried out in the presence of a suitable solvent as necessary, but the reaction can also be carried out without using a solvent. When the reaction is carried out in the presence of a solvent, usable solvents are not particularly limited as long as they do not react with the cyclic ether group-containing compounds represented by the general formulas (3) and (4) at a low temperature at high speed. Proton polar solvents such as water, methanol, ethanol, 2-propanol, acetone, methyl ethyl ketone, methyl isobutyl ketone, diethyl ketone, methyl propyl ketone, acetonitrile, tetrahydrofuran, 1,4-dioxane, N, N-dimethylformamide , N, N-dimethylacetamide, dimethyl sulfoxide, N-methyl-2-pyrrolidone, aprotic polar solvents such as ethyl acetate, propyl acetate, propylene glycol monomethyl ether acetate, linear aliphatic such as pentane, hexane, heptane Hydrocarbon, 2-me Branched aliphatic hydrocarbons such as tilbutane and 2-methylpentane, cycloaliphatic hydrocarbons such as cyclohexane and methylcyclohexane, aromatic hydrocarbons such as benzene, toluene and xylene, aliphatic halogen compounds such as dichloromethane and chloroform, chlorobenzene And aromatic halogen compounds such as dichlorobenzene. These organic solvents can be used alone or in admixture of two or more. The amount of these reaction solvents used is usually 0.01 to 20 times by weight with respect to the unsaturated quaternary ammonium salt of the present invention.

本発明の不飽和第四級アンモニウム塩は分子中に不飽和基を含有するため、反応中、さらに反応終了後の減圧蒸留、及び乾燥不活性ガス乃至乾燥空気バブリングによる有機溶媒の回収、除去は重合禁止剤の存在下で実施することが好ましい。 Since the unsaturated quaternary ammonium salt of the present invention contains an unsaturated group in the molecule, the organic solvent can be recovered and removed during the reaction, further by distillation under reduced pressure after completion of the reaction, and dry inert gas or dry air bubbling. It is preferable to carry out in the presence of a polymerization inhibitor.

重合禁止剤としては公知のものが使用できるが、例えば、ハイドロキノン、メチルハイドロキノン、tert−ブチルハイドロキノン、2,6−ジ−tert−ブチルパラハイドロキノン、2,5−ジ−tert−ブチルハイドロキノン、2,4−ジメチル−6−tertブチルフェノール、ハイドロキノンモノメチルエーテル等のフェノール化合物、N−イソプロピル−N'−フェニル−パラ−フェニレンジアミン、N−(1,3−ジメチルブチル)−N'−フェニル−パラ−フェニレンジアミン、N−(1−メチルヘプチル)−N'−フェニル−パラ−フェニレンジアミン、N,N'−ジフェニル−パラ−フェニレンジアミン、N,N'−ジ−2−ナフチル−パラ−フェニレンジアミン等のパラフェニレンジアミン類、チオジフェニルアミン等のアミン化合物、2,2,6,6−テトラメチルピペリジン−1−オキシル(TEMPO)、4?ヒドロキシ?2,2,6,6?テトラメチルピペリジン?1?オキシル(4H−TEMPO)、アセトアミドテトラメチルピペリジン−1−オキシル(アセトアミド−TEMPO)などのラジカル補足剤群などを例示することができる。これら重合禁止剤は、1種又は2種以上を併用しても構わない。 Known polymerization inhibitors can be used, such as hydroquinone, methyl hydroquinone, tert-butyl hydroquinone, 2,6-di-tert-butyl parahydroquinone, 2,5-di-tert-butyl hydroquinone, 2, Phenol compounds such as 4-dimethyl-6-tertbutylphenol and hydroquinone monomethyl ether, N-isopropyl-N′-phenyl-para-phenylenediamine, N- (1,3-dimethylbutyl) -N′-phenyl-para-phenylene Such as diamine, N- (1-methylheptyl) -N′-phenyl-para-phenylenediamine, N, N′-diphenyl-para-phenylenediamine, N, N′-di-2-naphthyl-para-phenylenediamine, etc. Paraphenylenediamines, thiodiphenylamine, etc. Amine compound, 2,2,6,6-tetramethylpiperidine-1-oxyl (TEMPO), 4-hydroxy-2,2,6,6-tetramethylpiperidine-1 oxyl (4H-TEMPO), acetamide tetramethyl A radical scavenger group such as piperidine-1-oxyl (acetamide-TEMPO) can be exemplified. These polymerization inhibitors may be used alone or in combination of two or more.

その他の重合禁止剤の添加量は、本発明の不飽和第四級アンモニウム塩に対して5〜10000ppm、好ましくは10〜5000ppmである。 The addition amount of the other polymerization inhibitor is 5 to 10000 ppm, preferably 10 to 5000 ppm, based on the unsaturated quaternary ammonium salt of the present invention.

上記製法により得られた高純度の不飽和第四級アンモニウム塩は、帯電防止効果を提供する観点から、コーティング剤、粘着剤、接着剤、インク組成物などに広く使用することができる。また、高いイオン導電性を利用した電解質や、抗菌効果を利用した抗菌剤用途においても好適に使用することができ、モノマーのまま使用したり、熱重合や活性エネルギー線硬化により、ポリマーやオリゴマー組成の一部に組み込んで使用したりすることができる。 The high-purity unsaturated quaternary ammonium salt obtained by the above production method can be widely used for coating agents, pressure-sensitive adhesives, adhesives, ink compositions and the like from the viewpoint of providing an antistatic effect. In addition, it can be suitably used in electrolytes utilizing high ionic conductivity and antibacterial agents utilizing antibacterial effects, and can be used as a monomer, or polymer or oligomer composition by thermal polymerization or active energy ray curing. It can be used by being incorporated into a part of

本発明の不飽和第四級アンモニウム塩を、ポリマーやオリゴマー組成の一部に組み込んで使用する場合、ポリマーやオリゴマーへ取り組む方法としては、汎用のビニル系単量体と共重合する方法が挙げられる。ビニル系単量体との共重合は、特に限定されるものではなく、公知のラジカル重合法により実施可能である。例えば、塊状重合法、有機溶媒中や水中の溶液重合法、懸濁重合法、乳化重合法などが挙げられる。有機溶媒中の溶液重合法を採用する場合、重合溶媒としては、トルエン、キシレン、酢酸エチル、酢酸ブチル、メチルエチルケトン、メチルアルコール、エチルアルコールなどを単独もしくは混合で用いることができる。 When the unsaturated quaternary ammonium salt of the present invention is used by incorporating it in a part of the polymer or oligomer composition, a method of tackling the polymer or oligomer includes a method of copolymerizing with a general-purpose vinyl monomer. . The copolymerization with the vinyl monomer is not particularly limited, and can be carried out by a known radical polymerization method. Examples thereof include a bulk polymerization method, a solution polymerization method in an organic solvent or in water, a suspension polymerization method, an emulsion polymerization method, and the like. When the solution polymerization method in an organic solvent is employed, toluene, xylene, ethyl acetate, butyl acetate, methyl ethyl ketone, methyl alcohol, ethyl alcohol, or the like can be used alone or in combination as a polymerization solvent.

ビニル系単量体との共重合において、重合開始剤としては、アゾ系、有機過酸化物系、無機過酸化物系、レドックス系など一般的に知られているラジカル重合開始剤が挙げられる。ラジカル重合開始剤の使用量としては、通常重合性単量体成分総量に対して0.001〜10重量%程度である。また、連鎖移動剤による分子量の調整など通常のラジカル重合技術が適用される。 In the copolymerization with the vinyl monomer, examples of the polymerization initiator include generally known radical polymerization initiators such as azo, organic peroxide, inorganic peroxide, and redox. The amount of the radical polymerization initiator used is usually about 0.001 to 10% by weight based on the total amount of the polymerizable monomer components. Further, a normal radical polymerization technique such as adjustment of molecular weight by a chain transfer agent is applied.

ビニル系単量体との共重合体における、本発明の不飽和第四級アンモニウム塩の含有量は、0.1〜95重量%であり、好ましくは1〜90重量%である。0.1%以下では、イオン伝導性能が発現されにくく、95%を越えると塗膜の強度低下の可能性がある。 The content of the unsaturated quaternary ammonium salt of the present invention in the copolymer with the vinyl monomer is 0.1 to 95% by weight, preferably 1 to 90% by weight. If it is 0.1% or less, the ion conduction performance is hardly exhibited, and if it exceeds 95%, the strength of the coating film may be lowered.

本発明の不飽和第四級アンモニウム塩を活性エネルギー線硬化性樹脂組成物の成分として用いる場合、光重合開始剤を含有させ、活性エネルギー線により硬化させる方法が挙げられる。 When using the unsaturated quaternary ammonium salt of this invention as a component of an active energy ray curable resin composition, the method of containing a photoinitiator and making it harden | cure with an active energy ray is mentioned.

活性エネルギー線とは、活性種を発生する化合物(光重合開始剤)を分解して活性種を発生させることのできるエネルギー線と定義され、このような活性エネルギー線としては、可視光、紫外線(UV)、赤外線、X線、α線、β線、γ線等の光エネルギー線が挙げられる。ただし、一定のエネルギーレベルを有し、硬化速度が速く、しかも照射装置が比較的安価で、小型である点から、紫外線を使用することが好ましい。 Active energy rays are defined as energy rays that can generate active species by decomposing a compound that generates active species (photopolymerization initiator). Such active energy rays include visible light, ultraviolet rays ( UV), infrared rays, X-rays, α rays, β rays, γ rays and other light energy rays. However, it is preferable to use ultraviolet rays because it has a certain energy level, has a high curing rate, is relatively inexpensive, and is compact.

光重合開始剤は、活性エネルギー線として電子線を用いる場合には特に必要はないが、紫外線を用いる場合には必要となる。光重合開始剤はアセトフェノン系、ベンゾイン系、ベンゾフェノン系、チオキサントン系等の通常のものから適宜選択すればよい。このうち、市販の光重合開始剤としてはチバ・スペシャルティーケミカルズ社製、商品名Darocure1116、Darocure1173、IRGACURE184、IRGACURE369、IRGACURE500、IRGACURE651、IRGACURE754、IRGACURE819、IRGACURE907、IRGACURE1300、IRGACURE1800、IRGACURE1870、IRGACURE2959、IRGACURE4265、LUCIRIN TPO、UCB社製、商品名ユベクリルP36、などを用いることができる。これらの光重合開始剤は1種又は2種以上を組み合わせて用いることができる。 The photopolymerization initiator is not particularly required when an electron beam is used as the active energy ray, but is required when ultraviolet rays are used. The photopolymerization initiator may be appropriately selected from ordinary ones such as acetophenone, benzoin, benzophenone, and thioxanthone. Among these, as commercially available photopolymerization initiators, trade names Darocure 1116, Darocure 1173, IRGACURE 184, IRGACURE 369, IRGACURE 500, IRGACURE 651, IRGACURE 754, IRGACURE IR, IRGACURE 1800, IRGACURE 1800, IRGACURE 1800, IRGACURE1800, IRGACURE1800, IRGACURE1800, IRGACURE1800 TPO, a product made by UCB, a brand name Ubekrill P36, etc. can be used. These photopolymerization initiators can be used alone or in combination of two or more.

これらの光重合開始剤の使用量は特に制限されていないが、一般に活性エネルギー線硬化性樹脂組成物やコート剤に対して、0.5〜10重量%、中でも1〜5重量%が添加されることが好ましい。0.5重量%未満だと十分な硬化性が得られず、10%を越えると塗膜の強度低下や黄変してしまう可能性がある。 The amount of these photopolymerization initiators is not particularly limited, but is generally 0.5 to 10% by weight, particularly 1 to 5% by weight based on the active energy ray-curable resin composition or coating agent. It is preferable. If it is less than 0.5% by weight, sufficient curability cannot be obtained, and if it exceeds 10%, the strength of the coating film may be lowered or yellowing may occur.

