JP2015165490A5 - - Google Patents

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JP2015165490A5
JP2015165490A5 JP2015019878A JP2015019878A JP2015165490A5 JP 2015165490 A5 JP2015165490 A5 JP 2015165490A5 JP 2015019878 A JP2015019878 A JP 2015019878A JP 2015019878 A JP2015019878 A JP 2015019878A JP 2015165490 A5 JP2015165490 A5 JP 2015165490A5
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JP
Japan
Prior art keywords
connection layer
layer
resin layer
anisotropic conductive
conductive film
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JP2015019878A
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Japanese (ja)
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JP6428325B2 (en
JP2015165490A (en
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Claims (14)

第1接続層とその片面に形成された第2接続層とを有する異方性導電フィルムであって、
第1接続層が、光重合樹脂層であり、
第2接続層が、熱又は光カチオン、アニオン若しくはラジカル重合性樹脂層であり、
第1接続層の第2接続層側表面に、異方性導電接続用の導電粒子が単層で配列されており、
第1接続層の第2接続層反対側表面に微細凹凸が設けられている
ことを特徴とする異方性導電フィルム。
An anisotropic conductive film having a first connection layer and a second connection layer formed on one side thereof,
The first connection layer is a photopolymerization resin layer;
The second connection layer is a heat or photocation, anion or radical polymerizable resin layer;
Conductive particles for anisotropic conductive connection are arranged in a single layer on the second connection layer side surface of the first connection layer,
An anisotropic conductive film, wherein fine irregularities are provided on the surface of the first connection layer opposite to the second connection layer.
第1接続層とその片面に形成された第2接続層とを有する異方性導電フィルムであって、An anisotropic conductive film having a first connection layer and a second connection layer formed on one side thereof,
第1接続層が、光重合樹脂層であり、The first connection layer is a photopolymerization resin layer;
第2接続層が、熱又は光カチオン、アニオン若しくはラジカル重合性樹脂層であり、The second connection layer is a heat or photocation, anion or radical polymerizable resin layer;
第1接続層の第2接続層側表面に、異方性導電接続用の導電粒子が単層で一定の間隔で設けられており、Conductive particles for anisotropic conductive connection are provided on the second connection layer side surface of the first connection layer in a single layer at regular intervals,
第1接続層の第2接続層反対側表面に微細凹凸が設けられているFine irregularities are provided on the surface of the first connection layer opposite to the second connection layer.
ことを特徴とする異方性導電フィルム。An anisotropic conductive film characterized by that.
該微細凹凸が規則的パターンで設けられている請求項1または2記載の異方性導電フィルム。 The anisotropic conductive film according to claim 1 or 2, wherein the fine irregularities are provided in a regular pattern. 該微細凹凸の凹部の底部から凸部の頂点までの平均距離が、導電粒子の平均粒子径の1/50〜10倍である請求項1〜3のいずれかに記載の異方性導電フィルム。 The anisotropic conductive film according to any one of claims 1 to 3, wherein an average distance from the bottom of the concave portion of the fine unevenness to the apex of the convex portion is 1/50 to 10 times the average particle diameter of the conductive particles. 該微細凹凸パターンのピッチが、導電粒子の平均粒子径の1/50〜10倍である請求項1〜のいずれかに記載の異方性導電フィルム。 The anisotropic conductive film according to any one of claims 1 to 4 , wherein the pitch of the fine uneven pattern is 1/50 to 10 times the average particle diameter of the conductive particles. 第1接続層が、アクリレート化合物と光ラジカル重合開始剤とを含む光ラジカル重合性樹脂層を光ラジカル重合させた光ラジカル重合樹脂層である請求項1〜のいずれかに記載の異方性導電フィルム。 First connection layer, anisotropy according to any one of claims 1 to 5, which is a photo-radical polymerization resin layer formed by photo-radical polymerization of a radical photopolymerizable resin layer containing acrylate compound and a photo-radical polymerization initiator Conductive film. 第1接続層が、更に、エポキシ化合物と熱又は光カチオン若しくはアニオン重合開始剤とを含有している請求項1〜のいずれかに記載の異方性導電フィルム。 First connection layer, further, anisotropic conductive film according to any one of claims 1 to 6 which contains an epoxy compound and a thermal or photo cationic or anionic polymerization initiator. 第2接続層が、エポキシ化合物と熱又は光カチオン若しくはアニオン重合開始剤とを含有する熱又は光カチオン若しくはアニオン重合性樹脂層、又はアクリレート化合物と熱又は光ラジカル重合開始剤とを含有する熱又は光ラジカル重合性樹脂層である請求項1〜のいずれかに記載の異方性導電フィルム。 The second connection layer is a heat containing an epoxy compound and heat or a photocation or anion polymerization initiator, or a heat or photocation or anion polymerizable resin layer, or a heat containing an acrylate compound and a heat or radical polymerization initiator, or the anisotropic conductive film according to any one of claims 1 to 7, which is a radical photopolymerizable resin layer. 第2接続層が、エポキシ化合物と熱又は光カチオン若しくはアニオン重合開始剤とを含有する熱又は光カチオン若しくはアニオン重合性樹脂層である場合、更にアクリレート化合物と熱又は光ラジカル重合開始剤とを含有する請求項記載の異方性導電フィルム。 When the second connection layer is a heat or photocation or anion polymerizable resin layer containing an epoxy compound and heat or a photocation or anion polymerization initiator, further contains an acrylate compound and a heat or photoradical polymerization initiator The anisotropic conductive film according to claim 8 . 請求項1記載の異方性導電フィルムの製造方法であって、以下の工程(A)〜(D):