本発明の不飽和第四級アンモニウム塩と併用するポリマー、オリゴマー、モノマーは、単独で加えてもよいし、2種類以上組み合わせて用いてもよい。例えば、このようなポリマーとしては、ポリビニルアルコール、ヒドロキシエチルセルロース、ヒドロキシプロピルセルロース、ポリアクリルアミド、ポリN−置換アクリルアミド、ポリビニルピロリドン、ポリエチレンオキサイド、ポリエチレングリコール等のホモポリマー及びコポリマーがある。このようなオリゴマーとしては、分子量10000以下であるポリビニルアルコール、ヒドロキシエチルセルロース、ヒドロキシプロピルセルロース、ポリアクリルアミド、ポリN−置換アクリルアミド、ポリビニルピロリドン、ポリエチレンオキサイド、ポリエチレングリコール等のホモオリゴマー及びコオリゴマーがある。このようなモノマーとしては、メチル(メタ)アクリレート、エチル(メタ)アクリレート、プロピル(メタ)アクリレート、ブチル(メタ)アクリレート、2−エチルヘキシル(メタ)アクリレート、テトラヒドロフルフリル(メタ)アクリレート、イソボルニル(メタ)アクリレート、N,N−ジメチルアミノエチル(メタ)アクリレートなどの(メタ)アクリレート系モノマー、(メタ)アクリルアミド、プロピル(メタ)アクリルアミド、イソプロピル(メタ)アクリルアミド、ブチル(メタ)アクリルアミド、N−メチル(メタ)アクリルアミド、ジメチル(メタ)アクリルアミド、ジエチル(メタ)アクリルアミド、N−メチロール(メタ)アクリルアミド、N,N−ジメチルアミノプロピル(メタ)アクリルアミド、N,N−ジエチルアミノプロピル(メタ)アクリルアミド、ダイアセトンアクリルアミドなどの(メタ)アクリルアミド系モノマー、ヒドロキシエチル(メタ)アクリレート、ヒドロキシブチル(メタ)アクリレート、ヒドロキシエチル(メタ)アクリルアミド、N−メチルヒドロキシエチル(メタ)アクリルアミドなどの水酸基含有(メタ)アクリル系モノマー、(メタ)アクリル酸、クロトン酸、マレイン酸、無水マレイン酸、フマル酸、シトラコン酸、イタコン酸などのカルボキシル基含有(メタ)アクリル系モノマー、2−(メタ)アクリロイルオキシエチルイソシアネートなどのイソシアネート基含有(メタ)アクリル系モノマー、(メタ)アクリル酸グリシジルなどのグリシジル基含有(メタ)アクリル系モノマー、2−ビニル−2−オキサゾリンなどのオキサゾリン基含有(メタ)アクリル系モノマー、(メタ)アクリロニトリルなどのシアノ含有モノマー、スチレン、2−メチルスチレンなどのスチレン系モノマー、ビニルナフタレン、ジビニルベンゼンなどの芳香族ビニルモノマー、酢酸ビニル、プロピオン酸ビニルなどのビニルエステル系モノマー、アクリロイルモルホリン、ビニルカプロラクタム、ビニルピロリドン、テトラヒドロフルフリル(メタ)アクリレート、3,4−エポキシシクロヘキシルメチル(メタ)アクリレートなどの複素環基含有モノマー、エチレン、プロピレン、イソプレン、ブタジエン、イソブチレンなどのオレフィン系モノマー、メチルビニルエーテル、エチルビニルエーテルなどのビニルエーテル系モノマーなどが挙げられる。これらは1種類に限らず、複数の種類を組み合わせて使用してもよい。 The polymer, oligomer and monomer used in combination with the unsaturated quaternary ammonium salt of the present invention may be added alone or in combination of two or more. For example, such polymers include homopolymers and copolymers such as polyvinyl alcohol, hydroxyethyl cellulose, hydroxypropyl cellulose, polyacrylamide, poly N-substituted acrylamide, polyvinyl pyrrolidone, polyethylene oxide, polyethylene glycol and the like. Examples of such oligomers include homo-oligomers and co-oligomers such as polyvinyl alcohol, hydroxyethyl cellulose, hydroxypropyl cellulose, polyacrylamide, poly N-substituted acrylamide, polyvinyl pyrrolidone, polyethylene oxide, and polyethylene glycol having a molecular weight of 10,000 or less. Such monomers include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, isobornyl (meth) ) Acrylate, (meth) acrylate monomers such as N, N-dimethylaminoethyl (meth) acrylate, (meth) acrylamide, propyl (meth) acrylamide, isopropyl (meth) acrylamide, butyl (meth) acrylamide, N-methyl ( (Meth) acrylamide, dimethyl (meth) acrylamide, diethyl (meth) acrylamide, N-methylol (meth) acrylamide, N, N-dimethylaminopropyl (meth) acrylamide, N, N- (Meth) acrylamide monomers such as ethylaminopropyl (meth) acrylamide and diacetone acrylamide, hydroxyethyl (meth) acrylate, hydroxybutyl (meth) acrylate, hydroxyethyl (meth) acrylamide, N-methylhydroxyethyl (meth) acrylamide Hydroxyl group-containing (meth) acrylic monomers such as (meth) acrylic acid, crotonic acid, maleic acid, maleic anhydride, fumaric acid, citraconic acid, itaconic acid and other carboxyl group-containing (meth) acrylic monomers, 2- ( Isocyanate group-containing (meth) acrylic monomers such as (meth) acryloyloxyethyl isocyanate, glycidyl group-containing (meth) acrylic monomers such as (meth) acrylic acid glycidyl, 2-vinyl-2-io Oxazoline group-containing (meth) acrylic monomers such as sazoline, cyano-containing monomers such as (meth) acrylonitrile, styrene monomers such as styrene and 2-methylstyrene, aromatic vinyl monomers such as vinylnaphthalene and divinylbenzene, vinyl acetate, Heterocyclic group-containing monomers such as vinyl ester monomers such as vinyl propionate, acryloylmorpholine, vinyl caprolactam, vinyl pyrrolidone, tetrahydrofurfuryl (meth) acrylate, 3,4-epoxycyclohexylmethyl (meth) acrylate, ethylene, propylene, Examples thereof include olefin monomers such as isoprene, butadiene and isobutylene, and vinyl ether monomers such as methyl vinyl ether and ethyl vinyl ether. These are not limited to one type, and a plurality of types may be used in combination.

本発明の不飽和第四級アンモニウム塩を活性エネルギー線硬化性樹脂組成物の成分として用いる場合、樹脂の凝集力を高めたり、硬化性を向上させる目的で、2個以上のエチレン基を有する多官能のモノマーやオリゴマーを添加してもよい。多官能モノマーの具体例としては、(メタ)アクリレートペンタエリスリトールテトラ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ジペンタエリスルトールヘキサ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールテトラ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、ジエチレングリコールジ(メタ)アクリレート、トリメチロールエタントリ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、1、6−ヘキサンジオールジ(メタ)アクリレート、トリプロピレングリコールジ(メタ)アクリレート、トリシクロデカンジメタノールジ(メタ)アクリレート、ジテトラエチレングリコールジ(メタ)アクリレート、メチレンビスアクリルアミド、メチレンビスメタアクリルアミド、エチレンビスアクリルアミド、エチレンビスメタアクリルアミド、ジアリルアクリルアミド、エポキシ(メタ)アクリレート、ポリエステル(メタ)アクリレート、ウレタン(メタ)アクリレート、ウレタンアクリルアミド等が挙げられる。 When the unsaturated quaternary ammonium salt of the present invention is used as a component of the active energy ray-curable resin composition, it has a large number of two or more ethylene groups for the purpose of increasing the cohesive strength of the resin or improving the curability. Functional monomers and oligomers may be added. Specific examples of the polyfunctional monomer include (meth) acrylate pentaerythritol tetra (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, di Pentaerythritol tetra (meth) acrylate, neopentyl glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, trimethylolethane tri (meth) acrylate, trimethylolpropane tri (meth) acrylate, 1,6-hexanediol di ( (Meth) acrylate, tripropylene glycol di (meth) acrylate, tricyclodecane dimethanol di (meth) acrylate, ditetraethylene glycol di (meth) a Relate, methylenebisacrylamide, methylenebisacrylamide methacrylamide, ethylene bisacrylamide, ethylene bis-methacrylamide, diallyl acrylamide, epoxy (meth) acrylates, polyester (meth) acrylate, urethane (meth) acrylate, urethane acrylamide.

これらの多官能のモノマーやオリゴマーは、1種類に限らず、複数を組み合わせて使用してもよい。また、このような多官能のモノマーやオリゴマーを使用する場合、その使用量は、架橋すべき前記の活性エネルギー線硬化性樹脂中に含まれる官能基の量や分子量とのバランスにより、さらには、用途目的により適宜選択できるが、通常は、活性エネルギー線硬化性樹脂100重量%に対して、0.05〜99.9重量%含有されていることが好ましく、0.1〜99.5重量%含有されていることがより好ましい。含有量が0.05重量%よりも少ない場合、架橋剤による架橋形成が不十分となり、十分な凝集力が得られない場合があり、一方、含有量が99.9重量%を超える場合、ポリマーの凝集力が大きく、被着体へのなじみ性(濡れ性)が不十分となる傾向がある。 These polyfunctional monomers and oligomers are not limited to one type and may be used in combination. In addition, when such a polyfunctional monomer or oligomer is used, the amount used thereof depends on the balance with the amount and molecular weight of the functional group contained in the active energy ray curable resin to be crosslinked, Although it can be appropriately selected depending on the purpose of use, it is usually preferably 0.05 to 99.9% by weight, preferably 0.1 to 99.5% by weight with respect to 100% by weight of the active energy ray-curable resin. More preferably it is contained. When the content is less than 0.05% by weight, the crosslinking formation by the crosslinking agent may be insufficient, and sufficient cohesive force may not be obtained. On the other hand, when the content exceeds 99.9% by weight, the polymer The cohesive force is large and the conformability (wetting property) to the adherend tends to be insufficient.

このようにして、本発明の不飽和第四級アンモニウム塩からなる帯電防止樹脂組成物が得られる。そして、該帯電防止樹脂組成物には、帯電防止性や、透明性、相溶性、抗菌性などの特性を阻害しない範囲で、従来公知の各種の粘着付与剤や表面潤滑剤、レベリング剤、酸化防止剤、紫外線吸収剤、腐食防止剤、光安定剤、重合禁止剤、シランカップリンング剤、無機または有機の充項剤、金属粉、顔料、染料などの粉体、粒子状、箔状物などの従来公知の各種の添加剤を、使用する用途に応じて適宜添加することができる。 In this way, an antistatic resin composition comprising the unsaturated quaternary ammonium salt of the present invention is obtained. The antistatic resin composition includes various conventionally known tackifiers, surface lubricants, leveling agents, oxidation agents, and the like as long as the antistatic properties, transparency, compatibility, antibacterial properties and the like are not impaired. Inhibitors, UV absorbers, corrosion inhibitors, light stabilizers, polymerization inhibitors, silane coupling agents, inorganic or organic fillers, metal powders, pigments, dyes, powders, particles, foils Various conventionally known additives such as those can be appropriately added according to the intended use.

本発明の帯電防止樹脂組成物を紙、布、不織布、ガラス、ポリエチレンテレフタレート、ジアセテートセルロース、トリアセテートセルロース、アクリル系ポリマー、ポリ塩化ビニル、セロハン、セルロイド、ポリカーボネート、ポリイミドなどのプラスチック及び金属等の基材の表面や間に塗布し、紫外線等の活性エネルギー線照射で硬化させることにより、高性能のハードコート層、粘着剤層又は接着剤層を得ることができる。また、本発明の帯電防止樹脂組成物は透明であるため、基材として透明なものを用いることにより、透明な帯電防止ハードコート層、粘着剤層、接着剤層を得ることができる。この樹脂組成物を基材上に塗布する方法としては、スピンコート法、スプレーコート法、ディッピング法、グラビアロール法、ナイフコート法、リバースロール法、スクリーン印刷法、バーコーター法等通常の塗膜形成法が用いられることができる。また、基材間に塗布する方法としては、ラミネート法、ロールツーロール法等が挙げられる。 The antistatic resin composition of the present invention is made of paper, cloth, non-woven fabric, glass, polyethylene terephthalate, diacetate cellulose, triacetate cellulose, acrylic polymer, polyvinyl chloride, cellophane, celluloid, polycarbonate, polyimide, and other plastics and metals. A high-performance hard coat layer, pressure-sensitive adhesive layer, or adhesive layer can be obtained by coating between the surfaces of the material and curing by irradiation with active energy rays such as ultraviolet rays. Moreover, since the antistatic resin composition of the present invention is transparent, a transparent antistatic hard coat layer, a pressure-sensitive adhesive layer, and an adhesive layer can be obtained by using a transparent base material. As a method of applying this resin composition on a substrate, a normal coating film such as a spin coating method, a spray coating method, a dipping method, a gravure roll method, a knife coating method, a reverse roll method, a screen printing method, a bar coater method, etc. A forming method can be used. Moreover, as a method of apply | coating between base materials, the laminating method, the roll-to-roll method, etc. are mentioned.

本発明の帯電防止樹脂組成物は、特に静電気が発生しやすいプラスチック製品などに用いられ、中でも特に、液晶ディスプレイなどに用いられる偏光板、位相差板、光学補償フィルム、光拡散シート、反射シートなどの光学部材表面を保護する目的で用いられる表面保護フィルムとして好適に用いることができる。 The antistatic resin composition of the present invention is used for plastic products that are particularly prone to generate static electricity, and in particular, polarizing plates, retardation plates, optical compensation films, light diffusion sheets, reflection sheets and the like used for liquid crystal displays and the like. It can be suitably used as a surface protective film used for the purpose of protecting the surface of the optical member.

本発明の不飽和第四級アンモニウム塩は、帯電防止コーティング用途以外に、イオン伝導性に優れ、耐水性や熱安定性に優れているため、各種の電解液を備えた電気化学デバイスの電解液にも有用である。電気化学デバイスとしては、電気二重層キャパシタ、リチウム二次電池、燃料電池、色素増感太陽電池、各種電気化学センサー、エレクトロクロミック阻止、電気化学スイッチング素子などが挙げられる。また、電解液用途では本発明の不飽和第四級アンモニウム塩単独の他、有機溶媒に溶解した状態で使用することも可能である。 The unsaturated quaternary ammonium salt of the present invention has excellent ionic conductivity, water resistance and thermal stability in addition to antistatic coating applications. Also useful. Examples of the electrochemical device include an electric double layer capacitor, a lithium secondary battery, a fuel cell, a dye-sensitized solar cell, various electrochemical sensors, electrochromic blocking, and an electrochemical switching element. In addition, for use as an electrolytic solution, in addition to the unsaturated quaternary ammonium salt of the present invention alone, it can be used in a state dissolved in an organic solvent.

以下、実施例によって本発明をさらに説明するが、本発明はこれに限定されるものではない。 EXAMPLES Hereinafter, although an Example demonstrates this invention further, this invention is not limited to this.

なお、以下の合成実施例、合成比較例において、不飽和第四級アンモニウム塩の分析は以下の方法により行った。
〔第四級アンモニウム塩濃度(該目的物の純度)の測定方法〕
電位差自動滴定装置(装置名:AT−610 京都電子工業株式会社製)を用いて、濃度0.02mol/Lのテトラフェニルほう酸ナトリウム溶液(関東化学株式会社製)により滴定を行い、滴定量から第四級アンモニウム塩濃度を求めた。
In the following synthesis examples and synthesis comparative examples, the analysis of unsaturated quaternary ammonium salts was performed by the following method.
[Method of measuring quaternary ammonium salt concentration (purity of the target product)]
Using an automatic potentiometric titrator (device name: AT-610, manufactured by Kyoto Electronics Industry Co., Ltd.), titration was performed with a sodium tetraphenylborate solution (manufactured by Kanto Chemical Co., Ltd.) having a concentration of 0.02 mol / L. The quaternary ammonium salt concentration was determined.

合成実施例1 不飽和第四級アンモニウム塩(1)(ジメチルアミノプロピルアクリルアミドとラウリルアルコール(EO)15グリシジルエーテル/酢酸塩の付加物の合成)
撹拌翼、還流冷却器、温度計、滴下漏斗を備えたフラスコに、ジメチルアミノプロピルアクリルアミド20.0重量部(0.13モル)とイオン交換水100.0重量部を仕込み、フラスコ内の温度を35℃以下に保ちながら酢酸7.3重量部(0.12モル)を滴下した。このとき反応液のpHは8.4であった。次に、フラスコ内の温度を60℃に上昇し、ラウリルアルコールポリオキシエチレングリシジルエーテル(デナコールEX―171;ナガセケムテックス株式会社製)110.0重量部(0.12モル)をイオン交換水100.0重量部に溶解させたものを1時間かけて滴下した後、8時間攪拌を行った。続いて、反応液に4−メトキシフェノール0.2重量部を加え、40℃、3torrで減圧濃縮を行ってイオン交換水を除去し、目的の不飽和第四級アンモニウム塩(1)を135.0重量部得た。生成物は黄色の粘調性液体であった。第四級アンモニウム塩濃度(該目的物の純度)を求めたところ、99.5%であった。また、収率は97.9%であった。元素分析では、実測値(C:59.33%、H:9.81%、N:2.35%)が理論値(C:59.01%、H:9.90%、N:2.50%)と一致した。
Synthesis Example 1 Unsaturated quaternary ammonium salt (1) (Synthesis of adduct of dimethylaminopropylacrylamide and lauryl alcohol (EO) 15 glycidyl ether / acetate)
A flask equipped with a stirring blade, a reflux condenser, a thermometer, and a dropping funnel was charged with 20.0 parts by weight (0.13 mol) of dimethylaminopropylacrylamide and 100.0 parts by weight of ion-exchanged water, and the temperature in the flask was adjusted. While maintaining the temperature at 35 ° C. or lower, 7.3 parts by weight (0.12 mol) of acetic acid was added dropwise. At this time, the pH of the reaction solution was 8.4. Next, the temperature in the flask was raised to 60 ° C., and 110.0 parts by weight (0.12 mol) of lauryl alcohol polyoxyethylene glycidyl ether (Denacol EX-171; manufactured by Nagase ChemteX Corporation) was added to 100% of ion-exchanged water. A solution dissolved in 0.0 part by weight was added dropwise over 1 hour, followed by stirring for 8 hours. Subsequently, 0.2 parts by weight of 4-methoxyphenol was added to the reaction solution, and concentrated under reduced pressure at 40 ° C. and 3 torr to remove ion-exchanged water, and the target unsaturated quaternary ammonium salt (1) was added to 135. 0 parts by weight were obtained. The product was a yellow viscous liquid. When the concentration of the quaternary ammonium salt (purity of the target product) was determined, it was 99.5%. The yield was 97.9%. In elemental analysis, measured values (C: 59.33%, H: 9.81%, N: 2.35%) are theoretical values (C: 59.01%, H: 9.90%, N: 2. 50%).

合成実施例2 不飽和第四級アンモニウム塩(2)(ジメチルアミノプロピルアクリルアミドとフェノール(EO)5グリシジルエーテル/酢酸塩の付加物の合成)
撹拌翼、還流冷却器、温度計、滴下漏斗を備えたフラスコに、酢酸10.4重量部(0.17モル)とイオン交換水100.0重量部を仕込み、フラスコ内の温度を35℃以下に保ちながらジメチルアミノプロピルアクリルアミド30.0重量部(0.19モル)を滴下した。このとき反応液のpHは8.8であった。次に、フラスコの温度を60℃に上昇し、フェノール(EO)5グリシジルエーテル(デナコールEX―145;ナガセケムテックス株式会社製)64.0重量部(0.17モル)をイオン交換水100.0重量部に溶解させたものを1時間かけて滴下した後、6時間攪拌を行った。続いて、反応液に4−メトキシフェノール0.2重量部を加え、40℃、3torrで減圧濃縮を行ってイオン交換水を除去し、目的の不飽和第四級アンモニウム塩(2)を90.0重量部得た。生成物は薄黄色の粘調性液体であった。第四級アンモニウム塩濃度(該目的物の純度)を求めたところ、99.3%であった。また、収率は88.1%であった。元素分析では、実測値(C:59.53%、H:8.51%、N:4.75%)が理論値(C:59.37%、H:8.59%、N:4.77%)と一致した。
Synthesis Example 2 Unsaturated quaternary ammonium salt (2) (synthesis of adduct of dimethylaminopropylacrylamide and phenol (EO) 5 glycidyl ether / acetate)
A flask equipped with a stirring blade, a reflux condenser, a thermometer, and a dropping funnel was charged with 10.4 parts by weight (0.17 mol) of acetic acid and 100.0 parts by weight of ion-exchanged water, and the temperature in the flask was 35 ° C. or less. 30.0 parts by weight (0.19 mol) of dimethylaminopropylacrylamide was added dropwise. At this time, the pH of the reaction solution was 8.8. Next, the temperature of the flask was raised to 60 ° C., 64.0 parts by weight (0.17 mol) of phenol (EO) 5 glycidyl ether (Denacol EX-145; manufactured by Nagase ChemteX Corporation) was added to 100. What was dissolved in 0 part by weight was added dropwise over 1 hour, followed by stirring for 6 hours. Subsequently, 0.2 parts by weight of 4-methoxyphenol was added to the reaction solution, and concentrated under reduced pressure at 40 ° C. and 3 torr to remove ion-exchanged water, and 90.90 of the target unsaturated quaternary ammonium salt (2) was obtained. 0 parts by weight were obtained. The product was a light yellow viscous liquid. When the concentration of the quaternary ammonium salt (purity of the target product) was determined, it was 99.3%. The yield was 88.1%. In elemental analysis, measured values (C: 59.53%, H: 8.51%, N: 4.75%) are theoretical values (C: 59.37%, H: 8.59%, N: 4. 77%).

合成実施例3 不飽和第四級アンモニウム塩(3)(ジメチルアミノプロピルアクリルアミドとポリエチレングリコール(EO)4ジグリシジルエーテル/プロピオン酸塩の付加物の合成)
撹拌翼、還流冷却器、温度計、滴下漏斗を備えたフラスコに、ジメチルアミノプロピルアクリルアミド20.0重量部(0.13モル)とイオン交換水100.0重量部を仕込み、フラスコ内の温度を35℃以下に保ちながらプロピオン酸9.5重量部(0.12モル)を滴下した。このとき反応液のpHは8.4であった。次に、フラスコの温度を60℃に上昇し、ポリエチレングリコール(EO)4ジグリシジルエーテル(デナコールEX―821;ナガセケムテックス株式会社製)18.6重量部(0.06モル)をイオン交換水100.0重量部に溶解させたものを1時間かけて滴下した後、8時間攪拌を行った。続いて、反応液に4−メトキシフェノール0.05重量部を加え、40℃、3torrで減圧濃縮を行ってイオン交換水を除去し、目的の不飽和第四級アンモニウム塩(3)を41.7重量部得た。生成物は薄黄色の粘調性液体であった。第四級アンモニウム塩濃度(該目的物の純度)を求めたところ、99.2%であった。また、収率は88.7%であった。元素分析では、実測値(C:56.13%、H:9.11%、N:7.05%)が理論値(C:56.38%、H:9.20%、N:7.31%)と一致した。
Synthesis Example 3 Unsaturated quaternary ammonium salt (3) (Synthesis of adduct of dimethylaminopropylacrylamide and polyethylene glycol (EO) 4 diglycidyl ether / propionate)
A flask equipped with a stirring blade, a reflux condenser, a thermometer, and a dropping funnel was charged with 20.0 parts by weight (0.13 mol) of dimethylaminopropylacrylamide and 100.0 parts by weight of ion-exchanged water, and the temperature in the flask was adjusted. While maintaining the temperature at 35 ° C. or lower, 9.5 parts by weight (0.12 mol) of propionic acid was added dropwise. At this time, the pH of the reaction solution was 8.4. Next, the temperature of the flask was raised to 60 ° C., and 18.6 parts by weight (0.06 mol) of polyethylene glycol (EO) 4 diglycidyl ether (Denacol EX-821; manufactured by Nagase ChemteX Corporation) was added to ion-exchanged water. What was dissolved in 100.0 parts by weight was added dropwise over 1 hour, followed by stirring for 8 hours. Subsequently, 0.05 parts by weight of 4-methoxyphenol was added to the reaction solution, and concentrated under reduced pressure at 40 ° C. and 3 torr to remove ion-exchanged water, and the desired unsaturated quaternary ammonium salt (3) was obtained in 41. 7 parts by weight were obtained. The product was a light yellow viscous liquid. When the concentration of the quaternary ammonium salt (purity of the target product) was determined, it was 99.2%. The yield was 88.7%. In elemental analysis, measured values (C: 56.13%, H: 9.11%, N: 7.05%) are theoretical values (C: 56.38%, H: 9.20%, N: 7.5). 31%).

合成実施例4 不飽和第四級アンモニウム塩(4)(ジメチルアミノエチルアクリレートとラウリルアルコール(EO)15グリシジルエーテル/酢酸塩の付加物の合成)
撹拌翼、還流冷却器、温度計、滴下漏斗を備えたフラスコに、ジメチルアミノエチルアクリレート20.0重量部(0.14モル)とイオン交換水100.0重量部を仕込み、フラスコ内の温度を35℃以下に保ちながら酢酸8.0重量部(0.13モル)を滴下した。このとき反応液のpHは5.0であったため、1%水酸化カリウム水溶液をpHが7.0になるよう添加した。次に、フラスコ内の温度を60℃に上昇し、ラウリルアルコールポリオキシエチレングリシジルエーテル(デナコールEX―171;ナガセケムテックス株式会社製)119.9重量部(0.13モル)をイオン交換水100.0重量部に溶解させたものを1時間かけて滴下した後、8時間攪拌を行った。続いて、反応液に4−メトキシフェノール0.1重量部を加え、40℃、3torrで減圧濃縮を行ってイオン交換水を除去し、目的の不飽和第四級アンモニウム塩(4)を140.2重量部得た。生成物は黄色の粘調性液体であった。第四級アンモニウム塩濃度(該目的物の純度)を求めたところ、99.4%であった。また、収率は94.9%であった。元素分析では、実測値(C:59.02%、H:9.72%、N:1.25%)が理論値(C:58.62%、H:9.75%、N:1.27%)と一致した。
Synthesis Example 4 Unsaturated quaternary ammonium salt (4) (Synthesis of adduct of dimethylaminoethyl acrylate and lauryl alcohol (EO) 15 glycidyl ether / acetate)
A flask equipped with a stirring blade, a reflux condenser, a thermometer, and a dropping funnel was charged with 20.0 parts by weight (0.14 mol) of dimethylaminoethyl acrylate and 100.0 parts by weight of ion-exchanged water, and the temperature in the flask was adjusted. While maintaining the temperature at 35 ° C. or lower, 8.0 parts by weight (0.13 mol) of acetic acid was added dropwise. At this time, since the pH of the reaction solution was 5.0, a 1% aqueous potassium hydroxide solution was added so that the pH was 7.0. Next, the temperature in the flask was raised to 60 ° C., and 119.9 parts by weight (0.13 mol) of lauryl alcohol polyoxyethylene glycidyl ether (Denacol EX-171; manufactured by Nagase ChemteX Corp.) A solution dissolved in 0.0 part by weight was added dropwise over 1 hour, followed by stirring for 8 hours. Subsequently, 0.1 part by weight of 4-methoxyphenol was added to the reaction solution, and the solution was concentrated under reduced pressure at 40 ° C. and 3 torr to remove ion-exchanged water, and the desired unsaturated quaternary ammonium salt (4) was 140. 2 parts by weight were obtained. The product was a yellow viscous liquid. When the concentration of the quaternary ammonium salt (purity of the target product) was determined, it was 99.4%. The yield was 94.9%. In elemental analysis, measured values (C: 59.02%, H: 9.72%, N: 1.25%) are theoretical values (C: 58.62%, H: 9.75%, N: 1. 27%).