工程(A)
微細凹凸が形成された原盤を用いて、片面に微細凹凸が設けられた光重合性樹脂層を形成する工程;
工程(B)
片面に微細凹凸が設けられた光重合性樹脂層の他面に導電粒子を単層で配列させる工程;
工程(C)
導電粒子が配列した光重合性樹脂層に対して紫外線を照射することにより光ラジカル重合反応させ、片面に微細凹凸が設けられ、他面に導電粒子が固定化された第1接続層を形成する工程;及び
工程(D)
導電粒子が固定化された第1接続層の他面に、熱又は光カチオン、アニオン若しくはラジカル重合性樹脂層からなる第2接続層を形成する工程
を有する製造方法。
It is a manufacturing method of the anisotropic conductive film of Claim 1, Comprising: The following processes (A)-(D):
Step (A)
Forming a photopolymerizable resin layer having fine irregularities on one surface using a master having fine irregularities formed thereon;
Process (B)
A step of arranging conductive particles in a single layer on the other side of the photopolymerizable resin layer provided with fine irregularities on one side;
Process (C)
The photopolymerizable resin layer in which the conductive particles are arranged is irradiated with ultraviolet rays to cause a radical photopolymerization reaction, thereby forming a first connection layer in which fine irregularities are provided on one side and the conductive particles are fixed on the other side. Step; and step (D)
The manufacturing method which has the process of forming the 2nd connection layer which consists of a heat | fever or a photocation, an anion, or a radical polymerizable resin layer in the other surface of the 1st connection layer to which the electroconductive particle was fix | immobilized.
工程(B)の紫外線照射を、光重合性樹脂層の導電粒子が配列した側から行う請求項10記載の製造方法。 The manufacturing method of Claim 10 which performs the ultraviolet irradiation of a process (B) from the side in which the electrically conductive particle of the photopolymerizable resin layer arranged. 請求項1記載の異方性導電フィルムの製造方法であって、以下の工程(AA)〜(EE):
工程(AA)
微細凹凸が形成された原盤を用いて、片面に微細凹凸が設けられた光重合性樹脂層を形成する工程;
工程(BB)
片面に微細凹凸が設けられた光重合性樹脂層の他面に導電粒子を単層で配列させる工程;
工程(CC)
導電粒子が配列した光重合性樹脂層に対して紫外線を照射することにより光重合反応させ、片面に微細凹凸が設けられ、他面に導電粒子が仮固定化された仮第1接続層を形成する工程;
工程(DD)
仮第1接続層の導電粒子側表面に、熱カチオン、アニオン若しくはラジカル重合性樹脂層からなる第2接続層を形成する工程;及び
工程(EE)
第2接続層と反対側から仮第1接続層に紫外線を照射することにより光重合反応させ、仮第1接続層を本硬化させて第1接続層を形成する工程
を有する製造方法。
It is a manufacturing method of the anisotropic conductive film of Claim 1, Comprising: The following processes (AA)-(EE):
Process (AA)
Forming a photopolymerizable resin layer having fine irregularities on one surface using a master having fine irregularities formed thereon;
Process (BB)
A step of arranging conductive particles in a single layer on the other side of the photopolymerizable resin layer provided with fine irregularities on one side;
Process (CC)
The photopolymerizable resin layer in which the conductive particles are arranged is subjected to a photopolymerization reaction by irradiating ultraviolet rays to form a temporary first connection layer in which fine irregularities are provided on one side and the conductive particles are temporarily fixed on the other side. The step of:
Process (DD)
Forming a second connection layer comprising a thermal cation, anion, or radical polymerizable resin layer on the conductive particle side surface of the temporary first connection layer; and step (EE)
The manufacturing method which has a process which carries out photopolymerization reaction by irradiating a temporary 1st connection layer by irradiating an ultraviolet-ray from the opposite side to a 2nd connection layer, and main-hardens a temporary 1st connection layer, and forms a 1st connection layer.
工程(CC)の紫外線照射を、光重合性樹脂層の導電粒子が配列した側から行う請求項12記載の製造方法。 The manufacturing method of Claim 12 which performs the ultraviolet irradiation of a process (CC) from the side in which the electrically conductive particle of the photopolymerizable resin layer arranged. 請求項1〜のいずれかに記載の異方性導電フィルムで第1電子部品を第2電子部品に異方性導電接続した接続構造体。 Connection structure connected anisotropic conductive first electronic component in the anisotropic conductive film to the second electronic component according to any of claims 1-9.
JP2015019878A 2014-02-04 2015-02-04 Anisotropic conductive film and manufacturing method thereof Active JP6428325B2 (en)