合成実施例5 不飽和第四級アンモニウム塩(5)(ジメチルアミノエチルメタクリレートとポリエチレングリコール(EO)22ジグリシジルエーテル/コハク酸塩の付加物の合成)
撹拌翼、還流冷却器、温度計、滴下漏斗を備えたフラスコに、ジメチルアミノエチルメタクリレート20.0重量部(0.13モル)とイオン交換水100.0重量部を仕込み、フラスコ内の温度を35℃以下に保ちながらコハク酸15.0重量部(0.13モル)を滴下した。このとき反応液のpHは5.7であったため、1%水酸化ナトリウム水溶液をpHが7.0になるよう添加した。次に、フラスコの温度を60℃に上昇し、ポリエチレングリコール(EO)22ジグリシジルエーテル(デナコールEX―861;ナガセケムテックス株式会社製)66.4重量部(0.06モル)をイオン交換水100.0重量部に溶解させたものを1時間かけて滴下した後、8時間攪拌を行った。続いて、反応液に4−メトキシフェノール0.1重量部を加え、40℃、3torrで減圧濃縮を行ってイオン交換水を除去し、目的の不飽和第四級アンモニウム塩(5)を90.4重量部得た。生成物は薄黄色の粘調性液体であった。第四級アンモニウム塩濃度(該目的物の純度)を求めたところ、98.8%であった。また、収率は89.6%であった。元素分析では、実測値(C:53.99%、H:8.48%、N:1.73%)が理論値(C:53.87%、H:8.55%、N:1.70%)と一致した。
Synthesis Example 5 Unsaturated quaternary ammonium salt (5) (Synthesis of adduct of dimethylaminoethyl methacrylate and polyethylene glycol (EO) 22 diglycidyl ether / succinate)
A flask equipped with a stirring blade, a reflux condenser, a thermometer, and a dropping funnel was charged with 20.0 parts by weight (0.13 mol) of dimethylaminoethyl methacrylate and 100.0 parts by weight of ion-exchanged water, and the temperature in the flask was adjusted. While maintaining the temperature at 35 ° C. or lower, 15.0 parts by weight (0.13 mol) of succinic acid was added dropwise. At this time, since the pH of the reaction solution was 5.7, a 1% aqueous sodium hydroxide solution was added so that the pH was 7.0. Next, the temperature of the flask was raised to 60 ° C., and 66.4 parts by weight (0.06 mol) of polyethylene glycol (EO) 22 diglycidyl ether (Denacol EX-861; manufactured by Nagase ChemteX Corporation) was added to ion-exchanged water. What was dissolved in 100.0 parts by weight was added dropwise over 1 hour, followed by stirring for 8 hours. Subsequently, 0.1 part by weight of 4-methoxyphenol was added to the reaction solution, and concentrated under reduced pressure at 40 ° C. and 3 torr to remove ion-exchanged water, and 90.90 of the target unsaturated quaternary ammonium salt (5) was obtained. 4 parts by weight were obtained. The product was a light yellow viscous liquid. When the concentration of the quaternary ammonium salt (purity of the target product) was determined, it was 98.8%. The yield was 89.6%. In elemental analysis, measured values (C: 53.99%, H: 8.48%, N: 1.73%) are theoretical values (C: 53.87%, H: 8.55%, N: 1. 70%).

合成実施例6 不飽和第四級アンモニウム塩(6)(ジメチルアミノプロピルメタクリルアミドとエチレングリコール(EO)1ジグリシジルエーテル/コハク酸塩の付加物の合成)
撹拌翼、還流冷却器、温度計、滴下漏斗を備えたフラスコに、ジメチルアミノプロピルメタクリルアミド20.0重量部(0.12モル)とイオン交換水100.0重量部を仕込み、フラスコ内の温度を35℃以下に保ちながらコハク酸13.9重量部(0.12モル)を滴下した。このとき反応液のpHは7.3であった。次に、フラスコの温度を60℃に上昇し、エチレングリコール(EO)1ジグリシジルエーテル(エポライト40E;共栄社化学株式会社製)9.7重量部(0.06モル)をイオン交換水100.0重量部に溶解させたものを1時間かけて滴下した後、8時間攪拌を行った。続いて、反応液に4−メトキシフェノール0.04重量部を加え、40℃、3torrで減圧濃縮を行ってイオン交換水を除去し、目的の不飽和第四級アンモニウム塩(6)を38.2重量部得た。生成物は薄黄色の粘調性液体であった。第四級アンモニウム塩濃度(該目的物の純度)を求めたところ、99.0%であった。また、収率は90.3%であった。元素分析では、実測値(C:54.44%、H:8.38%、N:7.52%)が理論値(C:54.39%、H:8.32%、N:7.46%)と一致した。
Synthesis Example 6 Unsaturated Quaternary Ammonium Salt (6) (Synthesis of Adduct of Dimethylaminopropyl Methacrylamide and Ethylene Glycol (EO) 1 Diglycidyl Ether / Succinate)
A flask equipped with a stirring blade, a reflux condenser, a thermometer, and a dropping funnel was charged with 20.0 parts by weight (0.12 mol) of dimethylaminopropylmethacrylamide and 100.0 parts by weight of ion-exchanged water, and the temperature in the flask 13.9 parts by weight (0.12 mol) of succinic acid was added dropwise while keeping the temperature at 35 ° C. or lower. At this time, the pH of the reaction solution was 7.3. Next, the temperature of the flask was raised to 60 ° C., and 9.7 parts by weight (0.06 mol) of ethylene glycol (EO) 1 diglycidyl ether (Epolite 40E; manufactured by Kyoeisha Chemical Co., Ltd.) was added to 100.0 ion-exchanged water. A solution dissolved in parts by weight was added dropwise over 1 hour, followed by stirring for 8 hours. Subsequently, 0.04 part by weight of 4-methoxyphenol was added to the reaction solution, and the solution was concentrated under reduced pressure at 40 ° C. and 3 torr to remove ion-exchanged water, and the target unsaturated quaternary ammonium salt (6) was obtained by 38. 2 parts by weight were obtained. The product was a light yellow viscous liquid. When the concentration of the quaternary ammonium salt (purity of the target product) was determined, it was 99.0%. The yield was 90.3%. In elemental analysis, measured values (C: 54.44%, H: 8.38%, N: 7.52%) are theoretical values (C: 54.39%, H: 8.32%, N: 7. 46%).

比較実施例1
撹拌翼、還流冷却器、温度計、滴下漏斗を備えたフラスコに、ジメチルアミノエチルメタクリレート20.0重量部(0.13モル)とイオン交換水100.0重量部を仕込み、フラスコ内の温度を35℃以下に保ちながら酢酸8.0重量部(0.13モル)を滴下した。このとき反応液のpHは5.7であった。反応液のpHを調整せず、フラスコの温度を60℃に上昇し、ポリエチレングリコール(EO)22ジグリシジルエーテル(デナコールEX―861;ナガセケムテックス株式会社製)66.4重量部(0.06モル)をイオン交換水100.0重量部に溶解させたものを1時間かけて滴下した後、8時間攪拌を行った。続いて、反応液に4−メトキシフェノール0.1重量部を加え、40℃、3torrで減圧濃縮を行ってイオン交換水を除去し、黄色の粘調性液体を86.6重量部得た。第四級アンモニウム塩濃度を求めたところ、50.8%であった。また、収率は46.7%であった。
Comparative Example 1
A flask equipped with a stirring blade, a reflux condenser, a thermometer, and a dropping funnel was charged with 20.0 parts by weight (0.13 mol) of dimethylaminoethyl methacrylate and 100.0 parts by weight of ion-exchanged water, and the temperature in the flask was adjusted. While maintaining the temperature at 35 ° C. or lower, 8.0 parts by weight (0.13 mol) of acetic acid was added dropwise. At this time, the pH of the reaction solution was 5.7. Without adjusting the pH of the reaction solution, the temperature of the flask was raised to 60 ° C., and 66.4 parts by weight (0.06) of polyethylene glycol (EO) 22 diglycidyl ether (Denacol EX-861; manufactured by Nagase ChemteX Corporation) Mol) was dissolved in 100.0 parts by weight of ion-exchanged water and added dropwise over 1 hour, followed by stirring for 8 hours. Subsequently, 0.1 part by weight of 4-methoxyphenol was added to the reaction solution, and vacuum exchange was performed at 40 ° C. and 3 torr to remove ion-exchanged water, thereby obtaining 86.6 parts by weight of a yellow viscous liquid. When the concentration of the quaternary ammonium salt was determined, it was 50.8%. The yield was 46.7%.

比較実施例2
撹拌翼、還流冷却器、温度計、滴下漏斗を備えたフラスコに、ジメチルアミノプロピルアクリルアミド20.0重量部(0.13モル)、酢酸7.3重量部(0.12モル)、ラウリルアルコールポリオキシエチレングリシジルエーテル(デナコールEX―171;ナガセケムテックス株式会社製)110.0重量部(0.12モル)とイオン交換水200.0重量部を仕込み、フラスコ内の温度が85℃に上がった。その後、水浴によりフラスコを冷却させ、反応液の温度を60℃に安定させた。このとき反応液のpHは7.4であった。フラスコ内の温度を60℃に維持しながら、8時間攪拌を行った。続いて、反応液に4−メトキシフェノール0.2重量部を加え、40℃、3torrで減圧濃縮を行ってイオン交換水を除去し、黄色の粘調性液体を115.8重量部得た。第四級アンモニウム塩濃度を求めたところ、8.6%であった。また、収率は7.2%であった。
Comparative Example 2
In a flask equipped with a stirring blade, a reflux condenser, a thermometer, and a dropping funnel, 20.0 parts by weight (0.13 mol) of dimethylaminopropylacrylamide, 7.3 parts by weight (0.12 mol) of acetic acid, 110.0 parts by weight (0.12 mol) of oxyethylene glycidyl ether (Denacol EX-171; manufactured by Nagase ChemteX Corporation) and 200.0 parts by weight of ion-exchanged water were charged, and the temperature in the flask rose to 85 ° C. . Then, the flask was cooled with a water bath, and the temperature of the reaction solution was stabilized at 60 ° C. At this time, the pH of the reaction solution was 7.4. Stirring was performed for 8 hours while maintaining the temperature in the flask at 60 ° C. Subsequently, 0.2 parts by weight of 4-methoxyphenol was added to the reaction solution, and the solution was concentrated under reduced pressure at 40 ° C. and 3 torr to remove ion-exchanged water, thereby obtaining 115.8 parts by weight of a yellow viscous liquid. The quaternary ammonium salt concentration was determined to be 8.6%. The yield was 7.2%.

本発明の製造方法により得られた不飽和第四級アンモニウム塩について、活性エネルギー線硬化性の評価結果、及び活性エネルギー線硬化性樹脂組成物としたときの各応用分野における特性の評価結果などを以下に示す。実施例及び比較例に用いた材料は以下の通りである。
IPA:イソプロピルアルコール
MEK:メチルエチルケトン
BA:ブチルアクリレート
2EHA:2−エチルヘキシルアクリレート
「HEAA」:N−ヒドロキシエチルアクリルアミド(興人フィルム&ケミカルズ社製、商品名「HEAA」)
MHEAA:N−メチル−N−(2−ヒドロキシエチル)アクリルアミド(興人フィルム&ケミカルズ社製)
「ACMO」:アクリロイルモルホリン(興人フィルム&ケミカルズ社製、商品名「ACMO」)
「DMAA」:N,N−ジメチルアクリルアミド(興人フィルム&ケミカルズ社製、商品名「DMAA」)
「DEAA」:N,N−ジエチルアクリルアミド(興人フィルム&ケミカルズ社製、商品名「DEAA」)
「NIPAM」:イソプロピルアクリルアミド(興人フィルム&ケミカルズ社製、商品名「NIPAM」)
「DMAPAA」:ジメチルアミノプロピルアクリルアミド(興人フィルム&ケミカルズ社製、商品名「DMAPAA」)
4HBA:4-ヒドロキシブチルアクリレート
2HEA:2−ヒドロキシエチルアクリレート
PETA:ペンタエリスリトールトリアクリレート
DPHA:ジペンタエリスリトールヘキサアクリレート
IBOA:イソボルニルアクリレート
HDDA:1,6−ヘキサンジオール ジアクリレート
DCP−A:ジメチロール−トリシクロデカンジアクリレート
UV−6640B:ポリウレタンアクリレート(日本合成化学社製)
CN2302:ハイパーブランチ体ポリエステルアクリレート(サートマー社製)
DMAEA−Q:アクリロイルオキシエチルトリメチルアンモニウムクロリド
アートンR5000:JSR株式会社製の環状オレフィン系保護フィルム
n−TAC:株式会社コニカミノルタオプト製のセルロースエステルを主成分とする高分子を用いた位相差フィルム
WV−SA:富士フィルム株式会社製のTACフィルム上にディスコティック液晶がコーティングされてなる光学補償フィルム
About the unsaturated quaternary ammonium salt obtained by the production method of the present invention, the evaluation result of the active energy ray curability and the evaluation result of the characteristics in each application field when the active energy ray curable resin composition is used. It is shown below. The materials used in Examples and Comparative Examples are as follows.
IPA: isopropyl alcohol MEK: methyl ethyl ketone BA: butyl acrylate 2EHA: 2-ethylhexyl acrylate “HEAA”: N-hydroxyethylacrylamide (trade name “HEAA” manufactured by Kojin Film & Chemicals Co., Ltd.)
MHEAA: N-methyl-N- (2-hydroxyethyl) acrylamide (manufactured by Kojin Film & Chemicals)
"ACMO": Acryloyl morpholine (product name "ACMO", manufactured by Kojin Film & Chemicals)
“DMAA”: N, N-dimethylacrylamide (manufactured by Kojin Film & Chemicals, trade name “DMAA”)
“DEAA”: N, N-diethylacrylamide (trade name “DEAA” manufactured by Kojin Film & Chemicals Co., Ltd.)
“NIPAM”: Isopropylacrylamide (manufactured by Kojin Films & Chemicals, Inc., trade name “NIPAM”)
“DMAPAA”: dimethylaminopropylacrylamide (manufactured by Kojin Film & Chemicals, trade name “DMAPAA”)
4HBA: 4-hydroxybutyl acrylate 2HEA: 2-hydroxyethyl acrylate PETA: pentaerythritol triacrylate DPHA: dipentaerythritol hexaacrylate IBOA: isobornyl acrylate HDDA: 1,6-hexanediol diacrylate DCP-A: dimethylol-tri Cyclodecanediacrylate UV-6640B: Polyurethane acrylate (manufactured by Nippon Synthetic Chemical)
CN2302: Hyperbranched polyester acrylate (manufactured by Sartomer)
DMAEA-Q: acryloyloxyethyltrimethylammonium chloride arton R5000: cyclic olefin-based protective film manufactured by JSR Corporation n-TAC: retardation film WV using a polymer mainly composed of cellulose ester manufactured by Konica Minoltaopt Co., Ltd. -SA: an optical compensation film in which a discotic liquid crystal is coated on a TAC film manufactured by Fuji Film Co., Ltd.

評価実施例A−1
合成実施例1で合成した不飽和第四級アンモニウム塩(1)20重量部、PETA 40重量部、ポリウレタンアクリレート(日本合成化学製紫光UV−7600B) 40重量部、MEK 60重量部を混合し、光重合開始剤として、Darocure1173 3重量部を加え、均一に混合し、紫外線硬化可能なハードコート剤を得た。その後、得られたハードコート剤を用いて、下記方法により紫外線硬化型ハードコート層を作製した。
Evaluation Example A-1
20 parts by weight of unsaturated quaternary ammonium salt (1) synthesized in Synthesis Example 1, 40 parts by weight of PETA, 40 parts by weight of polyurethane acrylate (purple light UV-7600B manufactured by Nippon Gosei Kagaku), and 60 parts by weight of MEK are mixed, As a photopolymerization initiator, 3 parts by weight of Darocure 1173 was added and mixed uniformly to obtain an ultraviolet curable hard coat agent. Thereafter, using the obtained hard coat agent, an ultraviolet curable hard coat layer was produced by the following method.

紫外線硬化型ハードコート層の作製方法
厚さ100μmのポリエチレンテレフタラート(PET)フィルムを額縁状の木枠に固定し、フィルムを台座の上に押し当てた状態で、PETフィルムの先方の端にハードコート剤を帯状に滴下して、バーコーター(RDS12)で全体に均等な力がかかるように両端を押さえ、回転させずに同じ速さ(5cm/sec)で手前まで引いて塗工した。90℃のオーブンで3分間乾燥させた後、塗布面を上向きにして紫外線照射(装置:アイグラフィックス製 インバーター式コンベア装置ECS−4011GX、メタルハライドランプ:アイグラフィックス製 M04−L41、紫外線照度:700mW/cm2、積算光量:1000mJ/cm2)を行って硬化させ、帯電防止ハードコート膜を得た。
Preparation method of UV curable hard coat layer Polyethylene terephthalate (PET) film with a thickness of 100 μm is fixed to a frame-like wooden frame, and the film is pressed onto the pedestal. The coating agent was dropped in a strip shape, both ends were pressed by a bar coater (RDS12) so that an even force was applied to the whole, and the coating was performed at the same speed (5 cm / sec) without rotating. After drying in an oven at 90 ° C. for 3 minutes, the coated surface is facing upward and irradiated with ultraviolet rays (apparatus: Inverter type conveyor device ECS-4011GX manufactured by iGraphics, metal halide lamp: M04-L41 manufactured by Eyegraphics, ultraviolet illuminance: 700 mW / Cm <2>, integrated light quantity: 1000 mJ / cm <2>) and cured to obtain an antistatic hard coat film.

帯電防止ハードコート膜の特性を下記方法で評価した。結果を表1に示す。
(1)塗膜の形成性・べたつき性・透明性
帯電防止ハードコート膜のPETフィルムに対する付着状態、外観を目視によって観察し、塗膜の形成性とべたつき性、透明性を評価した。
塗膜の形成性:
◎:ハジキがなく、均一な塗装膜である;
○:ハジキが極めて僅にあるが、ほぼ均一な塗装膜である;
△:ハジキが幾分あるが、全体としてはほぼ均一な塗装膜である;
×:ハジキが多く、不均一な塗装膜である;
べたつき性
◎:ベタツキが全くない;
○:僅かにベタツキがある;
△:若干のベタツキがある;
×:明らかなベタツキがある;
透明性:
◎:透明で表面が平滑;
○:透明だが凹凸がある;
△:僅かな曇りや凹凸がある;
×:極度な曇りや凹凸がある;
(2)表面抵抗率測定
型板 (縦110×横110mm) を用い、カッターナイフで帯電防止ハードコート膜を裁断し、温度25℃、相対湿度60%に調整した恒温恒室機に入れ、24時間静置し、表面抵抗率測定用試料を得た。JIS K 6911 に基づき、デジタルエレクトロメーター(R8252型:エーディーシー社製)を用いて測定を行った。
(3)耐擦傷性試験
スチールウールを#0000のスチールウールを用いて、200g/cm2の荷重をかけながら帯電防止ハードコート膜の上で10往復させ、傷の発生の有無を評価した。
耐擦傷性評価
◎:膜の剥離や傷の発生がほとんど認められない;
○:膜に僅かな細い傷が認められる;
△:膜全面に筋状の傷が認められる;
×:膜の剥離が生じる;
(4)耐湿性試験
帯電防止ハードコート膜を40℃、90%RHの恒温槽内にて3日間保管し、膜の外観の変化を目視で評価した。
◎:外観に変化がない;
○:白化などの外観変化が僅かに認められるが問題のないレベル;
△:白化などの外観変化が僅かに認められる;
×:白化などの外観変化が著しく認められる;
(5)鉛筆硬度試験
帯電防止ハードコート膜について、JIS K 5400 に基づき、鉛筆硬度試験を行った。
(6)密着性の評価
JIS K 5400 8.5 碁盤目テープ法(1990年版)に基づき1mm角のます目を100個作成し、セロハンテープを貼り付け、一気に剥がした時に基材側にハードコート層が残ったます目の数を数えて評価した。
◎:100/100 (剥れ無しの数);
○:95〜99/100 (剥れ無しの数);
△:90〜94/100 (剥れ無しの数);
×:0〜89/100 (剥れ無しの数);
The characteristics of the antistatic hard coat film were evaluated by the following methods. The results are shown in Table 1.
(1) Formability / stickiness / transparency of coating film The adhesion state and appearance of the antistatic hard coat film to the PET film were visually observed to evaluate the film formability, tackiness, and transparency.
Formability of coating film:
A: There is no cissing and it is a uniform coating film;
○: There is very little repellency, but the coating film is almost uniform;
Δ: There is some repelling, but the coating film is almost uniform as a whole;
X: There are many repellent and non-uniform coating films;
Stickiness ◎: No stickiness;
○: Slightly sticky;
Δ: Slight stickiness;
X: There is clear stickiness;
transparency:
A: Transparent and smooth surface;
○: Transparent but uneven
Δ: Slight cloudiness or unevenness;
X: Extreme cloudiness or unevenness;
(2) Surface resistivity measurement Using a template (length 110 x width 110 mm), the antistatic hard coat film was cut with a cutter knife and placed in a constant temperature and constant temperature machine adjusted to a temperature of 25 ° C and a relative humidity of 60%. It left still for a time and the sample for surface resistivity measurement was obtained. Based on JIS K 6911, the measurement was performed using a digital electrometer (R8252 type: manufactured by ADC Corporation).
(3) Scratch resistance test Using # 0000 steel wool, the steel wool was reciprocated 10 times on the antistatic hard coat film while applying a load of 200 g / cm <2>, and the presence or absence of scratches was evaluated.
Abrasion resistance evaluation A: Almost no film peeling or scratches are observed;
○: slight thin scratches are observed on the membrane;
Δ: A streak is found on the entire surface of the membrane;
X: peeling of the film occurs;
(4) Moisture resistance test The antistatic hard coat film was stored in a constant temperature bath at 40 ° C. and 90% RH for 3 days, and the change in the appearance of the film was visually evaluated.
A: No change in appearance;
○: A level in which a slight change in appearance such as whitening is observed but is not a problem;
Δ: Slight change in appearance such as whitening is observed;
×: Appearance change such as whitening is remarkably recognized;
(5) Pencil hardness test The antistatic hard coat film was subjected to a pencil hardness test based on JIS K 5400.
(6) Adhesion evaluation JIS K 5400 8.5 Create 100 squares of 1 mm square based on the cross-cut tape method (1990 version), apply cellophane tape, and hard coat on the substrate side when peeled off at once The number of eyes that left the layer was counted and evaluated.
A: 100/100 (number without peeling);
○: 95 to 99/100 (number without peeling);
(Triangle | delta): 90-94 / 100 (number without peeling);
X: 0-89 / 100 (number without peeling);

評価実施例A−2〜A−10、評価比較例A−11〜A−15
表1に記載の組成に変えた以外は評価実施例A−1と同様にハードコート層を作製、評価した。結果を表1と表2に示す。
Evaluation Examples A-2 to A-10, Evaluation Comparative Examples A-11 to A-15
Except having changed into the composition of Table 1, the hard-coat layer was produced and evaluated similarly to evaluation example A-1. The results are shown in Tables 1 and 2.

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評価実施例B−1
不飽和第四級アンモニウム塩ホモポリマー溶液の合成
撹拌翼、還流冷却器、温度計、ガス導入口を備えたフラスコに、合成実施例1で合成した不飽和第四級アンモニウム塩(1)20重量部とアゾイソブチロニトリル(AIBN)0.2重量部をIPA 100重量部に混合溶解し、窒素気流下70℃で8時間重合し、不飽和第四級アンモニウム塩のホモポリマー溶液(a)を得た。
不飽和第四級アンモニウム塩コポリマー溶液の合成
撹拌翼、還流冷却器、温度計、ガス導入口を備えたフラスコに、合成実施例1で合成した不飽和第四級アンモニウム塩(1)10重量部、2EHA 10重量部とAIBN 0.2重量部をIPA 100重量部に混合溶解し、窒素気流下70℃で8時間重合し、不飽和第四級アンモニウム塩のコポリマー溶液(b)を得た。コポリマー溶液の合成におけるモノマーの配合比を表3に示す。
Evaluation Example B-1
Synthesis of unsaturated quaternary ammonium salt homopolymer solution 20 wt. Of unsaturated quaternary ammonium salt (1) synthesized in Synthesis Example 1 in a flask equipped with a stirring blade, a reflux condenser, a thermometer, and a gas inlet. And 0.2 part by weight of azoisobutyronitrile (AIBN) are mixed and dissolved in 100 parts by weight of IPA, polymerized at 70 ° C. for 8 hours under a nitrogen stream, and a homopolymer solution of unsaturated quaternary ammonium salt (a) Got.
Synthesis of unsaturated quaternary ammonium salt copolymer solution 10 parts by weight of unsaturated quaternary ammonium salt (1) synthesized in Synthesis Example 1 in a flask equipped with a stirring blade, a reflux condenser, a thermometer, and a gas inlet 10 parts by weight of 2EHA and 0.2 parts by weight of AIBN were mixed and dissolved in 100 parts by weight of IPA and polymerized at 70 ° C. for 8 hours under a nitrogen stream to obtain a copolymer solution (b) of an unsaturated quaternary ammonium salt. Table 3 shows the mixing ratio of the monomers in the synthesis of the copolymer solution.

Figure 2015189680
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不飽和第四級アンモニウム塩のポリマー含有の帯電防止ハードコート剤の作製
不飽和第四級アンモニウム塩のホモポリマー溶液(a)5重量部に、PETA 50重量部とDPHA 50重量部、及び光重合開始剤としてDarocure1173 5重量部を、IPAとMEKの1:1重量比の混合溶媒120重量部に混合溶解して、紫外線硬化可能な不飽和第四級アンモニウム塩のホモポリマー含有の帯電防止ハードコート剤を得た。その後、得られたハードコート剤を厚さ100μmのPETフィルムに塗装し、評価実施例A−1と同様に、紫外線硬化を行い、帯電防止性ハードコートを作製、評価した。
Preparation of Antistatic Hard Coating Agent Containing Unsaturated Quaternary Ammonium Salt Polymer Into 5 parts by weight of homopolymer solution (a) of unsaturated quaternary ammonium salt, 50 parts by weight of PETA and 50 parts by weight of DPHA, and photopolymerization As an initiator, 5 parts by weight of Darocure 1173 is mixed and dissolved in 120 parts by weight of a mixed solvent of 1: 1 weight ratio of IPA and MEK, and an antistatic hard coat containing an ultraviolet curable unsaturated quaternary ammonium salt homopolymer. An agent was obtained. Thereafter, the obtained hard coat agent was applied to a PET film having a thickness of 100 μm, and was subjected to ultraviolet curing in the same manner as in Evaluation Example A-1, thereby producing and evaluating an antistatic hard coat.

評価実施例B−2〜B−11、評価比較例B−12〜B−13
表4と表5に記載の組成に変えた以外は実施例B−1と同様に帯電防止性ハードコートを作製、評価した。
Evaluation Examples B-2 to B-11, Evaluation Comparative Examples B-12 to B-13
An antistatic hard coat was prepared and evaluated in the same manner as in Example B-1, except that the compositions shown in Table 4 and Table 5 were changed.