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JP2014019868 2014-02-04
JP2014019868 2014-02-04
JP2015019878A JP6428325B2 (en) 2014-02-04 2015-02-04 Anisotropic conductive film and manufacturing method thereof

Publications (3)

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JP2015165490A JP2015165490A (en) 2015-09-17
JP2015165490A5 true JP2015165490A5 (en) 2018-03-08
JP6428325B2 JP6428325B2 (en) 2018-11-28

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KR102267650B1 (en) * 2016-12-01 2021-06-21 데쿠세리아루즈 가부시키가이샤 Anisotropic conductive film
JP7062389B2 (en) * 2017-08-23 2022-05-06 デクセリアルズ株式会社 Anisotropic conductive film
CN112750554B (en) * 2019-10-29 2022-10-04 昇印光电(昆山)股份有限公司 Conductive film

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JP2001052778A (en) * 1999-08-06 2001-02-23 Hitachi Chem Co Ltd Anisotropic conductive adhesive film and its manufacture
JP4084711B2 (en) * 2003-06-18 2008-04-30 株式会社リコー Flexible optical disk and method for manufacturing flexible optical disk
JP4880533B2 (en) * 2007-07-03 2012-02-22 ソニーケミカル&インフォメーションデバイス株式会社 Anisotropic conductive film, method for producing the same, and joined body
JP2011066100A (en) * 2009-09-16 2011-03-31 Bridgestone Corp Photocurable transfer sheet and method for forming recessed and projected pattern using same
JP5398455B2 (en) * 2009-09-30 2014-01-29 デクセリアルズ株式会社 Anisotropic conductive film and manufacturing method thereof
JP2013105636A (en) * 2011-11-14 2013-05-30 Dexerials Corp Anisotropic conductive film, connection method, and connected body

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