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評価実施例C−1
帯電防止性粘着剤の調製方法
撹拌翼、還流冷却器、温度計、ガス導入口を備えたフラスコに、合成実施例1で合成した不飽和第四級アンモニウム塩(1)4.0重量部、ブチルアクリレート18.5重量部、2−エチルヘキシルアクリレート74.0重量部、4−ヒドロキシブチルアクリレート3.5重量部、酢酸エチル208重量部、アセトン42重量部を加え、撹拌しながら窒素ガスを導入して装置内の空気を窒素に置換した後、AIBN 0.2部を加え、還流温度まで昇温し、7時間反応させた。反応終了後、トルエンで希釈して、アクリル系樹脂(イ−1)の35%溶液(固形分35%、粘度3000mPa・s)を得た。粘度は、コーンプレート型粘度計(装置名:RE550型粘度計 東機産業株式会社製)を使用し、JIS K5600−2−3に準じて、20℃で測定した。続いて、アクリル系樹脂(イ−1)の固形分100部に対して架橋剤としてヘキサメチレンジイソシアネート(デュラネート24A−100 旭化成工業株式会社製)を固形分で2部添加し、十分に撹拌して帯電防止性粘着剤を得た。
Evaluation Example C-1
Preparation method of antistatic pressure-sensitive adhesive In a flask equipped with a stirring blade, a reflux condenser, a thermometer, and a gas inlet, 4.0 parts by weight of the unsaturated quaternary ammonium salt (1) synthesized in Synthesis Example 1; Add 18.5 parts by weight of butyl acrylate, 74.0 parts by weight of 2-ethylhexyl acrylate, 3.5 parts by weight of 4-hydroxybutyl acrylate, 208 parts by weight of ethyl acetate and 42 parts by weight of acetone, and introduce nitrogen gas while stirring. After replacing the air in the apparatus with nitrogen, 0.2 part of AIBN was added, the temperature was raised to the reflux temperature, and the reaction was carried out for 7 hours. After completion of the reaction, the mixture was diluted with toluene to obtain a 35% solution (solid content 35%, viscosity 3000 mPa · s) of acrylic resin (I-1). The viscosity was measured at 20 ° C. according to JIS K5600-2-3 using a cone plate viscometer (device name: RE550 viscometer manufactured by Toki Sangyo Co., Ltd.). Subsequently, 2 parts of hexamethylene diisocyanate (Duranate 24A-100 manufactured by Asahi Kasei Kogyo Co., Ltd.) is added as a cross-linking agent to 100 parts of the solid content of the acrylic resin (I-1), and the mixture is sufficiently stirred. An antistatic pressure-sensitive adhesive was obtained.

アクリル系樹脂(イ−2〜11、ロ−1〜ロ−4)
表6と表7に記載のアクリル系樹脂(イ−2〜11、ロ−1〜ロ−4)に変更する以外は、評価実施例C−1のアクリル系樹脂(イ−1)と同様に帯電防止性粘着剤を得た。
Acrylic resin (I-2 to 11, B-1 to B-4)
Except for changing to the acrylic resins (A-2 to 11, B-1 to B-4) listed in Tables 6 and 7, the same as the acrylic resin (A-1) of Evaluation Example C-1 An antistatic pressure-sensitive adhesive was obtained.

Figure 2015189680
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帯電防止粘着シートの作製方法
上記にて調製した帯電防止粘着剤を、重剥離セパレーター(シリコーンコートPETフィルム)に塗工、90℃で3分間乾燥させた後、軽剥離セパレーター(シリコーンコートPETフィルム)で気泡を噛まないように卓上型ロール式ラミネーター機(Royal Sovereign製 RSL−382S)を用いて、粘着層が厚さ25μmになるように貼り合わせ、粘着剤層を形成した。次いで、
(i)温度23℃、相対湿度50%の環境に1日置き、試験用粘着シート(タイプi)を得た。
(ii)架橋剤を用いて架橋する場合は、40℃の恒温槽で3日間エージングさせた後、温度23℃、相対湿度50%の環境に1日置き、試験用粘着シート(タイプii)を得た。
(iii)紫外線照射により架橋する場合は、塗布面を上向きにして紫外線照射(装置:アイグラフィックス製 インバーター式コンベア装置ECS−4011GX、メタルハライドランプ:アイグラフィックス製 M04−L41、紫外線照度:700mW/cm2、積算光量:1000mJ/cm2)を行って硬化させ、紫外線硬化膜を得、その後、温度23℃、相対湿度50%の環境に1日置き、試験用粘着シート(タイプiii)を得た。
Preparation method of antistatic pressure-sensitive adhesive sheet The antistatic pressure-sensitive adhesive prepared above was applied to a heavy release separator (silicone-coated PET film), dried at 90 ° C. for 3 minutes, and then lightly released separator (silicone-coated PET film). Then, using a desktop roll laminator machine (RSL-382S manufactured by Royal Sovereign) so as not to bite the bubbles, the adhesive layer was bonded to a thickness of 25 μm to form an adhesive layer. Then
(I) A test pressure-sensitive adhesive sheet (type i) was obtained by placing in an environment at a temperature of 23 ° C. and a relative humidity of 50% for 1 day.
(ii) When cross-linking using a cross-linking agent, after aging in a constant temperature bath at 40 ° C. for 3 days, place it in an environment at a temperature of 23 ° C. and a relative humidity of 50% for 1 day, and attach the test adhesive sheet (type ii). Obtained.
(Iii) In the case of crosslinking by ultraviolet irradiation, ultraviolet irradiation is performed with the coated surface facing upward (apparatus: Inverter type conveyor device ECS-4011GX manufactured by Eye Graphics, metal halide lamp: M04-L41 manufactured by Eye Graphics, ultraviolet illuminance: 700 mW / cm2 and integrated light quantity: 1000 mJ / cm2) to cure and obtain an ultraviolet-cured film, and then placed in an environment of a temperature of 23 ° C. and a relative humidity of 50% for 1 day to obtain a test adhesive sheet (type iii).

得られた帯電防止粘着シートの特性を下記方法で評価した。結果を表8に示す。 The properties of the obtained antistatic pressure-sensitive adhesive sheet were evaluated by the following methods. The results are shown in Table 8.

(7)透明性(ヘイズ値)
温度23℃、相対湿度50%の条件下、被着体としてガラス基板に25mm幅に裁断した粘着シートの軽剥離セパレーターの剥がした面を貼り付け、更に重剥離セパレーターを剥がし、ヘイズ値を測定した。測定はヘイズメーター(日本電色工業社製、NDH−2000)を用いて、JIS K 7105に準じて行い、下記基準で評価した。
◎:実用上全く問題がない。ヘイズ:0.5未満;
○:曇り等は認められないが、ヘイズ:0.5以上1未満;
△:若干曇りが認められる。ヘイズ1以上3未満;
×:曇りが認められ、実用上問題がある。あるいは、ヘイズ:3以上;
(8) 粘着力
温度23℃、相対湿度50%の条件下、被着体としてアクリル(PMMA)、ポリカーボネート(PC)、ポリエチレンテレフタレート(PET)とガラスの基板、シートやフィルムに転写し、重さ2kgの圧着ローラーを用いて2往復することにより加圧貼付し、同雰囲気下で30分間放置した。その後、引っ張り試験機(装置名:オートグラフAGXS−X 500N 島津製作所製)を用いて、剥離速度300mm/分にて180°剥離強度(N/25mm)を測定した。
◎ :3(N/25mm)以上;
○ :0.5(N/25mm)以上、3(N/25mm)未満;
△ :0.1(N/25mm)以上、0.5(N/25mm)未満;
× :0.1(N/25mm)未満;
(9)耐汚染性
粘着シートを前記の粘着力の測定と同様に被着体に貼り付け、80℃、24時間放置した後、粘着シートを剥がした後の被着体表面の汚染を目視によって観察した。
◎:汚染なし;
○:ごく僅かに汚染がある;
△:僅かに汚染がある;
×:糊(粘着剤)残りがある;
(10)耐光黄変性
粘着シートをガラス基板に貼り付け、キセノンフェードメーター(SC−700−WA:スガ試験機社製)にセットし、70mW/cm2の強度の紫外線を、120時間照射した後、粘着シートの変色を目視によって観察した。
◎:黄変が目視で全く確認できない;
○:黄変が目視でごく僅かに確認できる;
△:黄変が目視で確認できる;
×:明らかな黄変が目視で確認できる;
(11)耐久性
粘着シートを前述の粘着力の測定と同様に被着体に貼り付け、85℃、85%RHの条件下で100時間保持した後の浮き・剥がれ、気泡、白濁の発生有無を目視によって観察、評価した。
◎:透明で、浮き・剥がれも気泡も発生しない;
○:ごく僅かな曇りがあるが、浮き・剥がれも気泡も発生しない;
△:僅かな曇り又は浮き・剥がれ、気泡がある;
×:極度な曇り又は浮き・剥がれ、気泡がある;
(7) Transparency (haze value)
Under the conditions of a temperature of 23 ° C. and a relative humidity of 50%, the peeled surface of the light release separator of the pressure-sensitive adhesive sheet cut to a width of 25 mm was attached to the glass substrate as the adherend, the heavy release separator was peeled off, and the haze value was measured. . The measurement was performed according to JIS K 7105 using a haze meter (NDH-2000, manufactured by Nippon Denshoku Industries Co., Ltd.) and evaluated according to the following criteria.
A: There is no problem in practical use. Haze: less than 0.5;
○: Clouding or the like is not recognized, but haze: 0.5 or more and less than 1;
Δ: Some cloudiness is observed. Haze 1 or more and less than 3;
X: Cloudiness is recognized and there is a problem in practical use. Or haze: 3 or more;
(8) Adhesive strength Under conditions of a temperature of 23 ° C. and a relative humidity of 50%, the adherend is transferred to acrylic (PMMA), polycarbonate (PC), polyethylene terephthalate (PET) and a glass substrate, sheet or film, and weight The pressure was applied by reciprocating twice using a 2 kg pressure roller, and the mixture was left for 30 minutes in the same atmosphere. Thereafter, 180 ° peel strength (N / 25 mm) was measured at a peel rate of 300 mm / min using a tensile tester (device name: Autograph AGXS-X 500N, manufactured by Shimadzu Corporation).
A: 3 (N / 25 mm) or more;
○: 0.5 (N / 25 mm) or more and less than 3 (N / 25 mm);
Δ: 0.1 (N / 25 mm) or more and less than 0.5 (N / 25 mm);
X: Less than 0.1 (N / 25 mm);
(9) Contamination resistance The adhesive sheet was adhered to the adherend in the same manner as in the measurement of the adhesive force described above, left at 80 ° C. for 24 hours, and then the contamination of the adherend surface after peeling the adhesive sheet was visually observed. Observed.
A: No contamination;
○: Slightly contaminated;
Δ: Slightly contaminated;
×: There is a residue of adhesive (adhesive);
(10) Light yellowing resistance The adhesive sheet was attached to a glass substrate, set in a xenon fade meter (SC-700-WA: manufactured by Suga Test Instruments Co., Ltd.), and irradiated with ultraviolet rays having an intensity of 70 mW / cm 2 for 120 hours. The color change of the adhesive sheet was observed visually.
A: No yellowing can be confirmed visually;
○: Yellowing can be confirmed very slightly by visual observation;
Δ: Yellowing can be visually confirmed;
X: Obvious yellowing can be confirmed visually;
(11) A durable adhesive sheet is attached to an adherend in the same manner as the measurement of the adhesive strength described above, and the presence / absence of floating / peeling, bubbles and cloudiness after holding for 100 hours under the conditions of 85 ° C. and 85% RH Were visually observed and evaluated.
◎: Transparent, no floating / peeling or bubbles generated;
○: There is very little cloudiness, but no floating / peeling or bubbles are generated;
Δ: Slight cloudiness or floating / peeling, air bubbles are present;
×: Extremely cloudy or floating / peeling, air bubbles are present;

評価実施例C−2〜C−15、評価比較例C−16〜C−21
評価実施例C−1と同様に帯電防止粘着シートを作製し、前記の試験方法で各種物性を測定した。得られた結果を表8と表9に示す。なお、評価実施例C−8は粘着シートの作成方法(i)に従って帯電防止粘着シート(タイプi)を作製し、評価実施例C−1〜C−7、C−9〜C−11と評価比較例C−13〜C−16は粘着シートの作製方法(ii)に従って帯電防止粘着シート(タイプii)を作製した。
Evaluation Examples C-2 to C-15, Evaluation Comparative Examples C-16 to C-21
An antistatic pressure-sensitive adhesive sheet was prepared in the same manner as in Evaluation Example C-1, and various physical properties were measured by the test methods described above. The obtained results are shown in Table 8 and Table 9. Evaluation Example C-8 produced an antistatic pressure-sensitive adhesive sheet (type i) in accordance with the pressure-sensitive adhesive sheet preparation method (i), and was evaluated as Evaluation Examples C-1 to C-7 and C-9 to C-11. Comparative Examples C-13 to C-16 produced antistatic pressure-sensitive adhesive sheets (type ii) according to the pressure-sensitive adhesive sheet production method (ii).

Figure 2015189680
Figure 2015189680

Figure 2015189680
Figure 2015189680

評価実施例C−17
比較製造例ロ−1で得たアクリル系樹脂10重量部に、合成実施例1で合成した不飽和第四級アンモニウム塩(1)0.5重量部、不飽和基含有化合物としてジペンタエリスリトールヘキサアクリレート1.5重量部、及び光重合開始剤として、Darocure1173 0.3重量部を加え、酢酸エチル/アセトン混合溶媒(5/1(v/v))10重量部に混合溶解して、紫外線硬化可能な不飽和第四級アンモニウム塩含有の樹脂組成物溶液を得た。この帯電防止粘着剤を用い、前記の粘着シートの作製方法(iii)に従い、塗膜及び紫外線照射を行い、帯電防止粘着シート(タイプiii)を作製した。
Evaluation Example C-17
To 10 parts by weight of the acrylic resin obtained in Comparative Production Example B-1, 0.5 part by weight of the unsaturated quaternary ammonium salt (1) synthesized in Synthesis Example 1, and dipentaerythritol hexa as an unsaturated group-containing compound Add 1.5 parts by weight of acrylate and 0.3 parts by weight of Darocure 1173 as a photopolymerization initiator, mix and dissolve in 10 parts by weight of an ethyl acetate / acetone mixed solvent (5/1 (v / v)), and then cure by UV. A possible resin composition solution containing an unsaturated quaternary ammonium salt was obtained. Using this antistatic pressure-sensitive adhesive, an antistatic pressure-sensitive adhesive sheet (type iii) was prepared by performing coating film and ultraviolet irradiation according to the above-mentioned pressure-sensitive adhesive sheet production method (iii).

評価実施例C−18〜C−24、評価比較例C−25〜C−26
評価実施例C−17と同様に帯電防止粘着シート(タイプiii)を作製し、前記の試験方法で各種物性を測定した。得られた結果を表10に示す。
Evaluation Examples C-18 to C-24, Evaluation Comparative Examples C-25 to C-26
An antistatic pressure-sensitive adhesive sheet (type iii) was prepared in the same manner as in Evaluation Example C-17, and various physical properties were measured by the test methods described above. Table 10 shows the obtained results.

Figure 2015189680
Figure 2015189680

評価実施例D−1
合成実施例1で合成した不飽和第四級アンモニウム塩(1)1重量部、「HEAA」60重量部と「DMAA」24重量部、HDDA 5重量部、ポリウレタンアクリレート(日本合成化学製紫光UV−6640B) 10重量部を混合して活性エネルギー線硬化性接着剤を調製した。これに、光重合開始剤としてDarocure1173 3重量部とIrgacure907 (チバ・スペシャルティーケミカルズ社製) 1重量部を加え、均一に混合した。
Evaluation Example D-1
1 part by weight of unsaturated quaternary ammonium salt (1) synthesized in Synthesis Example 1, 60 parts by weight of “HEAA” and 24 parts by weight of “DMAA”, 5 parts by weight of HDDA, polyurethane acrylate (purchased UV- 6640B) An active energy ray-curable adhesive was prepared by mixing 10 parts by weight. To this, 3 parts by weight of Darocure 1173 and 1 part by weight of Irgacure 907 (manufactured by Ciba Specialty Chemicals) were added as a photopolymerization initiator and mixed uniformly.

UV照射による偏光板の作製方法
卓上型ロール式ラミネーター機(Royal Sovereign製 RSL−382S)を用いて、2枚の透明フィルム(保護フィルム、位相差フィルム又は光学補償フィルム)の間に偏光フィルムを挟み、透明フィルムと偏光フィルムの間に、評価実施例または評価比較例の接着剤を、厚さ2μmになるように貼り合わせた。貼り合わせた透明フィルムの上面から紫外線を照射(装置:アイグラフィックス製 インバーター式コンベア装置ECS−4011GX、メタルハライドランプ:アイグラフィックス製 M04−L41、紫外線照度:700mW/cm2、積算光量:1000mJ/cm2)し、偏光フィルムの両側に透明フィルムを有する偏光板を作製した。
Production method of polarizing plate by UV irradiation Using a table-type roll laminator (RSL-382S manufactured by Royal Sovereign), a polarizing film is sandwiched between two transparent films (protective film, retardation film or optical compensation film) Between the transparent film and the polarizing film, the adhesive of the evaluation example or the evaluation comparative example was bonded so as to have a thickness of 2 μm. Irradiate ultraviolet rays from the upper surface of the laminated transparent film (device: Inverter type conveyor device ECS-4011GX manufactured by Eye Graphics, metal halide lamp: M04-L41 manufactured by Eye Graphics, UV illuminance: 700 mW / cm2, integrated light amount: 1000 mJ / cm2 And a polarizing plate having a transparent film on both sides of the polarizing film was prepared.

EB照射による偏光板の作製方法
光重合開始剤を加えず、上記と同様に、卓上型ロール式ラミネーター機、保護フィルム、位相差フィルム又は光学補償フィルムなどの透明フィルム、偏光フィルム及び評価実施例または評価比較例の接着剤を用い、貼り合わせを行った。貼り合わせた透明フィルムの上面から電子線を照射(装置:日新ハイボルテージ株式会社製、商品名:キュアトロンEBC−200−AA3、加速電圧:200kV、照射線量20kGy)し、偏光フィルムの両側に透明フィルムを有する偏光板を作製した。
Preparation method of polarizing plate by EB irradiation Without adding a photopolymerization initiator, similarly to the above, a transparent film such as a desktop roll laminator, a protective film, a retardation film or an optical compensation film, a polarizing film, and an evaluation example or Bonding was performed using the adhesive of the evaluation comparative example. An electron beam is irradiated from the upper surface of the bonded transparent film (apparatus: Nissin High Voltage Co., Ltd., trade name: Curetron EBC-200-AA3, acceleration voltage: 200 kV, irradiation dose 20 kGy), and both sides of the polarizing film A polarizing plate having a transparent film was prepared.

得られた接着剤と偏光板の特性を下記方法で評価した。結果を表11に示す。 The properties of the obtained adhesive and polarizing plate were evaluated by the following methods. The results are shown in Table 11.

(12)剥離強度
温度23℃、相対湿度50%の条件下、20mm×150mmに裁断した偏光板(試験片)を、引っ張り試験機(島津製作所製 オートグラフAGXS−X 500N)に取り付けた粘着テープ引きはがし試験装置の試験板に両面接着テープを用いて貼り付けた。両面接着テープを貼付していない方の透明保護フィルムと偏光フィルムの一片を、20〜30mm程度あらかじめ剥がしておき、上部つかみ具にチャックし、剥離速度300mm/minにて90°剥離強度(N/20mm)を測定した。
◎:3.0(N/20mm)以上;
○:1.5(N/20mm)以上、3.0(N/20mm)未満;
△:1.0(N/20mm)以上、1.5(N/20mm)未満;
×:1.0(N/20mm)未満;
(13)表面抵抗率測定
厚さ100μmのポリエチレンテレフタラート(PET)フィルムに、評価実施例および評価比較例で得られた接着液をバーコーター(No.3)を用いて塗布し、フィルムの上面から紫外線を照射(装置:アイグラフィックス製 インバーター式コンベア装置ECS−4011GX、メタルハライドランプ:アイグラフィックス製 M04−L41、紫外線照度:700mW/cm2、積算光量:1000mJ/cm2)し、表面抵抗率測定用フィルムを得た。続いて、温度23℃、相対湿度50%の条件下、110mm×110mmに裁断し、表面抵抗率測定用試験片を得、JIS K 6911 に基づき、デジタルエレクトロメーター(R8252型:エーディーシー社製)を用いて表面低効率を測定した。
(14)外観
得られた偏光板の透明性を目視によって観察し、下記基準で評価した。
◎:偏光板の表面に微小なスジも凹凸ムラも確認できない;
○:偏光板の表面に部分的に微小なスジが確認できる;
△:偏光板の表面に微小なスジや凹凸ムラが確認できる;
×:偏光板の表面に明らかなスジや凹凸ムラが確認できる;
(15)透明性(ヘイズ値)
得られた偏光板をヘイズメーター(日本電色工業製 ヘイズ計NDK2000)を用いてヘイズ値を測定し、下記基準で評価した。
◎:実用上全く問題がない。ヘイズ:0.5未満;
○:曇り等は認められないが、ヘイズ:0.5以上1未満;
△:若干曇りが認められる。ヘイズ1以上3未満;
×:曇りが認められ、実用上問題がある。あるいは、ヘイズ:3以上;
(16)耐水性
得られた偏光板を20×80mmに切断し、60℃の温水に48時間浸漬した後、偏光子と保護フィルム、位相差フィルム、光学補償フィルムとの界面における剥離の有無を確認した。判定は下記の基準で行った。
◎:偏光子と保護フィルムとの界面で剥離なし(1mm未満);
○:偏光子と保護フィルムとの界面の一部に剥離あり(1mm以上、3mm未満);
△:偏光子と保護フィルムとの界面の一部に剥離あり(3mm以上、5mm未満);
×:偏光子と保護フィルムとの界面で剥離あり(5mm以上);
(17)耐久性
得られた偏光板を150mm×150mmに裁断し、冷熱衝撃装置(エスペック社製TSA−101L−A)に入れ、−40℃〜80℃のヒートショックを各30分間、100回行い、下記基準で評価した。
◎:クラックの発生なし;
○:端部にのみ5mm以下の短いクラックの発生あり;
△:端部以外の場所にクラックが短い線状に発生している。しかし、その線により偏光板が2つ以上の部分に分離してはいない;
×:端部以外の場所にクラックの発生あり。その線により、偏光板が2つ以上の部分に分離している;
(12) Adhesive tape in which a polarizing plate (test piece) cut to 20 mm × 150 mm is attached to a tensile testing machine (Autograph AGXS-X 500N, manufactured by Shimadzu Corporation) under conditions of a peel strength of 23 ° C. and a relative humidity of 50% It peeled and stuck on the test board of the peeling test apparatus using the double-sided adhesive tape. One piece of the transparent protective film and the polarizing film to which the double-sided adhesive tape is not attached is peeled off in advance by about 20 to 30 mm, chucked on the upper gripping tool, and peeled at 90 ° peel strength (N / 20 mm).
A: 3.0 (N / 20 mm) or more;
○: 1.5 (N / 20 mm) or more and less than 3.0 (N / 20 mm);
Δ: 1.0 (N / 20 mm) or more and less than 1.5 (N / 20 mm);
X: Less than 1.0 (N / 20 mm);
(13) Measurement of surface resistivity The polyethylene terephthalate (PET) film having a thickness of 100 μm was coated with the adhesive liquid obtained in the evaluation examples and comparative examples using a bar coater (No. 3), and the upper surface of the film (Equipment: Inverter type ECS-4011GX manufactured by Eye Graphics, metal halide lamp: M04-L41 made by Eye Graphics, UV illumination: 700 mW / cm2, integrated light intensity: 1000 mJ / cm2), surface resistivity measurement A film was obtained. Subsequently, it was cut into 110 mm × 110 mm under conditions of a temperature of 23 ° C. and a relative humidity of 50% to obtain a test piece for measuring surface resistivity. Based on JIS K 6911, a digital electrometer (R8252 type: manufactured by ADC Corporation) Was used to measure the low surface efficiency.
(14) Appearance The transparency of the obtained polarizing plate was visually observed and evaluated according to the following criteria.
A: Neither fine streaks nor unevenness on the surface of the polarizing plate can be confirmed;
○: Minute streaks can be partially confirmed on the surface of the polarizing plate;
Δ: Minute streaks and unevenness on the surface of the polarizing plate can be confirmed;
X: Clear streaks and unevenness on the surface of the polarizing plate can be confirmed;
(15) Transparency (haze value)
The obtained polarizing plate was measured for the haze value using a haze meter (Nippon Denshoku Industries Co., Ltd. haze meter NDK2000) and evaluated according to the following criteria.
A: There is no problem in practical use. Haze: less than 0.5;
○: Clouding or the like is not recognized, but haze: 0.5 or more and less than 1;
Δ: Some cloudiness is observed. Haze 1 or more and less than 3;
X: Cloudiness is recognized and there is a problem in practical use. Or haze: 3 or more;
(16) Water resistance After the obtained polarizing plate was cut into 20 × 80 mm and immersed in warm water at 60 ° C. for 48 hours, the presence or absence of peeling at the interface between the polarizer and the protective film, retardation film, or optical compensation film was checked. confirmed. The determination was made according to the following criteria.
A: No peeling at the interface between the polarizer and the protective film (less than 1 mm);
○: There is peeling at a part of the interface between the polarizer and the protective film (1 mm or more and less than 3 mm);
(Triangle | delta): There exists peeling in a part of interface of a polarizer and a protective film (3 mm or more and less than 5 mm);
X: There is peeling at the interface between the polarizer and the protective film (5 mm or more);
(17) Durability The obtained polarizing plate was cut into 150 mm × 150 mm, put into a thermal shock apparatus (TSA-101L-A manufactured by Espec Corp.), and subjected to a heat shock of −40 ° C. to 80 ° C. for 30 minutes each 100 times. And evaluated according to the following criteria.
A: No cracking occurred;
○: Generation of a short crack of 5 mm or less only at the end;
(Triangle | delta): The crack has generate | occur | produced in the short linear form in places other than an edge part. However, the line does not separate the polarizer into two or more parts;
X: Cracks are generated in places other than the edges. The line separates the polarizer into two or more parts;

評価実施例D−2〜D−9、評価比較例D−10〜D−12
評価実施例D−1において、表11と表12に記載の組成に変えた以外は実施例D−1と同様に偏光板を作製、評価を行った。結果を表7に示す。
Evaluation Examples D-2 to D-9, Evaluation Comparative Examples D-10 to D-12
In Evaluation Example D-1, a polarizing plate was produced and evaluated in the same manner as in Example D-1, except that the compositions shown in Table 11 and Table 12 were changed. The results are shown in Table 7.

Figure 2015189680
Figure 2015189680

Figure 2015189680
Figure 2015189680

評価実施例E−1
評価実施例A−1で作成した帯電防止ハードコート膜を用い、JIS Z 2801に準拠して、抗菌性の評価を、供試細菌として黄色ぶどう球菌及び大腸菌を用いて行った。
判定は、未加工試料(PETフィルム)に対する抗菌活性値を求め、下記の基準に従って抗菌性の評価を行った。
◎:抗菌活性値が、2.0以上である;
○:抗菌活性値が、1.5以上、2.0未満である;
△:抗菌活性値が、0.5以上、1.5未満である;
×:抗菌活性値が、0.5未満である;
Evaluation Example E-1
Using the antistatic hard coat film prepared in Evaluation Example A-1, antibacterial evaluation was performed using Staphylococcus aureus and Escherichia coli as test bacteria according to JIS Z 2801.
In the determination, an antibacterial activity value for a raw sample (PET film) was obtained, and antibacterial evaluation was performed according to the following criteria.
A: Antibacterial activity value is 2.0 or more;
○: The antibacterial activity value is 1.5 or more and less than 2.0;
Δ: The antibacterial activity value is 0.5 or more and less than 1.5;
X: The antibacterial activity value is less than 0.5;

評価実施例E−2〜5、評価比較例E−6
評価実施例E−1において、表8に記載の組成に変えた以外は実施例E−1と同様に評価を行った。結果を表13に示す。
Evaluation Examples E-2 to 5 and Evaluation Comparative Example E-6
Evaluation was performed in the same manner as in Example E-1, except that the composition shown in Table 8 was used. The results are shown in Table 13.

Figure 2015189680
Figure 2015189680

合成実施例1〜6の結果に示されるように、本発明の不飽和第四級アンモニウム塩は、酸との反応時のpHを7以上に調整して合成されるため、環状エーテル基含有化合物が副生成物を生じず、高純度で目的の不飽和第四級アンモニウム塩を取得することができる。 As shown in the results of Synthesis Examples 1 to 6, the unsaturated quaternary ammonium salt of the present invention is synthesized by adjusting the pH at the time of reaction with an acid to 7 or more, and thus a cyclic ether group-containing compound Does not produce a by-product, and the target unsaturated quaternary ammonium salt can be obtained with high purity.

評価実施例と評価比較例の結果に示されるとおり、本発明の不飽和第四級アンモニウム塩は、両親媒性であるため、各種樹脂組成物、重合性モノマーやオリゴマー、ポリマー、有機溶媒に対する相溶性に優れる。このため、該不飽和第四級アンモニウム塩を配合することによって、高帯電防止性、高透明性、高密着性などの高機能を有する樹脂組成物を取得することができ、この結果、高性能のハードコート、粘着剤、接着剤などの樹脂組成物が得られる。また、本発明の不飽和第四級アンモニウム塩は、高純度で導電性に優れるため、高いイオン導電性や熱安定性が求められる、電気二重層キャパシタやリチウム二次電池などの電解液用途においても好適に使用することができる。さらに、優れた抗菌性を有するため、抗菌剤用途においても好適に用いることができる。 As shown in the results of the evaluation examples and evaluation comparative examples, the unsaturated quaternary ammonium salt of the present invention is amphiphilic, so it is a phase for various resin compositions, polymerizable monomers, oligomers, polymers, and organic solvents. Excellent solubility. For this reason, by blending the unsaturated quaternary ammonium salt, it is possible to obtain a resin composition having high functions such as high antistatic property, high transparency, and high adhesion. Resin compositions such as hard coats, pressure-sensitive adhesives, and adhesives can be obtained. In addition, since the unsaturated quaternary ammonium salt of the present invention has high purity and excellent conductivity, high ionic conductivity and thermal stability are required, and in electrolyte applications such as electric double layer capacitors and lithium secondary batteries. Can also be suitably used. Furthermore, since it has excellent antibacterial properties, it can be suitably used in antibacterial agent applications.

本発明によれば、不飽和第四級アンモニウム塩を工業的に有利に製造できる。得られた不飽和第四級アンモニウム塩は、活性エネルギー線に対し敏感に硬化反応を起こすので、活性エネルギー線硬化樹脂用途に好適に用いることができ、塗料ハードコートなどのコーティング剤、粘接着剤、電子材料、繊維、インクなどの帯電防止剤や、高導電性を利用した電気二重層キャパシタやリチウム二次電池などの電解液用途、さらには、抗菌効果を利用した抗菌剤用途においても好適に用いることができる。
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According to the present invention, an unsaturated quaternary ammonium salt can be produced industrially advantageously. The resulting unsaturated quaternary ammonium salt undergoes a curing reaction sensitively to active energy rays, and therefore can be suitably used for active energy ray curable resin applications. Suitable for antistatic agents such as adhesives, electronic materials, fibers and inks, electrolytes such as electric double layer capacitors and lithium secondary batteries using high conductivity, and antibacterial agents using antibacterial effects Can be used.
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Claims (13)

下記一般式(1)で表される飽和第四級アンモニウム塩。
Figure 2015189680
(式中、Rは水素原子またはメチル基、R、Rは各々独立に炭素数1〜3のアルキル基、炭素数1〜3のアルケニル基またはベンジル基で、互いに同一であっても異なっていてもよく、Xは酸素原子またはNH、Yは炭素数1〜3のアルキレン基を表し、nは1〜6の整数、Zは有機基、An-はn価の有機酸イオンを表す。)
A saturated quaternary ammonium salt represented by the following general formula (1).
Figure 2015189680
Wherein R 1 is a hydrogen atom or a methyl group, R 2 and R 3 are each independently an alkyl group having 1 to 3 carbon atoms, an alkenyl group having 1 to 3 carbon atoms or a benzyl group, may be different, X represents an oxygen atom or NH, Y represents an alkylene group having 1 to 3 carbon atoms, n represents an integer from 1 to 6, Z is an organic group, a n-is an n-valent organic acid ion Represents.)
一般式(1)のnが1であり、且つ、Zが下記
Figure 2015189680
(式中、Rは、炭素数1〜20のアルキル基、炭素数1〜3のアルケニル基、フェノール基またはベンジル基で、環状エーテル基で置換されていてもよく、Rは水素原子またはメチル基であり、mは1〜30の整数を示す。)で示される基である請求項1記載の不飽和第四級アンモニウム塩。
In the general formula (1), n is 1 and Z is
Figure 2015189680
(In the formula, R 4 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 1 to 3 carbon atoms, a phenol group or a benzyl group, which may be substituted with a cyclic ether group, and R 5 is a hydrogen atom or The unsaturated quaternary ammonium salt according to claim 1, which is a methyl group, and m is an integer of 1 to 30).
一般式(1)のnが2〜6であり、且つ、Zが、下記
Figure 2015189680
または
Figure 2015189680
(式中、Rは水素原子またはメチル基であり、mは1〜30の整数を示し、pおよびqは1〜29の整数を表し、その合計は2〜30である。)で示される基である請求項1記載の不飽和第四級アンモニウム塩。
N of general formula (1) is 2-6, and Z is the following
Figure 2015189680
Or
Figure 2015189680
(Wherein R 5 is a hydrogen atom or a methyl group, m represents an integer of 1 to 30, p and q represent an integer of 1 to 29, and the sum thereof is 2 to 30). The unsaturated quaternary ammonium salt according to claim 1, which is a group.
不飽和第四級アンモニウム塩が、
(a)下記一般式(2)
Figure 2015189680
(式中、Rは水素原子またはメチル基、R、Rは各々独立に炭素数1〜3のアルキル基、炭素数1〜3のアルケニル基またはベンジル基で互いに同一であっても異なっていてもよく、Xは酸素原子またはNHを表し、Yは炭素数1〜3のアルキレン基を表す。)
で表される三級アミン化合物と、有機酸と、
(b)下記一般式(3)
Figure 2015189680
または
(c)下記一般式(4)
Figure 2015189680
(式中、Rは、炭素数1〜20のアルキル基、炭素数1〜3のアルケニル基、フェノール基またはベンジル基で、環状エーテル基で置換されていてもよく、Rは水素原子または炭素数1のアルキル基であり、mは1〜30の整数を示す。)
で表される環状エーテル基含有化合物とを反応させる請求項1乃至請求項3のいずれか一項に記載の不飽和第四級アンモニウム塩の製造方法。
Unsaturated quaternary ammonium salt
(A) The following general formula (2)
Figure 2015189680
Wherein R 1 is a hydrogen atom or a methyl group, R 2 and R 3 are each independently an alkyl group having 1 to 3 carbon atoms, an alkenyl group having 1 to 3 carbon atoms or a benzyl group, which may be the same or different. X represents an oxygen atom or NH, and Y represents an alkylene group having 1 to 3 carbon atoms.)
A tertiary amine compound represented by the formula:
(B) The following general formula (3)
Figure 2015189680
Or (c) the following general formula (4)
Figure 2015189680
(In the formula, R 4 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 1 to 3 carbon atoms, a phenol group or a benzyl group, which may be substituted with a cyclic ether group, and R 5 is a hydrogen atom or (It is an alkyl group having 1 carbon atom, and m represents an integer of 1 to 30.)
The manufacturing method of the unsaturated quaternary ammonium salt as described in any one of Claim 1 thru | or 3 with which the cyclic ether group containing compound represented by these is made to react.
請求項4記載の反応において、三級アミン化合物と有機酸をpH7以上、温度35℃以下で反応させた後、環状エーテル基含有化合物とを反応させる不飽和第四級アンモニウム塩の製造方法。 5. The method for producing an unsaturated quaternary ammonium salt according to claim 4, wherein the tertiary amine compound and the organic acid are reacted at a pH of 7 or more and a temperature of 35 ° C. or less and then reacted with a cyclic ether group-containing compound. 請求項1乃至請求項3のいずれか一項に記載の不飽和第四級アンモニウム塩の単独重合または他の共重合可能なビニル系単量体との共重合で得られるオリゴマーまたはポリマー。 An oligomer or a polymer obtained by homopolymerization of the unsaturated quaternary ammonium salt according to any one of claims 1 to 3 or copolymerization with another copolymerizable vinyl monomer. 請求項1乃至請求項3のいずれか一項に記載の不飽和第四級アンモニウム塩、及び/または、請求項6記載のオリゴマーまたはポリマーからなる帯電防止剤。 An antistatic agent comprising the unsaturated quaternary ammonium salt according to any one of claims 1 to 3 and / or the oligomer or polymer according to claim 6. 請求項7記載の帯電防止剤を含有する帯電防止性樹脂組成物であって、請求項1乃至請求項3のいずれか一項に記載の不飽和第四級アンモニウム塩を構成単位として0.1〜95重量%含有するもの。 An antistatic resin composition comprising the antistatic agent according to claim 7, wherein the unsaturated quaternary ammonium salt according to any one of claims 1 to 3 is 0.1 as a constituent unit. Contains ~ 95% by weight. 請求項8記載の帯電防止性樹脂組成物であって、さらに多官能(メタ)アクリレート及び/または多官能(メタ)アクリルアミドを含有するもの。 The antistatic resin composition according to claim 8, further comprising polyfunctional (meth) acrylate and / or polyfunctional (meth) acrylamide. 基材上に請求項7記載の帯電防止剤及び/または請求項8または請求項9記載の帯電防止組成物を塗装した後、活性エネルギー線または熱により硬化して形成される帯電防止層。 An antistatic layer formed by coating the base material with the antistatic agent according to claim 7 and / or the antistatic composition according to claim 8 or 9, and then curing with an active energy ray or heat. 少なくとも片面に請求項10記載の帯電防止層を有するフィルム又はシート状の帯電防止薄膜。 A film or sheet-shaped antistatic thin film having the antistatic layer according to claim 10 on at least one surface. 請求項1乃至請求項3のいずれか一項に記載の不飽和第四級アンモニウム塩、及び/または、請求項6記載のオリゴマーまたはポリマーを用いる電池またはコンデンサ用電解質。 An electrolyte for a battery or a capacitor using the unsaturated quaternary ammonium salt according to any one of claims 1 to 3 and / or the oligomer or polymer according to claim 6. 請求項1乃至請求項3のいずれか一項に記載の不飽和第四級アンモニウム塩、及び/または、請求項6記載のオリゴマーまたはポリマーを用いる抗菌剤。 The antibacterial agent using the unsaturated quaternary ammonium salt as described in any one of Claims 1 thru | or 3, and / or the oligomer or polymer of Claim 6.
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109135232A (en) * 2017-06-27 2019-01-04 江南大学 A kind of antimicrobial macromolecule composite material and preparation method
CN113929809A (en) * 2021-09-13 2022-01-14 浙江理工大学 Quaternary ammonium salt polymer and preparation method thereof
JP7297228B2 (en) 2018-10-31 2023-06-26 Kjケミカルズ株式会社 antibacterial nail cosmetics

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109135232A (en) * 2017-06-27 2019-01-04 江南大学 A kind of antimicrobial macromolecule composite material and preparation method
JP7297228B2 (en) 2018-10-31 2023-06-26 Kjケミカルズ株式会社 antibacterial nail cosmetics
CN113929809A (en) * 2021-09-13 2022-01-14 浙江理工大学 Quaternary ammonium salt polymer and preparation method thereof

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